TWI381017B - Composition and Manufacturing Method of Halogen - free Printed Circuit Board with Low Dielectric Loss - Google Patents

Composition and Manufacturing Method of Halogen - free Printed Circuit Board with Low Dielectric Loss Download PDF

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TWI381017B
TWI381017B TW97121458A TW97121458A TWI381017B TW I381017 B TWI381017 B TW I381017B TW 97121458 A TW97121458 A TW 97121458A TW 97121458 A TW97121458 A TW 97121458A TW I381017 B TWI381017 B TW I381017B
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low dielectric
dielectric loss
parts
circuit board
halogen
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TW200951174A (en
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Hsien Te Chen
Ming Feng Cheng
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Taiwan Union Technology Corp
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具低介電損耗之無鹵素印刷電路板材料組成與製造方法Halogen-free printed circuit board material composition and manufacturing method with low dielectric loss

本發明係有關於一種印刷電路板材料組成與製造方法,更詳而言之,係有關於一種具低介電損耗之無鹵素印刷電路板材料組成與製造方法,該具低介電損耗之無鹵素印刷電路板材料組成與製造方法,除可使印刷電路板基板材料能通過UL 94V-0之阻燃性測試外,且能搭配具低介電損耗特性之樹脂以及無機粉體藉以降低材料之介電常數及介電損耗,使具低介電損耗之無鹵素印刷電路板材料組成,且具有低介電損耗特性、耐熱性、低膨脹性,同時又可通過無鉛銲錫之要求而能符合市場、環保要求。The present invention relates to a printed circuit board material composition and manufacturing method, and more particularly to a halogen-free printed circuit board material composition and manufacturing method having low dielectric loss, which has no low dielectric loss. Halogen printed circuit board material composition and manufacturing method, in addition to enabling the printed circuit board substrate material to pass the UL 94V-0 flame retardancy test, and can be combined with a resin with low dielectric loss characteristics and inorganic powder to reduce the material Dielectric constant and dielectric loss make halogen-free printed circuit board material with low dielectric loss, low dielectric loss, heat resistance, low expansion, and meet the market requirements of lead-free solder. ,Environmental requirements.

對一般習知的FR-4之銅箔基板材料而言,其阻燃元素是以溴為主,然,由於含以溴為阻燃元素之基板材料於燃燒時,會有大量黑煙、以及惡臭釋出,並適放出有害物質,因此,為符合環保法規要求,無鹵素銅箔基板材料的需求也與日具增。同時,在電路之訊號傳輸上,系統業者也不斷要求更快速的䚼訊號傳輸時間,並同時又能獲得更清晰之訊號,且由於印刷電路板之線寬及線距日益高度密集化,而對基板材料的要求也更加嚴格,藉以確保印刷電路板基板在更嚴格的高溫、高濕、高電壓環境下時仍能正常運作,是故,開發出具低介電損耗特性之無鹵素印刷電路板基板 材料,且於製造過程中,可利用無鉛銲錫之印刷電路板材料製造方法來予以製造。For the conventionally known FR-4 copper foil substrate material, the flame retardant element is mainly bromine. However, since the substrate material containing bromine as a flame retardant element is burned, there is a large amount of black smoke, and The malodor is released and the harmful substances are released. Therefore, in order to comply with environmental regulations, the demand for halogen-free copper foil substrate materials has also increased. At the same time, in the signal transmission of the circuit, the system industry also constantly requires a faster transmission time of the signal, and at the same time, a clearer signal can be obtained, and because the line width and the line spacing of the printed circuit board are increasingly highly dense, The requirements for substrate materials are also more stringent, so as to ensure that the printed circuit board substrate can still operate normally under the stricter high temperature, high humidity and high voltage environment. Therefore, a halogen-free printed circuit board substrate with low dielectric loss characteristics has been developed. Materials, and in the manufacturing process, can be fabricated using lead-free solder printed circuit board material manufacturing methods.

對於一般習知技術而言,例如,於中華民國專利公報之發明公告/公開號I290160「無鹵素之難燃性環氧樹脂組成物、無鹵素之組合型多層板用難燃性環氧樹脂組成物、預浸物、襯銅積層板、印刷配線板、附銅箔之樹脂膜、附有載體之樹脂膜、組合型積層板,及組合型多層板」、發明公告/公開號I289571「無鹵素無磷化物具難燃性之熱固型高分子材料組合物」,雖為無鹵素積層板材料配方,然該些專利只有”無鹵素”功能,而並未具備低介電常數、以及低介電損耗特性;另,於美國專利US7273900案,雖然其具備低介電常數、以及低介電損耗特性,然,該專利使用含溴及含磷之阻燃劑為添加型,而並未結合於基板材料結構中,是以,此將造成阻燃劑析出之污染環境的問題。For the general prior art, for example, the invention publication of the Republic of China Patent Publication No. I290160 "halogen-free flame-retardant epoxy resin composition, non-halogen combination type multi-layer board with flame retardant epoxy resin composition , prepreg, copper-clad laminate, printed wiring board, resin film with copper foil, resin film with carrier, combined laminated board, and combined multi-layer board", Announcement No. I289571 "Halogen-free Phosphorus-free, non-flammable thermosetting polymer material composition, although it is a halogen-free laminate material formulation, these patents only have "halogen-free" function, but do not have low dielectric constant, and low dielectric Electrical loss characteristics; in addition, in the US patent US7273900, although it has a low dielectric constant and low dielectric loss characteristics, the patent uses a bromine-containing and phosphorus-containing flame retardant as an additive type, and is not combined with In the material structure of the substrate, there is a problem that the environment in which the flame retardant is precipitated is polluted.

