TWI373832B - Display and method for manufacturing the same - Google Patents
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- TWI373832B TWI373832B TW97105016A TW97105016A TWI373832B TW I373832 B TWI373832 B TW I373832B TW 97105016 A TW97105016 A TW 97105016A TW 97105016 A TW97105016 A TW 97105016A TW I373832 B TWI373832 B TW I373832B
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13738321373832
、 TW4309PA 九、發明說明: • 【發明所屬之技術領域】 本發明是有關於一種顯示器’特別是關於構裝件與顯 示面板之間之结構以及一種製造該顯示器的方法。 【先前技術】 平面顯示器因為具有輕薄、短小以及低輻射的特性, φ目前已被廣泛應用。以目前被廣泛應用的液晶顯示器為 例,如第1A圖所示,第1A圖係為習知液晶顯示器之上視 圖。液晶顯示器1包含液晶顯示面板丨1、構裝件1 2 1、^ -以及電路板131以及132。構裝件12卜122係為捲帶式封 裝帶(tape carrier package,Tcp)。液晶顯示面板u包 括下基板111以及上基板11Q,上下基板111以及11〇之 間封裝有液晶層(未繪示),t基板U1具有複數導線 mo,係連接主動陣列(未繪示)以及構裝件121,構裝件 # 12卜122係分別將導線U10 ' 1110’與電路板131以及 132連接。 一接下來請參照第1B圖,第1B圖係為第1八圖之液晶 •顯示器沿剖面線Μ,繪製之液晶顯示器1之剖面圖。如第 1B圖所示,下基板ill包括導線mo以及與導線111〇連 接的線路端子1111。構裝件121藉由異方性導電膠14與 線路端子1111電性並直接連接。構裝件121具有複數導電 線路(未繪示),驅動晶片15係設置於構裝件121上。電路 板131係與構裝件121連接。 5TW4309PA IX. Description of the Invention: • Technical Field of the Invention The present invention relates to a display, particularly to a structure between a structure and a display panel, and a method of manufacturing the same. [Prior Art] Because of its thinness, shortness, and low radiation, flat panel displays have been widely used. Taking the liquid crystal display which is currently widely used as an example, as shown in Fig. 1A, Fig. 1A is a top view of a conventional liquid crystal display. The liquid crystal display 1 includes a liquid crystal display panel 丨1, a structure 1221, and a circuit board 131 and 132. The structure 12 122 is a tape carrier package (Tcp). The liquid crystal display panel u includes a lower substrate 111 and an upper substrate 11Q, and a liquid crystal layer (not shown) is interposed between the upper and lower substrates 111 and 11 , and the t substrate U1 has a plurality of wires mo connected to an active array (not shown) and The package 121, the structure #12, 122, respectively, connects the wires U10'1110' to the circuit boards 131 and 132. Next, please refer to FIG. 1B. FIG. 1B is a liquid crystal display of the first eight-figure diagram. As shown in Fig. 1B, the lower substrate ill includes a wire mo and a line terminal 1111 connected to the wire 111A. The component 121 is electrically and directly connected to the line terminal 1111 by the anisotropic conductive paste 14. The structure 121 has a plurality of conductive lines (not shown), and the driving wafer 15 is disposed on the structure 121. The circuit board 131 is connected to the structure 121. 5
1373832 * . TW4309PA 藉由上述的結構,驅動電壓或訊號電壓可由電路板131 以及132被提供至液晶顯示面板11,如此一來,便能顯示 影像。 請再次參照第1A圖及第1B圖,複數導線1110係在暴 露區10被暴露出來,故在製造或使用的過程中,導線1110 因沒有被遮蔽的緣故,容易造成氧化或損傷,使得導線受 損或失效,影響液晶顯示器1之顯示品質,更甚者,會造 成液晶顯示器1之無法正常顯示。 【發明内容】 本發明係提供一種平面顯示器,該平面顯示器之導線 上方具有一保護層,大體遮蔽該導線,其中該保護層係不 覆蓋該構裝件。 本發明係提供一種平面顯示器,該平面顯示器之導線 係不易受損及氧化。 本發明係提供一種製造顯示器之方法,係利用熱壓著 製程以形成一保護層,大體遮蔽該導線,其中該保護層係 不覆蓋該構裝件。 本發明係提供一種製造顯示器之方法,係利用熱壓著 製程以簡化整體製程。 本發明係提供一種製造顯示器之方法,係利用熱壓著 製程將保護層形成於平面顯示器之導線上。 本發明之目的係用以利用本發明之實施例所提供之製 造顯示器之方法,以簡化整體製程。 61373832 * . TW4309PA With the above structure, the driving voltage or signal voltage can be supplied to the liquid crystal display panel 11 by the boards 131 and 132, so that the image can be displayed. Referring again to FIG. 1A and FIG. 1B, the plurality of wires 1110 are exposed in the exposed region 10. Therefore, during manufacture or use, the wires 1110 are easily shielded from oxidation or damage due to the fact that they are not shielded, so that the wires are subjected to oxidation. The damage or failure affects the display quality of the liquid crystal display 1, and even worse, the liquid crystal display 1 cannot be displayed normally. SUMMARY OF THE INVENTION The present invention provides