CN110350011B - Pixel defining layer, preparation method thereof and display substrate - Google Patents
Pixel defining layer, preparation method thereof and display substrate Download PDFInfo
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- CN110350011B CN110350011B CN201910627395.0A CN201910627395A CN110350011B CN 110350011 B CN110350011 B CN 110350011B CN 201910627395 A CN201910627395 A CN 201910627395A CN 110350011 B CN110350011 B CN 110350011B
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- lyophobic material
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/1201—Manufacture or treatment
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
Abstract
The application discloses a pixel defining layer, a preparation method thereof and a display substrate. The method comprises the following steps: the first lyophobic material layer is arranged above the substrate base plate and comprises silicon dioxide Janus nano particles, and when the first lyophobic material layer is baked, the first lyophobic material layer is separated to form a lyophilic surface and a lyophobic surface, the lyophilic surface is far away from the substrate base plate, and the lyophobic surface is close to the substrate base plate. According to the technical scheme of the embodiment of the application, the lyophilic surface and the lyophobic surface are naturally separated and formed by the first lyophobic material layer containing the silicon dioxide Janus nano particles during baking of the photoetching process, so that ink of the ink-jet printing material is effectively prevented from climbing, and the film forming uniformity of the solution in the pixel area is improved.
Description
Technical Field
The present disclosure relates generally to the field of display technologies, and more particularly, to a pixel defining layer, a method for manufacturing the pixel defining layer, and a display substrate.
Background
An Organic Light-Emitting Diode (OLED) display panel includes an anode, a hole injection layer, a hole transport layer, an Organic material film layer, an electron transport layer, an electron injection layer, a cathode, and the like.
In manufacturing an organic material film using an inkjet printing technique, it is necessary to form a pixel defining layer on a base substrate and then spray a solution dissolving an organic light emitting material onto the base substrate on which the pixel defining layer is formed to form the organic material film.
When the ink-jet printing is carried out, the hydrophilic material of the pixel defining layer has an attraction effect on the solution for dissolving the organic luminescent material, so that an organic material film layer with uniform thickness is formed in the pixel region, and the hydrophobic material has a repulsion effect on the solution for dissolving the organic luminescent material, so that the solution can be inhibited from climbing on the pixel defining layer.
Disclosure of Invention
In view of the above-mentioned defects or shortcomings in the prior art, it is desirable to provide a pixel defining layer, a method for manufacturing the same, and a display substrate, which are capable of solving the problem of complicated manufacturing process of the pixel defining layer and effectively controlling the climbing of ink-jet printing ink.
In a first aspect, an embodiment of the present application provides a pixel defining layer, including:
the first lyophobic material layer is arranged above the substrate base plate and comprises silicon dioxide Janus nano particles, and when the first lyophobic material layer is baked, the first lyophobic material layer is separated to form a lyophilic surface and a lyophobic surface, the lyophilic surface is far away from the substrate base plate, and the lyophobic surface is close to the substrate base plate.
Preferably, the second lyophobic material layer is arranged above the first lyophobic material layer, and the lyophobic capacity of the second lyophobic material layer is larger than that of the first lyophobic material layer.
Optionally, the first lyophobic material layer has a thickness of 0.2-1 micron.
Optionally, a longitudinal section of the first lyophobic material layer is larger on a side far away from the substrate than on a side close to the substrate.
In a second aspect, an embodiment of the present application provides a method for preparing a pixel definition layer, where the method includes:
forming a first lyophobic material layer on the substrate, wherein the first lyophobic material layer comprises silicon dioxide Janus nano particles;
when the first lyophobic material layer is baked, the first lyophobic material layer is separated to form a lyophilic surface and a lyophobic surface, the lyophilic surface is far away from the substrate base plate, and the lyophobic surface is close to the substrate base plate;
after the first lyophobic material layer is subjected to a photoetching process, a first pattern of a pixel defining layer is formed.
Optionally, the longitudinal section of the first pattern is an inverted trapezoid.
Optionally, forming a second lyophobic material layer on the first lyophobic material layer, wherein the lyophobic capacity of the second lyophobic material layer is greater than that of the first lyophobic material layer;
and carrying out a photoetching process on the second lyophobic material layer to form a second pattern of the pixel defining layer, wherein the second pattern is different from the first pattern.
Optionally, the first pattern has a thickness of 0.2-1 micron.
In a third aspect, an embodiment of the present application provides a display substrate, including: a substrate base plate and a pixel defining layer arranged on the substrate base plate, wherein the pixel defining layer is the pixel defining layer described in the first aspect.
The embodiment of the application provides a pixel defining layer, a preparation method thereof and a display substrate, wherein a first lyophobic material layer containing silicon dioxide Janus nano particles is naturally separated to form a lyophilic surface and a lyophobic surface during baking of a photoetching process, and compared with the prior art, the process steps are further simplified, and the preparation efficiency is improved. Further, an inverted trapezoidal structure is formed by the first lyophobic material layer through the processes of exposure, development and the like of a photoetching process, and the second lyophobic material layer is further arranged, so that ink climbing of the ink-jet printing material can be effectively prevented, and the film forming uniformity of the solution in the pixel area is improved.
Drawings
Other features, objects and advantages of the present application will become more apparent upon reading of the following detailed description of non-limiting embodiments thereof, made with reference to the accompanying drawings in which:
fig. 1 is a schematic structural diagram of a pixel defining layer according to an embodiment of the present disclosure;
fig. 2 is a schematic structural diagram of another pixel defining layer provided in the embodiment of the present application;
FIG. 3 is a schematic structural diagram of another pixel definition layer provided in the embodiments of the present application;
fig. 4 shows a schematic separation diagram of a first lyophobic material layer with lyophilic/lyophobic performance provided by an embodiment of the application;
FIG. 5 is a flow chart illustrating a method for fabricating a pixel definition layer according to an embodiment of the present disclosure;
fig. 6 is a schematic flow chart illustrating a method for manufacturing a pixel definition layer according to another embodiment of the present disclosure.
Detailed Description
The present application will be described in further detail with reference to the following drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the relevant disclosure and are not limiting of the disclosure. It should be further noted that, for the convenience of description, only the portions relevant to the disclosure are shown in the drawings.
It should be noted that the embodiments and features of the embodiments in the present application may be combined with each other without conflict. The present application will be described in detail below with reference to the embodiments with reference to the attached drawings.
Referring to fig. 1, fig. 1 is a schematic structural diagram illustrating a pixel defining layer according to an embodiment of the present disclosure.
The pixel defining layer 12 may include a first lyophobic material layer 121 disposed over the substrate base plate 11. The first lyophobic material layer comprises silicon dioxide Janus nano particles, when the first lyophobic material layer is baked, the first lyophobic material layer is separated to form a lyophilic surface 121-1 and a lyophobic surface 121-2, the lyophilic surface is far away from the substrate base plate 11, and the lyophobic surface is close to the substrate base plate 11.
Janus nanoparticles refer to a class of nanoparticles having an asymmetric chemical composition. By utilizing the characteristics of Janus nano particles, the Janus nano particles can be separated to form a pixel defining material layer with lyophilic on the upper surface and lyophobic on the lower surface, and then a pattern is formed through a photoetching process, so that the pixel defining layer is prepared. The lyophobic material has low surface energy, after coating is finished, the lyophobic material with low surface energy moves towards the direction far away from the substrate through drying, prebaking and exposure processes, the Janus nano particles have lyophilic/lyophobic properties, the lyophilic parts of the Janus nano particles are in repulsion action with the lyophobic material with low surface energy, and the lyophilic surfaces of the Janus nano particles continuously move towards the direction far away from the low surface energy of the lyophobic material to form lyophilic surfaces. The lyophobic material has lyophobic property, and after exposure and development, the film is solid, so that Janus nano particles can not move any more, and a lyophobic surface is formed in the direction close to the substrate.
As shown in fig. 4, fig. 4 is a schematic diagram illustrating a separation of a first lyophobic material layer with lyophilic and hydrophobic properties according to an embodiment of the present disclosure. And adding the silica Janus nano particles with the lyophilic and lyophobic performances into the first lyophobic material, and coating the first lyophobic material on the substrate through a coating process. With the operation of the photolithography process of the first lyophobic material layer, the first lyophobic material is gradually separated into an upper layer which is a lyophilic surface and a lower layer which is a lyophobic surface.
The first lyophobic material layer 121 is made of a material having low lyophobic property, such as silicon dioxide, silicon nitride, or the like. Silica Janus nanoparticles having lyophilic/lyophobic properties may be added to the first lyophobic material layer 121, so that the first lyophobic material layer may be naturally separated to form a lyophilic surface and a lyophobic surface in the baking step.
The pixel defining layer can be formed through a one-step process, so that the process procedures are effectively reduced, and the preparation efficiency is improved.
The photoresist layer is added to the first lyophobic material layer 121, so that the first lyophobic material layer 121 can be directly exposed and developed without being coated again, and the process steps are further simplified.
The thickness of the first lyophobic material layer 121 may be 0.2 to 1 μm when it is prepared. Considering the process of forming the cathode after the pixel defining layer is formed, if the thickness of the first lyophobic material layer is large, the fracture phenomenon may occur. Therefore, it is preferable to set the thickness thereof to 0.2 to 1 μm.
Further, in order to better reduce the climbing of the solution on the inclined surface of the pixel defining layer and the influence on the film forming uniformity in the pixel area, the surface far away from the substrate is formed to be larger than the surface close to the substrate through the patterning treatment of the first lyophobic material layer through the photoetching process. As shown in fig. 1, the first lyophobic material layer may be prepared in an inverted trapezoid structure, which is advantageous for preventing the solution from climbing on the inclined surface of the pixel defining layer.
Referring to fig. 2, fig. 2 is a schematic structural diagram of another pixel defining layer according to an embodiment of the present disclosure.
As shown in fig. 2, the pixel defining layer 12 may include a first lyophobic material layer 121 near the upper surface of the substrate base plate 11, and a second lyophobic material layer 122 far from the upper surface of the substrate base plate 11. The material of the first lyophobic material layer may be a material with low lyophobic performance, such as silicon dioxide, silicon nitride, and the like. The same as the first lyophobic material layer 121 described in fig. 1.
The second lyophobic material layer 122 may be made of a material having high lyophobic property, for example, any one of organic lyophobic materials such as fluorinated polymethyl methacrylate, fluorinated polyimide, and polysiloxane.
The first lyophobic material layer 121 is made into an inverted trapezoid structure by a photolithography process, and the second lyophobic material layer 122 is made into a regular trapezoid structure. The height of the solution climbing over the slope of the pixel defining layer can be reduced by the repulsive action of the second lyophobic material layer 122.
The photoresist layer is added in the first lyophobic material layer, so that the first lyophobic material layer can be directly exposed and developed without coating the photoresist layer again, and the process steps are further simplified.
The thickness of the first lyophobic material layer may be 0.2 to 1 μm when it is prepared. Considering the process of forming the cathode after the pixel defining layer is formed, if the thickness of the first lyophobic material layer is large, the fracture phenomenon may occur. Therefore, it is preferable to set the thickness thereof to 0.2 to 1 μm.
The embodiment of the present application may further include a plurality of first lyophobic material layers, as shown in fig. 3. Fig. 3 is a schematic structural diagram of another pixel definition layer provided in the embodiment of the present application. Through the preparation process of the first lyophobic material layer with the multilayer structure, the climbing of solution on the inclined plane of the pixel defining layer can be further reduced, and the influence on the film forming uniformity in the pixel area can be further reduced.
Referring to fig. 5, fig. 5 is a schematic flow chart illustrating a method for manufacturing a pixel definition layer according to an embodiment of the present disclosure.
The embodiment of the application provides a process step for preparing a pixel defining layer, and a photoetching process is carried out after a first lyophobic material layer is formed. The photoetching process comprises the process steps of baking, exposing and developing. After the first lyophobic material layer is baked, exposed, developed and the like, the first lyophobic material layer with a certain pattern is formed. For example, the pattern may be an inverted trapezoid. The thickness of the first lyophobic material layer may be 0.2 to 1 μm when it is prepared.
The first lyophobic material layer can be formed through one-time process, and the preparation process is simplified. In the embodiment of the present application, the baking may be a soft baking or a hard baking of the photolithography process.
Further, as shown in fig. 6, fig. 6 is a schematic flow chart of a method for preparing a pixel definition layer according to another embodiment of the present application. The method may further include, on the basis of the first lyophobic material layer prepared in fig. 5:
304, forming a second lyophobic material layer on the first lyophobic material layer, wherein the lyophobic capacity of the second lyophobic material layer is larger than that of the first lyophobic material layer;
According to the pixel definition layer preparation method provided by the embodiment of the application, in order to reduce the climbing of ink-jet printing ink on the inclined plane of the pixel definition layer, a second lyophobic material layer is prepared above the first lyophobic material layer, and the problem of film forming uniformity of a pixel area is improved through the repulsion effect of the second lyophobic material layer. The second lyophobic material layer may have a thickness greater than that of the first lyophobic material layer. The pixel defining layer is composed of a first lyophobic material layer and a second lyophobic material layer, wherein the first lyophobic material layer can be separated to form a lyophilic surface and a lyophobic surface, and therefore the lyophobic surface, the lyophilic surface and the second lyophobic material layer are arranged in a stacked mode. The pixel defining layer with the structure simplifies the process flow compared with the existing pixel defining layer preparation process. And the pixel defining layer with the structure can reduce the climbing of ink-jet printing ink on the inclined surface of the pixel defining layer.
The embodiment of the present application further provides a display substrate, which includes: a substrate base plate and a pixel defining layer disposed on the substrate base plate, the pixel defining layer being the pixel defining layer described in any one of fig. 1-3. The display substrate may further include: an anode disposed between the base substrate and the pixel defining layer and a cathode disposed on the pixel defining layer. The display substrate may constitute a display panel of an OLED. For example, a display device including the display panel may include: products or components with display functions such as liquid crystal panels, electronic paper, mobile phones, tablet computers, televisions, displays, notebook computers, digital photo frames, navigation equipment and the like.
The above description is only a preferred embodiment of the application and is illustrative of the principles of the technology employed. It will be appreciated by those skilled in the art that the scope of the disclosure herein is not limited to the particular combination of features described above, but also encompasses other arrangements formed by any combination of the above features or their equivalents without departing from the spirit of the disclosure. For example, the above features may be replaced with (but not limited to) features having similar functions disclosed in the present application.
Claims (5)
1. A pixel defining layer, comprising:
the first lyophobic material layer is arranged above the substrate base plate and comprises silicon dioxide Janus nano particles, and when the first lyophobic material layer is baked, the first lyophobic material layer is separated to form a lyophilic surface and a lyophobic surface, the lyophilic surface is far away from the substrate base plate, and the lyophobic surface is close to the substrate base plate;
a second lyophobic material layer arranged above the first lyophobic material layer, wherein the lyophobic capacity of the second lyophobic material layer is larger than that of the first lyophobic material layer;
the side, far away from the substrate base plate, of the longitudinal section of the first lyophobic material layer is larger than the side, close to the substrate base plate, of the longitudinal section of the second lyophobic material layer, and the longitudinal section of the first lyophobic material layer is of a regular trapezoid structure.
2. The pixel defining layer of claim 1, wherein the first lyophobic material layer has a thickness of 0.2-1 micron.
3. A method of forming a pixel definition layer, the method comprising:
forming a first lyophobic material layer on a substrate, wherein the first lyophobic material layer comprises silicon dioxide Janus nano particles;
when the first lyophobic material layer is baked, the first lyophobic material layer is separated to form a lyophilic surface and a lyophobic surface, the lyophilic surface is far away from the substrate base plate, and the lyophobic surface is close to the substrate base plate;
after the first lyophobic material layer is subjected to a photoetching process, a first pattern of a pixel defining layer is formed, and the longitudinal section of the first pattern is of an inverted trapezoid structure;
forming a second lyophobic material layer on the first lyophobic material layer, wherein the lyophobic capacity of the second lyophobic material layer is larger than that of the first lyophobic material layer;
and carrying out a photoetching process on the second lyophobic material layer to form a second pattern of the pixel defining layer, wherein the second pattern is different from the first pattern, and the longitudinal section of the second pattern is of an inverted trapezoidal structure.
4. The method of claim 3, wherein the first pattern has a thickness of 0.2-1 μm.
5. A display substrate, comprising: a substrate and a pixel defining layer disposed on the substrate, the pixel defining layer being as claimed in any one of claims 1-2.
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| CN111326562B (en) * | 2020-03-05 | 2023-01-24 | 深圳市华星光电半导体显示技术有限公司 | Quantum dot display panel and preparation method thereof |
| CN111834536B (en) * | 2020-07-07 | 2022-04-26 | Tcl华星光电技术有限公司 | OLED panel and preparation method thereof |
| CN112420795A (en) * | 2020-11-18 | 2021-02-26 | 武汉华星光电半导体显示技术有限公司 | OLED display panel and preparation method thereof |
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| CN106941112A (en) * | 2017-05-05 | 2017-07-11 | 京东方科技集团股份有限公司 | Pixel defining layer and its manufacture method, display base plate |
| CN108987449A (en) * | 2018-07-27 | 2018-12-11 | 京东方科技集团股份有限公司 | Pixel defining layer and its manufacturing method, display base plate |
| CN109360839A (en) * | 2018-09-26 | 2019-02-19 | 京东方科技集团股份有限公司 | Display base plate and preparation method thereof, display panel, nanoparticle preparation method |
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| CN106920828A (en) * | 2017-03-29 | 2017-07-04 | 京东方科技集团股份有限公司 | A kind of organic EL display panel and preparation method |
| CN106941112A (en) * | 2017-05-05 | 2017-07-11 | 京东方科技集团股份有限公司 | Pixel defining layer and its manufacture method, display base plate |
| CN108987449A (en) * | 2018-07-27 | 2018-12-11 | 京东方科技集团股份有限公司 | Pixel defining layer and its manufacturing method, display base plate |
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