TWI449993B - Method for fabricating a display and the display produced therefrom - Google Patents
Method for fabricating a display and the display produced therefrom Download PDFInfo
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- TWI449993B TWI449993B TW099132527A TW99132527A TWI449993B TW I449993 B TWI449993 B TW I449993B TW 099132527 A TW099132527 A TW 099132527A TW 99132527 A TW99132527 A TW 99132527A TW I449993 B TWI449993 B TW I449993B
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- dry film
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- medium material
- photoresist layer
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Landscapes
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Liquid Crystal (AREA)
Description
本發明係關於一種顯示器之製造方法及其所製造之顯示器,尤指一種可改善製程中顯示介質材料平坦度之軟性顯示器之製造方法及其所製造之顯示器。The present invention relates to a method of manufacturing a display and a display thereof, and more particularly to a method of manufacturing a flexible display capable of improving the flatness of a display medium in a process and a display manufactured thereby.
近年來,薄型顯示器,例如液晶顯示器、電子紙、或電子書,正蓬勃發展。以單層液晶結構之液晶顯示器而言,如圖1所示,可包括下基板2、上基板4、複數個液晶材料6、用於隔開液晶材料之複數個擋牆8、上蓋10、第一導電膜12及第二導電膜14。In recent years, thin displays, such as liquid crystal displays, electronic paper, or e-books, are booming. The liquid crystal display having a single-layer liquid crystal structure, as shown in FIG. 1 , may include a lower substrate 2 , an upper substrate 4 , a plurality of liquid crystal materials 6 , a plurality of retaining walls 8 for separating the liquid crystal material, an upper cover 10 , and a first A conductive film 12 and a second conductive film 14.
然而,如圖2所示,目前在製作例如前述之液晶顯示器時,由於顯示介質材料(液晶)9與基板3或擋牆7各材料間在化學親和力等特性上具有差異,顯示介質材料9會傾向黏附於擋牆7上,造成噴塗於基板3表面之顯示介質材料9會產生表面平坦度與噴塗形狀不佳的缺點。因此,後續文獻研究如Microelectronic Engineering 82(2005),pp 1-11,便嘗試利用雙層感光材料來改善此一問題,但是也無法完全解決平坦性之問題,而習知技術應用於雙層結構感光材料領域大都有相同的缺點,列舉如下:(1)較為繁雜的製程,現行製作具有雙層結構擋牆(bank)的方法都是進行兩次塗佈或貼合製程,再進行兩次曝光顯影蝕刻動作才可得到具有雙層結構擋牆之基板;(2)或是使用表面電漿處理方使僅有一層結構之擋牆表面具有不同特性,產生如雙層結構擋牆之效果,但使用電漿表面處理的方式具有許多的缺點,如需要具備真空裝置與電漿產生系統等較貴的機台、過程中會產生有毒的氣體不符合環保規範、經過表面處理而產生之表面特性只是暫時性,以及電漿製程只能是單片單片(batch process)進行,產出慢等缺點;以及(3)目前雙層結構擋牆並無法有效的解決製程中顯示介質材料平坦度不佳的問題。However, as shown in FIG. 2, at the time of fabricating, for example, the aforementioned liquid crystal display, since the display medium material (liquid crystal) 9 and the materials of the substrate 3 or the retaining wall 7 have differences in chemical affinity and the like, the display medium material 9 The tendency to adhere to the retaining wall 7 causes the display medium material 9 sprayed on the surface of the substrate 3 to have a disadvantage of surface flatness and poor spray shape. Therefore, subsequent literature studies such as Microelectronic Engineering 82 (2005), pp 1-11, attempted to improve this problem with a double-layered photosensitive material, but the problem of flatness could not be completely solved, and the conventional technique was applied to a two-layer structure. The field of photosensitive materials all have the same shortcomings, as listed below: (1) The more complicated process, the current method of making a double-layered structural bank is to perform two coating or bonding processes, and then perform two exposures. The developing etching operation can obtain the substrate with the double-layer structure retaining wall; (2) or using the surface plasma treatment to make the surface of the retaining wall having only one layer structure have different characteristics, thereby producing the effect of a double-layer structural retaining wall, but The use of plasma surface treatment has many disadvantages, such as the need for expensive machines such as vacuum devices and plasma generation systems, the generation of toxic gases in the process that do not comply with environmental regulations, and the surface properties produced by surface treatment are only Temporary, and the plasma process can only be a single piece of the batch process, the output is slow and so on; and (3) the current double-layer structure retaining wall is not effective Problems of poor flatness of the dielectric material must display manufacturing process.
有鑑於此,本發明係提供一種顯示器之製造方法及由其所製造之顯示器,其係利用較簡易且較環保之製程,改善製程中顯示介質材料充填後之平坦度。In view of the above, the present invention provides a method of manufacturing a display and a display manufactured thereby, which utilizes a relatively simple and environmentally friendly process to improve the flatness of the display medium after filling in the process.
為達上揭及其他目的,本發明乃提出一種顯示器之製造方法,其包含以下步驟:提供具第一導電層之下基板;形成複數個擋牆於該下基板上;充填顯示介質材料於該些擋牆間;形成上蓋於該顯示介質材料上;及進行一第二導電層與該下基板之結合製程,其中該些擋牆之形成方式為:形成一乾膜於該下基板上;將一光罩設置於該乾膜上方;以及利用一次微影蝕刻製程,圖形化該乾膜,以形成複數個擋牆,其中該乾膜具有至少二光阻層。In order to achieve the above and other objects, the present invention provides a method of manufacturing a display, comprising the steps of: providing a substrate having a first conductive layer; forming a plurality of retaining walls on the lower substrate; filling the display medium material Forming an upper cover on the display medium material; and performing a bonding process of the second conductive layer and the lower substrate, wherein the retaining walls are formed by forming a dry film on the lower substrate; A photomask is disposed over the dry film; and the dry film is patterned by a single photolithography process to form a plurality of barrier walls, wherein the dry film has at least two photoresist layers.
本發明亦提出一顯示器,其係以前述方法所形成。The present invention also proposes a display formed by the aforementioned method.
請參照圖3A至3E,為本發明製作顯示器之一較佳實施例之示意圖。如圖3A所示,首先提供一下基板16,此下基板16上具有第一導電層18。此下基板16可為玻璃基板或塑膠基板且可包含主動式或被動式驅動電路。該塑膠基板可採用的樹脂種類,例如可為但不限於:聚酯樹脂(polyester resin),如聚對苯二甲酸乙二酯(polyethylene terephthalate,PET)或聚萘二甲酸乙二酯(polyethylene naphthalate,PEN);聚丙烯酸酯樹脂(polyacrylate resin),如聚甲基丙烯酸甲酯(polymethyl methacrylate,PMMA);聚烯烴樹脂(polyolefin resin),如聚乙烯(PE)或聚丙烯(PP);聚環烯烴樹脂(polycycloolefin resin);聚醯亞胺樹脂(polyimide resin);聚碳酸酯樹脂(polycarbonate resin);聚胺基甲酸酯樹脂(polyurethane resin);三醋酸纖維素(triacetyl cellulose,TAC);聚乳酸(polylactic acid),或其組合。較佳為聚酯樹脂、聚碳酸酯樹脂或其組合。該第一導電層18,可由本技術領域中具有通常知識者,所熟知之材料組成,例如可由氧化銦錫(indium tin oxide,ITO)所組成,並可利用濺鍍方式形成於下基板16上。此外,若所用之顯示介質材料為液晶材料,第一導電層18上可塗佈一配向層(圖未顯示)。該配向層可包含聚乙烯醇、聚亞醯胺、聚醯胺、尼龍、二氧化矽及卵磷脂。3A to 3E are schematic views of a preferred embodiment of a display device of the present invention. As shown in FIG. 3A, a substrate 16 is first provided, which has a first conductive layer 18 thereon. The lower substrate 16 can be a glass substrate or a plastic substrate and can include active or passive drive circuits. The type of resin that can be used for the plastic substrate can be, for example but not limited to, a polyester resin such as polyethylene terephthalate (PET) or polyethylene naphthalate (polyethylene naphthalate). , PEN); polyacrylate resin, such as polymethyl methacrylate (PMMA); polyolefin resin, such as polyethylene (PE) or polypropylene (PP); poly ring Polycycloolefin resin; polyimide resin; polycarbonate resin; polyurethane resin; triacetyl cellulose (TAC); Polylactic acid, or a combination thereof. It is preferably a polyester resin, a polycarbonate resin or a combination thereof. The first conductive layer 18 may be composed of materials well known to those skilled in the art, such as indium tin oxide (ITO), and may be formed on the lower substrate 16 by sputtering. . In addition, if the display medium material used is a liquid crystal material, an alignment layer (not shown) may be coated on the first conductive layer 18. The alignment layer may comprise polyvinyl alcohol, polyamidamine, polyamine, nylon, cerium oxide, and lecithin.
