TWI436951B - Clean water supply system and method thereof - Google Patents
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Description
本發明是有關於一種水供應系統及其供應方法,且特別是有關於一種洗淨水供應系統及其供應方法。The present invention relates to a water supply system and a method of supplying the same, and more particularly to a wash water supply system and a method of supplying the same.
近年來,由於液晶顯示器具有重量輕、體積小與低耗電等優點,因此液晶顯示器被廣泛的使用在各種電子產品(例如:電視、手機、筆記型電腦或衛星導航裝置等)上。In recent years, liquid crystal displays have been widely used in various electronic products (for example, televisions, mobile phones, notebook computers, satellite navigation devices, etc.) because of their advantages of light weight, small size, and low power consumption.
液晶顯示器的製程主要可區分為薄膜電晶體陣列(TFT Array)製程、彩色濾光(color filter)製程、液晶面板組裝(LC Cell Assembly)與液晶面板模組組裝(module Assembly),其中在彩色濾光製程中又包括了清洗、成模、微影與剝膜(光阻去除)等步驟。為了確保彩色濾光片的品質,在彩色濾光片製程中常使用洗淨系統進行清洗處理,以去除基板上附著的雜質、粒子或光阻等物質。The process of the liquid crystal display can be mainly divided into a TFT Array process, a color filter process, a liquid crystal panel assembly (LC Cell Assembly), and a liquid crystal panel module assembly, in which a color filter is used. The light process includes steps of cleaning, molding, lithography, and stripping (photoresist removal). In order to ensure the quality of the color filter, a cleaning system is often used in the color filter process to remove impurities, particles, or photoresists adhering to the substrate.
然而在所述的洗淨系統中往往需要使用大量的洗淨水(例如,去離子水)進行所述的清洗處理。以目前現有的洗淨系統為例,絕大部分的洗淨水仍由水源供應器的去離子水提供,致使廢水的使用率無法提升,無法達到較高省水效率。However, in the cleaning system described above, it is often necessary to use a large amount of washing water (for example, deionized water) for the cleaning treatment. Taking the existing cleaning system as an example, most of the washing water is still supplied by the deionized water of the water supply device, so that the utilization rate of the wastewater cannot be improved, and the high water saving efficiency cannot be achieved.
本發明提出一種洗淨水供應係統及其供應方法,透過管路的配置與控制閥的調配,以切換不同的供水來源從而因應洗淨水的使用需求,並提升省水效率。The invention provides a washing water supply system and a supply method thereof, through the arrangement of pipelines and the deployment of control valves, to switch different water supply sources, thereby responding to the use requirements of the washing water and improving the water saving efficiency.
本發明的洗淨水供應系統,係應用於洗淨輸送帶上所承載的目標物,其洗淨水供應系統包括有第一廢水儲存槽、第二廢水儲存槽、第一水洗處理室與第二水洗處理室。第一廢水儲存槽可用以儲存第一廢水。第二廢水儲存槽可用以儲存第二廢水。所述的第二廢水儲存槽透過第一管路接收來自第一水源供應器的第一水源。所述的第二廢水儲存槽還透過第二管路使用來自第二水源供應器的第二水源,其中第二廢水儲存槽的第二廢水可溢流至第一廢水儲存槽。第一水洗處理室透過第三管路使用來自第一廢水儲存槽的第一廢水對目標物進行第一水洗處理。第二水洗處理室透過第四管路使用來自第二廢水儲存槽的第二廢水,或者第二水洗處理室透過第五管路使用來自第二水源供應器的第二水源,以在第一水洗處理後對所述的目標物進行第二水洗處理。The washing water supply system of the present invention is applied to a target object carried on a washing conveyor belt, and the washing water supply system comprises a first waste water storage tank, a second waste water storage tank, a first water washing treatment room and a first Second washing treatment room. The first wastewater storage tank can be used to store the first wastewater. A second wastewater storage tank can be used to store the second wastewater. The second wastewater storage tank receives the first water source from the first water source through the first pipeline. The second wastewater storage tank also uses a second water source from the second water source through the second pipeline, wherein the second wastewater of the second wastewater storage tank can overflow to the first wastewater storage tank. The first water washing treatment chamber performs a first water washing treatment on the target through the third pipeline using the first wastewater from the first wastewater storage tank. The second water treatment processing chamber uses the second wastewater from the second wastewater storage tank through the fourth pipeline, or the second water treatment processing chamber uses the second water source from the second water source supply through the fifth pipeline to wash in the first water After the treatment, the target material is subjected to a second water washing treatment.
另外,本發明的洗淨水供應方法,包括有下列步驟:首先,設置第一廢水儲存槽以儲存第一廢水,以及設置第二廢水儲存槽以儲存第二廢水,其中第二廢水可溢流至第一廢水儲存槽。接著,設置第一管路以提供第一水源供應器的第一水源至第二廢水儲存槽,並設置第二管路以提供第二水源供應器的第二水源至第二廢水儲存槽,且設置第三管路以提供第一廢水儲存槽的第一廢水至第一水洗處理室,且設置第四管路以提供第二廢水儲存槽的第二廢水至第二水洗處理室。In addition, the method for supplying washing water of the present invention comprises the steps of: firstly, setting a first wastewater storage tank to store the first wastewater, and setting a second wastewater storage tank to store the second wastewater, wherein the second wastewater can overflow To the first wastewater storage tank. Next, a first line is provided to provide a first water source to a second wastewater storage tank of the first water source supply, and a second line is provided to provide a second water source to a second wastewater storage tank of the second water source supply, and A third line is provided to provide a first wastewater of the first wastewater storage tank to the first water treatment chamber, and a fourth line is provided to provide a second wastewater of the second wastewater storage tank to the second water treatment chamber.