是故,對於習知技術而言,如果想要滿足無鹵素之功能,則無法具有低介電常數、以及低介電損耗特性;然,若要求具備低介電常數及低介電損耗特性,則有污染環境之問題。是故,無法單純的結合以上所述之習知技術專利來達成無鹵素之功能、以及具有低介電常數及低介電損耗特性的需求,而是必須尋求其他的技術手段來解決問題。Therefore, for the conventional technology, if it is desired to satisfy the halogen-free function, it cannot have a low dielectric constant and a low dielectric loss characteristic; however, if a low dielectric constant and a low dielectric loss characteristic are required, There is a problem of polluting the environment. Therefore, it is not possible to simply combine the above-mentioned conventional patents to achieve a halogen-free function, and a demand having a low dielectric constant and a low dielectric loss characteristic, but other technical means must be sought to solve the problem.

所以,如何能得到一種印刷電路板及其製造方法,使其材料組成為不含鹵素且具有低介電損耗特性、耐熱性、低膨脹性,同時 又可通過無鉛銲錫之要求而能符合市場、環保要求,乃是待解決的問題。Therefore, how can a printed circuit board and a manufacturing method thereof be obtained such that the material composition is halogen-free and has low dielectric loss characteristics, heat resistance, and low expansion property, and at the same time It is also a problem to be solved by meeting the requirements of the market and environmental protection through the requirements of lead-free solder.

本發明之主要目的便是在於提供一種具低介電損耗之無鹵素印刷電路板材料組成與製造方法,係應用於印刷電路板基板材料製造環境中,該具低介電損耗之無鹵素印刷電路板材料組成為不含鹵素且具有低介電損耗特性、耐熱性、低膨脹性,同時又可通過無鉛銲錫之要求而能符合市場、環保要求。The main object of the present invention is to provide a halogen-free printed circuit board material composition and manufacturing method with low dielectric loss, which is applied to a printed circuit board substrate material manufacturing environment, and has a low dielectric loss halogen-free printed circuit. The material of the board is halogen-free and has low dielectric loss characteristics, heat resistance and low expansion. At the same time, it can meet market and environmental requirements through the requirements of lead-free solder.

本發明之又一目的便是在於提供一種具低介電損耗之無鹵素印刷電路板材料組成與製造方法,該具低介電損耗之無鹵素印刷電路板材料組成主要包含含磷之酚醛樹脂之交聯劑,除可使印刷電路板基板材料能通過UL 94V-0之阻燃性測試外,並使磷能與材料結合成為材料結構物而不致有析出之疑慮,且,能搭配具低介電損耗特性之無機粉體藉以降低材料之介電損耗。Another object of the present invention is to provide a halogen-free printed circuit board material composition and a manufacturing method with low dielectric loss, and the halogen-free printed circuit board material composition with low dielectric loss mainly comprises a phosphorus-containing phenolic resin. The cross-linking agent can not only pass the flame retardancy test of UL 94V-0 on the printed circuit board substrate material, but also combine the phosphorus energy with the material to become a material structure without doubt of precipitation, and can be matched with a low-medium The inorganic powder of the electrical loss characteristic is used to reduce the dielectric loss of the material.

根據以上所述之目的,本發明提供一種具低介電損耗之無鹵素印刷電路板材料組成與製造方法,係應用於印刷電路板基板材料製造環境中,本發明之具低介電損耗之無鹵素印刷電路板材料組成主要包含具含磷之酚醛樹脂為交聯劑,除可使印刷電路板基板材料能通過UL 94V-0之阻燃性測試外,並使磷能與材料結合成為材料結構物而不致有析出之疑慮,且,能搭配具低介電損耗特性之樹脂以及無機粉體藉以降低材料之介電常數及介電損耗,同 時又可通過無鉛銲錫之要求而能符合市場、環保要求。According to the above object, the present invention provides a halogen-free printed circuit board material composition and manufacturing method with low dielectric loss, which is applied to a printed circuit board substrate material manufacturing environment, and has low dielectric loss of the present invention. The halogen printed circuit board material consists mainly of a phosphorus-containing phenolic resin as a crosslinking agent, in addition to allowing the printed circuit board substrate material to pass the UL 94V-0 flame retardancy test, and the phosphorus energy can be combined with the material to form a material structure. The material does not have the doubt of precipitation, and can match the resin with low dielectric loss characteristics and the inorganic powder to reduce the dielectric constant and dielectric loss of the material. At the same time, it can meet the requirements of market and environmental protection through the requirements of lead-free solder.

爲使熟悉該項技藝人士瞭解本發明之目的、特徵及功效,茲藉由下述具體實施例,並配合所附之圖式,對本發明詳加說明如後:In order to make the person skilled in the art understand the purpose, features and effects of the present invention, the present invention will be described in detail by the following specific embodiments and the accompanying drawings.

本發明係一種具低介電損耗之無鹵素印刷電路板材料組成與製造方法,該具低介電損耗之無鹵素印刷電路板材料組成主要包含:1.環氧樹脂:所使用之環氧樹脂為不含鹵素之環氧樹脂,包括:酚酫類環氧樹脂(Phenol novolak epoxy,cresol novolak epoxy,bisphenol A novolak type epoxy),雙酚類環氧樹脂(biphenol epoxy,bisphenol A type epoxy,bisphenol F type epoxy,bisphenol M type epoxy),cyclopentadiene type epoxy,聚氨酯類環氧樹脂(Isocyanate modified Epoxy)The invention relates to a halogen-free printed circuit board material composition and a manufacturing method with low dielectric loss, and the halogen-free printed circuit board material composition with low dielectric loss mainly comprises: 1. Epoxy resin: epoxy resin used It is a halogen-free epoxy resin, including: phenolic epoxy resin (Phenol novolak epoxy, cresol novolak epoxy, bisphenol A novolak type epoxy), bisphenol epoxy resin (biphenol epoxy, bisphenol A type epoxy, bisphenol F Type epoxy,bisphenol M type epoxy),cyclopentadiene type epoxy,isocyanate modified Epoxy

