TWI422885B - Optical device - Google Patents

Optical device Download PDF

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Publication number
TWI422885B
TWI422885B TW096113741A TW96113741A TWI422885B TW I422885 B TWI422885 B TW I422885B TW 096113741 A TW096113741 A TW 096113741A TW 96113741 A TW96113741 A TW 96113741A TW I422885 B TWI422885 B TW I422885B
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face
optical fiber
incident end
end surface
incident
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TW096113741A
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TW200745648A (en
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Atsushi Mukai
Chiaki Goto
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Fujifilm Corp
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24Coupling light guides
    • G02B6/42Coupling light guides with opto-electronic elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24Coupling light guides
    • G02B6/26Optical coupling means
    • G02B6/27Optical coupling means with polarisation selective and adjusting means
    • G02B6/2706Optical coupling means with polarisation selective and adjusting means as bulk elements, i.e. free space arrangements external to a light guide, e.g. polarising beam splitters
    • G02B6/2713Optical coupling means with polarisation selective and adjusting means as bulk elements, i.e. free space arrangements external to a light guide, e.g. polarising beam splitters cascade of polarisation selective or adjusting operations
    • G02B6/272Optical coupling means with polarisation selective and adjusting means as bulk elements, i.e. free space arrangements external to a light guide, e.g. polarising beam splitters cascade of polarisation selective or adjusting operations comprising polarisation means for beam splitting and combining
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24Coupling light guides
    • G02B6/26Optical coupling means
    • G02B6/32Optical coupling means having lens focusing means positioned between opposed fibre ends
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133526Lenses, e.g. microlenses or Fresnel lenses

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optical Couplings Of Light Guides (AREA)
  • Semiconductor Lasers (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)

Description

光學裝置Optical device

本發明係關於一種光學裝置,特別是關於使從光源發出之光束結合於光纖的光學裝置。BACKGROUND OF THE INVENTION 1. Field of the Invention This invention relates to an optical device, and more particularly to an optical device for bonding a light beam emitted from a light source to an optical fiber.

以往,使用了一種方法,在以光學系使從光源發出的光束聚光並結合於光纖的光學裝置中,在通過光學系之光束的光路上配置光源側已被斜切的透明介電質塊體,使光纖與該介電質塊體之未被斜切之側(出射端面)進行光學接觸,藉以減低因已在光纖之入射端面反射的光返回光源而產生的雜訊。Conventionally, in a method of concentrating a light beam emitted from a light source by an optical system and bonding it to an optical fiber, a transparent dielectric block whose light source side has been chamfered is disposed on an optical path of a light beam passing through the optical system. The body optically contacts the optical fiber with the uncut side (the exit end face) of the dielectric block, thereby reducing noise generated by returning the light reflected by the incident end face of the optical fiber to the light source.

不過,在上述光學裝置中,在配設於前述光路的零件方面,會有在該零件周圍附著(集塵)殘存之異物而使光特性惡化的問題,特別是在光聚光(光密度高)的部分,亦即介電質塊體之出射端面及光纖之入射端面的核芯,集塵會很明顯。因此,在介電質塊體之出射端面及光纖之入射端面,會有為了進行上述光學接觸而產生壓力,導致異物被用力按壓而附著,且該附著之異物變得不容易除去的疑慮。如果異物附著,就會有產生因光的散亂和前述光學接觸不佳而造成之結合率下降、使光源的可靠度下降的疑慮。However, in the optical device described above, in the case of the components disposed in the optical path, there is a problem that foreign matter remaining (dust collecting) is adhered around the component to deteriorate optical characteristics, particularly in light concentrating (high optical density) The part, that is, the exit end face of the dielectric block and the core of the incident end face of the optical fiber, the dust collection is obvious. Therefore, in the exit end face of the dielectric block and the incident end face of the optical fiber, pressure is generated in order to perform the above-described optical contact, and the foreign matter is pressed by the force and adhered, and the adhered foreign matter is not easily removed. If the foreign matter adheres, there is a fear that the combination of the light is scattered and the optical contact is poor, and the reliability of the light source is lowered.

因此,已揭露了一種方法,用樹脂將介電質塊體黏在圓筒狀構件(制動器)內面,並使該制動器與配設在光纖周圍的套管接觸,藉以在光纖之入射端面和介電質塊體之間設置空隙並防止異物附著(專利文獻1)。Therefore, a method has been disclosed in which a dielectric block is adhered to the inner surface of a cylindrical member (brake) with a resin, and the stopper is brought into contact with a sleeve disposed around the optical fiber, whereby the incident end face of the optical fiber is A space is provided between the dielectric blocks to prevent foreign matter from adhering (Patent Document 1).

[專利文獻1]特開平6-148471號公報[Patent Document 1] Japanese Patent Publication No. 6-148471

不過,關於上述異物,則考量到有機物,該有機物除了在大氣中殘存的有機分子以外,有可能是從接著劑產生的有機分子。通常接著劑是使用在於光學裝置內部配設之光學構件的固定以及光纖和該光纖周圍配設之套管的固定等。因此,在使用上述制動器的方法中,會有從固定制動器和套管的接著劑產生的有機分子迴繞於上述密閉空間,並附著在光纖之入射端面的核芯之疑慮。特別是在制動器和介電質塊體的固定方面也使用接著劑的情況下,由於從該接著劑產生之有機分子而使前述附著之可能性有進一步提高的疑慮。However, regarding the above foreign matter, an organic substance which may be an organic molecule generated from an adhesive other than an organic molecule remaining in the atmosphere may be considered. Usually, the adhesive is used for fixing the optical member disposed inside the optical device, fixing the optical fiber and the sleeve disposed around the optical fiber, and the like. Therefore, in the method of using the above-described brake, there is a fear that the organic molecules generated from the adhesive for fixing the brake and the sleeve are wound around the sealed space and adhere to the core of the incident end face of the optical fiber. In particular, in the case where an adhesive is also used for fixing the brake and the dielectric block, the possibility of the adhesion is further increased due to the organic molecules generated from the adhesive.

另外,在光纖之入射端面也有可能出現從固接配設於光學裝置內部之光學構件的接著劑所產生之有機分子或大氣中殘存之有機分子的情況下,也和上述相同,會有有機分子附著於光纖之入射端面的核芯的疑慮。In addition, in the case where an organic molecule generated by an adhesive attached to an optical member disposed inside the optical device or an organic molecule remaining in the atmosphere may be present on the incident end surface of the optical fiber, the organic molecule may be present as described above. Concerns about the core attached to the incident end face of the fiber.

另外,因為使用制動器,所以制動器部分的零件件數增加,零件成本提高,在光學裝置中,因為必須以微米階級來穩定地維持光源和光纖之入射端面為光學結合的狀態,所以必須高精度地進行制動器和介電質塊體之定位,該定位更會花費製造成本。In addition, since the number of parts of the brake portion is increased and the cost of parts is increased because the brake is used, in the optical device, since it is necessary to stably maintain the state in which the incident end faces of the light source and the optical fiber are optically combined with the micron level, it is necessary to accurately The positioning of the brake and the dielectric block is performed, and the positioning is more costly to manufacture.

另外,本發明們發現了:在雷射等之光源的振動波長為160nm~500nm的情況下,通過光纖之入射端面及/或介電質塊體之出射端面的光束之能量密度為1.0mW/μm2 高能量密度區域中,使光纖之入射端面和介電質塊體之出射端面進行光學接觸,若從前述光源產生光束時,核芯之入射端面和感應體之出射端面則融著,光纖之脫落和振動等而造成光纖之入射端面及/或介電質塊體之出射端面剝離而產生缺陷,會有使光透過率下降的可能性。Further, the present inventors have found that, in the case where the vibration wavelength of a light source such as a laser is 160 nm to 500 nm, the energy density of the light beam passing through the incident end face of the optical fiber and/or the exit end face of the dielectric block is 1.0 mW/ In the high energy density region of μm 2 , the incident end surface of the optical fiber and the exit end surface of the dielectric mass are optically contacted. When the light beam is generated from the light source, the incident end surface of the core and the exit end surface of the inductor are fused, and the optical fiber is fused. The occurrence of detachment, vibration, and the like causes the incident end face of the optical fiber and/or the exit end face of the dielectric block to be peeled off to cause defects, which may lower the light transmittance.

本發明係有鑑於相關狀況而被製作者,其目的為提供一種光學裝置,以低成本抑制異物的附著,進一步防止在高能量密度區域的光纖融著,且具備高可靠度。The present invention has been made in view of the circumstances, and an object thereof is to provide an optical device which suppresses adhesion of foreign matter at a low cost, further prevents fusion of an optical fiber in a high energy density region, and has high reliability.

本發明的光學裝置係具備:光源;光學系,使從該光源發出的光束聚光;介電質塊體,配置在通過該光學系之光束的光路上;以及光纖,其配置成使通過該介電質塊體的光束從核芯之端面入射;該光學裝置之特徵為:在前述光纖之入射端面和前述介電質塊體之出射端面之間,至少前述核芯之入射端面是位於與前述介電質塊體之出射端面分離的位置,前述光纖之入射端面的包圍前述核芯之入射端面的部分係藉由被按壓於前述介電質塊體,而形成包圍前述核芯之入射端面的密閉空間。An optical device according to the present invention includes: a light source; an optical system that condenses a light beam emitted from the light source; a dielectric block disposed on an optical path of a light beam passing through the optical system; and an optical fiber configured to pass the optical device a light beam of the dielectric block is incident from an end face of the core; the optical device is characterized in that at least between the incident end face of the optical fiber and the exit end face of the dielectric block, at least the incident end face of the core is located a portion where the exit end face of the dielectric block is separated, and a portion of the incident end surface of the optical fiber that surrounds the incident end surface of the core is pressed against the dielectric block to form an incident end face surrounding the core Confined space.

此外,在此所謂的「前述光纖之入射端面的包圍前述核芯之入射端面的部分」是指前述光纖之入射端面的前述核芯入射端面以外之部分的全部亦可,或者是一部分亦可。但是,此部分必須是將核芯之入射端面完全地包圍成相對於核芯之入射端面形成密閉空間。In addition, the "portion of the incident end surface of the optical fiber surrounding the incident end surface of the core" may be a part of the incident end surface of the optical fiber other than the core incident end surface, or may be a part. However, this portion must be such that the incident end face of the core is completely surrounded to form a closed space with respect to the incident end face of the core.

本發明的光學裝置中,若前述光纖在前述核芯的周圍具備包覆層,則和前述核芯之入射端面鄰接的前述包覆層之至少一部分的端面是位於與前述介電質塊體之出射端面分離的位置。In the optical device according to the present invention, when the optical fiber includes a coating layer around the core, at least a part of an end surface of the cladding layer adjacent to an incident end surface of the core is located in the dielectric block. The position where the exit end faces are separated.

本發明的其他光學裝置,其具備:光源;光學系,使從該光源發出的光束聚光;介電質塊體,配置在通過該光學系之光束的光路上;光纖,其配置成使通過該介電質塊體的光束從核芯之端面入射;以及套管,從該光纖之入射端面突出的位置到前述光束之行進方向的既定位置為止,被配設在前述光纖的周圍;該光學裝置之特徵為:在前述光纖之入射端面和前述介電質塊體之出射端面之間,至少前述核芯之入射端面是位於與前述介電質塊體之出射端面分離的位置,從前述光纖之入射端面突出的前述套管之端面係藉由被按壓於前述介電質塊體,而形成包圍前述核芯之入射端面的密閉空間。Another optical device according to the present invention includes: a light source; an optical system that condenses a light beam emitted from the light source; a dielectric block disposed on an optical path of a light beam that passes through the optical system; and an optical fiber configured to pass a light beam of the dielectric block is incident from an end surface of the core; and a sleeve is disposed around the optical fiber from a position where the incident end surface of the optical fiber protrudes to a predetermined position of the traveling direction of the light beam; the optical The device is characterized in that at least the incident end face of the core is located at a position separated from the exit end face of the dielectric block between the incident end face of the optical fiber and the exit end face of the dielectric block, from the optical fiber The end surface of the sleeve projecting from the incident end surface is pressed against the dielectric block to form a sealed space surrounding the incident end surface of the core.

形成前述密閉空間的構件或者接觸前述密閉空間之內部的構件不包含由有機分子組成的構件為較佳。此外,具體而言,由有機分子組成的構件是指接著劑。It is preferable that the member forming the sealed space or the member contacting the inside of the sealed space does not include a member composed of organic molecules. Further, specifically, a member composed of organic molecules means an adhesive.

前述光纖之入射端面及/或前述介電質塊體之出射端面係披覆著AR膜,用以防止從前述光源發出之光束的反射為較佳。The incident end face of the optical fiber and/or the exit end face of the dielectric block are covered with an AR film to prevent reflection of a light beam emitted from the light source.

另外,較佳為在光束之波長為λ的情況下,前述核芯之入射端面和前述介電質塊體之出射端面之間的距離L為L=n λ/2±λ/8(n是整數)。Further, preferably, when the wavelength of the light beam is λ, the distance L between the incident end face of the core and the exit end face of the dielectric block is L = n λ / 2 ± λ / 8 (n is Integer).