接下來,利用輸送帶承載目標物至第一水洗處理室,透過第三管路使用來自第一廢水儲存槽的第一廢水對所述的目標物進行第一水洗處理。然後,利用所述的輸送帶承載目標物至第二水洗處理室,透過第四管路使用來自第二廢水儲存槽的第二廢水或者透過第五管路使用來自第二水源供應器的第二水源,以對目標物進行第二水洗處理。Next, the target is transported to the first water washing treatment chamber by the conveyor belt, and the target water is subjected to the first water washing treatment through the third pipeline using the first wastewater from the first wastewater storage tank. Then, using the conveyor belt to carry the target to the second water washing treatment chamber, using the second wastewater from the second wastewater storage tank through the fourth pipeline or using the second water supply device through the fifth pipeline The water source is subjected to a second water washing treatment on the target.
綜上所述,本發明的洗淨水供應系統及其供應方法,可以利用回收廢水作為洗淨程序的主要供水來源,一但回收廢水不足供應洗淨程序的水源需求量時,則可透過調整預先設置於各管路中的控制閥的狀態(例如,開啟或關閉),以切換由洗淨水作為洗淨程序的主要供水來源,因此,本發明所提出的洗淨水供應方式具有較佳的靈活度,相較於習知技術採用洗淨水作為洗淨程序的主要供水來源的方式,本發明亦可大幅提升省水效率。In summary, the washing water supply system and the supply method thereof of the present invention can utilize the recovered wastewater as the main source of water supply for the washing process, and if the recovered wastewater is insufficient for the water source demand for the washing process, it can be adjusted. The state of the control valve (for example, opening or closing) set in each of the pipelines is switched to switch the main water supply source of the washing water by the washing water. Therefore, the washing water supply method proposed by the present invention is preferable. The flexibility of the present invention can also greatly improve the water saving efficiency as compared with the conventional technique in which washing water is used as the main source of water supply for the washing process.
為讓本發明之上述和其他目的、特徵和優點能更明顯易懂,下文特舉較佳實施例,並配合所附圖式,作詳細說明如下。The above and other objects, features and advantages of the present invention will become more <RTIgt;
請參照圖1,圖1係為本發明實施例的洗淨水供應系統的示意圖。如圖1所示,本發明實施例的洗淨水供應系統200包括有:第一廢水儲存槽10、第二廢水儲存槽20、第一水洗處理室30與第二水洗處理室40。Please refer to FIG. 1. FIG. 1 is a schematic diagram of a washing water supply system according to an embodiment of the present invention. As shown in FIG. 1, the washing water supply system 200 of the embodiment of the present invention includes a first wastewater storage tank 10, a second wastewater storage tank 20, a first water washing treatment chamber 30, and a second water washing treatment chamber 40.
以下先說明洗淨水供應系統200組成構件。第一廢水儲存槽10可用以儲存第一廢水101。所述的第一廢水101例如包含洗淨處理後的回收水或其他相似性質者。另外,第一廢水儲存槽10還可透過第六管路73連接至第一水源供應器70,第一廢水儲存槽10可接收來自第一水源供應器70的第一水源701。The components of the washing water supply system 200 will be described below. The first wastewater storage tank 10 can be used to store the first wastewater 101. The first wastewater 101 includes, for example, recovered water after washing treatment or other similar properties. In addition, the first wastewater storage tank 10 may also be connected to the first water source supply 70 through the sixth conduit 73, and the first wastewater storage tank 10 may receive the first water source 701 from the first water source supply 70.
如上所述,在第六管路73中設置有第一控制閥90。所述的第一控制閥90可例如是由手動閥或自動閥構成。舉例來說,於第一控制閥90開啟時,可對應讓第一水源供應器70的第一水源701流入至第一廢水儲存槽10。於第一控制閥90關閉時,可讓第一水源供應器70的第一水源701停止流入至第一廢水儲存槽10。值得一提的是,所述的第一水源供應器70可收集與/或處理來自其他機台(圖中未示)的廢水,以作為第一水源701的來源。As described above, the first control valve 90 is provided in the sixth line 73. The first control valve 90 can be constituted, for example, by a manual valve or an automatic valve. For example, when the first control valve 90 is opened, the first water source 701 of the first water source supply 70 may be correspondingly flown into the first wastewater storage tank 10. When the first control valve 90 is closed, the first water source 701 of the first water source supply 70 can be stopped from flowing into the first wastewater storage tank 10. It is worth mentioning that the first water source supply 70 can collect and/or treat wastewater from other machines (not shown) as a source of the first water source 701.
在第一廢水儲存槽10旁(如圖1中第一廢水儲存槽10的右側)設置有第二廢水儲存槽20。所述的第二廢水儲存槽20可用以儲存第二廢水201。所述的第二廢水201也可例如包含洗淨後的回收水或其他相似性質者。A second wastewater storage tank 20 is disposed adjacent to the first wastewater storage tank 10 (as shown on the right side of the first wastewater storage tank 10 in FIG. 1). The second wastewater storage tank 20 can be used to store the second wastewater 201. The second wastewater 201 may also include, for example, recovered water after washing or other similar properties.
第二廢水儲存槽20可透過第一管路71連接至第一水源供應器70,第二廢水儲存槽20可接收來自第一水源供應器70的第一水源701。另外,於另一實施例中,在第一水源供應器70與第一管路71之間與第一水源供應器70與第六管路73之間,可設置一個或多個過濾裝置75,以提升第一水源701供應至第一廢水儲存槽10與第二廢水儲存槽20的純淨度。過濾裝置的數目與位置在此不設限,可視實際需求調整。The second wastewater storage tank 20 is connectable to the first water source supply 70 through the first conduit 71, and the second wastewater storage tank 20 can receive the first water source 701 from the first water source supply 70. In addition, in another embodiment, between the first water source supply 70 and the first pipeline 71 and between the first water source supply 70 and the sixth pipeline 73, one or more filtering devices 75 may be disposed. The purity of the first water source 701 supplied to the first wastewater storage tank 10 and the second wastewater storage tank 20 is increased. The number and position of the filtering devices are not limited here and can be adjusted according to actual needs.
