TWI486620B - Method for manufacturing optical member and optical member - Google Patents
Method for manufacturing optical member and optical member Download PDFInfo
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- TWI486620B TWI486620B TW099141386A TW99141386A TWI486620B TW I486620 B TWI486620 B TW I486620B TW 099141386 A TW099141386 A TW 099141386A TW 99141386 A TW99141386 A TW 99141386A TW I486620 B TWI486620 B TW I486620B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00009—Production of simple or compound lenses
- B29D11/00403—Producing compound lenses
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
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- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
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- Physical Vapour Deposition (AREA)
- Surface Treatment Of Optical Elements (AREA)
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Description
本發明係關於一種光學構件的製造方法及光學構件。The present invention relates to a method of manufacturing an optical member and an optical member.
以往,就利用於光通訊領域等中之光之聚光等的光學構件之一種而言,已知有一種具備球狀透鏡之光學構件。在該種光學構件中,為了達成抑制球狀透鏡之表面中之因光之反射所造成之光穿透率降低之目的等,一般而言係在球狀透鏡之表面上形成反射抑制膜等光學性功能膜。Conventionally, an optical member including a spherical lens is known as one of optical members such as light collected by light in the field of optical communication. In such an optical member, in order to achieve a purpose of suppressing a decrease in light transmittance due to reflection of light in the surface of the spherical lens, generally, an optical such as a reflection suppressing film is formed on the surface of the spherical lens. Sexual functional membrane.
然而,球狀透鏡係具有遠比一般之透鏡大之曲率,因此難以在球狀透鏡之表面上形成光學性功能膜。However, the spherical lens system has a curvature much larger than that of a general lens, and thus it is difficult to form an optical functional film on the surface of the spherical lens.
有鑑於上述狀況,在下述之專利文獻1至3等中,提案有在球狀透鏡之表面上形成光學性功能膜之各種方法。In view of the above, various methods for forming an optical functional film on the surface of a spherical lens are proposed in Patent Documents 1 to 3 and the like described below.
具體而言,在專利文獻1中記載有:藉由相對於可公轉或自公轉之元件支持機構配置複數個蒸鍍源,而將均勻厚度之光學性功能膜形成在支持於元件支持機構之曲率大的透鏡之方法。Specifically, in Patent Document 1, it is described that a plurality of vapor deposition sources are disposed with respect to a reproducible or self-revolving component supporting mechanism, and an optical functional film having a uniform thickness is formed in a curvature supported by the component supporting mechanism. The method of large lenses.
在專利文獻2中記載有:以朝鉛直方向傾斜之自轉軸為中心,一面使球狀透鏡自轉並公轉,一面進行成膜,藉此在球狀透鏡之表面上形成均勻厚度之光學性功能膜(過濾膜)。Patent Document 2 discloses that an optical functional film having a uniform thickness is formed on the surface of the spherical lens while the spherical lens is rotated and revolved around the rotation axis that is inclined in the vertical direction. (Filter membrane).
在專利文獻3中記載有:一面自轉一面公轉之成膜用治具位於成膜區域內時,維持成膜材料朝向球狀透鏡之中央部分飛行之狀態,藉此在球狀透鏡之表面上形成周緣部之膜厚比中央部之膜厚更薄的光學性功能膜。Patent Document 3 discloses that when the film forming jig that revolves while rotating is positioned in the film formation region, the film forming material is moved toward the central portion of the spherical lens, thereby forming on the surface of the spherical lens. An optical functional film having a film thickness at a peripheral portion that is thinner than a film thickness at a central portion.
(專利文獻1)日本特開平11-106901號公報(Patent Document 1) Japanese Patent Laid-Open No. Hei 11-106901
(專利文獻2)日本特開2006-342384號公報(Patent Document 2) Japanese Patent Laid-Open Publication No. 2006-342384
(專利文獻3)日本特開2007-108425號公報(Patent Document 3) Japanese Patent Laid-Open Publication No. 2007-108425
然而,如專利文獻1、2所記載,在球狀透鏡之表面上形成均勻厚度的光學性功能膜時,會有難以獲得所希望之光學特性之情形。同樣地,如專利文獻3所記載,在球狀透鏡之表面上形成周緣部之膜厚比中央部之膜厚更薄的光學性功能膜時,亦有難以獲得所希望之光學特性之情形。However, as described in Patent Documents 1 and 2, when an optical functional film having a uniform thickness is formed on the surface of the spherical lens, it may be difficult to obtain desired optical characteristics. Similarly, as described in Patent Document 3, when an optical functional film having a peripheral portion having a film thickness smaller than that of the central portion is formed on the surface of the spherical lens, it is difficult to obtain desired optical characteristics.
本發明係鑑於上述情事而研創者,其目的在於提供一種具有所希望之光學特性之光學構件的製造方法及具有所希望之光學特性的光學構件。The present invention has been made in view of the above circumstances, and an object thereof is to provide a method for producing an optical member having desired optical characteristics and an optical member having desired optical characteristics.
