TWI367776B - Separator for separating a liquid component from a mixture of liquid and gas and apparatus for processing a substrate including the separator - Google Patents

Separator for separating a liquid component from a mixture of liquid and gas and apparatus for processing a substrate including the separator

Info

Publication number
TWI367776B
TWI367776B TW098130290A TW98130290A TWI367776B TW I367776 B TWI367776 B TW I367776B TW 098130290 A TW098130290 A TW 098130290A TW 98130290 A TW98130290 A TW 98130290A TW I367776 B TWI367776 B TW I367776B
Authority
TW
Taiwan
Prior art keywords
separator
liquid
separating
mixture
gas
Prior art date
Application number
TW098130290A
Other languages
English (en)
Other versions
TW201016293A (en
Inventor
Jeong-Seon Kim
Original Assignee
Semes Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semes Co Ltd filed Critical Semes Co Ltd
Publication of TW201016293A publication Critical patent/TW201016293A/zh
Application granted granted Critical
Publication of TWI367776B publication Critical patent/TWI367776B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D19/00—Degasification of liquids
    • B01D19/0042—Degasification of liquids modifying the liquid flow
    • B01D19/0052—Degasification of liquids modifying the liquid flow in rotating vessels, vessels containing movable parts or in which centrifugal movement is caused
    • B01D19/0057—Degasification of liquids modifying the liquid flow in rotating vessels, vessels containing movable parts or in which centrifugal movement is caused the centrifugal movement being caused by a vortex, e.g. using a cyclone, or by a tangential inlet
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77—Liquid phase processes
    • B01D53/78—Liquid phase processes with gas-liquid contact
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Filtering Of Dispersed Particles In Gases (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Separating Particles In Gases By Inertia (AREA)
TW098130290A 2008-09-10 2009-09-08 Separator for separating a liquid component from a mixture of liquid and gas and apparatus for processing a substrate including the separator TWI367776B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020080089171A KR101000296B1 (ko) 2008-09-10 2008-09-10 기액 분리 장치 및 이를 포함하는 기판 처리 장치

Publications (2)

Publication Number Publication Date
TW201016293A TW201016293A (en) 2010-05-01
TWI367776B true TWI367776B (en) 2012-07-11

Family

ID=42017761

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098130290A TWI367776B (en) 2008-09-10 2009-09-08 Separator for separating a liquid component from a mixture of liquid and gas and apparatus for processing a substrate including the separator

Country Status (4)

Country Link
JP (1) JP4870801B2 (zh)
KR (1) KR101000296B1 (zh)
CN (1) CN101670215A (zh)
TW (1) TWI367776B (zh)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI440607B (zh) * 2011-12-13 2014-06-11 Vacuum Elimination Device and Method
CN102720549B (zh) * 2012-06-20 2015-04-08 河北省电力勘测设计研究院 真空能旋涡凝汽器
RU2529672C1 (ru) * 2013-07-09 2014-09-27 Шлюмберже Текнолоджи Б.В. Многофазный сепаратор-измеритель
CN104174188B (zh) * 2014-08-08 2015-09-30 西北工业大学 一种水洞除气装置
KR101817215B1 (ko) * 2016-03-16 2018-01-11 세메스 주식회사 펌프 및 액 공급 장치
CN108786283B (zh) * 2018-08-31 2023-10-10 中冶北方（大连）工程技术有限公司 一种选矿脱水作业用三级气液分离系统
KR102221258B1 (ko) * 2018-09-27 2021-03-02 세메스 주식회사 약액 토출 장치
KR102168831B1 (ko) * 2018-12-10 2020-10-22 주식회사 포스코 폐액 자동배출 여과장치
CN111900102A (zh) * 2019-05-06 2020-11-06 弘塑科技股份有限公司 单晶圆湿处理设备
CN110685892B (zh) * 2019-10-31 2021-09-03 福雪莱冷暖设备(东莞)有限公司 一种隔膜真空泵
KR102375491B1 (ko) * 2020-05-22 2022-03-17 주식회사 티에스티이 세포도말용 진공 흡입 장치
CN111569560B (zh) * 2020-05-26 2021-06-25 江苏双旭动力科技有限公司 膨胀释能汽水分离器
CN117443082A (zh) * 2022-06-09 2024-01-26 河北雄安三千科技有限责任公司 分离装置和分离方法
KR102613617B1 (ko) * 2023-02-13 2023-12-14 주식회사 어반트리 지속 가능한 항균 집진기

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61106324A (ja) * 1984-10-25 1986-05-24 Advantest Corp Ｉｃハンドリング装置
JPS61197206A (ja) * 1985-02-27 1986-09-01 Toyoda Gosei Co Ltd ゴム材料準備装置
JPH02120675A (ja) * 1988-10-31 1990-05-08 Nippon Telegr & Teleph Corp <Ntt> 電気信号測定方法
JP3140624B2 (ja) * 1993-12-28 2001-03-05 日本電熱計器株式会社 霧状フラックスの捕集装置
JP3769114B2 (ja) * 1997-11-07 2006-04-19 九州電力株式会社 ガスタービンの性能低下防止装置
JP2004016842A (ja) * 2002-06-12 2004-01-22 Tsudakoma Corp ミスト回収装置
EP2082077A2 (en) * 2006-09-22 2009-07-29 Applied Materials, Inc. System and method including a particle trap/filter for recirculating a dilution gas

Also Published As

Publication number Publication date
TW201016293A (en) 2010-05-01
KR20100030288A (ko) 2010-03-18
JP2010064068A (ja) 2010-03-25
KR101000296B1 (ko) 2010-12-13
JP4870801B2 (ja) 2012-02-08
CN101670215A (zh) 2010-03-17

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