TWI358508B - - Google Patents
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- TWI358508B TWI358508B TW95119656A TW95119656A TWI358508B TW I358508 B TWI358508 B TW I358508B TW 95119656 A TW95119656 A TW 95119656A TW 95119656 A TW95119656 A TW 95119656A TW I358508 B TWI358508 B TW I358508B
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1358508 九、發明說明： 【發明所屬之技術領域】 本發明係有關於一種氣體徂庙 孔體供應早兀*及氣體供應系 統’配設於供給氣體的搬運管路^ ^ ^ s将上使用複數個流體控制 機器而控制供給氣體。 【先前技術】 在習知技射，在半導體製程中，在光阻加工的㈣ 等中係使用腐钱性氣體。由於光阻加工（光阻塗佈、曝光、 顯像、，敍刻）在半導體製程中係反覆複數次，在實際的半 導體製程中’根據需要使用供給腐姓性氣體的氣體供給單-元。 第15圖為氣體供給單元的回路圖的一例。 / -氣體供給單元使作用氣體與淨化氣體（purge gas ) 係從圖中的左端向右端流動。調節器2、壓力感測器3、 入口開閉閥（相當於申請專利範圍的「第一流體控制機 :°」）4 質 ® 流篁控制器（mass f 1 〇w contro 11 er ) 5 、及出口開閉闊6依序連接於作用氣體供給源1，出口開 閉閥6的輸出接口係連接於真空腔體7。另一方面排氣 閥（purge vaive)(相當於申請專利範圍的「第二流體 控制機器」）9係連接於淨化氣體供給源8。排氣閥9的 輸出接口係連接於入口開閉閥4與質量流量控制器5之 間。 第16圖為第15圖所示的回路被具體化的習知的氣體 供給單元1〇〇的側視圖。 2097-8098-PF 5 1358508 I知的氣體供給單元100中，調節器2係從上方以螺 检固定於輸入塊101與流路塊102的上面，輸入接口係經 由輸入塊101而連通於作用氣體供給源丨上。壓力感測器 3係從上方以螺栓固定於流路塊i 〇2、丨〇3的上面輸入接 口係連通於調節器的輪出接口。入口開閉閥4係從上方以 螺栓固定於流路塊i 〇3、1〇4的上面，輸入接口係連通於 壓力感測器3的輸出接口。排氣閥9係從上方以螺栓固定 於流路塊104、105以及排氣塊108的上面，作用氣體輸 入接口係連通於入口開閉閥4的輸出接口，淨化氣體輸入 接口係經由排氣塊i 〇8連通於淨化氣體供給源8。質量流 量控制器5係從上方以螺栓固定於流路塊1〇5、1〇6的上 面，輸入接口係連通於排氣閥9的共通輸出接口。出口開 閉閥6係從上方以螺栓固定於流路塊1〇6與輸出塊1〇7的 上面，輸出接口經由輸出塊1〇7連通於真空腔體了。氣體 供給單元100中，由於各機器2〜9以螺栓從上方固定於 塊體101〜107的上面，與全部的機器2〜9以配管連接的 情況相比，其全長縮短而可以小型化（例如參照專利文獻 1 )。 另一方面，提出一種技術（例如參照專利文獻2)質 里λιι·罝控制器5被流路塊10 5、1 〇 6舉起，與安裝面之間 有間隙❹於此，交換頻率少的入口開閉閥4或出口開閉閥 6係橫向地安裝於流路塊105、1〇6上，配設於質量流量控 制器5與安裝面之間，使氣體供給單元的全長更縮短。 專利文獻1 :特開平1 1-159649 2097-8098-PF 6 1358508 專利文獻2 :國際公開第02/093053號公報 【發明内容】 發明所欲解決的問題 然而，習知的氣體供給單元1〇〇是將機器2〜9係 上方安裝於塊體1〇1〜1〇7±，而在質量流量控制器5與 安裝面之間配設機器而達到小型化者，但近年來對於作用 氣體供給單元小型化的要求還是不夠，即機器2〜4與安 裝面之間存在著浪費的空間，設置空間變大。又，由於— 個機器係固定於二個塊體而連結於其他的機器，塊體數量 變多，而使機器與塊體的連接部分密封的密封處也變多。 因此，習知的氣體供給單元中，塊體與密封元件等的材料 費及密封處的加工費等增加，使成本變高。 有鑑於此，本發明的目的在於提供一種小型且便宜的 氣體供給單元以及氣體供給系統。 解決問題的手段 為了達成上述的目的，本發明之氣體供給單元具有以 下的構造。 (1 )配設於作用氣體搬運管路上，複數個流體控制 機器經由流路塊連通而控制作用氣體，包括將複數個流體 控制機器中的第一流體控制機器安裝於其一側面的第— 流路塊，以及將複數個流體控制機器中的第二流體控制機 器安裝於其一側面的第二流路塊’該第一流路塊與該第二 流路塊相對於作用氣體搬運方向以垂直方向堆疊，第一流 2097-8098-PF 7 1358508 體控制機器與第二流體控制機器係配設於設於作用氣體 搬運管路上的流體控制機器與安裝氣體供給單元的安裝 面之間。 (2) 在Π)所記載的氣體供給單元中，第一流路塊 在上侧面與下側面中至少開設有一接口，該等接口係經由 第一流體控制機器相互連通，第二流路塊在±彻！面以及與 安裝第二流體控制機器之側面相向的側面中至少開設有 一接口，該等接口係經由第二流體控制機器相互連通❶ (3) 在（2)所記載的氣體供給單元中，第一流路塊 在與安裝第一流體控制機器的側面相向的側面上開設至 少一接口，經由第一流體控制機器相互連通於開設於上側 面與下側面的接口。 (4) 在（1)至（3)中任一項所記載的氣體供給單 元中1。括旁通配管係配設於上述流體控制機器與上 述安裝面之間’該旁通配管使第—流路塊與第二流路塊連 接於設在作用氣體搬運管路上之流路塊。 又，為達成上述目的，本發明之氣體供給系統具有以 下的構造。 ()在（1)至（4)中任-項所記載的氣體供給單 元中，更包括一對支架’安裝於氣體供給單元的兩端，使 該氣體供給單元保持水平，典，膝 十错由將一對支架固定於安裝元 件上’使氣體供給單元聚集。 發明之效果 2097-8098-PF 8 接著，針對本發明之作用效果做說明。 本發明的氣體供給單元在例如將作用氣體於左右方 向供給的情況下，將第-流路塊與第二流路塊相對於作用 風體的搬運方向於垂直方向’即上下方向堆積藉此安裝 於第一流路塊的-側面的第-流體控制機器與安裝於第 二流路塊的一侧面的第二流體控制機器係橫向地配設於 δ又在作用氣體供給管路上的流體控制機器與安裝氣體供 給單元的安裝面之間。因此，搭載於氣體供給單元的複數 個流體控制機器中，排列在作用氣體搬運管路上的流體控 制機器係省略第一流體控制機器與第二流體控制機器。而 且第-流路塊與第：流路塊係於上下方向堆積，在單元的 全長方向無浪費的空間’與一個流體控制機器固定於二個 流路塊的情況相比，流路塊之間浪費的空間變少。於此， 第一、第二流體控制機器係直接安裝於第_、第二流路塊 上。因此，氣體控制單元與一個冑器固定於二個流路塊的 情況相比’塊體數量以及密封處減少。 根據本發明之氣體供給單元，配設於作用氣體搬運管 路上的流體控制冑器的數量減丨’同肖流路塊之間的浪費 空間變少，因此單元的全長變短而可達到小型化。又，根 據本發明的氣體供給單元，由於塊體數與密封處減少，材 料費與加工費減少，可達到低價化的目的。 當第一流路塊與第二流路塊係上下堆積時，開設於第 一流路塊的下倒面與第二流路塊的上側面的接口相互連 通。第一流路塊中，開設於上侧面與下側面的接口係經由 2097-8098-PF 9 1358508 第⑽體控制機器而連通，第二流路塊中，開設於上側面 以及〃女裝第—流體控制機器之側面相向的側面的接口 丄由第一桃體控制機器而連通，因此將供給至開口於第二 抓路塊側面的接口的流體，經由第一流體控制機器、第二 流體控制機器，從開口於第一流路塊的上側面的接口輸 出，而供給至配設於作用氣體搬運管路上的流體控制機 器。 根據本發明之氣體供給單元，㈣一、第^流路塊堆 積’在第-、第二流體控制機器上在上下方向上形成流體 可控制的流路。 特別疋，第一流路塊除了上侧面與下側面的接口以 外，在與安裝第一流體控制機器的側面相向的側面上開設 接口，並將該等接口經由第一流體控制機器相互連通時， 與第一流體控制機器不同的流體控制機器以及流路塊可 直接抵接於側面而連結，配設於作用氣體搬運管路上的流 體控制機器的數量與流路塊之間的浪費的間隙得以減 少，而達到單元的小型化的目的。 如此，當第一流路塊與第二流路塊在上下方向上堆積 時，配設於作用氣體搬運管路上的流體控制機器與安裝面 之間有多餘的間隙，在此情況下，旁通配管的一端係連接 於第一流路塊或第二流路塊，另—端係速接至配設於作用 氣體搬運管路上的流路塊，藉此若旁通配管係配設於設在 作用氣體搬運管路上的流體控制機器與安裝面之間，則可 以一條管線所佔有的空間來配置旁通配管。 2097-8098-PF 10 上述氣體供給單元係藉由安裝於兩端的一對支架被 水平地保持著，藉由該支架固定於安裝元件而聚集。如此 被系統化的氣體供給系統由於使用小型化且低價化的氣 體供給單元，可達到系統本身的小型化與低價化。 【實施方式】 接著，參照圖式說明本發明之氣體供給單元、氣體供 °系統以及流路塊的實施形態。 第一實施形態 針對本發明之氣體供給單元的第一實施形態做說 明。第1圖為氣體供給單元丨丨Α的側視圖。 氣體供給單元11A為了使其與第16圖所示的習知的 ^體供給單元100的差異得以明確，而將第15圖所示的 回路具體化而形成。與第16圖相同的元件給予相同的符 娩。氣體供給單元11A係作為流體控制機器而具有調節器 2、壓力感測器3、入口開閉閥4、質量流量控制器5、出 % 口開閉閥6以及排氣閥9，機器2〜9係安裝於塊體12、 13、14、15、16、17而連結成桿狀。機器2〜9以及塊體 12 1 7有鑑於耐熱性及剛性，而以不銹鋼等具有剛性的金 屬作為其材質。氣體供給單元11A具有以下特徵：流路塊 (相當於申請專利範圍的「第—流路塊」）14以及流路塊 (相當於申請專利範圍的「第二流路塊」）17相對於氣體 搬運方向而垂直地，即縱方向堆積。 氣體供給單元11A中，調節器2係以螺栓從上方固定 於輸入塊12與流路塊13的上面，調節器2的輸入接口經 11 2097-8098-pf 由輸入塊1 2連通於作用氣體供給源丨。流路塊i 3從連接 於調節器2輸出接口的接口向開設於圖中右側面的接口， 使作用氣體流動的流路呈L字形，從該流路分歧的分歧流 路係開口於上面。壓力感測器3係定位於分歧流路中，從 上方以螺栓固定於流路塊丨3的上面，而量測流過流路塊 1 3的作用氣體的流體壓力。 流路塊14被連接於從流路塊13的圖中左侧面貫穿的 _ 螺栓，而固定於流路塊丨3上。在流路塊丨4的圖中右側面 上k向地女裝著入口開閉閥4。即，入口開閉閥4係配設 於質量流量控制器5與安裝面之間。入口開閉閥4為氣動 閥（air operated valve)式的開閉控制閥，由流路塊14 構成本體。流路塊14係於後述。 質量流量控制器5係從上方以螺栓固定於流路塊14 與流路塊1 5的上面，輸入接口係連通於入口開閉閥4的 共通輸出接口。出口開閉閥6係以螺栓從上方固定於流路 _ 塊15與輸出塊16上面，輸出接口經由輸出塊16連通於 真空腔體7。而且’流路塊15為了使質量流量控制器5 保持水平’與流路塊14具有相同的高度，為了將泛用品 用於輸出塊16，配合流路塊16的高度而設有固定出口開 閉閥6用的段差。 另一方面，流路塊14係連接於從下方貫通流路塊1 7 的螺栓上。排氣閥9係橫向地螺合於流路塊14的圖中的 右側面。即排氣閥9與入口開閉閥4於縱向排列而配設於 質量流量控制器5與安裝面之間。排氣閥9為氣動閥式的 2097-8098-PF 12 1358508 開閉控制閥，由流路塊17構成本體。排氣塊1 9係經由排 氣配管18連接於流路塊17上，排氣閥9的排氣輸入接口 被連通於排氣供給源8。 接著’針對流路塊14做說明。第2圖表示在氣體供 給單元11A中所使用的流路塊14的構造，第2A圖為安裝 入口開閉閥4的流路塊14的主要部位剖視圖，第2B圖為 流路塊14的左側視圖，第2C圖為流路塊14的右側視圖， 第2D圖為流路塊14的下視圖。 如第2A圖所示，流路塊14係大略呈立方體的形狀。 在流路塊14的右側面上，穿設有圓筒形的安裝孔2ι，用 於螺設入口開閉閥4。流路塊14係從圖中左側面起開設與 安裝孔21同轴的第一接口 22,經由直線狀的流路，連通 於安裝孔21的中央。又，流路塊14在圖中上側面開設第 二接口 23，而在圖中下側面開設第三接口 24。第二、第 三接口 23、24係經由L字形的流路連通於安裝孔21。在 文裝孔21的底面，在連通第一接口 22的開口部的周圍設 有閥座25，連通於第二、第三接口 23、24的流路係開口 於夾持閥座25的上下對稱位置上。流路塊14的安裝孔21 由膜片閥體26氣密地分隔，形成連通於第一〜第三接口 2、23、24 的閥室 27» 又，如第2B〜2C圖所示，在夾持流路塊14的第一接1358508 IX. Description of the Invention: [Technical Field of the Invention] The present invention relates to a gas 徂 temple hole body supply early 兀* and a gas supply system 'distributed to a supply line for supplying gas ^ ^ ^ s The fluid controls the machine and controls the supply of gas. [Prior Art] In the conventional technique, in the semiconductor process, a rotted gas is used in the photoresist processing (four) or the like. Since the photoresist processing (photoresist coating, exposure, development, and lithography) is repeated several times in the semiconductor process, the gas supplied to the gas of the rot gas is supplied to the single-element as needed in the actual semiconductor process. Fig. 15 is an example of a circuit diagram of a gas supply unit. / - The gas supply unit causes the working gas and the purge gas to flow from the left end to the right end in the drawing. Regulator 2, pressure sensor 3, inlet opening and closing valve (corresponding to the patent application "first fluid controller: °") 4 quality ® flow controller (mass f 1 〇w contro 11 er ) 5 , and The outlet opening and closing width 6 is sequentially connected to the working gas supply source 1, and the output port of the outlet opening and closing valve 6 is connected to the vacuum chamber 7. On the other hand, a purge vaive (corresponding to the "second fluid control device" of the patent application range) 9 is connected to the purge gas supply source 8. The output port of the exhaust valve 9 is connected between the inlet opening and closing valve 4 and the mass flow controller 5. Fig. 16 is a side view showing a conventional gas supply unit 1A in which the circuit shown in Fig. 15 is embodied. 2097-8098-PF 5 1358508 In the gas supply unit 100, the regulator 2 is fixed to the upper surface of the input block 101 and the flow path block 102 by screwing from above, and the input interface is connected to the working gas via the input block 101. Supply source. The pressure sensor 3 is bolted to the upper portion of the flow path block i 〇 2, 丨〇3 from above, and the input port is connected to the wheel-out port of the regulator. The inlet opening and closing valve 4 is bolted to the upper surface of the flow path blocks i 〇 3 and 1 〇 4 from above, and the input port is connected to the output port of the pressure sensor 3. The exhaust valve 9 is bolted to the upper surfaces of the flow path blocks 104 and 105 and the exhaust block 108 from above, and the working gas input port is connected to the output port of the inlet opening and closing valve 4, and the purge gas input port is via the exhaust block i. The crucible 8 is connected to the purge gas supply source 8. The mass flow controller 5 is bolted to the upper of the flow path blocks 1〇5 and 1〇6 from above, and the input interface is connected to the common output port of the exhaust valve 9. The outlet opening and closing valve 6 is bolted to the upper surface of the flow path block 1〇6 and the output block 1〇7 from above, and the output port communicates with the vacuum chamber via the output block 1〇7. In the gas supply unit 100, since the respective machines 2 to 9 are fixed to the upper surfaces of the blocks 101 to 107 by bolts from above, the total length thereof is shortened and the size can be reduced (for example, compared with the case where all the devices 2 to 9 are connected by a pipe). Refer to Patent Document 1). On the other hand, a technique has been proposed (for example, refer to Patent Document 2). The λ ιι 罝 controller 5 is lifted by the flow path blocks 10 5 and 1 〇 6 and has a gap with the mounting surface, and the exchange frequency is small. The inlet opening and closing valve 4 or the outlet opening and closing valve 6 is laterally attached to the flow path blocks 105 and 1 and is disposed between the mass flow controller 5 and the mounting surface to further shorten the total length of the gas supply unit. Patent Document 1: Japanese Laid-Open Patent Publication No. Hei No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. 