本發明之光學構件的製造方法係關於一種具備球狀透鏡、及形成在球狀透鏡之表面上之光學性功能膜之光學構件的製造方法。在本發明之光學構件的製造方法中,一面使球狀透鏡繞著第2中心軸旋轉,一面藉由氣相成長法形成光學性功能膜,其中該第2中心軸係繞著第1中心軸旋轉之中心軸,且相對於第1中心軸傾斜。The method for producing an optical member according to the present invention relates to a method for producing an optical member including a spherical lens and an optical functional film formed on the surface of the spherical lens. In the method for producing an optical member according to the present invention, the optical lens is formed by a vapor phase growth method while rotating the spherical lens around the second central axis, wherein the second central axis surrounds the first central axis The central axis of rotation is inclined with respect to the first central axis.
在本發明中,所謂「旋轉」係指以未通過物體中之軸為中心的圓運動。另一方面,所謂「迴旋」係指以通過物體中之軸為中心的圓運動。In the present invention, "rotation" means a circular motion centering on an axis that does not pass through an object. On the other hand, "swing" refers to a circular motion centered on an axis passing through an object.
光學性功能膜之光學特性係取決於光對於光學性功能膜之入射角。詳細言之,光學性功能膜之光學性特性係隨著光對於光學性功能膜之入射角變大而往短波長位移。例如,光學性功能膜為抑制預定之截止(cut-off)波長以下的波長域之光之反射的反射抑制膜時,截止波長係隨著光對於光學性功能膜之入射角變大而往短波長位移。The optical properties of the optically functional film depend on the angle of incidence of light with respect to the optically functional film. In detail, the optical property of the optical functional film shifts to a short wavelength as the incident angle of light to the optical functional film becomes larger. For example, when the optical functional film is a reflection suppressing film that suppresses reflection of light in a wavelength range below a predetermined cut-off wavelength, the cutoff wavelength is short as the incident angle of light to the optical functional film becomes larger. Wavelength shift.
再者,光學性功能膜之光學特性亦取決於光學性功能膜之膜厚。詳細言之,光學性功能膜之光學性特性係隨著光學性功能膜之膜厚變厚而往長波長位移。例如,光學性功能膜為抑制預定之截止(cut-off)波長以下的波長域之光之反射的反射抑制膜時,截止波長係隨著光學性功能膜之膜厚變厚而往長波長位移。Furthermore, the optical properties of the optical functional film also depend on the film thickness of the optical functional film. In detail, the optical property of the optical functional film shifts to a long wavelength as the film thickness of the optical functional film becomes thicker. For example, when the optical functional film is a reflection suppressing film that suppresses reflection of light in a wavelength range below a predetermined cut-off wavelength, the cutoff wavelength shifts to a long wavelength as the film thickness of the optical functional film becomes thicker. .
此外,在本發明中,「光學性功能膜之膜厚」係指形成有光學性功能膜之部分之球狀透鏡的表面之法線方向上之膜厚。In the present invention, the "thickness of the optical functional film" means the film thickness in the normal direction of the surface of the spherical lens in which the optical functional film is formed.
在此,當準直光或擴散光入射至形成於球狀透鏡之表面上的光學性功能膜時,位於球狀透鏡之光軸上之部分中的光之入射角為0°。另一方面,隨著遠離球狀透鏡之光軸,光的入射角會變大。Here, when the collimated light or the diffused light is incident on the optical functional film formed on the surface of the spherical lens, the incident angle of the light in the portion on the optical axis of the spherical lens is 0°. On the other hand, as the optical axis away from the spherical lens, the incident angle of light becomes large.
因此,光學性功能膜之膜厚均勻時,遠離球狀透鏡之光軸的部分中之光學性功能膜的光學特性係為比位於球狀透鏡之光軸上之部分中之光學特性更進行短波長位移者。亦即,以位於球狀透鏡之光軸上的部分為基準,設計均勻之光學性功能膜而使所希望之光學特性顯現時,遠離球狀透鏡之光軸的部分之光學特性係成為與所希望之光學特性不同者。結果,就整體而言,難以製作具有所希望之光學特性的光學構件。Therefore, when the film thickness of the optical functional film is uniform, the optical property of the optical functional film in the portion away from the optical axis of the spherical lens is shorter than the optical characteristic in the portion on the optical axis of the spherical lens. Wavelength shifter. That is, when a uniform optical functional film is designed on the basis of the portion located on the optical axis of the spherical lens, and the desired optical characteristics are exhibited, the optical characteristics of the portion away from the optical axis of the spherical lens are The optical characteristics of the hope are different. As a result, it is difficult to produce an optical member having desired optical characteristics as a whole.
例如,光學性功能膜為抑制預定之截止(cut-off)波長以下的波長域之光之反射的反射抑制膜時,會有遠離球狀透鏡之光軸的部分中之反射抑制膜的截止波長係比使用光之波長更短,遠離球狀透鏡之光軸的部分中之光的反射率變得過高之疑虞。在此情形下,難以製作具有所希望之光穿透率的光學構件。For example, when the optical functional film is a reflection suppressing film that suppresses reflection of light in a wavelength range below a predetermined cut-off wavelength, there is a cutoff wavelength of a reflection suppressing film in a portion away from the optical axis of the spherical lens. It is less than the wavelength of the light used, and the reflectance of the light in the portion away from the optical axis of the spherical lens becomes too high. In this case, it is difficult to fabricate an optical member having a desired light transmittance.
