TWI477489B - An n-type semiconductor composed of a fullerene compound - Google Patents

An n-type semiconductor composed of a fullerene compound Download PDF

Info

Publication number
TWI477489B
TWI477489B TW098138686A TW98138686A TWI477489B TW I477489 B TWI477489 B TW I477489B TW 098138686 A TW098138686 A TW 098138686A TW 98138686 A TW98138686 A TW 98138686A TW I477489 B TWI477489 B TW I477489B
Authority
TW
Taiwan
Prior art keywords
group
residue
film
type semiconductor
mmol
Prior art date
Application number
TW098138686A
Other languages
Chinese (zh)
Other versions
TW201024262A (en
Inventor
八田泰三
中家直樹
Original Assignee
學校法人君淵學園 崇城大學
日產化學工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 學校法人君淵學園 崇城大學, 日產化學工業股份有限公司 filed Critical 學校法人君淵學園 崇城大學
Publication of TW201024262A publication Critical patent/TW201024262A/en
Application granted granted Critical
Publication of TWI477489B publication Critical patent/TWI477489B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/20Carbon compounds, e.g. carbon nanotubes or fullerenes
    • H10K85/211Fullerenes, e.g. C60
    • H10K85/215Fullerenes, e.g. C60 comprising substituents, e.g. PCBM
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/15Nano-sized carbon materials
    • C01B32/152Fullerenes
    • C01B32/156After-treatment
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07HSUGARS; DERIVATIVES THEREOF; NUCLEOSIDES; NUCLEOTIDES; NUCLEIC ACIDS
    • C07H15/00Compounds containing hydrocarbon or substituted hydrocarbon radicals directly attached to hetero atoms of saccharide radicals
    • C07H15/20Carbocyclic rings
    • C07H15/203Monocyclic carbocyclic rings other than cyclohexane rings; Bicyclic carbocyclic ring systems
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/549Organic PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Genetics & Genomics (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • Biotechnology (AREA)
  • General Health & Medical Sciences (AREA)
  • Composite Materials (AREA)
  • Molecular Biology (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Saccharide Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Thin Film Transistor (AREA)
  • Photovoltaic Devices (AREA)

Description

由富勒烯化合物構成之n型半導體An n-type semiconductor composed of a fullerene compound

本發明係關於由富勒烯化合物所構成之n型半導體,更詳言之,係關於由具有單糖或糖醇殘基之富勒烯化合物所構成之n型半導體。The present invention relates to an n-type semiconductor composed of a fullerene compound, and more particularly to an n-type semiconductor composed of a fullerene compound having a monosaccharide or a sugar alcohol residue.

週知持有碳原子60個所成之足球狀構造的富勒烯(以下,稱為「C60」)係為在n型半導體材料之中可特別發揮優良特性之化合物,藉由在超高真空中使用蒸鍍法進行成膜,可得到可發揮與非晶質矽近似之電子移動度的薄膜(參考非專利文獻1)。It is known that fullerene (hereinafter referred to as "C60") having a soccer-like structure of 60 carbon atoms is a compound which exhibits particularly excellent characteristics among n-type semiconductor materials, in an ultra-high vacuum. When a film is formed by a vapor deposition method, a film which exhibits an electron mobility similar to that of the amorphous germanium can be obtained (see Non-Patent Document 1).

然而,由此C60所構成之薄膜,因其有必要藉蒸鍍法進行製膜,難以對應大面積化,又就算可對應其所需要龐大之製造成本的可能性為高。However, since the film composed of C60 is required to be formed by a vapor deposition method, it is difficult to cope with a large area, and even if it is required to have a large manufacturing cost, it is highly likely.

因此,要求著使用不增加製造成本對大面積化之對應變得容易之使用塗佈法而可成膜之材料的開發。Therefore, development of a material that can form a film using a coating method that does not increase the manufacturing cost and increase the ratio of the production area is required.

至此,有開發出將取代基導入之C60衍生物的[6,6]-Phenyl C61-butyric acid methyl ester(以下,稱為「PCBM」),或將氟化烷基導入之C60,且有報告指可藉由使用此些之材料,以旋轉塗佈法製作有機FET(參考專利文獻1、非專利文獻2)。So far, [6,6]-Phenyl C61-butyric acid methyl ester (hereinafter referred to as "PCBM") which has introduced a C60 derivative into which a substituent has been introduced, or C60 which introduces a fluorinated alkyl group, and has been reported It is understood that an organic FET can be produced by a spin coating method by using such a material (see Patent Document 1 and Non-Patent Document 2).

又,有開發出將長鏈烷基導入之C60衍生物的C60-fusedN-methylpyrrolidine-meta-C12 phenyl(C60MC12),且有報告指藉由使用此材料,所得之薄膜的結晶性提升,其結果顯示比PCBM更高之電子移動度(0.067cm2 /Vs)(參考專利文獻2、非專利文獻3)。Further, C60-fused N-methylpyrrolidine-meta-C12 phenyl (C60MC12) which has been developed as a C60 derivative in which a long-chain alkyl group has been introduced has been reported, and it has been reported that the crystallinity of the obtained film is improved by using this material, and the result is improved. The electron mobility (0.067 cm 2 /Vs) higher than the PCBM is displayed (refer to Patent Document 2 and Non-Patent Document 3).

如以上般,近年來使用可溶性富勒烯化合物之n型半導體薄膜受到開發,其特性雖逐漸提升,但作為薄膜所見時,則有發生部分性凝集低均勻性之問題。As described above, an n-type semiconductor film using a soluble fullerene compound has been developed in recent years, and its characteristics are gradually improved. However, when it is seen as a film, there is a problem that partial aggregation is low and uniformity occurs.

[先前技術文獻][Previous Technical Literature] [專利文獻][Patent Literature]

[專利文獻1]特開2007-251086號公報[Patent Document 1] JP-A-2007-251086

[專利文獻2]特開2006-60169號公報[Patent Document 2] JP-A-2006-60169

[非專利文獻][Non-patent literature]

[非專利文獻1]Applied Physics Letters,Vol.82,No.25,p4581-p4583,(2003)[Non-Patent Document 1] Applied Physics Letters, Vol. 82, No. 25, p4581-p4583, (2003)

[非專利文獻2]Advanced Materials,Vol.15,No.24,p2084-p2088,(2003)[Non-Patent Document 2] Advanced Materials, Vol. 15, No. 24, p2084-p2088, (2003)

[非專利文獻3]Applied Physics Letters,Vol.87,p153506-1-p153506-3,(2005)[Non-Patent Document 3] Applied Physics Letters, Vol. 87, p153506-1-p153506-3, (2005)

本發明係有鑑於上述情事而完成者,以提供可賦予均勻之薄膜且可溶於有機溶劑之n型半導體材料為目的。The present invention has been made in view of the above circumstances, and an object of the invention is to provide an n-type semiconductor material which can impart a uniform film and is soluble in an organic solvent.

本發明者們為了達成上述目的進行重複銳意檢討之結果,除發現具有單糖殘基或糖醇殘基之富勒烯化合物對於有機溶劑之溶解性良好,及由含有此化合物之清漆所得之薄膜之均勻性為良好一事外,且發現可作為n型半導體驅動一事,進而完成本發明。The inventors of the present invention conducted repeated evaluations to achieve the above object, and found that the fullerene compound having a monosaccharide residue or a sugar alcohol residue has good solubility in an organic solvent, and a film obtained from a varnish containing the compound. The uniformity is good, and it has been found that it can be driven as an n-type semiconductor to complete the present invention.

即,本發明為提供That is, the present invention provides

1.一種由下述式(1)所表示之富勒烯化合物所構成之n型半導體,An n-type semiconductor comprising a fullerene compound represented by the following formula (1),

【化1】【化1】

[式中,R1 ~R5 為各自獨立表示氫原子或OR7 (R7 表示單糖殘基或糖醇殘基)基,R6 表示碳數1~5之烷基。但,R1 ~R5 之中之至少1個為前述OR7 基]。[wherein, R 1 to R 5 each independently represent a hydrogen atom or OR 7 (R 7 represents a monosaccharide residue or a sugar alcohol residue) group, and R 6 represents an alkyl group having 1 to 5 carbon atoms. However, at least one of R 1 to R 5 is the aforementioned OR 7 group].

2.如1之n型半導體,其中前述單糖殘基為丁醣殘基、戊醣殘基或己醣殘基;2. An n-type semiconductor according to 1, wherein the aforementioned monosaccharide residue is a butyral residue, a pentose residue or a hexose residue;

3.如1之n型半導體,其中前述單糖殘基或糖醇殘基為阿洛糖基、阿拉伯糖基、赤藻糖基、果糖基、半乳糖基、糖基、古羅糖基、肌醇殘基、來蘇糖基、甘露糖基、核糖基、唾液酸殘基、山梨糖基、洛格酮糖基、塔羅糖基或木糖基;3. The n-type semiconductor according to 1, wherein the monosaccharide residue or the sugar alcohol residue is an allosyl group, an arabinose group, a erythrosyl group, a fructosyl group, a galactosyl group, a glycosyl group, a gulose group, Inositol residue, lysyl, mannosyl, ribose, sialic acid residue, sorbitan, logerone, talose or xylosyl;

4.如1~3中任一項之n型半導體,其中前述單糖殘基或糖醇殘基具有之羥基之中之至少1個以保護基所保護;4. The n-type semiconductor according to any one of 1 to 3, wherein at least one of the hydroxyl groups of the aforementioned monosaccharide residue or sugar alcohol residue is protected by a protecting group;

5.如4之n型半導體,其中前述保護基為烷基、苄基、p-甲氧基苄基、t-丁基、甲氧基甲基、2-四氫吡喃基、乙氧基乙基、乙醯基、三甲基乙醯基、苄醯基、三甲基矽烷基、三乙基矽烷基、t-丁基二甲基矽烷基、三異丙基矽烷基、或t-丁基二苯基矽烷基;5. An n-type semiconductor according to 4, wherein the aforementioned protecting group is an alkyl group, a benzyl group, a p-methoxybenzyl group, a t-butyl group, a methoxymethyl group, a 2-tetrahydropyranyl group, an ethoxy group. Ethyl, ethenyl, trimethylethenyl, benzindenyl, trimethyldecyl, triethyldecyl, t-butyldimethylalkyl, triisopropyldecyl, or t- Butyl diphenyl fluorenyl

6.一種清漆,其特徵為含有如1~5中任一項之n型半導體與有機溶劑,而前述n型半導體溶解於有機溶劑;A varnish characterized by containing the n-type semiconductor according to any one of 1 to 5 and an organic solvent, and the n-type semiconductor is dissolved in an organic solvent;

7.一種n型有機半導體薄膜,其特徵為由6之清漆所得;7. An n-type organic semiconductor film characterized by being obtained from a varnish of 6;

8.一種n型有機半導體薄膜,其特徵為含有如1~5中任一項之n型半導體;An n-type organic semiconductor thin film characterized by containing the n-type semiconductor according to any one of 1 to 5;

9.一種有機半導體元件,其特徵為具備如7或8之n型有機半導體薄膜;An organic semiconductor device characterized by comprising an n-type organic semiconductor thin film such as 7 or 8;

10.一種場效電晶體,其特徵為具備7或8之n型有機半導體薄膜;10. A field effect transistor characterized by having an n-type organic semiconductor film of 7 or 8;

11.一種有機薄膜太陽能電池,其特徵為具備7或8之n型有機半導體薄膜;An organic thin film solar cell characterized by having an n-type organic semiconductor thin film of 7 or 8;

12.一種以下述式(2)所表示之富勒烯化合物,12. A fullerene compound represented by the following formula (2),

【化2】[Chemical 2]

[式中,R1 ~R5 各自獨立表示氫原子或OR7 (R7 表示單糖殘基或糖醇殘基)基,R6 表示碳數1~5之烷基。但,R1 ~R5 之中之至少2個為前述OR7 基]。[wherein, R 1 to R 5 each independently represent a hydrogen atom or OR 7 (R 7 represents a monosaccharide residue or a sugar alcohol residue) group, and R 6 represents an alkyl group having 1 to 5 carbon atoms. However, at least two of R 1 to R 5 are the aforementioned OR 7 groups].

本發明之n型半導體因對有機溶劑具有良好溶解性,可藉由塗佈法等之溶液製程形成薄膜。The n-type semiconductor of the present invention has a good solubility in an organic solvent, and can be formed into a thin film by a solution process such as a coating method.

因此,除了半導體元件之大面積化變得容易,同時製造成本之減少化也成為可能。Therefore, in addition to the large area of the semiconductor element, it is easy to reduce the manufacturing cost.

又,使用本發明之n型半導體所得之薄膜因無凝集且均勻性優良,具備此薄膜之元件之特性會變得良好。Further, since the film obtained by using the n-type semiconductor of the present invention has no aggregation and is excellent in uniformity, the characteristics of the element having the film are excellent.

以下,更詳細說明關於本發明。Hereinafter, the present invention will be described in more detail.

本發明之n型半導體係如下述式(1)所表示般,對具有苯基取代吡咯啶骨架的C60化合物,至少一個單糖殘基或糖醇殘基附加在苯基之正位、鄰位、對位之化合物所構成。In the n-type semiconductor of the present invention, as shown by the following formula (1), at least one monosaccharide residue or sugar alcohol residue is added to the ortho position of the phenyl group to the C60 compound having a phenyl-substituted pyrrolidine skeleton. And the compound of the alignment.

【化3】[化3]

式(1)中,R1 ~R5 各自獨立表示氫原子或OR7 (R7 表示單糖殘基或糖醇殘基)基,R1 ~R5 之中之至少1個為OR7 基。In the formula (1), R 1 to R 5 each independently represent a hydrogen atom or OR 7 (R 7 represents a monosaccharide residue or a sugar alcohol residue) group, and at least one of R 1 to R 5 is an OR 7 group. .

單糖殘基並無特別限定,本發明中以丁醣殘基、戊醣殘基、己醣殘基為適宜,特別係以己醣殘基為佳。The monosaccharide residue is not particularly limited. In the present invention, a butyral residue, a pentose residue, and a hexose residue are preferred, and a hexose residue is particularly preferred.

丁醣殘基可舉出赤藻糖基殘基的赤藻糖基等。Examples of the butyric residue include an erythrosyl group of an erythrosyl residue.

戊醣殘基可舉出阿拉伯糖殘基的阿拉伯糖基、蘇糖基殘基的來蘇糖基、核糖殘基的核糖基、木糖殘基的木糖基等。Examples of the pentose residue include an arabinose group of an arabinose residue, a lysyl group of a threose residue, a ribose group of a ribose residue, and a xylosyl group of a xylose residue.

己醣殘基可舉出阿洛糖殘基的阿洛糖基、果糖基殘基的果糖基、半乳糖殘基的半乳糖基、葡萄糖殘基的葡苷基、古羅糖殘基的古羅糖基、甘露糖殘基的甘露糖基、洛格酮糖殘基的洛格酮糖基、塔羅糖殘基的塔羅糖基、唾液酸殘基等。Examples of the hexose residue include an allose group of an arabose residue, a fructosyl group of a fructosyl residue, a galactosyl group of a galactose residue, a glucosyl group of a glucose residue, and an ancient sugar residue. A mannose group of a glucosyl group, a mannose residue, a logerone glycosyl group of a logerone sugar residue, a talose group of a talose residue, a sialic acid residue, and the like.

糖醇殘基可舉出肌醇殘基等。Examples of the sugar alcohol residue include inositol residues and the like.

此些之中,本發明中以己醣殘基為佳,特別係以半乳糖基、葡苷基為適宜。Among these, in the present invention, a hexose residue is preferred, and a galactosyl group or a glucosyl group is particularly preferred.

又,R6 為碳數1~5之烷基,其具體例可舉出甲基、乙基、n-丙基、i-丙基、n-丁基、i-丁基、t-丁基、n-戊基等,特別係以甲基為佳。Further, R 6 is an alkyl group having 1 to 5 carbon atoms, and specific examples thereof include a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, an i-butyl group, and a t-butyl group. , n-pentyl, etc., especially methyl is preferred.

又,若考慮到使本發明之n型半導體對有機溶劑之溶解性更加提升,以單糖殘基或糖醇殘基所具有之羥基之至少1個以保護基所保護為佳,全部之羥基以保護基所保護為更佳。Further, in consideration of further improving the solubility of the n-type semiconductor of the present invention in an organic solvent, it is preferred that at least one of the hydroxyl groups of the monosaccharide residue or the sugar alcohol residue is protected by a protective group, and all of the hydroxyl groups are preferred. It is better to protect with a protective base.

此情況,保護基並無特別限定,只要從一般之糖羥基之保護所用之保護基之中適宜選擇使用即可。In this case, the protecting group is not particularly limited as long as it is appropriately selected from the protective groups used for the protection of the general sugar hydroxyl group.

其具體例可舉出烷基、苄基、p-甲氧基苄基、t-丁基、甲氧基甲基、2-四氫吡喃基、乙氧基乙基、乙醯基、三甲基乙醯基、苄醯基、三甲基矽烷基、三乙基矽烷基、t-丁基二甲基矽烷基、三異丙基矽烷基、t-丁基二苯基矽烷基等,特別係以乙醯基為佳。Specific examples thereof include an alkyl group, a benzyl group, a p-methoxybenzyl group, a t-butyl group, a methoxymethyl group, a 2-tetrahydropyranyl group, an ethoxyethyl group, an ethyl sulfonyl group, and a third group. a methyl ethyl fluorenyl group, a benzamidine group, a trimethyl decyl group, a triethyl decyl group, a t-butyl dimethyl decyl group, a triisopropyl decyl group, a t-butyl diphenyl fluorenyl group, or the like. In particular, it is preferred to use an acetamidine group.

上述式(1)所示之C60化合物可依據“具有糖單位之水溶性富勒烯衍生物之合成與電化學特性”(2002年3月日本化學會第81回春季年會)所揭載之具有單糖殘基之C60化合物的合成方法進行合成。若舉出一例,如以下之反應流程般。The C60 compound represented by the above formula (1) can be disclosed according to "Synthesis and Electrochemical Characteristics of Water-Soluble Fullerene Derivatives Containing Sugar Units" (March 81 Annual Meeting of the Chemical Society of Japan, March 2002) A method for synthesizing a C60 compound having a monosaccharide residue is synthesized. If an example is given, it is as follows.

【化4】【化4】

【化5】【化5】

本發明之清漆係含有上述之C60化合物與有機溶劑,C60化合物溶解於有機溶劑而成者。The varnish of the present invention contains the above-mentioned C60 compound and an organic solvent, and the C60 compound is dissolved in an organic solvent.

於此,有機溶劑只要係具有C60化合物之溶解能力者則無特別限定,例如可舉出苯、甲苯、茬、氯苯、二乙基醚、四氫呋喃、二噁烷、丙酮、乙酸乙酯、二硫化碳、二氯乙烷、三氯甲烷、二氯甲烷等。Here, the organic solvent is not particularly limited as long as it has a dissolving ability of the C60 compound, and examples thereof include benzene, toluene, hydrazine, chlorobenzene, diethyl ether, tetrahydrofuran, dioxane, acetone, ethyl acetate, and carbon disulfide. , dichloroethane, chloroform, dichloromethane, etc.

清漆中之C60化合物之含有量只要係可溶解於有機溶劑之量則無特別限定,若考慮到塗佈性等之操作性等,以0.01~20質量%為佳,0.5~3質量%為更佳。The content of the C60 compound in the varnish is not particularly limited as long as it is soluble in the organic solvent, and it is preferably 0.01 to 20% by mass, and 0.5 to 3% by mass, in consideration of workability such as coatability. good.

藉由將以上所說明之清漆塗佈於基材上且使溶劑蒸發,可在基材上形成n型有機半導體薄膜。An n-type organic semiconductor thin film can be formed on a substrate by applying the above-described varnish to a substrate and evaporating the solvent.

