TWI470380B - Anti - corrosive photoresist release agent composition - Google Patents

Description

Anti-corrosion photoresist stripper composition

The present invention relates to a composition of an anti-corrosive photoresist stripper, in particular, an anti-corrosive photoresist stripper composition having an excellent anti-corrosion effect by containing a specific anticorrosive agent.

Various release agents have been developed so far for the purpose of simply peeling off the photoresist applied to the inorganic substrate.

From the viewpoint of producing high-precision circuit wiring, it is required to peel off the photoresist without etching the aluminum, copper or inorganic substrate which is a metal wiring. In order to satisfy these requirements, a method of adding a carboxylic acid such as benzoic acid or citric acid, a chelating compound, a saccharide such as sorbitol, or a polyhydroxy aromatic such as catechol as an anticorrosive agent is being examined.

In the case of the liquid crystal display, the aluminum wiring is often used. In recent years, with the increase in the size of the liquid crystal display, it has been reviewed that copper wiring having a smaller aluminum resistance is being used from the viewpoint of the cost surface and the thin film. Therefore, it is desired to have a photoresist stripper which is not only aluminum but also has an excellent anti-corrosion effect on copper. However, there has not been known a release agent formulated with an anticorrosive formulation which exhibits sufficient anticorrosive effect on both copper and aluminum.

Patent Document 1 describes various types of corrosion inhibitors, and aromatic hydroxy compounds may also be used in combination with saccharides. However, there is no specific embodiment of the corrosion inhibitor formulation. Specific corrosion protection formulations are only described using 2,3-dihydroxynaphthalene (2,3-DHN) with benzoic acid and phthalic acid or phosphoric acid (chelating compound). Further, although the anticorrosive effect on aluminum was confirmed, the anticorrosive effect on copper was not confirmed.

In Patent Document 2, a sugar (linear polyol) and an aromatic hydroxy compound which are anticorrosive agents are used, but a composition of a peeling liquid composed of an aromatic hydroxy compound and a saccharide is not specifically disclosed in Examples and the like.

Although the condensed liquid composition containing a saccharide is disclosed in Patent Document 3, there is no description about the use of the aromatic hydroxy compound.

Further, Patent Document 7 relates to a non-aqueous cleaning composition containing a polar organic solvent and an organic hydroxylated amine compound, and is described as an aryl compound in which two or more hydroxyl groups are directly bonded to a saccharide or an aromatic ring. However, in the examples and the like, there is no specific disclosure of a release agent composition composed of an aromatic hydroxy compound and a sugar.

Patent Document 1: Special Publication No. 2005-70230

Patent Document 2: JP-A-2005-43874

Patent Document 3: JP-A-2000-241991

Patent Document 4: JP-A-9-319098

Patent Document 5: JP-A-2007-514983

Patent Document 6: Japanese Patent Publication No. 8-262746

Patent Document 7: Special Report 2007-514983

In order to solve the above problems, the present invention provides an anti-corrosion photoresist stripper which exhibits an excellent anti-corrosion effect in any of copper and aluminum in a wide temperature range or in the presence or absence of water. For the purpose.

The inventors of the present invention have conducted intensive studies to achieve the above object, and have found that the above problems can be solved by using an anticorrosive photoresist stripper composition using a combination of an aromatic polyhydroxy compound as a corrosion inhibitor and a saccharide, and the present invention is completed. .

That is, the present invention provides,

An anti-corrosion photoresist stripper composition comprising a polar organic solvent (A), an organic amine compound (B), and an anticorrosive agent (C) comprising a combination of an aromatic polyhydroxy compound and a saccharide,

2. The anti-corrosion photoresist stripper composition according to the above 1, which comprises a polar organic solvent (A), an organic amine compound (B), and an anticorrosive agent (C) composed of a combination of an aromatic polyhydroxy compound and a saccharide. And water,

3. The anti-corrosion photoresist stripper composition according to the above 1 or 2, which is an anticorrosive agent composed only of a polar organic solvent (A), an organic amine compound (B), and a combination of an aromatic polyhydroxy compound and a saccharide. (C) and water,

4. The anti-corrosion photoresist stripper composition according to any one of the above 1 to 3, wherein the polar organic solvent (A) is a guanamine solvent.

