TWI418065B - Light emitting diode - Google Patents

Light emitting diode Download PDF

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TWI418065B
TWI418065B TW100105736A TW100105736A TWI418065B TW I418065 B TWI418065 B TW I418065B TW 100105736 A TW100105736 A TW 100105736A TW 100105736 A TW100105736 A TW 100105736A TW I418065 B TWI418065 B TW I418065B
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light
conductive layer
emitting diode
finger
electrode
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TW100105736A
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Chinese (zh)
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TW201236220A (en
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Chia En Lee
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Lextar Electronics Corp
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Priority to CN2011101092948A priority patent/CN102646770A/en
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Description

發光二極體Light-emitting diode

本發明係有關於一種發光二極體,特別係有關於一種發光二極體的電極設計。The present invention relates to a light-emitting diode, and more particularly to an electrode design for a light-emitting diode.

對於高功率發光二極體而言,電流擴散能力扮演著很重要的角色。尤其在高功率發光二極體的應用方面,在較大的電流密度操作下,不均勻的電流分布極易造成電極的燒毀。For high-power light-emitting diodes, current spreading capability plays an important role. Especially in the application of high-power light-emitting diodes, under a large current density operation, uneven current distribution is extremely likely to cause burnt of the electrodes.

因此,發光二極體的電極設計著重在於使電流均勻分布。在習知技術中,係使用電極金屬延伸線的設計使電流有效的均勻擴散。然而,電極金屬延伸線的末端存在尖端放電的問題,因此易造成靜電擊穿而導致晶片損毀。電極金屬延伸線能有效幫助電流擴散,卻也會造成光吸收問題,反而造成光性衰退的問題。所以,係利用縮小電極金屬延伸線的面積,以有效減少吸光問題。然而,電極金屬延伸線的面積縮小則必須增加金屬線厚度來平衡電流密度,如此卻造成較高的生產成本,且隨著電極金屬線面積的縮小,靜電擊穿及電極燒毀的問題會更加嚴重。Therefore, the electrode design of the light-emitting diode focuses on evenly distributing the current. In the prior art, the design of the electrode metal extension line is used to effectively spread the current evenly. However, there is a problem of tip discharge at the end of the electrode metal extension line, which is liable to cause electrostatic breakdown and cause wafer damage. The electrode metal extension line can effectively help the current to diffuse, but it also causes light absorption problems, which in turn causes the problem of optical degradation. Therefore, the area of the metal extension line of the electrode is reduced to effectively reduce the light absorption problem. However, if the area of the electrode metal extension line is reduced, the thickness of the metal line must be increased to balance the current density, which results in higher production cost, and as the electrode metal line area shrinks, the problem of electrostatic breakdown and electrode burnout becomes more serious. .

在此技術領域中,有需要一種發光二極體的電極設計,其可在不增加電極面積及電極厚度前提下,能有效幫助電流擴散以及防止靜電擊穿及電極燒毀。In this technical field, there is a need for an electrode design of a light-emitting diode that can effectively help current diffusion and prevent electrostatic breakdown and electrode burnout without increasing electrode area and electrode thickness.

有鑑於此,本發明一實施例係提供一種發光二極體,上述發光二極體包括一基板;一發光結構,設置於上述基板上;一第一電極,設置於上述發光結構的一第一表面上;一透明導電層,設置於上述發光結構的一第二表面上;一第二電極,設置於上述透明導電層上;一指狀導電層,鄰接於上述第二電極,且延伸設置於上述透明導電層上,其中上述指狀導電層具有遠離於上述第二電極的一末端部分;一靜電保護層,設置於上述指狀導電層和上述發光結構之間,且接觸上述指狀導電層的上述末端部分。In view of the above, an embodiment of the present invention provides a light emitting diode, the light emitting diode includes a substrate, a light emitting structure disposed on the substrate, and a first electrode disposed on the first of the light emitting structures a transparent conductive layer disposed on a second surface of the light emitting structure; a second electrode disposed on the transparent conductive layer; a finger conductive layer adjacent to the second electrode and extending over The transparent conductive layer, wherein the finger conductive layer has an end portion away from the second electrode; an electrostatic protection layer is disposed between the finger conductive layer and the light emitting structure, and contacts the finger conductive layer The above end portion.

