TWI474366B - - Google Patents
Info
- Publication number
- TWI474366B TWI474366B TW101143729A TW101143729A TWI474366B TW I474366 B TWI474366 B TW I474366B TW 101143729 A TW101143729 A TW 101143729A TW 101143729 A TW101143729 A TW 101143729A TW I474366 B TWI474366 B TW I474366B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110457216.7A CN103187234B (en) | 2011-12-30 | 2011-12-30 | A kind of adjustable constraint device for plasma processing apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201338012A TW201338012A (en) | 2013-09-16 |
| TWI474366B true TWI474366B (en) | 2015-02-21 |
Family
ID=48678345
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101143729A TW201338012A (en) | 2011-12-30 | 2012-11-22 | Adjustable apparatus for use in plasma processing device |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN103187234B (en) |
| TW (1) | TW201338012A (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111326391B (en) * | 2018-12-17 | 2023-01-24 | 中微半导体设备(上海)股份有限公司 | Plasma processing apparatus |
| CN111383893B (en) * | 2018-12-29 | 2023-03-24 | 中微半导体设备(上海)股份有限公司 | Plasma processor and plasma control method |
| CN112687510B (en) * | 2019-10-18 | 2023-10-31 | 中微半导体设备(上海)股份有限公司 | Plasma processor and method for preventing arc damage of confinement rings |
| CN112928007B (en) * | 2019-12-06 | 2023-09-12 | 中微半导体设备(上海)股份有限公司 | Plasma processing apparatus and lower electrode assembly for the same |
| CN113130282B (en) * | 2019-12-31 | 2023-10-20 | 中微半导体设备(上海)股份有限公司 | Plasma confinement structure, manufacturing method thereof and plasma processing device |
| CN113838730B (en) * | 2020-06-08 | 2024-05-14 | 中微半导体设备(上海)股份有限公司 | Gas shielding ring, plasma processing device and method for regulating and controlling polymer distribution |
| CN115050623A (en) * | 2021-03-08 | 2022-09-13 | 中微半导体设备(上海)股份有限公司 | Plasma processing device |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWM370181U (en) * | 2009-07-03 | 2009-12-01 | Advanced Micro Fab Equip Inc | A plasma processing apparatus |
| TWM377038U (en) * | 2009-05-15 | 2010-03-21 | Advanced Micro Fab Equip Inc | Plasma confinement device and plasma processing device using the same |
| CN201503847U (en) * | 2009-07-03 | 2010-06-09 | 中微半导体设备(上海)有限公司 | Plasma processing device |
| US20100176085A1 (en) * | 2007-08-21 | 2010-07-15 | Panasonic Corporation | Plasma processing device and method of monitoring plasma discharge state in plasma processing device |
| US20110115466A1 (en) * | 2006-03-31 | 2011-05-19 | Daihen Corporation | Current detection printed board, voltage detection printed board, current/voltage detection printed board, current/voltage detector, current detector and voltage detector |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6896765B2 (en) * | 2002-09-18 | 2005-05-24 | Lam Research Corporation | Method and apparatus for the compensation of edge ring wear in a plasma processing chamber |
| US7075771B2 (en) * | 2003-05-21 | 2006-07-11 | Tokyo Electron Limited | Apparatus and methods for compensating plasma sheath non-uniformities at the substrate in a plasma processing system |
| US7632375B2 (en) * | 2004-12-30 | 2009-12-15 | Lam Research Corporation | Electrically enhancing the confinement of plasma |
| CN1909760B (en) * | 2005-08-05 | 2010-07-21 | 中微半导体设备(上海)有限公司 | Vacuum reaction chamber and processing method |
| CN101150909B (en) * | 2006-09-22 | 2010-05-12 | 中微半导体设备(上海)有限公司 | Plasm restraint device |
| JP5350043B2 (en) * | 2009-03-31 | 2013-11-27 | 東京エレクトロン株式会社 | Plasma processing apparatus and plasma processing method |
-
2011
- 2011-12-30 CN CN201110457216.7A patent/CN103187234B/en active Active
-
2012
- 2012-11-22 TW TW101143729A patent/TW201338012A/en unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110115466A1 (en) * | 2006-03-31 | 2011-05-19 | Daihen Corporation | Current detection printed board, voltage detection printed board, current/voltage detection printed board, current/voltage detector, current detector and voltage detector |
| US20100176085A1 (en) * | 2007-08-21 | 2010-07-15 | Panasonic Corporation | Plasma processing device and method of monitoring plasma discharge state in plasma processing device |
| TWM377038U (en) * | 2009-05-15 | 2010-03-21 | Advanced Micro Fab Equip Inc | Plasma confinement device and plasma processing device using the same |
| TWM370181U (en) * | 2009-07-03 | 2009-12-01 | Advanced Micro Fab Equip Inc | A plasma processing apparatus |
| CN201503847U (en) * | 2009-07-03 | 2010-06-09 | 中微半导体设备(上海)有限公司 | Plasma processing device |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201338012A (en) | 2013-09-16 |
| CN103187234A (en) | 2013-07-03 |
| CN103187234B (en) | 2016-03-16 |