TW200615713A - Container capable of preventing the crystallization of photomasks - Google Patents
Container capable of preventing the crystallization of photomasksInfo
- Publication number
- TW200615713A TW200615713A TW093134016A TW93134016A TW200615713A TW 200615713 A TW200615713 A TW 200615713A TW 093134016 A TW093134016 A TW 093134016A TW 93134016 A TW93134016 A TW 93134016A TW 200615713 A TW200615713 A TW 200615713A
- Authority
- TW
- Taiwan
- Prior art keywords
- photomasks
- crystallization
- preventing
- container capable
- containing space
- Prior art date
Links
- 238000002425 crystallisation Methods 0.000 title abstract 2
- 230000008025 crystallization Effects 0.000 title abstract 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 229910052709 silver Inorganic materials 0.000 abstract 2
- 239000004332 silver Substances 0.000 abstract 2
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67353—Closed carriers specially adapted for a single substrate
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67366—Closed carriers characterised by materials, roughness, coatings or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
Landscapes
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Atmospheric Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Environmental & Geological Engineering (AREA)
- Packages (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The present invention relates to a container capable of preventing the crystallization of photomasks. The container comprises a base and a cover enclosed with the base to form a sealed containing space. A plastic material containing silver that can absorb and eliminate sulfide from the plastic material. Alternatively, silver can be disposed in the containing space to absorb the sulfide in the containing space. Thus, the photomasks and the wafers can be conserved in a harmless environment to prevent any possible substances crystallized on the photomasks and to enhance the yield in the manufacturing process.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW093134016A TW200615713A (en) | 2004-11-08 | 2004-11-08 | Container capable of preventing the crystallization of photomasks |
US10/905,089 US20060120840A1 (en) | 2004-11-08 | 2004-12-15 | [semiconductor container that prevents crystalization on storage wafers/masks] |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW093134016A TW200615713A (en) | 2004-11-08 | 2004-11-08 | Container capable of preventing the crystallization of photomasks |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200615713A true TW200615713A (en) | 2006-05-16 |
Family
ID=36574402
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093134016A TW200615713A (en) | 2004-11-08 | 2004-11-08 | Container capable of preventing the crystallization of photomasks |
Country Status (2)
Country | Link |
---|---|
US (1) | US20060120840A1 (en) |
TW (1) | TW200615713A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11029595B2 (en) | 2015-02-03 | 2021-06-08 | Asml Netherlands B.V. | Mask assembly and associated methods |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108107672B (en) | 2016-11-25 | 2021-03-02 | 上海微电子装备(集团)股份有限公司 | Mask plate box |
CN115004111A (en) * | 2019-12-31 | 2022-09-02 | 恩特格里斯公司 | Reticle pod with retention through reticle compartment walls |
US12087605B2 (en) * | 2020-09-30 | 2024-09-10 | Gudeng Precision Industrial Co., Ltd. | Reticle pod with antistatic capability |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4154344A (en) * | 1976-11-09 | 1979-05-15 | Minnesota Mining And Manufacturing Company | Material for forming envelopes used to protect electronic components |
US5651171A (en) * | 1995-02-22 | 1997-07-29 | Carbon & Polymer Research, Inc. | Method of making a shielded magnetic storage system |
TWI262164B (en) * | 2004-12-15 | 2006-09-21 | Gudeng Prec Ind Co Ltd | Airtight semiconductor transferring container |
US20080060974A1 (en) * | 2006-02-21 | 2008-03-13 | Taiwan Semiconductor Manufacturing Company, Ltd. | Mask carrier treatment to prevent haze and ESD damage |
-
2004
- 2004-11-08 TW TW093134016A patent/TW200615713A/en unknown
- 2004-12-15 US US10/905,089 patent/US20060120840A1/en not_active Abandoned
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11029595B2 (en) | 2015-02-03 | 2021-06-08 | Asml Netherlands B.V. | Mask assembly and associated methods |
US11086213B2 (en) | 2015-02-03 | 2021-08-10 | Asml Netherlands B.V. | Mask assembly and associated methods |
TWI741498B (en) * | 2015-02-03 | 2021-10-01 | 荷蘭商Asml荷蘭公司 | Mask assembly container, pellicle assembly container, pellicle assembly, and method for making said pellicle assembly |
TWI793736B (en) * | 2015-02-03 | 2023-02-21 | 荷蘭商Asml荷蘭公司 | Pellicle inspection tool for an euv transparent pellicle, lithographic apparatus, and method for monitoring a pellicle of a mask assembly |
US11635681B2 (en) | 2015-02-03 | 2023-04-25 | Asml Netherlands B.V. | Mask assembly and associated methods |
TWI842365B (en) * | 2015-02-03 | 2024-05-11 | 荷蘭商Asml荷蘭公司 | Pellicle inspection tool for an euv transparent pellicle and mask assembly |
Also Published As
Publication number | Publication date |
---|---|
US20060120840A1 (en) | 2006-06-08 |
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