TWI441268B - Substrate transporting method and substrate transporting device - Google Patents

Substrate transporting method and substrate transporting device Download PDF

Info

Publication number
TWI441268B
TWI441268B TW102120779A TW102120779A TWI441268B TW I441268 B TWI441268 B TW I441268B TW 102120779 A TW102120779 A TW 102120779A TW 102120779 A TW102120779 A TW 102120779A TW I441268 B TWI441268 B TW I441268B
Authority
TW
Taiwan
Prior art keywords
substrate
island
adhesive
region
unit
Prior art date
Application number
TW102120779A
Other languages
Chinese (zh)
Other versions
TW201405675A (en
Inventor
Shinya Kawai
Shinsaku Ikeda
Original Assignee
Canon Machinery Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Machinery Inc filed Critical Canon Machinery Inc
Publication of TW201405675A publication Critical patent/TW201405675A/en
Application granted granted Critical
Publication of TWI441268B publication Critical patent/TWI441268B/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
    • H01L24/75Apparatus for connecting with bump connectors or layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
    • H01L24/741Apparatus for manufacturing means for bonding, e.g. connectors
    • H01L24/743Apparatus for manufacturing layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/75Apparatus for connecting with bump connectors or layer connectors
    • H01L2224/7565Means for transporting the components to be connected
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/75Apparatus for connecting with bump connectors or layer connectors
    • H01L2224/757Means for aligning
    • H01L2224/75703Mechanical holding means
    • H01L2224/75705Mechanical holding means in the upper part of the bonding apparatus, e.g. in the bonding head
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/75Apparatus for connecting with bump connectors or layer connectors
    • H01L2224/757Means for aligning
    • H01L2224/75743Suction holding means
    • H01L2224/75744Suction holding means in the lower part of the bonding apparatus, e.g. in the apparatus chuck
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8319Arrangement of the layer connectors prior to mounting
    • H01L2224/83192Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on another item or body to be connected to the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • H01L23/49503Lead-frames or other flat leads characterised by the die pad
    • H01L23/49513Lead-frames or other flat leads characterised by the die pad having bonding material between chip and die pad

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Die Bonding (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Description

基板搬運方法以及基板搬運裝置Substrate transfer method and substrate transfer device

本發明是有關於一種用以將半導體晶片(chip)等的晶粒(die)黏合(bonding)至引線框架(lead frame)等基板上之基板運送方法以及基板運送裝置。The present invention relates to a substrate transfer method and a substrate transfer device for bonding a die of a semiconductor chip or the like to a substrate such as a lead frame.

在半導體製造設備上,具有晶粒黏合器(die bonder)。晶粒黏合器是將焊料、鍍金、樹脂等作為接合材料,將晶粒(將電路製作於矽(silicon)基板的晶片)黏著於引線框架(基板)的裝置。On a semiconductor manufacturing facility, there is a die bonder. The die bonder is a device in which a die (a wafer in which a circuit is formed on a silicon substrate) is adhered to a lead frame (substrate) by using solder, gold plating, a resin or the like as a bonding material.

如圖11所示,引線框架(基板)101沿著其長邊方向以規定間隔(定間隔)具有多個島狀區(island)102,且於該些島狀區102配置接合有晶粒103(半導體晶片等)。因此,在晶粒接合器上,將黏著劑104供給至基板101的多個島狀區102,並將晶粒103(半導體晶片等)黏合至供給有黏著劑104的島狀區102。因此,在晶粒接合器上,必需將基板101搬運至供給(塗佈)黏 著劑104的預形成位置A,並且搬運至將晶粒103供給至島狀區102的黏合位置B。As shown in FIG. 11, the lead frame (substrate) 101 has a plurality of islands 102 at predetermined intervals (scheduled intervals) along the longitudinal direction thereof, and the crystal grains 103 are disposed to be bonded to the island regions 102. (semiconductor wafer, etc.). Therefore, on the die bonder, the adhesive 104 is supplied to the plurality of island regions 102 of the substrate 101, and the die 103 (semiconductor wafer or the like) is bonded to the island region 102 to which the adhesive 104 is supplied. Therefore, on the die bonder, it is necessary to transport the substrate 101 to the supply (coating) paste. The preform 104 is pre-formed at position A and transported to the bonding position B where the die 103 is supplied to the island region 102.

因此,從以往便存在用以將基板101的島狀區102依序搬運至預形成位置A以及黏合位置B的搬運裝置(專利文獻1)。在這樣的搬運裝置上,將基板101以定間隔間歇傳送。亦即,這種習知搬運裝置具有可重複上下方向和框架搬運方向(框架長邊方向)的前後方向之連續矩形運動的銷(pin)。又,基板101在上述每個定間隔都設有貫孔(傳送孔)。Therefore, there has been a conventional conveyance device for transporting the island-like regions 102 of the substrate 101 to the pre-formed position A and the bonding position B in order (Patent Document 1). On such a transfer device, the substrates 101 are intermittently transferred at regular intervals. That is, this conventional conveying device has a pin which can repeat the continuous rectangular movement in the front-rear direction of the up-and-down direction and the frame conveying direction (longitudinal direction of the frame). Further, the substrate 101 is provided with a through hole (transport hole) at each of the above-described predetermined intervals.

在這樣的搬運裝置上,傳送銷下降並嵌入基板101的一個傳送孔。並且,在此狀態下傳送銷以固定間隔移動至框架搬運方向的下游側。藉此,基板101僅以固定間隔被搬運至下游側。繼而,傳送銷上昇並從該傳送孔拔出後,傳送銷以固定間隔移動至框架搬運方向的上游側。其後,藉由依序進行上述各步驟,使基板101以定間隔被逐一搬運。In such a handling device, the transfer pin is lowered and embedded in one of the transfer holes of the substrate 101. Further, in this state, the transport pins are moved at a fixed interval to the downstream side in the frame transport direction. Thereby, the substrate 101 is transported to the downstream side only at regular intervals. Then, after the transfer pin is lifted and pulled out from the transfer hole, the transfer pin is moved to the upstream side in the frame conveyance direction at a fixed interval. Thereafter, the substrate 101 is transported one by one at regular intervals by sequentially performing the above steps.

並且,各基板101的島狀區102被搬運至預形成位置A,並在此預形成位置A塗佈接著劑104後,被搬運至黏合位置B,而晶粒103在此黏合位置B被黏合。Further, the island region 102 of each substrate 101 is transported to the pre-formed position A, and after the adhesive layer 104 is applied to the pre-formed position A, it is transported to the bonding position B, and the die 103 is bonded at this bonding position B. .

[先前技術文獻][Previous Technical Literature] [專利文獻][Patent Literature]

專利文獻1:日本專利特開2004-128097號公報Patent Document 1: Japanese Patent Laid-Open Publication No. 2004-128097

然而,在習知的搬運裝置,一般而言,島狀物102的定間隔僅能逐一被間歇傳送。因此,上游側的引線框架101b和下游側的引線框架101a如圖11的α的狀態所示,上游側引線框架101b的下游端島狀區102和下游側引線框架101a的上游端島狀區102的間隔必須為2×P。However, in conventional handling devices, in general, the spacing of the islands 102 can only be intermittently transmitted one by one. Therefore, the lead frame 101b on the upstream side and the lead frame 101a on the downstream side are spaced apart from each other in the state of α of the upstream side lead frame 101b, and the upstream end island area 102 of the downstream side lead frame 101a and the upstream end island area 102 of the downstream side lead frame 101a. Must be 2 x P.

但是,若將上游側引線框架101b的下游端島狀區102和下游側引線框架101a的上游端島狀區102的間隔設定為2×P,會如圖11的β的狀態所示,上游側的引線框架101b和下游側的引線框架101a之間在黏合位置對應時,便成沒有進行黏合的島狀區之狀態。因此,如圖11所示,較佳為以將上游側引線框架101b的下游端島狀區102和下游側引線框架101a的上游端島狀區102的間隔消除,並在作業步驟上不產生耗費的時間的方式進行設定。However, if the interval between the downstream end island region 102 of the upstream side lead frame 101b and the upstream end island region 102 of the downstream side lead frame 101a is set to 2 × P, the lead on the upstream side will be as shown in the state of β in Fig. 11 . When the frame 101b and the lead frame 101a on the downstream side correspond to each other at the bonding position, the state of the island region which is not bonded is formed. Therefore, as shown in Fig. 11, it is preferable to eliminate the interval between the downstream end island region 102 of the upstream side lead frame 101b and the upstream end island region 102 of the downstream side lead frame 101a, and it does not take time in the operation step. The way to set.

然而,在這樣的情況下,如圖12所示,必須設定預形成位置A和黏合位置B。亦即,如圖12的α的狀態所示,在引線框架101a的最下游的島狀區102已到達黏合位置B的狀態下,必須達到較此引線框架101a更上游的引線框架101b的最下游的島狀區102亦已到達的預形成位置A。However, in such a case, as shown in FIG. 12, the pre-formed position A and the bonded position B must be set. That is, as shown in the state of α of Fig. 12, in the state where the island portion 102 at the most downstream of the lead frame 101a has reached the bonding position B, it is necessary to reach the most downstream of the lead frame 101b which is further upstream than the lead frame 101a. The island region 102 has also reached the pre-formed position A.

亦即,從圖12的α所示的狀態,藉由將引線框架101以定間隔逐一傳送至下游側,能夠如圖12的β、γ、δ、ε、ζ、η依序將島狀區102分別搬運至預形成位置A和黏合位置B,並能夠在各位置進行預形成動作和黏合動作。藉此,各引線框架101的全部島狀區102可黏著於晶片3。That is, from the state indicated by α in Fig. 12, by routing the lead frames 101 one by one to the downstream side at regular intervals, the island regions can be sequentially arranged as shown in Fig. 12 by β, γ, δ, ε, ζ, η. The 102 is transported to the pre-formed position A and the bonded position B, respectively, and the pre-forming operation and the bonding operation can be performed at each position. Thereby, all the island regions 102 of the lead frames 101 can be adhered to the wafer 3.

然而,如從圖12的η所示之狀態至圖12的θ所示,將引線框架101b的最下游的島狀區102搬運至黏合位置B的情況時,必需以和上述定間隔P不同的間隔P1來傳送引線框架101。在此情況下,即便進行間隔P1的傳送(參考圖12的α),接續的引線框架101c的最下游的島狀區102也可在預形成位置A進行對應,並可進行預形成動作。However, as shown from θ in FIG. 12 to θ in FIG. 12, when the island-shaped region 102 at the most downstream of the lead frame 101b is transported to the bonding position B, it is necessary to be different from the above-described predetermined interval P. The lead frame 101 is transferred at an interval P1. In this case, even if the transfer of the interval P1 is performed (refer to α of FIG. 12), the island-shaped region 102 at the most downstream of the succeeding lead frame 101c can be corresponding to the pre-formed position A, and the pre-forming operation can be performed.

因此,若如圖12所示般設定預形成位置A和黏合位置B,便可藉由將定間隔P1傳送加至定間隔P傳送,且不浪費地進行預形成動作和黏合動作。Therefore, if the pre-formation position A and the bonding position B are set as shown in Fig. 12, the transfer can be performed by adding the fixed interval P1 to the fixed interval P, and the pre-forming operation and the bonding operation can be performed without waste.

但是,依據黏著劑的不同,有一種速乾性黏著劑(速乾性膠),在塗佈黏著劑後直到進行黏合動作,且一但時間流逝,該速乾型黏著劑便會乾燥,有黏著性惡化且無法黏著的情形。However, depending on the adhesive, there is a quick-drying adhesive (quick-drying adhesive) which is applied until the adhesive action is applied after the application of the adhesive, and once the time lapses, the quick-drying adhesive is dry and adhesive. A situation in which it deteriorates and cannot be adhered.

因此,在近年如圖13所示,提案有使預形成位置A接近黏合位置B的技術。在此情況下,必須是黏合位置B固定,並使預形成位置A變動。Therefore, in recent years, as shown in FIG. 13, a technique has been proposed in which the pre-formed position A is brought close to the bonding position B. In this case, it is necessary that the bonding position B is fixed and the pre-formed position A is changed.

亦即,如圖13的α所示,引線框架101a的下游起的第2號的島狀區102達到黏合位置B時,引線框架101a的最上游的島狀區102到達預形成位置A1。繼而,如圖13的β所示,若將引線框架101a的下游起第3個島狀區102搬運至黏合位置B,則引線框架101b的最上游的島狀區102沒有達到預形成位置A1。因此,使預形成位置變動至A2。藉此,在此預形成位置A2上的預形成動作變為可能。That is, as indicated by α in FIG. 13, when the second island-shaped region 102 from the downstream of the lead frame 101a reaches the bonding position B, the most upstream island-like region 102 of the lead frame 101a reaches the pre-formed position A1. Then, as shown by β in FIG. 13, when the third island-like region 102 is transported from the downstream of the lead frame 101a to the bonding position B, the most upstream island-shaped region 102 of the lead frame 101b does not reach the pre-formed position A1. Therefore, the pre-formed position is changed to A2. Thereby, a pre-forming action at this pre-formed position A2 becomes possible.

其後,若能夠以定間隔逐一搬運各引線框架101,當島狀區102已到達黏合位置B時,便能使各島狀區102對應預形成位置A2,並使在預形成位置A2的預形成動作變為可行。亦即,如圖13的γ所示,島狀區102在引線框架101a的最上游到達黏合位置B為止,在此預形成位置A2的預形成動作變為可行。Thereafter, if the lead frames 101 can be transported one by one at regular intervals, when the island regions 102 have reached the bonding position B, the respective island regions 102 can be corresponding to the pre-formed position A2, and the pre-formed position A2 can be pre-formed. The formation action becomes feasible. That is, as indicated by γ in Fig. 13, the island region 102 reaches the bonding position B at the most upstream of the lead frame 101a, and the pre-forming operation of the pre-forming position A2 becomes feasible.

但是,從圖13的γ的狀態至圖13的δ所示,當將下一個1b的引線框架101的最下游的島狀區102搬運至黏合位置B的情況下,傳送間隔變成P1。因此,島狀區102變成沒有對應預形成位置A2,而必須使預形成位置回到A1。藉此,在預形成位置A1的預形成動作變為可行。However, from the state of γ of FIG. 13 to the δ of FIG. 13, when the island area 102 of the most downstream of the lead frame 101 of the next 1b is conveyed to the bonding position B, the transmission interval becomes P1. Therefore, the island region 102 becomes the corresponding pre-formed position A2, and the pre-formed position must be returned to A1. Thereby, the pre-forming action at the pre-formed position A1 becomes feasible.

因此,若能進行上述動作,便如圖13所示,就算使預形成位置A接近黏合位置B,亦能依序進行效率佳的黏合作業。Therefore, if the above operation can be performed, as shown in Fig. 13, even if the pre-formed position A is brought close to the bonding position B, it is possible to sequentially perform an efficient bonding operation.

然而,在預形成位置以及黏合位置,必須進行引線框架101的對準之定位(固定)。作為固定方法,通常是以按壓構件從上方按壓引線框架101的表面,並且從引線框架101的背面進行藉由真空吸附的島狀區吸附固定。However, in the pre-formed position and the bonded position, the alignment (fixing) of the alignment of the lead frame 101 must be performed. As a fixing method, the surface of the lead frame 101 is usually pressed from above by a pressing member, and the island region by vacuum suction is suction-fixed from the back surface of the lead frame 101.

島狀區吸附固定示以吸附機構所構成,該吸附機構則是附加設置於被稱作吸附基座(base)和配適盤(plate)的構件。並且,在配適盤上設有和吸附基座連通的吸附路線,和在上面開口的吸附孔。因此,在配適盤上必須對配合島狀區配置的吸附孔進行加工。The adsorption and fixation of the island region is constituted by an adsorption mechanism which is additionally provided on a member called an adsorption base and a plate. Further, an adsorption path communicating with the adsorption base and an adsorption hole opened at the upper surface are provided on the distribution plate. Therefore, it is necessary to process the adsorption holes arranged in the island area on the matching plate.

在黏合位置是成為如下配置,即吸附孔的X方向位置固 定,而吸附孔的Y方向位置配合引線框架101的島狀區配置。對此,在預形成位置,將黏合位置作為基準,以島狀物間隔(X方向間隔)的整數倍並且在預形成範圍內的位置上,將吸附孔配置於靠近黏合位置的位置。In the bonding position, the configuration is as follows, that is, the position of the adsorption hole in the X direction is solid. The Y-direction position of the adsorption hole is matched with the island-shaped region of the lead frame 101. On the other hand, at the pre-formed position, the adsorption hole is placed at a position close to the bonding position at the position where the bonding position is an integral multiple of the island-shaped space (the X-direction interval) and within the pre-formation range.

但是,若要進行圖13所示的方法,由於黏合位置為固定,黏合動作中雖然能穩定地進行島狀區102的固定,但預形成位置有2處,因此必須使各預形位置配合按壓構件和真空吸附位置。However, in order to carry out the method shown in Fig. 13, since the bonding position is fixed, although the fixing of the island-shaped region 102 can be stably performed in the bonding operation, there are two pre-forming positions, so it is necessary to press the pre-shaped positions together. Component and vacuum adsorption location.

亦即,在預形成位置必須有具有多片(2片)的配適盤,該配適盤對應引線框架101的島狀區位置的吸附孔,且在按壓構件具有2個或1個的情況下,必須具有2個對應預形成位置的形狀的構件。因此,導致構件個數的增加及按壓構件的大型化,使成本增高。That is, it is necessary to have a plurality of (two pieces) matching disks at the pre-formed positions, which correspond to the adsorption holes at the position of the island portion of the lead frame 101, and have two or one pressing members. Next, it is necessary to have two members corresponding to the shape of the pre-formed position. Therefore, an increase in the number of components and an increase in the size of the pressing member increase the cost.

再者,在1片的引線框架上,亦沿著搬運方向以規定間隔而配設塊狀部,在該塊狀部上沿著搬運方向以定間隔形成有多個島狀區。在這樣的情況下,預形成位置更為增加,隨此而必須使按壓構件和真空吸附位置變動,進一步導致構件個數的增加等情況。Further, on one lead frame, a block portion is disposed at a predetermined interval along the conveyance direction, and a plurality of island regions are formed at regular intervals along the conveyance direction. In such a case, the pre-formation position is further increased, and accordingly, it is necessary to change the pressing member and the vacuum suction position, and further increase the number of members.

因此,本發明鑑於該些情況而提供一種基板搬運裝置以及基板搬運方法,即使預形成位置變動,也能使裝置構件個數不增加,且進行穩定的預形成作業以及黏合作業。Therefore, the present invention has been made in view of such circumstances, and provides a substrate transfer device and a substrate transfer method, which can increase the number of device members without increasing the positional variation, and perform stable pre-forming operations and bonding operations.

本發明的基板搬運裝置,將沿著搬運方向以規定間隔形 成有多個島狀區的基板沿著上述搬運方向進行搬運,並在上游測的預形成位置將黏著劑塗佈於上述基板的上述島狀區後,在下游側的黏合位置將晶片黏合至塗佈有上述黏著劑的上述島狀區。上述基板搬運裝置包括:搬運單元,將上述基板沿著上述搬運方向從上游側朝向下游側進行間隔傳送;黏合單元,在塗佈有上述黏著劑的上述島狀區被搬運至上述黏合位置時,將上述晶片黏合至上述島狀區;預形成單元,對應已停止的上述基板的上述島狀區的位置而使上述預形成位置變動,在上述預形成位置塗佈上述黏著劑;以及保持單元,上述保持單元以上述預形成單元塗佈上述黏著劑時,在利用沿著上述搬運方向進行往復運動的基板接受構件而接受上述基板的狀態下保持上述基板。上述基板搬運裝置和上述預形成單元的上述預形成位置的變動進行同步,並使上述保持單元的保持位置變動。The substrate transfer device of the present invention is formed at a predetermined interval along the conveyance direction The substrate having the plurality of island regions is transported along the transport direction, and the adhesive is applied to the island region of the substrate at a pre-formed position measured upstream, and the wafer is bonded to the adhesive position at the downstream side. The above-mentioned island region coated with the above adhesive. The substrate transfer device includes a transport unit that transports the substrate from the upstream side to the downstream side in the transport direction, and the adhesive unit transports the island region to which the adhesive is applied to the bonding position. Bonding the wafer to the island-like region; and forming a pre-formation position corresponding to the position of the island-like region of the stopped substrate, applying the adhesive to the pre-formed position; and holding the unit When the above-described adhesive unit is applied by the pre-forming unit, the holding unit holds the substrate while receiving the substrate by a substrate receiving member that reciprocates along the transport direction. The substrate transfer device and the pre-forming unit change in synchronization with the pre-formation position, and the holding position of the holding unit is changed.

本發明的基板搬運方法,將沿著搬運方向以規定間隔形成有多個島狀區的基板,沿著上述搬運方向從上游側朝向下游側進行間隔傳送,並在上游測的預形成位置於保持上述基板的狀態下將黏著劑塗佈於上述基板的上述島狀區,其後在下游側的黏合位置將晶片黏合至塗佈有上述黏著劑的上述島狀區。上述基板搬運方法能夠進行上述預形成位置的變動,其中上述變動對應已停止的上述基板的上述島狀區的位置,且在上述預形成位置的變動時,使上述預形成位置和上述基板的保持位置進行同步並變動,在上述已變動的上述預形)成位置將上述黏著劑塗佈至上述基板 的上述島狀區。In the substrate transfer method of the present invention, the substrate in which the plurality of island regions are formed at predetermined intervals along the conveyance direction is transported from the upstream side toward the downstream side along the conveyance direction, and the pre-formed position measured upstream is maintained. In the state of the substrate, an adhesive is applied to the island-like region of the substrate, and then the wafer is bonded to the island-shaped region coated with the adhesive at a bonding position on the downstream side. The substrate transfer method is capable of performing the fluctuation of the pre-formation position, wherein the fluctuation corresponds to a position of the island region of the substrate that has been stopped, and the pre-formation position and the substrate are maintained during a change in the pre-formation position. The position is synchronized and varied, and the adhesive is applied to the substrate at the changed pre-formed position The above island area.

根據本發明,在基板的傳送方法上,即使混合基本傳送和與此基本傳送不同的傳送,仍可固定黏合位置,藉由使預形成位置變動而能夠在各預形成位置進行預形成動作。因此,能夠使黏合位置接近預形成位置。並且,由於能夠和預形成單元的預形成位置的變動進行同步,而使保持單元的保持位置變動,使得在各預形成位置的預形成動作穩定。According to the present invention, in the method of transporting the substrate, even if the basic transfer and the transfer different from the basic transfer are performed, the bonding position can be fixed, and the pre-forming operation can be performed at each pre-formed position by changing the pre-formed position. Therefore, the bonding position can be brought close to the pre-formed position. Further, since the holding position of the holding unit can be changed in synchronization with the fluctuation of the pre-formed position of the pre-formed unit, the pre-forming operation at each pre-formed position is stabilized.

上述基板搬運裝置可在上述基板接受構件設置有吸附機構,上述吸附機構具有將上述基板從背面側進行吸附的吸附孔,並以上述吸附機構構成上述保持單元,亦可包括按壓件,所述按壓件從上方按壓由上述基板接受構件所接受的上述基板,並且以上述按壓件構成上述保持單元。此外,亦可藉由上述吸附機構和上述按壓件構成上述保持單元。亦即,包括上述按壓件的基板搬運裝置能夠和上述預形成位置的變動進行同步,而使始上述按壓件變動,並在預形成動作時能夠以最佳位置按壓上述基板。In the substrate transfer device, an adsorption mechanism may be provided in the substrate receiving member, and the adsorption mechanism may have an adsorption hole for adsorbing the substrate from the back side, and the holding unit may be configured by the adsorption mechanism, and may include a pressing member. The substrate is pressed from above by the substrate received by the substrate receiving member, and the holding member is configured by the pressing member. Further, the holding unit may be configured by the suction mechanism and the pressing member. In other words, the substrate transfer device including the pusher can synchronize the change of the pre-formed position to change the pusher, and can press the substrate at an optimum position during the pre-forming operation.

又,上述基板具有島狀區形成塊狀部,上述島狀區形成塊狀部在搬運方向和與搬運方向垂直的方向各自以規定間隔形成有多個島狀區,並且,上述島狀區形成塊狀部可沿著搬運方向配設有多個。Further, the substrate has an island-like region forming a block portion, and the island-shaped region forming block portion is formed with a plurality of island-shaped regions at predetermined intervals in a conveyance direction and a direction perpendicular to the conveyance direction, and the island-like region is formed. The block portion may be provided in plurality along the conveying direction.

上述預形成單元可包括:第1預形成單元,在下游側的上述預形成位置塗佈上述黏著劑;以及第2預形成單元,在較上述第1預形成單元的預形成位置更上游側的預形成位置塗佈上述 黏著劑。此時,其中一個預形成單元在上述基板的寬度方向的後方側進行對上述島狀區的上述黏著劑的塗佈,另一個預形成單元則在上述基板的寬度方向的前方側進行對上述島狀區的上述黏著劑的塗佈。The pre-forming unit may include: a first pre-forming unit that applies the adhesive to the pre-formed position on the downstream side; and a second pre-forming unit that is further upstream than a pre-formed position of the first pre-forming unit Preformed position coating Adhesive. At this time, one of the pre-forming units applies the above-described adhesive to the island-shaped region on the rear side in the width direction of the substrate, and the other pre-forming unit performs the above-mentioned island on the front side in the width direction of the substrate. Coating of the above adhesive in the region.