2.含磷交聯劑:所使用之含磷交聯劑係為反應性含磷之雙酚A型交聯劑,其中,該含磷交聯劑之磷含量為1~20%,其分子結構如第1圖中所示之。第1圖為一分子結構圖,用以顯示說明本發明之具低介電損耗之無鹵素 印刷電路板材料組成中之含磷交聯劑的分子結構。於第1圖中,所示之為磷含量為1~20%之含磷交聯劑的分子結構,其中,R1,R2,R3可為含磷化合物(DOPO,9,10-dihydro-9-oxa-10-phosphaphanthrene 10-oxide),或C1~C10之烷基,或C1~C10之醛基,或C1~C10之醇基或獨立之氫基。2. Phosphorus-containing crosslinking agent: the phosphorus-containing crosslinking agent used is a reactive phosphorus-containing bisphenol A type crosslinking agent, wherein the phosphorus-containing crosslinking agent has a phosphorus content of 1 to 20%, and the molecule thereof The structure is as shown in Figure 1. Figure 1 is a molecular structure diagram showing the halogen-free low dielectric loss of the present invention. The molecular structure of the phosphorus-containing crosslinker in the composition of the printed circuit board material. In Fig. 1, the molecular structure of the phosphorus-containing crosslinking agent having a phosphorus content of 1 to 20% is shown, wherein R1, R2, and R3 may be phosphorus-containing compounds (DOPO, 9, 10-dihydro-9- Oxa-10-phosphaphanthrene 10-oxide), or an alkyl group of C1 to C10, or an aldehyde group of C1 to C10, or an alcohol group of C1 to C10 or an independent hydrogen group.

3.交聯劑:使用之交聯劑為二氰二胺(dicyandiamide)或酚類(phenol)硬化劑。3. Crosslinking agent: The crosslinking agent used is a dicyandiamide or a phenol hardener.

4.低介電損耗無機粉體:使用具低介電損耗無機粉體,包括:結晶型二氧化矽(crystal silica),熔融型二氧化矽(fuse silica),氫氧化鋁(Al(OH)3),三氧化二鋁(Al2O3),氫氧化鎂(Mg(OH)2),氧化鎂(MgO),氧化鋇(BeO),氮化硼(BN),氮化矽((Si3N4)等無機粉體。4. Low dielectric loss inorganic powder: using inorganic powder with low dielectric loss, including: crystalline crystal silica, fuse type silica, aluminum hydroxide (Al(OH) 3), aluminum oxide (Al2O3), magnesium hydroxide (Mg (OH) 2), magnesium oxide (MgO), bismuth oxide (BeO), boron nitride (BN), tantalum nitride ((Si3N4) and other inorganic Powder.

5.分散劑:使用分散劑為矽烷偶合劑(Silane),包括氨基矽烷偶合劑(amino-silane)及環氧基矽烷偶合劑(epoxy-silane)。5. Dispersant: The dispersant is a silane coupling agent (Silane), including an amino-silane and an epoxy-silane.

6.稀釋劑:可使用丙酮(Acetone),甲乙酮(MEK),環己酮(cyclohexanol),1-甲氧基-2-丙醇(PM),1-甲氧基-2-丙醇甲酯(PMA),二甲基甲醯氨(DMF)。6. Diluent: Acetone, methyl ethyl ketone (MEK), cyclohexanol, 1-methoxy-2-propanol (PM), 1-methoxy-2-propanol methyl ester can be used. (PMA), dimethylformamide (DMF).

7.催化劑:使用之催化劑包括:三級胺,如, 2MI(2-methyl-imidazole),2E4MI(2-ethyl-4-methyl-imidazole),2PI(2-Phenyl-imidazole),BDMA(Benyl dimethylamine),BF3.MEA等。7. Catalyst: The catalyst used includes: a tertiary amine, such as, 2MI (2-methyl-imidazole), 2E4MI (2-ethyl-4-methyl-imidazole), 2PI (2-Phenyl-imidazole), BDMA (Benyl dimethylamine), BF3.MEA, and the like.

其中,所述之環氧樹酯係與硬化劑進行交聯而形成穩定之網狀結構,使之具有良好焊接耐熱及抗泡性,所選用之環氧樹脂其環氧當量(Epoxy Equivalent Weight,EEW)為200~1500,使用量為100份。於此其中,環氧當量若高於1500會有樹脂與玻纖束間之濕潤(wetting)狀態會變差,若低於200會有流膠過大之現象。於此其中,水解氯含量必須小於500ppm,若大於500ppm則會影響硬化反應之進行。Wherein, the epoxy resin is crosslinked with a hardener to form a stable network structure, which has good solder heat resistance and anti-foaming property, and the epoxy resin of the selected epoxy resin has an Epoxy Equivalent Weight (Epoxy Equivalent Weight, EEW) is 200~1500, and the usage is 100 parts. In this case, if the epoxy equivalent is higher than 1500, the wetting state between the resin and the glass fiber bundle may be deteriorated, and if it is lower than 200, the flow gel may be excessively large. Herein, the hydrolyzed chlorine content must be less than 500 ppm, and if it is more than 500 ppm, the progress of the hardening reaction is affected.

所述之含磷交聯劑,係當曝露疊層物於火焰或高溫時,形成阻燃層以遲緩燃燒,並與硬化劑進行交聯,而形成穩定之網狀結構,並以形成清漆而浸透於織造玻璃布後,形成難燃疊層物,使之具有良好焊接耐熱及抗泡性,成形板中其最佳磷含量範圍為2~6%,故所選用之含磷交聯劑其磷含量為2~12wt%,使用量為10~100份。其中使用量低於10份,則成型板無阻燃效果;若超過100份,會有樹脂與玻纖束間之濕潤(wetting)狀態會變差,且會影響硬化反應之進行。The phosphorus-containing crosslinking agent is formed by forming a flame-retardant layer to slowly burn when exposed to a flame or a high temperature, and crosslinking with a hardener to form a stable network structure and forming a varnish. After being impregnated into the woven glass cloth, a flame retardant laminate is formed to have good solder heat resistance and foam resistance. The optimum phosphorus content in the formed sheet ranges from 2 to 6%, so the phosphorus-containing crosslinking agent is selected. The phosphorus content is 2 to 12% by weight, and the amount used is 10 to 100 parts. When the amount used is less than 10 parts, the molded plate has no flame retardant effect; if it exceeds 100 parts, the wetting state between the resin and the glass fiber bundle may be deteriorated, and the hardening reaction may be affected.

