TWI391607B - Light irradiation device - Google Patents

Light irradiation device Download PDF

Info

Publication number
TWI391607B
TWI391607B TW098131926A TW98131926A TWI391607B TW I391607 B TWI391607 B TW I391607B TW 098131926 A TW098131926 A TW 098131926A TW 98131926 A TW98131926 A TW 98131926A TW I391607 B TWI391607 B TW I391607B
Authority
TW
Taiwan
Prior art keywords
plate
light
mirror
partition wall
plaque
Prior art date
Application number
TW098131926A
Other languages
Chinese (zh)
Other versions
TW201018835A (en
Inventor
Nobuchika Momochi
Kazuyoshi Suzuki
Kota Suzuki
Original Assignee
Ushio Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Electric Inc filed Critical Ushio Electric Inc
Publication of TW201018835A publication Critical patent/TW201018835A/en
Application granted granted Critical
Publication of TWI391607B publication Critical patent/TWI391607B/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008Production of exposure light, i.e. light sources
    • G03F7/7005Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/70141Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/7015Details of optical elements
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/702Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70233Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70275Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Arrangement Of Elements, Cooling, Sealing, Or The Like Of Lighting Devices (AREA)

Description

光照射裝置Light irradiation device

本發明,是有關使用於半導體元件和印刷電路基板、液晶基板等的製造用的曝光裝置的光照射裝置,特別是有關於具備複數燈泡的光照射裝置。The present invention relates to a light irradiation device for use in an exposure device for manufacturing a semiconductor element, a printed circuit board, a liquid crystal substrate, or the like, and more particularly to a light irradiation device including a plurality of bulbs.

作為半導體元件和印刷電路基板、液晶顯示基板的曝光裝置所使用的光源,主要是使用從數kW至數10kW的大型的超高壓水銀燈泡。這些的光源,是信賴性也較高,從以前就有使用。As a light source used for an exposure device of a semiconductor element, a printed circuit board, or a liquid crystal display substrate, a large-sized ultrahigh pressure mercury bulb of several kW to several 10 kW is mainly used. These light sources are also highly reliable and have been used since.

近年來,液晶顯示基板和印刷電路基板的大面積化,隨其也期望在曝光裝置中光照射領域的擴大,曝光用光源也要求大型化。In recent years, the liquid crystal display substrate and the printed circuit board have been increased in size, and it is also desired to expand the field of light irradiation in the exposure apparatus, and the exposure light source is also required to be increased in size.

作為具備大型的曝光用光源的光照射裝置,例如專利文獻1,被提案由複數燈泡及將從該燈泡被放射的光反射的反射鏡(集光鏡)所構成的光源的光照射裝置。For example, Patent Document 1 proposes a light irradiation device including a light source including a plurality of light bulbs and a mirror (light collecting mirror) that reflects light emitted from the light bulb.

在第9圖中,揭示於專利文獻1的習知的光照射裝置的結構。In Fig. 9, the structure of a conventional light irradiation device disclosed in Patent Document 1 is disclosed.

光源10是使用例如2個燈泡1a、1b及集光鏡2a、2b。2個集光鏡2a、2b,是分別使第2焦點一致的方式被配置。The light source 10 uses, for example, two bulbs 1a and 1b and collecting mirrors 2a and 2b. The two collecting mirrors 2a and 2b are arranged such that the second focal points coincide with each other.

第10圖是顯示如第9圖所示的光源10的結構的圖。如同圖所示,集光鏡2a、2b,是將其一部分對於集光鏡2a、2b的光軸L傾斜地切取,使此切除的切斷面S彼此之間平行並將集光鏡2a、2b的第2焦點f共有的方式配置。Fig. 10 is a view showing the structure of the light source 10 as shown in Fig. 9. As shown in the figure, the collecting mirrors 2a, 2b are cut obliquely from the optical axis L of the collecting mirrors 2a, 2b such that the cut cutting faces S are parallel to each other and the collecting mirrors 2a, 2b The second focus f is configured in a common manner.

返回至第9圖,來自光源10的光,是由第1平面鏡3折返,入射至被放置於集光鏡2a、2b的第2焦點位置的積分器透鏡4。藉由積分器透鏡4使在被照射面8中的照度分布成為均一的方式被調整之光,是隔著擋板5,由第2平面鏡6折返,由瞄準透鏡7使中心光線成為平行地被照射於光照射面8。Returning to Fig. 9, the light from the light source 10 is folded back by the first plane mirror 3, and is incident on the integrator lens 4 placed at the second focus position of the collecting mirrors 2a, 2b. The light that is adjusted so that the illuminance distribution in the illuminated surface 8 is uniform by the integrator lens 4 is folded back by the second plane mirror 6 via the shutter 5, and the center ray is made parallel by the aiming lens 7. It is irradiated to the light irradiation surface 8.

對於具備由複數燈泡及集光鏡所構成被的光源的光照射裝置,如第10圖所示將集光鏡的一部分切開配置的理由是因為,被照射在光照射面8的光的瞄準角(視角)θ不會加大,光的利用效率可提高,光照射面8中的照度可提高。In the light irradiation device including the light source composed of the plurality of light bulbs and the condensing mirror, the reason why the light absorbing mirror is partially cut away as shown in FIG. 10 is because the aiming angle of the light irradiated on the light irradiation surface 8 is The (viewing angle) θ is not increased, the light utilization efficiency can be improved, and the illuminance in the light irradiation surface 8 can be improved.

[專利文獻1]日本特開2004-245912號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2004-245912

[專利文獻2]日本特開2008-83586號公報[Patent Document 2] Japanese Patent Laid-Open Publication No. 2008-83586

但是,如第10圖所示,將集光鏡切開並列的話,相鄰接的燈泡及燈泡之間,就不會彼此遮住彼此。However, as shown in Fig. 10, if the concentrating mirror is cut and juxtaposed, the adjacent bulb and the bulb will not cover each other.

因此,假設,在點燈中在有1個燈泡破裂的問題發生時,該破裂的燈泡的破片到達相隣的燈泡為止,依據情況有可能引起弄傷其他燈泡的二次的問題。Therefore, it is assumed that when a problem of rupture of one bulb occurs in the lighting, the fragment of the ruptured bulb reaches the adjacent bulb, which may cause a secondary problem of injuring other bulbs depending on the situation.

為了防止這種問題發生,考慮在並列配置的集光鏡及集光鏡之間設置隔壁,例如燈泡即使破裂,其破片也不會到達相隣的燈泡。In order to prevent such a problem from occurring, it is considered that a partition wall is provided between the concentrating mirror and the concentrating mirror arranged side by side. For example, even if the bulb is broken, the fragment does not reach the adjacent bulb.

例如,在專利文獻2的曝光用光源中,設置的目的雖不同,但是同樣在集光鏡及集光鏡之間設置隔壁。For example, in the light source for exposure of Patent Document 2, the purpose of installation is different, but a partition wall is provided between the concentrating mirror and the condensing mirror.

但是,因為該隔壁只是將板狀的構件配置於集光鏡之間所以會發生以下的問題。However, since the partition wall only arranges the plate-like members between the collecting mirrors, the following problems occur.

第11圖,是顯示施加於作為隔壁使用的板狀構件的力的圖。Fig. 11 is a view showing the force applied to the plate-like member used as the partition wall.

如第11圖(a)所示,在集光鏡及集光鏡之間配置一枚的板狀的構件100的話,板狀構件100,在燈泡點燈中是由從燈泡1被放射的光B所加熱,接近燈泡1的中央部(圖中被圓線包圍的斜線部)101會成為高溫,其結果,中央部101是發生欲朝向外側膨脹的力F1。As shown in Fig. 11(a), when one plate-shaped member 100 is disposed between the collecting mirror and the collecting mirror, the plate-like member 100 is light emitted from the bulb 1 in the bulb lighting. When B is heated, the central portion (the oblique portion surrounded by the round line in the drawing) 101 near the bulb 1 is heated to a high temperature, and as a result, the central portion 101 is a force F1 that is intended to expand outward.