a flat panel display having a protective layer over the conductors that substantially shields the conductors, wherein the protective layer does not cover the components. The present invention provides a flat panel display in which the wires of the flat panel display are less susceptible to damage and oxidation. SUMMARY OF THE INVENTION The present invention provides a method of making a display that utilizes a thermal compression process to form a protective layer that substantially shields the wire, wherein the protective layer does not cover the structure. SUMMARY OF THE INVENTION The present invention provides a method of making a display that utilizes a hot press process to simplify the overall process. SUMMARY OF THE INVENTION The present invention provides a method of fabricating a display by forming a protective layer on a conductor of a flat panel display using a thermal compression process. It is an object of the present invention to utilize a method of manufacturing a display provided by an embodiment of the present invention to simplify the overall process. 6
1373832 -. TW4309PA 本發明之目的係用以利用本發明之實施例所提供之製 造顯示器之方法,利用單一壓頭便完成整體壓著製程。 本發明之目的係用以利用本發明之實施例所提供之製 造顯示器之方法,利用兩種壓頭便完成整體壓著製程。 本發明之目的係用以利用本發明之實施例所提供之製 造顯示器之方法,利用三種壓頭便完成整體壓著製程。 在本發明之一實施例中,顯示器包括一顯示面板,包括 至少一導線以及至少一線路端子與該導線連接;一構裝件; 一導電件,位於該構裝件以及該線路端子之間,使得該構 裝件與該線路端子電性連接;以及一保護層,大體遮蔽該 導線,其中該保護層係不覆蓋該構裝件。 為讓本發明之上述和其他目的、特徵和優點能更明顯 易懂,下文特舉較佳實施例,並配合所附圖式,作詳細說 明如下。 【實施方式】 本發明之顯示器之詳細構件及其製造方法如下述文字 所不’並佐以圖不詳細說明. 第一實施例 請參考第2A圖及第2B圖,第2A圖為本發明之一實 施例之平面顯示器之上視圖;第2B圖係為第2A圖之平面 顯示器沿剖面線ΙΙ-ΙΓ繪製之平面顯示器之本發明之第一 實施例之剖面圖。 71373832 -. TW4309PA The object of the present invention is to accomplish the overall crimping process using a single indenter using the method of manufacturing a display provided by an embodiment of the present invention. SUMMARY OF THE INVENTION The object of the present invention is to provide a method of manufacturing a display provided by an embodiment of the present invention, which utilizes two indenters to complete the overall crimping process. SUMMARY OF THE INVENTION The object of the present invention is to accomplish the overall crimping process using three indenters using the method of manufacturing a display provided by embodiments of the present invention. In an embodiment of the invention, the display includes a display panel including at least one wire and at least one line terminal connected to the wire; a component; a conductive member located between the component and the line terminal, such that The structure is electrically connected to the line terminal; and a protective layer substantially shields the wire, wherein the protective layer does not cover the structure. The above and other objects, features and advantages of the present invention will become more <RTIgt; [Embodiment] The detailed members of the display of the present invention and the method for manufacturing the same are not described in detail in the following description. For the first embodiment, please refer to FIGS. 2A and 2B, and FIG. 2A is the present invention. 1A is a cross-sectional view of a first embodiment of the present invention in which a flat panel display of the flat panel display of FIG. 2A is drawn along a section line. 7
1373832 • . TW4309PA 平面顯示器2包括顯示面板21,顯示面板21舉例係 為有機發光二極體顯示面板、電漿顯示面板、液晶面板或 微機電顯示面板等等。在本實施例中,以顯示面板21為有 機發光二極體顯示面板為例。顯示面板21具有有機發光二 極體陣列基板211、上蓋210位於有機發光二極體陣列基 板211上方,上蓋210及有機發光二極體陣列基板211之 間係以封膠(未繪示)封合。有機發光二極體陣列基板211 包括基底2110、有機發光二極體陣列(未繪示)、至少一導 線2112以及至少一線路端子2111與該導線2112連接。構 裝件221藉由導電件24與線路端子2111電性連接。構裝 件221舉例係為捲帶承載封裝(tape carrier package,TCP)、 _帶自動固接(Tape Automated Bonding ,TAB)、晶片於 膜上(Chip on Fi lm,COF)或晶片於玻璃上(Chip on Glass、 COG)等等。導電件24舉例係為異方性導電膠(anisotropic conductive film,ACF)或銀勝。 構裝件221與電路板231電性連接,連接的方式舉例 可以利用導電膠或直接焊接,在本實施例中並不侷限。電 路板231舉例係為印刷電路板或軟性電路板。 