所述之交聯劑系為二氰二胺(dicyandiamide)或酚類(phenol)硬化劑,其目的在於補強含磷交聯劑其膠聯程度之不足,所述之 二氰二胺(dicyandiamide),其分子量為83,其分子結構中含有2個1級胺、1個2級胺、以及1個3級胺,其在室溫下不反應,要溫度在170℃以上才會反應,故可長時間存放,其使用量為0.5~3.5份,若低於0.5份則無補強效果,若高於3.5份則會有析出之現像。所述之酚類(phenol)硬化劑,其OH當量為80~140,其分子結構中至少含有1個活性氫反應基,其使用量為10~60份,若低於10份則無補強效果,若高於60份,則會有流膠過大之現象。The crosslinking agent is a dicyandiamide or a phenol hardener, and the purpose thereof is to reinforce the deficiency of the degree of bonding of the phosphorus-containing crosslinking agent, Didicyandiamide, which has a molecular weight of 83, has two first-order amines, one second-grade amine, and one tertiary amine in its molecular structure. It does not react at room temperature and requires a temperature of 170 ° C. The above reaction will occur, so it can be stored for a long time, and its usage is 0.5~3.5 parts. If it is less than 0.5 part, there is no reinforcing effect. If it is higher than 3.5 parts, there will be a phenomenon of precipitation. The phenol hardener has an OH equivalent of 80 to 140, and has at least one active hydrogen reactive group in its molecular structure, and the amount thereof is 10 to 60 parts, and if it is less than 10 parts, there is no reinforcing effect. If it is higher than 60 parts, there will be a phenomenon that the glue is too large.

所述之催化劑係為三級胺,例如,2MI,2E4MI,2PI,BDMA等,三級胺之特性為降低反應溫度,若未使用三級胺,則硬化反應在170℃左右才開始,若使用三級胺則硬化反應在120℃左右就會發生,使用量為0.01~3.0份,若使用量太高,則使反應性太快,將影響儲存時間,用量太小,則無效果。The catalyst is a tertiary amine, for example, 2MI, 2E4MI, 2PI, BDMA, etc., and the tertiary amine is characterized by lowering the reaction temperature. If a tertiary amine is not used, the hardening reaction starts at about 170 ° C, if used. The tertiary amine has a hardening reaction occurring at about 120 ° C, and the amount used is 0.01 to 3.0 parts. If the amount used is too high, the reactivity is too fast, which will affect the storage time. If the amount is too small, the effect is not effective.

所述之低介電損耗無機粉體添加物其粒徑1~100um,包括:結晶型二氧化矽(crystal silica),熔融型二氧化矽(fuse silica),氫氧化鋁(Al(OH)3),三氧化二鋁(Al2O3),氫氧化鎂(Mg(OH)2),氧化鎂(MgO)氧化鋇(BeO),氮化硼(BN),氮化矽(Si3N4)等無機粉體,使用量為10~100份,若使用量太高,則使生膠水太黏稠,影響其與玻璃布之濕潤(wetting),用量太小則無效果。The low dielectric loss inorganic powder additive has a particle diameter of 1 to 100 um, and includes: crystalline silica, fuse silica, and aluminum hydroxide (Al(OH) 3 ), aluminum oxide (Al2O3), magnesium hydroxide (Mg(OH)2), magnesium oxide (MgO) yttrium oxide (BeO), boron nitride (BN), tantalum nitride (Si3N4) and other inorganic powder, The amount of use is 10~100 parts. If the amount is too high, the raw glue is too thick, which affects the wetting of the glass cloth. If the amount is too small, it has no effect.

所述之分散劑其目的為使該無機添加物在環氧樹酯中分散均勻,本配方其使用之分散劑為矽烷偶合劑,包括氨基矽烷偶合劑(ainino-silane),或環氧基矽烷偶合劑(epoxy-silane),用以改善無機 物及織造玻璃布間之結合穩定性,而達到分散均勻之目的,且此類偶合劑無重金屬存在,故,不會對人體造成不良影響,使用量為0.1~5.0份,若使用量太高則加快反應,影響儲存時間,用量太小則無效果。The dispersing agent is used for the purpose of uniformly dispersing the inorganic additive in the epoxy resin. The dispersing agent used in the formulation is a decane coupling agent, including an ainino-silane or an epoxy decane. Epoxy-silane to improve inorganic The combination stability between the object and the woven glass cloth achieves the purpose of uniform dispersion, and the coupling agent has no heavy metal, so it does not adversely affect the human body, and the usage amount is 0.1 to 5.0 parts, if the usage amount is too high Then speed up the reaction and affect the storage time. If the dosage is too small, it will have no effect.

所述之稀釋劑其選用之原則為在含浸至玻璃布上時,並在60~190℃下乾燥之後不殘存於材料中,例如,可使用丙酮(Acetone),甲乙酮(MEK),甲基異丁酮(MIBK),環己酮(cyclohexanol),1-甲氧基-2-丙醇(PM),1-甲氧基-2-丙醇甲酯(PMA),二甲基甲醯氨(DMF)。The diluent is selected according to the principle that it does not remain in the material after being impregnated on the glass cloth and dried at 60 to 190 ° C, for example, acetone (Acetone), methyl ethyl ketone (MEK), methyl Butanone (MIBK), cyclohexanol, 1-methoxy-2-propanol (PM), 1-methoxy-2-propanol methyl ester (PMA), dimethylformamide DMF).

第2圖為一示意圖,用以顯示說明本發明之具低介電損耗之無鹵素印刷電路板材料組成的一些實施例。如第2圖中所示之,於實施例一,環氧樹脂為CNE-200具100份,含磷交聯劑30份,而硬化劑為二氰二胺2.0份、低介電損耗無機粉體50份、催化劑0.2份、分散劑0.5份、稀釋劑40份;於實施例二,環氧樹脂為Epon 828具100份,含磷交聯劑40份,而硬化劑為二氰二胺2.0份、低介電損耗無機粉體50份、催化劑0.1份、分散劑0.5份、稀釋劑40份;於實施例三,環氧樹脂為Epon 828具100份,含磷交聯劑40份,而硬化劑為酚類(PHL-6635)30份、低介電損耗無機粉體50份、催化劑0.3份、分散劑0.5份、稀釋劑40份;於實施例四,環氧樹脂為Epon 828具100份,含磷交聯劑35份,而硬化劑為二氰二胺2.2份、低介電損耗無機粉體50份、催化劑0.25份、分散劑0.5份、稀釋劑40份。Figure 2 is a schematic diagram showing some embodiments of the material composition of the halogen-free printed circuit board having low dielectric loss of the present invention. As shown in Fig. 2, in the first embodiment, the epoxy resin is 100 parts of CNE-200, 30 parts of phosphorus-containing crosslinking agent, and the hardening agent is 2.0 parts of dicyandiamide, low dielectric loss inorganic powder. 50 parts, 0.2 parts of catalyst, 0.5 part of dispersing agent, 40 parts of diluent; in the second embodiment, the epoxy resin is 100 parts of Epon 828, 40 parts of phosphorus-containing crosslinking agent, and the hardening agent is dicyandiamide 2.0. 50 parts of low dielectric loss inorganic powder, 0.1 part of catalyst, 0.5 part of dispersant, 40 parts of diluent; in the third embodiment, the epoxy resin is 100 parts of Epon 828 and 40 parts of phosphorus-containing crosslinking agent. The hardener is 30 parts of phenol (PHL-6635), 50 parts of low dielectric loss inorganic powder, 0.3 parts of catalyst, 0.5 part of dispersant, and 40 parts of diluent. In the fourth embodiment, the epoxy resin is Epon 828 with 100 The fraction is 35 parts of a phosphorus-containing crosslinking agent, and the hardening agent is 2.2 parts of dicyandiamide, 50 parts of low dielectric loss inorganic powder, 0.25 parts of a catalyst, 0.5 part of a dispersing agent, and 40 parts of a diluent.

第3圖為一流程圖,用以顯示說明本發明之具低介電損耗之無鹵素印刷電路板材料組成之製造方法的流程步驟。如第3圖中所示之,首先,於步驟11,選取環氧樹脂、含磷交聯劑、硬化劑、低介電損耗無機粉體、催化劑、分散劑、以及稀釋劑之份量、使用種類,在此,選取方式可為,例如,實施例一,實施例二,實施例三,實施例四,所述之份量、使用種類,並進到步驟12。Figure 3 is a flow chart showing the flow steps of a method of fabricating a material composition of a halogen-free printed circuit board having low dielectric loss of the present invention. As shown in FIG. 3, first, in step 11, the amount of epoxy resin, phosphorus-containing crosslinking agent, hardener, low dielectric loss inorganic powder, catalyst, dispersant, and diluent, and type of use are selected. Herein, the selection manner may be, for example, the first embodiment, the second embodiment, the third embodiment, the fourth embodiment, the quantity and the type of use, and the process proceeds to step 12.

於步驟12,製備於室溫下攪拌120分鐘後,並進到步驟13。In step 12, the preparation was stirred at room temperature for 120 minutes and then proceeded to step 13.

於步驟13,將所調之清漆於滾筒式含浸機上將清漆含浸於7628之玻璃布上,並進到步驟14。In step 13, the varnish is immersed on a glass cloth of 7628 on a drum type impregnator, and the process proceeds to step 14.

於步驟14,將前述經含浸之多張玻璃布以7628 5之厚度(0.039 mil)於最外層兩面與各一張10z之銅箔進行壓合,並進到步驟15。In step 14, the plurality of impregnated glass cloths are pressed at a thickness of 7628 * 5 (0.039 mil) on both sides of the outermost layer with each of the 10z copper foils, and the process proceeds to step 15.

於步驟15,將壓合後之基板進行特性檢測。In step 15, the substrate after pressing is subjected to characteristic detection.

對壓合後之基板進行特性檢測時,在此,例如,無鉛銲錫測試以5片含銅基板,尺寸為290 210mm實際經過Lead free IR reflow 3次後(條件如下圖中所示之),觀察含銅基板是否有爆板現象。For the characteristic detection of the pressed substrate, for example, the lead-free solder test is performed with 5 copper-containing substrates, and the size is 290 * 210 mm after actually passing Lead free IR reflow 3 times (conditions are as shown in the following figure). Observe whether the copper-containing substrate has a blasting phenomenon.

於電性檢測時,以前述經含浸之玻璃布以2116*1之厚度(0.005mil)於最外層兩面與各一張1oz之銅箔進行壓合,再將壓合後之基板進行特性檢測。 For electrical detection, the impregnated glass cloth was pressed at a thickness of 2116*1 (0.005 mil) on both sides of the outermost layer with a 1 oz copper foil, and the pressed substrate was subjected to characteristic detection.

於此其中,玻璃移轉溫度的測試為熱機械分析儀(Thermal Mechanical Analyzer,TMA),熱機械分析儀並可同時量測Z軸膨脹係數。玻璃移轉溫度的測試規範為電子電路互聯與封裝學會(The Institute for Interconnecting and Packaging Electronic Circuits,IPC)之IPC-TM-650.2.4.24C號檢測方法。Z軸膨脹係數的測試規範為IPC-TM-650.2.4.41號檢測方法。Here, the glass transition temperature is measured by a Thermal Mechanical Analyzer (TMA), a thermomechanical analyzer, and the Z-axis expansion coefficient can be simultaneously measured. The test specification for the glass transfer temperature is the IPC-TM-650.2.4.24C test method of The Institute for Interconnecting and Packaging Electronic Circuits (IPC). The test specification for the Z-axis expansion coefficient is the detection method of IPC-TM-650.2.4.41.

耐熱性的測試規範為IPC-TN-650.2.4.24.1號檢測方法。The test specification for heat resistance is the detection method of IPC-TN-650.2.4.24.1.

熱衝擊試驗為將試片放入2大氣壓、121℃之高溫高濕的環境下1小時,再放入288℃的錫爐中20秒後拉起,重複此浸入拉起 之動作5次。In the thermal shock test, the test piece was placed in a high-humidity environment of 2 atm, 121 ° C for 1 hour, and then placed in a tin furnace at 288 ° C for 20 seconds, then pulled up, and the immersion was repeated. The action is 5 times.

電性測試的測試以HP4291儀器測試。The test for the electrical test was tested with the HP4291 instrument.

第4圖為一示意圖,用以顯示說明於第2圖中本發明之具低介電損耗之無鹵素印刷電路板材料組成之一些實施例的基板特性。如第4圖中所示之,為實施例一至四之基板特性的比較、以及對照組RF-4與實施例一至四之基板特性比較。如第4圖中所示之,實施例一至四之基板的特性檢測項且為玻璃移轉溫度-TMA(℃)、Z軸膨脹係數(25~260℃)(%)、耐熱性T-260(min)、熱衝擊試驗、無鉛銲錫測試、介電常數(1M/GHz)、以及介電損失(1M/GHz)。Figure 4 is a schematic view showing the substrate characteristics of some embodiments of the material composition of the halogen-free printed circuit board having low dielectric loss of the present invention as illustrated in Figure 2. As shown in Fig. 4, the comparison of the substrate characteristics of Examples 1 to 4 and the comparison of the substrate characteristics of the control RF-4 and Examples 1 to 4 were carried out. As shown in FIG. 4, the characteristic detection items of the substrates of the first to fourth embodiments are the glass transition temperature - TMA (° C.), the Z-axis expansion coefficient (25 to 260 ° C) (%), and the heat resistance T-260. (min), thermal shock test, lead-free solder test, dielectric constant (1 M/GHz), and dielectric loss (1 M/GHz).

由實施例一、實施例二、實施例三、實施例四,可知,使用含磷交聯劑及搭配低介電損耗無機粉體,可得出具低介電損耗之無鹵素印刷電路板材料組成,且可通過無鉛銲錫製程之要求。From the first embodiment, the second embodiment, the third embodiment, and the fourth embodiment, it can be seen that the use of a phosphorus-containing crosslinking agent and a low dielectric loss inorganic powder can result in a halogen-free printed circuit board material composition with low dielectric loss. And can pass the requirements of the lead-free solder process.

以上所述僅為本發明之較佳實施例而已,並非用以限定本發明之範圍;凡其它未脫離本發明所揭示之精神下所完成之等效改變或修飾,均應包含在下述之專利範圍內。The above are only the preferred embodiments of the present invention, and are not intended to limit the scope of the present invention; all other equivalent changes or modifications which are not departing from the spirit of the present invention should be included in the following patents. Within the scope.

11 12 13 14 15‧‧‧步驟11 12 13 14 15‧‧‧Steps

第1圖為一分子結構圖,用以顯示說明本發明之具低介電損耗之無鹵素印刷電路板材料組成中之含磷交聯劑的分子結構;第2圖為一示意圖,用以顯示說明本發明之具低介電損耗之 無鹵素印刷電路板材料組成的一些實施例;第3圖為一流程圖,用以顯示說明本發明之具低介電損耗之無鹵素印刷電路板材料組成之製造方法的流程步驟;以及第4圖為一示意圖,用以顯示說明於第2圖中本發明之具低介電損耗之無鹵素印刷電路板材料組成之一些實施例的基板特性。1 is a molecular structure diagram for illustrating the molecular structure of a phosphorus-containing crosslinking agent in the material composition of the halogen-free printed circuit board having low dielectric loss of the present invention; FIG. 2 is a schematic view showing Illustrating the low dielectric loss of the present invention Some embodiments of the composition of the halogen-free printed circuit board material; FIG. 3 is a flow chart showing the flow steps of the manufacturing method for the material composition of the halogen-free printed circuit board having low dielectric loss of the present invention; and The figure is a schematic diagram showing the substrate characteristics of some embodiments of the halogen-free printed circuit board material composition of the present invention having low dielectric loss as illustrated in FIG.

11 12 13 14 15‧‧‧步驟11 12 13 14 15‧‧‧Steps

Claims (16)

一種具低介電損耗之無鹵素印刷電路板材料組成,係應用於印刷電路板基板材料製造環境中,該具低介電損耗之無鹵素印刷電路板材料組成主要包含:環氧樹脂,該環氧樹脂為不含鹵素之環氧樹脂;含磷交聯劑,該含磷交聯劑係為反應性含磷之雙酚A型交聯劑;交聯劑;低介電損耗無機粉體;分散劑;稀釋劑;以及催化劑,其中,該含磷交聯劑之分子結構為 ,其中,R1,R2,R3係選取自甲基(methyl)、含磷化合物(DOPO,9,10-dihydro-9-oxa-10-phosphaphanthrene 10-oxide)、C1~C10之烷基、C1~C10之醛基、C1~C10之醇基、獨立之氫基等,n為正整數。A halogen-free printed circuit board material composition with low dielectric loss is applied to a printed circuit board substrate material manufacturing environment, and the halogen-free printed circuit board material composition with low dielectric loss mainly comprises: epoxy resin, the ring The oxygen resin is a halogen-free epoxy resin; the phosphorus-containing crosslinking agent is a reactive phosphorus-containing bisphenol A type crosslinking agent; a crosslinking agent; a low dielectric loss inorganic powder; a dispersing agent; a diluent; and a catalyst, wherein the molecular structure of the phosphorus-containing crosslinking agent is Among them, R1, R2, R3 are selected from methyl (methyl), phosphorus-containing compounds (DOPO, 9, 10-dihydro-9-oxa-10-phosphaphanthrene 10-oxide), C1 ~ C10 alkyl, C1 ~ An aldehyde group of C10, an alcohol group of C1 to C10, an independent hydrogen group, etc., and n is a positive integer. 一種具低介電損耗之無鹵素印刷電路板材料組成,係應用於印刷電路板基板材料製造環境中,該具低介電損耗之無鹵素印刷電路板材料組成主要包含:環氧樹脂,該環氧樹脂為不含鹵素之環氧樹脂,該環氧樹脂其環氧當量為200~1500,使用量為100份;含磷交聯劑,該含磷交聯劑係為反應性含磷之雙酚A型交聯劑,該含磷交聯劑之磷含量為1~20%;交聯劑,該交聯劑為二氰二胺(dicyandiamide)或酚類(phenol)硬化劑;低介電損耗無機粉體,該低介電損耗無機粉體為具低介電損耗無機粉體;分散劑,該分散劑為矽烷偶合劑(Silane);稀釋劑;以及催化劑,其中,該含磷交聯劑之分子結構為 ,其中,R1,R2,R3係選取自甲基(methyl)、含磷化合物(DOPO,9,10-dihydro-9-oxa-10-phosphaphanthrene 10-oxide)、C1~C10之烷 基、C1~C10之醛基、C1~C10之醇基、獨立之氫基等,n為正整數。A halogen-free printed circuit board material composition with low dielectric loss is applied to a printed circuit board substrate material manufacturing environment, and the halogen-free printed circuit board material composition with low dielectric loss mainly comprises: epoxy resin, the ring The oxy-resin is a halogen-free epoxy resin having an epoxy equivalent of 200 to 1500 and a usage amount of 100 parts; and a phosphorus-containing crosslinking agent, the phosphorus-containing crosslinking agent is a reactive phosphorus-containing double a phenol A type crosslinking agent, the phosphorus content of the phosphorus-containing crosslinking agent is 1 to 20%; a crosslinking agent, the crosslinking agent is a dicyandiamide or a phenol hardener; a low dielectric a lossy inorganic powder, the low dielectric loss inorganic powder is an inorganic powder having a low dielectric loss; a dispersant, which is a silane coupling agent (Silane); a diluent; and a catalyst, wherein the phosphorus-containing cross-linking The molecular structure of the agent is Among them, R1, R2, R3 are selected from methyl (methyl), phosphorus-containing compounds (DOPO, 9, 10-dihydro-9-oxa-10-phosphaphanthrene 10-oxide), C1 ~ C10 alkyl, C1 ~ An aldehyde group of C10, an alcohol group of C1 to C10, an independent hydrogen group, etc., and n is a positive integer. 如申請專利範圍第1項或第2項所述之該具低介電損耗之無鹵素印刷電路板材料組成,其中,不含鹵素之該環氧樹脂係選取自酚酫類環氧樹脂(Phenol novolak epoxy,cresol novolak epoxy,bisphenol A novolak type epoxy)、雙酚類環氧樹脂(biphenol epoxy,bisphenol A type epoxy,bisphenol F type epoxy,bisphenol M type epoxy)、cyclopentadiene type epoxy、聚氨酯類環氧樹脂(Isocyanate modified Epoxy)等。 The halogen-free printed circuit board material composition with low dielectric loss as described in claim 1 or 2, wherein the epoxy resin is selected from the group consisting of phenolphthalein epoxy resin (Phenol). Novolak epoxy, cresol novolak epoxy, bisphenol A novolak type epoxy), biphenol epoxy (bisphenol A type epoxy, bisphenol F type epoxy, bisphenol M type epoxy), cyclopentadiene type epoxy, urethane epoxy resin Isocyanate modified Epoxy) and so on. 如申請專利範圍第1項或第2項所述之該具低介電損耗之無鹵素印刷電路板材料組成,其中,該含磷交聯劑其磷含量為1~20wt%,使用量為10~100份。 The halogen-free printed circuit board material composition having low dielectric loss as described in claim 1 or 2, wherein the phosphorus-containing crosslinking agent has a phosphorus content of 1 to 20% by weight and a usage amount of 10 ~100 copies. 如申請專利範圍第1項或第2項所述之該具低介電損耗之無鹵素印刷電路板材料組成,其中,該交聯劑為二氰二胺,二氰二胺使用量為0.5~3.5份。 The halogen-free printed circuit board material composition having low dielectric loss according to claim 1 or 2, wherein the crosslinking agent is dicyandiamide and the amount of dicyandiamide used is 0.5~ 3.5 servings. 如申請專利範圍第1項或第2項所述之該具低介電損耗之無鹵素印刷電路板材料組成,其中,該交聯劑為酚類(phenol)硬化劑,OH當量為80~140,分子結構中至少含有1個活性氫反應基,使用量為10~60份。 The halogen-free printed circuit board material composition having low dielectric loss according to claim 1 or 2, wherein the crosslinking agent is a phenol hardener, and the OH equivalent is 80-140. The molecular structure contains at least one active hydrogen reactive group in an amount of 10 to 60 parts. 如申請專利範圍第1項或第2項所述之該具低介電損耗之無鹵素印刷電路板材料組成,其中,該低介電損耗無機粉體為具低介 電損耗無機粉體,粒徑為1~100um,係選取自結晶型二氧化矽(crystal silica)、熔融型二氧化矽(fuse silica)、氫氧化鋁(Al(OH)3)、三氧化二鋁(Al2O3)、氫氧化鎂(Mg(OH)2)、氧化鎂(MgO)、氧化鋇(BeO)、氮化硼(BN)、氮化矽(Si3N4)等無機粉體,使用量為10~100份。 