02-093053. SUMMARY OF THE INVENTION Problems to be Solved by the Invention However, a conventional gas supply unit 1〇〇 The machine 2 to 9 is mounted on the block 1〇1 to 1〇7±, and the machine is disposed between the mass flow controller 5 and the mounting surface to achieve miniaturization. However, in recent years, the working gas supply unit The requirement for miniaturization is still insufficient, that is, there is a wasteful space between the machines 2 to 4 and the mounting surface, and the installation space becomes large. Further, since one machine is fixed to two blocks and connected to other machines, the number of blocks is increased, and the number of seals for sealing the connection portion between the machine and the block is also increased. Therefore, in the conventional gas supply unit, the material cost of the block, the sealing member, and the like, and the processing cost of the seal are increased, and the cost is increased. In view of the above, it is an object of the present invention to provide a small and inexpensive gas supply unit and gas supply system. Means for Solving the Problem In order to achieve the above object, the gas supply unit of the present invention has the following structure. (1) disposed on the active gas carrying line, wherein the plurality of fluid control devices are in communication with the flow path block to control the working gas, and the first fluid control device of the plurality of fluid control devices is mounted on the one side of the first flow control device a road block, and a second flow path block that mounts the second fluid control device of the plurality of fluid control machines to one side thereof, the first flow path block and the second flow path block are perpendicular to the working gas carrying direction Stacking, first flow 2097-8098-PF 7 1358508 The body control machine and the second fluid control machine are disposed between the fluid control machine disposed on the active gas carrying line and the mounting surface of the installed gas supply unit. (2) In the gas supply unit described in Π), the first flow path block has at least one interface between the upper side surface and the lower side surface, and the interfaces are connected to each other via the first fluid control device, and the second flow path block is at ± thorough! At least one of the surface and the side opposite to the side on which the second fluid control device is mounted is provided with an interface that communicates with each other via the second fluid control device. (3) In the gas supply unit described in (2), the first flow The block has at least one interface on a side opposite to a side on which the first fluid control device is mounted, and communicates with each other via an interface between the upper side and the lower side via the first fluid control machine. (4) The gas supply unit according to any one of (1) to (3). A bypass piping system is disposed between the fluid control device and the mounting surface. The bypass pipe connects the first flow path block and the second flow path block to a flow path block provided in the active gas transfer line. Further, in order to achieve the above object, the gas supply system of the present invention has the following structure. (a) The gas supply unit according to any one of (1) to (4) further comprising a pair of brackets attached to both ends of the gas supply unit to maintain the gas supply unit at a level, and the knee is wrong. The gas supply unit is gathered by fixing a pair of brackets to the mounting member. EFFECTS OF THE INVENTION 2097-8098-PF 8 Next, the effects of the present invention will be described. In the gas supply unit of the present invention, for example, when the working gas is supplied in the right and left direction, the first flow path block and the second flow path block are stacked in the vertical direction, that is, in the vertical direction, with respect to the conveyance direction of the action wind body. The first fluid control machine on the side of the first flow path block and the second fluid control machine mounted on one side of the second flow path block are disposed laterally on the fluid control machine of the δ and the working gas supply line. Install between the mounting faces of the gas supply unit. Therefore, in the plurality of fluid control devices mounted in the gas supply unit, the fluid control device arranged in the gas transfer line omits the first fluid control device and the second fluid control device. Further, the first flow path block and the first flow path block are stacked in the vertical direction, and a space that is not wasted in the entire length direction of the unit is compared with the case where one fluid control device is fixed to the two flow path blocks. The waste of space is reduced. Here, the first and second fluid control devices are directly mounted on the first and second flow path blocks. Therefore, the number of blocks and the number of seals are reduced as compared with the case where one of the gas control units is fixed to the two flow path blocks. According to the gas supply unit of the present invention, the number of fluid control devices disposed on the working gas carrying line is reduced, and the wasted space between the blocks is reduced, so that the total length of the unit is shortened and the size can be reduced. . Further, according to the gas supply unit of the present invention, since the number of blocks and the number of seals are reduced, the material cost and the processing cost are reduced, and the cost can be reduced. When the first flow path block and the second flow path block are stacked up and down, the lower inverted surface of the first flow path block and the upper side of the second flow path block communicate with each other. In the first flow block, the interface between the upper side and the lower side is connected via the 2097-8098-PF 9 1358508 (10) body control machine, and the second flow block is opened on the upper side and the 〃 women's first fluid The interface of the side opposite to the side of the control machine is connected by the first peach control machine, so that the fluid supplied to the interface opening to the side of the second grip block is controlled by the first fluid control machine, the second fluid control machine, The output is output from an interface that is opened to the upper side of the first flow path block, and is supplied to a fluid control device disposed on the working gas delivery line. According to the gas supply unit of the present invention, (4) first, the second flow path block stack' forms a fluid controllable flow path in the vertical direction on the first and second fluid control machines. In particular, the first flow path block has an interface on the side opposite to the side on which the first fluid control device is mounted, in addition to the interface between the upper side and the lower side, and the interfaces are connected to each other via the first fluid control machine, The different fluid control devices of the first fluid control device and the flow path block can be directly connected to the side to be connected, and the waste control gap between the number of fluid control devices disposed on the gas transfer line and the flow path block can be reduced. And to achieve the purpose of miniaturization of the unit. When the first flow path block and the second flow path block are stacked in the vertical direction, there is an excess gap between the fluid control device disposed on the active gas transfer line and the mounting surface. In this case, the bypass pipe is provided. One end is connected to the first flow path block or the second flow path block, and the other end is fast-connected to the flow path block disposed on the working gas carrying line, whereby the bypass pipe is disposed in the working gas Between the fluid control machine on the transfer line and the mounting surface, the bypass pipe can be configured in a space occupied by one line. 2097-8098-PF 10 The gas supply unit is horizontally held by a pair of brackets