TWI401307B - Preparation of cerium - based abrasive - Google Patents

Preparation of cerium - based abrasive Download PDF

Info

Publication number
TWI401307B
TWI401307B TW96112022A TW96112022A TWI401307B TW I401307 B TWI401307 B TW I401307B TW 96112022 A TW96112022 A TW 96112022A TW 96112022 A TW96112022 A TW 96112022A TW I401307 B TWI401307 B TW I401307B
Authority
TW
Taiwan
Prior art keywords
abrasive
component
acid
slurry
particles
Prior art date
Application number
TW96112022A
Other languages
Chinese (zh)
Other versions
TW200745317A (en
Inventor
Yoshikazu Ito
Tetsufumi Hisatsune
Yoko Imafuku
Masaaki Ikemura
Original Assignee
Seimi Chem Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seimi Chem Kk filed Critical Seimi Chem Kk
Publication of TW200745317A publication Critical patent/TW200745317A/en
Application granted granted Critical
Publication of TWI401307B publication Critical patent/TWI401307B/en

Links

Landscapes

  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)

Description

鈰系研磨劑之再生方法Regeneration method of lanthanide abrasive

本發明係關於鈰系研磨劑的再生方法,更詳細地說,係關於將研磨速度大幅降低且通常被廢棄的鈰系研磨劑的研磨速度,再生到接近於未使用的研磨劑的研磨速度的方法。The present invention relates to a method for regenerating an lanthanide-based abrasive, and more particularly to a polishing rate of a cerium-based abrasive which is greatly reduced in polishing rate and which is usually discarded, and is regenerated to a polishing rate close to that of an unused abrasive. method.

近年來,玻璃材料被用於各種用途中,不僅用於光學透鏡等光學用途用的玻璃材料,並且廣泛地使用在液晶顯示器用的玻璃基板、電漿顯示器用玻璃基板、磁片或光碟等用於記錄媒體用玻璃基板、LSI光罩用玻璃基板等電子電路製造用的領域。In recent years, glass materials have been used in various applications, and are not only used for glass materials for optical applications such as optical lenses, but also widely used in glass substrates for liquid crystal displays, glass substrates for plasma displays, magnetic sheets, and optical disks. The field of electronic circuit manufacturing, such as a glass substrate for recording media, and a glass substrate for LSI photomask.

作為在這些玻璃基板的表面研磨中使用的研磨劑,以往係使用以稀土類氧化物(特別是氧化鈰)為主要成分的研磨劑(以下,稱為「鈰系研磨劑」)。其原因為,作為研磨磨料,氧化鈰與氧化鋯或二氧化矽相比,具有對玻璃的研磨效率優異數倍的優點。As an abrasive used for the surface polishing of these glass substrates, an abrasive containing a rare earth oxide (particularly cerium oxide) as a main component (hereinafter referred to as "lanthanum-based abrasive") has been conventionally used. The reason for this is that cerium oxide has an advantage that the polishing efficiency of the glass is several times higher than that of zirconia or cerium oxide as a polishing abrasive.

採用鈰系研磨劑研磨各種玻璃基板時,通常使其分散於水系介質中製成漿料(以下,稱為「研磨劑漿料」)使用。例如,研磨劑漿料供給到研磨裝置中進行研磨操作,該研磨裝置包括設置在上部的研磨頭(polishing head)和下部的旋轉的研磨墊(polishing pad),該研磨頭使被研磨劑(玻璃基板)保持並進行旋轉。When various glass substrates are polished by an lanthanum-based abrasive, they are usually dispersed in an aqueous medium to form a slurry (hereinafter referred to as "abrasive slurry"). For example, the abrasive slurry is supplied to a polishing apparatus for performing a polishing operation, and the polishing apparatus includes a polishing head disposed at an upper portion and a rotating polishing pad of a lower portion, the polishing head imparts an abrasive (glass) The substrate) is held and rotated.

目前現狀為,研磨劑漿料通常循環使用,但由於研磨力隨著使用而慢慢降低,從實用上的觀點看,在研磨速度大幅降低的時點(例如,降低到初期研磨速度的50%以下的時刻),係作為使用過的研磨劑被廢棄處置。The current state of the art is that the polishing slurry is usually recycled, but the polishing force is gradually lowered with use, and from a practical point of view, when the polishing rate is greatly lowered (for example, it is reduced to 50% or less of the initial polishing rate). At the time), it was disposed of as a used abrasive.

但是,使用過的鈰系研磨劑除了鈰以外,還含有大量鑭、鐠、釹等貴重的稀土(rare earth)元素。從資源的有效利用方面來看,強烈希望不將這些只是作為工業廢棄物廢棄,而是予以回收再次使用。However, the used lanthanide abrasive contains a large amount of valuable rare earth elements such as lanthanum, cerium and lanthanum in addition to cerium. From the point of view of the effective use of resources, it is strongly hoped that these will not be disposed of as industrial waste, but will be recycled and reused.

另外,如最近的報紙等的新聞中所報導,伴隨著液晶電視(液晶顯示器用面板)或電漿電視(電漿顯示器用面板)的激烈的大型化競爭,對應之玻璃基板也急遽地大型化,研磨所必需的鈰系研磨劑的需求量也增大。從確保稀土類原料的穩定方面看,也希望將使用過的研磨劑回收使用。In addition, as reported in the recent newspapers and the like, the glass substrate is also rapidly increasing in size due to the fierce competition for large-scale LCD TVs (panels for liquid crystal displays) or plasma TVs (panels for plasma displays). The demand for the lanthanide abrasive necessary for grinding also increases. From the viewpoint of ensuring the stability of the rare earth raw material, it is also desirable to recycle the used abrasive.

近年來,提出了幾種在使用過的鈰系研磨劑漿中添加硫酸鋁等凝集劑,使研磨劑粒子凝集,再用固液分離手段而回收研磨劑原料的技術方案。In recent years, several proposals have been made to add an aggregating agent such as aluminum sulfate to a used cerium-based abrasive slurry, to agglomerate the abrasive particles, and to recover the abrasive raw material by solid-liquid separation means.

具體而言,如日本專利公開公報(特開平10(1998)-280060號)(專利文獻1)所記載,提出了在研磨劑漿料中添加有機凝集劑,調節pH,再進行固液分離而回收的方法;如日本專利公開公報(特開2004-237163號)(專利文獻2)所記載,提出了添加作為凝集劑的聚合氯化鋁,將pH調節為7左右來進行凝集.回收的方法;以及如日本專利公開公報(特開2002-28662號)(專利文獻3)所記載,提出了使用含有氧化鋁、氧化鈣、二氧化矽、氧化鈉的凝集劑作為凝集劑,使研磨劑成分凝集而回收的方法。Specifically, as disclosed in Japanese Laid-Open Patent Publication No. Hei 10 (1998) No. 280060 (Patent Document 1), it is proposed to add an organic coagulant to an abrasive slurry, adjust the pH, and perform solid-liquid separation. In the method of the present invention, it is proposed to add a polyaluminum chloride as a coagulant and adjust the pH to about 7 to carry out agglutination as described in Japanese Laid-Open Patent Publication No. 2004-237163 (Patent Document 2). And a method of using a flocculant containing aluminum oxide, calcium oxide, cerium oxide, or sodium oxide as a coagulant, as described in Japanese Laid-Open Patent Publication No. 2002-28662 (Patent Document 3). A method in which the abrasive component is agglomerated and recovered.

如此作為固體成分回收的使用過的鈰系研磨劑,研磨力大幅降低,為了再使用,需要進行使研磨速度恢復的處理。研磨速度降低的原因被認為是由於如下理由:被研磨材料中的玻璃成分(Si成分)在研磨劑漿料中剝離或溶離而被吸附到研磨劑粒子的表面,或者來自玻璃成分或已使用的凝集劑等的雜質成分(Al成分、Fe成分等)同樣地被吸附在研磨劑粒子表面,從而使活性降低等。As described above, the used cerium-based abrasive recovered as a solid component has a greatly reduced polishing power, and it is necessary to perform a treatment for recovering the polishing rate for reuse. The reason why the polishing rate is lowered is considered to be due to the fact that the glass component (Si component) in the material to be polished is peeled off or eluted in the abrasive slurry to be adsorbed to the surface of the abrasive particles, or from the glass component or used. The impurity component (such as an Al component or an Fe component) such as a coagulant is adsorbed on the surface of the abrasive particles in the same manner to lower the activity.

為了使活性恢復,如日本專利公開公報(特開平11(1999)-90825號)(專利文獻4)所記載,已知下述方法:於使用過的鈰系研磨劑中添加大量過量的氫氧化鈉等鹼水溶液來進行處理,使Si成分和Al成分等溶解而除去。另外,如日本專利公開公報(特開2003-205460號)(專利文獻5)所記載,亦已知下述方法:在使用過的鈰系研磨劑漿料中添加分散劑和高濃度的鹼成分,加熱到50℃以上,將附著在研磨劑粒子表面的玻璃成分(Si成分)溶解除去。In order to restore the activity, as described in Japanese Laid-Open Patent Publication No. Hei 11 (1999)-90825 (Patent Document 4), there is known a method of adding a large excess amount of hydrogen peroxide to the used lanthanide abrasive. The alkali aqueous solution such as sodium is treated to dissolve and remove the Si component and the Al component. In addition, as described in Japanese Laid-Open Patent Publication No. 2003-205460 (Patent Document 5), a method of adding a dispersing agent and a high-concentration alkali component to a used cerium-based abrasive slurry is also known. The glass component (Si component) adhering to the surface of the abrasive particles is dissolved and removed by heating to 50 ° C or higher.

可是,藉由添加鹼來處理使用過的鈰系研磨劑的方法(以下,有時稱為「鹼處理法」)存在下述問題:需要大量過量的鹼(例如,需要乾燥基質(base)研磨劑質量的5~7倍質量的鹼)、添加鹼時鈰系研磨劑容易凝集而導致研磨劑的粒徑變大、以及為了控制這些現象而需要進一步添加分散劑等。However, a method of treating a used lanthanum-based abrasive by adding a base (hereinafter, sometimes referred to as "alkali treatment") has a problem that a large excess of alkali is required (for example, a dry base is required to be ground). When the alkali is added, the cerium-based abrasive tends to aggregate, and the particle size of the polishing agent becomes large, and further, a dispersing agent or the like needs to be added in order to control these phenomena.

另外,本發明人等藉由實際進行鹼添加法來研究鈰系研磨劑的再生處理而得知,儘管添加了附著在該鈰系研磨劑上的Si成分、Al成分的27倍當量的鹼來進行處理,但該等的除去率充其量也只是60%左右。In addition, the inventors of the present invention have studied the regeneration treatment of the lanthanide-based abrasive by actually performing the alkali addition method, and it has been found that a Si component and an alkali component of 27 equivalents of the Al component are added to the lanthanide-based abrasive. The treatment is carried out, but the removal rate of these is only about 60% at best.

另外,在日本專利公開公報(特開2003-211356號)(專利文獻6)中,記載了用酸來處理使用過的研磨劑的方法,該方法為:於幾乎全部被廢棄處置的使用過的研磨劑的含水濾餅中添加濃鹽酸和過氧化氫,使氧化鈰轉化成氯化鈰(Ce3+ )而完全溶解,再於該溶液中添加鹼,成為鈰的氫氧化物或碳酸鹽並使之沉澱,作為鈰資源而回收。該回收的鈰化合物可以用在研磨劑以外的各種用途,實現了資源的有效利用。但是,該技術並不是將使用過的鈰系研磨劑再生成研磨劑的技術。In the Japanese Patent Laid-Open Publication No. 2003-211356 (Patent Document 6), there is described a method of treating a used abrasive with an acid, which is used in almost all disposed of waste disposal. Concentrated hydrochloric acid and hydrogen peroxide are added to the aqueous filter cake of the abrasive to convert cerium oxide into cerium chloride (Ce 3+ ) and completely dissolved, and then a base is added to the solution to become a hydroxide or carbonate of cerium. The precipitate is recovered as a sputum resource. The recovered ruthenium compound can be used in various applications other than the abrasive to realize efficient use of resources. However, this technique is not a technique for regenerating an abrasive using a used lanthanide abrasive.

本發明的目的在於提供一種研磨劑的再生速度的方法,將研磨速度大幅降低且通常被廢棄的鈰系研磨劑的研磨速度,再生到接近於未使用的研磨劑的研磨速度。An object of the present invention is to provide a method for regenerating an abrasive, which greatly reduces the polishing rate and regenerates the polishing rate of the commonly used cerium-based abrasive to a polishing rate close to that of an unused abrasive.

另外,本發明的目的在於提供將使用過的鈰系研磨劑進行再生處理的方法,該方法不使用鹼,從而不存在使研磨劑粒子凝集等問題,並且避免了成為使鈰系研磨劑的研磨速度降低的原因的Si成分或Al成分的除去率低的問題。Further, an object of the present invention is to provide a method for regenerating a used cerium-based abrasive which does not use a base, so that there is no problem of agglomerating the abrasive particles, and the grinding of the cerium-based abrasive is avoided. There is a problem that the removal rate of the Si component or the Al component is low because of the decrease in speed.

按照本發明,可提供以下的鈰系研磨劑的再生方法。According to the present invention, the following method for regenerating a lanthanide abrasive can be provided.

[1]一種將使用過的鈰系研磨劑進行處理而得到再生研磨劑的方法,其特徵在於包含下面的步驟:將該使用過的研磨劑粒子用水進行再分散,再將得到的漿料以漿料的狀態直接至少用酸進行處理。[1] A method for obtaining a regenerated abrasive by treating a used lanthanide abrasive, comprising the steps of: redispersing the used abrasive particles with water, and then using the obtained slurry as The state of the slurry is treated directly with at least acid.

[2]一種將使用過的鈰系研磨劑進行處理而得到再生研磨劑的方法,其特徵在於包含下述步驟:(1)將該使用過的研磨劑粒子用水進行再分散,製成漿料的步驟;(2)用酸處理該再分散的漿料的步驟;(3)將得到的酸處理漿料進行固液分離的步驟;以及(4)將得到的濾餅乾燥、粉碎的步驟。[2] A method of obtaining a regenerated abrasive by treating a used lanthanide abrasive, comprising the steps of: (1) redispersing the used abrasive particles with water to prepare a slurry. a step of (2) treating the redispersed slurry with an acid; (3) a step of subjecting the obtained acid-treated slurry to solid-liquid separation; and (4) a step of drying and pulverizing the obtained filter cake.

[3]一種將使用過的鈰系研磨劑進行處理而得到再生研磨劑的方法,其特徵在於包含下述步驟:(1)將該使用過的研磨劑粒子用水進行再分散,製成漿料的步驟;(2)用酸處理該再分散的漿料的步驟;(3)將得到的酸處理漿料進行固液分離的步驟;(4)將得到的濾餅乾燥的步驟;以及(5)將該乾燥的濾餅煅燒、粉碎的步驟。[3] A method for obtaining a regenerated abrasive by treating a used lanthanide abrasive, comprising the steps of: (1) redispersing the used abrasive particles with water to prepare a slurry. a step of (2) treating the redispersed slurry with an acid; (3) a step of subjecting the obtained acid-treated slurry to solid-liquid separation; (4) a step of drying the obtained filter cake; and (5) The step of calcining and pulverizing the dried filter cake.

[4]上述[1]~[3]中任一項所述的鈰系研磨劑的再生方法,其中,酸為無機酸。[4] The method for regenerating an anthraquinone-based abrasive according to any one of the above [1], wherein the acid is a mineral acid.

[5]上述[4]所述的鈰系研磨劑的再生方法,其中,併用二種以上的無機酸。[5] The method for regenerating an anthraquinone-based abrasive according to the above [4], wherein two or more inorganic acids are used in combination.

[6]上述[5]所述的鈰系研磨劑的再生方法,其中,併用鹽酸、硫酸和硝酸中的一種和氫氟酸。[6] The method for regenerating a lanthanide abrasive according to the above [5], wherein one of hydrochloric acid, sulfuric acid and nitric acid and hydrofluoric acid are used in combination.

本發明的方法的基本的技術思想在於將使用過的鈰系研磨劑進行處理而得到再生研磨劑,其特徵在於包含下面的步驟:將該使用過的研磨劑粒子用水進行再分散,再將得到的漿料至少用酸進行處理。以下,參照附圖說明本發明的更具體的實施態樣。The basic technical idea of the method of the present invention is to obtain a regenerated abrasive by treating a used lanthanide abrasive, which comprises the steps of: redispersing the used abrasive particles with water, and then obtaining The slurry is treated with at least acid. Hereinafter, a more specific embodiment of the present invention will be described with reference to the drawings.

圖1是顯示處理使用過的鈰系研磨劑而得到再生研磨劑的具體步驟的一例的流程圖。Fig. 1 is a flow chart showing an example of a specific procedure for obtaining a regenerated abrasive by treating a used cerium-based abrasive.

(1)使用過的研磨劑的漿料化處理(第一步驟)(1) Slurry treatment of used abrasive (first step)

在本發明中,使用過的研磨劑是在研磨速度大幅降低的鈰系研磨劑漿料中添加凝集劑,使研磨劑粒子凝集,再用固液分離手段回收的濕濾餅(脫水濾餅)或乾燥濾餅狀的研磨劑粒子。In the present invention, the used abrasive is a wet cake (dewatered cake) which is obtained by adding a coagulant to the cerium-based abrasive slurry having a greatly reduced polishing rate, aggregating the abrasive particles, and recovering by solid-liquid separation means. Or filter the filter cake-like abrasive particles.

使用過的研磨劑的組成可以根據未使用(使用前)的研磨劑組成、研磨經歷、被研磨材料的種類或組成、凝集劑的種類等而改變,舉出一例的話,如後述的實施例所示,其成分組成(質量%(乾燥基準))為TREO(Total Rare Earth Oxide/總稀土氧化物)(=CeO2 +La2 O3 +Nd2 O3 +Pr6 O11 )為80~95%,另外,上述各氧化物相對於TREO的質量比率大致為:CeO2 60%、La2 O3 33%、Nd2 O3 1%、Pr6 O11 6%左右,此外含有氟成分(F)5~6%、Si成分0.6~3%、Al成分0.3~0.9%、Fe成分0.3~1.0%等。The composition of the used abrasive may be changed depending on the composition of the polishing agent before use (before use), the polishing experience, the type or composition of the material to be polished, the type of the aggregating agent, and the like, and as an example, as will be described later. It is shown that the composition (% by mass (dry basis)) is TREO (Total Rare Earth Oxide) (=CeO 2 +La 2 O 3 +Nd 2 O 3 +Pr 6 O 11 ) is 80 to 95%, The mass ratio of each of the above oxides to TREO is approximately: CeO 2 60%, La 2 O 3 33%, Nd 2 O 3 1%, Pr 6 O 11 6%, and fluorine component (F) 5~ 6%, Si composition 0.6 to 3%, Al composition 0.3 to 0.9%, Fe composition 0.3 to 1.0%, and the like.

在本發明中,在脫水濾餅狀等的使用過的研磨劑10中添加水12,進行再分散處理14,得到其再分散漿料16。作為漿料濃度並沒有特別限定,但通常為5~60%,較佳為10~40%左右。漿料濃度過低時,下面的酸處理步驟中的研磨劑粒子的處理量低,濃度高時,由於不能充分進行漿料的攪拌,酸處理不完全,故較不佳。In the present invention, water 12 is added to the used abrasive 10 such as a dewatered cake, and the redispersion treatment 14 is carried out to obtain a redispersed slurry 16 thereof. The slurry concentration is not particularly limited, but is usually from 5 to 60%, preferably from about 10 to 40%. When the slurry concentration is too low, the amount of the abrasive particles to be treated in the following acid treatment step is low, and when the concentration is high, the slurry is not sufficiently stirred, and the acid treatment is incomplete, which is not preferable.

作為用來進行該漿料化處理的裝置,較佳係具備攪拌手段的容器。As means for performing the slurrying treatment, a container having a stirring means is preferred.

(2)酸處理步驟(第二步驟)(2) Acid treatment step (second step)

於該再分散的使用過的研磨劑的再分散漿料16中添加酸18,進行處理。作為在酸處理步驟20中使用的酸,只要是可以藉由溶解、分解或洗滌等使被黏在該研磨劑表面的玻璃成分(Si成分)或雜質成分(Al成分、Fe成分等)可溶化或游離,從而從研磨劑粒子上除去的酸即可,可以是無機酸,也可以是有機酸,但從效果上看,作用較強的無機酸為佳。作為無機酸,可舉出氫氟酸、鹽酸、溴酸、硫酸、硝酸、磷酸等。這些酸可以使用其中的一種,也可以併用2種以上。例如,藉由併用氫氟酸和鹽酸、氫氟酸和硫酸等,以氫氟酸主要除去玻璃成分(Si成分),以鹽酸或硫酸主要除去其他的雜質成分(Al成分、Fe成分等),可以選擇性地除去各種成分,從而在整體上使除去效率更加提高。Acid 18 is added to the redispersed slurry 16 of the redispersed used abrasive for treatment. The acid to be used in the acid treatment step 20 is such that the glass component (Si component) or the impurity component (Al component, Fe component, etc.) adhering to the surface of the abrasive can be dissolved by dissolution, decomposition, washing or the like. Alternatively, the acid may be removed from the abrasive particles, and may be an inorganic acid or an organic acid. However, in view of the effect, a stronger inorganic acid is preferred. Examples of the inorganic acid include hydrofluoric acid, hydrochloric acid, bromic acid, sulfuric acid, nitric acid, and phosphoric acid. These acids may be used alone or in combination of two or more. For example, by using hydrofluoric acid, hydrochloric acid, hydrofluoric acid, sulfuric acid or the like in combination, hydrofluoric acid mainly removes a glass component (Si component), and hydrochloric acid or sulfuric acid mainly removes other impurity components (Al component, Fe component, etc.). The various components can be selectively removed to further improve the removal efficiency as a whole.

作為用以實施酸處理步驟20的裝置,只要是能夠以不會使收納的研磨劑漿料沉澱而是以良好分散的狀態有效地與酸進行反應的裝置,則沒有特別限定。通常較佳為具備攪拌手段、加熱手段、溫度控制手段、研磨劑漿料或酸的供給手段等的攪拌槽型的反應容器。另外,還可以使用該攪拌槽型反應容器同時作為用以實施漿料化步驟(第一步驟)的容器。The apparatus for carrying out the acid treatment step 20 is not particularly limited as long as it can efficiently react with an acid without precipitating the contained abrasive slurry. It is generally preferred to use a stirring tank type reaction vessel including a stirring means, a heating means, a temperature control means, an abrasive slurry, or an acid supply means. Further, it is also possible to use the agitation tank type reaction vessel as a vessel for carrying out the slurrying step (first step).

酸處理步驟20是於該槽型反應容器中容納的再分散漿料16中添加酸18,並以漿料狀態進行。與以往的添加鹼的情況相比,酸的添加重可以大幅減少,相對於研磨劑粒子中的玻璃成分(Si成分)或其他的雜質成分(Al成分、Fe成分等)係1~5倍當量,較佳為1.1~3倍當量。The acid treatment step 20 is to add an acid 18 to the redispersion slurry 16 contained in the tank type reaction vessel, and to carry out the slurry state. The addition weight of the acid can be greatly reduced as compared with the case of adding a base in the related art, and is 1 to 5 equivalents to the glass component (Si component) or other impurity component (Al component, Fe component, etc.) in the abrasive particles. Preferably, it is 1.1 to 3 times the equivalent.

