TWI454330B - A method for processing a brittle material substrate and a laser processing apparatus for use in the method - Google Patents

A method for processing a brittle material substrate and a laser processing apparatus for use in the method Download PDF

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TWI454330B
TWI454330B TW100108060A TW100108060A TWI454330B TW I454330 B TWI454330 B TW I454330B TW 100108060 A TW100108060 A TW 100108060A TW 100108060 A TW100108060 A TW 100108060A TW I454330 B TWI454330 B TW I454330B
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substrate
cooling
crack
brittle material
breaking
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TW100108060A
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Chinese (zh)
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TW201139025A (en
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Atsushi Imura
Yusuke Hirauchi
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Mitsuboshi Diamond Ind Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/033Apparatus for opening score lines in glass sheets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/08Severing cooled glass by fusing, i.e. by melting through the glass
    • C03B33/082Severing cooled glass by fusing, i.e. by melting through the glass using a focussed radiation beam, e.g. laser
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/09Severing cooled glass by thermal shock
    • C03B33/091Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00Technologies relating to the processing of minerals
    • Y02P40/50Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57Improving the yield, e-g- reduction of reject rates

Description

脆性材料基板之加工方法及用於該方法之雷射加工裝置Method for processing brittle material substrate and laser processing device therefor

本發明係關於藉由對玻璃、矽、陶瓷、半導體等脆性材料基板沿分斷預定線照射雷射光而局部加熱後噴射冷媒而局部冷卻,於該基板形成龜裂之加工方法。在此所謂「加工」雖係指藉由加熱與冷卻使基板產生熱應力分布而於該基板形成龜裂之加工,但亦包含使被形成之龜裂從基板表面到達背面以使完全分斷之場合與於分斷預定線形成深龜裂(基板厚度之80%以上之龜裂)以使成為即將完全分斷之狀態之加工。The present invention relates to a method for forming a crack by locally irradiating a substrate of a brittle material such as glass, tantalum, ceramics, or a semiconductor onto a predetermined line to discharge laser light, and then locally cooling the container to form a cooling agent. The term "processing" as used herein refers to the process of forming a thermal stress distribution on a substrate by heating and cooling to form a crack on the substrate, but also includes forming the formed crack from the surface of the substrate to the back surface so as to be completely broken. In the case, a deep crack (cracking of 80% or more of the thickness of the substrate) is formed in the predetermined line to be processed so as to be in a state of being completely broken.

以往,做為分斷(割斷)脆性材料即玻璃基板之方法,已知例如專利文獻1與專利文獻2所揭示將基板局部加熱及冷卻,藉由當時產生之熱應力(壓縮應力與拉伸應力)以預先形成於基板之端部之初期龜裂(觸發)為起點使龜裂往所要之方向進展,於基板形成刻劃線或完全分斷(板厚極薄時等)之加工方法。Conventionally, as a method of breaking (cutting) a brittle material, that is, a glass substrate, it is known that, for example, Patent Document 1 and Patent Document 2 locally heat and cool a substrate by thermal stress (compression stress and tensile stress) generated at that time. A method of processing in which a crack is formed in a desired direction from an initial crack (trigger) formed in advance at an end portion of a substrate, and a scribe line or a complete rupture (when the thickness is extremely thin) is formed on the substrate.

具體而言,係使用雷射光束做為熱源,將保持於平台上之基板相對雷射光束移動,使雷射光束沿基板之分斷預定線局部照射加熱,並隨之從冷卻單元之噴嘴噴射冷媒。此時利用因加熱而產生之壓縮應力與因急冷而產生之拉伸應力所導致之應力分布使龜裂往分斷預定線之方向進展,形成一條刻劃線。Specifically, the laser beam is used as a heat source, and the substrate held on the platform is moved relative to the laser beam, so that the laser beam is locally irradiated and heated along the predetermined line of the substrate, and then ejected from the nozzle of the cooling unit. Refrigerant. At this time, the stress distribution due to the compressive stress generated by the heating and the tensile stress generated by the rapid cooling causes the crack to progress in the direction of the predetermined line to form a score line.