如圖3B所示,一乾膜20係施加於該第一導電層18之下基板16上,於本較佳實施例中,該乾膜20係具有兩層結構,分別為上光阻層20a及下光阻層20b,然,本較佳實施例係僅為例示用,並非用以限制該乾膜20所含之層數,該乾膜20之層數,可依實際應用改變為三層或以上。於一較佳實施例中,該具有兩層結構之乾膜20係利用層壓滾輪(lamination roller)製程形成於下基板16上。於另一較佳實施例中,該具有兩層結構之乾膜20係利用真空壓合(vacuum lamination)製程形成於下基板16上。若以兩層結構之乾膜為例,該乾膜(上光阻層+下光阻層)之厚度可為約為5微米至50微米,較佳為10至35微米。且為得到具有較佳之平坦化的效果,該下光阻層之厚度應控制約與該顯示介質材料充填於該些擋牆結構間之厚度相同。上述乾膜為一感光性材料,其包含感光性樹脂及表面改質劑,雙層結構之乾膜係由上下兩層不同的感光性材料所組成,換言之,上下兩光阻層之感光性樹脂可以相同或不相同,但須使用不同的表面改質劑,上述感光性樹脂為本發明所屬技術領域中具有通常知識者所熟知者,皆可適用,可為丙烯酸系樹脂(acrylic type resin)或環氧樹脂(epoxy resin)。表面改質劑可為石蠟(wax),矽烷(silane),例如:乙烯基矽烷(vinyl silane)、聚醚類三甲氧基矽烷(polyether-functional trimethoxysilane),Novalac酚醛樹脂(cresol novalac hybrid resin),全氟丁烷磺酸鹽(perfluorobutane sulfonate),例如:雙官能基全氟丁烷磺酸鹽(di-functional perfluorobutane sulfonate)或矽膠(silicone),例如:雙官能基丙烯酸系矽膠(di-functional acrylic type silicone)、多官能基丙烯酸系矽膠(multi-functional acrylic type silicone)、聚醚矽膠(polyether silicone)、全氟聚醚矽膠(perfluoropolyether silicone)、雙官能基異氰酸酯系矽膠(di-functional isocyanate type silicone)、雙官能基胺系矽膠(di-functional amino type silicone)。然而,該雙層結構中之上光阻層與下光阻層需分別具有不同的化學親和力,並且其上光阻層與下光阻層之厚度係隨著顯示介質材料充填之厚度進行調整,以符合各種不同顯示方式之顯示器的需求。上下兩層感光性材料與各種顯示介質材料之親和力,與其表面張力有關,可藉由感光性材料與顯示介質材料間所產生之接觸角來判斷,通常接觸角大者,表示其較排斥(-phobic)顯示介質材料,而接觸角小者,表示其較親(-philic)顯示介質材料。因此,其係依所使用之顯示介質的不同,可任意搭配適合之上光阻層與下光阻層之感光性材料。一般而言,上光阻層之感光性材料為由相對較斥顯示介質材料者之材料組成為佳,而下光阻層之感光性材料為由相對較親顯示介質材料者之材料組成為佳,但若下光阻層之感光性材料與顯示介質材料之親和力過大,則顯示介質材料會往擋牆兩邊吸附而表面呈現凹型的狀況,因此根據本發明之一較佳實施態樣,顯示介質材料為膽固醇液晶時,下光阻層與顯示介質材料之接觸角為約30度至約45度時對顯示介質材料具有較佳之平坦化的效果。As shown in FIG. 3B, a dry film 20 is applied to the substrate 16 under the first conductive layer 18. In the preferred embodiment, the dry film 20 has a two-layer structure, which is an upper photoresist layer 20a and The lower photoresist layer 20b, however, the preferred embodiment is for illustrative purposes only, and is not intended to limit the number of layers included in the dry film 20. The number of layers of the dry film 20 can be changed to three layers according to practical applications. the above. In a preferred embodiment, the dry film 20 having a two-layer structure is formed on the lower substrate 16 by a lamination roller process. In another preferred embodiment, the dry film 20 having a two-layer structure is formed on the lower substrate 16 by a vacuum lamination process. For example, in the case of a two-layer dry film, the dry film (upper photoresist layer + lower photoresist layer) may have a thickness of about 5 to 50 μm, preferably 10 to 35 μm. In order to obtain a better planarization effect, the thickness of the lower photoresist layer should be controlled to be about the same as the thickness of the display dielectric material filled between the barrier structures. The dry film is a photosensitive material comprising a photosensitive resin and a surface modifying agent, and the