另一方面,遠離燈泡1的板狀構件100的周邊部102,其與中央部101相比溫度上昇減少,熱膨脹的量也小。On the other hand, the peripheral portion 102 of the plate-like member 100 that is away from the bulb 1 has a lower temperature rise than the central portion 101, and the amount of thermal expansion is also small.

因此,如第11圖(b)所示,在中央部101所產生的欲膨脹的力F1,是從不太膨脹的周邊部102被緊壓,中央部101,是成為從周邊部102受到相反地壓縮的力F2。因此,在中央部101中,產生對於板狀構件100的平面直交的方向的力F3,其結果,中央部101會發生朝對於板狀構件100的平面直交的方向膨脹(彎曲)的被稱為「彎曲」的變形。Therefore, as shown in Fig. 11(b), the force F1 to be expanded which is generated in the central portion 101 is pressed from the peripheral portion 102 which is not expanded, and the central portion 101 is reversed from the peripheral portion 102. Ground compression force F2. Therefore, in the central portion 101, a force F3 in a direction orthogonal to the plane of the plate-like member 100 is generated, and as a result, the central portion 101 is expanded (bent) in a direction orthogonal to the plane of the plate-like member 100. "Bending" deformation.

如上述,在光照射裝置的光源中,作為隔壁的板狀構件,是成為集光鏡及集光鏡之間的配置。但是,將此隔壁配置的集光鏡及集光鏡的間隔,是為了減少來自燈泡的光不被反射的成分,儘可能愈窄較佳。As described above, in the light source of the light irradiation device, the plate-shaped member as the partition wall is disposed between the collecting mirror and the collecting mirror. However, the interval between the collecting mirror and the collecting mirror disposed on the partition wall is preferably as narrow as possible in order to reduce the amount of light from the bulb that is not reflected.

因此,在該狹窄場所,在隔壁即板狀構件發生由彎曲所產生的變形的話,變形的板狀構件會按壓集光鏡的緣而將集光鏡弄傷,依據情況也有可能破損。Therefore, in the narrow place, when the plate-shaped member which is a partition wall is deformed by the bending, the deformed plate-shaped member presses the edge of the collecting mirror to injure the collecting mirror, and may be damaged depending on the situation.

本發明,是考慮上述問題點,本發明的目的是提供一種光照射裝置,對於具備複數燈泡及反射鏡的光照射裝置,在反射鏡及反射鏡之間設置隔壁的情況,隔壁不會朝對於隔壁的平面直交的方向發生膨脹而變形(彎曲)。The present invention has been made in view of the above problems, and an object of the present invention is to provide a light irradiation device. When a partition wall is provided between a mirror and a mirror for a light irradiation device including a plurality of bulbs and a mirror, the partition wall does not face the pair. The plane of the partition wall is expanded and deformed (bent).

為了解決上述課題,在本發明中,一種光照射裝置,是具備:複數燈泡、及各別設在該複數燈泡的周圍並將來自各燈泡的光反射的反射鏡、及設在該反射鏡及反射鏡之間的隔壁,該隔壁,是具備:將長度方向對齊地並列的複數長方形狀的板狀構件、及將此複數板狀構件支撐的支柱,該板狀構件,是對於支柱,容許沿著由熱膨脹所產生的板狀構件的長度方向的伸縮(移動)的方式被安裝。In order to solve the above problems, in the present invention, a light irradiation device includes: a plurality of light bulbs; and mirrors respectively disposed around the plurality of light bulbs to reflect light from the respective bulbs; and the mirrors are disposed on the mirrors and a partition wall between the mirrors, the partition wall having a plurality of rectangular plate-shaped members arranged in parallel in the longitudinal direction, and a support for supporting the plurality of plate-shaped members, the plate-like members being allowed to be along the pillars The expansion and movement (movement) of the plate-like member by thermal expansion in the longitudinal direction is mounted.

將板狀構件支撐在支柱的具體的方法,是如以下。A specific method of supporting the plate member on the pillar is as follows.

將板狀構件橫長配置的情況時,在板狀構件形成沿著其長度方向的長孔。且將螺絲或是銷插入此長孔,藉由將被插入的螺絲或是銷固定於支柱,將板狀構件支撐在支柱。When the plate-like members are arranged horizontally, the plate-like members form long holes along the longitudinal direction thereof. A screw or a pin is inserted into the long hole, and the plate member is supported by the support by fixing the inserted screw or pin to the support.

或者是在支柱形成沿著板狀構件的長度方向的長孔。且將螺絲或是銷插入此長孔,藉由將被插入的螺絲或是銷固定於板狀構件,將板狀構件支撐在支柱。Alternatively, a long hole along the longitudinal direction of the plate member is formed in the pillar. A screw or a pin is inserted into the long hole, and the plate-like member is supported by the support by fixing the inserted screw or pin to the plate-like member.

藉由如此支撐,板狀構件,是對於形成於板狀構件或是支柱的長孔部部分,可使該長度方向的對於支柱的由熱膨脹所產生的移動成為可能。By supporting in this manner, the plate-like member is a portion of the long hole portion formed in the plate-like member or the pillar, and the movement of the pillar in the longitudinal direction by thermal expansion can be made possible.

且,將板狀構件縱長配置的情況時,將其上端安裝在支柱,下端不固定。板狀構件,是使朝其長度方向也就是重力方向的由熱膨脹所產生的移動成為可能。Further, when the plate-like members are arranged vertically, the upper end is attached to the pillar, and the lower end is not fixed. The plate-like member makes it possible to move by thermal expansion in the longitudinal direction, that is, the direction of gravity.

又,將長度方向對齊地並列的板狀構件,是無論是橫長配置的情況,或縱長配置的情況,在相鄰接的板狀構件之間形成間隙的方式支撐在支柱較佳。Further, the plate-like members which are aligned in the longitudinal direction are preferably supported by the support members so as to form a gap between the adjacent plate-like members in the case of the horizontally long arrangement or the vertically long arrangement.

且,在上述的光照射裝置中,光源使用4個的燈泡及反射鏡的情況時,將隔壁在中央交叉配置成十字型,在由此隔壁形成被4個象限,設置各燈泡及將來自該燈泡的光反射的反射鏡。Further, in the above-described light irradiation device, when four light bulbs and mirrors are used as the light source, the partition walls are arranged in a cross shape at the center, and four quadrants are formed on the partition walls, and the respective bulbs are provided and The reflector of the light reflection of the bulb.

進一步,在上述的光源中,各反射鏡是將90°方向的2處切除形成缺口,將缺口部分彼此相向地配置,隔壁是配置於該缺口及缺口之間。Further, in the above-described light source, each of the mirrors is formed by cutting two places in the 90° direction to form a notch, and the notched portions are disposed to face each other, and the partition wall is disposed between the notch and the notch.

在本發明的光照射裝置中,藉由在將來自燈泡的光反射的反射鏡及反射鏡之間設置隔壁,將形成壁面的板狀構件,由在長度方向對齊地並列的複數長方形狀的板狀構件所構成,就可窄縮一枚一枚的板狀構件的寬度,減少各板狀構件中的寬度方向的溫度差。藉此使板狀構件因熱膨脹而大大地延伸的方向,可以限定於板的長度方向。In the light-emitting device of the present invention, a partition wall is provided between a mirror that reflects light from the bulb and the mirror, and the plate-shaped member that forms the wall surface is a plurality of rectangular plates that are aligned in the longitudinal direction. By forming the member, the width of one plate member can be narrowed, and the temperature difference in the width direction of each plate member can be reduced. The direction in which the plate-like member is greatly extended by thermal expansion can be limited to the longitudinal direction of the plate.