本發明在預形成步驟能夠使用速乾性的黏著劑,並且不需實現整體作業步驟的速度提升(speed up),而能實現產量的改進。並且,即使預形成位置變動,在各預形成位置的預形成動作也能穩定,且能夠避免從島狀區的黏著劑突出及黏著劑的塗佈不足等,並使其後的黏合步驟穩定,高精度的黏合作業變為可能。The present invention enables the use of a quick-drying adhesive in the pre-forming step, and does not require a speed up of the overall working step, and an improvement in throughput can be achieved. Further, even if the pre-formation position is changed, the pre-forming operation at each pre-formation position can be stabilized, and the adhesion of the adhesive from the island-shaped region and the insufficient application of the adhesive can be avoided, and the subsequent bonding step can be stabilized. High-precision bonding industry has become possible.

此外,由於能夠和預形成單元的預形成位置的變動進行同步而使保持單元的保持位置變動,故能使基本的間隔傳送和與此基本的間隔傳送不同的間隔傳送(例如,基板間傳送及在基板內的塊狀部間傳送等)進行混合,並能使讓黏合動作待機等的黏合損失不要產生。Further, since the holding position of the holding unit can be changed in synchronization with the fluctuation of the pre-formed position of the pre-formed unit, the basic interval transfer can be performed at a different interval from the basic interval transfer (for example, transfer between substrates and The mixing is carried out between the block portions in the substrate, and the bonding loss such as waiting for the bonding operation is not caused.

作為保持單元,藉由包括從上方按壓由基板接受構件所接受的基板之按壓件,在預形成時能將塗佈黏著劑的島狀區穩定維持於規定位置,並能使預形成作業穩定。特別是,在由吸附機構構成保持單元的情況下,作為基板接受構件的吸附孔,可為和基板搬運方向(X方向)垂直的方向(Y方向)的島狀區配置配合的1列,且孔尺寸也可為固定。因此,即使基本的間隔傳送和與此基本的間隔傳送不同的間隔傳送(例如,基板間傳送及在基 板內的塊狀部間傳送等)混合,基板接受構件的共用亦為可能。因此,能夠不需要多個種類對應零件,並能實現低成本。(對此,吸附孔位置無法變動者,必須沿著X方向配置吸附孔,因此吸附路線複雜化,種類對應零件亦增加。)As the holding means, by pressing the pressing member of the substrate received by the substrate receiving member from above, the island region to which the adhesive is applied can be stably maintained at a predetermined position during pre-forming, and the pre-forming operation can be stabilized. In particular, when the holding unit is constituted by the suction mechanism, the adsorption hole serving as the substrate receiving member may be arranged in a row in an island shape in a direction (Y direction) perpendicular to the substrate conveyance direction (X direction), and The hole size can also be fixed. Therefore, even basic interval transfers and transmissions at different intervals from this basic interval transfer (eg, inter-substrate transfer and on-base) It is also possible to mix the substrate receiving members by mixing between the block portions in the plate. Therefore, it is possible to eliminate a plurality of types of corresponding parts and achieve low cost. (In this case, if the position of the adsorption hole cannot be changed, the adsorption hole must be arranged along the X direction, so the adsorption route is complicated, and the type corresponding parts are also increased.)

以按壓件構成保持單元的情況下,由於搬運方向(X方向)可行,故能夠藉由將按壓件的基板按壓部調整至和搬運方向垂直的方向(Y方向),變為不需備齊各種類的按壓件,且不需多個種類對應零件,而可實現低成本。如此,藉由包括從基板的背面側進行吸附的吸附機構及從上方按壓由基板接受構件所接受的基板之按壓件,而能實現種類切換成本的減少。When the holding unit is configured by the pressing member, since the conveying direction (X direction) is possible, it is possible to adjust the substrate pressing portion of the pressing member to a direction (Y direction) perpendicular to the conveying direction, so that it is not necessary to prepare each. A variety of pressing members and a plurality of types of corresponding parts are not required, and low cost can be achieved. As described above, it is possible to reduce the type switching cost by including the suction mechanism that adsorbs from the back side of the substrate and the pressing member that presses the substrate received by the substrate receiving member from above.

作為基板,多個島狀區形成塊狀部可沿著搬運方向而被配設,多個島狀區形成塊狀部間的間隔亦可具有不同間隔,而能對應多種類型的基板,作為裝置的泛用性優異。As the substrate, the plurality of island-shaped regions forming the block portions may be disposed along the transport direction, and the plurality of island-shaped regions may have different intervals between the block-like portions, and may correspond to a plurality of types of substrates as devices. Excellent versatility.

藉由包括第1預形成單元和第2預形成單元,能實現對1片基板的預形成作業的高效率化。此外,藉由將預形成單元分為基板寬度方向的前方側和基板寬度方向的後方側更能實現作業效率的改進。By including the first pre-forming unit and the second pre-forming unit, it is possible to increase the efficiency of the pre-forming operation of one substrate. Further, the work efficiency can be improved by dividing the pre-formed unit into the front side in the substrate width direction and the rear side in the substrate width direction.

1、1a、1b、101、101a、101b、101c‧‧‧引線框架(基板)1, 1a, 1b, 101, 101a, 101b, 101c‧‧‧ lead frame (substrate)

2、102‧‧‧島狀區2. 102‧‧‧ islands

3‧‧‧晶片3‧‧‧ wafer

4、104‧‧‧黏著劑4, 104‧‧‧Adhesive

10‧‧‧搬運單元10‧‧‧Transportation unit

11‧‧‧控制單元11‧‧‧Control unit

12‧‧‧預形成單元12‧‧‧Preformed unit

12A‧‧‧第1預形成單元12A‧‧‧1st pre-formed unit

12B‧‧‧第2預形成單元12B‧‧‧2nd pre-formed unit

13‧‧‧黏合單元13‧‧‧bonding unit

14‧‧‧保持單元14‧‧‧Holding unit

15‧‧‧設定單元15‧‧‧Setting unit

20‧‧‧噴嘴2020‧‧‧Nozzle 20

21‧‧‧汽缸21‧‧‧ cylinder

22、22a、22b、22c‧‧‧XYZ平台22, 22a, 22b, 22c‧‧‧XYZ platform

23‧‧‧相機23‧‧‧ camera

25‧‧‧供給部25‧‧‧Supply Department

26‧‧‧夾頭26‧‧‧ chuck

27‧‧‧半導體晶圓27‧‧‧Semiconductor wafer

30‧‧‧基板接受構件30‧‧‧Substrate receiving member

31‧‧‧吸附基座31‧‧‧Adsorption base

32‧‧‧配適盤32‧‧‧ Matching

33‧‧‧吸附孔33‧‧‧Adsorption holes

34‧‧‧吸附機構34‧‧‧Adsorption mechanism

35‧‧‧導軌35‧‧‧rails

36‧‧‧滑軌36‧‧‧Slide rails

40、60‧‧‧按壓件40, 60‧‧‧ Pressing parts

41、61‧‧‧按壓桿41, 61‧‧‧ Pressing rod

41a、61a‧‧‧按壓桿的本體部41a, 61a‧‧‧ body of the pressing rod

42、62‧‧‧驅動機構42, 62‧‧‧ drive mechanism

51、51A、51B、51C、51D‧‧‧島狀區形成塊狀部51, 51A, 51B, 51C, 51D‧‧‧ islands form a block

55‧‧‧第1區域55‧‧‧1st area

56‧‧‧第2區域56‧‧‧2nd area

103‧‧‧晶粒103‧‧‧ grain

A、A1、A2‧‧‧預形成位置A, A1, A2‧‧‧ pre-formed position

B‧‧‧黏合位置B‧‧‧bonding position

S‧‧‧間隙S‧‧‧ gap

H、I、J、P、P1‧‧‧間隔H, I, J, P, P1‧‧

W‧‧‧搬運路徑W‧‧‧Transportation path

X1、X2、Y1、Y2、Y3、Y4、Z1、Z2、Z3、Z4‧‧‧方向X1, X2, Y1, Y2, Y3, Y4, Z1, Z2, Z3, Z4‧‧‧ direction

α、β、γ、δ、ε、ζ、η、θ‧‧‧狀態α, β, γ, δ, ε, ζ, η, θ‧‧‧ states

圖1是本發明實施型態的基板搬運裝置的構成方塊圖。Fig. 1 is a block diagram showing the configuration of a substrate transfer device according to an embodiment of the present invention.

圖2是上述圖1的基板搬運裝置的主要部分斜視圖。Fig. 2 is a perspective view showing a main part of the substrate transfer device of Fig. 1;

圖3是上述圖1的基板搬運裝置的基板接受構件的平面圖。Fig. 3 is a plan view showing a substrate receiving member of the substrate transfer device of Fig. 1;

圖4是上述圖1的基板搬運裝置的基板接受構件的正面圖。Fig. 4 is a front elevational view showing the substrate receiving member of the substrate transfer device of Fig. 1;

圖5是表示上述圖1的基板搬運裝置的預形成單元的簡略圖。Fig. 5 is a schematic view showing a pre-forming unit of the substrate transfer device of Fig. 1;

圖6是表示上述圖1的基板搬運裝置的黏合單元的點略圖。Fig. 6 is a schematic sectional view showing a bonding unit of the substrate transfer device of Fig. 1;

圖7是以上述圖6的黏合單元而黏合之晶片的斜視圖。Figure 7 is a perspective view of the wafer bonded by the bonding unit of Figure 6 above.

圖8是基板的引線框架的平面圖。Figure 8 is a plan view of a lead frame of a substrate.

圖9是表示本發明的實施型態的基板搬運方法的簡略步驟圖。Fig. 9 is a schematic view showing a step of transporting a substrate according to an embodiment of the present invention.

圖10是本發明的實施型態的基板搬運裝置的主要部分簡略圖。Fig. 10 is a schematic cross-sectional view showing a main part of a substrate transfer device according to an embodiment of the present invention.

圖11是表示於習知的基板搬運方法的引線框架和預形成位置的關係的簡略圖。Fig. 11 is a schematic view showing the relationship between a lead frame and a pre-formed position in a conventional substrate transfer method.

圖12是表示習知的基板搬運方法的簡略步驟圖。Fig. 12 is a schematic view showing a conventional substrate transport method.

圖13是表示其他的習知基板搬運方法的簡略步驟圖。Fig. 13 is a schematic view showing a conventional method of transporting a conventional substrate.

以下對本發明的實施型態基於圖1~圖10進行說明。Hereinafter, embodiments of the present invention will be described based on Figs. 1 to 10 .

圖1表示本發明的基板搬運裝置的簡略方塊圖。此基板搬運裝置沒有作為半導體製造設備的晶粒黏合機的主要部分,是用以將半導體晶片等的晶片(晶粒)3(參閱圖6以及圖7)黏合於引線框架等的基板1(參閱圖2等)。引線框架是作為半導體封裝體(package)的內部線路而使用的薄板金屬。因此,在本發明 的基板1一般而言稱作引線框架,以及作為包含配置有各種電子零件等的基板(例如,印刷電路基板)。Fig. 1 is a schematic block diagram showing a substrate transfer device of the present invention. This substrate transfer device is not a main part of a die bonder as a semiconductor manufacturing facility, and is a substrate 1 for bonding a wafer (die) 3 such as a semiconductor wafer (see FIGS. 6 and 7) to a lead frame or the like (see Figure 2, etc.). The lead frame is a thin plate metal used as an internal wiring of a semiconductor package. Therefore, in the present invention The substrate 1 is generally referred to as a lead frame, and is a substrate (for example, a printed circuit board) including various electronic components and the like.

此基板搬運裝置如圖9所示,將沿著長邊方向以規定間隔形成有多個島狀區2的基板1,沿著該長邊方向依序搬運多片,在上游側的預形成位置A(A1、A2),將黏著劑4塗佈於基板1的島狀區2之後,在下游側的黏合位置B將晶片3黏合於上述基板的島狀區2。As shown in FIG. 9, the substrate transfer apparatus has a plurality of sheets 1 formed in a plurality of island-like regions 2 at predetermined intervals along the longitudinal direction, and sequentially transports a plurality of sheets along the longitudinal direction, and a pre-formed position on the upstream side. A (A1, A2), after the adhesive 4 is applied to the island region 2 of the substrate 1, the wafer 3 is bonded to the island region 2 of the substrate at the bonding position B on the downstream side.

如圖1所示,基板搬運裝置包括搬運多片基板1的搬運單元、控制上述搬運單元10的控制單元11、預形成單元12、以及黏合單元13。As shown in FIG. 1, the substrate transfer device includes a transport unit that transports a plurality of substrates 1, a control unit 11 that controls the transport unit 10, a pre-form unit 12, and a bonding unit 13.

搬運單元10,例如,包括夾持基板1的夾持(clamp)機構、以及使該夾持機構的夾持部從上游動朝向下游側移動的驅動機構。驅動機構例如可使用伺服馬達(servomotor),並可藉由控制單元11的控制,將基板1以任意的間隔(已設定的間隔)傳送至下游側。亦即,能夠將基板1的島狀區2依序傳送至預形成位置A(A1、A2)和黏合位置B。The transport unit 10 includes, for example, a clamp mechanism that sandwiches the substrate 1 and a drive mechanism that moves the clamp portion of the clamp mechanism from the upstream side toward the downstream side. The drive mechanism can use, for example, a servomotor, and the substrate 1 can be transported to the downstream side at an arbitrary interval (set interval) by the control of the control unit 11. That is, the island regions 2 of the substrate 1 can be sequentially transferred to the pre-formed positions A (A1, A2) and the bonding position B.

作為搬運單元10,可包括驅動輪、從動輪、包括繞於該驅動輪和從動輪的皮帶之皮帶進料機(belt feeder)、以及用以驅動該進料機的驅動機構。於此情況下,若基板1被供給至進料機,則基板1會藉由定位單元(例如,嵌合於形成於基板的貫孔之銷(pin)等)在已定位的狀態下被配置於進料機上。作為驅動機構,例如可使用伺服馬達等,藉由控制單元11的控制,使進料機的驅 動輪驅動至已設定的任意轉動角度,並可以任意的間隔(已設定的間隔)將基板1傳送至下游側。又,使用進料機的情況下,亦可是皮帶進料機以外的進料機。亦即,能夠以島狀區2的配設間隔、塊狀部51(參閱圖8)間的配設間隔、以及基板1間的配設間隔來搬運便可。As the handling unit 10, a driving wheel, a driven wheel, a belt feeder including a belt wound around the driving wheel and the driven wheel, and a driving mechanism for driving the feeder may be included. In this case, if the substrate 1 is supplied to the feeder, the substrate 1 is configured in a positioned state by a positioning unit (for example, a pin fitted to a through hole formed in the substrate). On the feeder. As the drive mechanism, for example, a servo motor or the like can be used, and the drive of the feeder is controlled by the control of the control unit 11. The moving wheel is driven to an arbitrary rotation angle that has been set, and the substrate 1 can be conveyed to the downstream side at an arbitrary interval (set interval). Further, in the case of using a feeder, it may be a feeder other than the belt feeder. In other words, the arrangement of the island-like regions 2, the arrangement interval between the block portions 51 (see FIG. 8), and the arrangement interval between the substrates 1 can be carried.

控制單元11例如是以中央處理器(Central Processing Unit,CPU)為中心,經由唯讀記憶體(Read Only Memory)及隨機存取記憶體(Random Access Memory,RAM)等匯流排(bus)而互相連接的微電腦(micro computer)。控制單元11裝設有作為記憶單元的記憶裝置。記憶裝置包含硬碟機(Hard Disk Drive,HDD)、數位多功能光碟(Digital Versatile Disk,DVD)機、可錄式光碟(Computer Disk-Recordable,CD-R)機、電子可抹除及可程式規劃唯讀記憶體(Electronically Erasable and Programmable Read Only Memory,EEPROM)等。又,ROM儲存有CPU執行的程式及資料。The control unit 11 is, for example, a central processing unit (CPU), and is connected to each other via a bus such as a read only memory (Random Access Memory) or a random access memory (RAM). Connected to a micro computer. The control unit 11 is provided with a memory device as a memory unit. The memory device includes a Hard Disk Drive (HDD), a Digital Versatile Disk (DVD) machine, a Computer Disk-Recordable (CD-R) machine, an electronic erasable and a programmable device. Electrically Erasable and Programmable Read Only Memory (EEPROM). Also, the ROM stores programs and data executed by the CPU.

在預形成位置A(A1、A2),執行有將黏著劑4塗佈於基板1的島狀區2的預形成步驟(配料(dispense)步驟)。因此,預形成單元12如圖5所示,例如包括黏著劑塗佈用的汽缸(cylinder)21和XYZ平台(stage)22,其中上述汽缸21具有排出黏著劑4(參閱圖6)的噴嘴20,上述XYZ平台22使該汽缸21在X軸方向(如圖2所示的箭頭X1、X2方向)、Y軸方向(如圖2所示的箭頭Y1、Y2方向)和Z軸方向(上下方向)上進行 驅動。亦即,XYZ平台22包括驅動X軸方向的X平台22a、驅動Y軸方向的Y平台22b以及驅動Z軸方向的Z平台22C。At the pre-formed position A (A1, A2), a pre-forming step (dispense step) of applying the adhesive 4 to the island-like region 2 of the substrate 1 is performed. Therefore, as shown in FIG. 5, the pre-forming unit 12 includes, for example, a cylinder 21 for applying an adhesive and an XYZ stage 22, wherein the cylinder 21 has a nozzle 20 for discharging the adhesive 4 (see FIG. 6). The XYZ stage 22 has the cylinder 21 in the X-axis direction (the directions of the arrows X1 and X2 shown in FIG. 2), the Y-axis direction (the directions of the arrows Y1 and Y2 shown in FIG. 2), and the Z-axis direction (up and down direction). )Carried on drive. That is, the XYZ stage 22 includes an X stage 22a that drives the X-axis direction, a Y stage 22b that drives the Y-axis direction, and a Z stage 22C that drives the Z-axis direction.

因此,汽缸21之沿著X軸方向的移動、沿著Y軸方向的移動以及沿著Z軸方向的移動是可能的。藉此,預形成時噴嘴20對應島狀區2的位置,並在排出量(塗佈量)從該噴嘴20被控制的狀態下,黏著劑4排出至島狀區2。又,在XYZ平台22裝設有島狀區2的檢測用的相機23。Therefore, the movement of the cylinder 21 in the X-axis direction, the movement in the Y-axis direction, and the movement in the Z-axis direction are possible. Thereby, the nozzle 20 corresponds to the position of the island-like region 2 at the time of pre-forming, and the adhesive 4 is discharged to the island-like region 2 in a state where the discharge amount (coating amount) is controlled from the nozzle 20. Further, a camera 23 for detecting the island region 2 is mounted on the XYZ stage 22.

此外,在黏合位置B將晶片(晶粒)3搬運至塗佈有黏著劑4的島狀區2,並進行配置於該黏著劑4的黏合。因此,黏合裝置包括具有吸附供給部25的晶片3的夾頭26之黏合臂(bonding arm)(圖示省略)、對供給部25的晶片3進行觀察的確認用相機(圖示省略)以及對在黏合位置的引線框架(基板)1的島狀區2進行觀察的確認用相機(圖示省略)。Further, at the bonding position B, the wafer (die) 3 is transported to the island region 2 to which the adhesive 4 is applied, and is bonded to the adhesive 4. Therefore, the bonding apparatus includes a bonding arm (not shown) having the chuck 26 of the wafer 3 for adsorbing the supply unit 25, a camera for confirming the wafer 3 of the supply unit 25 (not shown), and A camera (not shown) for confirming the observation of the island region 2 of the lead frame (substrate) 1 at the bonding position.

供給部25包括半導體晶圓27(參閱圖7),而半導體晶圓27被分割為多個晶片3。亦即,晶圓27被貼於黏著膠片(切割膠片(dicing sheet)),此切割膠片則保持於環狀的框架(frame)上。而且,對該切割膠片上的晶圓27使用圓形刀刃(切割機(dicing saw))等進行單體化(singulation)而形成晶片3。再者,保持著夾頭26的黏合臂經由搬運單元而使夾取(pick-up)位置和黏合位置之間的移動變為可能。The supply unit 25 includes a semiconductor wafer 27 (see FIG. 7), and the semiconductor wafer 27 is divided into a plurality of wafers 3. That is, the wafer 27 is attached to an adhesive film (dicing sheet) which is held on an annular frame. Further, the wafer 27 on the cut film is singulated using a circular blade (dicing saw) or the like to form the wafer 3. Further, it is possible to maintain the movement between the pick-up position and the bonding position by the bonding arm holding the chuck 26 via the carrying unit.

此外,該夾頭26經由於其下端面開口的吸附孔使晶片3被真空吸附,並於該夾頭26的下端面吸附晶片3。又,該真空吸 附(吸真空)若被解除,則晶片3自夾頭26鬆開。Further, the chuck 26 vacuum-adsorbs the wafer 3 via an adsorption hole opened at the lower end surface thereof, and adsorbs the wafer 3 on the lower end surface of the chuck 26. Again, the vacuum suction When the attachment (vacuum suction) is released, the wafer 3 is released from the chuck 26.

接著對使用此黏合裝置的黏合方法進行說明。首先,以配置於供給部25上方的確認用相機對應該夾取的晶片3進行觀察,並使夾頭26定位於該應該夾取的晶片3之上方後,如箭頭Z1使夾頭26下降並夾取該晶片3。其後,如箭頭Z2使夾頭26上升。Next, the bonding method using this bonding apparatus will be described. First, the wafer 3 to be gripped is observed by the confirmation camera disposed above the supply unit 25, and after the chuck 26 is positioned above the wafer 3 to be gripped, the chuck 26 is lowered by the arrow Z1. The wafer 3 is taken up. Thereafter, the chuck 26 is raised as indicated by the arrow Z2.

接著,以配置於黏合位置上方的確認用相機對應該黏合的引線框架1的島狀區2進行觀察,並使夾頭26往箭頭Y3方向移動,並定位於該島狀區2上方後,使夾頭26如箭頭Z3下降移動,而將晶片3供給至該島狀區2。此外,將晶片3供給至島狀區2之後,使夾頭26如箭頭Z4上升後,如箭頭Y4回到夾取位置上方的待機位置。Next, the island region 2 of the lead frame 1 to be bonded is observed by the confirmation camera disposed above the bonding position, and the chuck 26 is moved in the direction of the arrow Y3 and positioned above the island region 2, thereby The chuck 26 is moved downward by the arrow Z3, and the wafer 3 is supplied to the island region 2. Further, after the wafer 3 is supplied to the island region 2, the chuck 26 is raised by the arrow Z4, and the arrow Y4 is returned to the standby position above the gripping position.

亦即,藉由使夾頭26依序如箭頭Z1、Z2、Y3、Z3、Z4、Y4移動,將基於夾取確認用相機的觀察而被定位的晶片3以夾頭26夾取,並將該晶片3安裝於島狀區2。That is, by moving the chuck 26 in order as the arrows Z1, Z2, Y3, Z3, Z4, Y4 are moved, the wafer 3 positioned based on the observation by the gripping confirmation camera is gripped by the chuck 26, and The wafer 3 is mounted on the island region 2.

此外,保持著多個晶片3的框架,例如藉由保持於XY桌等並使該桌移動,而使應該夾取的晶片3定位於夾取位置。Further, the frame of the plurality of wafers 3 is held, for example, by holding the XY table or the like and moving the table, so that the wafer 3 to be gripped is positioned at the gripping position.

在該裝置上,如圖9所示,預形成位置A變動至A1的位置或A2的位置,而黏合位置B則不變動且被固定。In this apparatus, as shown in FIG. 9, the pre-formed position A is changed to the position of A1 or the position of A2, and the adhesive position B does not change and is fixed.

因此,該基板搬運裝置如圖3及圖4所示,包括基板接受構件30,該基板接受構件30在基板1的搬運路徑W之黏合位置B的上游側旁邊接收基板1並沿著搬運方向進行滑動。基板接 受構件30具有吸附基座31、固定於該吸附基座31的配適盤(adapter plate)32,並在配適盤32的上面開設有吸附孔33。亦即,在該基板接受構件30上裝設有具有吸附孔33的吸附機構34。As shown in FIGS. 3 and 4, the substrate transfer device includes a substrate receiving member 30 that receives the substrate 1 along the upstream side of the bonding position B of the conveyance path W of the substrate 1 and proceeds along the conveyance direction. slide. Substrate connection The receiving member 30 has an adsorption base 31, an adapter plate 32 fixed to the adsorption base 31, and an adsorption hole 33 is formed in the upper surface of the distribution plate 32. That is, the substrate receiving member 30 is provided with an adsorption mechanism 34 having an adsorption hole 33.

吸附基座31設有吸附配管連接口和吸附通路,配適盤32則設有被吸附基座31的吸附通路連通的吸附通路、和對應引線框架1的島狀區2的Y軸方向配置的上述吸附孔33。在此情況下,搬運通路W向X軸方向延伸配置有一對平行的導軌(guide rail)35、35,導軌35、35上經由滑軌36、36配置有基板接受構件30。由於滑軌36、36沿著導軌35、35在X軸方向上進行往復運動,因此基板接受構件30可在X軸方向上進行往復運動。滑軌36、36藉由圖示省略的驅動單元在X軸方向上進行往復運動。又,例如可由驅動用馬達和將該驅動用馬達的驅動力傳動至滑軌36、36的連動機構等構成為驅動單元。此外,可由皮帶機構等構成為連動機構。The adsorption base 31 is provided with an adsorption pipe connection port and an adsorption passage, and the distribution plate 32 is provided with an adsorption passage that is communicated by the adsorption passage of the adsorption base 31, and is disposed in the Y-axis direction of the island-like region 2 corresponding to the lead frame 1. The adsorption hole 33 described above. In this case, the conveyance path W is provided with a pair of parallel guide rails 35 and 35 extending in the X-axis direction, and the substrate receiving members 30 are disposed on the guide rails 35 and 35 via the slide rails 36 and 36. Since the slide rails 36, 36 reciprocate in the X-axis direction along the guide rails 35, 35, the substrate receiving member 30 can reciprocate in the X-axis direction. The slide rails 36, 36 are reciprocated in the X-axis direction by a drive unit omitted from illustration. Further, for example, a drive motor and an interlocking mechanism that transmits the driving force of the drive motor to the slide rails 36 and 36 may be configured as a drive unit. Further, it may be constituted by a belt mechanism or the like as a linkage mechanism.

而且,在吸附基座31的吸附配管連接口上連接有圖示省略的真空源。因此,藉由真空源進行驅動,或者經由吸附基座31的吸附通路和配適盤32的吸附通路,使從配適盤32的吸附孔33的真空吸附被進行。Further, a vacuum source (not shown) is connected to the adsorption pipe connection port of the adsorption susceptor 31. Therefore, vacuum suction from the adsorption holes 33 of the distribution tray 32 is performed by driving by a vacuum source or via the adsorption passage of the adsorption base 31 and the adsorption passage of the accommodation tray 32.

此外,在該基板接受構件30裝設有如圖2所示的按壓件40。按壓件40包括按壓桿(bar)41和使該按壓桿41上下動作的驅動機構42。按壓桿41包含往垂直於搬運路徑W的搬運方向延伸的本體部41a、和從該本體部41a往X1方向或者X2方向延伸 的多根腳部(圖示省略)。因此,藉由使定位於基板1的上方之按壓桿41經由驅動機構42下降,藉由圖示省略的腳部而可按壓基板1。在此情況下,腳部配置於沿著Y軸方向被配設的島狀區之間,而不會成為對黏著劑4的塗佈作業之妨礙。又,可由汽缸機構、滾珠螺帽(ball nut)機構及線性導軌(linear guide)機構等往復運動機構而構成為驅動機構42。Further, a pressing member 40 as shown in FIG. 2 is attached to the substrate receiving member 30. The pressing member 40 includes a pressing lever 41 and a driving mechanism 42 that moves the pressing lever 41 up and down. The pressing lever 41 includes a main body portion 41a extending in a conveying direction perpendicular to the conveying path W, and extending from the main body portion 41a in the X1 direction or the X2 direction. Multiple feet (illustrated omitted). Therefore, the pressing lever 41 positioned above the substrate 1 is lowered by the driving mechanism 42, and the substrate 1 can be pressed by the leg portion (not shown). In this case, the leg portion is disposed between the island regions disposed along the Y-axis direction, and does not interfere with the application work of the adhesive 4. Further, the drive mechanism 42 may be configured by a reciprocating mechanism such as a cylinder mechanism, a ball nut mechanism, or a linear guide mechanism.

此外,即使在黏合位置,亦如圖2所示配置有按壓件60和吸附機構(圖示省略)。按壓件60包括按壓桿61、和使該按壓桿61上下動作的驅動機構62。亦可由汽缸機構、滾珠螺帽機構及線性導軌機構等往復運動機構而構成為驅動機構42。在此情況下,並無必要使按壓桿61以及依附機構的吸附孔之X方向位置進行變動。Further, even in the bonding position, as shown in FIG. 2, the pressing member 60 and the suction mechanism (not shown) are disposed. The pusher 60 includes a pressing lever 61 and a drive mechanism 62 that moves the pressing lever 61 up and down. The drive mechanism 42 may be configured by a reciprocating mechanism such as a cylinder mechanism, a ball nut mechanism, and a linear guide mechanism. In this case, it is not necessary to change the position of the pressing hole 61 and the suction hole of the attachment mechanism in the X direction.

亦即,在黏合位置,從被黏合的島狀區2的下方被吸附,或者將該島狀區2的旁邊以按壓件60的可上下動作的按壓桿61從上方進行按壓。即使在該按壓桿61亦包含按壓桿本體61a、和從該本體部6la往X1方向或者X2方向延伸的多根腳部(圖示省略),而該腳部對基板1進行按壓。That is, at the bonding position, it is adsorbed from below the bonded island-like region 2, or the side of the island-like region 2 is pressed upward by the pressing lever 61 of the pusher 60 that can move up and down. The pressing lever 61 includes a pressing lever main body 61a and a plurality of leg portions (not shown) extending from the main body portion 161a in the X1 direction or the X2 direction, and the leg portions press the substrate 1.

此外,在該裝置上進行預形成步驟和黏合步驟的基板1,例如是如圖8所示的引線框架。在此情況下的引線框架1具有島狀區形成塊狀部51,該島狀區形成塊狀部51上形成有多個島狀區2,且島狀區形成塊狀部51沿著搬運方向配設有多個(在此情況是4個)。Further, the substrate 1 on which the pre-forming step and the bonding step are performed, for example, is a lead frame as shown in FIG. The lead frame 1 in this case has an island-like region forming a block portion 51 which is formed with a plurality of island-like regions 2 formed on the block portion 51, and the island-like region forms the block portion 51 along the conveying direction There are multiple (four in this case).

在各島狀區形成塊狀部51上沿著X軸方向以及Y軸方向各自以規定間隔配置有多個島狀區2。此外,最下游的島狀區形成塊狀部51A的最上游列之島狀區2跟與此島狀區形成塊狀部51A相鄰的島狀區形成塊狀部51B的最下游列之島狀區2之間的間隔H,和島狀區形成塊狀部51B的最上游列之島狀區2跟與此島狀區形成塊狀部51B相鄰的島狀區形成塊狀部51C的最下游列之島狀區2之間的間隔I並不相同。此外,島狀區形成塊狀部51C的最上游列之島狀區2跟與此島狀區形成塊狀部51C相鄰的島狀區形成塊狀部51D的最下游列之島狀區2間的間隔,和島狀區形成塊狀部51A跟島狀區形成塊狀部51B的間隔H是為一致。A plurality of island-like regions 2 are arranged at predetermined intervals in the X-axis direction and the Y-axis direction on each of the island-like region forming block portions 51. Further, the most downstream island-like region forms the island portion 2 of the most upstream row of the block portion 51A and the island portion adjacent to the island-like region forming block portion 51A forms the island of the most downstream column of the block portion 51B. The interval H between the regions 2, and the island-like region 2 in which the island-shaped region forms the most upstream column of the block portion 51B and the island-like region adjacent to the island-like region forming the block portion 51B form the block portion 51C The interval I between the island regions 2 of the most downstream columns is not the same. Further, the island-like region 2 in which the island-like region forms the most upstream row of the block portion 51C and the island-like region adjacent to the island-like region forming the block portion 51C form the island-like region 2 of the most downstream row of the block portion 51D The interval between the partitions and the island-like region forming block portion 51A and the island-like region forming block portion 51B is identical.

此外,這樣的引線框架1連續從上游側向下游側被搬運多片。因此,下游側的引線框架1a和上游側的引線框架1b設有規定尺寸的間隙S。亦即,下游側的引線框架1a的最上游的島狀區形成塊狀部51D的最上游列之島狀區2跟上游側的引線框架1b的最下游的島狀區形成塊狀部51A的最下游列之島狀區2之間形成有間隔J。在此情況的間隔J與上述間隔H及間隔I並不相同。Further, such a lead frame 1 is continuously conveyed a plurality of pieces from the upstream side to the downstream side. Therefore, the lead frame 1a on the downstream side and the lead frame 1b on the upstream side are provided with a gap S of a predetermined size. That is, the island portion 2 of the most upstream column forming the block portion 51D on the upstream side of the lead frame 1a on the downstream side forms the block portion 51A with the island portion 2 on the most downstream side of the lead frame 1b on the upstream side. A space J is formed between the island regions 2 of the most downstream columns. The interval J in this case is not the same as the above-described interval H and interval I.

接著,對如上所述而構成的基板搬運裝置的基板搬運方法使用圖9等進行說明。在此情況下,為說明基本動作,基板1上的島狀區2僅沿著其搬運方向以等間隔P配設有7個,並將下游側的基板1a的最上游側的島狀區2跟上游側的基板1b的最下游的島狀區2的間隔J設為大於島狀區間隔P。此外,將黏合位置固定設為B線上,並將預形成位置設為A1線上和A2線上2處。 當島狀區2到達B線上時,便被搬運至黏合位置B,而當島狀區2到達A1線上時,便被搬運至預形成位置A1,而當島狀區2到達A2線上時,便被搬運至預形成位置A2。由於預形成單元12的具有噴嘴20的汽缸21能夠進行X方向的移動,使在各預形成位置A1、A2的預形成動作變為可能。Next, the substrate transfer method of the substrate transfer device configured as described above will be described with reference to FIG. 9 and the like. In this case, in order to explain the basic operation, the island regions 2 on the substrate 1 are disposed at equal intervals P only along the conveyance direction thereof, and the island regions 2 on the most upstream side of the substrate 1a on the downstream side are provided. The interval J from the most downstream island-like region 2 of the substrate 1b on the upstream side is set to be larger than the island-shaped region interval P. In addition, the bonding position is fixed to the B line, and the pre-forming position is set to 2 on the A1 line and the A2 line. When the island 2 reaches the B line, it is transported to the bonding position B, and when the island 2 reaches the A1 line, it is transported to the pre-formed position A1, and when the island 2 reaches the A2 line, It is transported to the preformed position A2. Since the cylinder 21 having the nozzle 20 of the pre-forming unit 12 is capable of moving in the X direction, the pre-forming operation at each of the pre-formed positions A1, A2 becomes possible.

如圖9的α所示,基板1從上游側向下游側被搬運,且當基板1a的最下游的島狀區2被搬運至黏合位置B時,以該基板1a的上游側起第2個島狀區2被搬運至預形成位置A的方式而設定。在此狀態下,藉由預形成單元12的預形成動作以及藉由黏合單元13的黏合動作是可能的。As shown by α in Fig. 9, the substrate 1 is transported from the upstream side to the downstream side, and when the island-shaped region 2 at the most downstream of the substrate 1a is transported to the bonding position B, the second side from the upstream side of the substrate 1a is used. The island region 2 is set to be transported to the pre-formed position A. In this state, the pre-forming action by the pre-forming unit 12 and the bonding action by the bonding unit 13 are possible.

因此,從圖9的α所示的狀態,若將各基板1僅以1個間隔P向下游側搬運,則如圖9的β所示,基板1a的下游起第2個島狀區2被搬運至黏合位置B,並且該基板1a的最上游的島狀區2被搬運至預形成位置A1。因此,在此狀態下,能夠進行在預形成位置A1的預形成動作以及在黏合位置B的黏合動作。Therefore, when the respective substrates 1 are transported to the downstream side at only one interval P from the state indicated by α in Fig. 9, the second island-like region 2 is formed downstream of the substrate 1a as indicated by β in Fig. 9 . It is transported to the bonding position B, and the most upstream island region 2 of the substrate 1a is transported to the pre-formed position A1. Therefore, in this state, the pre-forming operation at the pre-formation position A1 and the bonding operation at the bonding position B can be performed.

然而,若從該圖9的β所示狀態將各基板1僅以1個間隔P向下游側搬運,則如圖9的γ所示,基板1a的下游起第3個島狀區2被搬運至黏合位置B,但基板1b的最下游的島狀區2並未被搬運至預形成位置A1。因此,在此狀態下,雖可進行在黏合位置B的黏合動作,但無法進行在預形成位置A1的預形成動作。因此,在如圖9的γ的狀態下,將預形成位置變更為僅向上游側移動S(J-P)的預形成位置A2。藉此,在預形成位置A2的預形 成動作變為可能。However, when the respective substrates 1 are transported to the downstream side at only one interval P from the state indicated by β in Fig. 9, the third island-like region 2 is transported from the downstream of the substrate 1a as indicated by γ in Fig. 9 . Up to the bonding position B, the island portion 2 at the most downstream of the substrate 1b is not carried to the pre-formed position A1. Therefore, in this state, the bonding operation at the bonding position B can be performed, but the pre-forming operation at the pre-forming position A1 cannot be performed. Therefore, in the state of γ as shown in FIG. 9, the pre-formation position is changed to the pre-formation position A2 in which the S(J-P) is moved only to the upstream side. Thereby, the pre-form at the pre-formed position A2 The action becomes possible.

若從該圖9的γ所示的狀態將各基板1僅以1個間隔P依序向下游側搬運,則如圖9的δ所示,基板1a的最上游的島狀區2到達黏合位置B為止,以該1個間隔P的間歇傳送使基板1b的各島狀區2依序對應預形成位置A2。因此,在預形成位置A2的預形成動作為可能,並且在黏合位置B的黏合動作亦為可能。When the respective substrates 1 are sequentially transported to the downstream side at one interval P from the state indicated by γ in FIG. 9, the islands 2 of the most upstream of the substrate 1a reach the bonding position as indicated by δ in FIG. 9 . Up to B, the island regions 2 of the substrate 1b are sequentially corresponding to the pre-formation position A2 by the intermittent transfer of the one interval P. Therefore, the pre-forming action at the pre-formed position A2 is possible, and the bonding action at the bonding position B is also possible.

然而,從如圖9的δ所示狀態,至圖9的ε所示,將基板1b的最下游的島狀區2搬運至黏合位置B的情況下,必須為J的間隔傳送。若進行該間隔傳送,則基板1b的上游起第2個島狀區2不會對應預形成位置A2。因此,在該圖9的ε的狀態下,將預形成位置變更為僅以S(J-P)向下游側移動的預形成位置A1。藉此,在預形成位置A1的預形成動作變為可能。However, from the state shown by δ in Fig. 9 to the ε shown in Fig. 9, when the island-shaped region 2 at the most downstream of the substrate 1b is transported to the bonding position B, it is necessary to transmit at intervals of J. When the interval transmission is performed, the second island-like region 2 from the upstream of the substrate 1b does not correspond to the pre-formation position A2. Therefore, in the state of ε in FIG. 9, the pre-formation position is changed to the pre-formation position A1 which moves only to the downstream side by S(J-P). Thereby, the pre-forming operation at the pre-formation position A1 becomes possible.

因此,如圖9所示的基板1藉由使與P不同的J的間隔和成為基準地P的間隔傳送混合,而能夠將基板1的島狀區2依序搬運至A1或A2的預形成位置。如此,在已搬運預形成位置A1、A2的島狀區2的狀態下,已塗佈黏著劑的島狀區2到達黏合位置B。因此,可在該黏合位置B將晶片3黏合至已塗佈黏著劑的島狀區2。Therefore, the substrate 1 shown in FIG. 9 can be conveyed and mixed with the interval of J different from P and the interval of the reference ground P, whereby the island-like region 2 of the substrate 1 can be sequentially transported to the preform of A1 or A2. position. As described above, in the state where the island regions 2 of the pre-formed positions A1 and A2 have been transported, the island region 2 to which the adhesive has been applied reaches the bonding position B. Therefore, the wafer 3 can be bonded to the island region 2 to which the adhesive has been applied at the bonding position B.

此外,預形成位置是藉由預形成單元12而可將黏著劑塗佈於在該預形成位置的島狀區2之位置。因此,基板接受構件30的吸附孔33對應於塗佈有黏著劑的島狀區2且可從下方吸附的位置,並且對應於以按壓件40的按壓桿41可從該島狀區2的旁邊 從上方進行按壓的位置。Further, the pre-formed position is by the pre-forming unit 12 to apply the adhesive to the position of the island-like region 2 at the pre-formed position. Therefore, the adsorption hole 33 of the substrate receiving member 30 corresponds to the position where the island region 2 coated with the adhesive can be adsorbed from below, and corresponds to the side of the island 2 from the pressing lever 41 of the pressing member 40. The position to press from above.

因此,在本發明的各預形成位置A1、A2,基板接受構件30沿著X軸方向進行滑動,而使基板接受構件30的吸附孔33對應於在預形成位置的島狀區2。在此情況下,按壓件40的按壓桿41,和基板接受構件30以一體進行滑動(進行同步),而能夠從塗佈有黏著劑4的島狀區2的旁邊從上方進行按壓。又,在基板接受構件30進行滑動的狀態下,作為使按壓桿41上升的狀態,並作為不干涉基板1的狀態,在使基板接受構件30的吸附孔33已對應於在預形成位置的島狀區2時,使按壓桿41下降並將基板1從上方進行按壓。Therefore, at each of the pre-formed positions A1, A2 of the present invention, the substrate receiving member 30 slides along the X-axis direction, and the adsorption hole 33 of the substrate receiving member 30 corresponds to the island-like region 2 at the pre-formed position. In this case, the pressing lever 41 of the pusher 40 and the substrate receiving member 30 are integrally slid (synchronized), and can be pressed from the side of the island-shaped region 2 to which the adhesive 4 is applied from above. In a state where the substrate receiving member 30 is slid, as the state in which the pressing lever 41 is raised, and the state in which the substrate 1 is not interfered, the adsorption hole 33 of the substrate receiving member 30 corresponds to the island at the pre-formed position. In the case of the region 2, the pressing lever 41 is lowered and the substrate 1 is pressed from above.

如此,在上述實施型態中,藉由吸附機構34和按壓件40購成在以預形成單元12塗佈黏著劑4時,保持基板1的保持單元14,並和預形成位置的變動進行同步,使該保持單元14的保持位置移動,而能夠以最佳位置保持基板1。Thus, in the above embodiment, when the adhesive 4 is applied by the pre-forming unit 12 by the suction mechanism 34 and the pressing member 40, the holding unit 14 of the substrate 1 is held and synchronized with the fluctuation of the pre-formed position. The holding position of the holding unit 14 is moved, and the substrate 1 can be held at an optimum position.

又,藉由搬運單元10的間隔傳送,預形成單元12的預形成動作、黏合單元13、基板接受構件30的滑軌以及保持單元1的保持動作等是以上述控制單元11而控制,此時,對設定單元15的操作員等的各種資料被輸入,而控制單元11基於該設定值對各單元12、13等進行控制。Further, the pre-forming operation of the pre-forming unit 12, the bonding unit 13, the slide rail of the substrate receiving member 30, the holding operation of the holding unit 1, and the like are controlled by the above-described control unit 11 by the interval conveyance of the transport unit 10. Various materials such as an operator of the setting unit 15 are input, and the control unit 11 controls each of the units 12, 13, and the like based on the set value.

在此,於上述說明中,因為繪圖簡略化而使用了如圖9所示的引線框架1,但即使是如圖8所示實際上所使用的引線框架1,在本裝置上亦可對應。在此情況下,各島狀區形成塊狀部51 的X軸方向的島狀區2的配設間隔是P,但在島狀區形成塊狀部51間即引線框架1間則具有和該配設間隔P不相同的間隔(配設間隔)H、I、J。Here, in the above description, the lead frame 1 shown in Fig. 9 is used because the drawing is simplified, but even the lead frame 1 actually used as shown in Fig. 8 can be used in the present device. In this case, each island region forms a block portion 51. The arrangement interval of the island-like regions 2 in the X-axis direction is P, but between the formation of the block-like portions 51 in the island-like region, that is, between the lead frames 1, there is a difference (arrangement interval) H between the lead frames 1 and the arrangement interval P. , I, J.

此外,在各塊狀部51,由於沿著X軸方向以及Y軸方向配置有多個島狀區2,在預形成動作,於預形成位置A對應島狀區2的配置間隔,並沿著Y軸方向以規定間隔使具有噴嘴20的汽缸21進行移動。在此情況下,即使從基板1的寬度方向後方側(和搬運方向垂直之方向的後方側)的島狀區2向寬度方向前方側(和搬運方向垂直之方向的前方側)塗佈黏著劑4,或者倒過來從基板1的寬度方向前方側的島狀區2向寬度方向後方側塗佈黏著劑皆可。Further, in each of the block portions 51, a plurality of island-like regions 2 are arranged along the X-axis direction and the Y-axis direction, and in the pre-forming operation, the pre-formation position A corresponds to the arrangement interval of the island-like regions 2, and along The cylinder 21 having the nozzle 20 is moved at a predetermined interval in the Y-axis direction. In this case, the island-shaped region 2 from the rear side in the width direction of the substrate 1 (the rear side in the direction perpendicular to the conveyance direction) is applied to the front side in the width direction (the front side in the direction perpendicular to the conveyance direction). 4. Alternatively, an adhesive may be applied from the island-like region 2 on the front side in the width direction of the substrate 1 to the rear side in the width direction.

如圖8所示在引線框架1,H=I=J的情況下,若將黏合位置B配置於各島狀區形成塊狀部51的前頭(下游端)的島狀區2,並且將預形成位置A配置於各島狀區形成塊狀部51的前頭(下游端)的島狀區2,則配設間隔H、I以及引線框架間的間隔J的進入傳送的時機成為和黏合位置及預形成位置相同的時機。因此,成為如圖12所示的狀態,不需使預形成位置變動。As shown in FIG. 8, in the lead frame 1, when H=I=J, if the bonding position B is disposed in each of the island regions, the island portion 2 of the front end (downstream end) of the block portion 51 is formed, and When the formation position A is disposed in the island-like region 2 in which the front end (downstream end) of the block portion 51 is formed in each of the island regions, the timing of the entry and the transfer of the interval J between the lead frames H and I and the lead frame becomes the bonding position and The timing of pre-forming the same position. Therefore, in the state shown in FIG. 12, it is not necessary to change the pre-formation position.

然而,在島狀區形成塊狀部51的前頭(下游端)的島狀區2並未配置於預形成位置的情況下,在黏合位置上,在塊狀部間的間隔H、I以及引線框架間的間隔J的進入傳送的時機必須使預形成位置A進行變動。因此,需要2處的預形成位置。However, in the case where the island-like region 2 in which the front end (downstream end) of the block portion 51 is formed in the island region is not disposed at the pre-formed position, the interval H, I and the lead between the block portions at the bonding position The timing of the entry of the interval J between the frames must cause the pre-formed position A to fluctuate. Therefore, two pre-formed positions are required.

此外,間隔H≠I=J的情況下,若將預形成位置A配置 於島狀區形成塊狀部51C的前頭(下游端)的島狀區2,則島狀區形成塊狀部51B跟島狀區形成塊狀部51C之間的間隔I,和島狀區形成塊狀部51A跟島狀區形成塊狀部51B之間的間隔H的進入傳送的時機成為相同,因此不需使預形成位置A進行變動。In addition, in the case of the interval H≠I=J, if the pre-formed position A is configured The island-like region 2 of the front end (downstream end) of the block portion 51C is formed in the island region, and the interval I between the land portion forming block portion 51B and the island region forming the block portion 51C is formed, and the island region is formed. Since the timing of the intrusion of the interval H between the block portion 51A and the island-like region forming block portion 51B is the same, it is not necessary to change the pre-formation position A.

然而,在此情況下,如預形成位置並未配置於島狀區形成塊狀部51的前頭(下游端)的島狀區2,則在黏合位置上,島狀區形成塊狀部51B跟島狀區形成塊狀部51C之間的間隔I,和島狀區形成塊狀部51A跟島狀區形成塊狀部51B之間的間隔H的進入傳送的時機並不相同,因此必須使預形成位置進行變動。因此,需要3處的預形成位置。However, in this case, if the pre-formed position is not disposed in the island-like region 2 where the island-shaped region forms the front (downstream end) of the block portion 51, the island-like region forms the block portion 51B at the bonding position. The interval I between the island-like regions forming the block portions 51C and the timing at which the interval H between the island-like region forming block portions 51A and the island-like region forming the block portions 51B are different are different, and therefore it is necessary to make the The formation position is changed. Therefore, three pre-formed positions are required.

如上所述,對基準間隔如有1個不同的配設間隔,則需要2處預形成位置。因此,在圖8所示的引線框架由於有3個不同的配設間隔,作為預形成位置便需要有2×3而為6處。但是,過去以來,作為預形成位置充其量僅能取得2個位置。在此情況下,僅限定為J≠P(或I)。在這樣的塊狀取得種類,如預形成位置A無法配置於塊狀部51的前頭,則成為將塊狀之間以島狀區間隔P傳送數次,並在送入位置對無法劃分的尾數之傳送量進行修正。在該方法的情況下,會發生僅有預形成作動的列,而會發生黏合的損失。按壓位置亦如此,若允許預形成位置為2個位置,則必須設為以該兩者進行按壓的形狀,依照種類必須廣範圍地對基板1(引線框架)進行按壓,且依不同情況,會變成在框架之間的附近對雙方的框架進行按壓,引起搬運困難(trouble),且無法 設定2個位置而發生損失。此外不僅會發生損失,還需要配合每種引線框架的配適盤、按壓件之設計,種類數愈增加,種類對應零件亦增加。As described above, if there is one different arrangement interval for the reference interval, two pre-formed positions are required. Therefore, in the lead frame shown in Fig. 8, since there are three different arrangement intervals, it is necessary to have 2 × 3 and 6 as the pre-formed position. However, in the past, only two positions were obtained as a pre-formed position. In this case, it is limited to only J≠P (or I). In such a block-like acquisition type, if the pre-formation position A cannot be placed in front of the block portion 51, the block-shaped portion P is transmitted several times at an island-like interval P, and the mantissa cannot be divided at the delivery position. The amount of transmission is corrected. In the case of this method, a column with only pre-formation action occurs, and a loss of adhesion occurs. The same applies to the pressing position. If the pre-forming position is allowed to be two positions, the shape must be pressed by the two, and the substrate 1 (lead frame) must be pressed in a wide range according to the type, and depending on the situation, In the vicinity of the frame, the frame of both sides is pressed, causing difficulty in transportation and cannot be performed. Two positions are set and a loss occurs. In addition, not only losses will occur, but also the design of the matching plate and the pressing member for each lead frame will be required, and the number of types will increase, and the types of corresponding parts will also increase.

然而,在本發明的基板搬運裝置,由於將預形成單元12的汽缸21沿著X軸方向的往復運動是可能的,因此對應已變動的預形成位置而使汽缸21移動,在該位置的預形成動作亦為可能。因此,即使需要6處作為預形成位置,在各預形成位置的預形成動作仍為可能。此外,基板接受構件30的沿著X軸方向的往復運動亦為可能,因此可對應已變動的預形成位置而使基板接受構件30進行移動。並且,隨著該移動而使保持單元14的保持位置進行移動,而可在最佳位置保持基板1。However, in the substrate carrying device of the present invention, since the reciprocating motion of the cylinder 21 of the pre-forming unit 12 in the X-axis direction is possible, the cylinder 21 is moved corresponding to the changed pre-formed position, and the pre-position at the position It is also possible to form an action. Therefore, even if six locations are required as the pre-formed positions, the pre-forming action at each pre-formed position is still possible. Further, the reciprocating motion of the substrate receiving member 30 along the X-axis direction is also possible, so that the substrate receiving member 30 can be moved in accordance with the changed pre-formed position. Further, as the movement moves, the holding position of the holding unit 14 is moved, and the substrate 1 can be held at the optimum position.

在本發明的基板搬運方法,即使基本傳送和與該基本傳送不同的傳送進行混合,仍可藉由使黏合位置B保持固定,而使預形成位置A進行變動,而在各預形成位置進行預形成動作。故而,在預形成步驟,可使用速乾性的黏著劑,並且不需實現整體作業步驟的速度提升,而能實現產量的改進。而且,由於和保持單元12的預形成位置A的變動進行同步而能使保持單元14的保持位置進行變動,因此在各預形成位置A的預形成動作可為穩定,並且可避免從島狀區2的黏著劑突出及黏著劑的塗佈不足等,使其後的黏合步驟為穩定,高精度的黏合作業變為可能。In the substrate transfer method of the present invention, even if the basic transfer and the transfer different from the basic transfer are mixed, the pre-formed position A can be changed by fixing the adhesive position B, and the pre-formed position can be pre-formed. Form an action. Therefore, in the pre-forming step, a quick-drying adhesive can be used, and the speed improvement of the overall working step is not required, and the yield can be improved. Further, since the holding position of the holding unit 14 can be changed in synchronization with the fluctuation of the pre-formed position A of the holding unit 12, the pre-forming operation at each pre-forming position A can be stabilized, and the island-shaped area can be avoided. 2 Adhesive sticking and insufficient coating of the adhesive, etc., so that the subsequent bonding step is stable, and high-precision bonding work becomes possible.

此外,由於能夠和預形成單元12的預形成位置A的變動進行同步並使保持單元14的保持位置進行變動,因此可使基本的 間隔傳送和與該基本的間隔傳送不同的間隔傳送(例如:基板間傳送及在基板內的塊狀部間傳送等)進行混合,而可使讓黏合動作待機等的黏合損失不會產生。Further, since it is possible to synchronize with the fluctuation of the pre-formed position A of the pre-formed unit 12 and to change the holding position of the holding unit 14, the basic The intermittent transfer and the different interval transfer (for example, inter-substrate transfer and inter-substrate transfer between the substrates) are mixed, and the adhesive loss such as waiting for the bonding operation can be prevented.

作為保持單元14,由於包括將基板1從背面側進行吸附的吸附機構34,以及將基板1從上方按壓的按壓件40,因此在預形成時可將塗佈黏著劑4的島狀區2穩定維持於高對位置,並可使預形成作業穩定。特別是,以吸附機構34構成保持單元14的情況下,做為基板接受構件30的吸附孔33,可為配合和基板1的搬運方向(X方向)垂直的方向的島狀區配置的1列,並且孔尺寸可為固定者。因此,在基板1的搬運方法,即使基本的間隔傳送和與此基板的間隔傳送不同的間隔傳送(例如,基板間傳送及在基板內的塊狀部間傳送等)進行混合,基板接受構件30的共用亦為可能。因此,不需多個種類對應零件,而可實現低成本。(對此,吸附孔位置無法變動者,必須沿著X方向配置吸附孔,因此吸附路線亦會複雜化。而且,種類對應零件會增加。)As the holding unit 14, since the suction mechanism 34 that adsorbs the substrate 1 from the back side and the pressing member 40 that presses the substrate 1 from above are included, the island region 2 to which the adhesive 4 is applied can be stabilized at the time of pre-forming. Maintained in a high position and stabilized the preforming operation. In particular, when the holding unit 14 is configured by the suction mechanism 34, the adsorption hole 33 serving as the substrate receiving member 30 can be arranged in an array of island-shaped regions arranged in a direction perpendicular to the conveyance direction (X direction) of the substrate 1. And the hole size can be fixed. Therefore, in the method of transporting the substrate 1, the substrate receiving member 30 is mixed even if the basic interval is conveyed and transported at a different interval from the interval of the substrate (for example, transfer between substrates and transfer between blocks in the substrate). Sharing is also possible. Therefore, it is not necessary to have a plurality of types of corresponding parts, and low cost can be achieved. (In this case, if the position of the adsorption hole cannot be changed, the adsorption hole must be arranged along the X direction, so the adsorption route is complicated. Moreover, the type corresponding parts are increased.)

作為基板1,即使沿著搬運方向配設有多個島狀區形成塊狀部51,多個島狀區形成塊狀部51間的間隔亦可具有不同間隔,而能夠對應多種類型的基板1。此外,上游側的基板1和下游側的基板1之間的間隔亦可對應多種。因此,作為裝置的泛用性優異。As the substrate 1, even if a plurality of island-like regions are formed along the transport direction to form the block portion 51, the intervals between the plurality of island-shaped regions forming the block portions 51 may have different intervals, and can correspond to various types of the substrate 1 . Further, the interval between the substrate 1 on the upstream side and the substrate 1 on the downstream side may correspond to a plurality of types. Therefore, it is excellent in versatility as a device.

又,在上述實施型態,作為基板接受構件30包含吸附基座31和配適盤32。因此,對於1個吸附基座31,藉由設為包括多個配適盤32,該些配適盤32的吸附孔33的個數及配設間隔不 同,而可對應多種類型的基板1。亦即,藉由安裝和1個吸附基座31不同類型的配適盤32,而可對應多種類型的基板1,並可實現低成本化。Further, in the above embodiment, the substrate receiving member 30 includes the adsorption base 31 and the matching disk 32. Therefore, for one adsorption susceptor 31, by including a plurality of the accommodating disks 32, the number of the adsorption holes 33 of the lands 32 and the arrangement interval are not The same can be used for a plurality of types of substrates 1. That is, by mounting the different types of the mats 32 with one of the adsorption susceptors 31, it is possible to cope with a plurality of types of substrates 1, and it is possible to achieve cost reduction.

接著,圖10包括2個預形成單元12。在此情況下,其中一者(第1)的預形成單元12A設於下游側,另一者(第2)的預形成單元12B設於上游側。Next, FIG. 10 includes two pre-formed units 12. In this case, one of the (first) pre-formed units 12A is provided on the downstream side, and the other (second) pre-formed unit 12B is provided on the upstream side.

此外,作為第1預形成單元12A,在基板1的寬度方向後方側進行對島狀區2的黏著劑的塗佈,而第2預形成單元12B進行對基板1的寬度方向前方側的島狀區2的黏著劑的塗佈。亦即,在該實施型態中,於島狀區形成塊狀部51,在區域(zone)55以預形成單元12A進行黏著劑的塗佈,在區域56則以預形成單元12B進行黏著劑的塗佈。In addition, as the first pre-forming unit 12A, the application of the adhesive to the island-shaped region 2 is performed on the rear side in the width direction of the substrate 1, and the second pre-forming unit 12B performs an island shape on the front side in the width direction of the substrate 1. Coating of the adhesive of zone 2. That is, in this embodiment, the block portion 51 is formed in the island region, the adhesive is applied in the zone 55 by the pre-forming unit 12A, and the adhesive is formed in the region 56 as the pre-formed unit 12B. Coating.

在此情況下,由於各預形成單元12A、12B亦如圖5所示可由預形成單元12構成,因此各預形成單元12A、12B可對應預形成位置的變動。此外,包括附按壓件40的一對基板接受構件30。因此,對預形成位置的變動,將保持單元14的保持位置和其變動進行同步,使對各島狀區2的黏著劑的塗佈作業穩定進行。In this case, since each of the pre-formed cells 12A, 12B can also be constituted by the pre-formed cells 12 as shown in FIG. 5, each of the pre-formed cells 12A, 12B can correspond to a change in the pre-formed position. Further, a pair of substrate receiving members 30 with a pressing member 40 are included. Therefore, the fluctuation of the pre-formation position is synchronized with the holding position of the holding unit 14 and the fluctuation thereof, and the application operation of the adhesive to each of the island-like regions 2 is stably performed.

包括第1預形成單元12A和第2預形成單元12B可實現對1片基板1的預形成作業的高效率化。此外,將預形成單元12分為基板1的寬度方向前方側和基板的寬度方向後方側更能實現作業效率的改善。The first pre-forming unit 12A and the second pre-forming unit 12B can increase the efficiency of the pre-forming operation of the one substrate 1 . Further, it is possible to further improve the work efficiency by dividing the pre-forming unit 12 into the front side in the width direction of the substrate 1 and the rear side in the width direction of the substrate.

又,具有12A和12B的一對預形成單元12之情況下,各 預形成單元可沿著箭頭Y1方向依序塗佈黏著劑4,亦可沿著箭頭Y2方向依序塗佈黏著劑4。Further, in the case of a pair of pre-formed units 12 of 12A and 12B, each The pre-forming unit may sequentially apply the adhesive 4 in the direction of the arrow Y1, or may sequentially apply the adhesive 4 in the direction of the arrow Y2.

此外,如圖10所示,具有12A和12B的一對預形成單元12之情況下,藉由相機23的島狀區2之識別,較佳是在第1區域55如箭頭Y2從寬度方向後方側向寬度方向前方側進行,在第2區域56則如箭頭Y1從寬度方向前方側向寬度方向後方側進行。這是為了防止相機23的識別島狀區2的誤判,因此較佳為從基板1的外側進行。因此,由於相機23和汽缸21被設為一體化,因此在第1區域55是如箭頭Y1從寬度方向前方側向寬度方向後方側進行,在第2區域56則如箭頭Y2從寬度方向後方側向寬度方向前方側塗佈黏著劑4。Further, as shown in FIG. 10, in the case of a pair of pre-formed units 12 having 12A and 12B, by the identification of the island-like region 2 of the camera 23, it is preferable that the first region 55 is rearward from the width direction as the arrow Y2. The lateral direction is performed on the front side in the lateral direction, and the second region 56 is formed from the front side in the width direction toward the rear side in the width direction as indicated by an arrow Y1. This is for preventing the erroneous determination of the identification of the island region 2 by the camera 23, and therefore it is preferably performed from the outside of the substrate 1. Therefore, since the camera 23 and the cylinder 21 are integrated, the first region 55 is formed from the front side in the width direction toward the rear side in the width direction as indicated by the arrow Y1, and the rear side in the width direction as the arrow Y2 in the second region 56. The adhesive 4 is applied to the front side in the width direction.

以上,基於本發明的實施型態進行了說明,但本發明並非限定於上述實施型態,而可為多種變形。例如,基板1的塊狀部51的個數、塊狀部51間的配設間隔、各塊狀部51的島狀區各數、島狀區2的配設間隔、以及基板1間的配設間隔可任意變更。Although the embodiments of the present invention have been described above, the present invention is not limited to the above-described embodiments, and various modifications are possible. For example, the number of the block portions 51 of the substrate 1, the arrangement interval between the block portions 51, the number of the island regions of each of the block portions 51, the arrangement interval of the island regions 2, and the arrangement between the substrates 1 The interval can be changed arbitrarily.

作為保持單元14,可僅以具有設於基板接受構件30的吸附孔33之吸附機構34而構成,亦可僅以將接受於基板接受構件30的基板1從上方進行按壓的按壓件60而構成。亦即,作為保持單元14,可不具有按壓件60,亦可不具有吸附機構34。此外,作為基板接受構件30,在上述實施型態中,雖是由吸附基座31和配適盤32的2構件所構成,但亦可由1構件或者3構件以上所構成。The holding unit 14 may be configured only by the suction mechanism 34 provided in the adsorption hole 33 of the substrate receiving member 30, or may be configured only by the pressing member 60 that presses the substrate 1 received by the substrate receiving member 30 from above. . That is, the holding unit 14 may not have the pressing member 60 or the suction mechanism 34. Further, the substrate receiving member 30 is constituted by two members of the adsorption base 31 and the matching disk 32 in the above-described embodiment, but may be composed of one member or three or more members.

此外,作為預形成單元12,可為1機,可為2機,進而 亦可為3機。此外,包括2機的情況下,在上述實施型態中,以靠近黏合位置的其中一者的預形成單元12A對基板後方側的島狀區2進行預形成動作,且以另一者的預形成單元12B對基板前方側的島狀區2進行預形成動作,但亦可倒過來為以其中一者的預形成單元12A對基板前方側的島狀區2進行預形成動作,且以另一者的預形成單元12B對基板後方側的島狀區2進行預形成動作。In addition, as the pre-forming unit 12, it can be 1 machine, and can be 2 machines, and further Can also be 3 machines. Further, in the case of including two machines, in the above-described embodiment, the pre-formation unit 12A close to one of the bonding positions performs a pre-forming operation on the island-shaped region 2 on the rear side of the substrate, and the other is pre-formed. The forming unit 12B performs a pre-forming operation on the island-shaped region 2 on the front side of the substrate, but may reversely perform pre-forming operation on the island-shaped region 2 on the front side of the substrate by one of the pre-forming units 12A, and in another The pre-forming unit 12B performs a pre-forming operation on the island-like region 2 on the rear side of the substrate.

進而,作為黏著劑,有焊接膠、樹脂膠、樹脂膜等。此外,作為樹脂膠及樹脂膜,可使用環氧(epoxy)系、聚醯胺(Polyamide)系的多種樹脂黏合材料。Further, as the adhesive, there are a solder paste, a resin glue, a resin film, and the like. Further, as the resin glue and the resin film, a plurality of epoxy resin-based or polyamide-based resin adhesive materials can be used.

[產業上的可利用性][Industrial availability]

可使用於將半導體晶片等的晶片(晶粒)黏合於引線框架等的基板。作為基板搬運裝置,包括搬運多片基板的搬運單元、控制上述搬運單元的控制單元、預形成單元、以及黏合單元等。作為使用的黏著劑,有焊接膠、樹脂膠、樹脂膜等。A wafer (die) for bonding a semiconductor wafer or the like to a substrate such as a lead frame can be used. The substrate transfer device includes a transfer unit that transports a plurality of substrates, a control unit that controls the transfer unit, a pre-forming unit, and a bonding unit. As the adhesive to be used, there are a solder paste, a resin glue, a resin film, and the like.

10‧‧‧搬運單元10‧‧‧Transportation unit

11‧‧‧控制單元11‧‧‧Control unit

12‧‧‧預形成單元12‧‧‧Preformed unit

13‧‧‧黏合單元13‧‧‧bonding unit

14‧‧‧保持單元14‧‧‧Holding unit

15‧‧‧設定單元15‧‧‧Setting unit

Claims (7)

一種基板搬運裝置,將沿著搬運方向以規定間隔形成有多個島狀區的基板沿著上述搬運方向進行搬運,並在上游測的預形成位置將黏著劑塗佈於上述基板的上述島狀區後,在下游側的黏合位置將晶片黏合至塗佈有上述黏著劑的上述島狀區,上述基板搬運裝置的特徵在於包括:搬運單元,將上述基板沿著上述搬運方向從上游側朝向下游側進行間隔傳送;黏合單元,在塗佈有上述黏著劑的上述島狀區被搬運至上述黏合位置時,將上述晶片黏合至上述島狀區;預形成單元,對應已停止的上述基板的上述島狀區的位置而使上述預形成位置變動,在上述預形成位置塗佈上述黏著劑;以及保持單元,上述保持單元以上述預形成單元塗佈上述黏著劑時,在利用沿著上述搬運方向進行往復運動的基板接受構件而接受上述基板的狀態下保持上述基板,其中上述基板搬運裝置和上述預形成單元的上述預形成位置的變動進行同步,並使上述保持單元的保持位置變動。A substrate transfer device that transports a substrate having a plurality of island-shaped regions at predetermined intervals along a conveyance direction along the conveyance direction, and applies an adhesive to the island shape of the substrate at a pre-formed position measured upstream After the region, the wafer is bonded to the island region coated with the adhesive at a bonding position on the downstream side, and the substrate transfer device includes a transfer unit that moves the substrate from the upstream side to the downstream side in the transport direction. The side is spaced apart; the bonding unit bonds the wafer to the island region when the island region coated with the adhesive is transported to the bonding position; and the pre-forming unit corresponds to the above-mentioned substrate that has been stopped The pre-formed position is changed by the position of the island-shaped region, and the adhesive is applied to the pre-formed position; and a holding unit that uses the adhesive along the conveyance direction when the adhesive unit is applied by the pre-forming unit Holding the substrate while the reciprocating substrate receiving member receives the substrate, wherein the substrate is moved Pre-forming means and said forming means changes the pre-sync position, and changes the holding position of the holding means. 如申請專利範圍第1項所述的基板搬運裝置,其中在上述基板接受構件設有吸附機構,上述吸附機構具有將上述基板從背面側進行吸附的吸附孔,並以上述吸附機構構成上述保持單元。The substrate transfer device according to the first aspect of the invention, wherein the substrate receiving member is provided with an adsorption mechanism, wherein the adsorption mechanism has an adsorption hole for adsorbing the substrate from a back side, and the holding unit is configured by the adsorption mechanism. . 如申請專利範圍第1項所述的基板搬運裝置,更包括按壓件,所述按壓件從上方按壓由上述基板接受構件所接受的上述基板,並且以上述按壓件構成上述保持單元。The substrate transfer device according to claim 1, further comprising a pressing member that presses the substrate received by the substrate receiving member from above, and the holding member constitutes the holding unit. 如申請專利範圍第1項所述的基板搬運裝置,更包括按壓件,所述按壓件從上方按壓由上述基板接受構件所接受的上述基板,並且在上述基板接受構件上設有從將上述基板從背面側進行吸附的吸附機構,藉由上述吸附機構和上述按壓件構成上述保持單元。The substrate transfer device according to claim 1, further comprising a pressing member that presses the substrate received by the substrate receiving member from above, and the substrate receiving member is provided with the substrate The adsorption mechanism that adsorbs from the back side constitutes the holding unit by the adsorption mechanism and the pressing member. 如申請專利範圍第1項至第4項中任一項所述的基板搬運裝置,其中上述預形成單元包括:第1預形成單元,在下游側的上述預形成位置塗佈上述黏著劑;以及第2預形成單元,在較上述第1預形成單元的上述預形成位置更上游側的預形成位置塗佈上述黏著劑。The substrate transfer device according to any one of claims 1 to 4, wherein the pre-forming unit includes: a first pre-forming unit, wherein the adhesive is applied to the pre-formed position on the downstream side; The second pre-forming unit applies the adhesive at a pre-formation position on the upstream side of the pre-formed position of the first pre-forming unit. 如申請專利範圍第5項所述的基板搬運裝置,其中上述第1預形成單元和上述第2預形成單元的其中一個預形成單元在上述基板的寬度方向的後方側進行對上述島狀區的上述黏著劑的塗佈,上述第1預形成單元和上述第2預形成單元的另一個預形成單元則在上述基板的寬度方向的前方側進行對上述島狀區的上述黏著劑的塗佈。The substrate transfer device according to claim 5, wherein one of the first pre-forming unit and the second pre-forming unit performs the pair of island-shaped regions on the rear side in the width direction of the substrate In the application of the above-described adhesive, the first pre-forming unit and the other pre-forming unit of the second pre-forming unit apply the adhesive to the island-shaped region on the front side in the width direction of the substrate. 一種基板搬運方法,將沿著搬運方向以規定間隔形成有多個島狀區的基板,沿著上述搬運方向從上游側朝向下游側進行間 隔傳送,並在上游測的預形成位置於保持上述基板的狀態下將黏著劑塗佈於上述基板的上述島狀區,其後在下游側的黏合位置將晶片黏合至塗佈有上述黏著劑的上述島狀區,上述基板搬運方法的特徵在於:上述基板搬運方法能夠進行上述預形成位置的變動,其中上述變動對應已停止的上述基板的上述島狀區的位置,且在上述預形成位置的變動時,使上述預形成位置和上述基板的保持位置進行同步並變動,在上述已變動的上述預形成位置將上述黏著劑塗佈至上述基板的上述島狀區。A substrate transport method in which a substrate having a plurality of island regions formed at predetermined intervals along a conveyance direction is performed from the upstream side toward the downstream side along the conveyance direction The adhesive is applied to the island-shaped region of the substrate in a state where the substrate is held in the pre-formed position measured upstream, and then the wafer is bonded to the adhesive layer coated on the downstream side at the bonding position on the downstream side. In the above-described island-shaped region, the substrate transfer method is characterized in that the substrate transfer method is capable of performing a change in the pre-formation position, wherein the fluctuation corresponds to a position of the island-shaped region of the stopped substrate, and the pre-formed position is In the case of the change, the pre-formed position and the holding position of the substrate are synchronized and fluctuated, and the adhesive is applied to the island-shaped region of the substrate at the changed pre-formed position.
TW102120779A 2012-06-13 2013-06-11 Substrate transporting method and substrate transporting device TWI441268B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012133498A JP5350518B1 (en) 2012-06-13 2012-06-13 Substrate transport method and substrate transport apparatus

Publications (2)

Publication Number Publication Date
TW201405675A TW201405675A (en) 2014-02-01
TWI441268B true TWI441268B (en) 2014-06-11

Family

ID=49758143

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102120779A TWI441268B (en) 2012-06-13 2013-06-11 Substrate transporting method and substrate transporting device

Country Status (5)

Country Link
JP (1) JP5350518B1 (en)
KR (1) KR101413545B1 (en)
CN (1) CN103608909B (en)
TW (1) TWI441268B (en)
WO (1) WO2013187320A1 (en)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3287265B2 (en) * 1997-04-30 2002-06-04 松下電器産業株式会社 Chip bonding apparatus and bonding method
JP3241649B2 (en) * 1997-12-01 2001-12-25 松下電器産業株式会社 Semiconductor device manufacturing method and its manufacturing apparatus
JP3815171B2 (en) 2000-02-29 2006-08-30 松下電器産業株式会社 Paste application method
JP3899956B2 (en) * 2002-02-26 2007-03-28 松下電器産業株式会社 Bonding method for electronic components
JP4907233B2 (en) * 2006-06-12 2012-03-28 キヤノンマシナリー株式会社 Substrate transport method and substrate transport apparatus
US8707550B2 (en) * 2009-07-24 2014-04-29 Asm Technology Singapore Pte Ltd Bonding machine incorporating dual-track transfer mechanism

Also Published As

Publication number Publication date
CN103608909A (en) 2014-02-26
JP5350518B1 (en) 2013-11-27
KR101413545B1 (en) 2014-07-01
JP2013258298A (en) 2013-12-26
KR20140006972A (en) 2014-01-16
TW201405675A (en) 2014-02-01
CN103608909B (en) 2015-03-11
WO2013187320A1 (en) 2013-12-19

Similar Documents

Publication Publication Date Title
US10629461B2 (en) Apparatuses for bonding semiconductor chips
US8991681B2 (en) Die bonder and bonding method
KR101479815B1 (en) Die bonder and bonding method
JP4714026B2 (en) Electronic component mounting apparatus, electronic component mounting method, and electronic component apparatus
KR102003130B1 (en) Semiconductor manufacturing device and manufacturing method of semiconductor device
WO2007072714A1 (en) Apparatus and method for mounting electronic component
CN103579056A (en) Device for bonding semiconductor chips
JP2019054209A (en) Semiconductor manufacturing device, method of manufacturing semiconductor device, and collet
TWI441268B (en) Substrate transporting method and substrate transporting device
JP2004296808A (en) Mounting apparatus and method for electronic component
KR100362556B1 (en) A heat sink inline attach system of printed circuit board for b,g,a
JP2012164706A (en) Mounting device and mounting method of mounted member
KR100914986B1 (en) Chip bonding system
JP4907233B2 (en) Substrate transport method and substrate transport apparatus
TWI825937B (en) composite device
JP2013179207A (en) Placing table of electronic component, and die bonder equipped with the table
KR200375302Y1 (en) Multi array device for semiconductor package
US8905109B2 (en) Apparatus for bonding substrates to each other
WO2022190979A1 (en) Bonding apparatus and bonding method
JP6073625B2 (en) Substrate transport method and substrate transport apparatus
KR101247341B1 (en) System and method for singulation of semiconductor package
CN114030677A (en) Covering machine suitable for soft board manufacturing
TWI502658B (en) Mount device and mount method
KR20150076849A (en) Feeder for Processing and Supplying Components and Parts and Method for Supplying the Same
KR101646983B1 (en) Apparatus for transferring substrate