TWI406382B - Welded - type vibrator device wafer - level package structure - Google Patents

Welded - type vibrator device wafer - level package structure Download PDF

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Publication number
TWI406382B
TWI406382B TW099106780A TW99106780A TWI406382B TW I406382 B TWI406382 B TW I406382B TW 099106780 A TW099106780 A TW 099106780A TW 99106780 A TW99106780 A TW 99106780A TW I406382 B TWI406382 B TW I406382B
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Taiwan
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vibrator
wafer
hole
package structure
level package
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TW099106780A
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Chinese (zh)
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TW201131726A (en
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Txc Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation

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  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)

Description

貫孔式振子裝置晶圓級封裝結構Through-hole vibrator device wafer level package structure

本發明係有關一種振子裝置,應用於譬如為手機、筆記型電腦、汽車電子等各種電子產品,特別是指一種貫孔式振子裝置晶圓級封裝結構。The invention relates to a vibrator device, which is applied to various electronic products such as mobile phones, notebook computers, automobile electronics, etc., in particular to a through-hole vibrator wafer level packaging structure.

石英元件具有穩定的壓電特性,能夠提供精準且寬廣的參考頻率、時脈控制、定時功能與過濾雜訊等功能,此外,石英元件也能做為運動及壓力等感測器,以及重要的光學元件;因此,對於電子產品而言,石英元件扮演著舉足輕重的地位。Quartz components have stable piezoelectric characteristics, providing accurate and wide reference frequency, clock control, timing functions and filtering noise. In addition, quartz components can also be used as sensors for motion and pressure, as well as important Optical components; therefore, for electronic products, quartz components play a pivotal role.

而針對石英振子晶體的封裝,前案提出了許多種方案,譬如美國專利公告第5030875號專利「犧牲式石英晶體支撐架」(sacrificial quartz-crystal mount),屬於早期金屬蓋體(Metal Cap)的封裝方式,整體封裝結構複雜、體積無法縮小。美國專利公告第6545392號專利「壓電共振器之封裝結構」(Package structure for a piezoelectric resonator),主要採用陶瓷封裝體來封裝石英音叉振子,並改良陶瓷基座(Package)與上蓋(Lid)結構,使得石英音叉振子具有較佳的抗震性,然而,該封裝體成本高且尺寸無法進一步降低。For the encapsulation of quartz crystal oscillator crystals, many proposals have been made in the prior art, such as the "sacrificial quartz-crystal mount" of the US Patent Publication No. 5030875, which belongs to the early metal cap (Metal Cap). The package method has a complicated package structure and cannot be reduced in size. U.S. Patent No. 6,654,392, "Package structure for a piezoelectric resonator", which mainly uses a ceramic package to encapsulate a quartz tuning fork vibrator, and improves the ceramic package and the lid structure. Therefore, the quartz tuning fork vibrator has better shock resistance, however, the package is costly and the size cannot be further reduced.

美國專利公告第6531807號專利「壓電裝置」(Piezoelectric Device),主要針對在不同區域之陶瓷基座進行石英振子與振盪電路晶片之封裝,並利用陶瓷基座上之導線做電氣連接,同時振盪電路晶片以樹脂封裝,石英振子則以上蓋做焊接封裝(seam welding);然而,由於兩晶片各放在不同區塊,且以陶瓷基座為封裝體,因此使得面積加大且製作成本居高不下。U.S. Patent No. 6,531,807, "Piezoelectric Device", which is mainly used for encapsulating a quartz crystal oscillator and an oscillating circuit chip on ceramic pedestals in different regions, and electrically connecting the wires on the ceramic pedestal while oscillating The circuit chip is packaged in resin, and the quartz vibrator is covered by the above cover; however, since the two wafers are placed in different blocks and the ceramic base is used as the package, the area is increased and the manufacturing cost is high. No less.

又如美國專利公告第7098580號專利「壓電振盪器」(Piezoelectric Oscillator),主要將石英晶片與積體電路分別以陶瓷封裝體封裝後,再進行電氣連接的動作,雖可有效縮小面積問題,但整體體積仍無法有效降低,同時該封裝方式之製作成本也相對較高。In addition, the "Piezoelectric Oscillator" of the Japanese Patent Publication No. 7098580, which mainly encapsulates a quartz wafer and an integrated circuit in a ceramic package, and then performs an electrical connection operation, can effectively reduce the area problem. However, the overall volume cannot be effectively reduced, and the manufacturing cost of the packaging method is relatively high.

而美國專利公告第7608986號專利「石英晶體振盪器」(Quartz crystal resonator),主要為晶圓級封裝形式,其主要將玻璃材質(blue plate glass)之上蓋與下基座,與石英晶片藉由陽極接合完成一三明治結構。然而,此一三明治結構由於基材與石英之熱膨脹係數不同,因此當溫度變化時會造成內部石英晶片產生熱應力,使得頻率隨溫度而產生偏移現象。因此,需要特別選擇石英晶片之切角與上蓋和下基座材料之熱膨脹係數,才有辦法克服此困難點,然而在製作上和成本上都比較費工。The US Patent Publication No. 7608986 "Quartz crystal resonator" is mainly a wafer-level package form, which mainly uses a blue plate glass upper cover and a lower base, and a quartz wafer. Anode bonding completes a sandwich structure. However, this sandwich structure differs in thermal expansion coefficient between the substrate and the quartz, so that when the temperature changes, the internal quartz wafer generates thermal stress, so that the frequency shifts with temperature. Therefore, it is necessary to specifically select the chamfer angle of the quartz wafer and the thermal expansion coefficient of the upper and lower base materials in order to overcome this difficulty, but it is laborious in terms of production and cost.

上述專利之先前技術,皆無法跳脫目前採用陶瓷基座封裝的窘境,不僅產品成本高且貨源不穩定,且三明治狀的封裝結構所導致之熱應力問題,仍舊無法有效予以解決。The prior art of the above patents cannot escape the current dilemma of using a ceramic pedestal package, which not only has high product cost and unstable supply, but also the thermal stress problem caused by the sandwich-like package structure cannot be effectively solved.

鑒於以上的問題,本發明的主要目的在於提供一種貫孔式振子裝置晶圓級封裝結構,跳脫目前採用陶瓷基座封裝的窘境,產品成本降低且貨源穩定,並改善三明治封裝結構所導致之熱應力問題,利用貫孔連接方式,使得製程可批次生產並在晶圓上完成整體封裝;同時,減少貴金屬材料用料與進一步微縮尺寸,減少連接線之長度,從而降低因高頻化而衍生之寄生電容/電感效應。In view of the above problems, the main object of the present invention is to provide a wafer-level package structure of a through-hole vibrator device, which is suitable for the current use of a ceramic pedestal package, which has reduced product cost and stable supply, and improves the sandwich package structure. The thermal stress problem is solved by the through-hole connection method, so that the process can be batch-produced and the whole package can be completed on the wafer; at the same time, the precious metal material material is further reduced in size and the length of the connection line is reduced, thereby reducing the high frequency. Derived parasitic capacitance/inductance effect.

因此,為達上述目的,本發明所揭露之一種貫孔式振子裝置晶圓級封裝結構,乃包含有振子單元、上蓋、基座、封裝環以及金屬導通孔,振子單元設置於基座上,且封裝環設置於基座外緣,供上蓋設置而罩設振子單元,並將其予以氣密封裝,而金屬導通孔垂直貫穿基座並與振子單元電性連接,而提供振子單元之訊號輸出/輸入。故,藉由金屬導通孔垂直貫穿設置,減少連接線之長度,從而降低因高頻化而衍生的寄生電容/電感效應;同時,藉由晶圓接合技術可批次生產石英晶體振子之晶圓級封裝,減少人力與生產時間,降低生產成本。Therefore, in order to achieve the above object, a wafer-level package structure of a through-hole type oscillator device disclosed in the present invention includes a vibrator unit, an upper cover, a base, a package ring, and a metal via hole, and the vibrator unit is disposed on the base. The package ring is disposed on the outer edge of the base, and the upper cover is disposed to cover the vibrator unit and is hermetically sealed, and the metal through hole vertically penetrates the base and is electrically connected to the vibrator unit to provide signal output of the vibrator unit. /Input. Therefore, by vertically penetrating the metal vias, the length of the connection lines is reduced, thereby reducing parasitic capacitance/inductance effects due to high frequency. Meanwhile, wafers of quartz crystal oscillators can be batch-produced by wafer bonding technology. Level packaging, reducing labor and production time, and reducing production costs.

