TWI416610B - A method of controlling the splitting of a wafer by a wafer splitting machine - Google Patents

A method of controlling the splitting of a wafer by a wafer splitting machine Download PDF

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TWI416610B
TWI416610B TW99105229A TW99105229A TWI416610B TW I416610 B TWI416610 B TW I416610B TW 99105229 A TW99105229 A TW 99105229A TW 99105229 A TW99105229 A TW 99105229A TW I416610 B TWI416610 B TW I416610B
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wafer
splitting
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cut surface
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TW201130025A (en
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Horng Terng Automation Co Ltd
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Description

控制晶圓劈裂機對晶圓進行劈裂之方法Method for controlling wafer splitting to split a wafer

本發明係關於一種晶圓劈裂方法,尤指一種利用特定劈裂順序使劈刀之衝擊力可平均地施加於晶圓,進而提高晶圓劈裂面平整度的一種控制晶圓劈裂機對晶圓進行劈裂之方法。The invention relates to a wafer splitting method, in particular to a control wafer splitting machine which utilizes a specific splitting sequence to uniformly apply the impact force of the file to the wafer, thereby improving the flatness of the wafer split surface. A method of splitting a wafer.

半導體製程主要是將一晶圓進行裂片程序使其成為多數晶粒,再將晶粒置放於載體上進行封裝,利用半導體特殊的材料特性而製成一具有特定功能的電子電路元件,其中,晶圓裂片作業的優劣與否將決定晶粒品質,而晶粒品質又主宰半導體元件的良率,因此,晶圓裂片程序係半導體製程中十分重要的一環。The semiconductor process mainly involves a wafer splicing process to make it into a plurality of dies, and then placing the dies on the carrier for packaging, and using the special material properties of the semiconductor to form a specific functional electronic circuit component, wherein The pros and cons of wafer dicing operations will determine the grain quality, which in turn dominates the yield of semiconductor components. Therefore, the wafer splicing process is a very important part of the semiconductor process.

請參閱第八圖至第十圖所示,傳統晶圓裂片程序概是先於晶圓(30)底面黏貼一膠層(40),並將晶圓(30)表面先行預切複數並列的預切淺溝,而此預切淺溝係為預定的劈裂位置,意即預切面(S),之後再利用輸送帶將晶圓(30)輸送至晶圓劈裂機中的載台(50)上,該載台(50)係具有溝槽(51)。將欲切面(S)對位於該載台(50)之溝槽(51),復以劈刀(20)抵靠於晶圓(30)的預切面(S),並以晶圓劈裂機中的衝擊裝置給予劈刀(20)一衝擊力量,進而對該晶圓(30)進行劈裂。Referring to the eighth to tenth drawings, the conventional wafer splitting process is to paste a layer (40) on the bottom surface of the wafer (30) and pre-cut the number of wafers (30) in parallel. The shallow trench is cut, and the pre-cut shallow trench is a predetermined splitting position, that is, the pre-cut surface (S), and then the wafer (30) is transported to the stage in the wafer splitting machine by the conveyor belt (50). The stage (50) has a groove (51). The face (S) is placed on the groove (51) of the stage (50), and the boring tool (20) is placed against the pre-cut surface (S) of the wafer (30), and the wafer splitting machine is used. The impact device in the middle gives the file (20) an impact force, which in turn splits the wafer (30).