清漆之塗佈方法,無特別限定可舉出,浸漬法、旋轉塗佈法、轉印印刷法、輥塗法、刷毛塗法、噴墨法、噴塗法等。The coating method of the varnish is not particularly limited, and examples thereof include a dipping method, a spin coating method, a transfer printing method, a roll coating method, a brush coating method, an inkjet method, and a spray coating method.

溶劑之蒸發法並無特別限定,例如使用加熱板或烤箱,在適當之環境下,即,大氣、氮等之惰性氣體、真空中等使其蒸發即可。The evaporation method of the solvent is not particularly limited. For example, a hot plate or an oven may be used, and the solvent may be evaporated under an appropriate environment, that is, an inert gas such as air or nitrogen or a vacuum.

燒成溫度只要係可使溶劑則無特別限定,以在80~100℃下進行為佳。The firing temperature is not particularly limited as long as the solvent is used, and it is preferably carried out at 80 to 100 ° C.

半導體薄膜之膜厚無特別限定,以50~100nm為適宜。使膜厚變化之方法則有使清漆中之固形分濃度變化、使塗佈時之基板上之溶液量變化等之方法。The film thickness of the semiconductor thin film is not particularly limited, and is preferably 50 to 100 nm. The method of changing the film thickness includes a method of changing the solid content concentration in the varnish, changing the amount of the solution on the substrate during coating, and the like.

藉由使用本發明之清漆,與非蒸鍍法等之溶液製程之方法相比較,可以簡便之方法製作薄膜,且,也有可容易對應於大面積化之有利點。By using the varnish of the present invention, it is possible to produce a film in a simple manner as compared with the method of a solution process such as a non-evaporation method, and it is also advantageous in that it can easily correspond to a large area.

尚,含有本發明之n型半導體之薄膜的形成方法,並不侷限使用上述塗佈法的溶液製程,亦可使用蒸鍍法等之以往公知之其他方法。Further, the method for forming the film containing the n-type semiconductor of the present invention is not limited to the solution process using the above coating method, and other conventionally known methods such as a vapor deposition method may be used.

上述之n型有機半導體薄膜可適宜使用於作為構成場效電晶體、發光二極體、光電轉換元件、有機薄膜太陽能電池等之半導體元件的半導體層。The above-described n-type organic semiconductor thin film can be suitably used as a semiconductor layer which constitutes a semiconductor element such as a field effect transistor, a light emitting diode, a photoelectric conversion element, or an organic thin film solar cell.

本發明之半導體元件,因有將上述之具有單糖殘基或糖醇殘基之富勒烯化合物作為n型半導體而使用之特徵,其他元件之構成構件從以往公知者中適宜選擇使用即可。The semiconductor device of the present invention is characterized in that the above-described fullerene compound having a monosaccharide residue or a sugar alcohol residue is used as an n-type semiconductor, and the constituent members of the other elements are appropriately selected from those conventionally known. .

舉出一例說明關於場效電晶體。An example is given regarding a field effect transistor.

場效電晶體一般而言,係由具備基板、閘極(gate electrode)及閘極絕緣膜(gate insulator film)、源極(source electrode)及汲極(drain electrode)、n型有機半導體層所構成,作為此n型有機半導體層使用上述之n型有機半導體薄膜。Field effect transistors generally include a substrate, a gate electrode, a gate insulator film, a source electrode, a drain electrode, and an n-type organic semiconductor layer. In the configuration, the n-type organic semiconductor thin film described above is used as the n-type organic semiconductor layer.

上述閘極、閘極絕緣膜、源極、汲極及n型有機半導體層之配置,有於基板上層合閘極及閘極絕緣膜之形態、基板上層合n型有機半導體薄膜之形態、基板上層合源極及汲極之形態等之各種形態,本發明中可使用任一種之形態。The gate electrode, the gate insulating film, the source, the drain, and the n-type organic semiconductor layer are disposed on the substrate in the form of a gate electrode and a gate insulating film, and the n-type organic semiconductor film is laminated on the substrate, and the substrate In the various forms of the form of the upper layer and the source of the drain, any of the forms can be used in the present invention.

上述基板例如可舉出矽基板、玻璃基板、聚對酞酸乙二酯等之塑膠基板等。Examples of the substrate include a ruthenium substrate, a glass substrate, and a plastic substrate such as polyethylene terephthalate.

構成閘極之材料,例如可舉出p摻雜矽、n摻雜矽、銦‧錫氧化物(ITO)、經摻雜之聚噻吩或聚苯胺等之導電性高分子、金,銀,白金,鉻等之金屬等。Examples of the material constituting the gate include a conductive polymer such as p-doped germanium, n-doped germanium, indium ‧ tin oxide (ITO), doped polythiophene or polyaniline, gold, silver, and platinum. , metals such as chrome, etc.

構成閘極絕緣膜之材料,例如可舉出氧化矽,氮化矽,氧化鋁,氮化鋁,氧化鉭等之無機化合物、聚乙烯醇,聚乙烯酚,聚甲基丙烯酸酯,cyanoethylpullulan等之有機化合物。Examples of the material constituting the gate insulating film include inorganic compounds such as cerium oxide, cerium nitride, aluminum oxide, aluminum nitride, and cerium oxide, polyvinyl alcohol, polyvinyl phenol, polymethacrylate, and cyanoethylpullulan. Organic compound.

構成源極及汲極之材料,例如可舉出金、銀、白金、鉻、鋁、銦、鹼金屬(Li、Na、K、Rb、Cs)、鹼土類金屬(Mg、Ca、Sr、Ba)等。Examples of the material constituting the source and the drain include gold, silver, platinum, chromium, aluminum, indium, alkali metals (Li, Na, K, Rb, and Cs), and alkaline earth metals (Mg, Ca, Sr, and Ba). )Wait.

[實施例][Examples]

以下,舉出合成例、實施例及比較例,更具體說明本發明,但本發明並不係受限於下述之實施例者。且,實施例中所用之分析裝置為如下述般。Hereinafter, the present invention will be more specifically described by way of Synthesis Examples, Examples and Comparative Examples, but the present invention is not limited to the examples described below. Further, the analysis device used in the examples was as follows.

(1)融點:微量融點測定裝置(股份公司柳本製作所製、MP-S3)(1) Melting point: micro-melting point measuring device (manufactured by the company, Miyamoto Manufacturing Co., Ltd., MP-S3)

(2) NMR:超傳導核磁共震儀裝置(日本電子股份公司製、JNM-EX270及JNM-ECS 400)(2) NMR: superconducting nuclear magnetic resonance device (made by JEOL Co., Ltd., JNM-EX270 and JNM-ECS 400)

(3) IR:傅立葉轉換紅外分光光度計(日本分光工業股份公司製、JASCO FT/IR-7000)(3) IR: Fourier transform infrared spectrophotometer (manufactured by JASCO Corporation, JASCO FT/IR-7000)

(4) MS:質量分析計(日本電子股份公司製、JMS-AX500、及BRUKER製、autoflex II MALDI TOF/TOF MS)(4) MS: mass spectrometer (manufactured by JEOL Ltd., JMS-AX500, and BRUKER, autoflex II MALDI TOF/TOF MS)

(5)旋光度:旋光計(日本分光股份公司製、DIP-1000型)(5) Optical rotation: Optical rotation meter (manufactured by JASCO Corporation, DIP-1000 type)

(6) UV-VIS分光:紫外可視分光光度計(股份公司日立製作所製、U-2000形日立雙光束分光光度計)(6) UV-VIS spectrophotometer: UV-visible spectrophotometer (manufactured by Hitachi, Ltd., U-2000-shaped Hitachi dual-beam spectrophotometer)

(7) HPLC:高速液體層析裝置(股份公司日立製作所製、L-6000形日立高速液體層析儀)(7) HPLC: High-speed liquid chromatography device (manufactured by Hitachi, Ltd., L-6000 Hitachi High-Speed Liquid Chromatograph)

[合成例1]2-甲醯基苯基四-O-乙醯基-β-D-吡喃葡萄糖苷(2)之合成[Synthesis Example 1] Synthesis of 2-formylphenyltetra-O-ethylidene-β-D-glucopyranoside (2)

【化6】【化6】

氮環境下,對o-羥基苯甲醛(124mg,1.0mmol)之喹啉溶液(2.0ml)添加四-O-乙醯基-α-D-溴化吡喃葡糖(1)(822mg,2.0mmol)、及氧化銀(463mg,2.0mmol),在室溫下攪拌75分鐘。反應結束後,以苯(60ml)進行萃取,將不溶物過濾分離。4-O-Ethyl-α-D-bromoglucopyranose (1) (822 mg, 2.0) was added to a quinoline solution (2.0 ml) of o-hydroxybenzaldehyde (124 mg, 1.0 mmol) under nitrogen atmosphere. Methyl) and silver oxide (463 mg, 2.0 mmol) were stirred at room temperature for 75 minutes. After completion of the reaction, extraction was carried out with benzene (60 ml), and the insoluble material was separated by filtration.

其次,將萃取液以1%鹽酸(20ml)進行10次洗淨後,以1%碳酸氫鈉水溶液(20ml)進行10次洗淨。將有機層以硫酸鎂乾燥後,進行減壓濃縮得到褐色黏性油(780mg)。Next, the extract was washed 10 times with 1% hydrochloric acid (20 ml), and then washed 10 times with a 1% aqueous sodium hydrogencarbonate solution (20 ml). The organic layer was dried over magnesium sulfate and concentrated under reduced pressure to yield brown oil (780 mg).

將殘渣附交柱式色層分析儀(BW-300、富士Silysia化學(股)製,以下相同),藉由己烷-乙酸乙酯(3:2)溶析分離,得到無色黏性油(660mg)。將此由乙醇進行再結晶得到無色針狀晶(2)(400mg,88%)。所得之生成物之分析結果為如以下般。Colorless needles(Ethanol),mp 138-139℃.(lit. mp 125-124℃)IR(KBr) 2966(CH),1763,1688(C=O),1603,1485(C=C),1234,1071,1042(O-C=O),764cm-1 (CH ).1 H NMR(270MHz,CDCl3 )δ2.06(3H,s,CH3 ),2.07(6H,s,CH3 ),2.08(3H,s,CH3 ),3.87-3.98(1H,m,5-H),4.19(1H,dd,J=2.5,12.2Hz,6-H),4.31(1H,dd,J=5.5,12.2Hz,6-H),5.14-5.26(2H,m,2-,3-H),5.29-5.44(2H,m,1-,4-H),7.13(1H,d,J=8.4Hz,Ar-H),7.21(1H,dd,J=7.6,8.4Hz,Ar-H),7.57(1H,ddd,J=1.7,7.6,8.4Hz,Ar-H),7.87(1H,dd,J=1.7,7.6Hz,Ar-H),10.35(1H,s,CHO).13 C NMR(67.8MHz,CDCl3 )δ20.59(CH3 ×3),20.66(CH3 ),61.78(CH2 ),68.16,70.91,72.22,72.42(2,3,4,5-C),99.03(1-C),115.96,123.63,126.22,128.34,135.74,158.76(Ar-C),169.22,169.38,170.19,170.51(CH3 CO),189.14(Ar-CO).FAB-MS(m-NBA) m/z 452(M+ ),451([M-H]+ ).The residue was attached to a column chromatography analyzer (BW-300, manufactured by Fuji Silysia Chemical Co., Ltd., the same below), and separated by hexane-ethyl acetate (3:2) to obtain a colorless viscous oil (660 mg). ). This was recrystallized from ethanol to give colorless needle crystals (2) (400 mg, 88%). The analysis result of the obtained product was as follows. Colorless needles (Ethanol), mp 138-139 ° C. (lit. mp 125-124 ° C) IR (KBr) 2966 (CH), 1763, 1688 (C=O), 1603, 1485 (C=C), 1234, 1071, 1042 (OC=O), 764 cm -1 (C H ). 1 H NMR (270MHz, CDCl 3 ) δ 2.06 (3H, s, CH 3 ), 2.07 (6H, s, CH 3 ), 2.08 ( 3H, s, CH 3 ), 3.87-3.98 (1H, m, 5-H), 4.19 (1H, dd, J = 2.5, 12.2 Hz, 6-H), 4.31 (1H, dd, J = 5.5, 12.2 Hz,6-H),5.14-5.26(2H,m,2-,3-H), 5.29-5.44(2H,m,1-,4-H),7.13(1H,d,J=8.4Hz, Ar-H), 7.21 (1H, dd, J = 7.6, 8.4 Hz, Ar-H), 7.57 (1H, ddd, J = 1.7, 7.6, 8.4 Hz, Ar-H), 7.87 (1H, dd, J = 1.7, 7.6 Hz, Ar-H), 10.35 (1H, s, CHO). 13 C NMR (67.8 MHz, CDCl 3 ) δ 20.59 (CH 3 × 3), 20.66 (CH 3 ), 61.78 (CH 2 ), 68.16, 70.91, 72.22, 72.42 (2, 3, 4, 5-C), 99.03 (1-C), 115.96, 123.63, 126.22, 128.34, 135.74, 158.76 (Ar-C), 169.22, 169.38, 170.19 , 170.51 (CH 3 CO), 189.14 (Ar-CO). FAB-MS (m-NBA) m/z 452 (M + ), 451 ([MH] + ).

[數1][Number 1]

-32.9(c 1.03,CHCl3 ).Anal. Calcd for C21 H24 O11 :C,55.75;H,5.35%.Found:C,55.84;H,5.37%. -32.9 (c 1.03, CHCl 3 ). Anal. Calcd for C 21 H 24 O 11 : C, 55.75; H, 5.35%. Found: C, 55.84; H, 5.37%.

[合成例2]3-甲醯基苯基四-O-乙醯基-β-D-吡喃葡萄糖苷(3)之合成[Synthesis Example 2] Synthesis of 3-methylphenylphenyltetra-O-ethylidene-β-D-glucopyranoside (3)

【化7】【化7】

氮氣流下,對m-羥基苯甲醛(123mg,1.0mmol)之喹啉溶液(2.0ml)添加2,3,4,6-四-O-乙醯基-α-D-溴化吡喃葡糖(1)(822mg,2.0mmol)、及氧化銀(463mg,2.0mmol),在室溫下攪拌75分鐘。反應結束後,以苯(60ml)進行萃取,將不溶物過濾分離。2,3,4,6-tetra-O-ethinyl-α-D-bromoglucopyranose was added to m-hydroxybenzaldehyde (123 mg, 1.0 mmol) in quinoline solution (2.0 ml) under a nitrogen stream. (1) (822 mg, 2.0 mmol) and silver oxide (463 mg, 2.0 mmol) were stirred at room temperature for 75 minutes. After completion of the reaction, extraction was carried out with benzene (60 ml), and the insoluble material was separated by filtration.

其次,將萃取液以1%鹽酸(20ml)進行10次洗淨後,以1%碳酸氫鈉水溶液(20ml)進行10次洗淨。將有機層以硫酸鎂乾燥後,進行減壓濃縮得到黃色黏性油(764mg)。Next, the extract was washed 10 times with 1% hydrochloric acid (20 ml), and then washed 10 times with a 1% aqueous sodium hydrogencarbonate solution (20 ml). The organic layer was dried over magnesium sulfate and concentrated under reduced pressure to yield yellow oil (yield: 764).

將殘渣附交柱式色層分析儀,藉由己烷-乙酸乙酯(3:2)溶析分離,得到無色黏性油(493mg)。將此由乙醇進行再結晶得到無色針狀晶(3)(436mg,96%)。所得之生成物之分析結果如以下般。Colorless needles(Ethanol),mp 105-106℃.(lit. mp 108-109℃) IR(KBr) 3070,2944(CH),1760,1736,1700(C=O),1595,1485(C=C),1236,1220,1089,1058,1038(O-C=O),803,770cm-1 (CH).1 H NMR(270MHz,CDCl3 )δ2.05(3H,s,CH3 ),2.07(6H,s,CH3 ),2.10(3H,s,CH3 ),3.98(1H,ddd,J=2.7,5.7,9.9Hz,5-H),4.20(1H,dd,J=2.7,12.4Hz,6-H),4.27(1H,dd,J=5.9,12.2Hz,6-H),5.12-5.38(4H,m,1,2,3,4-H),7.26(1H,ddd,J=1.4,3.0,8.1Hz,5'-H),7.49(1H,t,J=8.1Hz,4'-H),7.51(1H,t,J=1.4Hz,2'-H),7.69(1H,td,J=1.4,7.6Hz,6'-H),9.98(1H,s,CHO).13 C NMR(67.8MHz,CDCl3 )δ20.59(CH3 ×2),20.65(CH3 ×2),61.98(CH2 ),68.19,71.05,72.29,72.61(2,3,4,5-C),98.60(1-C),115.96(3'-C),123.63(5'-C),126.22(4'-C),128.34(2'-C),135.74(6'-C),158.76(1'-C),169.29,169.43,170.19,170.67(CH3 CO),191.46(CHO).The residue was subjected to a column chromatography, and separated by hexane-ethyl acetate (3:2) to give a colorless viscous oil (493 mg). This was recrystallized from ethanol to give colorless crystals (3) (436 mg, 96%). The analysis results of the obtained product were as follows. Colorless needles (Ethanol), mp 105-106 ° C. (lit. mp 108-109 ° C) IR (KBr) 3070, 2944 (CH), 1760, 1736, 1700 (C=O), 1595, 1485 (C=C ), 1236, 1220, 1089, 1058, 1038 (OC = O), 803, 770 cm -1 (CH). 1 H NMR (270 MHz, CDCl 3 ) δ 2.05 (3H, s, CH 3 ), 2.07 (6H, s, CH 3 ), 2.10 (3H, s, CH 3 ), 3.98 (1H, ddd, J = 2.7, 5.7, 9.9 Hz, 5-H), 4.20 (1H, dd, J = 2.7, 12.4 Hz, 6 -H), 4.27 (1H, dd, J = 5.9, 12.2 Hz, 6-H), 5.12-5.38 (4H, m, 1, 2, 3, 4-H), 7.26 (1H, ddd, J = 1.4) , 3.0, 8.1 Hz, 5'-H), 7.49 (1H, t, J = 8.1 Hz, 4'-H), 7.51 (1H, t, J = 1.4 Hz, 2'-H), 7.69 (1H, Td, J = 1.4, 7.6 Hz, 6'-H), 9.98 (1H, s, CHO). 13 C NMR (67.8 MHz, CDCl 3 ) δ 20.59 (CH 3 × 2), 20.65 (CH 3 × 2) ), 61.98 (CH 2 ), 68.19, 71.05, 72.29, 72.61 (2, 3, 4, 5-C), 98.60 (1-C), 115.96 (3'-C), 123.63 (5'-C), 126.22 (4'-C), 128.34 (2'-C), 135.74 (6'-C), 158.76 (1'-C), 169.29, 169.43, 170.19, 170.67 (CH 3 CO), 191.46 (CHO).

[數2][Number 2]

-36.9(c 1.00,CHCl3 ).Anal. Calcd for C21 H24 O11 :C,55.75;H,5.35%.Found:C,55.78;H,5.36%. -36.9 (c 1.00, CHCl 3 ). Anal. Calcd for C 21 H 24 O 11 : C, 55.75; H, 5.35%. Found: C, 55.78; H, 5.36%.