attached to both ends, and is fixed by being attached to the mounting member. The gas supply system thus systemized can achieve miniaturization and low cost of the system itself by using a small-sized and low-cost gas supply unit. [Embodiment] Next, an embodiment of a gas supply unit, a gas supply system, and a flow path block according to the present invention will be described with reference to the drawings. First Embodiment A first embodiment of a gas supply unit of the present invention will be described. Fig. 1 is a side view of the gas supply unit 丨丨Α. The gas supply unit 11A is formed by embodying the circuit shown in Fig. 15 in order to clarify the difference from the conventional body supply unit 100 shown in Fig. 16. The same elements as in Fig. 16 give the same fetus. The gas supply unit 11A has a regulator 2, a pressure sensor 3, an inlet opening and closing valve 4, a mass flow controller 5, an outlet port opening and closing valve 6, and an exhaust valve 9, as a fluid control device, and the machine 2 to 9 are installed. The blocks 12, 13, 14, 15, 16, and 17 are connected in a rod shape. Machines 2 to 9 and blocks 12 1 7 are made of a metal having rigidity such as stainless steel as a material thereof in view of heat resistance and rigidity. The gas supply unit 11A has the following features: a flow path block (corresponding to the "first flow path block" of the patent application range) 14 and a flow path block (corresponding to the "second flow path block" of the patent application scope) 17 with respect to the gas The conveying direction is vertical, that is, stacked in the longitudinal direction. In the gas supply unit 11A, the regulator 2 is fixed to the upper surface of the input block 12 and the flow path block 13 by bolts from above, and the input interface of the regulator 2 is connected to the active gas supply by the input block 12 through the 11 2097-8098-pf Source. The flow path block i 3 is connected to the interface on the right side of the figure from the interface connected to the output port of the regulator 2, and the flow path through which the working gas flows is L-shaped, and the branch flow path branched from the flow path is opened on the upper side. The pressure sensor 3 is positioned in the branch flow path and is bolted to the upper surface of the flow path block 3 from above to measure the fluid pressure of the working gas flowing through the flow path block 13. The flow path block 14 is connected to the _ bolt penetrating from the left side surface of the flow path block 13 and is fixed to the flow path block 丨3. In the figure on the right side of the flow path block 4, the entrance and exit valve 4 is opened to the ground. That is, the inlet opening and closing valve 4 is disposed between the mass flow controller 5 and the mounting surface. The inlet opening and closing valve 4 is an air-operated valve type opening and closing control valve, and the flow path block 14 constitutes a main body. The flow path block 14 will be described later. The mass flow controller 5 is bolted to the upper surface of the flow path block 14 and the flow path block 15 from above, and the input interface is connected to the common output port of the inlet opening and closing valve 4. The outlet opening and closing valve 6 is fixed to the flow path _ block 15 and the output block 16 by bolts from above, and the output port communicates with the vacuum chamber 7 via the output block 16. Further, the 'flow path block 15 has the same height as the flow path block 14 in order to keep the mass flow controller 5 horizontal", and a fixed outlet opening and closing valve is provided for the height of the flow path block 16 in order to use the general product for the output block 16. 6 used segment difference. On the other hand, the flow path block 14 is connected to a bolt that penetrates the flow path block 17 from below. The exhaust valve 9 is screwed laterally to the right side surface of the flow path block 14 in the drawing. That is, the exhaust valve 9 and the inlet opening and closing valve 4 are arranged in the longitudinal direction and disposed between the mass flow controller 5 and the mounting surface. The exhaust valve 9 is a pneumatic valve type 2097-8098-PF 12 1358508 open/close control valve, and the flow path block 17 constitutes a body. The exhaust block 19 is connected to the flow path block 17 via an exhaust pipe 18, and the exhaust gas input port of the exhaust valve 9 is communicated with the exhaust gas supply source 8. Next, the flow path block 14 will be described. Fig. 2 is a view showing the structure of the flow path block 14 used in the gas supply unit 11A, Fig. 2A is a cross-sectional view showing a main portion of the flow path block 14 to which the inlet opening and closing valve 4 is attached, and Fig. 2B is a left side view of the flow path block 14. 2C is a right side view of the flow path block 14, and FIG. 2D is a lower view of the flow path block 14. As shown in Fig. 2A, the flow path block 14 has a substantially cubic shape. On the right side surface of the flow path block 14, a cylindrical mounting hole 2i is bored for screwing the inlet opening and closing valve 4. The flow path block 14 is provided with a first interface 22 coaxial with the mounting hole 21 from the left side surface of the drawing, and communicates with the center of the mounting hole 21 via a linear flow path. Further, the flow path block 14 has a second interface 23 on the upper side in the figure, and a third interface 24 is formed on the lower side in the figure. The second and third interfaces 23 and 24 communicate with the mounting hole 21 via an L-shaped flow path. A valve seat 25 is provided around the opening of the first port 22 on the bottom surface of the document opening 21, and the flow path of the second and third interfaces 23 and 24 is open to the upper and lower sides of the clamping valve seat 25. Location. The mounting hole 21 of the flow path block 14 is hermetically separated by the diaphragm valve body 26 to form a valve chamber 27» communicating with the first to third interfaces 2, 23, 24, as shown in Figs. 2B to 2C, First connection of the clamping flow path block 14
口 22、第一接口 23、第三接口 24的對稱位置上，分別形 成一對螺孔28、29 H 接著，針對流路塊17做說明。第3圖表示在氣體供A pair of screw holes 28, 29H are respectively formed at the symmetrical positions of the port 22, the first interface 23, and the third port 24. Next, the flow path block 17 will be described. Figure 3 shows the gas supply
2097-8098-PF 13 !3585〇8 給單元11A中所使用的流路塊17的構造，第3A圖為安裝 流體控制機器的流路塊17的主要部分剖視圖，第3B圖為 流路塊1 7的左侧視圖，第3C圖為流路塊17的上視圖， 第3D圖為流路17的下視圖。 如第3A圖所示，流路塊17係大略呈立方體的形狀。 在流路塊17的右側面上，穿設有圓筒形的安裝孔31，用 於螺設入口開閉閥9。流路塊1 7係從圖中左側面起開設與 安裝孔31同轴的第一接口 32’經由直線狀的流路，連通 於女裝孔31的中央。又，流路塊17在圖中上側面開設第 一接口 33’而經由L字形的流路連通於安裝孔31的中央。 第二接口 33係經由L字形的流路連通於安裝孔31。在安 裝孔31的底面，在連通第—接口 32的開口部的周圍設有 閥座3 5，連通於第一接口 3 3的流路係開口於夾持閥座3 5 的外侧。流路塊17的安裝孔31由膜片閥體36氣密地分 隔，形成連通於第一、第二接口 32、33的閥室3了。 又，如第3B圖所示，在流路塊17的左侧面，在夾持 第-接口 32的對稱位置上，分別形成一對螺孔又， 在肌路塊17上’如第3C、3D圖所* ’在夾持第二接口 33 的左右對稱的位置上，拟士 μ A田&廿咖 形成供螺栓貫穿的貫通孔39,而且 在下側面，如第3 D圖所子，泌士、也上人人 _所不，形成供卡合於螺栓頭部的段 L路塊14、17係於縱方向堆疊並以螺栓固定。流 路塊14 ' 1 7根據回路可 了以互換，使外型為同一形狀而具 有互換性。路塊1 4的第_姓p 9 q π第一接口 23、第三接口 24以及流2097-8098-PF 13 !3585〇8 The structure of the flow path block 17 used in the unit 11A, FIG. 3A is a cross-sectional view of a main portion of the flow path block 17 in which the fluid control device is mounted, and FIG. 3B is a flow path block 1 7 is a left side view, FIG. 3C is a top view of the flow path block 17, and FIG. 3D is a lower view of the flow path 17. As shown in Fig. 3A, the flow path block 17 has a substantially cubic shape. On the right side surface of the flow path block 17, a cylindrical mounting hole 31 is bored for screwing the inlet opening and closing valve 9. The flow path block 17 is connected to the center of the women's hole 31 via a linear flow path from the left side surface of the drawing and having a first port 32' coaxial with the mounting hole 31. Further, the flow path block 17 is opened at the upper side in the figure by the first port 33' and communicates with the center of the mounting hole 31 via the L-shaped flow path. The second interface 33 communicates with the mounting hole 31 via an L-shaped flow path. On the bottom surface of the mounting hole 31, a valve seat 35 is provided around the opening communicating with the first port 32, and the flow path communicating with the first port 33 is opened outside the pinch valve seat 35. The mounting hole 31 of the flow path block 17 is hermetically separated by the diaphragm valve body 36 to form a valve chamber 3 that communicates with the first and second ports 32, 33. Further, as shown in Fig. 3B, on the left side surface of the flow path block 17, a pair of screw holes are formed at the symmetrical positions of the first interface 32, and on the muscle path block 17, '3C, In the left-right symmetrical position of the second interface 33, the 士 μ A A & 廿 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成In addition, the segment L blocks 14 and 17 which are formed to be engaged with the bolt head are stacked in the longitudinal direction and fixed by bolts. The flow blocks 14' to 17 are interchangeable according to the circuit, so that the outer shape is the same shape and interchangeable. The first_last name of the block 1 4 p 9 q π first interface 23, the third interface 24 and the flow
