1331068 (1) 九、發明說明 【發明所屬之技術領域】1331068 (1) IX. Description of the invention [Technical field to which the invention pertains]
本發明，是係關於板狀體的硏磨方法及其裝置，特別 是藉由連續硏磨裝置，硏磨液晶顯示器等所使用的FPD * · (Flat Panel Display)用的玻璃基板之板狀體的硏磨方法 .· 及其裝置。 φ 【先前技術】 特別是液晶禪示器等所使用的FPD用的玻璃基板， 是藉由被稱之爲浮式法之玻璃板製法將熔融玻璃成形爲板 狀’利用專利文獻1等所揭不之連續式硏磨裝置，將表面 的微小凹凸或起伏硏磨去除，製造成可滿足於液晶顯示器 用玻璃基板領域所要求之平坦度，厚度於0.4〜1.1mm的 薄板狀。 於如此之連續式的硏磨裝置，一般是以如專利文獻1 • 所記載，藉由具有比玻璃基板的寬度還大之直徑，利用自 轉及公轉之硏磨具，一次將玻璃基板寬度全區域予以硏磨 來進行。 第5圖，是顯示利用以往的連續式的硏磨裝置來硏磨 玻璃基板G之狀態的說明圖。玻璃基板G，其與硏磨對象 面相反側的面是被吸附保持於接著於工作台（圖示省略） 的吸附薄片1，如圖中箭頭A所示地，由沒有圖示出的搬 運裝置連續性地搬運，並藉由被設置在該搬運路徑上方的 硏磨機之硏磨具2、3來硏磨硏磨對象面。如同圖所示， -4 - (3) 1331068 [解決問題之技術手段] 本發明，爲了達成上述目的，提供一針對於使板狀體 一面朝預定方向移動，一面藉由複數台自轉及公轉的圓形 硏磨具，將板狀體連續硏磨之板狀體的硏磨方法，將直徑 比上述板狀體的寬度還小的上述圓形硏磨具，以上述板狀 體的移動中心線爲基準成對配置，並且使上述各圓形硏磨 具越過移動中心線來硏磨上述板狀體，作爲特徵之板狀體 # 的硏磨方法（以下，稱之爲本發明之硏磨方法）。 又，本發明，爲了達成上述目的，提供一針對於使板 狀體一面朝預定方向移動，一面藉由複數台自轉及公轉的 圓形硏磨具，將板狀體連續硏磨之板狀體的硏磨裝置，上 述圓形硏磨具，其直徑被設定成比上述板狀體的寬度還 小，並且以上述板狀體的移動中心線爲基準成對被配置， 使上述圓形硏磨具越過移動中心線來硏磨上述板狀體，作 爲特徵之板狀體的硏磨裝置（以下，稱之爲本發明之硏磨 # 裝置）。 依據本發明，並不是使用1台大型硏磨具，而是集合 複數台直徑比板狀體的寬度還要小的小型圓形硏磨具，藉 由將該等圓形硏磨具以板狀體之移動中心線爲基準成對配 置，使圓形硏磨具越過移動中心線來硏磨板狀體，而可以 將板狀體的硏磨面之整面予以硏磨。又，依據本發明，由 於硏磨具設爲小直徑化，故可解決硏磨具之材料的確保、 硏磨裝置及硏磨具之加工組裝精度的維持、硏磨具的更換 作業與操作處理性、以及硏磨精度的維持等問題。 -6- (5) 1331068 在本發明中，若公轉半徑R未滿5 0mm時，硏磨具的 自公轉的合成方向變化較大，殘留在板狀體的硏磨紋路會 有容易顯眼之情形。又，若公轉半徑R超過l〇〇mm時， 則由於支持裝置變得較大而必須要有較大的剛性，導致初 期成本增高。並且，會有裝置容易振動之情形。爲了改善 此等情形，公轉半徑R於50mm $ R $ 1 00mm爲理想。 本發明之硏磨方法，以上述板狀體的移動中心線爲基 # 準成對所配置之一方的圓形硏磨具與另一方的圓形硏磨具 於硏磨時之重疊量至少爲100mm以上，又，上述圓形硏 磨具於硏磨時，從上述移動中心線之超出量以B爲最小 値，以C爲最大値時，是在25mm$BS100mm' 175mmS CS 250mm的條件下來硏磨板狀體爲理想。 本發明之硏磨裝置，以上述板狀體的移動中心線爲基 準成對所配置之一方的圓形硏磨具與另一方的圓形硏磨具 於硏磨時之重疊量至少爲100mm以上，又，上述圓形硏 Φ 磨具於硏磨時，從上述移動中心線之超出量以B爲最小 値，以C爲最大値時，是在25mm$BS100mm、175mmS CS 250mm的條件下來硏磨板狀體爲理想。 在本發明之硏磨方法及本發明之硏磨裝置中，由於是 藉由使其包含板狀體之移動方向的中心線其近旁的一部 分，以夾隔著移動中心線所配置的複數台硏磨具來進行硏 磨，所以依情形在該等硏磨具之硏磨區域的重疊部（以 下，稱爲重疊硏磨部），恐有產生硏磨不均之虞。爲了抑 制該硏磨不均，以謀求上述重疊硏磨部的適切正確化爲理 -8- (6) 1331068 想。藉此而能夠達成大型板狀體之高精度硏磨。 本發明之硏磨方法及本發明之硏磨裝置的理想實施形 態中，如上所述地，一方的圓形硏磨具與另一方的圓形硏 磨具於硏磨時之重疊量，亦即，將重疊硏磨部的寬度設定 爲l〇〇mm以上，且將圓形硏磨具在硏磨時從移動中心線 之超出量的最小値設定爲B，最大値設定爲C時，以成爲 25mmSBS 100mm、175mmSCS 250mm 之方式來設定。 # 重疊量的寬度爲未滿100mm時，B爲未滿25mm或超過 100mm時，以及C爲未滿175mm或超過250mm時，恐有 產生硏磨不均之虞。 本發明之硏磨方法，是將上述圓形硏磨具的硏磨壓， 分割設定於從上述圓形硏磨具的中心朝向外周方向，也就 是分割設定於半徑方向來硏磨板狀體爲理想。 本發明之硏磨裝置，是使上述圓形硏磨具的硏磨壓， 分割設定於從上述圓形硏磨具的中心朝向外周方向爲理 #想。 本發明之理想實施形態中，如此地在硏磨具中內藏有 複數個成爲硏磨壓產生機的空氣彈簧，該空氣彈簧是於半 徑方向分割爲內側、中間、外側3者》並且，對於各別之 空氣彈簧，藉由設定不同的空氣壓力於半徑方向分割控制 硏磨壓。藉此，主要藉由調整硏磨具外側的硏磨壓，不必 變更硏磨具的位置而能夠均一地進行硏磨，更進一步地利 用實施硏磨壓的調整與硏磨具的位置調整兩方，可以更加 細微地進行硏磨條件的設定。 -· aa, ··The present invention relates to a honing method for a plate-shaped body and a device thereof, and in particular, a plate-like body for a glass substrate for FPD* (Flat Panel Display) used for honing a liquid crystal display or the like by a continuous honing device. Honing method and its device. φ [Prior Art] In particular, a glass substrate for FPD used in a liquid crystal illuminator is formed by forming a molten glass into a plate shape by a glass plate method called a floating method. In the case of a continuous honing device, the surface irregularities or undulations are removed, and a flat plate having a thickness of 0.4 to 1.1 mm can be produced to satisfy the flatness required for the field of glass substrates for liquid crystal displays. In such a continuous honing device, generally, as described in Patent Document 1, the glass substrate is widened at one time by using a honing tool that rotates and revolves by a diameter larger than the width of the glass substrate. Think about it. Fig. 5 is an explanatory view showing a state in which the glass substrate G is honed by a conventional continuous honing device. The surface of the glass substrate G opposite to the surface to be honed is adsorbed and held by the adsorption sheet 1 attached to the stage (not shown), as shown by the arrow A in the figure, and is not shown. The honing target surface is honed by continuous conveyance and by the honing tools 2, 3 of the honing machine provided above the conveyance path. As shown in the figure, -4 - (3) 1331068 [Technical means for solving the problem] In order to achieve the above object, the present invention provides a method for moving a plate-like body in a predetermined direction while rotating and revolving by a plurality of stages. a circular honing tool, a honing method for continuously honing a plate-like body, and a circular honing tool having a diameter smaller than a width of the plate-like body, and a moving center of the plate-shaped body The wire is arranged in pairs as a reference, and the above-mentioned circular honing tools are used to honing the above-mentioned plate-like body over the moving center line, and the honing method as the characteristic plate-shaped body # (hereinafter, referred to as the honing of the present invention) method). Moreover, in order to achieve the above object, the present invention provides a plate-like shape in which a plate-shaped body is continuously honed by a circular honing tool that rotates and revolves in a plurality of stages while moving the plate-like body in a predetermined direction. The honing device of the body, wherein the circular honing tool has a diameter smaller than a width of the plate-like body, and is arranged in pairs on the basis of a movement center line of the plate-like body, so that the circular cymbal is arranged The grinding tool passes over the moving center line to honing the above-mentioned plate-like body, and is a honing device (hereinafter referred to as a honing # device of the present invention) which is a characteristic plate-shaped body. According to the present invention, instead of using one large honing tool, a plurality of small circular honing tools having a diameter smaller than the width of the plate-like body are collected, by using the circular honing tools in a plate shape. The moving center line of the body is arranged in pairs, so that the circular honing tool can honing the plate-shaped body beyond the moving center line, and the entire surface of the honing surface of the plate-shaped body can be honed. Moreover, according to the present invention, since the honing tool is made small in diameter, the material of the honing tool can be ensured, the processing precision of the honing device and the honing tool can be maintained, and the replacement operation and operation of the honing tool can be solved. Sex, as well as the maintenance of honing accuracy. -6- (5) 1331068 In the present invention, if the revolution radius R is less than 50 mm, the direction of the self-revolution of the honing tool varies greatly, and the honing pattern remaining in the plate-like body may be conspicuous. . Further, when the revolution radius R exceeds 10 mm, the support device becomes large, and it is necessary to have a large rigidity, resulting in an increase in initial cost. Also, there is a case where the device is easily vibrated. In order to improve these conditions, the revolution radius R is ideal for 50mm $ R $ 1 00mm. The honing method of the present invention is based on the movement center line of the plate-shaped body. The circular honing tool disposed one side of the pair and the other circular honing tool are at least overlapped during honing. 100mm or more, in addition, when the circular honing tool is honed, the excess from the above-mentioned moving center line is B being the minimum 値, and when C is the maximum ,, it is under the condition of 25mm$BS100mm' 175mmS CS 250mm 硏The plate-like body is ideal. In the honing device according to the present invention, the circular honing tool disposed in a pair with the other circular honing tool and the other circular honing tool are at least 100 mm or more in honing based on the moving center line of the plate-shaped body. Moreover, when the round 硏Φ grinding tool is honed, the excess amount from the moving center line is B being the minimum 値, and when C is the maximum ,, it is honing under the condition of 25mm$BS100mm, 175mmS CS 250mm. The plate is ideal. In the honing method of the present invention and the honing device of the present invention, the plurality of cymbals arranged to sandwich the moving center line are formed by including a portion of the vicinity of the center line of the moving direction of the plate-like body. Since the grinding tool is used for honing, there is a fear that unevenness in honing may occur in the overlapping portion of the honing region of the honing tool (hereinafter referred to as the overlapping honing portion). In order to suppress the unevenness of the honing, it is reasonable to seek the correctness of the above-mentioned overlapping honing section. -8- (6) 1331068 Thereby, high-precision honing of a large plate-shaped body can be achieved. In a preferred embodiment of the honing method of the present invention and the honing device of the present invention, as described above, the overlap between one of the circular honing tools and the other of the circular honing tools is honing, that is, The width of the overlapping honing portion is set to be l〇〇mm or more, and the minimum 値 of the excess amount of the moving center line is set to B when the circular honing tool is honed, and the maximum 値 is set to C, so as to become 25mmSBS 100mm, 175mmSCS 250mm way to set. # When the width of the overlap amount is less than 100 mm, when B is less than 25 mm or exceeds 100 mm, and C is less than 175 mm or more than 250 mm, there may be a problem of uneven honing. In the honing method of the present invention, the honing pressure of the circular honing tool is divided and set from the center of the circular honing tool toward the outer circumferential direction, that is, the division is set in the radial direction to honing the plate-like body. ideal. In the honing device of the present invention, the honing pressure of the circular honing tool is set to be different from the center of the circular honing tool toward the outer circumferential direction. In a preferred embodiment of the present invention, the honing tool includes a plurality of air springs that are honing pressure generating devices, and the air springs are divided into the inner side, the middle side, and the outer side in the radial direction. The respective air springs divide and control the honing pressure in the radial direction by setting different air pressures. Therefore, by adjusting the honing pressure on the outer side of the honing tool, it is possible to uniformly perform the honing without changing the position of the honing tool, and further utilize the adjustment of the honing pressure and the position adjustment of the honing tool. The setting of the honing condition can be performed more subtly. -· aa, ··
^ J -9 - (8) 1331068 上方的硏磨機之複數台的圓形硏磨具（以下，僅稱爲硏磨 具）14、14···，使硏磨對象面被硏磨成可滿足於液晶顯示 器用玻璃基板領域所要求之平坦度。 如第1圖所示，硏磨具14、14··•，是以比玻璃基板 • G的寬度W還小之直徑D所構成，利用自轉及公轉機構 (圖示省略）一面以預定的旋轉中心爲中心進行自轉，同 時以預定的公轉中心爲中心進行公轉，一面將玻璃基板G φ 予以硏磨。又，在第1圖中’以實線所顯示的圓’是表示 硏磨具1 4、1 4…現在的姿勢，以兩點鏈線所顯示的多數 個圓，是表示以玻璃基板G與硏磨具14、14…所接觸之 部分的輪廓部作爲軌跡。由此等硏磨軌跡亦可得知硏磨具 1 4、1 4…是以預定的公轉中心爲中心進行公轉。 又，硏磨具14、14···，是以玻璃基板G的移動中心 線L爲基準，於左右成對配置，亦即成對地被配置在移動 中心線L的兩側，並且將成對之硏磨具的一方相對於他 • 方，以在玻璃基板G的移動方向上錯開位置’配置成交 錯狀，使硏磨具14、14…被配置成以越過移動中心線L 來硏磨玻璃基板G之方式。在此，移動中心線L’如本例 中將硏磨具14、14以成2列配置於玻璃基板G之寬度方 向之情形時’如第1圖所示’是相當於玻璃基板G之寬 度方向的中心線° 依據如此所構成的硏磨裝置10，並非是使用1台大 型硏磨具，而是集合複數台直徑D比玻璃基板G的寬度 W還要小的小型硏磨具1 4，藉由將該等硏磨具1 4、1 4… -11 - 1331068^ J -9 - (8) 1331068 The round honing tools (hereinafter, simply referred to as honing tools) 14, 14··· of the honing machine above, the surface of the honing object is honed to It satisfies the flatness required in the field of glass substrates for liquid crystal displays. As shown in Fig. 1, the honing tools 14, 14··· are composed of a diameter D smaller than the width W of the glass substrate G, and are rotated by a predetermined rotation using a rotation mechanism and a revolving mechanism (not shown). The center rotates at the center, and the glass substrate G φ is honed while revolving around the predetermined revolution center. In addition, in the first drawing, the 'circle shown by the solid line' indicates the current posture of the honing tools 14 and 14... The majority of the circles displayed by the two-dot chain line indicate the glass substrate G and The contour portion of the portion to which the honing tools 14, 14 are in contact is used as a trajectory. Thus, it is also known that the honing tool 14 4, 1 4 ... revolves around the predetermined revolution center. Further, the honing tools 14, 14 are arranged side by side on the basis of the movement center line L of the glass substrate G, that is, they are arranged in pairs on both sides of the movement center line L, and are formed One of the honing tools is arranged in a staggered manner with respect to the other side in a moving position in the moving direction of the glass substrate G, so that the honing tools 14, 14, ... are arranged to be honed over the moving center line L. The method of the glass substrate G. Here, when the moving center line L' is disposed in two rows in the width direction of the glass substrate G in this example, 'as shown in FIG. 1' is equivalent to the width of the glass substrate G. The center line of the direction. According to the honing device 10 configured as described above, instead of using one large honing tool, a plurality of small honing tools 14 having a diameter D smaller than the width W of the glass substrate G are collected. By using the honing tools 1 4, 1 4... -11 - 1331068
以玻璃基板G之移動中心線L爲基準於其左右成對配 置，使硏磨具14、14…越過中心線L來硏磨玻璃基板 G，而可以將玻璃基板G整面予以硏磨。 又，依據此一硏磨裝置1〇，由於硏磨具14設爲小型 之小直徑化，故可解決硏磨具14之材料的確保、加工組 裝精度的維持、更換作業與操作處理性等問題。再者，硏 磨具14、14···，由於是沿著玻璃基板G之移動方向呈交 Φ 錯狀地至少配置2對，所以可以將板狀體均等且精度良好 地予以硏磨。 在本發明中之硏磨具14，在考量硏磨具14之大型化 所產生的缺失（硏磨具之材料的確保、硏磨裝置及硏磨具 之加工組裝精度的維持、硏磨具的更換作業與操作處理 性、以及硏磨精度的維持等問題），以及硏磨具14之製 造與操作處理時的受限條件（一般門尺寸：1 800mm、容 器尺寸：2250mm、材料泛用尺寸：1 800mm等），其直徑 ® 在1 75 0mm以下來構成爲理想。 作爲其一例，可舉玻璃基板G的寬度爲2200mm、硏 磨具14的直徑爲1290mm、公轉半徑爲75mm，公轉中心 是位於移動中心線L之正交方向，左右離移動中心線L 爲600mm的位置。 又’對於硏磨裝置10，硏磨具14，係如第2圖所 示，設定成在硏磨時可從玻璃基板G之一端外伸（over_ hang )。作爲該外伸量 A，以20mm $ A S 250mm爲理 想。 -12- (10) 1331068 由於硏磨對象之玻璃基板G的端緣，通常以沒有倒 角之情形較多，硏磨具14的外伸量A若未滿2 0mm則容 易傷及端緣，若外伸量A超過2 5 0mm時，則硏磨具14容 易傾斜，會難以均一地硏磨。因此，將外伸量A以設定 在20mmSA$ 250mm的範圍爲理想。 再者，對於上述硏磨裝置10，如第3圖所示，其公 轉半徑R以設定在50mmS RS l〇〇mm爲理想。 # 若公轉半徑R未滿5 0mm時，硏磨具14的自公轉的 合成方向變化較大，殘留在玻璃基板G的硏磨紋路會有 容易顯眼之情形。又，若公轉半徑R超過100mm時，則 硏磨具的支持裝置爲大型化因而必須要有較大的剛性。並 且，會有裝置容易振動之情形。由於如此，將公轉半徑R 以設於50mmSR$100mm爲理想。 再者，如第4圖所示，以玻璃基板G之移動中心線L 爲基準成對所配置之一方的硏磨具14與另一方的硏磨具 ® 14在硏磨時的重疊量P爲100mm以上，且硏磨具14在 硏磨時從移動中心線L之超出量以B爲最小値，以C爲 最大値時，是以被設定在10 0mm、175mm $ C S 250mm的條件爲理想。 在本例之硏磨裝置10中，由於是藉由使其包含玻璃 基板G之移動中心線其近旁的一部分，以夾隔著移動中 心線L成對配置成交錯狀的4台硏磨具14、14…來進行 硏磨，所以在成對硏磨具14、14…之重疊的硏磨部，恐 有產生硏磨不均之虞。對於抑制該硏磨不均上，在謀求上 -13- (13) 1331068 硏磨具之配置關係的說明圖。 第3圖是顯示於第1圖所示之玻璃基板硏磨裝置中， 硏磨具之公轉半徑的說明圖。 第4圖是顯示於第1圖所示之玻璃基板硏磨裝置中， 硏磨具之配置關係的說明圖。 第5圖是顯示以往之玻璃基板硏磨裝置的平面圖。 • 【主要元件符號說明】 10 :硏磨裝置 1 2 :吸附薄片 1 4 :硏磨具 D :硏磨具的直徑 G :玻璃基板 W:玻璃基板的寬度（寬幅） X :搬運方向 •16- (5The glass substrate G is honed over the center line L by honing the glass substrate G with the honing tools 14, 14 ... aligning the left and right sides of the glass substrate G with respect to the movement center line L. Further, according to the honing device 1 , since the honing tool 14 is made small in size, it is possible to solve the problem of ensuring the material of the honing tool 14 , maintaining the processing and assembling accuracy, replacing the operation, and handling the process. . Further, since the honing tools 14, 14 are arranged in at least two pairs along the moving direction of the glass substrate G, the plate-like body can be honed uniformly and accurately. In the honing tool 14 of the present invention, the lack of enlargement of the honing tool 14 is considered (the material of the honing tool is ensured, the processing precision of the honing device and the honing tool is maintained, and the honing tool is maintained. Problems such as replacement work and handling, and maintenance of honing accuracy, and restrictions on the manufacturing and handling of the honing tool 14 (general door size: 1 800 mm, container size: 2250 mm, material versatility: 1 800mm, etc., and its diameter ® is ideally below 175 mm. As an example, the glass substrate G has a width of 2,200 mm, the honing tool 14 has a diameter of 1,290 mm, and a revolution radius of 75 mm. The revolution center is located in the orthogonal direction of the movement center line L, and the left and right movement center lines L are 600 mm. position. Further, with respect to the honing device 10, the honing tool 14, as shown in Fig. 2, is set so as to be overhanged from one end of the glass substrate G during honing. As the amount of overhang A, it is desirable to use 20 mm $ A S 250 mm. -12- (10) 1331068 Since the edge of the glass substrate G of the honing object is usually not chamfered, if the amount of overhang A of the honing tool 14 is less than 20 mm, the edge is easily damaged. If the amount of overhang A exceeds 250 mm, the honing tool 14 is easily inclined, and it is difficult to uniformly honing. Therefore, it is desirable to set the overhang amount A to a range of 20 mm SA $ 250 mm. Further, as for the above-described honing device 10, as shown in Fig. 3, the revolution radius R is preferably set to 50 mmS RS l 〇〇 mm. # If the revolution radius R is less than 50 mm, the direction of the self-revolution of the honing tool 14 changes greatly, and the honing pattern remaining on the glass substrate G may be conspicuous. Further, when the revolution radius R exceeds 100 mm, the support device of the honing tool has a large size and thus must have a large rigidity. Also, there is a case where the device is easily vibrated. Because of this, it is desirable to set the revolution radius R to 50 mm SR $ 100 mm. Further, as shown in Fig. 4, the amount of overlap P between the honing tool 14 and the other honing tool 14 which are arranged in pairs with respect to the movement center line L of the glass substrate G is honed. When the honing tool 14 is honed, the excess amount from the moving center line L is B being the minimum 値, and when C is the maximum ,, it is preferably set to 100 mm, 175 mm $ CS 250 mm. In the honing apparatus 10 of the present embodiment, four honing tools 14 are arranged in a staggered manner in pairs by the movement center line L by including a part of the vicinity of the movement center line of the glass substrate G. Since the honing is performed in the overlap of the pair of honing tools 14, 14 ..., there is a fear that the honing unevenness will occur. In order to suppress the unevenness of the honing, an explanatory diagram of the arrangement relationship of the -13- (13) 1331068 honing tool is sought. Fig. 3 is an explanatory view showing the revolution radius of the honing tool in the glass substrate honing device shown in Fig. 1. Fig. 4 is an explanatory view showing the arrangement relationship of the honing tools in the glass substrate honing device shown in Fig. 1. Fig. 5 is a plan view showing a conventional glass substrate honing device. • [Main component symbol description] 10 : Honing device 1 2 : Adsorption sheet 1 4 : Honing tool D: Diameter of the honing tool G: Glass substrate W: Width of the glass substrate (wide) X: Handling direction • 16 - (5