[合成例3]4-甲醯基苯基四-O-乙醯基-β-D-吡喃葡萄糖苷(4)之合成[Synthesis Example 3] Synthesis of 4-methylnonylphenyltetra-O-ethylidene-β-D-glucopyranoside (4)

【化8】【化8】

氮氣流下,對p-羥基苯甲醛(123mg,1.0mmol)之喹啉溶液(2.0ml)添加2,3,4,6-四-O-乙醯基-α-D-溴化吡喃葡糖(1)(822mg,2.0mmol)、及氧化銀(464mg,2.0mmol),在室溫下攪拌75分鐘。反應結束後、以苯(60ml)進行萃取,將不溶物過濾分離。2,3,4,6-tetra-O-ethenyl-α-D-bromoglucopyranose was added to p-hydroxybenzaldehyde (123 mg, 1.0 mmol) in quinoline solution (2.0 ml) under a nitrogen stream. (1) (822 mg, 2.0 mmol) and silver oxide (464 mg, 2.0 mmol) were stirred at room temperature for 75 minutes. After completion of the reaction, extraction was carried out with benzene (60 ml), and the insoluble material was separated by filtration.

其次,將萃取液以1%鹽酸(20ml)進行10次洗淨後,以1%碳酸氫鈉水溶液(20ml)進行10次洗淨。將有機層以硫酸鎂乾燥後,進行減壓濃縮得到黃色黏性油(702mg)。Next, the extract was washed 10 times with 1% hydrochloric acid (20 ml), and then washed 10 times with a 1% aqueous sodium hydrogencarbonate solution (20 ml). The organic layer was dried over magnesium sulfate and concentrated under reduced pressure to give a pale oil.

將殘渣附交柱式色層分析儀,藉由己烷-乙酸乙酯(3:2)溶析分離,得到無色黏性油(417mg)。將此由乙醇進行再結晶得到無色針狀晶(4)(375mg,83%)。所得之生成物之分析結果如以下般。Colorless needles(Ethanol),mp 147-148℃.(lit. mp 149-150℃)IR(KBr) 1754,1694(C=O),1236,1056cm-1 (O-C=O).1 H NMR(270MHz,CDCl3 )δ2.05(3H,s,CH3 ),2.07(6H,s,CH3 ),2.08(3H,s,CH3 ),3.94(1H,ddd,J=2.5,5.5,10.1Hz,5-H),4.18(1H,dd,J=2.5,12.2Hz,6-H),4.30(1H,dd,J=5.5,12.2Hz,6-H),5.14-5.38(4H,m,1,2,3,4-H),7.11,7.86(each 2H,d,J=8.9Hz,Ar-H),9.93(1H,s,CHO).13 C NMR(67.8MHz,CDCl3 )δ20.61(CH3 ×3),20.68(CH3 ),61.87(6-C),68.12,71.01,72.33,72.54(2,3,4,5-C),98.04(1-C),116.78(2'-C),131.46(4'-C),131.82(3'-C),161.24(1'-C),169.23,169.40,170.20,170.49(CH3 CO),190.71(CHO).FAB-MS(m-NBA) m/z 452(M+ ),451([M-H]+ ).Anal. Calcd for C21 H24 O11 :C,55.75;H,5.35%.Found:C,55.66;H,5.37%The residue was subjected to a column chromatography to give a colorless viscous oil (417 mg) eluting with hexane-ethyl acetate (3:2). This was recrystallized from ethanol to give colorless needle crystals (4) (375 mg, 83%). The analysis results of the obtained product were as follows. Colorless needles (Ethanol), mp 147-148 ° C. (lit. mp 149-150 ° C) IR (KBr) 1754, 1694 (C=O), 1236, 1056 cm -1 (OC=O). 1 H NMR (270 MHz , CDCl 3 ) δ2.05 (3H, s, CH 3 ), 2.07 (6H, s, CH 3 ), 2.08 (3H, s, CH 3 ), 3.94 (1H, ddd, J = 2.5, 5.5, 10.1 Hz ,5-H), 4.18 (1H, dd, J=2.5, 12.2 Hz, 6-H), 4.30 (1H, dd, J=5.5, 12.2 Hz, 6-H), 5.14-5.38 (4H, m, 1,2,3,4-H), 7.11, 7.86 (each 2H, d, J=8.9 Hz, Ar-H), 9.93 (1H, s, CHO). 13 C NMR (67.8 MHz, CDCl 3 ) δ 20 .61 (CH 3 × 3), 20.68 (CH 3 ), 61.87 (6-C), 68.12, 71.01, 72.33, 72.54 (2, 3, 4, 5-C), 98.04 (1-C), 116.78 ( 2'-C), 131.46 (4'-C), 131.82 (3'-C), 161.24 (1'-C), 169.23, 169.40, 170.20, 170.49 (CH 3 CO), 190.71 (CHO). FAB- MS (m-NBA) m/z 452 (M + ), 451 ([MH] + ). Anal. Calcd for C 21 H 24 O 11 : C, 55.75; H, 5.35%. Found: C, 55.66; , 5.37%

[合成例4]2-甲醯基苯基四-O-乙醯基-β-D-半乳糖皮蒽(galactopyranoside)(6)之合成[Synthesis Example 4] Synthesis of 2-methylmercaptophenyltetra-O-ethinyl-β-D-galactopyranoside (6)

【化9】【化9】

氮氣流下,對o-羥基苯甲醛(124mg,1.0mmol)之喹啉溶液(2.0ml)添加2,3,4,6-四-O-乙醯基-α-D-溴化半乳哌喃糖(galactopyranosylbromide)(5)(822mg,2.0mmol)、及氧化銀(463mg,2.0mmol),在室溫下攪拌75分鐘。反應結束後,以苯(60ml)進行萃取,過濾分離不溶物。2,3,4,6-tetra-O-ethylindenyl-α-D-bromopentahydrate was added to a quinoline solution (2.0 ml) of o-hydroxybenzaldehyde (124 mg, 1.0 mmol) under a nitrogen stream. Sugar (galactopyranosylbromide) (5) (822 mg, 2.0 mmol) and silver oxide (463 mg, 2.0 mmol) were stirred at room temperature for 75 minutes. After completion of the reaction, extraction was carried out with benzene (60 ml), and the insoluble material was separated by filtration.

其次,將萃取液以1%鹽酸(20ml)進行10次洗淨後,以1%碳酸氫鈉水溶液(20ml)進行10次洗淨。將有機層以硫酸鎂乾燥後,進行減壓濃縮得到白色黏性油(747mg)。Next, the extract was washed 10 times with 1% hydrochloric acid (20 ml), and then washed 10 times with a 1% aqueous sodium hydrogencarbonate solution (20 ml). The organic layer was dried over magnesium sulfate and concentrated under reduced pressure to yield white oil (yield: 747 mg).

將殘渣附交柱式色層分析儀,藉由己烷-乙酸乙酯(3:2)溶析分離,得到無色黏性油(652mg)。將此由己烷-二乙基醚(7:2)進行再結晶得到無色針狀晶(6)(454mg,98%)。所得之生成物之分析結果如以下般。Colorless needles[Diethyl ether-n-Hexane(7/2)],mp 113-114℃.IR(KBr) 2982(CH),1748,1698(C=O),1603,1487(C=C),1234,1093,1044(C-O-C),768cm-1 (CH).1 H NMR(270MHz,CDCl3 )δ2.03(3H,s,CH3 ),2.07(6H,s,CH3 ),2.21(3H,s,CH3 ),4.07-4.33(3H,m,5-,6-H),5.16(1H,dd,J=3.4,10.5Hz,3-H),5.17(1H,d,J=8.0Hz,1-H),5.50(1H,d,J=3.4Hz,4-H),5.60(1H,dd,J=8.0,10.5Hz,2-H),7.14(1H,d,J=8.4Hz,6'-H),7.19(1H,t,J=7.6Hz,4'-H),7.57(1H,ddd,J=1.7,7.6,8.4Hz,5'-H),7.87(1H,dd,J=1.7,7.6Hz,3'-H),10.37(1H,s,CHO).13 C NMR(67.8MHz,CDCl3 )δ20.58(CH3 ),20.66(CH3 ×3),61.28(CH2 ),66.74,68.34,70.58,71.27(2,3,4,5-C),99.44(1-C),115.72(6'-C),123.50(4'-C),126.09(2'-C),128.28(3'-C),135.72(5'-C),158.81(1'-C),169.34,170.10,170.20,170.33(CH3 CO),189.29(CHO).FAB-MS(m-NBA) m/z 452(M+ ),451([M-H]+ ).The residue was subjected to a column chromatography, and was separated by hexane-ethyl acetate (3:2) to give a colorless viscous oil (652 mg). This was recrystallized from hexane-diethyl ether (7:2) to give colorless crystals (6) (454 mg, 98%). The analysis results of the obtained product were as follows. Colorless needles [Diethyl ether-n-Hexane (7/2)], mp 113-114 ° C. IR (KBr) 2982 (CH), 1748, 1698 (C=O), 1603, 1487 (C=C), 1234 , 1093, 1044 (COC), 768 cm -1 (CH). 1 H NMR (270MHz, CDCl 3 ) δ 2.03 (3H, s, CH 3 ), 2.07 (6H, s, CH 3 ), 2.21. s, CH 3 ), 4.07-4.33 (3H, m, 5-, 6-H), 5.16 (1H, dd, J = 3.4, 10.5 Hz, 3-H), 5.17 (1H, d, J = 8.0 Hz , 1-H), 5.50 (1H, d, J = 3.4 Hz, 4-H), 5.60 (1H, dd, J = 8.0, 10.5 Hz, 2-H), 7.14 (1H, d, J = 8.4 Hz) , 6'-H), 7.19 (1H, t, J = 7.6 Hz, 4'-H), 7.57 (1H, ddd, J = 1.7, 7.6, 8.4 Hz, 5'-H), 7.87 (1H, dd , J = 1.7, 7.6 Hz, 3'-H), 10.37 (1H, s, CHO). 13 C NMR (67.8 MHz, CDCl 3 ) δ 20.58 (CH 3 ), 20.66 (CH 3 × 3), 61.28 (CH 2 ), 66.74, 68.34, 70.58, 71.27 (2,3,4,5-C), 99.44 (1-C), 115.72 (6'-C), 123.50 (4'-C), 126.09 (2 '-C), 128.28 (3'-C), 135.72 (5'-C), 158.81 (1'-C), 169.34, 170.10, 170.20, 170.33 (CH 3 CO), 189.29 (CHO). FAB-MS (m-NBA) m/z 452(M + ), 451([MH] + ).

[數3][Number 3]

-12.4(c 1.00,CHCl3 ).Anal. Calcd for C21 H24 O11 :C,55.75;H,5.35%.Found:C,55.94;H,5.44%. -12.4 (c 1.00, CHCl 3 ). Anal. Calcd for C 21 H 24 O 11 : C, 55.75; H, 5.35%. Found: C, 55.94; H, 5.44%.

[合成例5]3-甲醯基苯基四-O-乙醯基-β-D-半乳糖皮蒽(7)之合成[Synthesis Example 5] Synthesis of 3-methylnonylphenyltetra-O-ethylidene-β-D-galactosylpyrene (7)

【化10】【化10】

氮氣流下,對m-羥基苯甲醛(122mg,1.0mmol)之喹啉溶液(2.0ml)添加2,3,4,6-四-O-乙醯基-α-D-溴化半乳哌喃糖(5)(822mg,2.0mmol)、及氧化銀(464mg,2.0mmol),在室溫下攪拌75分鐘。反應結束後,以苯(60ml)進行萃取,過濾分離不溶物。2,3,4,6-tetra-O-ethylindenyl-α-D-bromopentamethylene bromide was added to a quinoline solution (2.0 ml) of m-hydroxybenzaldehyde (122 mg, 1.0 mmol) under a nitrogen stream. Sugar (5) (822 mg, 2.0 mmol) and silver oxide (464 mg, 2.0 mmol) were stirred at room temperature for 75 minutes. After completion of the reaction, extraction was carried out with benzene (60 ml), and the insoluble material was separated by filtration.

其次,將萃取液以1%鹽酸(20ml)進行10次洗淨後,以1%碳酸氫鈉水溶液(20ml)進行10次洗淨。將有機層以硫酸鎂乾燥後,進行減壓濃縮得到黃色黏性油(751mg)。Next, the extract was washed 10 times with 1% hydrochloric acid (20 ml), and then washed 10 times with a 1% aqueous sodium hydrogencarbonate solution (20 ml). The organic layer was dried over magnesium sulfate and concentrated under reduced pressure to yield yellow oil (yield: 751 mg).

將殘渣附交柱式色層分析儀,藉由己烷-乙酸乙酯(3:2)溶析分離,得到無色黏性油(445mg)。將此由己烷-二乙基醚(7:2)進行再結晶得到無色棱晶(7)(381mg,85%)。所得之生成物之分析結果如以下般。Colorless prisms[Diethyl ether-n-Hexane(7/2)],mp 96-97℃.IR(KBr) 2986(CH),1752,1707(C=O),1597,1487(C=C),1228,1083,1065(C-O-C),801,687cm-1 (CH).1 H NMR(270MHz,CDCl3 )δ2.03(3H,s,CH3 ),2.08(3H,s,CH3 ),2.10(3H,s,CH3 ),2.20(3H,s,CH3 ),4.14(1H,ddd,J=0.8,5.1,7.0Hz,5-H),4.20(1H,d,J=5.1Hz,6-H),4.21(1H,d,J=7.0Hz,6-H),5.14(1H,dd,J=3.4,10.5Hz,3-H),5.15(1H,d,J=8.0Hz,1-H),5.49(1H,dd,J=3.4,0.8Hz,4-H),5.53(1H,dd,J=8.0,10.5Hz,2-H),7.28(1H,ddd,J=1.3,3.0,7.6Hz,6'-H),7.49(1H,t,J=7.6Hz,5'-H),7.53(1H,dd,J=1.3,3.0Hz,2'-H),7.59(1H,dt,J=7.6,1.3Hz,4'-H),9.99(1H,s,CHO).13 C NMR(67.8MHz,CDCl3 )δ20.59(CH3 ),20.63(CH3 ),20.66(CH3 ),20.75(CH3 ),61.63(CH2 ),66.97,68.50,70.74,71.43(2,3,4,5-C),99.17(1-C),115.18,123.70,125.95,130.31(2',4',5',6'-C),137.91(3'-C),157.32(1'-C),169.40,170.10,170.22,170.56(CH3 CO),191.50(CHO).The residue was subjected to a column chromatography, and separated by hexane-ethyl acetate (3:2) to give a colorless viscous oil (445 mg). This was recrystallized from hexane-diethyl ether (7:2) to give colorless crystals (7) (381 mg, 85%). The analysis results of the obtained product were as follows. Colorless prisms [Diethyl ether-n-Hexane (7/2)], mp 96-97 ° C. IR (KBr) 2986 (CH), 1752, 1707 (C=O), 1597, 1487 (C=C), 1228 , 1083, 1065 (COC), 801, 687 cm -1 (CH). 1 H NMR (270MHz, CDCl 3 ) δ 2.03 (3H, s, CH 3 ), 2.08 (3H, s, CH 3 ), 2.10 (3H , s, CH 3 ), 2.20 (3H, s, CH 3 ), 4.14 (1H, ddd, J = 0.8, 5.1, 7.0 Hz, 5-H), 4.20 (1H, d, J = 5.1 Hz, 6- H), 4.21 (1H, d, J = 7.0 Hz, 6-H), 5.14 (1H, dd, J = 3.4, 10.5 Hz, 3-H), 5.15 (1H, d, J = 8.0 Hz, 1- H), 5.49 (1H, dd, J = 3.4, 0.8 Hz, 4-H), 5.53 (1H, dd, J = 8.0, 10.5 Hz, 2-H), 7.28 (1H, ddd, J = 1.3, 3.0) , 7.6 Hz, 6'-H), 7.49 (1H, t, J = 7.6 Hz, 5'-H), 7.53 (1H, dd, J = 1.3, 3.0 Hz, 2'-H), 7.59 (1H, Dt, J = 7.6, 1.3 Hz, 4'-H), 9.99 (1H, s, CHO). 13 C NMR (67.8 MHz, CDCl 3 ) δ 20.59 (CH 3 ), 20.63 (CH 3 ), 20.66 ( CH 3 ), 20.75 (CH 3 ), 61.63 (CH 2 ), 66.97, 68.50, 70.74, 71.43 (2, 3, 4, 5-C), 99.17 (1-C), 115.18, 123.70, 125.95, 130.31 ( 2', 4', 5', 6'-C), 137.91 (3'-C), 157.32 (1'-C), 169.40, 170.10, 170.22, 170.56 (CH 3 CO), 191.50 (CHO).

[數4][Number 4]

-11.2(c 1.00,CHCl3 ).Anal. Calcd for C21 H24 O11 :C,55.75;H,5.35%.Found:C,55.83;H,5.36%. -11.2 (c 1.00, CHCl 3 ). Anal. Calcd for C 21 H 24 O 11 : C, 55.75; H, 5.35%. Found: C, 55.83; H, 5.36%.

[合成例6]4-甲醯基苯基四-O-乙醯基-β-D-半乳糖皮蒽(8)之合成[Synthesis Example 6] Synthesis of 4-methylnonylphenyltetra-O-ethylidene-β-D-galactosylpyrene (8)

【化11】【化11】

氮氣流下,對p-羥基苯甲醛(123mg,1.0mmol)之喹啉溶液(2.0ml)添加2,3,4,6-四-O-乙醯基-α-D-溴化半乳哌喃糖(5)(822mg,2.0mmol)、及氧化銀(464mg,2.0mmol),在室溫下攪拌75分鐘。反應結束後,以苯(60ml)進行萃取,過濾分離不溶物。其次,將萃取液以1%鹽酸(20ml)進行10次洗淨後,以1%碳酸氫鈉水溶液(20ml)進行10次洗淨。將有機層以硫酸鎂乾燥後,進行減壓濃縮得到黃色黏性油(725mg)。將殘渣附交柱式色層分析儀,藉由己烷-乙酸乙酯(3:2)溶析分離,得到無色黏性油(436mg)。將此由己烷-二乙基醚(7:2)進行再結晶得到無色針狀晶(8)(392mg,87%)。所得之生成物之分析結果如以下般。Colorless needles[Diethyl ether-n-Hexane(7/2)],mp 118-119℃.IR(KBr) 2832(CH),1742,1702(C=O),1605,1510(C=C),1228,1083,1050(C-O-C),843cm-1 (CH).1 H NMR(270MHz,CDCl3 )δ2.03(3H,s,CH3 ),2.08(6H,s,CH3 ×2),2.20(3H,s,CH3 ),4.10-4.30(3H,m,5,6-H),5.15(1H,dd,J=3.8,10.5Hz,3-H),5.19(1H,d,J=8.0Hz,1-H),5.49(1H,d,J=3.8Hz,4-H),5.53(1H,dd,J=8.0,10.5Hz,2-H),7.12(2H,d,J=8.4Hz,2',6'-H),7.86(2H,d,J=8.4Hz,3',5'-H),9.93(1H,s,CHO).13 C NMR(67.8MHz,CDCl3 )δ20.59(CH3 ),20.66(CH3 ×2),20.72(CH3 ),61.37(CH2 ),66.76,68.39,70.67,71.34(2,3,4,5-C),99.58(1-C),116.75(2',6'-C),131.84(3',4',5'-C),161.29(1'-C),169.32,170.10,170.19,170.35(CH3 CO),190.74(CHO).2,3,4,6-tetra-O-ethylindolyl-α-D-bromopentalin was added to a quinoline solution (2.0 ml) of p-hydroxybenzaldehyde (123 mg, 1.0 mmol) under a nitrogen stream. Sugar (5) (822 mg, 2.0 mmol) and silver oxide (464 mg, 2.0 mmol) were stirred at room temperature for 75 minutes. After completion of the reaction, extraction was carried out with benzene (60 ml), and the insoluble material was separated by filtration. Next, the extract was washed 10 times with 1% hydrochloric acid (20 ml), and then washed 10 times with a 1% aqueous sodium hydrogencarbonate solution (20 ml). The organic layer was dried over magnesium sulfate and concentrated under reduced pressure to yield yellow oil (725 mg). The residue was subjected to a column chromatography to give a colorless viscous oil (436 mg) eluting with hexane-ethyl acetate (3:2). This was recrystallized from hexane-diethyl ether (7:2) to give colorless crystals (8) (392 mg, 87%). The analysis results of the obtained product were as follows. Colorless needles [Diethyl ether-n-Hexane (7/2)], mp 118-119 ° C. IR (KBr) 2832 (CH), 1742, 1702 (C=O), 1605, 1510 (C=C), 1228 , 1083, 1050 (COC), 843 cm -1 (CH). 1 H NMR (270MHz, CDCl 3 ) δ 2.03 (3H, s, CH 3 ), 2.08 (6H, s, CH 3 × 2), 2.20 ( 3H, s, CH 3 ), 4.10-4.30 (3H, m, 5, 6-H), 5.15 (1H, dd, J = 3.8, 10.5 Hz, 3-H), 5.19 (1H, d, J = 8.0 Hz, 1-H), 5.49 (1H, d, J = 3.8 Hz, 4-H), 5.53 (1H, dd, J = 8.0, 10.5 Hz, 2-H), 7.12 (2H, d, J = 8.4) Hz, 2', 6'-H), 7.86 (2H, d, J = 8.4 Hz, 3', 5'-H), 9.93 (1H, s, CHO). 13 C NMR (67.8 MHz, CDCl 3 ) Δ20.59(CH 3 ), 20.66(CH 3 ×2), 20.72(CH 3 ), 61.37(CH 2 ), 66.76,68.39,70.67,71.34(2,3,4,5-C),99.58(1 -C), 116.75 (2', 6'-C), 131.84 (3', 4', 5'-C), 161.29 (1'-C), 169.32, 170.10, 170.19, 170.35 (CH 3 CO), 190.74 (CHO).

[數5][Number 5]

-2.5(c 1.00,CHCl3 ).Anal. Calcd for C21 H24 O11 :C,55.75;H,5.35%.Found:C,55.82;H,5.36%. -2.5 (c 1.00, CHCl 3 ). Anal. Calcd for C 21 H 24 O 11 : C, 55.75; H, 5.35%. Found: C, 55.82; H, 5.36%.

[合成例7]2,4-雙(2,3,4,6-四-O-乙醯基-β-D-葡苷氧基)苄醛(9)之合成[Synthesis Example 7] Synthesis of 2,4-bis(2,3,4,6-tetra-O-ethinyl-β-D-glucosideoxy)benzaldehyde (9)

【化12】【化12】

氮氣流下,對2,4-二羥基苯甲醛(138mg,1.0mmol)之喹啉溶液(3.0ml)添加四-O-乙醯基-α-D-溴化吡喃葡糖(1)(1233mg,3.0mmol)、及氧化銀(495mg,3.0mmol),在室溫下75攪拌分鐘。反應結束後,以苯(60ml)進行萃取,過濾分離不溶物。其次,將萃取液以1%鹽酸(20ml)進行10次洗淨後,以1%碳酸氫鈉水溶液(20ml)進行10次洗淨。將有機層以硫酸鎂乾燥後,進行減壓濃縮得到作殘渣之黃色黏性油(1085mg)。將殘渣附交柱式色層分析儀,藉由己烷-乙酸乙酯(3:2)溶析分離,得到黃色黏性油(801mg)。將此以二乙基醚(30ml)萃取,將不溶物之黃色黏性油(105mg)過濾分離。其次,將萃取液濃縮得到白色黏性油(733mg,92%)。將此由己烷-乙醇(3:1)進行再結晶得到無色針狀晶(9)(680mg,85%,mp179-180℃)。所得之生成物之分析結果如以下般。Colorless needles,[n-Hexane-Ethanol(3:1)],mp 179-180℃.IR(KBr) 2966(C-H),1760,1688(C=O),1607,1497(C=C),1226,1040(O-C=O),820cm-1 (CH).1 H NMR(270MHz CDCl3 )δ2.05(9H,s,CH3 ),2.07(12H,s,CH3 ),2.12(3H,s,CH3 ),3.85-4.02(2H,m,6-H),4.17(2H,ddd,J=2.5,9.7,12.4Hz,5-H),4.29(2H,dd,J=5.3,12.4Hz,6-H),5.06-5.43(8H,m,1,2,3,4-H),6.67(1H,d,J=2.1Hz,3’-H),6.74(1H,dd,J=2.1,8.9Hz,5’-H),7.85(1H,d,J=8.9Hz,6’-H),10.21(1H,s,CHO).Add 4,4-dihydroxymethyl-α-D-bromoglucopyranose (1) to 2,4-dihydroxybenzaldehyde (138 mg, 1.0 mmol) in quinoline solution (1,3 mg) under a nitrogen stream (1233 mg) 3.0 mmol) and silver oxide (495 mg, 3.0 mmol) were stirred at room temperature for 75 minutes. After completion of the reaction, extraction was carried out with benzene (60 ml), and the insoluble material was separated by filtration. Next, the extract was washed 10 times with 1% hydrochloric acid (20 ml), and then washed 10 times with a 1% aqueous sodium hydrogencarbonate solution (20 ml). The organic layer was dried over magnesium sulfate and concentrated under reduced pressure to yield yellow oil (1085 mg) as residue. The residue was subjected to a column chromatography to give a yellow viscous oil (801 mg) by hexane-ethyl acetate (3:2). This was extracted with diethyl ether (30 ml), and the insoluble yellow oil (105 mg) was filtered. Next, the extract was concentrated to give a white viscous oil (733 mg, 92%). This was recrystallized from hexane-ethanol (3:1) to give colorless crystals (9) (680 mg, 85%, mp 179-180 ° C). The analysis results of the obtained product were as follows. Colorless needles, [n-Hexane-Ethanol (3:1)], mp 179-180 ° C. IR (KBr) 2966 (CH), 1760, 1688 (C=O), 1607, 1497 (C=C), 1226 , 1040 (OC=O), 820 cm -1 (CH). 1 H NMR (270 MHz CDCl 3 ) δ 2.05 (9H, s, CH 3 ), 2.07 (12H, s, CH 3 ), 2.12 (3H, s , CH 3 ), 3.85-4.02 (2H, m, 6-H), 4.17 (2H, ddd, J = 2.5, 9.7, 12.4 Hz, 5-H), 4.29 (2H, dd, J = 5.3, 12.4 Hz , 6-H), 5.06-5.43 (8H, m, 1, 2, 3, 4-H), 6.67 (1H, d, J = 2.1 Hz, 3'-H), 6.74 (1H, dd, J = 2.1, 8.9 Hz, 5'-H), 7.85 (1H, d, J = 8.9 Hz, 6'-H), 10.21 (1H, s, CHO).

[合成例8]3,5-雙(2,3,4,6-四-O-乙醯基-β-D-葡苷氧基)苄醛(10)之合成[Synthesis Example 8] Synthesis of 3,5-bis(2,3,4,6-tetra-O-ethinyl-β-D-glucosideoxy)benzaldehyde (10)

【化13】【化13】

氮氣流下,對3,5-二羥基苯甲醛(69mg,0.5mmol)之喹啉溶液(2ml)添加四-O-乙醯基-α-D-溴化吡喃葡糖(1)(613mg,1.5mmol)、及氧化銀(347mg,1.5mmol),在室溫下75攪拌分鐘。反應結束後,以三氯甲烷(50ml)進行萃取,過濾分離不溶物。其次,將萃取液以1%鹽酸(20ml)進行5次洗淨後,以1%碳酸氫鈉水溶液(20ml)進行5次洗淨。將有機層以硫酸鎂乾燥後,得到殘渣之黃色固體(682mg)。將殘渣附交柱式色層分析儀,藉由己烷-乙酸乙酯(3:2)溶析分離,得到白色固體(301mg)。將此由乙醇進行再結晶得到無色針狀晶(10)(241mg,60%,mp113-114℃)。所得之生成物之分析結果如以下般。Colorless needles,(Ethanol),mp 113-114℃.IR(KBr) 2966(C-H),1756,1702(C=O),1609,1460(C=C),1234,1215,1080,1069,1042(O-C=O),907cm-1 (CH).1 H NMR(270MHz CDCl3 )δ2.04(6H,s,CH3 ),2.07(6H,s,CH3 ),2.07(6H,s,CH3 ),2.10(6H,s,CH3 ),3.94(2H,ddd,J=2.7,5.7,11.4Hz,5-H),4.18(2H,dd,J=2.7,12.2Hz,6-H),4.25(2H,dd,J=5.7,12.2Hz,6-H),5.09-5.38(8H,m,1,2,3,4-H),6.86(1H,t,J=2.3Hz,4’-H),7.21(2H,d,J=2.3Hz,2’,6’-H),9.90(1H,s,CHO).To a solution of 3,5-dihydroxybenzaldehyde (69 mg, 0.5 mmol) in quinoline (2 ml) was added tetrakis-O-acetamido-α-D-glucopyranose (1) (613 mg, under a nitrogen stream). 1.5 mmol) and silver oxide (347 mg, 1.5 mmol) were stirred at room temperature for 75 minutes. After completion of the reaction, extraction was carried out with chloroform (50 ml), and the insoluble material was separated by filtration. Next, the extract was washed five times with 1% hydrochloric acid (20 ml), and then washed with a 1% aqueous sodium hydrogencarbonate solution (20 ml). The organic layer was dried (MgSO4)iel The residue was subjected to chromatography on a column chromatography, eluting with hexane-ethyl acetate (3:2) to afford white solid (301mg). This was recrystallized from ethanol to give colorless needle crystals (10) (241 mg, 60%, mp 113-114 ° C). The analysis results of the obtained product were as follows. Colorless needles, (Ethanol), mp 113-114 ° C. IR (KBr) 2966 (CH), 1756, 1702 (C=O), 1609, 1460 (C=C), 1234, 1215, 1080, 1069, 1042 ( OC=O), 907cm -1 (CH). 1 H NMR (270MHz CDCl 3 ) δ2.04 (6H, s, CH 3 ), 2.07 (6H, s, CH 3 ), 2.07 (6H, s, CH 3 ) ), 2.10 (6H, s, CH 3 ), 3.94 (2H, ddd, J = 2.7, 5.7, 11.4 Hz, 5-H), 4.18 (2H, dd, J = 2.7, 12.2 Hz, 6-H), 4.25 (2H, dd, J=5.7, 12.2 Hz, 6-H), 5.09-5.38 (8H, m, 1, 2, 3, 4-H), 6.86 (1H, t, J = 2.3 Hz, 4' -H), 7.21 (2H, d, J = 2.3 Hz, 2', 6'-H), 9.90 (1H, s, CHO).

[合成例9]2,4,6-參(2,3,4,6-四-O-乙醯基-β-D-葡苷氧基)苄醛(11)之合成[Synthesis Example 9] Synthesis of 2,4,6-parade (2,3,4,6-tetra-O-ethinyl-β-D-glucosyloxy)benzaldehyde (11)

【化14】【化14】

氮氣流下,對2,4,6-三羥基苯甲醛(77mg,0.5mmol)之喹啉溶液(3ml)添加四-O-乙醯基-α-D-溴化吡喃葡糖(1)(924mg,2.25mmol)、及氧化銀(519mg,2.25mmol),在室溫攪拌2小時。反應結束後,以苯(50ml)進行萃取,過濾分離不溶物。其次,將萃取液以1%鹽酸(20ml)進行10次洗淨後,以1%碳酸氫鈉水溶液(20ml)進行10次洗淨。將有機層以硫酸鎂乾燥後,進行減壓濃縮得到殘渣之黃色油(723mg)。將殘渣附交柱式色層分析儀,藉由己烷-乙酸乙酯(2:3)溶析分離,得到白色黏性油(407mg)。將此由乙醇進行再結晶得到白色粉末(11)(367mg,64%,mp225-226℃)。所得之生成物之分析結果如以下般。White powder,(Ethanol),mp 225-226℃.IR(KBr) 2948(C-H),1760,1698(C=O),1607(C=C),1230,1061,1044(O-C=O),907cm-1 (CH).1 H NMR(270MHz CDCl3 )δ2.04(9H,s,CH3 ),2.05(3H,s,CH3 ),2.06(15H,s,CH3 ),2.09(3H,s,CH3 ),2.13(6H,s,CH3 ),3.85-4.36(9H,m,5,6-H),5.10-5.48(12H,m,1,2,3,4-H),6.49(2H,s,Ar-H),10.14(1H,s,CHO).4-O-Ethyl-α-D-bromoglucopyranose (1) was added to a solution of 2,4,6-trihydroxybenzaldehyde (77 mg, 0.5 mmol) in quinoline (3 ml) under a nitrogen stream ( 924 mg, 2.25 mmol), and silver oxide (519 mg, 2.25 mmol) were stirred at room temperature for 2 hours. After completion of the reaction, extraction was carried out with benzene (50 ml), and the insoluble material was separated by filtration. Next, the extract was washed 10 times with 1% hydrochloric acid (20 ml), and then washed 10 times with a 1% aqueous sodium hydrogencarbonate solution (20 ml). The organic layer was dried (MgSO4), evaporated, evaporated The residue was subjected to a column chromatography to give a white viscous oil (407 mg) by eluting with hexane-ethyl acetate (2:3). This was recrystallized from ethanol to give a white powder (11) (367 mg, 64%, mp 225-226 ° C). The analysis results of the obtained product were as follows. White powder, (Ethanol), mp 225-226 ° C. IR (KBr) 2948 (CH), 1760, 1698 (C=O), 1607 (C=C), 1230, 1061, 1044 (OC=O), 907 cm -1 (CH). 1 H NMR (270MHz CDCl 3 ) δ 2.04 (9H, s, CH 3 ), 2.05 (3H, s, CH 3 ), 2.06 (15H, s, CH 3 ), 2.09 (3H, s, CH 3 ), 2.13 (6H, s, CH 3 ), 3.85-4.36 (9H, m, 5, 6-H), 5.10-5.48 (12H, m, 1, 2, 3, 4-H), 6.49 (2H, s, Ar-H), 10.14 (1H, s, CHO).

[1]C60衍生物之製造[1] Manufacture of C60 derivatives [實施例1]具有2-(四-O-乙醯基-β-D-葡萄哌喃糖氧基)苯基取代吡咯啶體之C60(13)之合成[Example 1] Synthesis of C60 (13) having 2-(tetra-O-ethinyl-β-D-glucopyranosyloxy)phenyl-substituted pyrrolidine

【化15】【化15】

氮氣流下,對C60(288mg,0.4mmol)之乾燥p-茬溶液(200ml)添加合成例1中所得之o-甲醯基苯基2,3,4,6-四-O-乙醯基-β-D-吡喃葡萄糖苷(2)(181mg,0.4mmol)、及肌胺酸(36mg,0.4mmol),使用迪安-斯塔克裝置將水一邊去除,同時進行8小時加熱迴流。O-methylmercaptophenyl 2,3,4,6-tetra-O-ethenyl group obtained in Synthesis Example 1 was added to a dry p-hydrazine solution (200 ml) of C60 (288 mg, 0.4 mmol) under a nitrogen stream. β-D-glucopyranoside (2) (181 mg, 0.4 mmol) and creatinine (36 mg, 0.4 mmol) were removed while using a Dean-Stark apparatus while heating and refluxing for 8 hours.

將使反應液減壓濃縮所得之黑褐色固體(537mg)附交柱式色層分析儀。藉由二硫化碳溶析分離回收C60(105mg,36%)後,藉由苯-乙酸乙酯(5:1)溶析分離得到黑褐色固體[267mg,56%(87%)]。更將黑褐色固體以苯(4ml)進行加熱溶解後,放置冷卻下加入乙醇(20ml)再沈澱得到黑褐色固體(13)[228mg,48%(74%)]。所得之生成物之分析結果如以下般。Dark brown solid,mp>300℃.Relative ratio of diastereomers determined by1 H NMR:2/3IR(KBr) 2952,2784(CH),1760(C=O),1226,1040(O-C=O),756(CH),526cm-1 (C60 ).1 H NMR(270MHz,CDCl3 )δ1.96(1.2H,s,CH3 ),2.02,2.03(each 1.2H,s,CH3 ),2.05(3.6H,s,CH3 ),2.07(3H,s,CH3 ),2.29(1.8H,s,CH3 ),2.74(1.2H,s,N-CH3 ),2.75(1.8H,s,N-CH3 ),3.75-3.88(1H,m,5’-H),4.02-4.35(3H,m,one of 5-H,6’-H),4.97(0.6H,d,J=8.9Hz,5-H),5.04(0.4H,d,J=10.1Hz,5-H),5.14-5.47(4.6H,m,1’,2’,3’,4’-H,2-H),5.63(0.4H,s,2-H),7.06-7.14(1H,m,Ar-H),7.17-7.34(2H,m,Ar-H),7.98-8.08(1H,m,Ar-H).FAB-MS(m-NBA) m/z 1200([M+H]+ ),720(C60 ).UV-VIS(CHCl3 )λmax nm(log ε) 431(3.53).HPLC(ODS,CHCl3 ,flow rate 1ml/min) retention time 2.56min.The dark brown solid (537 mg) obtained by concentration of the reaction mixture under reduced pressure was applied to a column chromatography. The C60 (105 mg, 36%) was separated by EtOAc (EtOAc:EtOAc) Further, the dark brown solid was dissolved in benzene (4 ml), and the mixture was evaporated to ethyl ether (20 ml) and evaporated to give a dark brown solid (13) [228 mg, 48% (74%). The analysis results of the obtained product were as follows. Dark brown solid, mp>300°C.Relative ratio of diastereomers determined by 1 H NMR: 2/3IR (KBr) 2952, 2784 (CH), 1760 (C=O), 1226, 1040 (OC=O), 756 ( CH), 526 cm -1 (C 60 ). 1 H NMR (270MHz, CDCl 3 ) δ 1.96 (1.2H, s, CH 3 ), 2.02, 2.03 (each 1.2H, s, CH 3 ), 2.05 (3.6 H, s, CH 3 ), 2.07 (3H, s, CH 3 ), 2.29 (1.8H, s, CH 3 ), 2.74 (1.2H, s, N-CH 3 ), 2.75 (1.8H, s, N -CH 3 ), 3.75-3.88 (1H, m, 5'-H), 4.02-4.35 (3H, m, one of 5-H, 6'-H), 4.97 (0.6H, d, J = 8.9 Hz , 5-H), 5.04 (0.4H, d, J = 10.1 Hz, 5-H), 5.14 - 5.47 (4.6H, m, 1', 2', 3', 4'-H, 2-H) , 5.63 (0.4H, s, 2-H), 7.06-7.14 (1H, m, Ar-H), 7.17-7.34 (2H, m, Ar-H), 7.98-8.08 (1H, m, Ar-H .FAB-MS(m-NBA) m/z 1200([M+H] + ), 720(C 60 ).UV-VIS(CHCl 3 )λmax nm(log ε) 431(3.53).HPLC(ODS) , CHCl 3 , flow rate 1ml/min) retention time 2.56min.

[實施例2]具有3-(四-O-乙醯基-β-D-葡萄哌喃糖氧基)苯基取代吡咯啶體之C60(15)之合成[Example 2] Synthesis of C60 (15) having 3-(tetra-O-ethinyl-β-D-glucopyranosyloxy)phenyl-substituted pyrrolidine

【化16】【化16】

氮氣流下,對C60(288mg,0.4mmol)之乾燥p-茬溶液(200ml)添加合成例2中所得之m-甲醯基苯基2,3,4,6-四-O-乙醯基-β-D-吡喃葡萄糖苷(3)(181mg,0.4mmol)及肌胺酸(37mg,0.4mmol),使用迪安-斯塔克裝置一邊除去水,同時8小時加熱迴流。The m-methylphenylphenyl 2,3,4,6-tetra-O-ethenyl group obtained in Synthesis Example 2 was added to a dry p-hydrazine solution (200 ml) of C60 (288 mg, 0.4 mmol) under a nitrogen stream. β-D-glucopyranoside (3) (181 mg, 0.4 mmol) and creatinine (37 mg, 0.4 mmol) were removed using a Dean-Stark apparatus while heating under reflux for 8 hours.

