TWI465715B - Method for testing the solder in through hole of printed circuit board - Google Patents

Method for testing the solder in through hole of printed circuit board Download PDF

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TWI465715B
TWI465715B TW101100629A TW101100629A TWI465715B TW I465715 B TWI465715 B TW I465715B TW 101100629 A TW101100629 A TW 101100629A TW 101100629 A TW101100629 A TW 101100629A TW I465715 B TWI465715 B TW I465715B
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hole
tin
layer
circuit board
copper layer
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TW201329443A (en
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Yao-Wen Bai
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Zhen Ding Technology Co Ltd
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Description

電路板孔內焊錫之測試方法Test method for solder in the hole of circuit board

本發明涉及一種電路板之測試方法,尤其涉及一種噴錫後之電路板之孔內焊錫裂縫或孔內缺錫等焊錫不良之測試方法。The invention relates to a test method for a circuit board, in particular to a test method for solder defects such as solder cracks in a hole of a circuit board after tin-spraying or tin deficiency in a hole.

噴錫作為電路板板面處理之一種常見之表面塗敷形式,被廣泛地用於線路之生產,噴錫之品質之好壞直接會影響到後續客戶生產時焊接之品質和焊錫性,故噴錫之品質成為電路板生產廠家品質控制一個重點。As a common surface coating form for circuit board surface treatment, spray tin is widely used in the production of wires. The quality of spray tin directly affects the quality and solderability of subsequent customers during production. The quality of tin has become a focus of quality control for circuit board manufacturers.

於對較厚之電路板之孔內噴錫時,常因焊料之粘度高而導致焊料不易進入孔內,從而使孔內上錫不良,部分區域出現缺錫之狀況。另,因應力等原因,孔內焊錫還容易發生焊錫裂縫等不良。孔內焊錫裂縫或孔內缺錫等不良常會導致電路板之可信賴性下降,故於電路板測試時,必須將這些不良找出來。孔內焊錫裂縫或孔內缺錫較難藉由外觀檢測而檢出,一般需要製作切片後使用顯微鏡進行觀察才能發現,切片之製作較為繁瑣,一般需要灌膠、固化、粗磨以及細磨等流程才能於顯微鏡下觀察,並且切片之製作需要有一定之經驗技術,沒有經驗之操作工製作切片較為困難,很難將切片打磨平整和均勻,而切片製作品質之好壞,將直接關係到對切片樣品之品質研究和判斷之正確性。When tin is sprayed into the hole of a thick circuit board, the solder is often difficult to enter the hole due to the high viscosity of the solder, so that the tin in the hole is poor, and the tin is deficient in some areas. In addition, due to stress, etc., solder in the hole is also prone to defects such as solder cracks. Defects such as solder cracks in the holes or tin deficiency in the holes often lead to a decrease in the reliability of the board, so these defects must be found during board testing. It is difficult to detect the crack in the solder or the tin in the hole by the appearance inspection. It is generally necessary to make a slice and observe it with a microscope. The production of the slice is cumbersome, and generally requires glue filling, solidification, rough grinding, fine grinding, etc. The process can be observed under the microscope, and the production of the slice requires a certain amount of experience and technology. It is difficult to make the slice by the inexperienced operator. It is difficult to smooth the slice and evenly, and the quality of the slice is good or bad. The correctness of the quality study and judgment of the sliced samples.

有鑒於此,有必要提供一種操作簡便之電路板孔內焊錫之測試方法。In view of this, it is necessary to provide a test method for soldering in the hole of a circuit board which is easy to operate.

一種電路板孔內焊錫之測試方法,包括步驟:提供一待測電路板,所述待測電路板包括一基材,所述基材具有相對之第一表面和第二表面,所述基材上開設有一個貫穿第一表面和第二表面之通孔,所述通孔之孔壁鍍有孔銅層,所述第一表面形成有圍繞所述通孔之第一環狀銅層,所述第二表面形成有圍繞所述通孔之第二環狀銅層,所述第一環狀銅層、所述孔銅層以及所述第二環狀銅層無縫連接,所述第一環狀銅層、所述孔銅層以及所述第二環狀銅層之表面分別形成有無縫連接之第一噴錫層、第二噴錫層及第三噴錫層;量測所述第一噴錫層與第三噴錫層之間之電阻值,記錄為R1;將所述待測電路板浸泡於一鹼性蝕刻液中後取出,並進行清潔乾燥,所述鹼性蝕刻液之組分包括氨水、氯化銨及氯化銅,所述鹼性蝕刻液之PH範圍為7.8-9.0;再次量測所述第一噴錫層與第三噴錫層之間之電阻值,記錄為R2;及計算比值ΔR=(R2-R1)/R1,如果比值ΔR大於一設定值,則判定所述第二噴錫層存在焊錫不良。A method for testing solder in a hole in a circuit board, comprising the steps of: providing a circuit board to be tested, the circuit board to be tested comprising a substrate, the substrate having an opposite first surface and a second surface, the substrate The upper opening is provided with a through hole penetrating the first surface and the second surface, the hole wall of the through hole is plated with a hole copper layer, and the first surface is formed with a first annular copper layer surrounding the through hole, The second surface is formed with a second annular copper layer surrounding the through hole, the first annular copper layer, the hole copper layer and the second annular copper layer are seamlessly connected, the first Forming a seamlessly connected first tin-spraying layer, a second tin-spraying layer, and a third tin-spraying layer on the surfaces of the annular copper layer, the porous copper layer, and the second annular copper layer; The resistance value between a tin-spraying layer and a third tin-spraying layer is recorded as R1; the circuit board to be tested is immersed in an alkaline etching solution, and then taken out and cleaned and dried, and the alkaline etching liquid is used. The components include ammonia water, ammonium chloride and copper chloride, and the pH of the alkaline etching solution ranges from 7.8 to 9.0; the first spray is measured again The resistance value between the layer and the third tin-spraying layer is recorded as R2; and the calculated ratio ΔR=(R2-R1)/R1. If the ratio ΔR is greater than a set value, it is determined that the second tin-emitting layer has poor soldering. .

