TWI431698B - Packaging method - Google Patents
Packaging method Download PDFInfo
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- TWI431698B TWI431698B TW101114941A TW101114941A TWI431698B TW I431698 B TWI431698 B TW I431698B TW 101114941 A TW101114941 A TW 101114941A TW 101114941 A TW101114941 A TW 101114941A TW I431698 B TWI431698 B TW I431698B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/93—Batch processes
- H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L2224/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
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- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
Description
本發明是有關於一種封裝方法,且特別是有關於一種半導體元件的封裝方法。The present invention relates to a packaging method, and more particularly to a method of packaging a semiconductor device.
在現今的資訊社會中,電子產品的設計是朝向輕、薄、短、小的趨勢邁進,因此發展出諸如堆疊式半導體元件封裝等有利於微型化的封裝技術。In today's information society, electronic products are designed to be light, thin, short, and small, so that packaging technologies such as stacked semiconductor component packages that facilitate miniaturization have been developed.
於半導體封裝之加工製程中,封膠(molding)的主要目的為防止濕氣由外部侵入、與外部電氣絕緣、有效地將內部產生之熱排出於外部以及提供能夠手持之形體。一封膠過程大體上為將模具置於一具有半導體晶片或電子元件之基材上,再將固態的封膠塑料(Epoxy Molding Compound,EMC)加熱溶融成液態,經由柱塞(plunger)施予壓力進入該模具之模穴裡,使得封膠塑料密封住該基材上之晶片或電子元件以形成一完全氣密之封膠體,待封膠體硬化之後,再進行脫模完成封膠製程。In the semiconductor package processing process, the main purpose of the molding is to prevent moisture from intruding from the outside, electrically insulating from the outside, effectively discharging the heat generated inside to the outside, and providing a form that can be held by hand. The glue process is generally to place the mold on a substrate having a semiconductor wafer or an electronic component, and then melt the molten solid plastic (Epoxy Molding Compound, EMC) into a liquid state and apply it through a plunger. The pressure enters the cavity of the mold, so that the sealant plastic seals the wafer or electronic component on the substrate to form a completely airtight sealant. After the sealant is hardened, the mold release process is completed.
當一封裝構造大量生產時,一般係將複數個半導體晶片或電子元件設置於一封裝基材上,以同時進行封膠製程,接著,再對該封裝基材進行切割,以形成複數個封裝單元。然而,由於該封膠製程所使用之封膠塑料與該封裝基材之熱膨脹係數不同,因此在封膠後的硬化(curing)製程中,該封裝基材與該封膠塑料間係會隨溫度變化而產生不同的膨脹或收縮量而導致該封裝基材產生應力而翹曲(warpage);且當硬化時的溫度越高或時間越長,該封裝基材所產生的翹曲就越大,使得後續切割製程難以進行。此外,由於半導體晶片或電子元件設置在封裝基材上,因此半導體晶片或電子元件亦會承受一彎曲力矩,若該彎曲力矩太大,甚至會造成該半導體晶片或電子元件的損壞。When a package structure is mass-produced, a plurality of semiconductor wafers or electronic components are generally disposed on a package substrate to simultaneously perform a sealing process, and then the package substrate is cut to form a plurality of package units. . However, since the sealing plastic used in the sealing process differs from the thermal expansion coefficient of the packaging substrate, in the curing process after sealing, the sealing substrate and the sealing plastic are temperature-dependent. Varying to produce different amounts of expansion or contraction causes stress and warpage of the package substrate; and the higher the temperature or the longer the time of hardening, the greater the warpage generated by the package substrate. This makes the subsequent cutting process difficult. In addition, since the semiconductor wafer or the electronic component is disposed on the package substrate, the semiconductor wafer or the electronic component is also subjected to a bending moment, and if the bending moment is too large, the semiconductor wafer or the electronic component may be damaged.
本發明提供一種封裝方法,其可有效減少封裝產生之彎曲應力所造成之基材的翹曲變形。The present invention provides a packaging method which can effectively reduce warpage deformation of a substrate caused by bending stress generated by packaging.
本發明提出一種封裝方法,適於對安置在基材上的半導體元件進行封裝,封裝方法包括提供封裝模具,包括相對位置配置之上模具及下模具,下模具包括模穴,而模穴中已配置有多個絕緣顆粒,上模具與下模具之間具有間隔距離。安置基材於上模具上,且半導體元件對應下模具的模穴設置。對封裝模具、絕緣顆粒、基材及半導體元件進行第一微波烘烤步驟,以使絕緣顆粒形成熔融態封裝膠體。相對移近上模具與下模具,使熔融態封裝膠體包覆半導體元件且覆蓋部分基材。於熔融態封裝膠體包覆半導體元件且覆蓋部分基材後,進行第二微波烘烤步驟,以固化熔融態封裝膠體。The present invention provides a packaging method suitable for packaging a semiconductor component disposed on a substrate, the packaging method comprising providing a package mold, including a relative position configuration of the upper mold and the lower mold, the lower mold including the mold cavity, and the mold cavity has been It is provided with a plurality of insulating particles, and the upper mold and the lower mold have a separation distance. The substrate is placed on the upper mold, and the semiconductor component is disposed corresponding to the cavity of the lower mold. A first microwave baking step is performed on the package mold, the insulating particles, the substrate, and the semiconductor element to form the insulating particles into a molten encapsulated colloid. Relatively moving closer to the upper mold and the lower mold, the molten state encapsulant encapsulates the semiconductor element and covers a portion of the substrate. After the molten component encapsulates the semiconductor component and covers a portion of the substrate, a second microwave baking step is performed to cure the molten encapsulated colloid.
基於上述,本發明以微波烘烤步驟取代習知的加熱方式來固化熔融態之封裝膠體,形成固態之封裝膠體以封裝基材。微波烘烤的方式相較於習知的加熱方式,不僅可縮短加熱時間、降低加熱溫度、增加封裝效率、節省電力成本,且由於其所需之固化時間較短,可降低基材於固化過程產生之應力而造成之基材的翹曲變形,更可防止設置於基材上之半導體元件因基材的彎曲而造成損壞。故本發明可確實增加其封裝效率、降低電力成本並提高封裝良率。Based on the above, the present invention cures the encapsulated colloid in a molten state by a microwave baking step instead of a conventional heating method to form a solid encapsulant to encapsulate the substrate. Compared with the conventional heating method, the microwave baking method can not only shorten the heating time, lower the heating temperature, increase the packaging efficiency, save the power cost, but also reduce the substrate in the curing process due to the shorter curing time required. The warp deformation of the substrate caused by the generated stress prevents the semiconductor element provided on the substrate from being damaged by the bending of the substrate. Therefore, the present invention can surely increase its packaging efficiency, reduce power costs, and improve package yield.
為讓本發明之上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。The above described features and advantages of the present invention will be more apparent from the following description.
圖1為本發明之一實施例之一種封裝方法的流程圖。圖2至圖7為本發明之一實施例之一種封裝方法的剖面示意圖。請先同時參考圖1及圖2,本發明提供之封裝方法適於對安置在一基材200上的至少一半導體元件210進行封裝。其中,半導體元件210電性連接至基材200,且其可為晶圓、電晶體或記憶體元件等電子元件。在本實施例中,半導體元件210的數量為多個,陣列排列於基材200上,且至少其中之一半導體元件210為一具有穿矽孔(Through Silicone Via,TSV)之晶片堆疊結構。本實施例之封裝方法包括,實行步驟S110提供一封裝模具100,包括於相對位置配置之一上模具110及一下模具120,其中,下模具120包括一模穴122,而模穴122中已配置有多個絕緣顆粒300,且上模具110與下模具120之間具有一間隔距離D。而絕緣顆粒300分散配置於模穴122內,且絕緣顆粒300的材質可為環氧樹脂、矽膠等絕緣材。1 is a flow chart of a packaging method according to an embodiment of the present invention. 2 to 7 are schematic cross-sectional views showing a packaging method according to an embodiment of the present invention. Referring to FIG. 1 and FIG. 2 simultaneously, the packaging method provided by the present invention is suitable for packaging at least one semiconductor component 210 disposed on a substrate 200. The semiconductor component 210 is electrically connected to the substrate 200, and may be an electronic component such as a wafer, a transistor, or a memory component. In this embodiment, the number of the semiconductor elements 210 is plural, and the array is arranged on the substrate 200, and at least one of the semiconductor elements 210 is a wafer stack structure having a through silicon via (TSV). The encapsulation method of this embodiment includes performing a step S110 to provide a package mold 100, including one of the mold 110 and the lower mold 120, wherein the lower mold 120 includes a cavity 122, and the cavity 122 is configured. There are a plurality of insulating particles 300, and the upper mold 110 and the lower mold 120 have a separation distance D therebetween. The insulating particles 300 are disposed in the cavity 122, and the insulating particles 300 may be made of an insulating material such as epoxy resin or silicone rubber.
