TWI428065B - Copper foil for printed wiring board and manufacturing method thereof - Google Patents

Copper foil for printed wiring board and manufacturing method thereof Download PDF

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TWI428065B
TWI428065B TW099126930A TW99126930A TWI428065B TW I428065 B TWI428065 B TW I428065B TW 099126930 A TW099126930 A TW 099126930A TW 99126930 A TW99126930 A TW 99126930A TW I428065 B TWI428065 B TW I428065B
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printed wiring
wiring board
nickel
copper foil
plating layer
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TW099126930A
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TW201108883A (en
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Sh Copper Products Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/20Layered products comprising a layer of metal comprising aluminium or copper
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/321Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0346Organic insulating material consisting of one material containing N
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/08PCBs, i.e. printed circuit boards
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2222/00Aspects relating to chemical surface treatment of metallic material by reaction of the surface with a reactive medium
    • C23C2222/20Use of solutions containing silanes
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0137Materials
    • H05K2201/0154Polyimide

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  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Laminated Bodies (AREA)

Description

印刷配線板用銅箔及其製造方法Copper foil for printed wiring board and method of manufacturing same

本發明涉及一種印刷配線板用銅箔及其製造方法,係用於形成例如半導體裝置用帶載具(tape carrier)之類的印刷配線板之配線圖等各種導體圖案而黏貼、使用於例如由聚醯亞胺樹脂薄膜(polyimide resin film)所形成的絕緣性基材的表面,該印刷配線板銅箔係尤其適合於在圖案形成後,以穿透絕緣性基材觀看的方式進行該圖形位置識別之類的印刷配線板等。The present invention relates to a copper foil for a printed wiring board and a method for producing the same, which are used for forming various conductor patterns such as a wiring pattern of a printed wiring board such as a tape carrier for a semiconductor device, and are used for, for example, a surface of an insulating substrate formed of a polyimide resin film, the printed wiring board copper foil being particularly suitable for performing the pattern position in a manner of seeing through an insulating substrate after pattern formation A printed wiring board or the like for identification.

習知以來,作為用於形成印刷配線板的配線圖和所謂內部導線(inner lead)部等各種導體圖案的導體層一般係採用銅箔。Conventionally, as a conductor layer for forming a wiring pattern of a printed wiring board and various conductor patterns such as an inner lead portion, a copper foil is generally used.

尤其是在可撓式(flexible)印刷配線板領域中,係透過在由聚醯亞胺樹脂薄膜形成的絕緣性基材的表面上積層(laminate)數十微米至100μm左右的厚度的銅箔來形成可撓式印刷配線板用覆銅(copper clad)基板。或者有時通過在銅箔的一面塗佈以聚醯胺酸(polyamic acid)為主成分的清漆(varnish)至固化等來形成絕緣性基材層,以形成具有大約同樣特性的印刷配線板用覆銅基板。以後,對於此般通過在銅箔的表面塗佈清漆至固化等而形成的絕緣性基材層,也稱之為「印刷配線板用絕緣性基材」(或簡稱為絕緣性基材)。另外,無論是使用根據上述何種製法形成的絕緣性基材而成的基板,都將在絕緣性基材表面設有銅箔的基板總稱為「印刷配線板用覆銅基板」(或印刷配線板用覆金屬基板)(以社團法人日本印刷電路工業協會編寫的「印刷電路術語」,2006.6.7之41.1609「覆金屬基板」定義等為依據)。In particular, in the field of flexible printed wiring boards, a copper foil having a thickness of about several tens of micrometers to 100 μm is laminated on the surface of an insulating substrate formed of a polyimide film. A copper clad substrate for a flexible printed wiring board is formed. Alternatively, an insulating base material layer may be formed by applying a varnish containing polyamic acid as a main component to one side of the copper foil to form a printed wiring board having approximately the same characteristics. Copper clad substrate. In the following, the insulating base material layer formed by applying a varnish to the surface of the copper foil to cure or the like is also referred to as an "insulating substrate for a printed wiring board" (or simply an insulating substrate). In addition, the substrate in which the copper foil is provided on the surface of the insulating base material is collectively referred to as "copper substrate for printed wiring board" (or printed wiring). (metal-clad board for board) (based on the definition of "printed circuit terminology" by the Japan Printed Circuit Industry Association, 2006.6.7, 41.1609 "Metal-coated substrate").

銅箔與印刷配線板用絕緣性基材之間要求規定的黏著性(也稱為兩者間的面黏著強度或面接合性,以後僅以黏著強度或黏著性表示),因此在銅箔上,尤其是黏著面側實施粗糙化處理(roughening treatment)。The copper foil and the insulating base material for the printed wiring board require a predetermined adhesiveness (also referred to as surface adhesive strength or surface bondability between the two, and will be expressed only by adhesive strength or adhesiveness), so that it is on the copper foil. In particular, the tacking side is subjected to a roughening treatment.

對於銅箔而言,根據其製造方法係大致區分為電解銅箔和壓延銅箔,但是無論何種,就粗糙化處理而言都採用同樣的方法。該方法包括:例如通過所謂燒鍍使微細米粒狀的銅(Cu)粒子附著於銅箔表面的方法;或通過酸進行晶界(grain boundary)的選擇性蝕刻的方法。The copper foil is roughly classified into an electrolytic copper foil and a rolled copper foil according to the manufacturing method thereof, but the same method is used for the roughening treatment. The method includes, for example, a method of attaching fine rice grain-shaped copper (Cu) particles to a surface of a copper foil by so-called baking, or a method of selectively etching a grain boundary by an acid.

對於通過燒鍍進行的粗糙化處理而言,除了採用一般的銅電鍍法的製程(process)之外,業已提出利用以銅(Cu)-鎳(Ni)合金電鍍為代表的合金電鍍法的製程等方案(專利文獻1)。For the roughening treatment by baking, in addition to the process of the general copper plating method, a process using an alloy plating method typified by copper (Cu)-nickel (Ni) alloy plating has been proposed. Etc. (Patent Document 1).

作為用於提高銅箔與印刷配線板用絕緣性基材的黏著性的方法,除了通過如上述般的粗糙化處理來有效地利用固著效果(anchor effect)之外,還存有對作為原箔的銅箔實施表面處理,即在銅箔的表面設置對聚醯亞胺樹脂那般的絕緣性有機化合物之化學黏著性較高之金屬層的方法。具體而言,被稱作「鉻酸鹽處理」(chromate treatment)的化成處理法(conversion treatment)、或矽烷偶合處理法(silane coupling treatment)等皆為其一典型的例子,這些在提高黏著性的同時還兼有銅箔表面防鏽的作用。As a method for improving the adhesion between the copper foil and the insulating base material for a printed wiring board, in addition to the roughening treatment as described above, the anchor effect is effectively utilized, and the pair remains as the original. The copper foil of the foil is subjected to a surface treatment, that is, a method of providing a metal layer having a high chemical adhesion to an insulating organic compound such as a polyimide resin on the surface of the copper foil. Specifically, a conversion treatment called "chromate treatment" or a silane coupling treatment is a typical example, and these are improving adhesion. At the same time, it also has the effect of anti-rust on the surface of the copper foil.

迄今為止,吾人(本發明的申請人)深入持續地對與印刷配線板用絕緣性基材之黏著性高且耐熱性、耐濕性亦良好的印刷配線板用銅箔進行技術開發,而且提出了與用於實現該銅箔的技術相關的各種方案(專利文獻2、3)。In the past, the present inventors have developed a technology for developing a copper foil for printed wiring boards having high adhesion to an insulating substrate for a printed wiring board and excellent heat resistance and moisture resistance. Various schemes related to the technique for realizing the copper foil (Patent Documents 2 and 3).

近年來,可撓式印刷配線板的配線圖的線寬和間距(pitch)有進一步向微細化發展的傾向,而且再加上印刷配線板的整體外形尺寸的進一步小型化,也開始經常進行在印刷配線板上直接安裝IC(半導體積體電路;以下簡稱為IC)之類的半導體裝置。In recent years, the line width and the pitch of the wiring pattern of the flexible printed wiring board tend to be further refined, and further miniaturization of the overall outer dimensions of the printed wiring board has begun to be carried out frequently. A semiconductor device such as an IC (Semiconductor Integrated Circuit; hereinafter abbreviated as IC) is directly mounted on the printed wiring board.

在安裝此種半導體裝置時,需要進行用於焊接(bonding)的位置對準等,該位置的精確調整係藉由識別穿透(所謂「透過」)絕緣性基材來以目視確認或光學方式進行檢測的配線圖或內部導線部等導體圖案來進行。In the mounting of such a semiconductor device, it is necessary to perform alignment for bonding, etc., and the precise adjustment of the position is visually confirmed or optically by identifying a penetrating (so-called "transmission") insulating substrate. A conductor pattern such as a wiring pattern or an internal lead portion is detected.

惟,如果配線圖或其他各種導體圖案更加微細化,則與此對應所要求之用於焊接的位置對準(定位)的精度也難以避免要變得更高。因此,對於印刷配線板用銅箔而言,要求穿透絕緣性基材觀看時的高目視確認性(或憑藉攝影裝置在可見光領域的光學識別可能性,以下有時將這些概括統稱「目視確認性」)係更甚以往。However, if the wiring pattern or other various conductor patterns are further miniaturized, the accuracy of the positional alignment (positioning) required for welding corresponding thereto is hard to avoid becoming higher. Therefore, the copper foil for printed wiring boards is required to have high visibility when viewed through an insulating substrate (or the possibility of optical recognition by the imaging device in the visible light field, and the following is generally referred to as "visual confirmation". ")" is more than ever.

為了得到這樣的高目視確認性,一般認為對銅箔實施黑化處理(黑色氧化處理,black oxide coating)係有效的。In order to obtain such high visibility, it is considered that it is effective to apply a blackening treatment (black oxide coating) to the copper foil.

另外,作為上述黑化處理以外的對策業已提出如下方法:雖此非為相關於印刷配線板用銅箔之技術,而是相關於PDP(電漿顯示面板)等FPD(平面顯示器)用銅箔等的技術,惟通過在銅箔的表面以簡單的鈷(Co)電鍍形成鈷鍍層,便可以看出該銅箔表面的色調即使在透明化處理前為灰色,透明化處理後卻實質上為黑色(專利文獻4)。In addition, as a countermeasure other than the above-described blackening treatment, a method has been proposed which is not related to a copper foil for a printed wiring board, but is related to a copper foil for an FPD (planar display) such as a PDP (plasma display panel). Etc., but by forming a cobalt coating on the surface of the copper foil by simple cobalt (Co) plating, it can be seen that the color tone of the surface of the copper foil is gray even before the transparent treatment, and the transparent treatment is substantially Black (Patent Document 4).

【先前技術文獻】[Previous Technical Literature]

【專利文獻1】日本特開昭52-145769號公報[Patent Document 1] Japanese Patent Laid-Open No. 52-145769

【專利文獻2】日本特開2006-319286號公報[Patent Document 2] Japanese Patent Laid-Open Publication No. 2006-319286

【專利文獻3】日本特開2007-119902號公報[Patent Document 3] Japanese Patent Laid-Open Publication No. 2007-119902

【專利文獻4】日本特開2005-248221號公報[Patent Document 4] Japanese Patent Laid-Open Publication No. 2005-248221

然而,對於黑化處理而言,由於其附著量愈多,其黑化粒子愈容易從銅箔的表面脫落,因此,若是為了得到高目視確認性而實施充分的黑化處理,則存在易於發生被稱為所謂「掉粉」的現象,甚至由於這種掉粉而使得導體圖案的目視確認性反而降低的問題。另外,不僅如此,還存在如下問題:因黑化處理導致的掉粉會成為污染該製程之後的印刷配線板的製造步驟並發生配線圖的形成不良、斷線不良等各種製造不良的重要原因。However, in the blackening treatment, the more the amount of adhesion is, the more easily the blackened particles are detached from the surface of the copper foil. Therefore, if a sufficient blackening treatment is performed in order to obtain high visual confirmation, it is liable to occur. It is called the phenomenon of "dropping powder", and even the problem of the visual confirmation of the conductor pattern is lowered due to such powder drop. In addition, there is a problem in that the powder falling due to the blackening treatment is an important cause of various manufacturing defects such as a defective manufacturing process of the printed wiring board after the process and a defective formation of the wiring pattern and a disconnection failure.

另外,藉由透過透明玻璃基板等且實質上主要是以背光或自發光元件自身的光進行影像上目視確認之用於FPD之類的銅箔的表面的色調,成為看起來呈灰色或黑色那般的顏色的方面來看,在銅箔的表面通過簡單的鈷(Co)電鍍形成鈷鍍層之專利文獻4中所提出的方法係為與作為本發明對象之印刷配線板用銅箔在技術領域、和所解決之問題完全不同的技術,因此,此種技術是否能夠適用於提高穿透聚醯亞胺樹脂薄膜之類的絕緣性基材觀看時之銅箔的目視確認性係完全未知的。In addition, the color tone of the surface of the copper foil for FPD, which is visually confirmed by the light transmitted through the transparent glass substrate or the like substantially by the backlight or the light of the self-luminous element itself, becomes gray or black. In the aspect of the color, the method proposed in Patent Document 4 for forming a cobalt plating layer by simple cobalt (Co) plating on the surface of a copper foil is a copper foil for a printed wiring board which is the object of the present invention. The technique is completely different from the problem to be solved. Therefore, whether the technique can be applied to improve the visual confirmation of the copper foil when the insulating substrate such as the polyimide film is penetrated is completely unknown.

而且,憑藉這樣的簡單的鈷電鍍進行處理時,作為印刷配線板用銅箔存在如下致命的問題:即,在伴隨印刷配線板的蝕刻(etching)及錫(Sn)電鍍的步驟中,從鈷鍍層溶出鈷(Co)而產生被稱之為所謂滲入的現象和剝離等的可能性極高,進而成為尤其是使配線間隔狹窄之印刷配線板的配線電路系的可靠性顯著受損的重要原因。Further, when the film is processed by such simple cobalt plating, the copper foil for a printed wiring board has a fatal problem in that, in the step of etching (etching) and tin (Sn) plating of the printed wiring board, cobalt is used. It is highly probable that cobalt (Co) is eluted from the plating layer to cause so-called infiltration, peeling, and the like, and further, the reliability of the wiring circuit system of the printed wiring board having a narrow wiring interval is significantly impaired. .

本發明係鑑於此課題而完成,其目的在於提供一種印刷配線板用銅箔及其製造方法,該印刷配線板用銅箔具有穿透絕緣性基材觀看時的高目視確認性,且在印刷配線板的製造步驟中,不會有發生如黑化處理的情況般的滲入和剝離等之虞。The present invention has been made in view of the above problems, and an object of the invention is to provide a copper foil for a printed wiring board which has high visibility when viewed through an insulating substrate and which is printed, and a method for producing the same In the manufacturing process of the wiring board, there is no possibility of infiltration, peeling, or the like in the case of blackening treatment.

本發明之印刷配線板用銅箔係為在印刷配線板上為了形成導體圖案而用來黏貼於絕緣性基材之表面上而設定的印刷配線板用銅箔,其特徵為具有使藉由所述絕緣性基材進行光學檢測之該印刷配線板用銅箔的表面的彩度(基於日本工業規格JIS Z8729)c* =(a*2 +b*2 )1/2 為6以下的鎳鈷合金鍍層。The copper foil for a printed wiring board of the present invention is a copper foil for a printed wiring board which is set to be adhered to the surface of an insulating substrate for forming a conductor pattern on a printed wiring board, and is characterized in that it has a The chroma of the surface of the copper foil for the printed wiring board (the Japanese industrial standard JIS Z8729) c * = (a *2 + b * 2 ) 1/2 is 6 or less nickel cobalt Alloy plating.

另外,本發明之印刷配線板用銅箔係為在印刷配線板上為了形成導體圖案而用來黏貼於絕緣性基材之表面上而設定的印刷配線板用銅箔,其特徵為在由銅(Cu)或銅基合金形成的原箔的表面上具有鎳鈷合金鍍層,所述鎳鈷合金鍍層係由鎳(Ni)和鈷(Co)的合金的電鍍皮膜形成,其中,鈷(Co)的濃度為20質量%以上且小於55質量%,並且鎳(Ni)和鈷(Co)的合計附著量為20μg/cm2 以上且小於40μg/cm2In addition, the copper foil for a printed wiring board of the present invention is a copper foil for a printed wiring board which is set to be bonded to the surface of an insulating base material in order to form a conductor pattern on a printed wiring board, and is characterized in that it is made of copper. The surface of the original foil formed of (Cu) or a copper-based alloy has a nickel-cobalt alloy plating layer formed of an electroplated coating of an alloy of nickel (Ni) and cobalt (Co), wherein cobalt (Co) The concentration is 20% by mass or more and less than 55% by mass, and the total adhesion amount of nickel (Ni) and cobalt (Co) is 20 μg/cm 2 or more and less than 40 μg/cm 2 .

本發明之印刷配線板用銅箔之製造方法係為在印刷配線板上為了形成導體圖案而用來黏貼於絕緣性基材之表面上而設定的印刷配線板用銅箔之製造方法,其特徵為包含:在由銅(Cu)或銅基合金形成的原箔的表面上形成鎳鈷合金鍍層的步驟,該鎳鈷合金鍍層由鎳(Ni)和鈷(Co)的合金的電鍍皮膜形成,鈷(Co)的濃度為20質量%以上且小於55質量%,並且鎳(Ni)和鈷(Co)的合計附著量為20μg/cm2 以上且小於40μg/cm2 ;在所述鎳鈷合金鍍層上形成由鋅(Zn)的電鍍皮膜形成的鋅鍍層的步驟;在所述鋅鍍層上形成3價鉻酸鹽處理層的步驟;在形成所述3價鉻酸鹽處理層後,於該3價鉻酸鹽處理層的表面塗佈矽烷偶合劑的水溶液,在乾燥氛圍溫度為150℃以上300℃以下進行加熱乾燥而形成矽烷偶合處理層的步驟。The method for producing a copper foil for a printed wiring board according to the present invention is a method for producing a copper foil for a printed wiring board which is set on a surface of a printed wiring board for bonding a conductive pattern to a surface of an insulating substrate. The method comprising: forming a nickel-cobalt alloy plating layer on a surface of a raw foil formed of copper (Cu) or a copper-based alloy, the nickel-cobalt alloy plating layer being formed of an electroplated film of an alloy of nickel (Ni) and cobalt (Co), The concentration of cobalt (Co) is 20% by mass or more and less than 55% by mass, and the total adhesion amount of nickel (Ni) and cobalt (Co) is 20 μg/cm 2 or more and less than 40 μg/cm 2 ; in the nickel-cobalt alloy a step of forming a zinc plating layer formed of an electroplated film of zinc (Zn) on the plating layer; a step of forming a trivalent chromate treatment layer on the zinc plating layer; and after forming the trivalent chromate treatment layer, The surface of the trivalent chromate-treated layer is coated with an aqueous solution of a decane coupling agent, and dried in a dry atmosphere at a temperature of from 150 ° C to 300 ° C to form a decane coupling treatment layer.

此處,上述「用來黏貼於絕緣性基材之表面上而設定的印刷配線板用銅箔」係指如下兩種銅箔:以在例如薄膜(film)狀或片(sheet)狀絕緣性基材的表面上積層而形成所謂覆銅基板的方式使用的印刷配線板用銅箔,以及如下方式使用的印刷配線板用銅箔:通過在銅箔的一面上塗佈至固化(cure)例如以聚醯胺酸為主成分的清漆等形成絕緣性基材層,以此為絕緣性基材,結果形成如同銅箔黏貼(黏著)於絕緣性基材表面的構造。Here, the "copper foil for a printed wiring board which is set to be adhered to the surface of an insulating substrate" means two types of copper foils, for example, in the form of a film or a sheet. A copper foil for a printed wiring board used to form a so-called copper-clad substrate on the surface of the substrate, and a copper foil for a printed wiring board used as follows: by coating on one surface of the copper foil to cure, for example An insulating base material layer is formed of a varnish or the like which is a polyglycine as a main component, and this is an insulating base material, and as a result, a structure in which a copper foil is adhered (adhered) to the surface of an insulating base material is formed.

根據本發明,由於不進行極可能發生滲入和剝離等的黑化處理,並使之具有藉由絕緣性基材進行光學檢測之該印刷配線板用銅箔的表面的彩度(基於日本工業規格JIS Z8729)c* =(a*2 +b*2 )1/2 為6以下的鎳鈷合金鍍層,因此能夠使穿透以聚醯亞胺為代表之絕緣性基材觀看時的顏色(基於日本工業規格JIS Z8729)成為如可觀察到例如與黑色的色差ΔE* ab為3以內那般的表面,結果能夠實現如下的印刷配線板用銅箔:其在安裝半導體晶片(semiconductor chip)時進行位置對準之際等情況下,具有於藉由絕緣性基材進行所謂穿透觀看之狀態下的足夠高的目視確認性,且能夠形成在印刷配線板的製造步驟中無發生滲入和剝離等之虞的導體圖案。According to the present invention, the blackening treatment such as penetration and peeling is unlikely to occur, and the chroma of the surface of the copper foil for a printed wiring board which is optically detected by an insulating substrate (based on Japanese Industrial Standards) JIS Z8729)c * = (a *2 +b *2 ) 1/2 is a nickel-cobalt alloy plating layer of 6 or less, so that the color can be observed when penetrating an insulating substrate typified by polyimine (based on Japanese Industrial Standard JIS Z8729) is a surface in which, for example, a color difference ΔE * ab with black is observed to be within 3, as a result, it is possible to realize a copper foil for a printed wiring board which is mounted on a semiconductor chip (semiconductor chip) When the position is aligned, it is sufficiently visually identifiable in a state of so-called penetration observation by an insulating base material, and it is possible to form no penetration or peeling in the manufacturing process of the printed wiring board. The conductor pattern after that.

以下參照附圖,對本實施方式相關的印刷配線板用銅箔及其製造方法以及印刷配線板進行說明。Hereinafter, a copper foil for a printed wiring board according to the present embodiment, a method for manufacturing the same, and a printed wiring board will be described with reference to the drawings.

該印刷配線板用銅箔係具備積層結構作為其主要部分,所述積層結構係在原箔1的表面上依次積層粗糙化鍍層2、Ni-Co(鎳鈷)合金鍍層3、Zn(鋅)鍍層4、鉻酸鹽處理層5、矽烷偶合處理層6而成,為了形成印刷配線板的導體圖案,作為一個典型例子係用來黏貼於聚醯亞胺樹脂薄膜之類的絕緣性基材(省略圖示)的表面而設定者。The copper foil for a printed wiring board has a laminated structure in which a roughened plating layer 2, a Ni-Co (nickel-cobalt) alloy plating layer 3, and a Zn (zinc) plating layer are sequentially laminated on the surface of the original foil 1. 4. A chromate treatment layer 5 and a decane coupling treatment layer 6 are formed. In order to form a conductor pattern of a printed wiring board, a typical example is used for adhering to an insulating substrate such as a polyimide film. Set the surface of the illustration).

原箔1為由銅(Cu)或銅基合金形成的銅箔。對於該原箔1本身而言,可以使用一般壓延銅箔或電解銅箔,所述銅箔係由純銅或銅基合金形成,用於一般的印刷配線板、可撓式印刷配線板或半導體裝置用帶載具等。The original foil 1 is a copper foil formed of copper (Cu) or a copper-based alloy. For the original foil 1 itself, a generally rolled copper foil or an electrolytic copper foil which is formed of pure copper or a copper-based alloy for use in a general printed wiring board, a flexible printed wiring board or a semiconductor device can be used. Use a belt carrier, etc.

但是,當具有該原箔1的印刷配線板用銅箔為用於形成如可撓式印刷配線板或帶載具這類特別要求有適度的機械撓性和折彎性之印刷配線板的導體圖案的銅箔時,從表面平坦性及折彎性方面考量,更佳使用與電解銅箔相比具有優良特質的壓延銅箔。However, the copper foil for a printed wiring board having the original foil 1 is a conductor for forming a printed wiring board which is particularly required to have moderate mechanical flexibility and bendability such as a flexible printed wiring board or a tape carrier. In the case of the patterned copper foil, from the viewpoint of surface flatness and bending property, it is more preferable to use a rolled copper foil having superior characteristics as compared with the electrolytic copper foil.

粗糙化鍍層2例如設置在原箔1的表面上,以用於提高該印刷配線板用銅箔對絕緣性基材的黏著性(提高固著效果)。對於該粗糙化鍍層2本身而言,可為利用一般製造方法所製造之由一般材質形成的層。The roughened plating layer 2 is provided, for example, on the surface of the original foil 1 for improving the adhesion of the copper foil for the printed wiring board to the insulating base material (improving the fixing effect). The roughened plating layer 2 itself may be a layer formed of a general material manufactured by a general manufacturing method.

鎳鈷合金鍍層3係通過鎳(Ni)和鈷(Co)的合金電鍍而形成於粗糙化鍍層2上,鈷(Co)的濃度為20質量%以上且小於55質量%,並且鎳(Ni)和鈷(Co)的合計附著量為20μg/cm2 以上且小於40μg/cm2The nickel-cobalt alloy plating layer 3 is formed on the roughened plating layer 2 by alloy plating of nickel (Ni) and cobalt (Co), and the concentration of cobalt (Co) is 20% by mass or more and less than 55% by mass, and nickel (Ni) The total adhesion amount to cobalt (Co) is 20 μg/cm 2 or more and less than 40 μg/cm 2 .

就本發明實施方式相關的印刷配線板用銅箔而言,通過具有由如上述組成所形成的材質的鎳鈷合金鍍層3,而使得設有該鍍層3之一側的表面之穿透如聚醯亞胺樹脂薄膜基材之類的絕緣性基材觀看時的目視確認性極為良好。而且與此同時,在使用該印刷配線板用銅箔製造印刷配線板時,能夠避免因鈷(Co)從鎳鈷合金鍍層3溶出而產生滲入和降低黏著力等。The copper foil for a printed wiring board according to the embodiment of the present invention has a nickel-cobalt alloy plating layer 3 having a material formed by the above-described composition, so that the surface provided on one side of the plating layer 3 is penetrated. The insulating substrate such as the quinone imine resin film substrate is extremely excellent in visual visibility when viewed. At the same time, when the printed wiring board is produced using the copper foil for a printed wiring board, it is possible to avoid the infiltration of cobalt (Co) from the nickel-cobalt alloy plating layer 3, the adhesion, and the like.

即,以往為了提高對該印刷配線板用銅箔實施圖案加工等而形成的配線圖、連接焊墊(pad)部或內部導線等各種導體圖案之穿透如聚醯亞胺樹脂薄膜基材之類的絕緣性基材觀看時的目視確認性,較佳使作為該目視確認對象之導體圖案的顏色、即印刷配線板用銅箔中與絕緣性基材相對之一側的表面的顏色,儘可能為黑色。In other words, in order to improve the wiring pattern formed by performing pattern processing or the like on the copper foil for a printed wiring board, the penetration of various conductor patterns such as a pad portion or an internal lead wire, such as a polyimide film substrate. It is preferable that the color of the conductor pattern to be visually recognized, that is, the color of the surface on the side opposite to the insulating substrate in the copper foil for a printed wiring board, is preferably the color of the insulating substrate. May be black.

但是,本發明的諸發明人,針對印刷配線板用銅箔中與絕緣性基材相對之一側的表面的顏色與其目視確認性良窳的關係,進行了各種實驗及調查,並對這些結果進行了深入的研究和考察等結果確認:印刷配線板用銅箔表面上用於視覺識別(或在可見光區域內進行檢測)的顏色,即便不一定為黑色,但通過使其為例如視覺上作為灰色色彩而可識別之類的顏色,再加上與作為絕緣性基材之聚醯亞胺樹脂薄膜基材所具有的土黃色或茶褐色等顏色,亦能夠得到與黑色的情況相近之良好的目視確認性或光學上的可識別性。However, the inventors of the present invention conducted various experiments and investigations on the relationship between the color of the surface on the side opposite to the insulating base material and the visual confirmation of the copper foil for a printed wiring board, and the results were investigated. As a result of intensive research and investigation, it was confirmed that the color for visual recognition (or detection in the visible light region) on the surface of the copper foil for printed wiring boards is not necessarily black, but it is visually A color that is identifiable by a gray color, and a color such as khaki or brownish brown which is obtained from a polyimide substrate film substrate as an insulating substrate, can also obtain a good visual appearance similar to that in the case of black. Confirmatory or optically identifiable.

這種導體圖案的顏色係指藉由(穿透)絕緣性基材進行光學檢測之由日本工業規格JIS Z8729定義的顏色的彩度c* =(a*2 +b*2 )1/2 為6以下者。或者藉由絕緣性基材進行光學檢測之由日本工業規格JIS Z8730定義的顏色與黑色的色差ΔE* ab為3以內者。The color of such a conductor pattern refers to the color of the color c * = (a * 2 + b * 2 ) 1/2 defined by Japanese Industrial Standard JIS Z8729 by optically detecting (penetrating) the insulating substrate. 6 or less. Or the color difference ΔE * ab of the color and black defined by Japanese Industrial Standard JIS Z8730, which is optically detected by an insulating substrate, is within three.

此外,為了得到如此般能夠取得良好目視確認性的表面的顏色,係通過採用實施例及比較例相關的樣本等的各種實驗來確認出如上述般材質(組成)的鎳鈷合金鍍層3係合適的(此外,對於使用這類樣本的實驗及其結果的考察等,在後述的實施例中進一步具體地說明)。In addition, in order to obtain the color of the surface which is able to obtain the visually identifiable property, it is confirmed that the nickel-cobalt alloy plating layer 3 of the material (composition) as described above is suitable by various experiments such as the samples of the examples and the comparative examples. (In addition, examination of the experiment using such a sample and the result thereof will be further specifically described in the examples to be described later).

此處,吾人基本上可以確認:鎳鈷合金鍍層3的厚度(換言之為附著量)愈增加,存在能夠得到愈高的目視確認性的傾向。但是吾人亦確認:鎳(Ni)和鈷(Co)的合計附著量並非愈多愈好,而且相反地如果過少,則存在得不到良好的目視確認性的傾向。Here, it is basically confirmed that the thickness of the nickel-cobalt alloy plating layer 3 (in other words, the amount of adhesion) is increased, and there is a tendency that the higher the visibility can be obtained. However, it has been confirmed that the total amount of adhesion of nickel (Ni) and cobalt (Co) is not as good as possible, and conversely, if it is too small, there is a tendency that good visibility is not obtained.

即,作為在鎳鈷合金鍍層3中的鎳(Ni)和鈷(Co)的合計附著量的合適的數值範圍之態樣,較佳為20μg/cm2 以上且小於40μg/cm2In other words, as a suitable numerical range of the total adhesion amount of nickel (Ni) and cobalt (Co) in the nickel-cobalt alloy plating layer 3, it is preferably 20 μg/cm 2 or more and less than 40 μg/cm 2 .

這是因為倘若鎳鈷合金鍍層3中的鎳(Ni)和鈷(Co)的合計附著量小於20μg/cm2 ,則難以得到目視確認性高的顏色,而且如果為40μg/cm2 以上,則在通過蝕刻法對該印刷配線板用銅箔實施圖案加工、形成包含配線圖的各種導體圖案時,很可能在本來應完全去除的非圖形部分處殘留作為蝕刻殘留的鎳鈷合金鍍層3,且以該圖案加工得到之導體圖案所形成的電路系的遷移性(migration)會顯著受損之故。This is because if the total adhesion amount of nickel (Ni) and cobalt (Co) in the nickel-cobalt alloy plating layer 3 is less than 20 μg/cm 2 , it is difficult to obtain a color having high visibility, and if it is 40 μg/cm 2 or more, When the copper foil for a printed wiring board is subjected to pattern processing by an etching method to form various conductor patterns including wiring patterns, it is likely that a nickel-cobalt alloy plating layer 3 as an etching residue remains at the non-pattern portion which should be completely removed, and The migration of the circuit system formed by the conductor pattern processed in this pattern is significantly impaired.

另外,鎳鈷合金鍍層3的鈷(Co)的濃度較佳為20質量%以上且小於55質量%。Further, the concentration of cobalt (Co) in the nickel-cobalt alloy plating layer 3 is preferably 20% by mass or more and less than 55% by mass.

這是因為在使用設有包含55質量%以上之大量的(高濃度的)鈷(Co)的鎳鈷合金鍍層3的印刷配線板用銅箔製造印刷配線板時,在該印刷配線板的製造步驟中,特別是在通過蝕刻法等對印刷配線板用銅箔實施圖案加工形成各種導體圖案的步驟、在形成該導體圖案後實施半蝕刻的步驟或實施錫(Sn)電鍍的步驟等中,極可能有鈷(Co)從鎳鈷合金鍍層3溶解至析出(溶出),而產生被稱之為所謂滲入的現象之故。另外,還因為如果鈷(Co)的濃度小於20質量%,則很可能黏著強度的降低變得顯著,並且該印刷配線板用銅箔整體的蝕刻性亦降低之故。This is because when a printed wiring board is manufactured using a copper foil for a printed wiring board provided with a nickel-cobalt alloy plating layer 3 containing a large amount of (high-concentration) cobalt (Co) of 55 mass% or more, the printed wiring board is manufactured. In the step, in particular, a step of patterning a copper foil for a printed wiring board by etching or the like to form various conductor patterns, a step of performing half etching after forming the conductor pattern, or a step of performing tin (Sn) plating, or the like, It is highly probable that cobalt (Co) is dissolved from the nickel-cobalt alloy plating layer 3 to be precipitated (dissolved), resulting in a phenomenon called so-called infiltration. In addition, if the concentration of cobalt (Co) is less than 20% by mass, the decrease in the adhesive strength is likely to be remarkable, and the etching property of the entire copper foil for a printed wiring board is also lowered.