2097-8098-PF 14 1358508 路塊17的第二接口 33在流路塊14、17堆疊時形成同軸 狀排列《因此’例如在不供給淨化氣體的回路上，省略了 排氣塊1 9、排氣配管18以及排氣閥9，可改變至流路塊 14，而也可在一段中使用流路塊17。而且，具有如此的互 換性’流路塊17在貫通孔39的内面形成母螺紋而可用於 鎖入螺栓。 流路塊14與流路塊17如以下安裝於氣體供給單元 11A。如第1圖所示，流路塊14係將第一接口 22經由氣 ® 門（未圖示）對位於開設在流路塊1 3的圖中右側面的接 口，流路塊13的從圖中左侧面侧向右侧面侧貫通的螺栓 係連接於左侧面的螺孔2 8 ’藉此與流路塊13 一體化。流 路塊14係以從上方貫穿質量流量控制器5的螺栓連接於 上側面的螺孔30 ’藉此與質量流量控制器5 一體化。在流 路塊14的下侧面上’流路塊14的第三接口 24與流路塊 17的第二接口 33之間存在一氣門（未圖示），流路塊14 的下側面抵接於流路塊1 7的上側面，從下方貫穿流路塊 ® 1 7之貫通孔39的螺栓連接於流路塊14的螺孔29，藉此 流路塊14、1 7係一體化。 流路塊1 7在第一接口 32與排氣配管18之間配設氣 門’貫穿排氣配管18的固定塊的螺栓係連接於左側面的 螺孔38 ’藉此與排氣配管18 —體化。而且此時，各螺栓 對各氣門施加平均的力而連結。各螺栓周圍的密封力是平 均的。 此氣體供給單元11A由支架41、42支持而固定於安 2097-8098-PF 15 1358508 裝板10上，而構成起體供給系統。支架41、42將金屬板 的兩端彎曲至相反側並設有抵接於氣體供給系統丨丨A的下 面的抵接部41a、42a，以及抵接於安裝板10的抵接部 41b、42b »氣體供給單元11A中，支架41、42分別將貫 穿抵接部41a、42a的螺栓連接於塊體12、13、16而藉此 被固定’螺栓貫穿於該支架41、42的抵接部4ib、42b而 連接於安裝板10上，藉此從安裝面上舉而固定於安裝板 10.上。 而且’此時由於排氣配管18係貫穿於形成於支架41 上的貫穿孔或槽，排氣配管丨8可在調節器2與壓力敢側 氣3的下方設置成直線狀’在氣體供給單元llA的寬度方 向上不佔有多餘的空間。又，由於排氣塊19設於支架41 的外側，在增設氣體供給單元11A時容易設置排氣線。 接著’針對氣體供給單元11A的作用效果做說明。 該氣體供給單元11A在作用氣體與淨化氣體均未供給 時，入口開閉閥4、出口開閉閥6以及排氣閥9是關閉的。 氣體供給單元11A在供給作用氣體時，在排氣閥9關 閉的狀態下，打開入口開閉閥4與出口開閉閥6。接著， ，作用氣體供給源i供給至輸入快12的作用氣體在調節 器調整壓力後，經過流路塊13輸入至流路塊14的第一接 口 22。作用氣體由於排氣閥9關閉，而從第—接口 u經 由閥座25、閥室27供給至第二接口 23。當 路塊Η的第二接口 23輸入至質量流量控制器二= 流1，通過出口開閉閥6並經過輸出塊16輸出至真空腔 2097-8098-PF 16 1358508 體7 0 氣體供給單元UA在之後進行排氣時，關閉入口開閉 閥4之後，打開排氣閥9 ^從淨化氣體供給源8供給至排 氣塊1 9的淨化氣體經由排氣配管丨8輸入至流路塊丨7的 第一接口 32。淨化氣體從第一接口 32經由閥座35、閥室 37供給至第二接口 33，而輸入至流路塊14的第三接口 24。淨化氣體從連通於第三接口 24的流路流入閥室27 時，在閥座25的周圍分成二個方向流動，而流入連通於 _ 第二接口 23的流路。淨化氣體從第二接口 23輸入至質量 流量控制器5，更經由流路塊丨5、出口開閉閥6、輸出塊 1 6輸出至真空腔體7。此時，淨化氣體將殘留在入口開閉 閥4、流路塊14、質量流量控制器5、流路塊丨5、出口開 閉閥6及輸出塊1 6的作用氣體以流體壓力排出，進行氣 體置換。之後，氣體供給單元11A關閉排氣閥9，排氣完 畢。 接著’根據本實施形態的氣體供給單元丨丨A，將流路 •塊14與流路塊1 7係相對於從輸入塊丨2側向輸出塊丨6側 流動的作用氣體的運送方向呈垂直方向，即圖中上下方向 堆疊’藉此安裝於流路塊14的一侧面的入口開閉閥4與 安裝於流路塊1 7的一側面的排氣閥9係撗向地配置於設 在作用氣體管路上的質量流量控制器5與安裴氣體供給單 元11A的安裝面之間的間隙中。因此，搭載於氣體供給單 元11A的複數個流體控制機器2、3、4、5、6、9之中， 排列在作用氣體輸送管路上的流體控制機器係省略了入 2097-8098-PF 17 1358508 口開閉閥4與排氣閥9。而且，流路塊14與流路塊17在 上下方向上堆積，由於在單元11A的全長方向上沒有浪費 的空間，與一個流體控制機器固定於二個流路塊的情況下 相比，流路塊之間的浪費的空間變少。於此，入口開閉閥 4與排氣閥9係分別直接安裝於流路塊14、1 7上。因此’ 氣體供給單元11A不必如習知技術般（參照第1 6圖）入 口開閉閥4及排氣閥9分別橫跨二個流路塊，流路塊的數 量及密封處減少。 針對上述效果，比較將同一回路具體化的氣體供給單 元11A、100而做具體的說明。第4圖表示氣體供給裝置 11A的尺寸及密封位置。第5圖為在第16圖中所示的氣體 供給單元100的尺寸及密封位置的突❶如上所述，氣體供 給單元11A與習知的氣體供給單元丨〇〇係將第i 5圖所示 的同一回路具體化。 氣體供給裝置11A僅在輸入塊12與流路塊13之間存 在全長方向的間隙S，相對於此，習知的氣體供給單元1 〇 〇 具有輸入塊101與流路塊1 〇2之間、流路塊1 〇2與流路塊 1 03之間、流路塊！ 〇3與流路塊1 〇4之間的三個地方的間 隙，氣體供給單元11A與習知的氣體供給單元1 〇〇相比， 全長方向的間隙量變少。又，氣體供給裝置i u與習知的 氣體供給單元1 〇〇相比，入口開閉閥4與排氣閥9不沿管 線設置，可節省入口開閉閥4與排氣閥9的設置空間》藉 此，習知的氣體供給單元1〇〇的全長為269_，相對地氣 體供、··。單元11A的全長為178隨，氣體供給單元11A與習2097-8098-PF 14 1358508 The second interface 33 of the block 17 is formed in a coaxial arrangement when the flow path blocks 14, 17 are stacked. Therefore, for example, on a circuit that does not supply the purge gas, the exhaust block 19 and the row are omitted. The gas piping 18 and the exhaust valve 9 can be changed to the flow path block 14, and the flow path block 17 can also be used in one section. Further, the interchangeable portion "flow path block 17" is formed with a female thread on the inner surface of the through hole 39 and can be used for locking the bolt. The flow path block 14 and the flow path block 17 are attached to the gas supply unit 11A as follows. As shown in Fig. 1, the flow path block 14 connects the first interface 22 to the right side surface of the flow path block 13 via the gas valve (not shown), and the flow path block 13 is shown in the figure. The bolt that penetrates to the right side of the left side of the middle side is connected to the screw hole 28' of the left side surface, thereby being integrated with the flow path block 13. The flow path block 14 is integrated with the mass flow controller 5 by a screw hole 30' which is connected to the upper side by bolts penetrating the mass flow controller 5 from above. On the lower side of the flow path block 14 there is a valve (not shown) between the third interface 24 of the flow path block 14 and the second interface 33 of the flow path block 17, and the lower side of the flow path block 14 abuts The upper side surface of the flow path block 17 is connected to the screw hole 29 of the flow path block 14 through the bolt passing through the through hole 39 of the flow path block 1.7 from below, whereby the flow path blocks 14 and 17 are integrated. The flow path block 17 is disposed between the first port 32 and the exhaust pipe 18, and the bolt passing through the fixed block of the exhaust pipe 18 is connected to the screw hole 38' on the left side surface, thereby being integrated with the exhaust pipe 18 Chemical. At this time, each bolt is connected to each of the valves by applying an average force. The sealing force around each bolt is average. This gas supply unit 11A is supported by the brackets 41, 42 and fixed to the mounting plate 10 of the An 2097-8098-PF 15 1358508 to constitute a starting supply system. The brackets 41 and 42 bend the both ends of the metal plate to the opposite side and are provided with abutting portions 41a and 42a that abut against the lower surface of the gas supply system 丨丨A, and abutting portions 41b and 42b that abut against the mounting plate 10. In the gas supply unit 11A, the brackets 41 and 42 respectively connect the bolts penetrating the abutting portions 41a and 42a to the blocks 12, 13, and 16, thereby being fixed by the bolts penetrating the abutting portions 4ib of the brackets 41 and 42. And 42b is connected to the mounting board 10, thereby being fixed from the mounting surface to the mounting board 10. Further, at this time, since the exhaust pipe 18 is inserted through the through hole or the groove formed in the bracket 41, the exhaust pipe 8 can be disposed linearly below the regulator 2 and the pressure side 3 in the gas supply unit. llA does not occupy extra space in the width direction. Moreover, since the exhaust block 19 is provided outside the bracket 41, it is easy to provide an exhaust line when the gas supply unit 11A is added. Next, the effect of the gas supply unit 11A will be described. When the gas supply unit 11A is not supplied with both the working gas and the purge gas, the inlet opening and closing valve 4, the outlet opening and closing valve 6, and the exhaust valve 9 are closed. When the gas supply unit 11A supplies the working gas, the inlet opening and closing valve 4 and the outlet opening and closing valve 6 are opened in a state where the exhaust valve 9 is closed. Next, the working gas supplied from the working gas supply source i to the input fast 12 is input to the first port 22 of the flow path block 14 through the flow path block 13 after the regulator adjusts the pressure. The operating gas is supplied from the first port u through the valve seat 25 and the valve chamber 27 to the second port 23 due to the closing of the exhaust valve 9. When the second interface 23 of the block block is input to the mass flow controller 2 = stream 1, through the outlet opening and closing valve 6 and through the output block 16 to the vacuum chamber 2097-8098-PF 16 1358508 body 7 0 gas supply unit UA after When the exhaust valve is closed, the inlet opening and closing valve 4 is closed, and the exhaust valve 9 is opened. The purge gas supplied from the purge gas supply source 8 to the exhaust block 19 is first input to the flow path block 7 via the exhaust pipe 8 Interface 32. The purge gas is supplied from the first port 32 to the second port 33 via the valve seat 35 and the valve chamber 37, and is input to the third port 24 of the flow path block 14. When the purge gas flows into the valve chamber 27 from the flow path communicating with the third port 24, it flows in two directions around the valve seat 25, and flows into the flow path communicating with the second port 23. The purge gas is input from the second port 23 to the mass flow controller 5, and is output to the vacuum chamber 7 via the flow path block 丨5, the outlet opening and closing valve 6, and the output block 16. At this time, the purge gas is discharged from the inlet opening and closing valve 4, the flow path block 14, the mass flow controller 5, the flow path block 5, the outlet opening and closing valve 6, and the output block 16 by the fluid pressure to perform gas replacement. . Thereafter, the gas supply unit 11A closes the exhaust valve 9, and the exhaust is completed. Then, according to the gas supply unit 丨丨A of the present embodiment, the flow path block 14 and the flow path block 17 are perpendicular to the transport direction of the working gas flowing from the input block 丨2 side to the output block 丨6 side. The direction, that is, the stacking in the vertical direction in the drawing, is based on the fact that the inlet opening and closing valve 4 attached to one side of the flow path block 14 and the exhaust valve 9 attached to one side of the flow path block 17 are disposed in the vertical direction. The gap between the mass flow controller 5 on the gas line and the mounting surface of the ampoule gas supply unit 11A. Therefore, among the plurality of fluid control devices 2, 3, 4, 5, 6, and 9 mounted in the gas supply unit 11A, the fluid control device arranged in the working gas delivery line is omitted from the 2097-8098-PF 17 1358508. The valve 4 is opened and closed and the exhaust valve 9 is opened. Further, the flow path block 14 and the flow path block 17 are stacked in the vertical direction, and there is no wasted space in the longitudinal direction of the unit 11A, and the flow path is compared with the case where one fluid control device is fixed to the two flow path blocks. There is less wasted space between blocks. Here, the inlet opening and closing valve 4 and the exhaust valve 9 are directly attached to the flow path blocks 14, 17 respectively. Therefore, the gas supply unit 11A does not have to be traversed between the two flow path blocks by the inlet opening and closing valve 4 and the exhaust valve 9, respectively, as in the prior art (see Fig. 16), and the number of flow path blocks and the seal portion are reduced. With respect to the above effects, the gas supply units 11A and 100 which are embodied in the same circuit will be described in detail. Fig. 4 shows the size and sealing position of the gas supply device 11A. Fig. 5 is a view showing the size and sealing position of the gas supply unit 100 shown in Fig. 16. As described above, the gas supply unit 11A and the conventional gas supply unit are shown in Fig. 5 The same loop is embodied. The gas supply device 11A has a gap S in the full length direction only between the input block 12 and the flow path block 13, whereas the conventional gas supply unit 1 has a gap between the input block 101 and the flow path block 1 〇 2 Between the flow block 1 〇 2 and the flow block 1 03, the flow block! In the gap between the three places between the crucible 3 and the flow path block 1 〇 4, the gas supply unit 11A has a smaller amount of the gap in the full length direction than the conventional gas supply unit 1 。. Further, the gas supply device iu is provided in the line between the inlet opening and closing valve 4 and the exhaust valve 9 in comparison with the conventional gas supply unit 1 ,, thereby saving the installation space of the inlet opening and closing valve 4 and the exhaust valve 9 The conventional gas supply unit 1〇〇 has a total length of 269_, and is relatively supplied with gas. The total length of the unit 11A is 178, and the gas supply unit 11A and the ha
2097-8098-PF 18 1358508 知的氣體供給單元100相比’全長可大約減少三分之一。 而且，氣體供給單元11A藉由堆疊流路塊14、17，使 全南為202mm，與全高為142mm的習知的氣體供給裝置1〇〇 相比，必須在高度方向上具有空間。但是，在半導體製造 裝置等中，希望使全長方向及寬度方向的空間狹小化較 少希望在高度方向的空間變小，即使如氣體供給單2097-8098-PF 18 1358508 The known gas supply unit 100 can be reduced by about one third compared to the full length. Further, the gas supply unit 11A has a total width of 202 mm by stacking the flow path blocks 14 and 17, and it is necessary to have a space in the height direction as compared with the conventional gas supply device 1 having a full height of 142 mm. However, in a semiconductor manufacturing apparatus or the like, it is desirable to reduce the space in the full-length direction and the width direction, and it is desirable to reduce the space in the height direction, even if it is a gas supply sheet.
6α 入- τ 祀 11A 般王鬲變高，也不會造成問題0 又’氣體供給裝置11A藉由入口開閉閥4與排氣間g 直接安裝於流路塊14、17上，第4圖所示總塊體數為7 個’相對地’習知的流路塊1 〇〇由於將入口開閉閥4與排 氣間9固定於流路塊103、104、ι〇5上，第5圖所示的織 塊體數為8個。氣體供給單元ΠΑ與習知的氣體供給單2 1 〇〇相比，塊體數量可減少1個。然後，氣體供給單元11A， 如第4圖所示密封處X為11個，相對地，習知的氣體供 給單元100’如第5圖所示密封處X為14個。氣體供給單 元11A隨著塊體數量的減少與習知的氣體供給單元i^相 比’可減少三個密封處。 根據本實施形態的氣體供給單元11A，配設於作用$ 體輸送管路上的流體控制機器的數量減少之同時，由於流 路塊之間浪費的空間減少，單元11A的全長變短而可達= 小型化的目的。又，根據本實施形態的氣體供給單元丨丨A , 由於塊體數及密封處X減少’材料費及加工費減少，可達 到低價化目的。 當流路塊1 4與流路塊1 7上下堆疊時，開設於流路塊 2097-8098-PF 19 13585086α 入 - τ 祀 11A The king 鬲 is high, and does not cause a problem. 0 The gas supply device 11A is directly attached to the flow path blocks 14 and 17 by the inlet opening and closing valve 4 and the exhaust gas g, Fig. 4 The total number of blocks shown is seven 'relatively' conventional flow path blocks 1 〇〇 because the inlet opening and closing valve 4 and the exhaust gas 9 are fixed to the flow path blocks 103, 104, and ι 5, Figure 5 The number of weaving blocks shown is eight. The number of blocks can be reduced by one compared to the conventional gas supply unit 2 1 〇〇. Then, the gas supply unit 11A has 11 seals X as shown in Fig. 4. In contrast, the conventional gas supply unit 100' has 14 seals X as shown in Fig. 5. The gas supply unit 11A can reduce the three seals as the number of blocks decreases as compared with the conventional gas supply unit. According to the gas supply unit 11A of the present embodiment, the number of fluid control devices disposed on the body transfer line is reduced, and the space that is wasted between the flow path blocks is reduced, and the total length of the unit 11A is shortened to reach = The purpose of miniaturization. Further, according to the gas supply unit 丨丨A of the present embodiment, the number of blocks and the number of seals X are reduced, and the material cost and processing fee are reduced, so that the cost can be reduced. When the flow path block 14 and the flow path block 17 are stacked on top of each other, the flow path block 2097-8098-PF 19 1358508 is opened.
14的下侧面的第三接口24與開設於流路塊17的上側面的 第二接口 33相互連通。流路塊14中，開設於上側面的第 二接口 23與開設於下侧面的第三接口 24經由入口開閉間 4連通’流路塊17中，由於開設於上側面的第二接口 33 以及開設於與安裝排氣閥9的右側面相樣的左側面的第一 接口 32經由排氣閥9連通，供給至流路塊I?的第—接口 23的淨化氣體經由排氣閥9、入口開閉閥4從開口於流路 塊14的社側面的第二接口 23輸出，而供給至配設於作用 氣體輸送管路上的質量流量控制器5。 根據本實施形態的氣體供給單元lu，藉由僅堆疊流 路塊14、1 7，以排氣閥9可在可做流體控制的流路上於上 下方向簡單地形成。 付別定流路塊 ,·«、，一_,，，叫六「囬的第二、第三 接口 23、24之外，在盥安裝入門 一发 開閉閥4之右侧面相向 的左側面上開設第一接口 22，& ^ 田於該4接口 22、23、24 係經由入口開閉閥4而相互連通，品你* & 埂通而使流路塊1 3直接抵 接於流路塊14的右側面而連結 路塊13、14之間無浪 費的二間而可達到單元11A的小型化。 上述氣體供給單元11A藉由容肚 棺田女裝於兩端的一對支牟 41、42而保持水平，藉由該立 刃對叉朱 …查… 4卜42固定於安裝板1。 上而聚集如此系統化的氣體供給车缔 、°糸統由於使用牙丨化見 低價化的氣體供給單元11A，達 用】型化且 價化〇 系、，先本身的小型化及低 第二實施形態 2097-8098-PF 20 1358508 接著，參照圖式說明氣體供給單元的第二實施形態。 本實施形態的氣體供、給單元具有與第-實施形態不 同的回路。第6圖為氣體供給單元的回路圖。而且，與第 一實施形癌相同的7L件在圖式上給予相同的標號並省略 其說明。 本實施形態的氣體供給單元具有從排氣管路分出並 連接於質量流量控制器5的下游側的旁通管路，這點與第 一實施形態不同。在旁通管路上，配設有使流速增加的噴 嘴54以及第二排氣閥9。又，在入口開閉閥4的上游側， 設有流量調整閥51 ’從作用氣體供給源丨輸入的作用氣體 以微小流量供給至入口開閉閥4。又，在第一排氣閥（相 當於申請專利範圍之「第一流體控制機器」）53的上游侧， 設有止逆閥52，防止作用氣體逆流。 第7圖為氣體供給單元11B的側視圖。 本實施形態的氣體供給單元11B為將第6圖所示的回 路具體化者。氣體供給單元11B中，質量流量控制器5與 安裝面之間的流路塊14、5 5、1 7係於縱方向堆叠，並利 用如此形成的質量流量控制器5與安裝面之間的間隙設χ 旁通配管56。於此，本實施形態的氣體供給單元 與第一實施形態的氣體供給單元11A相同的構造。在本實 施形態中，以與第一實施形態不同的構造為中心作說明， 對於與第一實施形態相同的構造，在圖式上給予相同的符 號，並適當省略說明。 氣體供給單元11B係在流路塊14、17之間配設—流The third interface 24 on the lower side of the flow path 14 communicates with the second interface 33 opened on the upper side of the flow path block 17. In the flow path block 14, the second interface 23 opened on the upper side and the third interface 24 opened on the lower side are connected to the flow path block 17 via the inlet opening and closing compartment 4, and the second interface 33 is opened on the upper side and opened. The first port 32 on the left side opposite to the right side surface on which the exhaust valve 9 is attached is communicated via the exhaust valve 9, and the purge gas supplied to the first port 23 of the flow path block I is supplied via the exhaust valve 9 and the inlet opening and closing valve. 4 is outputted from the second port 23 opening to the side of the flow path block 14 and supplied to the mass flow controller 5 disposed on the working gas delivery line. According to the gas supply unit lu of the present embodiment, only the flow path blocks 14 and 17 can be stacked, so that the exhaust valve 9 can be easily formed in the upper and lower directions on the flow path which can be fluid-controlled. Paying the flow path block, «,, _,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, The first interface 22 is opened, and the 4 interfaces 22, 23, and 24 are connected to each other via the inlet opening and closing valve 4, so that the flow path block 1 3 directly abuts the flow path. The right side of the block 14 connects the two spaces between the road blocks 13 and 14 without waste, and the unit 11A can be miniaturized. The gas supply unit 11A is provided with a pair of supports 41 at both ends of the woman. 