請參考圖3,實行步驟S120,安置基材200於上模具110上,且半導體元件210對應下模具120的模穴122設置。在本實施例中,安置基材200於上模具110上的方式為真空吸附,換言之,上模具110以真空吸附的方式吸附基材200,使基材200固定於上模具110。接著,實行步驟S130,如圖4及圖5所示,對封裝模具100、絕緣顆粒300、基材200以及半導體元件210進行一第一微波烘烤步驟M1,以使絕緣顆粒300形成一熔融狀態的封裝膠體310,亦可烘乾基材200上殘餘的水氣。Referring to FIG. 3, step S120 is performed to place the substrate 200 on the upper mold 110, and the semiconductor component 210 is disposed corresponding to the cavity 122 of the lower mold 120. In the present embodiment, the manner in which the substrate 200 is placed on the upper mold 110 is vacuum adsorption. In other words, the upper mold 110 adsorbs the substrate 200 by vacuum adsorption to fix the substrate 200 to the upper mold 110. Next, in step S130, as shown in FIG. 4 and FIG. 5, a first microwave baking step M1 is performed on the package mold 100, the insulating particles 300, the substrate 200, and the semiconductor element 210 to form the molten particles 300 in a molten state. The encapsulant 310 can also dry residual moisture on the substrate 200.
具體而言,本實施例之第一微波烘烤步驟M1中所使用之微波烘烤條件如下述:微波加熱的溫度介於30℃至100℃之間,微波加熱的時間介於1分鐘至2分鐘之間,以確保絕緣顆粒300均勻受熱而熔融。值得注意的是,本發明利用微波烘烤以進行絕緣顆粒300的熔融步驟,其相較習知的加熱方式,例如:熱耦器(thermocouple),具有許多習知難以實現的優點,例如:花費時間較短、效率較高且節省電力成本,更由於所需之加熱溫度較低,使材料加熱後的熔融結構質地均勻且穩定。Specifically, the microwave baking conditions used in the first microwave baking step M1 of the embodiment are as follows: the temperature of the microwave heating is between 30 ° C and 100 ° C, and the microwave heating time is between 1 minute and 2 Between the minutes, it is ensured that the insulating particles 300 are uniformly heated and melted. It is noted that the present invention utilizes microwave baking to perform the melting step of the insulating particles 300, which has many conventionally difficult advantages, such as cost, compared to conventional heating methods, such as thermocouples. The time is shorter, the efficiency is higher, and the power cost is saved. Moreover, the required heating temperature is lower, so that the molten structure after heating of the material is uniform and stable.
請同時參考圖5及圖6,實行步驟S140,相對移近上模具110與下模具120,而使熔融狀態的封裝膠體310包覆半導體元件210且覆蓋部分基材200。在本實施例中,上模具110更包括多個第一嵌合部112,而下模具120更包括多個第二嵌合部124,當相對移近上模具110與下模具120時,第一嵌合部112與第二嵌合部124對應嵌合,而使基材200、上模具110及下模具120構成一封閉空間S。接著,實行步驟S150,進行第二微波烘烤步驟M2,以固化熔融狀態的封裝膠體310而形成一固態封裝膠體320。Referring to FIG. 5 and FIG. 6 simultaneously, step S140 is performed to relatively move the upper mold 110 and the lower mold 120 to cover the semiconductor element 210 and cover part of the substrate 200 in a molten state. In the embodiment, the upper mold 110 further includes a plurality of first fitting portions 112, and the lower mold 120 further includes a plurality of second fitting portions 124. When relatively moving closer to the upper mold 110 and the lower mold 120, the first The fitting portion 112 is fitted to the second fitting portion 124, and the base material 200, the upper mold 110, and the lower mold 120 constitute a closed space S. Next, in step S150, a second microwave baking step M2 is performed to cure the encapsulated colloid 310 in a molten state to form a solid encapsulant 320.
具體而言,本實施例之第二微波烘烤步驟M2中所使用之微波烘烤條件如下述:微波加熱的溫度介於30℃至100℃之間,微波加熱的時間介於60分鐘至120分鐘之間。值得注意的是,本發明利用微波烘烤以進行熔融狀態的封裝膠體310的固化步驟,其相較習知的加熱方式,例如:熱耦器(thermocouple),具有許多習知難以實現的優點,例如:花費時間較短、效率較高且節省電力成本,更由於固化所需的時間較短,使得基材200與固態封裝膠體320間之部分應力得以釋放,進而降低其基材200之翹曲變形。Specifically, the microwave baking conditions used in the second microwave baking step M2 of the embodiment are as follows: the temperature of the microwave heating is between 30 ° C and 100 ° C, and the microwave heating time is between 60 minutes and 120. Between minutes. It is noted that the present invention utilizes microwave bake to perform the curing step of the encapsulant 310 in a molten state, which has many advantages that are conventionally difficult to achieve, compared to conventional heating methods, such as thermocouples. For example, it takes less time, is more efficient, and saves power costs. Moreover, due to the shorter time required for curing, part of the stress between the substrate 200 and the solid encapsulant 320 is released, thereby reducing the warpage of the substrate 200. Deformation.
最後,請參考圖7,相對移離上模具110與下模具120,以使模穴122內的固態封裝膠體320自下模具120分離,而完成封裝。由本實施例之封裝方法所製成之封裝結構,因其經過第一微波烘烤步驟M1,去除絕緣顆粒300間之空隙以及熔融狀態的封裝膠體310內之氣泡,故所形成之封裝結構可具有無表面空洞的平整表面。本發明更以第二微波烘烤步驟M2固化熔融狀態的封裝膠體310,其所需的固化時間較短,故可降低基材200因固化過程產生之應力而造成之翹曲變形。Finally, referring to FIG. 7, the upper mold 110 and the lower mold 120 are relatively moved to separate the solid encapsulant 320 in the cavity 122 from the lower mold 120 to complete the encapsulation. The package structure made by the encapsulation method of the embodiment has a space in which the gap between the insulating particles 300 and the bubbles in the molten state of the encapsulant 310 are removed by the first microwave baking step M1, so that the package structure formed can have A flat surface without surface voids. The invention further cures the encapsulated colloid 310 in a molten state by the second microwave baking step M2, and the required curing time is short, so that the warpage deformation of the substrate 200 due to the stress generated by the curing process can be reduced.
綜上所述,本發明以第一微波烘烤步驟來熔融絕緣顆粒,以形成熔融態之封裝膠體,並以第二微波烘烤步驟來固化熔融態之封裝膠體,形成固態之封裝膠體以封裝基材。微波烘烤的方式相較於習知的加熱方式,不僅可縮短加熱時間、降低加熱溫度、增加封裝效率、節省電力成本,且由於其所需之固化時間較短,可降低基材於固化過程產生之應力而造成之基材的翹曲變形,更可防止設置於基材上之半導體元件因基材的彎曲而造成損壞。故本發明之封裝方法可確實增加封裝效率、降低電力成本並提高封裝良率。In summary, the present invention melts the insulating particles by a first microwave baking step to form a molten colloid, and cures the molten colloid by a second microwave baking step to form a solid encapsulant for encapsulation. Substrate. Compared with the conventional heating method, the microwave baking method can not only shorten the heating time, lower the heating temperature, increase the packaging efficiency, save the power cost, but also reduce the substrate in the curing process due to the shorter curing time required. The warp deformation of the substrate caused by the generated stress prevents the semiconductor element provided on the substrate from being damaged by the bending of the substrate. Therefore, the packaging method of the present invention can surely increase packaging efficiency, reduce power cost, and improve package yield.
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,故本發明之保護範圍當視後附之申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the invention, and any one of ordinary skill in the art can make some modifications and refinements without departing from the spirit and scope of the invention. The scope of the invention is defined by the scope of the appended claims.
100...封裝模具100. . . Packaging mold
110...上模具110. . . Upper mold
112...第一嵌合部112. . . First fitting
120...下模具120. . . Lower mold
122...模穴122. . . Cavity
124...第二嵌合部124. . . Second fitting part
200...基材200. . . Substrate
210...半導體元件210. . . Semiconductor component
300...絕緣顆粒300. . . Insulating particles
310...熔融狀態封裝膠體310. . . Molten state encapsulant
320...固態封裝膠體320. . . Solid encapsulant
D...間隔距離D. . . Spacing distance
M1...第一微波烘烤步驟M1. . . First microwave baking step
M2...第二微波烘烤步驟M2. . . Second microwave baking step
S...封閉空間S. . . Closed space
S110~S150...步驟S110~S150. . . step
圖1為本發明之一實施例之一種封裝方法的流程圖。1 is a flow chart of a packaging method according to an embodiment of the present invention.
圖2至圖7為本發明之一實施例之一種封裝方法的剖面示意圖。2 to 7 are schematic cross-sectional views showing a packaging method according to an embodiment of the present invention.
S110~S150...步驟S110~S150. . . step
Claims (9)
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