TWI370495B - - Google Patents
Info
- Publication number
- TWI370495B TWI370495B TW096139003A TW96139003A TWI370495B TW I370495 B TWI370495 B TW I370495B TW 096139003 A TW096139003 A TW 096139003A TW 96139003 A TW96139003 A TW 96139003A TW I370495 B TWI370495 B TW I370495B
- Authority
- TW
- Taiwan
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00261—Processes for packaging MEMS devices
- B81C1/00333—Aspects relating to packaging of MEMS devices, not covered by groups B81C1/00269 - B81C1/00325
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00134—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
- B81C1/0015—Cantilevers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/01—Suspended structures, i.e. structures allowing a movement
- B81B2203/0118—Cantilevers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2203/00—Forming microstructural systems
- B81C2203/01—Packaging MEMS
- B81C2203/0136—Growing or depositing of a covering layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/161—Cap
- H01L2924/1615—Shape
- H01L2924/16195—Flat cap [not enclosing an internal cavity]
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW096139003A TW200919593A (en) | 2007-10-18 | 2007-10-18 | Elements and modules with micro caps and wafer level packaging method thereof |
US12/244,258 US7824945B2 (en) | 2007-10-18 | 2008-10-02 | Method for making micro-electromechanical system devices |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW096139003A TW200919593A (en) | 2007-10-18 | 2007-10-18 | Elements and modules with micro caps and wafer level packaging method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200919593A TW200919593A (en) | 2009-05-01 |
TWI370495B true TWI370495B (zh) | 2012-08-11 |
Family
ID=41415165
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096139003A TW200919593A (en) | 2007-10-18 | 2007-10-18 | Elements and modules with micro caps and wafer level packaging method thereof |
Country Status (2)
Country | Link |
---|---|
US (1) | US7824945B2 (zh) |
TW (1) | TW200919593A (zh) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102009029184A1 (de) * | 2009-09-03 | 2011-03-10 | Robert Bosch Gmbh | Herstellungsverfahren für ein verkapptes mikromechanisches Bauelement, entsprechendes mikromechanisches Bauelement und Kappe für ein mikromechanisches Bauelement |
KR101300749B1 (ko) * | 2009-12-14 | 2013-08-28 | 한국전자통신연구원 | 음향 센서 및 이의 제조 방법 |
US9131325B2 (en) * | 2010-08-31 | 2015-09-08 | Freescale Semiconductor, Inc. | MEMS device assembly and method of packaging same |
US8636911B2 (en) * | 2010-10-07 | 2014-01-28 | Magic Technologies, Inc. | Process for MEMS scanning mirror with mass remove from mirror backside |
TWI421983B (zh) * | 2011-03-22 | 2014-01-01 | Memsor Corp | 微機電裝置及其製造方法 |
TWI458409B (zh) * | 2011-06-21 | 2014-10-21 | Memsor Corp | 微機電裝置及其製造方法 |
US8889451B2 (en) | 2012-02-21 | 2014-11-18 | Freescale Semiconductor, Inc. | MEMS pressure transducer assembly and method of packaging same |
US9402138B2 (en) | 2012-10-12 | 2016-07-26 | Infineon Technologies Ag | MEMS device and method of manufacturing a MEMS device |
US9091820B2 (en) | 2013-06-10 | 2015-07-28 | Freescale Semiconductor, Inc. | Communication system die stack |
US10230458B2 (en) * | 2013-06-10 | 2019-03-12 | Nxp Usa, Inc. | Optical die test interface with separate voltages for adjacent electrodes |
US9442254B2 (en) | 2013-06-10 | 2016-09-13 | Freescale Semiconductor, Inc. | Method and apparatus for beam control with optical MEMS beam waveguide |
US9766409B2 (en) | 2013-06-10 | 2017-09-19 | Nxp Usa, Inc. | Optical redundancy |
US9810843B2 (en) | 2013-06-10 | 2017-11-07 | Nxp Usa, Inc. | Optical backplane mirror |
US9435952B2 (en) | 2013-06-10 | 2016-09-06 | Freescale Semiconductor, Inc. | Integration of a MEMS beam with optical waveguide and deflection in two dimensions |
US9094135B2 (en) | 2013-06-10 | 2015-07-28 | Freescale Semiconductor, Inc. | Die stack with optical TSVs |
US9261556B2 (en) | 2013-06-10 | 2016-02-16 | Freescale Semiconductor, Inc. | Optical wafer and die probe testing |
US11220423B2 (en) * | 2018-11-01 | 2022-01-11 | Invensense, Inc. | Reduced MEMS cavity gap |
Family Cites Families (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5470783A (en) * | 1994-06-06 | 1995-11-28 | At&T Ipm Corp. | Method for integrated circuit device isolation |
US5596222A (en) * | 1994-08-12 | 1997-01-21 | The Charles Stark Draper Laboratory, Inc. | Wafer of transducer chips |
US6969635B2 (en) * | 2000-12-07 | 2005-11-29 | Reflectivity, Inc. | Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates |
US6156585A (en) * | 1998-02-02 | 2000-12-05 | Motorola, Inc. | Semiconductor component and method of manufacture |
US7190854B1 (en) * | 2000-05-24 | 2007-03-13 | Active Optical Networks, Inc. | Methods for forming an array of MEMS optical elements |
US6827866B1 (en) * | 2000-05-24 | 2004-12-07 | Active Optical Networks, Inc. | Deep-well lithography process for forming micro-electro-mechanical structures |
US6847090B2 (en) * | 2001-01-24 | 2005-01-25 | Knowles Electronics, Llc | Silicon capacitive microphone |
US7057251B2 (en) * | 2001-07-20 | 2006-06-06 | Reflectivity, Inc | MEMS device made of transition metal-dielectric oxide materials |
US20030048036A1 (en) * | 2001-08-31 | 2003-03-13 | Lemkin Mark Alan | MEMS comb-finger actuator |
US6847114B2 (en) * | 2001-11-09 | 2005-01-25 | Turnstone Systems, Inc. | Micro-scale interconnect device with internal heat spreader and method for fabricating same |
WO2003047307A2 (en) * | 2001-11-27 | 2003-06-05 | Corporation For National Research Initiatives | A miniature condenser microphone and fabrication method therefor |
DE10160830A1 (de) * | 2001-12-11 | 2003-06-26 | Infineon Technologies Ag | Mikromechanische Sensoren und Verfahren zur Herstellung derselben |
US6787897B2 (en) * | 2001-12-20 | 2004-09-07 | Agilent Technologies, Inc. | Wafer-level package with silicon gasket |
US7208809B2 (en) * | 2002-09-19 | 2007-04-24 | Nippon Telegraph And Telephone Corporation | Semiconductor device having MEMS |
US20050250253A1 (en) * | 2002-10-23 | 2005-11-10 | Cheung Kin P | Processes for hermetically packaging wafer level microscopic structures |
US20050189621A1 (en) * | 2002-12-02 | 2005-09-01 | Cheung Kin P. | Processes for hermetically packaging wafer level microscopic structures |
US7049051B2 (en) * | 2003-01-23 | 2006-05-23 | Akustica, Inc. | Process for forming and acoustically connecting structures on a substrate |
JP2004356707A (ja) * | 2003-05-27 | 2004-12-16 | Hosiden Corp | 音響検出機構 |
US7075160B2 (en) * | 2003-06-04 | 2006-07-11 | Robert Bosch Gmbh | Microelectromechanical systems and devices having thin film encapsulated mechanical structures |
US6996306B2 (en) * | 2003-08-25 | 2006-02-07 | Asia Pacific Microsystems, Inc. | Electrostatically operated micro-optical devices and method for manufacturing thereof |
US6936524B2 (en) * | 2003-11-05 | 2005-08-30 | Akustica, Inc. | Ultrathin form factor MEMS microphones and microspeakers |
WO2005050680A1 (ja) * | 2003-11-20 | 2005-06-02 | Matsushita Electric Industrial Co., Ltd. | エレクトレット及びエレクトレットコンデンサー |
US7585744B2 (en) * | 2003-12-08 | 2009-09-08 | Freescale Semiconductor, Inc. | Method of forming a seal for a semiconductor device |
US7091057B2 (en) * | 2003-12-19 | 2006-08-15 | Agency For Science, Technology And Research | Method of making a single-crystal-silicon 3D micromirror |
JP2005244178A (ja) * | 2004-01-26 | 2005-09-08 | Toshiba Corp | 半導体装置の製造方法 |
US7280436B2 (en) * | 2004-05-07 | 2007-10-09 | Corporation For National Research Initiatives | Miniature acoustic detector based on electron surface tunneling |
JP3751625B2 (ja) * | 2004-06-29 | 2006-03-01 | 新光電気工業株式会社 | 貫通電極の製造方法 |
US7329933B2 (en) * | 2004-10-29 | 2008-02-12 | Silicon Matrix Pte. Ltd. | Silicon microphone with softly constrained diaphragm |
US7346178B2 (en) * | 2004-10-29 | 2008-03-18 | Silicon Matrix Pte. Ltd. | Backplateless silicon microphone |
US7159459B2 (en) * | 2005-01-06 | 2007-01-09 | Freescale Semiconductor, Inc. | Multiple microelectromechanical (MEM) devices formed on a single substrate and sealed at different pressures and method therefor |
US7449356B2 (en) * | 2005-04-25 | 2008-11-11 | Analog Devices, Inc. | Process of forming a microphone using support member |
US20060291674A1 (en) * | 2005-06-14 | 2006-12-28 | Merry Electronics Co. Ltd. | Method of making silicon-based miniaturized microphones |
TWI293851B (en) * | 2005-12-30 | 2008-02-21 | Ind Tech Res Inst | Capacitive microphone and method for making the same |
US7351609B2 (en) * | 2006-03-22 | 2008-04-01 | National Taiwan University | Method for wafer level package of sensor chip |
KR100785014B1 (ko) * | 2006-04-14 | 2007-12-12 | 삼성전자주식회사 | Soi웨이퍼를 이용한 mems 디바이스 및 그 제조방법 |
-
2007
- 2007-10-18 TW TW096139003A patent/TW200919593A/zh unknown
-
2008
- 2008-10-02 US US12/244,258 patent/US7824945B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20090311819A1 (en) | 2009-12-17 |
TW200919593A (en) | 2009-05-01 |
US7824945B2 (en) | 2010-11-02 |
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