dry film of the two-layer structure is composed of two different photosensitive materials, in other words, the photosensitive resin of the upper and lower photoresist layers. They may be the same or different, but different surface modifying agents must be used. The above photosensitive resins are suitable for those skilled in the art to which the present invention pertains, and may be acrylic type resins or Epoxy resin. The surface modifying agent may be wax, silane, for example, vinyl silane, polyether-functional trimethoxysilane, volsol novalac hybrid resin, Perfluorobutane sulfonate, for example, di-functional perfluorobutane sulfonate or silicone, for example, di-functional acrylic Type silicone), multi-functional acrylic type silicone, polyether silicone, perfluoropolyether silicone, di-functional isocyanate type silicone ), a di-functional amino type silicone. However, in the double-layer structure, the upper photoresist layer and the lower photoresist layer respectively have different chemical affinity, and the thicknesses of the upper photoresist layer and the lower photoresist layer are adjusted according to the thickness of the display medium material filling. To meet the needs of displays with a variety of different display modes. The affinity between the upper and lower photosensitive materials and various display medium materials is related to the surface tension, and can be judged by the contact angle between the photosensitive material and the display medium material. Generally, the contact angle is large, indicating that it is more repulsive (- Phob) shows the material of the medium, and the contact angle is small, indicating that it is a philic display medium material. Therefore, depending on the display medium used, the photosensitive material suitable for the upper photoresist layer and the lower photoresist layer can be arbitrarily matched. Generally, the photosensitive material of the upper photoresist layer is preferably composed of a material which is relatively more repellent to the display medium material, and the photosensitive material of the lower photoresist layer is preferably composed of a material of a relatively comparative display medium material. However, if the affinity between the photosensitive material of the lower photoresist layer and the display medium material is too large, the display medium material is adsorbed to both sides of the retaining wall and the surface is concave. Therefore, according to a preferred embodiment of the present invention, the display medium When the material is a cholesteric liquid crystal, the contact angle of the lower photoresist layer and the display medium material is about 30 degrees to about 45 degrees, which has a better planarization effect on the display medium material.
下表1中之實驗數據是以膽固醇液晶(RGB三色)作為顯示介質材料,分別測量感光性材料對水與對膽固醇液晶(RGB三色)之接觸角,以表示此感光性材料之表面張力特性。其中三色膽固醇液晶之來源為永日化學有限公司,而由於各種顯示介質材料的表面張力均不一樣,所以本發明提出對水之接觸角則作為一個基準點可供參考。表1中所列舉出來的14種感光性材料均可以任意之厚度與搭配來建構出一種多層結構之乾膜。這14種感光性材料之主要成分包含感光性樹脂及表面改質劑,感光性樹脂可為一般的有機感光型樹脂或是具有特殊結構的有機感光樹脂,如包含丙烯酸系樹脂、環氧樹脂。表面改質劑如包含石蠟、矽烷、Novalac酚醛樹脂、氟系磺酸鹽及矽膠,可藉由不同感光性樹脂配合適當的表面改質劑調整感光性材料對顯示介質材料接觸角的大小。The experimental data in Table 1 below is based on cholesteric liquid crystal (RGB three colors) as the display medium material, and the contact angles of the photosensitive material against water and cholesteric liquid crystal (RGB three colors) are respectively measured to indicate the surface tension of the photosensitive material. characteristic. The source of the three-color cholesteric liquid crystal is Yongri Chemical Co., Ltd., and since the surface tension of various display medium materials is different, the present invention proposes that the contact angle of water is used as a reference point for reference. The 14 photosensitive materials listed in Table 1 can be constructed with a multilayer structure of a dry film in any thickness and combination. The main components of the 14 kinds of photosensitive materials include a photosensitive resin and a surface modifying agent, and the photosensitive resin may be a general organic photosensitive resin or an organic photosensitive resin having a special structure, such as an acrylic resin or an epoxy resin. The surface modifier includes paraffin, decane, Novalac phenolic resin, fluorine sulfonate and silicone. The contact angle of the photosensitive material to the display medium can be adjusted by using different photosensitive resins in combination with a suitable surface modifier.
此外,乾膜之上下層之厚度亦可作調整,以使顯示介質材料較平坦。例如,當乾膜之下光阻層厚度與充填之顯示介質材料厚度相當時,顯示介質材料易流平於凹槽內部,而再利用較厚之乾膜之上光阻層之斥顯示介質材料表面特性,使往兩邊擋牆吸附之顯示介質材料被排斥下來,如此即可得到一個可使顯示介質材料表面較平坦之顯示器基板。於一較佳實施例中,當顯示介質材料充填於擋牆間之凹槽之厚度約為2微米時,該乾膜之上光阻層厚度為約3微米至33微米,而該乾膜之下光阻層厚度為約2微米,於另一較佳實施例中,當顯示介質材料充填於擋牆間之凹槽之厚度約為5微米時,該乾膜之上光阻層厚度為約5微米至45微米,而該乾膜之下光阻層厚度為約5微米。In addition, the thickness of the upper layer above the dry film can also be adjusted to make the display medium material flat. For example, when the thickness of the photoresist layer under the dry film is equivalent to the thickness of the filled display medium material, the display medium material is easily leveled inside the groove, and the dielectric material of the photoresist layer on the thicker dry film is reused. The surface characteristics are such that the display medium material adsorbed to the two side walls is repelled, so that a display substrate which can make the surface of the display medium material flat is obtained. In a preferred embodiment, when the thickness of the groove of the display medium filled between the retaining walls is about 2 micrometers, the thickness of the photoresist layer on the dry film is about 3 micrometers to 33 micrometers, and the dry film is The thickness of the lower photoresist layer is about 2 micrometers. In another preferred embodiment, when the thickness of the recess of the display dielectric material between the barrier walls is about 5 micrometers, the thickness of the photoresist layer on the dry film is about 5 microns to 45 microns, and the thickness of the photoresist layer below the dry film is about 5 microns.
如圖3B至3C所示,接著對乾膜20進行圖形化。首先將一光罩22設置於乾膜20之上方,然後利用光罩22進行微影蝕刻製程,以一次微影蝕刻製程於乾膜20中同時形成複數個擋牆24(擋牆間由凹槽26間隔),且該擋牆具有上下層24a及24b。其中,擋牆之厚度係為約5微米至50微米,較佳為10至35微米,而擋牆之寬度係為約15微米至約60微米,然上述規格可依實際需求改變。各擋牆間係構成顯示面板之一畫素區,該擋牆間之間距係約為50微米至250微米,較佳約為70微米至100微米,然上述規格可依實際需求改變。As shown in Figures 3B through 3C, the dry film 20 is then patterned. First, a photomask 22 is disposed above the dry film 20, and then a photolithography etching process is performed by the photomask 22, and a plurality of retaining walls 24 are simultaneously formed in the dry film 20 by a microlithography etching process (the recesses between the retaining walls are formed by grooves) 26 spaces), and the retaining wall has upper and lower layers 24a and 24b. Wherein, the thickness of the retaining wall is about 5 micrometers to 50 micrometers, preferably 10 to 35 micrometers, and the width of the retaining wall is about 15 micrometers to about 60 micrometers. However, the above specifications may be changed according to actual needs. Each of the retaining walls constitutes a pixel area of the display panel, and the distance between the retaining walls is about 50 micrometers to 250 micrometers, preferably about 70 micrometers to 100 micrometers. However, the above specifications can be changed according to actual needs.