以下以各實施例詳細說明並伴隨著圖式說明之範例,做為本發明之參考依據。在圖式或說明書描述中,相似或相同之部分皆使用相同之圖號。且在圖式中,實施例之形狀或是厚度可擴大,並以簡化或是方便標示。再者,圖式中各元件之部分將以分別描述說明之,值得注意的是,圖中未繪示或描述之元件,為所屬技術領域中具有通常知識者所知的形式,另外,特定之實施例僅為揭示本發明使用之特定方式,其並非用以限定本發明。The following is a detailed description of the embodiments and examples accompanying the drawings, which are the basis of the present invention. In the drawings or the description of the specification, the same drawing numbers are used for similar or identical parts. In the drawings, the shape or thickness of the embodiment may be expanded and simplified or conveniently indicated. In addition, the components of the drawings will be described separately, and it is noted that the components not shown or described in the drawings are known to those of ordinary skill in the art, and in particular, The examples are merely illustrative of specific ways of using the invention and are not intended to limit the invention.

本發明實施例係提供一種發光二極體,其電極設計於指狀導電層和發光結構之間設置有一層靜電保護層,且接觸指狀導電層的末端部分。因此,本發明實施例的發光二極體同時具有有效幫助電流擴散以及防止靜電擊穿及電極燒毀等優點。第1a圖為本發明實施例之發光二極體500a~500b的上視圖。第1b、1c圖分別為本發明不同實施例之發光二極體500a~500b的剖面圖,其顯示靜電保護層的不同設置位置。第1a~1c圖顯示的發光二極體係以一氮化鎵(GaN)系藍光發光二極體做為本發明實施例。如第1a~1c圖所示,本發明實施例之發光二極體500a或500b可包括一基板200。在本發明一實施例中,基板200可包括一藍寶石(sapphire)基板。一發光結構202,設置於基板200上。在本發明一實施例中,基板200和發光結構202之間可設置有一緩衝層(圖未顯示)。在本發明一實施例中,發光結構202可由具有p型-n型接面(pn junction)的半導體層構成,其包括至少兩個電性連接的一p型半導體層和一n型半導體層,以及p型半導體層和n型半導體層之間的一發光半導體層,用於發光結構202之半導體層可包括氮化鎵(GaN)、氮化鎵銦(GaInN)等材質。在本發明一實施例中。在本實施例中,發光結構202的n型半導體層和p型半導體層沿著垂直基板200表面的方向堆疊,且發光結構202的n型半導體層的一第一表面203和p型半導體層的一第二表面205皆係位於發光結構202的同一側且兩者不共平面,其中p型半導體層的第二表面205可視為一發光面。Embodiments of the present invention provide a light emitting diode having an electrode disposed between a finger conductive layer and a light emitting structure with an electrostatic protection layer and contacting an end portion of the finger conductive layer. Therefore, the light-emitting diode of the embodiment of the invention has the advantages of effectively helping current diffusion and preventing electrostatic breakdown and electrode burning. Fig. 1a is a top view of the light-emitting diodes 500a to 500b according to the embodiment of the present invention. 1b and 1c are respectively cross-sectional views of the light-emitting diodes 500a to 500b according to different embodiments of the present invention, which show different positions of the electrostatic protection layers. The light-emitting diode system shown in FIGS. 1a to 1c is a gallium nitride (GaN)-based blue light-emitting diode as an embodiment of the present invention. As shown in FIGS. 1a to 1c, the light emitting diode 500a or 500b of the embodiment of the present invention may include a substrate 200. In an embodiment of the invention, the substrate 200 may comprise a sapphire substrate. A light emitting structure 202 is disposed on the substrate 200. In an embodiment of the invention, a buffer layer (not shown) may be disposed between the substrate 200 and the light emitting structure 202. In an embodiment of the invention, the light emitting structure 202 may be composed of a semiconductor layer having a p-type n-type junction, which includes at least two electrically connected p-type semiconductor layers and an n-type semiconductor layer. And a light emitting semiconductor layer between the p-type semiconductor layer and the n-type semiconductor layer, and the semiconductor layer used for the light emitting structure 202 may include a material such as gallium nitride (GaN) or gallium indium nitride (GaInN). In an embodiment of the invention. In the present embodiment, the n-type semiconductor layer and the p-type semiconductor layer of the light emitting structure 202 are stacked along the direction of the surface of the vertical substrate 200, and a first surface 203 and a p-type semiconductor layer of the n-type semiconductor layer of the light emitting structure 202 are A second surface 205 is located on the same side of the light emitting structure 202 and is not coplanar, wherein the second surface 205 of the p-type semiconductor layer can be regarded as a light emitting surface.