一種電路板孔內焊錫之測試方法,包括步驟:提供一待測電路板,所述待測電路板具有相對之第一表面和第二表面,並開設有均貫穿第一表面和第二表面之複數通孔,每個所述通孔之孔壁鍍有孔銅層,所述第一表面形成有複數依次連接之第一環狀銅層,每個第一環狀銅層圍繞一個對應之通孔,並與該通孔內之孔銅層無縫連接,所述第二表面形成有複數依次連接之第二環狀銅層,每個第二環狀銅層圍繞一個對應之通孔,並與該通孔內之孔銅層無縫連接,每個第一環狀銅層、每個孔銅層以及每個第二環狀銅層之表面分別形成有第一噴錫層、第二噴錫層及第三噴錫層;量測第一噴錫層與第三噴錫層之間之電阻值,記錄為R1;將所述待測電路板浸泡於鹼性蝕刻液中1至5分鐘後取出,並進行清潔乾燥,所述鹼性蝕刻液之組分包括氨水、氯化銨及氯化銅,所述鹼性蝕刻液之PH範圍為7.8-9.0;再次量測第一噴錫層與第三噴錫層之間之電阻值,記錄為R2;及計算比值ΔR=(R2-R1)/R1,若比值ΔR大於一設定值,則判定所述複數通孔內之至少一個第二噴錫層存在焊錫不良。A method for testing solder in a hole in a circuit board, comprising the steps of: providing a circuit board to be tested, wherein the circuit board to be tested has opposite first and second surfaces, and is open to penetrate the first surface and the second surface a plurality of through holes, a hole wall of each of the through holes is plated with a hole copper layer, and the first surface is formed with a plurality of first annular copper layers sequentially connected, each of the first annular copper layers surrounding a corresponding pass a hole, and is seamlessly connected to the hole copper layer in the through hole, the second surface is formed with a plurality of second annular copper layers sequentially connected, each second annular copper layer surrounding a corresponding through hole, and Seamlessly connecting with the hole copper layer in the through hole, each first annular copper layer, each hole copper layer and each second annular copper layer are respectively formed with a first tin-spraying layer and a second spraying a tin layer and a third tin-spraying layer; measuring a resistance value between the first tin-spraying layer and the third tin-spraying layer, recorded as R1; immersing the circuit board to be tested in an alkaline etching solution for 1 to 5 minutes After taking out and cleaning and drying, the components of the alkaline etching solution include ammonia water, ammonium chloride and copper chloride, and the alkali The pH of the etching solution is 7.8-9.0; the resistance between the first tin layer and the third tin layer is measured again, recorded as R2; and the ratio ΔR=(R2-R1)/R1 is calculated, if the ratio When ΔR is greater than a set value, it is determined that at least one of the second tin-spraying layers in the plurality of via holes has poor soldering.

本技術方案之電路板孔內焊錫不良之測試方法具有如下優點:採用測試鹼性蝕刻液浸泡前後所述第一噴錫層及第三噴錫層之間或所述長導線之電阻值之變化來判斷所述第二噴錫層存在有焊錫裂縫或部分位置有缺錫等不良,無需製作切片,操作簡便,不需要經驗技術即可進行測試及結果判定。The test method for poor soldering in the hole of the circuit board of the technical solution has the following advantages: the change of the resistance value between the first tin-plated layer and the third tin-plated layer or the long wire before and after immersion in the test alkaline etching solution It is judged that there is a defect such as a solder crack in the second tin-plated layer or a tin deficiency in a part of the position, and it is not necessary to make a slice, and the operation is simple, and the test and the result determination can be performed without an empirical technique.

下面將結合圖1及實施例,對本技術方案提供之電路板孔內焊錫不良之測試方法作進一步之詳細說明。The test method for soldering defects in the hole of the circuit board provided by the technical solution will be further described in detail below with reference to FIG. 1 and the embodiment.

電路板孔內焊錫不良之測試方法包括以下步驟:The test method for poor soldering in the hole of the circuit board includes the following steps:

第一步:提供一待測電路板10。The first step: providing a circuit board 10 to be tested.