且,因為各板狀構件,對於各別將板狀構件支撐的支柱,容許朝由熱膨脹所產生的長度方向的延伸的方式安裝,所以在燈泡點燈中,板狀構件不會發生朝對於本身的平面直交的方向膨脹的變形(彎曲)。Further, since each of the plate-like members is attached to each of the pillars supporting the plate-like members so as to extend in the longitudinal direction due to thermal expansion, the plate-like members do not occur toward the self in the bulb lighting. The plane is orthogonal to the direction of deformation (bending).

因此,即使將隔壁設在反射鏡及反射鏡之間的間隔的狹窄部分,也不會將反射鏡弄傷。Therefore, even if the partition wall is provided in a narrow portion of the space between the mirror and the mirror, the mirror is not injured.

且,藉由將板狀構件,在相鄰接的板狀構件之間形成間隙的方式安裝於支柱,各板狀構件熱膨脹時,在相鄰接的板狀構件中熱膨脹的量(伸縮的長度)雖不同,但是彼此之間不會相互磨擦,可以防止垃圾的發生。進一步,對於板狀構件的朝寬度方向的膨脹也可充余地對應。Further, the plate-like member is attached to the pillar so as to form a gap between the adjacent plate-like members, and when each of the plate-shaped members thermally expands, the amount of thermal expansion in the adjacent plate-like members (the length of expansion and contraction) Although they are different, they do not rub each other and prevent garbage from happening. Further, the expansion of the plate-like member in the width direction can also be satisfactorily matched.

又,在使用4個燈泡及集光鏡的光照射裝置中,藉由將隔壁交叉配置成十字型,在將形成隔壁的長方形狀的板狀構件橫長配置的情況時,特別是在板狀構件的一端側(隔壁交叉側的相反側),容易成為讓板狀構件可以藉由熱膨脹延伸的自由的空間。Further, in the light irradiation device using four light bulbs and the condensing mirror, when the partition walls are arranged in a cross shape, when the rectangular plate-shaped members forming the partition walls are arranged horizontally, particularly in the form of a plate One end side of the member (the opposite side to the side where the partition wall intersects) is likely to be a free space in which the plate-like member can be extended by thermal expansion.

且,上述的光照射裝置的情況,反射鏡是在90°方向2處切除形成缺口,將缺口彼此相向配置的方式的話,4個的反射鏡成為相同形狀就可以共通化。由此可以達成裝置整體的成本下降。Further, in the case of the light irradiation device described above, when the mirror is cut at a 90° direction to form a notch and the notches are arranged to face each other, the four mirrors can be formed in the same shape. This makes it possible to achieve a cost reduction of the entire device.

第1圖,是顯示本發明的光照射裝置的概略構成的圖。又,對於與第9圖相同者是附加相同符號。Fig. 1 is a view showing a schematic configuration of a light irradiation device of the present invention. In addition, the same symbols are attached to the same as in Fig. 9.

與第9圖之間的相異,是在由複數燈泡構成的光源的集光鏡及集光鏡之間設置隔壁20的點,其他的結構基本上相同。The difference from Fig. 9 is that the partition wall 20 is provided between the collecting mirror of the light source composed of the plurality of bulbs and the collecting mirror, and the other structures are basically the same.

第2圖,是顯示如第1圖所示的隔壁的第1實施例的結構的圖。Fig. 2 is a view showing the configuration of the first embodiment of the partition wall shown in Fig. 1.

如同圖所示,隔壁20,是由:複數(圖中為8枚)的細長的長方形狀的板(以下稱為詩箋板)21、及將此複數詩箋板21由兩端支撐的2條的支柱22、23所構成被。As shown in the figure, the partition wall 20 is composed of a plurality of (in the figure, eight) elongated rectangular plates (hereinafter referred to as a slab) 21 and two slabs 21 supported by both ends. The pillars 22 and 23 of the strip are constructed.

供防止燈泡破裂時的破片到達隣的燈泡用的壁面的部分,是藉由將此詩箋板一致地將長度方向橫向並上下方向複數並列地構成。又,在同圖中,在壁面的下部,也顯示將支柱固定的框架。The portion for preventing the breakage of the bulb from reaching the wall surface of the adjacent bulb is formed by juxtending the length of the plaque in the horizontal direction and the vertical direction in parallel. Further, in the same figure, a frame for fixing the pillars is also displayed on the lower portion of the wall surface.

詩箋板21,是可耐由來自燈泡的光所產生的加熱(推定的到達溫度是400℃~600℃),且因為是比較便宜的素材所以採用不銹鋼板。The plaque board 21 is resistant to heat generated by light from a bulb (estimated arrival temperature is 400 ° C to 600 ° C), and is a stainless steel plate because it is a relatively inexpensive material.

且,在詩箋板21殘留由加工所產生的內部變形的話,因為彎曲發生容易,且其變形量也變大,所以作為詩箋板使用的不銹鋼板是施加退火(annealing)加工將變形去除。Further, when the inner deformation of the plaque plate 21 is left by the processing, since the bending is easy to occur and the amount of deformation is also large, the stainless steel plate used as the plaque plate is subjected to an annealing process to remove the deformation.

又,本實施例中的詩箋板21的1枚的大小,是長度600mm、寬度30mm、厚度6mm。Further, the size of one piece of the plaque plate 21 in the present embodiment is a length of 600 mm, a width of 30 mm, and a thickness of 6 mm.

在此,詩箋板21的長度,是對應於形成於集光鏡的缺口的長度,成為缺口的長度以上的方式被設計。Here, the length of the plaque 21 is designed to correspond to the length of the notch formed in the concentrating mirror and to be equal to or longer than the length of the notch.

且,厚度,是破裂的燈泡的破片撞到詩箋板時,計算該破片不會穿過詩箋板的方式設計厚度。Moreover, the thickness is such that when the fragment of the broken bulb hits the poetry board, the thickness of the fragment is calculated without passing through the poetry board.

且,寬度,是詩箋板的厚度是在上述的厚度時,計算在寬度方向不會因溫度分布而產生彎曲的方式設計距離。Further, the width is a design distance in which the thickness of the plaque plate is the thickness described above, and the bending is not caused by the temperature distribution in the width direction.

第3圖,是將詩箋板21支撐在支柱22、23的部分的擴大圖。Fig. 3 is an enlarged view of a portion in which the plaque plate 21 is supported by the pillars 22, 23.

如同圖所示,在詩箋板21的長度方向的端部,形成沿著其長度方向的長孔的貫通孔30,將螺絲40或是銷50插入此貫通孔30。且,將插入的螺絲40或是銷50固定於支柱22、23。由此使詩箋板21被支撐於22、23支柱。As shown in the figure, a through hole 30 having a long hole along the longitudinal direction is formed at an end portion of the plaque 21 in the longitudinal direction, and the screw 40 or the pin 50 is inserted into the through hole 30. Further, the inserted screw 40 or the pin 50 is fixed to the stays 22, 23. Thereby, the plaque 21 is supported by the 22 and 23 pillars.

又,後述的方式,在詩箋板21的兩端形成貫通孔30的情況,不需要雙方皆為長孔,只有將形成於任一方的端的貫通孔形成長孔即可。Further, in the embodiment described later, when the through holes 30 are formed at both ends of the plaque plate 21, it is not necessary to form long holes for both of them, and only the through holes formed at one of the ends may be formed as long holes.