須特別注意的是,保護層240大體遮蔽導線2112,保 護層240可選擇性的覆蓋或不覆蓋該構裝件221,視設計 或製成所需而定。該保護層240之厚度約為0.04毫米至 0. 3毫米,但也可視設計需求而定,約為0. 1毫米至0. 3 毫米或0. 04毫米至0. 1毫米。保護層240舉例係為異方性 導電膠(anisotropic conductive film,ACF)、非_導電顆 8 13738321373832 • The TW4309PA flat panel display 2 includes a display panel 21, which is exemplified by an organic light emitting diode display panel, a plasma display panel, a liquid crystal panel, or a microelectromechanical display panel. In the present embodiment, the display panel 21 is an organic light-emitting diode display panel as an example. The display panel 21 has an organic light emitting diode array substrate 211, and the upper cover 210 is disposed above the organic light emitting diode array substrate 211. The upper cover 210 and the organic light emitting diode array substrate 211 are sealed by a sealant (not shown). . The organic light emitting diode array substrate 211 includes a substrate 2110, an organic light emitting diode array (not shown), at least one wire 2112, and at least one line terminal 2111 connected to the wire 2112. The component 221 is electrically connected to the line terminal 2111 by the conductive member 24. The component 221 is exemplified by a tape carrier package (TCP), a Tape Automated Bonding (TAB), a Chip on Film (COF) or a wafer on a glass ( Chip on Glass, COG) and more. The conductive member 24 is exemplified by an anisotropic conductive film (ACF) or silver. The structure 221 is electrically connected to the circuit board 231. The manner of connection may be made by using a conductive adhesive or direct soldering, which is not limited in this embodiment. The circuit board 231 is exemplified by a printed circuit board or a flexible circuit board. It is important to note that the protective layer 240 generally shields the wires 2112, and the protective layer 240 can selectively cover or not cover the component 221, depending on the design or fabrication requirements. 5毫米至0. 1毫米。 The thickness of the protective layer 240 is about 0.04 mm to 0. 3 mm, but also depending on the design requirements, from about 0.1 mm to 0.3 mm or 0. 04 mm to 0.1 mm. The protective layer 240 is exemplified by an anisotropic conductive film (ACF), non-conductive particles 8 1373832
• TW4309PA 粒月(nonconductive paste、nonconductive film,NCP、 NCF)、矽膠(siiicone)或TlJFFY膠。因為導線2112被保護 層240遮蔽,故導線2112在製程或使用時遭受損害或氧化 的機率大為降低,如此一來,顯示器2的使用壽命大為提 升且顯像品質更為穩定。 第二實施例 φ μ同時參考第2A圖及第2C圖,本實施例與第一實施 例大體相同,不同之處係為保護層24〇為導電件24的延 伸’故保護層240及導電件24為相同材料並可選擇性地在 相同製程步驟中完成,保護層240及導電件24舉例係為異 方性導電膠(anis〇tr〇pic ccmductive fi im , acf)或銀膠。 導電件24可選擇性的覆蓋或不覆蓋該構裝件221,視設計 或製成所需而定。該保護層240(或導電件24)之厚度約為 0. 04毫米至〇. 3毫米,但也可視設計需求而定,約為〇. j 鲁毫米至0. 3毫米或〇. 〇4毫米至毫米。 本實施例比第一實施例較佳處為省略第一實施例之保 護層240的設置,故製程及結構上更為簡單。 . 第一貫施例與第二實施例之製造方法可參考後續之實 施例,熟悉此技藝人士可利用後續之實施例所述之製造方 法而了解第一實施例與第二實施例之製造方法。 第三實施例 請參考第3圖及第4A圖至第4D圖,第3圖為本發明 9 1373832 TW4309PA 晶片35位於構裝件321上為例,構裝件321舉例係為捲^ 承載封裝(tape carrier package,TCP)、捲帶自動固接(Tape Automated Bonding,TAB)、晶片於膜上(Chip 〇n Film, COF)或晶片於玻璃上(Chip 〇n Glass、c〇G)等等,電路板 331舉例係為印刷電路板或軟性電路板。 接下來,提供一第一壓頭361並利用該第一壓頭361 對應該導電件34對該構裝件321預先加壓,藉此,該導電 ❿件34係連接該線路端子3111以及該構裝件321。第一壓 頭361提供之壓力舉例為5kg/cm2至1〇kg/cm2或如⑽2 至5 kg/cm2 ’操作溫度為40°C至80°C或60°C至80。(:,操 作時間為0.1秒至1秒或〇丨秒至〇 2秒。其中第一壓頭 之操作參數視製成及儀器設定而可選擇性調整,並不侷限。 然後,請參考第4B圖,提供保護層340於該導線3112 上’保護層340舉例係為異方性導電膠(anis〇tr〇pic ductive film ’ ACF)、非導電顆粒膏(n〇nc〇nductive _ paste、nonconductive film,NCp、NCF)、矽膠(siHc〇ne) 或TUFFY膠,再次利用第一壓頭%卜對應該導線3il2對 該保護層340加壓,此為另一次預壓,在此步驟中,第一 壓頭361提供之壓力約為叫/⑽2至顺^⑽2或啦/⑽2 ,8 kg/cm,操作溫度為4(TC至80ΐ或為60°C至80t:, 操作時間為1秒至5秒或i秒至2秒。其中第一壓頭361 之操作參數視製成及儀器設定而可選擇性調整,並不侷 限。可選擇性地在第一壓頭361和保護層之間設置緩 衝膜3611 ’緩衝膜3611舉例係為離形膜。 1373832• TW4309PA (nonconductive paste, nonconductive film, NCP, NCF), silicone (siiicone) or TlJFFY glue. Since the wire 2112 is shielded by the protective layer 240, the probability of damage or oxidation of the wire 2112 during processing or use is greatly reduced, so that the life of the display 2 is greatly improved and the development quality is more stable. The second embodiment φ μ refers to the 2A and 2C drawings at the same time, and the embodiment is substantially the same as the first embodiment, except that the protective layer 24 is an extension of the conductive member 24, so the protective layer 240 and the conductive member 24 is the same material and can be selectively completed in the same process step. The protective layer 240 and the conductive member 24 are exemplified by an anisotropic conductive adhesive (anis〇tr〇pic ccmductive fi im , acf) or silver paste. The conductive member 24 can selectively cover or not cover the member 221, depending on the design or fabrication requirements. The thickness of the protective layer 240 (or the conductive member 24) is about 0. 04 mm to 〇. 3 mm, but it can also be determined by the design requirements, about 〇. j 鲁 mm to 0.3 mm or 〇. 〇 4 mm To millimeters. This embodiment is preferable to the first embodiment in that the protection layer 240 of the first embodiment is omitted, so that the process and structure are simpler. The manufacturing method of the first embodiment and the second embodiment can be referred to the following embodiments, and those skilled in the art can understand the manufacturing methods of the first embodiment and the second embodiment by using the manufacturing method described in the subsequent embodiments. . For the third embodiment, please refer to FIG. 3 and FIG. 4A to FIG. 4D. FIG. 3 is an example of the 9 1373832 TW4309PA wafer 35 of the present invention being disposed on the structure 321 . The structure 321 is exemplified by a roll carrier package ( Tape carrier package (TCP), Tape Automated Bonding (TAB), Chip 〇n Film (COF) or wafer on glass (Chip 〇n Glass, c〇G), etc. The circuit board 331 is exemplified by a printed circuit board or a flexible circuit board. Next, a first indenter 361 is provided and the first indenter 361 is used to pre-press the member 321 corresponding to the conductive member 34, whereby the conductive member 34 is connected to the line terminal 3111 and the structure. 321. The pressure provided by the first pressure head 361 is exemplified as 5 kg/cm 2 to 1 〇 kg/cm 2 or as (10) 2 to 5 kg/cm 2 ' the operating temperature is 40 ° C to 80 ° C or 60 ° C to 80. (:, the operation time is 0.1 second to 1 second or leap seconds to 〇 2 seconds. The operating parameters of the first indenter can be selectively adjusted depending on the settings and instrument settings, and are not limited. Then, please refer to section 4B The protective layer 340 is provided on the wire 3112. The protective layer 340 is exemplified by an anisotropic conductive film (ACF), a non-conductive particle paste (n〇nc〇nductive _ paste, nonconductive film). , NCp, NCF), silicone (siHc〇ne) or TUFFY glue, again using the first indenter% corresponding to the wire 3il2 to pressurize the protective layer 340, this is another preload, in this step, the first The pressure provided by the indenter 361 is approximately /(10)2 to cis(10)2 or 啦/(10)2, 8 kg/cm, and the operating temperature is 4 (TC to 80 ΐ or 60 ° C to 80 t: operation time is 1 second to 5 seconds) Or i seconds to 2 seconds, wherein the operating parameters of the first indenter 361 are selectively adjustable depending on the preparation and instrument settings, and are not limited. A buffer film may be selectively disposed between the first indenter 361 and the protective layer. 3611 'The buffer film 3611 is exemplified by a release film. 1373832
TW4309PA 接下來如第4C圖所示,保護層34〇逐漸水平延伸以大 體覆蓋導線3112,又再-次利用第一壓頭361同時對應該 、導電件34以及该導線3112對該構裝件321以及該保護層 3仙加壓’此為正壓,第一壓頭361舉例在此步驟中提供 之壓力為 10 Icg/C《m2 至 50 kg/cm2 或 40 kg/cm2 至 50 kg/cm,操作溫度為15〇。〇至22〇它或18〇它至2⑼。〇,操 作時間為5秒至1Q秒或1秒至$秒。 • 正壓完成後,如第4D圖所示,液晶顯示器3便製造完 成,其中該保護層340之厚度約為〇 〇4毫米至〇 3毫米, 但也可視设計需求而定,約為〇. i毫米至〇 3毫米或〇 毫米至0. 1毫米。 四實施例 第5A圖至第5D圖為本發明之液晶顯示器之第四實施 例之對應製程别面圖。 • 與第三實施例類似,如同第4A圖至第4B圖,本實施 例利用第-壓頊461對應該導電件44對該構裝件421預先 以及對應該導線4112對該保護層加壓。與第三 實%例不同處為,利用不同於第一壓頭丨的第二壓頭4⑽ 同時對應该導電件44以及該導線4112對該構裝件421以 及該保護層440加壓,此為正壓,第二壓頭似舉例在此 步驟中提供之壓力為1Gkg/em2至皿g/em2或碰_2至 5〇 kg/cm2,操作溫度為 15〇它至 22(rc 或 18〇。〇 至 2〇(Γ(:, 操作時間為5秒至10秒或1秒至5秒’如第5C圖所示。 1373832TW4309PA Next, as shown in FIG. 4C, the protective layer 34 is gradually horizontally extended to substantially cover the wire 3112, and the first indenter 361 is again used, the conductive member 34 and the wire 3112 are attached to the component 321 and The protective layer is pressurized by 'this is a positive pressure, and the first indenter 361 exemplifies the pressure provided in this step as 10 Icg/C "m2 to 50 kg/cm2 or 40 kg/cm2 to 50 kg/cm, operation. The temperature is 15 〇. 〇 to 22 〇 it or 18 〇 it to 2 (9). 〇, the operating time is 5 seconds to 1Q seconds or 1 second to $ seconds. • After the positive pressure is completed, as shown in Fig. 4D, the liquid crystal display 3 is completed. The thickness of the protective layer 340 is about 毫米4 mm to 〇3 mm, but it can also be determined according to design requirements. Imm to 〇3 mm or 〇 mm to 0.1 mm. Fourth Embodiment Figs. 5A to 5D are views showing a corresponding process of a fourth embodiment of the liquid crystal display of the present invention. • Similar to the third embodiment, as in Figs. 4A to 4B, the present embodiment utilizes the first pressure pad 461 to correspond to the conductive member 44 to press the protective member 421 in advance and corresponding to the wire 4112. The difference from the third embodiment is that the second indenter 4 (10) different from the first indenter 同时 simultaneously presses the conductive member 44 and the wire 4112 to pressurize the component 421 and the protective layer 440. The pressure, the second indenter is exemplified by the pressure provided in this step from 1 Gkg/em2 to the dish g/em2 or the touch of _2 to 5 〇kg/cm2, and the operating temperature is 15 〇 to 22 (rc or 18 〇. 〇 To 2 〇 (Γ (:, operation time is 5 seconds to 10 seconds or 1 second to 5 seconds) as shown in Figure 5C. 1373832
TW4309PA 正壓完成後,如第5D圖所示,液晶顯示器4便製造完 • 成,液晶顯示器4包括基底4110、導線4112、線路端子 4111、第一基板410、導電件44、驅動晶片45、電路板43卜 保護層440,其元件設置關係與第三實施例相同,在此不 再贅述。 第五實施例 第6A圖至第6D圖為本發明之液晶顯示器之第五實施 *例之對應製程剖面圖。 與第三實施例類似,如同第4A圖,本實施例利用第 一壓頭561對應該導電件54對該構裝件521預先加壓。接 下來,如第6B圖所示,提供保護層540於該導線5112上, 保護層 540舉例係為異方性導電膠(anisotropic conductive film,ACF)、非導電顆粒膏(nonconductive paste、nonconductive f i lm,NCP、NCF)、石夕膠(si 1 icone) 春或TUFFY膠,提供第二壓頭562,對應該導線5112對該保 護層540加壓,此為另一次預壓,在此步驟中,第二壓頭 562提供之壓力約為lkg/cm2至10kg/cm2或6kg/cm2至 8kg/cm2,操作溫度為40°C至80°C或為60°C至80°C,操作 時間為1秒至5秒或1秒至2秒。可選擇性地在第二壓頭 562和保護層540之間設置緩衝膜5611,緩衝膜5611舉例 係為離形膜。 接下來如第6C圖所示,保護層540逐漸水平延伸以大 體覆蓋導線5112,然後提供第三壓頭563,利用第三壓頭 13 1373832After the TW4309PA is completed, as shown in FIG. 5D, the liquid crystal display 4 is completed. The liquid crystal display 4 includes a substrate 4110, a wire 4112, a line terminal 4111, a first substrate 410, a conductive member 44, a driving wafer 45, and a circuit. The board 43 is provided with the protective layer 440, and its component arrangement relationship is the same as that of the third embodiment, and details are not described herein again. Fifth Embodiment FIGS. 6A to 6D are cross-sectional views showing a corresponding process of a fifth embodiment of the liquid crystal display of the present invention. Similar to the third embodiment, as in Fig. 4A, the present embodiment utilizes the first indenter 561 to pre-stress the member 521 with the conductive member 54. Next, as shown in FIG. 6B, a protective layer 540 is provided on the wire 5112. The protective