如上所述,在第一管路71中可設置有第二控制閥91。所述的第二控制閥91可例如是由手動閥或自動閥構成。舉例來說,於第二控制閥91開啟時,可對應讓第一水源供應器70的第一水源701流入至第二廢水儲存槽20。於第二控制閥91關閉時,可讓第一水源供應器70的第一水源701停止流入至第二廢水儲存槽20。As described above, the second control valve 91 may be provided in the first line 71. The second control valve 91 can be constituted, for example, by a manual valve or an automatic valve. For example, when the second control valve 91 is opened, the first water source 701 of the first water source supply 70 may be correspondingly flown into the second wastewater storage tank 20. When the second control valve 91 is closed, the first water source 701 of the first water source supply 70 can be stopped from flowing into the second wastewater storage tank 20.
另外,第二廢水儲存槽20還可透過第二管路83連接至第二水源供應器80,第二廢水儲存槽20可接收來自第二水源供應器80的第二水源801。所述的第二水源801可例如是去離子水或純水。值得一提的是,所述的第一水源701的純淨度低於或等於第二水源80的純淨度,且第一廢水101的純淨度低於或等於第二廢水201的純淨度。In addition, the second wastewater storage tank 20 may also be connected to the second water source supply 80 through the second conduit 83, and the second wastewater storage tank 20 may receive the second water source 801 from the second water source supply 80. The second water source 801 can be, for example, deionized water or pure water. It is worth mentioning that the purity of the first water source 701 is lower than or equal to the purity of the second water source 80, and the purity of the first wastewater 101 is lower than or equal to the purity of the second wastewater 201.
如上所述,在第二管路83中設置有第三控制閥92。所述的第三控制閥92可開啟或關閉,以對應讓第二水源供應器80的第二水源801流入至第二廢水儲存槽20,或者讓第二水源供應器80的第二水源801停止流入至第二廢水儲存槽20。值得一提的是,所述的第二水源供應器80可例如是由廠務提供純水或去離子水的供應器,以提供純水或去離子水作為第二水源801的來源。另外,第三控制閥92可例如是由手動閥或自動閥構成,但較佳者為一個自動閥,並可根據設定的流體壓力值對應開啟或關閉。As described above, the third control valve 92 is provided in the second line 83. The third control valve 92 can be opened or closed to allow the second water source 801 of the second water source supplier 80 to flow into the second wastewater storage tank 20, or to stop the second water source 801 of the second water source supplier 80. It flows into the second wastewater storage tank 20. It is worth mentioning that the second water source supply 80 can be, for example, a supply of pure water or deionized water provided by the factory to provide pure water or deionized water as a source of the second water source 801. In addition, the third control valve 92 may be constituted, for example, by a manual valve or an automatic valve, but is preferably an automatic valve and may be opened or closed according to a set fluid pressure value.
如圖1所示,第二廢水儲存槽20具有高於第一廢水儲存槽10的液體儲存高度,因此,第二廢水儲存槽20的第二廢水201可溢流至第一廢水儲存槽10。另外,第二廢水儲存槽20可具有透過溢流管或溢流口(圖中未示)輔助使第二廢水201溢流至第一廢水儲存槽10。As shown in FIG. 1, the second wastewater storage tank 20 has a liquid storage height higher than that of the first wastewater storage tank 10, and therefore, the second wastewater 201 of the second wastewater storage tank 20 can overflow to the first wastewater storage tank 10. In addition, the second wastewater storage tank 20 may have an overflow overflow pipe or an overflow port (not shown) to assist in overflowing the second wastewater 201 to the first wastewater storage tank 10.
在第一廢水儲存槽10與第二廢水儲存槽20的上方處分別設置有第一水洗處理室30與第二水洗處理室40。另外,第一水洗處理室30與第二水洗處理室40的設置位置僅為舉例說明,並非用以作為限制。A first water washing treatment chamber 30 and a second water washing treatment chamber 40 are disposed above the first wastewater storage tank 10 and the second wastewater storage tank 20, respectively. In addition, the installation positions of the first water washing processing chamber 30 and the second water washing processing chamber 40 are merely illustrative and are not intended to be limiting.
輸送帶210分別通過在第一水洗處理室30與第二水洗處理室40。所述的輸送帶210可透過驅動器(例如,馬達)、滾輪等構件形成傳動。藉此,輸送帶210可用以承載目標物220朝圖1中標示的運送方向傳動。所述的目標物220可例如是玻璃基板、電路基板等物件,或者是清洗、顯影、剝膜等製程後需要進行水洗處理的物件,但不以此為限。若有其他洗淨需求時,在本發明的另一個實施例中,還可於第一水洗處理室30前設置一個水洗處理室(圖中未示),或者於第一水洗處理室30與第二水洗處理室40之間設置一個水洗處理室(圖中未示),用以清潔目標物220。The conveyor belt 210 passes through the first water washing treatment chamber 30 and the second water washing treatment chamber 40, respectively. The conveyor belt 210 can be driven by a member such as a driver (for example, a motor), a roller, or the like. Thereby, the conveyor belt 210 can be used to carry the target 220 to the conveying direction indicated in FIG. The target object 220 can be, for example, a glass substrate, a circuit board, or the like, or an object that needs to be washed after the process of cleaning, developing, stripping, etc., but is not limited thereto. If there is another cleaning requirement, in another embodiment of the present invention, a water washing processing chamber (not shown) may be disposed in front of the first water washing processing chamber 30, or in the first water washing processing chamber 30 and the first A water washing treatment chamber (not shown) is disposed between the two water treatment processing chambers 40 for cleaning the target 220.
第一水洗處理室30可透過第三管路11連接至第一廢水儲存槽10。第一水洗處理室30可使用來自第一廢水儲存槽10的第一廢水101對目標物220進行第一水洗處理。更進一步說,在第一水洗處理室30中的輸送帶210的上方可設置有一個或多個噴嘴32。透過第三管路11連接第一廢水儲存槽10與噴嘴32,以使噴嘴32噴出水柱或水霧至目標物220的上表面,進而可去除目標物220的上表面的雜質或粒子等物質。另外,第一水洗處理室30還可透過第一排放管路31排出第一水洗處理後的廢水至廢水處理站(圖中未示)進行相關的廢水處理程序。The first water washing process chamber 30 is connectable to the first waste water storage tank 10 through the third line 11. The first water washing treatment chamber 30 may perform the first water washing treatment on the target 220 using the first wastewater 101 from the first wastewater storage tank 10. Still further, one or more nozzles 32 may be disposed above the conveyor belt 210 in the first water washing process chamber 30. The first wastewater storage tank 10 and the nozzle 32 are connected through the third conduit 11 so that the nozzle 32 ejects a water column or a water mist to the upper surface of the target 220, thereby removing impurities such as impurities or particles on the upper surface of the target 220. In addition, the first water washing treatment chamber 30 can also discharge the first water-washed wastewater through the first discharge line 31 to a wastewater treatment station (not shown) to perform a related wastewater treatment process.
另一方面,在第一水洗處理室30中的輸送帶210的下方可設置有一個或多個噴嘴34。噴嘴34可噴出水柱或水霧至目標物220的下表面,進而可去除目標物220的下表面的雜質或粒子等物質。所述的噴嘴32與34可同時或不同時噴水至目標物220,以對目標物220進行所述的第一水洗處理。另外,在第三管路11中較佳者可設置一個或多個過濾裝置13,以提升第一廢水101供應至第一水洗處理室30的純淨度。過濾裝置的數目與位置在此不設限,可視實際需求調整。On the other hand, one or more nozzles 34 may be disposed below the conveyor belt 210 in the first water washing process chamber 30. The nozzle 34 can eject a water column or a water mist to the lower surface of the target 220, thereby removing impurities such as impurities or particles on the lower surface of the target 220. The nozzles 32 and 34 may spray water to the target 220 at the same time or at different times to perform the first water washing treatment on the target 220. In addition, one or more filtering devices 13 may preferably be provided in the third conduit 11 to enhance the purity of the first wastewater 101 supplied to the first water washing treatment chamber 30. The number and position of the filtering devices are not limited here and can be adjusted according to actual needs.
接著,第二水洗處理室40可透過第五管路81連接至第二水源供應器80。另外,在第五管路81中較佳者可設置一個或多個過濾裝置88,以提升第二水源801供應至第二水洗處理室40的純淨度。過濾裝置的數目與位置在此不設限,可視實際需求調整。第二水洗處理室40可接收與使用來自第二水源供應器80的第二水源801。在第五管路81中設置有第四控制閥93。所述的第四控制閥93可例如是由手動閥或自動閥構成。舉例來說,於第四控制閥93開啟時,可對應讓第二水源供應器80的第二水源801流入至第二水洗處理室40。於第四控制閥93關閉時,可讓第二水源供應器80的第二水源801停止流入至第二水洗處理室40。Next, the second water washing process chamber 40 is connectable to the second water source supply 80 through the fifth line 81. Additionally, one or more filtering devices 88 may preferably be provided in the fifth conduit 81 to enhance the purity of the second water source 801 to the second water treatment chamber 40. The number and position of the filtering devices are not limited here and can be adjusted according to actual needs. The second water treatment process chamber 40 can receive and use a second water source 801 from the second water source supply 80. A fourth control valve 93 is provided in the fifth line 81. The fourth control valve 93 can be constituted, for example, by a manual valve or an automatic valve. For example, when the fourth control valve 93 is opened, the second water source 801 of the second water source supplier 80 may be correspondingly flown into the second water washing processing chamber 40. When the fourth control valve 93 is closed, the second water source 801 of the second water source supplier 80 can be stopped from flowing into the second water washing process chamber 40.
第二水洗處理室40可透過第四管路21連接至第二廢水儲存槽20。第二水洗處理室40可使用來自第二廢水儲存槽20的第二廢水201,以在第一水洗處理後對所述的目標物220進行第二水洗處理。另外,第二水洗處理室40還可透過第二排放管路41排出第二水洗處理後的廢水至第二廢水儲存槽20。The second water washing process chamber 40 is connectable to the second waste water storage tank 20 through the fourth line 21. The second water treatment processing chamber 40 may use the second wastewater 201 from the second wastewater storage tank 20 to perform a second water washing treatment on the target 220 after the first water washing treatment. In addition, the second water washing treatment chamber 40 can also discharge the second water-washed wastewater to the second wastewater storage tank 20 through the second discharge line 41.
在第四管路21中可設置有第五控制閥94。所述的第五控制閥94可例如是由手動閥或自動閥構成。舉例來說,於第五控制閥94開啟時,可對應讓第二廢水儲存槽20的第二廢水201流入至第二水洗處理室40。於第五控制閥94關閉時,可讓第二廢水儲存槽20的第二廢水201停止流入至第二水洗處理室40。A fifth control valve 94 may be provided in the fourth line 21. The fifth control valve 94 can be constituted, for example, by a manual valve or an automatic valve. For example, when the fifth control valve 94 is opened, the second wastewater 201 of the second wastewater storage tank 20 may be correspondingly flown into the second water washing treatment chamber 40. When the fifth control valve 94 is closed, the second wastewater 201 of the second wastewater storage tank 20 can be stopped from flowing into the second water washing treatment chamber 40.
同樣的,在第二水洗處理室40中的輸送帶210的上方可設置有一個或多個噴嘴42。透過第四管路21連接第二廢水儲存槽20與噴嘴42,以使噴嘴42噴出水柱或水霧至目標物220的上表面,進而可去除目標物220的上表面的雜質或粒子等物質。Likewise, one or more nozzles 42 may be disposed above the conveyor belt 210 in the second water treatment process chamber 40. The second wastewater storage tank 20 and the nozzle 42 are connected through the fourth line 21 so that the nozzle 42 ejects the water column or the water mist to the upper surface of the target 220, thereby removing impurities such as impurities or particles on the upper surface of the target 220.
另一方面,在第二水洗處理室40中的輸送帶210的下方可設置有一個或多個噴嘴44。噴嘴44可噴出水柱或水霧至目標物220的下表面,進而可去除目標物220的下表面的雜質或粒子等物質。所述的噴嘴42與44可同時或不同時噴水至目標物220,以對目標物220進行所述的第二水洗處理。另外,在第四管路21中較佳者可設置一個或多個過濾裝置28,以提升第二廢水201供應至第二水洗處理室40的純淨度。過濾裝置的數目與位置在此不設限,可視實際需求調整。On the other hand, one or more nozzles 44 may be disposed below the conveyor belt 210 in the second water washing process chamber 40. The nozzle 44 can eject a water column or a water mist to the lower surface of the object 220, thereby removing substances such as impurities or particles on the lower surface of the object 220. The nozzles 42 and 44 may spray water to the target 220 at the same time or at different times to perform the second water washing treatment on the target 220. Additionally, one or more filtering devices 28 may preferably be provided in the fourth conduit 21 to enhance the purity of the second wastewater 201 supplied to the second water treatment chamber 40. The number and position of the filtering devices are not limited here and can be adjusted according to actual needs.
附帶一提的是,上述的各個管路中還可設置流量計(圖中未示),並透過電腦系統(圖中未示)監控或記錄各個管路的流量值、壓力值等數據,以進一步遠端調整各個控制閥的狀態。Incidentally, a flow meter (not shown) may be disposed in each of the above pipelines, and the flow rate value, pressure value, and the like of each pipeline may be monitored or recorded through a computer system (not shown) to Further remotely adjust the state of each control valve.
以下說明洗淨水供應系統200的供水模式的調整狀態。如圖1所示,當洗淨水供應系統200對於第一水源701的水源需求量小於第二水源801的水源需求量時,可透過調整第一控制閥90為關閉、第二控制閥91為關閉、第三控制閥92為關閉、第四控制閥93為開啟與第五控制閥94為關閉來實現第二水源801為主要供給來源,第一水源701供給為輔的供水模式。舉例來說,此供水模式可以純水或去離子水做為主要供應來源,可適用於需要特別清潔要求的目標物上或配合調配水源的彈性應用。於上述供水模式時,當第二水源801的水源供給量不足供應該第二水源801的水源需求量時,第一控制閥90變更為開啟,以將第一水源701補充於第一廢水儲存槽10。較佳者,上述的各個控制閥可透過電腦系統調整為開啟或關閉的狀態。The adjustment state of the water supply mode of the washing water supply system 200 will be described below. As shown in FIG. 1 , when the water supply demand of the first water source 701 is smaller than the water demand of the second water source 801, the first control valve 90 can be turned off and the second control valve 91 can be When the third control valve 92 is closed, the fourth control valve 93 is open, and the fifth control valve 94 is closed, the second water source 801 is used as the main supply source, and the first water source 701 is supplied as the auxiliary water supply mode. For example, this water supply mode can be used as the main source of supply of pure water or deionized water, and can be applied to targets that require special cleaning requirements or to elastic applications that match water sources. In the above water supply mode, when the water supply amount of the second water source 801 is less than the water source demand amount of the second water source 801, the first control valve 90 is changed to be opened to replenish the first water source 701 to the first wastewater storage tank. 10. Preferably, each of the above control valves can be adjusted to be turned on or off through a computer system.
另外,若欲使洗淨水供應系統200對於第一水源701的水源需求量大於第二水源801的水源需求量時,可透過調整第一控制閥90為關閉、第二控制閥91為開啟、第三控制閥92為關閉、第四控制閥93為關閉與第五控制閥94為開啟來實現第一水源701為主要供給來源,第二水源801供給為輔的供水模式。舉例來說,此供水模式可以回收已使用過的水做為主要供應來源,可適用於提高省水效率的洗淨情況或配合調配水源的彈性應用。於此供水模式中,當第一水源701的水源供給量不足供應第一水源701的水源需求量時,可變更第三控制閥92為開啟,以將第二水源801補充至第二廢水儲存槽20,進而使第二廢水儲存槽20的第二廢水201溢流至第一廢水儲存槽10。In addition, if the water source demand of the first water source 701 is greater than the water source demand of the second water source 801, the first control valve 90 can be turned off and the second control valve 91 can be turned on. The third control valve 92 is closed, the fourth control valve 93 is closed, and the fifth control valve 94 is opened to realize that the first water source 701 is the main source of supply, and the second water source 801 is supplied as the auxiliary water supply mode. For example, this water supply model can recycle used water as the main source of supply, and can be applied to improve the water-saving efficiency of washing or to match the elastic application of the water source. In this water supply mode, when the water supply amount of the first water source 701 is less than the water source demand of the first water source 701, the third control valve 92 may be changed to be opened to replenish the second water source 801 to the second wastewater storage tank. 20. Further, the second wastewater 201 of the second wastewater storage tank 20 is overflowed to the first wastewater storage tank 10.
另外,在上述供水模式下,本發明的另一實施例中,當第一水源701的水源供給量不足供應第一水源701的水源需求量時,還可將第二控制閥91變更為關閉、第四控制閥93變更為開啟與第五控制閥94變更為關閉,即調整第一控制閥90為關閉、第二控制閥91為關閉、第三控制閥92為關閉、第四控制閥93為開啟與第五控制閥94為關閉來實現所需的供水模式。也就是說,可依彈性切換所需要的模式。In addition, in the above water supply mode, in another embodiment of the present invention, when the water supply amount of the first water source 701 is less than the water source demand amount supplied to the first water source 701, the second control valve 91 may be changed to be closed, The fourth control valve 93 is changed to open and the fifth control valve 94 is changed to closed, that is, the first control valve 90 is closed, the second control valve 91 is closed, the third control valve 92 is closed, and the fourth control valve 93 is closed. The opening and fifth control valve 94 are closed to achieve the desired water supply mode. That is to say, the desired mode can be switched according to the elasticity.
接下來,請參照圖2,圖2為本發明的第一廢水儲存槽與第二廢水儲存槽的示意圖。如圖2所示,第一廢水儲存槽10中設置有對應於不同液位高度的第一感測器10a、第二感測器10b、第三感測器10c與第四感測器10d。所述的第一感測器10a的設置位置為最高,更進一步說,第一感測器10a的設置位置最遠離第二廢水儲存槽20的底部。第二感測器10b的設置位置低於第一感測器10a。第三感測器10c的設置位置低於第二感測器10b。第四感測器10d的設置位置低於第三感測器10c。所述的各感測器可用以提供液位警告資訊。Next, please refer to FIG. 2. FIG. 2 is a schematic diagram of the first wastewater storage tank and the second wastewater storage tank of the present invention. As shown in FIG. 2, the first wastewater storage tank 10 is provided with a first sensor 10a, a second sensor 10b, a third sensor 10c and a fourth sensor 10d corresponding to different liquid level heights. The first sensor 10a is disposed at the highest position. Further, the first sensor 10a is disposed farthest from the bottom of the second wastewater storage tank 20. The second sensor 10b is disposed lower than the first sensor 10a. The third sensor 10c is disposed lower than the second sensor 10b. The fourth sensor 10d is disposed lower than the third sensor 10c. Each of the sensors can be used to provide level warning information.
另外,在第一廢水儲存槽10的側邊位於第一感測器10a與第二感測器10b之間的位置處還可設置溢流管15,以排放多餘的第一廢水101,進而避免第一廢水101溢出第一廢水儲存槽10。In addition, an overflow pipe 15 may be disposed at a position of the first wastewater storage tank 10 at a side between the first sensor 10a and the second sensor 10b to discharge excess first wastewater 101, thereby avoiding The first wastewater 101 overflows the first wastewater storage tank 10.
於第一廢水儲存槽10中的第一廢水101的液位低於第三感測器10c(或者允許液位)時,即第一廢水101將不夠第一水洗處理使用時,可透過調整各個控制閥的開啟或關閉,以使第一水源701供應至第一廢水儲存槽10。舉例來說,變更第一控制閥90的狀態為開啟,以使第一水源供應器70的第一水源701供應至第一廢水儲存槽10。When the liquid level of the first wastewater 101 in the first wastewater storage tank 10 is lower than the third sensor 10c (or the allowable liquid level), that is, when the first wastewater 101 is not enough for the first water washing treatment, the individual wastewater can be adjusted. The valve is opened or closed to supply the first water source 701 to the first wastewater storage tank 10. For example, the state of the first control valve 90 is changed to be on to supply the first water source 701 of the first water source supply 70 to the first wastewater storage tank 10.
另外,在本發明的另一個實施例中,於第一廢水儲存槽10中的第一廢水101的液位低於第三感測器25時,即第一廢水101將不夠第一水洗處理使用時,可透過調整各個控制閥的開啟或關閉,以使第二廢水儲存槽20的第二廢水201溢流至第一廢水儲存槽10。藉此,可避免第一廢水儲存槽10中的液位過低而導致洗淨水供應系統200產生當機的問題。舉例來說,可變更第三控制閥92的狀態為開啟,以使第二水源供應器80的第二水源801供應至第二廢水儲存槽20,進而使第二廢水儲存槽20的第二廢水101溢流至第一廢水儲存槽10。In addition, in another embodiment of the present invention, when the liquid level of the first wastewater 101 in the first wastewater storage tank 10 is lower than the third sensor 25, that is, the first wastewater 101 will be insufficient for the first water washing treatment. The second wastewater 201 of the second wastewater storage tank 20 can be overflowed to the first wastewater storage tank 10 by adjusting the opening or closing of each control valve. Thereby, the problem that the liquid level in the first wastewater storage tank 10 is too low to cause the washing water supply system 200 to malfunction can be avoided. For example, the state of the third control valve 92 can be changed to be on, so that the second water source 801 of the second water source supplier 80 is supplied to the second wastewater storage tank 20, thereby making the second wastewater of the second wastewater storage tank 20 101 overflows to the first wastewater storage tank 10.
如上所述,在使第二廢水儲存槽20的第二廢水201溢流至第一廢水儲存槽10的過程中,還可透過使第一水源供應器70的第一水源701供應至第二廢水儲存槽20的方式實現。舉例來說,當第二控制閥91的狀態為開啟時,可使第一水源供應器70的第一水源701供應至第二廢水儲存槽20。As described above, in the process of overflowing the second wastewater 201 of the second wastewater storage tank 20 to the first wastewater storage tank 10, the first water source 701 of the first water source supply 70 may also be supplied to the second wastewater. The way of storing the tank 20 is achieved. For example, when the state of the second control valve 91 is ON, the first water source 701 of the first water source supply 70 may be supplied to the second wastewater storage tank 20.
請參照圖3,圖3為本發明實施例的洗淨水供應方法的步驟流程圖。為了說明方便,可一併參閱圖1與圖3,首先,在步驟S401中,設置第一廢水儲存槽10以儲存第一廢水101,以及設置第二廢水儲存槽20以儲存第二廢水201,其中第二廢水201可溢流至第一廢水儲存槽10。值得一提的是,其中第一水源701的純淨度低於第二水源801的純淨度,第一廢水101的純淨度亦低於第二廢水201的純淨度。Please refer to FIG. 3. FIG. 3 is a flow chart showing the steps of the method for supplying the washing water according to the embodiment of the present invention. For convenience of description, reference may be made to FIG. 1 and FIG. 3 . First, in step S401, a first wastewater storage tank 10 is disposed to store the first wastewater 101, and a second wastewater storage tank 20 is disposed to store the second wastewater 201. The second wastewater 201 may overflow to the first wastewater storage tank 10. It is worth mentioning that the purity of the first water source 701 is lower than the purity of the second water source 801, and the purity of the first wastewater 101 is also lower than the purity of the second wastewater 201.
設置第一管路71以提供第一水源供應器70的第一水源701至第二廢水儲存槽20,並設置第二管路83以提供第二水源供應器80的第二水源801至第二廢水儲存槽20,設置第三管路11以提供第一廢水儲存槽10的第一廢水101至第一水洗處理室30,設置第四管路21以提供第二廢水儲存槽20的第二廢水201至第二水洗處理室40,並設置第五管路81以連接第二水源供應器80至第二水洗處理室40。此外,設置第六管路73以連接第一水源供應器70至第一廢水儲存槽10。可設置第一控制閥90於第六管路73中,以控制第一水源701是否輸送至第一廢水儲存槽10。設置第二控制閥91於第一管路71中,以控制第一水源701是否輸送至第二廢水儲存槽20。設置第三控制閥92於第二管路83中,以控制第二水源801是否輸送至第二廢水儲存槽20。設置第四控制閥93於第五管路81中,以控制第二水源801是否輸送至第二水洗處理室40。設置第五控制閥94於第四管路21中,以控制第二廢水201是否輸送至第二水洗處理室40。The first line 71 is provided to provide the first water source 701 to the second wastewater storage tank 20 of the first water source supply 70, and the second line 83 is provided to provide the second water source 801 to the second of the second water source supply 80 The wastewater storage tank 20 is provided with a third pipeline 11 to provide the first wastewater 101 of the first wastewater storage tank 10 to the first water washing treatment chamber 30, and a fourth pipeline 21 is provided to provide the second wastewater of the second wastewater storage tank 20. 201 to the second water washing treatment chamber 40, and a fifth line 81 is provided to connect the second water source supplier 80 to the second water washing processing chamber 40. Further, a sixth line 73 is provided to connect the first water source supply 70 to the first wastewater storage tank 10. A first control valve 90 may be provided in the sixth line 73 to control whether the first water source 701 is delivered to the first wastewater storage tank 10. A second control valve 91 is provided in the first line 71 to control whether the first water source 701 is delivered to the second wastewater storage tank 20. A third control valve 92 is provided in the second line 83 to control whether the second water source 801 is delivered to the second wastewater storage tank 20. A fourth control valve 93 is provided in the fifth line 81 to control whether the second water source 801 is delivered to the second water washing process chamber 40. A fifth control valve 94 is provided in the fourth line 21 to control whether the second wastewater 201 is delivered to the second water washing process chamber 40.
在步驟S403中,利用輸送帶承載目標物至第一水洗處理室30,並透過第三管路11使用來自第一廢水儲存槽10的第一廢水101對目標物進行第一水洗處理。In step S403, the target is transported to the first washing processing chamber 30 by the conveyor belt, and the first water washing treatment is performed on the target by the first wastewater 101 from the first wastewater storage tank 10 through the third conduit 11.
接下來,在步驟S405中,利用所述的輸送帶承載目標物至第二水洗處理室40,可透過第四管路21使用來自第二廢水儲存槽20的第二廢水201對目標物進行第二水洗處理,及亦可透過第五管路81使用來自該第二水源供應器80的第二水源801對目標物進行第二水洗處理,其中第一水洗處理後的廢水可透過設置第一排放管路31排出第一水洗處理室30至廢水處理站(圖中未示)進行相關的廢水處理程序,而第二水洗處理後的廢水可透過設置第二排放管路41排出第二水洗處理室40至第二廢水儲存槽20,以再次回收使用並提升省水效率。Next, in step S405, the target belt is transported to the second water washing processing chamber 40 by the conveyor belt, and the second wastewater 201 from the second wastewater storage tank 20 is used to pass through the fourth pipeline 21 to the target. a second water washing treatment, and the second water source 801 from the second water source supplier 80 may be used to perform a second water washing treatment through the fifth water line 81, wherein the first water washing treated wastewater can pass through the first discharge The pipeline 31 discharges the first water washing treatment chamber 30 to the wastewater treatment station (not shown) for the relevant wastewater treatment process, and the second water treatment treated wastewater can be discharged to the second water treatment treatment chamber through the second discharge conduit 41. 40 to the second wastewater storage tank 20 to be reused again and to improve water saving efficiency.
雖然本發明的實施例之一是以第一水源701為主要供給來源,第二水源801供給為輔的供水模式,也就是說以回收已使用過的水源作為洗淨水供應系統200的主要供水來源,但是透過顆粒計數器(Particle Counter)檢驗水質可確保符合目前目標物製程(例如彩色濾光製程)的使用標準。舉例來說,所述的顆粒計數器(圖中未示)分別連接於過濾裝置28(如圖1所示)的兩端,以分別取得過濾前的數據與過濾後的數據。取樣時間為50分鐘,並取樣20次,符合目前彩色濾光片製程對於洗淨水純淨度的要求(0.2μm的顆粒數量在5顆或以下)的標準。Although one of the embodiments of the present invention uses the first water source 701 as the main supply source, the second water source 801 supplies the auxiliary water supply mode, that is, to recover the used water source as the main water supply for the washing water supply system 200. Source, but testing the water quality through a Particle Counter ensures compliance with current target manufacturing processes (eg color filter processes). For example, the particle counters (not shown) are respectively connected to both ends of the filtering device 28 (shown in FIG. 1) to obtain the pre-filtering data and the filtered data, respectively. The sampling time is 50 minutes and sampled 20 times, which is in line with the current color filter process requirements for the purity of the washing water (the number of particles of 0.2 μm is 5 or less).
綜上所述,本發明的洗淨水供應系統及其供應方法,可利用第一水源與第二水源其中之一作為洗淨程序的主要供水來源,一但主要水源不足供應洗淨程序的水源需求量時,則可透過調整預先設置於各管路中的控制閥的狀態(例如,開啟或關閉),以切換第一水源與第二水源其中另一作為洗淨程序的輔助供水來源,因此,本發明所提出的洗淨水供應方式具有較佳的靈活度,相較於習知技術採用洗淨水作為洗淨程序的主要供水來源的方式,本發明亦可大幅提升省水效率。In summary, the washing water supply system and the supply method thereof of the present invention can utilize one of the first water source and the second water source as the main water supply source of the washing program, but the main water source is insufficient to supply the water source of the washing program. In the case of demand, the state of the control valve (for example, on or off) preset in each pipeline can be adjusted to switch the first water source and the second water source as the auxiliary water supply source of the cleaning program, so The washing water supply method proposed by the invention has better flexibility, and the invention can also greatly improve the water saving efficiency compared with the conventional technology that uses the washing water as the main water supply source of the washing program.
雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。While the present invention has been described in its preferred embodiments, the present invention is not intended to limit the invention, and the present invention may be modified and modified without departing from the spirit and scope of the invention. The scope of protection is subject to the definition of the scope of the patent application.
10...第一廢水儲存槽10. . . First wastewater storage tank
10a...第一感測器10a. . . First sensor
10b...第二感測器10b. . . Second sensor
10c...第三感測器10c. . . Third sensor
10d...第四感測器10d. . . Fourth sensor
11...第三管路11. . . Third pipeline
13...過濾裝置13. . . filter
15...溢流管15. . . Overflow pipe
101...第一廢水101. . . First wastewater
20...第二廢水儲存槽20. . . Second wastewater storage tank
21...第四管路twenty one. . . Fourth pipeline
28...過濾裝置28. . . filter
200...洗淨水供應系統200. . . Washing water supply system
201...第二廢水201. . . Second wastewater
210...輸送帶210. . . conveyor
220...目標物220. . . Target
30...第一水洗處理室30. . . First washing treatment room
31...第一排放管路31. . . First discharge line
32...噴嘴32. . . nozzle
34...噴嘴34. . . nozzle
40...第二水洗處理室40. . . Second washing treatment room
41...第二排放管路41. . . Second discharge line
42...噴嘴42. . . nozzle
44...噴嘴44. . . nozzle
70...第一水源供應器70. . . First water supply
71...第一管路71. . . First line
73...第六管路73. . . Sixth pipeline
75...過濾裝置75. . . filter
701...第一水源701. . . First water source
80...第二水源供應器80. . . Second water supply
81...第五管路81. . . Fifth pipeline
83...第二管路83. . . Second pipeline
88...過濾裝置88. . . filter
801...第二水源801. . . Second water source
90...第一控制閥90. . . First control valve
91...第二控制閥91. . . Second control valve
92...第三控制閥92. . . Third control valve
93...第四控制閥93. . . Fourth control valve
94...第五控制閥94. . . Fifth control valve
S401~S405...步驟流程說明S401~S405. . . Step process description
圖1繪示為本發明實施例的洗淨水供應系統的示意圖。FIG. 1 is a schematic diagram of a washing water supply system according to an embodiment of the present invention.
圖2繪示為本發明實施例的第一廢水儲存槽與第二廢水儲存槽的示意圖。2 is a schematic view of a first wastewater storage tank and a second wastewater storage tank according to an embodiment of the present invention.
圖3繪示為本發明實施例的洗淨水供應方法的步驟流程圖。3 is a flow chart showing the steps of a method for supplying washing water according to an embodiment of the present invention.
10...第一廢水儲存槽10. . . First wastewater storage tank
11...第三管路11. . . Third pipeline
13...過濾裝置13. . . filter
15...溢流管15. . . Overflow pipe
101...第一廢水101. . . First wastewater
20...第二廢水儲存槽20. . . Second wastewater storage tank
21...第四管路twenty one. . . Fourth pipeline
28...過濾裝置28. . . filter
200...洗淨水供應系統200. . . Washing water supply system
201...第二廢水201. . . Second wastewater
210...輸送帶210. . . conveyor
220...目標物220. . . Target
30...第一水洗處理室30. . . First washing treatment room
31...第一排放管路31. . . First discharge line
32...噴嘴32. . . nozzle
34...噴嘴34. . . nozzle
40...第二水洗處理室40. . . Second washing treatment room
41...第二排放管路41. . . Second discharge line
42...噴嘴42. . . nozzle
44...噴嘴44. . . nozzle
70...第一水源供應器70. . . First water supply
71...第一管路71. . . First line
73...第六管路73. . . Sixth pipeline
75...過濾裝置75. . . filter
701...第一水源701. . . First water source
80...第二水源供應器80. . . Second water supply
81...第五管路81. . . Fifth pipeline
83...第二管路83. . . Second pipeline
88...過濾裝置88. . . filter
801...第二水源801. . . Second water source
90...第一控制閥90. . . First control valve
91...第二控制閥91. . . Second control valve
92...第三控制閥92. . . Third control valve
93...第四控制閥93. . . Fourth control valve
94...第五控制閥94. . . Fifth control valve
Claims (27)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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TW100141926A TWI436951B (en) | 2011-11-16 | 2011-11-16 | Clean water supply system and method thereof |
CN201110396615.7A CN102535584B (en) | 2011-11-16 | 2011-11-29 | Washing water supply system and method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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TW100141926A TWI436951B (en) | 2011-11-16 | 2011-11-16 | Clean water supply system and method thereof |
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TW201321308A TW201321308A (en) | 2013-06-01 |
TWI436951B true TWI436951B (en) | 2014-05-11 |
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TW100141926A TWI436951B (en) | 2011-11-16 | 2011-11-16 | Clean water supply system and method thereof |
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CN (1) | CN102535584B (en) |
TW (1) | TWI436951B (en) |
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CN101570404A (en) * | 2008-04-30 | 2009-11-04 | 深超光电(深圳)有限公司 | Washing system |
CN102202469B (en) * | 2010-03-22 | 2013-05-08 | 宏恒胜电子科技(淮安)有限公司 | Circuit board wet-processing system |
JP5630808B2 (en) * | 2010-03-26 | 2014-11-26 | 住友精密工業株式会社 | Water-saving cleaning system for transfer type substrate processing equipment |
CN201988550U (en) * | 2010-12-22 | 2011-09-28 | 厦门精显赛特勒液晶显示有限公司 | Device for circulating liquid crystal glass cleaning water |
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TW201321308A (en) | 2013-06-01 |
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