第3圖(a)及第3圖(b),是顯示將詩箋板21藉由螺絲40安裝在支柱23的例的圖。第3圖(a)是其立體圖,第3圖(b)是其剖面圖。FIGS. 3(a) and 3(b) are views showing an example in which the plaque plate 21 is attached to the pillar 23 by the screw 40. Fig. 3(a) is a perspective view thereof, and Fig. 3(b) is a cross-sectional view thereof.

在支柱23,形成將詩箋板21支撐的螺絲40用的螺孔60,且在詩箋板21中形成貫通孔30。詩箋板21因為是朝長度方向熱膨脹,所以貫通孔30是考慮該熱膨脹的量,形成在詩箋板21的長度方向具有長度為數毫米的長孔。In the pillar 23, a screw hole 60 for the screw 40 supporting the plaque plate 21 is formed, and a through hole 30 is formed in the plaque plate 21. Since the plaque plate 21 is thermally expanded in the longitudinal direction, the through hole 30 is formed in a long hole having a length of several millimeters in the longitudinal direction of the plaque plate 21 in consideration of the amount of thermal expansion.

接著,在螺絲40的軸41,將彈簧墊圈42及平墊圈43放入之後,通過被稱為軸環44的筒狀的構件,與此軸環44一起將螺絲40插入貫通孔30,螺固在支柱23。軸環44是比詩箋板21的板厚(6mm)高,且,貫通孔30的徑是比軸環44的外徑更大。Next, after the spring washer 42 and the flat washer 43 are placed on the shaft 41 of the screw 40, the screw 40 is inserted into the through hole 30 together with the collar 44 by a cylindrical member called the collar 44, and is screwed. In the pillar 23. The collar 44 is higher than the plate thickness (6 mm) of the plaque plate 21, and the diameter of the through hole 30 is larger than the outer diameter of the collar 44.

螺絲40是被旋直到緊墊圈42、43接觸軸環44處為止。如上述因為軸環44是比詩箋板21的板厚更高,所以詩箋板21是對於支柱23未完全地被固定。詩箋板21,是藉由所形成的貫通孔30的長孔分,對於支柱23容許由熱膨脹所產生的伸縮的移動的方式被支撐。The screw 40 is rotated until the tight washers 42, 43 contact the collar 44. As described above, since the collar 44 is higher than the thickness of the plaque 21, the plaque 21 is not completely fixed to the pillar 23. The slab 21 is supported by the long hole of the through hole 30 formed, and the support 23 is allowed to move by expansion and contraction due to thermal expansion.

第3圖(c),是顯示將詩箋板21藉由銷50安裝在支柱22的例的圖。Fig. 3(c) is a view showing an example in which the stacking board 21 is attached to the stay 22 by the pin 50.

在此例中,支柱22是字(U字)型,在兩側形成通過銷50固定的銷孔70。在詩箋板21中雖形成貫通孔30,但是此貫通孔30,是與上述同樣,考慮由詩箋板21的熱膨脹所產生的伸縮,在詩箋板21的長度方向形成長度為數毫米的長孔。In this case, the pillar 22 is In the word (U-shaped) type, pin holes 70 fixed by pins 50 are formed on both sides. Although the through hole 30 is formed in the plaque plate 21, the through hole 30 is formed to have a length of several millimeters in the longitudinal direction of the plaque plate 21 in consideration of expansion and contraction by thermal expansion of the plaque plate 21 in the same manner as described above. hole.

將詩箋板21插入支柱22的字(U字)的凹部71,由支柱22的一方的銷孔70→詩箋板21的貫通孔30→支柱22的另一方的銷孔70的順序通過銷50。Inserting the poetry board 21 into the pillar 22 The concave portion 71 of the word (U-shaped) passes through the pin 50 in the order of the one pin hole 70 of the support post 22, the through hole 30 of the plaque plate 21, and the other pin hole 70 of the support post 22.

又,支柱22的字(U字)的凹部71的寬度,是比詩箋板21的厚度稍為寬。且,詩箋板21的長度方向的側面,是由不與支柱22的字(U字)的底面碰撞的方式,將字(U字)深深地形成。Again, the struts 22 The width of the concave portion 71 of the word (U-shaped) is slightly wider than the thickness of the plaque plate 21. Moreover, the side of the length direction of the plaque 21 is not the struts 22 The way the bottom of the word (U word) collides, will The word (U word) is deeply formed.

如此的話,與使用上述螺絲例同樣,詩箋板21是對於支柱22未完全地被固定,詩箋板21,是藉由所形成的貫通孔30的長孔分,對於支柱22容許由熱膨脹所產生的伸縮的方式被支撐。In this case, as in the case of the above-described screw, the plaque 21 is not completely fixed to the stay 22, and the plaque 21 is formed by the long hole of the through hole 30 formed, and the struts 22 are allowed to be thermally expanded. The resulting telescopic way is supported.

又,將詩箋板21的兩端支撐在支柱22、23的方法,兩端皆使用螺絲,或是兩端皆使用銷也可以,一方是使用螺絲而另一方是使用銷也可以。Further, the method of supporting the both ends of the plaque board 21 on the pillars 22 and 23 uses a screw at both ends, or a pin may be used at both ends, and one of the screws may be used and the other may be a pin.

又,如上述,如本實施例,將詩箋板21朝橫長並列,將其兩端藉由支柱22、23支撐的情況時,不需要將形成於詩箋板21的兩端的螺絲40或是銷50通過的貫通孔30雙方皆形成長孔。至少一方的端的貫通孔30,是具有相當於由詩箋板21的熱膨脹所產生的伸縮的長度的長孔即可。Further, as described above, as in the present embodiment, when the plaques 21 are juxtaposed in the lateral direction and the both ends thereof are supported by the struts 22, 23, the screws 40 formed at both ends of the plaque 21 or Both of the through holes 30 through which the pins 50 pass form long holes. The through hole 30 at the end of at least one of the ends may be a long hole having a length corresponding to the expansion and contraction caused by thermal expansion of the plaque plate 21.

如上述,將複數詩箋板21各別獨立,將複數長度方向對齊並朝上下方向並列地安裝在支柱22、23。由此,各詩箋板21,是與相鄰接的上下的詩箋板獨立使由熱膨脹所產生的伸縮成為可能,且,也可每次一枚的方式進行安裝/取下。As described above, the plurality of plaques 21 are independent of each other, and the plurality of length plates are aligned and attached to the pillars 22 and 23 in the vertical direction. Thereby, each of the plaques 21 is independent of the adjacent upper and lower slabs, and the expansion and contraction by thermal expansion is possible, and the sills 21 can be attached/detached one at a time.

且,將詩箋板21朝上並列直到不切除集光鏡的情況時的周緣的高度為止。Further, the plaque 21 is juxtaposed up to the height of the periphery when the concentrating mirror is not cut.

在本實施例中,如第2圖所示,將詩箋板8枚並列(堆高)。由此,假設1個的燈泡即使破裂,其破片會被隔壁遮斷,而不會到達相隣的燈泡。In the present embodiment, as shown in Fig. 2, eight poems are arranged side by side (stacked). Therefore, if one of the bulbs is broken, the fragments will be blocked by the partition walls and will not reach the adjacent bulbs.

第4圖,是顯示將如此構成的隔壁20適用於4燈式的光源(具備4個的燈泡1a、1b、1c、1d及將來自各燈泡的光反射並集光的集光鏡2a、2b、2c、2d之光源)的光照射裝置的圖。Fig. 4 is a view showing a configuration in which the partition wall 20 configured as described above is applied to a four-lamp type light source (four bulbs 1a, 1b, 1c, and 1d and a collecting mirror 2a, 2b for reflecting and collecting light from each bulb) A diagram of a light irradiation device of 2, 2, and 2d light sources.