layer 540 is exemplified by an anisotropic conductive film (ACF), a nonconductive paste (nonconductive paste, nonconductive fi lm). , NCP, NCF, Si 1 icone spring or TUFFY glue, providing a second indenter 562, corresponding to the wire 5112 pressurizing the protective layer 540, this is another preload, in this step, The second indenter 562 provides a pressure of about lkg/cm 2 to 10 kg/cm 2 or 6 kg/cm 2 to 8 kg/cm 2 , an operating temperature of 40 ° C to 80 ° C or 60 ° C to 80 ° C, and an operation time of 1 Seconds to 5 seconds or 1 second to 2 seconds. A buffer film 5611 may be selectively disposed between the second indenter 562 and the protective layer 540, and the buffer film 5611 is exemplified by a release film. Next, as shown in Fig. 6C, the protective layer 540 is gradually horizontally extended to substantially cover the wire 5112, and then the third indenter 563 is provided, using the third indenter 13 1373832.
TW4309PA ' 563同時對應該導電件54以及該導線5112對該構裝件521 ' 以及該保護層540加壓,此為正壓,第三壓頭563舉例在 此步驟令提供之壓力為10kg/cm2至50kg/cm2或40kg/cm2 至 50kg/cm2,操作溫度為 150°C 至 220°C 或 180°C 至 200°C, 操作時間為5秒至10秒或1秒至5秒。緩衝膜5611之設 置如第三實施例相同,可選擇性使用。 第一壓頭561、第二壓頭562、第三壓頭563之操作參 數視製成及儀器設定而可選擇性調整,並不侷限。 * 正壓完成後,如第6D圖所示,液晶顯示器5便製造完 成,其中該保護層540之厚度約為0. 04毫米至0.3毫米, 但也可視設計需求而定,約為0. 1毫米至0.3毫米或0.04 毫米至0. 1毫米。 第六實施例 第7A圖至第7C圖為本發明之液晶顯示器之第六實施 |例之對應製程剖面圖。 請參照第7A圖,提供顯示面板61,顯示面板61包括 至少一導線6112以及至少一線路端子6111與該導線6112 連接;接下來提供一導電件64於該線路端子6111上;導 電件64舉例為異方性導電膠(anisotropic conductive film,ACF)或銀膠,與第三實施例不同之處為,導電件64 之量比導電件34多;提供一構裝件621於該導電件上方, 構裝件621可包括驅動晶片65並可選擇性地預先電性連接 一電路板631,驅動晶片65可位於基底6110上而不位於 14TW4309PA ' 563 simultaneously corresponds to the conductive member 54 and the wire 5112 pressurizes the component 521 ′ and the protective layer 540, which is a positive pressure, and the third pressure head 563 exemplifies the pressure provided in this step to 10 kg/cm 2 . 50 kg/cm2 or 40 kg/cm2 to 50 kg/cm2, operating temperature is 150 ° C to 220 ° C or 180 ° C to 200 ° C, and the operation time is 5 seconds to 10 seconds or 1 second to 5 seconds. The buffer film 5611 is provided in the same manner as in the third embodiment, and can be selectively used. The operating parameters of the first indenter 561, the second indenter 562, and the third indenter 563 can be selectively adjusted depending on the instrument and the instrument settings, and are not limited. The singularity of the protective layer 540 is about 0. 04 mm to 0.3 mm, but it can also be visually determined according to the design requirements, about 0.10, as shown in Fig. 6D. Mm to 0.3 mm or 0.04 mm to 0.1 mm. Sixth Embodiment FIGS. 7A to 7C are cross-sectional views showing a corresponding process of a sixth embodiment of the liquid crystal display of the present invention. Referring to FIG. 7A, a display panel 61 is provided. The display panel 61 includes at least one wire 6112 and at least one line terminal 6111 connected to the wire 6112. Next, a conductive member 64 is provided on the line terminal 6111. The conductive member 64 is exemplified as An anisotropic conductive film (ACF) or a silver paste, which differs from the third embodiment in that the conductive member 64 is more than the conductive member 34; a member 621 is provided over the conductive member. The package 621 can include a driving chip 65 and can be selectively electrically connected to a circuit board 631. The driving wafer 65 can be located on the substrate 6110 instead of 14
1373832 I TW4309PA 構裝件621上,視設計而疋而不侷限,本實施例係以。 晶片65位於構裝件621上為例’構裝件621舉例係為 承載封裝(tape carrier package ’ TCP)、捲帶自動固接(τ1373832 I TW4309PA The structure 621 is not limited by design, and this embodiment is used. The wafer 65 is located on the structure 621 as an example. The structure 621 is exemplified by a tape carrier package (TCP), and the tape is automatically fixed (τ).