之後,除了在基板極薄之場合等被完全分斷外,藉由沿刻劃線(龜裂)按壓折斷棒或壓接轉動滾輪,使基板彎曲以將基板分斷。Thereafter, in addition to being completely broken when the substrate is extremely thin, the substrate is bent to break the substrate by pressing the breaking bar along the scribe line (crack) or crimping the rotating roller.

專利文獻1:日本特開2004-182530號公報Patent Document 1: Japanese Laid-Open Patent Publication No. 2004-182530

專利文獻2:日本特開2005-263578號公報Patent Document 2: Japanese Patent Laid-Open Publication No. 2005-263578

然而,以上述之以往方法,在進行加熱、冷卻後,於施加外力使基板彎曲以分斷時,被分斷而形成之端面間可能互相按壓,無法精度良好地沿分斷預定線分斷。此外,亦有分斷面變粗糙之問題。However, in the conventional method described above, when the external force is applied to bend the substrate to be divided by heating and cooling, the end faces formed by being separated may be pressed against each other, and the cutting line may not be accurately divided along the predetermined line. In addition, there are also problems of roughening the section.

針對上述問題,本發明係以提供解決本課題,可沿分斷預定線L精度良好地分斷之基板之分斷方法為目的。In view of the above problems, the present invention has an object of providing a method for breaking a substrate which can be accurately separated along a predetermined line L by solving the problem.

在檢討上述課題後,由發明者之反覆實驗得知被分斷而形成之端面間互相按壓係因以下各點。圖6係顯示於局部加熱後,追隨加熱部分剛噴射冷媒冷卻後之基板之狀態之剖面圖。另外,為了說明之方便,誇張顯示龜裂等。After reviewing the above-mentioned problems, it was found by the inventors' repeated experiments that the end faces formed by the breaking were caused by the following points. Fig. 6 is a cross-sectional view showing the state of the substrate which has been cooled by the injection of the refrigerant immediately after the partial heating. In addition, for the convenience of explanation, exaggeration shows cracks and the like.

在將基板W以雷射光束局部加熱後,若將此加熱部分以來自冷卻裝置之噴嘴13之冷媒急冷,會有拉伸應力產生。藉由此拉伸應力,如圖6(a)所示龜裂11產生。此龜裂11之開口部會隨著從冷媒被噴射之冷卻點離開而關閉,如圖6(b)所示成為目視無法看見之盲裂痕12。盲裂痕12係因冷卻而有拉伸應力產生之區域隨時間經過而溫度緩和,表面溫度再上升時,變為壓縮應力,龜裂面被壓縮而龜裂關閉。若在有此種盲裂痕(曾經產生之龜裂之開口部雖再度關閉而以目視無法看見但於內部仍有龜裂殘留之狀態)產生之狀態下施加外力使基板彎曲以進行折斷,因於龜裂之開口部有壓縮應力殘留而關閉,故需有較大外力,若欲勉強分斷則被分斷而形成之端面間會互相按壓。此壓縮應力為無法精度良好地沿分斷預定線分斷之場合之要因。After the substrate W is locally heated by the laser beam, if the heated portion is quenched by the refrigerant from the nozzle 13 of the cooling device, tensile stress is generated. By this tensile stress, crack 11 is generated as shown in Fig. 6(a). The opening of the crack 11 is closed as it leaves the cooling point where the refrigerant is ejected, and becomes a blind crack 12 which is visually invisible as shown in Fig. 6(b). The blind crack 12 is a region in which tensile stress is generated by cooling, and the temperature is moderated as time passes. When the surface temperature rises again, it becomes a compressive stress, and the cracked surface is compressed and the crack is closed. If an external force is applied in a state where such a blind crack (the opening of the crack that has once occurred is closed again and is invisible to the eye but there is still a crack in the inside), the substrate is bent to be broken. The opening of the crack has a compressive stress remaining and is closed, so that a large external force is required, and if it is to be forced to break, the end faces formed by the breaking will press each other. This compressive stress is a factor that cannot be accurately separated along the predetermined line.

