TWI458413B - Three - dimensional surface laser guided through filling line method - Google Patents

Three - dimensional surface laser guided through filling line method Download PDF

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TWI458413B
TWI458413B TW100136003A TW100136003A TWI458413B TW I458413 B TWI458413 B TW I458413B TW 100136003 A TW100136003 A TW 100136003A TW 100136003 A TW100136003 A TW 100136003A TW I458413 B TWI458413 B TW I458413B
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layer
laser
substrate
conductive loop
plating
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TW201316869A (en
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Hui Hsiung Chen
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立體曲面雷射導穿填孔線路方法 Three-dimensional curved laser guiding through hole filling line method

本發明係一種立體曲面雷射導穿填孔線路方法,特別是應用雷射鑽孔方式以達到更小的孔徑,在已成形的塑件上進行微小孔徑加工,並透過化鍍填孔方式,達到佈線精準及線路導通。 The invention relates to a three-dimensional curved laser guiding and filling hole filling line method, in particular to apply a laser drilling method to achieve a smaller aperture, micro-aperture processing on a formed plastic part, and through a plated hole filling method, Accurate wiring and line continuity.

在現行的工業技術上,在工件上進行導穿孔加工時,多半利用鑽頭進行鑽孔加工,或是將具有導穿孔的工件利用射出成形方式直接形成。然而,由於鑽頭或是射出成形的技術限制,一般以鑽孔加工或是射出成形方式做出的導穿孔,有最小孔徑的限制(約為0.1mm)。若是要進行更精細的孔徑加工,通常必須使用雷射鑽孔或蝕刻方式,以達到更小的孔徑(最小孔徑約可達6μm)。 In the current industrial technology, when a perforation process is performed on a workpiece, a drill is often used for drilling, or a workpiece having a guide hole is directly formed by injection molding. However, due to the technical limitations of the drill bit or injection molding, the perforation, which is generally made by drilling or injection molding, has a minimum aperture limit (about 0.1 mm). In order to perform finer aperture processing, it is usually necessary to use laser drilling or etching to achieve a smaller aperture (minimum aperture of up to about 6 μm).

然而,當工件為已成形之塑料件時,若要在已成形之塑件上進行微小孔徑加工,則鑽孔加工,射出成形或蝕刻等方式均不適用。例如在印刷電路板上進行電路加工時,若是其線路圖案為三維立體線路,則會包含有小孔徑之導穿孔,同時在鑽孔後還必須進行其餘線路圖案的雕刻,並將所設計的線路圖案鍍上金屬,以完成電路製作。查中華民國發明專利公告第457157號專利「銅箔表面化學微蝕刻在直接雷射鑽孔之應用方法」;其著重於利用化學微蝕刻之技術,來清楚定位出欲進行雷射鑽孔之區域,雖與雷射鑽孔技術相關,但此前案並未提及雷射鑽孔技術之規格。中華民 國發明專利公告第I313631號專利「軟性印刷電路板之雷射鑽孔系統及方法」,本前案著重於採用與以往不同波段之雷射來進行鑽孔,並且限定於軟性印刷電路板的應用,但其孔深及孔徑比並不佳。中華民國發明公開第201029539號專利「印刷電路板及其製造方法」,著重於由一印刷電路板之兩側分別進行雷射鑽孔,兩側均會形成有一漸縮形狀,再予以鍍覆導電材料進而導通。以上前案均無法達到小孔徑之導穿孔,因此,亟需一種製程方法,能達到小孔徑之導穿孔,特別為孔徑0.04mm以下之導穿孔,以便於化學填孔之化鍍能夠填補。 However, when the workpiece is a formed plastic part, drilling, injection molding, or etching is not applicable if micro-aperture processing is performed on the formed plastic part. For example, when circuit processing is performed on a printed circuit board, if the line pattern is a three-dimensional line, a small aperture guide hole is included, and after the drilling, the remaining line pattern must be engraved, and the designed line is designed. The pattern is plated with metal to complete the circuit fabrication. Investigating the Republic of China Invention Patent Bulletin No. 457157 "Application Method of Chemical Micro-etching of Copper Foil Surface in Direct Laser Drilling"; focusing on the use of chemical micro-etching technology to clearly locate the area to be laser drilled Although related to laser drilling technology, the previous specifications did not mention the specifications of laser drilling technology. Chinese people National Patent Publication No. I313631, "Laser Drilling System and Method for Flexible Printed Circuit Boards", the present case focuses on the use of lasers of different wavelengths in the past for drilling, and is limited to flexible printed circuit boards. However, its hole depth and aperture ratio are not good. The Republic of China Invention Publication No. 201029539, "Printed Circuit Board and Method of Manufacturing the Same", focuses on laser drilling from both sides of a printed circuit board, and a tapered shape is formed on both sides, and then plated and electrically conductive. The material is in turn turned on. None of the above cases can achieve the perforation of the small aperture. Therefore, a process method is needed to achieve the small aperture guide hole, especially the guide hole with a hole diameter of 0.04 mm or less, so that the chemical hole filling can be filled.

故本發明有鑑於上述的缺失,係提出一種立體曲面雷射導穿填孔線路方法,用以解決習知技術的缺點。 Therefore, in view of the above-mentioned shortcomings, the present invention proposes a three-dimensional curved laser guided through-filling line method for solving the shortcomings of the prior art.

本發明之一目的係提供一種立體曲面雷射導穿填孔線路方法,係使用雷射直接成型(Laser Direct Structuring,LDS)加工方式進行導穿孔的微小孔徑加工以及線路圖案雕刻,並以化鍍方式進行金屬線路沉積,而完成電路圖樣。 An object of the present invention is to provide a method for stereoscopic curved laser through-hole filling line, which uses laser direct structuring (LDS) processing method to perform micro-aperture processing and line pattern engraving of the via hole, and to perform plating The way to perform metal line deposition is to complete the circuit pattern.

本發明之另一目的係提供一種立體曲面雷射導穿填孔線路方法,利用雷射光進行微小孔徑加工(0.04mm以下),再進行三維雷射雕刻加工將所設計的線路圖案完成。 Another object of the present invention is to provide a method for stereoscopic curved laser guided through-filling line, which uses laser light to perform micro-aperture processing (0.04 mm or less), and then performs three-dimensional laser engraving processing to complete the designed circuit pattern.

本發明之再一目的係提供一種立體曲面雷射導穿填孔線路方法,以化學沉積法將所設計的線路圖案鍍上銅、鎳、金等金屬, 藉由雷射鑽孔及化鍍填孔方式應用在射出成形塑膠零件(LDS專用材料)上可達到線路導通、加工簡便、零件設計更微小及更精密等目的。 A further object of the present invention is to provide a three-dimensional curved laser guided through hole filling line method, which is characterized by chemical deposition to plate copper, nickel, gold and other metals. The use of laser drilling and plated hole filling methods for injection molding of plastic parts (LDS special materials) can achieve wire conduction, simple processing, smaller parts and more precise parts.

為達成上述目的及其它目的,本發明係提供一種立體曲面雷射導穿填孔線路方法,包含:提供具有曲面層與本體層的基材;透過具有微型光點尺寸(spot size)的光源擊穿透該基材,以在該曲面層與該本體層上形成雷射活化(Laser Activation)之導穿孔;在該曲面層進行立體電路佈局,以形成導電回路,其中該導電回路係透過該導穿孔連接;以及鍍覆金屬於該導電回路,以改變該導電回路的電器特性。 In order to achieve the above and other objects, the present invention provides a method for stereoscopic curved laser through-hole filling line, comprising: providing a substrate having a curved layer and a body layer; and transmitting through a light source having a miniature spot size Penetrating the substrate to form a laser activation guide via on the curved layer and the body layer; performing a three-dimensional circuit layout on the curved layer to form a conductive loop, wherein the conductive loop passes through the conductive a perforated connection; and plating a metal to the conductive loop to change electrical characteristics of the conductive loop.

與習知技術相較,本發明之立體曲面雷射導穿填孔線路方法,藉由雷射鑽孔及化鍍填孔方式應用在射出成形塑膠零件(LDS專用材料)上可達到線路導通、加工簡便、零件設計更微小及更精密等目的。 Compared with the prior art, the three-dimensional curved laser guiding and filling hole filling method of the present invention can be applied to the injection molding plastic parts (LDS special materials) by the laser drilling and the chemical plating filling method. Simple processing, smaller part design and more precise.

為充分瞭解本發明之目的、特徵及功效,茲藉由下述具體之實施例,並配合所附之圖式,對本發明做一詳細說明,說明如後:參考第一圖,係本發明一實施例之立體曲面雷射導穿填孔線路方法之流程圖,分別說明如下:提供具有曲面層與本體層的基材(步驟100);透過具有微型光點尺寸(spot size)的光源擊穿透該 基材,以在該曲面層與該本體層上形成雷射活化(Laser Activation)之導穿孔(步驟200);在該曲面層進行立體電路佈局,以形成導電回路,其中該導電回路係透過該導穿孔連接(步驟300);以及鍍覆金屬層於該導電回路,以改變該導電回路的電器特性(步驟400)。 In order to fully understand the objects, features and advantages of the present invention, the present invention will be described in detail with reference to the accompanying drawings. A flow chart of a method for stereoscopic curved laser guided through-filling lines of an embodiment is respectively described as follows: providing a substrate having a curved layer and a body layer (step 100); and penetrating through a light source having a micro spot size Through this a substrate for forming a laser activation via hole on the curved layer and the body layer (step 200); performing a three-dimensional circuit layout on the curved layer to form a conductive loop, wherein the conductive loop transmits through the conductive loop a via connection (step 300); and plating a metal layer on the conductive loop to change the electrical characteristics of the conductive loop (step 400).

以下對上述步驟分別進行細部說明。步驟100中之基材可為一塑膠射出塑件,其材料可為的材料係為熱固性塑膠DAP及熱塑性塑膠PPA、LCP、PA6/6、PC或PC/ABS,且斷面厚度在2mm以下較佳。步驟200中,具有微型光點尺寸的光源一般即為雷射光,以雷射方式利用產品表面的三維空間,依雷射光之穿透性進行雷射活化(Laser Activation),而製造出導穿孔。通常,該導穿孔之最小孔徑係小於0.04mm較佳。步驟300中之立體電路佈局係利用該導穿孔將該導電回路進行連接。步驟400中,金屬層係利用化鍍方式鍍覆於該導電回路,例如一實施例中,各金屬層之順序為:a.化鍍(銅),導(電)通金屬層,其厚度為30μm以內;b.化鍍(鎳),保護銅層避免氧化,耐磨性較佳,其厚度為10μm之內;化鍍(金),最佳抗氧化層,其厚度為0.2μm以內。上述生產步驟之實施例中,各金屬層之較佳厚度為化鍍銅金屬層30為15μm、化鍍鎳金屬層40為5μm、化鍍金金屬層50為0.1μm。針對此一化鍍製程之膜厚限制,可填補孔徑在0.04mm以下之導穿孔,以確保導穿孔對導電回路之連接。 The above steps are described in detail below. The substrate in step 100 can be a plastic injection molding material, and the material of the material can be thermosetting plastic DAP and thermoplastic plastic PPA, LCP, PA6/6, PC or PC/ABS, and the thickness of the section is less than 2 mm. good. In step 200, the light source having the micro spot size is generally laser light, and the laser three-dimensional space on the surface of the product is laser-based, and laser activation is performed according to the penetration of the laser light to produce a via hole. Generally, the minimum aperture diameter of the via is preferably less than 0.04 mm. The three-dimensional circuit layout in step 300 uses the vias to connect the conductive loops. In step 400, the metal layer is plated on the conductive circuit by means of a chemical plating method. For example, in one embodiment, the order of the metal layers is: a. plating (copper), conductive (electric) metal layer, the thickness of which is Within 30μm; b. plating (nickel), protect the copper layer from oxidation, better wear resistance, its thickness is within 10μm; chemical plating (gold), the best anti-oxidation layer, its thickness is within 0.2μm. In the embodiment of the above production step, the preferred thickness of each metal layer is 15 μm for the copper-plated copper metal layer 30, 5 μm for the nickel-plated metal layer 40, and 0.1 μm for the gold-plated metal layer 50. For the film thickness limitation of this plating process, the via hole with the hole diameter of 0.04 mm or less can be filled to ensure the connection of the via hole to the conductive loop.

以下分別參考第二圖至第六圖,詳細說明本發明之立體曲面雷射導穿填孔線路方法。第二圖係本發明一實施例之基材於雷射 鑽孔前之斷面示意圖;該雷射鑽孔係於各種不同的基材,例如3C產品塑件10的殼體上,利用雷射及化鍍的技術產生同PCB般的金屬佈線,將以往傳統的平面佈線轉至三維,具有立體傳導之功能,除達到產品製成的簡化,更是實現簡化多層PCB,由於導通的一致性加上減少平面PCB線路之接點,使其更能將電路傳導的更為順暢。其塑件10材料限定可包含:熱固性塑膠鄰苯二甲酸二烯丙脂(DAP;Diallyl Phthalate)及熱塑性塑膠聚鄰苯二甲醯胺(PPA;Polyphthalamide)、高性能工程塑料(LCP;Liquid Crystal Polyester)、聚醯胺6/6(PA6/6;Nylon)、聚碳酸酯(PC;Polycarbonate)、聚碳酸酯/聚丙烯精(PC/ABS;Polycarbonate/Acrylonitrile Butadiene Styrene)等材質,該專用料可包含有複數個均勻散布的金屬微粒,此金屬微粒的平均粒徑小於100μm(微米),且材料選自於由鈀與銅所構成的群組,且前述金屬微粒與熱塑(固)性塑膠結合成金屬(亦稱之高分子螯合物),此金屬係為一種有機金屬複合物。 Hereinafter, the method of the three-dimensional curved laser guided through-filling line of the present invention will be described in detail with reference to the second to sixth figures, respectively. The second figure is a substrate of a laser according to an embodiment of the present invention. Schematic diagram of the cross-section before drilling; the laser drilling is carried out on various substrates, such as the housing of the 3C product plastic part 10, using laser and plating technology to produce metal wiring like PCB. The traditional planar wiring is transferred to three-dimensional, and has the function of stereo conduction. In addition to the simplification of the product, the simplified multi-layer PCB is realized. The continuity of the conduction and the reduction of the joint of the planar PCB line make it more capable of the circuit. Conducted more smoothly. The material of the plastic part 10 may include: thermosetting plastic diene phthalate (DAP; Diallyl Phthalate) and thermoplastic plastic polyphthalamide (PPA; Polyphthalamide), high performance engineering plastics (LCP; Liquid Crystal Polyester), polyamide 6/6 (PA6/6; Nylon), polycarbonate (PC; Polycarbonate), polycarbonate / polypropylene (PC / ABS; Polycarbonate / Acrylonitrile Butadiene Styrene) and other materials, the special material The method may include a plurality of uniformly dispersed metal particles having an average particle diameter of less than 100 μm (micrometers), and the material is selected from the group consisting of palladium and copper, and the foregoing metal particles and thermoplastic (solid) properties The plastic is combined into a metal (also known as a polymer chelate), which is an organometallic composite.

參考第三圖,係上述實施例之基材於雷射鑽孔後化鍍前之斷面示意圖。第三圖中,產品塑件10斜線部分為其斷面,以雷射直接成型(LDS;Laser Direct Structuring)製作出三維立體電路,在化鍍前將雷射光於導穿孔入口D入射,而由導穿孔出口d出射,形成導穿孔20,同時並在產品塑件10之曲面層(即圖中上方表面)將其餘立體電路佈局進行雷雕成形,以形成導電回路,其中該導電回路係透過導穿孔20連接。導穿孔20出口d之最小孔徑不超過 0.04mm,以確保之後進行化鍍時可將導穿孔完全填充,使得導電回路係透過導穿孔20連接。本圖為化鍍前之雷射孔洞。 Referring to the third figure, a schematic cross-sectional view of the substrate of the above embodiment before laser plating after laser drilling. In the third figure, the diagonal part of the product plastic part 10 is a section thereof, and a three-dimensional stereo circuit is fabricated by laser direct structuring (LDS; Laser Direct Structuring), and the laser light is incident on the entrance hole D before the plating. The perforation outlet d exits to form the via hole 20, and at the same time, the remaining three-dimensional circuit layout is subjected to lightning engraving on the curved layer of the product plastic part 10 (ie, the upper surface in the figure) to form a conductive loop, wherein the conductive loop is transmitted through the guide The perforations 20 are connected. The minimum aperture of the outlet d of the guide hole 20 does not exceed 0.04 mm to ensure that the vias are completely filled during the subsequent plating, so that the conductive loops are connected through the vias 20. This picture shows the laser hole before the plating.

參考第四圖,係上述實施例之基材於化鍍銅金屬層後之示意圖。第四圖中,所用之化鍍金屬層材料為銅,形成化鍍銅金屬層30,其作用係構成一導(電)通金屬層,其厚度為30μm以內較佳。 Referring to the fourth figure, a schematic view of the substrate of the above embodiment after the copper plating metal layer is formed. In the fourth figure, the metallization layer material used is copper, and the copper plating metal layer 30 is formed to function as a conductive (electric) metal layer, and the thickness thereof is preferably 30 μm or less.

參考第五圖,係上述實施例之基材於化鍍鎳金屬層後之示意圖。第五圖中,所用之化鍍金屬層材料為鎳,在化鍍銅金屬層30外側形成化鍍鎳金屬層40,其作用係構成一保護層,其厚度為10μm以內較佳。 Referring to the fifth drawing, a schematic view of the substrate of the above embodiment after the nickel plating metal layer is formed. In the fifth figure, the metal plating layer material used is nickel, and a nickel-plated metal layer 40 is formed on the outer side of the copper-plated metal layer 30, and its function is to form a protective layer having a thickness of 10 μm or less.

參考第六圖,係上述實施例之基材於化鍍金金屬層後之示意圖。第六圖中,所用之化鍍金屬層材料為金,在化鍍鎳金屬層40外側形成化鍍金金屬層50,其作用係構成一抗氧化層,其厚度為0.2μm以內較佳。 Referring to the sixth drawing, a schematic view of the substrate of the above embodiment after the gold plating metal layer is formed. In the sixth figure, the metal plating layer material used is gold, and a gold plating metal layer 50 is formed on the outer side of the nickel plating metal layer 40, and the function thereof constitutes an oxidation resistant layer, and the thickness thereof is preferably 0.2 μm or less.

上述各金屬層中,各金屬層之較佳厚度為化鍍銅金屬層30為15μm、化鍍鎳金屬層40為5μm、化鍍金金屬層50為0.1μm。使用較佳之金屬層厚度,可確保導穿孔20出口d之最小孔徑不超過0.04mm時,在進行化鍍時可將導穿孔完全填充。 In each of the above metal layers, the thickness of each of the metal layers is 15 μm for the copper-plated copper metal layer 30, 5 μm for the nickel-plated metal layer 40, and 0.1 μm for the gold-plated metal layer 50. Using a preferred thickness of the metal layer, it is ensured that the minimum diameter of the exit d of the via 20 is not more than 0.04 mm, and the via hole can be completely filled during the plating.

以上,本發明係透過雷射直接成型之製程,並應用了LDS限定用材料,由於其材料具有硬度佳、耐磨性佳及輕薄性,可用以有效率地加工每一加工件,而更可有效地節省傳統二維PCB板的容置空間。 In the above, the present invention is a laser direct molding process and uses an LDS-defining material. Since the material has good hardness, good wear resistance and lightness, it can be used to efficiently process each workpiece, and more preferably. Effectively save the space of the traditional two-dimensional PCB board.

本發明在上文中已以較佳實施例揭露,然熟習本項技 術者應理解的是,該實施例僅用於描繪本發明,而不應解讀為限制本發明之範圍。應注意的是,舉凡與該實施例等效之變化與置換,均應設為涵蓋於本發明之範疇內。 The present invention has been disclosed in the above preferred embodiments, and is familiar with the present technology. It is to be understood by those skilled in the art that the present invention is not intended to limit the scope of the invention. It should be noted that variations and permutations equivalent to those of the embodiments are intended to be included within the scope of the present invention.

10‧‧‧塑件(基材) 10‧‧‧plastic parts (substrate)

20‧‧‧導穿孔 20‧‧‧Guiding

30‧‧‧化鍍銅金屬層 30‧‧‧Chemical copper plating

40‧‧‧化鍍鎳金屬層 40‧‧‧Ni-plated metal layer

50‧‧‧化鍍金金屬層 50‧‧‧metallized metal layer

步驟100‧‧‧提供具有曲面層與本體層的基材 Step 100‧‧‧ Provide a substrate with a curved layer and a body layer

步驟200‧‧‧透過具有微型光點尺寸(spot size)的光源擊穿透該基 材,以在該曲面層與該本體層上形成雷射活化(Laser Activation)之導穿孔 Step 200‧‧‧ penetrate the base through a light source with a miniature spot size Material, to form a laser activation of the guide layer on the curved layer and the body layer

步驟300‧‧‧在該曲面層進行立體電路佈局,以形成導電回路,其中該導電回路係透過該導穿孔連接 Step 300‧‧‧ performing a three-dimensional circuit layout on the curved layer to form a conductive loop through which the conductive loop is connected

步驟400‧‧‧鍍覆金屬層於該導電回路,以改變該導電回路的電器特性 Step 400‧‧‧ plating a metal layer on the conductive loop to change the electrical characteristics of the conductive loop

D‧‧‧導穿孔入口 D‧‧‧Guide perforation entrance

d‧‧‧導穿孔出口 D‧‧‧guide piercing exit

第一圖 係本發明一實施例之立體曲面雷射導穿填孔線路方法之流程圖。 The first figure is a flow chart of a method for a three-dimensional curved laser guided through hole filling line according to an embodiment of the present invention.

第二圖 係本發明一實施例之基材於雷射鑽孔前之斷面示意圖。 The second figure is a schematic cross-sectional view of a substrate according to an embodiment of the present invention before laser drilling.

第三圖 係上述實施例之基材於雷射鑽孔後化鍍前之斷面示意圖。 The third figure is a schematic cross-sectional view of the substrate of the above embodiment before laser plating after laser drilling.

第四圖 係上述實施例之基材於化鍍銅金屬層後之示意圖。 The fourth figure is a schematic view of the substrate of the above embodiment after the copper plating metal layer.

第五圖 係上述實施例之基材於化鍍鎳金屬層後之示意圖。 Fig. 5 is a schematic view showing the substrate of the above embodiment after the nickel-plated metal layer.

第六圖 係上述實施例之基材於化鍍金金屬層後之示意圖。 Fig. 6 is a schematic view showing the substrate of the above embodiment after the gold plating metal layer.

步驟100‧‧‧提供具有曲面層與本體層的基材 Step 100‧‧‧ Provide a substrate with a curved layer and a body layer

步驟200‧‧‧透過具有微型光點尺寸(spot size)的光源擊穿透該基材,以在該曲面層與該本體層上形成雷射活化(Laser Activation)之導穿孔 Step 200 ‧ ‧ penetrates the substrate through a light source having a miniature spot size to form a laser activation via hole on the curved layer and the body layer

步驟300‧‧‧在該曲面層進行立體電路佈局,以形成導電回路,其中該導電回路係透過該導穿孔連接 Step 300‧‧‧ performing a three-dimensional circuit layout on the curved layer to form a conductive loop through which the conductive loop is connected

步驟400‧‧‧鍍覆金屬層於該導電回路,以改變該導電回路的電器特性 Step 400‧‧‧ plating a metal layer on the conductive loop to change the electrical characteristics of the conductive loop

Claims (5)

一種立體曲面雷射導穿填孔線路方法,包含:提供具有曲面層與本體層的基材;透過具有微型光點尺寸(spot size)的光源擊穿透該基材,以在該曲面層與該本體層上形成雷射活化(Laser Activation)之導穿孔;在該曲面層進行立體電路佈局,以形成導電回路,其中該導電回路係透過該導穿孔連接;以及鍍覆金屬層於該導電回路,以改變該導電回路的電器特性。 A method for stereoscopic curved laser through-hole filling line includes: providing a substrate having a curved layer and a body layer; and penetrating the substrate through a light source having a miniature spot size to Forming a laser activating via hole on the body layer; performing a three-dimensional circuit layout on the curved layer to form a conductive loop, wherein the conductive loop is connected through the via; and plating a metal layer on the conductive loop To change the electrical characteristics of the conductive loop. 如申請專利範圍第1項所述之立體曲面雷射導穿填孔方法,其中該基材的材料包括有熱固性塑膠DAP及熱塑性塑膠PPA、LCP、PA6/6、PC或PC/ABS等材料。 The method of claim 3, wherein the material of the substrate comprises a thermosetting plastic DAP and a thermoplastic plastic PPA, LCP, PA6/6, PC or PC/ABS. 如申請專利範圍第2項所述之立體曲面雷射導穿填孔方法,其中該基材更包含散布均勻的複數金屬微粒。 The method of claim 3, wherein the substrate further comprises a plurality of uniformly dispersed metal particles. 如申請專利範圍第3項所述之立體曲面雷射導穿填孔方法,其中該等金屬微粒的尺寸係小於100微米。 The method of claim 3, wherein the metal particles have a size of less than 100 micrometers. 如申請專利範圍第4項所述之立體曲面雷射導穿填孔方法,其中該等金屬微粒的材質係選自於鈀與銅所組成之一族。 The method of claim 3, wherein the material of the metal particles is selected from the group consisting of palladium and copper.
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