關於反應溫度,可以在室溫或加溫下實施,通常為5~90℃,較佳為10~80℃,更佳為15~70℃左右。另外,反應時間可以根據反應溫度、酸的種類、濃度、添加量、研磨劑粒子中的玻璃成分(Si成分)或其他的雜質成分(Al成分、Fe成分等)量而改變,但通常為0.5~30小時,較佳為1~20小時,更佳為2~10小時左右。The reaction temperature can be carried out at room temperature or under heating, and is usually 5 to 90 ° C, preferably 10 to 80 ° C, more preferably about 15 to 70 ° C. Further, the reaction time may be changed depending on the reaction temperature, the type of acid, the concentration, the amount of addition, the glass component (Si component) in the abrasive particles, or other impurity components (Al component, Fe component, etc.), but is usually 0.5. ~30 hours, preferably 1 to 20 hours, more preferably 2 to 10 hours.

併用多種酸,例如氫氟酸和鹽酸、氫氟酸和硫酸等的情況下,可以將該2種酸同時加入研磨劑漿料中,另外,也可以先加入一種酸,接著再添加另一種酸。後者之方法中,亦可根據酸的種類來改變反應溫度和反應時間。再者,酸處理步驟可以間歇式操作實施,也可串聯連接多個槽型反應器,以連續流通式操作實施。另外,以連續流通式操作實施時,作為反應時間,可以採取槽型反應器中的平均滯留時間。When a plurality of acids, such as hydrofluoric acid and hydrochloric acid, hydrofluoric acid, sulfuric acid, etc., are used, the two acids may be simultaneously added to the abrasive slurry, or an acid may be added first, followed by another acid. . In the latter method, the reaction temperature and the reaction time can also be changed depending on the kind of the acid. Further, the acid treatment step may be carried out in a batch operation, or a plurality of tank reactors may be connected in series and carried out in a continuous flow operation. Further, when it is carried out in a continuous flow type operation, the average residence time in the tank type reactor can be taken as the reaction time.

(3)固液分離步驟(第三步驟)(3) Solid-liquid separation step (third step)

如此,被酸處理的處理漿料22在固液分離步驟24中被處理,分離成研磨劑粒子濾餅26和濾液25。研磨劑粒子中的大部分玻璃成分(Si成分)、其他的雜質成分(Al成分、Fe成分等),藉由酸而可溶化或游離,轉移到該濾液25(母液或上清液)中。如此,研磨劑粒子和雜質成分被分離。Thus, the acid-treated treatment slurry 22 is treated in the solid-liquid separation step 24, and separated into the abrasive particle filter cake 26 and the filtrate 25. Most of the glass component (Si component) and other impurity components (Al component, Fe component, etc.) in the abrasive particles are solubilized or freed by an acid, and are transferred to the filtrate 25 (mother liquor or supernatant). Thus, the abrasive particles and the impurity components are separated.

固液分離步驟可以採用沉澱分離,即,在增稠器(沉降槽)中將酸處理漿料靜置,使研磨劑粒子沉降而分離,傾出上清液或使上清液由槽中溢出。或者,亦可以藉由機械性離心分離、離心沉降分離、過濾等來進行固液分離。進而,可以將沉降分離和過濾等組合實施。另外,固液分離時,根據研磨劑粒子的粒徑,可以使用濾布、陶瓷過濾器、濾紙等適當的濾布。The solid-liquid separation step may be carried out by precipitation separation, that is, the acid-treated slurry is allowed to stand in a thickener (settling tank), the abrasive particles are sedimented and separated, and the supernatant is decanted or the supernatant is overflowed from the tank. . Alternatively, solid-liquid separation may be carried out by mechanical centrifugation, centrifugal sedimentation, filtration, or the like. Further, it is possible to carry out a combination of sedimentation separation, filtration, and the like. Further, in the solid-liquid separation, an appropriate filter cloth such as a filter cloth, a ceramic filter, or a filter paper can be used depending on the particle diameter of the abrasive particles.

另外,為了將附著在研磨劑表面等的玻璃成分(Si成分)等充分洗滌,可以充分洗滌濾餅,或者進一步使分離的研磨劑粒子濾餅再次分散在水中(再壓濾(repulp)),製成漿料,再進行固液分離操作,反覆進行該操作。In addition, in order to sufficiently wash the glass component (Si component) or the like adhering to the surface of the polishing agent or the like, the filter cake may be sufficiently washed, or the separated abrasive particle cake may be further dispersed in water (re-repulp). The slurry is formed, and then subjected to a solid-liquid separation operation, and the operation is repeated.

在本發明中,對如上獲得的研磨劑粒子的濾餅26實施最終的處理,得到再生研磨劑。此時,根據目的,如圖所示,可以使用只藉由乾燥、粉碎得到再生研磨劑的採用流程1的處理方案的方法,以及進行乾燥、煅燒、粉碎而得到再生研磨劑的採用流程2的處理方案的方法中的任意一種方法。In the present invention, the final treatment of the filter cake 26 of the abrasive particles obtained above is carried out to obtain a regenerated abrasive. At this time, according to the purpose, as shown in the drawing, a method using the treatment scheme of the flow 1 obtained by drying and pulverizing only the regenerated abrasive, and drying, calcination, and pulverization to obtain the regenerated abrasive can be used. Any of the methods of processing the scheme.

(4)流程1的方案(乾燥、粉碎步驟)(4) Scheme of Process 1 (drying, pulverizing step)

只藉由乾燥步驟28、粉碎步驟30,將研磨劑粒子濾餅26製成最終的再生研磨劑。作為用於實施乾燥的裝置,沒有特別限定,例如可使用箱型乾燥機、帶式乾燥機、真空乾燥機、氣流乾燥機、噴霧乾燥機、攪拌型乾燥機、振動乾燥機、熱風乾燥機等。The abrasive particle filter cake 26 is formed into a final regenerated abrasive by only the drying step 28 and the pulverizing step 30. The apparatus for performing the drying is not particularly limited, and for example, a box dryer, a belt dryer, a vacuum dryer, a gas flow dryer, a spray dryer, a stirring dryer, a vibration dryer, a hot air dryer, or the like can be used. .

乾燥環境溫度可適當設定,但較佳為40~800℃,特佳為100~400℃。乾燥時間也可以適當設定,例如為幾秒~30小時。使用通常的熱風乾燥機時,乾燥環境溫度較佳為100~400℃。另外,使用真空乾燥機時,乾燥環境溫度較佳為40~200℃。使用噴霧乾燥機時,可以乾燥幾秒鐘。The dry ambient temperature can be appropriately set, but it is preferably 40 to 800 ° C, and particularly preferably 100 to 400 ° C. The drying time can also be appropriately set, for example, several seconds to 30 hours. When a normal hot air dryer is used, the drying ambient temperature is preferably from 100 to 400 °C. Further, when a vacuum dryer is used, the drying ambient temperature is preferably 40 to 200 °C. When using a spray dryer, it can be dried for a few seconds.

藉由將乾燥後的研磨劑粒子濾餅進行粉碎處理30,將研磨劑粒子充分粉碎、解開,得到分散性良好的再生研磨劑粒子32。此外,較佳係在粉碎後設置分級步驟,通過旋風分離器等的風力分級機等適當的分級機除去微細粒子、粗大粒子等。By subjecting the dried abrasive particle cake to the pulverization treatment 30, the abrasive particles are sufficiently pulverized and unwound to obtain regenerated abrasive particles 32 having good dispersibility. Further, it is preferable to provide a classification step after the pulverization, and to remove fine particles, coarse particles, and the like by an appropriate classifier such as a wind classifier such as a cyclone.

例如,如後述實施例所示,採用流程1的方案(乾燥、粉碎步驟)製成的再生研磨劑32的組成為TREO(Total Rare Earth Oxide/總稀土氧化物)(=CeO2 +La2 O3 +Nd2 O3 +Pr6 O11 )93~95%,另外,上述各氧化物相對於TREO的質量比率大約為CeO2 60%、La2 O3 33%、Nd2 O3 1%、Pr6 O11 6%。此外,含有其他氟成分(F)5~6%、Si成分0.1%、Al成分0.03%以下、Fe成分0.1~0.2%等。For example, as shown in the later-described embodiment, the composition of the regenerated abrasive 32 produced by the scheme of the scheme 1 (drying, pulverizing step) is TREO (Total Rare Earth Oxide) (=CeO 2 +La 2 O 3 +Nd 2 O 3 +Pr 6 O 11 ) 93 to 95%, and the mass ratio of each of the above oxides to TREO is approximately CeO 2 60%, La 2 O 3 33%, Nd 2 O 3 1%, Pr 6 O 11 6%. Further, it contains 5 to 6% of other fluorine components (F), 0.1% of Si component, 0.03% or less of Al component, and 0.1 to 0.2% of Fe component.

另一方面,如後述實施例所示,未使用的研磨劑粒子的組成為TREO(Total Rare Earth Oxide/總稀土氧化物)(=CeO2 +La2 O3 +Nd2 O3 +Pr6 O11 )(下面的實施例中也相同)95%(上述各氧化物相對於TREO的質量比率大約為CeO2 61%、La2 O3 33%、Nd2 O3 0.5%、Pr6 O11 6%),其他氟成分(F)為5%、Si成分為0.04%、Al成分為0.03%以下、Fe成分為0.14%左右。On the other hand, as shown in the examples below, the composition of the unused abrasive particles is TREO (Total Rare Earth Oxide) (=CeO 2 +La 2 O 3 +Nd 2 O 3 +Pr 6 O 11 ) ( 95% in the following examples) (the mass ratio of each of the above oxides to TREO is approximately CeO 2 61%, La 2 O 3 33%, Nd 2 O 3 0.5%, Pr 6 O 11 6%), The other fluorine component (F) is 5%, the Si component is 0.04%, the Al component is 0.03% or less, and the Fe component is about 0.14%.

藉由流程1處理而得到的再生研磨劑32與未使用的研磨劑相比,幾乎未發現CeO2 等相對於TREO的成分比和雜質的含量差異。以研磨速度進行比較時,如後述的實施例所示,恢復到未使用品的84~87%左右。The regenerated abrasive 32 obtained by the process 1 was found to have almost no difference in the composition ratio of CeO 2 or the like to TREO and the content of impurities as compared with the unused abrasive. When the comparison is made at the polishing rate, it is restored to about 84 to 87% of the unused product as shown in the examples described later.

但是,例如在後述的實施例中,其比表面積(10.92m2 /g)、微晶粒徑(169)的物性與未使用品的值(3.82m2 /g、202)相比,比表面積增大,而微晶粒徑大幅降低,由這樣的事實,可認為:在流程1的只進行乾燥、粉碎步驟的方案中,因研磨劑粒子本身的微細化而導致的劣化並沒有因該再生步驟而完全恢復。However, for example, in the examples described later, the specific surface area (10.92 m 2 /g) and the crystallite size (169) Physical and unproductive values (3.82m 2 /g, 202) Compared with the fact that the specific surface area is increased and the crystallite size is greatly reduced, it is considered that, in the scheme of only performing the drying and pulverizing steps of the first step, the polishing particles themselves are refined. The deterioration did not completely recover due to the regeneration step.

(4)流程2的方案(乾燥、煅燒、粉碎步驟)(4) Scheme of Process 2 (drying, calcination, pulverization step)

流程2的方案是接在流程1的乾燥步驟28後進行煅燒步驟29。藉由實施該煅燒步驟,如後述的實施例所述,應該特別提到的是:藉由該再生步驟,其比表面積(3.45m2 /g)、微晶粒徑(198)所顯示的劣化的物性幾乎完全恢復。The solution of Scheme 2 is followed by a calcination step 29 following the drying step 28 of Scheme 1. By carrying out the calcination step, as described in the examples to be described later, it should be particularly mentioned that the specific surface area (3.45 m 2 /g) and the crystallite size (198) by the regeneration step. The deteriorated physical properties shown are almost completely recovered.

煅燒環境溫度較佳為600~1200℃,特佳為700~1100℃。較佳係適當地調節煅燒時間,以使在煅燒溫度範圍內得到期望的結晶粒徑。The calcination environment temperature is preferably 600 to 1200 ° C, and particularly preferably 700 to 1100 ° C. It is preferred to appropriately adjust the calcination time so as to obtain a desired crystal grain size in the calcination temperature range.

作為用於實施煅燒的煅燒裝置,沒有特別限定,可以使用電爐、氣體加熱爐、旋轉爐(連續旋轉爐)、紅外線加熱爐、隧道爐、流動層爐等任意的裝置。The calcination apparatus for performing calcination is not particularly limited, and any apparatus such as an electric furnace, a gas heating furnace, a rotary furnace (continuous rotary furnace), an infrared heating furnace, a tunnel furnace, or a fluidized bed furnace can be used.

另外,較佳係在煅燒後將煅燒物粉碎,並在粉碎後設置分級步驟,通過旋風分離器等的風力分級機等適當的分級機除去微細粒子、粗大粒子等,在這點上與流程1相同。Further, it is preferable to pulverize the calcined product after calcination, and to provide a classification step after the pulverization, and to remove fine particles, coarse particles, and the like by a suitable classifier such as a cyclone or a wind classifier, and at this point, and the flow 1 the same.

(實施例)(Example)

以下,利用實施例說明本發明。但這些只是實施態樣的一個例子,本發明的技術範圍並不受這些的任何限定。另外,只要沒有特別說明,%係指質量%。Hereinafter, the present invention will be described by way of examples. However, these are only one example of the embodiment, and the technical scope of the present invention is not limited to these. In addition, unless otherwise indicated, % means mass%.

[實施例1](採用流程1的再生處理)[Example 1] (Regeneration treatment using Flow 1) (1)(使用過的研磨劑A)(1) (Used abrasive A)

(i)作為在再生試驗中使用的使用過的研磨劑A,係使用除去了玻璃屑和研磨墊的纖維屑等雜物,並且將研磨劑漿料過濾的濕濾餅(含水率21.7質量%)。使用過的研磨劑A在乾燥狀態(dry base)下的成分組成為TREO(Total Rare Earth Oxide/總稀土氧化物)(=CeO2 +La2 O3 +Nd2 O3 +Pr6 O11 )(以下的實施例中也相同)93.8%(另外,上述各氧化物相對於TREO的質量比率為CeO2 60.3%、La2 O3 33.3%、Nd2 O3 0.9%、Pr6 O11 5.7%),其他氟成分(F)為6.1%、Si成分為0.66%、Al成分為0.33%、Fe成分為0.33%。(i) As the used abrasive A used in the regeneration test, a wet cake having a particle size such as lint removed from the glass cullet and the polishing pad and filtering the abrasive slurry (water content: 21.7% by mass) was used. ). The composition of the used abrasive A in the dry base is TREO (Total Rare Earth Oxide) (=CeO 2 +La 2 O 3 +Nd 2 O 3 +Pr 6 O 11 ) (below In the examples, the same was 93.8% (in addition, the mass ratio of each of the above oxides to TREO was 60.3% of CeO 2 , 33.3% of La 2 O 3 , 0.9% of Nd 2 O 3 , and 5.7% of Pr 6 O 11 ), and the like. The fluorine component (F) was 6.1%, the Si component was 0.66%, the Al component was 0.33%, and the Fe component was 0.33%.

(ii)該使用過的研磨劑A的平均粒徑(D50)为1.088 μm(以雷射散射測定装置(日機裝公司製造,商品名:Microtrac,9320-X100型),用雷射散射法測定。以下同)。另外,最小粒徑Dmin為0.375 μm,最大粒徑Dmax為6.541 μm,在其累計粒度分佈中,對於從小粒徑起10%、90%的粒徑,D10為0.592 μm,D90為2.364 μm。(ii) The average particle diameter (D50) of the used abrasive A was 1.088 μm (by laser scattering measuring apparatus (manufactured by Nikkiso Co., Ltd., trade name: Microtrac, model 9320-X100), using laser scattering method Determination. The same as below). Further, the minimum particle diameter Dmin was 0.375 μm, and the maximum particle diameter Dmax was 6.541 μm. In the cumulative particle size distribution, D10 was 0.592 μm and D90 was 2.364 μm for the particle diameter of 10% and 90% from the small particle diameter.

(iii)該研磨劑A的粒子的其他物性如下。(iii) Other physical properties of the particles of the abrasive A are as follows.

a)採用BET法測定的比表面積(採用島津製作所製造的裝置名Micro Meritics Flow SorbII 2300測定。以下同)為11.34m2 /g。a) The specific surface area measured by the BET method (measured by a device name manufactured by Shimadzu Corporation, Micro Meritics Flow Sorb II 2300. The same applies hereinafter) was 11.34 m 2 /g.

b)微晶粒徑(採用粉末X射線衍射裝置(Rigaku公司製造,CuK α射線,Rint-2000型),用Scherrer法測定。以下同)為166b) crystallite size (measured by a powder X-ray diffractometer (manufactured by Rigaku Co., Ltd., CuK α ray, Rint-2000 type), measured by the Scherrer method. The following is the same) .

將以上的使用過的研磨劑A的物性歸納示於表1~4中。另外,對於未使用的新品研磨劑的物性也合併示於表1~4中。另外,表1是研磨劑的組成(質量%),表2是研磨劑的粒度(μm),表3是研磨劑的比表面積(m2 /g),表4是研磨劑的晶體粒徑()。The physical properties of the above used abrasive A are summarized in Tables 1 to 4. In addition, the physical properties of the unused new abrasives are also shown in Tables 1 to 4. In addition, Table 1 is the composition (% by mass) of the abrasive, Table 2 is the particle size (μm) of the abrasive, Table 3 is the specific surface area (m 2 /g) of the abrasive, and Table 4 is the crystal grain size of the abrasive ( ).

(2)(使用過的研磨劑A的再生處理)(2) (Recycling treatment of used abrasive A)

(i)在聚乙烯製造的燒杯中稱取2kg脫水濾餅狀的使用過的研磨劑A,加入3L水使漿料濃度約為30%,進行攪拌,得到再分散漿料。(第一步驟,漿料化步驟)(i) 2 kg of the used abrasive A in the form of a dewatered cake was weighed in a beaker made of polyethylene, and 3 L of water was added to make the slurry concentration about 30%, and the mixture was stirred to obtain a redispersed slurry. (first step, slurrying step)

(ii)將該再分散漿料如下進行酸處理。即,慢慢加入35%的鹽酸35mL(相對於濾餅中含有的Al、Fe成分為1.3當量),在室溫下攪拌2小時,進行鹽酸的酸處理。(ii) The redispersed slurry was subjected to an acid treatment as follows. Specifically, 35 mL of 35% hydrochloric acid (1.3 equivalents to the Al and Fe components contained in the filter cake) was gradually added, and the mixture was stirred at room temperature for 2 hours to carry out an acid treatment of hydrochloric acid.

再於該漿料中慢慢加入46%的氫氟酸58g(相對於濾餅中含有的Si成分為1.3當量),加溫到50℃,攪拌5小時,進行氫氟酸的酸處理。(第二步驟,酸處理步驟)Further, 58 g of 46% hydrofluoric acid (1.3 equivalents to the Si component contained in the filter cake) was gradually added to the slurry, and the mixture was heated to 50 ° C and stirred for 5 hours to carry out acid treatment of hydrofluoric acid. (second step, acid treatment step)

(iii)將經酸處理的漿料如下進行固液分離。即,將該漿料靜置1小時,使研磨劑粒子沉降,然後傾出上清液,再於得到的沉澱中加入3L水,進行再壓濾,充分攪拌,再靜置1小時,使研磨劑粒子沉降後,傾出上清液,得到沉澱。(iii) The acid-treated slurry was subjected to solid-liquid separation as follows. That is, the slurry was allowed to stand for 1 hour to precipitate the abrasive particles, and then the supernatant was decanted, and 3 L of water was added to the obtained precipitate, followed by further pressure filtration, and the mixture was thoroughly stirred and allowed to stand for 1 hour to be ground. After the agent particles settled, the supernatant was decanted to obtain a precipitate.

將此操作(沉澱再壓濾-沉降分離操作)重複進行3次,再對該研磨劑粒子沉澱充分地進行水洗處理,使鹽酸、氫氟酸、溶解的玻璃成分不致殘留。最後使用ADVANTEC公司No.5A濾紙進行抽濾,回收經水洗的研磨劑粒子沉澱。(第三步驟,固液分離步驟)This operation (precipitation re-filtration-sedimentation separation operation) was repeated three times, and the abrasive particle precipitation was sufficiently washed with water to prevent hydrochloric acid, hydrofluoric acid, and dissolved glass components from remaining. Finally, suction filtration was performed using ADVANTEC No. 5A filter paper, and the precipitate of the washed abrasive particles was recovered. (third step, solid-liquid separation step)

(iv)用箱型乾燥機將回收的研磨劑粒子沉澱(濾餅)在110℃下乾燥12小時。用粉碎機將該乾燥的濾餅粉碎後,用風力分級機進行分級,回收1.33kg再生研磨劑A’。(第四步驟,乾燥、粉碎步驟)(iv) The recovered abrasive particles were precipitated (filter cake) in a box dryer and dried at 110 ° C for 12 hours. The dried filter cake was pulverized by a pulverizer, and classified by an air classifier to recover 1.33 kg of regenerated abrasive A'. (fourth step, drying, pulverizing step)

(3)(再生研磨劑A’的物性)(3) (physical properties of regenerated abrasive A')

(i)再生研磨劑A’的成分組成為TREO(=CeO2 +La2 O3 +Nd2 O3 +Pr6 O11 )94.8質量%(另外,上述各氧化物相對於TREO的質量比率為CeO2 59.4%、La2 O3 33.5%、Nd2 O3 0.9%、Pr6 O11 5.9%),其他氟成分(F)為6.0%、Si成分為0.09%、Al成分為0.03%以下、Fe成分為0.09%。(i) The composition of the regenerated abrasive A' is TREO (=CeO 2 +La 2 O 3 +Nd 2 O 3 +Pr 6 O 11 ),94.8 mass% (in addition, the mass ratio of each of the above oxides to TREO is CeO 2 59.4 %, La 2 O 3 33.5%, Nd 2 O 3 0.9%, Pr 6 O 11 5.9%), other fluorine component (F) is 6.0%, Si component is 0.09%, Al component is 0.03% or less, and Fe component is 0.09%.

(ii)再生研磨劑A’的平均粒徑(D50)為1.046 μm。另外,最小粒徑Dmin為0.375 μm,最大粒徑Dmax為5.5 μm,在其累積粒度分佈中,對於從小粒徑起10%、90%的粒徑,D10為0.582 μm,D90為2.098 μm。(ii) The average particle diameter (D50) of the regenerated abrasive A' was 1.046 μm. Further, the minimum particle diameter Dmin was 0.375 μm, and the maximum particle diameter Dmax was 5.5 μm. In the cumulative particle size distribution, D10 was 0.582 μm and D90 was 2.098 μm for the particle diameter of 10% and 90% from the small particle diameter.

(iii)該研磨劑A’的粒子的其他物性如下。(iii) Other physical properties of the particles of the abrasive A' are as follows.

a)採用BET法測定的比表面積為10.92m2 /g。a) The specific surface area measured by the BET method was 10.92 m 2 /g.

b)晶體粒徑為169b) crystal grain size is 169 .

將以上的再生研磨劑A’的物性歸納示於表1~4中。The physical properties of the above regenerated abrasive A' are summarized in Tables 1 to 4.

(4)(採用再生研磨劑A’的研磨試驗)(4) (grinding test using regenerated abrasive A')

(i)研磨試驗機使用浜井產業公司製造的兩面研磨機6BF型。試驗中使用的被研磨玻璃板使用旭硝子公司製造的無鹼玻璃(商品名:AN-100,玻璃組成中的SiO2 含量約60質量%,試驗板尺寸(正方形):100mm/100mm/0.7mm)。(i) The grinding tester used a double-faced grinder 6BF type manufactured by Sakai Industry Co., Ltd. The ground glass used in the test used an alkali-free glass manufactured by Asahi Glass Co., Ltd. (trade name: AN-100, SiO 2 content in the glass composition was about 60% by mass, and test plate size (square): 100 mm/100 mm/0.7 mm) .

(ii)研磨墊使用發泡聚胺基甲酸酯製造的不織布型,研磨壓力為130g/cm2 ,以底盤轉速60rpm實施兩面研磨試驗。(ii) The polishing pad was made of a non-woven fabric made of foamed polyurethane, and the polishing pressure was 130 g/cm 2 , and the double-side polishing test was carried out at a chassis rotation speed of 60 rpm.

(iii)研磨劑漿料中研磨劑濃度為15質量%(其餘為水),以供給量1.8L/min邊循環邊使用。(iii) The concentration of the abrasive in the abrasive slurry was 15% by mass (the rest was water), and it was used while circulating at a supply amount of 1.8 L/min.

(iv)研磨時間為每1批次45分鐘,進行6批次研磨,由被研磨玻璃板的質量差算出削磨量。將未使用的研磨劑(新品研磨劑)A0 的削磨量作為100時的該削磨量的相對值為87。結果示於表5中。(iv) The polishing time was 45 minutes per batch, and 6 batches of polishing were performed, and the amount of grinding was calculated from the difference in mass of the glass plate to be polished. When the amount of grinding of the unused abrasive (new abrasive) A 0 was taken as 100, the relative value of the amount of grinding was 87. The results are shown in Table 5.

(5)(結果的探討)(5) (Exploration of results)

(i)在採用流程1的含有步驟(乾燥、粉碎)的再生處理步驟的實施例1中,對於再生研磨劑A’,與未使用的新品研磨劑A0 相比,雖然成分組成、粒度幾乎未確認到差異,但其比表面積(10.92m2 /g)、微晶粒徑(169)的物性與A0 的值(3.82m2 /g、202)相比,比表面積增大,另外微晶粒徑大幅降低,由這樣的事實,可認為:研磨劑粒子A’並沒有因該流程1的步驟而使使用過的研磨劑的劣化完全恢復。(i) In Example 1 in which the regeneration treatment step including the step (drying and pulverization) of the scheme 1 was employed, the regenerated abrasive A' was almost the same as the composition and particle size of the unused new abrasive A0 . No difference was confirmed, but its specific surface area (10.92 m 2 /g), crystallite size (169 The physical property and the value of A 0 (3.82m 2 /g, 202) In comparison with the fact that the specific surface area is increased and the crystallite size is largely lowered, it is considered that the abrasive particles A' do not completely recover the deterioration of the used abrasive due to the procedure of the first step.

(ii)如表5所示,採用A’時的削磨量的相對值87相對於未使用的新品研磨劑A0 100,是低約10%的結果。但是,具有該相對值87的再生研磨劑A’可以充分作為研磨劑使用。(ii) As shown in Table 5, the relative value 87 of the amount of grinding when A' was used was a result of about 10% lower than that of the unused new abrasive A 0 100. However, the regenerated abrasive A' having the relative value of 87 can be sufficiently used as an abrasive.

[實施例2](採用流程2的再生處理)[Example 2] (Regeneration treatment using Flow 2) (1)(使用過的研磨劑A)(1) (Used abrasive A)

再生試驗中使用的使用過的研磨劑A使用與實施例1中同樣的研磨劑。The same abrasive as used in Example 1 was used for the used abrasive A used in the regeneration test.

(2)(使用過的研磨劑A的再生處理)(2) (Recycling treatment of used abrasive A)

(i)在聚乙烯製造的燒杯中稱取2kg脫水濾餅狀的使用過的研磨劑A,加入3L水使漿料濃度約為30%,進行攪拌,得到再分散漿料。(第一步驟,漿料化步驟)(i) 2 kg of the used abrasive A in the form of a dewatered cake was weighed in a beaker made of polyethylene, and 3 L of water was added to make the slurry concentration about 30%, and the mixture was stirred to obtain a redispersed slurry. (first step, slurrying step)

(ii)將該再分散漿料如下進行酸處理。即,慢慢加入35%的鹽酸35mL(相對於濾餅中含有的Al、Fe成分為1.3當量),在室溫下攪拌2小時,進行鹽酸的酸處理。(ii) The redispersed slurry was subjected to an acid treatment as follows. Specifically, 35 mL of 35% hydrochloric acid (1.3 equivalents to the Al and Fe components contained in the filter cake) was gradually added, and the mixture was stirred at room temperature for 2 hours to carry out an acid treatment of hydrochloric acid.

再於該漿料中慢慢加入46%的氫氟酸58g(相對於濾餅中含有的Si成分為1.3當量),加溫到50℃,攪拌5小時,進行氫氟酸的酸處理。(第二步驟,酸處理步驟)Further, 58 g of 46% hydrofluoric acid (1.3 equivalents to the Si component contained in the filter cake) was gradually added to the slurry, and the mixture was heated to 50 ° C and stirred for 5 hours to carry out acid treatment of hydrofluoric acid. (second step, acid treatment step)

(iii)將酸處理的漿料如下進行固液分離。即,將該漿料靜置1小時,使研磨劑粒子沉降,然後傾出上清液,再於得到的沉澱中加入3L水,進行再壓濾,充分攪拌,再靜置1小時,使研磨劑粒子沉降後,傾出上清液,得到沉澱。(iii) The acid-treated slurry was subjected to solid-liquid separation as follows. That is, the slurry was allowed to stand for 1 hour to precipitate the abrasive particles, and then the supernatant was decanted, and 3 L of water was added to the obtained precipitate, followed by further pressure filtration, and the mixture was thoroughly stirred and allowed to stand for 1 hour to be ground. After the agent particles settled, the supernatant was decanted to obtain a precipitate.

將此操作(沉澱再壓濾-沉降分離操作)重複進行3次,再對該研磨劑粒子沉澱充分地進行水洗處理,使鹽酸、氫氟酸、溶解的玻璃成分不致殘留。最後使用ADVANTEC公司No.5A濾紙進行抽濾,回收經水洗的研磨劑粒子沉澱。(第三步驟,固液分離步驟)This operation (precipitation re-filtration-sedimentation separation operation) was repeated three times, and the abrasive particle precipitation was sufficiently washed with water to prevent hydrochloric acid, hydrofluoric acid, and dissolved glass components from remaining. Finally, suction filtration was performed using ADVANTEC No. 5A filter paper, and the precipitate of the washed abrasive particles was recovered. (third step, solid-liquid separation step)

(iv)用箱型乾燥機將回收的研磨劑粒子沉澱(濾餅)在110℃下乾燥12小時。(第四步驟,乾燥步驟)(iv) The recovered abrasive particles were precipitated (filter cake) in a box dryer and dried at 110 ° C for 12 hours. (fourth step, drying step)

(v)用電煅燒爐在950℃下將該乾燥濾餅煅燒3小時。用粉碎機將煅燒濾餅粉碎後,用風力分級機進行分級,回收1.07kg再生研磨劑A”。(第五步驟,煅燒、粉碎步驟)(v) The dried filter cake was calcined at 950 ° C for 3 hours in an electric calciner. The calcined cake was pulverized by a pulverizer, and classified by an air classifier to recover 1.07 kg of regenerated abrasive A" (fifth step, calcination, pulverization step)

(3)(再生研磨劑A”的物性)(3) (physical properties of regenerated abrasive A)

(i)再生研磨劑A”的成分組成為TREO(=CeO2 +La2 O3 +Nd2 O3 +Pr6 O11 )94.7質量%(另外,上述各氧化物相對於TREO的質量比率為CeO2 59.7%、La2 O3 33.2%、Nd2 O3 0.9%、Pr6 O11 5.8%),其他氟成分(F)為6.0%、Si成分為0.07%、Al成分為0.03%以下、Fe成分為0.15%。(i) The composition of the regenerated abrasive A" is TREO (=CeO 2 +La 2 O 3 +Nd 2 O 3 +Pr 6 O 11 ) 94.7 mass% (in addition, the mass ratio of each of the above oxides to TREO is CeO 2 59.7 %, La 2 O 3 33.2%, Nd 2 O 3 0.9%, Pr 6 O 11 5.8%), other fluorine component (F) was 6.0%, Si component was 0.07%, Al component was 0.03% or less, and Fe component was 0.15%.

(ii)再生研磨劑A”的平均粒徑(D50)為1.074 μm。另外,最小粒徑Dmin為0.375 μm,最大粒徑Dmax為4.625 μm,在其累積粒度分佈中,對於從小粒徑起10%、90%的粒徑,D10為0.582 μm,D90為2.127 μm。(ii) The average particle diameter (D50) of the regenerated abrasive A" is 1.074 μm. In addition, the minimum particle diameter Dmin is 0.375 μm, the maximum particle diameter Dmax is 4.625 μm, and in the cumulative particle size distribution, 10 from the small particle diameter %, 90% particle size, D10 is 0.582 μm, and D90 is 2.127 μm.

(iii)該研磨劑A”的粒子的其他物性如下。(iii) Other physical properties of the particles of the abrasive A" are as follows.

a)採用BET法測定的比表面積為3.45m2 /g。a) The specific surface area measured by the BET method was 3.45 m 2 /g.

b)微晶粒徑為198b) The crystallite size is 198 .

將以上的再生研磨劑A”的物性歸納示於表1~4中。The physical properties of the above regenerated abrasive A" are summarized in Tables 1 to 4.

(4)(採用再生研磨劑A”的研磨試驗)(4) (grinding test using regenerated abrasive A)

(i)研磨試驗使用與實施例1同樣的研磨試驗機,與實施例1同樣地進行。(i) Polishing Test The same procedure as in Example 1 was carried out using the same polishing tester as in Example 1.

(ii)與實施例1同樣地,由被研磨玻璃板的質量差算出削磨量。將未使用的研磨劑(新品研磨劑)A0 的削磨量作為100時的該削磨量的相對值為98。結果示於表5中。(ii) In the same manner as in the first embodiment, the amount of grinding was calculated from the difference in mass of the glass plate to be polished. When the amount of grinding of the unused abrasive (new abrasive) A 0 was taken as 100, the relative value of the amount of the grinding was 98. The results are shown in Table 5.

(5)(結果的探討)(5) (Exploration of results)

(i)在採用流程2的含有煅燒、粉碎步驟的再生處理步驟的實施例2中,對於再生研磨劑A”,與未使用的新品研磨劑A0 相比,不僅幾乎未確認到成分組成、粒度的差異,而且其比表面積(3.45m2 /g)、微晶粒徑(198)的物性與A0 的值(3.82m2 /g、202)相比,也確認了實質上幾乎恢復的事實。可認為:研磨劑粒子A”通過該再生步驟而使使用過的研磨劑的劣化完全恢復。(i) In the second embodiment in which the regeneration treatment step including the calcination and pulverization step of the second step is employed, the regenerated abrasive A" has almost no component composition and particle size as compared with the unused new abrasive A0 . Difference, and its specific surface area (3.45m 2 /g), crystallite size (198 The physical property and the value of A 0 (3.82m 2 /g, 202) In comparison, the fact that it is almost restored is also confirmed. It is considered that the abrasive particles A" completely recover the deterioration of the used abrasive by the regeneration step.

(ii)如表5所示,採用A”時的削磨量的相對值為98(相對於未使用的新品研磨劑A0 100的值),即使與新品研磨劑A0 相比,也是毫不遜色的削磨量。即,可判斷:採用實施例2的再生研磨劑A”可以作為與新品同樣的研磨劑再次使用。(ii) As shown in Table 5, the relative value of the amount of grinding when using A" is 98 (relative to the value of the unused new abrasive A 0 100), even if compared with the new abrasive A 0 In other words, it can be judged that the regenerated abrasive A" of the second embodiment can be used again as the same abrasive as the new one.

[實施例3](採用流程1的再生處理)[Example 3] (Regeneration treatment using Flow 1) (1)(使用過的研磨劑B)(1) (Used abrasive B)

(i)作為在再生試驗中使用的使用過的研磨劑B,使用除去了玻璃屑和研磨墊的纖維屑等雜物,並且將研磨劑漿料過濾的濕濾餅(含水率47.5質量%)。使用過的研磨劑B在乾燥狀態下的成分組成為TREO(=CeO2 +La2 O3 +Nd2 O3 +Pr6 O11 )81.5%(另外,上述各氧化物相對於TREO的質量比率為CeO2 60.9%、La2 O3 33.0%、Nd2 O3 1.0%、Pr6 O11 6.0%),此外,氟成分(F)為5.2%、Si成分為2.70%、Al成分為0.90%、Fe成分為6.88%。(i) As the used abrasive B used in the regeneration test, a wet cake (water content: 47.5 mass%) using a waste material such as lint from the glass cullet and the polishing pad and filtering the abrasive slurry was used. . The composition of the used abrasive B in the dry state is 81.5% of TREO (=CeO 2 +La 2 O 3 +Nd 2 O 3 +Pr 6 O 11 ) (in addition, the mass ratio of each of the above oxides to TREO is CeO 2 60.9%, La 2 O 3 33.0%, Nd 2 O 3 1.0%, and Pr 6 O 11 6.0%), and the fluorine component (F) was 5.2%, the Si component was 2.70%, and the Al component was 0.90%. It is 6.88%.

(ii)該使用過的研磨劑B的平均粒徑(D50)為2.768 μm。另外,最小粒徑Dmin為0.375 μm,最大粒徑Dmax為26.11 μm,在其累計粒度分佈中,對於從小粒徑起10%、90%的粒徑,D10為0.762 μm,D90為8.098 μm。(ii) The used abrasive B had an average particle diameter (D50) of 2.768 μm. Further, the minimum particle diameter Dmin was 0.375 μm, and the maximum particle diameter Dmax was 26.11 μm. In the cumulative particle size distribution, D10 was 0.762 μm and D90 was 8.098 μm for the particle diameter of 10% and 90% from the small particle diameter.

(iii)該研磨劑B的粒子的其他物性如下。(iii) Other physical properties of the particles of the abrasive B are as follows.

a)採用BET法測定的比表面積為18.7m2 /g。a) The specific surface area measured by the BET method was 18.7 m 2 /g.

b)晶體粒徑為167b) crystal size is 167 .

將以上的使用過的研磨劑B的物性歸納示於表6~9中。另外,對於未使用的新品研磨劑B0 的物性也合併示於表6~9中。The physical properties of the above used abrasive B are summarized in Tables 6 to 9. In addition, the physical properties of the unused new abrasive B 0 are also shown in Tables 6 to 9.

(2)(使用過的研磨劑B的再生處理)(2) (Recycling treatment of used abrasive B)

(i)在聚乙烯製造的燒杯中稱取3kg脫水濾餅狀的使用過的研磨劑B,加入3L水使漿料濃度約為30%,進行攪拌,得到再分散漿料。(第一步驟,漿料化步驟)(i) 3 kg of the used abrasive B in the form of a dehydrated cake was weighed in a beaker made of polyethylene, and 3 L of water was added to make the slurry concentration about 30%, and the mixture was stirred to obtain a redispersed slurry. (first step, slurrying step)

(ii)將該再分散漿料如下進行酸處理。即,慢慢加入35%的鹽酸570mL(相對於濾餅中含有的Al、Fe成分為1.3當量),在室溫下攪拌2小時,進行鹽酸的酸處理。(ii) The redispersed slurry was subjected to an acid treatment as follows. Specifically, 570 mL of 35% hydrochloric acid (1.3 equivalents to the Al and Fe components contained in the filter cake) was gradually added, and the mixture was stirred at room temperature for 2 hours to carry out an acid treatment of hydrochloric acid.

再向該漿料中慢慢加入46%的氫氟酸240g(相對於濾餅中含有的Si成分為1.3當量),加溫到50℃,攪拌5小時,進行氫氟酸的酸處理。(第二步驟,酸處理步驟)Further, 240 g of 46% hydrofluoric acid (1.3 equivalents to the Si component contained in the filter cake) was gradually added to the slurry, and the mixture was heated to 50 ° C and stirred for 5 hours to carry out acid treatment of hydrofluoric acid. (second step, acid treatment step)

(iii)將酸處理的漿料如下進行固液分離。即,將該漿料靜置1小時,使研磨劑粒子沉降,然後傾出上清液,再於得到的沉澱中加入3L水,進行再壓濾,充分攪拌,再靜置1小時,使研磨劑粒子沉降後,傾出上清液,得到沉澱。(iii) The acid-treated slurry was subjected to solid-liquid separation as follows. That is, the slurry was allowed to stand for 1 hour to precipitate the abrasive particles, and then the supernatant was decanted, and 3 L of water was added to the obtained precipitate, followed by further pressure filtration, and the mixture was thoroughly stirred and allowed to stand for 1 hour to be ground. After the agent particles settled, the supernatant was decanted to obtain a precipitate.

將此操作(沉澱再壓濾-沉降分離操作)重複進行3次,再對該研磨劑粒子沉澱充分地進行水洗處理,使鹽酸、氫氟酸、溶解的玻璃成分不致殘留。最後使用ADVANTEC公司No.5A濾紙進行抽濾,回收經水洗的研磨劑粒子沉澱。(第三步驟,固液分離步驟)This operation (precipitation re-filtration-sedimentation separation operation) was repeated three times, and the abrasive particle precipitation was sufficiently washed with water to prevent hydrochloric acid, hydrofluoric acid, and dissolved glass components from remaining. Finally, suction filtration was performed using ADVANTEC No. 5A filter paper, and the precipitate of the washed abrasive particles was recovered. (third step, solid-liquid separation step)

重複操作上述的第二步驟和第三步驟。The second and third steps described above are repeated.

(iv)用箱型乾燥機將回收的研磨劑粒子沉澱(濾餅)在110℃下乾燥12小時。用粉碎機將該乾燥濾餅粉碎後,用風力分級機進行分級,回收1.16kg再生研磨劑B’。(第四步驟,乾燥、粉碎步驟)(iv) The recovered abrasive particles were precipitated (filter cake) in a box dryer and dried at 110 ° C for 12 hours. The dried cake was pulverized by a pulverizer, and classified by an air classifier to recover 1.16 kg of regenerated abrasive B'. (fourth step, drying, pulverizing step)

(3)(再生研磨劑B’的物性)(3) (physical properties of regenerated abrasive B')

(i)再生的研磨劑B’的成分組成為TREO(=CeO2 +La2 O3 +Nd2 O3 +Pr6 O11 )93.7質量%(另外,上述各氧化物相對於TREO的質量比率為CeO2 60.5%、La2 O3 32.1%、Nd2 O3 1.0%、Pr6 O11 6.2%),其他氟成分(F)為5.2%、Si成分為0.10%、Al成分為0.03%以下、Fe成分為0.17%。(i) The composition of the regenerated abrasive B' is TREO (=CeO 2 +La 2 O 3 +Nd 2 O 3 +Pr 6 O 11 ),93.7 mass% (in addition, the mass ratio of each of the above oxides to TREO is CeO 2 60.5%, La 2 O 3 32.1%, Nd 2 O 3 1.0%, Pr 6 O 11 6.2%), other fluorine component (F) is 5.2%, Si component is 0.10%, Al component is 0.03% or less, and Fe component It is 0.17%.

(ii)再生的研磨劑B’的平均粒徑(D50)為1.077 μm。另外,最小粒徑Dmin為0.375 μm,最大粒徑Dmax為5.5 μm,在其累積粒度分佈中,對於從小粒徑起10%、90%的粒徑,D10為0.577 μm,D90為2.154 μm。(ii) The average particle diameter (D50) of the regenerated abrasive B' was 1.077 μm. Further, the minimum particle diameter Dmin was 0.375 μm, and the maximum particle diameter Dmax was 5.5 μm. In the cumulative particle size distribution, D10 was 0.577 μm and D90 was 2.154 μm for the particle diameter of 10% and 90% from the small particle diameter.

(iii)另外,該研磨劑B’的粒子的其他物性如下。(iii) Further, other physical properties of the particles of the abrasive B' are as follows.

a)採用BET法測定的比表面積為19.1m2 /g。a) The specific surface area measured by the BET method was 19.1 m 2 /g.

b)晶體粒徑為176b) crystal grain size is 176 .

將以上的再生研磨劑B’的物性歸納示於表6~9中。另外,對於未使用的新品研磨劑B0 的物性也合併示於表6~9中。另外,表6是研磨劑的組成(質量%)、表7是研磨劑的粒度(μm)、表8是研磨劑的比表面積(m2 /g)、表9是研磨劑的晶體粒徑()。The physical properties of the above regenerated abrasive B' are summarized in Tables 6 to 9. In addition, the physical properties of the unused new abrasive B 0 are also shown in Tables 6 to 9. In addition, Table 6 is the composition (% by mass) of the abrasive, Table 7 is the particle size (μm) of the abrasive, Table 8 is the specific surface area (m 2 /g) of the abrasive, and Table 9 is the crystal grain size of the abrasive ( ).

(註)表示採用Rigaku公司製造的裝置名:粉末X射線衍射裝置Rint-2000型,由Scherrer法測定的微晶粒徑()。 (Note) indicates the name of the device manufactured by Rigaku Co., Ltd.: powder X-ray diffractometer Rint-2000 type, crystallite size determined by the Scherrer method ( ).

(4)(採用再生研磨劑B’的研磨試驗)(4) (grinding test using regenerated abrasive B')

(i)研磨試驗使用與實施例1同樣的研磨試驗機,與實施例1同樣地進行。(i) Polishing Test The same procedure as in Example 1 was carried out using the same polishing tester as in Example 1.

(ii)與實施例1同樣地,由被研磨玻璃板的質量差算出削磨量。將未使用的研磨劑(新品研磨劑)的削磨量作為100時的該削磨量的相對值為84。結果示於表10中。(ii) In the same manner as in the first embodiment, the amount of grinding was calculated from the difference in mass of the glass plate to be polished. The relative value of the amount of the grinding when the amount of grinding of the unused abrasive (new abrasive) was 100 was 84. The results are shown in Table 10.

(5)(結果的探討)(5) (Exploration of results)

(i)在採用流程1的含有步驟(乾燥、粉碎)的再生處理步驟的實施例3中,對於再生研磨劑B’,與未使用的新品研磨劑B0 相比,雖然成分組成、粒度幾乎未確認到差異,但其比表面積(19.1m2 /g)、微晶粒徑(176)的物性與B0 的值(3.82m2 /g、202)相比,比表面積增大,另外微晶粒徑大幅降低,由於這樣的事實,可認為:研磨劑粒子B’並沒有由於該再生步驟而使使用過的研磨劑的劣化完全恢復。(i) a step comprising using the procedure of Example (dried and pulverized) regeneration process of step 1 in 3, for the regeneration of the abrasive B ', compared to the new abrasive B 0 unused, although the chemical composition, particle size almost No difference was confirmed, but its specific surface area (19.1 m 2 /g), crystallite size (176 Physical property and value of B 0 (3.82m 2 /g, 202 In comparison with the fact that the specific surface area is increased and the crystallite size is largely lowered, it is considered that the abrasive particles B' do not completely recover the deterioration of the used abrasive due to the regeneration step.

(ii)如表10所示,採用B’時的削磨量的相對值84相對於未使用的新品研磨劑B0 100,是低約15%的結果。但是,可認為具有該相對值84的再生研磨劑B’可以充分作為研磨劑使用。另外,可認為使用過的研磨劑B與A相比,玻璃成分、凝集劑成分多,粒子的凝集強,再生更加困難,但按照本發明的再生方法,即使是採用流程1的方法,也確認了可以達到完全再生的目的。(ii) As shown in Table 10, the relative value 84 of the amount of grinding when B' was used was a result of about 15% lower than that of the unused new abrasive B 0 100. However, it is considered that the regenerated abrasive B' having the relative value of 84 can be sufficiently used as an abrasive. In addition, it is considered that the used polishing agent B has a larger glass component and agglomerating agent component than A, and the aggregation of the particles is strong, and regeneration is more difficult. However, the regeneration method according to the present invention is confirmed by the method of the first embodiment. It can achieve the purpose of complete regeneration.

[實施例4](採用流程2的再生處理)[Embodiment 4] (Regeneration processing using Flow 2) (1)(使用過的研磨劑B)(1) (Used abrasive B)

再生試驗中使用的使用過的研磨劑B使用與實施例3中同樣的研磨劑。The same abrasive as used in Example 3 was used for the used abrasive B used in the regeneration test.

(2)(使用過的研磨劑B的再生處理)(2) (Recycling treatment of used abrasive B)

(i)在聚乙烯製造的燒杯中稱取2kg脫水濾餅狀的使用過的研磨劑B,加入3L水使漿料濃度約為30%,進行攪拌,得到再分散漿料。(第一步驟,漿料化步驟)(i) 2 kg of the used abrasive B in the form of a dewatered cake was weighed in a beaker made of polyethylene, and 3 L of water was added to make the slurry concentration about 30%, and the mixture was stirred to obtain a redispersed slurry. (first step, slurrying step)

(ii)將該再分散漿料如下進行酸處理。即,慢慢加入35%的鹽酸570mL(相對於濾餅中含有的Al、Fe成分為1.3當量),在室溫下攪拌2小時,進行鹽酸的酸處理。(ii) The redispersed slurry was subjected to an acid treatment as follows. Specifically, 570 mL of 35% hydrochloric acid (1.3 equivalents to the Al and Fe components contained in the filter cake) was gradually added, and the mixture was stirred at room temperature for 2 hours to carry out an acid treatment of hydrochloric acid.

再於該漿料中慢慢加入46%的氫氟酸240g(相對於濾餅中含有的Si成分為1.3當量),加溫到50℃,攪拌5小時,進行氫氟酸的酸處理。(第二步驟,酸處理步驟)Further, 240 g of 46% hydrofluoric acid (1.3 equivalents to the Si component contained in the filter cake) was gradually added to the slurry, and the mixture was heated to 50 ° C and stirred for 5 hours to carry out acid treatment of hydrofluoric acid. (second step, acid treatment step)

(iii)將酸處理的漿料如下進行固液分離。即,將該漿料靜置1小時,使研磨劑粒子沉降,然後傾出上清液,再於得到的沉澱中加入3L水,進行再壓濾,充分攪拌,再靜置1小時,使研磨劑粒子沉降後,傾出上清液,得到沉澱。(iii) The acid-treated slurry was subjected to solid-liquid separation as follows. That is, the slurry was allowed to stand for 1 hour to precipitate the abrasive particles, and then the supernatant was decanted, and 3 L of water was added to the obtained precipitate, followed by further pressure filtration, and the mixture was thoroughly stirred and allowed to stand for 1 hour to be ground. After the agent particles settled, the supernatant was decanted to obtain a precipitate.

將此操作(沉澱再壓濾-沉降分離操作)重複進行3次,再對該研磨劑粒子沉澱充分地進行水洗處理,使鹽酸、氫氟酸、溶解的玻璃成分沒有殘留。最後使用ADVANTEC公司No.5A濾紙進行抽濾,回收經水洗的研磨劑粒子沉澱。(第三步驟,固液分離步驟)This operation (precipitation re-filtration-sedimentation separation operation) was repeated three times, and the abrasive particle precipitation was sufficiently washed with water to prevent hydrochloric acid, hydrofluoric acid, and dissolved glass components from remaining. Finally, suction filtration was performed using ADVANTEC No. 5A filter paper, and the precipitate of the washed abrasive particles was recovered. (third step, solid-liquid separation step)

(iv)用箱型乾燥機將回收的研磨劑粒子沉澱(濾餅)在110℃下乾燥12小時。(第四步驟,乾燥步驟)(iv) The recovered abrasive particles were precipitated (filter cake) in a box dryer and dried at 110 ° C for 12 hours. (fourth step, drying step)

(v)用電煅燒爐在950℃下將該乾燥濾餅煅燒3小時。用粉碎機將煅燒濾餅粉碎後,用風力分級機進行分級,回收0.94kg再生研磨劑B”。(第五步驟,煅燒、粉碎步驟)(v) The dried filter cake was calcined at 950 ° C for 3 hours in an electric calciner. The calcined cake was pulverized by a pulverizer, and classified by an air classifier to recover 0.94 kg of regenerated abrasive B" (fifth step, calcination, pulverization step)

(3)(再生研磨劑B”的物性)(3) (physical properties of regenerated abrasive B)

(i)再生的研磨劑B”的成分組成為TREO(=CeO2 +La2 O3 +Nd2 O3 +Pr6 O11 )94.5質量%(另外,上述各氧化物相對於TREO的質量比率為CeO2 60.2%、La2 O3 32.8%、Nd2 O3 0.9%、Pr6 O11 5.9%),其他氟成分(F)為5.1%、Si成分為0.09%、Al成分為0.03%以下、Fe成分為0.13%。(i) The composition of the regenerated abrasive B" is TREO (=CeO 2 +La 2 O 3 +Nd 2 O 3 +Pr 6 O 11 ) of 94.5 mass% (in addition, the mass ratio of each of the above oxides to TREO is CeO 2 60.2%, La 2 O 3 32.8%, Nd 2 O 3 0.9%, Pr 6 O 11 5.9%), other fluorine component (F) is 5.1%, Si component is 0.09%, Al component is 0.03% or less, and Fe component It is 0.13%.

(ii)再生的研磨劑B”的平均粒徑(D50)為1.010 μm。另外,最小粒徑Dmin為0.375 μm,最大粒徑Dmax為5.5 μm,在其累積粒度分佈中,對於從小粒徑起10%、90%的粒徑,D10為0.564 μm,D90為2.178 μm。(ii) The average particle diameter (D50) of the regenerated abrasive B" is 1.010 μm. Further, the minimum particle diameter Dmin is 0.375 μm, and the maximum particle diameter Dmax is 5.5 μm, in the cumulative particle size distribution, from the small particle diameter 10%, 90% particle size, D10 is 0.564 μm, and D90 is 2.178 μm.

(iii)該研磨劑B”的粒子的其他物性如下。(iii) Other physical properties of the particles of the abrasive B" are as follows.

a)採用BET法測定的比表面積為3.26m2 /g。a) The specific surface area measured by the BET method was 3.26 m 2 /g.

b)晶體粒徑為213b) crystal size is 213 .

將以上的再生研磨劑B”的物性歸納示於表6~9中。The physical properties of the above regenerated abrasive B" are summarized in Tables 6 to 9.

(4)(採用再生研磨劑B”的研磨試驗)(4) (grinding test using regenerated abrasive B)

(i)研磨試驗使用與實施例1同樣的研磨試驗機,與實施例1同樣地進行。(i) Polishing Test The same procedure as in Example 1 was carried out using the same polishing tester as in Example 1.

(ii)與實施例1同樣地,由被研磨玻璃板的質量差算出削磨量。將未使用的研磨劑(新品研磨劑)的削磨量作為100時的該削磨量的相對值為97。結果示於表10中。(ii) In the same manner as in the first embodiment, the amount of grinding was calculated from the difference in mass of the glass plate to be polished. The relative value of the amount of grinding of the unused abrasive (new abrasive) was 100, which was 97. The results are shown in Table 10.

(5)(結果的探討)(5) (Exploration of results)

(i)在採用流程2的含有煅燒、粉碎步驟的再生處理步驟的實施例4中,對於再生研磨劑B”,與未使用的新品研磨劑B0 相比,不僅幾乎未確認到成分組成、粒度的差異,而且其比表面積(3.26m2 /g)、微晶粒徑(213)的物性與B0 的值(3.82m2 /g、202)相比,也確認到幾乎恢復到相當於未使用的研磨劑的事實。可認為:研磨劑粒子B”通過該再生步驟而使使用過的研磨劑的劣化完全恢復。(i) a process comprising calcining using 2, Example 4 step regeneration process of the pulverization step, for the regeneration of the abrasive B ", compared with the new B 0 unused abrasive, not only hardly confirmed the chemical composition, particle size Difference, and its specific surface area (3.26m 2 /g), crystallite size (213 Physical property and value of B 0 (3.82m 2 /g, 202 In comparison, it was confirmed that the recovery was almost equivalent to the use of an unused abrasive. It is considered that the abrasive particles B" completely recover the deterioration of the used abrasive by the regeneration step.

(ii)如表10所示,採用B”時的削磨量的相對值為97(相對於未使用的新品研磨劑B0 100的值),即使與新品研磨劑B0 相比,也是毫不遜色的削磨量。即,可判斷:採用實施例4的再生研磨劑B”可以作為與新品同樣的研磨劑再次使用。(ii) As shown in Table 10, the relative value of the amount of grinding when using B" is 97 (relative to the value of the unused new abrasive B 0 100), even if compared with the new abrasive B 0 The amount of grinding that is not inferior, that is, it can be judged that the regenerated abrasive B" of the fourth embodiment can be used again as the same abrasive as the new one.

另外,可認為使用過的研磨劑B與原本的A相比,玻璃成分、凝集劑成分多,粒子的凝集強,再生更加困難,但按照本發明的再生方法,特別是採用包含流程2的方法,確認了可以達到完全再生的目的。Further, it is considered that the used abrasive B has a larger glass component and agglomerating component than the original A, and the aggregation of the particles is strong, and regeneration is more difficult. However, the regeneration method according to the present invention, particularly the method including the flow 2 It is confirmed that the purpose of complete regeneration can be achieved.

(產業上之可利用性)(industrial availability)

依照本發明,可提供一種再生方法,該方法將研磨速度大幅降低的通常被廢棄的鈰系研磨劑的研磨速度再生到接近於未使用的研磨劑的再生速度。According to the present invention, there is provided a method of regenerating a polishing rate of a generally discarded cerium-based abrasive having a greatly reduced polishing rate to a regeneration rate close to that of an unused abrasive.

另外,依照本發明,還提供一種將使用過的鈰系研磨劑進行再生處理的方法,該方法不使用鹼,從而不存在使研磨劑粒子凝集等問題,並且避免了成為使鈰系研磨劑的研磨速度降低的原因的Si成分或Al成分的除去率低的問題。Further, according to the present invention, there is further provided a method of regenerating a used lanthanide-based abrasive which does not use a base, so that there is no problem of agglomerating the abrasive particles, and the like is avoided. There is a problem that the removal rate of the Si component or the Al component is low because the polishing rate is lowered.

10...使用過的研磨劑10. . . Used abrasive

12...水12. . . water

14...再分散步驟14. . . Redispersion step

16...再分散漿料16. . . Redispersed slurry

18...酸18. . . acid

20...酸處理步驟20. . . Acid treatment step

22...處理漿料twenty two. . . Treatment slurry

24...固液分離步驟twenty four. . . Solid-liquid separation step

25...濾液25. . . filtrate

26...研磨劑粒子濾餅26. . . Abrasive particle filter cake

28...乾燥28. . . dry

29...煅燒29. . . Calcination

30...粉碎(分級)30. . . Crushing (grading)

32...再生研磨劑32. . . Regenerated abrasive

圖1係顯示處理使用過的鈰系研磨劑而得到再生研磨劑的步驟的一例的流程圖。Fig. 1 is a flow chart showing an example of a procedure for obtaining a regenerated abrasive by treating a used cerium-based abrasive.

10...使用過的研磨劑10. . . Used abrasive

12...水12. . . water

14...再分散步驟14. . . Redispersion step

16...再分散漿料16. . . Redispersed slurry

18...酸18. . . acid

20...酸處理步驟20. . . Acid treatment step

22...處理漿料twenty two. . . Treatment slurry

24...固液分離步驟twenty four. . . Solid-liquid separation step

25...濾液25. . . filtrate

26...研磨劑粒子濾餅26. . . Abrasive particle filter cake

28...乾燥28. . . dry

29...煅燒29. . . Calcination

30...粉碎(分級)30. . . Crushing (grading)

32...再生研磨劑32. . . Regenerated abrasive

Claims (6)

一種鈰系研磨劑之再生方法,係將使用過的鈰系研磨劑進行處理而得到再生研磨劑者,其特徵在於包含下述步驟:將該使用過的研磨劑粒子用水進行再分散,再將得到的漿料以漿料狀態直接至少用能夠使被黏在研磨劑粒子表面的屬於玻璃成分之Si成分及屬於雜質成分之Al成分與Fe成分可溶化或游離,從而從研磨劑粒子除去的酸進行處理。 A method for regenerating a lanthanum-based abrasive, which comprises treating a regenerated abrasive with a used lanthanide abrasive, comprising the steps of: redispersing the used abrasive particles with water, and then The obtained slurry is directly neutralized with at least a Si component which is a glass component adhered to the surface of the abrasive particles, and an Al component which is an impurity component and an Fe component are dissolved or freed in a slurry state, thereby removing the acid from the abrasive particles. Process it. 一種鈰系研磨劑之再生方法,係將使用過的鈰系研磨劑進行處理而得到再生研磨劑者,其特徵在於包含下述步驟:(1)將該使用過的研磨劑粒子用水進行再分散,製成漿料的步驟;(2)用能夠使被黏在研磨劑粒子表面的屬於玻璃成分之Si成分及屬於雜質成分之Al成分與Fe成分可溶化或游離,從而從研磨劑粒子除去的酸處理該再分散漿料的步驟;(3)將得到的酸處理漿料進行固液分離的步驟;以及(4)將得到的濾餅乾燥、粉碎的步驟。 A method for regenerating a lanthanum-based abrasive which is obtained by treating a used lanthanide abrasive to obtain a regenerated abrasive, comprising the steps of: (1) redispersing the used abrasive particles with water; a step of forming a slurry, and (2) removing and removing the Si component belonging to the glass component adhered to the surface of the abrasive particle and the Al component and the Fe component which are impurity components, thereby being removed from the abrasive particle. a step of acid-treating the redispersed slurry; (3) a step of subjecting the obtained acid-treated slurry to solid-liquid separation; and (4) a step of drying and pulverizing the obtained filter cake. 一種鈰系研磨劑之再生方法,係將使用過的鈰系研磨劑進行處理而得到再生研磨劑者,其特徵在於包含下述步驟:(1)將該使用過的研磨劑粒子用水進行再分散,製成漿料的步驟; (2)用能夠使被黏在研磨劑粒子表面的屬於玻璃成分之Si成分及屬於雜質成分之Al成分與Fe成分可溶化或游離,從而從研磨劑粒子除去的酸處理該再分散漿料的步驟;(3)將得到的酸處理漿料進行固液分離的步驟;(4)將得到的濾餅乾燥的步驟;以及(5)進一步將該乾燥的濾餅煅燒、粉碎的步驟。 A method for regenerating a lanthanum-based abrasive which is obtained by treating a used lanthanide abrasive to obtain a regenerated abrasive, comprising the steps of: (1) redispersing the used abrasive particles with water; a step of forming a slurry; (2) treating the redispersed slurry with an acid capable of dissolving or dissolving the Si component belonging to the glass component adhered to the surface of the abrasive particles and the Al component and the impurity component belonging to the impurity component to be removed from the abrasive particles Step; (3) a step of subjecting the obtained acid-treated slurry to solid-liquid separation; (4) a step of drying the obtained filter cake; and (5) a step of further calcining and pulverizing the dried filter cake. 如申請專利範圍第1至3項中任一項之鈰系研磨劑之再生方法,其中,酸為無機酸。 The method for regenerating an anthraquinone abrasive according to any one of claims 1 to 3, wherein the acid is a mineral acid. 如申請專利範圍第4項之鈰系研磨劑之再生方法,其中,併用二種以上的無機酸。 The method for regenerating an abrasive according to the fourth aspect of the patent application, wherein two or more inorganic acids are used in combination. 如申請專利範圍第5項之鈰系研磨劑之再生方法,其中,併用鹽酸、硫酸及硝酸中的一種和氫氟酸。 The method for regenerating an abrasive according to the fifth aspect of the patent application, wherein one of hydrochloric acid, sulfuric acid and nitric acid and hydrofluoric acid are used in combination.
TW96112022A 2006-04-07 2007-04-04 Preparation of cerium - based abrasive TWI401307B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006105820A JP4729428B2 (en) 2006-04-07 2006-04-07 Regeneration method of cerium-based abrasive

Publications (2)

Publication Number Publication Date
TW200745317A TW200745317A (en) 2007-12-16
TWI401307B true TWI401307B (en) 2013-07-11

Family

ID=38678067

Family Applications (1)

Application Number Title Priority Date Filing Date
TW96112022A TWI401307B (en) 2006-04-07 2007-04-04 Preparation of cerium - based abrasive

Country Status (3)

Country Link
JP (1) JP4729428B2 (en)
CN (1) CN101280175B (en)
TW (1) TWI401307B (en)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITRM20070677A1 (en) * 2007-12-27 2009-06-28 Garbo S R L PROCEDURE FOR SEPARATION AND RECOVERY OF THE SUSPENDENT CONTENT IN SUSPENSIONS EXHAUSTED FROM THE SILICON MECHANICAL PROCESSES.
JP5286040B2 (en) * 2008-11-13 2013-09-11 昭和電工株式会社 Manufacturing method of glass substrate for magnetic disk
JP2010214515A (en) * 2009-03-16 2010-09-30 Fukushima Univ Method of manufacturing glass abrasive material
JP5588114B2 (en) * 2009-03-25 2014-09-10 三井金属鉱業株式会社 Manufacturing method and processing method of cerium-based abrasive
WO2011099197A1 (en) 2010-02-15 2011-08-18 三井金属鉱業株式会社 Cerium-based abrasive regeneration method
JP4956636B2 (en) * 2010-03-08 2012-06-20 株式会社東芝 Antimony valence analysis method
KR101225746B1 (en) * 2010-08-03 2013-02-15 주식회사 랜코 Method of recycling cerium oxide abrasive material
WO2012053432A1 (en) * 2010-10-18 2012-04-26 Dowaエコシステム株式会社 Method for recovering cerium oxide polishing agent and recovered product containing cerium oxide polishing agent
KR101051207B1 (en) * 2011-02-09 2011-07-21 윤종훈 Recycling mineral abrasive for lcd and pdp glass panel based on rare earth metal oxides and method for recycling mineral abrasive using sludge disposal
JP2012245582A (en) * 2011-05-27 2012-12-13 Nippon Electric Glass Co Ltd Method for manufacturing cerium oxide-based abrasive
SG10201602755SA (en) * 2011-10-07 2016-05-30 Dowa Eco System Co Ltd Method for recycling abrasive from used cerium oxide based abrasive for glass containing flocculant
SG11201401813PA (en) * 2011-11-09 2014-09-26 Dowa Eco System Co Ltd Recycling method for polishing agent
JP2013126928A (en) 2011-12-19 2013-06-27 Shin-Etsu Chemical Co Ltd Method for recovering cerium oxide
EP2796243B1 (en) * 2011-12-22 2017-05-17 Konica Minolta, Inc. Abrasive material regeneration method and regenerated abrasive material
WO2013099666A1 (en) * 2011-12-27 2013-07-04 コニカミノルタ株式会社 Method for separating polishing material and regenerated polishing material
WO2013122128A1 (en) * 2012-02-16 2013-08-22 コニカミノルタ株式会社 Abrasive regeneration method
CN110065006A (en) * 2012-07-25 2019-07-30 柯尼卡美能达株式会社 Grinding-material regeneration method
JP5943529B2 (en) * 2012-09-13 2016-07-05 エルジー・ケム・リミテッド Recycling method of waste abrasive containing ceria
JP5940224B2 (en) * 2012-09-14 2016-06-29 エルジー・ケム・リミテッド Recycling method of waste abrasive containing ceria
CN104619806A (en) * 2012-09-17 2015-05-13 株式会社Lg化学 Method for recycling waste abrasive material containing ceria
SG11201507820WA (en) * 2013-04-09 2015-10-29 Dowa Eco System Co Ltd Method for manufacturing regenerated cerium oxide-based abrasive particles, and regenerated particles
WO2016017819A1 (en) * 2014-07-31 2016-02-04 Hoya株式会社 Method for producing polishing slurry, polishing abrasive grains, polishing slurry, and method for producing glass substrate
JP5967246B2 (en) * 2015-04-03 2016-08-10 信越化学工業株式会社 Recovery method of cerium oxide
CN105798778A (en) * 2016-05-09 2016-07-27 惠晶显示科技(苏州)有限公司 Grinding powder recycling method for displaying glass plane grinding
DE102017118017A1 (en) * 2017-08-08 2019-02-14 PDR Recycling GmbH + Co. KG Recycling process for abrasive grains
KR102479603B1 (en) * 2017-12-27 2022-12-22 주식회사 케이씨텍 Preparing method of surface-modified ceria abrasive particle and polishing slurry composition comprising the same
TWI759787B (en) * 2020-07-07 2022-04-01 環創源科技股份有限公司 Method for processing waste polishing solution and waste solution containing hydrofluoric acid
JP2022172678A (en) * 2021-05-06 2022-11-17 コニカミノルタ株式会社 Method for preparing recycled/regenerated polishing agent slurry and polishing agent slurry

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004306210A (en) * 2003-04-08 2004-11-04 Speedfam Co Ltd Processing method and processing equipment for reusing cerium oxide-based polishing agent and water, in drainage in glass polishing

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3446988B2 (en) * 1997-04-10 2003-09-16 三井金属鉱業株式会社 Method for recovering abrasive raw materials from waste cerium abrasive
JP3134189B2 (en) * 1997-09-18 2001-02-13 福島県 How to collect abrasives
CN1194060C (en) * 2003-07-24 2005-03-23 南开大学 Preparation method of rare-earth polishing powder

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004306210A (en) * 2003-04-08 2004-11-04 Speedfam Co Ltd Processing method and processing equipment for reusing cerium oxide-based polishing agent and water, in drainage in glass polishing

Also Published As

Publication number Publication date
CN101280175A (en) 2008-10-08
JP2007276055A (en) 2007-10-25
CN101280175B (en) 2012-07-25
JP4729428B2 (en) 2011-07-20
TW200745317A (en) 2007-12-16

Similar Documents

Publication Publication Date Title
TWI401307B (en) Preparation of cerium - based abrasive
KR101051207B1 (en) Recycling mineral abrasive for lcd and pdp glass panel based on rare earth metal oxides and method for recycling mineral abrasive using sludge disposal
TWI558665B (en) Method for recovery of cerium oxide
JP3929481B2 (en) Cerium oxide-based abrasive, its production method and use
KR101225746B1 (en) Method of recycling cerium oxide abrasive material
WO2013094399A1 (en) Abrasive material regeneration method and regenerated abrasive material
JP4248937B2 (en) Method for recovering rare earth oxide from waste liquid containing rare earth element
JP2012052121A (en) Method for producing cerium salt, cerium oxide and cerium based polishing slurry
JP5872836B2 (en) Method for recovering cerium oxide-based abrasive and recovered material containing cerium oxide-based abrasive
KR101539419B1 (en) Regenaration method of spent abrasives containing ceria
JP3615943B2 (en) Method for recovering rare earth elements from used rare earth abrasives
WO2013069720A1 (en) Recycling method for polishing agent
WO2013099666A1 (en) Method for separating polishing material and regenerated polishing material
JP5976659B2 (en) Abrasive recycling method from spent cerium oxide glass abrasive containing flocculant
KR101554901B1 (en) Method of manufacturing recycling waste sludge of nonorganic abrasive for grinding glass panel
JP3560121B2 (en) Method for producing rare earth-based abrasive raw materials from waste abrasive
KR101539420B1 (en) Regenaration method of spent abrasives containing ceria
WO2014042431A1 (en) Method for regenerating spent ceria-containing polishing agent
JP2004175964A (en) Manufacturing process of high purity cerium oxide abrasive, and high purity cerium oxide abrasive obtained by the process
JP4290465B2 (en) Method for producing cerium-based abrasive mainly composed of cerium oxide
KR101988451B1 (en) Regenaration method of spent abrasives containing ceria
JP5967246B2 (en) Recovery method of cerium oxide
WO2014042494A1 (en) Method for recycling waste abrasive material containing ceria
CN116812963A (en) Preparation method of nanoscale cerium oxide for rough polishing of silicon substrate
WO2014042430A1 (en) Method for regenerating spent ceria-containing polishing agent

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees