TWI349643B - Method of preventing a mask from haze - Google Patents

Method of preventing a mask from haze

Info

Publication number
TWI349643B
TWI349643B TW095137970A TW95137970A TWI349643B TW I349643 B TWI349643 B TW I349643B TW 095137970 A TW095137970 A TW 095137970A TW 95137970 A TW95137970 A TW 95137970A TW I349643 B TWI349643 B TW I349643B
Authority
TW
Taiwan
Prior art keywords
haze
mask
preventing
Prior art date
Application number
TW095137970A
Other languages
Chinese (zh)
Other versions
TW200732225A (en
Inventor
S Y Liang
Chih Wing Chang
Hisin Yuan Chen
Chungjen Chen
J F Lee
Chihchien Wang
Chun Yi Ho
Original Assignee
Taiwan Semiconductor Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg Co Ltd filed Critical Taiwan Semiconductor Mfg Co Ltd
Publication of TW200732225A publication Critical patent/TW200732225A/en
Application granted granted Critical
Publication of TWI349643B publication Critical patent/TWI349643B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Laminated Bodies (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
TW095137970A 2006-02-21 2006-10-14 Method of preventing a mask from haze TWI349643B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/358,306 US20080060974A1 (en) 2006-02-21 2006-02-21 Mask carrier treatment to prevent haze and ESD damage

Publications (2)

Publication Number Publication Date
TW200732225A TW200732225A (en) 2007-09-01
TWI349643B true TWI349643B (en) 2011-10-01

Family

ID=39168490

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095137970A TWI349643B (en) 2006-02-21 2006-10-14 Method of preventing a mask from haze

Country Status (2)

Country Link
US (1) US20080060974A1 (en)
TW (1) TWI349643B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200615713A (en) * 2004-11-08 2006-05-16 Gudeng Prec Ind Co Ltd Container capable of preventing the crystallization of photomasks
US20220404696A1 (en) * 2021-06-18 2022-12-22 Entegris, Inc. Bonded layer on extreme ultraviolet plate

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2788827A (en) * 1953-06-26 1957-04-16 Reeve & Mitchell Mfg Co Inc Flatware case
US4053281A (en) * 1975-01-31 1977-10-11 Envirotech Corporation Method and apparatus for determining organic carbon in sulfureous compounds
DE4233817C1 (en) * 1992-10-07 1994-02-24 Kabi Pharmacia Gmbh Packaging material for a gas-releasing product
US5346518A (en) * 1993-03-23 1994-09-13 International Business Machines Corporation Vapor drain system
US5744183A (en) * 1995-08-17 1998-04-28 Ellsworth; Robert M. Removal of sulfides from alcoholic beverages
US6319297B1 (en) * 1998-03-27 2001-11-20 Asyst Technologies, Inc. Modular SMIF pod breather, adsorbent, and purge cartridges
US6459472B1 (en) * 1998-05-15 2002-10-01 Asml Netherlands B.V. Lithographic device
US6421113B1 (en) * 2000-02-14 2002-07-16 Advanced Micro Devices, Inc. Photolithography system including a SMIF pod and reticle library cassette designed for ESD protection
EP1412262B1 (en) * 2000-07-10 2008-05-21 Entegris, Inc. Smif container including an electrostatic dissipative reticle support structure
JP3939101B2 (en) * 2000-12-04 2007-07-04 株式会社荏原製作所 Substrate transport method and substrate transport container
US20020160194A1 (en) * 2001-04-27 2002-10-31 Flex Products, Inc. Multi-layered magnetic pigments and foils
US6749936B2 (en) * 2001-12-20 2004-06-15 Flex Products, Inc. Achromatic multilayer diffractive pigments and foils
US6826828B1 (en) * 2001-08-22 2004-12-07 Taiwan Semiconductor Manufacturing Company Electrostatic discharge-free container comprising a cavity surrounded by surfaces of PMMA-poly covered metal-PMMA
TWI319123B (en) * 2002-02-22 2010-01-01 Asml Holding Nv System and method for using a two part cover for protecting a reticle
US7463336B2 (en) * 2004-04-14 2008-12-09 Asml Netherlands B.V. Device manufacturing method and apparatus with applied electric field
TWI262164B (en) * 2004-12-15 2006-09-21 Gudeng Prec Ind Co Ltd Airtight semiconductor transferring container
US7400383B2 (en) * 2005-04-04 2008-07-15 Entegris, Inc. Environmental control in a reticle SMIF pod
US20070076292A1 (en) * 2005-09-27 2007-04-05 Taiwan Semiconductor Manufacturing Company, Ltd. Fully electric field shielding reticle pod

Also Published As

Publication number Publication date
US20080060974A1 (en) 2008-03-13
TW200732225A (en) 2007-09-01

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