如第1a~1c圖所示,一透明導電層(transparent conductive layer,TCL)206,設置於發光結構202的第二表面205上。在本實施例中,透明導電層206係直接與發光結構202的p型磊晶層接觸。在本發明一實施例中,透明導電層206具有高透光性、電流擴散等功能。在本發明一實施例中,透明導電層206可包括例如鎳-金之薄金屬導電層,或者包括例如氧化銦錫(ITO)之金屬氧化物導電層。As shown in FIGS. 1a-1c, a transparent conductive layer (TCL) 206 is disposed on the second surface 205 of the light emitting structure 202. In the present embodiment, the transparent conductive layer 206 is in direct contact with the p-type epitaxial layer of the light emitting structure 202. In an embodiment of the invention, the transparent conductive layer 206 has functions of high light transmittance, current spreading, and the like. In an embodiment of the invention, the transparent conductive layer 206 may comprise a thin metal conductive layer such as nickel-gold or a metal oxide conductive layer such as indium tin oxide (ITO).

如第1a~1c圖所示,一第一電極204和一第二電極208,分別設置於該發光結構的一第一表面203上和一第二表面205上,其中第二電極208設置於透明導電層206上。在本發明一實施例中,第一電極204可為n型電極,其電性連接至發光結構202的n型磊晶層,而第二電極208可為p型電極,其電性連接至發光結構202的p型磊晶層。As shown in FIGS. 1a to 1c, a first electrode 204 and a second electrode 208 are respectively disposed on a first surface 203 of the light emitting structure and a second surface 205, wherein the second electrode 208 is disposed on the transparent surface. On the conductive layer 206. In an embodiment of the invention, the first electrode 204 can be an n-type electrode electrically connected to the n-type epitaxial layer of the light-emitting structure 202, and the second electrode 208 can be a p-type electrode electrically connected to the light-emitting layer. The p-type epitaxial layer of structure 202.

如第1b~1c圖所示,一指狀導電層210,鄰接於第二電極208,且沿著水平於透明導電層206的表面方向延伸設置於透明導電層206上。在本發明一實施例中,指狀導電層210可做為第二電極208的一延伸部分,且指狀導電層210的設置可以使發光二極體500a或500b在操作時電流能更均勻的分布。在本發明一實施例中,為了考慮不影響發光二極體500a或500b的發光效率,指狀導電層210的設計係使其寬度係遠小於第二電極208的寬度且具有足夠的長度,以使發光二極體500a或500b的電流有效的均勻擴散且有效減少吸光問題。在本發明一實施例中,指狀導電層210具有遠離於第二電極208的一末端部分212。然而,指狀導電層210的延伸方向和形狀並不限於本實施例。As shown in FIGS. 1b to 1c, a finger-shaped conductive layer 210 is adjacent to the second electrode 208 and extends on the transparent conductive layer 206 along the surface of the transparent conductive layer 206. In an embodiment of the invention, the finger conductive layer 210 can be used as an extension of the second electrode 208, and the finger conductive layer 210 can be disposed to make the current of the light emitting diode 500a or 500b more uniform during operation. distributed. In an embodiment of the present invention, in order to consider not affecting the luminous efficiency of the light-emitting diode 500a or 500b, the finger-shaped conductive layer 210 is designed such that its width is much smaller than the width of the second electrode 208 and has a sufficient length to The current of the light-emitting diode 500a or 500b is effectively spread uniformly and the light absorption problem is effectively reduced. In an embodiment of the invention, the finger conductive layer 210 has an end portion 212 that is remote from the second electrode 208. However, the extending direction and shape of the finger conductive layer 210 are not limited to the embodiment.

