TWI495004B - - Google Patents
Info
- Publication number
- TWI495004B TWI495004B TW101129384A TW101129384A TWI495004B TW I495004 B TWI495004 B TW I495004B TW 101129384 A TW101129384 A TW 101129384A TW 101129384 A TW101129384 A TW 101129384A TW I495004 B TWI495004 B TW I495004B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103192527A CN102395243A (zh) | 2011-10-19 | 2011-10-19 | 改进等离子均匀性和效率的电感耦合等离子装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201318063A TW201318063A (zh) | 2013-05-01 |
| TWI495004B true TWI495004B (ja) | 2015-08-01 |
Family
ID=45862417
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101129384A TW201318063A (zh) | 2011-10-19 | 2012-08-14 | 改進等離子均勻性和效率的電感耦合等離子裝置 |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN102395243A (ja) |
| TW (1) | TW201318063A (ja) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103796413B (zh) * | 2012-11-01 | 2017-05-03 | 中微半导体设备(上海)有限公司 | 等离子反应器及制作半导体基片的方法 |
| CN103874314B (zh) * | 2012-12-17 | 2016-10-05 | 中微半导体设备(上海)有限公司 | 一种电感耦合等离子装置 |
| CN103997843B (zh) * | 2013-02-17 | 2017-02-15 | 中微半导体设备(上海)有限公司 | 一种改进气体分布的等离子体反应器 |
| CN117080062B (zh) * | 2023-10-13 | 2024-01-26 | 无锡邑文微电子科技股份有限公司 | 碗状刻蚀的方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0729890A (ja) * | 1993-07-08 | 1995-01-31 | Kokusai Electric Co Ltd | プラズマ発生装置 |
| JPH0774155A (ja) * | 1993-08-31 | 1995-03-17 | Nec Corp | ドライエッチング方法およびドライエッチング装置 |
| JP2001267248A (ja) * | 2000-03-15 | 2001-09-28 | Shibaura Mechatronics Corp | 半導体処理装置 |
| US20080210378A1 (en) * | 2005-07-19 | 2008-09-04 | Dms Co, Ltd. | Plasma Reactor Having Multiple Antenna Structure |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6164241A (en) * | 1998-06-30 | 2000-12-26 | Lam Research Corporation | Multiple coil antenna for inductively-coupled plasma generation systems |
| TWI241868B (en) * | 2002-02-06 | 2005-10-11 | Matsushita Electric Ind Co Ltd | Plasma processing method and apparatus |
| US20040118344A1 (en) * | 2002-12-20 | 2004-06-24 | Lam Research Corporation | System and method for controlling plasma with an adjustable coupling to ground circuit |
| KR100561848B1 (ko) * | 2003-11-04 | 2006-03-16 | 삼성전자주식회사 | 헬리컬 공진기형 플라즈마 처리 장치 |
| US20050241767A1 (en) * | 2004-04-30 | 2005-11-03 | Ferris David S | Multi-piece baffle plate assembly for a plasma processing system |
| JP4904202B2 (ja) * | 2006-05-22 | 2012-03-28 | ジーイーエヌ カンパニー リミッテッド | プラズマ反応器 |
| JP6097471B2 (ja) * | 2007-04-27 | 2017-03-15 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | 環状のバッフル |
| CN101797394A (zh) * | 2009-02-09 | 2010-08-11 | 王龙哲 | 射频电感耦合等离子体灭菌器 |
| CN101805895B (zh) * | 2010-03-31 | 2011-09-07 | 河北大学 | 一种螺旋波等离子体增强化学气相沉积装置 |
-
2011
- 2011-10-19 CN CN2011103192527A patent/CN102395243A/zh active Pending
-
2012
- 2012-08-14 TW TW101129384A patent/TW201318063A/zh unknown
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0729890A (ja) * | 1993-07-08 | 1995-01-31 | Kokusai Electric Co Ltd | プラズマ発生装置 |
| JPH0774155A (ja) * | 1993-08-31 | 1995-03-17 | Nec Corp | ドライエッチング方法およびドライエッチング装置 |
| JP2001267248A (ja) * | 2000-03-15 | 2001-09-28 | Shibaura Mechatronics Corp | 半導体処理装置 |
| US20080210378A1 (en) * | 2005-07-19 | 2008-09-04 | Dms Co, Ltd. | Plasma Reactor Having Multiple Antenna Structure |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201318063A (zh) | 2013-05-01 |
| CN102395243A (zh) | 2012-03-28 |