前述光束之波長較佳為160nm~500nm。前述光束的能量密度在入射至前述光纖之入射端面的時候為1.0mW/μm2 以上為較佳。The wavelength of the light beam is preferably from 160 nm to 500 nm. It is preferable that the energy density of the light beam is 1.0 mW/μm 2 or more when incident on the incident end surface of the optical fiber.

本發明的畫像曝光裝置之特徵為具備上述光學裝置來作為曝光用光源。The image exposure apparatus of the present invention is characterized in that the optical device is provided as an exposure light source.

藉由本發明的光學裝置,朝向介電質塊體之出射端面,推壓光纖之入射端面的包圍核芯之入射端面的部分,例如具有包圍核芯之入射端面的孔穴的光纖之入射端面,所以介電質塊體之出射端面以及光纖之入射端面的包圍核芯之部分會彈性變形,形成包圍前述核芯之入射端面的密閉空間。藉由至少在核芯之入射端面和介電質塊體之出射端面之間設置密閉空間,因為能夠減低可能從固接配設在光學裝置內部之光學構件等的接著劑產生的有機分子等之異物混入前述密閉空間的內部,所以能抑制異物附著於光聚光的部分,亦即核芯之入射端面。另外,雖然是在些許異物混入前述密閉空間的情況下,也能防止異物被推擠至 核芯之入射端面,所以能抑制異物的附著。藉此能夠抑制因異物所造成之光散亂和結合效率的下降,能提升光源的可靠度。According to the optical device of the present invention, the portion of the incident end surface of the optical fiber that surrounds the incident end surface of the core is pressed toward the exit end face of the dielectric block, for example, the incident end face of the optical fiber having the hole surrounding the incident end face of the core, The exit end face of the dielectric block and the portion of the incident end face of the optical fiber that surrounds the core are elastically deformed to form a sealed space surrounding the incident end face of the core. By providing a sealed space at least between the incident end surface of the core and the exit end surface of the dielectric block, it is possible to reduce organic molecules or the like which may be generated from an adhesive which is fixed to an optical member or the like disposed inside the optical device. Since the foreign matter is mixed into the inside of the sealed space, it is possible to suppress the foreign matter from adhering to the portion where the light is concentrated, that is, the incident end surface of the core. In addition, even when a small amount of foreign matter is mixed into the sealed space, foreign matter can be prevented from being pushed to The incident end face of the core prevents the adhesion of foreign matter. Thereby, it is possible to suppress light scattering caused by foreign matter and a decrease in bonding efficiency, and it is possible to improve the reliability of the light source.

另外,為了設置前述密閉空間而不使用制動器等的其他零件,僅追加在光纖之入射端面及/或介電質塊體之出射端面形成例如凹部等的加工步驟即可,所以能降低零件成本,也能降低制動器和介電質塊體之高精度定位造成的製造成本。In addition, in order to provide the sealed space without using other components such as a brake, it is only necessary to add a processing step such as forming a concave portion to the incident end surface of the optical fiber and/or the output end surface of the dielectric block, so that the component cost can be reduced. It also reduces the manufacturing cost caused by the high-precision positioning of the brake and the dielectric block.

另外,藉由本發明之其他裝置,朝向介電質塊體之出射端面,推壓從光纖之入射端面突出的套管之端面,所以介電質塊體之出射端面以及套管之端面彈性會變形,形成包圍前述核芯之入射端面的密閉空間。因此即使是在例如些許異物混入密閉空間的情況下,也能防止異物被推擠至核芯之入射端面,所以能抑制異物的附著。藉此能夠抑制因異物所造成之光散亂和結合效率的下降,能提升光源的可靠度。In addition, with the other device of the present invention, the end face of the sleeve projecting from the incident end face of the optical fiber is pressed toward the exit end face of the dielectric block, so that the exit end face of the dielectric block and the end face of the sleeve are elastically deformed. Forming a sealed space surrounding the incident end surface of the core. Therefore, even when, for example, a small amount of foreign matter is mixed into the sealed space, the foreign matter can be prevented from being pushed to the incident end surface of the core, so that the adhesion of the foreign matter can be suppressed. Thereby, it is possible to suppress light scattering caused by foreign matter and a decrease in bonding efficiency, and it is possible to improve the reliability of the light source.

另外,為了設置前述密閉空間而不使用制動器等的其他零件,例如使用抵碰治具等,僅追加為了使套管的端面比光纖之入射端面更突出至介電質塊體側而利用焊料來固定的步驟即可,所以能降低零件成本,也能降低制動器和介電質塊體之高精度定位造成的製造成本。Further, in order to provide the sealed space without using other components such as a brake, for example, a contact jig or the like is used, and only the end surface of the sleeve is protruded from the incident end surface of the optical fiber to the dielectric block side, and solder is used. The fixed steps are sufficient, so that the cost of the parts can be reduced, and the manufacturing cost caused by the high-precision positioning of the brake and the dielectric block can be reduced.

此外,在形成密閉空間的構件或者接觸密閉空間之內部的構件不包含由有機分子組成的構件,例如接著劑的情況下,因為能夠減低可能從固接配設在光學裝置內部之光學構件等的接著劑產生的有機分子等之異物混入密閉空間的內部,所以能抑制異物附著於光聚光的部分,亦即核芯之入射端面。Further, in the case where the member forming the sealed space or the member contacting the inside of the sealed space does not include a member composed of organic molecules, for example, an adhesive, it is possible to reduce an optical member or the like which may be fixedly disposed inside the optical device. Since the foreign matter such as organic molecules generated by the subsequent agent is mixed into the sealed space, it is possible to suppress the foreign matter from adhering to the portion where the light is concentrated, that is, the incident end face of the core.

另外,在光纖之入射端面及/或介電質塊體之出射端面披覆著用以防止從光源發出之光束的反射之AR膜的情況下,因為能減低在光纖之入射端面和介電質塊體之出射端面之間產生的光束之反射損失,所以能高效率地將光導波於光纖。In addition, in the case where the incident end face of the optical fiber and/or the exit end face of the dielectric block are covered with an AR film for preventing reflection of the light beam emitted from the light source, the incident end face and the dielectric at the optical fiber can be reduced. The reflection loss of the light beam generated between the exit end faces of the block allows the light to be efficiently guided to the optical fiber.

此外,在光束之波長為λ的情況下,若核芯之入射端面和介電質塊體之出射端面之間的距離L為L=n λ/2±λ/8(n是整數),就能減低在核芯之入射端面以及介電質塊體之出射端面的反射損失。Further, in the case where the wavelength of the light beam is λ, if the distance L between the incident end face of the core and the exit end face of the dielectric block is L = n λ / 2 ± λ / 8 (n is an integer), The reflection loss at the incident end face of the core and the exit end face of the dielectric block can be reduced.

在光源的振動波長為160nm~500nm的情況下,因為能量提高而集塵增長,所以採用本發明就能有效防止異物的附著。In the case where the vibration wavelength of the light source is from 160 nm to 500 nm, since the dust is increased due to the increase in energy, the adhesion of the foreign matter can be effectively prevented by the present invention.

另外,朝向光纖之入射端面入射的光束係因為高效率地結合於光纖,被聚集在比核芯直徑更小的區域,所以核芯之入射端面以及介電質塊體之出射端面成為高能量密度區域。在那種情況下,使光纖之入射端面和介電質塊體之出射端面進行光學接觸,從前述光源發出光束的時候,會有核芯之入射端面和介電質塊體之出射端面融著的疑慮,但藉由採用本發明,因為至少在核芯之入射端面和介電質塊體之出射端面之間設置密閉空間,所以能防止前述融著。藉此,能夠防止光纖之脫落和振動等而造成光纖之入射端面及/或介電質塊體之出射端面剝離而產生缺陷且光透過率下降。In addition, since the light beam incident toward the incident end surface of the optical fiber is efficiently bonded to the optical fiber and is concentrated in a region smaller than the core diameter, the incident end face of the core and the exit end face of the dielectric mass become high energy density. region. In that case, the incident end face of the optical fiber and the exit end face of the dielectric block are optically contacted, and when the light beam is emitted from the light source, the incident end face of the core and the exit end face of the dielectric block are fused. However, by adopting the present invention, since at least a sealed space is provided between the incident end surface of the core and the exit end surface of the dielectric block, the aforementioned fusion can be prevented. Thereby, it is possible to prevent the occurrence of defects such as the incident end face of the optical fiber and/or the exit end face of the dielectric block by the fall of the optical fiber, the vibration, and the like, and the light transmittance is lowered.

本發明的畫像曝光裝置係因為具備能獲得上述效果的光學裝置,所以能執行具備高可靠度之光源的曝光。Since the image exposure apparatus of the present invention includes an optical device capable of obtaining the above-described effects, exposure of a light source having high reliability can be performed.

以下,將參照圖式來詳細說明本發明的第1實施形態之光學裝置1。第1A圖所示為表示第1實施形態之光學裝置1的概略形狀的側截面圖。此外,在本實施形態中,為了方便起見將第1A圖之上側稱為上方來進行說明。Hereinafter, the optical device 1 according to the first embodiment of the present invention will be described in detail with reference to the drawings. Fig. 1A is a side cross-sectional view showing a schematic shape of an optical device 1 according to the first embodiment. Further, in the present embodiment, the upper side of Fig. 1A will be referred to as an upper side for convenience.

本實施形態之光學裝置1係如第1A圖所示,由以下所概略構成:GaN系半導體雷射LD,作為固定於由銅或銅合金所組成之熱塊體(散熱塊體)2上的光源;聚光透鏡3,作為使從GaN系半導體雷射LD發出之雷射光B(光束B)聚光的光學系列;介電質塊體4,配置於通過聚光透鏡3的雷射光B之光路;以及光纖30,使通過介電質塊體4的雷射光B入射。As shown in FIG. 1A, the optical device 1 of the present embodiment is roughly configured as follows: a GaN-based semiconductor laser LD is fixed as a thermal block (heat dissipation block) 2 composed of copper or a copper alloy. The light source; the condensing lens 3 is an optical series that condenses the laser light B (light beam B) emitted from the GaN-based semiconductor laser LD; the dielectric block 4 is disposed in the laser beam B that passes through the condensing lens 3. The optical path and the optical fiber 30 are incident on the laser light B passing through the dielectric block 4.

GaN系半導體雷射LD係以例如405nm的波長而振動者,且連接著供給驅動電流的引出配線2a。此外,作為GaN系半導體雷射LD,在160nm~500nm的波長範圍中,亦可使用以上述405nm以外的波長振動之雷射。在此,於振動波長為160nm~500nm的情況下,由於能量提高而集塵增加,所以採用本發明在防止異物之附著方面很有效。The GaN-based semiconductor laser LD vibrates at a wavelength of, for example, 405 nm, and is connected to the lead-out wiring 2a to which a drive current is supplied. Further, as the GaN-based semiconductor laser LD, a laser that vibrates at a wavelength other than the above 405 nm may be used in a wavelength range of 160 nm to 500 nm. Here, when the vibration wavelength is 160 nm to 500 nm, dust collection increases due to an increase in energy, and therefore, the present invention is effective in preventing adhesion of foreign matter.

聚光透鏡3是凸透鏡,其藉由例如對樹脂或者光學玻璃進行鑄模成形而形成。The condensing lens 3 is a convex lens which is formed by, for example, molding a resin or an optical glass.

介電質塊體4係由例如石英玻璃等的雷射光B可透過的構件所形成,且形成為在配設於雷射光B之光路時,聚光透鏡3側之端面,亦即入射端面4a,係具有越朝著下方則越遠離聚光透鏡3的斜面,光纖30側之端面,亦即出射端面4b,係形成為和光纖30之軸成直角。若為如上述之入射端面4a具有斜面者,能夠抑制在後述光纖30之入射端面30A的核芯5因為雷射光B之反射光返回GaN系半導體雷射LD而產生的雜訊。The dielectric block 4 is formed of a member transparent to the laser beam B such as quartz glass, and is formed as an end surface on the side of the collecting lens 3 when the optical path of the laser beam B is disposed, that is, the incident end face 4a. The lower end of the optical fiber 30 side, that is, the end surface 4b, is formed at a right angle to the axis of the optical fiber 30. When the incident end surface 4a has a slope as described above, it is possible to suppress noise generated by the core 5 of the incident end surface 30A of the optical fiber 30 to be returned to the GaN-based semiconductor laser LD due to the reflected light of the laser light B.

然後,光學配置上述GaN系半導體雷射LD、聚光透鏡3及介電質塊體4,藉由例如接著劑等而固接於封裝,而成為整體型模組。Then, the GaN-based semiconductor laser LD, the condensing lens 3, and the dielectric block 4 are optically disposed, and are fixed to the package by, for example, an adhesive to form an integral module.

光纖30係由形成於軸芯的核芯5、在核芯5的周圍形成的包覆層6所構成。在光纖30的周圍,從光纖30之入射端面朝著雷射光B之行進方向到既定位置(未圖示)為止,藉由例如接著劑而固接圓筒狀的套管7。The optical fiber 30 is composed of a core 5 formed on the shaft core and a coating layer 6 formed around the core 5. Around the optical fiber 30, the cylindrical sleeve 7 is fixed by, for example, an adhesive agent from the incident end surface of the optical fiber 30 toward a predetermined position (not shown) in the traveling direction of the laser light B.

套管7係由陶瓷、玻璃或金屬,或者是從其等的組合所組成之材料所形成。在由陶瓷或玻璃所形成的情況下,其側面較佳為藉由鍍金屬或是濺鍍法來進行金屬化加工。然後,在套管7被配設於光纖30周圍之後,套管7之介電質塊體4側的端面7a及光纖30之入射端面係被研磨加工成平坦或球面狀。The sleeve 7 is formed of ceramic, glass or metal, or a material composed of a combination thereof. In the case of being formed of ceramic or glass, the side surface is preferably metallized by metal plating or sputtering. Then, after the sleeve 7 is disposed around the optical fiber 30, the end surface 7a of the sleeve 7 on the side of the dielectric block 4 and the incident end surface of the optical fiber 30 are polished to be flat or spherical.

在此,本發明之特徵為,將如同上述之光纖30被研磨加工成平坦或球面狀之入射端面,如第1圖所示,加工成形成有朝向核芯5之中心而具有平緩曲率的凹部GA之入射端面30A。此時,凹部GA係從比包覆層6之外周圍稍微靠近內側處(核芯5側)形成凹狀,除了包覆層6凹部GA以外的外側入射端面6a1係加工成位於和套管7之端面7a呈同一面。凹部係藉由濕式蝕刻法所形成,而該濕式蝕刻法係將光纖30之入射端面浸入於作為蝕刻溶液的HF水溶液或HF與NH4F之混合水溶液而進行。此外,加工方法並非限定為濕式蝕刻法,即使採用研磨的形狀控制、使用CF4等的乾式蝕刻、與光阻製程之組合的乾式蝕刻、濕式蝕刻、沉積法等亦可。Here, the present invention is characterized in that, as described above, the optical fiber 30 is polished into a flat or spherical incident end surface, and as shown in FIG. 1, it is processed to have a concave portion having a gentle curvature toward the center of the core 5. The incident end face 30A of the GA. At this time, the concave portion GA is formed in a concave shape slightly from the outer side (the core 5 side) of the outer periphery of the cladding layer 6, and the outer incident end surface 6a1 except the concave portion GA of the cladding layer 6 is processed to be located in the sleeve 7 The end faces 7a are in the same plane. The concave portion is formed by a wet etching method in which the incident end surface of the optical fiber 30 is immersed in an aqueous HF solution as an etching solution or a mixed aqueous solution of HF and NH4F. Further, the processing method is not limited to the wet etching method, and it may be controlled by polishing, dry etching using CF4 or the like, dry etching combined with a photoresist process, wet etching, deposition method, or the like.

然後,於形成有凹部GA之入射端面30A係藉由蒸著而披覆防止雷射光B反射的AR(無反射)膜。此外,AR膜亦披覆上述介電質塊體4之入射端面4a及出射端面4b。藉由這種方式,在連接介電質塊體4之出射端面4b和光纖30之入射端面30A的時候,因為能夠減低在出射端面4b與入射端面30A之間產生的雷射光B之反射損失,所以能高效率地將雷射光B導波至光纖30。此外,在本實施形態中,雖已將AR膜披覆於光纖30之入射端面30A、介電質塊體4之入射端面4a及出射端面4b,但本發明並非限於此,亦可披覆任何一者1個端面,亦可披覆任何者2個端面,亦可以不披覆。Then, the incident end surface 30A on which the concave portion GA is formed is coated with an AR (non-reflective) film that prevents reflection of the laser light B by evaporation. Further, the AR film also covers the incident end face 4a and the exit end face 4b of the dielectric block 4. In this manner, when the exit end face 4b of the dielectric block 4 and the incident end face 30A of the optical fiber 30 are connected, since the reflection loss of the laser light B generated between the exit end face 4b and the incident end face 30A can be reduced, Therefore, the laser light B can be efficiently guided to the optical fiber 30. Further, in the present embodiment, the AR film is applied to the incident end surface 30A of the optical fiber 30, the incident end surface 4a of the dielectric block 4, and the emission end surface 4b. However, the present invention is not limited thereto and may be coated with any One end face can also cover either end face or not.

此外,不在光纖和介電質塊體設置AR膜的情況下,將核芯之入射端面5a與介電質塊體之出射端面4b之間的距離作為L,光束之波長作為λ的情況下,較佳為將L設定成L=n λ/2±λ/8(n是整數)。第1B圖係表示核芯之入射端面5a與介電質塊體之出射端面4b之間的距離L和透過率的關係,藉由將L定為n λ/2±λ/8(n是整數),能減低在出射端面4b與入射端面30A之間產生的雷射光B之反射損失。Further, when the AR film is not provided in the optical fiber and the dielectric block, the distance between the incident end face 5a of the core and the exit end face 4b of the dielectric block is L, and the wavelength of the light beam is λ. It is preferable to set L to L = n λ / 2 ± λ / 8 (n is an integer). Fig. 1B shows the relationship between the distance L between the incident end face 5a of the core and the exit end face 4b of the dielectric block and the transmittance, by setting L to n λ/2 ± λ / 8 (n is an integer The reflection loss of the laser light B generated between the exit end face 4b and the incident end face 30A can be reduced.

然後,如上述地形成的光纖30係以6~12N按壓套管7之端面7a及包覆層6之外側入射端面6a1至介電質塊體4之出射端面4b,做成例如以彈性構件將由套管和光纖組成的插栓壓押至包含雷射光源、聚光光學系、介電質塊體的插座的連接器型,並利用連接器構造內的彈性構件,將光纖30壓押至介電質塊體4,藉以定位成使通過介電質塊體4的雷射光B聚光於核芯5之入射端面5a。此外,光纖30能夠反復裝卸於介電質塊體4之出射端面4b。Then, the optical fiber 30 formed as described above is pressed with the end surface 7a of the sleeve 7 and the outer end surface 6a1 of the cladding layer 6 to the exit end surface 4b of the dielectric block 4 by 6 to 12 N, for example, by an elastic member. The plug of the sleeve and the optical fiber is pressed to a connector type including a socket of a laser light source, a collecting optical system, and a dielectric block, and the optical member 30 is pressed to the optical member 30 by using an elastic member in the connector structure. The electric mass 4 is positioned such that the laser light B passing through the dielectric block 4 is condensed on the incident end face 5a of the core 5. Further, the optical fiber 30 can be repeatedly attached and detached to the exit end face 4b of the dielectric block 4.

當按壓具備這樣形成有凹部GA的入射端面30A的光纖30與介電質塊體4時,在光纖30之入射端面30A及介電質塊體4之出射端面4b之間,核芯5之入射端面5a及與該入射端面5a鄰接的包覆層6之內側入射端面6a2,亦即凹部GA的內面係與出射端面4b分離,套管7之端面7a及包覆層6之外側入射端面6a1係與出射端面4b緊密接觸。藉此,在光纖30之入射端面30A及介電質塊體4之出射端面4b之間,因為形成有包圍核芯5之入射端面5a的密閉空間SA,所以在固定配設於光學裝置1的光學構件等時使用接著劑的情況下,能減低有可能從該接著劑產生之有機分子等的異物混入至密閉空間SA的內部,能抑制異物附著於雷射光B聚光的核芯5之入射端面5a。另外,如同上述,因為套管7之端面7a及包覆層6之外側入射端面6a1係與出射端面4b緊密接觸,所以套管7和光纖30的固接面不面向密閉空間SA,所以能防止有可能從使用於該固接面的接著劑產生之有機分子混入至密閉空間SA。When the optical fiber 30 having the incident end face 30A in which the concave portion GA is formed and the dielectric block 4 are pressed, the incident of the core 5 is between the incident end face 30A of the optical fiber 30 and the exit end face 4b of the dielectric block 4. The end face 5a and the inner incident end face 6a2 of the cover layer 6 adjacent to the incident end face 5a, that is, the inner face of the recessed portion GA are separated from the exit end face 4b, and the end face 7a of the sleeve 7 and the outer end face 6a1 of the cover layer 6 are separated. It is in close contact with the exit end face 4b. Thereby, since the sealed space SA surrounding the incident end surface 5a of the core 5 is formed between the incident end surface 30A of the optical fiber 30 and the exit end surface 4b of the dielectric block 4, it is fixedly disposed in the optical device 1. When an adhesive is used for the optical member or the like, foreign matter such as organic molecules generated from the adhesive can be reduced to the inside of the sealed space SA, and the incident of the foreign matter adhered to the core 5 of the laser beam B can be suppressed. End face 5a. Further, as described above, since the end surface 7a of the sleeve 7 and the incident end surface 6a1 on the outer side of the cladding layer 6 are in close contact with the exit end surface 4b, the fixed surface of the sleeve 7 and the optical fiber 30 does not face the sealed space SA, so that it can be prevented. It is possible to mix organic molecules generated from an adhesive agent used for the fixed surface into the sealed space SA.

此外,即使在雖有些許異物混入密閉空間SA的情況下,也能藉由密閉空間SA來防止異物被推壓至核芯5之入射端面5a,所以能抑制異物的附著。藉此,能夠抑制異物造成之光散亂和結合效率的下降,能提升GaN系半導體雷射LD的可靠度。In addition, even when some foreign matter is mixed into the sealed space SA, the foreign matter can be prevented from being pressed against the incident end surface 5a of the core 5 by the sealed space SA, so that adhesion of foreign matter can be suppressed. Thereby, it is possible to suppress light scattering caused by foreign matter and decrease in bonding efficiency, and it is possible to improve the reliability of the GaN-based semiconductor laser LD.

此外,不使用其他零件,僅追加在光纖30之入射端面30A形成凹部GA的加工步驟就可形成密閉空間SA,所以能降低零件成本。Further, the sealing space SA can be formed by adding only the processing steps in which the concave portion GA is formed on the incident end surface 30A of the optical fiber 30 without using other components, so that the component cost can be reduced.

另外,在使用150mW以上輸出的半導體雷射LD之振動波長為160nm~500nm、發光區域為7×1 μm2 、4倍光學透鏡的情況下,在以往不具有凹部GA的光纖中,因為通過光纖之入射端面及介電質塊體之出射端面的雷射光B之截面積成為28×4 μm2 ,核芯之入射端面及介電質塊體之出射端面成為1.0mW/μm2 以上的高能量密度區域,所以使光纖之入射端面和介電質塊體之出射端面進行光學接觸,產生雷射光B的時候,會有核芯之入射端面和介電質塊體之出射端面融著的疑慮,但如同上述般地形成密閉空間SA,核芯5之入射端面5a以及與該入射端面5a鄰接的包覆層6內側之入射端面6a2會與介電質塊體4之出射端面4b分離而防止前述融著。Further, in the case where the semiconductor laser LD output using 150 mW or more has a vibration wavelength of 160 nm to 500 nm and a light-emitting region of 7 × 1 μm 2 or a 4x optical lens, in the conventional optical fiber having no concave portion GA, the optical fiber is passed through the optical fiber. The cross-sectional area of the incident light source B and the exit end face of the dielectric block is 28 × 4 μm 2 , and the incident end face of the core and the exit end face of the dielectric block have a high energy of 1.0 mW/μm 2 or more. In the density region, the incident end face of the optical fiber and the exit end face of the dielectric block are optically contacted, and when the laser light B is generated, there is a fear that the incident end face of the core and the exit end face of the dielectric block are fused. However, the sealed space SA is formed as described above, and the incident end surface 5a of the core 5 and the incident end surface 6a2 inside the cladding layer 6 adjacent to the incident end surface 5a are separated from the exit end surface 4b of the dielectric block 4 to prevent the aforementioned Melt.

<實施例1><Example 1>

在此,說明上述實施形態的光纖30之入射端面30A的加工方法以及將該加工之後的光纖30重複裝卸於介電質塊體4時的實施例。光纖30係核芯5之徑為60 μm、包覆層6之徑為125 μm的SI型石英光纖,並黏著固定於套管7。光纖30以及套管7係使用已將入射端面(套管7之端面7a、核芯5之入射端面5a及包覆層6入射端面6a)研磨加工成平坦者。Here, a method of processing the incident end surface 30A of the optical fiber 30 of the above embodiment and an embodiment in which the optical fiber 30 after the processing is repeatedly attached and detached to the dielectric block 4 will be described. The optical fiber 30 is a SI-type quartz fiber having a core diameter of 60 μm and a coating layer 6 having a diameter of 125 μm, and is fixed to the sleeve 7 by adhesion. The optical fiber 30 and the sleeve 7 are formed by polishing the incident end surface (the end surface 7a of the sleeve 7, the incident end surface 5a of the core 5, and the incident end surface 6a of the cladding layer 6).

1)將光纖30之入射端面浸入於已以HF:NH4F:純水=0.15:0:0.1的重量比混合的水溶液中,對上述光纖30進行5小時的蝕刻。其結果,得到曲率半徑大約25 μm的凹形狀。1) The incident end face of the optical fiber 30 was immersed in an aqueous solution which had been mixed at a weight ratio of HF:NH4F:pure water = 0.15:0:0.1, and the above-mentioned optical fiber 30 was etched for 5 hours. As a result, a concave shape having a radius of curvature of about 25 μm was obtained.

2)爾後進行研磨加工,將具有凹部GA之入射端面30A形成為套管7之端面7a與包覆層6之外側入射端面6a1成為同一面。2) Thereafter, the polishing process is performed, and the incident end surface 30A having the concave portion GA is formed such that the end surface 7a of the sleeve 7 and the outer surface incident end surface 6a1 of the cladding layer 6 are flush with each other.

3)然後,藉由未圖示的連接器,將如上述般地形成有凹部GA的光纖30之入射端面30A按壓至已光學配置GaN系半導體雷射LD、聚光透鏡3及介電質塊體4之整體型模組的介電質塊體4之出射端面4b,重複進行裝卸。其結果,相較於以往不具有凹部GA的光纖,已確定異物附著於光纖30之核芯5的入射端面5a的情況變少。3) Then, the incident end surface 30A of the optical fiber 30 in which the concave portion GA is formed as described above is pressed to the optically disposed GaN-based semiconductor laser LD, the collecting lens 3, and the dielectric block by a connector (not shown) The exit end face 4b of the dielectric block 4 of the integral module of the body 4 is repeatedly attached and detached. As a result, it has been confirmed that the foreign matter adheres to the incident end surface 5a of the core 5 of the optical fiber 30 as compared with the conventional optical fiber which does not have the concave portion GA.

4)此外,但即使是在僅些許異物附著的情況下,也能以棉棒等來拭去而輕易地除去附著的異物。這在以往不具有凹部GA的光纖中,因強力按壓該光纖之入射端面和介電質塊體4之出射端面4b,所以在二者之間混入的異物會貼附於核芯5之入射端面5a,相對於此,藉由在光纖30之入射端面30A形成凹部GA,因為核芯5之入射端面5a不會被按壓,所以推定能抑制異物的貼附。4) Further, even when only a small amount of foreign matter adheres, it is possible to easily remove the adhered foreign matter by wiping it with a cotton swab or the like. In the optical fiber which does not have the recessed part GA in the past, the incident end surface of the optical fiber and the exit end surface 4b of the dielectric block 4 are strongly pressed, so that foreign matter mixed between the two ends is attached to the incident end face of the core 5. In contrast, since the concave portion GA is formed on the incident end surface 30A of the optical fiber 30, since the incident end surface 5a of the core 5 is not pressed, it is estimated that the attachment of the foreign matter can be suppressed.

接著,參照圖式來詳細說明本發明的第2實施形態之光學裝置1B。第2圖係表示第2實施形態之光學裝置1B之概略形狀的側截面圖。Next, an optical device 1B according to a second embodiment of the present invention will be described in detail with reference to the drawings. Fig. 2 is a side cross-sectional view showing a schematic shape of an optical device 1B according to the second embodiment.

本實施形態之光學裝置1B係因為與上述第1實施形態之光學裝置1概略相同,所以只詳細說明不同部分的光纖30之入射端面30B。此外,因為發明效果也和第1實施形態之光學裝置1相同,所以省略說明。Since the optical device 1B of the present embodiment is substantially the same as the optical device 1 of the above-described first embodiment, only the incident end faces 30B of the optical fibers 30 of different portions will be described in detail. In addition, since the effects of the invention are the same as those of the optical device 1 of the first embodiment, the description thereof is omitted.

於本實施形態的光纖30形成與在上述光學裝置1之光纖30的入射端面30A形成的凹部GA不同形狀的凹部GB。凹部GB係如第2圖所示,僅於核芯5之入射端面5a形成朝向核芯5中心具有平緩曲率,在形成有凹部GB之入射端面30B藉由蒸著而披覆防止雷射光B之反射的AR(無反射)膜。當按壓具備形成有凹部GB的入射端面30B的光纖30與介電質塊體4時,在光纖30之入射端面30B及介電質塊體4之出射端面4b之間,核芯5之入射端面5a係與出射端面4b分離,套管7之端面7a以及包覆層6之入射端面6a係與出射端面4b緊密接觸。藉此,在光纖30之入射端面30B與介電質塊體4之出射端面4b之間形成密閉空間SB。The optical fiber 30 of the present embodiment forms a concave portion GB having a shape different from that of the concave portion GA formed on the incident end surface 30A of the optical fiber 30 of the optical device 1. As shown in Fig. 2, the recessed portion GB has a gentle curvature toward the center of the core 5 only on the incident end surface 5a of the core 5, and the incident end surface 30B on which the recessed portion GB is formed is covered by evaporation to prevent the laser light B from being irradiated. Reflected AR (non-reflective) film. When the optical fiber 30 having the incident end face 30B in which the concave portion GB is formed and the dielectric block 4 are pressed, the incident end face of the core 5 is between the incident end face 30B of the optical fiber 30 and the exit end face 4b of the dielectric block 4. The 5a is separated from the exit end face 4b, and the end face 7a of the sleeve 7 and the incident end face 6a of the cover layer 6 are in close contact with the exit end face 4b. Thereby, a sealed space SB is formed between the incident end surface 30B of the optical fiber 30 and the emission end surface 4b of the dielectric block 4.

<實施例2><Example 2>

在此,說明上述實施形態的光纖30之入射端面30B的加工方法以及將該加工之後的光纖30重複裝卸於介電質塊體4時的實施例。此外,本實施例係與上述實施例1到(1)為止的步驟相同。因此,說明(2)以後的步驟。Here, a method of processing the incident end surface 30B of the optical fiber 30 of the above embodiment and an embodiment in which the optical fiber 30 after the processing is repeatedly attached and detached to the dielectric block 4 will be described. Further, the present embodiment is the same as the steps up to the above-described first to (1). Therefore, the steps after (2) will be explained.

2)爾後進行研磨加工,將具有凹部GB之入射端面30B形成為套管7之端面7a與包覆層6之入射端面6a成為同一面。2) Thereafter, the polishing process is performed, and the incident end surface 30B having the concave portion GB is formed such that the end surface 7a of the sleeve 7 and the incident end surface 6a of the cladding layer 6 are flush with each other.

3)然後,與上述實施例1相同地,將如上述般地形成有凹部GB的光纖30之入射端面30B按壓至介電質塊體4之出射端面4b,重複進行裝卸。其結果,與上述實施例1相同,已確定異物附著於光纖30之核芯5的入射端面5a的情況變少,推定能抑制異物的貼附。3) Then, in the same manner as in the above-described first embodiment, the incident end surface 30B of the optical fiber 30 in which the concave portion GB is formed as described above is pressed against the emission end surface 4b of the dielectric block 4, and the detachment is repeated. As a result, in the same manner as in the above-described first embodiment, it has been determined that the foreign matter adheres to the incident end surface 5a of the core 5 of the optical fiber 30, and it is estimated that the adhesion of the foreign matter can be suppressed.

接著,參照圖式來詳細說明本發明的第3實施形態之光學裝置1C。第3圖係表示第3實施形態之光學裝置1C之概略形狀的側截面圖。Next, an optical device 1C according to a third embodiment of the present invention will be described in detail with reference to the drawings. Fig. 3 is a side cross-sectional view showing a schematic shape of an optical device 1C according to a third embodiment.

本實施形態之光學裝置1C係因為與上述第1實施形態之光學裝置1概略相同,所以只詳細說明不同部分的光纖30之入射端面30C。Since the optical device 1C of the present embodiment is substantially the same as the optical device 1 of the above-described first embodiment, only the incident end surface 30C of the optical fiber 30 of a different portion will be described in detail.

於本實施形態的光纖30形成在上述光學裝置1之光纖30的入射端面30A形成的凹部GA不同形狀的凹部GC。凹部GC係如第3圖所示,光纖30之核芯5及包覆層6之平坦入射端面5a、6a係形成為在雷射光B之行進方向上更遠離套管7之端面7a達例如40 μm,藉由核芯5以及包覆層6之平坦入射端面5a、6a的內面而構成。此凹部GC係形成為:於具有預先被研磨加工成平坦的核芯5及包覆層6之入射端面5a、6a的光纖30之包覆層6,使用例如抵碰治具等,將套管7設成為端面7a比前述入射端面5a、6a更突出於介電質塊體4側並藉由焊料而固接,爾後將套管7之端面7a研磨加工成平坦。The optical fiber 30 of the present embodiment is formed in a concave portion GC having a different shape in the concave portion GA formed by the incident end surface 30A of the optical fiber 30 of the optical device 1. As shown in FIG. 3, the concave portion GC is formed such that the core 5 of the optical fiber 30 and the flat incident end faces 5a, 6a of the cladding layer 6 are formed to be farther away from the end face 7a of the sleeve 7 in the traveling direction of the laser light B, for example, 40. The μm is constituted by the inner faces of the flat incident end faces 5a and 6a of the core 5 and the cladding layer 6. The concave portion GC is formed by coating the coating layer 6 of the optical fiber 30 having the flat end faces 5a and 6a of the core 5 and the cladding layer 6 which have been polished in advance, for example, by using a jig or the like. 7 is formed such that the end surface 7a protrudes more from the side of the dielectric block 4 than the incident end faces 5a, 6a and is fixed by solder, and then the end face 7a of the sleeve 7 is polished to be flat.

此外,凹部GC的形成並非限於上述方法,例如在預先將光纖30及套管7之入射端面30C研磨加工成平坦之後,以浸入於作為蝕刻溶液的HF水溶液或HF與NH4F之混合水溶液而進行的濕式蝕刻法來形成亦可。然後,於形成有凹部GC之入射端面30C係藉由蒸著而披覆防止雷射光B反射的AR(無反射)膜。Further, the formation of the concave portion GC is not limited to the above-described method. For example, after the optical fiber 30 and the incident end surface 30C of the sleeve 7 are polished to be flat, the immersion in an aqueous solution of HF as an etching solution or a mixed aqueous solution of HF and NH4F is carried out. Wet etching can also be used to form. Then, the incident end surface 30C on which the concave portion GC is formed is coated with an AR (non-reflective) film that prevents reflection of the laser light B by evaporation.

當按壓具備形成有凹部GC的入射端面30C的光纖30以及套管7至介電質塊體4時,包覆層6之入射端面6a及核芯5之入射端面5a係與介電質塊體4之出射端面4b分離,套管7之端面7a係與出射端面4b緊密接觸。藉此,在光纖30之入射端面30C與介電質塊體4之出射端面4b之間形成密閉空間SC。When the optical fiber 30 having the incident end surface 30C in which the recess GC is formed and the sleeve 7 to the dielectric block 4 are pressed, the incident end surface 6a of the cladding layer 6 and the incident end surface 5a of the core 5 are connected to the dielectric block. The exit end face 4b of 4 is separated, and the end face 7a of the sleeve 7 is in close contact with the exit end face 4b. Thereby, a sealed space SC is formed between the incident end surface 30C of the optical fiber 30 and the emission end surface 4b of the dielectric block 4.

因此,即使在雖有些許異物混入密閉空間的情況下,也能防止異物被推壓至核芯之入射端面,所以能抑制異物的附著。藉此,能夠抑制異物造成之光散亂和結合效率的下降,能提升光源的可靠度。Therefore, even when some foreign matter is mixed into the sealed space, the foreign matter can be prevented from being pressed against the incident end surface of the core, so that the adhesion of the foreign matter can be suppressed. Thereby, it is possible to suppress light scattering caused by foreign matter and a decrease in bonding efficiency, and it is possible to improve the reliability of the light source.

另外,在本實施形態中,因為在套管7和光纖30的固接方面並非使用接著劑而是使用焊料,所以該固接面W即使面向密閉空間SC也因為不會從該固接面W產生有機分子,所以有機分子不會混入密閉空間SC。此外,套管7和光纖30之固接若是有機分子不混入密閉空間SC的固接方法即可,例如僅對密閉空間SC側之固接面W的一部分使用焊料,在那以外的部份則使用接著劑的方法亦可。Further, in the present embodiment, since the solder is not used instead of the adhesive agent in the fixing of the sleeve 7 and the optical fiber 30, the fixed surface W does not pass from the fixed surface W even if it faces the sealed space SC. Organic molecules are generated, so organic molecules do not mix into the closed space SC. In addition, the fixing of the sleeve 7 and the optical fiber 30 may be a method of fixing the organic molecules without being mixed into the sealed space SC. For example, only a part of the fixing surface W on the sealed space SC side is made of solder, and the other part is not. A method using an adhesive can also be used.