將使反應液減壓濃縮所得之黑褐色固體(502mg)交附柱式色層分析儀。藉由二硫化碳溶析分離回收C60(98mg,34%)後,藉由苯-乙酸乙酯(5:1)溶析分離得到黑褐色固體[229mg,48%(72%)]。更將黑褐色固體以苯(4ml)加熱溶解後,放置冷卻下加入乙醇(20ml)再沈澱得到黑褐色固體(15)[223mg,46%(71%)]。所得之生成物之分析結果如以下般。Brown solid,mp>300℃.Relative ratio of diastereomers determind by1 H NMR:8/7IR(KBr) 2950,2782(CH),1760(C=O),1228,1050(O-C=O),526cm-1 (C60 ).1 H NMR(270MHz,CDCl3 :CS2 =1:2)δ1.96(3H,s,CH3 ),1.97(4.6H,s,CH3 ),1.99(1.4H,s,CH3 ),2.01(1.4H,s,CH3 ),2.03(1.6H,s,CH3 ),2.78(1.6H,s,N-CH3 ),2.79(1.4H,s,N-CH3 ),4.04(1H,dd,J=2.7,9.5Hz,6'-H),4.23(1H,d,J=9.7Hz,5-H),4.22-4.33(1H,m,6'-H),4.87(1H,s,2-H),4.94(0.54H,d,J=9.2Hz,5-H),4.95(0.46H,d,J=9.2Hz,5-H),4.96-5.24(4H,m,1',2',3',4'-H),6.83-6.93(1H,m,Ar-H),7.24-7.34(1H,m,Ar-H),7.35-7.59(2H,m,Ar-H).UV-VIS(CHCl3 )λmax nm(log ε) 431(3.59).HPLC(ODS,CHCl3 ,flow rate 1ml/min) retention time 2.61min.The dark brown solid (502 mg) obtained by concentration of the reaction mixture under reduced pressure was applied to a column chromatography. The C60 (98 mg, 34%) was separated by EtOAc (EtOAc:EtOAc) The dark brown solid was dissolved in EtOAc (4 mL). The analysis results of the obtained product were as follows. Brown solid, mp>300°C.Relative ratio of diastereomers determind by 1 H NMR: 8/7IR (KBr) 2950, 2782 (CH), 1760 (C=O), 1228, 1050 (OC=O), 526 cm -1 (C 60 ). 1 H NMR (270 MHz, CDCl 3 : CS 2 = 1: 2) δ 1.96 (3H, s, CH 3 ), 1.97 (4.6H, s, CH 3 ), 1.99 (1.4H, s , CH 3 ), 2.01 (1.4H, s, CH 3 ), 2.03 (1.6H, s, CH 3 ), 2.78 (1.6H, s, N-CH 3 ), 2.79 (1.4H, s, N-CH 3 ), 4.04 (1H, dd, J = 2.7, 9.5 Hz, 6'-H), 4.23 (1H, d, J = 9.7 Hz, 5-H), 4.22-4.33 (1H, m, 6'-H ), 4.87 (1H, s, 2-H), 4.94 (0.54H, d, J = 9.2 Hz, 5-H), 4.95 (0.46H, d, J = 9.2 Hz, 5-H), 4.96-5.24 (4H, m, 1', 2', 3', 4'-H), 6.83-6.93 (1H, m, Ar-H), 7.24-7.34 (1H, m, Ar-H), 7.35-7.59 ( 2H, m, Ar-H). UV-VIS (CHCl 3 ) λ max nm (log ε) 431 (3.59). HPLC (ODS, CHCl 3 , flow rate 1 ml/min) retention time 2.61 min.

[實施例3]具有4-(四-O-乙醯基-β-D-葡萄哌喃糖氧基)苯基取代吡咯啶體之C60(17)之合成[Example 3] Synthesis of C60(17) having 4-(tetra-O-ethinyl-β-D-glucopyranosyloxy)phenyl-substituted pyrrolidine

【化17】【化17】

氮氣流下,對C60(288mg,0.4mmol)之乾燥p-茬溶液(200ml)添加合成例3所得之p-甲醯基苯基2,3,4,6-四-O-乙醯基-β-D-吡喃葡萄糖苷(4)(181mg,0.4mmol)及肌胺酸(36mg,0.4mmol),使用迪安-斯塔克裝置一邊除去水,同時8小時加熱迴流。The p-formylphenyl 2,3,4,6-tetra-O-ethenyl-β obtained in Synthesis Example 3 was added to a dry p-hydrazine solution (200 ml) of C60 (288 mg, 0.4 mmol) under a nitrogen stream. -D-glucopyranoside (4) (181 mg, 0.4 mmol) and creatinine (36 mg, 0.4 mmol) were removed using a Dean-Stark apparatus while heating under reflux for 8 hours.

將使反應液減壓濃縮所得之黑褐色固體(533mg)交附柱式色層分析儀。藉由二硫化碳溶析分離回收C60(135mg,47%)後,藉由苯-乙酸乙酯(5:1)溶析分離得到黑褐色固體[216mg,45%(85%)]。更將黑褐色固體以苯(4ml)加熱溶解後,放置冷卻下加入乙醇(20ml)再沈澱得到黑褐色固體(17)[158mg,33%(76%)]。所得之生成物之分析結果如以下般。Brown solid,mp>300℃.IR(KBr) 2950(CH),1758(C=O),1226,1038(O-C=O),526cm-1 (C60 ).1 H NMR(270MHz,CDCl3 )δ2.03,2.04,2.05,2.07(each 3H,s,CH3 ),2.78(3H,s,N-CH3 ),3.89(1H,ddd,J=2.1,5.5,10.1Hz,5'-H),4.16(1H,dd,J=2.1,12.3Hz,6'-H),4.25,4.98(each 1H,d,J=9.7Hz,5-H),4.26-4.35(1H,m,6'-H),4.90(1H,s,2-H),5.09-5.34(4H,m,1',2',3',4'-H),7.05,7.74(each 2H,d,J=8.9Hz,Ar-H).13 C NMR(67.8MHz,CDCl3 )δ20.61(CH3 ×2),20.72,20.77(CH3 ),40.00(N-CH3 ),61.94(6'-C),68.25(CH),68.28,68.98(3,4-C),69.99(5-C),71.16,72.04,72.69(CH),83.00(2-C),98.85(1'-C),117.03(2"-C),130.60(3"-C),131.86,131.95,135.70,135.87,136.46,136.91,139.60,139.89,139.93,140.20,141.54,141.70,141.83,141.94,141.99,142.05,142.10(2C),142.14,142.17,142.26(2C),142.59(2C),142.71,143.02,143.18,144.38,144.42,144.60,144.72,145.17,145.24(2C),145.30,145.35(2C),145.44,145.50,145.53(2C),145.75,145.98,146.13,146.16(2C),146.20(2C),146.32(2C),146.45,146.65,147.33(2C),153.22,153.37,154.00,156.22,156.75,156.82(C60 ,1"-,4"-C),169.31,169.40,170.24,170.58(C=O).FAB-MS(m-NBA) m/z 1200([M+H]+ ),720(C60 ).UV-VIS(CHCl3 )λmax nm(log ε) 431(3.68).HPLC(ODS,CHCl3 ,flow rate 1ml/min) retention time 2.62min. Anal. Calcd for C83 H29 O10 N:C,83.07;H,2.44;N,1.17%.Found:C,82.26;H,2.90;N,1.25%.The dark brown solid (533 mg) obtained by concentration of the reaction mixture under reduced pressure was applied to a column chromatography. The C60 (135 mg, 47%) was separated by EtOAc (EtOAc) (EtOAc) Further, the dark brown solid was dissolved in benzene (4 ml), and then evaporated to ethyl ether (20 ml) to give a dark brown solid (17) [158 mg, 33% (76%)]. The analysis results of the obtained product were as follows. Brown solid, mp>300°C.IR(KBr) 2950(CH), 1758(C=O), 1226,1038(OC=O), 526cm -1 (C 60 ). 1 H NMR (270MHz, CDCl 3 ) Δ2.03, 2.04, 2.05, 2.07 (each 3H, s, CH 3 ), 2.78 (3H, s, N-CH 3 ), 3.89 (1H, ddd, J = 2.1, 5.5, 10.1 Hz, 5'-H ), 4.16 (1H, dd, J = 2.1, 12.3 Hz, 6'-H), 4.25, 4.98 (each 1H, d, J = 9.7 Hz, 5-H), 4.26-4.35 (1H, m, 6' -H), 4.90 (1H, s, 2-H), 5.09-5.34 (4H, m, 1', 2', 3', 4'-H), 7.05, 7.74 (each 2H, d, J = 8.9 Hz, Ar-H). 13 C NMR (67.8MHz, CDCl 3 ) δ 20.61 (CH 3 × 2), 20.72, 20.77 (CH 3 ), 40.00 (N-CH 3 ), 61.94 (6'-C) , 68.25 (CH), 68.28, 68.98 (3,4-C), 69.99 (5-C), 71.16, 72.04, 72.69 (CH), 83.00 (2-C), 98.85 (1'-C), 117.03 ( 2"-C), 130.60 (3"-C), 131.86, 131.95, 135.70, 135.87, 136.46, 136.91, 139.60, 139.89, 139.93, 140.20, 141.54, 141.70, 141.83, 141.94, 141.99, 142.05, 142.10 (2C) , 142.14, 142.17, 142.26 (2C), 142.59 (2C), 142.71, 143.02, 143.18, 144.38, 144.42, 144.60, 144.72, 145.17, 145.24 (2C), 145.30, 145.35 (2C), 145.44, 145.50, 145.53 (2C ), 145.75, 145.98, 146.13, 146.16 (2C), 146.20 (2C), 146.32 (2C), 146.45, 146.65, 147.33 (2C), 153.22, 153.37, 154.00, 156.22, 156.75, 156.82 (C 60 , 1"- , 4"-C), 169.31, 169.40, 170.24, 170.58 (C=O ). FAB-MS (m-NBA) m/z 1200 ([M+H] + ), 720 (C 60 ). UV-VIS (CHCl 3 ) λ max nm (log ε) 431 (3.68). HPLC (ODS) , CHCl 3 , flow rate 1 ml/min) retention time 2.62 min. Anal. Calcd for C 83 H 29 O 10 N: C, 83.07; H, 2.44; N, 1.17%. Found: C, 82.26; H, 2.90; N, 1.25%.

[實施例4]具有2-(四-O-乙醯基-β-D-半乳哌喃糖氧基)苯基取代吡咯啶體之C60(19)之合成[Example 4] Synthesis of C60(19) having 2-(tetra-O-ethinyl-β-D-galactoseoxy) phenyl-substituted pyrrolidine

【化18】【化18】

氮氣流下,對C60(288mg,0.4mmol)之乾燥p-茬溶液(200ml)添加合成例4中所得之o-甲醯基苯基2,3,4,6-四-O-乙醯基-β-D-半乳糖皮蒽(6)(181mg,0.4mmol)及肌胺酸(36mg,0.4mmol),使用迪安-斯塔克裝置一邊去除水,同時8小時加熱迴流。O-methylmercaptophenyl 2,3,4,6-tetra-O-ethenyl group obtained in Synthesis Example 4 was added to a dry p-hydrazine solution (200 ml) of C60 (288 mg, 0.4 mmol) under a nitrogen stream. β-D-galactose picoside (6) (181 mg, 0.4 mmol) and creatinine (36 mg, 0.4 mmol) were removed using a Dean-Stark apparatus while heating under reflux for 8 hours.

將使反應液減壓濃縮所得之黑褐色固體(574mg)交附柱式色層分析儀。藉由二硫化碳溶析分離回收C60(88mg,31%)後,藉由苯-乙酸乙酯(5:1)溶析分離得到黑褐色固體[274mg,57%(82%)]。更將黑褐色固體以苯(4ml)加熱溶解後,放置冷卻下加入乙醇(20ml)再沈澱得到黑褐色固體(19)[213mg,44%(64%)]。所得之生成物之分析結果如以下般。Brown solid,mp>300℃.Relative ratio of diastereomers determind by1 H NMR:3/2IR(KBr) 2946,2782(CH),1752(C=O),1216,1073,1042(C-O-C),526cm-1 (C60 ).1 H NMR(270MHz,CDCl3 )δ1.94-2.15(9H,m,CH3 ),2.27(1.7H,s,CH3 ),2.29(1.3H,s,CH3 ),2.73(1.3H,s,N-CH3 ),2.76(1.7H,s,N-CH3 ),3.87-4.08(2H,m,5'-,6'-H),4.22(1H,d,J=6.8Hz,6'-H),4.28(0.6H,d,J=9.3Hz,5-H),4.29(0.4H,d,J=9.3Hz,5-H),4.96(0.4H,d,J=9.3Hz,5-H),4.99(0.6H,d,J=9.3Hz,5-H),5.05-5.27(2H,m,1'-,3'-H),5.28-5.51(2H,m,2'-,4'-H),5.41(0.6H,s,2-H),5.65(0.4H,s,2-H),6.97-7.36(3H,m,4"-,5"-,6"-H),8.02(0.6H,dd,J=1.7,7.6Hz,3"-H),8.06(0.4H,dd,J=1.7,7.6Hz,3"-H).13 C NMR(67.8MHz,CDCl3 )δ20.61(CH3 ×4),20.81(CH3 ×2),20.92,21.29(CH3 ),39.86(N-CH3 ),40.36(N-CH3 ),61.02,61.10(6'-C),66.67,66.83,68.62,68.79,70.64,70.78(2C),71.16(2',3',4',5'-C),69.16,69.38(3 or 4-C),69.90,70.01(5-C),75.35,75.40(2-C),77.23(3 or 4-C),97.61,100.81(1'-C),113.73(Ar-C),118.00(Ar-C),123.30(Ar-C),124.53(Ar-C),126.41(1" or 2"-C),128.34(2C)(1" or 2"-C),128.93(Ar-C),129.16(Ar-C),129.25(1" or 2"-C),130.11(Ar-C),130.73(Ar-C),135.18,135.25,136.12,136.46(2C),136.49(2C),139.37,139.46,139.75,140.05,140.09(2C),141.58,141.63,141.70(2C),141.88,141.96,142.06(2C),142.12(2C),142.21(2C),142.24(2C),142.46(2C),142.50(2C),142.59(2C),142.68,142.87,142.94,143.07,144.31(2C),144.47,144.53(3C),145.05,145.14(2C),145.19(2C),145.26(2C),145.33,145.44,145.50(2C),145.55,145.71(2C),145.87,145.91(2C),146.00,146.07(2C),146.16(2C),146.23(2C),146.38,146.57,146.61,146.74,147.26(2C),147.46,153.85(2C),154.45(2C),154.59(2C),155.33,156.60,156.69(C60 -C),168.82,169.11,170.06,170.15,170.22,170.28,170.35(C=O).UV-VIS(CHCl3 )λmax nm(log ε) 257(5.09),333(4.44),431(3.59).HPLC(ODS,CHCl3 ,flow rate 1ml/min) retention time 2.59min.The dark brown solid (574 mg) obtained by concentration of the reaction mixture under reduced pressure was applied to a column chromatography. The C60 (88 mg, 31%) was separated by EtOAc (EtOAc) (EtOAc) The dark brown solid was dissolved in EtOAc (4 mL). The analysis results of the obtained product were as follows. Brown solid, mp>300°C.Relative ratio of diastereomers determind by 1 H NMR: 3/2IR(KBr) 2946,2782(CH), 1752(C=O), 1216,1073,1042(COC),526cm -1 (C 60 ). 1 H NMR (270MHz, CDCl 3 ) δ 1.94 - 2.15 (9H, m, CH 3 ), 2.27 (1.7H, s, CH 3 ), 2.29 (1.3H, s, CH 3 ), 2.73 (1.3H, s, N-CH 3 ), 2.76 (1.7H, s, N-CH 3 ), 3.87-4.08 (2H, m, 5'-, 6'-H), 4.22 (1H, d, J = 6.8 Hz, 6'-H), 4.28 (0.6H, d, J = 9.3 Hz, 5-H), 4.29 (0.4H, d, J = 9.3 Hz, 5-H), 4.96 (0.4H, d, J=9.3 Hz, 5-H), 4.99 (0.6H, d, J=9.3 Hz, 5-H), 5.05-5.27 (2H, m, 1'-, 3'-H), 5.28-5.51 (2H, m, 2'-, 4'-H), 5.41 (0.6H, s, 2-H), 5.65 (0.4H, s, 2-H), 6.97-7.36 (3H, m, 4"- , 5"-,6"-H), 8.02 (0.6H, dd, J=1.7, 7.6 Hz, 3"-H), 8.06 (0.4H, dd, J=1.7, 7.6 Hz, 3"-H) 13 C NMR (67.8 MHz, CDCl 3 ) δ 20.61 (CH 3 × 4), 20.81 (CH 3 × 2), 20.92, 21.29 (CH 3 ), 39.86 (N-CH 3 ), 40.36 (N-CH 3 ), 61.02, 61.10 (6'-C), 66.67, 66.83, 68.62, 68.79, 70.64, 70.78 (2C), 71.16 (2', 3', 4', 5'-C), 69.16, 69.38 (3 Or 4-C), 69.90, 70.01 (5-C), 75.35, 75.40 (2-C), 77.23 (3 or 4-C), 97.61, 100.81 (1'-C), 113.73 (Ar-C), 118.00 (Ar-C), 123.30 (Ar-C), 124.53 (Ar-C), 126.41 (1" or 2"-C), 128.34 (2C) (1" or 2"-C), 128.93 (Ar- C), 129.16 (Ar-C), 12 9.25 (1" or 2"-C), 130.11 (Ar-C), 130.73 (Ar-C), 135.18, 135.25, 136.12, 136.46 (2C), 136.49 (2C), 139.37, 139.46, 139.75, 140.05, 140.09 (2C), 141.58, 141.33, 141.70 (2C), 141.88, 141.96, 142.06 (2C), 142.12 (2C), 142.21 (2C), 142.24 (2C), 142.46 (2C), 142.50 (2C), 142.59 (2C) ), 142.68, 142.87, 142.94, 143.07, 144.31 (2C), 144.47, 144.53 (3C), 140.55, 145.14 (2C), 145.19 (2C), 145.26 (2C), 145.33, 145.44, 145.50 (2C), 145.55, 145.71(2C),145.87,145.91(2C),146.00,146.07(2C),146.16(2C),146.23(2C),146.38,146.57,146.61,146.74,147.26(2C),147.46,153.85(2C),154.45 (2C), 154.59 (2C), 155.33, 156.60, 156.69 (C 60- C), 168.82, 169.11, 170.06, 170.15, 170.22, 170.28, 170.35 (C=O). UV-VIS (CHCl 3 ) λ max nm ( Log ε) 257 (5.09), 333 (4.44), 431 (3.59). HPLC (ODS, CHCl 3 , flow rate 1 ml/min) retention time 2.59 min.

[實施例5]具有3-(四-O-乙醯基-β-D-半乳哌喃糖氧基)苯基取代吡咯啶體之C60(21)之合成[Example 5] Synthesis of C60(21) having 3-(tetra-O-ethinyl-β-D-galiphaloxyloxy)phenyl substituted pyrrolidine

【化19】【化19】

氮氣流下,對C60(289mg,0.4mmol)之乾燥p-茬溶液(200ml)添加合成例5中所得之m-甲醯基苯基2,3,4,6-四-O-乙醯基-β-D-半乳糖皮蒽(7)(181mg,0.4mmol)及肌胺酸(36mg,0.4mmol),使用迪安-斯塔克裝置一邊去除水,同時8小時加熱迴流。The m-methylphenylphenyl 2,3,4,6-tetra-O-ethenyl group obtained in Synthesis Example 5 was added to a dry p-hydrazine solution (200 ml) of C60 (289 mg, 0.4 mmol) under a nitrogen stream. β-D-galactose picoside (7) (181 mg, 0.4 mmol) and creatinine (36 mg, 0.4 mmol) were removed using a Dean-Stark apparatus while heating under reflux for 8 hours.