請一併參閱圖2至圖3,所述待測電路板10包括一基材110,所述基材110之材質可為含增強材料如玻纖布基、紙基、複合基、芳醯胺纖維無紡布基、合成纖維基等或不含增強材料之樹脂基材,亦可係內層形成有線路之多層電路板。Referring to FIG. 2 to FIG. 3, the circuit board 10 to be tested includes a substrate 110. The material of the substrate 110 may be a reinforcing material such as a fiberglass cloth base, a paper base, a composite base, and an arylamine. A resin base material such as a fiber nonwoven fabric base, a synthetic fiber base or the like, or a reinforcing material may be a multilayer circuit board in which an inner layer is formed with a line.

所述基材110具有相對之第一表面111和第二表面112,所述基材110上設有一個貫通所述第一表面111和第二表面112之圓柱狀之通孔120,所述通孔120孔壁鍍有孔銅層130。所述第一表面111形成有圍繞所述通孔之第一環狀銅層140,所述第二表面112形成有圍繞所述通孔之第二環狀銅層150,所述第一環狀銅層140、所述孔銅層130以及所述第二環狀銅層150無縫連接。所述第一環狀銅層140、所述孔銅層130以及所述第二環狀銅層150之形成方式為電路板製作中之常見方式,即先於所述第一表面111及所述第二表面112形成所述第一環狀銅層140及所述第二環狀銅層150,再於所述通孔120內電鍍銅形成孔銅層130,同時於所述第一環狀銅層140及所述第二環狀銅層150上電鍍銅,使所述第一環狀銅層140、所述孔銅層130以及所述第二環狀銅層150無縫連接。所述第一環狀銅層140、所述孔銅層130以及所述第二環狀銅層150之表面分別形成有第一噴錫層160、第二噴錫層170及第三噴錫層180,所述第一噴錫層160、第二噴錫層170及第三噴錫層180亦為無縫連接。The substrate 110 has a first surface 111 and a second surface 112 opposite to each other. The substrate 110 is provided with a cylindrical through hole 120 penetrating the first surface 111 and the second surface 112. The hole 120 hole wall is plated with a porous copper layer 130. The first surface 111 is formed with a first annular copper layer 140 surrounding the through hole, and the second surface 112 is formed with a second annular copper layer 150 surrounding the through hole, the first ring shape The copper layer 140, the hole copper layer 130, and the second annular copper layer 150 are seamlessly connected. Forming the first annular copper layer 140, the via copper layer 130, and the second annular copper layer 150 in a manner common to circuit board fabrication, that is, prior to the first surface 111 and the The second surface 112 forms the first annular copper layer 140 and the second annular copper layer 150, and then electroplated copper into the through hole 120 to form a hole copper layer 130, and simultaneously the first annular copper The layer 140 and the second annular copper layer 150 are plated with copper to seamlessly connect the first annular copper layer 140, the via copper layer 130, and the second annular copper layer 150. a surface of the first annular copper layer 140, the hole copper layer 130, and the second annular copper layer 150 are respectively formed with a first tin-spraying layer 160, a second tin-spraying layer 170, and a third tin-spraying layer. 180. The first tin-spraying layer 160, the second tin-spraying layer 170, and the third tin-spraying layer 180 are also seamlessly connected.

其中,如果僅檢測一個所述通孔120內之噴錫層狀況,則所述孔銅層130不與所述基材110上之其他孔之孔銅層相電連接。當然,亦可測試相互電連接之複數通孔孔壁之孔銅層上之噴錫狀況,將電連接之複數通孔內之孔銅層作為一個整體進行測試,可增加測試之靈敏度,推薦所述待測電路板10包括基材及貫通基材之十個以上通孔,每個通孔對應一第一環狀銅層、一孔銅層及一第二環狀銅層,所述基材之第一表面形成有複數依次連接之第一環狀銅層,每個第一環狀銅層圍繞一個對應之通孔,並與該通孔內之孔銅層無縫連接,所述基材之與所述第一表面相對之第二表面形成有複數依次連接之第二環狀銅層,每個第二環狀銅層圍繞一個對應之通孔,並與該通孔內之孔銅層無縫連接,每個第一環狀銅層、每個孔銅層以及每個第二環狀銅層之表面分別形成有第一噴錫層、第二噴錫層及第三噴錫層。Wherein, if only the condition of the tin-plated layer in the through hole 120 is detected, the hole copper layer 130 is not electrically connected to the hole copper layer of the other holes on the substrate 110. Of course, it is also possible to test the tin-spraying condition on the copper layer of the plurality of through-hole holes electrically connected to each other, and test the hole copper layer in the plurality of through-holes of the electrical connection as a whole, thereby increasing the sensitivity of the test, and recommending the The circuit board 10 to be tested includes a substrate and ten or more through holes penetrating the substrate, each of the through holes corresponding to a first annular copper layer, a hole copper layer and a second annular copper layer, the substrate The first surface is formed with a plurality of first annular copper layers sequentially connected, each of the first annular copper layers surrounding a corresponding through hole and seamlessly connected with the hole copper layer in the through hole, the substrate The second surface opposite to the first surface is formed with a plurality of second annular copper layers sequentially connected, each second annular copper layer surrounding a corresponding through hole, and a hole copper layer in the through hole The first tin-plated layer, the second tin-sprayed layer and the third tin-sprayed layer are respectively formed on the surface of each of the first annular copper layer, the copper layer of each hole, and the surface of each of the second annular copper layers.

本測試方法之目的為檢測所述第二噴錫層170是否有焊錫裂縫或部分位置有缺錫等不良,於進行測試前,需要先確定所述第一噴錫層160及第三噴錫層180是否有焊錫裂縫或部分位置缺錫等缺陷,如果所述第一噴錫層160及第三噴錫層180存在缺陷,無法使用本技術方案之測試方法判斷缺陷是否位於所述第二噴錫層170。第一噴錫層160及第三噴錫層180之缺陷藉由外觀檢測方法即可檢出,無需對待測電路板10進行切片。The purpose of the test method is to detect whether the second tin-plated layer 170 has a solder crack or a defect in a part of the tin. Before the test, the first tin-plated layer 160 and the third tin-plated layer need to be determined. If there is a defect such as a solder crack or a partial tin deficiency, if the first tin-plated layer 160 and the third tin-plated layer 180 are defective, the test method of the technical solution cannot be used to determine whether the defect is located in the second spray tin. Layer 170. The defects of the first tin-plated layer 160 and the third tin-plated layer 180 can be detected by the appearance detecting method, and the circuit board 10 to be tested is not required to be sliced.

第二步:量測所述第一噴錫層160與第三噴錫層180之間之電阻值。The second step: measuring the resistance between the first tin-plated layer 160 and the third tin-plated layer 180.

於本實施例中,量測電阻之儀器四線制精密電阻計。將所述第一噴錫層160遠離所述通孔120開口之邊緣作為第一測試點191,將所述第三噴錫層180遠離所述通孔開口之邊緣作為第二測試點192,量測所述第一測試點191與所述第二測試點192之間之電阻值,記錄為R1。In the present embodiment, the instrument for measuring resistance is a four-wire precision resistance meter. The edge of the first tin-spraying layer 160 away from the opening of the through-hole 120 is used as the first test point 191, and the edge of the third tin-plated layer 180 is away from the edge of the through-hole opening as the second test point 192. The resistance value between the first test point 191 and the second test point 192 is measured and recorded as R1.

可理解,所述第一測試點191及第二測試點192之位置並不限於上述實施例,可分別選擇所述第一噴錫層160上之任意一點及所述第三噴錫層180上之任意一點作為測試點;所述第一測試點191及第二測試點192之間之電阻值之量測亦可使用其他類型之電阻計或有量測電阻功能之儀器;並且,當將電連接之複數通孔內之孔銅層作為一個整體進行測試時,將相連接之各個通孔之第一環狀銅層、孔銅層及第二環狀銅層看做係一長導線,量測點為該長導線之兩端。It can be understood that the positions of the first test point 191 and the second test point 192 are not limited to the above embodiments, and any point on the first tin-plated layer 160 and the third tin-plated layer 180 may be respectively selected. Any one of the points is used as a test point; the resistance between the first test point 191 and the second test point 192 can also be measured using other types of resistance meters or instruments having a measured resistance function; and, when When testing the copper layer of the hole in the plurality of through holes as a whole, the first annular copper layer, the copper layer of the hole and the second annular copper layer of each of the connected through holes are regarded as a long wire. The measuring point is the two ends of the long wire.

第三步:將所述待測電路板10浸泡於一鹼性蝕刻液一預定時間,然後取出並清潔乾燥。The third step: immersing the circuit board 10 to be tested in an alkaline etching solution for a predetermined time, then taking out and cleaning and drying.

本實施例中,所述鹼性蝕刻液之主要成分為氨水、氯化銨、氯化銅,其中,銅離子之濃度範圍為155±35g/L,氯離子之濃度範圍為200±40g/L,所述鹼性蝕刻液之比重為1.21±0.01(即所述鹼性蝕刻液之密度與於標準大氣壓,3.98℃時純H2O下之密度(999.972 kg/m3)之比值),PH值之範圍為7.8-9.0,溫度範圍為50±5℃。In this embodiment, the main components of the alkaline etching solution are ammonia water, ammonium chloride, copper chloride, wherein the concentration of copper ions ranges from 155±35 g/L, and the concentration of chloride ions ranges from 200±40 g/L. The specific gravity of the alkaline etching solution is 1.21±0.01 (that is, the density of the alkaline etching solution is proportional to the standard atmospheric pressure, the density under pure H2O at 3.98 ° C (999.972 kg/m 3 )), and the range of the pH value. It is 7.8-9.0 and the temperature range is 50 ± 5 °C.

首先,將所述待測電路板10浸泡於所述鹼性蝕刻液中1分鐘。First, the circuit board 10 to be tested is immersed in the alkaline etching solution for 1 minute.