Automated Bonding ’ TAB)、晶片於膜上(Chip 〇n COF)或晶片於玻璃上(chip 〇n Glass、COG)等等,電路 631舉例係為印刷電路板或軟性電路板。 接下來,提供一第一壓頭661並利用該第一壓 對應該導電件64對該構裝件621預先加壓,藉此 接該線路端子6111以及該構裂件 2 為啊至80t或至1〇 kgW ’操作溫度 或一。.2秒二至第8〇厂…時間购 儀器設定而可選擇性 ②頭661之㈣參數視製成及 導電件64係整體覆 ::如第Μ圖所-’ 6112。 線路^子6111以及至少部分導線Automated Bonding 'TAB), wafer Cn COF or wafer 〇n Glass, COG, etc., and circuit 631 is exemplified by a printed circuit board or a flexible circuit board. Next, a first indenter 661 is provided and the member 621 is pre-pressurized by the first pressing pair of conductive members 64, thereby connecting the line terminal 6111 and the fracturing member 2 to 80t or 1〇. kgW 'operating temperature or one. .2 seconds 2 to 8th factory... Time to purchase Instrument settings and optional 2 661 (4) parameters are made and conductive parts 64 are integrally covered :: as shown in Figure ’-' 6112. Line ^6111 and at least part of the wire
然後,請參考第7B 對應該導電件64以 ,再一次利用第—壓頭661同時 導電件64加壓,此為亥導線6112對該構裝件621以及該 使用另-壓頭心使當然可視製程需求在此步驟中 361舉例在此步驟中一壓頭來執行此正壓。第-壓頭 或 40 kg/cm2 至 5〇 kg/c^ 之壓力為 10 kg/cm2 至 50 kg/cm2 t:至2〇〇°c,操作時間仍,知作溫度為150°C至220°C或180 此正壓,導電件64係^秒至10秒或1秒至5秒。藉由 位於導線6112上夕道岣勻地或不均勻地覆蓋導線6112, 之導電件64之厚度約為〇 〇4毫米至〇 3 15 1373832Then, refer to the 7B corresponding conductive member 64, and again use the first-indenter 661 and the conductive member 64 to pressurize, which is the wire 6112 for the structure 621 and the use of the other-indenter to make the process of course visible. Requirement In this step, 361 exemplifies a positive pressure in this step with an indenter. The pressure of the first-indenter or 40 kg/cm2 to 5 〇kg/c^ is 10 kg/cm2 to 50 kg/cm2 t: to 2 〇〇 °c, the operation time is still, the temperature is known as 150 ° C to 220 °C or 180 This positive pressure, the conductive member 64 is ^ seconds to 10 seconds or 1 second to 5 seconds. The conductive member 64 has a thickness of about 〇 4 mm to 〇 3 15 1373832 by uniformly or unevenly covering the wire 6112 on the wire 6112.
TW4309PA 毫米,但也可視料需求而定,約為0.1毫米至0.3毫米 或0.04毫米至0.1¾米。 與第三實關不同處為,本實_之保襲係利用導 电件64直接形成&可比第三實施例至少省略一道壓著步 驟以及提供賴層340之步驟,故製較為簡單。 正壓完成後,如第7C圖所示,液晶顯示器6便製造完 成,液晶顯示器6包括基底611〇、導線6112、線路端子TW4309PA mm, but depending on material requirements, it is approximately 0.1 mm to 0.3 mm or 0.04 mm to 0.13⁄4 m. The difference from the third real-time is that the protection of the present invention is directly formed by the conductive member 64. The step of providing at least one pressing step and providing the layer 340 can be made simpler than the third embodiment. After the positive pressure is completed, as shown in Fig. 7C, the liquid crystal display 6 is completed, and the liquid crystal display 6 includes the substrate 611 〇, the wire 6112, and the line terminal.
