TWI399787B - Ultraviolet irradiation unit and ultraviolet radiation treatment device - Google Patents

Description

Ultraviolet irradiation unit and ultraviolet irradiation treatment device

The present invention relates to an ultraviolet irradiation treatment apparatus, and more particularly to an ultraviolet irradiation unit and an ultraviolet irradiation treatment apparatus using an excimer lamp used for cleaning a semiconductor substrate or a liquid crystal substrate, for example, in a semiconductor substrate or a liquid crystal substrate. .

In the process of a semiconductor substrate or a liquid crystal substrate, a dry method using ultraviolet rays is widely used as a method of removing dirt such as an organic compound on the surface of a glass substrate or a liquid crystal substrate of a liquid crystal substrate. Washing method. In particular, in the cleaning method using ozone or active oxygen derived from vacuum ultraviolet light emitted from an excimer lamp, various cleaning apparatuses which are more efficiently and washed in a short period of time are proposed, and are known as patents. Document 1.

Fig. 13 is a view showing the structure of a conventional ultraviolet irradiation treatment apparatus disclosed in the same document. According to the conventional ultraviolet irradiation processing apparatus, for example, a hole having a diameter of 2 mm is formed on the top of the lampshade A at a pitch of 3 mm, and the porous gas diffusion plate B having an opening ratio of 40% is disposed in parallel with the open surface of the open shade A. . In the support plate C, a gas supply port CA continuous with a space partitioned by the gas diffusion plate B is formed, and a gas supply pipe D is provided on the support plate C so as to cover the gas supply port CA from above. A gas supply source (not shown) is connected to the gas supply conduit D, and a cleaned nitrogen gas (inert gas) is supplied through the gas supply. The tube D and the gas supply port CA are supplied to a space above the gas diffusion plate B, and these are configured to constitute the gas supply means E. In the transfer chamber F, the plurality of conveyor shafts H constituting the transport mechanism G are rotatably provided in a direction orthogonal to the conveyance direction of the workpiece W, and are placed on the respective conveyor axes H. The workpiece W is transported by a plurality of transport rollers. Further, at the bottom of the transfer chamber F, an exhaust duct I connected to an exhaust device (not shown) is provided, and an exhaust gas generated in the interior and the nitrogen gas supplied into the transfer chamber F can be discharged. .

As shown by the arrow in Fig. 13, according to the ultraviolet irradiation processing apparatus of the above configuration, the nitrogen gas is discharged downward from the fine pores of the gas diffusion plate B provided in the globe A. The nitrogen gas to be discharged is a flat surface that first collides with the excimer lamp J, and changes the flow in the lateral direction, and flows straight and falls from the both sides of the excimer lamp toward the surface of the object W. Therefore, the ultraviolet irradiation space X from the periphery of the excimer lamp J to the object to be processed W is filled with the entire flow of the nitrogen gas, and is maintained in an inert gas atmosphere in which almost no oxygen is present. Therefore, the ultraviolet light emitted from the excimer lamp J is hardly absorbed by the oxygen and reaches the ultraviolet irradiation space X, and the ultraviolet light intensity on the surface of the object W is considerably higher than that of the conventional one.

Patent Document 1: Japanese Patent Laid-Open No. 2005-197291

However, according to the conventional ultraviolet irradiation processing apparatus described above, in order to quickly perform the processing of the object W, it is necessary to obtain the excimer lamp J. The surroundings are continued until the ultraviolet space X between the excimer lamp J and the object to be processed W is rapidly filled with nitrogen gas. However, as shown in Fig. 13, in the conventional ultraviolet irradiation processing apparatus, the plurality of collimator lamps J adjacent to each other are disposed so as to be spaced apart from each other, so that the internal volume of the opening shade A has to be increased. Therefore, it is necessary to pass through the gas supply conduit D and the gas supply port CA from the periphery of the plurality of excimer lamps J disposed inside the open shade A to the ultraviolet irradiation space X of the object W to be filled with the flow of the inert gas. A large amount of inert gas is supplied, and there is a problem that the cost becomes high. Further, in order to pass a large amount of inert gas through the fine pores of the gas diffusion plate B, it takes a long time to fill the periphery of the excimer lamp J with the inert gas, and it is necessary to reduce the conveyance speed of the object W to be processed. There are problems with the disadvantage of reducing production.

As described above, in the present invention, an ultraviolet irradiation unit capable of rapidly filling an inert gas around the excimer lamp and an ultraviolet irradiation treatment apparatus including the ultraviolet irradiation unit are provided.

