TWI369158B - - Google Patents

Info

Publication number
TWI369158B
TWI369158B TW097104684A TW97104684A TWI369158B TW I369158 B TWI369158 B TW I369158B TW 097104684 A TW097104684 A TW 097104684A TW 97104684 A TW97104684 A TW 97104684A TW I369158 B TWI369158 B TW I369158B
Authority
TW
Taiwan
Application number
TW097104684A
Other languages
Chinese (zh)
Other versions
TW200841774A (en
Inventor
Ro Lee Sang
Sil Im Seong
Hwan Kim Yun
Cheol Choi Woo
Original Assignee
Se Plasma Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=39752484&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TWI369158(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Se Plasma Inc filed Critical Se Plasma Inc
Publication of TW200841774A publication Critical patent/TW200841774A/en
Application granted granted Critical
Publication of TWI369158B publication Critical patent/TWI369158B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32834—Exhausting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32522—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32541—Shape
TW097104684A 2007-02-06 2008-02-05 Plasma generation device TW200841774A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020070012129A KR100875233B1 (en) 2007-02-06 2007-02-06 Plasma generator with suction port around protruding plasma outlet

Publications (2)

Publication Number Publication Date
TW200841774A TW200841774A (en) 2008-10-16
TWI369158B true TWI369158B (en) 2012-07-21

Family

ID=39752484

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097104684A TW200841774A (en) 2007-02-06 2008-02-05 Plasma generation device

Country Status (4)

Country Link
JP (1) JP4801103B2 (en)
KR (1) KR100875233B1 (en)
CN (1) CN101242705A (en)
TW (1) TW200841774A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014132540A (en) * 2013-01-07 2014-07-17 Kowa Dennetsu Keiki:Kk Plasma surface treatment device
WO2017162614A1 (en) * 2016-03-22 2017-09-28 Koninklijke Philips N.V. Cold plasma device for treating a surface
CN113950405B (en) * 2019-06-11 2023-09-26 横滨橡胶株式会社 Tire cleaning method and tire manufacturing method

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07326587A (en) * 1994-06-02 1995-12-12 Hitachi Electron Eng Co Ltd Temperature adjustment mechanism of work reaction device
JPH09263931A (en) * 1996-03-25 1997-10-07 Agency Of Ind Science & Technol Vacuum treatment and vacuum treating device
JP3561080B2 (en) * 1996-04-23 2004-09-02 松下電器産業株式会社 Plasma processing apparatus and plasma processing method
JP2000045074A (en) * 1998-07-27 2000-02-15 Komatsu Ltd Surface treating method
JP3972970B2 (en) * 1998-08-06 2007-09-05 株式会社エフオーアイ Plasma reactor
JP2001118831A (en) 1999-10-19 2001-04-27 Nec Kansai Ltd Dry etching system
JP2001127041A (en) * 1999-10-26 2001-05-11 Matsushita Electric Ind Co Ltd Plasma processor for board, and plasma processing method
JP3366301B2 (en) * 1999-11-10 2003-01-14 日本電気株式会社 Plasma CVD equipment
JP2001321633A (en) * 2000-05-18 2001-11-20 Asahi Lite Optical Co Ltd Method for removing nasty smell and device therefor
JP2002001099A (en) * 2000-06-20 2002-01-08 Matsushita Electric Ind Co Ltd Method and apparatus for plasma treatment
JP2002025988A (en) * 2000-07-07 2002-01-25 Chemitoronics Co Ltd Plasma etching system
JP2002237480A (en) * 2000-07-28 2002-08-23 Sekisui Chem Co Ltd Method of treating base material with discharge plasma
JP2003022900A (en) * 2001-07-06 2003-01-24 Sekisui Chem Co Ltd Plasma processing method for atmospheric pressure pulse
JP4077704B2 (en) * 2001-09-27 2008-04-23 積水化学工業株式会社 Plasma processing equipment
JP2003208999A (en) * 2002-01-10 2003-07-25 Sekisui Chem Co Ltd Discharge plasma processing method and its equipment
JP2003318000A (en) * 2002-04-19 2003-11-07 Sekisui Chem Co Ltd Discharge plasma treatment apparatus
JP4140324B2 (en) * 2002-09-10 2008-08-27 住友金属鉱山株式会社 Metal boride powder and method for producing the same
JP3686662B1 (en) * 2003-05-14 2005-08-24 積水化学工業株式会社 Plasma processing equipment
JP4420690B2 (en) * 2004-02-04 2010-02-24 ホソカワミクロン株式会社 Fine particle production method and fine particle production apparatus
JP2005260186A (en) * 2004-03-15 2005-09-22 Sharp Corp Plasma process apparatus
CN101128964B (en) * 2005-03-28 2012-05-09 三菱电机株式会社 Silent discharge type plasma device
JP5168907B2 (en) * 2007-01-15 2013-03-27 東京エレクトロン株式会社 Plasma processing apparatus, plasma processing method, and storage medium

Also Published As

Publication number Publication date
TW200841774A (en) 2008-10-16
JP2008192618A (en) 2008-08-21
CN101242705A (en) 2008-08-13
KR100875233B1 (en) 2008-12-19
KR20080073471A (en) 2008-08-11
JP4801103B2 (en) 2011-10-26

Similar Documents

Publication Publication Date Title
CN104335712B8 (en)
TWI329394B (en)
CN300727988S (zh) 标签(jmy-025)
CN300736167S (zh) 笔(ah-br232)
CN300729146S (zh) 嵌入式燃气灶(不锈钢b型)
CN300730695S (zh) 烛台(100)
CN300730811S (zh) 蜡烛(232)
CN300726086S (zh) 钥匙圈
CN300726267S (zh) 墙纸(26)
CN300726282S (zh) 包装纸
CN300726283S (zh) 玻璃板(第六印象)
CN300726363S (zh) 婴儿床
CN300726666S (zh) 电磁茶炉
CN300726847S (zh) 酒瓶
CN300726955S (zh) 包装盒(黄金搭档儿童青少年型)
CN300726969S (zh) 酒类包装盒(8)
CN300730822S (zh) 蜡烛(102)
CN300727525S (zh) 漏电断路器(tgb7l-40)
CN300727568S (zh) 扬声器(2)
CN300727612S (zh) 显示器(五)
CN300727777S (zh) 数控雕铣机床
CN300727985S (zh) 标签(jmy-016)
CN300726853S (zh) 储水箱(条形压纹)
CN300726770S (zh) 机柜门锁
CN300727132S (zh) 包装袋(田七纯棉洗衣粉)

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees