TWI393162B - Transmission bias mechanism of vacuum continuous carrier - Google Patents

Transmission bias mechanism of vacuum continuous carrier Download PDF

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Publication number
TWI393162B
TWI393162B TW97151487A TW97151487A TWI393162B TW I393162 B TWI393162 B TW I393162B TW 97151487 A TW97151487 A TW 97151487A TW 97151487 A TW97151487 A TW 97151487A TW I393162 B TWI393162 B TW I393162B
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Taiwan
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biasing device
contact
unit
vacuum
insulating material
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TW97151487A
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Chinese (zh)
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TW201025403A (en
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Ching Fu Yang
Kung Ming Hsu
Kaj Jeih Chang
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Metal Ind Res & Dev Ct
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Publication of TWI393162B publication Critical patent/TWI393162B/en

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Description

真空連續式載台傳輸偏壓裝置Vacuum continuous stage transmission biasing device

本發明係有關於一種偏壓裝置,詳言之,係關於一種真空連續式載台傳輸偏壓裝置。The present invention relates to a biasing device, and more particularly to a vacuum continuous stage transfer biasing device.

一般真空機械引入模組需具有在真空中直線運動及旋轉運動的功能。其中,直線運動功能即是控制有機物蒸發源與承載台(承載被蒸鍍工件)間的距離;旋轉運動功能是影響蒸鍍製程形成的鍍膜均勻性。Generally, the vacuum mechanical introduction module needs to have a function of linear motion and rotational motion in a vacuum. Among them, the linear motion function is to control the distance between the evaporation source of the organic matter and the carrying platform (bearing the vapor-deposited workpiece); the rotary motion function is to influence the uniformity of the coating formed by the evaporation process.

以有機發光二極體(OLED)為例,OLED被譽為次世代顯示器的背光源,其具有高亮度與低耗能的優點,現階段之OLED已有商品化的產品問世,且許多小尺寸的OLED面板,可應用於各種消費性電子產品之中。Taking organic light-emitting diodes (OLEDs) as an example, OLEDs are known as backlights for next-generation displays, which have the advantages of high brightness and low power consumption. At present, OLEDs have been commercialized, and many small sizes The OLED panel can be used in a variety of consumer electronics products.

然而,由於OLED的製程特性,其主要製程只能利用蒸鍍的方式進行,因此必須針對蒸鍍製程的需求製造一具功能性及適合方便操作的真空機械引入模組,使該蒸鍍製程可在真空環境中順利完成。However, due to the process characteristics of the OLED, the main process can only be carried out by means of evaporation. Therefore, it is necessary to manufacture a vacuum mechanical introduction module which is suitable for convenient operation for the requirements of the evaporation process, so that the evaporation process can be Successfully completed in a vacuum environment.

其中,若施予一RF或DC的負偏壓於該承載台,其可加強鍍膜的品質、提升濺鍍效率及可鍍膜的種類。然而,在習知技術中,真空機械引入模組的設計技術上,僅具有單獨旋轉運動或單獨的直線運動,或者,僅有批次式之真空設備均配有偏壓機構之功能,但在連續式之真空設備方面卻一直無配備此功能。因此,連續式真空蒸鍍製程之鍍膜之特性(附著性較差、顆粒不細緻及均勻性不佳)以及連續 式真空設備之應用領域無法提升。Wherein, if a negative bias of RF or DC is applied to the carrier, the quality of the coating can be enhanced, the sputtering efficiency and the type of coating can be enhanced. However, in the prior art, the design technique of the vacuum mechanical introduction module has only a single rotary motion or a separate linear motion, or only the batch type vacuum device is equipped with a biasing mechanism function, but Continuous vacuum equipment has not been equipped with this feature. Therefore, the characteristics of the coating of the continuous vacuum evaporation process (poor adhesion, poor particle size and poor uniformity) and continuous The application field of vacuum equipment cannot be improved.