因此,為了達成上述目的,在本發明係採用如下之技術手段。亦即,在本發明之脆性材料基板之加工方法係由藉由沿脆性材料基板之分斷預定線使雷射光束相對移動同時照射來加熱而使基板產生局部性之壓縮應力之加熱步驟、藉由使對已被加熱之區域之後方近處噴射冷媒而形成之冷卻區域追隨雷射光束移動同時局部冷卻脆性材料基板來使拉伸應力產生並沿分斷預定線使龜裂進展之冷卻步驟、在此拉伸應力殘留而龜裂之開口部開啟期間對此龜裂之開口部產生之區域施加外力使龜裂往厚度方向滲透之折斷步驟構成。Therefore, in order to achieve the above object, the following technical means are employed in the present invention. That is, the processing method of the brittle material substrate of the present invention is a heating step of causing the substrate to generate local compressive stress by heating the laser beam while being relatively moved along the predetermined line of the brittle material substrate. a cooling step in which a cooling region formed by injecting a refrigerant in a vicinity of a heated region follows a laser beam while locally cooling the brittle material substrate to cause tensile stress to be generated and the crack progresses along a predetermined line to be broken, When the tensile stress remains and the opening of the crack is opened, an external force is applied to the region where the opening of the crack is generated, so that the crack penetrates in the thickness direction.

在此,折斷步驟中之使外力施加之位置配置於從由冷卻步驟產生之冷卻區域之冷卻中心往冷卻區域之移動方向後方側20mm及往冷卻區域之移動方向前方側5mm之範圍較理想。特別是因冷卻而產生之龜裂之開口部開啟為最大之位置最理想,從基板之冷卻中心(cp)往冷卻區域之移動方向為相反方向之後方側0~10mm之範圍內之位置為適當。Here, it is preferable that the position at which the external force is applied in the breaking step is disposed within a range of 20 mm from the cooling center of the cooling region generated by the cooling step to the rear side in the moving direction of the cooling region and 5 mm toward the front side in the moving direction of the cooling region. In particular, it is preferable that the opening portion of the crack due to cooling is maximized, and the position from the cooling center (cp) of the substrate to the direction in which the cooling region moves in the opposite direction is 0 to 10 mm. .

利用本發明之加工方法,由於係使在折斷步驟之施加外力之位置為因冷卻步驟之急速冷卻而產生之龜裂不成為盲裂痕而龜裂之開口部開啟之區域內,故只要稍微施加外力,亦即只要以外力使龜裂之開口部開啟之區域稍微彎曲,便可順利使龜裂滲透而分斷。藉此,可消除被分斷而形成之端面間互相按壓之現象,可沿分斷預定線精度良好地分斷,可獲得平滑且漂亮之分斷面。According to the processing method of the present invention, since the position at which the external force is applied in the breaking step is such that the crack generated by the rapid cooling in the cooling step does not become a blind crack and the opening of the crack is opened, the external force is slightly applied. That is, as long as the area where the opening of the crack is opened by the external force is slightly bent, the crack can be smoothly penetrated and broken. Thereby, the phenomenon in which the end faces formed by the breakage are pressed against each other can be eliminated, and the line can be accurately divided along the line to be divided, and a smooth and beautiful cross section can be obtained.

於本發明,可使用壓接於基板之滾輪做為折斷步驟中之外力之施加手段,將此滾輪配置於與基板之雷射照射面為相反側,藉由壓接滾輪來施加外力。In the present invention, the roller pressed against the substrate can be used as a means for applying an external force in the breaking step, and the roller is disposed on the opposite side of the laser irradiation surface of the substrate, and an external force is applied by the pressure roller.

藉此,可確實使龜裂之開口部開啟之區域彎曲,可順利使龜裂滲透而分斷。Thereby, the region where the opening of the crack is opened can be surely bent, and the crack can be smoothly penetrated and separated.

以下,基於顯示其實施形態之圖式詳細說明本發明之加工方法之詳細。Hereinafter, the details of the processing method of the present invention will be described in detail based on the drawings showing the embodiments thereof.

圖1為顯示實施本發明之加工方法之雷射加工裝置之一例之概略立體圖,圖2為說明加工方法之圖。Fig. 1 is a schematic perspective view showing an example of a laser processing apparatus for carrying out the processing method of the present invention, and Fig. 2 is a view for explaining a processing method.