且第5圖是顯示安裝在4燈式的光源的隔壁的圖,從第4圖將燈泡及集光鏡去除的圖。Fig. 5 is a view showing a partition wall of a light source mounted on a four-lamp type, and a diagram of removing a bulb and a collecting mirror from Fig. 4.

如第5圖所示,在4燈式的光源中,將4枚的隔壁由中央交叉配置成十字型。且,如第4圖所示,在藉由呈十字型交叉配置的隔壁所產生的被90°分割的4個象限內,分別配置:燈泡1a、Ib、1c、1d、及將從該燈泡被放射的光反射並集光的反射鏡(集光鏡)2a、2b、2c、2d。As shown in Fig. 5, in the four-lamp type light source, four partition walls are arranged in a cross shape from the center. Further, as shown in FIG. 4, in the four quadrants divided by 90° generated by the partition walls arranged in a cross shape, the bulbs 1a, Ib, 1c, 1d, and the bulbs are respectively disposed. A mirror (light collecting mirror) 2a, 2b, 2c, 2d in which the emitted light reflects and collects light.

各集光鏡2a、2b、2c、2d是將90°方向的2處切除一部分,將被切除的部分彼此相向地配置。由此,與不切除部分集光鏡的情況相比燈泡彼此更接近,將4個燈泡及集光鏡作為一個光源形成時的輝度會變高,如上述,不需加大瞄準角(視角)θ,就可以提高光的利用效率。Each of the collecting mirrors 2a, 2b, 2c, and 2d is formed by cutting a part of two places in the 90° direction and arranging the cut portions to face each other. Thereby, the bulbs are closer to each other than when the partial concentrating mirrors are not cut, and the luminance when the four bulbs and the concentrating mirror are formed as one light source becomes high, as described above, the angle of sight (angle of view) does not need to be increased. θ, the efficiency of light utilization can be improved.

且,藉由將燈泡及集光鏡如上述配置,4個集光鏡2a、2b、2c、2d,皆是其缺口在相同方向為相同形狀,使零件可共通化。由此可以達成裝置整體的成本下降。Further, by arranging the bulb and the concentrating mirror as described above, the four collecting mirrors 2a, 2b, 2c, and 2d have the same shape in the same direction so that the parts can be made common. This makes it possible to achieve a cost reduction of the entire device.

且,隔壁20,是配置於這些的集光鏡2a、2b、2c、2d的缺口及缺口之間。集光鏡彼此的間隔變寬的話,來自燈泡的光之中未被反射的成分因為變多,所以儘可能愈窄愈好,在本實施例中約14mm。Further, the partition wall 20 is disposed between the notch and the notch of the collecting mirrors 2a, 2b, 2c, and 2d. When the distance between the light collecting mirrors is widened, the amount of light that is not reflected from the light from the bulb is increased, so it is as narrow as possible, and is about 14 mm in this embodiment.

在本實施例中,如第5圖所示,將隔壁20的詩箋板21支撐的支柱22、23,是在中央設置1根及在周邊部設置4根。在中央的支柱22中,朝向4方向延伸的方式安裝詩箋板21的一端,詩箋板21的另一端是安裝在被設在周邊部的支柱23。由此構成呈十字型交叉的隔壁。In the present embodiment, as shown in Fig. 5, the pillars 22 and 23 supporting the plaque 21 of the partition wall 20 are provided at one center and four at the peripheral portion. In the center pillar 22, one end of the plaque board 21 is attached so as to extend in the four directions, and the other end of the plaque board 21 is attached to the pillar 23 provided in the peripheral portion. Thereby, a partition wall having a cross shape is formed.

又,如此藉由將4枚的隔壁20呈十字型交叉配置,各隔壁20的詩箋板21,是藉由熱膨脹延伸時,在4枚的隔壁20接觸的內側(中央的支柱22的方向)雖無法延伸,但是可以容易作成可朝外側方向(周邊部的支柱23的方向)延伸的自由的空間。In addition, by arranging the four partition walls 20 in a cross shape, the swash plate 21 of each partition wall 20 is inwardly contacted by the four partition walls 20 when extending through thermal expansion (the direction of the center pillar 22) Although it is not extendable, it can be easily formed into a free space which can extend in the outer direction (the direction of the pillar 23 of the peripheral part).

因此,為了將詩箋板21固定於支柱22、23而形成的貫通孔30之中,中央的支柱22側的貫通孔未形成長孔,只有周邊部的支柱23側的貫通孔形成長孔,詩箋板21是在熱膨脹時朝外側延伸。又,長孔的形狀,是考慮詩箋板21的熱膨脹的伸縮而形成。Therefore, in the through hole 30 formed by fixing the plaque plate 21 to the pillars 22 and 23, the through hole on the center pillar 22 side is not formed with a long hole, and only the through hole on the pillar 23 side of the peripheral portion forms a long hole. The plaque 21 extends outward toward the thermal expansion. Further, the shape of the long hole is formed by considering the expansion and contraction of the thermal expansion of the plaque plate 21.

第6圖,是燈泡點燈時的隔壁的狀態的意示圖,使用同圖說明燈泡點燈時的由詩箋板構成的隔壁的狀態。在同圖中,隔壁的壁面是藉由從A至E顯示的5枚的詩箋板構成,且支柱是省略顯示。Fig. 6 is a view showing the state of the partition wall when the bulb is lit, and the state of the partition wall made of the plaque when the bulb is lit is explained using the same figure. In the same figure, the wall surface of the partition wall is composed of five poems displayed from A to E, and the pillars are omitted.

燈泡點燈的話,接近詩箋板A~E的中央部(燈泡部分)是上昇到約400℃至600℃。在同圖中,各詩箋板的溫度變高的部分是由斜線顯示。接近燈泡的發光點中央的詩箋板C,是溫度的變高領域最寬,其上下的詩箋板,是隨著遠離燈泡的發光點,溫度的變高領域變窄。When the bulb is turned on, the center portion (light bulb portion) close to the plaque board A to E rises to about 400 ° C to 600 ° C. In the same figure, the portion where the temperature of each poetry plate becomes higher is indicated by a diagonal line. The poem board C near the center of the light-emitting point of the bulb is the widest in the field of temperature rise, and the upper and lower poems are narrowed in the field of higher temperature as the light-emitting point away from the bulb.

此時,將在詩箋板A~E發生的力分為:朝上下方向發生的力、及朝左右方向發生的力的2個。At this time, the forces that occur in the plaques A to E are divided into two: forces occurring in the vertical direction and two forces occurring in the left-right direction.

首先,詩箋板的上下方向,如上述,使詩箋板的上下方向的溫度差儘可能不會產生的方式將寬度窄縮。因此,在1枚的詩箋板中上下方向的溫度差減少,對於上下方向不易產生熱的部分(熱膨脹的大的部分)及冷的部分(熱膨脹少的部分)。因此,對於溫度較高的部分不會產生從上下方向壓縮的力。First, the vertical direction of the plaque plate is narrowed as described above in such a manner that the temperature difference in the vertical direction of the plaque plate is not generated as much as possible. Therefore, the temperature difference in the vertical direction is reduced in one of the slabs, and the portion (the large portion of the thermal expansion) and the cold portion (the portion having less thermal expansion) which are less likely to generate heat in the vertical direction are formed. Therefore, the force compressed from the up and down direction is not generated for the portion having a higher temperature.