The ultraviolet irradiation unit of the present invention includes a plurality of excimer lamps in which a discharge gas is sealed in a sealed space formed in the discharge vessel, and a pair of electrodes are formed on an outer surface of the discharge vessel via the sealed space, and a lampshade that is opened around the plurality of excimer lamps in one direction in the vertical direction, and an ultraviolet irradiation unit for supplying an inert gas to the gas supply mechanism inside the lampshade, characterized in that: in the lampshade, the space enclosure It is disposed in a space other than the space occupied by the excimer lamp.

Further, the ultraviolet irradiation unit of the present invention is adjacent to each other The space enclosure is disposed between the excimer lamps, and the base end portion of the space enclosure is fixed to the top of the lampshade.

In the ultraviolet irradiation unit of the present invention, in recent years, it has been required to irradiate ultraviolet rays to a large-area object to be processed, and accordingly, it is necessary to increase the length of light emitted from the excimer lamp housed in the globe. For example, when the object to be processed is irradiated with ultraviolet rays to the object to be processed, the length of the light emitted from the excimer lamp must be longer than the full length of the direction orthogonal to the direction in which the object to be processed is orthogonal.

In order to increase the long light emission of the excimer lamp, it is necessary to increase the length of the synthetic quartz glass tube constituting the light-emitting tube, and to increase the full length of one branch of the excimer lamp, as described below, there is a problem in the manufacture of the synthetic quartz glass tube. It is more difficult to set the problem on the excimer lamp.

The problem in the manufacture of a synthetic quartz glass tube is that if a synthetic quartz glass tube having a long length is to be produced, it is deformed and bent, and it is difficult to process it into a lamp having stable characteristics. Further, as the full length of the synthetic quartz glass tube becomes longer, the workability is lowered, and the synthetic quartz glass tube is injured, which becomes a high-cost lamp.

The problem of the installation of the excimer lamp is that when the long-length excimer lamp is placed in the lamp cover, the excimer lamp is warped and the center of the excimer lamp is close to the workpiece, and the ultraviolet radiation is uneven. When the processing for producing the substrate is uneven or more warped, the excimer lamp contacts the workpiece to rub the surface of the workpiece to give mechanical damage to the workpiece.

Therefore, as shown in Fig. 4, an excimer lamp 1A, 1B having a shorter overall length than a direction orthogonal to the conveyance direction of the object to be processed is prepared. The field Q in which the light-emitting areas SA and SB of the respective excimer lamps 1A, 1B overlap, whereby the growth light length is generally performed. However, as shown in Fig. 4, compared with the short-length excimer lamp, an extra space is formed in the central axis direction of each of the excimer lamps 1A, 1B.

Therefore, in order to reduce the excess space formed in the central axis direction of the excimer lamps 1A and 1B described above, the ultraviolet irradiation unit of the present invention is such that the space enclosure is disposed on the central axis of the excimer lamp and is adjacent to each other. Each of the light-emitting fields of the excimer lamp is superimposed on an imaginary straight line orthogonal to the central axis of the excimer lamp.

Further, the ultraviolet irradiation unit includes a support for fixing the excimer lamp in the globe, and both of the excimer lamp and the space enclosure are fixed to the support.

Moreover, the ultraviolet irradiation processing apparatus of the present invention includes the ultraviolet irradiation unit and a transport mechanism that transports the object to be processed in a direction orthogonal to the central axis of the excimer lamp.

According to the ultraviolet irradiation unit of the present invention, since the space enclosure is disposed in a space other than the space occupied by the excimer lamp in the globe, the volume of the space around the excimer lamp is reduced. Therefore, even if a large amount of inert gas is not supplied into the lampshade, the periphery of the excimer lamp can be made into an inert gas atmosphere, and the cost necessary for supplying the inert gas can be reduced. Further, as described above, by reducing the volume of the space surrounding the excimer lamp, the periphery of the excimer lamp can be quickly made into an inert gas atmosphere, thereby increasing the throughput.

Further, in the ultraviolet irradiation unit of the present invention, adjacent to each other The space enclosure is disposed between the excimer lamps, and the base end portion of the space enclosure is fixed to the top of the lampshade, so that the space enclosure can be surely fixed inside the lampshade.