然,習知之晶圓的裂片方式為自晶圓(30)一端依序劈裂至另一端,請參閱第九圖及第十圖所示,定義該晶圓預切面(S)兩側為待劈裂部(32)以及未劈裂部(31),由於待劈裂 部(32)的寬度極短,以微觀的角度來看,當劈刀(20)在劈裂過程中施予晶圓(30)一接觸力時,待劈裂部(32)的自由端會產生些微翹起現象,致使預切面(S)兩側的晶圓(30)其下凹程度不同,使劈刀(20)之衝擊力量未能平均地施加於晶圓(30),造成晶圓劈裂面產生如缺角...等缺陷,降低日後以此劈裂方式製造出的晶粒品質,進而影響半導體元件的良率。However, the conventional wafer is split by one end from the end of the wafer (30) to the other end. Please refer to the ninth and tenth figures to define the wafer pre-cut surface (S) on both sides. The splitting portion (32) and the unsplit portion (31) due to the splitting The width of the portion (32) is extremely short. From a microscopic point of view, when the file (30) is applied to the wafer (30) during the splitting process, the free end of the portion to be split (32) is slightly generated. The lifting phenomenon causes the wafers (30) on both sides of the pre-cut surface (S) to have different degrees of undercut, so that the impact force of the trowel (20) is not uniformly applied to the wafer (30), causing the wafer to split. The surface is deformed such as a missing corner, which reduces the grain quality which is produced by the cleaving method in the future, thereby affecting the yield of the semiconductor element.

本發明之主要目的在於提供一種控制晶圓劈裂機對晶圓進行劈裂之方法,藉此設計改善習知劈刀劈裂過程中,因預切面兩側之晶圓下凹程度不同,使劈刀之衝擊力未能平均地施加於晶圓而造成劈裂面缺陷之情形。The main object of the present invention is to provide a method for controlling the splitting of a wafer by a wafer splitting machine, thereby designing and improving the cleaving process of the conventional boring tool, because the degree of undercut of the wafer on both sides of the pre-cut surface is different. The impact of the trowel is not applied evenly to the wafer, causing a crack in the surface.

為達前揭目的,本發明控制晶圓劈裂機對晶圓進行劈裂之方法包含下列步驟:將晶圓上之複數預切位置從一側至另一側依序定義為第一預切面、第二預切面...、第n預切面;定義晶圓劈裂機劈裂晶圓之順序依序為:交替執行一間隔劈裂步驟及一中分劈裂步驟,於間隔劈裂步驟中係對該晶圓之第x預切面進行劈裂,於中分劈裂步驟中係對該晶圓之第x-1預切面進行劈裂,其中在每一輪的間隔劈裂步驟及中分劈裂步驟中係代入相同的x值,而x依序代入2,4,6,...之偶數正整數In order to achieve the above, the method for controlling the wafer splitting machine to split the wafer includes the following steps: sequentially defining the plurality of pre-cut positions on the wafer from one side to the other side as the first pre-cut surface. The second pre-cut surface...the n-th pre-cut surface; the order of defining the wafer splitting device to split the wafer is: alternately performing a spacer splitting step and a middle splitting step, in the interval splitting step The middle part splits the xth pre-cut surface of the wafer, and splits the x-1 pre-cut surface of the wafer in the middle splitting step, wherein the splitting step and the middle split in each round In the splitting step, the same x value is substituted, and x is substituted into the even positive integer of 2, 4, 6, ...

依照所定義之劈裂順序以一控制裝置控制該晶圓劈裂機對晶圓進行劈裂。The wafer splitting machine is controlled to split the wafer by a control device in accordance with the defined cleaving sequence.

本發明之晶圓劈裂順序概可分為間隔劈裂步驟以及中分劈裂步驟輪序進行,所述之間隔劈裂步驟是指劈刀前進 跳過奇數預切面而對下一個偶數預切面進行劈裂,進而將晶圓劈分為包含二預切段的已劈裂部以及未劈裂部,而所述之中分劈裂步驟是指將晶圓之已劈裂部自中間之預切面位置劈裂為二劈裂段。The wafer splitting sequence of the present invention can be divided into a splitting and splitting step and a middle splitting and splitting step, and the interval splitting step refers to the advancement of the file. Skipping the odd pre-cut surface and cleaving the next even pre-cut surface, thereby dividing the wafer into the splitting portion including the two pre-cut segments and the un-cracking portion, wherein the splitting step refers to The splitting portion of the wafer is split from the pre-cut position in the middle into a splitting section.

當進行間隔劈裂步驟時,由於待劈裂部的寬度為習知之待劈裂部的兩倍,使得劈刀施予晶圓一接觸力時,待劈裂部自由端的翹起現象較習知不明顯,使預切面兩側的晶圓其下凹程度相近,而劈刀之衝擊力便可以較平均地施加於晶圓,進而得到較平整的劈裂面;而當進行中分劈裂步驟時,由於是由已劈裂部的中間位置進行劈裂,使預切面兩側的晶圓其下凹程度相同,劈刀之衝擊力自然可以平均地施加於晶圓得到好的效果,由上述可知,本發明控制晶圓劈裂機對晶圓進行劈裂之方法可在不改變設備的條件下,僅改變晶圓劈裂的順序便可降低晶圓劈裂面因施力不平均而產生缺陷之情形,進而提升晶圓劈裂面的平整度。When the interval cleaving step is performed, since the width of the portion to be cleaved is twice that of the conventional cleaving portion, the lifting action of the free end of the cleaving portion is less obvious than when the blade is applied to the wafer. The wafers on both sides of the pre-cut surface are similar in degree of depression, and the impact force of the file can be applied to the wafer more evenly, thereby obtaining a flattened split surface; and when the splitting step is performed, Since the cleaving is performed by the intermediate position of the cleaved portion, the wafers on both sides of the pre-cut surface are recessed to the same extent, and the impact force of the file can be applied to the wafer evenly to obtain a good effect. The method for controlling the wafer splitting machine to split the wafer can reduce the defect of the wafer split surface due to the uneven application force without changing the order of the wafer. The situation, in turn, improves the flatness of the wafer split surface.

請參閱第一圖所示,為本發明控制晶圓劈裂機對晶圓進行劈裂之方法的流程方塊圖,其包含下列步驟:請配合第二圖及第三圖所示,首先定義晶圓(10)上之複數預切位置從一側至另一側依序為第一預切面(S 1 )、第二預切面(S 2 )...、第n預切面(S n ),其中,奇數預切面以實線表示,偶數預切面以虛線表示。Referring to the first figure, a block diagram of a method for controlling a wafer splitting machine to split a wafer according to the present invention includes the following steps: first, as shown in the second and third figures, the crystal is first defined. The plurality of pre-cut positions on the circle (10) are sequentially from the one side to the other side as the first pre-cut surface ( S 1 ), the second pre-cut surface ( S 2 ), and the n-th pre-cut surface ( S n ), Among them, the odd pre-cut faces are indicated by solid lines, and the even pre-cut faces are indicated by broken lines.

定義晶圓劈裂機劈裂晶圓(10)之順序依序為:交替執行一間隔劈裂步驟及一中分劈裂步驟,於間隔劈裂步驟中係對該晶圓之第x預切面進行劈裂,於中分劈裂步驟中係對 該晶圓之第x-1預切面進行劈裂,其中在每一輪的間隔劈裂步驟及中分劈裂步驟中係代入相同的x值,而x依序代入2,4,6,...之偶數正整數,其中:請參閱第二、三圖,根據前述定義出的順序,各次劈裂的詳細次序如下:The order of the wafer splitting machine splitting wafer (10) is as follows: alternately performing a spacer splitting step and a middle splitting step, in the interval splitting step, the xth pre-cut surface of the wafer Performing a split, in the middle splitting step The x-1 pre-cut surface of the wafer is cleaved, wherein the same x value is substituted in each of the interval cleaving step and the middle splitting step, and x is sequentially substituted into 2, 4, 6, ... The even number of positive integers, where: see the second and third figures, according to the order defined above, the detailed order of each split is as follows:

第1次劈裂:劈裂晶圓之第x預切面,x以2代入,即劈裂第二預切面(S2 )。The first split: the xth pre-cut surface of the split wafer, x is substituted by 2, that is, the second pre-cut (S 2 ) is split.

第2次劈裂:劈裂晶圓之第x-1預切面,x以2代入,即劈裂第一預切面(S1 )。The second split: the x-1 pre-cut surface of the split wafer, x is substituted by 2, that is, the first pre-cut surface (S 1 ) is split.

第3次劈裂:劈裂晶圓之第x預切面,x以4代入,即劈裂第四預切面(S4 )。The third split: the xth pre-cut surface of the split wafer, x is substituted by 4, that is, the fourth pre-cut (S 4 ) is split.

第4次劈裂:劈裂晶圓之第x-1預切面,x以4代入,即劈裂第三預切面(S3 )。The fourth split: the x-1 pre-cut surface of the split wafer, x is substituted by 4, that is, the third pre-cut (S 3 ) is split.

第五次劈裂:劈裂晶圓之第x-1預切面,x以6代入,即劈裂第六預切面(S6 )。The fifth split: the x-1 pre-cut surface of the split wafer, x is substituted by 6 into the sixth pre-cut surface (S 6 ).

第六次劈裂:劈裂晶圓之第x-1預切面,x以6代入,即劈裂第五預切面(S5 )。The sixth split: the x-1 pre-cut surface of the split wafer, x is substituted by 6 into the fifth pre-cut surface (S 5 ).

依照所定義之劈裂順序以一控制裝置控制該晶圓劈裂機對晶圓(10)進行劈裂,直到所有預切面全部劈裂完畢。The wafer splitting machine is controlled to split the wafer (10) by a control device in accordance with the defined cleaving sequence until all pre-cut faces are cleaved.

上述之晶圓劈裂順序概可分為間隔劈裂步驟以及中分劈裂步驟輪序進行,請參閱第二圖、第四圖及第五圖所示,所述之間隔劈裂步驟是指劈刀(20)前進跳過奇數預切面(S m )而對下一個偶數預切面(S m +1 )進行劈裂,進而將晶圓(10)劈分為包含二預切段(121)的已劈裂部(12a)以及未劈裂部(11),請參閱第三圖、第六圖及第七圖所示,所述之中分劈 裂步驟是指將晶圓(10)之己劈裂部(12a)自中間之奇數預切面(S m )位置劈裂為二劈裂段(121a)。The above-mentioned wafer splitting sequence can be divided into a gap splitting step and a middle splitting step step, as shown in the second, fourth and fifth figures, wherein the interval splitting step refers to The file (20) advances over the odd pre-cut surface ( S m ) and splits the next even pre-cut surface ( S m +1 ), thereby dividing the wafer (10) into two pre-cut segments (121) For the splitting portion (12a) and the unsplit portion (11), please refer to the third, sixth and seventh figures, wherein the splitting step refers to the wafer (10) The splitting portion (12a) is split from the odd pre-cut surface ( S m ) in the middle into a splitting section (121a).

請配合第四圖及第五圖所示,當進行間隔劈裂步驟時,由於待劈裂部(12)包含二預切段(121),使得待劈裂部(12)的寬度為習知的兩倍,載台(50)提供予晶圓(10)的支撐面相對變大,使得劈刀(20)施予晶圓(10)一接觸力時,待劈裂部(12)自由端(122)的翹起現象較習知不明顯,使預切面(S m +1 )兩側的晶圓(10)其下凹程度相近,而劈刀(20)之衝擊力便可以較平均地施加於晶圓(10),進而得到較平整的劈裂面,提昇劈裂作業的品質;請配合第六圖及第七圖所示,而當進行中分劈裂步驟時,載台(50)之間距略有調整,其間距略小於第四、五圖劈裂作業時之寬度,以使支撐面兩端受力相同,由於是由已劈裂部(12a)的中間位置進行劈裂,使預切面(S m )兩側的晶圓(10)其下凹程度相同,劈刀(20)之衝擊力自然可以平均地施加於晶圓(10)得到好的效果,由上述可知,本發明控制晶圓劈裂機對晶圓進行劈裂之方法可在不改變設備的條件下,僅改變晶圓(10)劈裂的順序便可降低晶圓劈裂面因施力不平均而產生缺陷之情形,進而提升晶圓劈裂面的平整度。Please cooperate with the fourth and fifth figures. When the interval splitting step is performed, since the to-be-cleaved portion (12) includes two pre-cut segments (121), the width of the portion to be split (12) is known. Twice, the support surface provided by the stage (50) to the wafer (10) is relatively large, so that when the file (10) is applied to the wafer (10) with a contact force, the free end of the beating portion (12) (122) The lift phenomenon is not obvious, so that the wafers (10) on both sides of the pre-cut surface ( S m +1 ) are similar in degree of depression, and the impact force of the file (20) can be applied to the average The wafer (10), in turn, obtains a flattened split surface to improve the quality of the splitting operation; please cooperate with the sixth and seventh figures, and when performing the splitting step, the stage (50) The spacing is slightly adjusted, and the spacing is slightly smaller than the width of the fourth and fifth figures during the splitting operation, so that the force at both ends of the supporting surface is the same, since the splitting is performed by the intermediate position of the splitting portion (12a), so that the The wafers (10) on both sides of the cut surface ( S m ) have the same degree of undercut, and the impact force of the trowel (20) can be naturally applied to the wafer (10) evenly, and the effect of the present invention is controlled. Wafer splitting machine The method of splitting the wafer can change the order of the cracking of the wafer (10) without changing the order of the wafer, thereby reducing the occurrence of defects due to uneven application of the cracked surface of the wafer, thereby enhancing the crystal. The flatness of the split surface.

(10)‧‧‧晶圓(10) ‧‧‧ Wafer

(11)‧‧‧未劈裂部(11) ‧‧‧Unsplit

(12)‧‧‧待劈裂部(12) ‧ ‧ to be split

(12a)‧‧‧已劈裂部(12a) ‧ ‧ cleavage

(121)‧‧‧預切段(121) ‧ ‧ pre-cut

(121a)‧‧‧劈裂段(121a) ‧‧‧ cracking section

(122)‧‧‧自由端(122)‧‧‧Free end

(20)‧‧‧劈刀(20)‧‧‧劈

(30)‧‧‧晶圓(30) ‧‧‧ Wafer

(31)‧‧‧未劈裂部(31) ‧‧‧Unsplit

(32)‧‧‧待劈裂部(32) ‧ ‧ to be split

(40)‧‧‧膠層(40) ‧ ‧ 胶 layer

(50)‧‧‧載台(50) ‧‧‧ stage

(51)‧‧‧溝槽(51) ‧‧‧ trench

(S)‧‧‧預切面(S) ‧ ‧ pre-cut

(S 1 )‧‧‧第一預切面( S 1 )‧‧‧First pre-cut

(S 2 )‧‧‧第二預切面( S 2 )‧‧‧Second precut

(S 3 )‧‧‧第三預切面( S 3 )‧‧‧ Third pre-cut

(S 4 )‧‧‧第四預切面( S 4 )‧‧‧Four pre-cut

(S n-3 )第(n-3)‧‧‧預切面( S n-3 ) (n-3) ‧ ‧ pre-cut

(S n -2 )第(n-2)‧‧‧預切面( S n -2 ) (n-2) ‧ ‧ pre-cut

(S n-1 )第(n-1)‧‧‧預切面( S n-1 ) (n-1) ‧ ‧ pre-cut

(S n )‧‧‧第n預切面( S n )‧‧‧n n pre-cut

第一圖:為本發明控制晶圓劈裂機對晶圓進行劈裂之方法的方塊流程圖。The first figure is a block flow diagram of a method for controlling a wafer splitting machine to split a wafer according to the present invention.

第二圖:為本發明控制晶圓劈裂機對晶圓進行劈裂之方法包含偶數個預切面之示意圖。Second: The method for controlling the wafer splitting machine to split the wafer according to the present invention includes an even number of pre-cut surfaces.

第三圖:為本發明控制晶圓劈裂機對晶圓進行劈裂之 方法包含奇數個預切面之示意圖。The third figure: the wafer splitting machine of the present invention controls the wafer splitting The method includes a schematic diagram of an odd number of pre-cut faces.

第四圖:為本發明控制晶圓劈裂機對晶圓進行劈裂之方法中間隔劈裂步驟於劈裂前的示意圖。The fourth figure is a schematic diagram of the method of controlling the splitting and splitting of the wafer by the wafer splitting machine in the method of cleaving.

第五圖:為第四圖之間隔劈裂步驟於劈裂後的示意圖。Figure 5: Schematic diagram of the splitting step of the fourth figure after the splitting.

第六圖:為本發明控制晶圓劈裂機對晶圓進行劈裂之方法之中分劈裂步驟於劈裂前的示意圖。Fig. 6 is a schematic view showing the splitting step before the splitting in the method for controlling the splitting of the wafer by the wafer splitting machine of the present invention.

第七圖:為第六圖之中分劈裂步驟於劈裂後的示意圖。Figure 7: Schematic diagram of the splitting step in the sixth figure after splitting.

第八圖:為習知之晶圓劈裂方法之劈裂順序示意圖。Figure 8: Schematic diagram of the splitting sequence of the conventional wafer splitting method.

第九圖:為習知之晶圓劈裂方法於劈裂前的示意圖。Figure IX: Schematic diagram of the conventional wafer splitting method before splitting.

第十圖:為習知之晶圓劈裂方法於劈裂後的示意圖。Figure 10: Schematic diagram of the conventional wafer splitting method after splitting.

Claims (1)

一種控制晶圓劈裂機對晶圓進行劈裂之方法,其包含下列步驟:將晶圓上之複數預切位置從一側至另一側依序定義為第一預切面、第二預切面...、第n預切面;定義晶圓劈裂機之劈裂順序為:交替執行一間隔劈裂步驟及一中分劈裂步驟,於間隔劈裂步驟中係對該晶圓之第x預切面進行劈裂,於中分劈裂步驟中係對該晶圓之第x-1預切面進行劈裂,其中在每一輪的間隔劈裂步驟及中分劈裂步驟中係代入相同的x值,而x依序代入2,4,6,...之偶數正整數;依照所定義之劈裂順序以一控制裝置控制該晶圓劈裂機對晶圓進行劈裂。 A method for controlling a wafer splitting machine to split a wafer, comprising the steps of: sequentially defining a plurality of pre-cut locations on the wafer from one side to the other side as a first pre-cut surface and a second pre-cut surface ..., the nth pre-cut surface; the cleaving order of the wafer splitting machine is defined as: alternately performing a spacer splitting step and a middle splitting step, in the interval cleaving step, the xth portion of the wafer The pre-cut surface is cleaved, and the x-1 pre-cut surface of the wafer is cleaved in the middle splitting step, wherein the same x is substituted in the splitting step and the splitting step in each round Value, and x is substituted into an even positive integer of 2, 4, 6, ...; the wafer splitting machine is used to control the wafer splitting according to a defined splitting sequence.
TW99105229A 2010-02-24 2010-02-24 A method of controlling the splitting of a wafer by a wafer splitting machine TWI416610B (en)

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Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200903610A (en) * 2007-07-05 2009-01-16 Both Wing Co Ltd Pressing board mechanism for wafer cleavage

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200903610A (en) * 2007-07-05 2009-01-16 Both Wing Co Ltd Pressing board mechanism for wafer cleavage

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