雷射加工裝置具備載置玻璃基板W之被二分割之平台1。平台1具有載置基板W之平坦之上面2,於上面2設有多數之空氣吸引孔3。此空氣吸引孔3係吸引保持被載置之基板W者,透過設於平台1內部之分歧管(不圖示)連通於空氣吸引泵(不圖示)。另外,設有將載置於平台1之基板W透過吸盤4拾起並搬送之搬送機械手臂5。The laser processing apparatus includes a divided platform 1 on which a glass substrate W is placed. The stage 1 has a flat upper surface 2 on which the substrate W is placed, and a plurality of air suction holes 3 are provided in the upper surface 2. The air suction hole 3 sucks and holds the substrate W placed thereon, and communicates with an air suction pump (not shown) through a branch pipe (not shown) provided inside the stage 1. Further, a transfer robot 5 that picks up and transports the substrate W placed on the stage 1 through the suction cup 4 is provided.

此外,設有做為為了將載置於平台1上之基板W沿分斷預定線加工而使基板W產生局部性之壓縮應力之加熱手段之雷射照射機構6、藉由追隨由此雷射照射機構6產生之加熱區域(雷射點)以冷媒噴射使加熱區域之後方近處冷卻來使拉伸應力產生並使龜裂沿分斷預定線進展之冷卻機構7、以及在此拉伸應力殘留期間對冷卻區域附近(龜裂之開口部產生之區域)施加外力使龜裂往厚度方向滲透之折斷機構8。Further, a laser irradiation mechanism 6 is provided as a heating means for causing the substrate W placed on the stage 1 to be processed along the predetermined line to cause local compressive stress to be generated, thereby following the laser The heating region (laser spot) generated by the illuminating mechanism 6 is cooled by the refrigerant to cool the vicinity of the heating region to generate tensile stress and to cause the crack to progress along the breaking predetermined line, and the tensile stress therein In the residual period, a breaking mechanism 8 that applies an external force to the vicinity of the cooling region (the region where the opening of the crack is generated) so that the crack penetrates in the thickness direction.

冷卻機構7具備從前端噴射冷媒之噴嘴7a。此外,折斷機構8具備配置於基板W之下方側之滾輪8a,藉由使此滾輪8a在被分割後之平台1之間隙從下方按壓而按壓基板並分斷。另外,相對於滾輪8a於基板W之上方側配設具有凹面狀之周面之承接滾輪8b較理想。The cooling mechanism 7 includes a nozzle 7a that ejects a refrigerant from the tip end. Further, the breaking mechanism 8 includes a roller 8a disposed on the lower side of the substrate W, and the roller 8a is pressed from below by the gap of the divided platform 1, and the substrate is pressed and divided. Further, it is preferable that the receiving roller 8b having a concave peripheral surface is disposed on the upper side of the substrate W with respect to the roller 8a.

雷射照射機構6、冷卻機構7、折斷機構8係形成為以雷射照射機構6為首依序排列於一直線上並被共通之保持構件保持,且可藉由驅動機構(不圖示)相對載置有基板W之平台1沿排列方向移動。The laser irradiation mechanism 6, the cooling mechanism 7, and the breaking mechanism 8 are formed so that the laser irradiation mechanism 6 is sequentially arranged on the straight line and held by the common holding member, and can be relatively loaded by a driving mechanism (not shown). The stage 1 on which the substrate W is placed is moved in the arrangement direction.

折斷機構8之滾輪8a係配置於因來自噴嘴7a之冷媒噴射導致之急速冷卻而產生之龜裂10(參照圖4)不成為盲裂痕而龜裂10之開口部開啟之區域。The roller 8a of the breaking mechanism 8 is disposed in a region where the crack 10 (see FIG. 4) generated by the rapid cooling of the refrigerant from the nozzle 7a does not become a blind crack and the opening of the crack 10 is opened.