因錫可耐弱鹼之腐蝕,故可耐本實施例中之鹼性蝕刻液之腐蝕,故所述待測電路板10中之所述第一噴錫層160、第二噴錫層170及第三噴錫層180不會被所述鹼性蝕刻液蝕刻。而銅可被本實施例中之鹼性蝕刻液所蝕刻,如果所述第二噴錫層170有焊錫裂縫或部分位置有缺錫等不良,所述鹼性蝕刻液可藉由所述裂縫或缺錫之空洞進入所述孔銅層130,則所述孔銅層130即被部分蝕刻,其中,所述孔銅層130與所述鹼性蝕刻液之反應原理主要為:Because the tin is resistant to the corrosion of the weak base, it can withstand the corrosion of the alkaline etching solution in the embodiment, so the first tin-plated layer 160 and the second tin-plated layer 170 in the circuit board 10 to be tested and The third tin-plated layer 180 is not etched by the alkaline etchant. The copper can be etched by the alkaline etching solution in the embodiment. If the second tin-plated layer 170 has solder cracks or defects such as tin deficiency in some places, the alkaline etching solution can be formed by the crack or The voided copper layer 130 is partially etched, and the reaction principle of the porous copper layer 130 and the alkaline etching solution is mainly as follows:

(1)氯化銅與氨水之絡合反應:CuCl2 +4NH3 →Cu(NH3 )4 Cl2(1) complexation reaction of copper chloride with ammonia water: CuCl 2 + 4NH 3 → Cu(NH 3 ) 4 Cl 2 ;

(2)銅被Cu(NH3 )4 2- 絡離子氧化發生蝕刻反應:Cu(NH3 )4 Cl2 +Cu→2Cu(NH3 )2 Cl;(2) Cu is etched by Cu(NH 3 ) 4 2- plex ion oxidation reaction: Cu(NH 3 ) 4 Cl 2 +Cu→2Cu(NH 3 ) 2 Cl;

之後,將所述待測電路板10取出,用純水清洗,後將所述待測電路板10乾燥。Then, the circuit board 10 to be tested is taken out, cleaned with pure water, and then the circuit board 10 to be tested is dried.

當然,所述待測電路板10浸泡於所述鹼性蝕刻液之時間還可為1分鐘以上或小於1分鐘,推薦為1-5分鐘,可節省時間,同時又能使銅層能充分被蝕刻,提高測試靈敏度。Of course, the time for the circuit board 10 to be tested to be immersed in the alkaline etching solution may be 1 minute or more or less than 1 minute, and it is recommended to be 1-5 minutes, which can save time and at the same time enable the copper layer to be fully Etching to improve test sensitivity.

第四步:再次量測所述第一噴錫層160及第三噴錫層180之間之電阻值,判斷所述第二噴錫層170是否有焊錫裂縫或部分位置有缺錫等焊錫不良。The fourth step: measuring the resistance between the first tin-plated layer 160 and the third tin-plated layer 180 again, determining whether the second tin-plated layer 170 has a solder crack or a portion of the soldering defect such as tin deficiency .

使用四線制精密電阻計再次量測所述第一測試點191與所述第二測試點192之間之電阻值,記錄為R2。The resistance value between the first test point 191 and the second test point 192 is again measured using a four-wire precision resistance meter and recorded as R2.

其中,再次量測所述第一噴錫層160及第三噴錫層180之間之電阻值時,推薦量測點與第一次量測時之量測點重合,或者兩次量測之測試點位於所述第一噴錫層160及第三噴錫層180上之同一個與所述通孔120同心之圓上,以減小量測誤差。Wherein, when the resistance value between the first tin-plated layer 160 and the third tin-plated layer 180 is measured again, the recommended measuring point coincides with the measuring point of the first measurement, or two measurements are performed. The test points are located on the same concentric circle of the first tin-plated layer 160 and the third tin-plated layer 180 to reduce the measurement error.

計算浸泡鹼性蝕刻液前後所述待測電路板10之所述第一噴錫層160及第三噴錫層180之間之電阻值之變化(R2-R1)與浸泡鹼性蝕刻液前所述第一噴錫層160及第三噴錫層180之間之電阻值R1之比值ΔR=(R2-R1)/R1。如果所述比值ΔR大於一設定值,則可判定所述第二噴錫層170沒有焊錫裂縫或部分位置有缺錫等不良。Calculating a change in resistance between the first tin-plated layer 160 and the third tin-plated layer 180 of the circuit board 10 to be tested before and after soaking the alkaline etching solution (R2-R1) and before immersing the alkaline etching solution The ratio of the resistance value R1 between the first tin-plated layer 160 and the third tin-plated layer 180 is ΔR=(R2-R1)/R1. If the ratio ΔR is greater than a set value, it can be determined that the second tin-plated layer 170 has no solder cracks or defects such as tin deficiency at some locations.