且,詩箋板的寬度因為狹窄,所以即使溫度較高的部分朝寬度方向熱膨脹的,其量減少只有1mm以下,可吸收形成於各詩箋板的螺絲和銷通過的貫通孔的徑的遊隙部分。Moreover, since the width of the plaque plate is narrow, even if the portion having a relatively high temperature is thermally expanded in the width direction, the amount thereof is reduced by only 1 mm or less, and the diameter of the through hole formed by the screw and the pin formed in each swash plate can be absorbed. Gap section.

另一方面,對於詩箋板的左右方向,因為是將詩箋板橫長配置,所以與上下方向相異,在左右方向(詩箋板的長度方向)中,熱的部分(熱膨脹較大的部分)及冷的部分(熱膨脹較少的部分)會發生。熱的部分雖是藉由熱膨脹使詩箋板數毫程度朝左右方向延伸,但是該延伸,是如上述藉由形成於詩箋板的長孔被吸收。On the other hand, in the left and right direction of the swash plate, since the swash plate is arranged horizontally, it is different from the vertical direction, and in the left and right direction (the length direction of the plaque), the hot portion (large thermal expansion) Part) and the cold part (the part with less thermal expansion) will occur. Although the hot portion is extended by the thermal expansion to the left and right direction by a few degrees, the extension is absorbed by the long hole formed in the plaque plate as described above.

即,因為是長方形狀的詩箋板,所以板狀構件(詩箋板)的熱膨脹的方向是被限定於其長度方向,因此可以藉由長孔吸收板的熱膨脹及伸縮。That is, since it is a rectangular plaque, the direction of thermal expansion of the slab member is limited to the longitudinal direction thereof, so that thermal expansion and expansion and contraction of the long hole absorbing plate can be performed.

詩箋板,是在接近燈泡的詩箋板(例如詩箋板C)、及遠離燈泡的詩箋板(例如詩箋板A和詩箋板E),或是其中間的詩箋板(例如詩箋板B和詩箋板D)中,成為高溫的領域(圖中斜線的領域)的廣度是相異,因此由熱膨脹所產生的延伸的量FL是各別不同。即,詩箋板C是較長地延伸,但是詩箋板A和詩箋板E的延伸量縮短,詩箋板B及詩箋板C是其中間。The poetry board is a poem board close to the bulb (such as the poetry board C), and a poem board away from the bulb (such as the poem board A and the poem board E), or the poetry board in the middle (for example In the poem board B and the poem board D), the extent of the field which becomes a high temperature (the area of the oblique line in the figure) is different, and thus the amount of extension FL generated by thermal expansion is different. That is, the poem board C is extended for a long time, but the extension of the poem board A and the poetry board E is shortened, and the poem board B and the poetry board C are in the middle.

對於此,各詩箋板,是如上述,對於支柱獨立且容許熱膨脹的伸縮的方式被安裝。因此,從A至E的各詩箋板,是可以對應各熱膨脹而進行延伸/收縮的移動。因此,在左右方向,也不會產生對於溫度較高的部分壓縮的力。In this regard, each of the plaques is mounted in such a manner that the pillars are independent of each other and allow expansion and contraction of thermal expansion. Therefore, each of the plaques from A to E is a movement that can be extended/contracted in accordance with each thermal expansion. Therefore, in the left and right direction, the force for the partial compression of the higher temperature is not generated.

如以上,詩箋板的上下方向的寬度,是使溫度差不會產生的方式較窄形成,且在左右方向中溫度差雖會發生,但是因為是容許由熱膨脹所產生的伸縮(移動)的方式被安裝於支柱,所以無論是上下方向或左右方向,不會對於溫度較高的部分產生壓縮。As described above, the width of the swash plate in the vertical direction is such that the temperature difference does not occur, and the temperature difference occurs in the left-right direction, but it is allowed to expand (move) due to thermal expansion. Since the method is attached to the pillar, compression is not performed on the portion having a high temperature in the up-and-down direction or the left-right direction.

因此,在各詩箋板A~E中不會發生朝對於本身的板面直交的方向的力,在將詩箋板複數並列的隔壁中,不會產生朝對於隔壁的平面直交的方向膨脹的變形(彎曲)。Therefore, in the respective slabs A to E, the force in the direction orthogonal to the plate surface of the slab is not generated, and in the partition wall in which the plurality of plaques are arranged in parallel, there is no expansion in the direction orthogonal to the plane of the partition wall. Deformation (bending).

又,將各詩箋板並列配置時,相鄰接的詩箋板之間可隔有1mm或其以下的間隙,設置供形成於支柱的固定用的螺孔和銷孔較佳。Further, when the poems are arranged side by side, a gap of 1 mm or less can be interposed between the adjacent poems, and it is preferable to provide a screw hole and a pin hole for fixing to the pillar.

因為,如第6圖所示,詩箋板雖是朝其長度方向熱膨脹,但是其延伸量FL在各詩箋板不同。因此,在相鄰接的詩箋板之間形成間隙的話,各詩箋板分別依據各別的熱膨脹進行伸縮時,相鄰接的詩箋板彼此的間不會相互磨擦。Because, as shown in Fig. 6, although the poetry board is thermally expanded toward its length, the amount of extension FL is different in each poetry board. Therefore, when a gap is formed between the adjacent plaques, when the plaques are respectively expanded and contracted according to the respective thermal expansions, the adjacent plaques do not rub against each other.

其結果,各詩箋板可以平順地伸縮,且也可防止由相互磨擦事所產生的垃圾的發生。且,也可以吸收上下方向(詩箋板的寬度方向)的膨脹。又,1mm即其以下的間隙的話,即使燈泡破裂且破片通過其間隙,也不會弄傷相隣的燈泡。As a result, each of the plaques can be smoothly stretched, and the occurrence of garbage generated by mutual friction can also be prevented. Further, it is also possible to absorb the expansion in the vertical direction (the width direction of the plaque). Moreover, if the gap is 1 mm or less, even if the bulb is broken and the fragment passes through the gap, the adjacent bulb is not damaged.

又,在上述第1實施例中,在詩箋板形成長孔,在支柱形成了將螺絲固定的螺孔,或是將銷固定的銷孔。但是,在詩箋板形成將螺絲或是銷固定的孔,將長孔形成於支柱側也可以。Further, in the first embodiment described above, a long hole is formed in the plaque, and a screw hole for fixing the screw or a pin hole for fixing the pin is formed in the pillar. However, it is also possible to form a hole in which the screw or the pin is fixed in the plaque plate, and to form the long hole on the side of the struts.

在第7圖中,顯示由上述第1實施例所示的隔壁的變形例。同圖,是與第3圖同樣,顯示將詩箋板支撐在支柱的部分的擴大圖。In Fig. 7, a modification of the partition wall shown in the first embodiment is shown. In the same figure, as in the third figure, an enlarged view showing a portion in which the plaque is supported on the pillar is shown.

同圖,是將詩箋板21藉由螺絲40安裝在支柱24的情況的例。在詩箋板21形成將螺絲40固定的螺孔60,在支柱24形成沿著詩箋板21的長度方向的長孔的貫通孔30。長孔的長度,是考慮由詩箋板21的熱膨脹所產生的伸縮而形成。The same figure is an example of a case where the plaque plate 21 is attached to the stay 24 by the screw 40. A screw hole 60 for fixing the screw 40 is formed in the plaque plate 21, and a through hole 30 for forming a long hole along the longitudinal direction of the plaque plate 21 is formed in the struts 24. The length of the long hole is formed in consideration of expansion and contraction caused by thermal expansion of the plaque plate 21.