如第1a~1c圖所示,本發明一實施例係特別提供一靜電保護層214a或214b,設置於指狀導電層210和發光結構202之間,且接觸指狀導電層210的末端部分212。由於當發光二極體500a或500b在高電流密度操作下,具有電流均勻擴散的指狀導電層210的末端部分212會成為電場最大處,因而會產生尖端放電且會從此處擊穿發光二極體500a或500b燒毀電極,而使發光二極體500a或500b損毀無法使用。在本發明一實施例的靜電保護層214a或214b可以有效防止發光二極體500a或500b在較大的電流密度操作下於末端部分212產生靜電擊穿的問題。在本發明一實施例中,靜電保護層214或214b可包括介電材料。在本發明實施例中,靜電保護層214或214b可有不同的設置位置,只要能避免指狀導電層210的末端部分212與其下的透明導電層206或發光結構202直接接觸即可。As shown in FIGS. 1a-1c, an embodiment of the present invention provides an electrostatic protection layer 214a or 214b disposed between the finger conductive layer 210 and the light emitting structure 202 and contacting the end portion 212 of the finger conductive layer 210. . Since the end portion 212 of the finger-shaped conductive layer 210 having uniform current diffusion becomes the maximum electric field when the light-emitting diode 500a or 500b is operated at a high current density, a tip discharge is generated and the light-emitting diode is broken therefrom. The body 500a or 500b burns the electrode, and the light-emitting diode 500a or 500b is destroyed and cannot be used. The electrostatic protection layer 214a or 214b according to an embodiment of the present invention can effectively prevent the problem that the light-emitting diode 500a or 500b generates electrostatic breakdown at the end portion 212 under a large current density operation. In an embodiment of the invention, the electrostatic protection layer 214 or 214b may comprise a dielectric material. In the embodiment of the present invention, the electrostatic protection layer 214 or 214b may have different arrangement positions as long as the end portion 212 of the finger conductive layer 210 can be prevented from directly contacting the transparent conductive layer 206 or the light-emitting structure 202 under it.

如第1b圖所示,在本發明一實施例中,發光二極體500a的靜電保護層214a可設置於指狀導電層210和透明導電層206之間,且接觸指狀導電層210的末端部分212。在如第1b圖所示的實施例中,靜電保護層214a可從指狀導電層210的末端部分212朝第二電極208的方向延伸。在本發明實施例中,靜電保護層214a的面積可遠小於指狀導電層210的面積,且靜電保護層214a可具有任意形狀,只要能使靜電保護層214a的邊緣係凸出於指狀導電層210的末端部分212的邊緣即可。As shown in FIG. 1b, in an embodiment of the present invention, the electrostatic protection layer 214a of the LED 500a may be disposed between the finger conductive layer 210 and the transparent conductive layer 206 and contact the end of the finger conductive layer 210. Section 212. In the embodiment as shown in FIG. 1b, the electrostatic protection layer 214a may extend from the end portion 212 of the finger conductive layer 210 toward the second electrode 208. In the embodiment of the present invention, the area of the electrostatic protection layer 214a may be much smaller than the area of the finger-shaped conductive layer 210, and the electrostatic protection layer 214a may have any shape as long as the edge of the electrostatic protection layer 214a is convexly exposed to the fingers. The edge of the end portion 212 of the layer 210 is sufficient.

如第1c圖所示,在本發明另一實施例中,發光二極體500b的靜電保護層214b可設置於透明導電層206和發光結構202之間,且靜電保護層214b可從指狀導電層210的末端部分212朝第二電極208的方向延伸。如第1c圖所示在本發明另一實施例的發光二極體500b的透明導電層係具有一開口218,以使靜電保護層214b從開口218暴露出來,且指狀導電層210的末端部分212位於開口218中,以使靜電保護層214b能夠接觸指狀導電層210的末端部分212。如第1c圖所示,靜電保護層214b的邊緣也會凸出於指狀導電層210的末端部分212的邊緣。As shown in FIG. 1c, in another embodiment of the present invention, the electrostatic protection layer 214b of the LED 500b can be disposed between the transparent conductive layer 206 and the light emitting structure 202, and the electrostatic protection layer 214b can be electrically conductive from the fingers. The end portion 212 of the layer 210 extends in the direction of the second electrode 208. The transparent conductive layer of the light-emitting diode 500b according to another embodiment of the present invention has an opening 218 as shown in FIG. 1c to expose the electrostatic protective layer 214b from the opening 218, and the end portion of the finger conductive layer 210. 212 is located in opening 218 to enable electrostatic protection layer 214b to contact end portion 212 of finger conductive layer 210. As shown in FIG. 1c, the edge of the electrostatic protection layer 214b also protrudes from the edge of the end portion 212 of the finger conductive layer 210.

本發明實施例係提供一種發光二極體,其電極設計於指狀導電層的末端部分和發光結構之間設置有一層靜電保護層,可有效避免指狀導電層的末端部分產生尖端放電而擊穿發光二極體。因此,本發明實施例的發光二極體同時具有有效幫助電流擴散以及防止靜電擊穿及電極燒毀等優點。因此,本發明實施例的發光二極體可廣為應用於高功率發光二極體,在不增加電極面積及電極厚度前提下,靜電保護層的設計可以確保在高電流密度操作下能防止電極的燒毀。The embodiment of the invention provides a light-emitting diode, wherein the electrode is designed to have an electrostatic protection layer between the end portion of the finger-shaped conductive layer and the light-emitting structure, which can effectively avoid the tip discharge of the finger-shaped conductive layer. Wear a light-emitting diode. Therefore, the light-emitting diode of the embodiment of the invention has the advantages of effectively helping current diffusion and preventing electrostatic breakdown and electrode burning. Therefore, the light-emitting diode of the embodiment of the invention can be widely applied to a high-power light-emitting diode, and the electrostatic protective layer can ensure the electrode can be prevented under high current density operation without increasing the electrode area and the electrode thickness. Burned down.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and the present invention may be modified and modified without departing from the spirit and scope of the invention. The scope is defined as defined in the scope of the patent application.

500a、500b...發光二極體500a, 500b. . . Light-emitting diode

200...基板200. . . Substrate

202...發光結構202. . . Light structure

203...第一表面203. . . First surface

204...第一電極204. . . First electrode

205...第二表面205. . . Second surface

206...透明導電層206. . . Transparent conductive layer

208...第二電極208. . . Second electrode

210...指狀導電層210. . . Finger conductive layer

212...末端部分212. . . End part

214a、214b...靜電保護層214a, 214b. . . Electrostatic protective layer

218...開口218. . . Opening

第1a圖為本發明實施例之發光二極體的上視圖。Fig. 1a is a top view of a light emitting diode according to an embodiment of the present invention.

第1b、1c圖本發明不同實施例之發光二極體的剖面圖。1b and 1c are cross-sectional views of light emitting diodes of different embodiments of the present invention.

500a、500b...發光二極體500a, 500b. . . Light-emitting diode

202...發光結構202. . . Light structure

203...第一表面203. . . First surface

204...第一電極204. . . First electrode

205...第二表面205. . . Second surface

206...透明導電層206. . . Transparent conductive layer

208...第二電極208. . . Second electrode

210...指狀導電層210. . . Finger conductive layer

212...末端部分212. . . End part

214a、214b...靜電保護層214a, 214b. . . Electrostatic protective layer

Claims (10)

一種發光二極體,包括:一基板;一發光結構,設置於該基板上;一第一電極,設置於該發光結構的一第一表面上;一透明導電層,設置於該發光結構的一第二表面上;一第二電極,設置於該透明導電層上;一指狀導電層,鄰接於該第二電極,且延伸設置於該透明導電層上,其中該指狀導電層具有遠離於該第二電極的一末端部分;以及一靜電保護層,設置於該指狀導電層和該發光結構之間,且接觸該指狀導電層的該末端部分,其中該指狀導電層的該末端部分與該發光結構藉由該靜電保護層彼此隔開。 A light-emitting diode includes: a substrate; a light-emitting structure disposed on the substrate; a first electrode disposed on a first surface of the light-emitting structure; and a transparent conductive layer disposed on the light-emitting structure a second electrode disposed on the transparent conductive layer; a finger conductive layer adjacent to the second electrode and extending over the transparent conductive layer, wherein the finger conductive layer has a distance away from An end portion of the second electrode; and an electrostatic protection layer disposed between the finger conductive layer and the light emitting structure and contacting the end portion of the finger conductive layer, wherein the end of the finger conductive layer The portion and the light emitting structure are separated from each other by the electrostatic protection layer. 如申請專利範圍第1項所述之發光二極體,其中該靜電保護層設置於該指狀導電層和該透明導電層之間。 The light-emitting diode of claim 1, wherein the electrostatic protection layer is disposed between the finger-shaped conductive layer and the transparent conductive layer. 如申請專利範圍第2項所述之發光二極體,其中該靜電保護層的邊緣係凸出於該指狀導電層的該末端部分的邊緣。 The light-emitting diode of claim 2, wherein an edge of the electrostatic protection layer protrudes from an edge of the end portion of the finger-shaped conductive layer. 如申請專利範圍第1項所述之發光二極體,其中該靜電保護層設置於該透明導電層和該發光結構之間。 The light-emitting diode of claim 1, wherein the electrostatic protection layer is disposed between the transparent conductive layer and the light-emitting structure. 如申請專利範圍第4項所述之發光二極體,其中該透明導電層具有一開口,以使該靜電保護層從該開口暴露出來,且該指狀導電層的該末端部分位於該開口中。 The light-emitting diode of claim 4, wherein the transparent conductive layer has an opening such that the electrostatic protection layer is exposed from the opening, and the end portion of the finger-shaped conductive layer is located in the opening . 如申請專利範圍第4項所述之發光二極體,其中該靜 電保護層從該指狀導電層的該末端部分朝該第二電極的方向延伸。 The light-emitting diode according to claim 4, wherein the static An electrical protective layer extends from the end portion of the finger conductive layer toward the second electrode. 如申請專利範圍第6項所述之發光二極體,其中該靜電保護層的邊緣係凸出於該指狀導電層的邊緣。 The light-emitting diode of claim 6, wherein an edge of the electrostatic protection layer protrudes from an edge of the finger-shaped conductive layer. 如申請專利範圍第1項所述之發光二極體,其中該該第一表面和該第二表面係位於該發光結構的同一側且兩者不共平面。 The light-emitting diode of claim 1, wherein the first surface and the second surface are on the same side of the light-emitting structure and the two are not coplanar. 如申請專利範圍第1項所述之發光二極體,其中該靜電保護層包括介電材料。 The light-emitting diode of claim 1, wherein the electrostatic protection layer comprises a dielectric material. 如申請專利範圍第1項所述之發光二極體,其中該基板包括藍寶石。 The light-emitting diode of claim 1, wherein the substrate comprises sapphire.
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