在連續式之真空蒸鍍製程中,由於承載台於真空腔體中連續傳輸,因此要持續穩定性的施加偏壓於該承載台,具有非常大的困難性。In the continuous vacuum evaporation process, since the stage is continuously transported in the vacuum chamber, it is extremely difficult to apply a bias to the stage with continuous stability.

因此,有必要提供一創新且具有進步性之真空連續式載台傳輸偏壓裝置,以解決上述問題。Therefore, it is necessary to provide an innovative and progressive vacuum continuous stage transfer biasing device to solve the above problems.

本發明提供一種真空連續式載台傳輸偏壓裝置,用以傳輸一偏壓至一真空腔體中之一承載單元,該承載單元具有一第一接觸元件,該承載單元電性絕緣地結合一移動平台,該移動平台係沿一導引單元於該真空腔體中移動。The present invention provides a vacuum continuous stage transfer biasing device for transmitting a bias voltage to a load bearing unit in a vacuum chamber, the load bearing unit having a first contact element, the load bearing unit being electrically insulated and coupled a mobile platform that moves along the guiding unit in the vacuum chamber.

該真空連續式載台傳輸偏壓裝置電性絕緣地連接該真空腔體,該真空連續式載台傳輸偏壓裝置包括:一基座、一接觸單元及一電引入模組。該基座電性絕緣地固設於該真空腔體中。該接觸單元固設於該基座,用以電性接觸該第一接觸元件。該電引入模組電性絕緣地穿設於該真空腔體,用以將該偏壓傳導至該接觸單元。The vacuum continuous stage transmission biasing device is electrically and electrically connected to the vacuum chamber. The vacuum continuous stage transmission biasing device comprises: a base, a contact unit and an electrical lead-in module. The pedestal is electrically insulated from the vacuum chamber. The contact unit is fixed to the base for electrically contacting the first contact element. The electrical lead-in module is electrically insulated from the vacuum cavity for conducting the bias voltage to the contact unit.

本發明之真空連續式載台傳輸偏壓裝置可由大氣環境下傳輸偏壓至該真空腔體中之該承載單元,可有效維持該真空腔體之真空度。並且,該接觸單元能持續地接觸該第一接觸元件,以將偏壓持續穩定地傳導至該承載單元。藉此,本發明之該真空連續式載台傳輸偏壓裝置可提升鍍膜之均勻性、緻密性及附著性。The vacuum continuous stage transmission biasing device of the present invention can transmit a bias voltage to the carrying unit in the vacuum chamber in an atmospheric environment, and can effectively maintain the vacuum degree of the vacuum chamber. And, the contact unit can continuously contact the first contact element to continuously conduct the bias voltage to the carrier unit. Thereby, the vacuum continuous stage transfer biasing device of the present invention can improve the uniformity, compactness and adhesion of the coating.

圖1顯示本發明真空連續式載台傳輸偏壓裝置應用於一連續式真空設備之示意圖。其中,該連續式真空設備1具有一真空腔體11。該真空腔體11可為連續式真空物理氣相沉積(PVD)設備中之真空腔體。該真空連續式載台傳輸偏壓裝置2係用以傳輸一偏壓至該真空腔體11中之一承載單元12(用以承載被蒸鍍工件),其中,一蒸鍍源13設置於該承載單元12之上方相對位置。該承載單元12具有一第一接觸元件121。在本實施例中,該第一接觸元件121係為一金屬基板,設置於該承載單元12之一側邊且實質上垂直該承載單元12之表面。該承載單元12電性絕緣地結合一移動平台14,該移動平台14係沿一導引單元15(包括複數個滑輪)於該真空腔體11中移動。BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic illustration of the application of a vacuum continuous stage transfer biasing device of the present invention to a continuous vacuum apparatus. Among them, the continuous vacuum apparatus 1 has a vacuum chamber 11. The vacuum chamber 11 can be a vacuum chamber in a continuous vacuum physical vapor deposition (PVD) apparatus. The vacuum continuous stage transfer biasing device 2 is configured to transmit a bias voltage to one of the load carrying units 12 of the vacuum chamber 11 (for carrying the vapor-deposited workpiece), wherein an evaporation source 13 is disposed at the The relative position above the carrying unit 12. The carrier unit 12 has a first contact element 121. In this embodiment, the first contact element 121 is a metal substrate disposed on one side of the carrying unit 12 and substantially perpendicular to the surface of the carrying unit 12 . The carrying unit 12 is electrically insulated from the moving platform 14 , and the moving platform 14 moves along the guiding unit 15 (including a plurality of pulleys) in the vacuum chamber 11 .

該真空連續式載台傳輸偏壓裝置2電性絕緣地連接該真空腔體11,該真空連續式載台傳輸偏壓裝置2包括:一基座21、一第一絕緣材料22、一第一遮罩23、一接觸單元24、一第二絕緣材料25、一第二遮罩26及一電引入模組27。The vacuum continuous stage transmission biasing device 2 is electrically and electrically connected to the vacuum chamber 11. The vacuum continuous stage transmission biasing device 2 includes a base 21, a first insulating material 22, and a first The mask 23, a contact unit 24, a second insulating material 25, a second mask 26 and an electrical lead-in module 27.

在本實施例中,該承載單元12與該移動平台14之間設有該第一絕緣材料22,以使該承載單元12與該移動平台14電性絕緣,其中該第一絕緣材料22較佳係為鐵弗龍(teflon)。該第一遮罩23設置於該承載單元12與該第一絕緣材料22之間,該第一遮罩23完全遮蔽該第一絕緣材料22,藉此以防止該第一絕緣材料22在蒸鍍製程中鍍上金屬鍍膜而使該承載單元12電性導通至該移動平台14。In the embodiment, the first insulating material 22 is disposed between the carrying unit 12 and the moving platform 14 to electrically insulate the carrying unit 12 from the moving platform 14. The first insulating material 22 is preferably It is teflon. The first mask 23 is disposed between the carrying unit 12 and the first insulating material 22, and the first mask 23 completely shields the first insulating material 22, thereby preventing the first insulating material 22 from being evaporated. The metal plating film is plated in the process to electrically conduct the carrying unit 12 to the moving platform 14.

在本實施例中,該承載單元12、該第一絕緣材料22及該第一遮罩23係以固定元件16(例如:螺絲)固設於該移動平台14。要注意的是,該固定元件16與該承載單元12之間亦為電性絕緣(例如:設置絕緣材料於該固定元件16與該承載單元12之間),以防止該承載單元12與該移動平台14電性導通。In this embodiment, the carrying unit 12, the first insulating material 22 and the first mask 23 are fixed to the moving platform 14 by fixing elements 16 (for example, screws). It is to be noted that the fixing element 16 is also electrically insulated from the carrying unit 12 (for example, an insulating material is disposed between the fixing element 16 and the carrying unit 12) to prevent the carrying unit 12 from moving. The platform 14 is electrically conductive.

該基座21電性絕緣地固設於該真空腔體11中。在本實施例中,該基座21與該真空腔體11之間設有該第二絕緣材料25,以防止該基座21與該真空腔體11電性導通。其中,該第二絕緣材料25較佳係為鐵弗龍。該第二遮罩26設置於該基座21與該第二絕緣材料25之間,該第二遮罩26完全遮蔽該第二絕緣材料25,藉此以防止該第二絕緣材料25在蒸鍍製程中鍍上金屬鍍膜而使該基座21電性導通至該真空腔體11。The susceptor 21 is electrically insulated from the vacuum chamber 11 . In the embodiment, the second insulating material 25 is disposed between the susceptor 21 and the vacuum chamber 11 to prevent the susceptor 21 from being electrically connected to the vacuum chamber 11 . The second insulating material 25 is preferably Teflon. The second mask 26 is disposed between the base 21 and the second insulating material 25, and the second mask 26 completely shields the second insulating material 25, thereby preventing the second insulating material 25 from being evaporated. A metal plating film is plated in the process to electrically conduct the susceptor 21 to the vacuum chamber 11.

在本實施例中,該基座21、該第二遮罩26及該第二絕緣材料25係以固定元件17固設於該真空腔體,其中該固定元件17與該基座21之間亦為電性絕緣(例如:設置絕緣材料於該固定元件17與該基座21之間),以防止該基座21與該真空腔體11電性導通。In this embodiment, the susceptor 21, the second mask 26, and the second insulating material 25 are fixed to the vacuum chamber by a fixing member 17, wherein the fixing member 17 and the pedestal 21 are also It is electrically insulated (for example, an insulating material is disposed between the fixing member 17 and the susceptor 21) to prevent the susceptor 21 from being electrically connected to the vacuum chamber 11.

圖2顯示本發明接觸單元之示意圖。配合參考圖1及圖2,在本實施例中,該接觸單元24與該承載單元12皆位於該移動平台14之一相同側,該接觸單元24包括一固定座241、複數個第二接觸元件242及至少一彈性伸縮元件243,其中該彈性伸縮元件243連接該基座21及該固定座 241,該等第二接觸元件242結合於該固定座241,該等第二接觸元件242係為具導電性之滾子(如軸承)且與該第一接觸元件121(金屬基板)係為滾動接觸,以電性導通至該第一接觸元件121。其中,至少二第二接觸元件242同時接觸該第一接觸元件121,以確保偏壓可確實經該第一接觸元件121傳導至該承載單元12。要注意的是,依據不同應用,本發明之該接觸單元24亦可不包括該彈性伸縮元件243。Figure 2 shows a schematic view of the contact unit of the present invention. With reference to FIG. 1 and FIG. 2 , in the embodiment, the contact unit 24 and the carrying unit 12 are located on the same side of the mobile platform 14 . The contact unit 24 includes a fixing base 241 and a plurality of second contact elements. 242 and at least one elastic expansion element 243, wherein the elastic expansion element 243 is connected to the base 21 and the fixing base The second contact element 242 is coupled to the fixing base 241. The second contact element 242 is a conductive roller (such as a bearing) and is rolled with the first contact element 121 (metal substrate). Contact is electrically conducted to the first contact element 121. Wherein at least two second contact elements 242 simultaneously contact the first contact element 121 to ensure that a bias voltage can be reliably conducted to the carrier unit 12 via the first contact element 121. It should be noted that the contact unit 24 of the present invention may not include the elastic expansion element 243 according to different applications.

在本實施例中,該彈性伸縮元件243連接該基座21及該固定座241,用以容忍該承載單元12在移動時所產生之偏移,更可進一步確保該等接觸元件242能持續地接觸該第一接觸元件121,且可在該承載單元12離開後恢復成初始狀態,以準備接觸下一個承載單元。In this embodiment, the elastic expansion element 243 is coupled to the base 21 and the fixing base 241 for tolerating the displacement of the carrying unit 12 when moving, and further ensures that the contact elements 242 can be continuously The first contact element 121 is contacted and can be restored to an initial state after the carrier unit 12 leaves to prepare for contact with the next carrier unit.

該電引入模組27電性絕緣地穿設於該真空腔體11,用以將該偏壓傳導至該接觸單元24。在本實施例中,該電引入模組27包括一引入通道模組271及一導線272。該引入通道模組271電性絕緣地穿設於該真空腔體11,且該引入通道模組271與該真空腔體11之間係緊密地結合,故可保持該真空腔體11之真空狀態。該導線272通過該引入通道模組271且電性連接該接觸單元24,偏壓則經由該導線272傳導至該接觸單元24。其中,本發明之該真空連續式載台傳輸偏壓裝置2係可承受大於500伏特(V)之電壓及10安培(A)之電流。The electric lead-in module 27 is electrically insulated from the vacuum chamber 11 for conducting the bias voltage to the contact unit 24. In this embodiment, the electric lead-in module 27 includes an introduction channel module 271 and a wire 272. The introduction channel module 271 is electrically insulated from the vacuum cavity 11 , and the introduction channel module 271 is tightly coupled with the vacuum cavity 11 , so that the vacuum state of the vacuum cavity 11 can be maintained. . The lead wire 272 passes through the lead-in channel module 271 and is electrically connected to the contact unit 24 , and the bias voltage is transmitted to the contact unit 24 via the wire 272 . Wherein, the vacuum continuous stage transmission biasing device 2 of the present invention can withstand a voltage greater than 500 volts (V) and a current of 10 amps (A).

藉由本發明之該真空連續式載台傳輸偏壓裝置2,可由大氣環境下傳輸偏壓至真空環境(該真空腔體11)中之該承 載單元12,可有效維持該真空腔體11之真空度。並且,該接觸單元24可確保至少二第二接觸元件242同時接觸該第一接觸元件121,且該彈性伸縮元件243可容忍該承載單元12在移動時所產生之偏移,故可確保該等第二接觸元件242能持續地接觸該第一接觸元件121,以將偏壓持續穩定地傳導至該承載單元12。藉此,本發明之該真空連續式載台傳輸偏壓裝置2可提升鍍膜之均勻性、緻密性及附著性。By the vacuum continuous stage transfer biasing device 2 of the present invention, the bias can be transmitted from the atmosphere to the vacuum environment (the vacuum chamber 11) The loading unit 12 can effectively maintain the vacuum degree of the vacuum chamber 11. Moreover, the contact unit 24 can ensure that at least two second contact elements 242 simultaneously contact the first contact element 121, and the elastic expansion element 243 can tolerate the offset generated by the carrying unit 12 when moving, thereby ensuring such The second contact element 242 can continuously contact the first contact element 121 to continuously conduct the bias voltage to the carrier unit 12. Thereby, the vacuum continuous stage transfer biasing device 2 of the present invention can improve the uniformity, compactness and adhesion of the coating.

上述實施例僅為說明本發明之原理及其功效,並非限制本發明。因此習於此技術之人士對上述實施例進行修改及變化仍不脫本發明之精神。本發明之權利範圍應如後述之申請專利範圍所列。The above embodiments are merely illustrative of the principles and effects of the invention and are not intended to limit the invention. Therefore, those skilled in the art can make modifications and changes to the above embodiments without departing from the spirit of the invention. The scope of the invention should be as set forth in the appended claims.

1‧‧‧連續式真空設備1‧‧‧Continuous vacuum equipment

2‧‧‧本發明真空連續式載台傳輸偏壓裝置2‧‧‧Vacuum continuous stage transfer biasing device of the present invention

11‧‧‧真空腔體11‧‧‧Vacuum chamber

12‧‧‧承載單元12‧‧‧ Carrying unit

13‧‧‧蒸鍍源13‧‧‧vapor deposition source

14‧‧‧移動平台14‧‧‧Mobile platform

15‧‧‧導引單元15‧‧‧Guide unit

16‧‧‧固定元件16‧‧‧Fixed components

17‧‧‧固定元件17‧‧‧Fixed components

21‧‧‧基座21‧‧‧Base

22‧‧‧第一絕緣材料22‧‧‧First insulating material

23‧‧‧第一遮罩23‧‧‧First mask

24‧‧‧接觸單元24‧‧‧Contact unit

25‧‧‧第二絕緣材料25‧‧‧Second insulation material

26‧‧‧第二遮罩26‧‧‧ second mask

27‧‧‧電引入模組27‧‧‧Electrical introduction module

121‧‧‧第一接觸元件121‧‧‧First contact element

241‧‧‧固定座241‧‧‧ Fixed seat

242‧‧‧第二接觸元件242‧‧‧Second contact element

243‧‧‧彈性伸縮元件243‧‧‧Flexible expansion elements

271‧‧‧引入通道模組271‧‧‧Introduction channel module

272‧‧‧導線272‧‧‧ wire

圖1顯示本發明真空連續式載台傳輸偏壓裝置應用於一連續式真空設備之示意圖;及圖2顯示本發明接觸單元之示意圖。1 shows a schematic view of a vacuum continuous stage transfer biasing device of the present invention applied to a continuous vacuum apparatus; and FIG. 2 shows a schematic view of the contact unit of the present invention.

1‧‧‧連續式真空設備1‧‧‧Continuous vacuum equipment

2‧‧‧本發明真空連續式載台傳輸偏壓裝置2‧‧‧Vacuum continuous stage transfer biasing device of the present invention

11‧‧‧真空腔體11‧‧‧Vacuum chamber

12‧‧‧承載單元12‧‧‧ Carrying unit

13‧‧‧蒸鍍源13‧‧‧vapor deposition source

14‧‧‧移動平台14‧‧‧Mobile platform

15‧‧‧導引單元15‧‧‧Guide unit

16‧‧‧固定元件16‧‧‧Fixed components

17‧‧‧固定元件17‧‧‧Fixed components

21‧‧‧基座21‧‧‧Base

22‧‧‧第一絕緣材料22‧‧‧First insulating material

23‧‧‧第一遮罩23‧‧‧First mask

24‧‧‧接觸單元24‧‧‧Contact unit

25‧‧‧第二絕緣材料25‧‧‧Second insulation material

26‧‧‧第二遮罩26‧‧‧ second mask

27‧‧‧電引入模組27‧‧‧Electrical introduction module

121‧‧‧第一接觸元件121‧‧‧First contact element

241‧‧‧固定座241‧‧‧ Fixed seat

242‧‧‧第二接觸元件242‧‧‧Second contact element

243‧‧‧彈性伸縮元件243‧‧‧Flexible expansion elements

271‧‧‧引入通道模組271‧‧‧Introduction channel module

272‧‧‧導線272‧‧‧ wire

Claims (14)

