TWI433887B - Epoxy resin composition - Google Patents

Epoxy resin composition Download PDF

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TWI433887B
TWI433887B TW097136127A TW97136127A TWI433887B TW I433887 B TWI433887 B TW I433887B TW 097136127 A TW097136127 A TW 097136127A TW 97136127 A TW97136127 A TW 97136127A TW I433887 B TWI433887 B TW I433887B
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epoxy resin
resin composition
insulating layer
layer
epoxy
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TW097136127A
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TW200923007A (en
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Shigeo Nakamura
Kenji Kawai
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Ajinomoto Kk
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/24Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
    • C08J5/241Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using inorganic fibres
    • C08J5/244Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using inorganic fibres using glass fibres
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/386Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
    • H05K3/387Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive for electroless plating
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/62Alcohols or phenols
    • C08G59/621Phenols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/24Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
    • C08J5/249Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs characterised by the additives used in the prepolymer mixture
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/49Phosphorus-containing compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L29/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical; Compositions of hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Compositions of derivatives of such polymers
    • C08L29/14Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L31/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an acyloxy radical of a saturated carboxylic acid, of carbonic acid or of a haloformic acid; Compositions of derivatives of such polymers
    • C08L31/02Homopolymers or copolymers of esters of monocarboxylic acids
    • C08L31/04Homopolymers or copolymers of vinyl acetate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2363/00Characterised by the use of epoxy resins; Derivatives of epoxy resins
    • C08J2363/02Polyglycidyl ethers of bis-phenols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00Polymer mixtures characterised by other features
    • C08L2205/03Polymer mixtures characterised by other features containing three or more polymers in a blend
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L71/00Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
    • C08L71/08Polyethers derived from hydroxy compounds or from their metallic derivatives
    • C08L71/10Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
    • C08L71/12Polyphenylene oxides
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0104Properties and characteristics in general
    • H05K2201/012Flame-retardant; Preventing of inflammation
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4661Adding a circuit layer by direct wet plating, e.g. electroless plating; insulating materials adapted therefor

Description

環氧樹脂組成物Epoxy resin composition

本發明係有關適用於形成多層印刷電路板之絕緣層之環氧樹脂組成物。The present invention relates to an epoxy resin composition suitable for forming an insulating layer of a multilayer printed circuit board.

近幾年來,隨著電子機器的小型化、高性能化發展,多層印刷電路板亦更進一步進展至多層化或、配線之微細化以及高密度化。至於適用於形成高密度微細配線之導體形成方法,已知有將絕緣層表面進行粗糙化處理後,以無電解電鍍形成導體層之加成法(additive method),以及以無電解電鍍及電解電鍍形成導體層之半加成法(semi-additive method)。該等方法中,主要係藉由粗糙化處理所形成之絕緣層表面的凹凸而確保絕緣層與電鍍導體層間之密著性。亦即,以絕緣層表面具有凹凸而獲得與電鍍層間之錨定效果。因此,為使密著性增高,考慮有更增大絕緣層表面的凹凸程度(粗糙度)。In recent years, with the development of miniaturization and high performance of electronic devices, multilayer printed circuit boards have further progressed to multilayering, miniaturization of wiring, and high density. As for a method of forming a conductor suitable for forming a high-density fine wiring, an additive method of forming a conductor layer by electroless plating after roughening the surface of the insulating layer, and electroless plating and electrolytic plating are known. A semi-additive method of forming a conductor layer. In these methods, the adhesion between the insulating layer and the plated conductor layer is mainly ensured by the unevenness of the surface of the insulating layer formed by the roughening treatment. That is, the anchoring effect with the plating layer is obtained by having irregularities on the surface of the insulating layer. Therefore, in order to increase the adhesion, it is considered to increase the degree of roughness (roughness) of the surface of the insulating layer.

然而,為使配線益發高密度化絕緣層表面之粗糙度較好較小。亦即,藉由無電解電鍍、電解電鍍形成導體層後,藉由快速蝕刻(flash etching)去除薄膜之電鍍層而完成配線之際,若絕緣層表面之粗糙度大,則為了去除潛埋在凹部之導體層而必要長時間進行快速蝕刻,若長時間進行快速蝕刻,將受其影響而損傷微細配線或使其斷線之危險性高。因此,為了形成高信賴性之高密度配線,而要求即使於絕緣層表面進行粗糙化處理後之粗糙度小,其與電鍍導體間之密著性仍需優異。However, in order to make the wiring high, the roughness of the surface of the insulating layer is preferably small. That is, after the conductor layer is formed by electroless plating or electrolytic plating, the wiring is removed by flash etching to remove the plating layer of the thin film, and if the surface roughness of the insulating layer is large, the buried layer is removed. It is necessary to perform rapid etching for a long time for the conductor layer of the concave portion, and if the rapid etching is performed for a long period of time, the risk of damaging the fine wiring or breaking the wire is high. Therefore, in order to form a highly reliable high-density wiring, it is required that the roughness of the surface of the insulating layer after the roughening treatment is small, and the adhesion to the plated conductor is required to be excellent.

再者,多層印刷基板之絕緣材必須具有難燃性,尤其近幾年,由對環境方面之考慮,傾向於使用非鹵系之難燃劑。作為非鹵系難燃劑之例,已知有磷系難燃劑,例如於特開2001-181375號公報中,揭示有含有含磷環氧樹脂及酚系硬化劑、特定之苯氧基樹脂等之環氧樹脂組成物,於使用在多層印刷電路板之絕緣層時,其耐熱性、難燃性高,由電鍍形成之導體層之剝離強度優異。然而,該專利說明書之實施例中記載之粗糙化後絕緣層表面之粗糙度大,於微細配線化有其界限。Furthermore, the insulating material of the multilayer printed substrate must be flame retardant, and in recent years, in view of environmental considerations, it is preferred to use a non-halogen-based flame retardant. As an example of a non-halogen-based flame retardant, a phosphorus-based flame retardant is known. For example, JP-A-2001-181375 discloses a phosphorus-containing epoxy resin and a phenolic curing agent, and a specific phenoxy resin. When the epoxy resin composition is used as an insulating layer of a multilayer printed circuit board, it has high heat resistance and flame retardancy, and the conductor layer formed by electroplating is excellent in peeling strength. However, the roughness of the surface of the insulating layer after roughening described in the examples of the patent specification is large, and there is a limit to fine wiring.

又例如於特開2003-11269號公報中,揭示含有具有酚性羥基之磷化合物之環氧樹脂組成物於使用作為貼附銅箔絕緣材時,其絕緣性、耐熱性優異。然而,此專利文獻中,並未揭示於作為絕緣層使用時,可獲得低粗糙度且高剝離強度之樹脂組成物,且亦未提示此等問題。For example, JP-A-2003-11269 discloses that an epoxy resin composition containing a phosphorus compound having a phenolic hydroxyl group is excellent in insulation property and heat resistance when used as a copper foil insulating material. However, this patent document does not disclose that a resin composition having low roughness and high peel strength can be obtained when used as an insulating layer, and such problems are not prompted.

本發明係鑑於上述情事而完成者,解決此之課題係提供一種環氧樹脂組成物,其係適合使用作為多層印刷電路板之絕緣層之環氧樹脂組成物,其可達成儘管粗糙化處理後之粗糙化面之粗糙度比較小,但該粗糙化面對於電鍍導體仍顯示高的密著力且可難燃性優異之絕緣層。The present invention has been made in view of the above circumstances, and an object of the present invention is to provide an epoxy resin composition which is suitable for use as an epoxy resin composition as an insulating layer of a multilayer printed circuit board, which can be achieved after roughening treatment The roughness of the roughened surface is relatively small, but the roughened surface exhibits a high adhesion to the plated conductor and is excellent in flame retardancy.

本發明人欲解決上述課題而積極研究之結果,發現對於環氧樹脂、環氧硬化劑以及苯氧基樹脂及/或聚乙烯縮醛樹脂與含磷之苯并噁嗪化合物所調配之環氧樹脂組成物,使該環氧樹脂硬化所得之硬化物若經粗糙化處理,即使所得之粗糙化面粗糙度比較小亦可以高的密著力與電鍍導體進行密著,且具有優異難燃性,因而完成本發明。As a result of active research by the present inventors to solve the above problems, it has been found that an epoxy resin, an epoxy hardener, and an epoxy compound of a phenoxy resin and/or a polyvinyl acetal resin and a phosphorus-containing benzoxazine compound are found. In the resin composition, if the cured product obtained by curing the epoxy resin is roughened, even if the roughened surface roughness is relatively small, the adhesion can be adhered to the plated conductor with high adhesion, and the flame retardancy is excellent. Thus the present invention has been completed.

亦即,本發明包含下述內容。That is, the present invention encompasses the following.

[1]一種環氧樹脂組成物,其特徵為含有(A)環氧樹脂、(B)環氧硬化劑、(C)苯氧樹脂及/或聚乙烯縮醛樹脂以及(D)含有磷之苯并噁嗪化合物。[1] An epoxy resin composition characterized by comprising (A) an epoxy resin, (B) an epoxy hardener, (C) a phenoxy resin and/or a polyvinyl acetal resin, and (D) a phosphorus-containing compound Benzooxazine compounds.

[2]如上述[1]記載之環氧樹脂組成物,其中該含磷之苯并噁嗪化合物為以下式(1)表示之含磷苯并噁嗪化合物:[2] The epoxy resin composition according to the above [1], wherein the phosphorus-containing benzoxazine compound is a phosphorus-containing benzoxazine compound represented by the following formula (1):

[3]如上述[1]或[2]記載之環氧樹脂組成物,其中該環氧硬化劑為選自酚系硬化劑、萘酚系硬化劑及活性酯系硬化劑之1種以上之環氧硬化劑。[3] The epoxy resin composition according to the above [1] or [2], wherein the epoxy curing agent is one or more selected from the group consisting of a phenolic curing agent, a naphthol curing agent, and an active ester curing agent. Epoxy hardener.

[4]如上述[1]至[3]中任一項記載之環氧樹脂組成物,其中以該環氧樹脂組成物之不揮發成分作為100質量%時,成分(A)之含量為10~50質量%,成分(C)之含量為2~20質量%,以及成分(D)之含量為2~20質量%,且環氧硬化劑之反應基相對於環氧樹脂組成物中存在之1個環氧基之比例為1:0.5~1:1.1。[4] The epoxy resin composition according to any one of the above [1], wherein the content of the component (A) is 10 when the nonvolatile component of the epoxy resin composition is 100% by mass. ~50% by mass, the content of the component (C) is 2 to 20% by mass, and the content of the component (D) is 2 to 20% by mass, and the reactive group of the epoxy curing agent is present in the epoxy resin composition. The ratio of one epoxy group is 1:0.5 to 1:1.1.

[5]如上述[1]至[4]中任一項記載之環氧樹脂組成物,其進而含有無機填充劑。[5] The epoxy resin composition according to any one of the above [1] to [4] further comprising an inorganic filler.

[6]如上述[5]記載之環氧樹脂組成物,其中以該環氧樹脂組成物之不揮發成分作為100質量%時,該無機填充劑之含量為10~60質量%。[6] The epoxy resin composition according to the above [5], wherein the content of the inorganic filler is from 10 to 60% by mass based on 100% by mass of the nonvolatile component of the epoxy resin composition.

[7]一種接著薄膜,其特徵係於支撐薄膜上形成有上述[1]至[6]中任一項記載之環氧樹脂組成物之層而成者。[7] A film comprising a layer of the epoxy resin composition according to any one of the above [1] to [6], which is formed on the support film.

[8]一種預浸片,其特徵係於由纖維所構成薄片狀纖維基材中含浸有上述[1]至[6]中任一項記載之環氧樹脂組成物而成者。[8] A prepreg according to any one of the above [1] to [6], wherein the sheet-like fibrous base material comprising the fibers is impregnated with the epoxy resin composition according to any one of the above [1] to [6].

[9]一種多層印刷電路板,其特徵係形成有由上述[1]至[6]中任一項記載之環氧樹脂組成物的硬化物所成之絕緣層者。[9] A multilayer printed wiring board comprising the insulating layer formed of the cured product of the epoxy resin composition according to any one of the above [1] to [6].

[10]一種多層印刷電路板之製造方法,其具有在內層電路基板上形成絕緣層之步驟以及在該絕緣層上形成導體層之步驟者,其特徵為該絕緣層係使上述[1]至[6]中任一項記載之環氧樹脂組成物加以熱硬化所形成,該導體層係藉由於該絕緣層表面經粗糙化處理之粗糙化面上進行電鍍而形成。[10] A method of manufacturing a multilayer printed circuit board, comprising the steps of forming an insulating layer on an inner layer circuit substrate and forming a conductor layer on the insulating layer, wherein the insulating layer is such that [1] The epoxy resin composition according to any one of [6] is formed by thermal curing, and the conductor layer is formed by electroplating on the roughened surface of the surface of the insulating layer which has been roughened.

[11]一種多層印刷電路板之製造方法,其具有在內層電路基板上形成絕緣層之步驟以及在該絕緣層上形成導體層之步驟者,其特徵為具有絕緣層形成步驟、該絕緣層之粗面化步驟及對該粗面進行電鍍之步驟;該絕緣層形成步驟係具有於內層電路基板上層合上述[7]記載之支持薄膜上之形成層之接著薄膜之步驟以及使環氧樹脂組成物熱硬化之步驟。[11] A method of manufacturing a multilayer printed circuit board, comprising the steps of forming an insulating layer on an inner layer circuit substrate and forming a conductor layer on the insulating layer, characterized by having an insulating layer forming step, the insulating layer a step of roughening the surface and a step of plating the rough surface; the insulating layer forming step is a step of laminating an adhesive film forming a layer on the support film of the above [7] on the inner circuit substrate and making the epoxy The step of thermally hardening the resin composition.

[12]一種多層印刷電路板之製造方法,其具有在內層電路基板上形成絕緣層之步驟以及在該絕緣層上形成導體層之步驟者,其特徵為該絕緣層係在內層電路基板上層合上述[8]記載之預浸片,使環氧樹脂組成物加以熱硬化所形成,該導體層係藉由於該絕緣層表面經粗糙化處理之粗糙化面上進行電鍍而形成。[12] A method of manufacturing a multilayer printed circuit board, comprising the steps of forming an insulating layer on an inner layer circuit substrate and forming a conductor layer on the insulating layer, wherein the insulating layer is an inner layer circuit substrate The prepreg according to the above [8] is laminated, and the epoxy resin composition is thermally cured. The conductor layer is formed by electroplating on the roughened surface of the surface of the insulating layer which has been roughened.

[13]如上述[10]至[12]中任一項記載之多層印刷電路板之製造方法,其中該粗糙化處理係使用鹼性過錳酸溶液而進行。[13] The method for producing a multilayer printed wiring board according to any one of [10] to [12] wherein the roughening treatment is carried out using an alkaline permanganic acid solution.

依據本發明,可於多層印刷電路板中導入即使粗糙化處理後之粗糙化面粗糙度比較小其與藉電鍍形成之導體層亦具有優異之密著強度且具有優異難燃性之絕緣層。According to the present invention, it is possible to introduce, in a multilayer printed circuit board, an insulating layer which has a rough surface roughness after roughening treatment and which has excellent adhesion strength and excellent flame retardancy with a conductor layer formed by plating.

[成分(A)之環氧樹脂][Epoxy Resin of Ingredient (A)]

本發明中之成分(A)之環氧樹脂並無特別限定,可舉例為例如雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚S型環氧樹脂、苯酚酚醛清漆型環氧樹脂、第三丁基鄰苯二酚型環氧樹脂、萘酚型環氧樹脂、萘型環氧樹脂,縮水甘油胺型環氧樹脂、甲苯酚酚醛清漆型環氧樹脂、聯苯型環氧樹脂、線狀脂肪族環氧樹脂、脂環式環氧樹脂、雜環式環氧樹脂、含有螺環之環氧樹脂、鹵化環氧樹脂等。The epoxy resin of the component (A) in the present invention is not particularly limited, and examples thereof include, for example, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, and phenol novolak type ring. Oxygen resin, t-butyl catechol type epoxy resin, naphthol type epoxy resin, naphthalene type epoxy resin, glycidylamine type epoxy resin, cresol novolak type epoxy resin, biphenyl type ring Oxygen resin, linear aliphatic epoxy resin, alicyclic epoxy resin, heterocyclic epoxy resin, epoxy resin containing a spiro ring, halogenated epoxy resin, and the like.

環氧樹脂由耐熱性、絕緣信賴性、與金屬膜之密著性之觀點觀之,該等中,較好為雙酚A型環氧樹脂、萘酚型環氧樹脂、萘型環氧樹脂、聯苯型環氧樹脂、具有丁二烯構造之環氧樹脂。具體而言,舉例有液狀雙酚A型環氧樹脂(日本環氧樹脂(股)製之「Epicote 828EL」(jER828EL))、萘型2官能基環氧樹脂(大日本油墨化學工業(股)製之「HP4032」、「HP4032D」)、萘型4官能環氧樹脂(大日本油墨化學工業(股)製之「HP4700」)、萘酚型環氧樹脂(東都化成(股)製「ESN-475V」)、含有丁二烯構造之環氧樹脂(Daicel化學工業(股)製「PB-3600」)、具有聯苯構造之環氧樹脂(日本化藥(股)製「NC3000H」、「NC3000L」,日本環氧樹脂(股)製「YX4000」)等。The epoxy resin is preferably a bisphenol A type epoxy resin, a naphthol type epoxy resin, or a naphthalene type epoxy resin from the viewpoints of heat resistance, insulation reliability, and adhesion to a metal film. , biphenyl type epoxy resin, epoxy resin with butadiene structure. Specifically, a liquid bisphenol A type epoxy resin ("Epicote 828EL" (jER828EL) manufactured by Nippon Epoxy Co., Ltd.), a naphthalene type 2-functional epoxy resin (Daily Ink Chemical Industry Co., Ltd.) is exemplified. "HP4032" and "HP4032D"), naphthalene-type 4-functional epoxy resin ("HP4700" manufactured by Dainippon Ink Chemicals Co., Ltd.), and naphthol-type epoxy resin (ESN manufactured by Tohto Kasei Co., Ltd.) -475V"), epoxy resin containing butadiene structure ("PB-3600" manufactured by Daicel Chemical Industry Co., Ltd.), epoxy resin having biphenyl structure ("NC3000H" manufactured by Nippon Kayaku Co., Ltd.," NC3000L", "YX4000" made by Japan Epoxy Co., Ltd.).

環氧樹脂可單獨使用一種,亦可兩種以上併用,但通常含有一分子中具有2個以上環氧基之環氧樹脂。以環氧樹脂組成物之不揮發成分做為100質量%時,較好至少50質量%以上為一分子中具有2個以上環氧基之環氧樹脂。再者,較佳樣態係含有一分子中具有2個以上環氧基且在溫度20℃為液狀之芳香族系環氧樹脂之環氧樹脂以及一分子中具有3個以上環氧基且在溫度20℃為固體狀之芳香族系環氧樹脂。又,本發明中所謂之芳香族系環氧樹脂,意指其分子內具有芳香環骨架之環氧樹脂。又環氧當量(g/eq)意指每1環氧基之分子量。至於環氧樹脂,於使用液狀環氧樹脂與固形環氧樹脂時,於環氧樹脂組成物以接著薄膜形態使用時,於可形成顯示充分可撓性、操作性優異之接著薄膜之同時,亦可提高環氧樹脂組成物之硬化物的斷裂強度,且提高多層印刷電路板之耐久性。The epoxy resins may be used alone or in combination of two or more, but usually contain an epoxy resin having two or more epoxy groups in one molecule. When the non-volatile component of the epoxy resin composition is 100% by mass, it is preferably at least 50% by mass or more of an epoxy resin having two or more epoxy groups in one molecule. Further, a preferred embodiment is an epoxy resin having an aromatic epoxy resin having two or more epoxy groups and having a liquidity at a temperature of 20 ° C, and having three or more epoxy groups in one molecule. An aromatic epoxy resin which is solid at a temperature of 20 °C. Moreover, the aromatic epoxy resin in the present invention means an epoxy resin having an aromatic ring skeleton in its molecule. Further, the epoxy equivalent (g/eq) means the molecular weight per 1 epoxy group. In the case of using an epoxy resin and a solid epoxy resin, when the epoxy resin composition is used in the form of a film, it is possible to form a film which exhibits sufficient flexibility and excellent handleability. It is also possible to increase the breaking strength of the cured product of the epoxy resin composition and to improve the durability of the multilayer printed circuit board.

又,作為環氧樹脂,於併用液狀環氧樹脂及固形環氧樹脂時,其調配比例(液狀:固形)以質量比計,為1:0.3~1:2之範圍較佳。液狀環氧樹脂之比例若在該範圍內,則環氧樹脂組成物之黏度不會提高,以接著薄膜的形態使用時,於真空層合時之脫氣性降低而不容易發生空隙。又真空層合時保護薄膜或支持薄膜之剝離性不會降低,或硬化後之耐熱性不會降低。又,於環氧樹脂組成物之硬化物可獲得充分之斷裂強度。另一方面,若固形環氧樹脂之比例在該範圍內,以接著薄膜形態使用時,可獲得充分的可撓性,操作性良好,於層合之際可獲得充分的流動性。Further, as the epoxy resin, when the liquid epoxy resin and the solid epoxy resin are used in combination, the mixing ratio (liquid form: solid form) is preferably in the range of 1:0.3 to 1:2 by mass ratio. When the ratio of the liquid epoxy resin is within this range, the viscosity of the epoxy resin composition is not improved, and when it is used in the form of a film, the degassing property at the time of vacuum lamination is lowered, and voids are unlikely to occur. Further, the peeling property of the protective film or the support film at the time of vacuum lamination is not lowered, or the heat resistance after hardening is not lowered. Further, sufficient fracture strength can be obtained in the cured product of the epoxy resin composition. On the other hand, when the ratio of the solid epoxy resin is within this range and is used in the form of a film, sufficient flexibility can be obtained, and workability is good, and sufficient fluidity can be obtained at the time of lamination.

本發明之環氧樹脂組成物中,以環氧樹脂組成物之不揮發成分做為100質量%時,環氧樹脂之含量較好為10~50質量%,更好為20~40質量%,最好為20~35質量%。環氧樹脂(A)的含量若在此範圍內,則樹脂組成物之硬化性良好。In the epoxy resin composition of the present invention, when the nonvolatile component of the epoxy resin composition is 100% by mass, the content of the epoxy resin is preferably from 10 to 50% by mass, more preferably from 20 to 40% by mass, It is preferably 20 to 35 mass%. When the content of the epoxy resin (A) is within this range, the curability of the resin composition is good.

[成分(B)之環氧硬化劑][Epoxy hardener of component (B)]

作為於本發明中使用之環氧硬化劑,就充分發揮本發明效果而言,較好為選自酚系硬化劑、萘酚系硬化劑及活性酯系硬化劑之一種以上所構成之環氧硬化劑。作為酚系硬化劑、萘酚系硬化劑,就耐熱性、耐水性之觀點而言,最好為具有酚醛清漆構造之酚系硬化劑或具有酚醛清漆構造之萘酚系硬化劑。此種具有酚醛清漆構造之酚系硬化劑或具有酚醛清漆構造之萘酚系硬化劑之市售品,舉例有例如MEH-7700、MEH-7810、MEH-7851(明和化成(股)製)、NHN、CBN、GPH(日本化藥(股)製)、SN170、SN180、SN190、SN475、SN485、SN495、SN375、SN395(東都化成(股)製)、LA7052、LA7054(大日本油墨化學工業(股)製)等。作為活性酯系硬化劑,舉例有EXB-9451、EXB-9460(大日本油墨化學工業(股)製)、DC808(日本環氧樹脂(股)製)等。於本發明,硬化劑可使用1種或2種以上併用,但尤其是由於活性酯系硬化劑之反應性較差故較好併用酚系硬化劑及/或萘酚系硬化劑。The epoxy curing agent used in the present invention is preferably an epoxy resin selected from one or more selected from the group consisting of a phenolic curing agent, a naphthol curing agent, and an active ester curing agent. hardener. The phenolic curing agent and the naphthol-based curing agent are preferably a phenolic curing agent having a novolak structure or a naphthol-based curing agent having a novolac structure from the viewpoint of heat resistance and water resistance. Commercial products of such a phenolic curing agent having a novolak structure or a naphthol-based curing agent having a novolak structure are exemplified by, for example, MEH-7700, MEH-7810, and MEH-7851 (manufactured by Megumi Kasei Co., Ltd.). NHN, CBN, GPH (Nippon Chemical Co., Ltd.), SN170, SN180, SN190, SN475, SN485, SN495, SN375, SN395 (Dongdu Chemical Co., Ltd.), LA7052, LA7054 (Daily Ink Chemical Industry Co., Ltd. ))). Examples of the active ester-based curing agent include EXB-9451, EXB-9460 (manufactured by Dainippon Ink Chemicals Co., Ltd.), DC808 (manufactured by Nippon Epoxy Resin Co., Ltd.), and the like. In the present invention, the curing agent may be used singly or in combination of two or more kinds. In particular, since the reactivity of the active ester-based curing agent is inferior, it is preferred to use a phenol-based curing agent and/or a naphthol-based curing agent.

於本發明,環氧樹脂組成物中之環氧硬化劑之量,通常環氧硬化劑之反應基合計數相對於環氧樹脂組成物中存在之環氧基之合計數之比例,於以環氧基合計數作為1時,較好成為1:0.5~1:1.1之暈,更好為該比例成為1:0.5~1:0.9之量。又所謂環氧樹脂組成物中存在之環氧基之合計數,為所有環氧樹脂中各環氧樹脂之固形分質量除以環氧當量之值之合計值,而所謂環氧硬化劑之反應基(活性羥基、活性酯基等)之合計數,為所有硬化劑中各硬化劑之固形分質量除以反應基當量之值之合計值。藉由使硬化劑之含量在此較佳範圍內,使環氧樹脂組成物硬化所得之硬化物之耐熱性變得不足。In the present invention, the amount of the epoxy hardener in the epoxy resin composition is usually a ratio of the total number of reactive groups of the epoxy hardener to the total number of epoxy groups present in the epoxy resin composition. When the number of oxygenation is 1, it is preferably a halo of 1:0.5 to 1:1.1, more preferably the ratio is 1:0.5 to 1:0.9. The total number of epoxy groups present in the epoxy resin composition is the total value of the solid content of each epoxy resin in the epoxy resin divided by the value of the epoxy equivalent, and the reaction of the so-called epoxy hardener The total number of bases (active hydroxyl groups, active ester groups, etc.) is the sum of the solid mass of each hardener in each hardener divided by the value of the reactive base equivalent. When the content of the curing agent is within this preferred range, the heat resistance of the cured product obtained by hardening the epoxy resin composition becomes insufficient.

[成分(C)之苯氧基樹脂及/或聚乙烯縮醛樹脂][Phenolic resin and/or polyvinyl acetal resin of component (C)]

於本發明,苯氧基樹脂及/或聚乙烯縮醛樹脂係為對接著薄膜賦予充分可撓性及調整粗糙化性之目的而使用。作為苯氧基樹脂之具體例舉例有東都化成(股)製之FX280、FX293;日本環氧樹脂(股)製之YX8100、YX6954、YL6974等。聚乙烯縮醛樹脂並無特別限制,但較好為聚乙烯縮丁醛樹脂。作為聚乙烯縮醛樹脂之具體例舉例有電氣化學工業(股)製之電化縮丁醛4000-2、5000-A、6000-C、6000-EP;積水化學工業(股)製之S-REC BH系列、BX系列、KS系列、BL系列、BM系列等。In the present invention, the phenoxy resin and/or the polyvinyl acetal resin are used for the purpose of imparting sufficient flexibility to the film and adjusting the roughening property. Specific examples of the phenoxy resin include FX280 and FX293 manufactured by Tohto Kasei Co., Ltd., and YX8100, YX6954, and YL6974 manufactured by Nippon Epoxy Resin Co., Ltd., and the like. The polyvinyl acetal resin is not particularly limited, but is preferably a polyvinyl butyral resin. Specific examples of the polyvinyl acetal resin include electro-chemical butyral 4000-2, 5000-A, 6000-C, and 6000-EP manufactured by the Electrochemical Industry Co., Ltd.; and S-REC manufactured by Sekisui Chemical Industry Co., Ltd. BH series, BX series, KS series, BL series, BM series, etc.

該聚乙烯縮醛以玻璃轉移溫度為80℃以上者為最佳。此處所謂「玻璃轉移溫度」係依據JIS K7197所記載之方法加以決定。又,玻璃轉移溫度高於分解溫度而在實際上無法觀察到玻璃轉移溫度時,可以分解溫度作為本發明中之玻璃轉移溫度。又,所謂分解溫度係定義為依據JIS K7120所記載之方法測定時質量減少率為5%時之溫度。The polyvinyl acetal is preferably one having a glass transition temperature of 80 ° C or higher. Here, the "glass transition temperature" is determined in accordance with the method described in JIS K7197. Further, when the glass transition temperature is higher than the decomposition temperature and the glass transition temperature is not actually observed, the temperature can be decomposed as the glass transition temperature in the present invention. In addition, the decomposition temperature is defined as the temperature at which the mass reduction rate is 5% when measured according to the method described in JIS K7120.

本發明之環氧樹脂組成物中,以環氧樹脂組成物之不揮發成分作為100質量%時,該苯氧基樹脂及/或聚乙烯縮醛樹脂之含量較好在2~20質量%之範圍。藉由此其在該範圍內,可獲得充分的可撓性、操作性亦良好,由電鍍所形成之導體層之剝離強度變充分。又若超過20質量%,層合時無法獲得充分的流動性,有粗糙度變得過大的傾向。In the epoxy resin composition of the present invention, when the nonvolatile component of the epoxy resin composition is 100% by mass, the content of the phenoxy resin and/or the polyvinyl acetal resin is preferably from 2 to 20% by mass. range. Thereby, in this range, sufficient flexibility and workability are obtained, and the peeling strength of the conductor layer formed by electroplating becomes sufficient. When the amount is more than 20% by mass, sufficient fluidity cannot be obtained at the time of lamination, and the roughness tends to be excessive.

[成分(D)之含磷苯并噁嗪化合物][Component (D) phosphorus-containing benzoxazine compound]

作為於本發明中使用之含磷苯并噁嗪化合物,最好為以下式(1)表示之含磷苯并噁嗪化合物(參考WO/2008/010429)。The phosphorus-containing benzoxazine compound to be used in the present invention is preferably a phosphorus-containing benzoxazine compound represented by the following formula (1) (refer to WO/2008/010429).

此化合物含有磷,而可作為不含鹵素之難燃劑之功能。且與環氧樹脂具有反應性。作為市售者,舉例有昭和高分子(股)製之HF-BOZ06(以式(1)表示之含磷苯并噁嗪化合物之二噁烷溶液)、HFB-2006M(以式(1)表示之含磷苯并噁嗪化合物之1-甲氧基-2-丙醇溶液)等。本發明之環氧樹脂組成物中,以環氧樹脂組成物之不揮發成分作為100質量%時,成分(D)之含量較好在2~20質量%之範圍,更好為2~10質量%,最好為3~6質量%。藉由使成分(D)之含量於2~20質量%,可提高硬化物之難燃性及低吸濕性。This compound contains phosphorus and functions as a halogen-free flame retardant. And reactive with epoxy resin. As a commercially available product, HF-BOZ06 (a dioxane solution of a phosphorus-containing benzoxazine compound represented by the formula (1)) and HFB-2006M (shown by the formula (1)) of Showa Polymer Co., Ltd. are exemplified. a solution of a phosphorus-containing benzoxazine compound in 1-methoxy-2-propanol). In the epoxy resin composition of the present invention, when the nonvolatile component of the epoxy resin composition is 100% by mass, the content of the component (D) is preferably in the range of 2 to 20% by mass, more preferably 2 to 10% by mass. %, preferably 3 to 6 mass%. By setting the content of the component (D) to 2 to 20% by mass, the flame retardancy and low hygroscopicity of the cured product can be improved.

本發明之環氧樹脂組成物中,為降低熱膨脹率等之目的亦可進而含有無機填充劑。作為無機填充劑,可舉例有例如氧化矽、氧化鋁、硫酸鋇、滑石、黏土、雲母粉、氫氧化鋁、氫氧化鎂、碳酸鈣、碳酸鎂、氧化鎂、氮化硼、硼酸鋁、鈦酸鋇、鈦酸鍶、鈦酸鈣、鈦酸鎂、鈦酸鉍、氧化鈦、鋯酸鋇、鋯酸鈣等,該等中最好為無定形氧化矽、熔融氧化矽、結晶氧化矽、合成氧化矽等之氧化矽。作為氧化矽較好為球狀者。無機填充劑之平均粒徑較好為1μm以下,更好為0.8μm以下,最好為0.7μm以下。平均粒徑超過1μm時,由電鍍所形成之導體層之剝離強度有降低之傾向。又,無機填充劑之平均粒徑若過小,則環氧樹脂組成物作為樹脂清漆時,由於清漆黏度上昇而有操作性降低之傾向,故較好平均粒徑為0.05μm以上。又,為使無機填充劑提高耐濕性,較好為以環氧矽烷偶合劑、胺基矽烷偶合劑、鈦酸酯系偶合劑等表面處理劑進行表面處理者。The epoxy resin composition of the present invention may further contain an inorganic filler for the purpose of lowering the coefficient of thermal expansion and the like. As the inorganic filler, for example, cerium oxide, aluminum oxide, barium sulfate, talc, clay, mica powder, aluminum hydroxide, magnesium hydroxide, calcium carbonate, magnesium carbonate, magnesium oxide, boron nitride, aluminum borate, titanium can be exemplified. Barium strontium, barium titanate, calcium titanate, magnesium titanate, barium titanate, titanium oxide, barium zirconate, calcium zirconate, etc., among which are preferably amorphous cerium oxide, lanthanum oxidized cerium, crystalline cerium oxide, Synthesis of cerium oxide such as cerium oxide. As the cerium oxide, it is preferably spherical. The average particle diameter of the inorganic filler is preferably 1 μm or less, more preferably 0.8 μm or less, and most preferably 0.7 μm or less. When the average particle diameter exceeds 1 μm, the peel strength of the conductor layer formed by plating tends to decrease. When the average particle diameter of the inorganic filler is too small, when the epoxy resin composition is used as a resin varnish, the varnish viscosity tends to increase, and the handleability tends to be lowered. Therefore, the average particle diameter is preferably 0.05 μm or more. Further, in order to improve the moisture resistance of the inorganic filler, it is preferred to carry out surface treatment with a surface treatment agent such as an epoxy cyclane coupling agent, an amino decane coupling agent or a titanate coupling agent.

上述無機填充劑之平均粒徑係依據Mie散射理論藉由雷射繞射.散射法測定。具體的雷射繞射粒度分布裝置,以體積為基準作成無機填充劑之粒度分布,可以其中值粒徑作為平均粒徑加以測定。測定樣品可較好使用藉由超音波使無機填充劑分散於水中者。至於雷射繞射粒度分布測定裝置,可使用堀場製作所(股)製之LA-500等。The average particle diameter of the above inorganic filler is determined by a laser diffraction scattering method according to the Mie scattering theory. The specific laser diffraction particle size distribution device prepares the particle size distribution of the inorganic filler on a volume basis, and the median diameter can be measured as the average particle diameter. The measurement sample can preferably be used in which an inorganic filler is dispersed in water by ultrasonic waves. As for the laser diffraction particle size distribution measuring apparatus, LA-500 manufactured by Horiba, Ltd., etc. can be used.

於調配該無機填充劑時於環氧樹脂組成物(不揮發成分100質量%)中含量係依據樹脂組成物所要求之特定而有不同,但較好為10~60質量%,更好為15~50質量%,最好為15~45質量%。The content of the epoxy resin composition (100% by mass of the nonvolatile matter) in the preparation of the inorganic filler varies depending on the specific requirements of the resin composition, but is preferably from 10 to 60% by mass, more preferably 15 ~50% by mass, preferably 15 to 45% by mass.

本發明之環氧樹脂組成物為提高硬化物之機械強度,亦可以應力緩和效果等之目的而含有固體狀橡膠粒子。本發明中之橡膠粒子為不溶解於調製環氧樹脂組成物時之有機溶劑,且與環氧樹脂等之樹脂組成物中之成分亦不相溶者。因此,本發明中橡膠粒子於環氧樹脂組成物之清漆中係以分散狀態存在。此等橡膠粒子,一般係大至橡膠成分之分子量不溶解於有機溶劑或樹脂中之程度,而調製為粒子狀。作為橡膠粒子,舉例有例如芯殼型橡膠粒子、交聯丙烯腈丁二烯橡膠粒子、交聯苯乙烯丁二烯橡膠粒子、丙烯酸橡膠粒子等。芯殼型橡膠粒子為粒子具有芯層及殼層之橡膠粒子,舉例有例如外層之殼層為玻璃狀聚合物,內層之芯層為橡膠狀聚合物所構成之2層構造,或外層之殼層為玻璃狀聚合物、中間層為橡膠狀聚合物、芯層為玻璃狀聚合物所構成之3層構造者。玻璃層係以甲基丙烯酸甲酯之聚合物等所構成,橡膠狀聚合物層係例如以丙烯酸丁酯聚合物(丁基橡膠)等構成。作為芯殼型橡膠粒子之具體例,舉例有Staphyloid AC3832、AC3816N(GANZ化成(股)商品名)、Metablen KW-4426(三菱RAYON(股)商品名)。丙烯腈丁二烯橡膠(NBR)粒子之具體例舉例有XER-91(平均粒徑0.5μm,JSR(股)製)等。苯乙烯丁二烯橡膠(SBR)粒子之具體例舉例有XSK-500(平均粒徑0.5μm,JSR(股)製)等。丙烯酸橡膠粒子之具體例可舉例有Metablen W300A(平均粒徑0.1μm)、W450A(平均粒徑0.5μm)(三菱RAYON(股)商品名)。The epoxy resin composition of the present invention contains solid rubber particles for the purpose of improving the mechanical strength of the cured product, and also for the purpose of stress relaxation effect or the like. The rubber particles in the present invention are organic solvents which are insoluble in the preparation of the epoxy resin composition, and are incompatible with components in the resin composition such as epoxy resin. Therefore, in the present invention, the rubber particles are present in a dispersed state in the varnish of the epoxy resin composition. These rubber particles are generally prepared in such a manner that the molecular weight of the rubber component is not dissolved in the organic solvent or the resin, and is prepared into a particulate form. Examples of the rubber particles include core-shell type rubber particles, crosslinked acrylonitrile butadiene rubber particles, crosslinked styrene butadiene rubber particles, and acrylic rubber particles. The core-shell type rubber particles are rubber particles in which the particles have a core layer and a shell layer, and for example, the shell layer of the outer layer is a glassy polymer, and the core layer of the inner layer is a two-layer structure composed of a rubber-like polymer, or an outer layer. The shell layer is a glassy polymer, the intermediate layer is a rubbery polymer, and the core layer is a three-layer structure composed of a glassy polymer. The glass layer is composed of a polymer of methyl methacrylate or the like, and the rubber-like polymer layer is composed of, for example, a butyl acrylate polymer (butyl rubber). Specific examples of the core-shell type rubber particles include Staphyloid AC3822, AC3816N (GANZ Chemicals Co., Ltd.), and Metablen KW-4426 (Mitsubishi RAYON Co., Ltd.). Specific examples of the acrylonitrile butadiene rubber (NBR) particles include XER-91 (average particle diameter: 0.5 μm, manufactured by JSR Co., Ltd.). Specific examples of the styrene butadiene rubber (SBR) particles include XSK-500 (average particle diameter: 0.5 μm, manufactured by JSR Co., Ltd.). Specific examples of the acrylic rubber particles include Metablen W300A (average particle diameter: 0.1 μm) and W450A (average particle diameter: 0.5 μm) (Mitsubishi RAYON (trade name) trade name).

所調配之橡膠粒子之平均粒徑較好在0.005~1μm之範圍,更好為0.2~0.6μm之範圍。本發明中橡膠粒子之平均粒徑可使用動態光散射法加以測定。例如藉由超音波將橡膠粒子均一分散於適當有機溶劑中,使用FPRA-1000(大塚電子(股)製),以質量基準作成橡膠粒子之粒度分布,可測定其中值粒徑作為平均粒徑。The average particle diameter of the rubber particles to be blended is preferably in the range of 0.005 to 1 μm, more preferably in the range of 0.2 to 0.6 μm. The average particle diameter of the rubber particles in the present invention can be measured by dynamic light scattering. For example, the rubber particles are uniformly dispersed in an appropriate organic solvent by ultrasonic waves, and FPRA-1000 (manufactured by Otsuka Electronics Co., Ltd.) is used to prepare the particle size distribution of the rubber particles on a mass basis, and the median diameter can be measured as the average particle diameter.

調配該橡膠粒子時於於環氧樹脂組成物(不揮發成分100質量%)中含量較好為1~10質量%,更好為2~5質量%。When the rubber particles are blended, the content of the epoxy resin composition (100% by mass of the nonvolatile matter) is preferably from 1 to 10% by mass, more preferably from 2 to 5% by mass.

本發明之環氧樹脂組成物亦可含有以調整硬化時間等為目的之硬化促進劑。作為硬化促進劑,舉例有例如有機膦化合物、咪唑化合物、胺基加成物化合物、3級胺化合物等。作為有機膦化合物之具體例,舉例有三苯膦(商品名TPP)、四苯基鏻四苯基硼酸鹽(商品名TPP-K)、三苯膦三苯基硼烷(商品名TPP-S)、三-對-甲苯基膦(TPTP-S),以上為北興化學工業(股)製等。作為咪唑化合物之具體例,舉例有2-甲基咪唑(商品名Curezol 2MZ)、2-乙基-4-甲基咪唑(商品名2E4MZ)、2-脲基咪唑(商品名CllZ)、1-氰基乙基-2-脲基咪唑(商品名CllZ-CN)、1-氰基乙基-2-脲基咪唑鎓偏苯三酸鹽(商品名CllZ-CNS)、2,4-二胺基-6-[2’-脲基咪唑基-(1’)]-乙基-s-三嗪(商品名CllZ-A)、2MZ-OK、2,4-二胺基-6-[2’甲基咪唑基-(1’)]-乙基-s-三嗪異氰尿酸加成物(商品名2MA-OK)、2-苯基-4,5-二羥基甲基咪唑(商品名2PHZ),以上為四國化成工業(股)製等。胺基加成物化合物之具體例舉例為NOVACURE(旭化成工業(股)商品名)、FUZICURE(富士化成工業(股)商品名)等。3級胺化合物之具體例舉例有DBU(1,8-二氮雜雙環[5,4,0]十一碳-7-烯)等。本發明之環氧樹脂組成物中,硬化促進劑之含量,於環氧樹脂組成物中所含之環氧樹脂與酚性硬化劑總量作為100質量%(不揮發成分)時,通常以0.1~5質量%之範圍使用。The epoxy resin composition of the present invention may contain a curing accelerator for the purpose of adjusting the curing time and the like. The hardening accelerator is exemplified by, for example, an organic phosphine compound, an imidazole compound, an amine-based adduct compound, a tertiary amine compound, and the like. Specific examples of the organic phosphine compound include triphenylphosphine (trade name: TPP), tetraphenylphosphonium tetraphenylborate (trade name: TPP-K), and triphenylphosphine triphenylborane (trade name: TPP-S). , tri-p-tolylphosphine (TPTP-S), the above is Beixing Chemical Industry Co., Ltd. and so on. Specific examples of the imidazole compound include 2-methylimidazole (trade name: Curezol 2MZ), 2-ethyl-4-methylimidazole (trade name: 2E4MZ), 2-ureidoimidazole (trade name: CllZ), and 1- Cyanoethyl-2-ureidoimidazole (trade name CllZ-CN), 1-cyanoethyl-2-ureidoimidazolium trimellitate (trade name CllZ-CNS), 2,4-diamine -6-[2'-ureidoimidazolyl-(1')]-ethyl-s-triazine (trade name CllZ-A), 2MZ-OK, 2,4-diamino-6-[2 'Methylimidazolyl-(1')]-ethyl-s-triazine isocyanuric acid adduct (trade name 2MA-OK), 2-phenyl-4,5-dihydroxymethylimidazole (trade name) 2PHZ), the above is the Shikoku Chemical Industry Co., Ltd. and so on. Specific examples of the amine-based adduct compound are, for example, NOVACURE (Asahi Kasei Industrial Co., Ltd. product name), FUZICURE (Fuji Chemical Industry Co., Ltd. trade name), and the like. Specific examples of the tertiary amine compound are exemplified by DBU (1,8-diazabicyclo[5,4,0]undec-7-ene). In the epoxy resin composition of the present invention, the content of the hardening accelerator is usually 0.1 in the case where the total amount of the epoxy resin and the phenolic hardener contained in the epoxy resin composition is 100% by mass (nonvolatile matter). Use in the range of ~5 mass%.

本發明之環氧樹脂組成物,在不損及本發明硬化之範圍內亦可含有(D)成分以外之難燃劑。作為難燃劑,舉例有例如有機磷系難燃劑、有機含氮磷化合物、氮化合物、矽氧系難燃劑、金屬氫氧化物等。The epoxy resin composition of the present invention may contain a flame retardant other than the component (D) within a range not to impair the hardening of the present invention. Examples of the flame retardant include an organic phosphorus-based flame retardant, an organic nitrogen-containing phosphorus compound, a nitrogen compound, a xenon-based flame retardant, and a metal hydroxide.

本發明之環氧樹脂組成物,在發揮本發明效果之範圍內,亦可含有上述以外之其他樹脂。作為其他樹脂,舉例有氰酸酯樹脂、聚醯亞胺樹脂、聚醯胺醯亞胺、聚醚碸樹脂、聚碸樹脂等。The epoxy resin composition of the present invention may contain other resins than the above insofar as the effects of the present invention are exerted. Examples of the other resin include a cyanate resin, a polyimide resin, a polyamidoximine, a polyether oxime resin, a polyfluorene resin, and the like.

本發明之環氧樹脂組成物,在發揮本發明效果之範圍內,亦可含有上述以外之其他樹脂添加劑。作為樹脂添加劑,舉例有例如矽粉、耐綸粉、氟系粉等之有機填充劑,Orben、Benton等之增黏劑,矽系、氟系、高分子系之消泡劑或平流劑,咪唑系、噻唑系、三唑系、矽烷偶合劑等之密著性賦予劑、酞青藍、酞青綠、碘綠、顏料黃、碳黑等著色劑等。The epoxy resin composition of the present invention may contain other resin additives than the above insofar as the effects of the present invention are exerted. Examples of the resin additive include organic fillers such as strontium powder, nylon powder, and fluorine powder, tackifiers such as Orben and Benton, oxime, fluorine, and polymer defoamers or admixtures, and imidazole. A coloring agent such as an adhesion imparting agent such as a thiazole system, a triazole system or a decane coupling agent, or an indigo blue, indigo green, iodine green, pigment yellow or carbon black.

本發明之環氧樹脂組成物,可塗佈在支持薄膜上形成樹脂組成物層而成為多層印刷電路板用之接著薄膜,或亦可於由纖維所構成之薄片狀纖維基材中含浸該樹脂組成物,成為多層印刷電路板之層間絕緣層用之預浸片。本發明之樹脂組成物可塗佈在電路基板上形成絕緣層,但在工業上,一般係作為接著薄膜或預浸片形態使用於形成絕緣層。The epoxy resin composition of the present invention can be applied to a support film to form a resin composition layer to form a film for a multilayer printed circuit board, or can be impregnated into a sheet-like fiber substrate composed of fibers. The composition is a prepreg for an interlayer insulating layer of a multilayer printed circuit board. The resin composition of the present invention can be applied to a circuit board to form an insulating layer, but industrially, it is generally used as an adhesive film or a prepreg sheet to form an insulating layer.

本發明之接著薄膜可藉由本技藝者已知方法,例如將樹脂組成物溶解於有機溶劑中調製樹脂清漆,以支持薄膜作為支持體,塗佈該樹脂清漆,進而加熱或吹熱風而使有機溶劑乾燥,形成樹脂組成物層而製造。The adhesive film of the present invention can be prepared by a method known to those skilled in the art, for example, by dissolving a resin composition in an organic solvent to prepare a resin varnish to support the film as a support, coating the resin varnish, and further heating or blowing hot air to make an organic solvent. It is dried and formed into a resin composition layer.

作為有機溶劑,可舉例為例如丙酮、甲基乙基酮、環己酮等酮類;乙酸乙酯、乙酸丁酯、溶纖素乙酸酯、丙二醇單甲基醚乙酸酯、卡必醇乙酸酯等之乙酸酯類;溶纖素、丁基卡必醇等之卡必醇類;甲苯、二甲苯等之芳香族烴類;二甲基甲醯胺、二甲基乙醯胺、N-甲基吡咯啶酮等之醯胺系溶劑等。可使用1種有機溶劑亦可組合2種以上使用。The organic solvent may, for example, be a ketone such as acetone, methyl ethyl ketone or cyclohexanone; ethyl acetate, butyl acetate, fibrin acetate, propylene glycol monomethyl ether acetate, carbitol. Acetate such as acetate; carbitol such as cellulase or butyl carbitol; aromatic hydrocarbon such as toluene or xylene; dimethylformamide, dimethylacetamide, A guanamine-based solvent such as N-methylpyrrolidone. One type of organic solvent may be used, or two or more types may be used in combination.

乾燥條件並無特別限制,可乾燥成有機溶劑對樹脂組成物層之含有比例通常在10質量%以下,更好為5質量%以下。乾燥條件可藉由簡單實驗而設定適宜、適當之乾燥條件。雖隨著清漆中有機溶劑量而異,但例如含有30~60質量%之有機溶劑之清漆係在50~150℃乾燥3~10分鐘左右。The drying conditions are not particularly limited, and the content of the organic solvent to the resin composition layer is usually 10% by mass or less, more preferably 5% by mass or less. Dry conditions can be set by appropriate experiments to set suitable and appropriate drying conditions. Although the amount of the organic solvent varies depending on the amount of the organic solvent in the varnish, for example, the varnish containing 30 to 60% by mass of the organic solvent is dried at 50 to 150 ° C for about 3 to 10 minutes.

於接著薄膜上形成之樹脂組成物層之厚度通常為導體層厚度以上。由於形成有電路基板之導體層之厚度通常為5~70μm之範圍,故樹脂組成物層之厚度較好具有10~100μm之厚度。樹脂組成物層亦可用後述之保護薄膜進行保護。藉由以保護薄膜保護,可防止污物等附著於樹脂組成物層表面或損傷。The thickness of the resin composition layer formed on the subsequent film is usually equal to or greater than the thickness of the conductor layer. Since the thickness of the conductor layer on which the circuit substrate is formed is usually in the range of 5 to 70 μm, the thickness of the resin composition layer preferably has a thickness of 10 to 100 μm. The resin composition layer can also be protected by a protective film described later. By protecting with a protective film, it is possible to prevent dirt or the like from adhering to the surface of the resin composition layer or being damaged.

本發明中作為支持薄膜以及保護薄膜可舉例為聚乙烯、聚丙烯、聚氯乙烯等之聚烯烴之薄膜,聚對苯二甲酸乙二酯(以下有時簡稱「PET」)、聚萘二甲酸乙二酯等之聚酯之薄膜,聚碳酸酯薄膜、聚醯亞胺薄膜,可進而舉例有離型紙或銅箔、鋁箔等之金屬箔等。又,支持薄膜及保護薄膜經霧化處理、電暈處理以外,亦可施加離型處理。In the present invention, as the support film and the protective film, a film of a polyolefin such as polyethylene, polypropylene or polyvinyl chloride, polyethylene terephthalate (hereinafter sometimes referred to as "PET") or polynaphthalene dicarboxylic acid can be exemplified. A film of a polyester such as ethylene glycol ester, a polycarbonate film or a polyimide film may, for example, be a metal foil such as a release paper, a copper foil or an aluminum foil. Further, the support film and the protective film may be subjected to a release treatment in addition to atomization treatment or corona treatment.

支持薄膜厚度並無特別限制,通常為10~150μm,較好為25~50μm之範圍。又保護薄膜厚度並無特別限制,通常以1~40μm,更好以10~30μm之範圍使用。又,如後述,於接著薄膜之製造步驟中作為支持體使用之支持薄膜,亦可使用作為保護樹脂組成物層表面之保護薄膜。The thickness of the supporting film is not particularly limited and is usually in the range of 10 to 150 μm, preferably 25 to 50 μm. Further, the thickness of the protective film is not particularly limited, and it is usually used in the range of 1 to 40 μm, more preferably 10 to 30 μm. Further, as will be described later, a protective film used as a support for the support film may be used as a protective film for protecting the surface of the resin composition layer.

本發明中之支持薄膜,層合於電路基板上之後,或藉由加熱硬化而形成絕緣層之後,予以剝離。接著薄膜加熱硬化後若剝離支持薄膜,則可防止在硬化步驟中污物之附著,又可提高硬化後絕緣層之表面平滑性。硬化後剝離時,通常對支持薄膜預先施以離型處理。又,於支持薄膜上形成之樹脂組成物層,較好形成為層的面積比支持薄膜之面積小。又接著薄膜可捲取為輥筒狀後,予以保存、儲藏。The support film of the present invention is peeled off after being laminated on a circuit board or after forming an insulating layer by heat curing. Then, if the support film is peeled off after the film is heat-hardened, the adhesion of the dirt in the hardening step can be prevented, and the surface smoothness of the insulating layer after hardening can be improved. When peeling after hardening, the support film is usually subjected to a release treatment in advance. Further, the resin composition layer formed on the support film is preferably formed such that the area of the layer is smaller than the area of the support film. Then, the film can be taken up in a roll shape, and then stored and stored.

接著,對本發明之使用接著薄膜之本發明多層印刷電路板之製造方法加以說明。樹脂組成物層以保護薄膜加以保護之情況下將其剝離後,以使樹脂組成物層直接接觸於電路基板之方式,層合於電路基板之單面或雙面。本發明之接著薄膜較好使用於藉由真空層合法以減壓下層合於電路基板之方法。層合方法可為批式亦可為以輥之連續式。又進行層合之前亦可視需要對接著薄膜及電路基板予以加熱(預加熱)。Next, a method of manufacturing the multilayer printed wiring board of the present invention using the adhesive film of the present invention will be described. When the resin composition layer is protected by a protective film, the resin composition layer is peeled off, and the resin composition layer is laminated on one side or both sides of the circuit board so as to directly contact the circuit board. The adhesive film of the present invention is preferably used in a method of laminating to a circuit substrate under reduced pressure by vacuum lamination. The lamination method may be batch or continuous in rolls. The film and the circuit substrate may be heated (preheated) as needed before lamination.

層合條件,壓著溫度(層合溫度)較好為70~140℃,壓著壓力較好為1~11kgf/cm2 (9.8×104 ~107.9×104 N/m2 ),較好以空氣壓為20mmHg(26.7hPa)以下之減壓下進行層合。The lamination condition, the pressing temperature (laminating temperature) is preferably 70 to 140 ° C, and the pressing pressure is preferably 1 to 11 kgf/cm 2 (9.8×10 4 to 107.9×10 4 N/m 2 ), preferably Lamination was carried out under reduced pressure at an air pressure of 20 mmHg (26.7 hPa) or less.

真空層合可使用市售真空層合機進行。至於市售真空層合機可舉例為例如NICHIGO MORTON(股)製之真空塗佈機、名機製作所(股)製之真空加壓式層合機、日立工業(股)製之輥式乾式塗佈機、日立AIC(股)製之真空層合機等。Vacuum lamination can be carried out using a commercially available vacuum laminator. As for the commercially available vacuum laminating machine, for example, a vacuum coater manufactured by NICHIGO MORTON Co., Ltd., a vacuum press laminator manufactured by a famous machine manufacturer, and a roll dry coat made by Hitachi Industrial Co., Ltd. Cloth machine, vacuum laminator made by Hitachi AIC (share).

本發明中所謂之內層電路基板,主要是意指於玻璃環氧、金屬基板、聚酯基板、聚醯亞胺基板、BT樹脂基板、熱硬化型聚苯醚基板等之基板之單面或兩面上形成有經圖型加工之導體層(電路)者。又導體層與絕緣層形成交互層,成為於單面或兩面上之經圖型加工之導體層(電路),於製造多層印刷電路板時,適合進而形成有絕緣層及導體層之中間製造物亦包含於本發明之內層電路基板內。關於內層電路基板,由絕緣層對內層電路基板之密著性之觀點觀之,較好藉由黑化處理等對導體電路層表面預先施加粗糙化處理。The inner layer circuit substrate in the present invention mainly means a single side of a substrate such as a glass epoxy, a metal substrate, a polyester substrate, a polyimide substrate, a BT resin substrate, or a thermosetting polyphenylene ether substrate. A patterned conductor layer (circuit) is formed on both sides. Further, the conductor layer and the insulating layer form an alternating layer, and the conductor layer (circuit) is patterned on one or both sides. When manufacturing the multilayer printed circuit board, it is suitable to form an intermediate layer of the insulating layer and the conductor layer. Also included in the inner layer circuit substrate of the present invention. In the inner layer circuit board, from the viewpoint of the adhesion of the insulating layer to the inner layer circuit board, it is preferable to apply a roughening treatment to the surface of the conductor circuit layer by blackening treatment or the like.

如此將接著薄膜層合於電路基板上之後,剝離支持薄膜之情況,可藉由剝離、熱硬化而在電路基板上形成絕緣層。加熱硬化條件係在150℃~220℃歷時20分鐘~180分鐘之範圍內選擇,更好在160℃~200℃歷時30分鐘~120分鐘。After the film is laminated on the circuit board in this manner, the support film is peeled off, and the insulating layer can be formed on the circuit board by peeling and heat curing. The heat hardening condition is selected from 150 ° C to 220 ° C for a period of from 20 minutes to 180 minutes, more preferably from 160 ° C to 200 ° C for 30 minutes to 120 minutes.

形成絕緣層後,於硬化前未剝離支持薄膜之情況,於此進行剝離。接著於電路基板上形成之絕緣層上進行開孔而形成埋孔、通孔。開孔係藉由例如鑽孔、雷射、電漿等之已知方法,又依據必要可組合該等方法進行,但藉由碳酸氣體雷射、YAG雷射等之雷射進行開孔較為一般之方法。After the insulating layer was formed, the support film was not peeled off before the hardening, and peeling was performed there. Then, a hole is formed in the insulating layer formed on the circuit board to form a buried hole and a through hole. The opening is performed by a known method such as drilling, laser, plasma, etc., and may be combined according to necessity, but the opening by a laser such as a carbon dioxide gas laser or a YAG laser is more common. The method.

接著,進行絕緣層表面之粗糙化處理。本發明中之粗糙化處理通常較好以使用氧化劑之濕式粗糙化方法進行。作為氧化劑,舉例有過錳酸鹽(過錳酸鉀、過錳酸鈉等)、重鉻酸鹽、臭氧、過氧化氫/硫酸、硝酸等。較好為藉由堆焊(built-up)method製造多層印刷電路板中絕緣層粗糙化所廣泛使用之氧化劑,較好使用鹼性過錳酸溶液(例如過錳酸鉀、過錳酸鈉水溶液)進行粗糙化。Next, roughening treatment of the surface of the insulating layer is performed. The roughening treatment in the present invention is usually preferably carried out by a wet roughening method using an oxidizing agent. Examples of the oxidizing agent include permanganate (potassium permanganate, sodium permanganate, etc.), dichromate, ozone, hydrogen peroxide/sulfuric acid, nitric acid, and the like. Preferably, an oxidizing agent widely used for roughening an insulating layer in a multilayer printed circuit board by a built-up method is preferably used, and an alkaline permanganic acid solution (for example, potassium permanganate or sodium permanganate solution is preferably used. ) roughening.

絕緣層表面經粗糙化處理之粗糙化面之粗糙度,於形成微細配線方面,較好Ra值為0.5μm以下。所謂Ra值為表示表面粗糙度之數值之一種,係稱為算數平均粗糙度者,具體而言,係自測定區域內變化高度之絕對值之平均線的表面測定之算數平均者。例如,可使用Veeco儀器公司製WYKO NT3300,以VSI接觸模式,自藉由50倍透鏡以121μm×92μm為測定範圍所得之數值而求得。The roughness of the roughened surface on which the surface of the insulating layer is roughened is preferably 0.5 μm or less in forming fine wiring. The Ra value is a value indicating the surface roughness, and is called an arithmetic mean roughness. Specifically, it is an arithmetic average of the surface measurement of the average line of the absolute value of the height of change in the measurement region. For example, WYKO NT3300 manufactured by Veeco Instruments Co., Ltd. can be used to obtain a value obtained by measuring a range of 121 μm × 92 μm from a 50-fold lens in a VSI contact mode.

接著,於藉由粗糙化處理形成有凹凸錨定之樹脂組成物層表面上,以組合無電解電鍍及電解電鍍之方法形成導體層。又所謂導體層可為形成逆圖型之電鍍光阻,僅以無電解電鍍形成導體層者。又導體層形成後,藉由在150~200℃退火(anneal)20~90分鐘,可使導體層之剝離強度進一步提高並安定化。導體層之剝離強度較好為0.6kgf/cm以上。Next, on the surface of the resin composition layer on which the unevenness is anchored by roughening treatment, a conductor layer is formed by a combination of electroless plating and electrolytic plating. Further, the conductor layer may be a plating resist which forms an inverse pattern, and the conductor layer is formed only by electroless plating. After the conductor layer is formed, the peeling strength of the conductor layer can be further improved and stabilized by annealing at 150 to 200 ° C for 20 to 90 minutes. The peeling strength of the conductor layer is preferably 0.6 kgf/cm or more.

又,作為對導體層圖型加工形成電路之方法,可使用例如本技藝者已知之削減法(自全面貼銅之基板除去不要部分而形成電路之方法)或半加成法(於絕緣體基板上自後附加電路圖型之方法)等。Further, as a method of forming a circuit for patterning a conductor layer, for example, a reduction method known in the art (a method of forming a circuit by removing a unnecessary portion from a copper-plated substrate) or a semi-additive method (on an insulator substrate) can be used. Since the method of attaching a circuit pattern, etc.).

本發明之預浸片可將本發明之樹脂組成物藉由熱熔融法或熔劑法含浸於由纖維等所構成之薄片狀纖維基材中,藉由加熱使其半硬化而製造。亦即,本發明之樹脂組成物可成為含浸於由纖維所構成之薄片狀纖維基材中之狀態之預浸片。In the prepreg of the present invention, the resin composition of the present invention can be produced by impregnating a sheet-like fibrous base material composed of fibers or the like by a hot melt method or a flux method, and semi-hardening by heating. That is, the resin composition of the present invention can be a prepreg impregnated in a state of a sheet-like fibrous base material composed of fibers.

至於由纖維構成之薄片狀纖維基材,可使用例如玻璃布或芳醯胺纖維等常作為預浸片用纖維使用者。As the sheet-like fibrous base material composed of fibers, for example, a glass cloth or an arylamine fiber can be used as a fiber user for a prepreg sheet.

熱熔融法有未將樹脂溶解於有機溶劑中,而將樹脂暫時塗佈在與樹脂之剝離性良好之塗佈紙上,將其層合於薄片狀纖維基材上,或藉由染料旋塗機直接塗佈等,而製造預浸片之方法。又溶劑法,可為與接著薄膜同樣,將薄片狀纖維基材浸漬於使樹脂溶解於有機溶劑所得之樹脂清漆中,使樹脂清漆含浸於薄片狀纖維基材中,隨後乾燥之方法。In the hot melt method, the resin is temporarily dissolved in an organic solvent, and the resin is temporarily applied onto a coated paper having good peelability from the resin, laminated on a sheet-like fibrous substrate, or by a dye spin coater. A method of manufacturing a prepreg by directly coating or the like. Further, in the solvent method, a flaky fiber base material may be immersed in a resin varnish obtained by dissolving a resin in an organic solvent in the same manner as the adhesive film, and the resin varnish may be impregnated into the flaky fiber base material and then dried.

接著對使用本發明之預浸片製造本發明之多層印刷電路板之方法加以說明。於電路基板上,將本發明之預浸片一片或視需要數片重疊,介以離型薄膜夾住金屬板在加壓加熱條件下加壓層合。壓力較好為5~40kgf/cm2 (49×104 ~392×104 N/m2 ),較好溫度為120~200℃,時間為20~100分鐘之範圍成型。又與接著薄膜同樣地藉由真空層合法層合於電路基板上之後,藉由加熱硬化亦可製造而得。隨後,與上述同樣地,藉由氧化劑使硬化後之預浸片表面粗糙化後,藉由電鍍形成導體層,而製造多層印刷電路板。Next, a method of manufacturing the multilayer printed wiring board of the present invention using the prepreg of the present invention will be described. On the circuit substrate, one or a plurality of prepreg sheets of the present invention are overlapped, and the metal sheet is sandwiched between the release film and under pressure heating under pressure. The pressure is preferably 5 to 40 kgf/cm 2 (49 × 10 4 to 392 × 10 4 N/m 2 ), preferably 120 to 200 ° C, and the time is 20 to 100 minutes. Further, after laminating on a circuit board by vacuum lamination in the same manner as the subsequent film, it can be produced by heat curing. Subsequently, in the same manner as described above, the surface of the prepreg after curing is roughened by an oxidizing agent, and then a conductor layer is formed by electroplating to produce a multilayer printed wiring board.

以下,使用實施例及比較例更詳細說明本發明,惟該等不應以任何方式限制本發明。又,以下記載中,「份」意指「質量份」。In the following, the invention will be described in more detail by way of examples and comparative examples, which should not be construed as limiting the invention in any way. In the following description, "parts" means "parts by mass".

<實施例1><Example 1>

30份液狀雙酚A型環氧樹脂(環氧當量180,日本環氧樹脂(股)製「Epicote 828EL」)與30份聯苯型環氧樹脂(環氧當量291,日本化藥(股)製「NC3000H」)於15份甲基乙基酮(以下簡稱為「MEK」)及15份環己酮中邊攪拌邊加熱溶解。於其中,混合100份之萘酚系硬化劑(東都化成(股)製之「SN485」,酚性羥基當量215)之固形分50%之MEK溶液、0.1份硬化觸媒(四國化成工業(股)製,「2E4MZ」)、70份球形氧化矽(平均粒徑0.5μm,經胺基矽烷處理之「SO-C2」,Admatechs(股)製)、20份聚乙烯縮丁醛樹脂溶液(玻璃轉移溫度105℃,積水化學工業(股)製「KS-1」之固形分15%之乙醇與甲苯之1:1溶液)、20份苯氧基樹脂(分子量38,000,日本環氧樹脂(股)製「YX6954」,不揮發分30質量%之MEK與環己酮之1:1溶液)、8份之以式(1)表示之含磷苯并噁嗪(昭和高分子(股)製之HF-BOZ06,固形分65%之二噁烷溶液),以高速旋轉混合機均一分散,製作樹脂清漆。接著將此樹脂清漆以染料旋塗機塗佈在聚對苯二甲酸乙二酯(厚38μm)上,使乾燥後之樹脂厚度成為40μm,在80~120℃(平均100℃)乾燥6分鐘(殘留溶劑量約2質量%)。接著於樹脂組成物表面貼合厚度15μm之聚丙烯薄膜同時捲取成輥筒狀。將輥筒狀接著薄膜切成寬507mm,藉此獲得507mm×336mm大小之薄片狀接著薄膜。30 parts of liquid bisphenol A type epoxy resin (epoxy equivalent 180, "Epicote 828EL" made by Nippon Epoxy Co., Ltd.) and 30 parts of biphenyl type epoxy resin (epoxy equivalent 291, Nippon Chemical Co., Ltd. The "NC3000H" system was heated and dissolved in 15 parts of methyl ethyl ketone (hereinafter referred to as "MEK") and 15 parts of cyclohexanone while stirring. Among them, 100 parts of a naphthol-based hardener ("SN485" manufactured by Tohto Kasei Co., Ltd.), a phenolic hydroxyl equivalent of 215), a solid solution of 50% MEK solution, and 0.1 part of a hardening catalyst (Four Nations Chemical Industry Co., Ltd.) )), "2E4MZ"), 70 parts of spherical cerium oxide (average particle size 0.5μm, "SO-C2" treated with amino decane, manufactured by Admatechs), 20 parts of polyvinyl butyral resin solution ( Glass transfer temperature 105 ° C, Sekisui Chemical Industry Co., Ltd. "KS-1" solids 15% ethanol and toluene 1:1 solution), 20 parts phenoxy resin (molecular weight 38,000, Japanese epoxy resin ) "YX6954", a 1:1 solution of MEK and cyclohexanone having a nonvolatile content of 30% by mass, and 8 parts of a phosphorus-containing benzoxazine represented by the formula (1) (manufactured by Showa Polymer Co., Ltd.) HF-BOZ06, a solid solution of 65% dioxane solution, was uniformly dispersed in a high-speed rotary mixer to prepare a resin varnish. Next, the resin varnish was applied onto polyethylene terephthalate (thickness: 38 μm) by a dye spin coater to make the thickness of the dried resin 40 μm, and dried at 80 to 120 ° C (average 100 ° C) for 6 minutes ( The amount of residual solvent was about 2% by mass). Then, a polypropylene film having a thickness of 15 μm was attached to the surface of the resin composition while being wound into a roll shape. The roll-like film was cut into a width of 507 mm, whereby a sheet-like film of 507 mm × 336 mm was obtained.

<實施例2><Example 2>

30份液狀雙酚A型環氧樹脂(環氧當量180,日本環氧樹脂(股)製「Epicote 828EL」)與30份聯苯型環氧樹脂(環氧當量291,日本化藥(股)製「NC3000H」)於15份MEK及15份環己酮中邊攪拌邊加熱溶解。於其中,混合80份之萘酚系硬化劑(東都化成(股)製之「SN485」,酚性羥基當量215)之固形分50%之MEK溶液、15份活性酯系硬化劑(大日本油墨化學工業(股)製之「EXB9451」,活性基當量223,固形分為65質量%之甲苯溶液)、0.1份硬化觸媒(四國化成工業(股)製,「2E4MZ」)、70份球形氧化矽(平均粒徑0.5μm,經胺基矽烷處理之「SO-C2」,Admatechs(股)製)、20份聚乙烯縮丁醛樹脂溶液(玻璃轉移溫度105℃,積水化學工業(股)製「KS-1」之固形分15%之乙醇與甲苯之1:1溶液)、20份苯氧基樹脂(分子量38,000,日本環氧樹脂(股)製「YX6954」,不揮發分30質量%之MEK與環己酮之1:1溶液)、15份之以式(1)表示之含磷苯并噁嗪(昭和高分子(股)製之HF-BOZ06,固形分65%之二噁烷溶液),以高速旋轉混合機均一分散,製作樹脂清漆。接著使用此樹脂清漆與實施例1完全一樣地獲得接著薄膜。30 parts of liquid bisphenol A type epoxy resin (epoxy equivalent 180, "Epicote 828EL" made by Nippon Epoxy Co., Ltd.) and 30 parts of biphenyl type epoxy resin (epoxy equivalent 291, Nippon Chemical Co., Ltd. The "NC3000H" system was heated and dissolved in 15 parts of MEK and 15 parts of cyclohexanone while stirring. Among them, 80 parts of a naphthol-based hardener ("SN485" manufactured by Tohto Kasei Co., Ltd.), a phenolic hydroxyl equivalent of 215), a solid component of 50% MEK solution, and 15 parts of an active ester-based hardener (Daily ink) "EXB9451" manufactured by Chemical Industry Co., Ltd., active base equivalent 223, solid content is divided into 65 mass% toluene solution, 0.1 part hardening catalyst ("European Chemical Industry Co., Ltd.", "2E4MZ"), 70 parts spherical Cerium oxide (average particle size 0.5 μm, "SO-C2" treated with amino decane, manufactured by Admatechs Co., Ltd.), 20 parts of polyvinyl butyral resin solution (glass transition temperature 105 ° C, Sekisui Chemical Industry Co., Ltd.) "KS-1" solids 15% ethanol and toluene 1:1 solution), 20 parts phenoxy resin (molecular weight 38,000, Japan Epoxy Resin Co., Ltd. "YX6954", non-volatile 30% by mass 1:1 solution of MEK and cyclohexanone), 15 parts of phosphorus-containing benzoxazine represented by formula (1) (HF-BOZ06 manufactured by Showa Polymer Co., Ltd., 65% solid content of dioxane) The solution was uniformly dispersed by a high-speed rotary mixer to prepare a resin varnish. Then, using this resin varnish, the following film was obtained in exactly the same manner as in Example 1.

<比較例1><Comparative Example 1>

於實施例1記載之樹脂清漆中,除不添加8份含磷苯并噁嗪(昭和高分子(股)製之HF-BOZ06,固形分65%之二噁烷溶液)以外,其餘完全相同,獲得接著薄膜。The resin varnish described in Example 1 was completely the same except that 8 parts of phosphorus-containing benzoxazine (HF-BOZ06 manufactured by Showa Polymer Co., Ltd., 65% solid solution of dioxane) was added. A follow-up film was obtained.

<比較例2><Comparative Example 2>

30份液狀雙酚A型環氧樹脂(環氧當量180,日本環氧樹脂(股)製「Epicote 828EL」)與30份含磷環氧樹脂(環氧當量306,東都化成(股)製「FX289」)於15份MEK及15份環己酮中邊攪拌邊加熱溶解。於其中,混合100份之萘酚系硬化劑(東都化成(股)製之「SN485」,酚性羥基當量215)之固形分50%之MEK溶液、0.1份硬化觸媒(四國化成工業(股)製,「2E4MZ」)、70份球形氧化矽(平均粒徑0.5μm,經胺基矽烷處理之「SO-C2」,Admatechs(股)製)、20份聚乙烯縮丁醛樹脂溶液(玻璃轉移溫度105℃,積水化學工業(股)製「KS-1」之固形分15%之乙醇與甲苯之1:1溶液)、20份苯氧基樹脂(分子量38,000,日本環氧樹脂(股)製「YX6954」,不揮發分30質量%之MEK與環己酮之1:1溶液),以高速旋轉混合機均一分散,製作樹脂清漆。接著使用此樹脂清漆與實施例1完全一樣地獲得接著薄膜。30 parts of liquid bisphenol A type epoxy resin (epoxy equivalent 180, "Epicote 828EL" made by Nippon Epoxy Co., Ltd.) and 30 parts of phosphorus-containing epoxy resin (epoxy equivalent 306, manufactured by Tohto Kasei Co., Ltd.) "FX289") was dissolved by heating in 15 parts of MEK and 15 parts of cyclohexanone while stirring. Among them, 100 parts of a naphthol-based hardener ("SN485" manufactured by Tohto Kasei Co., Ltd.), a phenolic hydroxyl equivalent of 215), a solid solution of 50% MEK solution, and 0.1 part of a hardening catalyst (Four Nations Chemical Industry Co., Ltd.) )), "2E4MZ"), 70 parts of spherical cerium oxide (average particle size 0.5μm, "SO-C2" treated with amino decane, manufactured by Admatechs), 20 parts of polyvinyl butyral resin solution ( Glass transfer temperature 105 ° C, Sekisui Chemical Industry Co., Ltd. "KS-1" solids 15% ethanol and toluene 1:1 solution), 20 parts phenoxy resin (molecular weight 38,000, Japanese epoxy resin "YX6954", a 1:1 solution of MEK and cyclohexanone having a nonvolatile content of 30% by mass, was uniformly dispersed by a high-speed rotary mixer to prepare a resin varnish. Then, using this resin varnish, the following film was obtained in exactly the same manner as in Example 1.

<比較例3><Comparative Example 3>

於實施例1記載之樹脂清漆中,除8份含磷苯并噁嗪(昭和高分子(股)製之HF-BOZ06,固形分65%之二噁烷溶液)變更為8份磷系難燃劑(三光(股)製之HCA-HQ-HS)以外,其餘完全相同,獲得接著薄膜。In the resin varnish described in Example 1, 8 parts of phosphorus-containing benzoxazine (HF-BOZ06 manufactured by Showa Polymer Co., Ltd., 65% solid solution of dioxane) was changed to 8 parts of phosphorus-based flame retardant. Except for the agent (HCA-HQ-HS manufactured by Sanguang Co., Ltd.), the others were identical, and a film was obtained.

<剝離強度及Ra值測定用樣品之調製><Modulation of sample for peel strength and Ra value measurement> (1)層合板之底層處理(1) Underlayer treatment of laminate

將形成內層電路之玻璃布基材環氧樹脂兩面貼銅層合板[銅箔厚度18μm,基板厚度0.3mm,松下電工(股)製R5715ES]之兩面浸漬於有機酸系蝕刻劑(Mecc(股)製,CZ8100)中,對銅表面進行粗糙化處理。The glass cloth substrate of the inner layer circuit is immersed in an organic acid etchant (Mecc) on both sides of a copper laminate (copper foil thickness: 18 μm, substrate thickness: 0.3 mm, and Matsushita Electric Co., Ltd. R5715ES). In the system, CZ8100), the copper surface is roughened.

(2)接著薄膜之層合(2) followed by lamination of the film

以實施例及比較例作成之接著薄膜,使用批式真空加壓層合機MVLP-500(名機(股)製商品名),層合在層合板兩面上。層合係藉由在30秒內減壓至氣壓成為13hPa以下,隨後於30秒內,以100℃、壓力0.74MPa加壓而進行。The adhesive film prepared in the examples and the comparative examples was laminated on both sides of the laminate using a batch vacuum pressure laminator MVLP-500 (trade name, manufactured by a famous machine). The lamination system was carried out by depressurizing to a gas pressure of 30 hPa or less in 30 seconds, followed by pressurization at 100 ° C and a pressure of 0.74 MPa in 30 seconds.

(3)樹脂組成物之硬化(3) Hardening of resin composition

自經層合之接著薄膜剝離PET薄膜,在180℃、30分鐘之硬化條件使樹脂組成物硬化。The resin composition was cured by a film-peeled PET film which was laminated and laminated at 180 ° C for 30 minutes.

(4)粗糙化處理(4) roughening treatment

層合板浸漬於膨潤液之日本Atotech(股)之含有二乙二醇單丁基醚之Sering Dip.SecurGund P中,接著浸漬於粗糙化液之日本Atotech(股)之Concentrate.Compact P(KMnO4 :60g/L,NaOH:40g/L之水溶液)中,最後於中和液之日本Atotech(股)之Reduction Solution.SecurGund P中於40℃浸漬5分鐘。粗糙化條件:於膨潤液中60℃浸漬5分鐘,於粗糙化液中80℃浸漬20分鐘。對該粗糙化處理後之層合板,進行表面粗糙度(Ra值)測定。The laminate is immersed in a swelling solution of Atotech Co., Ltd. in Japan, containing Diethylene glycol monobutyl ether, Sering Dip. In SecurGund P, Concentrate is then immersed in the roughening liquid of Atotech Japan. Compact P (KMnO 4 : 60g / L, NaOH: 40g / L aqueous solution), and finally in the neutralizing solution of Japan Atotech (stock) Reduction Solution. The SecurGund P was immersed at 40 ° C for 5 minutes. Roughening conditions: immersed in a swelling solution at 60 ° C for 5 minutes, and immersed in a roughening solution at 80 ° C for 20 minutes. The surface roughness (Ra value) of the laminate after the roughening treatment was measured.

(5)依據半加成方法之電鍍(5) Electroplating according to the semi-additive method

為在絕緣層表面形成電路,將層合板浸漬於含有PdCl2 之無電解電鍍用溶液中,接著浸漬於無電解鍍銅液中。於150℃加熱30分鐘進行退火處理後,形成蝕刻阻劑,藉由蝕刻形成圖型後,進行硫酸銅電解電鍍,形成30±5μm厚之導體層。接著,於180℃進行退火處理60分鐘。對此層合板測定鍍銅之剝離強度。In order to form a circuit on the surface of the insulating layer, the laminate was immersed in a solution for electroless plating containing PdCl 2 and then immersed in an electroless copper plating solution. After annealing at 150 ° C for 30 minutes, an etching resist was formed, and a pattern was formed by etching, and then copper sulfate electrolytic plating was performed to form a conductor layer having a thickness of 30 ± 5 μm. Next, annealing treatment was performed at 180 ° C for 60 minutes. The laminate was tested for peel strength of copper plating.

<電鍍導體層剝離強度(剝離強度)之測定><Measurement of peeling strength (peeling strength) of electroplated conductor layer>

於層合板之導體層上,切成寬10mm、長100mm之部分,剝離其一端並以捏具夾住,在室溫下,以50mm/分鐘之速度,測定對於層合板略垂直方向剝離35mm時之荷重。On the conductor layer of the laminate, cut into a portion having a width of 10 mm and a length of 100 mm, peeling off one end thereof and sandwiching it with a jig, and measuring at a temperature of 50 mm/min at room temperature for peeling 35 mm in a vertical direction of the laminate. The load is heavy.

<粗糙化後表面粗糙度(Ra值)之測定><Measurement of surface roughness (Ra value) after roughening>

使用非接觸型表面粗糙度計(Veeco儀器公司製WYKO NT3300),自藉由VSI接觸模式、50倍透鏡以121μm×92μm為測定範圍所得之數值求得Ra值。又藉由求得10點平均粗糙度而測定。Using a non-contact surface roughness meter (WYKO NT3300, manufactured by Veeco Instruments Co., Ltd.), the Ra value was obtained from a value obtained by a VSI contact mode and a 50-fold lens with a measurement range of 121 μm × 92 μm. It was also measured by obtaining a 10-point average roughness.

<難燃性試驗用樣品之調製><Preparation of sample for flame retardancy test> (1)層合板之底層處理(1) Underlayer treatment of laminate

於玻璃布基材環氧樹脂層合板[銅箔蝕刻除之產品,基板厚度0.3mm,松下電工(股)製R5715ES]之兩面上,將實施例及比較例作成之接著薄膜,使用批式真空加壓層合機MVLP-500(名機(股)製商品名),層合於層合板之兩面上。層合係於30秒內減壓至氣壓為13hPa以下,之後於30秒內,於100℃、壓力0.74Mpa進行壓著。自經層合之接著薄膜剝離PET薄膜後,於其上以相同條件進而層合2次該相同接著薄膜。For the glass cloth substrate epoxy resin laminate (product of copper foil etching, substrate thickness 0.3 mm, R5715ES manufactured by Matsushita Electric Works Co., Ltd.), the examples and comparative examples were used as the film, and a batch vacuum was used. A pressure laminator MVLP-500 (trade name, manufactured by a famous machine) was laminated on both sides of the laminate. The laminate was depressurized to a pressure of 13 hPa or less in 30 seconds, and then pressed at 100 ° C and a pressure of 0.74 MPa in 30 seconds. After the PET film was peeled off from the laminated film, the same film was laminated thereon twice under the same conditions.

(2)樹脂組成物之硬化(2) Hardening of resin composition

於最後自層合之接著膜剝離PET薄膜,以180℃、90分鐘之硬化條件使樹脂組成物硬化。其後,切斷成12.7mm×127mm之尺寸作為UL難燃性試驗用,其端面以砂紙(最初為#1200,接著使用#2800)予以研磨,於基材厚度0.3mm單面上層合絕緣層120μm製作燃燒性試驗用試驗片。隨後,依據UL耐火性試驗規格,進行94V0或94V1之評價。The PET film was peeled off from the film which was laminated at the last, and the resin composition was hardened at 180 ° C for 90 minutes. Thereafter, it was cut into a size of 12.7 mm × 127 mm for UL flame retardancy test, and the end surface was ground with sandpaper (originally #1200, then #2800), and the insulating layer was laminated on one side of the substrate thickness of 0.3 mm. A test piece for a flammability test was prepared at 120 μm. Subsequently, an evaluation of 94 V0 or 94 V1 was performed in accordance with the UL fire resistance test specification.

使用以實施例及比較例所得之接著薄膜之評價樣品之電鍍導體層之剝離強度及粗糙化後之表面粗糙度(Ra值)結果記載於表1。如由表1所了解,本發明中使用含磷苯并噁嗪化合物之實施例之評價樣品,為低粗糙度且高剝離強度,難燃性為V0而為優良。又,於不使用含磷苯并噁嗪化合物之比較例1之情況,獲得雖剝離強度較高,但難燃性變差,粗糙度變大之結果。再者,替代本發明中之含磷苯并噁嗪化合物而使用其他含磷化合物之比較例2及3之情況,獲得雖剝離強度較高,但為獲得如此高的剝離強度,粗糙度應變大之結果。The peeling strength of the plated conductor layer and the surface roughness (Ra value) after roughening of the evaluation sample of the adhesive film obtained by the Example and the comparative example are shown in Table 1. As is understood from Table 1, the evaluation sample of the example using the phosphorus-containing benzoxazine compound in the present invention is excellent in low roughness and high peel strength, and the flame retardancy is V0. Further, in the case of Comparative Example 1 in which the phosphorus-containing benzoxazine compound was not used, the peel strength was high, but the flame retardancy was deteriorated, and the roughness was increased. Further, in the case of Comparative Examples 2 and 3 in which other phosphorus-containing compounds were used instead of the phosphorus-containing benzoxazine compound in the present invention, the peel strength was obtained, but the peel strength was obtained, and the roughness strain was large. The result.

[產業上之利用可能性][Industry use possibility]

本發明之樹脂組成物,於由該樹脂組成物所調製之接著薄膜或預浸片可適當使用於作為多層印刷電路板,尤其是以(built-up)方式製造之多層印刷電路板之層間絕緣材料。The resin composition of the present invention, the film or prepreg prepared by the resin composition can be suitably used for interlayer insulation of a multilayer printed circuit board, in particular, a multilayer printed circuit board manufactured by a built-up method. material.

本申請案係以於日本申請之特願2007-245801作為基礎,其內容全部包含於本說明書中供參考。The present application is based on Japanese Patent Application No. 2007-245801, the entire disclosure of which is incorporated herein by reference.

Claims (14)

一種環氧樹脂組成物,其特徵為含有(A)環氧樹脂、(B)環氧硬化劑、(C)苯氧樹脂及/或聚乙烯縮醛樹脂以及(D)含有磷之苯并噁嗪化合物;該含磷之苯并噁嗪化合物為以下式(1)表示之含磷苯并噁嗪化合物: An epoxy resin composition characterized by comprising (A) an epoxy resin, (B) an epoxy hardener, (C) a phenoxy resin and/or a polyvinyl acetal resin, and (D) a benzoxazole containing phosphorus a azine compound; the phosphorus-containing benzoxazine compound is a phosphorus-containing benzoxazine compound represented by the following formula (1): 如申請專利範圍第1項之環氧樹脂組成物,其中該環氧硬化劑為由選自酚系硬化劑、萘酚系硬化劑及活性酯系硬化劑之1種以上之所構成之環氧硬化劑。 The epoxy resin composition according to the first aspect of the invention, wherein the epoxy curing agent is an epoxy resin comprising one or more selected from the group consisting of a phenolic curing agent, a naphthol curing agent, and an active ester curing agent. hardener. 如申請專利範圍第1項之環氧樹脂組成物,其中以該環氧樹脂組成物之不揮發成分作為100質量%時,成分(A)之含量為10~50質量%,成分(C)之含量為2~20質量%,以及成分(D)之含量為2~20質量%,且環氧硬化劑之反應基相對於環氧樹脂組成物中存在之1個環氧基之比例為1:0.5~1:1.1。 The epoxy resin composition according to the first aspect of the invention, wherein the content of the component (A) is 10 to 50% by mass, and the component (C) is used as the nonvolatile component of the epoxy resin composition. The content is 2 to 20% by mass, and the content of the component (D) is 2 to 20% by mass, and the ratio of the reactive group of the epoxy curing agent to the epoxy group present in the epoxy resin composition is 1: 0.5~1:1.1. 如申請專利範圍第1項之環氧樹脂組成物,其進而含有無機填充劑。 The epoxy resin composition of claim 1, which further contains an inorganic filler. 如申請專利範圍第4項之環氧樹脂組成物,其中以該環氧樹脂組成物之不揮發成分作為100質量%時,該無 機填充劑之含量為10~60質量%。 The epoxy resin composition of claim 4, wherein the non-volatile component of the epoxy resin composition is 100% by mass, The content of the filler is 10 to 60% by mass. 一種接著薄膜,其特徵係於支撐薄膜上形成有申請專利範圍第1至5項中任一項之環氧樹脂組成物之層而成者。 An adhesive film characterized in that a layer of an epoxy resin composition according to any one of claims 1 to 5 is formed on a support film. 一種預浸片,其特徵係於由纖維所構成薄片狀纖維基材中含浸有申請專利範圍第1至5項中任一項之環氧樹脂組成物而成者。 A prepreg characterized in that the sheet-like fibrous base material composed of fibers is impregnated with the epoxy resin composition according to any one of claims 1 to 5. 一種多層印刷電路板,其特徵係形成有由申請專利範圍第1至5項中任一項之環氧樹脂組成物的硬化物所成之絕緣層者。 A multilayer printed circuit board characterized in that an insulating layer formed of a cured product of the epoxy resin composition according to any one of claims 1 to 5 is formed. 一種多層印刷電路板之製造方法,其具有在內層電路基板上形成絕緣層之步驟以及在該絕緣層上形成導體層之步驟者,其特徵為該絕緣層係使申請專利範圍第1至5項中任一項之環氧樹脂組成物加以熱硬化所形成,該導體層係藉由於該絕緣層表面經粗糙化處理之粗糙化面上進行電鍍而形成。 A method of manufacturing a multilayer printed circuit board, comprising the steps of forming an insulating layer on an inner layer circuit substrate and forming a conductor layer on the insulating layer, wherein the insulating layer is in the scope of claims 1 to 5 The epoxy resin composition according to any one of the items is formed by thermal hardening, and the conductor layer is formed by electroplating on the roughened surface of the surface of the insulating layer which has been roughened. 一種多層印刷電路板之製造方法,其具有在內層電路基板上形成絕緣層之步驟以及在該絕緣層上形成導體層之步驟者,其特徵為具有絕緣層形成步驟、該絕緣層之粗面化步驟及對該粗面進行電鍍之步驟;該絕緣層形成步驟係具有於內層電路基板上層合申請專利範圍第6項之支持薄膜上之形成層之接著薄膜之步驟以及使環氧樹脂組成物熱硬化之步驟。 A method of manufacturing a multilayer printed circuit board having the steps of forming an insulating layer on an inner layer circuit substrate and forming a conductor layer on the insulating layer, characterized by having an insulating layer forming step and a rough surface of the insulating layer And a step of electroplating the rough surface; the insulating layer forming step is a step of laminating a film forming a layer on the support film of the sixth aspect of the patent application on the inner circuit substrate and forming the epoxy resin The step of thermal hardening. 一種多層印刷電路板之製造方法,其具有在內層 電路基板上形成絕緣層之步驟以及在該絕緣層上形成導體層之步驟者,其特徵為該絕緣層係在內層電路基板上層合申請專利範圍第7項之預浸片,使環氧樹脂組成物加以熱硬化所形成,該導體層係藉由於該絕緣層表面經粗糙化處理之粗糙化面上進行電鍍而形成。 A method of manufacturing a multilayer printed circuit board having an inner layer a step of forming an insulating layer on the circuit substrate and a step of forming a conductor layer on the insulating layer, wherein the insulating layer is laminated on the inner layer circuit substrate to prepreg the prepreg according to item 7 of the patent application, so that the epoxy resin The composition is formed by thermal hardening, and the conductor layer is formed by electroplating on the roughened surface of the surface of the insulating layer which has been roughened. 如申請專利範圍第9項之多層印刷電路板之製造方法,其中該粗糙化處理係使用鹼性過錳酸溶液而進行。 A method of producing a multilayer printed wiring board according to claim 9, wherein the roughening treatment is carried out using an alkaline permanganic acid solution. 如申請專利範圍第10項之多層印刷電路板之製造方法,其中粗面化步驟之粗糙化處理係使用鹼性過錳酸溶液而進行。 The method for producing a multilayer printed wiring board according to claim 10, wherein the roughening treatment is performed using an alkaline permanganic acid solution. 如申請專利範圍第11項之多層印刷電路板之製造方法,其中粗面化步驟之粗糙化處理係使用鹼性過錳酸溶液而進行。 The method for producing a multilayer printed wiring board according to claim 11, wherein the roughening treatment is performed using an alkaline permanganic acid solution.
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