TWI373866B - Method for making a multilayer device structure with solution process and solvent casting device thereof - Google Patents

Method for making a multilayer device structure with solution process and solvent casting device thereof Download PDF

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Publication number
TWI373866B
TWI373866B TW097119451A TW97119451A TWI373866B TW I373866 B TWI373866 B TW I373866B TW 097119451 A TW097119451 A TW 097119451A TW 97119451 A TW97119451 A TW 97119451A TW I373866 B TWI373866 B TW I373866B
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TW
Taiwan
Prior art keywords
organic
organic molecular
solution
film
molecular
Prior art date
Application number
TW097119451A
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English (en)
Chinese (zh)
Other versions
TW200950179A (en
Inventor
Hsin Fei Meng
Sheng Fu Horng
Hsin Rong Tseng
Chi Shen Tuan
Original Assignee
Univ Nat Chiao Tung
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Application filed by Univ Nat Chiao Tung filed Critical Univ Nat Chiao Tung
Priority to TW097119451A priority Critical patent/TWI373866B/zh
Priority to JP2008294266A priority patent/JP5370959B2/ja
Publication of TW200950179A publication Critical patent/TW200950179A/zh
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Publication of TWI373866B publication Critical patent/TWI373866B/zh

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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/549Organic PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • Electroluminescent Light Sources (AREA)
  • Coating Apparatus (AREA)
  • Photovoltaic Devices (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
TW097119451A 2008-05-27 2008-05-27 Method for making a multilayer device structure with solution process and solvent casting device thereof TWI373866B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW097119451A TWI373866B (en) 2008-05-27 2008-05-27 Method for making a multilayer device structure with solution process and solvent casting device thereof
JP2008294266A JP5370959B2 (ja) 2008-05-27 2008-11-18 溶液工程技術を使った製造工程を利用した多層膜の製造方法及び溶液膜製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW097119451A TWI373866B (en) 2008-05-27 2008-05-27 Method for making a multilayer device structure with solution process and solvent casting device thereof

Publications (2)

Publication Number Publication Date
TW200950179A TW200950179A (en) 2009-12-01
TWI373866B true TWI373866B (en) 2012-10-01

Family

ID=41455393

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097119451A TWI373866B (en) 2008-05-27 2008-05-27 Method for making a multilayer device structure with solution process and solvent casting device thereof

Country Status (2)

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JP (1) JP5370959B2 (ja)
TW (1) TWI373866B (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109961904B (zh) * 2017-12-22 2022-05-31 重庆元石盛石墨烯薄膜产业有限公司 刮刀涂布式石墨烯透明导电膜基材功能层设置方法
CN112289964B (zh) * 2020-10-30 2022-09-27 合肥维信诺科技有限公司 显示基板的制备方法和显示面板的制备方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002361151A (ja) * 2001-06-10 2002-12-17 Mikuni Denshi Kk 液状体の吐出塗布方法と吐出塗布装置
JP2004098012A (ja) * 2002-09-12 2004-04-02 Seiko Epson Corp 薄膜形成方法、薄膜形成装置、光学素子、有機エレクトロルミネッセンス素子、半導体素子および電子機器
JP2005103416A (ja) * 2003-09-30 2005-04-21 Toppan Printing Co Ltd 塗布装置およびダイスリット厚み制御方法
JP2005211734A (ja) * 2004-01-28 2005-08-11 Toppan Printing Co Ltd 有機材料塗布装置及びその装置を用いた有機材料塗布方法
JP4506338B2 (ja) * 2004-08-02 2010-07-21 凸版印刷株式会社 高分子エレクトロルミネッセンス素子の製造方法
JP4867473B2 (ja) * 2006-05-25 2012-02-01 大日本印刷株式会社 塗布方法及び装置

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Publication number Publication date
JP5370959B2 (ja) 2013-12-18
JP2009285646A (ja) 2009-12-10
TW200950179A (en) 2009-12-01

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