為使對本發明之目的、特徵及其功能有進一步的了解,茲配合圖式詳細說明如下:In order to further understand the purpose, features and functions of the present invention, the drawings are described in detail as follows:

根據本發明所揭露之貫孔式振子裝置晶圓級封裝結構,首先請參閱第1圖,為本發明貫孔式振子裝置晶圓級封裝結構第一實施例之示意圖。According to the wafer-level package structure of the through-hole vibrator device disclosed in the present invention, first, referring to FIG. 1 , a schematic diagram of a first embodiment of a wafer-level package structure of a through-hole vibrator device according to the present invention is shown.

根據本發明所揭露之貫孔式振子裝置晶圓級封裝結構包含有振子單元20、上蓋10、基座40、封裝環30以及金屬導通孔50,振子單元20可為溫度穩定切角(AT-cut)石英晶體振子、音叉型石英晶體振子等石英晶體振子或其它機械共振型式振子,且振子單元20之上、下表面分別具有上表面電極21與下表面電極22(見第2圖),藉以激振振子單元20,並透過導電凸塊23電性連接至底部基座40之基座金屬焊墊41。其中,上表面電極21與下表面電極22分別位於振子單元20之相對側,且導電凸塊23可為銀粉顆粒與樹脂等組成之導電膠材或金屬凸塊,其中金屬凸塊可由金、銅、錫、銀、銦或其合金之一構成。The wafer-level package structure of the via-type vibrator device according to the present invention comprises a vibrator unit 20, an upper cover 10, a susceptor 40, a package ring 30 and a metal via 50. The vibrator unit 20 can be a temperature stable chamfer (AT- Cut) a quartz crystal vibrator such as a quartz crystal vibrator or a tuning fork quartz crystal vibrator or other mechanical resonance type vibrator, and the upper surface and the lower surface of the vibrator unit 20 have an upper surface electrode 21 and a lower surface electrode 22, respectively (see FIG. 2). The vibrator unit 20 is excited and electrically connected to the base metal pad 41 of the bottom base 40 through the conductive bumps 23. The upper surface electrode 21 and the lower surface electrode 22 are respectively located on opposite sides of the vibrator unit 20, and the conductive bumps 23 may be conductive rubber materials or metal bumps composed of silver powder particles and resin, wherein the metal bumps may be gold or copper. One of tin, silver, indium or one of its alloys.

因此,振子單元20配置於基座40之上,而基座40外緣設置有封裝環30,此封裝環30可藉由銅、錫、金、銀、銦及上述金屬之合金、有機聚合物、氧化物等材質所構成。藉由封裝環30用以提供上蓋10予以封裝設置,且上蓋10具有凹槽11來容設振子單元20。故,上蓋10、基座40透過封裝環30,而可將振子單元20作氣密封裝,其內部環境可為真空或是充填氮氣;上蓋10的材質可為矽、玻璃、石英、陶瓷、金屬材料等,基座40的材質亦可為矽、玻璃、石英、陶瓷等非導電材料,再者,若將其兩者(上蓋10與基座40)選用相同材質,可進一步防止熱應力之問題。Therefore, the vibrator unit 20 is disposed on the base 40, and the outer edge of the base 40 is provided with a package ring 30. The package ring 30 can be made of copper, tin, gold, silver, indium, and an alloy of the above metals, an organic polymer. It is made of materials such as oxides. The package ring 30 is provided for providing the upper cover 10, and the upper cover 10 has a recess 11 for accommodating the vibrator unit 20. Therefore, the upper cover 10 and the base 40 are transmitted through the sealing ring 30, and the vibrator unit 20 can be hermetically sealed, and the internal environment can be vacuum or filled with nitrogen; the upper cover 10 can be made of bismuth, glass, quartz, ceramic, or metal. Materials, etc., the material of the susceptor 40 may also be non-conductive materials such as enamel, glass, quartz, ceramics, etc. Further, if the two materials (the upper cover 10 and the susceptor 40) are selected from the same material, the problem of thermal stress can be further prevented. .