如上述專利文獻3所記載,在球狀透鏡之表面上形成周緣部之膜厚比中央部之膜厚更薄的光學性功能膜時,光學特性會在光之入射角小且膜厚較厚之中央部、與光之入射角大且膜厚較薄之周邊部之間大幅不同。結果,更難以製作所希望之光學特性的光學構件。As described in the above Patent Document 3, when an optical functional film having a peripheral portion having a film thickness smaller than that of the central portion is formed on the surface of the spherical lens, the optical characteristics are small at an incident angle of light and the film thickness is thick. The central portion is greatly different from the peripheral portion where the incident angle of light is large and the film thickness is thin. As a result, it is more difficult to fabricate optical members of desired optical characteristics.
相對於此,本發明係如前所述,一面使球狀透鏡繞著第2中心軸旋轉,一面藉由氣相成長法形成光學性功能膜,其中該第2中心軸係繞著第1中心軸旋轉之中心軸,且相對於第1中心軸傾斜。因此,光學性功能膜中之膜厚最厚的部分不再是位於球狀透鏡之光軸上的部分,在光學性功能膜之中央部中,膜厚會隨著遠離球狀透鏡之光軸而變厚。在此情形下,於光學性功能膜之中央部中,與光學性功能膜之膜厚均勻之情形相比較,可使光學特性之變異減少。特別是,可使遠離球狀透鏡之光軸的部分中之光學特性的變異減少。結果,可得到具有所期望之光學特性的光學構件。On the other hand, in the present invention, as described above, the optical lens is formed by a vapor phase growth method while rotating the spherical lens around the second central axis, wherein the second central axis surrounds the first center. The central axis of the shaft rotation is inclined with respect to the first central axis. Therefore, the thickest portion of the optical functional film is no longer the portion on the optical axis of the spherical lens. In the central portion of the optical functional film, the film thickness is away from the optical axis of the spherical lens. And thicker. In this case, in the central portion of the optical functional film, the variation in optical characteristics can be reduced as compared with the case where the film thickness of the optical functional film is uniform. In particular, variation in optical characteristics in a portion away from the optical axis of the spherical lens can be reduced. As a result, an optical member having desired optical characteristics can be obtained.
例如,光學性功能膜為抑制預定之截止(cut-off)波長以下的波長域之光之反射的反射抑制膜時,可防止遠離球狀透鏡之光軸的部分中之截止波長變得過短之事態。因此,可抑制遠離球狀透鏡之光軸的部分中之光之反射率的增大。結果,可獲得具有所希望之高光穿透率的光學構件。For example, when the optical functional film is a reflection suppressing film that suppresses reflection of light in a wavelength range below a predetermined cut-off wavelength, the cutoff wavelength in a portion away from the optical axis of the spherical lens can be prevented from becoming too short. The state of affairs. Therefore, an increase in the reflectance of light in a portion away from the optical axis of the spherical lens can be suppressed. As a result, an optical member having a desired high light transmittance can be obtained.
再者,「球狀透鏡」係指光入出面之至少一方為球面狀的透鏡,除此以外之部分的形狀並無特別限定為球面狀。「球狀透鏡」亦包含例如設有光入出面之球面狀的透鏡本體、及設置在透鏡本體以外之部分的凸緣部或凹部者。In addition, the "spherical lens" refers to a lens in which at least one of the light entrance and exit surfaces is spherical, and the shape of the other portions is not particularly limited to a spherical shape. The "spherical lens" also includes, for example, a spherical lens body having a light entrance and exit surface, and a flange portion or a concave portion provided in a portion other than the lens body.
在本發明中,第1中心軸與第2中心軸所成之角度θ0 較佳為比0°大,且為形成有光學性功能膜之區域的中心角θ1 之1/2以下。當角度θ0 比中心角θ1 之1/2更大時,即會有光學性功能膜之位於光軸上的部分之膜厚變得過薄,反而無法獲得所希望之光學特性之情形。In the present invention, the angle θ 0 formed by the first central axis and the second central axis is preferably larger than 0° and equal to or less than 1/2 of the central angle θ 1 of the region in which the optical functional film is formed. When the angle θ 0 is larger than 1/2 of the central angle θ 1 , the film thickness of the portion of the optical functional film on the optical axis becomes too thin, and the desired optical characteristics are not obtained.
再者,在本發明中,氣相成長法之種類並無特別限定。例如,可藉由化學氣相成長法(CVD:Chemical vapor deposition)或物理氣相成長法(PVD:Physical vapor deposition)形成光學性功能膜。特別是,物理氣相成長法係比化學氣相成長法更容易地在球狀透鏡之表面上形成二維之光學性功能膜,因此較為理想。此外,物理氣相成長法亦有被稱為濺鍍法或真空蒸鍍法之情形。Further, in the present invention, the type of the vapor phase growth method is not particularly limited. For example, an optical functional film can be formed by chemical vapor deposition (CVD) or physical vapor deposition (PVD). In particular, the physical vapor phase growth method is more preferable because it forms a two-dimensional optical functional film on the surface of the spherical lens more easily than the chemical vapor growth method. In addition, the physical vapor phase growth method is also referred to as a sputtering method or a vacuum evaporation method.
本發明之光學構件可藉由上述之本發明之光學構件的製造方法適當地製造。本發明之光學構件係具備球狀透鏡、及光學性功能膜。光學性功能膜係形成在前述球狀透鏡之表面上。在本發明之光學構件中,從球狀透鏡之光軸的延伸方向觀看時之前述光學性功能膜之中央部的膜厚係隨著遠離前述球狀透鏡之光軸而變厚。因此,在本發明之光學構件中,在光學性功能膜之中央部中,與光學性功能膜之膜厚均勻之情形相比較,光學特性之變異會減少。結果,本發明之光學構件係可實現更高之光學特性。例如,光學性功能膜為抑制預定之截止(cut-off)波長以下的波長域之光之反射的反射抑制膜時,與光學性功能膜之膜厚均勻之情形相比較,遠離球狀透鏡之光軸的部分中之截止波長較長。因此,可抑制光學構件中遠離球狀透鏡之光軸的部分中之光之反射率的增大。因此,可獲得高的光穿透率。The optical member of the present invention can be suitably produced by the above-described method for producing an optical member of the present invention. The optical member of the present invention includes a spherical lens and an optical functional film. An optical functional film is formed on the surface of the aforementioned spherical lens. In the optical member of the present invention, the film thickness at the central portion of the optical functional film when viewed from the extending direction of the optical axis of the spherical lens becomes thicker as it goes away from the optical axis of the spherical lens. Therefore, in the optical member of the present invention, in the central portion of the optical functional film, the variation in optical characteristics is reduced as compared with the case where the film thickness of the optical functional film is uniform. As a result, the optical member of the present invention can achieve higher optical characteristics. For example, when the optical functional film is a reflection suppressing film that suppresses reflection of light in a wavelength range below a predetermined cut-off wavelength, it is farther away from the spherical lens than when the film thickness of the optical functional film is uniform. The cutoff wavelength in the portion of the optical axis is longer. Therefore, an increase in the reflectance of light in a portion of the optical member away from the optical axis of the spherical lens can be suppressed. Therefore, a high light transmittance can be obtained.
此外,從前述球狀透鏡之光軸的延伸方向觀看時之光學性功能膜之位於中央部外側之外周部的膜厚不需要隨著遠離前述球狀透鏡之光軸而變厚。亦即,在光學性功能膜之整體中,膜厚並不必然要隨著遠離球狀透鏡之光軸而變厚。外周部之膜厚亦可隨著遠離球狀透鏡之光軸而變薄。Further, the film thickness of the outer peripheral portion of the optical functional film located outside the center portion when viewed from the extending direction of the optical axis of the spherical lens does not need to be thicker away from the optical axis of the spherical lens. That is, in the entirety of the optical functional film, the film thickness does not necessarily have to become thicker away from the optical axis of the spherical lens. The film thickness of the outer peripheral portion may also become thinner away from the optical axis of the spherical lens.
在本發明中,光學性功能膜之中央部的任何部分較佳為皆位於比包含球狀透鏡之光軸與光學性功能膜之交點且垂直於光軸垂直之平面更靠近球狀透鏡的中心側處。這是由於若有位於比包含球狀透鏡之光軸與光學性功能膜之交點且垂直於光軸之平面更靠近球狀透鏡的中心之相反側處的部分存在於光學性功能膜之中央部時,會有光學特性反而降低之情形之故。In the present invention, any portion of the central portion of the optical functional film is preferably located closer to the center of the spherical lens than the plane including the intersection of the optical axis of the spherical lens and the optical functional film and perpendicular to the optical axis. Side. This is because if there is a portion located on the opposite side of the center of the spherical lens from the intersection of the optical axis containing the spherical lens and the optical functional film and perpendicular to the optical axis, it exists in the central portion of the optical functional film. At the time, there is a case where the optical characteristics are lowered.
在本發明中,球狀透鏡之材質並無特別限定。球狀透鏡可為例如玻璃製,亦可為樹脂製。In the present invention, the material of the spherical lens is not particularly limited. The spherical lens may be made of, for example, glass or a resin.
光學性功能膜係只要為具有光學性功能之膜,則無特別限定。光學性功能膜可為例如抑制預定波長域之光之反射的反射抑制膜、具有波長選擇功能之過濾膜、主要藉由吸收使光衰減之衰減膜、及反射預定波長域之光的反射膜等。The optical functional film system is not particularly limited as long as it is a film having an optical function. The optical functional film may be, for example, a reflection suppressing film that suppresses reflection of light in a predetermined wavelength range, a filter film having a wavelength selective function, an attenuating film that mainly attenuates light by absorption, and a reflective film that reflects light in a predetermined wavelength range. .
光學性功能膜係可由交互地積層有例如折射率相對較低之低折射率層、及折射率相對較高之高折射率層的積層膜所構成。低折射率層係可藉由例如氧化矽、氧化鋁、氟化鈣等氟化鹼土類金屬等所形成。另一方面,高折射率層係可由氧化鈦、氧化鈮、氧化鑭、氧化鉭、氧化鎢等所形成。The optical functional film may be composed of a laminated film in which a low refractive index layer having a relatively low refractive index and a high refractive index layer having a relatively high refractive index are alternately laminated. The low refractive index layer can be formed by, for example, a fluorinated alkaline earth metal such as cerium oxide, aluminum oxide or calcium fluoride. On the other hand, the high refractive index layer may be formed of titanium oxide, cerium oxide, cerium oxide, cerium oxide, tungsten oxide or the like.
以下,說明本發明之較佳實施形態之一例。Hereinafter, an example of a preferred embodiment of the present invention will be described.
第1圖係本實施形態之光學構件的製造裝置之示意圖。第1圖所示之製造裝置1係用以製造第4圖所示之本實施形態之光學構件的裝置。具體而言,製造裝置1係進行電子束蒸鍍之成膜裝置。Fig. 1 is a schematic view showing a manufacturing apparatus of an optical member of the present embodiment. The manufacturing apparatus 1 shown in Fig. 1 is an apparatus for manufacturing the optical member of the embodiment shown in Fig. 4. Specifically, the manufacturing apparatus 1 is a film forming apparatus that performs electron beam evaporation.
如第1圖所示,製造裝置1係具備區隔形成成膜室10a之裝置本體10。在成膜室10a連接有減壓泵等減壓機構14。成膜室10a係可藉由該減壓機構14而減壓。As shown in Fig. 1, the manufacturing apparatus 1 is provided with a device body 10 that partitions the film forming chamber 10a. A pressure reducing mechanism 14 such as a pressure reducing pump is connected to the film forming chamber 10a. The film forming chamber 10a can be depressurized by the pressure reducing mechanism 14.
在成膜室10a設置有作為供給源之靶材13、電子槍12、及支持機構20。支持機構20係具備支持盤21。支持盤21係以第1中心軸C1為中心可迴旋地設置在成膜室10a。支持盤21之下表面21a係形成為圓頂狀。A target 13 as a supply source, an electron gun 12, and a support mechanism 20 are provided in the film forming chamber 10a. The support mechanism 20 is provided with a support tray 21. The support tray 21 is rotatably provided in the film forming chamber 10a around the first central axis C1. The lower surface 21a of the support tray 21 is formed in a dome shape.
如第1圖及第2圖所示,在支持盤21之下表面21a安裝有複數個平板狀的支持板22。各支持板22係設置在支持盤21之與第1中心軸C1不同之位置。各支持板22係能以第2中心軸C2為中心迴旋。第2中心軸C2係相對於第1中心軸C1傾斜。在本實施形態中,第1中心軸C1與第2中心軸C2所成之角度θ0 係為第4圖所示之形成有光學性功能膜33之區域的中心角θ1 之1/2以下。As shown in Figs. 1 and 2, a plurality of flat support plates 22 are attached to the lower surface 21a of the support tray 21. Each of the support plates 22 is provided at a position different from the first central axis C1 of the support disk 21. Each of the support plates 22 can be rotated around the second central axis C2. The second central axis C2 is inclined with respect to the first central axis C1. In the present embodiment, the angle θ 0 between the first central axis C1 and the second central axis C2 is 1/2 or less of the central angle θ 1 of the region in which the optical functional film 33 is formed as shown in Fig. 4 . .
支持盤21與支持板22係連接在驅動機構11。驅動機構11係使支持盤21繞著第1中心軸C1迴旋,並且使複數個支持板22之各者相對於支持盤21繞著第2中心軸C2相對地迴旋。因此,各支持板22係藉由驅動機構11繞著第1中心軸C1旋轉,且繞著相對於第1中心軸C1傾斜之第2中心軸C2迴旋。The support tray 21 and the support plate 22 are connected to the drive mechanism 11. The drive mechanism 11 rotates the support disk 21 about the first central axis C1, and relatively rotates each of the plurality of support plates 22 with respect to the support disk 21 about the second central axis C2. Therefore, each of the support plates 22 is rotated about the first central axis C1 by the drive mechanism 11, and is rotated around the second central axis C2 that is inclined with respect to the first central axis C1.
如第2圖及第3圖所示,在支持板22,以第2中心軸C2為中心將複數個光學構件本體30安裝成矩陣狀。然而,在支持板22之第2中心軸C2上並未安裝有光學構件本體30。As shown in FIGS. 2 and 3, in the support plate 22, a plurality of optical member bodies 30 are mounted in a matrix shape around the second central axis C2. However, the optical member body 30 is not attached to the second central axis C2 of the support plate 22.
如第3圖所示,光學構件本體30係具備保持具31、及球狀透鏡32。保持具31只要是可保持球狀透鏡32者,則無特別限定。保持具31可由例如金屬製或樹脂製之筒狀構件所構成。As shown in FIG. 3, the optical member main body 30 is provided with the holder 31 and the spherical lens 32. The holder 31 is not particularly limited as long as it can hold the spherical lens 32. The holder 31 may be composed of, for example, a tubular member made of metal or resin.
球狀透鏡32係由例如玻璃或樹脂等所構成之球狀的透鏡。球狀透鏡32係固定在保持具31。球狀透鏡32對於保持具31之固定方法並無特別限定。例如,可藉由玻璃料(glass frit)將球狀透鏡32固定在保持具31。The spherical lens 32 is a spherical lens made of, for example, glass or resin. The spherical lens 32 is fixed to the holder 31. The method of fixing the spherical lens 32 to the holder 31 is not particularly limited. For example, the spherical lens 32 can be fixed to the holder 31 by a glass frit.
接著,說明利用上述製造裝置1之光學構件34(參照第4圖)的製造方法。Next, a manufacturing method using the optical member 34 (see FIG. 4) of the above-described manufacturing apparatus 1 will be described.
首先,將複數個光學構件本體30安裝在支持板22。接著,如第2圖所示,將支持板22安裝在支持盤21。然後,藉由減壓機構14將成膜室10a(參照第1圖)設為減壓環境,並且依需要從未圖示之氣體供給機構將成膜所需之氣體供給至成膜室10a。First, a plurality of optical member bodies 30 are mounted on the support plate 22. Next, as shown in FIG. 2, the support plate 22 is attached to the support tray 21. Then, the film forming chamber 10a (see FIG. 1) is set as a pressure reducing environment by the pressure reducing mechanism 14, and a gas required for film formation is supplied to the film forming chamber 10a as needed from a gas supply mechanism (not shown).
接著,一面藉由驅動機構11驅動支持盤21及支持板22,一面驅動電子槍12,而使粒子從靶材13飛散,藉此在球狀透鏡32之表面上進行成膜。因此,對於球狀透鏡32之表面上的成膜,係一面使球狀透鏡32繞著第2中心軸C2旋轉,一面藉由物理氣相成長法等氣相成長法進行,而該第2中心軸C2係繞著第1中心軸C1旋轉之中心軸,且相對於第1中心軸C1傾斜。Next, while the support disk 21 and the support plate 22 are driven by the drive mechanism 11, the electron gun 12 is driven to scatter particles from the target 13, whereby film formation is performed on the surface of the spherical lens 32. Therefore, the film formation on the surface of the spherical lens 32 is performed by a vapor phase growth method such as a physical vapor phase growth method while rotating the spherical lens 32 around the second central axis C2, and the second center is formed. The shaft C2 is rotated about the central axis of the first central axis C1 and is inclined with respect to the first central axis C1.
因此,如第4圖所示,如以上方式形成之光學性功能膜33之外周部33b的膜厚係隨著遠離球狀透鏡32之光軸A而變薄,中央部33a的膜厚係隨著遠離球狀透鏡32之光軸A而變厚。因此,如上所述,在光學性功能膜33之中央部33a中,與光學性功能膜之膜厚均勻之情形相比較,可使光學特性之變異減少。結果,可獲得具有所希望之光學特性的光學構件34。Therefore, as shown in Fig. 4, the film thickness of the outer peripheral portion 33b of the optical functional film 33 formed as described above is thinned away from the optical axis A of the spherical lens 32, and the film thickness of the central portion 33a is It becomes thicker away from the optical axis A of the spherical lens 32. Therefore, as described above, in the central portion 33a of the optical functional film 33, the variation in optical characteristics can be reduced as compared with the case where the film thickness of the optical functional film is uniform. As a result, an optical member 34 having desired optical characteristics can be obtained.
此外,光學性功能膜33之中央部33a的任一部分較佳為皆位於比平面P更靠近球狀透鏡32的中心側處,其中,該平面P包含球狀透鏡32之光軸A與光學性功能膜33之交點且垂直於球狀透鏡32之光軸。這是由於若有位於比平面P更靠近球狀透鏡32的中心之相反側處的部分存在於光學性功能膜33之中央部33a時,會有光學特性反而降低之情形之故。Further, any portion of the central portion 33a of the optical functional film 33 is preferably located closer to the center side of the spherical lens 32 than the plane P, wherein the plane P includes the optical axis A of the spherical lens 32 and optical properties. The intersection of the functional film 33 is perpendicular to the optical axis of the spherical lens 32. This is because if a portion located on the opposite side of the center of the spherical lens 32 from the plane P exists in the central portion 33a of the optical functional film 33, the optical characteristics may be lowered.
此外,支持盤21之旋轉角速度、與支持板22之繞著第2中心軸C2之旋轉角速度較佳為彼此不同。Further, it is preferable that the rotational angular velocity of the support disk 21 and the rotational angular velocity of the support plate 22 around the second central axis C2 are different from each other.
藉由上述製造方法,以下述之設計參數製作第4圖所示之光學構件。並且,以穿透型掃描顯微鏡來測量光學構件之光學性功能膜的膜厚。將其結果顯示在第5圖。此外,在第5圖所示之曲線圖中,橫軸係顯示光對於光學性功能膜之入射角度。縱軸係顯示光學性功能膜之膜厚。光出射口係使用一般之單模式光纖(SMF),且使用折射率Nd 1.8、球徑Φ 2.0mm之玻璃材質的球狀透鏡。According to the above manufacturing method, the optical member shown in Fig. 4 was produced with the following design parameters. Further, the film thickness of the optical functional film of the optical member was measured by a transmission type scanning microscope. The result is shown in Fig. 5. Further, in the graph shown in Fig. 5, the horizontal axis shows the incident angle of light to the optical functional film. The vertical axis shows the film thickness of the optical functional film. The light exit port of the system using a general single-mode fiber (SMF), and a refractive index Nd 1.8, the ball diameter of Φ 2.0mm spherical lens made of glass.
再者,使光線入射至光學性功能膜之中央部,並使用可調頻雷射(tunable laser)及功率計(power meter)來測量光學構件之光穿透率。同樣地,對於形成光學性功能膜之前的光學構件本體亦測量光穿透率。由該等之結果,可獲得光學性功能膜之中央部的光穿透率。其結果顯示於第7圖。Further, light is incident on the central portion of the optical functional film, and a tunable laser and a power meter are used to measure the light transmittance of the optical member. Similarly, the optical transmittance was also measured for the optical member body before the formation of the optical functional film. From these results, the light transmittance of the central portion of the optical functional film can be obtained. The results are shown in Figure 7.
光學性功能膜之膜構成:下述表1所示之膜構成Membrane structure of optical functional film: film composition shown in Table 1 below
在成膜之際,除了不使支持板22繞著第2中心軸C2旋轉而僅使支持盤21繞著第1中心軸C1旋轉以外,與上述實施例同樣地製作光學構件,並測量光學性功能膜之膜厚及光穿透率。將其結果顯示在第6圖及第7圖。此外,在第6圖所示之曲線圖中,橫軸係顯示光對於光學性功能膜之入射角度。縱軸係顯示光學性功能膜之膜厚。光出射口係使用一般之單模式光纖(SMF),且使用折射率Nd 1.8、球徑Φ 2.0mm之玻璃材質的球狀透鏡。In the film formation, the optical member was produced and optically measured in the same manner as in the above-described example except that the support plate 22 was rotated around the second central axis C2 and the support disk 21 was rotated around the first central axis C1. Film thickness and light transmittance of the functional film. The results are shown in Figures 6 and 7. Further, in the graph shown in Fig. 6, the horizontal axis shows the incident angle of light to the optical functional film. The vertical axis shows the film thickness of the optical functional film. The light exit port of the system using a general single-mode fiber (SMF), and a refractive index Nd 1.8, the ball diameter of Φ 2.0mm spherical lens made of glass.
由第5圖及第7圖之結果得知,依據本發明,一面使球狀透鏡繞著第2中心軸C2旋轉,一面進行光學性功能膜之成膜,藉此可形成中央部之膜厚隨著遠離球狀透鏡之光軸A而變厚的光學性功能膜,其中該第2中心軸C2係繞著第1中心軸C1旋轉之中心軸,且相對於第1中心軸C1傾斜。As is apparent from the results of FIGS. 5 and 7, according to the present invention, the film thickness of the central portion can be formed by performing the film formation of the optical functional film while rotating the spherical lens around the second central axis C2. The optical functional film that becomes thicker away from the optical axis A of the spherical lens, wherein the second central axis C2 is rotated about the central axis of the first central axis C1 and is inclined with respect to the first central axis C1.
再者,藉由使光學性功能膜之中央部之膜厚隨著遠離球狀透鏡之光軸A而變厚,而可獲得高的光學特性。亦即,從光纖射出之擴散光中之朝膜面傾斜地入射之光的光學特性係朝短波長位移,但藉由使膜厚變厚,即可補正短波長位移份,且可獲得與光軸上相同之光學特性。Further, by making the film thickness of the central portion of the optical functional film thicker away from the optical axis A of the spherical lens, high optical characteristics can be obtained. In other words, the optical characteristics of the light incident on the film surface obliquely from the diffused light emitted from the optical fiber are shifted toward a short wavelength, but by making the film thickness thicker, the short wavelength shift portion can be corrected, and the optical axis can be obtained. The same optical properties.
1...製造裝置1. . . Manufacturing device
10...裝置本體10. . . Device body
10a...成膜室10a. . . Film forming chamber
11...驅動機構11. . . Drive mechanism
12...電子槍12. . . Electron gun
13...靶材13. . . Target
14...減壓機構14. . . Pressure reducing mechanism
15...第2導引部15. . . Second guiding portion
15A...貫通孔15A. . . Through hole
20...支持機構20. . . Support organization
21...支持盤twenty one. . . Support disk
21a...支持盤之下表面21a. . . Support surface under the disc
22...支持板twenty two. . . Support board
30...光學構件本體30. . . Optical component body
31...保持具31. . . Holder
32...球狀透鏡32. . . Spherical lens
33...光學性功能膜33. . . Optical functional film
33a...光學性功能膜之中央部33a. . . Central part of optical functional film
33b...光學性功能膜之外周部33b. . . Optical functional film outer periphery
34...光學構件34. . . Optical member
A...光軸A. . . Optical axis
C1...第1中心軸C1. . . 1st central axis
C2...第2中心軸C2. . . 2nd central axis
P...平面P. . . flat
第1圖係本發明之第1實施形態之光學構件的製造裝置之示意圖。Fig. 1 is a schematic view showing an apparatus for manufacturing an optical member according to a first embodiment of the present invention.
第2圖係支持構件之示意平面圖。Figure 2 is a schematic plan view of the support member.
第3圖係將支持板之一部分予以放大之光學構件的示意剖面圖。Figure 3 is a schematic cross-sectional view of an optical member that amplifies a portion of the support plate.
第4圖係在本發明之一實施形態中製造之光學構件之示意剖面圖。Fig. 4 is a schematic cross-sectional view showing an optical member manufactured in an embodiment of the present invention.
第5圖係顯示本發明之實施例之光學性功能膜(1310nm與1490 nm之波長選擇過濾膜、48層膜)之膜厚的曲線圖。在第5圖所示之曲線圖中,橫軸係表示光對於光學性功能膜之入射角度。縱軸係表示光學性功能膜之膜厚。Fig. 5 is a graph showing the film thickness of an optical functional film (a wavelength selective filter film of 1310 nm and 1490 nm, and a 48-layer film) of an example of the present invention. In the graph shown in Fig. 5, the horizontal axis indicates the incident angle of light to the optical functional film. The vertical axis indicates the film thickness of the optical functional film.
第6圖係顯示本發明之實施例之光學性功能膜(1310nm與1490 nm之波長選擇過濾膜、48層膜)之膜厚的曲線圖。在第6圖所示之曲線圖中,橫軸係表示光對於光學性功能膜之入射角度。縱軸係表示光學性功能膜之膜厚。Fig. 6 is a graph showing the film thickness of an optical functional film (a wavelength selective filter film of 1310 nm and 1490 nm, and a 48-layer film) of an example of the present invention. In the graph shown in Fig. 6, the horizontal axis indicates the incident angle of light to the optical functional film. The vertical axis indicates the film thickness of the optical functional film.
第7圖係顯示本發明之實施例之光學性功能膜之中央部的光穿透率、及本發明之比較例之光學性功能膜之對應部分的光穿透率之曲線圖。Fig. 7 is a graph showing the light transmittance of the central portion of the optical functional film of the embodiment of the present invention and the light transmittance of the corresponding portion of the optical functional film of the comparative example of the present invention.
1...製造裝置1. . . Manufacturing device
10...裝置本體10. . . Device body
10a...成膜室10a. . . Film forming chamber
11...驅動機構11. . . Drive mechanism
12...電子槍12. . . Electron gun
13...靶材13. . . Target
14...減壓機構14. . . Pressure reducing mechanism
20...支持機構20. . . Support organization
21...支持盤twenty one. . . Support disk
21a...支持盤之下表面21a. . . Support surface under the disc
22...支持板twenty two. . . Support board
C1...第1中心軸C1. . . 1st central axis
C2...第2中心軸C2. . . 2nd central axis
Claims (5)
Applications Claiming Priority (1)
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JP2009289264A JP5493824B2 (en) | 2009-12-21 | 2009-12-21 | Optical component manufacturing method and optical component |
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TW201142340A TW201142340A (en) | 2011-12-01 |
TWI486620B true TWI486620B (en) | 2015-06-01 |
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TW099141386A TWI486620B (en) | 2009-12-21 | 2010-11-30 | Method for manufacturing optical member and optical member |
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JP (1) | JP5493824B2 (en) |
CN (1) | CN102575340B (en) |
TW (1) | TWI486620B (en) |
WO (1) | WO2011077892A1 (en) |
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JP5749223B2 (en) * | 2012-07-13 | 2015-07-15 | 株式会社メイハン | Method for forming spherical film |
CN104583820B (en) | 2012-08-29 | 2017-07-11 | 旭硝子株式会社 | Near infrared ray cut-off filter |
CN106707725B (en) * | 2017-01-20 | 2022-07-22 | 中国电子科技集团公司第十二研究所 | Optical transmission window for atomic clock |
CN112916341B (en) * | 2021-01-25 | 2022-10-18 | 上海应用技术大学 | Rotatable flexible clamp for coating bearing rolling body |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0428859A (en) * | 1990-05-23 | 1992-01-31 | Matsushita Electric Ind Co Ltd | Vacuum deposition device |
JP2004271658A (en) * | 2003-03-06 | 2004-09-30 | Pentax Corp | Objective lens for optical pickup device and optical pickup device |
JP2006091600A (en) * | 2004-09-27 | 2006-04-06 | Konica Minolta Opto Inc | Method and apparatus for forming film on lens |
JP2007108425A (en) * | 2005-10-13 | 2007-04-26 | Nippon Electric Glass Co Ltd | Method and device of manufacturing optical component, and the optical component |
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CH650028A5 (en) * | 1980-09-26 | 1985-06-28 | Balzers Hochvakuum | ARRANGEMENT FOR COATING GLEICHFOERMIGEN surface of revolution BY high vacuum metallization. |
JP3412849B2 (en) * | 1992-12-25 | 2003-06-03 | キヤノン株式会社 | Thin film deposition equipment |
JP2002217132A (en) * | 2001-01-23 | 2002-08-02 | Sony Corp | Vacuum deposition apparatus |
-
2009
- 2009-12-21 JP JP2009289264A patent/JP5493824B2/en not_active Expired - Fee Related
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2010
- 2010-11-25 WO PCT/JP2010/070981 patent/WO2011077892A1/en active Application Filing
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- 2010-11-30 TW TW099141386A patent/TWI486620B/en not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0428859A (en) * | 1990-05-23 | 1992-01-31 | Matsushita Electric Ind Co Ltd | Vacuum deposition device |
JP2004271658A (en) * | 2003-03-06 | 2004-09-30 | Pentax Corp | Objective lens for optical pickup device and optical pickup device |
JP2006091600A (en) * | 2004-09-27 | 2006-04-06 | Konica Minolta Opto Inc | Method and apparatus for forming film on lens |
JP2007108425A (en) * | 2005-10-13 | 2007-04-26 | Nippon Electric Glass Co Ltd | Method and device of manufacturing optical component, and the optical component |
Also Published As
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CN102575340A (en) | 2012-07-11 |
CN102575340B (en) | 2014-04-02 |
JP5493824B2 (en) | 2014-05-14 |
WO2011077892A1 (en) | 2011-06-30 |
JP2011127213A (en) | 2011-06-30 |
TW201142340A (en) | 2011-12-01 |
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