承接上述製程,在定義出複數個擋牆24與複數個凹槽26後,對該擋牆24進行固化。該固化之方式為本發明所屬技術領域中具通常知識者所熟知者,皆可使用,例如可包含紫外光固化。於固化後,具有擋牆24之基板可進行後續烘烤的製程,利用約為100℃至150℃,較佳約100℃至約120℃的溫度進行約為30至90分鐘,較佳約40至60分鐘的烘烤,以增加擋牆24之耐化性與機械強度。After the above process is completed, after the plurality of retaining walls 24 and the plurality of grooves 26 are defined, the retaining wall 24 is solidified. The manner of curing is well known to those of ordinary skill in the art to which the present invention pertains, and may be used, for example, to include ultraviolet light curing. After curing, the substrate having the retaining wall 24 can be subjected to a subsequent baking process, using a temperature of about 100 ° C to 150 ° C, preferably about 100 ° C to about 120 ° C, for about 30 to 90 minutes, preferably about 40. Baking to 60 minutes to increase the chemical resistance and mechanical strength of the retaining wall 24.
如圖3D所示,將顯示介質材料充填於下基板16之擋牆間(即凹槽26中)。顯示介質材料係可以噴墨頭28進行噴墨印刷(ink-jet printing)製程,或以真空注入(vacuum input)的方式,充填於擋牆間(凹槽26中)。該顯示介質材料,例如可為膽固醇液晶,或為其他本發明領域中所熟知之顯示介質材料。As shown in FIG. 3D, the display medium material is filled between the barrier walls of the lower substrate 16 (i.e., in the recesses 26). The display medium material may be subjected to an ink-jet printing process by the ink-jet head 28, or may be filled between the barrier walls (in the recess 26) by vacuum input. The display medium material can be, for example, a cholesteric liquid crystal, or other display medium material well known in the art.
根據表1所提供之製造例1至製造例14之乾膜固化後作成單層或雙層之複數個擋牆,將顯示介質材料(永日化學有限公司的三色膽固醇液晶)充填於擋牆間(凹槽中),以光學顯微鏡觀測顯示介質材料於擋牆間(凹槽中)之平坦化的情形,觀測結果如下表2所示。According to the dry film of the manufacturing example 1 to the manufacturing example 14 provided in Table 1, after curing, a plurality of retaining walls of a single layer or a double layer are formed, and the display medium material (three-color cholesteric liquid crystal of Yongri Chemical Co., Ltd.) is filled in the retaining wall. In the case of (in the groove), the flattening of the dielectric material between the retaining walls (in the groove) was observed by an optical microscope, and the observation results are shown in Table 2 below.
由表2所示比較例1為使用最排斥膽固醇液晶的感光性材料(製造例1)之單層結構之擋牆,膽固醇液晶被兩邊擋牆給排斥到中間,比較例9為最親膽固醇液晶(製造例14)的單層結構之擋牆,所以所噴印的膽固醇液晶會往擋牆兩邊吸附而表面呈現凹型的狀況,所以在其光學顯微鏡圖中液晶正中間有一條較白的區域即為液晶較淺的部分。比較例4的乾膜(製造例9)對膽固醇液晶之平坦化效果相較於其他單層擋牆較佳,但仍無法達到製作顯示器所需之平坦化效果。Comparative Example 1 shown in Table 2 is a single-layer structure retaining wall using a photosensitive material (manufacturing example 1) which is the most repellent liquid crystal, and the cholesteric liquid crystal is repelled to the middle by the two side walls, and Comparative Example 9 is the most cholesteric liquid crystal. (Manufacturing Example 14) The single-layer structure of the retaining wall, so the printed cholesteric liquid crystal will adsorb to both sides of the retaining wall and the surface will be concave. Therefore, in the optical microscope image, there is a white area in the middle of the liquid crystal. It is the lighter part of the liquid crystal. The dry film of Comparative Example 4 (Production Example 9) was preferable to the flattening effect of the cholesteric liquid crystal as compared with the other single-layer retaining walls, but the flattening effect required for the display was not obtained.
表2所示實施例1,實施例2及比較例10為雙層擋牆結構,其中實施例1及實施例2的擋牆下層使用對膽固醇液晶之平坦化效果較佳的製造例9,擋牆上層分別使用排斥膽固醇液晶的感光性材料製造例7及製造例1,對膽固醇液晶之平坦化效果佳,比較例10為擋牆下層使用最親膽固醇液晶的感光性材料(製造例14)搭配上層使用排斥膽固醇液晶的感光性材料(製造例5),相對於實施例1及實施例2而言,對膽固醇液晶之平坦化效果較差。The first embodiment, the second embodiment and the comparative example 10 shown in Table 2 are double-walled retaining wall structures, and the lower layer of the retaining wall of the first embodiment and the second embodiment uses the manufacturing example 9 which is preferable for the flattening effect of the cholesteric liquid crystal. In the case of using the photosensitive material for repelling cholesteric liquid crystal in the wall layer, the production method of Example 7 and Production Example 1 was good, and the flattening effect of the cholesteric liquid crystal was good. In Comparative Example 10, the photosensitive material using the most cholesteric liquid crystal in the lower layer of the barrier wall (Production Example 14) was used. In the upper layer, a photosensitive material that repels cholesterol liquid crystal (Production Example 5) was used, and the flattening effect on the cholesteric liquid crystal was inferior to those of Examples 1 and 2.
如圖3E所示,複數個上蓋32係形成於顯示介質材料之上方。該上蓋可為高分子保護層。此外,係進行具第二導電層34之上基板36與下基板16之結合製程,例如熱滾輪壓合製程。其中該上基板係用玻璃基板或塑膠基板,該第二導電層34係使用無機導電材料或有機導電材料,且可包含主動式或被動式驅動電路。As shown in FIG. 3E, a plurality of upper covers 32 are formed over the display medium material. The upper cover may be a polymer protective layer. In addition, a bonding process of the substrate 36 and the lower substrate 16 on the second conductive layer 34 is performed, such as a hot roller pressing process. The upper substrate is a glass substrate or a plastic substrate, and the second conductive layer 34 is made of an inorganic conductive material or an organic conductive material, and may include an active or passive driving circuit.
由於本發明之感光性乾膜為兩層以上結構,且上下層具有不同之表面性質,而其不同的表面性質來自於光聚合反應後的結果,所以其表面性質為永久性,不像以電漿處理的表面性質會隨著時間而很快的消逝。Since the photosensitive dry film of the present invention has two or more layers and the upper and lower layers have different surface properties, and the different surface properties are derived from the results after photopolymerization, the surface properties are permanent, unlike electricity. The surface properties of the pulp treatment will quickly fade away over time.
由於本發明係先施加具有上層與下層之感光性乾膜於基板表面,然後再進行圖案化製程,以於感光性乾膜中定義出複數個擋牆,接著再充填顯示介質材料於擋牆間(凹槽中);利用上述不同特性之雙層感光性乾膜所建構之擋牆,可有效改善習知製作顯示器時以單層結構擋牆造成之材料平坦化問題、以兩次製程建構出之雙層結構擋牆之製程繁複問題、使用電漿表面處理所產生之有毒害氣體與只具有暫時性之表面改質特性之問題。Since the present invention first applies a photosensitive dry film having an upper layer and a lower layer on the surface of the substrate, and then performs a patterning process to define a plurality of retaining walls in the photosensitive dry film, and then fills the display medium material between the retaining walls. (in the groove); the retaining wall constructed by the double-layer photosensitive dry film with different characteristics described above can effectively improve the material flattening problem caused by the single-layer structure retaining wall when the display is conventionally manufactured, and is constructed by two processes. The problem of complicated manufacturing process of the double-layer structure retaining wall, the use of the toxic gas generated by the plasma surface treatment and the problem of only temporary surface modification characteristics.
2‧‧‧下基板2‧‧‧lower substrate
3‧‧‧基板3‧‧‧Substrate
4‧‧‧上基板4‧‧‧Upper substrate
6‧‧‧液晶材料6‧‧‧Liquid crystal materials
7‧‧‧擋牆7‧‧‧Retaining wall
8‧‧‧擋牆8‧‧‧Retaining wall
9‧‧‧顯示介質材料9‧‧‧Display media material
10‧‧‧上蓋10‧‧‧Upper cover
12‧‧‧第一導電膜12‧‧‧First conductive film
14‧‧‧第二導電膜14‧‧‧Second conductive film
16‧‧‧下基板16‧‧‧lower substrate
18‧‧‧導電層18‧‧‧ Conductive layer
20‧‧‧乾膜20‧‧‧ dry film
20a‧‧‧上光阻層20a‧‧‧Upper photoresist layer
20b‧‧‧下光阻層20b‧‧‧ lower photoresist layer
22‧‧‧光罩22‧‧‧Photomask
24‧‧‧擋牆24‧‧ ‧ retaining wall
24a‧‧‧擋牆上層24a‧‧ ‧ wall layer
24b‧‧‧擋牆下層24b‧‧‧Under the wall
26‧‧‧凹槽26‧‧‧ Groove
28‧‧‧噴墨頭28‧‧‧Inkjet head
30‧‧‧顯示介質材料30‧‧‧Display media material
32‧‧‧上蓋32‧‧‧Upper cover
34‧‧‧第二導電層34‧‧‧Second conductive layer
36‧‧‧上基板36‧‧‧Upper substrate
圖1係習知技術中單層液晶結構之顯示器基板之剖面構造示意圖。1 is a schematic cross-sectional view showing a display substrate of a single-layer liquid crystal structure in a prior art.
圖2顯示顯示介質材料剛充填於基板後,平坦度不佳之情形。Fig. 2 shows a case where the flatness of the dielectric material is not good after being filled in the substrate.
圖3A至3E顯示本發明顯示器之製造方法之一較佳實施例。3A to 3E show a preferred embodiment of a method of manufacturing the display of the present invention.
16...下基板16. . . Lower substrate
18...導電層18. . . Conductive layer
24...擋牆twenty four. . . Retaining wall
24a...擋牆上層24a. . . Wall layer
24b...擋牆下層24b. . . Lower wall
30...顯示介質材料30. . . Display media material
32...上蓋32. . . Upper cover
34...第二導電層34. . . Second conductive layer
36...上基板36. . . Upper substrate
Claims (17)
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TW200619739A (en) * | 2004-12-07 | 2006-06-16 | Ind Tech Res Inst | Method and device of color cholesteric liquid crystal |
TW200628874A (en) * | 2005-02-04 | 2006-08-16 | Ind Tech Res Inst | Cholesteric liquid crystal display device and manufacturing method for the same |
TW200941076A (en) * | 2008-03-31 | 2009-10-01 | Ind Tech Res Inst | Color cholesteric liquid crystal display devices and fabrication methods thereof |
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TW200619739A (en) * | 2004-12-07 | 2006-06-16 | Ind Tech Res Inst | Method and device of color cholesteric liquid crystal |
TW200628874A (en) * | 2005-02-04 | 2006-08-16 | Ind Tech Res Inst | Cholesteric liquid crystal display device and manufacturing method for the same |
TW200941076A (en) * | 2008-03-31 | 2009-10-01 | Ind Tech Res Inst | Color cholesteric liquid crystal display devices and fabrication methods thereof |
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