具體而言,係假設應加工之玻璃基板W之厚度為0.4~1.1mm程度、基板W之搬送速度為50mm/秒~500mm/秒時,滾輪8a被配置於從噴嘴7a導致之冷卻點之中心cp(圖2)往噴嘴7a之相對於基板W之移動方向(箭頭方向)相反方向即後方側之20mm及移動方向前方側5mm之範圍。Specifically, when the thickness of the glass substrate W to be processed is about 0.4 to 1.1 mm and the conveying speed of the substrate W is 50 mm/sec to 500 mm/sec, the roller 8a is disposed at the center of the cooling point from the nozzle 7a. Cp (Fig. 2) is a range of 20 mm on the rear side and 5 mm on the front side in the moving direction in the direction opposite to the moving direction (arrow direction) of the nozzle 7a with respect to the substrate W.

特別是因冷卻而產生之龜裂10之開口部大幅開啟之位置最理想,從冷卻點之中心cp(圖2)往噴嘴7a之相對於基板W之移動方向為相反方向之後方側0~10mm之範圍內之位置為適當。附帶一提,以往有刻劃與折斷應以個別步驟進行之想法,認為在進行滾輪折斷之場合盡量不給予振動較理想,且認為於基板W被充分冷卻且龜裂往基板之厚度方向充分進展後設折斷步驟較理想,滾輪被配置於從冷媒噴射位置充分離開之位置(從冷卻點之中心cp往後方側離開20mm以上)。In particular, the position of the opening of the crack 10 which is generated by the cooling is most preferably opened, from the center cp of the cooling point (Fig. 2) to the direction in which the nozzle 7a moves in the opposite direction with respect to the substrate W, and then the side is 0 to 10 mm. The location within the range is appropriate. Incidentally, in the past, the idea of scribing and breaking should be carried out in individual steps. It is considered that it is preferable to not impart vibration as much as possible when the roller is broken, and it is considered that the substrate W is sufficiently cooled and the crack is sufficiently progressed toward the thickness direction of the substrate. Preferably, the breaking step is preferably performed, and the roller is disposed at a position sufficiently away from the refrigerant ejection position (20 mm or more from the center cp of the cooling point to the rear side).

另外,於將滾輪8a配置於比從冷卻點之中心cp往噴嘴7a之相對於基板W之移動方向前方側離開5mm之位置之場合,無法觀察到使龜裂滲透之效果。In addition, when the roller 8a is disposed at a position separated from the center cp of the cooling point by 5 mm from the front side of the nozzle 7a in the moving direction with respect to the substrate W, the effect of allowing crack penetration is not observed.

其次,針對加工動作說明。於將基板W沿分斷預定線L加工時,定位為基板W之分斷預定線L來到雷射加工裝置中之既定加工位置同時保持於平台1。之後,藉由使雷射照射機構6(保持構件9)沿分斷預定線L相對移動同時對基板W照射雷射光束,如圖3所示,使基板W產生局部性之壓縮應力場P1。其次,如圖4所示,使追隨雷射光束將已被雷射光束加熱之區域之後方近處(因此,P1會稍微往基板內部移動)以來自冷卻機構7之噴嘴7a之冷媒噴射急冷而使拉伸應力P2產生。Second, for the processing action description. When the substrate W is processed along the line dividing line L, the predetermined line L positioned as the substrate W comes to a predetermined processing position in the laser processing apparatus while being held by the stage 1. Thereafter, the laser beam is irradiated to the substrate W while the laser irradiation mechanism 6 (holding member 9) is relatively moved along the predetermined line L, and as shown in FIG. 3, the substrate W is subjected to a local compressive stress field P1. Next, as shown in FIG. 4, the vicinity of the area where the laser beam has been heated by the laser beam (so that P1 moves slightly inside the substrate) is quenched by the refrigerant jet from the nozzle 7a of the cooling mechanism 7. The tensile stress P2 is generated.

藉此,龜裂10沿分斷預定線L(圖1)被形成。另外,如圖5所示,使折斷機構8之滾輪8a上升,使因冷卻步驟而龜裂10產生之區域彎曲,使龜裂深度滲透至板厚之100%(完全分斷)至80%。Thereby, the crack 10 is formed along the breaking planned line L (FIG. 1). Further, as shown in Fig. 5, the roller 8a of the breaking mechanism 8 is raised, and the region where the crack 10 is generated by the cooling step is bent, and the crack depth is infiltrated to 100% (completely broken) of the plate thickness to 80%.