一種真空連續式載台傳輸偏壓裝置,用以傳輸一偏壓至一真空腔體中之一承載單元,該承載單元具有一第一接觸元件,該承載單元電性絕緣地結合一移動平台,該移動平台係沿一導引單元於該真空腔體中移動,該真空連續式載台傳輸偏壓裝置電性絕緣地連接該真空腔體,該真空連續式載台傳輸偏壓裝置包括:一基座,電性絕緣地固設於該真空腔體中;一接觸單元,固設於該基座,該接觸單元與該承載單元位於該移動平台之一相同側,用以電性接觸該第一接觸元件;及一電引入模組,電性絕緣地穿設於該真空腔體,用以將該偏壓傳導至該接觸單元。 A vacuum continuous stage transmission biasing device for transmitting a biasing force to a carrying unit in a vacuum chamber, the carrying unit having a first contact element electrically coupled to a mobile platform The mobile platform moves along the guiding unit in the vacuum chamber, and the vacuum continuous stage transmitting biasing device electrically connects the vacuum chamber. The vacuum continuous stage transmitting biasing device comprises: a susceptor is electrically insulated from the vacuum cavity; a contact unit is fixed to the pedestal, and the contact unit and the carrying unit are located on the same side of the mobile platform for electrically contacting the first a contact element; and an electrical lead-in module, electrically insulated from the vacuum cavity for conducting the bias voltage to the contact unit. 如請求項1之偏壓裝置,其中該第一接觸元件係為一金屬基板。 The biasing device of claim 1, wherein the first contact element is a metal substrate. 如請求項1之偏壓裝置,另包括一第一絕緣材料,設置於該承載單元與該移動平台之間。 The biasing device of claim 1, further comprising a first insulating material disposed between the carrying unit and the mobile platform. 如請求項3之偏壓裝置,其中該第一絕緣材料係為鐵弗龍(teflon)。 The biasing device of claim 3, wherein the first insulating material is teflon. 如請求項3之偏壓裝置,另包括一第一遮罩,設置於該承載單元與該第一絕緣材料之間,其完全遮蔽該第一絕緣材料。 The biasing device of claim 3, further comprising a first mask disposed between the carrying unit and the first insulating material to completely shield the first insulating material. 如請求項1之偏壓裝置,其中該接觸單元包括至少一第二接觸元件。 The biasing device of claim 1, wherein the contact unit comprises at least one second contact element. 如請求項6之偏壓裝置,其中該接觸單元另包括一固定座及至少一彈性伸縮元件,該彈性伸縮元件連接該基座及該固定座,該第二接觸元件結合於該固定座。 The biasing device of claim 6, wherein the contact unit further comprises a fixing base and at least one elastic expansion element, the elastic expansion element connecting the base and the fixing base, and the second contact element is coupled to the fixing base. 如請求項6之偏壓裝置,其中該第二接觸元件係為具導電性之滾子,其與該第一接觸元件滾動接觸。 The biasing device of claim 6, wherein the second contact element is a conductive roller that is in rolling contact with the first contact element. 如請求項6之偏壓裝置,其中該接觸單元包括複數個第二接觸元件,其中至少二第二接觸元件同時接觸該第一接觸元件。 The biasing device of claim 6, wherein the contact unit comprises a plurality of second contact elements, wherein at least two of the second contact elements simultaneously contact the first contact element. 如請求項1之偏壓裝置,另包括一第二絕緣材料,設置於該基座與該真空腔體之間。 The biasing device of claim 1, further comprising a second insulating material disposed between the base and the vacuum chamber. 如請求項10之偏壓裝置,其中該第二絕緣材料係為鐵弗龍。 The biasing device of claim 10, wherein the second insulating material is Teflon. 如請求項10之偏壓裝置,另包括一第二遮罩,設置於該基座與該第二絕緣材料之間,其完全遮蔽該第二絕緣材料。 The biasing device of claim 10, further comprising a second mask disposed between the base and the second insulating material to completely shield the second insulating material. 如請求項1之偏壓裝置,其中該電引入模組包括一引入通道模組及一導線,該引入通道模組電性絕緣地穿設於該真空腔體,該導線通過該引入通道模組且電性連接該接觸單元。 The biasing device of claim 1, wherein the electric lead-in module includes a lead-in channel module and a wire, the lead-in channel module is electrically insulated from the vacuum cavity, and the wire passes through the lead-in channel module And electrically connecting the contact unit. 如請求項1之偏壓裝置,其係可承受大於500伏特(V)之電壓及10安培(A)之電流。The biasing device of claim 1 is capable of withstanding a voltage greater than 500 volts (V) and a current of 10 amps (A).
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TW513900B (en) * 1999-06-25 2002-12-11 Electro Scient Ind Inc Electronic component handler
TWM248948U (en) * 2004-01-05 2004-11-01 Chung-Hsien Cheng Air-cooled connector for plasma apparatus
TWI240759B (en) * 2004-06-14 2005-10-01 Hsiuping Inst Technology The real-time adjustable mechanism of the shielding plate in the sputtering vacuum chamber design
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4042128A (en) * 1975-11-26 1977-08-16 Airco, Inc. Substrate transfer apparatus for a vacuum coating system
TW513900B (en) * 1999-06-25 2002-12-11 Electro Scient Ind Inc Electronic component handler
CN1800442A (en) * 2000-05-22 2006-07-12 基础资源有限公司 Coating substrates plating method
TWM248948U (en) * 2004-01-05 2004-11-01 Chung-Hsien Cheng Air-cooled connector for plasma apparatus
TWI240759B (en) * 2004-06-14 2005-10-01 Hsiuping Inst Technology The real-time adjustable mechanism of the shielding plate in the sputtering vacuum chamber design

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