出於這樣的理由,通過使鎳鈷合金鍍層3中的鎳(Ni)和鈷(Co)的合計附著量為20μg/cm2 以上且小於40μg/cm2 ,並且使鈷濃度為20質量%以上且小於55質量%,便可以得到能夠取得良好目視確認性那般的表面顏色,且能夠抑制或消除因鎳鈷合金鍍層3所含的鈷(Co)的溶出而產生滲入、以及因在非圖形部中的鎳鈷合金鍍層3的殘留而造成的電路系的遷移性降低。For this reason, the total adhesion amount of nickel (Ni) and cobalt (Co) in the nickel-cobalt alloy plating layer 3 is 20 μg/cm 2 or more and less than 40 μg/cm 2 , and the cobalt concentration is 20% by mass or more. When the amount is less than 55% by mass, the surface color can be obtained with good visibility, and the infiltration of cobalt (Co) contained in the nickel-cobalt alloy plating layer 3 can be suppressed or eliminated, and the non-graphics can be obtained. The mobility of the circuit system due to the residual of the nickel-cobalt alloy plating layer 3 in the portion is lowered.

此處,通過預先實施預粗糙化處理,使得即使鈷濃度小於55質量%也能夠抑制黏著強度降低。進一步通過適當地實施矽烷偶合處理等,而能夠增強與聚醯亞胺樹脂的黏著強度。Here, by performing the pre-roughening treatment in advance, it is possible to suppress the decrease in the adhesive strength even if the cobalt concentration is less than 55 mass%. Further, by appropriately performing a decane coupling treatment or the like, the adhesion strength to the polyimide resin can be enhanced.

鋅鍍層4係為了賦予該印刷配線板用銅箔防鏽效果,是在鎳鈷合金鍍層3上實施鋅(Zn)電鍍而形成。The zinc plating layer 4 is formed by performing zinc (Zn) plating on the nickel-cobalt alloy plating layer 3 in order to impart a rust-preventing effect to the copper foil for the printed wiring board.

作為形成該鋅鍍層4時的電鍍製程係可採用硫酸浴、鹼性鋅酸鹽(alkali zincate)浴、氯化物浴等。而且,其更具體的製程條件等也能夠對應該鋅鍍層4所要求的防鏽性能和其他各種要求而適宜地設定。As the plating process for forming the zinc plating layer 4, a sulfuric acid bath, an alkali zincate bath, a chloride bath or the like can be used. Further, more specific process conditions and the like can be appropriately set in accordance with the rust preventive performance and other various requirements required for the zinc plating layer 4.

但是,在本實施方式中,作為該鋅鍍層4的附著量較佳小於3μg/cm2 。這是因為如果在鎳鈷合金鍍層3上所形成之鋅鍍層4的附著量,即鋅(Zn)的附著量為3μg/cm2 以上,很可能由在使用該印刷配線板用銅箔製造印刷配線板的步驟中使用的鹽酸和無電解錫(Sn)(electroless tin)電鍍液等導致鋅(Zn)成分溶出,進而使該印刷配線板銅箔對絕緣性基材的黏著強度降低。However, in the present embodiment, the adhesion amount of the zinc plating layer 4 is preferably less than 3 μg/cm 2 . This is because if the adhesion amount of the zinc plating layer 4 formed on the nickel-cobalt alloy plating layer 3, that is, the adhesion amount of zinc (Zn) is 3 μg/cm 2 or more, it is likely that the printing is performed by using the copper foil for the printed wiring board. The hydrochloric acid and the electroless tin (electroless tin) plating solution used in the step of the wiring board cause the zinc (Zn) component to be eluted, and the adhesion strength of the printed wiring board copper foil to the insulating base material is lowered.

鉻酸鹽處理層5為在鋅鍍層4的表面上實施被稱為「鉻酸鹽處理」的化成處理而形成。對於該鉻酸鹽處理,出於其對環境和人體的影響的方面考量,應該使用不含有害之6價鉻的組成的處理液。具體而言,較佳使用3價鉻。The chromate treatment layer 5 is formed by performing a chemical conversion treatment called "chromate treatment" on the surface of the zinc plating layer 4. For the chromate treatment, a treatment liquid containing no harmful hexavalent chromium composition should be used in view of its influence on the environment and the human body. Specifically, trivalent chromium is preferably used.

作為該鉻酸鹽處理層5的附著量,較佳使其為2.5μg/cm2 以下。如果附著量多於此,則鉻酸鹽處理層5的厚度過厚,設置該鉻酸鹽處理層5而成的印刷配線板用銅箔對絕緣性基材的黏著強度降低的可能性將變高。The amount of adhesion of the chromate treatment layer 5 is preferably 2.5 μg/cm 2 or less. When the amount of adhesion is more than this, the thickness of the chromate treatment layer 5 is too thick, and the possibility that the adhesion of the copper foil for a printed wiring board to the insulating base material is reduced. high.

矽烷偶合處理層6係為了提高對由聚醯亞胺樹脂之類的有機化合物所形成的絕緣性基材的表面的黏著強度,在鉻酸鹽處理層5的表面上實施矽烷偶合處理而形成。The decane coupling treatment layer 6 is formed by performing a decane coupling treatment on the surface of the chromate treatment layer 5 in order to improve the adhesion strength to the surface of the insulating base material formed of an organic compound such as a polyimide resin.

作為在形成該矽烷偶合處理層6時使用的矽烷偶合處理劑,能夠使用多種物質,尤其是當使用聚醯亞胺樹脂薄膜作為絕緣性基材時,胺基矽烷體系(amino silane-based)的處理劑係合適的。As the decane coupling treatment agent used in forming the decane coupling treatment layer 6, a variety of substances can be used, especially when a polyimide film is used as an insulating substrate, and an amino silane-based system is used. The treatment agent is suitable.

作為該印刷配線板用銅箔的製造方法,首先,在原箔1的表面上,通過粗糙化電鍍製程形成粗糙化鍍層2。As a method of producing the copper foil for a printed wiring board, first, a roughened plating layer 2 is formed on the surface of the original foil 1 by a roughening plating process.

在該粗糙化鍍層2上,通過鎳(Ni)與鈷(Co)的合金的電鍍形成鎳鈷合金鍍層3,其中,鈷(Co)的濃度為20質量%以上且小於55質量%,並且鎳(Ni)和鈷(Co)的合計附著量為20μg/cm2 以上且小於40μg/cm2On the roughened plating layer 2, a nickel-cobalt alloy plating layer 3 is formed by electroplating of an alloy of nickel (Ni) and cobalt (Co), wherein a concentration of cobalt (Co) is 20% by mass or more and less than 55% by mass, and nickel The total adhesion amount of (Ni) and cobalt (Co) is 20 μg/cm 2 or more and less than 40 μg/cm 2 .

接著,在鎳鈷合金鍍層3的表面上,以較佳小於3μg/cm2 的附著量實施鋅電鍍來形成鋅鍍層4。Next, zinc plating is performed on the surface of the nickel-cobalt alloy plating layer 3 with an adhesion amount of preferably less than 3 μg/cm 2 to form the zinc plating layer 4.

在該鋅鍍層4的表面上實施鉻酸鹽化成處理,較佳形成3價鉻的附著量為2.5μg/cm2 以下的鉻酸鹽處理層5。The chromate formation treatment is performed on the surface of the zinc plating layer 4, and it is preferred to form the chromate treatment layer 5 having a deposition amount of trivalent chromium of 2.5 μg/cm 2 or less.

然後,較佳進一步在該鉻酸鹽處理層5的表面上使用胺基矽烷體系的處理液實施矽烷偶合處理,由此形成矽烷偶合處理層6。Then, it is preferred to further perform a decane coupling treatment on the surface of the chromate treatment layer 5 using a treatment liquid of an amino decane system, thereby forming a decane coupling treatment layer 6.

此處,尤其是形成該矽烷偶合處理層6時的乾燥溫度及乾燥時間,亦依存於用於進行該處理之裝置的結構及其處理速度等,但作為合適的數值範圍,較佳將乾燥溫度設定為150℃以上300℃以下,並將乾燥時間設定為15秒以上35秒以下。Here, in particular, the drying temperature and drying time at the time of forming the decane coupling treatment layer 6 depend on the structure of the apparatus for performing the treatment, the processing speed thereof, and the like, but the drying temperature is preferably a suitable numerical range. The temperature is set to 150 ° C or more and 300 ° C or less, and the drying time is set to 15 seconds or more and 35 seconds or less.

例如,使用能夠確保30秒之乾燥時間的裝置時,對於乾燥溫度而言,150℃~200℃係為最合適的數值範圍。這是因為儘管在實施例中進一步具體地說明,通過以該方式設定乾燥溫度及乾燥時間,能夠確實地得到足夠的黏著強度之故。For example, when a device capable of ensuring a drying time of 30 seconds is used, 150 ° C to 200 ° C is the most suitable numerical range for the drying temperature. This is because, although it is more specifically described in the examples, by setting the drying temperature and the drying time in this manner, it is possible to surely obtain sufficient adhesive strength.

對於使用這類本發明實施方式相關的電路板用銅箔來製造的印刷配線板而言,對該印刷配線板用銅箔進行圖案加工而成的導體圖案藉由穿透如聚醯亞胺樹脂薄膜之類的絕緣性基材進行目視確認(或光學檢測)、且由日本工業規格JIS Z8730定義的顏色,與例如黑色的色差ΔE* ab為3以內,再加上絕緣性基材的顏色,即可使導體圖案的目視確認性變得極為良好。In the printed wiring board manufactured by using the copper foil for a circuit board according to the embodiment of the present invention, the conductor pattern formed by patterning the copper foil for the printed wiring board is penetrated by, for example, a polyimide resin. The insulating substrate such as a film is visually confirmed (or optically detected), and the color defined by Japanese Industrial Standard JIS Z8730 has a color difference ΔE * ab of, for example, 3 or less, and the color of the insulating substrate is added. The visual confirmation of the conductor pattern can be made extremely excellent.

根據如以上所說明之本發明實施方式相關的印刷配線板用銅箔及其製造方法,鎳鈷合金鍍層3的材質係由例如鎳(Ni)和鈷(Co)的合金的電鍍皮膜形成,並使鈷(Co)的濃度為20質量%以上且小於55質量%,且鎳(Ni)與鈷(Co)的合計附著量為20μg/cm2 以上且小於40μg/cm2 ,藉此使黏貼該印刷配線板用銅箔於絕緣性基材後,再進行圖案加工而成的導體圖案而藉由(穿透)絕緣性基材進行光學檢測(導體圖案)、且由日本工業規格JIS Z8729定義的顏色的彩度c* =(a*2 +b*2 )1/2 為6以下,因此,即便不特別實施極可能發生滲入和剝離等的黑化處理,也能夠確保如穿透以聚醯亞胺為代表的絕緣性基材觀看時的導體圖案的顏色與黑色的色差ΔE* ab為3以內那般,在安裝半導體晶片時對準位置之際等實用上夠高的目視確認性,且能夠在印刷配線板的製造步驟中不產生滲入和剝離等而形成導體圖案。According to the copper foil for a printed wiring board according to the embodiment of the present invention as described above, and the method for producing the same, the material of the nickel-cobalt alloy plating layer 3 is formed of an electroplated film of an alloy of, for example, nickel (Ni) and cobalt (Co), and The concentration of cobalt (Co) is 20% by mass or more and less than 55% by mass, and the total adhesion amount of nickel (Ni) and cobalt (Co) is 20 μg/cm 2 or more and less than 40 μg/cm 2 , whereby the paste is adhered thereto. After the copper foil for the printed wiring board is placed on the insulating base material, the conductive pattern is patterned, and the optical substrate (optical pattern) is formed by penetrating the insulating substrate, and is defined by Japanese Industrial Standard JIS Z8729. Since the chroma of the color c * = (a * 2 + b * 2 ) 1/2 is 6 or less, it is possible to secure penetration such as penetration even if blackening treatment such as penetration or peeling is extremely unlikely to be performed. The color of the conductor pattern when the insulating substrate is represented by the imine is a practically high visual confirmation property such as when the color difference ΔE * ab of the black semiconductor is three or less, and the alignment position is at the time of mounting the semiconductor wafer. It is possible to form a conductor pattern without causing penetration, peeling, or the like in the manufacturing steps of the printed wiring board. .

如上所述,在本發明中能夠抑制稀有金屬鎳(Ni)和鈷(Co)的使用量,並且能夠實現通過蝕刻法實施圖案加工時之蝕刻殘留實質上很少、電路目視確認性甚高的印刷配線板用銅箔。As described above, in the present invention, it is possible to suppress the use amount of the rare metal nickel (Ni) and cobalt (Co), and it is possible to realize that the etching residue in the pattern processing by the etching method is substantially small, and the circuit visibility is highly high. Copper foil for printed wiring boards.

【實施例】[Examples]

製作如上述實施方式中所說明之印刷配線板用銅箔,來作為本發明之實施例相關的印刷配線板用銅箔的樣本。然後,使用該印刷配線板用銅箔的樣本,來製作本發明的實施例相關的印刷配線板的樣本(實施例1~6)。A copper foil for a printed wiring board as described in the above embodiment is produced as a sample of a copper foil for a printed wiring board according to an embodiment of the present invention. Then, samples of the printed wiring board according to the examples of the present invention were produced using the samples of the copper foil for printed wiring boards (Examples 1 to 6).

另外,為了與其比較、對照,製作與上述實施方式中所說明之印刷配線板用銅箔不必然相同之結構的印刷配線板用銅箔,使用其製作比較例相關的印刷配線板的樣本(比較例1~6)。In addition, a copper foil for a printed wiring board having a structure which is not necessarily the same as the copper foil for a printed wiring board described in the above-described embodiment is used for comparison and comparison, and a sample of a printed wiring board according to a comparative example is produced. Examples 1 to 6).

然後,對此等各個樣本中的電路(導體圖案)目視確認性、黏著強度、有無發生滲入分別進行確認、評估。Then, the circuit (conductor pattern) in each of the samples was visually confirmed, adhered, and infiltrated, and confirmed and evaluated.

歸納此等各個樣本的設定及其結果示於下表1。The settings for summarizing these samples and their results are shown in Table 1 below.

〈實施例1〉<Example 1>

使用厚度為16.3μm的壓延銅箔作為原箔1,在40g/L的氫氧化鈉及20g/L的碳酸鈉的水溶液中,於設定成溫度40℃、電流密度5A/dm2 、處理時間10秒的製程條件下,通過陰極電解製程進行電解脫脂(degreasing)處理。A rolled copper foil having a thickness of 16.3 μm was used as the original foil 1, and was set to a temperature of 40 ° C, a current density of 5 A/dm 2 , and a treatment time of 10 in an aqueous solution of 40 g/L of sodium hydroxide and 20 g/L of sodium carbonate. Under the process conditions of two seconds, electrolytic degreasing treatment is performed by a cathodic electrolysis process.

接著,在25℃的溫度下,浸漬於50g/L的硫酸水溶液中處理10秒,實施酸洗處理。Subsequently, the mixture was immersed in a 50 g/L aqueous sulfuric acid solution at a temperature of 25 ° C for 10 seconds to carry out a pickling treatment.

在對該原箔1實施粗糙化電鍍處理、形成粗糙化電鍍層2之後,根據在上述實施方式中說明的製造方法,在其上形成鎳鈷合金鍍層3、鋅鍍層4、鉻酸鹽處理層5、矽烷偶合處理層6。After the roughening plating treatment is performed on the original foil 1 to form the roughened plating layer 2, a nickel-cobalt alloy plating layer 3, a zinc plating layer 4, and a chromate treatment layer are formed thereon according to the manufacturing method described in the above embodiment. 5. The decane coupling treatment layer 6.

更具體而言,鎳鈷合金鍍層3係由硫酸浴形成,鋅鍍層4由藥品配製後通過硫酸浴形成,鉻酸鹽處理層5使用一般市售3價鉻酸鹽處理液來形成。矽烷偶合處理層6則使用作為處理液的3-胺基丙基三甲氧基矽烷(3-aminopropyltrimethoxysilane)(信越化學製KBM-903)而形成。More specifically, the nickel-cobalt alloy plating layer 3 is formed of a sulfuric acid bath, and the zinc plating layer 4 is formed by a chemical solution and then formed by a sulfuric acid bath, and the chromate-treated layer 5 is formed using a commercially available trivalent chromate treatment liquid. The decane coupling treatment layer 6 was formed using 3-aminopropyltrimethoxysilane (KBM-903 manufactured by Shin-Etsu Chemical Co., Ltd.) as a treatment liquid.

對於各層金屬皮膜附著量及組成的測定,係在對各層的金屬皮膜進行酸溶解後,使用感應偶合電漿發光分光分析裝置(ICP-AES)進行。即,首先以40mm×100mm的大小切出各樣本,並使黏著膠帶確實地密接於測定面之相反側的面(即測定面的背面)整面,此係為了在後述進行酸溶解時僅使測定面溶解。將該樣本切斷為合適的大小,置入ICP-AES測定用燒杯,作為酸溶解處理液,係正確計量以體積比對1份硝酸混合10份蒸餾水而成的硝酸水溶液(也稱為(1+10)硝酸)30mL,並倒入至置入有所述樣本的燒杯中,進行酸溶解處理。The measurement of the adhesion amount and composition of each layer of the metal film was carried out by acid-dissolving the metal film of each layer, and then using an inductively coupled plasma luminescence spectroscopic analyzer (ICP-AES). In other words, first, each sample is cut out at a size of 40 mm × 100 mm, and the adhesive tape is surely adhered to the entire surface of the measurement surface (that is, the back surface of the measurement surface). This is for the purpose of performing acid dissolution as will be described later. The surface was dissolved. The sample was cut into an appropriate size, placed in an ICP-AES measuring beaker, and used as an acid-dissolving treatment liquid to accurately measure an aqueous solution of nitric acid obtained by mixing 10 parts of distilled water in a volume ratio of 1 part of nitric acid (also referred to as (1). +10) Nitric acid) 30 mL, and poured into a beaker in which the sample was placed, and subjected to acid dissolution treatment.

然後,在確認了由金屬皮膜的酸溶解所引起的氣泡產生結束之後,取出樣本,通過ICP-AES測定溶解液中的金屬濃度。且對於該測定方法而言,不僅是實施例1相關的樣本,對包括比較例相關的樣本在內的全部樣本統一實施如上述的方法。Then, after confirming that the generation of bubbles by the acid dissolution of the metal film was completed, the sample was taken out, and the metal concentration in the solution was measured by ICP-AES. For the measurement method, not only the sample related to Example 1, but also the method described above is uniformly applied to all samples including the samples related to the comparative examples.

在以上述方式形成且測定該各金屬皮膜的附著量及組成之印刷配線板用銅箔的各樣本的粗糙面上,以桿塗佈裝置(bar coater)以9mil的厚度塗佈聚醯亞胺清漆(宇部興產製U-Varnish A),通過在氮氣(N2 )氛圍中乾燥而使之固化,以此為絕緣性基材。在實施例1中將乾燥溫度設為200℃。乾燥後得到的絕緣性基材的厚度為25μm。On the rough surface of each sample of the copper foil for printed wiring boards which was formed and measured as described above and measured for the adhesion amount and composition of each of the metal films, a polyimide coating was applied at a thickness of 9 mils by a bar coater. The varnish (U-Varnish A manufactured by Ube Industries, Ltd.) was cured by drying in a nitrogen (N 2 ) atmosphere to serve as an insulating substrate. In Example 1, the drying temperature was set to 200 °C. The thickness of the insulating base material obtained after drying was 25 μm.

對於電路目視確認性而言,係使用色彩色差計(KONICA MINOLTA製CR-400)測定穿透上述方式形成之聚醯亞胺樹脂所構成的絕緣性基材進行檢測的顏色來評估。作為該評估方法,係基於市售具有良好目視確認性之含有黑色粗化面的銅箔的測定結果,檢測以上述方式對本實施例相關的銅箔進行圖案加工而形成之導體圖案,在對穿透聚醯亞胺樹脂形成的絕緣性基材所見(導體圖案)之顏色的彩度c* =(a*2 +b*2 )1/2 為6以下而於實質上對黑色的色差ΔE* ab為3以內時判斷為「電路目視確認性良好」。對於該電路目視確認性的判斷方法,亦適用於全部的樣本。The visibility of the circuit was evaluated by measuring the color of the insulating substrate formed by the polyimine resin formed in the above manner using a color difference meter (CR-400 manufactured by KONICA MINOLTA). As a result of the measurement, a conductor pattern formed by patterning the copper foil according to the present embodiment in the above-described manner is detected based on the measurement results of a copper foil containing a black roughened surface which is commercially visible and confirmed. The color of the color (c * = (a * 2 + b * 2 ) 1/2 of the insulating substrate formed by the permeable fluorinated imine resin (conductor pattern) is 6 or less and the color difference ΔE * is substantially black . When ab is less than 3, it is judged that "the circuit visual visibility is good". The method of judging the visibility of the circuit is also applicable to all samples.

與絕緣性基材的黏著強度係依據日本工業規格JIS C6481,在設定為電路寬度1mm、剝離角度90°、剝離速度50mm/秒的測定條件下,進行剝離實驗並測定剝離強度(N/mm),以此用作參數進行評估。The adhesion strength to the insulating base material was measured according to Japanese Industrial Standard JIS C6481 under the measurement conditions of a circuit width of 1 mm, a peeling angle of 90°, and a peeling speed of 50 mm/sec, and a peeling test was performed to measure the peel strength (N/mm). Used as a parameter for evaluation.

對於有無發生滲入則通過濕式蝕刻法(wet etching)對印刷配線板用銅箔實施圖案加工,形成寬度1mm的直線電路,在進一步將其在50℃下浸漬於3%的硫酸中1小時後,使用金屬顯微鏡,藉由穿透由聚醯亞胺樹脂形成的絕緣性基材進行觀察而確認。The presence or absence of penetration occurred, and the copper foil for printed wiring boards was subjected to pattern processing by wet etching to form a linear circuit having a width of 1 mm, and further immersed in 3% sulfuric acid at 50 ° C for 1 hour. Using a metal microscope, it was confirmed by penetrating through an insulating substrate formed of a polyimide resin.