5. The anti-corrosion photoresist stripper composition according to any one of the above 1 to 4, wherein the organic amine compound (B) is one selected from the group consisting of monoethanolamine, N-methylethanolamine and N,N-dimethylethanolamine. More than one kind of organic amine compound,

6. The anti-corrosion photoresist stripper composition according to the above 1 to 5, wherein the aromatic polyhydroxy compound is represented by the following general formula (a).

R _m -Ar-(OH) _n ...(a)

(wherein R is an alkyl group or an aryl group, an Ar-based aromatic hydrocarbon structure, m is an integer of 0 to 4, and n is an integer of 2 to 6),

7. The anti-corrosion photoresist stripper composition according to any one of the above 1 to 6, wherein the saccharide is one or more selected from the group consisting of xylitol, sorbitol, arabitol, mannitol, glucose, and galactose. Sugar,

8. The anti-corrosion photoresist stripper composition according to any one of the above 1 to 7, wherein the corrosion inhibitor (C) contains an aromatic polyhydroxy compound and a saccharide in a ratio of 9:1 to 1:9 by mass, and

9. The anti-corrosive photoresist stripping composition according to any one of the above 1 to 8, wherein the polar organic solvent (A) contains 19 to 95% by mass, the organic amine compound (B) contains 4 to 80% by mass, and the foregoing corrosion protection The agent (C) is contained in an amount of 0.001 to 10% by mass.

According to the present invention, any of copper and aluminum can provide an anti-corrosive photoresist release agent composition exhibiting an excellent anti-corrosion effect in a wide temperature range or in the presence or absence of water.

[The best way to implement the invention]

The anticorrosive photoresist stripper composition of the present invention contains a polar organic solvent (A), an organic amine compound (B), and an anticorrosive agent (C) composed of a combination of an aromatic polyhydroxy compound and a saccharide.

The polar organic solvent (A) is not particularly limited as long as it can uniformly dissolve the organic amine compound and the aromatic polyhydroxy compound and the saccharide, and examples thereof include a guanamine solvent, an ether alcohol solvent, an alcohol solvent, and an ester solvent. , dimethyl hydrazine (DMSO), and the like. Specific examples of the guanamine-based solvent include N-methyl-2-pyrrolidone (NMP), dimethylformamide (DMF), and a compound represented by the following general formula (1). Particularly preferred are the amide-based solvents of the general formula below, specifically 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide Better.

[Chemical 1]

(wherein R ¹ is a linear or branched alkyl group having 1 to 6 carbon atoms; and R ² and R ³ are each independently a linear or branched alkyl group having 1 to 3 carbon atoms; .)

Specific examples of the linear alkyl group include a methyl group, an ethyl group, a n-propyl group, a n-butyl group, a n-heptyl group, and a n-hexyl group.

Specific examples of the above branched alkyl group include isopropyl group, second butyl group, isobutyl group, tert-butyl group, 2-methylbutyl group, 3-methylbutyl group, isopentyl group, and 2- Ethylpropyl, neopentyl.

Specific examples of the ether alcohol-based solvent include diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monopropyl ether, diethylene glycol monobutyl ether (BDG), and the like. .

Specific examples of the ester solvent include γ-butyrolactone and butyl acetate.

Specific examples of the alcohol solvent include ethylene glycol and propylene glycol.

The polar organic solvent (A) may be used alone or in combination of two or more. In the polar organic solvent (A), a guanamine-based solvent is preferred, and in order to have high amphiphilic solubility, 3-methoxy-N,N-dimethylpropanamide and 3 are used. - Butoxy-N,N-dimethylpropionamide is particularly preferred.