Further, in the ultraviolet irradiation unit of the present invention, the space enclosure is disposed on a central axis of the excimer lamp, and each of the light-emitting regions of the excimer lamp adjacent to each other overlaps the center of the excimer lamp When the axis is orthogonal to the imaginary straight line, when a short-length excimer lamp is used, the space formed in the direction of the central axis of the excimer lamp is closed by the space enclosure, and the inside of the lampshade can be reduced. The volume of the space around the molecular lamp, and the ultraviolet rays can be surely irradiated to a large-area object to be processed.

Further, the ultraviolet irradiation unit according to the present invention includes a support for fixing the excimer lamp to the shade, and both the excimer lamp and the space enclosure are fixed to the support, and thus When a plurality of types of objects to be processed having different widths in the conveyance direction are subjected to ultraviolet irradiation treatment using a common lampshade, the cost necessary for supplying the inert gas can be reduced, and the periphery of the excimer lamp can be quickly made into an inert gas atmosphere.

Moreover, the ultraviolet irradiation processing apparatus according to the present invention includes the transport mechanism for transporting the target object in the direction in which the central axis of the molecular lamp is aligned, thereby reducing the excimer required for the ultraviolet irradiation treatment of the object to be processed. The number of lights.

(First embodiment)

Hereinafter, the first embodiment of the ultraviolet irradiation unit of the present invention will be described with reference to Figs. 1 to 5 . Fig. 1 is a cross-sectional view showing the configuration of an ultraviolet irradiation unit of the present invention. Fig. 2 is a cross-sectional view showing the configuration of an excimer lamp. Fig. 2(a) is a cross-sectional view showing the excimer lamp cut in the direction of the central axis. Fig. 2(b) is a cross-sectional view showing the cutting of the excimer lamp in a direction orthogonal to the central axis. Fig. 3 is a view showing a state in which the ultraviolet irradiation unit of the present invention is viewed from the vertical direction. Fig. 4 is a view conceptually showing the arrangement of an excimer lamp, a space enclosure, and a body to be processed. Fig. 5 is a view showing the configuration of a space enclosure.

The ultraviolet irradiation unit 100 is a lamp cover 5 formed of a metal casing having an opening 51 on the lower side in the vertical direction, and a plurality of excimer lamps 1 are disposed in parallel with each other, and are provided on the top 52 of the lamp cover 5 The gas supply pipe 3 for supplying an inert gas such as a nitrogen gas or the like is provided with excimer lamps 1 (1B, 1D) adjacent to each other and a block-shaped space enclosure 2 (2A, 2C), each of which is excimer The lamp 1 is for equalizing the distance from the object W to be processed so that the respective light exit surfaces are arranged on the same plane. A transport mechanism 6 for providing a plurality of rollers 61 for transporting the object W such as a liquid crystal substrate or a semiconductor substrate to the arrow direction in the first drawing is provided below the ultraviolet irradiation unit 100 in the vertical direction. In addition, in the following, both of the ultraviolet irradiation unit and the conveyance machine are provided as an ultraviolet irradiation treatment apparatus.

As shown in Fig. 2, the excimer lamp 1 is made of a bismuth glass of a dielectric material, and has a flat rectangular tube-shaped discharge capacitor having a round taste in the four sides. 10. In the sealed space S formed inside the discharge vessel 10, for example, a rare gas such as a nitrogen gas or a halogen gas such as chlorine gas mixed with a rare gas is filled as a discharge gas. Excimer light of different wavelengths occurs by the type of discharge gas. The discharge gas is generally filled at a pressure of about 10 to 100 KPa.

As shown in Fig. 2, the discharge vessel 10 is such that the flat wall 11 on the upper side of the paper surface and the flat wall 12 on the lower side of the paper surface are spaced apart from each other and extend in parallel, and the flat wall 13 on the left side of the paper surface The flat walls 14 on the right side of the paper sheet are spaced apart from each other and extend in parallel, and the respective ends of the flat walls 11 to 14 are joined by the bent portion 15. The discharge vessel 10 is formed by any of the flat walls 11 and 12 on the lower surface of the paper, and forms a light exit surface for emitting ultraviolet rays to the object W. For example, when the object to be processed W is disposed under the discharge vessel 10, the flat wall 12 is provided. Become a light exit surface.

Electrodes 17, 18 are disposed on the flat walls 11, 12, respectively. The electrodes 17, 18 are, for example, printed or vapor-deposited on the flat walls 11, 12 by a corrosion-resistant metal such as gold, silver, copper, nickel, or chromium. For example, the thickness is formed to be 0.1 μm to several tens of 10 μm, and the cover is flat. The walls 11, 12 are approximately the entire area in the width direction. When the flat wall 12 is a light exit surface, the electrode 18 located below is formed into a lattice shape by printing or vapor deposition. The light-emitting area SA is a field in which the electrodes 17 and 18 are sandwiched in the sealed space S in the discharge vessel 10 as indicated by a broken line in the second (a) diagram.