42 while maintaining the level, by the vertical edge of the fork Zhu... check... 4 Bu 42 fixed to the mounting plate 1. The above-mentioned systemized gas supply vehicle is gathered up, and the system is low-cost due to the use of gums. The gas supply unit 11A is of a type and a valence system, and is first miniaturized and low. The second embodiment is 2097-8098-PF 20 1358508. Next, a second embodiment of the gas supply unit will be described with reference to the drawings. The gas supply and supply unit of the present embodiment has a circuit different from that of the first embodiment. Fig. 6 is a gas The circuit diagram of the unit is the same as that of the first embodiment, and the same reference numerals are given to the drawings and the description thereof is omitted. The gas supply unit of the present embodiment has a separation from the exhaust line and is connected to the mass. The bypass line on the downstream side of the flow controller 5 is different from the first embodiment. The nozzle 54 is provided with a nozzle 54 for increasing the flow rate and the second exhaust valve 9. Further, the inlet and the outlet are opened and closed. On the upstream side of the valve 4, a flow regulating valve 51' is provided, and the working gas input from the working gas supply source 供给 is supplied to the inlet opening and closing valve 4 at a minute flow rate. Further, in the first exhaust valve (corresponding to the patent application scope) On the upstream side of a fluid control machine") 53, a check valve 52 is provided to prevent backflow of the working gas. Fig. 7 is a side view of the gas supply unit 11B. The gas supply unit 11B of the present embodiment is a person who embodies the circuit shown in Fig. 6. In the gas supply unit 11B, the flow path blocks 14, 55, and 17 between the mass flow controller 5 and the mounting surface are stacked in the longitudinal direction, and the gap between the mass flow controller 5 thus formed and the mounting surface is utilized. Set the bypass piping 56. Here, the gas supply unit of the present embodiment has the same structure as the gas supply unit 11A of the first embodiment. In the present embodiment, the structure that is different from the first embodiment will be mainly described. The same reference numerals are given to the same structures as those in the first embodiment, and the description thereof will be omitted as appropriate. The gas supply unit 11B is disposed between the flow path blocks 14 and 17
2097-8098-PF 21 1358508 路塊55,以三個流路塊做堆積。流路塊14、17、55的外 型為同一形狀，於縱方向連結成棒狀。 流路塊55大體上與流路塊14具有相同的構造。即在 圖中右側面與第-排氣閥53螺合並安震第一排氣閥㈤的 右側面相向的左側面上形成第-接口，在下侧面形成第二 接口’在上側面形成第三接口，止逆閥52係連通於第一 接口。排氣塊1 9係經由排氣配管丨8連接於止逆閥52，使 淨化氣體僅流入第一排氣閥53側。而且，流路塊55中， 第一接口係對應於流路塊17的第二接口 33的位置而開 設，第二接口與第三接口係形成於同軸上的點與流路塊14 不同。 旁通配管56係固定於流路塊17與流路塊57上。為 了在質量流量控制器5的下游設置旁通配管56，流路塊 17與第一實施形態相比做1 8 0度反轉配置。因此’，第二排 氣閥9係橫向地配設於安裝面與作用氣體輸送管路上的流 量調整閥51之間，與止逆閥52上下並排。在流路塊1 7 的第二接口 33上，裝填有喷嘴54。又，旁通配管56係連 通於第一接口 32。旁通配管56係藉由將貫穿固定塊56a 的接口連接於流路塊17的螺孔3 8而與流路塊1 7 —體化。 旁通配管56的另一端係固定於設在質量流量控制器 5的下游側的流路塊57。藉由使固定塊56b抵接於流路塊 57的下端面並將從上方貫穿流路塊57的螺栓連接於固定 塊5 6b，旁通配管56與流路塊57係一體化。質量流量控 制器5係載置於流路塊14與流路塊5 7的上面，並從上方 2097-8098-PF 22 1358508 以螺栓固定。出口開閉閥6係以螺栓固定於流路塊57與 輸出塊58的上面。於此，流路塊57中，連通於質量流量 控制器5的輸入接口與連通於出口開閉閥6的輸出接口係 連通於開口於下面的淨化氣體輸入接口，使從質量流量控 制器5流出的淨化氣體與從旁通配管56流出的淨化氣體 合流而供給至出口開閉閥6。 第8圖為氣體供給單元iiB的平面圖。 氣體供給單元11B中，旁通配管5 6係配設於質量流 直控制器5與安裝面之間，不從作用氣體供給線橫方向露 出。 接著’檢討實施第6圖的回路的習知的氣體供給單元 2〇〇°第9圖係將第6圖所示的回路具體化的習知的氣體 供給單元2 0 0的側視圖。 氣體供給單元200具有將一個機器安裝於二個流路塊 上的構造。氣體供給單元200中，由輸入塊201、流量調 整閥51、流路塊202、排氣塊203、切換塊204、流路塊 2〇5、分歧塊206、流路塊207、質量流量控制器5、流路 塊208、第二排氣閥9、流路塊209、出口開閉閥6以及輸 出塊210構成作用氣體供給線。又，氣體供給單元200中， 由止逆閥52、排氣塊203、第一排氣閥53、切換塊204、 入口開閉閥4、流路塊205、分歧塊206以及流路塊207 構成排氣線。因此，習知的氣體供給單元200中僅將入口 開閉閥4、止逆閥52、第一排氣閥53以及第二排氣閥9 配設於作用氣體輸送管路上，就比本實施形態的氣體供給 2097-8098-PF 23 1358508 單兀11B的全長要長。又，習知的氣體供給單元2〇〇使排 氣塊203、切換塊204的下方以及質量流量控制器5的下 方的間隙S成為浪費的空間。 第10圖為將第6圖所示的回路具體化的習知的氣體 供給單元200的平面圖》 氣體供給單元200由分歧塊206、上游側旁通塊211、 旁通配管212、下游側旁通塊213構成旁通線。此時，旁 通配管212於氣體供給單元2〇〇的橫方向突出。即，氣體 供給單元200中’作用氣體供給線與旁通線係於單元的橫 方向设置並列的二條線。因此，習知的氣體供給單元 比本實施形態的氣體供給單元丨1Β在橫方向的設置空間 大。 因此’根據本實施形態的氣體供給單元丨1β，旁通配 管56的一端係連接於流路塊17，另一端係連接於設在作 用氣體輸送管路上的流路塊57,藉此，由於將旁通配管 56配設於設在作用氣體輸送管路上的質量流量控制器5 與安裝面之間，可以將旁通配管56設置於佔有一條管線 的空間中。 又，本實施形態的氣體供給單元1丨3由於在與安裝流 路塊55的第一排氣閥53的側面相向的側面上設有第一接 口而直接安裝止逆閥52,可減少配設在作用氣體輸送管路 上的流體控制機器。 又，當流路塊14、55、17上下堆疊時，不僅在質量 流量控制器5的下方，在流量調整閥51的下方亦友 31x1 . 2097-8098-PF 24 1358508 體供給單元11B利用流路塊55、1 7兩側的空間，炎持流 路塊55、17而在相反方向設置流體控制機器52、53、9 的旁通配管，因此可有效活用單元下方的間隙，可有效地 減少裝置尺寸。 第三實施形態 接著，參照圖式說明本發明之氣體供給單元的第三實 施形態。第11圖為氣體供給單元的回路圖。 在本實施形態中，與第一實施形態不同的回路。即， ® 在輸入側與輸出側設置過濾器61、63，將手動閥62設於 過;慮器61與調節器2之間，在排氣閥9的上游側設置止 逆閥52等等是與第一實施形態不同的。 第12圖為第11圖的回路具體化的氣體供給單元ilc 的側視圖。 氣體供給單元11C中，手動閥62係以螺栓從上方固 疋於輸入塊12與流路塊64的上面。在輸入塊12上，過 φ 濾器61係安裝於輸入接口上’將以過濾器除去不純物的 作用氣體輸入手動閥62。調節器2以螺栓從上方固定於流 路鬼64與流路塊13的上面，輸入接口係連通於手動閥62 輸出接口，輸出接口經由流路塊13、流路塊14連通於 1才1閥4。又，在輸出塊16上内藏有過濾器，將 洛亂氣63降本14+七 ，、去不，，屯物的氣體輸出至真空腔體7。而且，流 路塊17為了遠 建通於第—接口 32,止逆閥52以螺栓固定於 止逆閥52係經由旁通配管18連通於排氣塊 2097-8〇98-pp 25 丄挪508 * 因此，根據本實施形態的氣體供給單元lie，作業員 操作的手動閥62、調節器2以及需要錢維護的過渡器 61 63、作業員目視確認的壁要的某些壓力感測器3等， 對於需要-疋作業的機器係安裝於塊冑12、64、13而配 設於作用氣體輸送管路上，對於作業性低的止逆閥52等， 由於配設於設在作用氣體輸送管路的機器62、2、3與安 裝面之間，可不妨礙作業性及維護性而使單元丨1C小型化。 第四實施形態 接著，參照圖式說明本發明的第四實施形態。第i 3 圖為氣體供給單元1 ID的侧視圖。 本貫施形態的氣體供給單元11D中，以流路塊73 (相 當於申請專利範圍的「第一流路塊」）取代流路塊14，子 手動閥62取代調節器2，而且將壓力感測器3固定於直接 流路塊7 3上，這幾點是與第一實施形態不同的。於此， 針對與第一實施形態不同的點做說明，共通的點在圖式上 給予相同的標號’而適當地省略其說明。 手動閥6 2係以螺栓從上方固定於輸入塊71與流路塊 7 2的上面，壓力感測器3係以螺栓從上方固定於流路塊 72與流路塊73的上面。輸入塊71與流路塊72為相同的 形狀，輸入塊71係從上方將作用氣體導入。與流路塊72 與第一實施形態的輸入塊12與流路塊13相比，輸入塊71 的高度較低。此係由於壓力感測器3的輸出接口直接連接 於開口於流路塊73的上面的接口，而不必在流路塊72的 圖中右侧面上設置接口。如此，藉由使用高度低的塊體2097-8098-PF 21 1358508 Road block 55, stacked with three flow path blocks. The flow path blocks 14, 17, 55 have the same shape and are connected in a rod shape in the longitudinal direction. The flow path block 55 has substantially the same configuration as the flow path block 14. That is, in the right side of the figure, a first interface is formed on the left side surface of the right side opposite to the right side surface of the first exhaust valve (5), and a second interface is formed on the lower side, and a third interface is formed on the upper side. The check valve 52 is in communication with the first interface. The exhaust block 19 is connected to the check valve 52 via the exhaust pipe 丨8, so that the purge gas flows only into the first exhaust valve 53 side. Further, in the flow path block 55, the first interface is opened corresponding to the position of the second interface 33 of the flow path block 17, and the point at which the second interface and the third interface are formed on the same axis is different from the flow path block 14. The bypass pipe 56 is fixed to the flow path block 17 and the flow path block 57. In order to provide the bypass pipe 56 downstream of the mass flow controller 5, the flow path block 17 is arranged in a 180 degree reversal manner as compared with the first embodiment. Therefore, the second exhaust valve 9 is disposed laterally between the mounting surface and the flow rate adjusting valve 51 of the working gas delivery line, and is arranged side by side with the check valve 52. On the second port 33 of the flow path block 17, a nozzle 54 is loaded. Further, the bypass pipe 56 is connected to the first port 32. The bypass pipe 56 is integrated with the flow path block 17 by connecting the interface penetrating the fixed block 56a to the screw hole 38 of the flow path block 17. The other end of the bypass pipe 56 is fixed to a flow path block 57 provided on the downstream side of the mass flow controller 5. The bypass block 56 is integrated with the flow path block 57 by abutting the fixing block 56b against the lower end surface of the flow path block 57 and connecting the bolt passing through the flow path block 57 from above to the fixed block 56b. The mass flow controller 5 is placed on the flow path block 14 and the flow path block 57, and is bolted from above 2097-8098-PF 22 1358508. The outlet opening and closing valve 6 is bolted to the upper surface of the flow path block 57 and the output block 58. Here, in the flow path block 57, the input port that communicates with the mass flow controller 5 and the output port that communicates with the outlet opening and closing valve 6 communicate with the purge gas input port that is open to the lower side, so that the flow rate is discharged from the mass flow controller 5. The purge gas merges with the purge gas flowing out from the bypass pipe 56 and is supplied to the outlet opening and closing valve 6. Fig. 8 is a plan view of the gas supply unit iiB. In the gas supply unit 11B, the bypass pipe 56 is disposed between the mass flow controller 5 and the mounting surface, and is not exposed in the lateral direction of the working gas supply line. Next, the conventional gas supply unit 2〇〇 which is a circuit for carrying out the circuit of Fig. 6 is a side view of a conventional gas supply unit 200 in which the circuit shown in Fig. 6 is embodied. The gas supply unit 200 has a structure in which one machine is mounted on two flow path blocks. In the gas supply unit 200, the input block 201, the flow rate adjusting valve 51, the flow path block 202, the exhaust block 203, the switching block 204, the flow path block 2〇5, the branch block 206, the flow path block 207, and the mass flow controller 5. The flow path block 208, the second exhaust valve 9, the flow path block 209, the outlet opening and closing valve 6, and the output block 210 constitute an active gas supply line. Further, in the gas supply unit 200, the check valve 52, the exhaust block 203, the first exhaust valve 53, the switching block 204, the inlet opening and closing valve 4, the flow path block 205, the branch block 206, and the flow path block 207 constitute a row. Gas line. Therefore, in the conventional gas supply unit 200, only the inlet opening and closing valve 4, the check valve 52, the first exhaust valve 53, and the second exhaust valve 9 are disposed on the working gas delivery line, which is more than the present embodiment. Gas supply 2097-8098-PF 23 1358508 The length of the single turn 11B is longer. Further, the conventional gas supply unit 2 makes the space S below the exhaust block 203, the switching block 204, and the gap S below the mass flow controller 5 a wasteful space. Fig. 10 is a plan view showing a conventional gas supply unit 200 for embodying the circuit shown in Fig. 6. The gas supply unit 200 is bypassed by the branch block 206, the upstream side bypass block 211, the bypass pipe 212, and the downstream side bypass. Block 213 forms a bypass line. At this time, the bypass pipe 212 protrudes in the lateral direction of the gas supply unit 2''. That is, in the gas supply unit 200, the action gas supply line and the bypass line are arranged in two lines juxtaposed in the lateral direction of the unit. Therefore, the conventional gas supply unit has a larger installation space in the lateral direction than the gas supply unit 丨1Β of the present embodiment. Therefore, according to the gas supply unit 丨1β of the present embodiment, one end of the bypass pipe 56 is connected to the flow path block 17, and the other end is connected to the flow path block 57 provided in the working gas delivery line, whereby The bypass pipe 56 is disposed between the mass flow controller 5 provided on the working gas delivery line and the mounting surface, and the bypass pipe 56 can be disposed in a space occupying one line. Further, in the gas supply unit 1A of the present embodiment, the check valve 52 is directly attached to the side surface facing the side surface of the first exhaust valve 53 of the flow path block 55, and the arrangement of the check valve 52 can be reduced. The fluid control machine on the active gas delivery line. Further, when the flow path blocks 14, 55, and 17 are stacked up and down, not only below the mass flow controller 5, but also below the flow rate adjusting valve 51, the friend 31x1. 2097-8098-PF 24 1358508 body supply unit 11B uses the flow path The spaces on both sides of the blocks 55 and 17 are provided with the flow path blocks 55 and 17 and the bypass pipes of the fluid control devices 52, 53, and 9 are disposed in opposite directions, so that the gap below the unit can be effectively utilized, and the device can be effectively reduced. size. (THIRD EMBODIMENT) Next, a third embodiment of the gas supply unit of the present invention will be described with reference to the drawings. Figure 11 is a circuit diagram of the gas supply unit. In the present embodiment, a circuit different from the first embodiment is used. That is, the filter 61, 63 is provided on the input side and the output side, the manual valve 62 is provided, and the check valve 52 is provided on the upstream side of the exhaust valve 9 between the regulator 61 and the regulator 2, etc. Different from the first embodiment. Fig. 12 is a side view of the circuit-specific gas supply unit ilc of Fig. 11. In the gas supply unit 11C, the manual valve 62 is fixed to the upper surface of the input block 12 and the flow path block 64 by bolts from above. On the input block 12, the φ filter 61 is attached to the input port, and the action gas for removing the impurities by the filter is supplied to the manual valve 62. The regulator 2 is fixed to the upper surface of the flow path ghost 64 and the flow path block 13 by bolts from above, the input interface is connected to the output interface of the manual valve 62, and the output interface is connected to the 1st valve via the flow path block 13 and the flow path block 14. 4. Further, a filter is built in the output block 16, and the gas is lowered to 14 + seven, and the gas of the waste is output to the vacuum chamber 7. Further, the flow path block 17 is opened to the first port 32, and the check valve 52 is bolted to the check valve 52 via the bypass pipe 18 to the exhaust block 2097-8〇98-pp 25 丄 508 * Therefore, according to the gas supply unit lie of the present embodiment, the manual valve 62 operated by the operator, the regulator 2, the transition device 61 63 requiring maintenance, and some pressure sensors 3 required for visual confirmation by the operator, etc. The machine that requires the 疋 operation is installed in the block 胄 12, 64, and 13 and is disposed in the working gas transfer line, and the check valve 52 having low workability is disposed in the action gas transfer line. The unit 丨1C can be miniaturized without hindering workability and maintainability between the machines 62, 2, and 3 and the mounting surface. Fourth Embodiment Next, a fourth embodiment of the present invention will be described with reference to the drawings. Figure i3 is a side view of the gas supply unit 1 ID. In the gas supply unit 11D of the present embodiment, the flow path block 73 (corresponding to the "first flow path block" of the patent application scope) is substituted for the flow path block 14, the sub manual valve 62 is substituted for the regulator 2, and the pressure sensing is performed. The device 3 is fixed to the direct flow path block 73, which is different from the first embodiment. Here, the points that are different from the first embodiment will be described, and the same points will be denoted by the same reference numerals in the drawings, and the description thereof will be appropriately omitted. The manual valve 62 is fixed to the upper surface of the input block 71 and the flow path block 7.2 by bolts from above, and the pressure sensor 3 is fixed to the upper surface of the flow path block 72 and the flow path block 73 by bolts from above. The input block 71 has the same shape as the flow path block 72, and the input block 71 introduces the working gas from above. The height of the input block 71 is lower than that of the flow path block 72 and the input block 12 of the first embodiment and the flow path block 13. This is because the output interface of the pressure sensor 3 is directly connected to the interface that is open above the flow path block 73, and it is not necessary to provide an interface on the right side of the flow path block 72. So by using a block of low height
2097-8098-PF 26 1358508 71、72’可達到輕量化及降低成本的目的。另_方面，流 路塊73在將二個流體控制機器（於此為壓力感測器3與 質量流量感測器5)固定於上面的關係上，與流路塊j 7 相比’全長方向的寬度尺寸變大。 第14圖表示流路塊73的構造，第14A圖為安裝流體 控制機器的流珞塊7：3的主要部位剖視圖，第i4B圖為流 路塊73的上視圖’第14C圖為流路塊73的下視圖。 流路塊73雖然基本上具有與第2圖所示的流路塊14 相同的構造’但是在上側面設置第一接口 74與第二接口 23是與第一實施形態的流路塊i 4不同的。在流路塊 的上端面上’如第4B圖所示’在第一接口 74的兩侧形成 螺孔75，在與壓力感測器3的下端面之間壓下氣門（未圖 示）時形成平均的密封。2097-8098-PF 26 1358508 71, 72' can achieve the purpose of light weight and cost reduction. On the other hand, the flow path block 73 fixes the two fluid control devices (here, the pressure sensor 3 and the mass flow sensor 5) on the upper side, and the 'longitudinal direction' compared with the flow path block j 7 The width of the width becomes larger. Fig. 14 is a view showing the structure of the flow path block 73, Fig. 14A is a cross-sectional view showing the main part of the flow block 7: 3 in which the fluid control device is mounted, and Fig. 4B is a top view of the flow path block 73. Fig. 14C is a flow path block. The lower view of 73. The flow path block 73 basically has the same structure as the flow path block 14 shown in Fig. 2, but the first interface 74 and the second interface 23 are provided on the upper side, which is different from the flow path block i 4 of the first embodiment. of. On the upper end surface of the flow path block, 'as shown in FIG. 4B', a screw hole 75 is formed on both sides of the first port 74, and when a valve (not shown) is pressed between the lower end surface of the pressure sensor 3 Form an average seal.
如此的氣體供給單元11D中，輸入至輸入塊71的作 用氣體係經由流路塊72與壓力感測器3而輸入至流路塊 73的第一接口 74。右入口開閉閥4打開且排氣閥9關閉， 作用氣體從流路塊73的間座25輪出至閥室”及第二接 與出口開閉閥6供給至 口 2 3 ’而且通過質量流量控制器 真空腔體7。 另一方面，若入口開閉閥4關閉且排氣闊9打開，作 用氣體不會從流路塊73的閥座25流出至閥室27，而是淨 化氣體從排氣閥9通過入口開閉閥4的第三接口 24、閥室 27以及第二接口 23而供給至質量流量控制器5,甚至通 過出口開閉閥6而排出至真空腔體7。 2097-8098-PF 27 1358508 因此，根據本實施形態的氣體供給單元11D，對應搭 載於單元11D的流體控制機器的種類而變更堆疊的流路塊 14、17、73的接口開設位置’使可具體化的回路的自由度 變大。 又，雖然是針對本發明的實施形態做說明，但本發明 並不限於上述實施形態’各種應用皆可。 (1 )例如在上述實形態中，雖然是針對安裝於半導 體製造裝置的氣體供給裝置11Α〜11D做說明，氣體供給 _ 裝置使用於CVD裝置、蝕刻裝置等各種技術領 域亦可〇 (2 )例如在上述實形態中，雖然是將安裝板1 〇固定 於軋體供給單元11A〜11D，將軌道作為安裝元件使用亦 可。此時’將支架41、42製作成可卡合於軌道的形狀， /α執道使氣體供給單元11A〜11D移動而在既定的位置固 疋，使氟體供給單元11Α〜11D相當簡單地系統化。 (3 )例如在上述實形態中，雖然各種流路塊與流體 控制機器的材質是以具有耐熱性及剛性的金屬製成，在控 制腐蝕性高的氣體時，以PTFE及pp等樹脂作為流路塊及 流體控制機器的材質亦可。 【圖式簡單說明】 第1圖為本發明之第一實施形態的氣體供給單元的側 視圖。 第2A圖為本發明之第一實施形態的氣體供給單元中 所使用㈣路塊的構&，為安裝流體控制冑器的流路塊的 2097-8098-PF 28 1358508 主要部分剖視圖。 第2β圖為第2A圖所示的流路塊的左側視圖。 第2C圖為第2Α圖所示的流路塊的上視圖。 第2D圖為第2Α圖所示的流路塊的下視圖。 第3Α圖為本發明之第一實施形態的氣體供給單元中 所使用的流路塊的構造，為安裝流體控制機器的流路塊的 主要部分剖視圖。 第3Β圖為第3Α圖所示的流路塊的左側視圖。 • 第3C圖為第3Α圖所示的流路塊的上視圖。 第3D圖為第3Α圖所示的流路塊的下視圖。 第4圖表示本發明之第一實施形態的氣體供給單元的 尺寸及密封處。 第5圖表示第16圃所示的習知的氣體供給單元的尺 寸及密封位置。 第6圖為本發明之第二實施形態的氣體供給單元的回 路圖。 ^ 第7圖為本發明之第二實施形態的氣體供給單元的側 視圖。 第8圖為本發明之第二實施形態的氣體供給單元的平 面圖。 第9圖為本發明之第二實施形態中’將第6圖所示的 回路具體化的習知的氣體供給單元的側視圖。 第10圖為本發明之第二實施形態中’將第6圖所示 的回路具體化的習知的氟體供給單元的平面圖。 29In such a gas supply unit 11D, the working gas system input to the input block 71 is input to the first interface 74 of the flow path block 73 via the flow path block 72 and the pressure sensor 3. The right inlet opening and closing valve 4 is opened and the exhaust valve 9 is closed, the working gas is taken out from the seat 25 of the flow path block 73 to the valve chamber", and the second and the outlet opening and closing valve 6 are supplied to the port 2 3 ' and controlled by mass flow. On the other hand, if the inlet opening and closing valve 4 is closed and the exhaust opening 9 is opened, the working gas does not flow out from the valve seat 25 of the flow path block 73 to the valve chamber 27, but the purge gas is exhausted from the exhaust valve. 9 is supplied to the mass flow controller 5 through the third port 24 of the inlet opening and closing valve 4, the valve chamber 27, and the second port 23, and is discharged to the vacuum chamber 7 even through the outlet opening and closing valve 6. 2097-8098-PF 27 1358508 Therefore, according to the gas supply unit 11D of the present embodiment, the interface opening position of the flow path blocks 14, 17 and 73 of the stack is changed in accordance with the type of the fluid control device mounted on the unit 11D, so that the degree of freedom of the concrete circuit can be changed. Further, although the embodiment of the present invention has been described, the present invention is not limited to the above-described embodiments, and various applications are possible. (1) For example, in the above-described embodiment, it is directed to a gas attached to a semiconductor manufacturing apparatus. supply 11 to 11D, the gas supply_device is used in various technical fields such as a CVD apparatus and an etching apparatus. (2) For example, in the above-described embodiment, the mounting plate 1 is fixed to the rolling body supply unit 11A~ 11D, the rail may be used as a mounting member. At this time, the brackets 41 and 42 are formed to be engageable in the shape of the rail, and the /α actuator moves the gas supply units 11A to 11D to be fixed at a predetermined position. The fluorine supply units 11A to 11D are relatively simple and systematic. (3) For example, in the above-described embodiment, the material of the various flow path blocks and the fluid control device is made of a metal having heat resistance and rigidity, and the corrosion resistance is controlled. In the case of a high gas, a resin such as PTFE or pp may be used as a material for the flow path block and the fluid control device. [Brief Description] Fig. 1 is a side view of the gas supply unit according to the first embodiment of the present invention. 2A is a cross-sectional view of a main portion of a flow path block for mounting a fluid control device, which is a structure of a (4) road block used in the gas supply unit according to the first embodiment of the present invention. The ? diagram is a left side view of the flow path block shown in Fig. 2A. Fig. 2C is a top view of the flow path block shown in Fig. 2D. Fig. 2D is a bottom view of the flow path block shown in Fig. 2D. Fig. 3 is a cross-sectional view showing the structure of a flow path block used in the gas supply unit according to the first embodiment of the present invention, and is a flow chart showing a flow path block in which a fluid control device is attached. Fig. 3 is a flow shown in Fig. 3 The left side view of the block. • Fig. 3C is a top view of the flow block shown in Fig. 3. Fig. 3D is a bottom view of the flow block shown in Fig. 3. Fig. 4 shows the first of the present invention. The size and seal of the gas supply unit of the embodiment. Fig. 5 is a view showing the size and sealing position of the conventional gas supply unit shown in Fig. 16. Fig. 6 is a circuit diagram of a gas supply unit according to a second embodiment of the present invention. Figure 7 is a side elevational view of the gas supply unit of the second embodiment of the present invention. Fig. 8 is a plan view showing a gas supply unit according to a second embodiment of the present invention. Fig. 9 is a side view showing a conventional gas supply unit for embodying the circuit shown in Fig. 6 in the second embodiment of the present invention. Fig. 10 is a plan view showing a conventional fluorine supply unit in which the circuit shown in Fig. 6 is embodied in the second embodiment of the present invention. 29
2097-8098-PF 第11圖為本發明之第三實施形態之氣體供給單元的 回路圖。 第12圖為本發明之第三實施形態中，將第11圖所示 的回路具體化的氣體供給單元的側視圖。 第丨3圖為本發明之第四實施形態的氣體供給單元的 侧視圖。 第14Α圖表示本發明之第四實施形態的流路塊的構2097-8098-PF Fig. 11 is a circuit diagram of a gas supply unit according to a third embodiment of the present invention. Fig. 12 is a side view showing a gas supply unit in which the circuit shown in Fig. 11 is embodied in the third embodiment of the present invention. Fig. 3 is a side view showing the gas supply unit of the fourth embodiment of the present invention. Figure 14 is a block diagram showing the structure of a flow path block according to a fourth embodiment of the present invention.
’為安裝流體控制機器的流路塊的主要部分剖視圖。 第14B圖為第ι4Α圖所示的流路塊的上視圖。 第14C圖為第14A圖所示的流路塊的下視圖。 第15圖為氣體供給單元的回路圖的一例。 第16圖為第15圖所示的回路被具體化的習知的氣體 供給單元的側視圖。 【主要元件符號說明】 2〜調節器；' is a cross-sectional view of a main portion of a flow path block for mounting a fluid control machine. Fig. 14B is a top view of the flow path block shown in Fig. 4B. Fig. 14C is a bottom view of the flow path block shown in Fig. 14A. Fig. 15 is an example of a circuit diagram of a gas supply unit. Fig. 16 is a side view showing a conventional gas supply unit in which the circuit shown in Fig. 15 is embodied. [Main component symbol description] 2~ regulator;
1〜作用氣體供給源； 3〜壓力感測器； 5〜質量流量控制器； 7〜真空腔體； 9〜排氣閥； 11A、11B、11C、11D 1 2〜輸入塊； 4〜入口開閉閥； 6〜出口開閉閥； 8〜淨化氣體供給源； 10〜安裝板； 體供給單元； 1 3、14、1 5、17〜流路塊； 1 6〜輸出塊； 18〜排氣配管； 19〜排氣塊； 21〜安装孔； 301~action gas supply source; 3~pressure sensor; 5~mass flow controller; 7~vacuum chamber; 9~exhaust valve; 11A, 11B, 11C, 11D 1 2~ input block; 4~ inlet opening and closing Valve; 6~ outlet opening and closing valve; 8~ purge gas supply source; 10~ mounting plate; body supply unit; 1 3, 14, 15, 5, 17~ flow path block; 1 6~ output block; 18~ exhaust pipe; 19~exhaust block; 21~mounting hole; 30
2097-8098-PF 13585082097-8098-PF 1358508
22〜 第一接口； 23〜 第二接口； 24〜 第三接口； 25〜 閥座； 26〜 膜片閥體； 27〜 閥室； 28 ' 29、30〜螺孔； 31、 -安裝孔， 32〜 第一接口； 33〜第二接口； 35〜 閥座； 36〜 膜片閥體； 37〜 閥室； 38〜 螺孔； 39〜 貫通孔； 4 0〜 段差； 41、 42〜支架； 41a 、4 2 a〜抵接部 41b 、42b〜抵接部； 51〜 流量調整閥； 52〜 止逆閥； 53〜 第一排氣閥； 54〜 喷嘴； 5 5〜 流路塊； 56〜 旁通配管； 56a 、56b〜固定塊 57〜 流路塊； 61、 63〜過濾器； 62〜 手動閥； 64〜 流路塊； 71〜 輸入塊； 72〜 流路塊； 73〜 流路塊； 74〜 第一接口； 100, -氣體供給單元； 101， &輸入塊； 102 、103、104、105、106- -流路塊； 1 0 7〜輸出塊； 108- -排氣塊； 200〜氣體供給單元； 201、 ^輸入塊； 202' 〜流路塊； 203- y排氣塊； 204〜切換塊； 205- -流路塊； 2 0 6〜分歧塊； 207- -流路塊；22~ first interface; 23~ second interface; 24~ third interface; 25~ valve seat; 26~ diaphragm valve body; 27~ valve chamber; 28 '29, 30~ screw hole; 31, - mounting hole, 32~ first interface; 33~second interface; 35~ valve seat; 36~ diaphragm valve body; 37~ valve chamber; 38~ screw hole; 39~ through hole; 4 0~ step difference; 41, 42~ bracket; 41a, 4 2 a~ abutting portion 41b, 42b~ abutting portion; 51~ flow regulating valve; 52~ check valve; 53~ first exhaust valve; 54~ nozzle; 5 5~ flow path block; 56~ Bypass piping; 56a, 56b~ fixed block 57~ flow path block; 61, 63~ filter; 62~ manual valve; 64~ flow block; 71~ input block; 72~ flow block; 73~ flow block 74~ first interface; 100, - gas supply unit; 101, & input block; 102, 103, 104, 105, 106 - - flow block; 1 0 7~ output block; 108 - - exhaust block; 200~gas supply unit; 201, ^ input block; 202'~flow block; 203-y exhaust block; 204~switch block; 205--flow block; 2 0 6~ branch block ; 207- - flow block;
2097-8098-PF 31 1358508 2 0 8〜流路塊； 211〜上游側旁通塊； 21 3〜下游側旁通塊。 209 212 流路塊； 旁通配管；2097-8098-PF 31 1358508 2 0 8~ flow path block; 211~ upstream side bypass block; 21 3~ downstream side bypass block. 209 212 flow block; bypass piping;
2097-8098-PF 322097-8098-PF 32
Claims (1)
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW95119656A TW200801384A (en) | 2006-06-02 | 2006-06-02 | Gas supply unit and gas supply system |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW95119656A TW200801384A (en) | 2006-06-02 | 2006-06-02 | Gas supply unit and gas supply system |
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| TW200801384A TW200801384A (en) | 2008-01-01 |
| TWI358508B true TWI358508B (en) | 2012-02-21 |
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| TWI668386B (en) * | 2018-09-03 | 2019-08-11 | 台灣積體電路製造股份有限公司 | Flow control member and method for using the same |
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