將螺絲40插入此長孔30且將詩箋板21安裝在支柱。又,在螺絲40的軸中,如上述第1實施例所示,即使墊圈及軸環貫通並將螺絲40旋緊,詩箋板21,是也可藉由形成於支柱24的長孔部分,容許由熱膨脹所產生的伸縮。A screw 40 is inserted into the elongated hole 30 and the plaque 21 is mounted on the struts. Further, in the shaft of the screw 40, as shown in the above-described first embodiment, even if the washer and the collar pass through and the screw 40 is screwed, the swash plate 21 can be formed in the long hole portion of the stay 24, Allows expansion and contraction caused by thermal expansion.

在上述的第1實施例中,將詩箋板橫長配置,朝上下方向複數並列構成壁面。但是將詩箋板縱長配置,朝左右方向複數並列構成壁面也可以。In the first embodiment described above, the plaques are arranged in a horizontally long direction, and the wall faces are arranged in parallel in the vertical direction. However, it is also possible to arrange the poetry slabs in a lengthwise manner and to form a wall surface in the left and right direction.

在第8圖中,顯示設在本發明的光照射裝置的隔壁的第2實施例的結構。In Fig. 8, the structure of the second embodiment of the partition wall of the light irradiation device of the present invention is shown.

在同圖中,顯示將從A至E的5枚的詩箋板縱長配置,將各詩箋板A~E的上端側藉由支柱25支撐,並且將各詩箋板朝左右方向並列構成隔壁的例。In the same figure, the lengths of the five plaques from A to E are displayed, and the upper end sides of the plaques A to E are supported by the struts 25, and the plaques are arranged side by side in the left-right direction. Example of the next door.

如同圖所示,將詩箋板縱長配置的情況時,將詩箋板A~E支撐的支柱25是設於橫方向(左右方向)。各詩箋板A~E,是被安裝成使上方的端藉由螺絲40被螺固在被設在此橫方向的支柱25的方式吊下。將如此被安裝的複數詩箋板,在長度方向對齊並左右並列地構成壁面。As shown in the figure, when the poems are arranged vertically, the pillars 25 supported by the poems A to E are disposed in the lateral direction (left-right direction). Each of the plaques A to E is attached so that the upper end is suspended by the screw 40 in the support 25 provided in the lateral direction. The plurality of poems thus mounted are aligned in the longitudinal direction and arranged side by side to form a wall surface.

如此,將詩箋板縱長配置的情況,支柱25,是將各詩箋板A~E的上部只有由1根支撐較佳,詩箋板A~E的下部不需要支撐。即,詩箋板是由所謂的「懸臂」的方式被支撐於支柱25。各詩箋板A~E的下方的端是自由,熱膨脹時,各詩箋板是可以依據各延伸量FL,朝詩箋板的長度方向也就是重力方向下方自由地延伸。In this way, in the case where the poems are arranged vertically, the pillars 25 are preferably supported by only one of the upper portions of the poems A to E, and the lower portions of the poems A to E do not need to be supported. That is, the plaque is supported by the pillar 25 by a so-called "cantilever". The lower end of each of the plaques A to E is free. When the thermal expansion is performed, each plaque can be freely extended toward the length of the plaque, that is, below the direction of gravity, according to each extension amount FL.

因此,如此將詩箋板由懸臂支撐的情況時,在詩箋板或是支柱,不需要形成如上述第1實施例所示的長孔的貫通孔。Therefore, when the plaque is supported by the cantilever as described above, it is not necessary to form the through hole of the long hole as shown in the first embodiment in the plaque or the struts.

又,如第1實施例所示,相鄰接的詩箋板之間設置間隙,在熱膨脹時使詩箋板彼此不會相互磨擦較佳。Further, as shown in the first embodiment, a gap is provided between the adjacent plaques, and it is preferable that the plaques do not rub against each other during thermal expansion.

又,在上述第1及第2實施例中,詩箋板雖顯示為板狀的構件,但是例如由網目狀的構件、金網構成也可以。但是,網目的大小需要,是燈泡破裂時,會刮傷相隣的燈泡程度的破片不會通過的大小。Further, in the above-described first and second embodiments, the plaque plate is shown as a plate-shaped member, but may be formed of, for example, a mesh-like member or a gold mesh. However, the size of the mesh needs to be the size at which the fragment of the adjacent bulb will not scratch when the bulb is broken.

1...燈泡1. . . light bulb

1a,1b,1c,1d...燈泡1a, 1b, 1c, 1d. . . light bulb

2a,2b,2c,2d...集光鏡(反射鏡)2a, 2b, 2c, 2d. . . Light collecting mirror

3...第1平面鏡3. . . First plane mirror

4...積分器透鏡4. . . Integrator lens

5...擋板5. . . Baffle

6...第2平面鏡6. . . 2nd plane mirror

7...瞄準透鏡7. . . Aiming lens

8...光照射面8. . . Light exposure surface

10...光源10. . . light source

20...隔壁20. . . next door

21...詩箋板(長方形狀的板狀構件)twenty one. . . Poetry board (rectangular plate-shaped member)

22...支柱twenty two. . . pillar

23...支柱twenty three. . . pillar

24...支柱twenty four. . . pillar

25...支柱25. . . pillar

30...長孔(貫通孔)30. . . Long hole (through hole)

40...螺絲40. . . Screw

41...軸41. . . axis

42...彈簧墊圈42. . . Spring washer

43...平墊圈43. . . Flat Washers

44...軸環44. . . Collar

50...銷50. . . pin

60...螺孔60. . . Screw hole

70...銷孔70. . . Pin hole

71...凹部71. . . Concave

100...板狀構件100. . . Plate member

101...中央部101. . . Central department

102...周邊部102. . . Peripheral part

[第1圖]顯示本發明的光照射裝置的概略構成的圖。[Fig. 1] A view showing a schematic configuration of a light irradiation device of the present invention.

[第2圖]顯示隔壁的第1實施例的結構的圖。[Fig. 2] A view showing the configuration of the first embodiment of the partition wall.

[第3圖(a)(b)(c)]顯示將詩箋板支撐在支柱的部分擴大的圖。[Fig. 3 (a), (b), (c)] shows an enlarged view of a portion in which the plaque is supported on the pillar.

[第4圖]將隔壁適用在4燈式的光源的光照射裝置的圖。[Fig. 4] A view of a light irradiation device in which a partition wall is applied to a four-lamp type light source.

[第5圖]顯示安裝在4燈式的光源的隔壁的圖。[Fig. 5] A view showing a partition wall of a light source mounted on a 4-lamp type.

[第6圖]將燈泡點燈時的隔壁的狀態的模式圖。[Fig. 6] A schematic view showing the state of the partition wall when the bulb is turned on.

[第7圖]顯示第1實施例所示的隔壁的變形例的圖。[Fig. 7] A view showing a modification of the partition wall shown in the first embodiment.

[第8圖]顯示周壁的第2實施例的圖。[Fig. 8] A view showing a second embodiment of the peripheral wall.

[第9圖]顯示習知的光照射裝置的結構的圖。[Fig. 9] A view showing the structure of a conventional light irradiation device.

[第10圖]顯示如第9圖所示的光源的結構的圖。[Fig. 10] A view showing the structure of a light source as shown in Fig. 9.

[第11圖(a)(b)]顯示施加在隔壁的板狀構件的力的圖。[Fig. 11 (a) and (b)] is a view showing the force applied to the plate member of the partition wall.