將使反應液減壓濃縮所得之黑褐色固體(574mg)交附柱式色層分析儀。藉由二硫化碳溶析分離回收C60(125mg,43%)後,藉由苯-乙酸乙酯(5:1)溶析分離得到黑褐色固體[222mg,46%(81%)]。更將黑褐色固體以苯(4ml)加熱溶解後,放置冷卻下加入乙醇(20ml)再沈澱得到黑褐色固體(21)[202mg,42%(74%)]。所得之生成物之分析結果如以下般。Brown solid,mp>300℃.Relative ratio of diastereomers determind by1 H NMR:1/1IR(KBr)1754(C=O),1218,1075,1046(C-O-C),526cm-1 (C60 ).1 H NMR(270MHz,CDCl3 )δ2.01(3H,s,CH3 ),2.03(1.5H,s,CH3 ),2.05(1.5H,s,CH3 ),2.06(1.5H,s,CH3 ),2.07(1.5H,s,CH3 ),2.17(1.5H,s,CH3 ),2.18(1.5H,s,CH3 ),2.80(1.5H,s,N-CH3 ),2.81(1.5H,s,N-CH3 ),3.97-4.07(1H,m,5'-H),4.10-4.23(2H,m,6'-H),4.26(1H,d,J=9.3Hz,5-H),4.91(1H,s,2-H),4.97(0.5H,d,J=9.3Hz,5-H),4.98(0.5H,d,J=9.3Hz,5-H),5.00(1H,d,J=8.0Hz,1'-H),5.06(0.5H,dd,J=3.4,5.5Hz,3'-H),5.10(0.5H,dd,J=3.4,5.5Hz,3'-H),5.38-5.55(2H,m,2',4'-H),6.92-7.04(1H,m,Ar-H),7.30-7.40(2H,m,Ar-H),7.40-7.81(1H,m,Ar-H).13 C NMR(67.8MHz,CDC13 )δ20.58(CH3 ×2),20.66(CH3 ×2),20.70(CH3 ×2),20.72,20.86(CH3 ),39.98(N-CH3 ×2),61.31(6'-C×2),66.70(2C),68.59,68.62,70.73(2C),71.00,70.03(2',3',4',5'-C),69.00(3 or 4-C),69.90(5-C),77.23(3 or 4-C),83.13(2-C),100.07(1'-C×2),116.60,118.33,124.47,128.32(2C),129.31(2C),129.77(Ar-C),135.67,135.90,135.94,136.37,136.66,136.73,139.06,139.10,139.40,139.75,139.84,140.20,141.51,141.56,141.69,141.74(2C),141.94,142.03(2C),142.12,142.15,142.21(2C),142.59(2C),142.69,143.00,143.18,144.33,144.40,144.53,144.58,144.71,145.16,145.23,145.26,145.33(2C),145.41,145.46,145.50(2C),145.53,145.66,145.69,145.95(2C),146.11,146.16,146.20,146.29,146.39,146.63,147.28,147.31,153.10,153.19,153.91,156.12(2C),157.36(C60 ,1",2"-C),169.40,169.43,170.10,170.20(C=O). HPLC(ODS,CHCl3 ,flow rate 1ml/min) retention time 2.58min.The dark brown solid (574 mg) obtained by concentration of the reaction mixture under reduced pressure was applied to a column chromatography. The C60 (125 mg, 43%) was isolated by chromatography eluting with EtOAc (EtOAc:EtOAc) The dark brown solid was dissolved in EtOAc (4 mL). The analysis results of the obtained product were as follows. Brown solid, mp>300°C.Relative ratio of diastereomers determind by 1 H NMR: 1/1IR (KBr) 1754 (C=O), 1218, 1075, 1046 (COC), 526 cm -1 (C 60 ). 1 H NMR (270MHz, CDCl 3 ) δ 2.01 (3H, s, CH 3 ), 2.03 (1.5H, s, CH 3 ), 2.05 (1.5H, s, CH 3 ), 2.06 (1.5H, s, CH 3 ) ), 2.07 (1.5H, s, CH 3 ), 2.17 (1.5H, s, CH 3 ), 2.18 (1.5H, s, CH 3 ), 2.80 (1.5H, s, N-CH 3 ), 2.81 ( 1.5H, s, N-CH 3 ), 3.97-4.07 (1H, m, 5'-H), 4.10-4.23 (2H, m, 6'-H), 4.26 (1H, d, J = 9.3 Hz, 5-H), 4.91 (1H, s, 2-H), 4.97 (0.5H, d, J = 9.3 Hz, 5-H), 4.98 (0.5H, d, J = 9.3 Hz, 5-H), 5.00 (1H, d, J = 8.0 Hz, 1'-H), 5.06 (0.5H, dd, J = 3.4, 5.5 Hz, 3'-H), 5.10 (0.5H, dd, J = 3.4, 5.5 Hz) , 3'-H), 5.38-5.55 (2H, m, 2', 4'-H), 6.92-7.04 (1H, m, Ar-H), 7.30-7.40 (2H, m, Ar-H), 7.40-7.81 (1H, m, Ar-H). 13 C NMR (67.8MHz, CDC1 3 ) δ 20.58 (CH 3 × 2), 20.66 (CH 3 × 2), 20.70 (CH 3 × 2), 20.72 , 20.86 (CH 3 ), 39.98 (N-CH 3 × 2), 61.31 (6'-C × 2), 66.70 (2C), 68.59, 68.62, 70.73 (2C), 71.00, 70.03 (2', 3' , 4', 5'-C), 69.00 (3 or 4-C), 69.90 (5-C), 77.23 (3 or 4-C), 83.13 (2-C), 100.07 (1'-C×2 ), 116.60, 118.33, 124.47, 128.32 (2C), 129.31 (2C), 129.77 (Ar-C), 135.67, 135.90, 135.94, 136.37, 136.66, 136.73, 139.06, 139. 10,139.40,139.75,139.84,140.20,141.51,141.56,141.69,141.74(2C),141.94,142.03(2C),142.12,142.15,142.21(2C),142.59(2C),142.69,143.00,143.18,144.33,144.40, 144.53, 144.58, 144.71, 145.16, 145.23, 145.26, 145.33 (2C), 145.41, 145.46, 145.50 (2C), 145.53, 145.66, 145.69, 145.95 (2C), 146.11, 146.16, 146.20, 146.29, 146.39, 146.63, 147.28 , 147.31, 153.10, 153.19, 153.91, 156.12 (2C), 157.36 (C 60 , 1", 2"-C), 169.40, 169.43, 170.10, 170.20 (C=O). HPLC (ODS, CHCl 3 , flow rate 1ml/min) retention time 2.58min.

[實施例6]具有4-(四-O-乙醯基-β-D-半乳哌喃糖氧基)苯基取代吡咯啶體之C60(23)之合成[Example 6] Synthesis of C60(23) having 4-(tetra-O-ethinyl-β-D-galiperoseoxy)phenyl-substituted pyrrolidine

【化20】【化20】

氮氣流下,對C60(288mg,0.4mmol)之乾燥p-茬溶液(200ml)添加合成例6中所得之p-甲醯基苯基2,3,4,6-四-O-乙醯基-β-D-半乳糖皮蒽(8)(181mg,0.4mmol)及肌胺酸(36mg,0.4mmol),使用迪安-斯塔克裝置一邊去除水,同時8小時加熱迴流。The p-formylphenyl 2,3,4,6-tetra-O-ethenyl group obtained in Synthesis Example 6 was added to a dry p-hydrazine solution (200 ml) of C60 (288 mg, 0.4 mmol) under a nitrogen stream. β-D-galactose sputum (8) (181 mg, 0.4 mmol) and creatinine (36 mg, 0.4 mmol) were removed using a Dean-Stark apparatus while heating under reflux for 8 hours.

將使反應液減壓濃縮所得之黑褐色固體(513mg)交附柱式色層分析儀。藉由二硫化碳溶析分離回收C60(109mg,38%)後,藉由苯-乙酸乙酯(5:1)溶析分離得到黑褐色固體[427mg,51%(83%)]。更將黑褐色固體以苯(4ml)加熱溶解後,放置冷卻下加入乙醇(20ml)再沈澱得到黑褐色固體(23)[202mg,42%(68%)]。Brown solid,mp>300℃.IR(KBr) 1754(C=O),1228,1077(C-O-C),772(C-H),526cm-1 (C60 ).1 H NMR(270MHz,CDCL3 )δ2.01(3H,s,CH3 ),2.05(3H,s,CH3 ),2.06(3H,s,CH3 ),2.17(3H,s,CH3 ),2.78(3H,s,N-CH3 ),4.03-4.31(3H,m,5'-,6'-H),4.25(1H,d,J=9.5Hz,5-H),4.90(1H,s,2-H),4.98(1H,d,J=9.5Hz,5-H),5.05-5.17(2H,m,1'-,3'-H),5.42-5.54(2H,m,2'-,4'-H),7.06(2H,d,J=8.9Hz,Ar-H),7.74(2H,d,J=7.2Hz,Ar-H).HPLC(ODS,CHCl3 ,flow rate 1.00ml/min) retention time 2.58min.The dark brown solid (513 mg) obtained by concentration of the reaction mixture under reduced pressure was applied to a column chromatography. The C60 (109 mg, 38%) was isolated by chromatography eluting with EtOAc (EtOAc:EtOAc) The dark brown solid was dissolved in EtOAc (4 mL). Brown solid, mp > 300 ° C. IR (KBr) 1754 (C = O), 1228, 1077 (COC), 772 (CH), 526 cm -1 (C 60 ). 1 H NMR (270 MHz, CDCL 3 ) δ 2. 01(3H, s, CH 3 ), 2.05 (3H, s, CH 3 ), 2.06 (3H, s, CH 3 ), 2.17 (3H, s, CH 3 ), 2.78 (3H, s, N-CH 3 ) ), 4.03-4.31 (3H, m, 5'-, 6'-H), 4.25 (1H, d, J = 9.5 Hz, 5-H), 4.90 (1H, s, 2-H), 4.98 (1H) ,d,J=9.5Hz,5-H),5.05-5.17(2H,m,1'-,3'-H),5.42-5.54(2H,m,2'-,4'-H),7.06 (2H, d, J = 8.9 Hz, Ar-H), 7.74 (2H, d, J = 7.2 Hz, Ar-H). HPLC (ODS, CHCl 3 , flow rate 1.00 ml/min) retention time 2.58 min.

[實施例7]具有2,4-雙(2,3,4,6-四-O-乙醯基-β-D-葡萄哌喃糖氧基)取代吡咯啶體之C60(25)之合成[Example 7] Synthesis of C60 (25) with 2,4-bis(2,3,4,6-tetra-O-ethinyl-β-D-glucopyranosyloxy)-substituted pyrrolidine

【化21】【化21】

氮氣流下,對C60(288mg,0.4mmol)之乾燥p-茬溶液(200ml)添加合成例7中所得之前驅物(9)(319mg,0.4mmol)及肌胺酸(36mg,0.4mmol),使用迪安-斯塔克裝置一邊去除水,同時8小時加熱迴流。將使反應液減壓濃縮所得之黑褐色固體(704mg)交附柱式色層分析儀。藉由二硫化碳溶析分離回收C60(95mg,33%)後,藉由苯-乙酸乙酯(5:2)溶析分離得到黑褐色固體[326mg,53%(79%)]。將黑褐色固體以苯(4ml)加熱溶解後,放置冷卻下加入乙醇(20ml)再沈澱得到褐色固體(25)[292mg,47%(70%),mp192-194℃]。所得之生成物之分析結果如以下般。Relative ration of diastereomers determind by1 H NMR:1/1Brown solid,mp 192-194℃.IR(KBr) 2948,2940,2784(C-H),1758(C=O),1222,1040(O-C=O),905(CH),526cm-1 (C60 ).1 H NMR(270MHz CDCl3 )δ1.94(1.5H,s,CH3 ),2.02(1.5H,s,CH3),2.03(1.5H,s,CH3 ),2.03(3H,s,CH3 ),2.04(3H,s,CH3 ),2.05(1.5H,s,CH3 ),2.06(4.5H,s,CH3 ),2.07(1.5H,s,CH3 ),2.08(3H,s,CH3 ),2.10(1.5H,s,CH3 ),2.25(1.5H,s,CH3 ),2.70(3H,s,N-CH3 ),3.79-3.99(2H,m,6’-H),4.08(1H,ddd,J=2.7,9.8,12.5Hz,5’-H),4.16(1H,dd,J=9.8,12.5Hz,5’-H),4.20-4.41(3H,m,5,6’-H),4.96(0.5H,d,J=9.5Hz,5-H),4.99(0.5H,d,J=9.5Hz,5-H),4.91-5.49(8.5H,m,2,1’,2’,3’,4’-H),5.53(0.5H,s,2-H),6.72(0.5H,d,J=2.3Hz,3”-H),6.75(0.5H,d,J=2.3Hz,3”-H),6.81(0.5H,dd,J=2.3,8.6Hz,5”-H),6.87(0.5H,dd,J=2.3,8.6Hz,5”-H),7.92(0.5H,d,J=8.6Hz,6”-H),7.96(0.5H,d,J=8.6Hz,6”-H).FAB-MS(m-NBA) m/z 1545([M]+ ) 720(C60 ).HPLC(ODS,CHCl3 ,flow rate 1.00ml/min) retention time 2.42min.The precursor (9) (319 mg, 0.4 mmol) obtained in Synthesis Example 7 and creatinine (36 mg, 0.4 mmol) were added to a dry p-hydrazine solution (200 ml) of C60 (288 mg, 0.4 mmol). The Dean-Stark unit removes water while heating to reflux for 8 hours. The dark brown solid (704 mg) obtained by concentration of the reaction mixture under reduced pressure was applied to a column chromatography. The C60 (95 mg, 33%) was separated by EtOAc (EtOAc:EtOAc) The dark brown solid was dissolved in EtOAc (4 mL). EtOAc (EtOAc) The analysis results of the obtained product were as follows. Relative ration of diastereomers determind by 1 H NMR: 1/1 Brown solid, mp 192-194 ° C. IR (KBr) 2948, 2940, 2784 (CH), 1758 (C=O), 1222, 1040 (OC=O), 905(CH), 526cm -1 (C 60 ). 1 H NMR (270MHz CDCl 3 ) δ 1.94 (1.5H, s, CH 3 ), 2.02 (1.5H, s, CH3), 2.03 (1.5H, s , CH 3 ), 2.03 (3H, s, CH 3 ), 2.04 (3H, s, CH 3 ), 2.05 (1.5H, s, CH 3 ), 2.06 (4.5H, s, CH 3 ), 2.07 (1.5 H, s, CH 3 ), 2.08 (3H, s, CH 3 ), 2.10 (1.5H, s, CH 3 ), 2.25 (1.5H, s, CH 3 ), 2.70 (3H, s, N-CH 3 ) ), 3.79-3.99 (2H, m, 6'-H), 4.08 (1H, ddd, J=2.7, 9.8, 12.5 Hz, 5'-H), 4.16 (1H, dd, J=9.8, 12.5 Hz, 5'-H), 4.20-4.41 (3H, m, 5, 6'-H), 4.96 (0.5H, d, J = 9.5 Hz, 5-H), 4.99 (0.5H, d, J = 9.5 Hz ,5-H),4.91-5.49 (8.5H,m,2,1',2',3',4'-H),5.53(0.5H,s,2-H),6.72(0.5H,d , J = 2.3 Hz, 3"-H), 6.75 (0.5H, d, J = 2.3 Hz, 3"-H), 6.81 (0.5H, dd, J = 2.3, 8.6 Hz, 5"-H), 6.87 (0.5H, dd, J=2.3, 8.6 Hz, 5"-H), 7.92 (0.5H, d, J = 8.6 Hz, 6"-H), 7.96 (0.5H, d, J = 8.6 Hz, 6"-H). FAB-MS (m-NBA) m/z 1545 ([M] + ) 720 (C 60 ). HPLC (ODS, CHCl 3 , flow rate 1.00 ml/min) retention time 2.42 min.

[實施例8]具有3,5-雙(2,3,4,6-四-O-乙醯基-β-D-葡萄哌喃糖氧基)取代吡咯啶體之C60(27)之合成[Example 8] Synthesis of C60 (27) having 3,5-bis(2,3,4,6-tetra-O-ethinyl-β-D-glucopyranosyloxy)-substituted pyrrolidine

【化22】【化22】

氮氣流下,對C60(288mg,0.4mmol)之乾燥p-茬溶液(200ml)添加合成例8中所得之前驅物(10)(319mg,0.4mmol)及肌胺酸(35mg,0.4mmol),使用迪安-斯塔克裝置一邊去除水,8小時加熱迴流。將使反應液減壓濃縮所得之黑褐色固體(731mg)交附柱式色層分析儀。藉由二硫化碳溶析分離回收C60(99mg,34%)後,藉由苯-乙酸乙酯(5:2)溶析分離得到黑褐色固體[327mg,53%(80%)]。將黑褐色固體以苯(4ml)加熱溶解後,放置冷卻下加入乙醇(20ml)再沈澱得到褐色固體(27)[278mg,45%(68%),mp255-257℃]。所得之生成物之分析結果如以下般。Relative ration of diastereomers determind by1 H NMR:1/1Brown solid,mp 255-257℃.IR(KBr) 2950,2784(C-H),1760(C=O),1220,1040(O-C=O),907(CH),526cm-1 (C60 ).1 H NMR(270MHz CDCl3 )δ2.03(6H,s,CH3 ),2.03(9H,s,CH3 ),2.06(4.5H,s,CH3 ),2.08(1.5H,s,CH3 ),2.10(3H,s,CH3 ),2.80(1.5H,s,N-CH3 ),2.80(1.5H,s,N-CH3 ),3.78-4.91(2H,m,5’-H),4.12(2H,dd,J=2.3,9.6Hz,6’-H),4.26(2H,dd,J=2.3,9.6Hz,6’-H),4.26-4.41(1H,m,5-H),4.85(0.5H,s,2-H),4.86(0.5H,s,2-H),4.96(0.5H,d,J=9.6Hz,5-H),4.97(0.5H,d,J=9.6Hz,5-H),5.01-5.47(8H,m,1’,2’,3’,4’-H),6.58(0.5H,t,J=2.3Hz,4”-H),6.64(0.5H,t,J=2.3Hz,4”-H),7.26(2H,s,2”,6”-H).FAB-MS(m-NBA) m/z 1546([M+H]+ ) 720(C60 ).HPLC(ODS,CHCl3 ,flow rate 1.00ml/min) retention time 2.41min.The precursor (10) (319 mg, 0.4 mmol) obtained in Synthesis Example 8 and creatinine (35 mg, 0.4 mmol) were added to a dry p-hydrazine solution (200 ml) of C60 (288 mg, 0.4 mmol). The Dean-Stark unit removes water and heats it back for 8 hours. The dark brown solid (731 mg) obtained by concentration of the reaction mixture under reduced pressure was applied to a column chromatography. The C60 (99 mg, 34%) was isolated by chromatography eluting with EtOAc (EtOAc:EtOAc) After the dark brown solid was dissolved in EtOAc (4 mL), EtOAc (EtOAc:EtOAc) The analysis results of the obtained product were as follows. Relative ration of diastereomers determind by 1 H NMR: 1/1 Brown solid, mp 255-257 ° C. IR (KBr) 2950, 2784 (CH), 1760 (C=O), 1220, 1040 (OC=O), 907 ( CH), 526cm -1 (C 60 ). 1 H NMR (270MHz CDCl 3 ) δ 2.03 (6H, s, CH 3 ), 2.03 (9H, s, CH 3 ), 2.06 (4.5H, s, CH 3 ) ), 2.08 (1.5H, s, CH 3 ), 2.10 (3H, s, CH 3 ), 2.80 (1.5H, s, N-CH 3 ), 2.80 (1.5H, s, N-CH 3 ), 3.78 -4.91 (2H, m, 5'-H), 4.12 (2H, dd, J=2.3, 9.6 Hz, 6'-H), 4.26 (2H, dd, J=2.3, 9.6 Hz, 6'-H) , 4.26-4.41 (1H, m, 5-H), 4.85 (0.5H, s, 2-H), 4.86 (0.5H, s, 2-H), 4.96 (0.5H, d, J = 9.6 Hz, 5-H), 4.97 (0.5H, d, J=9.6Hz, 5-H), 5.01-5.47 (8H, m, 1', 2', 3', 4'-H), 6.58 (0.5H, t, J = 2.3 Hz, 4"-H), 6.64 (0.5H, t, J = 2.3 Hz, 4"-H), 7.26 (2H, s, 2", 6"-H). FAB-MS ( m-NBA) m/z 1546 ([M+H] + ) 720 (C 60 ). HPLC (ODS, CHCl 3 , flow rate 1.00 ml/min) retention time 2.41 min.