6m、第一基板610、導電件64、驅動晶片65以及電路板 631。 參考本實施例,利用導電件64同時形成保護層之方法 可對照第四實施例及第五實施例分別使用兩個壓頭及三個 壓頭’此外,各壓頭在不同㈣可替換❹或維持使用之 方式,熟悉此技藝人士可依本發明之各實施例而了解,並 不侷限。 、,,不、上所述’本發明主要在提供一顯示器及製造此顯示 器的方法,顯示器之導線係被保護件覆蓋而保護,故導線 在製程或使用時遭受損害或氧化的機率大為降低,如此一 來,顯示器的使用壽命大為提升且顯像品質更為穩定。 雖然本發明已以較佳實施例揭露如上,然其並非用以 限定本發明,任何所屬技術領域中具有通常知識者,在不 脫離本發明之精神和範圍内,當可作些許之更動與潤飾, 因此本發明之保護範圍當視後附之申請專利範圍所界 為準。 16 ^/38326m, the first substrate 610, the conductive member 64, the driving wafer 65, and the circuit board 631. Referring to the present embodiment, the method of simultaneously forming the protective layer by the conductive member 64 can use two indenters and three indenters respectively according to the fourth embodiment and the fifth embodiment. In addition, the indenters are different (four) replaceable or The manner in which the person skilled in the art can maintain the use can be understood in accordance with the embodiments of the present invention and is not limited. The present invention is mainly directed to providing a display and a method of manufacturing the same. The wire of the display is covered by the protective member and protected, so that the probability of the wire being damaged or oxidized during the process or use is greatly reduced. As a result, the life of the display is greatly improved and the image quality is more stable. Although the present invention has been disclosed in the above preferred embodiments, it is not intended to limit the invention, and any one of ordinary skill in the art can make some modifications and refinements without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims. 16 ^/3832
TW4309PA 【圖式簡單說明】 ^ lA 知液晶顯示器之上視圖; IB ®係為第1A圖之液晶顯示器沿 【,繪製 之液晶顯示器之剖面圖; ^ 為本發明之平面顯示器之上視圖,· 、,2B圖係為第2A圖之平面顯示器沿剖面線仰,繪 灰之平面顯示器之本發明之第—實施例之剖面圖; 第2C ®係為第2A圖之平面顯示器沿剖面線⑽,繪 I之平面顯示器之本發明之第二實施例之剖面圖; 第3圖為本發明之液晶顯示器之上視圖; 第4A圖至帛4D圖為帛3圖之液晶顯示器沿剖面線 -I’繪製之液晶顯示器之本發明之第三實施例 製 程剖面圖; 顯示器之第四實施 第5A圖至第5D圖為本發明之液晶 例之對應製程剖面圖; _ 帛6A圖至第6D圖為本發明之液晶顯示器之第施 例之對應製程剖面圖;以及 第7A圖至第7C圖為本發明之液晶顯示器 例之對應製程剖面圖。 〇 n施TW4309PA [Simple description of the diagram] ^ lA know the top view of the liquid crystal display; IB ® is the liquid crystal display of the 1A diagram along the [, the cross-sectional view of the liquid crystal display; ^ is the top view of the flat panel display of the present invention, · 2B is a cross-sectional view of the flat display of FIG. 2A along the cross-sectional line, and the cross-sectional view of the first embodiment of the present invention is shown in FIG. 2C; the 2C® is a flat display of FIG. 2A along the section line (10), 1 is a top view of a second embodiment of the present invention; FIG. 3 is a top view of the liquid crystal display of the present invention; FIGS. 4A to 4D are liquid crystal displays of the 帛3 diagram taken along a section line -I' The liquid crystal display is a cross-sectional view of a third embodiment of the present invention; the fourth embodiment of the display is 5A to 5D, which is a cross-sectional view of a corresponding process of the liquid crystal according to the present invention; _ 6A to 6D are the present invention FIG. 7A to FIG. 7C are cross-sectional views showing corresponding processes of the liquid crystal display of the present invention. 〇 n Shi
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TWI565120B (en) * | 2014-11-27 | 2017-01-01 | 財團法人工業技術研究院 | Illumination device and method of fabricating an illumination device |
US10084135B2 (en) | 2014-11-27 | 2018-09-25 | Industrial Technology Research Institute | Illumination device and method of fabricating an illumination device |
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