接著,參照圖式來詳細說明本發明的第4實施形態之光學裝置1D。第4圖係表示第4實施形態所示之光學裝置1D之概略形狀的側截面圖。Next, an optical device 1D according to a fourth embodiment of the present invention will be described in detail with reference to the drawings. Fig. 4 is a side cross-sectional view showing a schematic shape of an optical device 1D shown in the fourth embodiment.

本實施形態之光學裝置1D係因為與上述第1實施形態之光學裝置1概略相同,所以只詳細說明不同部分的光纖30之入射端面30a及介電質塊體之出射端面4b。此外,因為發明效果也和第1實施形態之光學裝置1相同,所以省略說明。Since the optical device 1D of the present embodiment is substantially the same as the optical device 1 of the above-described first embodiment, only the incident end face 30a of the optical fiber 30 and the outgoing end face 4b of the dielectric block will be described in detail. In addition, since the effects of the invention are the same as those of the optical device 1 of the first embodiment, the description thereof is omitted.

本實施形態之光學裝置1D與上述第1~3實施形態不同,光纖30係如第4圖所示,套管7之端面7a及光纖30之核芯5和包覆層6之入射端面5a、6a(以下稱為光纖30之入射端面30a)被研磨加工成平坦,且並非在光纖30而是在介電質塊體4之出射端面4b形成凹部GD。The optical device 1D of the present embodiment differs from the above-described first to third embodiments in that the optical fiber 30 is as shown in Fig. 4, the end face 7a of the sleeve 7, the core 5 of the optical fiber 30, and the incident end face 5a of the cladding layer 6, 6a (hereinafter referred to as the incident end face 30a of the optical fiber 30) is polished to be flat, and the concave portion GD is formed not on the optical fiber 30 but on the exit end face 4b of the dielectric block 4.

在按壓光纖30與介電質塊體4的時候,凹部GD係於核芯5之入射端面5a對應的位置形成為凹部GD之圓狀開口包圍入射端面5a,被封閉設置成從出射端面4b朝向入射端面4a而底部成為球狀。然後,於形成有凹部GD之出射端面4b、入射端面4a及光纖30之入射端面30a係藉由蒸著而披覆防止雷射光B反射的AR(無反射)膜。When the optical fiber 30 and the dielectric block 4 are pressed, the concave portion GD is formed at a position corresponding to the incident end surface 5a of the core 5 so that the circular opening of the concave portion GD surrounds the incident end surface 5a, and is closed so as to be oriented from the exit end surface 4b. The end face 4a is incident and the bottom is spherical. Then, the AR (non-reflective) film that prevents the reflection of the laser light B is coated by evaporation on the emission end surface 4b on which the concave portion GD is formed, the incident end surface 4a, and the incident end surface 30a of the optical fiber 30 by evaporation.

當按壓形成有凹部GD的介電質塊體4之出射端面4b 及光纖30時,在光纖30之入射端面30a及介電質塊體4之出射端面4b之間,核芯5之入射端面5a及與該入射端面5a鄰接的包覆層6a之入射端面6a的一部分係與出射端面4b分離,套管7之端面7a以及除去包覆層6之該一部分的入射端面6a係與出射端面4b緊密接觸。藉此,在光纖30之入射端面30a與介電質塊體4之出射端面4b之間形成密閉空間SD。When the exit end face 4b of the dielectric block 4 in which the recess GD is formed is pressed And the optical fiber 30, between the incident end face 30a of the optical fiber 30 and the exit end face 4b of the dielectric block 4, the incident end face 5a of the core 5 and the incident end face 6a of the cladding layer 6a adjacent to the incident end face 5a A part is separated from the exit end face 4b, and the end face 7a of the sleeve 7 and the incident end face 6a from which the portion of the cover layer 6 is removed are in close contact with the exit end face 4b. Thereby, a sealed space SD is formed between the incident end surface 30a of the optical fiber 30 and the emission end surface 4b of the dielectric block 4.

此外,在本實施形態中,凹部GD如同上述地將凹部GD之開口作為圓狀,將底部作為球狀,但本發明並非限於此,例如第5圖所示之第5實施形態,做成開口作為四方形之角柱狀的孔穴所構成之凹部GE亦可。在此情況下,當按壓形成有凹部GE的介電質塊體4之出射端面4b及光纖30時,在光纖30之入射端面30a及介電質塊體4之出射端面4b之間,核芯5之入射端面5a及與該入射端面5a鄰接的包覆層6a之入射端面6a的一部分係與出射端面4b分離,套管7之端面7a以及除去包覆層6之該一部分的入射端面6a係與出射端面4b緊密接觸。藉此,在光纖30之入射端面30a與介電質塊體4之出射端面4b之間形成密閉空間SE。In the present embodiment, the recess GD has a circular shape in the opening of the recess GD as described above, and the bottom portion has a spherical shape. However, the present invention is not limited thereto. For example, in the fifth embodiment shown in FIG. 5, an opening is formed. The concave portion GE formed by the columnar holes of the square corner may be used. In this case, when the exit end face 4b of the dielectric block 4 in which the recess GE is formed and the optical fiber 30 are pressed, between the incident end face 30a of the optical fiber 30 and the exit end face 4b of the dielectric block 4, the core A portion of the incident end surface 5a of the fifth and the incident end surface 6a of the cladding layer 6a adjacent to the incident end surface 5a are separated from the emission end surface 4b, and the end surface 7a of the sleeve 7 and the incident end surface 6a from which the portion of the cladding layer 6 is removed are attached. It is in close contact with the exit end face 4b. Thereby, a sealed space SE is formed between the incident end surface 30a of the optical fiber 30 and the emission end surface 4b of the dielectric block 4.

此外,提出實施例來詳細說明本發明的第6實施形態之光學裝置1F。第6圖係表示第6實施形態之光學裝置1F的光纖之前端形狀的側截面圖。此外,在第6圖中,以橫軸作為光纖之直徑方向的距離(μm),以縱軸作為光纖之軸方向的距離(nm),縱軸的座標係作為測定系統的相對座標。Further, an optical device 1F according to a sixth embodiment of the present invention will be described in detail by way of examples. Fig. 6 is a side cross-sectional view showing the shape of the front end of the optical fiber of the optical device 1F of the sixth embodiment. Further, in Fig. 6, the horizontal axis represents the distance (μm) in the radial direction of the optical fiber, the vertical axis represents the distance (nm) in the axial direction of the optical fiber, and the coordinate of the vertical axis serves as the relative coordinate of the measurement system.

本實施形態的光纖30係與上述第4及第5實施形態的光纖30相同,將套管7之端面7a及光纖30之入射端面30a研磨加工成平坦之後,進一步使用中間粒徑(9um)的研磨劑,進行研磨加工。其結果,能獲得如第6圖所示的前端形狀。光纖30之入射端面30a及套管7之端面7a係以套管7之端面7a比光纖30之入射端面30a更突出於前端側之型態,而在前端具有山形狀。In the same manner as the optical fiber 30 of the fourth and fifth embodiments, the optical fiber 30 of the present embodiment is formed by flattening the end surface 7a of the sleeve 7 and the incident end surface 30a of the optical fiber 30, and further using an intermediate particle diameter (9 um). An abrasive is polished. As a result, the front end shape as shown in Fig. 6 can be obtained. The incident end face 30a of the optical fiber 30 and the end face 7a of the sleeve 7 have a mountain shape at the front end with the end face 7a of the sleeve 7 projecting more toward the front end side than the incident end face 30a of the optical fiber 30.

然後,與上述實施例1相同,將如同上述形成的光纖30按壓至介電質塊體4之出射端面4b,重複進行裝卸。其結果,因為套管7之端面7a比光纖30之入射端面30a更突出於前端側,所以出射端面4b中僅套管7之端面7a被按壓,因為在出射端面4b和光纖30之入射端面30a之間形成密閉空間SF,所以與上述實施例1相同,能確定異物附著於光纖30之核芯5的入射端面5a的情況變少,推定能抑制異物貼附的狀況。Then, in the same manner as in the above-described first embodiment, the optical fiber 30 formed as described above is pressed against the exit end face 4b of the dielectric block 4, and the detachment is repeated. As a result, since the end surface 7a of the sleeve 7 protrudes more than the front end side of the incident end surface 30a of the optical fiber 30, only the end surface 7a of the sleeve 7 is pressed in the exit end surface 4b because the incident end surface 30b and the incident end surface 30a of the optical fiber 30 are pressed. In the same manner as in the above-described first embodiment, it is possible to determine that the foreign matter adheres to the incident end surface 5a of the core 5 of the optical fiber 30, and it is estimated that the foreign matter can be suppressed from being attached.

此外,雖然上述實施形態之光學裝置係如同上述所構成,但本發明的光學裝置並非限於此,可以進行適當設計變更。Further, although the optical device of the above-described embodiment is configured as described above, the optical device of the present invention is not limited thereto, and can be appropriately modified in design.

接著,說明具備本發明之光學裝置作為曝光用光源的畫像曝光裝置。Next, an image exposure apparatus including the optical device of the present invention as a light source for exposure will be described.

[畫像曝光裝置的構成][Configuration of image exposure device]

此畫像曝光裝置係如第7圖所示,具備平板狀的移動台座152,用以將薄片狀之感光材料150吸附在表面上並保持之。在被4支腳部154所支撐的厚板狀之設置台156表面上,設置沿著台座移動方向而延伸的2根導部158。台座152係配置成其縱長方向朝向台座移動方向,同時被導部158支撐成可以來回移動。此外,於此曝光裝置係設有沿著導部158而驅動作為副掃描手段的台座152的後述台座驅動裝置304(參照第16圖)。As shown in Fig. 7, the image exposure apparatus includes a flat movable pedestal 152 for adsorbing and holding the sheet-like photosensitive material 150 on the surface. On the surface of the thick plate-shaped mounting table 156 supported by the four leg portions 154, two guide portions 158 extending in the moving direction of the pedestal are provided. The pedestal 152 is disposed such that its longitudinal direction faces the pedestal moving direction while being supported by the guide portion 158 so as to be movable back and forth. Further, the exposure apparatus is provided with a pedestal driving device 304 (see FIG. 16) which will be described later to drive the pedestal 152 as a sub-scanning means along the guide portion 158.

在設置台156之中央部,將字狀的閘門160設成跨過移動台座152的移動途徑。將字狀的閘門160之各個端部固定在設置台156的兩側面。隔著此閘門160,其中一邊設有掃描器162,另一邊則設置複數(例如2個)感測器164,用以檢測出感光材料150之前端或後端。將掃描器162以及感測器164各自安裝於閘門160,並固定配置在台座152的移動途徑上方。此外,掃描器162及感測器164係連接至用以控制其等未圖示的控制器。In the central part of the setting station 156, The gated gate 160 is designed to move across the moving pedestal 152. will The respective ends of the gates 160 are fixed to both side faces of the setting table 156. A gate 162 is disposed, one side of which is provided with a scanner 162, and the other side is provided with a plurality of (for example, two) sensors 164 for detecting the front end or the rear end of the photosensitive material 150. The scanner 162 and the sensor 164 are each mounted to the shutter 160 and fixedly disposed above the movement path of the pedestal 152. Further, the scanner 162 and the sensor 164 are connected to a controller (not shown) for controlling them.

掃描器162係如同第8圖以及第9(B)圖所示,係具備被排列成m列n行(例如3列5行)之略矩陣狀的複數(例如14個)曝光頭166。在本例中,因為感光材料150之寬度的關係,則在第3列配置了4個曝光頭166。此外,以曝光頭166mn 來表示被排列於第m列第n行的各個曝光頭。The scanner 162 has a plurality of (for example, 14) exposure heads 166 arranged in a matrix of m columns and n rows (for example, three columns and five rows) as shown in Figs. 8 and 9(B). In this example, four exposure heads 166 are arranged in the third column because of the relationship of the width of the photosensitive material 150. Further, each of the exposure heads arranged in the nth row of the mth column is indicated by the exposure head 166 mn .

曝光頭166的曝光區域168係以副掃描方向為短邊的矩形狀。因此,隨著台座152的移動,在感光材料150上係於每個曝光頭166形成帶狀的曝光完畢區域170。此外,以曝光區域168mn 來表示被排列於第m列第n行之各個曝光頭的曝光區域。The exposure area 168 of the exposure head 166 has a rectangular shape in which the sub-scanning direction is a short side. Therefore, as the pedestal 152 moves, a strip-shaped exposed region 170 is formed on each of the exposure heads 166 on the photosensitive material 150. Further, the exposure regions of the respective exposure heads arranged in the nth row of the mth column are indicated by the exposure region 168 mn .

另外,如第9(A)圖以及第9(B)圖所示,帶狀的曝光完畢區域170係為了在副掃描方向之正交方向上並排成無間隙,線狀排列之各列的各個曝光頭係配置成在排列方向上以既定間隔(曝光區域之長邊的自然數倍,本例中為2倍)錯開。因此,第1列曝光區域16811 和曝光區域16812 之間無法曝光的部分係可藉由第2列曝光區域16821 和第3列曝光區域16831 來進行曝光。Further, as shown in Fig. 9(A) and Fig. 9(B), the strip-shaped exposed areas 170 are arranged in a line-like arrangement in order to be arranged in the direction orthogonal to the sub-scanning direction. Each of the exposure heads is arranged to be staggered at a predetermined interval (a natural multiple of the long side of the exposure area, twice in this example) in the arrangement direction. Therefore, the portion of the first column between the exposed region 168 11 and the exposed region 168 12 that is not exposed can be exposed by the second column of exposed regions 168 21 and the third column of exposed regions 168 31 .

如同第10圖以及第11圖所示,曝光頭16611 ~166mn 的各個係具備美國德州儀器公司製的數位微鏡裝置(DMD)50,其作為在每個像素上依照畫像資料來調變入射之光束的空間光調變元件。此DMD50係連接於具備資料處理部和鏡驅動控制部的後述之控制器302(參照第16圖)。在此控制器302的資料處理部中,係根據被輸入的畫像資料來產生控制信號,用以在各個曝光頭166驅動控制DMD50之應控制區域內的各微鏡。此外,關於應控制區域將在後面描述。另外,在鏡驅動控制部中,係根據已在畫像資料處理部產生的控制信號,而在各個曝光頭166控制DMD50之各微鏡之反射面的角度。此外,關於反射面之角度控制將在後面描述。As shown in Fig. 10 and Fig. 11, each of the exposure heads 166 11 to 166 mn is provided with a digital micromirror device (DMD) 50 manufactured by Texas Instruments, Inc., which is modulated in accordance with image data on each pixel. A spatial light modulation element of the incident beam. The DMD 50 is connected to a controller 302 (see FIG. 16), which will be described later, including a data processing unit and a mirror drive control unit. In the data processing unit of the controller 302, control signals are generated based on the input image data for driving the respective micromirrors in the control region of the DMD 50 in the respective exposure heads 166. In addition, the area to be controlled will be described later. Further, in the mirror drive control unit, the angles of the reflection surfaces of the respective micromirrors of the DMD 50 are controlled by the respective exposure heads 166 based on the control signals generated in the image data processing unit. Further, the angle control with respect to the reflecting surface will be described later.

在DMD50的光入射側係依序配置有:光纖陣列光源66,具備有光纖之出射端部(發光點)沿著和曝光區域168之長邊方向對應的方向而排列成一行的雷射出射部;透鏡系67,修正從光纖陣列光源66射出的雷射光並聚光於DMD上;以及鏡69,使透過此透鏡系67的雷射光朝向DMD50而反射。此外,第10圖係概略地表示透鏡系67。The optical fiber array light source 66 is disposed on the light incident side of the DMD 50, and is provided with a laser exiting portion in which the exit end portion (light emitting point) of the optical fiber is arranged in a row in a direction corresponding to the longitudinal direction of the exposure region 168. The lens system 67 corrects the laser light emitted from the fiber array light source 66 and condenses it on the DMD; and the mirror 69 reflects the laser light transmitted through the lens system 67 toward the DMD 50. In addition, FIG. 10 schematically shows the lens system 67.

上述透鏡系統67係如同第11圖所詳細表示,由以下所構成:聚光透鏡71,使作為從光纖陣列光源66射出之照明光的雷射光B進行聚光;桿狀光學勻光器72(以下稱為桿狀勻光器),被插入至通過此聚光透鏡71的光之光路;以及成像透鏡74,被配置於此桿狀勻光器72之下游側,亦即鏡69側。聚光透鏡71、桿狀勻光器72以及成像透鏡74係使從光纖陣列光源66射出的雷射光成為趨近平行光而且光束截面內強度均一的光束,並使其射入至DMD50。關於此桿狀勻光器72的形狀或作用,將於後面詳細說明。The lens system 67 is as shown in detail in Fig. 11, and is composed of a collecting lens 71 that condenses the laser light B as illumination light emitted from the fiber array light source 66, and a rod-shaped optical homogenizer 72 ( Hereinafter, it is referred to as a rod-shaped homogenizer, and is inserted into the light path of the light passing through the condensing lens 71; and the imaging lens 74 is disposed on the downstream side of the rod-shaped homogenizer 72, that is, on the side of the mirror 69. The condenser lens 71, the rod-shaped homogenizer 72, and the imaging lens 74 cause the laser light emitted from the optical fiber array light source 66 to become a light beam that approaches parallel light and has uniform intensity in the beam cross section, and is incident on the DMD 50. The shape or action of this rod-shaped homogenizer 72 will be described in detail later.

從上述透鏡系統67射出的雷射光B係在鏡69反射,並介由TIR(全反射)稜鏡70而被照射於DMD50。此外,在第10圖係省略了此TIR稜鏡70。The laser light B emitted from the lens system 67 is reflected by the mirror 69 and is irradiated to the DMD 50 via TIR (total reflection) 稜鏡 70. Further, this TIR 稜鏡 70 is omitted in the tenth figure.

另外,在DMD50的光反射側,係配設有成像光學系51,其用以將DMD50反射的雷射光B成像於感光材料150上。第10圖概略地表示此成像光學系51,如第11圖的詳細表示,其係由以下所構成:由透鏡系52、54所組成的第1成像光學系;由透鏡系57、58所組成的第2成像光學系統;插入於這些成像光學系之間的微透鏡陣列55;以及開孔陣列59。Further, on the light reflection side of the DMD 50, an imaging optical system 51 for imaging the laser light B reflected by the DMD 50 on the photosensitive material 150 is disposed. Fig. 10 is a view schematically showing the imaging optical system 51, as shown in detail in Fig. 11, which is composed of a first imaging optical system composed of lens systems 52 and 54 and composed of lens systems 57 and 58. a second imaging optical system; a microlens array 55 interposed between the imaging optical systems; and an aperture array 59.

微透鏡陣列55係由DMD50之各像素所對應的多數微透鏡55a以2維狀排列而成。在來自個別對應之微鏡62的雷射光B所入射的位置中,各微透鏡55a係被配置在從透鏡系52、54所形成之微鏡62的成像位置上偏移的該微鏡62以及透鏡系52、54所形成之分離聚光位置。在本例中,如同後述,因為DMD50的1024個×768行的微鏡中僅驅動1024個×256行,所以對應於其則使微透鏡55a排列成1024個×256行。另外,微透鏡55a的配置間距係縱方向、橫方向皆為41 μm。本例之此微透鏡55a係焦點距離為0.19mm、NA(開口數)為0.11,並由光學玻璃BK7所形成。此外,將於後面說明微透鏡55a的形狀。然後,各微透鏡55a之位置的雷射光B之束徑是41 μm。The microlens array 55 is formed by arranging a plurality of microlenses 55a corresponding to respective pixels of the DMD 50 in two dimensions. In a position where the laser light B from the corresponding micromirror 62 is incident, each of the microlenses 55a is disposed at the imaging position shifted from the imaging position of the micromirror 62 formed by the lens systems 52, 54 and The separation concentrating position formed by the lens systems 52, 54. In this example, as will be described later, since only 1024 × 256 lines are driven in the 1024 × 768-line micromirrors of the DMD 50, the microlenses 55a are arranged in 1024 × 256 lines corresponding thereto. Further, the arrangement pitch of the microlenses 55a is 41 μm both in the longitudinal direction and in the lateral direction. The microlens 55a of this example has a focal length of 0.19 mm and an NA (number of openings) of 0.11, and is formed of optical glass BK7. Further, the shape of the microlens 55a will be described later. Then, the beam diameter of the laser light B at the position of each microlens 55a is 41 μm.

另外,上述開孔陣列59係形成與微透鏡陣列55之各微透鏡55a對應的多數開孔(開口)59a。在本實施形態中,開孔59a的直徑為10 μm。Further, the above-described aperture array 59 forms a plurality of openings (openings) 59a corresponding to the respective microlenses 55a of the microlens array 55. In the present embodiment, the diameter of the opening 59a is 10 μm.

上述第1成像光學系係將DMD50之像放大到3倍並成像於微透鏡陣列55上。然後,第2成像光學系係將經過微透鏡陣列55的影像放大到1.6倍並成像、投影在感光材料150上。因此,就全體而言,DMD50的像擴大至4.8倍且被投影、成像於感光材料150上。The first imaging optical system described above magnifies the image of the DMD 50 by a factor of three and forms an image on the microlens array 55. Then, the second imaging optical system magnifies the image passing through the microlens array 55 by 1.6 times and images and projects on the photosensitive material 150. Therefore, as a whole, the image of the DMD 50 is expanded to 4.8 times and projected and imaged on the photosensitive material 150.

此外,在本例中,在第2成像光學系和感光材料150之間配設稜鏡對73,藉由使此稜鏡對73移動於第11圖中之上下方向,可調節感光材料150上的像之焦點。此外,在同一圖中,感光材料150係在箭頭F方向上進行副掃描移動。Further, in this example, a pair of yokes 73 is disposed between the second imaging optical system and the photosensitive material 150, and the photosensitive material 150 can be adjusted by moving the 稜鏡 pair 73 in the upper and lower directions in FIG. The focus of the image. Further, in the same figure, the photosensitive material 150 is subjected to sub-scanning movement in the direction of the arrow F.

如第12圖所示,DMD50係一種鏡裝置,其在SRAM單元(記憶體單元)60上,由構成各個畫素(像素)多數(例如,1024個×768個)的微小鏡(微鏡)62以格子狀所排列而成。在各像素中,最上部係設有被支柱支撐的微鏡62,在微鏡62的表面則蒸著有鋁等的高反射率材料。此外,微鏡62的反射率為90%以上,在本例中,其排列間距係縱方向、橫方向皆為13.7 μm。另外,在微鏡62的正下方係介由包含鉸鏈以及軛的支柱,而配置有在一般半導體記憶體的生產線所製造之矽閘極CMOS的SRAM單元60,全體係構成為一整體(monolithic)。As shown in Fig. 12, the DMD 50 is a mirror device which is formed on a SRAM cell (memory cell) 60 by a micromirror (micromirror) constituting a plurality of pixels (pixels) of a plurality of pixels (for example, 1024 × 768). 62 is arranged in a lattice shape. In each of the pixels, a micromirror 62 supported by a pillar is provided on the uppermost portion, and a high reflectance material such as aluminum is evaporated on the surface of the micromirror 62. Further, the reflectance of the micromirror 62 is 90% or more. In this example, the arrangement pitch is 13.7 μm both in the longitudinal direction and in the lateral direction. Further, a SRAM cell 60 of a gate CMOS fabricated in a general semiconductor memory production line is disposed directly under the micromirror 62 via a pillar including a hinge and a yoke, and the whole system is configured as a monolithic body. .

當數位信號被寫入至DMD50的SRAM單元60時,支柱所支撐的微鏡62係以對角線為中心並相對於配置有DMD50之基板側在±α度(例如±12度)的範圍內傾斜。第13(A)圖係表示微鏡62在ON狀態下傾斜+α度的狀態,第13(B)圖係表示微鏡62在OFF狀態下傾斜-α度的狀態。因此,依照畫像信號,並如同第12圖所示般地控制DMD50的各像素的微鏡62之傾斜,藉此,已入射至DMD50的雷射光B係被反射至各個微鏡62的傾斜方向。When the digital signal is written to the SRAM cell 60 of the DMD 50, the micromirrors 62 supported by the pillars are centered on the diagonal and are within ±α degrees (e.g., ±12 degrees) with respect to the substrate side on which the DMD 50 is disposed. tilt. Fig. 13(A) shows a state in which the micromirror 62 is tilted by +α degrees in the ON state, and Fig. 13(B) shows a state in which the micromirror 62 is tilted by -α degrees in the OFF state. Therefore, the tilt of the micromirrors 62 of the respective pixels of the DMD 50 is controlled in accordance with the image signal as shown in Fig. 12, whereby the laser light B incident on the DMD 50 is reflected to the tilt direction of each of the micromirrors 62.

此外,第12圖係表示將DMD50之一部分放大,且微鏡62被控制在+α及-α度之狀態的一例。各個微鏡62的ON/OFF控制係藉由連接於DMD50的該控制器302來進行。另外,被OFF狀態的微鏡62所反射的雷射光B所行進之方向上係配置有光吸收體(未圖示)。本實施形態之微鏡62雖然在其反射面上有歪斜,但在第12圖、第13圖中則省略此歪斜。Further, Fig. 12 shows an example in which one portion of the DMD 50 is enlarged and the micromirror 62 is controlled to a state of +α and -α degrees. The ON/OFF control of each of the micromirrors 62 is performed by the controller 302 connected to the DMD 50. Further, a light absorber (not shown) is disposed in a direction in which the laser beam B reflected by the micromirror 62 in the OFF state travels. Although the micromirror 62 of the present embodiment has a skew on the reflecting surface thereof, the skew is omitted in Figs. 12 and 13 .

另外,DMD50係較佳為配置成其短邊與副掃描方向以既定角度θ(例如,0.1°~5°)稍微傾斜。第14(A)圖係表示不使DMD50傾斜時的各微鏡之反射光像(曝光束)53的掃描軌跡,第14(B)圖係表示使DMD50傾斜時的曝光束53之掃描軌跡。Further, the DMD 50 is preferably arranged such that its short side and the sub-scanning direction are slightly inclined at a predetermined angle θ (for example, 0.1° to 5°). Fig. 14(A) shows the scanning trajectory of the reflected light image (exposure beam) 53 of each micromirror when the DMD 50 is not tilted, and Fig. 14(B) shows the scanning trajectory of the exposure beam 53 when the DMD 50 is tilted.

於DMD50,在縱長方向上排列有多數個微鏡(例如1024個)的微鏡行係在短方向上排列成多數組(例如756組),如第14(B)圖所示,藉由使DMD50傾斜,各微鏡的曝光束53之掃描軌跡(掃描線)的間距P1 係變得比不使DMD50傾斜時的掃描線之間距P2 還要狹窄,能大幅度提升解析度。另一方面,因為DMD50的傾斜角微小,所以DMD50傾斜時的掃描寬度W2 和DMD50不傾斜時的掃描寬度W1 係大略相同。In the DMD 50, micromirror rows in which a plurality of micromirrors (for example, 1024) are arranged in the longitudinal direction are arranged in a plurality of arrays (for example, 756 groups) in the short direction, as shown in FIG. 14(B). When the DMD 50 is tilted, the pitch P 1 of the scanning trajectory (scanning line) of the exposure beam 53 of each micromirror becomes narrower than the distance P 2 between the scanning lines when the DMD 50 is not inclined, and the resolution can be greatly improved. On the other hand, since the inclination angle of the DMD 50 is small, the scanning width W 2 when the DMD 50 is inclined and the scanning width W 1 when the DMD 50 is not inclined are substantially the same.

另外,藉由不同的微鏡行,同樣的掃描線上被重複曝光(多重曝光)。如這般,藉由多重曝光,可控制相對於校準標記的曝光位置之微少量,能實現高精細的曝光。另外,將排列於主掃描方向的複數曝光頭之間的接合部控制在微少量的曝光位置,藉以實現無高低差的連接。In addition, the same scanning line is repeatedly exposed (multiple exposure) by different micromirror rows. As such, by multiple exposures, a small amount of exposure position relative to the calibration mark can be controlled, enabling high-definition exposure. Further, the joint portion between the plurality of exposure heads arranged in the main scanning direction is controlled at a small amount of exposure position, thereby achieving connection without height difference.

此外,除了使DMD50傾斜,即使將各微鏡行配置成在副掃描方向之正交方向上以既定間隔偏移成鋸齒狀,亦可達到同樣的效果。Further, in addition to tilting the DMD 50, the same effect can be obtained even if the respective micro mirror rows are arranged to be zigzag at a predetermined interval in the orthogonal direction of the sub-scanning direction.

光纖陣列光源66係如第15A圖所示,係由具備有光纖30之複數(例如14個)光學裝置1所構成。光纖30的另一端係結合有第二光纖31,該第二光纖31之核芯徑係與光纖30相同,而且包覆層徑則比光纖30還要小。如第15B圖所詳細表示,第二光纖31之與光纖30相反之側的端部係沿著與副掃描方向正交的主掃描方向而排列7個,並排列 成2行而構成雷射射出部68。The fiber array light source 66 is composed of a plurality (for example, 14) of optical devices 1 including the optical fibers 30 as shown in Fig. 15A. The other end of the optical fiber 30 is coupled with a second optical fiber 31 having the same core diameter as the optical fiber 30 and having a smaller cladding diameter than the optical fiber 30. As shown in detail in Fig. 15B, the ends of the second optical fiber 31 on the side opposite to the optical fiber 30 are arranged in seven main scanning directions orthogonal to the sub-scanning direction, and are arranged. The laser emitting portion 68 is formed in two rows.

第二光纖31之端部所構成的雷射射出部68係如第15B圖所示,被表面平坦的2片支撐板65所夾入並固定。另外,在第二光纖31的光出射端面係較佳為配置有用以保護其的玻璃等之透明保護板。第二光纖31的光射出端面係因為光密度高容易集塵而造成容易劣化,但藉由配置如上述保護板,能防止端面附著塵埃,另外,可延遲劣化。The laser emitting portion 68 formed at the end of the second optical fiber 31 is sandwiched and fixed by two support plates 65 having a flat surface as shown in Fig. 15B. Further, it is preferable that the light-emitting end face of the second optical fiber 31 is provided with a transparent protective plate for protecting glass or the like. The light-emitting end face of the second optical fiber 31 is easily deteriorated due to the high optical density, and the dust can be prevented from adhering to the end surface by arranging the protective plate as described above, and deterioration can be delayed.

在本例中,如第15C圖所示,在包覆層徑大的光纖30之雷射光射出側的前端部分係以同軸的方式結合著長度1~30cm左右之包覆層徑小的第二光纖31。此等光纖30、31係在各個核芯軸一致的狀態下,藉由將第二光纖31之入射端面融著於光纖30之出射端面而結合著。如同上述,第二光纖31的核芯31a之直徑係與光纖30的核芯5之直徑為相同尺寸。In this example, as shown in Fig. 15C, the tip end portion of the laser light-emitting side of the optical fiber 30 having a large cladding diameter is coaxially coupled with a second coating layer having a length of about 1 to 30 cm. Optical fiber 31. These optical fibers 30 and 31 are joined by fusing the incident end faces of the second optical fibers 31 to the exit end faces of the optical fibers 30 in a state in which the respective core axes are aligned. As described above, the diameter of the core 31a of the second optical fiber 31 is the same as the diameter of the core 5 of the optical fiber 30.

接著參照第16圖,說明本例的圖像曝光裝置之電氣構成。如此圖所示,全體控制部300係連接有調變電路301,該調變電路301係連接著控制DMD50的控制器302。另外,全體控制部300係連接著驅動光學裝置1的LD驅動電路303。此外,此全體控制部300係連接著驅動前述台座152的台座驅動裝置304。Next, the electrical configuration of the image exposure apparatus of this embodiment will be described with reference to Fig. 16. As shown in the figure, the entire control unit 300 is connected to a modulation circuit 301 which is connected to the controller 302 that controls the DMD 50. Further, the entire control unit 300 is connected to the LD drive circuit 303 that drives the optical device 1. Further, the entire control unit 300 is connected to the pedestal driving device 304 that drives the pedestal 152.

[畫像曝光裝置的動作][Operation of image exposure device]

接著,說明上述圖像曝光裝置的動作。在掃描器162的各曝光頭166中,從構成光纖陣列光源66之合波雷射光源的各個GaN系半導體雷射LD(參照第1圖)以發散光狀態射出的雷射光B係藉由聚光透鏡3而聚光,通過介電質塊體4並收斂在光纖30之核芯5的入射端面5a上。然後,已入射至光纖30之核芯5的雷射光B傳導於光纖30內,從結合在光纖30之出射端面的第二光纖31射出。Next, the operation of the image exposure apparatus will be described. In each of the exposure heads 166 of the scanner 162, the laser light B emitted from each of the GaN-based semiconductor lasers LD (see FIG. 1) constituting the combined laser light source of the optical fiber array light source 66 is emitted in a divergent state. The optical lens 3 condenses and passes through the dielectric block 4 and converges on the incident end surface 5a of the core 5 of the optical fiber 30. Then, the laser light B that has entered the core 5 of the optical fiber 30 is conducted in the optical fiber 30, and is emitted from the second optical fiber 31 coupled to the exit end face of the optical fiber 30.

圖像曝光之際,按照曝光圖案的畫像資料係從第16圖所示之調變電路301輸入至DMD50的控制器302,且暫時記憶於此圖框記憶體。此畫像資料係以2值(點之記錄的有無)來表示構成畫像的各像素之濃度的資料。When the image is exposed, the image data according to the exposure pattern is input from the modulation circuit 301 shown in Fig. 16 to the controller 302 of the DMD 50, and temporarily stored in the frame memory. This image data indicates data of the density of each pixel constituting the image by a binary value (the presence or absence of the recording of the dot).

在表面上吸著感光材料150的台座152係藉由第16圖所示之台座驅動裝置304,而以一定速度沿著導部158從閘門160之上游側移向下游側。在台座152通過閘門160下的時候,若藉由安裝於閘門160的感測器164來檢測出感光材料150的前端,以每複數線份量依序讀出圖框記憶體所記憶的畫像資料,並根據在資料處理部讀出的畫像資料來對各個曝光頭166產生控制信號。然後,藉由鏡驅動控制部,依據產生的控制信號而在各曝光頭166控制DMD50之各個微鏡的ON/OFF。此外,在本例的情況下,成為1個畫素部之上述微鏡的尺寸是14 μm×14 μm。The pedestal 152 that sucks the photosensitive material 150 on the surface is moved from the upstream side to the downstream side of the shutter 160 along the guide 158 at a constant speed by the pedestal driving device 304 shown in Fig. 16. When the pedestal 152 passes under the gate 160, if the front end of the photosensitive material 150 is detected by the sensor 164 attached to the shutter 160, the image data memorized by the frame memory is sequentially read for each of the plurality of lines. A control signal is generated for each of the exposure heads 166 based on the image data read by the data processing unit. Then, the mirror driving control unit controls the ON/OFF of each of the micromirrors of the DMD 50 in each of the exposure heads 166 in accordance with the generated control signal. Further, in the case of this example, the size of the above-described micromirror which is one pixel portion is 14 μm × 14 μm.

若從光纖陣列光源66對DMD50照射雷射光B,在DMD50之微鏡為ON狀態時所反射的雷射光係藉由透鏡系54、58而成像在感光材料150上。以此方式,從光纖陣列光源66射出的雷射光係於每個畫素上被控制為ON/OFF,感光材料150則以與DMD50之使用畫素數略同之數量的畫素單位(曝光區域168)而被曝光。另外,藉由感光材料150和台座152一起以一定速度移動,感光材料150係利用掃描器162而在與台座移動方向相反的方向上被進行副掃描,而在各曝光頭166形成帶狀的曝光完畢區域170。When the DMD 50 is irradiated with the laser light B from the fiber array light source 66, the laser light reflected when the micromirror of the DMD 50 is in the ON state is imaged on the photosensitive material 150 by the lens systems 54, 58. In this way, the laser light emitted from the fiber array light source 66 is controlled to be ON/OFF on each pixel, and the photosensitive material 150 is in the same number of pixel units as the DMD50 (the exposure area). 168) was exposed. Further, by the photosensitive material 150 and the pedestal 152 moving at a constant speed, the photosensitive material 150 is sub-scanned in the direction opposite to the moving direction of the pedestal by the scanner 162, and a strip-shaped exposure is formed in each of the exposure heads 166. Finish area 170.

掃描器162所進行的感光材料150之副掃描結束,以感測器164檢測出感光材料150之後端時,台座152係藉由台座驅動裝置304沿著導部158回到位於閘門160之最上游側的原點,再次以一定速度沿著導部158從閘門160上游側移向下游側。The sub-scanning of the photosensitive material 150 by the scanner 162 is completed. When the sensor 164 detects the rear end of the photosensitive material 150, the pedestal 152 is returned to the upstream of the gate 160 by the pedestal driving device 304 along the guiding portion 158. The origin of the side is again moved from the upstream side to the downstream side of the gate 160 along the guide 158 at a constant speed.

接著,說明第11圖所示的照明光學系,其係由光纖陣列光源66、聚光透鏡71、桿狀勻光器72、成像透鏡74、鏡69以及TIR稜鏡70所構成,且使作為照明光的雷射光B照射於DMD50。桿狀勻光器72係形成為例如四角柱狀的透光性桿柱,雷射光B在其內部一邊全反射一邊前進的時候,該雷射光B的束截面內強度分佈會被均勻化。此外,在桿狀勻光器72的入射端面、出射端面係塗佈有反射防止膜,以提高透過率。以上述方式,如果可以使照明光的雷射光B之束截面內強度分佈高度地均勻化的話,則可消除照明光強度的不均勻,可在感光材料150上曝光出高精細的畫像。Next, an illumination optical system shown in Fig. 11 will be described, which is composed of an optical fiber array light source 66, a collecting lens 71, a rod-shaped homogenizer 72, an imaging lens 74, a mirror 69, and a TIR 70, and The laser light B of the illumination light is incident on the DMD 50. The rod-shaped homogenizer 72 is formed, for example, as a translucent pole of a quadrangular prism shape, and when the laser beam B is advanced while being totally reflected inside, the intensity distribution in the beam section of the laser beam B is uniformized. Further, an anti-reflection film is applied to the incident end surface and the emission end surface of the rod-shaped homogenizer 72 to increase the transmittance. In the above manner, if the intensity distribution in the cross section of the laser beam B of the illumination light can be made highly uniform, the unevenness of the illumination light intensity can be eliminated, and a high-definition image can be exposed on the photosensitive material 150.

1、1B、1C、1D、1E、1F...光學裝置1, 1B, 1C, 1D, 1E, 1F. . . Optical device

2...熱塊體(散熱塊體)2. . . Thermal block (heat block)

3...聚光透鏡(光學系)3. . . Condenser lens (optical system)

30...光纖30. . . optical fiber

30A、30B、30C、30a...光纖之入射端面30A, 30B, 30C, 30a. . . Incident end face of the fiber

31...第二光纖31. . . Second fiber

4...介電質塊體4. . . Dielectric block

4a...介電質塊體之入射端面4a. . . Incident end face of dielectric block

4b...介電質塊體之出射端面4b. . . Exit end face of dielectric block

5、31a...核芯5, 31a. . . Core

5a...核芯之入射端面5a. . . Core incident end face

6...包覆層6. . . Coating

6a...包覆層之入射端面6a. . . Incident end face of the cladding

7...套管7. . . casing

7a...套管之入射端面7a. . . Incident end face of the casing

B...雷射光(光束)B. . . Laser light

GA、GB、GC、GD、GE...凹部GA, GB, GC, GD, GE. . . Concave

LD...GaN系半導體雷射(光源)LD. . . GaN-based semiconductor laser (light source)

SA、SB、SC、SD、SE、SF...密閉空間SA, SB, SC, SD, SE, SF. . . hermetic space

50、250...數位微鏡裝置(DMD)50, 250. . . Digital micromirror device (DMD)

51...成像光學系51. . . Imaging optics

52、54...透鏡系52, 54. . . Lens system

55...微透鏡陣列55. . . Microlens array

55a、56a、155a、355a...微透鏡55a, 56a, 155a, 355a. . . Microlens

56...聚光用微透鏡陣列56. . . Concentrating microlens array

57、58...透鏡系57, 58. . . Lens system

59、159...開孔陣列59,159. . . Open array

59a、159a...開孔59a, 159a. . . Opening

62...微鏡62. . . Micromirror

66...纖維陣列光源66. . . Fiber array light source

68...雷射之出射部68. . . Laser exit department

72...桿狀勻光器72. . . Rod homogenizer

150...感光材料150. . . Photosensitive material

152...台座152. . . Pedestal

162...掃描器162. . . scanner

166...曝光頭166. . . Exposure head

168...曝光區域168. . . Exposure area

170...曝光完畢區域170. . . Exposure area

第1A圖係表示第1實施形態之光學裝置的概略形狀之側截面圖。Fig. 1A is a side cross-sectional view showing a schematic shape of an optical device according to the first embodiment.

第1B圖係表示核芯之入射端面和介電質塊體之出射端面之間的距離L與透過的關係之圖。Fig. 1B is a view showing the relationship between the distance L between the incident end face of the core and the exit end face of the dielectric block and the transmission.

第2圖係表示第2實施形態之光學裝置的概略形狀之側截面圖。Fig. 2 is a side cross-sectional view showing a schematic shape of an optical device according to a second embodiment.

第3圖係表示第3實施形態之光學裝置的概略形狀之側截面圖。Fig. 3 is a side cross-sectional view showing a schematic shape of an optical device according to a third embodiment.

第4圖係表示第4實施形態之光學裝置的概略形狀之側截面圖。Fig. 4 is a side cross-sectional view showing a schematic shape of an optical device according to a fourth embodiment.

第5圖係表示第5實施形態之光學裝置的概略形狀之側截面圖。Fig. 5 is a side cross-sectional view showing a schematic shape of an optical device according to a fifth embodiment.

第6圖係表示第6實施形態之光學裝置的光纖之前端形狀的側截面圖。Fig. 6 is a side cross-sectional view showing the shape of the front end of the optical fiber of the optical device of the sixth embodiment.

第7圖係表示作為本發明之一實施形態的畫像曝光裝置之外觀的立體圖。Fig. 7 is a perspective view showing the appearance of an image exposure apparatus according to an embodiment of the present invention.

第8圖係表示第7圖之畫像曝光裝置的掃描器之構成的立體圖。Fig. 8 is a perspective view showing the configuration of a scanner of the image exposure apparatus of Fig. 7.

第9(A)圖係表示形成於感光材料的曝光完畢區域之平面圖,第9(B)圖係表示各曝光頭的曝光區域之排列之圖。Fig. 9(A) is a plan view showing an exposed region formed on a photosensitive material, and Fig. 9(B) is a view showing an arrangement of exposure regions of respective exposure heads.

第10圖係表示第7圖之畫像曝光裝置的曝光頭之概略構成的立體圖。Fig. 10 is a perspective view showing a schematic configuration of an exposure head of the image exposure apparatus of Fig. 7.

第11圖係上述曝光頭的截面圖。Figure 11 is a cross-sectional view of the above exposure head.

第12圖係表示數位微鏡裝置(DMD)之構成的部分放大圖。Fig. 12 is a partially enlarged view showing the configuration of a digital micromirror device (DMD).

第13(A)圖以及第13(B)圖係用於說明DMD之動作的說明圖。Fig. 13(A) and Fig. 13(B) are explanatory diagrams for explaining the operation of the DMD.

第14(A)圖以及第14(B)圖係表示DMD不傾斜配置與傾斜配置的情況下比較曝光束的配置以及掃描線的平面圖。The 14th (A) and 14th (B) drawings show the arrangement of the exposure beam and the plan view of the scanning line in the case where the DMD is not tilted and tilted.

第15A圖係表示纖維陣列光源之構成的立體圖。Fig. 15A is a perspective view showing the configuration of a fiber array light source.

第15B圖係表示纖維陣列光源之雷射射出部的發光點之排列的正面圖。Fig. 15B is a front elevational view showing the arrangement of the light-emitting points of the laser emitting portion of the fiber array light source.

第15C圖係表示光纖構成的圖。Fig. 15C is a view showing the configuration of an optical fiber.

第16圖係表示上述畫像曝光裝置之電氣構成的方塊圖。Fig. 16 is a block diagram showing the electrical configuration of the image exposure apparatus.

1...光學裝置1. . . Optical device

2...熱塊體(散熱塊體)2. . . Thermal block (heat block)

2a...引出配線2a. . . Lead wiring

3...聚光透鏡3. . . Condenser lens

30...光纖30. . . optical fiber

30A...光纖之入射端面30A. . . Incident end face of the fiber

4...介電質塊體4. . . Dielectric block

4a...介電質塊體之入射端面4a. . . Incident end face of dielectric block

4b...介電質塊體之出射端面4b. . . Exit end face of dielectric block

5...核芯5. . . Core

5a...核芯之入射端面5a. . . Core incident end face

6...包覆層6. . . Coating

6a...包覆層之入射端面6a. . . Incident end face of the cladding

6a1...外側入射端面6a1. . . Outer incident end face

6a2...內側入射端面6a2. . . Medial incident end face

7...套管7. . . casing

7a...套管之入射端面7a. . . Incident end face of the casing

B...雷射光B. . . laser

GA...凹部GA. . . Concave

LD...GaN系半導體雷射LD. . . GaN-based semiconductor laser

SA...密閉空間SA. . . hermetic space

Claims (13)

一種光學裝置,其具備:光源;光學系,使從該光源發出的光束聚光;介電質塊體,配置在通過該光學系之光束的光路上;以及光纖,其配置成使通過該介電質塊體的光束從核芯之端面入射;此光學裝置之特徵為:在前述光纖之入射端面和前述介電質塊體之出射端面之間,至少前述核芯之入射端面是位於與前述介電質塊體之出射端面分離的位置,前述光纖之入射端面的包圍前述核芯之入射端面的部分係藉由被按壓於前述介電質塊體,而形成包圍前述核芯之入射端面的密閉空間。 An optical device comprising: a light source; an optical system that condenses a light beam emitted from the light source; a dielectric mass disposed on an optical path of a light beam passing through the optical system; and an optical fiber configured to pass the medium The light beam of the electric mass is incident from the end surface of the core; the optical device is characterized in that at least the incident end surface of the core is located between the incident end surface of the optical fiber and the exit end surface of the dielectric block a portion where the exit end face of the dielectric block is separated, and a portion of the incident end face of the optical fiber that surrounds the incident end face of the core is pressed against the dielectric block to form an incident end face surrounding the core. hermetic space. 如申請專利範圍第1項的光學裝置,其中,前述光纖在前述核芯的周圍具備包覆層,和前述核芯之入射端面鄰接的前述包覆層之至少一部分的端面是位於與前述介電質塊體之出射端面分離的位置。 The optical device according to claim 1, wherein the optical fiber has a coating layer around the core, and an end surface of at least a portion of the cladding layer adjacent to an incident end surface of the core is located at the dielectric The position at which the exit end of the mass is separated. 如申請專利範圍第1項的光學裝置,其中,前述光纖之入射端面及/或前述介電質塊體之出射端面係披覆著AR膜,該AR膜用以防止從前述光源發出之光束的反射。 The optical device of claim 1, wherein the incident end face of the optical fiber and/or the exit end face of the dielectric block are covered with an AR film for preventing a light beam emitted from the light source. reflection. 如申請專利範圍第1項的光學裝置,其中,在光束之波 長為λ的情況下,前述核芯之入射端面和前述介電質塊體之出射端面之間的距離L為L=n λ/2±λ/8(n是整數)。 An optical device as claimed in claim 1, wherein the wave of the beam In the case of λ, the distance L between the incident end face of the core and the exit end face of the dielectric block is L = n λ / 2 ± λ / 8 (n is an integer). 如申請專利範圍第1項的光學裝置,其中,前述光束之波長為160nm~500nm。 The optical device according to claim 1, wherein the wavelength of the light beam is from 160 nm to 500 nm. 如申請專利範圍第1項的光學裝置,其中,前述光束的能量密度在入射至前述光纖之入射端面的時候為1.0mW/μm2 以上。The optical device according to claim 1, wherein the energy density of the light beam is 1.0 mW/μm 2 or more when incident on an incident end surface of the optical fiber. .一種光學裝置,其具備:光源;光學系,使從該光源發出的光束聚光;介電質塊體,配置在通過該光學系之光束的光路上;光纖,其配置成使通過該介電質塊體的光束從核芯之端面入射;以及套管,從該光纖之入射端面突出的位置到前述光束之行進方向的既定位置為止,被配設在前述光纖的周圍;此光學裝置之特徵為:在前述光纖之入射端面和前述介電質塊體之出射端面之間,至少前述核芯之入射端面是位於與前述介電質塊體之出射端面分離的位置,從前述光纖之入射端面突出的前述套管之端面係藉由被按壓於前述介電質塊體,而形成包圍前述核芯之入射端面的密閉空間。 An optical device comprising: a light source; an optical system that condenses a light beam emitted from the light source; a dielectric mass disposed on an optical path of a light beam passing through the optical system; and an optical fiber configured to pass through the medium a light beam of the electric mass is incident from an end surface of the core; and a sleeve is disposed around the optical fiber from a position where the incident end surface of the optical fiber protrudes to a predetermined position of the traveling direction of the light beam; The method is characterized in that at least between the incident end face of the optical fiber and the exit end face of the dielectric block, at least the incident end face of the core is located at a position separated from the exit end face of the dielectric block, and is incident from the optical fiber. The end surface of the sleeve projecting from the end surface is pressed against the dielectric block to form a sealed space surrounding the incident end surface of the core. 如申請專利範圍第7項的光學裝置,其中,形成前述密閉空間的構件或者接觸前述密閉空間之內部的構件不包 含由有機分子組成的構件。 The optical device of claim 7, wherein the member forming the sealed space or the member contacting the inside of the sealed space is not included Contains components consisting of organic molecules. 如申請專利範圍第7項的光學裝置,其中,前述光纖之入射端面及/或前述介電質塊體之出射端面係披覆著AR膜,該AR膜用以防止從前述光源發出之光束的反射。 The optical device of claim 7, wherein the incident end face of the optical fiber and/or the exit end face of the dielectric block are covered with an AR film for preventing a light beam emitted from the light source. reflection. 如申請專利範圍第7項的光學裝置,其中,在光束之波長為λ的情況下,前述核芯之入射端面和前述介電質塊體之出射端面之間的距離L為L=n λ/2±λ/8(n是整數)。 The optical device of claim 7, wherein, in the case where the wavelength of the light beam is λ, the distance L between the incident end face of the core and the exit end face of the dielectric block is L = n λ / 2±λ/8 (n is an integer). 如申請專利範圍第7項的光學裝置,其中,前述光束之波長為160nm~500nm。 The optical device of claim 7, wherein the wavelength of the light beam is from 160 nm to 500 nm. 如申請專利範圍第7項的光學裝置,其中,前述光束的能量密度在入射至前述光纖之入射端面的時候為1.0mW/μm2 以上。The optical device according to claim 7, wherein the energy density of the light beam is 1.0 mW/μm 2 or more when incident on an incident end surface of the optical fiber. 一種畫像曝光裝置,其特徵為具備申請專利範圍第1項的光學裝置,來作為曝光用光源。An image exposure apparatus comprising the optical device of the first application of the patent scope as a light source for exposure.
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