Specific examples of the organic amine compound (B) include a primary alkanolamine such as monoethanolamine, monoisopropanolamine or diethylene glycolamine, N-methylethanolamine, N-methylpropanolamine, and N-methyl group. a secondary alkanolamine such as butanolamine, N-ethylethanolamine or diethanolamine, a secondary amine such as diethylamine, N,N-dimethylethanolamine, N-methyldiethanolamine, N-ethyldiethanolamine a tertiary alkanolamine such as N-propyldiethanolamine or N-butyldiethanolamine or a tertiary amine such as triethylamine. Among them, from the viewpoint of the anti-corrosion function, an ethanolamine-based compound such as monoethanolamine, N-methylethanolamine or N,N-dimethylethanolamine can be preferably used, and in particular, a secondary alkanol can be used from the viewpoint of exhibiting a greater anticorrosive effect. N-methylethanolamine of an amine and N,N-dimethylethanolamine of a tertiary alkanolamine are preferred. These organic amine compounds (B) may be used alone or in combination of two or more.

The corrosion inhibitor (C) is composed of a combination of an aromatic polyhydroxy compound and a saccharide.

The above aromatic polyhydroxy compound is preferably represented by the following general formula (a).

R _m -Ar-(OH) _n ...(a)

(In the formula, R is an alkyl group or an aryl group, and an Ar-based aromatic hydrocarbon structure, m is 0 to 4, preferably an integer of 1 to 2, and n is 2 to 6, preferably an integer of 2 to 4.)

In the above general formula (a), R is an alkyl group or an aryl group.

The alkyl group represented by R in the above general formula (a) is preferably one having a carbon number of from 1 to 50, more preferably from 1 to 20 carbon atoms. The alkyl group may be linear, branched or cyclic, and specific examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a second butyl group, and a third butyl group. Pentyl, hexyl, cyclohexyl, heptyl, octyl, octadecyl and the like.

The aryl group represented by R in the above general formula (a) is preferably a carbon number of 6 to 50, more preferably a carbon number of 6 to 18. Specific examples of the aryl group include a phenyl group, a naphthyl group, an anthracenyl group, and a fluorenyl group. Base, biphenyl, terphenyl, and the like.

The aromatic polyhydroxy structure represented by Ar in the above general formula (a) is preferably a carbon number of 6 to 50, and more preferably a carbon number of 6 to 18. Specific examples of the aromatic polyhydroxy structure include those having a specific example of the above aryl group.

Specific examples of the aromatic polyhydroxy compound include catechol, tert-butylbenzenediol, resorcinol, hydroquinone, pyrogallol, and 1,2,4-benzenetriol. It is preferred to use hydroquinone. These aromatic polyhydroxy compounds may be used alone or in combination of two or more.

Specific examples of the saccharide include xylitol, sorbitol, arabitol, mannitol, glucose, and galactose, and xylitol and sorbitol are preferred. These saccharides may be used alone or in combination of two or more.

In the present invention, the ratio of the aromatic polyhydroxy compound to the saccharide in the corrosion inhibitor (C) is preferably in the range of 9:1 to 1:9 by mass ratio, and 8:2 to 5:5 from the viewpoint of the anti-corrosion effect. The range is better.

The composition of the anti-corrosive photoresist stripper of the present invention is not limited to a specific composition ratio, and is preferably a peeling function which can be used as a release agent, and is relative to the polar organic solvent (A) and the organic amine compound (B). And the total amount of the corrosion inhibitor (C), the polar organic solvent (A) is contained in an amount of 20 to 98% by mass, the organic amine compound (B) is contained in an amount of 1 to 79% by mass, and the corrosion inhibitor (C) is contained in an amount of 0.001 to 10% by mass. The content of (A) is preferably 50 to 96% by mass, the organic amine compound (B) is 3 to 49% by mass, and the corrosion inhibitor (C) is preferably 0.01 to 5% by mass. Further, the corrosion inhibitor (C) has an anticorrosive effect even if it contains a very small amount, and is preferably contained in an amount of 0.001 to 10% by mass, more preferably 0.01 to 5% by mass.

The corrosion-resistant photoresist stripper composition of the present invention exhibits good corrosion resistance even when the corrosion inhibitor (C) is contained in an amount of 0.001 to 1% by mass, and further contains 0.01 to 0.5% by mass.

The anti-corrosive photoresist stripper composition of the present invention may further contain water. In general, due to the presence of moisture in the photoresist release agent, the peeling function is lowered and the inorganic matrix is easily corroded. However, the anti-corrosion photoresist stripper composition of the present invention is not only in the presence of water, but also in the presence of water. Excellent corrosion resistance.

The amount of water in the composition of the anti-corrosive photoresist stripper of the present invention is 100 parts by mass based on the total amount of the polar organic solvent (A), the organic amine compound (B) and the corrosion inhibitor (C), and the water is 100 mass. The following is preferred, and 20 parts by mass or less is more preferred. On the other hand, the total amount of the polar organic solvent (A), the organic amine compound (B), and the corrosion inhibitor (C) is 100 in terms of the low flammability and ease of use of the composition of the resistive photoresist release agent. The amount of water is preferably 20 parts by mass or more, more preferably 20 to 100 parts by mass.

When the anticorrosive photoresist stripper composition of the present invention is used not only in the presence of anhydrous, but also in the presence of water, since it exhibits a uniform anticorrosive effect over a wide temperature range, temperature control and self-peeling are easily performed. From the standpoint of performance, there is an advantage that the optimum temperature can be determined. When the composition of the anti-corrosive photoresist stripper of the present invention is preferably used at a temperature of 30 to 90 ° C, more preferably 40 to 80 ° C, and an optimum temperature of 65 to 80 ° C, the effects of the present invention can be more remarkably exhibited.

The anti-corrosive photoresist stripper composition of the present invention has an anti-corrosion function for a wide variety of inorganic substrates. Examples of the inorganic substrate include cerium oxide, poly cerium oxide, cerium oxide oxide film, semiconductor wiring materials such as aluminum, aluminum alloy, titanium, titanium tungsten lanthanide, titanium nitride, tungsten, or gallium-arsenic, gallium-phosphorus, and the like. A compound semiconductor such as indium-phosphorus or the like is a glass substrate of an LCD, and is particularly excellent for metals such as aluminum, aluminum alloy (Al-Cu), copper, tantalum, and titanium, cerium oxide, and poly-cerium oxide. Anti-corrosion effect.

The anti-corrosion photoresist stripper composition of the present invention can be used for peeling off a photoresist film applied on an inorganic substrate or a photoresist layer remaining after dry etching of a photoresist film coated on an inorganic substrate, or After the dry etching, the photoresist film on the inorganic substrate such as the photoresist residue remaining after the photoresist ashing is subjected to the above-described peeling step, and may be appropriately heated or used in combination with ultrasonic waves. Moreover, the method of treating the composition of the anti-corrosive photoresist stripper of the present invention is generally a spraying method, but a dipping method or the like may also be used.

Example

Hereinafter, the present invention will be described in more detail by way of examples and comparative examples, but the invention is limited by these examples.

<mixed ingredients>

The mixing components used in Examples 1 to 17 and Comparative Examples 1 to 10 are as follows.

Polar organic solvent (A):

3-methoxy-N,N-dimethylpropanamide

Diethylene glycol monobutyl ether (BDG, manufactured by Wako Pure Chemical Industries, Ltd.)

Organic amine compound (B):

N-methylethanolamine (N-MeEtAm, manufactured by Wako Pure Chemical Industries, Ltd.)

Monoethanolamine (MEA, Wako Pure Chemical Industries, Ltd.)

N,N-dimethylethanolamine (DMAE, manufactured by Wako Pure Chemical Industries, Ltd.)

Corrosion inhibitor (C):

Aromatic polyhydroxy compounds:

Hydroquinone (made by Wako Pure Chemical Industries Co., Ltd.)

carbohydrate:

Xylitol (Sigma-Aldrich)

Sorbitol (produced by Pure Chemical Co., Ltd.)

Example 1

86.5 mass% of 3-methoxy-N,N-dimethylpropionamide and 12.5% by mass of N-MeEtAm were used as a substrate, and 0.5% by mass of hydroquinone and 0.5% by mass of xylose were added. 1.0% by mass of an anticorrosive agent composed of an alcohol was prepared into an anti-corrosion photoresist stripper composition. The mixing ratio is shown in Table 1. Further, the obtained corrosion-resistant photoresist stripper composition was evaluated for corrosion rate, water concentration dependency, and temperature dependency of copper and aluminum in the following order.