在實施例1中,將鎳鈷合金鍍層3的鎳(Ni)和鈷(Co)的合計附著量(以下,將其簡稱為「鎳鈷合金鍍層3的附著量」)設為21μg/cm2 。另外,將該鎳鈷合金鍍層3中的鈷(Co)的濃度設為35質量%。另外,將矽烷偶合處理後的乾燥溫度設為200℃。In the first embodiment, the total adhesion amount of nickel (Ni) and cobalt (Co) of the nickel-cobalt alloy plating layer 3 (hereinafter, simply referred to as "the adhesion amount of the nickel-cobalt alloy plating layer 3") is 21 μg/cm 2 . . Further, the concentration of cobalt (Co) in the nickel-cobalt alloy plating layer 3 was set to 35 mass%. Further, the drying temperature after the decane coupling treatment was set to 200 °C.

其結果確認出,對於該實施例1相關的樣本而言,從電路目視確認性、黏著強度、滲入等全部特性來看都良好。As a result, it was confirmed that the samples related to Example 1 were excellent in terms of all characteristics such as circuit visibility, adhesion strength, and infiltration.

〈實施例2〉<Example 2>

在該實施例2相關的樣本中,將鎳鈷合金鍍層3的附著量設為39μg/cm2 ,並且將該鎳鈷合金鍍層3中的鈷(Co)的濃度設為40質量%。然後,將其他設為與實施例1相關的樣本相同的設定。In the sample of the second embodiment, the adhesion amount of the nickel-cobalt alloy plating layer 3 was set to 39 μg/cm 2 , and the concentration of cobalt (Co) in the nickel-cobalt alloy plating layer 3 was 40% by mass. Then, the other settings are set to be the same as those of the sample related to the first embodiment.

確認了該實施例2相關的樣本,從電路目視確認性、黏著強度、滲入等全部特性來看也都良好。尤其是黏著強度與實施例1的情況之1.2N/mm相比些許提高,為1.3N/mm。The samples relating to the second embodiment were confirmed to be good from the viewpoints of visual confirmation, adhesion strength, and infiltration. In particular, the adhesion strength was slightly increased as compared with 1.2 N/mm in the case of Example 1, and was 1.3 N/mm.

〈實施例3〉<Example 3>

在該實施例3相關的樣本中,將鎳鈷合金鍍層3的附著量設為34μg/cm2 ,並且將該鎳鈷合金鍍層3中的鈷(Co)的濃度設為20質量%。然後,將其他設為與實施例1相關的樣本相同的設定。In the sample of the third embodiment, the adhesion amount of the nickel-cobalt alloy plating layer 3 was 34 μg/cm 2 , and the concentration of cobalt (Co) in the nickel-cobalt alloy plating layer 3 was 20% by mass. Then, the other settings are set to be the same as those of the sample related to the first embodiment.

確認了該實施例3相關的樣本,從電路目視確認性、黏著強度、滲入等全部特性來看也都為與實施例2的情況同樣地良好。The sample according to the third embodiment was confirmed to be as good as the case of the second embodiment in terms of all the characteristics such as visual confirmation, adhesion strength, and infiltration.

〈實施例4〉<Example 4>

在該實施例4相關的樣本中,將鎳鈷合金鍍層3的附著量設為34μg/cm2 ,並且將該鎳鈷合金鍍層3中的鈷(Co)的濃度設為53質量%。然後,將其他設為與實施例1相關的樣本相同的設定。In the sample of the fourth embodiment, the adhesion amount of the nickel-cobalt alloy plating layer 3 was 34 μg/cm 2 , and the concentration of cobalt (Co) in the nickel-cobalt alloy plating layer 3 was 53 mass%. Then, the other settings are set to be the same as those of the sample related to the first embodiment.

確認了該實施例4相關的樣本,從電路目視確認性、黏著強度、滲入等全部特性來看也都為良好。尤其是黏著強度,與實施例1和實施例2的情況的1.2N/mm和1.3mm相比更高,為1.5N/mm。The samples related to Example 4 were confirmed to be good from the viewpoints of visual confirmation, adhesion strength, and penetration. In particular, the adhesive strength was higher than 1.2 N/mm and 1.3 mm in the cases of Example 1 and Example 2, and was 1.5 N/mm.

〈實施例5〉<Example 5>

在該實施例5相關的樣本中,將鎳鈷合金鍍層3的附著量設為34μg/cm2 ,並且將該鎳鈷合金鍍層3中的鈷(Co)的濃度設為35質量%。然後,將矽烷偶合處理後的乾燥溫度設為略低之(實施方式中所說明之合適數值範圍的下限值)150℃。將其他設定為與實施例1相關的樣本相同的設定。In the sample of the fifth embodiment, the adhesion amount of the nickel-cobalt alloy plating layer 3 was 34 μg/cm 2 , and the concentration of cobalt (Co) in the nickel-cobalt alloy plating layer 3 was set to 35 mass%. Then, the drying temperature after the decane coupling treatment was set to be slightly lower (the lower limit of the suitable numerical range described in the embodiment) at 150 °C. The other settings are set to be the same as the samples related to the first embodiment.

確認了該實施例5相關的樣本,從電路目視確認性、黏著強度、滲入等全部特性來看也都為良好。但是對於黏著強度,與實施例1的情況的1.2N/mm相比些許降低,為1.1N/mm。The samples related to Example 5 were confirmed to be good from the viewpoints of visual confirmation, adhesion strength, and infiltration. However, the adhesion strength was slightly lower than that of 1.2 N/mm in the case of Example 1, and was 1.1 N/mm.

〈實施例6〉<Example 6>

在該實施例6相關的樣本中,將矽烷偶合處理後的乾燥溫度設為略高的(實施方式中所說明之合適數值範圍的上限值)300℃。然後,將其他設為與實施例5相關的樣本同樣的設定。In the sample according to Example 6, the drying temperature after the decane coupling treatment was set to be slightly higher (the upper limit of the appropriate numerical range described in the embodiment) at 300 °C. Then, the other settings are set to be the same as those of the sample related to the fifth embodiment.

其結果係確認了該實施例6相關的樣本,從電路目視確認性、黏著強度、滲入等全部特性來看也都良好。尤其是對於黏著強度,與實施例4的情況的1.5N/mm同樣為1.5N/mm,為全部樣本中最高級的強度。As a result, it was confirmed that the samples related to Example 6 were excellent in terms of all of the characteristics such as visual confirmation, adhesion strength, and penetration. In particular, the adhesion strength was 1.5 N/mm as in the case of Example 4, which was 1.5 N/mm, which was the highest level of strength in all samples.

若將該實施例6的結果與實施例5的結果一併考察,可以明瞭:通過將矽烷偶合處理後的乾燥溫度設定為本發明實施方式所說明之合適數值範圍內之略高的值,顯示出能夠得到較高的黏著強度。When the results of Example 6 are examined together with the results of Example 5, it is understood that the drying temperature after the decane coupling treatment is set to a slightly higher value within the appropriate numerical range described in the embodiment of the present invention, and it is displayed. Can get a higher adhesion strength.

〈比較例1〉<Comparative Example 1>

在該比較例1相關的樣本中,特意將鎳鈷合金鍍層3的附著量設為脫離本發明實施方式相關的印刷配線板用銅箔的合適數值範圍的下限值的較低值15μg/cm2 。對於鎳鈷合金鍍層3中的鈷(Co)的濃度而言,係設為在本發明實施方式相關的印刷配線板用銅箔的合適數值範圍內的略高值50質量%。然後,將其他設為與實施例1相關的樣本同樣的設定。In the sample of the first comparative example, the adhesion amount of the nickel-cobalt alloy plating layer 3 is deliberately set to a lower value of 15 μg/cm which is lower than the lower limit value of the appropriate numerical range of the copper foil for printed wiring boards according to the embodiment of the present invention. 2 . The concentration of cobalt (Co) in the nickel-cobalt alloy plating layer 3 is set to a slightly higher value of 50% by mass in a suitable numerical range of the copper foil for printed wiring boards according to the embodiment of the present invention. Then, the other settings are set to be the same as those of the sample related to the first embodiment.

其結果為:由於在該比較例1相關的樣本中鎳鈷合金鍍層3的附著量少,電路目視確認性明顯降低,惟從黏著強度、滲入方面來看係良好的。從其結果可確認出,如果鎳鈷合金鍍層3的附著量為如15μg/cm2 般小於本發明的實施方式所規定的下限值20μg/cm2 ,則難以或不能得到良好的電路目視確認性。As a result, in the sample related to Comparative Example 1, the amount of adhesion of the nickel-cobalt alloy plating layer 3 was small, and the visibility of the circuit was remarkably lowered, but it was good from the viewpoint of adhesion strength and penetration. From the results confirmed that, if the applied amount of nickel-cobalt alloy plating layer 3 is the lower limit value 20μg / cm as 15μg / cm 2 of the present invention is generally less than a predetermined embodiment 2, it is difficult or impossible to obtain a good visual confirmation circuit Sex.

〈比較例2〉<Comparative Example 2>

在該比較例2相關的樣本中,特意將鎳鈷合金鍍層3的附著量設為脫離本發明實施方式相關的印刷配線板用銅箔之合適數值範圍的上限值的較高值50μg/cm2 。另外,該鎳鈷合金鍍層3的鈷(Co)濃度也設為超過本發明實施方式相關的印刷配線板用銅箔之合適數值範圍的上限值的較高值55質量%。然後,將其他設為與實施例1的樣本相同的設定。In the sample of the second comparative example, the adhesion amount of the nickel-cobalt alloy plating layer 3 was deliberately set to a higher value of 50 μg/cm from the upper limit value of the appropriate numerical range of the copper foil for printed wiring boards according to the embodiment of the present invention. 2 . In addition, the cobalt (Co) concentration of the nickel-cobalt alloy plating layer 3 is also higher than the upper limit of the appropriate numerical range of the copper foil for printed wiring boards according to the embodiment of the present invention, which is 55 mass%. Then, the other settings are set to be the same as those of the sample of the first embodiment.

其結果為:在該比較例2相關的樣本中,雖然電路目視確認性良好,但由於鎳鈷合金鍍層3的附著量過多而發生顯著的蝕刻殘留,使得進行對黏著強度及滲入的評估本身變得不可能。As a result, in the sample of Comparative Example 2, although the circuit visibility was good, the adhesion of the nickel-cobalt alloy plating layer 3 was excessive, and significant etching residue occurred, so that the evaluation of the adhesion strength and the infiltration itself was changed. It is impossible.

從其結果可確認出,如果鎳鈷合金鍍層3的附著量多達55質量%以上,雖然能夠得到良好的電路目視確認性,但作為發生顯著的蝕刻殘留這樣的印刷配線板用銅箔,極有可能產生致命的缺陷。As a result, it was confirmed that the adhesion amount of the nickel-cobalt alloy plating layer 3 is as high as 55% by mass or more, and good circuit visibility can be obtained. However, as a copper foil for a printed wiring board in which significant etching remains, the pole is extremely There may be fatal flaws.

〈比較例3〉<Comparative Example 3>

在該比較例3相關的樣本中,對於鎳鈷合金鍍層3的附著量,與實施例3~6的情況同樣地設為本發明實施方式相關的印刷配線板用銅箔之合適數值範圍內的值34μg/cm2In the sample of the comparative example 3, the adhesion amount of the nickel-cobalt alloy plating layer 3 is within the appropriate numerical range of the copper foil for printed wiring boards according to the embodiment of the present invention, as in the case of the third to sixth embodiments. The value was 34 μg/cm 2 .

但是,對於該鎳鈷合金鍍層3中的鈷(Co)的濃度,設為脫離本發明實施方式相關的印刷配線板用銅箔之合適數值範圍的下限值的極低值(1/2以下)10質量%。然後,將其他設為與實施例1相關的樣本相同的設定。However, the concentration of cobalt (Co) in the nickel-cobalt alloy plating layer 3 is an extremely low value (1/2 or less) of the lower limit value of the appropriate numerical range of the copper foil for printed wiring boards according to the embodiment of the present invention. ) 10% by mass. Then, the other settings are set to be the same as those of the sample related to the first embodiment.

其結果為:在該比較例3相關的樣本中,雖然從電路目視確認性及滲入方面來看為良好,但因鎳鈷合金鍍層3的鈷(Co)的濃度為極低的值故黏著強度成為0.7N/mm,從黏著性方面來看則顯著地低劣。As a result, in the sample of the comparative example 3, although the visibility of the circuit was confirmed and the penetration was good, the cobalt (Co) concentration of the nickel-cobalt alloy plating layer 3 was extremely low, so the adhesion strength was obtained. It becomes 0.7 N/mm, which is remarkably inferior in terms of adhesion.

從其結果可以確認,如果鎳鈷合金鍍層3的鈷(Co)的濃度過低,則難以或不可能得到充分的黏著強度。From the results, it was confirmed that if the concentration of cobalt (Co) in the nickel-cobalt alloy plating layer 3 is too low, it is difficult or impossible to obtain sufficient adhesion strength.

〈比較例4〉<Comparative Example 4>

在該比較例4相關的樣本中,鎳鈷合金鍍層3的附著量為本發明的實施方式相關的印刷配線板用銅箔之合適數值範圍內的值37μg/cm2In the sample of the comparative example 4, the adhesion amount of the nickel-cobalt alloy plating layer 3 is 37 μg/cm 2 in a suitable numerical range of the copper foil for a printed wiring board according to the embodiment of the present invention.

但是,將該鎳鈷合金鍍層3中的鈷(Co)的濃度設為脫離本發明實施方式相關的印刷配線板用銅箔的合適數值範圍的上限值的較高值70質量%。然後,將其他設為與實施例1相關的樣本相同的設定。However, the concentration of cobalt (Co) in the nickel-cobalt alloy plating layer 3 is set to be 70% by mass higher than the upper limit value of the appropriate numerical range of the copper foil for printed wiring boards according to the embodiment of the present invention. Then, the other settings are set to be the same as those of the sample related to the first embodiment.

其結果為:在該比較例4相關的樣本中,黏著強度及電路目視確認性良好。尤其是黏著強度為1.7N/mm,為全部樣本中的最高值。但是,因鎳鈷合金鍍層3中的鈷(Co)的濃度過高而發生了滲入。As a result, in the samples related to Comparative Example 4, the adhesion strength and the circuit visibility were good. In particular, the adhesion strength is 1.7 N/mm, which is the highest value of all samples. However, infiltration occurs due to an excessively high concentration of cobalt (Co) in the nickel-cobalt alloy plating layer 3.

從該結果可以確認,如果鎳鈷合金鍍層3中的鈷(Co)的濃度過高,則極可能發生滲入。From this result, it was confirmed that if the concentration of cobalt (Co) in the nickel-cobalt alloy plating layer 3 is too high, penetration is highly likely to occur.

〈比較例5〉<Comparative Example 5>

在該比較例5相關的樣本中,將鎳鈷合金鍍層3的附著量設為本發明實施方式相關的印刷配線板用銅箔之合適數值範圍內的值35μg/cm2 ,並且將該鎳鈷合金鍍層3中的鈷(Co)濃度設為本發明實施方式相關的印刷配線板用銅箔之合適數值範圍內的值35質量%。In the sample of the comparative example 5, the adhesion amount of the nickel-cobalt alloy plating layer 3 is 35 μg/cm 2 in a suitable numerical range of the copper foil for printed wiring boards according to the embodiment of the present invention, and the nickel-cobalt is used. The cobalt (Co) concentration in the alloy plating layer 3 is set to be 35 mass% in a suitable numerical range of the copper foil for printed wiring boards according to the embodiment of the present invention.

惟,將矽烷偶合處理後的乾燥溫度設為低於本發明實施方式所說明的合適數值範圍的下限值之120℃。However, the drying temperature after the decane coupling treatment is set to be 120 ° C lower than the lower limit of the appropriate numerical range described in the embodiment of the present invention.

其結果為:在該比較例5相關的樣本中,從電路目視確認性及滲入方面來看為良好,但黏著強度為0.8N/mm,從黏著性方面來說則顯著地低劣。As a result, the sample according to Comparative Example 5 was excellent in terms of visual confirmation and penetration of the circuit, but the adhesive strength was 0.8 N/mm, which was remarkably inferior in terms of adhesion.

從其結果可以確認,如果矽烷偶合處理後的乾燥溫度如該比較例5的情況的120℃般低於合適數值範圍的下限值150℃,則黏著強度顯著地降低。From the results, it was confirmed that the adhesion strength was remarkably lowered if the drying temperature after the decane coupling treatment was lower than the lower limit value of 150 ° C of the appropriate numerical range as in the case of the comparative example 5 at 120 °C.

〈比較例6〉<Comparative Example 6>

在該比較例6相關的樣本中,將矽烷偶合處理後的乾燥溫度設為與本發明的實施方式所說明之合適的數值範圍的上限值相比更高的350℃。然後,將其他的設定設為與實施例6相關的樣本相同的設定。In the sample of Comparative Example 6, the drying temperature after the decane coupling treatment was set to be 350 ° C higher than the upper limit value of the numerical range suitable for the embodiment of the present invention. Then, the other settings are set to the same settings as those of the sample of the sixth embodiment.

其結果為:在該比較例6相關的樣本中,電路目視確認性良好,但是黏著強度為0.5N/mm,在全部樣本中黏著性為最低。這被認為係由於乾燥溫度為極端高的350℃,因此該比較例6相關的樣本的印刷配線板用銅箔的表面產生氧化且發生多次剝離所致。As a result, in the samples related to Comparative Example 6, the circuit visibility was good, but the adhesion strength was 0.5 N/mm, and the adhesion was the lowest in all the samples. This is considered to be because the drying temperature is extremely high at 350 ° C, and therefore the surface of the copper foil for the printed wiring board of the sample of Comparative Example 6 is oxidized and peeled off a plurality of times.

另外,由於這樣的黏著強度的顯著降低,也導致發生了滲入。In addition, due to such a significant decrease in the adhesive strength, infiltration also occurs.

從其結果可以確認,如果矽烷偶合處理後的乾燥溫度如該比較例6的情況的350℃般高於合適數值範圍的上限值300℃,則黏著強度顯著降低,而且與此同時易於發生滲入。From the results, it was confirmed that if the drying temperature after the decane coupling treatment is higher than the upper limit value of 300 ° C of the appropriate numerical range in the case of 350 ° C in the case of Comparative Example 6, the adhesion strength is remarkably lowered, and at the same time, penetration is liable to occur. .

從如上所述之使用實施例1~6及比較例1~6相關的各種樣本的實驗結果能夠確認出:根據本發明,由於通過具有由鎳(Ni)和鈷(Co)的合金電鍍皮膜形成之鈷(Co)的濃度為20質量%以上且小於55質量%,並且鎳(Ni)和鈷(Co)的合計附著量為20μg/cm2 以上且小於40μg/cm2 的鎳鈷合金鍍層3,使對該銅箔進行圖案加工而形成的導體圖案之穿透由聚醯亞胺樹脂形成的絕緣性基材進行確認的顏色的彩度c* =(a*2 +b*2 )1/2 為6以下,因此能夠使具有該鎳鈷合金鍍層3的印刷配線板用銅箔的表面,在抑制稀有金屬鎳(Ni)和鈷(Co)的使用量的同時,具有穿透以聚醯亞胺為代表之絕緣性基材觀看時與黑色的色差為ΔE* ab為3以內那般的高目視確認性,且能夠在印刷配線板的製造步驟中不發生滲入和剝離等而形成電路(導體圖案)。From the experimental results of the various samples related to Examples 1 to 6 and Comparative Examples 1 to 6 as described above, it was confirmed that, according to the present invention, it is formed by plating a film having an alloy of nickel (Ni) and cobalt (Co). The concentration of cobalt (Co) is 20% by mass or more and less than 55% by mass, and the total adhesion amount of nickel (Ni) and cobalt (Co) is 20 μg/cm 2 or more and less than 40 μg/cm 2 of the nickel-cobalt alloy plating layer 3 The chroma of the color of the conductor pattern formed by patterning the copper foil through the insulating substrate formed of the polyimide resin c * = (a * 2 + b * 2 ) 1 / Since the amount of 2 is 6 or less, the surface of the copper foil for a printed wiring board having the nickel-cobalt alloy plating layer 3 can be penetrated to suppress the use amount of the rare metal nickel (Ni) and cobalt (Co). When the insulating base material represented by the imine is viewed from the insulating substrate, the color difference from black is ΔE * ab is as high as 3, and the circuit can be formed without infiltration, peeling, or the like in the manufacturing process of the printed wiring board. Conductor pattern).

此外,在上述實施方式及實施例(包括比較例)中,對於僅在原箔1的單面設置粗糙化電鍍層2、鎳鈷合金鍍層3、Zn(鋅)鍍層4、鉻酸鹽處理層5、矽烷偶合處理層6的情況進行了說明,但是,尤其是為了對原箔1的兩面賦予更加強力的防鏽效果,較佳在該原箔1的兩面上,設置鎳鈷合金鍍層3、Zn(鋅)鍍層4、鉻酸鹽處理層5。Further, in the above-described embodiments and examples (including comparative examples), the roughened plating layer 2, the nickel-cobalt alloy plating layer 3, the Zn (zinc) plating layer 4, and the chromate-treated layer 5 are provided only on one side of the original foil 1. Although the case of the decane coupling treatment layer 6 has been described, in particular, in order to impart a more strong rust preventing effect to both surfaces of the original foil 1, it is preferable to provide a nickel-cobalt alloy plating layer 3 and Zn on both surfaces of the original foil 1. (Zinc) plating layer 4, chromate treatment layer 5.

另外,在所述實施方式及實施例中,雖然以將本發明相關的印刷配線板用銅箔黏貼於由聚醯亞胺樹脂形成的絕緣性基材上的結構為重點進行了說明,但是作為絕緣性基材的材質,當然不僅限定於聚醯亞胺樹脂。就其他物質而言,只要是具有與聚醯亞胺樹脂近似的顏色的物質即可作為絕緣性基材來應用。In addition, in the above-described embodiments and examples, the copper foil for a printed wiring board according to the present invention has been mainly bonded to an insulating base material made of a polyimide resin, but The material of the insulating base material is of course not limited to the polyimide resin. As the other substance, any substance having a color similar to that of the polyimide resin can be used as an insulating substrate.

具體而言,也可以應用例如PET(聚對苯二甲酸乙二醇酯,polyethylene terephthalate)、PI(聚醯亞胺)、PEI(聚醚醯亞胺)、PEN(聚萘二甲酸乙二醇酯,polyethylene naphthalate)、PP(聚丙烯)、PE(聚乙烯)、環氧樹脂(epoxy)、尼龍(nylon)、氟系樹脂等。Specifically, for example, PET (polyethylene terephthalate), PI (polyimide), PEI (polyether quinone), PEN (polyethylene naphthalate) can also be applied. Ester, polyethylene naphthalate, PP (polypropylene), PE (polyethylene), epoxy (epoxy), nylon (nylon), fluorine resin, and the like.

另外,上述實施方式及實施例中所說明的印刷配線板用銅箔的鎳鈷合金鍍層3的材質(組成),由於能夠對該銅箔進行圖案加工而形成的導體圖案於穿透由聚醯亞胺樹脂形成的絕緣性基材進行確認的顏色的彩度c* =(a*2 +b*2 )1/2 為6以下,係為極佳的一典型態樣,因此理當不僅限定於上述所規定的材質(組成)。除此以外,亦可因應例如原箔1的合金組成和表面粗糙度,或絕緣性基材的顏色和透光性等的各種條件來適宜地變更鎳鈷合金鍍層3的材質,而使對該銅箔進行圖案加工而形成的導體圖案於穿透絕緣性基材進行確認的顏色的彩度c* =(a*2 +b*2 )1/2 為6以下。In addition, the material (composition) of the nickel-cobalt alloy plating layer 3 of the copper foil for a printed wiring board described in the above embodiments and examples is a conductive pattern formed by patterning the copper foil. The coloring of the color of the insulating base material formed of the imide resin c * = (a * 2 + b * 2 ) 1/2 is 6 or less, which is an excellent typical example, and therefore is not limited to The material (composition) specified above. In addition, the material of the nickel-cobalt alloy plating layer 3 may be appropriately changed depending on, for example, the alloy composition and surface roughness of the original foil 1, or the color and light transmittance of the insulating base material. The color pattern c * = (a *2 + b * 2 ) 1/2 of the color of the conductor pattern formed by patterning the copper foil to be infiltrated into the insulating base material is 6 or less.

1...原箔1. . . Original foil

2...粗糙化鍍層2. . . Rough coating

3...鎳鈷合金鍍層3. . . Nickel-cobalt alloy coating

4...鋅鍍層4. . . Zinc coating

5...鉻酸鹽處理層5. . . Chromate treatment layer

6...矽烷偶合處理層6. . . Decane coupling treatment layer

圖1為模式地表示本發明實施方式相關的印刷配線板用銅箔的主要結構的圖。FIG. 1 is a view schematically showing a main configuration of a copper foil for a printed wiring board according to an embodiment of the present invention.

1...原箔1. . . Original foil

2...粗糙化鍍層2. . . Rough coating

3...鎳鈷合金鍍層3. . . Nickel-cobalt alloy coating

4...鋅鍍層4. . . Zinc coating

5...鉻酸鹽處理層5. . . Chromate treatment layer

6...矽烷偶合處理層6. . . Decane coupling treatment layer

Claims (6)

一種印刷配線板用銅箔,係為在印刷配線板上為了形成導體圖案而用來黏貼於絕緣性基材之表面上而設定的印刷配線板用銅箔,其特徵為:具有穿透所述絕緣性基材進行光學檢測之基於日本工業規格JIS Z8729的該印刷配線板用銅箔表面的彩度c* =(a*2 +b*2 )1/2 為6以下的鎳鈷合金鍍層,其中,具有使穿透所述絕緣性基材進行光學檢測之基於日本工業規格JIS Z8730的該印刷配線板用銅箔表面的顏色,與黑色的色差△E* ab為3以內的鎳鈷合金鍍層。A copper foil for a printed wiring board, which is a copper foil for a printed wiring board which is set to be adhered to a surface of an insulating substrate to form a conductor pattern on a printed wiring board, and has a feature that The nickel-cobalt alloy plating layer having a chroma c * =(a *2 +b *2 ) 1/2 of 6 or less on the surface of the copper foil for the printed wiring board based on Japanese Industrial Standard JIS Z8729, which is optically detected by an insulating substrate. In addition, the color of the surface of the copper foil for the printed wiring board based on Japanese Industrial Standard JIS Z8730, which is optically detected through the insulating base material, and the nickel-cobalt alloy plating having a color difference ΔE * ab of 3 or less . 如申請專利範圍第1項所述的印刷配線板用銅箔,其中,所述絕緣性基材係由聚醯亞胺樹脂構成。 The copper foil for a printed wiring board according to the first aspect of the invention, wherein the insulating base material is made of a polyimide resin. 一種印刷配線板用銅箔,係為在印刷配線板上為了形成導體圖案而用來黏貼於絕緣性基材之表面上而設定之印刷配線板用銅箔,其特徵為:在由銅或銅基合金形成的原箔的表面上具有鎳鈷合金鍍層,所述鎳鈷合金鍍層係由鎳及鈷的合金的電鍍皮膜構成,其中鈷的濃度為20質量%以上且小於55質量%,並且鎳和鈷的合計附著量為20μg/cm2 以上且小於40μg/cm2A copper foil for a printed wiring board is a copper foil for a printed wiring board which is provided on a surface of a printed wiring board for bonding a conductive pattern to a surface of an insulating substrate, and is characterized in that it is made of copper or copper. The base foil formed of the base alloy has a nickel-cobalt alloy plating layer on the surface thereof, and the nickel-cobalt alloy plating layer is composed of an electroplated coating of an alloy of nickel and cobalt, wherein the concentration of cobalt is 20% by mass or more and less than 55% by mass, and nickel The total adhesion amount to cobalt is 20 μg/cm 2 or more and less than 40 μg/cm 2 . 如申請專利範圍第3項所述的印刷配線板用銅箔,其中,在所述鎳鈷合金鍍層上還具有由鋅的電鍍皮膜構成的鋅鍍層。 The copper foil for a printed wiring board according to claim 3, further comprising a zinc plating layer made of a plating film of zinc on the nickel-cobalt alloy plating layer. 如申請專利範圍第3項或第4項所述的印刷配線板用銅箔,其中,在所述鎳鈷合金鍍層或所述鋅鍍層上還具有3價鉻酸鹽處理層。 The copper foil for a printed wiring board according to the invention of claim 3, wherein the nickel-cobalt alloy plating layer or the zinc plating layer further has a trivalent chromate-treated layer. 一種印刷配線板用銅箔的製造方法,係為在印刷配線板上為了形成導體圖案而用來黏貼於絕緣性基材之表面上而設定之印刷配線板用銅箔的製造方法,其特徵為包含:在由銅或銅基合金形成的原箔的表面上形成鎳鈷合金鍍層的步驟,所述鎳鈷合金鍍層係由鎳及鈷的合金的電鍍皮膜構成,其中鈷的濃度為20質量%以上且小於55質量%,並且鎳及鈷的合計附著量為20μg/cm2 以上且小於40μg/cm2 ;在所述鎳鈷合金鍍層上形成由鋅的電鍍皮膜所構成的鋅鍍層的步驟;在所述鋅鍍層上形成3價鉻酸鹽處理層的步驟;以及 在形成所述3價鉻酸鹽處理層後,於該3價鉻酸鹽處理層的表面塗佈矽烷偶合劑的水溶液,在乾燥氛圍溫度為150℃以上300℃以下進行加熱乾燥而形成矽烷偶合處理層的步驟。A method for producing a copper foil for a printed wiring board is a method for producing a copper foil for a printed wiring board which is provided on a surface of a printed wiring board for bonding a conductive pattern to a surface of an insulating substrate. And comprising: a step of forming a nickel-cobalt alloy plating layer on a surface of a raw foil formed of a copper or a copper-based alloy, the nickel-cobalt alloy plating layer being composed of an electroplated coating of an alloy of nickel and cobalt, wherein a concentration of cobalt is 20% by mass The above and less than 55% by mass, and the total adhesion amount of nickel and cobalt is 20 μg/cm 2 or more and less than 40 μg/cm 2 ; and a step of forming a zinc plating layer composed of an electroplated zinc film on the nickel-cobalt alloy plating layer; a step of forming a trivalent chromate treatment layer on the zinc plating layer; and after forming the trivalent chromate treatment layer, coating an aqueous solution of a decane coupling agent on the surface of the trivalent chromate treatment layer, The step of forming a decane coupling treatment layer by heating and drying at a dry atmosphere temperature of 150 ° C or more and 300 ° C or less.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI584707B (en) * 2014-08-29 2017-05-21 Sumitomo Metal Mining Co A method for manufacturing a flexible copper wiring board, and a method for manufacturing a flexible copper clad sheet

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013065727A1 (en) * 2011-11-02 2013-05-10 Jx日鉱日石金属株式会社 Copper foil for printed circuit
TWI497051B (en) * 2012-09-14 2015-08-21 Jx Nippon Mining & Metals Corp An evaluation apparatus for a surface condition of a metallic material, a visibility evaluation apparatus for a transparent substrate, an evaluation program thereof, and a computer-readable recording medium on which a recording medium is recorded, and a method of detecting the same
JP5362924B1 (en) 2012-11-09 2013-12-11 Jx日鉱日石金属株式会社 Surface-treated copper foil and laminate using the same
JP5706026B1 (en) * 2013-07-30 2015-04-22 古河電気工業株式会社 Copper foil for wiring board and wiring board
JP6393126B2 (en) * 2013-10-04 2018-09-19 Jx金属株式会社 Surface-treated rolled copper foil, laminate, printed wiring board, electronic device, and printed wiring board manufacturing method
KR101895256B1 (en) * 2014-09-02 2018-09-05 미쓰이금속광업주식회사 Blackened surface treated copper foil and copper foil with carrier foil
CN106795644B (en) * 2014-09-09 2019-10-01 古河电气工业株式会社 Copper foil for printed wiring board and copper clad laminate
JP5877282B1 (en) * 2014-09-09 2016-03-02 古河電気工業株式会社 Copper foil and copper-clad laminate for printed wiring boards
CN109839347A (en) * 2019-04-10 2019-06-04 珠海市永刚塑料制品有限公司 A kind of corrosion-resistant test technology of automobile decoration piece product treatment
CN111129194A (en) * 2019-12-23 2020-05-08 浙江正泰太阳能科技有限公司 Black bus bar, manufacturing method thereof and full-black photovoltaic module
CN113438805A (en) * 2021-07-06 2021-09-24 昆山联滔电子有限公司 Copper foil substrate for flexible antenna and method for manufacturing the same

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI246398B (en) * 2004-02-17 2005-12-21 Nikko Materials Co Ltd Copper foil having blackened surface or layer

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2608014B2 (en) * 1992-11-17 1997-05-07 悦 ▲柳▼平 Painting method
JP2002341783A (en) * 2001-05-18 2002-11-29 Shuho:Kk Display filter in electronic image display device
TW583688B (en) * 2002-02-21 2004-04-11 Dainippon Printing Co Ltd Electromagnetic shielding sheet and method of producing the same
JP4311991B2 (en) * 2003-06-30 2009-08-12 長島鋳物株式会社 Color iron cover for underground structures
JP2009004423A (en) * 2007-06-19 2009-01-08 Hitachi Cable Ltd Copper foil with carrier foil
JP4941204B2 (en) * 2007-09-27 2012-05-30 日立電線株式会社 Copper foil for printed wiring board and surface treatment method thereof
JP4978456B2 (en) * 2007-12-19 2012-07-18 日立電線株式会社 Copper foil for printed circuit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI246398B (en) * 2004-02-17 2005-12-21 Nikko Materials Co Ltd Copper foil having blackened surface or layer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI584707B (en) * 2014-08-29 2017-05-21 Sumitomo Metal Mining Co A method for manufacturing a flexible copper wiring board, and a method for manufacturing a flexible copper clad sheet

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