As shown in Figs. 1 and 2, for example, cerium oxide particles and alumina are formed on the inner surface 11a of the flat wall 11 which is farther from the object W to be processed. The ultraviolet reflecting film 16 formed by the particles. In the example shown in FIG. 2, the ultraviolet ray reflection film 16 extends to the inner surface of the curved portion 15 and the flat walls 12 to 14 which are continuous at both ends of the flat wall 11. The ultraviolet ray reflection film 16 is preferably a content ratio of the cerium oxide particles of 30 to 99% by mass, and a content ratio of the alumina particles of 1 to 70% by mass.

The ultraviolet irradiation unit of the present invention will be described in detail using Fig. 3 .

In the globe 5, the plurality of excimer lamps 1A to 1D (shown as four in the example of Fig. 3) and the space enclosures 2A to 2D having the same number as the excimer lamps 1A to 1D are the respective space enclosures 2A~ 2D is located on the central axis X of each of the excimer lamps 1A to 1D, and in the direction orthogonal to the central axis X of the excimer lamps 1A to 1D, the excimer lamps 1A to 1D and the space enclosures 2A to 2D are specifically arranged as follows. Arranged interactively.

The excimer lamps 1A and 1B are one end of the excimer lamp 1A located near the side wall of the globe 5, and extend beyond the other end of the excimer lamp 1B extending adjacent to the excimer lamp 1A, but are disposed not to exceed the excimer lamp 1B. One end. The light-emitting area SA of the excimer lamp 1A and the light-emitting area SB of the excimer lamp 1B overlap each other in the field indicated by Q in FIG. A space which is not occupied by the excimer lamp 1A is formed on one end side of the excimer lamp 1A, and a space enclosure 2A is disposed in the space.

The excimer lamps 1B and 1C are the other end of the excimer lamp 1B, and extend beyond the end of the excimer lamp 1C extending adjacent to the excimer lamp 1B, but are disposed so as not to exceed the other end of the excimer lamp 1C. The light-emitting area SB of the excimer lamp 1B and the light-emitting area SC of the excimer lamp 1C are shown by Q in FIG. The fields overlap. On the other end side of the excimer lamp 1B, a space which is not occupied by the excimer lamp 1B is formed, and a space enclosure 2B is disposed in the space.

The excimer lamps 1C and 1D are one end of the excimer lamp 1C and extend beyond the other end of the excimer lamp 1D extending adjacent to the excimer lamp 1C, but are disposed so as not to exceed one end of the excimer lamp 1D. The light-emitting area SC of the excimer lamp 1C and the light-emitting area SD of the excimer lamp 1D overlap with the field indicated by Q in FIG. A space enclosed by the excimer lamp 1C is formed on one end side of the excimer lamp 1C, and a space enclosure 2C is disposed in the space. A space enclosed by the excimer lamp 1D is formed on the other end side of the excimer lamp 1D located near the side wall of the globe 5, and a space enclosure 2D is disposed in the space.

As shown in FIG. 3 and FIG. 4, in the ultraviolet irradiation unit 100, each of the excimer lamps 1A to 1D has a central axis X arranged in a direction orthogonal to the conveyance direction of the object W, Further, the respective light-emitting areas SA to SD of the excimer lamps 1A to 1D adjacent to each other are arranged to overlap each other on the virtual straight line K orthogonal to the respective central axes of the excimer lamps 1A to 1D. As shown in Fig. 4, even if the full length of the direction orthogonal to the conveyance direction of the object W is longer than the full length of each of the excimer lamps 1A to 1D, it is accurate. The ultraviolet rays emitted from the molecular lamps 1A to 1D are irradiated to the entire length in the direction orthogonal to the conveyance direction of the object W, and the surface treatment of the object W can be surely performed, and it is not necessary to correspond to the entire length of the object W to be processed. Producing a long-length excimer lamp, thus creating an excimer lamp Simple advantages.

As shown in Fig. 1 and Fig. 3, in the vertical direction of each of the excimer lamps 1A to 1D, an inert gas is disposed to be supplied around the excimer lamps 1A to 1D. Each gas supply mechanism 3A to 3H. Each of the gas supply mechanisms 3A to 3H is formed by a tubular member having a rectangular tube in cross section, and the plurality of openings 31A to 31H for blowing out the inert gas are alternately arranged and arranged in the gas supply mechanisms 3A to 3H. In the longitudinal direction, the inert gas can be uniformly blown from the respective openings 31A to 31H. The inert gas is preferably supplied to the supplier by absorbing the ultraviolet light emitted from the excimer lamps 1A to 1D by the oxygen present in the globe 5, for example, a nitrogen gas or the like.

The configuration of the space enclosures 2A to 2D will be described below. For the sake of convenience, only the configuration of the space enclosure 2A will be described, but the space enclosures 2B to 2D are also configured in the same manner as the space enclosure 2A.

As shown in Fig. 5, the space enclosure 2A is composed of a rod-shaped body 21A attached to the top portion 52 of the globe 5, and a bottomed cylindrical body 22A covering the periphery of the rod-shaped body, and the rod-shaped body is fixed. 21A is constituted by a fixing member 23A of the bottomed cylindrical body 22A. The rod-shaped body 21A has a base end side fixed to the top portion 52 of the globe 5, and a bottomed screw hole 211A is formed on the front end side of the object to be processed W. The bottomed cylindrical body 22A is opened to abut against the proximal end side of the top portion 52, and an opening 222A for inserting the fixing member 23A is formed in the center of the bottom plate portion 221A. The fixing member 23A is composed of a rod-shaped spiral portion 231A that is screwed into the screw hole 211A of the rod-shaped body 21A, and a flange portion 232A that extends annularly in the loop portion 231A. to make.

The space enclosures 2A to 2D are produced as follows. The bottom portion of the rod-shaped body 21A is covered by the bottomed cylindrical body 22A, and the base end portion of the bottomed cylindrical body 22A is placed in contact with the inner surface of the globe 5, and is inserted from the opening 222A of the bottomed cylindrical body 22A. The spiral portion 231A of the fixing member 23A is passed until the flange portion 232A of the fixing member 23A abuts against the distal end portion of the bottomed cylindrical body 22A, and the spiral hole 211A of the rod-shaped body 21A is screwed by the spiral portion 231A. Formed. Further, the shape of the space enclosure 2A is not particularly limited, but it is preferable to have a rectangular parallelepiped shape in the inside of the globe 5 in order to reduce the volume of the field which is not occupied by the excimer lamp. Further, since the bottomed cylindrical body and the fixing member are exposed in the space inside the globe 5, they are preferably made of a material excellent in ultraviolet light resistance and ozone resistance, for example, SUS, and an alumite treatment is applied to the aluminum plate. , ceramics, etc.

In the ultraviolet irradiation unit of the present invention, the front end faces (the front end faces of the bottomed cylindrical bodies) of the respective space enclosures 2A to 2D are disposed closer to the plane including the light exit faces of the respective excimer lamps 1A to 1D. The object to be processed W is preferably higher than the plane of the front end surface on the lower side in the vertical direction of the shade 5 in the vertical direction. By doing so, the volume of the space other than the space occupied by each of the excimer lamps 1A to 1D can be reduced in the internal space of the globe 5, and there is no object to be processed for each of the space enclosures 2A to 2D. W collision concerns.

According to the ultraviolet irradiation unit of the present invention as described above, as shown in FIG. 1 and FIG. 3, a space enclosure is disposed in a space other than the space occupied by the excimer lamps 1A to 1D in the inside of the globe 5. And thus the light The volume of the excess space in the cover 5 becomes small. Therefore, the internal space of the globe 5 can be made into an inert gas atmosphere by supplying a small amount of inert gas, so that the cost required for supplying the inert gas can be eliminated, and the internal space of the globe 5 can be quickly filled with the inert gas.

In particular, as shown in Fig. 1, in the ultraviolet irradiation processing apparatus including the transport mechanism, in order to increase the throughput, the environment in the lampshade 5 is treated as an atmosphere in consideration of the object W to be processed and processed. When the body is located directly below the opening 51 of the globe 5, the environment inside the globe 5 must be quickly made into an inert gas atmosphere. Therefore, according to the present invention, the space other than the space occupied by the excimer lamp 1 is reduced inside the globe 5, whereby when the object to be processed W is located directly below the opening 51 of the globe 5, Since the inert gas is quickly filled in the globe 5, the throughput is particularly increased as compared with the ultraviolet irradiation unit of the comparative example.

On the other hand, in the ultraviolet irradiation unit of the comparative example shown in Fig. 6, in the inside of the globe 5, the space enclosure is not disposed in the space TA~TD other than the space occupied by the excimer lamps 1A to 1D. Therefore, if a large amount of inert gas is not supplied to the space inside the globe 5, the space in the globe 5 cannot be made into an inert gas atmosphere, which may increase the cost or fill the space inside the globe 5 with an inert gas. It takes a long time and therefore reduces production.

(Second embodiment)

Hereinafter, the second embodiment of the ultraviolet irradiation unit is used. 7 to 8 are explained. This embodiment is preferably applied to a case where the total length in the direction orthogonal to the conveyance direction of the object to be processed is short. Fig. 7 is a cross-sectional view showing the configuration of a second embodiment of the ultraviolet irradiation unit of the present invention. Fig. 8 is a view showing a state in which the ultraviolet irradiation unit shown in Fig. 7 is viewed from the vertical direction. In the seventh and eighth figures, the same reference numerals as in the first to fifth figures are given to the same portions as those of the first to fifth figures.

The ultraviolet irradiation unit 200 is disposed inside the globe 5 formed by the metal casing on the lower side in the vertical direction, and is provided with a plurality of excimer lamps 1A to 1C in parallel with each other, and is provided at the top 52 of the globe 5 for supply. Gas supply pipes 3A to 3F of an inert gas such as a nitrogen gas, and block-shaped space enclosures 2A, 2B are disposed between adjacent excimer lamps. Each of the excimer lamps 1A to 1C is formed so that the distance from the object to be processed is equal, and the respective light exit surfaces are arranged on the same plane.

The space enclosures 2A to 2B are fixed to the top portion 52 of the globe 5 in the same manner as in the fifth diagram, and the front end faces of the respective space enclosures 2A to 2B (the front end faces of the bottomed cylindrical bodies) are included. The plane of the light exit surface of the excimer lamps 1A to 1C is also close to the object to be processed, and is preferably disposed above the vertical direction of the plane including the front end surface on the lower side in the vertical direction of the globe 5.

As shown in Fig. 8, in the ultraviolet irradiation unit of the present invention, the plurality of excimer lamps 1A to 1C are arranged to be spaced apart from each other at equal intervals, and the respective central axes are arranged in parallel. Above the vertical direction of each of the excimer lamps 1A to 1C, it is disposed to supply an inert gas to the excimer lamp 1A~ The gas supply mechanisms 3A to 3F around 1C.

As shown in Fig. 7 and Fig. 8, the space enclosures 2A to 2B are disposed in the inevitably between the excimer lamps 1A to 1C adjacent to each other, and are occupied by the excimer lamps 1A to 1C. Space outside the space. In the second embodiment of the ultraviolet irradiation unit of the present invention, each of the excimer lamps 1A to 1C and the respective spaces are alternately arranged in a direction orthogonal to the central axis of each of the excimer lamps 1A to 1C. Body 2A~2B.

In other words, in the ultraviolet irradiation unit 200, the insulation distance from the feed side electrode cannot be ensured, and thus the excimer lamps 1A to 1C cannot be extremely closely approached, and the respective excimer lamps 1A to 1C adjacent to each other are not in contact with each other. There is inevitably a space between them. In the same manner as in the first embodiment of the ultraviolet irradiation unit of the present invention, the space enclosures 2A to 2B are disposed in a space which is inevitably formed between the adjacent excimer lamps 1A to 1C. Therefore, the volume of the space other than the space occupied by 1A to 1C in the inside of the globe 5 can be reduced. Therefore, by supplying a small amount of inert gas, the internal space of the globe 5 can be made into an inert gas atmosphere. The cost required to supply the inert gas can be eliminated, and the internal space of the lampshade 5 can be quickly filled with an inert gas.

(Third embodiment)

Hereinafter, a third embodiment of the ultraviolet irradiation unit of the present invention will be described with reference to Figs. 9 to 11 . Fig. 9 is a cross-sectional view showing the ultraviolet irradiation unit. Figure 10 is a view showing ultraviolet irradiation from obliquely above. A perspective view of a part of the unit. In the drawings of Fig. 9 and Fig. 10, the same reference numerals as in Figs. 1 to 5 are given to the same portions as those of Figs. 1 to 5 . Fig. 11 is a view for explaining the configuration of a support for an excimer lamp. Fig. 12 is a perspective view for explaining the lighting lamp for the room.

In the ultraviolet irradiation unit 300, the specifications of the globe 5 are unified into various types. Regardless of the size of the object to be processed W, when a plurality of types of the object to be processed W are processed, the cover 5 is generally used in common, and the size of the cover 5 is accommodated. The number of the excimer lamps 1 in the globe 5 is determined by the maximum width of the plurality of objects to be processed W corresponding to the conveyance direction. Therefore, when the width of the object to be processed W in the conveyance direction is smaller than the width of the lampshade in this direction, the excimer lamp 1 is removed from the support body 7 to perform a so-called inter-lighting lamp.

As shown in Fig. 12, the inter-lighting lamp is a support body 7D located on the right side of the excimer lamp 1C, and 7E is in a state in which the excimer lamp 1 is not supported, and as shown in Fig. 10, The space enclosures 20A, 20B having approximately the same volume as the respective excimer lamps 1 are respectively fixed to the supports 7D, 7E. The third embodiment of the ultraviolet irradiation unit of the present invention is particularly effective when the lamp is lit.

The ultraviolet irradiation unit shown in Fig. 10 and Fig. 10 is a lamp housing 5 formed of a metal casing having an opening 51 on the lower side in the vertical direction, and the plurality of ultraviolet irradiation units 1A to 1C are separated from each other to be parallel and respectively The support bodies 7A to 7C are fixed, and the gas supply pipes 3A to 3F for supplying an inert gas such as a nitrogen gas or the like are provided at the top 52 of the globe 5. The paper surface in Fig. 10 is located on the right side of the excimer lamp 1C, and the block space seal The closed bodies 20A, 20B are respectively fixed to the support body 7D, and 7E is parallel to the excimer lamps 1A to 1C. Each of the excimer lamps 1A to 1C is formed so that the distance from the object W to be processed is equal, and the respective light exit surfaces are arranged on the same plane.

The space enclosures 20A, 20B are rod-like members having the same volume as the excimer lamp 1, such as metal, wood, or the like. The excimer lamps 1A to 1C and the space enclosures 20A and 20B do not have to be disposed in different regions as shown in Fig. 10, respectively. For example, excimer lamps 1A to 1C and space enclosures 20A, 20B, in the paper surface of Fig. 10, by left-side excimer lamp 1A, space enclosure 20A, excimer lamp 1B, space enclosure 20B, excimer lamp 1C Sequential configuration is also possible.

As shown in Fig. 11, the support body 7A includes a first holding member 71A attached to one end portion 10A of the excimer lamp 1A, and a second holding member attached to the other end portion 10B of the excimer lamp 1A. 72A. The first holding member 71A includes a fixing portion 711A that extends in parallel with the tube axis of the excimer lamp 1A, and a protruding portion 712A that extends in a direction orthogonal to the fixing portion 711A in succession with the fixing portion 711A, so that the cross-section forms L. In the shape of the front end surface 713A of the fixing portion 711A, a bottomed hole 714A for inserting one end portion of the excimer lamp 1A is formed.

The second holding member 72A is in a section The shape is formed by the continuous column portions 722A, 723A, and 724A, and the frame portion 721A disposed so as to surround the other end portion of the excimer lamp 1A and the column portion 724A as the center are rotatably The method is configured by being coupled to the pressing portion 725A of the frame portion 721A. The pressing portion 725A is formed by a base portion 726A coupled to an end portion of the column portion 724A, and a protruding portion 727A extending in a direction perpendicular to the vertical direction of the base portion 726A, and a C-shaped leaf spring 728A is formed in a cross section. It is fixed to the protruding portion 727A.

The excimer lamp 1A is fixed to the support body 7 described above as follows. After the one end portion 10A of the excimer lamp 1A is inserted into the bottomed hole 714A of the first holding member 71A, the frame portion 721A is placed around the other end portion 10B of the excimer lamp 1A. The holding member 72A rotates the pressing portion 725A in the circumferential direction of the column portion 724A, and presses the end surface of the other end portion 10B of the excimer lamp 1A by the leaf spring 728A. The pressing portion 725A is a cutting portion (not shown) that is provided on the base portion 726A by a projection (not shown) to be formed at an end portion of the column portion 722A, and is regulated to the circumferential direction. The rotation is fixed to the frame portion 721A. The excimer lamp 1A is pushed toward the bottom of the bottomed hole 714A by the repulsive force generated by the leaf spring 728A, and the width of the bottomed hole 714A and the frame portion 721A is approximately equal to the width of the excimer lamp 1A. Therefore, it is surely regulated to move in the tube axis direction and the tube axis in the orthogonal direction.

Further, the support bodies 7B to 7E have the same configuration as the above-described support body 7A, and as described above, the excimer lamps 1B to 1C and the space enclosures 20A and 20B are respectively fixed.

In the ultraviolet irradiation unit, in the state in which the excimer lamps 1A to 1E are fixed to the respective support bodies 7A to 7E, the object W is irradiated with ultraviolet rays to perform the treatment of the object W, and the support bodies 7A to 7E are provided. In the state in which any one of the excimer lamps 1A to 1E is removed, the object W is irradiated with ultraviolet rays to perform the processing of the object W. in In the latter case, according to the ultraviolet irradiation unit 300 of the present invention, as shown in Fig. 10, the space enclosures 20A, 20B are fixed to the support bodies 7D, 7E not provided with the excimer lamp 1, thereby reducing Excessive space inside the lampshade 5. Therefore, according to the ultraviolet irradiation unit 300, similarly to the ultraviolet irradiation units 100 and 200 of the first embodiment described above, the internal space of the globe 5 can be made into an inert gas atmosphere with a small amount of inert gas, so that supply inertness can be eliminated. The cost of the gas.

1‧‧ ‧ excimer lamp

2‧‧‧Space enclosure

3‧‧‧ gas supply agency

5‧‧‧shade

6‧‧‧Transportation agencies

7‧‧‧Support

20‧‧‧Space enclosure

W‧‧‧Processed body

K‧‧‧ imaginary line

The central axis of the X‧‧‧ excimer lamp

Fig. 1 is a cross-sectional view showing the configuration of an ultraviolet irradiation unit of the present invention.

2(a) and 2(b) are cross-sectional views showing the configuration of the excimer lamp.

Fig. 3 is a view showing a state in which the ultraviolet irradiation unit is viewed from the vertical direction.

Fig. 4 is a view conceptually showing the arrangement of the excimer lamp, the space enclosure, and the object to be processed.

Fig. 5 is a view showing the configuration of a space enclosure.

Fig. 6 is a view conceptually showing an ultraviolet irradiation unit of a comparative example.

Fig. 7 is a cross-sectional view showing the configuration of a second embodiment of the ultraviolet irradiation unit of the present invention.

Fig. 8 is a view showing a state in which the ultraviolet irradiation unit shown in Fig. 7 is viewed from the vertical direction.

Fig. 9 is a cross-sectional view showing the configuration of a third embodiment of the ultraviolet irradiation unit of the present invention.

Fig. 10 is a perspective view showing a part of the ultraviolet irradiation unit viewed obliquely from above.

Fig. 11 is a view for explaining the configuration of a support for an excimer lamp.

Fig. 12 is a perspective view for explaining the lighting lamp for the room.

Fig. 13 is a cross-sectional view showing the configuration of a conventional ultraviolet irradiation treatment apparatus.

W‧‧‧Processed body

1B‧‧ ‧ excimer lamp

1D‧‧ ‧ excimer lamp

2A, 2C‧‧‧ Space enclosures

3B, 3D, 3F, 3H‧‧‧ gas supply agencies

5‧‧‧shade

6‧‧‧Transportation agencies

31B, 31D, 31F, 31H‧‧‧ openings

51‧‧‧ openings

52‧‧‧ top

61‧‧‧Multiple rollers

100‧‧‧UV irradiation unit

Claims (4)

An ultraviolet irradiation unit includes a plurality of excimer lamps each having a pair of electrodes formed on an outer surface of the discharge vessel via a sealed space in which a discharge gas is sealed in a sealed space formed in a discharge vessel, and surrounding a plurality of excimer lamps and a lamp cover that is opened in one direction in a vertical direction, and a gas supply mechanism for supplying an inert gas to the inside of the lamp cover; the ultraviolet irradiation unit characterized in that: in the lamp cover, the space enclosure is It is disposed in a space other than the space occupied by the excimer lamp and the gas supply mechanism. The ultraviolet irradiation unit according to claim 1, wherein the ultraviolet irradiation unit has the space enclosure disposed between the excimer lamps adjacent to each other, and the base end portion of the space enclosure is fixed to The top of the above lampshade. The ultraviolet irradiation unit according to the first aspect of the invention, wherein the ultraviolet irradiation unit is configured such that the space enclosure is disposed on a central axis of the excimer lamp, and each of the excimer lamps adjacent to each other is in a light-emitting field And superimposed on an imaginary straight line orthogonal to the central axis of the above excimer lamp. An ultraviolet irradiation treatment apparatus according to any one of claims 1 to 3, further comprising: conveying the central axis of the excimer lamp in a direction orthogonal to each other Body handling mechanism.