(Evaluation of corrosion rate)

Al and Cu evaporation on the glass plate (about 7000) After that, it was made into two kinds of test pieces. The corrosion-resistant photoresist stripper composition obtained above was maintained at 60 ° C, and two kinds of test pieces were immersed for 33 minutes. After the immersion, the test piece was sufficiently washed with isopropyl alcohol, and then air-dried, and the surface resistance was measured by a 4-point probe method to calculate the corrosion rate. The evaluation results of the corrosion rate of Cu are shown in Table 2, and the evaluation results of the corrosion rate of Al are shown in Table 3.

(Evaluation of water concentration correlation)

To 100 parts by mass of the anti-corrosive photoresist release agent composition, 1 to 99 parts by mass of water was added, and the corrosion rate was evaluated in the same manner as above. The evaluation results of the corrosion rate of Cu are shown in Table 2, and the evaluation results of the corrosion rate of Al are shown in Table 3.

(Evaluation of temperature correlation)

The corrosion rate was evaluated in the same manner as above for the treatment temperatures of 40 ° C and 80 ° C, respectively. The evaluation results of the corrosion rates at the respective temperatures are shown in Table 4.

Example 2

The photoresist stripper composition was prepared in the same manner as in Example 1 except for the composition ratio shown in Table 1, and the corrosion rate and water concentration correlation were evaluated. The evaluation results of the corrosion rate of Cu are shown in Table 2, and the evaluation results of the corrosion rate of Al are shown in Table 3.

Comparative Examples 1 and 2

The photoresist stripper composition was prepared in the same manner as in Example 1 except for the mixing ratio shown in Table 1, and the corrosion rate and water concentration correlation were evaluated. The evaluation results of the corrosion rate of Cu are shown in Table 2, and the evaluation results of the corrosion rate of Al are shown in Table 3.

Comparative example 3

The photoresist stripper composition was prepared in the same manner as in Example 1 except for the mixing ratio shown in Table 1, and the corrosion rate, water concentration correlation, and temperature dependency were evaluated. The evaluation results of the Cu corrosion rate are shown in Table 2, the evaluation results of the Al corrosion rate are shown in Table 3, and the temperature correlation evaluation results are shown in Table 4.

Compared with Examples 1 and 2 containing hydroquinone and saccharides, Comparative Example 1 containing no such compounds, Comparative Example 2 containing only xylitol, Comparative Example 3 containing only hydroquinone, and copper The corrosion rate was extremely fast, and the corrosion-resistant photoresist stripper compositions obtained in Examples 1 and 2 were found to have excellent corrosion resistance to both copper and aluminum.

Further, in Examples 1 and 2, even if water was added to the composition of the anti-corrosion photoresist stripper, it exhibited excellent corrosion resistance with respect to a wide range of water concentration, and in Comparative Examples 1 to 3, The increase in water concentration, especially the corrosion rate of copper, is significantly faster.

Further, the corrosion-resistant photoresist stripper composition obtained in Example 1 was obtained by the corrosion-resistant photoresist stripper obtained in Comparative Examples 3, 4 and 7 with respect to the corrosion resistance which was exhibited at a wide temperature range of 40 to 80 ° C. The composition will have a particularly high corrosion rate of copper due to temperature.

Examples 3 and 4

The corrosion-resistant photoresist release agent composition was prepared in the same manner as in Example 1 except for the mixing ratio shown in Table 5, and the corrosion rates were evaluated. The evaluation results are shown in Table 5.

Based on Examples 3 and 4, by using different amines, the corrosion protection effect of the corrosion inhibitor was used in combination. The DMAE of the tertiary alkanolamine was mixed in Example 4 with 3-methoxy-N,N-dimethylpropionamide in Example 3, and the corrosion rate shown in Table 5 was evaluated. result. From the results, it can be seen that when the two anticorrosive agents are used in combination, it is more effective to mix the secondary amine or the tertiary amine compound than when the primary amine is mixed.

Examples 5 to 13

The corrosion-resistant photoresist release agent composition was prepared in the same manner as in Example 1 except that the mixing ratios shown in Tables 6 and 7 were used. 40 parts by mass of water was added to 100 parts by mass of the obtained corrosion-resistant photoresist release agent composition, and the corrosion rate was evaluated. The evaluation results are shown in Tables 6 and 7.

Example 14

The corrosion-resistant photoresist release agent composition was prepared in the same manner as in Example 1 except that the mixing ratios shown in Table 8 were used. 10 parts by mass of water was added to 100 parts by mass of the obtained corrosion-resistant photoresist release agent composition, and the corrosion rate was evaluated. The evaluation results are shown in Table 8.

Comparative example 4

The photoresist stripper composition was prepared in the same manner as in Example 14 except for the mixing ratio shown in Table 8, and the corrosion rate and temperature dependency thereof were evaluated. The evaluation results of the corrosion rate are shown in Table 8, and the evaluation results of the temperature dependence are shown in Table 4.

Comparative Examples 5 and 6

The photoresist stripper composition was prepared in the same manner as in Example 14 except for the mixing ratio shown in Table 8, and the etching rate was evaluated. The evaluation results are shown in Table 8.

Example 15

The corrosion-resistant photoresist release agent composition was prepared in the same manner as in Example 1 except that the mixing ratios shown in Table 9 were used. The corrosion rate of the obtained anti-corrosion photoresist stripper composition was evaluated. The evaluation results are shown in Table 9.

Comparative Example 7

The photoresist stripper composition was prepared in the same manner as in Example 15 except for the mixing ratio shown in Table 9, and the corrosion rate and temperature dependency were evaluated. The evaluation results of the corrosion rate are shown in Table 9, and the evaluation results of the temperature dependence are shown in Table 4.

Comparative Examples 8 and 9

The photoresist stripper composition was prepared in the same manner as in Example 15 except for the mixing ratio shown in Table 9, and the corrosion rate was evaluated. The evaluation results are shown in Table 9.

Example 16

The corrosion-resistant photoresist stripper composition was prepared in the same manner as in Example 1 except that the xylitol was replaced with sorbitol, and the corrosion rate was evaluated in the same manner as in Example 1. The evaluation results are shown in Table 10. Further, the peeling performance of the corrosion-resistant photoresist stripper composition was evaluated in the following order.

(evaluation of peeling performance)

A positive-type photoresist composition (HPR204, 8 cps manufactured by Fuji FILM Electronic Materials Co., Ltd.) was applied onto a sufficiently cleaned glass substrate, and coated by a spin coater (750 rpm × 20 s) in the oven. The conditions are described as firing.

Firing conditions: 80 ° C × 15 minutes + 130 ° C × 15 minutes + 160 ° C × 15 minutes

The glass substrate was cut into a size of 5 × 5 mm to obtain a test piece.

Approximately 10 ml of the anti-corrosive photoresist stripper composition was placed in the beaker and maintained at a constant temperature of 70 ° C in an oil bath. The test piece was immersed therein, and after 2 minutes, it was sufficiently rinsed with pure water immediately after taking out, and then dried by air drying.

After observing the test piece by a scanning electron microscope (SEM), it was confirmed that the photoresist was completely removed.

Comparative Example 10

The photoresist stripper composition was prepared in the same manner as in Example 16 except for the mixing ratio shown in Table 10, and the corrosion rate was evaluated. The results are shown in Table 10.

According to the examples 1, 5 to 13 and 16 and the comparative example 10, it was confirmed that the composition of the anticorrosive photoresist stripper of the present invention after the formulation of the aromatic polyhydroxy compound and the saccharide was used together, even if the overall corrosion inhibitor concentration was low. It can also exert sufficient anti-corrosion effect. On the other hand, when sorbitol was added at a low concentration alone (Comparative Example 10), the corrosion resistance to aluminum was confirmed, but corrosion of copper was greatly performed.

As described above, it was confirmed that the anti-corrosive photoresist stripper composition of the present invention has no temperature dependency and exhibits high corrosion resistance at a wide temperature, and also exhibits an anti-corrosion effect at a wide water concentration.

Further, according to Figs. 1 and 2, it can be seen that when hydroquinone is used in combination with xylitol or sorbitol, the total amount of the photoresist stripping agent which is separately formulated with xylitol and hydroquinone is added to the water. It has high corrosion resistance to both copper and aluminum. Furthermore, it can be confirmed from FIGS. 3 and 4 that the anti-corrosion photoresist stripper composition of the present invention has a lower temperature dependency than other anti-corrosion formulations, and can sufficiently exert an anti-corrosion effect on any of copper and aluminum at various temperatures. .

Industrial availability

As described in detail above, the anti-corrosive photoresist stripper composition of the present invention exhibits an excellent anti-corrosion effect for both copper and aluminum, and is applicable to application to inorganics due to low water concentration correlation and temperature dependency. A stripper or the like for the photoresist on the substrate.

Fig. 1 is a graph showing the correlation between the amount of each of the water-added amount and the copper corrosion rate (Table 2) of the (corrosion-resistant) photoresist stripper composition prepared in Examples 1 and 2 and Comparative Examples 1 to 3.

Fig. 2 is a graph showing the correlation between the (anti-corrosion) photoresist stripper composition prepared in Examples 1 and 2 and Comparative Examples 1 to 3, the amount of each water added, and the aluminum corrosion rate (Table 3).

Fig. 3 is a graph showing the Cu corrosion rate at each temperature of the (corrosion resistant) photoresist stripper composition prepared in Example 1 and Comparative Examples 3, 4 and 7. (Table 4).

Fig. 4 is a graph showing the Al corrosion rate at each temperature of the (corrosion resistant) photoresist stripper composition prepared in Example 1 and Comparative Examples 3, 4 and 7. (Table 4).

Claims (4)

An anti-corrosion photoresist stripper composition comprising a polar organic solvent (A), an organic amine compound (B), and an anti-corrosion resist of an anticorrosive agent (C) composed of a combination of an aromatic polyhydroxy compound and a saccharide a stripper composition characterized in that the polar organic solvent (A) is one or more selected from the group consisting of a guanamine solvent, dimethyl hydrazine (DMSO), and diethylene glycol monobutyl ether (BDG). The organic amine compound (B) is one or more selected from the group consisting of monoethanolamine, N-methylethanolamine, and N,N-dimethylethanolamine, and the aromatic polyhydroxy compound of one of the corrosion inhibitors (C) is in the following general formula. (a) indicates that the other sugar is one or more selected from the group consisting of xylitol, sorbitol, arabitol, mannitol, glucose, and galactose, and is organic with respect to the aforementioned polar organic solvent (A). The total amount of the amine compound (B) and the corrosion inhibitor (C), the content of the polar organic solvent (A) is 20 to 98% by mass, the content of the organic amine compound (B) is 1 to 79% by mass, and the aforementioned corrosion inhibitor The content of (C) is 0.001 to 1% by mass, and R _m -Ar-(OH) _n (a) (wherein R is an alkyl group or an aryl group, an Ar-based aromatic hydrocarbon structure, m system An integer from 0 to 4, n is an integer from 2 to 6.) An anti-corrosion photoresist stripper composition according to the first aspect of the patent application, which comprises a polar organic solvent (A), an organic amine compound (B), and an anticorrosive agent composed of a combination of an aromatic polyhydroxy compound and a saccharide ( C) and water. An anti-corrosion photoresist stripper composition according to the first aspect of the patent application, which is an anticorrosive agent composed only of a polar organic solvent (A), an organic amine compound (B), and a combination of an aromatic polyhydroxy compound and a saccharide. (C) and water. The anti-corrosion photoresist stripper composition according to claim 1, wherein the anti-corrosion agent (C) contains an aromatic polyhydroxy compound and a saccharide in a ratio of a mass ratio of 9:1 to 1:9.