1a,1b...燈泡1a, 1b. . . light bulb

2a,2b...集光鏡(反射鏡)2a, 2b. . . Light collecting mirror

3...第1平面鏡3. . . First plane mirror

5...擋板5. . . Baffle

6...第2平面鏡6. . . 2nd plane mirror

7...瞄準透鏡7. . . Aiming lens

8...光照射面8. . . Light exposure surface

10...光源10. . . light source

20...隔壁20. . . next door

Claims (7)

一種光照射裝置,是具備:複數燈泡、及各別設在該複數燈泡的周圍並將來自各燈泡的光反射的反射鏡、及設在該反射鏡及反射鏡之間的隔壁,其特徵為:上述隔壁,是具備:將長度方向對齊地並列的複數長方形狀的板狀構件、及將該板狀構件支撐的支柱,上述板狀構件,是以容許由熱膨脹所產生的朝長度方向的延伸的方式被支撐於上述支柱。 A light irradiation device includes: a plurality of bulbs; and a mirror disposed around the plurality of bulbs to reflect light from the respective bulbs; and a partition wall provided between the mirrors and the mirrors, wherein The partition wall includes a plurality of rectangular plate-shaped members that are aligned in the longitudinal direction, and a support for supporting the plate-shaped member. The plate-shaped member is extended in the longitudinal direction to allow thermal expansion. The way is supported by the above pillars. 如申請專利範圍第1項的光照射裝置,其中,上述板狀構件,是以在與相鄰接的板狀構件之間形成間隙的方式被支撐於上述支柱。 The light-emitting device according to claim 1, wherein the plate-like member is supported by the pillar so as to form a gap between the adjacent plate-like members. 如申請專利範圍第1或2項的光照射裝置,其中,上述板狀構件是橫長配置,並且在該板狀構件中形成有沿著該板狀構件的長度方向的長孔,該板狀構件,是將螺絲或是銷插入上述長孔,藉由將該被插入的螺絲或是銷固定於上述支柱而被支撐。 The light-irradiating device according to claim 1 or 2, wherein the plate-like member is disposed in a horizontally long configuration, and a long hole along a longitudinal direction of the plate-like member is formed in the plate-like member, the plate-like shape The member is inserted into the long hole by a screw or a pin, and is supported by fixing the inserted screw or pin to the above-mentioned pillar. 如申請專利範圍第1或2項的光照射裝置,其中,上述板狀構件是橫長配置,並且在上述支柱中形成有沿著上述板狀構件的長度方向的長孔,上述板狀構件,是將螺絲或是銷插入上述長孔,藉由將該插入的螺絲或是銷固定於上述板狀構件而被支撐。 The light-emitting device according to claim 1 or 2, wherein the plate-like member is disposed in a horizontally long direction, and a long hole along a longitudinal direction of the plate-like member is formed in the pillar, and the plate-shaped member is A screw or a pin is inserted into the long hole, and is supported by fixing the inserted screw or pin to the plate member. 如申請專利範圍第1或2項的光照射裝置,其中, 上述板狀構件是縱長配置,並且該板狀構件,是藉由將其上端固定於支柱而被支撐。 A light irradiation device according to claim 1 or 2, wherein The plate-like member is of a vertically long configuration, and the plate-like member is supported by fixing the upper end thereof to the pillar. 如申請專利範圍第1或2項的光照射裝置,其中,是具備:4個的燈泡、及各別設在該燈泡的周圍並將來自各燈泡的光反射的反射鏡、及設在該反射鏡及反射鏡之間的隔壁,設有:在中央交叉並呈十字型配置的隔壁、及在由上述隔壁形成的4個象限各設置1個燈泡及將來自該燈泡的光反射的反射鏡。 The light irradiation device according to claim 1 or 2, further comprising: four light bulbs; and a mirror that is disposed around the light bulb and reflects light from each of the light bulbs, and is provided in the reflection The partition wall between the mirror and the mirror is provided with a partition wall that is disposed at the center and has a cross shape, and a mirror that is provided with one bulb and four reflecting light from the bulb in each of the four quadrants formed by the partition wall. 如申請專利範圍第6項的光照射裝置,其中,上述反射鏡是將90°方向的2處切除形成缺口,上述隔壁是被配置於上述缺口及缺口之間。 The light irradiation device according to claim 6, wherein the mirror is formed by cutting two places in the 90° direction to form a notch, and the partition wall is disposed between the notch and the notch.
TW098131926A 2008-11-13 2009-09-22 Light irradiation device TWI391607B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008290709A JP5077198B2 (en) 2008-11-13 2008-11-13 Light irradiation device

Publications (2)

Publication Number Publication Date
TW201018835A TW201018835A (en) 2010-05-16
TWI391607B true TWI391607B (en) 2013-04-01

Family

ID=42278914

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098131926A TWI391607B (en) 2008-11-13 2009-09-22 Light irradiation device

Country Status (4)

Country Link
JP (1) JP5077198B2 (en)
KR (1) KR101190961B1 (en)
CN (1) CN101737732B (en)
TW (1) TWI391607B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7100398B1 (en) * 2021-05-06 2022-07-13 株式会社 ベアック Exposure device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002351085A (en) * 2001-05-30 2002-12-04 Sharp Corp Ultraviolet irradiation method and ultraviolet irradiation device
TWM308368U (en) * 2006-09-29 2007-03-21 Tyc Brother Ind Co Ltd Improved structure of LED lamp assembly
JP2008083586A (en) * 2006-09-28 2008-04-10 Hitachi High-Technologies Corp Exposure light source, exposure apparatus, exposure method and method for manufacturing panel substrate for display

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2997351B2 (en) * 1991-08-12 2000-01-11 旭光学工業株式会社 Illumination optics
US6023555A (en) 1998-08-17 2000-02-08 Eaton Corporation Radiant heating apparatus and method
JP2004245912A (en) * 2003-02-12 2004-09-02 Ushio Inc Light irradiation system

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002351085A (en) * 2001-05-30 2002-12-04 Sharp Corp Ultraviolet irradiation method and ultraviolet irradiation device
JP2008083586A (en) * 2006-09-28 2008-04-10 Hitachi High-Technologies Corp Exposure light source, exposure apparatus, exposure method and method for manufacturing panel substrate for display
TWM308368U (en) * 2006-09-29 2007-03-21 Tyc Brother Ind Co Ltd Improved structure of LED lamp assembly

Also Published As

Publication number Publication date
KR101190961B1 (en) 2012-10-12
CN101737732B (en) 2013-05-08
JP5077198B2 (en) 2012-11-21
TW201018835A (en) 2010-05-16
CN101737732A (en) 2010-06-16
JP2010117553A (en) 2010-05-27
KR20100054083A (en) 2010-05-24

Similar Documents

Publication Publication Date Title
JP4805493B2 (en) Liquid crystal display
JP4860755B2 (en) Optical member and illumination device, display device and television receiver using the same
JP4961685B2 (en) Light irradiation device
CN101943350A (en) Backlight module
JP2007027122A (en) Device for unifying light from plurality of light sources
TW201017060A (en) Machine vision inspection system and light source module thereof
KR102000037B1 (en) Back light assembly and method for assembling the same
JP2007115817A (en) Light irradiation device
CN101430054A (en) Flat display device and its backlight module
TWI391607B (en) Light irradiation device
JP2012084298A (en) Light irradiation device
JP5761834B2 (en) Curved backlight unit and display device including the same
TWI535969B (en) A lamp unit and a light irradiation device provided with the lamp unit
WO2020103785A1 (en) Light homogenizing rod, optical assembly and projection device
JP5382954B2 (en) Lighting device
KR101373993B1 (en) Light irradiation device
KR100500606B1 (en) Light illuminating apparatus
JP2006058480A (en) Backlight device of liquid crystal display device
JP7051204B2 (en) How to assemble a light source device, an exposure device and a light source device
JP6845562B2 (en) Lighting system
KR20060097201A (en) Backlight unit for lcd
JP2006202710A (en) Illuminator
TW200722680A (en) Positioning device for light guide plate
JP2008061074A (en) Illumination apparatus for image processing
JP2018101072A (en) Light irradiation device

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees