TW200732225A - Mask carrier treatment to prevent haze and ESD damage - Google Patents

Mask carrier treatment to prevent haze and ESD damage

Info

Publication number
TW200732225A
TW200732225A TW095137970A TW95137970A TW200732225A TW 200732225 A TW200732225 A TW 200732225A TW 095137970 A TW095137970 A TW 095137970A TW 95137970 A TW95137970 A TW 95137970A TW 200732225 A TW200732225 A TW 200732225A
Authority
TW
Taiwan
Prior art keywords
base portion
mask carrier
esd damage
carrier treatment
prevent haze
Prior art date
Application number
TW095137970A
Other languages
Chinese (zh)
Other versions
TWI349643B (en
Inventor
Shuoyuan Liang
Chihwing Chang
Hisinyuan Chen
Chungjen Chen
Jrfu Lee
Chihchien Wang
Chun Yi Ho
Original Assignee
Taiwan Semiconductor Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg Co Ltd filed Critical Taiwan Semiconductor Mfg Co Ltd
Publication of TW200732225A publication Critical patent/TW200732225A/en
Application granted granted Critical
Publication of TWI349643B publication Critical patent/TWI349643B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Laminated Bodies (AREA)

Abstract

A reticle carrier including a base portion and a cover portion at least partially detachable from the base portion. The base portion and the cover portion are configured to collectively house a reticle in a region collectively defined by the base portion and the cover portion when the base portion and the cover portion are fully attached. At least a portion of an interior surface of at least one of the base portion and the cover portion is treated with a sulfide-absorbing composition, such as silver or a silver-containing alloy.
TW095137970A 2006-02-21 2006-10-14 Method of preventing a mask from haze TWI349643B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/358,306 US20080060974A1 (en) 2006-02-21 2006-02-21 Mask carrier treatment to prevent haze and ESD damage

Publications (2)

Publication Number Publication Date
TW200732225A true TW200732225A (en) 2007-09-01
TWI349643B TWI349643B (en) 2011-10-01

Family

ID=39168490

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095137970A TWI349643B (en) 2006-02-21 2006-10-14 Method of preventing a mask from haze

Country Status (2)

Country Link
US (1) US20080060974A1 (en)
TW (1) TWI349643B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200615713A (en) * 2004-11-08 2006-05-16 Gudeng Prec Ind Co Ltd Container capable of preventing the crystallization of photomasks
KR20240021950A (en) * 2021-06-18 2024-02-19 엔테그리스, 아이엔씨. Bonded layer on extreme ultraviolet plate

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2788827A (en) * 1953-06-26 1957-04-16 Reeve & Mitchell Mfg Co Inc Flatware case
US4053281A (en) * 1975-01-31 1977-10-11 Envirotech Corporation Method and apparatus for determining organic carbon in sulfureous compounds
DE4233817C1 (en) * 1992-10-07 1994-02-24 Kabi Pharmacia Gmbh Packaging material for a gas-releasing product
US5346518A (en) * 1993-03-23 1994-09-13 International Business Machines Corporation Vapor drain system
US5744183A (en) * 1995-08-17 1998-04-28 Ellsworth; Robert M. Removal of sulfides from alcoholic beverages
US6319297B1 (en) * 1998-03-27 2001-11-20 Asyst Technologies, Inc. Modular SMIF pod breather, adsorbent, and purge cartridges
US6459472B1 (en) * 1998-05-15 2002-10-01 Asml Netherlands B.V. Lithographic device
US6421113B1 (en) * 2000-02-14 2002-07-16 Advanced Micro Devices, Inc. Photolithography system including a SMIF pod and reticle library cassette designed for ESD protection
AU2002218763A1 (en) * 2000-07-10 2002-01-21 Asyst Technologies, Inc. Smif container including an electrostatic dissipative reticle support structure
JP3939101B2 (en) * 2000-12-04 2007-07-04 株式会社荏原製作所 Substrate transport method and substrate transport container
US20020160194A1 (en) * 2001-04-27 2002-10-31 Flex Products, Inc. Multi-layered magnetic pigments and foils
US6749936B2 (en) * 2001-12-20 2004-06-15 Flex Products, Inc. Achromatic multilayer diffractive pigments and foils
US6826828B1 (en) * 2001-08-22 2004-12-07 Taiwan Semiconductor Manufacturing Company Electrostatic discharge-free container comprising a cavity surrounded by surfaces of PMMA-poly covered metal-PMMA
TWI319123B (en) * 2002-02-22 2010-01-01 Asml Holding Nv System and method for using a two part cover for protecting a reticle
US7463336B2 (en) * 2004-04-14 2008-12-09 Asml Netherlands B.V. Device manufacturing method and apparatus with applied electric field
TWI262164B (en) * 2004-12-15 2006-09-21 Gudeng Prec Ind Co Ltd Airtight semiconductor transferring container
US7400383B2 (en) * 2005-04-04 2008-07-15 Entegris, Inc. Environmental control in a reticle SMIF pod
US20070076292A1 (en) * 2005-09-27 2007-04-05 Taiwan Semiconductor Manufacturing Company, Ltd. Fully electric field shielding reticle pod

Also Published As

Publication number Publication date
TWI349643B (en) 2011-10-01
US20080060974A1 (en) 2008-03-13

Similar Documents

Publication Publication Date Title
MY173616A (en) Compositions and methods for lowering triglycerides
MX340733B (en) Organic compounds and their uses.
TNSN07257A1 (en) Silver/water,silver gels and silver-based compositions ; and methods for making and using the same
EA200702510A1 (en) METHODS OF PROTECTION FROM APOPTOSIS USING LIPOPEPTIDES
EA201101189A1 (en) SGLT-2 INHIBITOR, INTENDED FOR THE TREATMENT OF TYPE 1 DIABETES TYPE 1, TYPE 2 DIABETES MELLITUS DIABETES, DISTURBED GLUCOSE TYPE OR HYPERGLYCEMIA
MY151091A (en) Antiviral colloidal silver composition
NO20071144L (en) Agent for providing substrates based on cellulose and / or starch with water-repellent and at the same time fungicidal, antibacterial, insect-repellent and algal-antiviral properties
MX2007007588A (en) Tetrahydroquinoline analogues as muscarinic agonists.
TW200700433A (en) Acylated glp-1 compounds
CL2012002844A1 (en) Compounds derived from chromen-2-one; pharmaceutical composition that includes them; and its use in the treatment of a proliferative cell disorder such as cancer (divisional application No. 311-07).
MY147247A (en) Organic compounds and their uses
IL218317A0 (en) Use of compositions containing il-15 polypeptide and il-15 containing complexes for the treatment of cancer
MX2007010833A (en) Use of opioid antagonists to attenuate endothelial cell proliferation and migration.
EA200802428A1 (en) COMBINATION OF AGENTS FOR BIOLOGICAL FIGHT AND NEMATOCIDES INCLUDING THE SEEDS COATING
IL195256A0 (en) Compositions of r(+)and s(-)pramipexole and methods of using the same
MX2011008000A (en) Cyclosporin analogues for preventing or treating hepatitis c infection.
EA019744B9 (en) Isothiazolyloxyphenyl amidines and use thereof for combating fungi and seed material treated with isothiazolyloxyphenyl amidines
CA115968S (en) Inline vent fan
TW200800969A (en) Compounds
WO2010056378A3 (en) Extracellular matrix compositions for the treatment of cancer
GB2441095A (en) Golf ball covers and mantles comprising glass particles
CA119816S (en) Manikin chest shield
MX2009003378A (en) Suspension concentrates for improving the root absorption of agrochemical active ingredients.
MX2009002960A (en) Serine hydrolase inhibitors.
MX2010001416A (en) Compounds for the treatment of hepatitis c.