此時,由於係使折斷機構8之滾輪8a之壓接位置為因噴嘴7a之急速冷卻而產生之龜裂10不成為盲裂痕而龜裂10之開口部開啟之區域,故只要使滾輪8a稍微按壓,亦即以滾輪8a使龜裂10之開口部開啟之區域稍微彎曲,便可順利使龜裂滲透。藉此,可消除被分斷而形成之端面間互相按壓之現象,可沿分斷預定線精度良好地分斷,可獲得平滑且漂亮之分斷面。At this time, since the pressure contact position of the roller 8a of the breaking mechanism 8 is a region in which the crack 10 caused by the rapid cooling of the nozzle 7a does not become a blind crack and the opening of the crack 10 is opened, it is only necessary to make the roller 8a slightly By pressing, that is, the region where the opening of the crack 10 is opened by the roller 8a is slightly bent, and the crack can be smoothly penetrated. Thereby, the phenomenon in which the end faces formed by the breakage are pressed against each other can be eliminated, and the line can be accurately divided along the line to be divided, and a smooth and beautiful cross section can be obtained.

以上雖已針對本發明之代表性之實施例說明,但本發明並非必須受限於特定於上述之實施形態者,可在達成其目的且不超出申請專利範圍之範圍內適當修正、變更。The present invention has been described with reference to the preferred embodiments of the present invention. However, the present invention is not necessarily limited to the embodiments described above, and may be appropriately modified or changed without departing from the scope of the invention.

[產業上之可利用性][Industrial availability]

本發明之加工方法可利用於加工由玻璃基板等脆性材料構成之基板。The processing method of the present invention can be utilized for processing a substrate made of a brittle material such as a glass substrate.

W...基板W. . . Substrate

L...分斷預定線L. . . Breaking line

1...平台1. . . platform

6...雷射照射機構6. . . Laser irradiation mechanism

7...冷卻機構7. . . Cooling mechanism

7a...噴嘴7a. . . nozzle

8...折斷機構8. . . Broken mechanism

8a...滾輪8a. . . Wheel

10...龜裂10. . . Crack

圖1為顯示實施本發明之加工方法之雷射加工裝置之一例之立體圖。BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing an example of a laser processing apparatus for carrying out the processing method of the present invention.

圖2為說明本發明之加工方法之圖。Fig. 2 is a view for explaining the processing method of the present invention.

圖3為顯示本發明中之加工時之熱應力之產生狀態之擴大剖面圖,顯示有壓縮應力產生之狀態。Fig. 3 is an enlarged cross-sectional view showing the state of generation of thermal stress during processing in the present invention, showing a state in which compressive stress is generated.

圖4為顯示本發明中之加工時之熱應力之產生狀態之擴大剖面圖,顯示有拉伸應力產生之狀態。Fig. 4 is an enlarged cross-sectional view showing a state in which thermal stress is generated during processing in the present invention, showing a state in which tensile stress is generated.

圖5為顯示施加有外力之狀態之擴大剖面圖。Fig. 5 is an enlarged cross-sectional view showing a state in which an external force is applied.

圖6為顯示於雷射加熱後,剛噴射冷媒冷卻後之基板之狀態之剖面圖。Fig. 6 is a cross-sectional view showing the state of the substrate immediately after the cooling of the refrigerant after the laser heating.

W...基板W. . . Substrate

L...分斷預定線L. . . Breaking line

1...平台1. . . platform

2...上面2. . . Above

3...空氣吸孔孔3. . . Air suction hole

4...吸盤4. . . Suction cup

5...搬送機械手臂5. . . Transfer robot

6...雷射照射機構6. . . Laser irradiation mechanism

7...冷卻機構7. . . Cooling mechanism

7a...噴嘴7a. . . nozzle

8...折斷機構8. . . Broken mechanism

8a...滾輪8a. . . Wheel

8b...承接滾輪8b. . . Undertake roller

9...保持構件9. . . Holding member

Claims (5)

一種脆性材料基板之加工方法,由藉由沿脆性材料基板之分斷預定線使雷射光束相對移動同時照射來加熱而使基板產生局部性之壓縮應力之加熱步驟、藉由使對已加熱之區域之後方近處噴射冷媒而形成之冷卻區域追隨雷射光束移動同時局部冷卻脆性材料基板來使拉伸應力產生並沿分斷預定線使龜裂進展之冷卻步驟、以及對前述基板施加外力使龜裂往厚度方向滲透之折斷步驟構成;前述折斷步驟中之使外力施加之位置,係前述冷卻區域之範圍內且係從前述冷卻區域之冷卻中心往冷卻區域之移動方向後方側20mm及往冷卻區域之移動方向前方側5mm之範圍內。 A method for processing a substrate of a brittle material, which comprises heating a substrate by locally moving a laser beam by relatively moving a laser beam along a predetermined line of a brittle material substrate, thereby causing a localized compressive stress to be heated by the substrate. The cooling region formed by spraying the refrigerant in the vicinity of the region follows the cooling beam while locally cooling the brittle material substrate to generate tensile stress and to cool the crack along the predetermined line, and to apply an external force to the substrate. a step of breaking the crack in the thickness direction; wherein the position of the external force applied in the breaking step is within the range of the cooling region and is 20 mm from the cooling center of the cooling region to the rear side of the moving direction of the cooling region The area in the direction of movement is within 5 mm of the front side. 如申請專利範圍第1項記載之脆性材料基板之加工方法,其中,在前述折斷步驟使用滾輪,將此滾輪配置於與基板之雷射照射面為相反側,藉由壓接滾輪來施加外力。 The method for processing a brittle material substrate according to claim 1, wherein the roller is disposed on the opposite side of the laser irradiation surface of the substrate in the breaking step, and an external force is applied by the pressure roller. 一種雷射加工裝置,具備:藉由沿載置於平台上之脆性材料基板之分斷預定線從前述基板之上方使雷射光束相對移動同時照射來加熱而使基板產生局部性之壓縮應力之雷射照射機構;以及藉由使對已加熱之區域之後方近處噴射冷媒而形成之冷卻區域追隨雷射光束移動而局部冷卻脆性材料基板來使拉伸應力產生並沿分斷預定線使龜裂進展之冷卻機構;前述平台係隔著用以使前述基板之分割預定線之下面側露出之間隙被分割為兩側,具備從前述基板之下方對前 述基板施加外力使龜裂往厚度方向滲透之折斷機構;前述冷卻機構具有噴射冷媒之噴嘴,在被噴射冷媒之冷卻區域的範圍內且係從前述冷卻區域之冷卻中心往與噴嘴之相對於基板之移動方向為相反側即後方側20mm及往移動方向前方側5mm之範圍內配置有前述折斷機構。 A laser processing apparatus comprising: locally compressing a substrate by heating a laser beam while being relatively moved from above the substrate by a predetermined dividing line of a brittle material substrate placed on the platform; a laser irradiation mechanism; and a cooling region formed by injecting a refrigerant near the heated region to follow a laser beam to locally cool the brittle material substrate to generate tensile stress and to cause the turtle along the predetermined line a cooling mechanism for cracking progress; the gap is divided into two sides by a gap for exposing a lower side of the planned dividing line of the substrate, and is provided from the lower side of the substrate a breaking mechanism for applying an external force to infiltrate a crack in a thickness direction; the cooling mechanism having a nozzle for injecting a refrigerant, in a range of a cooling region from which the refrigerant is sprayed, and a cooling center from the cooling region to a nozzle opposite to the substrate The breaking mechanism is disposed in a range in which the moving direction is the opposite side, that is, the rear side 20 mm and the moving direction front side 5 mm. 如申請專利範圍第3項記載之雷射加工裝置,其中,前述折斷機構係由相對前述平台沿前述間隙移動同時按壓基板之分割預定線之下面之滾輪構成。 The laser processing apparatus according to claim 3, wherein the breaking mechanism is constituted by a roller that moves along the gap with respect to the platform and simultaneously presses a lower surface of a predetermined dividing line of the substrate. 如申請專利範圍第4項記載之雷射加工裝置,其中,前述折斷機構進一步具備相對於前述滾輪之於前述基板之上方之位置具有凹面狀之周面之承接滾輪。 The laser processing apparatus according to claim 4, wherein the breaking mechanism further includes a receiving roller having a concave peripheral surface with respect to a position of the roller above the substrate.
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