理論上,如果所述第二噴錫層170沒有焊錫裂縫和缺錫等不良,則所述比值ΔR等於0,如果所述第二噴錫層170存在焊錫裂縫或部分位置有缺錫等不良,則所述比值ΔR大於0。實際測試中,可能因測量儀器精準度等因素之影響,所述比值ΔR雖然大於0,但係所述第二噴錫層170並沒有焊錫裂縫或部分位置有缺錫等不良,或者所述比值ΔR雖然大於0,但係所述第二噴錫層170之焊錫裂縫或缺錫情況於客戶允許或者行業標準允許之範圍內。故,一般會將焊錫裂縫或缺錫設定一可允許之範圍對應地,所述比值ΔR會設定一可允許之設定值,當所述比值ΔR大於所述設定值,則可判定所述第二噴錫層170具有焊錫裂縫或部分位置有缺錫等不良。所述設定值一般需要參考所述待測電路板10於所述鹼性蝕刻液中之浸泡時間、所述第二噴錫層170之允許焊錫裂縫或缺錫大小以及電阻量測設備之精準度進行設定。於本實施例中,所述設定值為10%,即如果ΔR≧10%,則判定所述第二噴錫層170存在有焊錫裂縫或部分位置有缺錫等不良,如果ΔR≦10%,則可判定所述第二噴錫層170沒有焊錫裂縫或缺錫等不良。Theoretically, if the second tin-plated layer 170 has no defects such as solder cracks and tin deficiency, the ratio ΔR is equal to 0, and if the second tin-plated layer 170 has a solder crack or a part of the position, there is a defect such as tin deficiency. Then the ratio ΔR is greater than zero. In the actual test, the ratio ΔR may be greater than 0 due to factors such as the accuracy of the measuring instrument, but the second tin-plated layer 170 is not defective in solder cracking or tinning in some positions, or the ratio is Although ΔR is greater than 0, the solder crack or tin deficiency of the second tin-plated layer 170 is within the range permitted by the customer or by industry standards. Therefore, the solder crack or the tin deficiency is generally set to an allowable range, and the ratio ΔR sets an allowable set value. When the ratio ΔR is greater than the set value, the second may be determined. The tin-spraying layer 170 has defects such as solder cracks or tin defects in some places. The set value generally needs to refer to the immersion time of the circuit board 10 to be tested in the alkaline etchant, the allowable solder crack or tin deficiency of the second tin-plated layer 170, and the accuracy of the resistance measuring device. Make settings. In the present embodiment, the set value is 10%, that is, if ΔR ≧ 10%, it is determined that there is a solder crack in the second tin-plated layer 170 or a defect such as tin deficiency in some places, and if ΔR ≦ 10%, Then, it can be determined that the second tin-spraying layer 170 has no defects such as solder cracks or tin deficiency.

可理解,如果需要測試複數待測電路板之孔內噴錫層狀況時,可先將所述複數待測電路板進行如第二步所述之方法量測電阻,然後將複數待測電路板同時置入鹼性蝕刻液中浸泡,之後再分別利用如第四步所述之方法再次量測電阻,得到所述複數待測電路板之孔內焊錫不良狀況。It can be understood that if it is required to test the condition of the tin-spray layer in the hole of the plurality of circuit boards to be tested, the plurality of circuit boards to be tested may be first measured by the method as described in the second step, and then the plurality of circuit boards to be tested are tested. At the same time, the alkaline etching solution is immersed, and then the resistance is measured again by using the method as described in the fourth step to obtain the poor soldering condition in the hole of the plurality of circuit boards to be tested.

相較於先前技術,本技術方案之具有內埋元件之電路板之製作方法具有如下優點:本實施例採用測試鹼性蝕刻液浸泡前後所述第一噴錫層160及第三噴錫層180之間之電阻值之變化來判斷所述第二噴錫層170是否存在有焊錫裂縫或部分位置有缺錫等不良,無需切片,操作簡便,不需要經驗技術即可進行測試及結果判定;並且,一般切片之製作時間平均要於15分鐘以上,檢測效率較低,而本技術方案中浸泡蝕刻液之時間一般於5分鐘內即可完成,檢測效率較高,待測電路板並且可將較多數量之待測電路板10同時置入鹼性蝕刻液中浸泡,從而方便進行批量檢測。Compared with the prior art, the manufacturing method of the circuit board with the embedded component of the present technical solution has the following advantages: the first tin-spraying layer 160 and the third tin-spraying layer 180 before and after the immersion in the test alkaline etching solution are used in this embodiment. Between the change in the resistance value, it is judged whether the second tin-plated layer 170 has a solder crack or a part of the position has defects such as tin deficiency, no slicing is required, the operation is simple, and the test and the result determination can be performed without an empirical technique; The average slicing time is more than 15 minutes, and the detection efficiency is low. However, the time for soaking the etching solution in the technical solution is generally completed within 5 minutes, and the detection efficiency is high, and the circuit board to be tested can be compared. A large number of circuit boards 10 to be tested are simultaneously placed in an alkaline etching solution to facilitate batch inspection.

惟,以上所述者僅為本發明之較佳實施方式,自不能以此限制本案之申請專利範圍。舉凡熟悉本案技藝之人士援依本發明之精神所作之等效修飾或變化,皆應涵蓋於以下申請專利範圍內。However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by persons skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims.

10...待測電路板10. . . Circuit board to be tested

110...基材110. . . Substrate

111...第一表面111. . . First surface

112...第二表面112. . . Second surface

120...通孔120. . . Through hole

130...孔銅層130. . . Copper layer

140...第一環狀銅層140. . . First annular copper layer

150...第二環狀銅層150. . . Second annular copper layer

160...第一噴錫層160. . . First tin layer

170...第二噴錫層170. . . Second tin layer

180...第三噴錫層180. . . Third tin layer

191...第一測試點191. . . First test point

192...第二測試點192. . . Second test point

圖1係本技術方案實施方式提供之測試方法之流程圖。FIG. 1 is a flow chart of a test method provided by an embodiment of the present technical solution.

圖2待測電路板係本技術方案實施方式提供之待測電路板之正面示意圖。The circuit board to be tested is a front view of the circuit board to be tested provided by the embodiment of the present technical solution.

圖3待測電路板係本技術方案實施方式提供之待測電路板之剖面示意圖。FIG. 3 is a schematic cross-sectional view of a circuit board to be tested provided by an embodiment of the present technical solution.

10...待測電路板10. . . Circuit board to be tested

110...基材110. . . Substrate

111...第一表面111. . . First surface

112...第二表面112. . . Second surface

120...通孔120. . . Through hole

130...孔銅層130. . . Copper layer

140...第一環狀銅層140. . . First annular copper layer

150...第二環狀銅層150. . . Second annular copper layer

160...第一噴錫層160. . . First tin layer

170...第二噴錫層170. . . Second tin layer

180...第三噴錫層180. . . Third tin layer

191...第一測試點191. . . First test point

192...第二測試點192. . . Second test point

Claims (10)

一種電路板孔內焊錫之測試方法,包括步驟:
提供一待測電路板,所述待測電路板包括基材,所述基材具有相對之第一表面和第二表面,所述基材上開設有一個貫穿第一表面和第二表面之通孔,所述通孔之孔壁鍍有孔銅層,所述第一表面形成有圍繞所述通孔之第一環狀銅層,所述第二表面形成有圍繞所述通孔之第二環狀銅層,所述第一環狀銅層、所述孔銅層以及所述第二環狀銅層無縫連接,所述第一環狀銅層、所述孔銅層以及所述第二環狀銅層之表面分別形成有無縫連接之第一噴錫層、第二噴錫層及第三噴錫層;
量測所述第一噴錫層與第三噴錫層之間之電阻值,記錄為R1;
將所述待測電路板浸泡於一鹼性蝕刻液中後取出,並進行清潔乾燥,所述鹼性蝕刻液之組分包括氨水、氯化銨及氯化銅,所述鹼性蝕刻液之PH範圍為7.8-9.0;
再次量測所述第一噴錫層與第三噴錫層之間之電阻值,記錄為R2;及
計算比值ΔR=(R2-R1)/R1,如果比值ΔR大於一設定值,則判定所述第二噴錫層存在焊錫不良。
A method for testing solder in a hole in a circuit board, comprising the steps of:
Providing a circuit board to be tested, the circuit board to be tested comprises a substrate, the substrate has opposite first and second surfaces, and the substrate is provided with a through-the-surface and a second surface a hole, the hole wall of the through hole is plated with a hole copper layer, the first surface is formed with a first annular copper layer surrounding the through hole, and the second surface is formed with a second surrounding the through hole a ring-shaped copper layer, the first annular copper layer, the hole copper layer, and the second annular copper layer are seamlessly connected, the first annular copper layer, the hole copper layer, and the first a surface of the second annular copper layer is respectively formed with a first tin-spraying layer, a second tin-spraying layer and a third tin-spraying layer;
Measuring the resistance between the first tin layer and the third tin layer, recorded as R1;
The circuit board to be tested is immersed in an alkaline etching solution, and then taken out and cleaned and dried. The components of the alkaline etching solution include ammonia water, ammonium chloride and copper chloride, and the alkaline etching liquid PH range is 7.8-9.0;
Re-measuring the resistance value between the first tin-spraying layer and the third tin-spraying layer, recorded as R2; and calculating the ratio ΔR=(R2-R1)/R1, if the ratio ΔR is greater than a set value, determining the The second tin-spraying layer has poor soldering.
如申請專利範圍第1項所述之電路板孔內焊錫之測試方法,其中,所述基材為含增強材料之樹脂基材、純樹脂基材或內層形成有線路之多層電路板。The method for testing solder in a hole in a circuit board according to the first aspect of the invention, wherein the substrate is a resin substrate containing a reinforcing material, a pure resin substrate or a multilayer circuit board in which an inner layer is formed with a line. 如申請專利範圍第1項所述之電路板孔內焊錫之測試方法,其中,所述鹼性蝕刻液中之銅離子之濃度範圍為120-190g/L。The method for testing solder in a hole in a circuit board according to the first aspect of the invention, wherein the concentration of copper ions in the alkaline etching solution ranges from 120 to 190 g/L. 如申請專利範圍第1項所述之電路板孔內焊錫之測試方法,其中,所述鹼性蝕刻液中之氯離子之濃度範圍為160-240g/L。The method for testing solder in a hole in a circuit board according to the first aspect of the invention, wherein the concentration of the chloride ion in the alkaline etching solution ranges from 160 to 240 g/L. 如申請專利範圍第1項所述之電路板孔內焊錫之測試方法,其中,所述鹼性蝕刻液之比重為1.21±0.01。The method for testing solder in a hole in a circuit board according to the first aspect of the invention, wherein the alkaline etching solution has a specific gravity of 1.21±0.01. 如申請專利範圍第1項所述之電路板孔內焊錫之測試方法,其中,所述鹼性蝕刻液之溫度範圍為45-55℃。The method for testing solder in a hole in a circuit board according to claim 1, wherein the alkaline etching solution has a temperature ranging from 45 to 55 °C. 如申請專利範圍第1項所述之電路板孔內焊錫之測試方法,其中,所述浸泡步驟之時間為1-5分鐘。The method for testing solder in a hole in a circuit board according to claim 1, wherein the soaking step is performed for 1-5 minutes. 如申請專利範圍第1項所述之電路板孔內焊錫之測試方法,其中,所述比值ΔR為10%。The method for testing solder in a hole in a circuit board according to the first aspect of the invention, wherein the ratio ΔR is 10%. 如申請專利範圍第1項所述之電路板孔內焊錫之測試方法,其中,所述量測電阻步驟所用之儀器為四線制精密電阻計。The method for testing solder in a hole in a circuit board according to the first aspect of the invention, wherein the instrument for measuring the resistance step is a four-wire precision resistance meter. 一種電路板孔內焊錫之測試方法,包括步驟:
提供一待測電路板,所述待測電路板具有相對之第一表面和第二表面,並開設有均貫穿第一表面和第二表面之複數通孔,每個所述通孔之孔壁鍍有孔銅層,所述第一表面形成有複數依次連接之第一環狀銅層,每個第一環狀銅層圍繞一個對應之通孔,並與該通孔內之孔銅層無縫連接,所述第二表面形成有複數依次連接之第二環狀銅層,每個第二環狀銅層圍繞一個對應之通孔,並與該通孔內之孔銅層無縫連接,每個第一環狀銅層、每個孔銅層以及每個第二環狀銅層之表面分別形成有第一噴錫層、第二噴錫層及第三噴錫層;
量測第一噴錫層與第三噴錫層之間之電阻值,記錄為R1;
將所述待測電路板浸泡於鹼性蝕刻液中1至5分鐘後取出,並進行清潔乾燥,所述鹼性蝕刻液之組分包括氨水、氯化銨及氯化銅,所述鹼性蝕刻液之PH範圍為7.8-9.0;
再次量測第一噴錫層與第三噴錫層之間之電阻值,記錄為R2;及
計算比值ΔR=(R2-R1)/R1,若比值ΔR大於一設定值,則判定所述複數通孔內之至少一個第二噴錫層存在焊錫不良。
A method for testing solder in a hole in a circuit board, comprising the steps of:
Providing a circuit board to be tested, the circuit board to be tested has opposite first and second surfaces, and a plurality of through holes penetrating through the first surface and the second surface, and a hole wall of each of the through holes The first surface is formed with a plurality of first annular copper layers connected in sequence, each of the first annular copper layers surrounding a corresponding through hole, and having no copper layer in the through hole a second annular copper layer is sequentially connected to the second surface, and each of the second annular copper layers surrounds a corresponding through hole and is seamlessly connected to the hole copper layer in the through hole. a first tin-emitting layer, a second tin-spraying layer and a third tin-spraying layer are respectively formed on a surface of each of the first annular copper layer, each of the copper-clad layers, and each of the second annular copper layers;
Measuring the resistance between the first tin layer and the third tin layer, recorded as R1;
The circuit board to be tested is taken out in an alkaline etching solution for 1 to 5 minutes, and then taken out and cleaned and dried. The components of the alkaline etching solution include ammonia water, ammonium chloride and copper chloride, and the alkalinity The pH of the etching solution ranges from 7.8 to 9.0;
Re-measuring the resistance value between the first tin-spraying layer and the third tin-spraying layer, recorded as R2; and calculating the ratio ΔR=(R2-R1)/R1, and determining the complex number if the ratio ΔR is greater than a set value At least one of the second tin-spraying layers in the via hole has poor soldering.
TW101100629A 2012-01-03 2012-01-06 Method for testing the solder in through hole of printed circuit board TWI465715B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201210000135.9A CN103185736B (en) 2012-01-03 2012-01-03 Testing method for circuit board hole solder

Publications (2)

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CN114945252B (en) * 2022-04-28 2023-11-10 四会富仕电子科技股份有限公司 Method for filling through holes with metal

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