The low-dielectric loss-free halogen-free printed circuit board material composition as described in claim 1 or 2, wherein the low dielectric loss inorganic powder has a low dielectric Electrically depleted inorganic powder with a particle size of 1~100um, selected from crystalline crystal silica, fuse silica, aluminum hydroxide (Al(OH)3), and trioxide Inorganic powders such as aluminum (Al2O3), magnesium hydroxide (Mg(OH)2), magnesium oxide (MgO), beryllium oxide (BeO), boron nitride (BN), tantalum nitride (Si3N4), etc., used in an amount of 10 ~100 copies. 如申請專利範圍第1項或第2項所述之該具低介電損耗之無鹵素印刷電路板材料組成,其中,該分散劑為矽烷偶合劑選取自無重金屬存在之氨基矽烷偶合劑(amino-silane)、環氧基矽烷偶合劑(epoxy-silane)等,使用量為0.1~5.0份。 The halogen-free printed circuit board material composition having low dielectric loss as described in claim 1 or 2, wherein the dispersant is a decane coupling agent selected from an amino decane coupling agent (amino) in which no heavy metal is present. -silane), epoxy-silane, etc., used in an amount of 0.1 to 5.0 parts. 如申請專利範圍第1項或第2項所述之該具低介電損耗之無鹵素印刷電路板材料組成,其中,該稀釋劑選取自丙酮(Acetone)、甲乙酮(MEK)、環己酮(cyclohexanol)、1-甲氧基-2-丙醇(PM)、1-甲氧基-2-丙醇甲酯(PMA)、二甲基甲醯氨(DMF)等。 The halogen-free printed circuit board material composition having low dielectric loss as described in claim 1 or 2, wherein the diluent is selected from the group consisting of acetone (Acetone), methyl ethyl ketone (MEK), and cyclohexanone ( Cyclohexanol), 1-methoxy-2-propanol (PM), 1-methoxy-2-propanol methyl ester (PMA), dimethylformamide (DMF), and the like. 如申請專利範圍第1項或第2項所述之該具低介電損耗之無鹵素印刷電路板材料組成,其中,該催化劑係為三級胺。 The halogen-free printed circuit board material composition having low dielectric loss as described in claim 1 or 2, wherein the catalyst is a tertiary amine. 如申請專利範圍第1項或第2項所述之該具低介電損耗之無鹵素印刷電路板材料組成,其中,該環氧樹脂為100份,該含磷交聯劑30份,該硬化劑為二氰二胺2.0份,該低介電損耗無機粉體50份,該催化劑0.2份,該分散劑0.5份,該稀釋劑40份。 The halogen-free printed circuit board material composition having low dielectric loss according to claim 1 or 2, wherein the epoxy resin is 100 parts, and the phosphorus-containing crosslinking agent is 30 parts, the hardening The agent was 2.0 parts of dicyandiamide, 50 parts of the low dielectric loss inorganic powder, 0.2 parts of the catalyst, 0.5 part of the dispersant, and 40 parts of the diluent. 如申請專利範圍第1項或第2項所述之該具低介電損耗之無鹵素印刷電路板材料組成,其中,該環氧樹脂為100份,該含磷 交聯劑40份,該硬化劑為二氰二胺2.0份,該低介電損耗無機粉體50份,該催化劑0.1份,該分散劑0.5份,該稀釋劑40份。 The halogen-free printed circuit board material composition having low dielectric loss according to claim 1 or 2, wherein the epoxy resin is 100 parts, and the phosphorus is contained 40 parts of a crosslinking agent, which is 2.0 parts of dicyandiamide, 50 parts of the low dielectric loss inorganic powder, 0.1 part of the catalyst, 0.5 part of the dispersing agent, and 40 parts of the diluent. 如申請專利範圍第1項或第2項所述之該具低介電損耗之無鹵素印刷電路板材料組成,其中,該環氧樹脂為100份,該含磷交聯劑40份,該硬化劑為酚類30份,該低介電損耗無機粉體50份,該催化劑0.3份,該分散劑0.5份,該稀釋劑40份。 The halogen-free printed circuit board material composition having low dielectric loss according to claim 1 or 2, wherein the epoxy resin is 100 parts, and the phosphorus-containing crosslinking agent is 40 parts, the hardening The agent was 30 parts of phenols, 50 parts of the low dielectric loss inorganic powder, 0.3 parts of the catalyst, 0.5 parts of the dispersant, and 40 parts of the diluent. 如申請專利範圍第1項或第2項所述之該具低介電損耗之無鹵素印刷電路板材料組成,其中,該環氧樹脂為100份,該含磷交聯劑35份,該硬化劑為二氰二胺2.2份,該低介電損耗無機粉體50份,該催化劑0.25份,該分散劑0.5份,該稀釋劑40份。 The halogen-free printed circuit board material composition having low dielectric loss according to claim 1 or 2, wherein the epoxy resin is 100 parts, and the phosphorus-containing crosslinking agent is 35 parts. The agent was 2.2 parts of dicyandiamide, 50 parts of the low dielectric loss inorganic powder, 0.25 parts of the catalyst, 0.5 parts of the dispersant, and 40 parts of the diluent. 一種具低介電損耗之無鹵素印刷電路板材料組成的製造方法,係應用於印刷電路板基板材料製造環境中,該製造方法包含以下程序:製備由如申請專利範圍第1項或第2項所述之該具低介電損耗之無鹵素印刷電路板材料組成所調之清漆,並於室溫下攪拌120分鐘;將該清漆含浸於玻璃布上;以及將該經含浸之玻璃布與銅箔進行壓合。 A manufacturing method of a halogen-free printed circuit board material composition with low dielectric loss is applied to a printed circuit board substrate material manufacturing environment, and the manufacturing method comprises the following procedure: preparation according to the first or second item of the patent application scope The halogen-free printed circuit board material having a low dielectric loss is composed of the varnish adjusted and stirred at room temperature for 120 minutes; the varnish is impregnated on the glass cloth; and the impregnated glass cloth and copper are The foil is pressed. 如申請專利範圍第15項所述之該具低介電損耗之無鹵素印刷 電路板材料組成的製造方法,其中,將該經含浸之玻璃布與銅箔進行壓合之步驟,係為將該經含浸之多張玻璃布於最外層兩面與各一張銅箔進行壓合。Halogen-free printing with low dielectric loss as described in claim 15 The manufacturing method of the material composition of the circuit board, wherein the step of pressing the impregnated glass cloth and the copper foil is performed by pressing the impregnated glass cloth on the outermost surface with each copper foil. .
TW97121458A 2008-06-09 2008-06-09 Composition and Manufacturing Method of Halogen - free Printed Circuit Board with Low Dielectric Loss TWI381017B (en)

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