TWI479696B - Led device - Google Patents

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TWI479696B
TWI479696B TW100140858A TW100140858A TWI479696B TW I479696 B TWI479696 B TW I479696B TW 100140858 A TW100140858 A TW 100140858A TW 100140858 A TW100140858 A TW 100140858A TW I479696 B TWI479696 B TW I479696B
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light
diode device
reflective
substrate
intermediate portion
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TW100140858A
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Chinese (zh)
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TW201320403A (en
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Li Chun Ko
Kuo Chen Wu
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Huga Optotech Inc
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Priority to TW100140858A priority Critical patent/TWI479696B/en
Priority to CN201110399454.7A priority patent/CN103107270B/en
Publication of TW201320403A publication Critical patent/TW201320403A/en
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Publication of TWI479696B publication Critical patent/TWI479696B/en

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Description

發光二極體裝置Light-emitting diode device

本發明係有關一種發光二極體裝置,尤其是關於一種晶粒之疊層結構具有雙面反射層的發光二極體裝置。The present invention relates to a light-emitting diode device, and more particularly to a light-emitting diode device having a double-sided reflective layer in a laminated structure of crystal grains.

對於發光二極體裝置而言,如何提升發光效率一直是很重要的課題。在習知之技術中,已有許多不同的解決方法被提出,其中一種乃是將發光二極體晶粒之基底的表面形成一具有凹凸結構的反射表面,以便使發光二極體晶粒內部的光得以反射至外部。For the light-emitting diode device, how to improve the luminous efficiency has been an important issue. In the prior art, many different solutions have been proposed, one of which is to form the surface of the base of the light-emitting diode die into a reflective surface having a concave-convex structure so as to make the inside of the light-emitting diode die Light is reflected to the outside.

圖1A係繪示一種習知之發光二極體裝置封裝前的示意圖;圖1B係繪示圖1A之發光二極體裝置封裝後的示意圖。請一併參考圖1A、1B,發光二極體裝置110包含發光二極體晶粒112以及封裝體124,其中,封裝體124承載並封裝該晶粒112,且內側面126為一反射面。發光二極體晶粒112則包含藍寶石(sapphire)基板114、以及疊層結構116,其中,疊層結構116位於藍寶石基板114上且包含緩衝層150、氮化鎵構成之n型接觸層152、n型電極154、發光層156、氮化鎵構成之p型接觸層158、氮化鎵摻雜鎂層160、銦錫氧化物層162、p型電極164。發光二極體晶粒112各層、封裝體124的材料以及形成方法皆為習知技術,可參考中華民國專利公告號575970、567618、523939、522579所記載之內容,在此不再贅述。請再次參考圖1B,藍寶石基板114的表面具有一凹凸反射結構114a,可將來自發光層156的光線RL反射至封裝體124,並藉由內側面126而反射至發光二極體裝置110外部。FIG. 1A is a schematic view showing a conventional LED device before being packaged; FIG. 1B is a schematic view showing the LED device of FIG. 1A after being packaged. Referring to FIGS. 1A and 1B , the LED device 110 includes a light emitting diode die 112 and a package body 124 . The package body 124 carries and encapsulates the die 112 , and the inner side surface 126 is a reflective surface. The LED die 112 includes a sapphire substrate 114 and a stacked structure 116. The stacked structure 116 is disposed on the sapphire substrate 114 and includes a buffer layer 150, an n-type contact layer 152 formed of gallium nitride, The n-type electrode 154, the light-emitting layer 156, the p-type contact layer 158 composed of gallium nitride, the gallium nitride-doped magnesium layer 160, the indium tin oxide layer 162, and the p-type electrode 164. The layers of the light-emitting diode die 112, the material of the package body 124, and the method for forming the package are all known in the art. For details, refer to the contents of the Chinese Patent Publication Nos. 575970, 567618, 523939, and 522579, and no further details are provided herein. Referring again to FIG. 1B, the surface of the sapphire substrate 114 has a concave-convex reflective structure 114a that reflects the light RL from the light-emitting layer 156 to the package 124 and is reflected by the inner side surface 126 to the outside of the light-emitting diode device 110.

然而,具有上述結構之發光二極體裝置的發光效率仍有待提升。However, the luminous efficiency of the light-emitting diode device having the above structure still needs to be improved.

有鑒於上述問題,本案乃提供一種晶粒之疊層結構,其具有雙面反射層的發光二極體裝置。In view of the above problems, the present invention provides a laminated structure of crystal grains having a light-emitting diode device having a double-sided reflective layer.

在一實施例中,發光二極體裝置包括一晶粒。該晶粒包括一基底以及一疊層結構。該疊層結構位於該基底上且包括彼此獨立的一中間部份以及一周圍部分。該周圍部分係位於該中間部份之周圍且具有一面對該中間部分之內側面。該內側面具有一反射層,而該反射層具有一第一反射面以及一第二反射面。該第一反射面係面對該中間部份,且該第二反射面係與該周圍部分的內側面接觸。In an embodiment, the light emitting diode device includes a die. The die includes a substrate and a laminate structure. The laminate structure is located on the substrate and includes an intermediate portion and a peripheral portion that are independent of each other. The peripheral portion is located around the intermediate portion and has an inner side facing the intermediate portion. The inner side has a reflective layer, and the reflective layer has a first reflective surface and a second reflective surface. The first reflecting surface faces the intermediate portion, and the second reflecting surface is in contact with the inner side surface of the surrounding portion.

在另一個實施例中,發光二極體裝置包括:一晶粒,該晶粒包括一基底以及一疊層結構,該疊層結構位於該基底上且包括彼此獨立的一中間部份以及一周圍部分,該周圍部分係位於該中間部份之周圍且具有一內側面,該內側面具有一反射層,而該反射層具有一第一反射面以及一第二反射面,該第一反射面係面對該中間部份,且該第二反射面係與該周圍部分的內側面接觸;以及一封裝體,承載並環繞該晶粒,該封裝體的一內側面與一內部底面係分別為一第三反射面與一第四反射面,其中該第三反射面面對且實質上平行該第二反射面;其中,該基底係由透光材料構成,而該基底與該中間部份接觸區域之表面可透光,且該基底的厚度足以讓該中間部份之一發光層的部分光線通過該接觸區域之表面後在該第四反射面反射並到達該第三反射面。In another embodiment, a light emitting diode device includes: a die including a substrate and a laminate structure on the substrate and including an intermediate portion and a periphery independent of each other a portion, the peripheral portion is located around the intermediate portion and has an inner side surface having a reflective layer, and the reflective layer has a first reflective surface and a second reflective surface, the first reflective surface Facing the intermediate portion, and the second reflective surface is in contact with the inner side surface of the surrounding portion; and a package carrying and surrounding the die, the inner side surface and the inner bottom surface of the package body are respectively a third reflective surface and a fourth reflective surface, wherein the third reflective surface faces and is substantially parallel to the second reflective surface; wherein the substrate is made of a light transmissive material, and the substrate and the intermediate portion contact region The surface is permeable to light, and the substrate has a thickness sufficient for a portion of the light of the light-emitting layer of the intermediate portion to pass through the surface of the contact region and then reflect at the fourth reflective surface and reach the third reflective surface.

以下將參照附圖說明本案之較佳實施形態。Preferred embodiments of the present invention will be described below with reference to the accompanying drawings.

圖2A~2D係繪示本發明一實施例之發光二極體裝置製程的示意圖。2A-2D are schematic views showing the process of a light-emitting diode device according to an embodiment of the present invention.

請特別注意,在圖2A~2D之實施例中,晶粒212本身具有一雙面皆有反射功能的反射層222,而此反射層222乃位於晶粒212本身結構的周圍部份(即形成所謂的“反射罩”),使得晶粒212之發光層232所發出的光(尤其是晶粒212之側光)可以藉由這樣的反射層222而有效地反射至發光二極體裝置210外部,提高晶粒212側光的利用效率,進一步提升發光二極體裝置210整體的發光效率。另一方面,這樣的反射層222亦可避免晶粒212之發光層232所發出的光再次進入晶粒212本身的半導體結構內產生熱能,有助於提升發光二極體裝置210的光電效率。其中,上述“側光”一詞泛指自晶粒212側邊射出之光線,藉由反射層222重新導向而成為所謂的“正向光”到達發光二極體裝置210外部。在此,“正向光”一詞泛指由發光二極體裝置210射出的光線。In particular, in the embodiment of FIGS. 2A to 2D, the die 212 itself has a reflective layer 222 having a reflective function on both sides, and the reflective layer 222 is located around the structure of the die 212 itself (ie, is formed). The so-called "reflector" causes the light emitted by the light-emitting layer 232 of the die 212 (especially the side light of the die 212) to be effectively reflected to the outside of the light-emitting diode device 210 by such a reflective layer 222. The utilization efficiency of the light on the side of the crystal chip 212 is improved, and the luminous efficiency of the entire light-emitting diode device 210 is further improved. On the other hand, such a reflective layer 222 can also prevent the light emitted by the light-emitting layer 232 of the die 212 from entering the semiconductor structure of the die 212 itself to generate thermal energy, which helps to improve the photoelectric efficiency of the LED device 210. The term "sidelight" refers to the light emitted from the side of the die 212, and is redirected by the reflective layer 222 to become so-called "forward light" to the outside of the LED device 210. Here, the term "forward light" generally refers to the light emitted by the light-emitting diode device 210.

圖2A係繪示發光二極體裝置尚未封裝之晶粒212半成品。晶粒212半成品包括一基底214以及一疊層結構216,疊層結構216位於基底214上且包括彼此獨立的一中間部份218以及一周圍部分220,周圍部分220係位於中間部分218之周圍且具有一內側面220a。在此最佳實施例中,周圍部分220係環繞中間部份218。疊層結構216包含緩衝層250、氮化鎵構成之n型接觸層252、n型電極254、發光層232、氮化鎵構成之p型接觸層258、氮化鎵摻雜鎂層260、銦錫氧化物層262、p型電極264。其中,基底214可由導電或不導電材料構成;疊層結構216乃是藉由在基底214上依序全面地形成緩衝層250、氮化鎵構成之n型接觸層252、發光層232、氮化鎵構成之p型接觸層258、氮化鎵摻雜鎂層260、銦錫氧化物層262,而上述各層的材料以及形成方法皆可參考先前技術中所載之專利文獻,在此不再贅述。本實施例主要在氮化鎵摻雜鎂層260形成之後,藉由感應耦合電漿(inductively coupled plasma)在上述各層構成的疊層外圍區域定義出介於中間部份218與周圍部分220之間的開口(如圖2A所示),該開口可視設計與需要而進行各種尺寸、形狀的調整。接著,再繼續習知的電極製程而分別於n型接觸層252、p型接觸層258上形成n型電極254、p型電極264。至此,可得到圖2A所示之晶粒212半成品。FIG. 2A illustrates a die 212 semi-finished product that has not been packaged by the light emitting diode device. The die 212 semi-finished product includes a substrate 214 and a laminate structure 216. The laminate structure 216 is disposed on the substrate 214 and includes an intermediate portion 218 and a peripheral portion 220 that are independent of each other. The peripheral portion 220 is located around the intermediate portion 218 and There is an inner side 220a. In the preferred embodiment, the peripheral portion 220 surrounds the intermediate portion 218. The laminated structure 216 includes a buffer layer 250, an n-type contact layer 252 composed of gallium nitride, an n-type electrode 254, a light-emitting layer 232, a p-type contact layer 258 composed of gallium nitride, a gallium nitride-doped magnesium layer 260, and an indium. Tin oxide layer 262, p-type electrode 264. The substrate 214 may be made of a conductive or non-conductive material; the laminated structure 216 is formed by sequentially forming a buffer layer 250 on the substrate 214, an n-type contact layer 252 composed of gallium nitride, a light-emitting layer 232, and nitriding. The p-type contact layer 258, the gallium nitride-doped magnesium layer 260, and the indium tin oxide layer 262 are formed by gallium. For the materials and formation methods of the above layers, reference may be made to the patent documents contained in the prior art, and no further description is provided herein. . In this embodiment, after the formation of the gallium nitride doped magnesium layer 260, between the intermediate portion 218 and the surrounding portion 220 is defined by the inductively coupled plasma in the peripheral region of the laminate formed by the above layers. The opening (as shown in Fig. 2A) is adjustable in various sizes and shapes depending on the design and needs. Next, the conventional electrode process is continued to form an n-type electrode 254 and a p-type electrode 264 on the n-type contact layer 252 and the p-type contact layer 258, respectively. At this point, the die 212 semi-finished product shown in FIG. 2A can be obtained.

圖2B係繪示在圖2A所示之晶粒212半成品形成雙面皆有反射功能之反射層的示意圖。請注意,為了方便說明起見,圖2B右側部分之反射層222適當地自周圍部分220之內側面220a向左上方平移。反射層222可為單層或疊層結構,而其材料可以是金屬、氧化物、或氧化物及金屬的疊層組合,形成的方法可以適當地利用各種習知的技術。反射層222若是金屬,可以採用的材料包括銀或鋁等。反射層222若是氧化物,可以採用如SiO2 、TiO2 或SiO2 與TiO2 疊層結構。反射層222若是氧化物及金屬的疊層結構,可以是銀/SiO2 疊層結構、銀/TiO2 疊層結構、鋁/SiO2 疊層結構、鋁/TiO2 疊層結構、或上述金屬與氧化物的其它組合。在此實施例中,反射層222形成於周圍部分220之內側面220a上,並延伸至周圍部分220之上表面,且具有一第一反射面222a以及一第二反射面222b,其中第一反射面222a係面對該中間部份218,而第二反射面222b係與周圍部分220的內側面220a接觸。請特別注意,在此實施例中,基底214介於中間部份218與周圍部分220間的部分表面234未被反射層222覆蓋而外露。在另一實施例中,反射層222是氧化物及金屬的疊層結構,其中第一反射面222a由氧化物構成,第二反射面222b由金屬構成。FIG. 2B is a schematic view showing the semi-finished product of the die 212 shown in FIG. 2A forming a reflective layer having a reflective function on both sides. Note that, for convenience of explanation, the reflective layer 222 of the right portion of FIG. 2B is appropriately translated from the inner side 220a of the surrounding portion 220 to the upper left. The reflective layer 222 may be a single layer or a laminated structure, and the material thereof may be a metal, an oxide, or a laminated combination of an oxide and a metal, and the method of forming may suitably utilize various conventional techniques. If the reflective layer 222 is a metal, materials which may be used include silver or aluminum. If the reflective layer 222 is an oxide, a laminated structure such as SiO 2 , TiO 2 or SiO 2 and TiO 2 may be employed. The reflective layer 222 may have a silver/SiO 2 laminated structure, a silver/TiO 2 laminated structure, an aluminum/SiO 2 laminated structure, an aluminum/TiO 2 laminated structure, or the above metal, if it is a laminated structure of an oxide and a metal. Other combinations with oxides. In this embodiment, the reflective layer 222 is formed on the inner side surface 220a of the peripheral portion 220 and extends to the upper surface of the peripheral portion 220, and has a first reflective surface 222a and a second reflective surface 222b, wherein the first reflection The face 222a faces the intermediate portion 218, and the second reflecting surface 222b is in contact with the inner side surface 220a of the peripheral portion 220. It is to be noted that in this embodiment, the portion of the surface 234 of the substrate 214 between the intermediate portion 218 and the peripheral portion 220 is not covered by the reflective layer 222 to be exposed. In another embodiment, the reflective layer 222 is a stacked structure of oxide and metal, wherein the first reflective surface 222a is composed of an oxide and the second reflective surface 222b is composed of a metal.

圖2C係繪示封裝圖2B所示之晶粒212的示意圖。如圖2C所示,晶粒212完成之後,藉由一封裝體224進行封裝。封裝體224承載藉由並環繞晶粒212,封裝體224具有一內側面226與一內部底面228。請特別注意,為了簡潔起見,在圖2C與後述之圖2D中不再重複標示晶粒212每一個元件的符號,若有需要請參照圖2A與圖2B。2C is a schematic view showing the package of the die 212 shown in FIG. 2B. As shown in FIG. 2C, after the die 212 is completed, it is packaged by a package 224. The package 224 carries and surrounds the die 212. The package 224 has an inner side 226 and an inner bottom surface 228. It is to be noted that, for the sake of brevity, the symbols indicating each element of the die 212 are not repeated in FIG. 2C and FIG. 2D described later, and FIG. 2A and FIG. 2B are referred to if necessary.

圖2D係繪示完成封裝之發光二極體裝置的示意圖。請特別注意,在此實施例中,發光二極體裝置210包含晶粒212與封裝體224。如前所述,晶粒212之反射層222具有第一反射面222a以及一第二反射面222b,其中第一反射面222a係面對該中間部份218,而第二反射面222b係與周圍部分220的內側面220a接觸。另外,封裝體224之內側面226與內部底面228係分別為一第三反射面(亦即226)與一第四反射面(亦即228),其中第三反射面226係面對且實質上平行第二反射面222b。而且,在此實施例中,基底214係由透光材料構成。基底214具有一接觸區域I藉以與中間部份218接觸。該接觸區域I之表面可透光。且基底214的厚度足以讓中間部份218之發光層232的部分光線RL1 通過接觸區域I之表面後在第四反射面228反射至外界。在另一實施例中,基底214的厚度足以讓中間部份218之發光層232的部分光線RL1 通過接觸區域I之表面後,在第四反射面228反射並到達該第三反射面226,進而反射至外界。在又一實施例中,基底214的厚度足以讓中間部份218之發光層232的部分光線RL1 通過接觸區域I之表面後,在第四反射面228反射並到達該第三反射面226以及第二反射面222b,進而反射至外界。在本發明此實施例中,基底214之厚度可介於5μm與100μm之間。2D is a schematic view showing a completed LED device of the package. It is to be noted that in this embodiment, the LED device 210 includes the die 212 and the package 224. As described above, the reflective layer 222 of the die 212 has a first reflective surface 222a and a second reflective surface 222b, wherein the first reflective surface 222a faces the intermediate portion 218, and the second reflective surface 222b is surrounded by The inner side 220a of the portion 220 is in contact. In addition, the inner side surface 226 and the inner bottom surface 228 of the package body 224 are respectively a third reflecting surface (ie, 226) and a fourth reflecting surface (ie, 228), wherein the third reflecting surface 226 faces and substantially Parallel to the second reflecting surface 222b. Moreover, in this embodiment, the substrate 214 is constructed of a light transmissive material. The substrate 214 has a contact area I for contact with the intermediate portion 218. The surface of the contact area I is transparent. The thickness of the substrate 214 is sufficient for the partial light RL 1 of the light-emitting layer 232 of the intermediate portion 218 to pass through the surface of the contact region I and then reflected to the outside at the fourth reflective surface 228. In another embodiment, the thickness of the substrate 214 is sufficient for the partial light RL 1 of the light-emitting layer 232 of the intermediate portion 218 to pass through the surface of the contact region I, and then reflected at the fourth reflective surface 228 and reaches the third reflective surface 226. It is reflected to the outside world. In still another embodiment, the thickness of the substrate 214 is sufficient for the partial light RL 1 of the light-emitting layer 232 of the intermediate portion 218 to pass through the surface of the contact region I, and then reflected at the fourth reflective surface 228 and reaches the third reflective surface 226 and The second reflecting surface 222b is further reflected to the outside. In this embodiment of the invention, the thickness of the substrate 214 can be between 5 μm and 100 μm.

在一實施例中,第二反射面222b與第三反射面226的水平距離d3 係不大於封裝體224剖面內緣底部水平距離(即封裝體224的內徑)d1 的一半,亦即d3 ≦(1/2)d1 。只要滿足d3 ≦(1/2)d1 的關係,即足以讓發光層232之部分光線RL1 在第三反射面226反射後到達該第二反射面222b。In one embodiment, the horizontal distance d 3 of the second reflecting surface 222b and the third reflecting surface 226 is not more than half of the horizontal distance of the bottom edge of the inner edge of the package 224 (ie, the inner diameter of the package 224) d 1 , that is, d 3 ≦(1/2)d 1 . As long as the relationship of d 3 ≦(1/2)d 1 is satisfied, it is sufficient for the partial ray RL 1 of the luminescent layer 232 to be reflected by the third reflecting surface 226 to reach the second reflecting surface 222b.

在一實施例中,周圍部分220與該中間部份218具有實質上相同的高度,介於5μm與15μm之間。在另一實施例中,周圍部分220與該中間部份218的高度實質上相同,但不以此為限。在另一實施例中,周圍部分220略高於中間部份218。在又一實施例中,周圍部分220略低於中間部份218。In one embodiment, the peripheral portion 220 and the intermediate portion 218 have substantially the same height, between 5 μm and 15 μm. In another embodiment, the height of the surrounding portion 220 and the intermediate portion 218 are substantially the same, but not limited thereto. In another embodiment, the peripheral portion 220 is slightly above the intermediate portion 218. In yet another embodiment, the peripheral portion 220 is slightly lower than the intermediate portion 218.

在一實施例中,基底214介於中間部份218與周圍部分220之間的上表面234外露,且中間部份218之底部至該反射層222之底部的距離d2 不大於1μm。In one embodiment, the substrate 214 is exposed between the upper surface 234 between the intermediate portion 218 and the peripheral portion 220, and the distance d 2 from the bottom of the intermediate portion 218 to the bottom of the reflective layer 222 is no more than 1 μm.

在一實施例中,周圍部分220之內側面220a(或者反射層222之第二反射面222b)與基底214之一上表面間具有一銳角θ,且該銳角θ小於90度。在另一實施例中,該銳角θ介於30度與80度之間。在最佳實施例中,該銳角θ介於40度與60度之間。In one embodiment, the inner side 220a of the peripheral portion 220 (or the second reflective surface 222b of the reflective layer 222) has an acute angle θ with the upper surface of one of the substrates 214, and the acute angle θ is less than 90 degrees. In another embodiment, the acute angle θ is between 30 and 80 degrees. In a preferred embodiment, the acute angle θ is between 40 and 60 degrees.

綜上所述,本發明之實施例所揭露的發光二極體裝置可以進一步提升整體發光效率,亦可以提升光電效率。另外,本發明之實施例所揭露的基底214亦可採用導電基板。In summary, the LED device disclosed in the embodiments of the present invention can further improve the overall luminous efficiency and can also improve the photoelectric efficiency. In addition, the substrate 214 disclosed in the embodiments of the present invention may also adopt a conductive substrate.

雖然本案是以若干最佳實施例做說明,但精於此技藝者能在不脫離本案精神與範疇下做各種不同形式的改變。以上所舉實施僅用以說明本案而已,非用以限制本案之範圍。舉凡不違本案精神所從事的種種修改或變化,俱屬本案申請專利範圍。Although the present case is illustrated by a number of preferred embodiments, those skilled in the art can make various forms of changes without departing from the spirit and scope of the present invention. The above implementations are for illustrative purposes only and are not intended to limit the scope of the present invention. All kinds of modifications or changes that are not in violation of the spirit of the case are the scope of patent application in this case.

110...發光二極體裝置110. . . Light-emitting diode device

112...晶粒112. . . Grain

114...基底114. . . Base

114a...凹凸結構114a. . . Concave structure

116...疊層結構116. . . Laminated structure

124...封裝體124. . . Package

126...內側面126. . . Inner side

150...緩衝層150. . . The buffer layer

152...n型接觸層152. . . N-type contact layer

154...n型電極154. . . N-type electrode

156...發光層156. . . Luminous layer

158...p型接觸層158. . . P-type contact layer

160...氮化鎂層160. . . Magnesium nitride layer

162...銦錫氧化物層162. . . Indium tin oxide layer

164...p型電極164. . . P-electrode

210...發光二極體裝置210. . . Light-emitting diode device

212...晶粒212. . . Grain

214...基底214. . . Base

216...疊層結構216. . . Laminated structure

218...中間部份218. . . Middle part

220...周圍部分220. . . Surrounding part

220a...內側面220a. . . Inner side

222...反射層222. . . Reflective layer

222a...第一反射面222a. . . First reflecting surface

222b...第二反射面222b. . . Second reflecting surface

224...封裝體224. . . Package

226...第三反射面226. . . Third reflecting surface

228...第四反射面228. . . Fourth reflecting surface

232...發光層232. . . Luminous layer

234...表面234. . . surface

250...緩衝層250. . . The buffer layer

252...n型接觸層252. . . N-type contact layer

254...n型電極254. . . N-type electrode

258...p型接觸層258. . . P-type contact layer

260...氮化鎵摻雜鎂層260. . . Gallium nitride doped magnesium layer

262...銦錫氧化物層262. . . Indium tin oxide layer

264...p型電極264. . . P-electrode

d1 、d2 、d3 ...距離d 1 , d 2 , d 3 . . . distance

I...接觸區域I. . . Contact area

θ...夾角θ. . . Angle

RL、RL1 ...光線RL, RL 1 . . . Light

圖1A係繪示一種習知之發光二極體裝置封裝前的示意圖。FIG. 1A is a schematic view showing a conventional light emitting diode device before being packaged.

圖1B係繪示圖1A之發光二極體裝置封裝後的示意圖。FIG. 1B is a schematic diagram of the LED device of FIG. 1A after being packaged.

圖2A~2D係繪示本發明一實施例之發光二極體裝置製程的示意圖。2A-2D are schematic views showing the process of a light-emitting diode device according to an embodiment of the present invention.

210‧‧‧發光二極體裝置210‧‧‧Lighting diode device

212‧‧‧晶粒212‧‧‧ grain

214‧‧‧基底214‧‧‧Base

216‧‧‧疊層結構216‧‧‧Laminated structure

218‧‧‧中間部份218‧‧‧ middle part

220‧‧‧周圍部分220‧‧‧ surrounding parts

220a‧‧‧內側面220a‧‧‧ inside

222‧‧‧反射層222‧‧‧reflective layer

222a‧‧‧第一反射面222a‧‧‧first reflective surface

222b‧‧‧第二反射面222b‧‧‧second reflective surface

224‧‧‧封裝體224‧‧‧Package

226‧‧‧第三反射面226‧‧‧ third reflecting surface

228‧‧‧第四反射面228‧‧‧fourth reflecting surface

232‧‧‧發光層232‧‧‧Lighting layer

234‧‧‧表面234‧‧‧ surface

250‧‧‧緩衝層250‧‧‧buffer layer

252‧‧‧n型接觸層252‧‧‧n type contact layer

254‧‧‧n型電極254‧‧‧n type electrode

258‧‧‧p型接觸層258‧‧‧p type contact layer

260‧‧‧氮化鎵摻雜鎂層260‧‧‧ gallium nitride doped magnesium layer

262‧‧‧銦錫氧化物層262‧‧‧Indium tin oxide layer

264‧‧‧p型電極264‧‧‧p-type electrode

d1、d2、d3‧‧‧距離D1, d2, d3‧‧‧ distance

I...接觸區域I. . . Contact area

θ...夾角θ. . . Angle

RL1...光線RL1. . . Light

Claims (20)

一種發光二極體裝置,包括:一晶粒,包括一基底以及一半導體疊層結構於該基底上,其中,該半導體疊層結構包括彼此獨立的一中間部份以及一周圍部分,該周圍部分係位於該中間部份之周圍且具有一面對該中間部分之內側面;以及一反射層,具有一第一反射面以及一第二反射面,其中該第一反射面係面對該中間部份,且該第二反射面係與該周圍部分的內側面接觸。 A light emitting diode device comprising: a die comprising a substrate and a semiconductor laminate structure on the substrate, wherein the semiconductor laminate structure comprises an intermediate portion and a peripheral portion independent of each other, the peripheral portion Between the intermediate portion and having an inner side surface of the intermediate portion; and a reflective layer having a first reflective surface and a second reflective surface, wherein the first reflective surface faces the intermediate portion And the second reflecting surface is in contact with the inner side surface of the surrounding portion. 如申請專利範圍第1項之發光二極體裝置,更包括:一封裝體,承載並環繞該晶粒,該封裝體的一內側面與一內部底面係分別為一第三反射面與一第四反射面;其中,該中間部分包含一發光層,該基底係由透光材料構成且具有一中間接觸區域藉以與該中間部分接觸,而該中間接觸區域之表面可透光,且該基底的厚度足以讓該發光層的光線通過該中間接觸區域之表面後在該第四反射面反射。 The illuminating diode device of claim 1, further comprising: a package carrying and surrounding the die, wherein an inner side surface and an inner bottom surface of the package body are respectively a third reflecting surface and a first a fourth reflecting surface; wherein the intermediate portion comprises a light emitting layer, the substrate is made of a light transmissive material and has an intermediate contact region for contacting the intermediate portion, and the surface of the intermediate contact region is transparent, and the substrate is The thickness is sufficient for the light of the luminescent layer to pass through the surface of the intermediate contact region and then reflected at the fourth reflective surface. 如申請專利範圍第1項之發光二極體裝置,其中該基底之厚度介於5μm與100μm之間。 The light-emitting diode device of claim 1, wherein the substrate has a thickness of between 5 μm and 100 μm. 如申請專利範圍第2項之發光二極體裝置,其中該第二反射面與該第三反射面的水平距離係不大於該封裝體內徑的一半,足以讓該發光層之光線在該第三反射面反射後到達該第二反射面。 The illuminating diode device of claim 2, wherein a horizontal distance between the second reflecting surface and the third reflecting surface is not more than half of an inner diameter of the package, sufficient for the light of the luminescent layer to be in the third After the reflecting surface reflects, the second reflecting surface is reached. 如申請專利範圍第1項之發光二極體裝置,其中該周圍部分與該中間部份具有實質上相同的高度。 The light-emitting diode device of claim 1, wherein the peripheral portion has substantially the same height as the intermediate portion. 如申請專利範圍第1項之發光二極體裝置,其中該反射層由金屬或氧化物構成。 The light-emitting diode device of claim 1, wherein the reflective layer is composed of a metal or an oxide. 如申請專利範圍第6項之發光二極體裝置,其中該反射層係氧化物或金屬與氧化物之疊層結構。 The light-emitting diode device of claim 6, wherein the reflective layer is an oxide or a stacked structure of a metal and an oxide. 如申請專利範圍第6項之發光二極體裝置,其中該反射層之材料係選自由銀、鋁、SiO2 及TiO2 所組成之一群組中之其一。The light-emitting diode device of claim 6, wherein the material of the reflective layer is selected from the group consisting of silver, aluminum, SiO 2 and TiO 2 . 如申請專利範圍第1項之發光二極體裝置,其中該基底介於該中間部份與該周圍部分之間的上表面外露,且中間部份之底部至該反射層之底部的距離不大於1μm。 The light-emitting diode device of claim 1, wherein the substrate is exposed on an upper surface between the intermediate portion and the peripheral portion, and a distance from a bottom portion of the intermediate portion to a bottom portion of the reflective layer is not greater than 1 μm. 如申請專利範圍第1項之發光二極體裝置,其中該周圍部分之該內側面與該基底之一上表面間具有一銳角,且該銳角介於40度與60度之間。 The illuminating diode device of claim 1, wherein the inner side of the peripheral portion has an acute angle with an upper surface of the substrate, and the acute angle is between 40 degrees and 60 degrees. 一種發光二極體裝置,包括:一晶粒,包括一基底以及一半導體疊層結構,位於該基底;其中,該半導體疊層結構包括彼此獨立的一中間部份以及一周圍部分,該周圍部分係位於該中間部份之周圍 且具有一內側面;一反射層,該反射層係由金屬或氧化物構成,而該反射層具有一第一反射面以及一第二反射面,其中該第一反射面係面對該中間部份,且該第二反射面係與該周圍部分的內側面接觸;以及一封裝體,承載並環繞該晶粒,該封裝體的一內側面與一內部底面係分別為一第三反射面與一第四反射面,其中該第三反射面係面對該第二反射面;其中,該中間部分包含一發光層,該基底係由透光材料構成且具有一中間接觸區域藉以與該中間部分接觸,而該中間接觸區域之表面可透光,且該基底的厚度足以讓該中間部份之一發光層的光線通過該中間接觸區域之表面後在該第四反射面反射,並到達該第三反射面。 A light emitting diode device comprising: a die comprising a substrate and a semiconductor laminate structure on the substrate; wherein the semiconductor laminate structure comprises an intermediate portion and a peripheral portion independent of each other, the peripheral portion Is located around the middle part And having an inner side surface; a reflective layer, the reflective layer is made of metal or oxide, and the reflective layer has a first reflective surface and a second reflective surface, wherein the first reflective surface faces the intermediate portion And the second reflective surface is in contact with the inner side surface of the surrounding portion; and a package that carries and surrounds the die, and an inner side surface and an inner bottom surface of the package body are respectively a third reflective surface and a fourth reflecting surface, wherein the third reflecting surface faces the second reflecting surface; wherein the intermediate portion comprises a light emitting layer, the substrate is composed of a light transmissive material and has an intermediate contact region and the intermediate portion Contacting, and the surface of the intermediate contact region is transparent, and the thickness of the substrate is sufficient for the light of the light-emitting layer of the intermediate portion to pass through the surface of the intermediate contact region to be reflected on the fourth reflective surface, and reach the first Three reflective surfaces. 如申請專利範圍第11項之發光二極體裝置,其中該基底之厚度介於5μm與100μm之間。 The light-emitting diode device of claim 11, wherein the substrate has a thickness of between 5 μm and 100 μm. 如申請專利範圍第11項之發光二極體裝置,其中該第二反射面與該第三反射面的水平距離係不大於該封裝體內徑的一半,足以讓該發光層之光線在該第三反射面反射後到達該第二反射面。 The illuminating diode device of claim 11, wherein a horizontal distance between the second reflecting surface and the third reflecting surface is not more than half of an inner diameter of the package, sufficient for the light of the luminescent layer to be in the third After the reflecting surface reflects, the second reflecting surface is reached. 如申請專利範圍第11項之發光二極體裝置,其中該反射層為氧化物及金屬的疊層結構,且該第一反射面由該氧化物構成,而該第二反射面由該金屬構成。 The light-emitting diode device of claim 11, wherein the reflective layer is a stacked structure of an oxide and a metal, and the first reflective surface is composed of the oxide, and the second reflective surface is composed of the metal . 如申請專利範圍第14項之發光二極體裝置,其中該反 射層之材料係選自由銀、鋁、SiO2 及TiO2 所組成之一群組中之其一。The light-emitting diode device of claim 14, wherein the material of the reflective layer is selected from the group consisting of silver, aluminum, SiO 2 and TiO 2 . 如申請專利範圍第14項之發光二極體裝置,其中該反射層係SiO2 與TiO2 的疊層結構。The light-emitting diode device of claim 14, wherein the reflective layer is a laminated structure of SiO 2 and TiO 2 . 如申請專利範圍第11項之發光二極體裝置,其中該基底介於該中間部份與該周圍部分之間的上表面外露,且中間部份之底部至該反射層之底部的距離不大於1μm。 The illuminating diode device of claim 11, wherein the substrate is exposed on an upper surface between the intermediate portion and the peripheral portion, and a distance from a bottom portion of the intermediate portion to a bottom portion of the reflective layer is not greater than 1 μm. 如申請專利範圍第11項之發光二極體裝置,其中該周圍部分之該內側面與該基底之一上表面間具有一銳角,且該銳角介於40度與60度之間。 The light-emitting diode device of claim 11, wherein the inner side of the peripheral portion has an acute angle with an upper surface of the substrate, and the acute angle is between 40 degrees and 60 degrees. 如申請專利範圍第11項之發光二極體裝置,其中該封裝體之該第三反射面係實質上平行該第二反射面。 The illuminating diode device of claim 11, wherein the third reflecting surface of the package is substantially parallel to the second reflecting surface. 如申請專利範圍第11項之發光二極體裝置,其中該周圍部分與該中間部份具有實質上相同的高度。 The illuminating diode device of claim 11, wherein the peripheral portion has substantially the same height as the intermediate portion.
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