金屬導通孔50垂直貫穿基座40設置,其材質可為金屬導電材質,譬如銅、鎢、鋁、銀、金及上述金屬之合金等,並且利用矽導通孔(Through silicon via;TSV)技術予以成型。金屬導通孔50上面電性連接於振子單元20之上表面電極21與下表面電極22,並將其電性連接至基座金屬焊墊41,使其可與外部做電性連接,提供電能與訊號輸入與輸出。The metal via hole 50 is vertically disposed through the susceptor 40 and is made of a metal conductive material such as copper, tungsten, aluminum, silver, gold, or an alloy of the above metals, and is subjected to a through silicon via (TSV) technique. forming. The metal via 50 is electrically connected to the upper surface electrode 21 and the lower surface electrode 22 of the vibrator unit 20, and is electrically connected to the pedestal metal pad 41 so as to be electrically connected to the outside to provide electrical energy. Signal input and output.

而其中,當封裝環30為銅、錫、金、銀、銦及上述金屬之合金時,可藉由金屬融接結合的方式予以封裝;當封裝環30為有機聚合物時,則可利用膠合技術達成封裝;而當封裝環30譬如為二氧化矽等氧化性材質時,則可利用陽極氧化接合技術(anodic bonding)達成封裝。Wherein, when the encapsulation ring 30 is an alloy of copper, tin, gold, silver, indium and the above metal, it can be encapsulated by metal fusion bonding; when the encapsulation ring 30 is an organic polymer, it can be glued. The technology achieves the package; and when the package ring 30 is made of an oxidizing material such as ruthenium dioxide, the package can be achieved by anodic bonding.

另一方面,除了上述上表面電極21與下表面電極22位於振子單元20之相對側外,亦可將其設計為位於相同側。請參閱第3圖,為本發明貫孔式振子裝置晶圓級封裝結構第二實施例之示意圖;其中繪示有上表面電極21與下表面電極22位於振子單元20之相同側(見第4圖)。On the other hand, in addition to the above-described upper surface electrode 21 and lower surface electrode 22 being located on opposite sides of the vibrator unit 20, they may be designed to be located on the same side. Please refer to FIG. 3 , which is a schematic diagram of a second embodiment of a wafer level package structure of a through-hole vibrator device according to the present invention; wherein the upper surface electrode 21 and the lower surface electrode 22 are located on the same side of the vibrator unit 20 (see section 4). Figure).

相同地,上蓋10之凹槽11的設計,乃是為了容設振子單元20,故亦可將基座40設計具有凹槽42,而上蓋10設計為平坦,也可達到相同之效果,如第5A、5B圖所示,分別對應於上述第一實施例、第二實施例之變化態樣。Similarly, the recess 11 of the upper cover 10 is designed to accommodate the vibrator unit 20, so that the base 40 can also be designed with a recess 42 and the upper cover 10 is designed to be flat, and the same effect can be achieved. 5A and 5B are diagrams corresponding to the first embodiment and the second embodiment, respectively.

請參閱第6、7圖,為本發明貫孔式振子裝置晶圓級封裝結構第三實施例之示意圖。上述實施例中,金屬導通孔50設計位於貫穿於概略在振子單元20之導電凸塊23的下方;而本實施例中,將金屬導通孔50設計垂直貫穿於封裝環30下方,因金屬導通孔50乃是藉由矽導通孔技術來形成,而矽導通孔為影響內部氣密性的因素之一,因此,本實施例中,藉由走線的方式將金屬導通孔50開設於封裝環30之下方,則當進行封裝製程時,影響封裝氣密性之因素,僅剩下封裝環30接合的好壞,內部封裝氣體不會經由矽導通孔走線而與外界產生交換。因此,整體封裝結構的氣密性將更容易獲得控制。當然,凹槽11的變化、上表面電極21與下表面電極22的相對位置亦可如上述實施例、態樣般予以變化(圖中未示)。Please refer to FIGS. 6 and 7 for a schematic view of a third embodiment of a wafer level package structure of a through-hole vibrator device according to the present invention. In the above embodiment, the metal via 50 is designed to extend under the conductive bump 23 of the vibrator unit 20; in this embodiment, the metal via 50 is designed to penetrate vertically below the package ring 30 due to the metal via. 50 is formed by the via via technology, and the via is one of the factors affecting the internal airtightness. Therefore, in the embodiment, the metal via 50 is opened in the package ring 30 by way of routing. Below, when the packaging process is performed, the factors affecting the hermeticity of the package are left, and only the bonding of the package ring 30 is left, and the internal package gas is not exchanged with the outside through the via hole. Therefore, the airtightness of the overall package structure will be more easily controlled. Of course, the change of the groove 11 and the relative position of the upper surface electrode 21 and the lower surface electrode 22 can also be changed as shown in the above embodiment (not shown).

本發明所揭露之一種貫孔式振子裝置晶圓級封裝結構,藉由垂直貫穿開設於基座的金屬導通孔,來使振子單元與底部的基座金屬焊墊形成電性連接,因此,跳脫目前採用陶瓷基座封裝的窘境(包括產品成本高且貨源不穩定等),並改善三明治封裝結構所導致之熱應力問題;同時,減少貴金屬材料用料與進一步微縮尺寸,減少連接線之長度,從而降低因高頻化而衍生的寄生電容/電感效應。且藉由晶圓接合技術可批次生產石英晶體振子,減少人力與生產時間,降低生產成本。The wafer-level package structure of the through-hole type oscillator device disclosed in the present invention electrically connects the vibrator unit to the bottom base metal pad by vertically penetrating through the metal via hole opened in the base, and therefore jumps The current use of ceramic pedestal packaging (including high product cost and unstable supply), and improve the thermal stress caused by the sandwich packaging structure; at the same time, reduce the use of precious metal materials and further miniaturization, reduce the length of the connection line To reduce the parasitic capacitance/inductance effect due to high frequency. And through the wafer bonding technology, quartz crystal oscillators can be batch-produced, reducing labor and production time and reducing production costs.

雖然本發明以前述之實施例揭露如上,然其並非用以限定本發明。在不脫離本發明之精神和範圍內,所為之更動與潤飾,均屬本發明之專利保護範圍。關於本發明所界定之保護範圍請參考所附之申請專利範圍。Although the present invention has been disclosed above in the foregoing embodiments, it is not intended to limit the invention. It is within the scope of the invention to be modified and modified without departing from the spirit and scope of the invention. Please refer to the attached patent application for the scope of protection defined by the present invention.

10...上蓋10. . . Upper cover

11...凹槽11. . . Groove

20...振子單元20. . . Vibrator unit

21...上表面電極twenty one. . . Upper surface electrode

22...下表面電極twenty two. . . Lower surface electrode

23...導電凸塊twenty three. . . Conductive bump

30...封裝環30. . . Package ring

40...基座40. . . Pedestal

41...基座金屬焊墊41. . . Base metal pad

42...凹槽42. . . Groove

50...金屬導通孔50. . . Metal via

第1圖為本發明貫孔式振子裝置晶圓級封裝結構第一實施例之示意圖。1 is a schematic view showing a first embodiment of a wafer level package structure of a through-hole type vibrator device of the present invention.

第2圖為本發明貫孔式振子裝置晶圓級封裝結構之第一實施例中振子單元上、下電極之示意圖。2 is a schematic view showing the upper and lower electrodes of the vibrator unit in the first embodiment of the wafer level package structure of the through-hole type vibrator device of the present invention.

第3圖為本發明貫孔式振子裝置晶圓級封裝結構第二實施例之示意圖。FIG. 3 is a schematic view showing a second embodiment of a wafer level package structure of a through-hole vibrator device according to the present invention.

第4圖為本發明貫孔式振子裝置晶圓級封裝結構之第二實施例中振子單元上、下電極之示意圖。4 is a schematic view showing the upper and lower electrodes of the vibrator unit in the second embodiment of the wafer level package structure of the through-hole type vibrator device of the present invention.

第5A圖為本發明貫孔式振子裝置晶圓級封裝結構之第一實施例中凹槽之變化實施態樣示意圖。FIG. 5A is a schematic view showing a variation of the groove in the first embodiment of the wafer level package structure of the through-hole type vibrator device of the present invention.

第5B圖為本發明貫孔式振子裝置晶圓級封裝結構之第二實施例中凹槽之變化實施態樣示意圖。FIG. 5B is a schematic view showing a variation of the groove in the second embodiment of the wafer level package structure of the through-hole type vibrator device of the present invention.

第6圖為本發明貫孔式振子裝置晶圓級封裝結構第三實施例之示意圖。FIG. 6 is a schematic view showing a third embodiment of the wafer level package structure of the through-hole vibrator device of the present invention.

第7圖為本發明貫孔式振子裝置晶圓級封裝結構之第三實施例中振子單元上、下電極與封裝環走線之示意圖。FIG. 7 is a schematic view showing the upper and lower electrodes of the vibrator unit and the package ring in the third embodiment of the wafer level package structure of the through-hole type vibrator device of the present invention.

10...上蓋10. . . Upper cover

11...凹槽11. . . Groove

20...振子單元20. . . Vibrator unit

21...上表面電極twenty one. . . Upper surface electrode

22...下表面電極twenty two. . . Lower surface electrode

23...導電凸塊twenty three. . . Conductive bump

30...封裝環30. . . Package ring

40...基座40. . . Pedestal

41...基座金屬焊墊41. . . Base metal pad

50...金屬導通孔50. . . Metal via

Claims (19)

一種貫孔式振子裝置晶圓級封裝結構,其包含:一振子單元;一基座,供該振子單元設置;一封裝環,設置於該基座上;一上蓋,設置於該封裝環而罩設於該振子單元,並將該振子單元予以封裝;以及至少一金屬導通孔,垂直設置於該基座,並與該振子單元電性連接,而提供訊號輸入/輸出。A through-hole vibrator device wafer-level package structure, comprising: a vibrator unit; a base for the vibrator unit; a package ring disposed on the base; an upper cover disposed on the package ring The vibrator unit is disposed, and the vibrator unit is packaged; and at least one metal via hole is vertically disposed on the base and electrically connected to the vibrator unit to provide signal input/output. 如申請專利範圍第1項所述之貫孔式振子裝置晶圓級封裝結構,其中該振子單元係為一石英晶體振子或機械共振型式振子。The wafer-level package structure of the through-hole vibrator device according to claim 1, wherein the vibrator unit is a quartz crystal vibrator or a mechanical resonance type vibrator. 如申請專利範圍第2項所述之貫孔式振子裝置晶圓級封裝結構,其中該石英晶體振子係為溫度穩定切角(AT-cut)石英晶體振子或音叉型石英晶體振子。The wafer-level package structure of the through-hole vibrator device according to claim 2, wherein the quartz crystal oscillator is a temperature-stabilized angle-cutting (AT-cut) quartz crystal vibrator or a tuning-fork quartz crystal vibrator. 如申請專利範圍第1項所述之貫孔式振子裝置晶圓級封裝結構,其中該上蓋係由矽、玻璃、石英、陶瓷或金屬材料之一所構成。The wafer-level package structure of the through-hole vibrator according to claim 1, wherein the upper cover is made of one of bismuth, glass, quartz, ceramic or metal material. 如申請專利範圍第1項所述之貫孔式振子裝置晶圓級封裝結構,其中該封裝環係由銅、錫、金、銀、銦或上述合金、有機聚合物或氧化物之材質之一所構成。The wafer-level package structure of the through-hole vibrator device according to claim 1, wherein the package ring is made of copper, tin, gold, silver, indium or one of the above alloys, organic polymers or oxide materials. Composition. 如申請專利範圍第1項所述之貫孔式振子裝置晶圓級封裝結構,其中該振子單元包含有一上表面電極與一下表面電極。The wafer-level package structure of the through-hole vibrator device of claim 1, wherein the vibrator unit comprises an upper surface electrode and a lower surface electrode. 如申請專利範圍第6項所述之貫孔式振子裝置晶圓級封裝結構,其中該上表面電極與該下表面電極係分別藉由一導電凸塊與該金屬導通孔電性連接。The wafer-level package structure of the through-hole vibrator device of claim 6, wherein the upper surface electrode and the lower surface electrode are electrically connected to the metal via hole by a conductive bump. 如申請專利範圍第7項所述之貫孔式振子裝置晶圓級封裝結構,其中該導電凸塊係為銀粉顆粒與樹脂之混合導電膠材或金屬凸塊之一所構成。The wafer-level package structure of the through-hole vibrator device according to claim 7, wherein the conductive bump is composed of one of a mixed conductive rubber material or a metal bump of silver powder particles and a resin. 如申請專利範圍第8項所述之貫孔式振子裝置晶圓級封裝結構,其中該金屬凸塊可由金、銅、錫、銀、銦或其合金之一構成。The wafer-level package structure of the through-hole vibrator device of claim 8, wherein the metal bump may be composed of one of gold, copper, tin, silver, indium or an alloy thereof. 如申請專利範圍第6項所述之貫孔式振子裝置晶圓級封裝結構,其中該上表面電極與該下表面電極設置於該振子單元之相同側。The wafer-level package structure of the through-hole vibrator device of claim 6, wherein the upper surface electrode and the lower surface electrode are disposed on the same side of the vibrator unit. 如申請專利範圍第6項所述之貫孔式振子裝置晶圓級封裝結構,其中該上表面電極與該下表面電極設置於該振子單元之相對側。The wafer-level package structure of the through-hole vibrator device of claim 6, wherein the upper surface electrode and the lower surface electrode are disposed on opposite sides of the vibrator unit. 如申請專利範圍第1項所述之貫孔式振子裝置晶圓級封裝結構,其中該上蓋具有一凹槽,用以容設該振子單元。The wafer-level package structure of the through-hole vibrator device of claim 1, wherein the upper cover has a recess for receiving the vibrator unit. 如申請專利範圍第1項所述之貫孔式振子裝置晶圓級封裝結構,其中該基座具有一凹槽,用以容設該振子單元。The wafer-level package structure of the through-hole vibrator device of claim 1, wherein the base has a recess for receiving the vibrator unit. 如申請專利範圍第1項所述之貫孔式振子裝置晶圓級封裝結構,其中該金屬導通孔設置於該封裝環下方。The through-hole vibrator wafer level package structure according to claim 1, wherein the metal via hole is disposed under the package ring. 如申請專利範圍第1項所述之貫孔式振子裝置晶圓級封裝結構,其中該金屬導通孔係選自由銅、銀、金、鎢、或其合金所構成之組合。The through-hole vibrator wafer level package structure according to claim 1, wherein the metal via hole is selected from the group consisting of copper, silver, gold, tungsten, or alloys thereof. 如申請專利範圍第1項所述之貫孔式振子裝置晶圓級封裝結構,其中該金屬導通孔係藉由矽導通孔技術予以成型。The through-hole vibrator wafer level package structure according to claim 1, wherein the metal via hole is formed by a via via technology. 如申請專利範圍第1項所述之貫孔式振子裝置晶圓級封裝結構,其中該基座係由矽、玻璃、石英或陶瓷材料之一所構成。The wafer-level package structure of the through-hole vibrator device of claim 1, wherein the pedestal is composed of one of bismuth, glass, quartz or ceramic materials. 如申請專利範圍第1項所述之貫孔式振子裝置晶圓級封裝結構,其中該上蓋與該基座係為相同材質所構成。The wafer-level package structure of the through-hole vibrator device according to claim 1, wherein the upper cover and the base are made of the same material. 如申請專利範圍第1項所述之貫孔式振子裝置晶圓級封裝結構,其中該基座底部更包含有一基座金屬焊墊,藉以與該金屬導通孔構成電性連接。The wafer-level package structure of the through-hole vibrator according to claim 1, wherein the bottom of the base further comprises a base metal pad for electrically connecting to the metal via.
TW099106780A 2010-03-09 2010-03-09 Welded - type vibrator device wafer - level package structure TWI406382B (en)

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1371763A (en) * 2001-02-19 2002-10-02 精工爱普生株式会社 Piezoelectric element and package thereof
US20040103509A1 (en) * 1998-12-08 2004-06-03 Agnes Bidard Encapsulated surface acoustic wave component and method of collective fabrication

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040103509A1 (en) * 1998-12-08 2004-06-03 Agnes Bidard Encapsulated surface acoustic wave component and method of collective fabrication
CN1371763A (en) * 2001-02-19 2002-10-02 精工爱普生株式会社 Piezoelectric element and package thereof

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