[實施例9]具有2,4,6-參(2,3,4,6-四-O-乙醯基-β-D-葡萄哌喃糖氧基)取代吡咯啶體之C60(29)之合成[Example 9] C60 (29) having 2,4,6-paran (2,3,4,6-tetra-O-ethinyl-β-D-glucopyranosyloxy)-substituted pyrrolidine Synthesis

【化23】【化23】

氮氣流下,對C60(216mg,0.3mmol)之乾燥p-茬溶液(200ml)添加合成例9中所得之前驅物(11)(344mg,0.3mmol)及肌胺酸(27mg,0.3mmol),使用迪安-斯塔克裝置一邊除去水,同時8小時加熱迴流。將使反應液減壓濃縮所得之黑褐色固體(621mg)交附柱式色層分析儀。藉由二硫化碳溶析分離回收C60(60mg,28%)後,藉由苯-乙酸乙酯(1:1)溶析分離得到黑褐色固體[346mg,61%(85%)]。將黑褐色固體以苯(4ml)加熱溶解後,放置冷卻下加入乙醇(20ml)再沈澱得到褐色固體(29)[235mg,41%(57%),mp174-176℃]。所得之生成物之分析結果如以下般。Relative ration of diastereomers determind by1 H NMR:8/7Brown solid,mp 174-176℃.IR(KBr) 2950,2780(C-H),1758(C=O),1609,(C=C),1220,1040(O-C=O),907(CH) 526cm-1 (C60 ).1 H NMR(270MHz CDCl3 )δ1.95(1.4H,s,CH3 ),1.96(1.6H,s,CH3 ),2.01(1.6H,s,CH3 ),2.02(3.2H,s,CH3 ),2.03(4.6H,s,CH3 ),2.04(3H,s,CH3 ),2.05(3.2H,s,CH3 ),2.07(4.4H,s,CH3 ),2.08(3H,s,CH3 ),2.08(2.8H,s,CH3 ),2.10(4.4H,s,CH3 ),2.19(1.4H,s,CH3 ),2.25(1.4H,s,CH3 ),2.59(1.6H,s,N-CH3 ),2.73(1.4H,s,N-CH3 ),3.81-4.47(10H,m,5,5’,6’-H),4.79-5.73(14H,m,2,5,1’,2’,3’,4’-H),6.34(0.5H,d,J=2.1Hz,Ar-H),6.37(0.5H,d,J=2.1Hz,Ar-H),6.40(0.5H,d,J=2.1Hz,Ar-H),6.50(0.5H,d,J=2.1Hz,Ar-H).FAB-MS(m-NBA) m/z 1892([M+H]+ ) 720(C60 ).HPLC(ODS,CHCl3 ,flow rate 1.00ml/min) retention time 2.37min.The precursor (11) (344 mg, 0.3 mmol) obtained in Synthesis Example 9 and creatinine (27 mg, 0.3 mmol) were added to a dry p-hydrazine solution (200 ml) of C60 (216 mg, 0.3 mmol). The Dean-Stark unit removes water while heating to reflux for 8 hours. The dark brown solid (621 mg) obtained by concentration of the reaction mixture under reduced pressure was applied to a column chromatography. The C60 (60 mg, 28%) was separated by EtOAc (EtOAc) (EtOAc) The dark brown solid was dissolved in EtOAc (4 mL). EtOAc (EtOAc) The analysis results of the obtained product were as follows. Relative ration of diastereomers determind by 1 H NMR: 8/7 Brown solid, mp 174-176 ° C. IR (KBr) 2950, 2780 (CH), 1758 (C=O), 1609, (C=C), 1220, 1040 (OC=O), 907(CH) 526cm -1 (C 60 ). 1 H NMR (270MHz CDCl 3 ) δ 1.95 (1.4H, s, CH 3 ), 1.96 (1.6H, s, CH 3 ), 2.01 (1.6H, s, CH 3 ), 2.02 (3.2H, s, CH 3 ), 2.03 (4.6H, s, CH 3 ), 2.04 (3H, s, CH 3 ), 2.05 (3.2H, s, CH 3), 2.07 (4.4H, s, CH 3), 2.08 (3H, s, CH 3), 2.08 (2.8H, s, CH 3), 2.10 (4.4H, s, CH 3), 2.19 (1.4 H, s, CH 3 ), 2.25 (1.4H, s, CH 3 ), 2.59 (1.6H, s, N-CH 3 ), 2.73 (1.4H, s, N-CH 3 ), 3.81-4.47 (10H ,m,5,5',6'-H),4.79-5.73(14H,m,2,5,1',2',3',4'-H),6.34(0.5H,d,J= 2.1 Hz, Ar-H), 6.37 (0.5H, d, J = 2.1 Hz, Ar-H), 6.40 (0.5H, d, J = 2.1 Hz, Ar-H), 6.50 (0.5H, d, J) =2.1 Hz, Ar-H). FAB-MS (m-NBA) m/z 1892 ([M+H] + ) 720 (C 60 ). HPLC (ODS, CHCl 3 , flow rate 1.00 ml/min) Time 2.37min.

[2]C60衍生物之溶解性試驗[2] Solubility test of C60 derivatives [比較例1][Comparative Example 1]

測量取出10mg之PCBM,對此逐漸加入二氯乙烷(以下稱為DCE),計算溶解後之濃度(質量%)。PCBM中就算加入0.99g之DCE(1質量%溶液)也無法全部溶解。10 mg of PCBM was taken out, and dichloroethane (hereinafter referred to as DCE) was gradually added thereto, and the dissolved concentration (% by mass) was calculated. Even if 0.99 g of DCE (1 mass% solution) was added to the PCBM, it could not be completely dissolved.

[實施例10][Embodiment 10]

除了使用實施例1中所得之C60化合物(13)以外,其他與比較例1同樣之方法進行溶解性試驗。其結果,當加入0.2033g之DCE時全部已溶解。計算此時之濃度為4.69質量%。The solubility test was carried out in the same manner as in Comparative Example 1, except that the C60 compound (13) obtained in Example 1 was used. As a result, all of them were dissolved when 0.2033 g of DCE was added. The concentration at this time was calculated to be 4.69 mass%.

[實施例11][Example 11]

除了使用實施例4中所得之C60化合物(19)以外,其他與比較例1同樣之方法進行溶解性試驗。其結果,當加入0.4083g之DCE時已全部溶解。計算此時之濃度為2.39質量%。The solubility test was carried out in the same manner as in Comparative Example 1, except that the C60 compound (19) obtained in Example 4 was used. As a result, it was completely dissolved when 0.4083 g of DCE was added. The concentration at this time was calculated to be 2.39% by mass.

將上述比較例1、實施例10及11之結果總合整理於下述表1。如表1所示般,得知具有單糖殘基之C60化合物與PCBM相比,對有機溶劑之溶解性極為良好一事。The results of the above Comparative Example 1, Examples 10 and 11 were collectively summarized in Table 1 below. As shown in Table 1, it was found that the C60 compound having a monosaccharide residue was extremely excellent in solubility in an organic solvent as compared with PCBM.

[3]C60衍生物之成膜面之評價[3] Evaluation of the film-forming surface of C60 derivatives [比較例2][Comparative Example 2]

對PCBM加入DCE調製0.01g/ml之清漆。使此清漆通過0.2μm之濾器後,藉由旋轉塗佈法(1000rpm、20sec.)於ITO基板上將PCBM成膜後,100℃在1小時燒成製成薄膜。Add DCE to the PCBM to modulate 0.01g/ml of varnish. After passing this varnish through a 0.2 μm filter, the PCBM was formed on the ITO substrate by a spin coating method (1000 rpm, 20 sec.), and then fired at 100 ° C for 1 hour to form a film.

對於所得之薄膜,使用雷射掃描式共軛焦顯微鏡(LaserTech公司製、即時掃描型雷射顯微鏡、1LM21D)觀察成膜面,使用掃描型探針顯微鏡(SII Nano Technology社製、Nano Navi L-traceII)進行表面粗度、及膜之形狀的評價。各自將PCBM之成膜面之雷射掃描式共軛焦顯微鏡相片表示於圖1、PCBM之2次元成膜表面之結果表示於圖2、PCBM之3次元成膜表面之結果表示於圖3。For the obtained film, a film formation surface was observed using a laser scanning conjugate focal length microscope (manufactured by LaserTech, Inc., real-time scanning laser microscope, 1LM21D), and a scanning probe microscope (Nano Navi L-manufactured by SII Nano Technology Co., Ltd.) was used. Trace II) Evaluation of the surface roughness and the shape of the film. The results of the laser scanning conjugate focal length micrographs of the film formation surface of the PCBM are shown in Fig. 1. The results of the 2D film formation surface of the PCBM are shown in Fig. 2. The results of the 3D film formation surface of the PCBM are shown in Fig. 3.

如圖1所示般,確認PCBM薄膜中有凝集體出現。又,此時之表面粗度以AFM測定時為216.2nm。如圖2及3所示般,確認凝集體之凹凸在膜表面為相當大。As shown in Fig. 1, it was confirmed that agglomerates appeared in the PCBM film. Further, the surface roughness at this time was 216.2 nm as measured by AFM. As shown in Figs. 2 and 3, it was confirmed that the concavities and convexities of the aggregate were considerably large on the surface of the film.

[實施例12][Embodiment 12]

對實施例1中所得之C60化合物(13)加入DCE調製成0.01g/ml之清漆。使用此清漆,與比較例2同樣之條件製成薄膜,進行成膜面之評價(膜厚40.3nm)。各自將成膜面之雷射掃描式共軛焦顯微鏡相片表示於圖4、2次元成膜表面之結果表示於圖5、3次元成膜表面之結果表示於圖6。To the C60 compound (13) obtained in Example 1, DCE was added to prepare a varnish of 0.01 g/ml. Using this varnish, a film was formed under the same conditions as in Comparative Example 2, and the film formation surface was evaluated (film thickness: 40.3 nm). The results of the laser scanning conjugate focal length micrographs of the film formation surface shown in Fig. 4 and the 2nd dimensional film formation surface are shown in Fig. 5 and the results of the 3rd dimensional film formation surface are shown in Fig. 6.

如圖4所示般,顯微鏡相片中並無觀察到在比較例1中般所見之凝集體。又,此時之平均表面粗度以AFM測定時為3.66nm。如圖5及6所示般,得知雖在膜表面觀測到凹凸,與比較例1相比較其為相當較小者。此凹凸被認為係由於燒成時大氣中之水分在膜表面被乾燥所造成之凹凸。依據此些結果,藉由使用C60化合物(13),明顯得知可得到比PCBM更良好之膜一事。As shown in Fig. 4, no aggregates as seen in Comparative Example 1 were observed in the microscope photograph. Further, the average surface roughness at this time was 3.66 nm as measured by AFM. As shown in FIGS. 5 and 6, it was found that the unevenness was observed on the surface of the film, which was considerably smaller than that of Comparative Example 1. This unevenness is considered to be the unevenness caused by the moisture in the atmosphere at the time of firing being dried on the surface of the film. Based on these results, by using the C60 compound (13), it is apparent that a film which is better than PCBM can be obtained.

[實施例13][Example 13]

對實施例1中所得之C60化合物(13)加入DCE調製0.01g/ml之清漆。使此清漆通過0.2μm之濾器後,在手套箱中(氮環境下)藉由旋轉塗佈法(1000rpm、20sec.)在ITO基板上進行成膜。其後,在真空中100℃下1小時燒成,製成薄膜(膜厚39.0nm)。對於所得之薄膜進行表面粗度、及膜之形狀的評價。將2次元成膜表面之結果表示於圖7、3次元成膜表面之結果表示於圖8。如圖7及8所示般,藉由在真空中進行燒成,因不受到水分之影響所以凹凸消失,明顯得知可得到具有更良好之成膜面的薄膜。又,此時之平均表面粗度以AFM測定時為0.63nm。To the C60 compound (13) obtained in Example 1, DCE was added to prepare a varnish of 0.01 g/ml. The varnish was passed through a 0.2 μm filter, and then formed on a ITO substrate by a spin coating method (1000 rpm, 20 sec.) in a glove box (under a nitrogen atmosphere). Thereafter, the film was fired at 100 ° C for 1 hour in a vacuum to form a film (film thickness: 39.0 nm). The obtained film was evaluated for surface roughness and shape of the film. The results of the formation of the two-dimensional film formation surface on the surface of the film formation of Fig. 7 and the third dimension are shown in Fig. 8. As shown in Figs. 7 and 8, by firing in a vacuum, the unevenness disappeared without being affected by moisture, and it was apparent that a film having a more excellent film formation surface was obtained. Further, the average surface roughness at this time was 0.63 nm as measured by AFM.

[實施例14][Embodiment 14]

對實施例4中所得之C60化合物(19)加入DCE製成0.01g/ml之清漆。使用此清漆與比較例2同樣之條件製成薄膜,進行成膜面之評價(膜厚43.0nm)。各自將成膜面之雷射掃描式共軛焦顯微鏡相片表示於圖9、2次元成膜表面之結果表示於圖10、3次元成膜表面之結果表示於圖11。To the C60 compound (19) obtained in Example 4, DCE was added to prepare a varnish of 0.01 g/ml. Using this varnish, a film was formed under the same conditions as in Comparative Example 2, and the film formation surface was evaluated (film thickness: 43.0 nm). The results of the laser scanning conjugate focal length micrographs of the film formation surface shown in Fig. 9 and the 2nd dimensional film formation surface are shown in Fig. 10 and the results of the 3rd dimensional film formation surface are shown in Fig. 11.

如圖9~11所示般,得知可得到實施例12與同樣之表面性狀之薄膜。又,此時之平均表面粗度以AFM測定時為7.84nm。As shown in Figs. 9 to 11, it was found that the film of Example 12 and the same surface properties were obtained. Further, the average surface roughness at this time was 7.84 nm as measured by AFM.

[實施例15][Example 15]

對實施例4中所得之C60化合物(19)加入DCE製成0.01g/ml之清漆。使此清漆通過0.2μm之濾器後,在手套箱中(氮環境下)藉由旋轉塗佈法(1000rpm、20sec.)在ITO基板上進行成膜。其後,在真空中進行100℃下1小時燒成,製成薄膜(膜厚42.9nm)。對於所得之薄膜,進行表面粗度、及膜之形狀的評價。將2次元成膜表面之結果表示於圖12、3次元成膜表面之結果表示於圖13。如圖12及13所示,藉由在真空中進行燒成,因無受到水分之影響所以凹凸,明顯得知可得到具有更良好之成膜面的薄膜。又,此時之平均表面粗度以AFM測定時為1.28nm。To the C60 compound (19) obtained in Example 4, DCE was added to prepare a varnish of 0.01 g/ml. The varnish was passed through a 0.2 μm filter, and then formed on a ITO substrate by a spin coating method (1000 rpm, 20 sec.) in a glove box (under a nitrogen atmosphere). Thereafter, the film was fired in a vacuum at 100 ° C for 1 hour to form a film (film thickness: 42.9 nm). The surface roughness and the shape of the film were evaluated for the obtained film. The results of the formation of the 2-dimensional film formation surface on the surface of the film formation of Fig. 12 and the third dimension are shown in Fig. 13. As shown in Figs. 12 and 13, by firing in a vacuum, it was apparent that no film was affected by moisture, and it was found that a film having a more excellent film formation surface was obtained. Further, the average surface roughness at this time was 1.28 nm as measured by AFM.

[實施例16][Example 16]

對實施例7中所得之C60化合物(25)加入DCE調製成1質量%之清漆。使用此清漆與比較例2同樣之條件下製成薄膜,進行成膜面之評價(膜厚68.6nm)。各自將2次元成膜表面之結果表示於圖14、3次元成膜表面之結果表示於圖15。To the C60 compound (25) obtained in Example 7, DC resin was added to prepare a 1% by mass varnish. Using this varnish, a film was formed under the same conditions as in Comparative Example 2, and the film formation surface was evaluated (film thickness: 68.6 nm). The results of the respective two-dimensional film formation surfaces are shown in Fig. 14 and the results of the three-dimensional film formation surface are shown in Fig. 15.

如圖14、15所示般,得知可得到與實施例12同樣之表面性狀之薄膜。又,此時之平均表面粗度以AFM測定時為2.75nm。As shown in Figs. 14 and 15, a film having the same surface properties as in Example 12 was obtained. Further, the average surface roughness at this time was 2.75 nm as measured by AFM.

[實施例17][Example 17]

對實施例8中所得之C60化合物(27)加入DCE調製成1質量%之清漆。使用此清漆在與比較例2同樣之條件下製成薄膜,進行成膜面之評價(膜厚72.1nm)。各自將2次元成膜表面之結果表示於圖16、3次元成膜表面之結果表示於圖17。The C60 compound (27) obtained in Example 8 was added with DCE to prepare a 1% by mass varnish. Using this varnish, a film was formed under the same conditions as in Comparative Example 2, and the film formation surface was evaluated (film thickness: 72.1 nm). The results of the results of the two-dimensional film formation surface on the surface of the film formation of Fig. 16 and the third dimension are shown in Fig. 17.

如圖16、17所示般,得知可得到與實施例12同樣之表面性狀之薄膜。又,此時之平均表面粗度以AFM測定時為25.3nm。As shown in Figs. 16 and 17, a film having the same surface properties as in Example 12 was obtained. Further, the average surface roughness at this time was 25.3 nm as measured by AFM.

[實施例18][Embodiment 18]

對實施例9中所得之C60化合物(29)加入DCE調製成1質量%之清漆。使用此清漆在與比較例2同樣之條件下製成薄膜,進行成膜面之評價(膜厚72.1nm)。各自將2次元成膜表面之結果表示於圖18、3次元成膜表面之結果表示於圖19。The C60 compound (29) obtained in Example 9 was added with DCE to prepare a 1% by mass varnish. Using this varnish, a film was formed under the same conditions as in Comparative Example 2, and the film formation surface was evaluated (film thickness: 72.1 nm). The results of the respective two-dimensional film formation surfaces are shown in Fig. 18 and the results of the three-dimensional film formation surface are shown in Fig. 19.

如圖18、19所示般,得知可得到與實施例12同樣之表面性狀之薄膜。又,此時之平均表面粗度以AFM測定時為5.53nm。As shown in Figs. 18 and 19, a film having the same surface properties as in Example 12 was obtained. Further, the average surface roughness at this time was 5.53 nm as measured by AFM.

將上述比較例2及實施例12~18所得之薄膜之平均表面粗度整理表示於表2。如表2所示般,藉由使用C60化合物(13),(19),(25),(27),(29),明顯得知可得到具有比PCBM良好之成膜面的薄膜。又,得知藉由在真空中進行燒成,可防止水分所造成之凹凸,可更平滑地進行成膜。The average surface roughness of the film obtained in the above Comparative Example 2 and Examples 12 to 18 is shown in Table 2. As shown in Table 2, by using the C60 compounds (13), (19), (25), (27), and (29), it was apparent that a film having a film formation surface superior to PCBM was obtained. Further, it has been found that by baking in a vacuum, irregularities due to moisture can be prevented, and film formation can be performed more smoothly.

[4]移動度之測定[4] Determination of mobility [實施例19][Embodiment 19]

基板係使用厚度300nm之附熱氧化膜之矽基板。閘極係使用通道長L=25μm、通道寬W=76mm之櫛形金電極。SiO2 表面進行過六甲基二矽氮烷(HMDS)處理。The substrate was a tantalum substrate with a thermal oxide film having a thickness of 300 nm. The gate electrode uses a dome-shaped gold electrode having a channel length L = 25 μm and a channel width W = 76 mm. The surface of SiO 2 was subjected to hexamethyldioxane (HMDS) treatment.

使實施例4中所得之C60化合物(19)溶於二氯甲烷中,在大氣中調製0.02g/ml之清漆。將此清漆在手套箱中使其通過Φ=0.2μm之濾器滴下於基板上,以1500rpm進行20sec旋轉塗佈。直接在100℃之加熱板上使其乾燥1小時形成n型有機半導體層。The C60 compound (19) obtained in Example 4 was dissolved in dichloromethane, and a 0.02 g/ml varnish was prepared in the atmosphere. This varnish was dropped on a substrate through a filter of Φ = 0.2 μm in a glove box, and spin-coated at 1500 rpm for 20 sec. The n-type organic semiconductor layer was formed by directly drying it on a hot plate at 100 ° C for 1 hour.

將測量箱持入手套箱中,使FET不曝露於大氣中放入,隨即形成真空,進行電晶體特性之評價。評價結果表示於圖20。The measuring box was held in a glove box so that the FET was not exposed to the atmosphere, and a vacuum was formed to evaluate the characteristics of the transistor. The evaluation results are shown in Fig. 20.

一般而言,飽和狀態中之汲極電流ID 可藉下述式表示。亦即,有機半導體之移動度μ係可由將汲極電流ID 之絕對值之平方根作為縱軸,將閘電壓VG 作為橫軸進行作圖時之圖之斜率所求得。In general, the drain current I D in the saturated state can be expressed by the following formula. That is, the mobility μ of the organic semiconductor can be obtained by taking the square root of the absolute value of the drain current I D as the vertical axis and the slope of the graph when the gate voltage V G is plotted on the horizontal axis.

ID =WCμ(VG -VT )2 /2LI D = WCμ(V G -V T ) 2 /2L

上述式中,W為電晶體之通道幅、L為電晶體之通道長、C為閘極絕緣膜之静電容量、VT 為電晶體之閾值電壓、μ為移動度。將C60化合物(19)之移動度μ以此式為基準計算時為5.00×10-4 cm2 /Vs。閾值電壓之開/關比各自為、13.6V、105 ~106 。如此般可明顯得知,具有平滑膜面之C60化合物(19)可作為n型半導體而驅動。In the above formula, W is the channel width of the transistor, L is the channel length of the transistor, C is the electrostatic capacitance of the gate insulating film, V T is the threshold voltage of the transistor, and μ is the mobility. The mobility μ of the C60 compound (19) was 5.00 × 10 -4 cm 2 /Vs when calculated based on this formula. The on/off ratios of the threshold voltages are each, 13.6V, 10 5 ~ 10 6 . As is apparent from this, the C60 compound (19) having a smooth film surface can be driven as an n-type semiconductor.

[實施例20][Example 20]

基板係使用厚度300nm之附熱氧化膜之矽基板。閘極係使用通道長L=25μm、通道寬W=76mm之櫛形金電極。直接使用未處理SiO2 表面。The substrate was a tantalum substrate with a thermal oxide film having a thickness of 300 nm. The gate electrode uses a dome-shaped gold electrode having a channel length L = 25 μm and a channel width W = 76 mm. The untreated SiO 2 surface was used directly.

使實施例1中所得之C60化合物(13)溶於二氯甲烷中,在大氣中調製0.02g/ml之清漆。使此清漆在手套箱中通過Φ=0.2μm之濾器滴下於基板上,以1500rpm進行20sec旋轉塗佈。直接在100℃之加熱板上使其乾燥1小時形成n型有機半導體層。The C60 compound (13) obtained in Example 1 was dissolved in dichloromethane, and a 0.02 g/ml varnish was prepared in the atmosphere. This varnish was dropped on a substrate through a filter of Φ = 0.2 μm in a glove box, and spin-coated at 1500 rpm for 20 sec. The n-type organic semiconductor layer was formed by directly drying it on a hot plate at 100 ° C for 1 hour.

將測量箱持入手套箱中,使FET不曝曬於大氣中放入,隨即形成真空,進行電晶體特性之評價。評價結果表示於圖21。將C60化合物(13)之電子移動度以上述式為基準進行計算時為6.73×10-4 cm2 /Vs,閾值電壓之開/關比各自為38.4V、105 ~106 。如此般可明顯得知,具有平滑膜面之C60化合物(13)可作為n型半導體而驅動。The measuring box was held in a glove box, and the FET was placed in the atmosphere without being exposed to the atmosphere, and then a vacuum was formed to evaluate the characteristics of the transistor. The evaluation results are shown in Fig. 21. The electron mobility of the C60 compound (13) was calculated to be 6.73 × 10 -4 cm 2 /Vs based on the above formula, and the on/off ratios of the threshold voltages were each 38.4 V and 10 5 to 10 6 . As is apparent from this, the C60 compound (13) having a smooth film surface can be driven as an n-type semiconductor.

[圖1]表示比較例2所製成之PCBM薄膜之成膜面的雷射掃描式共軛焦顯微鏡相片的圖。Fig. 1 is a view showing a laser scanning conjugate focal length microscope photograph of a film formation surface of a PCBM film produced in Comparative Example 2.

[圖2]表示比較例2所製成之PCBM薄膜之2次元成膜表面的圖。Fig. 2 is a view showing a 2-dimensional film formation surface of a PCBM film produced in Comparative Example 2.

[圖3]表示比較例2所製成之PCBM薄膜之3次元成膜表面的圖。Fig. 3 is a view showing a 3-dimensional film-forming surface of a PCBM film produced in Comparative Example 2.

[圖4]表示實施例12所製成之薄膜之成膜面之雷射掃描式共軛焦顯微鏡相片的圖。Fig. 4 is a view showing a laser scanning conjugate focal length microscope photograph of a film formation surface of a film produced in Example 12.

[圖5]表示實施例12所製成之薄膜之2次元成膜表面的圖。Fig. 5 is a view showing a 2-dimensional film formation surface of a film produced in Example 12.

[圖6]表示實施例12所製成之薄膜之3次元成膜表面的圖。Fig. 6 is a view showing a three-dimensional film formation surface of a film produced in Example 12.

[圖7]表示實施例13所製成之薄膜之2次元成膜表面的圖。Fig. 7 is a view showing a 2-dimensional film formation surface of a film produced in Example 13.

[圖8]表示實施例13所製成之薄膜之3次元成膜表面的圖。Fig. 8 is a view showing a three-dimensional film formation surface of a film produced in Example 13.

[圖9]表示實施例14所製成之薄膜之成膜面之雷射掃描式共軛焦顯微鏡相片的圖。Fig. 9 is a view showing a laser scanning conjugate focal length microscope photograph of a film formation surface of a film produced in Example 14.

[圖10]表示實施例14所製成之薄膜之2次元成膜表面的圖。Fig. 10 is a view showing a 2-dimensional film formation surface of a film produced in Example 14.

[圖11]表示實施例14所製成之薄膜之3次元成膜表面的圖。Fig. 11 is a view showing a 3-dimensional film-forming surface of a film produced in Example 14.

[圖12]表示實施例15所製成之薄膜之2次元成膜表面的圖。Fig. 12 is a view showing a 2-dimensional film formation surface of a film produced in Example 15.

[圖13]表示實施例15所製成之薄膜之3次元成膜表面的圖。Fig. 13 is a view showing a three-dimensional film formation surface of a film produced in Example 15.

[圖14]表示實施例16所製成之薄膜之2次元成膜表面的圖。Fig. 14 is a view showing a 2-dimensional film formation surface of a film produced in Example 16.

[圖15]表示實施例16所製成之薄膜之3次元成膜表面的圖。Fig. 15 is a view showing a three-dimensional film formation surface of a film produced in Example 16.

[圖16]表示實施例17所製成之薄膜之2次元成膜表面的圖。Fig. 16 is a view showing a 2-dimensional film formation surface of a film produced in Example 17.

[圖17]表示實施例17所製成之薄膜之3次元成膜表面的圖。Fig. 17 is a view showing a three-dimensional film formation surface of a film produced in Example 17.

[圖18]表示實施例18所製成之薄膜之2次元成膜表面的圖。Fig. 18 is a view showing a 2-dimensional film formation surface of a film produced in Example 18.

[圖19]表示實施例18所製成之薄膜之3次元成膜表面的圖。Fig. 19 is a view showing a three-dimensional film formation surface of a film produced in Example 18.

[圖20]表示實施例19所製成之元件之電晶體特性的圖。Fig. 20 is a view showing the transistor characteristics of the element produced in Example 19.

[圖21]表示實施例20所製成之元件之電晶體特性的圖。Fig. 21 is a view showing the transistor characteristics of the element produced in Example 20.

Claims (12)

一種n型半導體,其特徵為以下述式(1)所表示之富勒烯化合物所構成, [式中,R1 ~R5 為各自獨立表示氫原子或OR7 (R7 表示單糖殘基或肌醇殘基)基,R6 表示碳數1~5之烷基;但,R1 ~R5 之中之至少1個為前述OR7 基]。An n-type semiconductor characterized by being composed of a fullerene compound represented by the following formula (1), [wherein, R 1 to R 5 each independently represent a hydrogen atom or OR 7 (R 7 represents a monosaccharide residue or an inositol residue) group, and R 6 represents an alkyl group having 1 to 5 carbon atoms; however, R 1 At least one of ~R 5 is the aforementioned OR 7 group]. 如申請專利範圍第1項記載之n型半導體,其中前述單糖殘基為丁醣殘基、戊醣殘基或己醣殘基。 The n-type semiconductor according to claim 1, wherein the monosaccharide residue is a butyral residue, a pentose residue or a hexose residue. 如申請專利範圍第1項記載之n型半導體,其中前述單糖殘基為阿洛糖基(allosyl)、阿拉伯糖基(arabinosyl)、赤藻糖基(erythrosyl)、果糖基(fructosyl)、半乳糖基(galactosyl)、葡苷基(glucosyl)、古羅糖基(gulosyl)、來蘇糖基(lyxosyl)、甘露糖基(mannosyl)、核糖基、唾液酸殘基、山梨糖基(sorbosyl)、洛格酮糖基(tagalosyl)、塔羅糖基(talosyl)或木糖基(xylosyl)。 The n-type semiconductor according to claim 1, wherein the monosaccharide residue is allosyl, arabinosyl, erythrosyl, fructosyl, and half. Galactosyl, glucosyl, gulosyl, lyxosyl, mannosyl, ribosyl, sialic acid residues, sorbosyl , tagalosyl, talosyl or xylosyl. 如申請專利範圍第1項至第3項中任一項記載之n型半導體,其中前述單糖殘基或肌醇殘基具有之羥基之中 之至少1個係以保護基所保護。 The n-type semiconductor according to any one of claims 1 to 3, wherein the aforementioned monosaccharide residue or inositol residue has a hydroxyl group At least one of them is protected by a protecting group. 如申請專利範圍第4項記載之n型半導體,其中前述保護基為烷基、苄基、p-甲氧基苄基、t-丁基、甲氧基甲基、2-四氫吡喃基、乙氧基乙基、乙醯基、三甲基乙醯基、苄醯基、三甲基矽烷基、三乙基矽烷基、t-丁基二甲基矽烷基、三異丙基矽烷基、或t-丁基二苯基矽烷基。 The n-type semiconductor according to claim 4, wherein the protecting group is an alkyl group, a benzyl group, a p-methoxybenzyl group, a t-butyl group, a methoxymethyl group or a 2-tetrahydropyranyl group. , ethoxyethyl, ethenyl, trimethylethenyl, benzindenyl, trimethyldecyl, triethyldecyl, t-butyldimethylalkyl, triisopropyldecyl Or t-butyldiphenyldecylalkyl. 一種清漆,其特徵為含有如申請專利範圍第1項至第5項中任一項記載之n型半導體與有機溶劑,且前述n型半導體溶解於有機溶劑中。 A varnish comprising the n-type semiconductor and the organic solvent according to any one of claims 1 to 5, wherein the n-type semiconductor is dissolved in an organic solvent. 一種n型有機半導體薄膜,其特徵為由如申請專利範圍第6項之清漆所得。 An n-type organic semiconductor thin film obtained by the varnish as claimed in claim 6 of the patent application. 一種n型有機半導體薄膜,其特徵為含有如申請專利範圍第1項至第5項中任一項記載之n型半導體。 An n-type organic semiconductor thin film comprising the n-type semiconductor according to any one of claims 1 to 5. 一種有機半導體元件,其特徵為具備如申請專利範圍第7項或第8項記載之n型有機半導體薄膜。 An organic semiconductor device comprising the n-type organic semiconductor thin film according to item 7 or item 8 of the patent application. 一種場效電晶體,其特徵為具備如申請專利範圍第7項或第8項記載之n型有機半導體薄膜。 A field effect transistor characterized by having an n-type organic semiconductor thin film as described in claim 7 or 8. 一種有機薄膜太陽能電池,其特徵為具備如申請專利範圍第7項或第8項記載之n型有機半導體薄膜。 An organic thin film solar cell characterized by comprising an n-type organic semiconductor thin film as described in claim 7 or 8. 一種富勒烯化合物,其特徵為以下述式(2)所表示者, [式中,R1 ~R5 各自獨立表示氫原子或OR7 (R7 表示單糖殘基或肌醇殘基)基,R6 表示碳數1~5之烷基;但,R1 ~R5 之中之至少2個為前述OR7 基]。A fullerene compound characterized by being represented by the following formula (2), [wherein, R 1 to R 5 each independently represent a hydrogen atom or OR 7 (R 7 represents a monosaccharide residue or an inositol residue) group, and R 6 represents an alkyl group having 1 to 5 carbon atoms; however, R 1 ~ At least two of R 5 are the aforementioned OR 7 groups].
TW098138686A 2008-11-14 2009-11-13 An n-type semiconductor composed of a fullerene compound TWI477489B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008292440 2008-11-14

Publications (2)

Publication Number Publication Date
TW201024262A TW201024262A (en) 2010-07-01
TWI477489B true TWI477489B (en) 2015-03-21

Family

ID=42170028

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098138686A TWI477489B (en) 2008-11-14 2009-11-13 An n-type semiconductor composed of a fullerene compound

Country Status (3)

Country Link
JP (1) JP5494491B2 (en)
TW (1) TWI477489B (en)
WO (1) WO2010055898A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011258944A (en) * 2010-05-13 2011-12-22 Nissan Chem Ind Ltd Organic solar cell prepared using fullerene derivative
JP5979710B2 (en) * 2012-04-12 2016-08-31 日産化学工業株式会社 Fullerene derivative and organic solar cell using the same
WO2014203887A1 (en) * 2013-06-20 2014-12-24 日産化学工業株式会社 Method for manufacturing n-type organic semiconductor thin film

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6399785B1 (en) * 1995-07-31 2002-06-04 C-Sixty, Inc. Multiply-substituted fullerenes
JP2006060169A (en) * 2004-08-24 2006-03-02 National Institute Of Advanced Industrial & Technology Field effect transistor and method for manufacturing same
EP1132380B1 (en) * 2000-03-06 2008-01-23 Long Y. Chiang E-Isomeric fullerene derivatives

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4253858B2 (en) * 1998-03-12 2009-04-15 生化学工業株式会社 Fullerene derivative and method for producing the same
JP5529439B2 (en) * 2008-06-23 2014-06-25 独立行政法人物質・材料研究機構 Fullerene derivative composition and field effect transistor device using the same
JP5344432B2 (en) * 2008-08-05 2013-11-20 三洋化成工業株式会社 Photoelectric conversion element

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6399785B1 (en) * 1995-07-31 2002-06-04 C-Sixty, Inc. Multiply-substituted fullerenes
EP1132380B1 (en) * 2000-03-06 2008-01-23 Long Y. Chiang E-Isomeric fullerene derivatives
JP2006060169A (en) * 2004-08-24 2006-03-02 National Institute Of Advanced Industrial & Technology Field effect transistor and method for manufacturing same

Also Published As

Publication number Publication date
JP5494491B2 (en) 2014-05-14
JPWO2010055898A1 (en) 2012-04-12
WO2010055898A1 (en) 2010-05-20
TW201024262A (en) 2010-07-01

Similar Documents

Publication Publication Date Title
TWI439461B (en) Perylene semiconductors and methods of preparation and use thereof
JP6025748B2 (en) Naphthalene diimide and lylene diimide compounds substituted with thiocyanate or isothiocyanate, and their use as n-type semiconductors
JP6219314B2 (en) Triptycene derivative useful as a self-assembled film forming material, its production method, film using it, and its production method
JP6080870B2 (en) Organic semiconductor material for solution process and organic semiconductor device
US20050258398A1 (en) Dithia-s-indacene derivative
JP2010510228A (en) Diimide-based semiconductor material and method for preparing diimide-based semiconductor material
JP2010510228A5 (en)
WO2007146250A2 (en) Naphthalene-based semiconductor materials and methods of preparing and use thereof
Chien et al. Tetracene-based field-effect transistors using solution processes
TWI477489B (en) An n-type semiconductor composed of a fullerene compound
CN105061463B (en) A kind of nine yuan of fused-ring derivatives and its synthetic method and application
JP5187737B2 (en) FIELD EFFECT TRANSISTOR, PROCESS FOR PRODUCING THE SAME, COMPOUND USED FOR THE SAME, AND INK FOR SEMICONDUCTOR DEVICE
JP2006036755A (en) Device with small molecular thiophene compound having divalent linkage
JP2006013483A (en) Apparatus equipped with small molecular thiophene compound
JP5793134B2 (en) Organic semiconductor material containing perylene tetracarboxylic acid diimide compound, and organic semiconductor element
JP2015502937A (en) COMPOUNDS WITH SEMICONDUCTOR PROPERTIES, AND RELATED COMPOSITIONS AND DEVICES
TWI598349B (en) Halogenated perylene-based semiconducting materials
CN110461824B (en) Method for producing polymerizable compound and solution
DE102010031897A1 (en) Semiconductors based on substituted [1] benzothieno [3,2-b] [1] benzothiophenes
CN108484500B (en) Preparation method of 1-trifluoroethyl isoquinoline
JP5194626B2 (en) Fullerene derivative and its solution, production method and membrane
JP6474276B2 (en) Picenodithiophene compounds, organic semiconductor materials, organic semiconductor layers, organic semiconductor elements
TW201139391A (en) Nitrogen-containing condensed ring compound, nitrogen-containing condensed ring polymer, organic thin film and organic thin film element
TWI789253B (en) Nonfullerene acceptor compound and photovoltaic device comprising the same
WO2022191092A1 (en) Quinoline compound, hnmt inhibitor, and agent for preventing/treating adhd, narcolepsy, or alzheimer's disease

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees