TWI329191B - - Google Patents

Description

1329191 » * IX. DESCRIPTION OF THE INVENTION: TECHNICAL FIELD OF THE INVENTION The present invention relates to a method of correcting the absolute flow rate of a flow controller used in a gas system of a semiconductor process. [Prior Art] Use in a film forming apparatus or a dry money engraving apparatus in a semiconductor process

For example, a special gas such as money or hydrogen, or a smoldering gas such as gas or the like, and a combustible gas such as hydrogen. The flow of these gases must be strictly managed. For the reason, it can be mentioned that the gas flow directly affects the quality of the treatment. That is, the film processing quality and the processing of the etching processing circuit are affected by the high precision of the gas machine s, and the yield of the semiconductor process is determined. For other reasons, it is mentioned that such a gas is harmful or explosive to the human body or the environment. ~, do not allow these air shadows after use directly to the atmosphere, must be in accordance with the type of gas to save and destroy means. However, the general treatment performance of this means of decontamination is limited. When the flow rate exceeds the allowable value, 'it is not completely possible, and it may flow out to the environment# harmful gas, or cause the means of damage to damage β and 'attempt some gas' because In particular, high-purity and dust-free, which can be used in a semiconductor process, is not only expensive, but also has a limitation in the use of natural deterioration depending on the type of gas. On the other hand, in the semiconductor manufacturing process, the gas is required to be about 2 to 2000 Sccm, and the flow rate of the high-precision fixed 5 2097-8068-PF; Ahddub is required to be spread over a wide range. Therefore, since the conventional flow controller is disposed in the semiconductor process circuit, the well-known flow controller is used to optimize the flow rate of various gases, and the mass flow controller is changed by applying the σ voltage. Change the set flow rate to handle changes in processing prescriptions. However, among these gases used in the semiconductor process, among the so-called process gases, a material gas for film formation is particularly preferable in that the gas line i has a possibility of depositing a solid matter, which may change the flow volume. • The mass flow controller uses a thin tube inside to supply a high-precision fixed flow rate, and even if a solid substance is precipitated in a small amount in this part, the flow accuracy of the supply is deteriorated. In addition, since a gas having a high corrosion resistance such as an etching process is used, a material having high corrosion resistance such as stainless steel is used inside the mass flow controller, and corrosion cannot be avoided, and aging may occur. The accuracy also deteriorates. Thus the relationship between the applied voltage and the actual flow varies, and because of the possibility of actual flow changes, the mass flow controller needs to periodically detect and correct the flow. In the flow rate correction of the mass flow controller, although the membrane flowmeter is basically used, if the measurement system removes a part of the piping, the piping must be installed in the original state after the measurement and leak detection. Therefore, the work is labor intensive. Therefore, it is desirable to perform flow correction without removing the piping. In the method of performing the flow correction while the piping is still installed, it is also considered that the vacuum system provided in the processing chamber is used, but the method is insufficient in time or precision required for 2097-8068-PF; Ahddub 6 1329191. For example, the system for calculating the flow rate of the mass flow controller by the build down method for calculating the flow rate based on the measurement of the space of the fixed volume has been applied by the inventors of the present invention. In Patent Document 1, a correction system for the absolute flow rate of the mass flow controller is disclosed. The piping diagram is shown in Fig. 14. The system uses an inert gas such as nitrogen gas for the measurement gas, and fills the gas line with a predetermined amount of gas, and measures the speed of the controller 4 through the mass flow controller 10. Therefore, on the piping 110 between the σ and the first __ of the mass flow controller 10, the measurement of the gas for storing the measurement gas via the pressure sensor 11 and the measuring opening and closing valve 1 () 1 is provided. The groove 102' utilizes a first opening and closing valve 1'. After the supply of the processing gas to the mass flow controller 1 is cut off, the measurement opening/closing valve 1〇1 is opened, and the time τ required for measuring the predetermined pressure drop by the pressure sensor 11 can be easily performed. The absolute flow of the mass flow controller 10 is simply corrected. ^ However, in the method of Patent Document i, the gas for measurement needs to use an inert gas such as a rolling. This is the force. When measuring the flow rate, the temperature is set to a constant value. Based on the change in pressure, the volume in the loop is calculated using the equation of state of the ideal gas, and the flow rate is calculated based on the elapsed time τ and the volume. However, the compressed gas of the process gas system flowing continuously in the pipeline is corrected by an inert gas such as nitrogen close to an ideal gas, but the flow rate in the case where the process gas is actually used is not guaranteed. Also, 'the system cannot be used during this measurement, and when the system is restarted after the measurement is completed, because the processing gas to the pipeline is pure = 2097-8068-pp; Ahddub 7 1329191 takes time to recover' Therefore, there is a problem that the operating rate of the system is lowered. =, in the method of Patent Document 1, even if the flow characteristic of the mass flow controller 1 is known to deviate from the initial state, the system user needs to perform additional correction. Therefore, the inventors have also disclosed a method as disclosed in Patent Document 2. Patent Document 2 discloses a correction system for a gas piping system. A schematic diagram of the piping is shown in Fig. 5R. According to the invention of Patent Document 2, the processing gas is supplied from the processing gas source via the first opening (four)! 〇〇, the mass flow controller ίο located downstream thereof, and the pipeline of the final section shut-off valve 12〇 on the downstream side thereof, the system for supplying the gas piping system of the processing chamber 121, the system having the measurement at the end The pressure sensor u that cuts off the pressure on the inlet side of the valve 120 opens the first opening and closing valve 100 and closes the final section shut-off valve 12A, and measures the flow through the mass flow controller by the pressure sensor u. The pressure of the mass flow controller is measured when the process gas is introduced into the upstream side of the final stage shutoff valve 120, and the flow rate of the mass flow controller is measured. In this system, when the flow rate of the mass flow controller 1 is corrected, the first on-off valve is first used. Both the 100 and the final cut valve 120 are opened. At this time, the process gas is supplied from the process gas source, and on the other hand, the portion downstream of the mass flow controller 10 and the exhaust pump located downstream of the process chamber 121 are in communication. In this gas piping system, the exhaust pump is usually placed further downstream than the processing chamber 121, in which case the pressure of the portion is lowered to near the vacuum. Further, it is lowered to the vicinity of the atmospheric pressure in the case where the pump is not disposed. Use The force sensor 11 measures the pressure. Next, the terminal shut-off valve 120 is closed, and the 2097-8068-PF on the side of the processing chamber i 2 is cut off; Ahddub 8 1329191 :: is controlled by the mass flow controller 10 The gas flow rate, the portion between the turbulent flow controller 10 and the final section shut-off valve 120 is gradually increased due to the processing gas, and the value of the pressure sensor 11 is gradually increased. "The upper jaw corrects the mass flow controller 10, and the 'duty rise' over time (4) is corrected by the slope of the initial slope based on the minimum flat slope. School: and 'the flow rate controller of the mass flow controller can be used to process the gas: the result of the flow correction, the flow rate of the mass flow controller deviates from the starting value because it is based on the body controller from the unillustrated It means that the automatic correction "correction of 'υ can always supply the set flow of the gas. In addition, in other methods, the method of Patent Document 3 also has a method of measuring the absolute flow of the flow controller. In the patent document 3' reveals Weng gift temporary county a曰 _ milk body! The flow measurement system is not schematic in the 16th chart. In Fig. 16, an input terminal 134 connected to the pressure conversion 褥 state 130, and a temperature sensing resistance element 138 electrically connected between the input terminal 134 and the wheel DD 1 η storage w (four) terminal 142 are shown. Connected, the temperature sensing resistive element 140 is electrically connected between the output terminal U2 and the ground 136. The force converter 130 is a sound pressure gauge with a high precision. For example, it is a type of electric valley gas pressure gauge that uses a measured metal pressure to change the pressure of the metal diaphragm. 2097-8068-PF; Ahddub 9 yi utilizes a circuit that is connected to the pressure converter 13 卷 in a gas-filled manner, and the resistance value of the resistance element and the temperature are directly changed (directly proportional) by the ground, along with The temperature increases and increases, and decreases with the decrease of the degree of prion and β itch. When the temperature of the gas in contact with the resistive element 138 rises, the value of the i-ray / resistance increases. The magnitude of the output voltage v appearing across the fixed temperature sensing resistive element 140 is thereby reduced by a greater portion of the overall signal voltage across the temperature sensing resistive element. Therefore, a relatively simple device is provided which is determined and corrected by connecting the pressure conversion thief 130 to a chamber having a predetermined volume disposed on the downstream side of the mass flow controller 10 connected to a gas source not shown. Mass flow controller 1 The average flow of gas. According to the method of Patent Document 3, the mass flow control body proportional to the number of moles is also the process gas itself. In addition, it is not necessary to separately measure the pressure and the temperature 'the flow rate of the gas that can be obtained from the inside of the chamber' can be measured by the measured flow at this time. No mathematical calculation is required. Patent Document 1: Patent No. 2635929 2: Patent No. 3,367, 811, Patent Document 3: Japanese Patent Application No. 3022931 [Summary of the Invention] [The problem to be solved by the invention] However, 'the user strongly desires who to think ^ # 仃 仃 according to the actual fluid of the mass flow controller Correction of Absolute Flow Rate in Straight 4 In Patent Document 1, since the absolute flow rate is corrected by the gas for measurement, it is guaranteed to be 2097-8068-PF when using the process gas; the flow rate of Ahddub 10 is: , for the field, patent document 2, although the actual use of the = can be used to correct the absolute flow of the mass flow controller, but the s and the pressure rise rate of the starting material comparison to carry out mass flow control in the convection The correction is based on the so-called flow correction based on the relative comparison so that the absolute flow rate cannot be corrected. In the method of Patent Document 3, although the correction of the absolute flow 4 of θ is controlled by the use of the processing gas, the absolute flow rate of the high-precision C-force and the temperature-sensing resistance element is actually used. The correction system is capable of correcting the flow rate with high precision. Although it is corrected according to the force and corrected by the temperature of the fluid in the flow path, it is not corrected according to the type and number of the gas type. The value of obtaining the absolute flow rate of the processing gas with high precision is not clear, and there is no detailed description thereof. That is, in the methods of Patent Documents 1 to 3, it is difficult to correct the absolute flow rate with high precision. Further, in the method of Patent Document 2, the volume is fixed in an absolute condition. In Patent Document 2, it is necessary to fix the volume of the space between the end shutoff valve and the mass flow controller of the flow path to which the processing chamber is connected, and when the grain product of the space changes, the data to be the reference does not exist. The mass flow controller cannot be calibrated after substantial modification. The same can be said in Patent Document 3. It is described that in order to obtain the flow rate, the pressure sensor is used as a circuit for the contactor, and the pressure rise in the chamber having a known fixed volume is measured. Therefore, the volume of the measurement space is changed due to the modification, and the flow rate correction cannot be performed correctly. Further, the space referred to herein means a container for measuring the pressure to which the pipe having the known fixed body 2097-8068-PF; Ahddub 1329191 is connected, although it is also thought that the volume of the chamber is sufficiently large. System, but semiconductor manufacturing equipment with strict space constraints is impractical. < Yes, gas accumulation may occur frequently due to manufacturing plans or design changes, etc. The user also strongly demands the realization of an absolute flow path measurement method that can cope with the modification. Therefore, the present invention is directed to a developer who solves the above problems, and an object thereof is to provide a correction system for absolute flow rate of a flow controller that can realize the following matters: (1) The flow rate represented by the mass flow controller can be performed by using the processing gas. Correction of the absolute flow rate of the controller with high precision; (2) Even if the volume of the flow path changes due to the modification or the like, the volume can be obtained and the absolute flow rate of the flow controller can be corrected. [Means for Solving the Problem] In order to achieve the above object, the flow control machine absolute flow detection system of the present invention has the following features. (1) A correction system for the absolute flow rate of the flow controller, correcting the flow control unit having the first shutoff valve and the second shutoff valve provided in the gas flow path that connects the outlet of the flow controller and the inlet of the processing chamber The absolute flow rate of the flow controller is characterized in that: the exhaust flow path is connected to the gas flow path between the first valve and the second cut-off and the inlet of the vacuum fruit; a third cut-off and a fourth shut-off valve are disposed in the exhaust flow path; a pressure sensor and a temperature sensor, 2097-8068-PF; Ahddub 12 1329191 • 5 is placed in the third shut-off valve And the exhaust flow path between the fourth shut-off valve; and the control device for calibration, connecting the pressure sensor and the temperature-sensing stolen 'memory gas type inherently indentation factor data, and a volume value of a predetermined space formed by an outlet of the flow controller, the second shutoff valve, and the fourth shutoff valve; and the compression factor data read from the calibration control device is read during the first measurement The first pressure value of the pressure sensor and the first of the temperature sensor a first compression factor value corresponding to the degree value, and determining a first quality from the first pressure value, the first temperature value, the volume value, and the first compression factor value; The compression factor data reads a second compression factor value corresponding to the second pressure value of the pressure sensor and the second degree value of the temperature sensor during the second measurement, and from the second pressure value, the The second temperature value, the volume value, and the second compression factor value determine a second mass; and the absolute flow rate of the flow control benefit is corrected according to the difference between the first mass and the second mass. Further, the flow controller referred to herein means a machine that controls the flow rate of a fluid represented by a mass flow controller or the like. In addition, the compression factor referred to here is set to the absolute temperature τ, the gas 1 mol volume is V, and the gas constant is R, the variable represented by Z = PV/RT is called the compression factor. The deviation between the actual gas and the ideal gas is based on the value of the disorder and is in the ideal gas system. Also, Z is also called a compression factor. The compression factor is a function of temperature and pressure as shown by the equation, and although there is a tendency to change little at high temperatures and low pressures, it is applied to a process gas produced by a semiconductor manufacturer 2097-8068-PF; Ahddub 1329191. Since there are many cases of use at normal temperature, the value of z can be used instead of compression depending on temperature and pressure. The error of the correction factor inherent to the gas type is smaller. = Again, the compression factor referred to here, the value of the compression factor for the pre-measured fort and force, has different sources depending on the gas species. However, if it is used only for the type of gas to be defined, it can be calculated by a calculation formula without having to have data. A processing chamber that is private here means a semiconductor process in which a process using a gas is performed. (2) The correction system for the absolute flow rate of the flow controller described in the section is characterized in that the flow controller is a predetermined fixed flow rate/force L, and at the time of measurement, the root wall ~ 士曰~1 switches the first mode and the first mode according to the fixed flow rate of the fluid passing through the flow controller, and the first mode determines the first amount of time and the time based on the elapsed time The first time is measured, and the second mode is based on the predetermined pressure. The first 1 time and the second measure are determined.

The positive error at the time of the passage indicated here becomes smaller, and the longer the time required according to the flow. In order to make the flow controller flow change, the experiment is to confirm that the lower the flow rate, the lower the output, and the pressure that is used to replace the time-corrected two: flow rate... There are many cases in which the gas is handled. θ The strength of the earth is strong, and the pressure is based on the measurement. The root (four) test is also broken. 3) - Correction system for the absolute flow of the flow controller, corrected to have a temperature of 2097-8〇68-PF; Ahddub has δ and is placed at the absolute flow of the first shut-off valve and the controller of the flow controller flow path , which is characterized by:

And an exhaust gas flow path connecting the body flow path between the first shutoff valve and the second shutoff valve and a population of the vacuum pump; the third shutoff valve and the fourth shutoff valve are further disposed In the exhaust flow path; a pressure sensor and a temperature sensor, 6 is further disposed between the second shutoff valve and the fourth shutoff valve; and a correction control device, connected The pressure sensor and the temperature sensor further comprise: a first sealed space formed by the first shut-off valve, the second shut-off valve, and the third shut-off valve being closed; and the second The sealed space is formed by closing the third shutoff valve and the fourth shutoff valve, and the volume V2 separated by the third shutoff valve and the first sealed space is known; a confined space and the second confined space, and measuring the pressure P, the temperature Tl;

The flow rate control unit of the gas two shut-off valve connected to the inlet of the processing chamber evacuates the first sealed space and the second sealed space, and measures the pressure ρ2 after vacuuming, and the temperature Τ2; The third shut-off valve connects the first closed space and the second closed space, and measures the pressure ρ3 and the temperature D3 after the time; according to the pressure Pi, the temperature T1, the pressure ρ2, the temperature Τ2 The pressure Ρ3, the temperature Τ3, and the volume V2 determine the volume V of the second closed space. [Effect of the Invention] 2097-8068-PF; Ahddub 15 1^29191 The action and effect as shown below can be obtained by using the correction system of the absolute flow rate of the flow controller of the present invention having the above characteristics. (1) A correction system for the absolute flow rate of the flow controller, correcting the first shut-off valve and the second cutting width of the gas hungry road having the X placed in the inlet of the controller/claw controller and the inlet of the processing chamber The flow rate control & absolute flow rate of the flow controller is characterized by: having: an exhaust flow path, the gas flow path between the first shutoff valve and the second shutoff valve The population of the vacuum pump is connected; the third shut-off valve and the fourth shut-off valve are placed in the exhaust flow path; the pressure sensor and the temperature sensor are disposed on the third shut-off valve and the fourth cut The exhaust flow path between the shut-off valves; and a correction control device that connects the pressure sensor and the temperature sensor's inherent compression factor data of the memory gas type, and the outlet of the flow controller, the first a volume value of a predetermined space formed by the second shutoff valve and the fourth shutoff valve; reading the compression factor data from the calibration control device at the first measurement time and the first of the pressure sensor The first compression factor corresponding to the pressure value and the first degree value of the temperature sensor And determining a first quality from the first pressure value, the first temperature value, the volume value, and the first compression factor value. Reading the compression factor data from the calibration control device in the first amount And measuring a second compression factor value corresponding to the second pressure value of the pressure sensor and the first temperature value of the temperature sensor, and from the second pressure value, the second temperature value, the volume value, And determining the second quality by the second compression factor value. Correcting the absolute flow of the & controller according to the difference between the first mass and the second mass; 2097-8068-PF; Ahddub 16 丄329191 so 'not For example, the gas for measuring the nitrogen gas close to the ideal gas, and the processing gas actually flowing to the mass flow controller, can be used to correct the flow rate of the absolute flow, and because of the pressure and/or value at each moment. Each of the corresponding (four) factors corrects the state equation of the ideal gas, and calculates an absolute flow rate with high accuracy, so that it has an excellent effect of correcting the absolute flow rate of the flow rate controller. In the equation of the state in which the ideal gas is used, the absolute flow rate n brother is calculated, and since the absolute flow rate of the actual gas is deviated, in order to correct the set of the non-physical phase of the actual gas, as shown in Patent Document 3, a simple correction coefficient is used. Corrected. > However, 'because the compression factor showing the non-ideal behavior is a function of the force and temperature, the value of the reduction factor is changed according to the pressure and temperature at the measurement time, by the first measurement and the second The appropriate absolute flow rate at each measurement can be calculated using the first compression factor and the second compression factor corresponding to the respective forces and temperatures during the measurement. Once, the actual flow of gas can be used to obtain the absolute flow with good precision: two kilograms: if the gas calibration is used, the actual use shape is not different, and it can be corrected according to the absolute flow rate. The absolute flow rate of the gas supplied to the semiconductor machine can be gripped. (2) The correction of the absolute flow rate of the flow controller described in (1): It is characterized in that the flow controller is fixed in advance: the second one is 'measured' according to the flow controller The solid amount of the fluid switches between the first mode and the second mode, and the first mode is used to determine the first set time and the second measure time, and the 2097-8068-PF; Ahddub 17 1329191 ♦ The flow rate of the gas during the measurement and the second amount of the controller. The second method determines the first measurement time based on the predetermined pressure; therefore, it has an excellent effect of performing high-precision correction in accordance with the flow rate. . The flow rate of the processing gas, such as the mass flow controller, of the flow controller of the gas concentration unit, is generally in the range of 2 coffee to 2 _ coffee flow through the flow controller of the f, and the mass flow rate is performed. The case of the correction of the absolute flow rate is also corrected by the set flow rate which is the same as the state of use.

“The pressure and time have a proportional relationship, although the flow rate is low.” Because the pressure report is difficult to rise, it takes time to see the change, but in the case of a large flow, the pressure changes in a short time. = In this case, 'the pressure rises in a too short period of time due to the responsiveness of the machine'. When the pressure is measured based on the elapsed time, the accuracy may deteriorate. Moreover, since it is measured in a portion close to the maximum range, it is also possible to exceed the measurement range of the Lili sensor according to the response accuracy. Although it is considered that each of them has a dust sensor, it is a high-precision pressure: the sensor is expensive, and a space-efficient gas deposition guide is also required to be a problem. Therefore, by adopting a system in which the flow rate is low based on the elapsed time and the predetermined pressure is used as the reference amount in the case of the flow rate, and the absolute flow rate is corrected, the low price and the space efficiency can be achieved. Excellent and accurate flow correction. (3) The correction system for the absolute flow of the flow controller is corrected to have a first cut off of the gas gripping path that is connected to the inlet of the flow controller and the inlet of the processing chamber with the 2097-8068-PF; Ahddub 18 1329191 f The absolute flow rate of the flow controller of the flow control unit of the valve and the second shut-off valve is characterized by: having: an exhaust flow path, the door of the first shut-off valve and the second shut-off valve The gas H and the vacuum pump are connected to the σ; the third shut-off valve and the fourth shut-off valve are again placed in a quasi-exhaust flow path; the force sensor and the temperature sensor are disposed on the third shut-off valve and The exhaust flow path between the fourth cuts; and the correction control device connected to the house force sensor and the temperature sensor; further comprising: a first closed space, by the first cut a valve, the second shutoff valve, and the third shutoff valve are closed; and the second closed space is formed by closing the 6th second shutoff valve and the fourth shutoff valve, and the third The volume separated by the shutoff valve and the first closed space is known; the gas is filled in the first closed space and the second closed Room, and measuring a pressure Pi, temperature Τι; Room evacuated and measuring

The pressure of the first sealed space and the second sealed vacuum is 2, and the temperature is 2; the third cut room is opened, and the first sealed space and the second sealed space are connected, and the measurement is performed after time. Pressure Ρ3 and temperature τ "the pressure F»2, the temperature T2, the 'determination of the first closed space according to the pressure Pi, the temperature τ, the S force P3, the temperature T3, and the volume 'volume V , and 'do not use the cut-off flow path of the gas-reducing flow path to measure the pressure and temperature, so do not use the special measuring device 5^ set the space efficiency of the measuring circuit, such as the measuring valve, The space in the flow path is treated as a groove, 2097-8068-PF; Ahddub 19 can be used to obtain an unknown transfer hoarding. The volume change of the flow path due to the transformation of the system, etc. θ , ^ The superior effect of the correction of the absolute flow rate of the controller is set. The absolute flow rate of the flow controller is corrected for I, and it is necessary to correctly grasp the volume of the machine thief and the ε within the ε. Calculate the flow direction using the equation of state corrected by the compression factor and the mind Since the flow rate of the controller is not correctly known, the volume cannot be calculated. ^ Therefore, if the volume is determined in this way, the volume can be modified, and the volume in the assembled state can be specified to help shorten the time. Further, the present invention has an excellent effect of the problem of the volume error caused by the assembly after the disassembly. [Embodiment] Hereinafter, an embodiment of the present invention will be described with reference to the drawings. First, the structure of the first embodiment will be described. Figure 1 is a flow diagram showing the minimum configuration necessary to correct the absolute flow weight of the flow controller used in the semiconductor process. The mass flow controller 1G of the fluid controller is implemented with the processing gas inside it. The gas flow path 30 to which the inlet of the processing chamber 13 of the semiconductor process is connected is connected. The X' first shutoff valve 21 and the second shutoff valve 22 are provided in a gas that connects the outlet of the mass flow controller 10 and the inlet of the process chamber 13 Further, between the first shut-off valve 21 and the second shut-off valve 22, the connection of the 2097-8068-PF; the Ahddub 20 1329191 and the exhaust gas flow path 3 connected to the vacuum pump 14 1. Further, a third shutoff valve 23 and a fourth shutoff valve 24 are provided in the exhaust flow path μ, and a pressure sensor 11 and a temperature are provided between the third shutoff valve 23 and the fourth cutoff chamber 24. The sensor 12. Further, for convenience of explanation, the third shutoff valve 23, the pressure sensor 11's proximity sensor 12, and the fourth shutoff valve 24 are disposed in the exhaust flow path 31. It is referred to as a correction unit 20. The first shutoff valve 21, the second shutoff valve 22, the third shutoff valve 23, and the fourth shutoff valve 24 are connected to a pneumatic connection unit (not shown). Although the membrane m does not necessarily require a pneumatic operation type, the semiconductor process 'because of the use of a flammable gas as described above', the core system and the explosion-proof specification are preferable, and the air pressure operation type is used. The correction unit 20 is actually mounted in the circuit as shown in Fig. 2. Fig. 2 is a piping diagram showing a part of the actual pipeline. In other words, the plurality of gas lines are the three flow paths of the first gas supply path 33, the first gas supply path 34, and the third gas supply path 35 in the second drawing, and the mass quantity controller 1 is The gas flow path 30 is connected, and the gas flow path 3 之间 between the first shut-off valves 22 for the first cut-off of the first year is connected and the exhaust flow path 31 is provided. Further, in the first gas supply path 33, the second gas supply path 34, and the third gas supply path 35, the pressure gauge 15 or the fifth shutoff valve 28 is removed, and the first flushing is performed. The flushing line 32' to which the second flush valve 26 is connected is used in the case of performing N2 flushing. Further, in addition to the pressure gauge 15 and the pressure regulator 16, the flushing wire 32 is merged via the third flush valve 27 and the gas flow path 30. 21 2097-8068-PF; Ahddub 1329191 In the exhaust flow path 3 I Qiaofan # > „ The third shut-off valve of the second shut-off valve 24, μ 忒 (1) and vacuum 纟The force sense 11 and the temperature sensor 12, the complex & connection and the gas flow path 30 are connected to the processing chamber 13. One of the lines is in the actual use case, and the third figure shows the actual tube gas collecting unit. The structural diagram, Fig. 4 shows the side view thereof. The unitary unit 20 is not disposed in one of the gas gathering units, and is disposed in the mass flow controller 1 of each block. Correction: This βFig. 3 (4) and Fig. 2 correspond to and draw only three gas supply paths, but in the actual gas accumulation unit, more gas supply paths can be connected. And 'these gas supply paths are used as one The unit is housed in a gas box. - In this month, the gas unit is not placed in the structure as shown above, and the positive unit 20 and the crucible are connected and controlled by the control device, and the mass flow I control can be corrected. Absolute flow of 11. Next, explain the steps. Initially, the flow rate Q is determined in advance. The calculation step can determine the flow rate Q according to the relationship between the inflow mass dG and the elapsed time dt, and the correction by the mass flow controller 10 is performed at the absolute flow rate Q〇 of the temperature 〇t: Therefore, according to the formula of dG = nQDdt Here, the specific value of the specific gravity n-type material. The dG system can be obtained from the pressure and temperature measured at each time of the first measurement and the second measurement according to the equation of state of the ideal gas. PV=nRT indicates that the gas constant R′ at this time is determined according to the gas type, and the pressure P is measured by the pressure sensor 11, and the temperature sensing and i 2 measurement is 2097-8068-PF; Ahddub 22 1329191 • /m degree Τ The volume V is known. Furthermore, if the equation of state uses the mass g. instead of the mole number η, it can also be expressed as pv = nRT. ' Therefore, the pressure P! and temperature measured during the first measurement are used. Τι, and the pressure and temperature h measured during the first measurement, two equations can be established, 旎 denotes the mass G at that moment, and the mass G1 in the first measurement is in the second The measurement is the mass G2. That is, it is represented by dG = G2-Gi = (P丨/T丨-P2/t2) (v/R). In the equation, by substituting the above-mentioned absolute flow rate Q, the expression is expressed as Q°=(Pl/Ti~~ P2/T2) CV/I〇/(r()t). However, the ideal gas The equation of state can only be applied to ideal gases. ^The actual gas's intermolecular attraction, or the size of the molecule, and the state of the set are different for each gas molecule. It is necessary to modify the equation of state of the ideal gas and use it. The user is a non-ideal amount of compression factor Z representing the non-ideal behavior of the actual gas. The compression factor z is expressed as Z = pv / RT, and is also expressed as z = z (p, τ). • That is, the compression factor Z can be said to be a function of the pressure P and the temperature τ. Since the compression factor Z is inherently variable in the gas, it does not show a value different from that of the gas as shown in Fig. 5. Also, since the compression factor z is a function of the pressure p and the temperature T, it also varies according to the pressure p and the temperature τ. Figures 6 and 7 show those relationships. Fig. 5 is a graph showing that the reduction factor 2 of the representative processing gas at a pressure of 3 kPa and a temperature of 3 〇〇 κ has a large influence on the high and low temperatures, in fact, as in the first In the figure 5, the molecular weight "the bigger the 2097-8068-PF; the Ahddub 23 1329191. The more the condition of the ideal gas is deviated from ζ=ι. • Regarding the small molecular weight of H2 or He, N2, etc., it is close to z=l, especially the nitrogen of the inert gas, which can be said to be about the same as the ideal gas. However, in nh3 or SF6, the impact is so large that it cannot be ignored. In SF6, the compression factor Z is 0.961, and the deviation is close to 0.04. Fig. 6 and Fig. 7 are diagrams showing how the compression factor Z changes depending on the change of temperature and pressure by gas, and Fig. 6 is a graph showing the change caused by the temperature of the compression factor Z of SFe, the seventh figure. The graph represents a graph of the change caused by the temperature of the compression factor Z of N2 _. In each graph 'the compression axis Z represents the vertical axis at a temperature [. 〇 ] shows that the horizontal axis ′ represents a curve at 20 kPa, 50 kPa, 75 kPa, and 101. 3 kPa, respectively. The curve of SFe shown in Fig. 6 and the curve of N2 shown in Fig. 7 show that the value of compression factor Z is close to 1 according to the temperature, respectively, and the pressure is more than the value of compression factor Z is farther away from 1, the temperature The rate of change caused is also becoming more intense. It is known that especially the compression factor z of SF6 is affected by temperature and pressure _ large. Therefore, in order to utilize the above-described equation of state of the ideal gas, it is necessary to correct the compression factor Z as in PV = ZnRT, and thus, the correct value can be calculated. According to this, the absolute flow rate Q will be used. Expressed as Q[i=(Pi/(Z|Ti) - PJ(Z2T2))(V/R)/(r〇1:). According to the above method, the flow rate of the mass flow controller i 可 can be calculated. Because at each measurement time, according to the compression factor z that is responded to the correction, that is, at the first measurement, it is the measured pressure Ρ, the temperature I of the second 097 2097-8068-PF; Ahddub 24 . dust reduction factor Z', and in the second measurement, the appropriate correction is made for the measured pressure p2 and the second compression factor Z2 of the temperature T2, so that the value of the true flow can be obtained. Perform 皙, Λ 1 % 玎贞 s flow "correction of absolute flow of controller 10. The graph of Fig. 8 shows the accuracy of the flow rate correction in the case where the absolute flow rate of the mass flow controller 10 is corrected using the compression factor Ζ and the case where the compression factor 未 is not used. The accuracy of the flow rate correction indicates the error rate with the true value of the flow rate, the vertical axis is represented by φ precision [%], and the horizontal axis is represented by flow rate [seem]. Thus, it is known that the correction of the absolute flow rate of the mass flow controller 1 显然, in comparison with the case where the compression factor Z is not used, is apparent in the case where the absolute flow rate is corrected using the compression factor z. Moreover, it is known that the accuracy of the target is approached in the case of correcting the absolute flow rate using the compression factor Z. However, the mass flow controller of the actual gas aggregating unit has a wide flow range of 2 sccm to 200 〇 sccm. This is due to the amount of gas required depending on the type of gas used. However, as shown in Fig. 2, since one correction unit 2〇 needs to perform correction of the absolute flow rate of the plurality of mass flow controllers 1 , it is inconvenient when the flow range is wide. This is because the same pressure sensor 11 needs to be measured, and the volume of the reference is the same in measuring any one of the mass flow controllers 丨0, because the flow path is used as a space for measurement, so the general volume is, for example, about 1. 〇〇CC. Therefore, in the case where the gas is supplied at a flow rate of 2 sccm, although it takes time for the pressure change required for the measurement, the flow rate is 2〇97-8〇68-PF at 2〇〇〇SCCff1; Ahddub 25 1329191. In the case, the pressure, such as the pressure sensor π, is instantaneously placed in the end. It changes as fast. On the other hand, if the pressure sensor 11 capable of detecting the pressure with high accuracy at a flow rate of 2 SCCm is selected, since the range is inevitably determined, it becomes a knot which instantaneously reaches the limit range of the pressure sensor when the flow rate is 2 SCCm. • fruit. • The table indicating the status is the figure in Figure 9 and the table in Figure 1. Fig. 9 is a graph showing the relationship between pressure and measurement time. Further, Fig. 10 shows the relationship between the pressure at a certain volume and the measurement time when the fluid is nitrogen. In Fig. 9, the vertical axis is set to the pressure [kpa], and the horizontal axis is set to the measurement time [sec]'. As shown in Fig. 9, the pressure is proportional to the measurement time, and the measured flow rate is 2 〇 SCCm. The change at 50sccni and 1〇〇sccm is different, and the more the flow rate is, the larger the inclination is. In the table shown in Fig. 10, it is found that when the measured flow rate is obtained, the required pressure is reached at 0.7 seconds. • This, in order to cope with it, it is necessary to switch the reference according to the set supply flow rate, that is, for example, when the set flow rate is 2 sccm to less than ι〇〇〇_ is =, based on the elapsed time dt, the amount _ force And temperature, and in the case where the set flow rate is 100 〇sccm to 2000 sccm, the temperature and time are measured on the basis of pressure. By using this method, the measurement accuracy can be maintained. Further, in the table of Fig. 10, the numbers written in bold words are set values. For example, when the gas flow rate is 10%1, it is set to dt=10, and after the measurement, the result is 3kpa. In the case where the gas flow rate is set to 2097-8068-PF for the seek, the Ahddub 26 is 191 dP=23 kPa, and the time taken for the pressure to change from the pressure P1 to the pressure p2 is 1. 3 sec. Next, the second step is used according to these steps. The flow chart shown in the figure illustrates the actual measurement steps. Figure 11 is a flow chart showing the measurement procedure for the absolute flow rate of the circuit of the present invention. The actual flow is also corrected for the absolute flow according to the same procedure. When the flow measurement mode is selected, the state of each shutoff valve is set in S1. The first shut-off valve 2, the third shut-off valve 23, and the fourth shut-off valve 24 shown in Fig. 1 are all (four) 'the second shut-off valve 22 is closed, and the gas flows to the exhaust flow. Road 31 side. At this time, it is necessary to close the first shut-off valve other than the mass flow controller 1校正 for correcting the absolute flow rate. a. That is, in the second diagram in which a plurality of lines are connected, for example, the quality of the first gas supply path 33 is set. It is necessary to close the first shutoff valve 21 provided in the second gas supply path 34 and the third gas supply path 35 in advance. Since the correction of the absolute flow rate of one mass flow controller 1 一次 can be performed at a time, the absolute flow rate of the mass flow controller I 具备 provided in the first gas supply path cannot be corrected without performing this in advance. In addition, it can be said that the same is true for the correction of the absolute flow rate of other mass flow controllers. Then, in S2 'the mass flow controller that makes the process gas flow at the set flow rate state> J absolute..., then 'to the sage flow controller 1 〇2097-8068-PF; Ahddub 1329191 flow becomes stable until the process gas After the flow vector measures the mass of the absolute flow, the fourth shut-off valve 24 is closed, and the pressure in the flow path as the groove is increased. In this manner, the space formed by the fourth shut-off valve 24 and the second shut-off valve 22, and the outlet of the mass flow s controller 10 becomes the pocket path of the volume v, on the other hand, since the mass flow controller 1 It is a gas that flows into a fixed flow rate, so the product inside the space of the valley product V gradually rises.

At S4, it is confirmed that the pressure of the set pressure sensor 达到 reaches the pressure Pi ′ and the temperature τ is measured by the temperature sensor 12, and the measurement is started. At S5 ', check if the pressure sensor 丨 pressure has reached the set pressure, and when the set pressure is reached (S5: Yes), measure the elapsed time when the pressure reaches the pressure P2 of the set pressure at S8. On the other hand, if the set pressure (S5: No) is not reached, and the set time of the inspection is reached at S6 (s6: Yes), the pressure P2 at that time and the temperature are not measured at s6 at S7. In the case (S6: No), it is checked again at S5 whether or not the set pressure is reached. That is, here, the measurement reference is different when the set pressure or the set time is reached first. Therefore, in the case of Fig. 10, if the pressure is set to 23 kPa and the pressure of the set pressure range dP of the set pressure first? The value of the sum of 1 is set to the second measurement time, and the elapsed time and temperature 1 are measured. At this time, the pressure ρ2 is equal to the set pressure. Further, in the case where the measurement time dt reaches 10 sec first, the time is set as the second measurement time, and the pressure P2 and the temperature T2 are measured. For example, if the mass flow controller 10 has a set flow rate of 50 sccm and the fluid used is gas, 2097-8068-PF; Ahddub 28 1329191 is based on the table shown by the circle, because the measurement time dt is 〇, After the pressure P1 is measured, the pressure p2 and the temperature τ2 are measured after 10 seconds. ‘Because the set pressure range at this time is 10kpa, the pressure Ρ2 becomes equal to the value of the pressure p1+dp. For example, if the mass flow controller 10 has a set flow rate of 2000 sccm and the fluid used is nitrogen gas, according to the table shown in Fig. 10, since the set pressure range DP is 23 kPa, it is known that the pressure rise of 23 kpa takes 〇7 seconds. - In addition, the judgment may be made based on the set flow rate set by the mass flow controller ι, determined on the basis of the pressure, or judged on the basis. In the case of Fig. 10, as in Fig. 1 and δ, in the case where the set flow rate is 2 Sccm to less than 1 _ coffee, the pressure and temperature are measured based on the elapsed time dt, and the set flow rate is i OOOSCCIfl~2 In the case of 〇〇〇sccm, measure the temperature and time based on repeated force. Then, at S9, from the pressure P丨 of the first measurement, the temperature T丨, the self-weighting is compressed by the controller to purchase the first compression factor L' from the second compression factor L' from the second The pressure at the time of measurement p / the degree of Tz 'self-correction control the memory of the compression factor data read out the second ° 3L drag |_1 Yu Ζ 2. In Sin, the state equation of the gas is taken, and the absolute flow rate y is calculated according to the above steps, and the absolute flow rate y is calculated according to the above steps, and 0 唞 香 认 & & gt The correction of the absolute muscle mass of the quality controller 10 can be corrected according to this value. But the 丁 罝 罝 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器 控制器Production mass flow 29 2097-8068-PF; Ahddub 1329191 Yu, controller 1 〇 the original applied voltage and real flow. • The gas concentration in the 'in use' room is empirically deviated from the design value. As a result, since the yield of the treatment is deteriorated, it is preferable to generate a certain alarm at a timing exceeding the limit value of the deviation. Next, a second embodiment of the present invention will be described. (Second Embodiment) - It is not uncommon for a gas aggregating unit used in a semiconductor process to be modified due to a change in production schedule or a change in product. # However, in the third embodiment of the equation for correcting the ideal gas by the compression factor 并 and calculating the absolute flow rate, the flow path structure is changed by the modification, or the volume ν used for the calculation is changed, the flow cannot be calculated. . Therefore, in view of this problem, in the second embodiment, a method of obtaining the volume V which is changed by the reforming is obtained in the flow path structure of the jth embodiment. The second embodiment: the structure of the % example is the same as that of the first embodiment as described above, and therefore the description of the structure is omitted. Here, in order to simplify the description, the description will be made using the j-th diagram. The first sealing of the gas passage 3〇 and the exhaust passage 31 is formed by closing the shutoff valve 21, the second shutoff valve 22, and the first shutoff valve 23 in the first drawing. The volume Vi of the space and the first shut-off valve 23 and the shut-off valve 24 are closed to form a current product V2 between the second seals of a part of the exhaust flow path 31, and the second embodiment is obtained. The value of the valley product V used by the equation of state for the ideal gas. That is, y = V|+V2. However, strictly speaking, since the outlet of the mass flow controller 10 to the 2097-8068-PF; Ahddub 30 1329191 • the flow path V3 of the shut-off valve 21 exists, although it becomes v=Vi+Vz+V3, • However, the mass flow ratio controller 10 and the first shut-off valve 21 are arranged very close, because the volume L is much smaller than the volume V, the volume Vz, and there is almost no case of modifying the portion, so when it is explained here As known. In the case where the flow path is changed due to the expansion of the pipeline or the addition of the machine, the volume V! may vary. However, the part constituting the volume Vi is mounted on the body constituting the gas concentrating unit, and it is extremely difficult to remove the gas collecting unit and measure the volume. • On the other hand, the possibility of rebuilding the volume V2 is extremely low and should be assembled to the gas accumulation unit after being assembled in the gas accumulation unit, for example, using a measuring machine such as a membrane flowmeter to correct the volume V2. That is, the volume can always be treated as a known value. Therefore, it is preferable to measure the volume v] while still being assembled. In Fig. 12 and the figure, in the configuration of Fig. i, a means for measuring the volume V1 of the unknown system is shown by a flowchart. In addition, the 12th and 13th figures are calculated according to substantially the same method.

First, it is explained from Fig. 12. When the volume measurement mode is selected, the state of each shutoff valve is set in S11. It is assumed that all of the first shutoff valve 2 and the third shutoff valve 23' shown in Fig. 1 are opened, and the second shutoff chamber 22 is closed, so that the gas flows to the exhaust flow. Road 31 side. At this time, it is necessary to close the first cut-off 胄 21 other than the mass flow controller 10 to be the volume measurement target. That is, in the second drawing ‘connecting a plurality of lines, for example, the mass flow controller 31 2097-8068-PF; Ahddub 1329191 m 1 provided to the first gas supply path 33 is used. In the case of performing the volume measurement, it is necessary to close the second gas supply and the first shutoff valve 2 included in the third gas supply path 35 in advance, since it is not possible to simultaneously use two or more mass flow controllers 1 to perform the volumetric quantity: When the above is not performed in advance, the volume measurement can be performed using the flow rate controller 10 provided by the first gas supply path (1). In addition, it can be said that the same is true for volume measurement using other mass flow controllers 10. + But 'as long as volume measurement is performed*, since the volume can be obtained with high precision, although it is only confirmable to use other mass flow controllers 10 for volumetric capacity, it has a more reliable volume. The possibility of measurement. ^ Then set the flow-like bear at S1 2 ' in the mass flow controller 1 to make the nitrogen flow. This situation and the first! The embodiment is different because the volume V! of the flow path is unknown, so it is necessary to use a gas measurement close to the ideal gas. After the supply flow rate of the nitrogen gas passing through the mass flow controller 10 becomes stable, the fourth shutoff valve 24 is closed at S13. In this manner, the flow path ' is closed by the second shutoff valve 22 and the fourth shutoff valve 24, because the bag is small, the outlet of the mass flow controller 1 is closed, the second shutoff valve 22, and the fourth shutoff valve 24 are provided. The pressure of the space formed begins to rise. After the pressure in the flow path reaches the pressure P1, the first-cutting valve 21 is closed at S14, and thus a sealed space of volume + volume V2 is generated. The pressure P, and the temperature τ, are then measured at S15'. After the measurement is completed, the third shut-off valve 23 is closed at S16, and the fourth shut-off valve 24 is opened. Thus, the volume v, the first closed space is at the original pressure of 2097-8068-PF; Ahddub 32 1329191 state, and The second closed space of the volume V2 is opened. After that, after vacuuming the vacuum pump 24 at S17, the fourth shutoff valve 24 is closed. In the vacuum pump 14 used in the semiconductor manufacturing process, since there are many cases in which a high-vacuum is generated, such as a turbine molecular pump or a dry pump, a substantially vacuum state can be generated. By closing the fourth shut-off valve 24 at that time, the volume is closed. The second closed space of V2 can maintain a state of high vacuum. The pressure pz and the temperature of this state were measured at S18 s. Then, the third cut _ 23 is opened at S19, and the first closed space and the second closed space are communicated, and the pressure enthalpy and the temperature L are measured. According to the above method, the pressure of the first sealed space of the volume L which is unknown is the pressure P1 and the temperature is the temperature. The state of 1 is the state in which the pressure of the first living space of the known capacity = ^ is the pressure Pa, the temperature is the temperature T2, and the volume of the space in the state where the first closed space and the second closed space are connected is the volume V1 + volume V2, the pressure is the pressure Η, and the temperature is the state of temperature I. At S20', the state equation of the ideal gas is used according to these states, and the volume V! which is unknown is obtained. According to the above method, the volume V! of the first sealed space after the modification can be known. Further, the calculation steps of the equation of state of the ideal gas are as follows. When the above state is expressed by the equation, PluRTi, P2V2 = n2RT2, PiCVi + Vz^naRTs are three expressions. Here, the R-based gas constant is the number of moles. In addition, if the degree of airtightness is high, the number of moles should be constant, and ηι+η2=η3 can be said. 2097*8〇68-PF; Ahddub 33 Γ329191 m Finish the above formula, according to the number of moles V丨=(τ丨(ρ2τ3 - p3T3))/(T2(p3T丨—so, the relationship of the gas constant R When, it means $ ρα))^. Since the right term of the above formula is all known, the volume can be calculated by calculation. Next, explain the 13th. When the volume measurement mode is selected' At S21, each shutoff valve can be set. It is assumed that the first shut-off valve 21, the third shut-off chamber 3, and the fourth shut-off valve 24 shown in Fig. 1 are opened and the second shut-off valve 22 is closed. The gas is caused to flow toward the exhaust flow path 31 side. At this time, it is necessary to close the first-cutting room 2 other than the mass flow controller which is the volume measuring object, and the reason of the 12th figure: The receiver is at S22' in the mass flow controller. Set the flow state to allow nitrogen to flow. This situation is awkward! The embodiment is different because the volume V of the flow path is unknown, so it is necessary to use a gas measurement close to the ideal gas. After the supply flow rate of the nitrogen gas passing through the mass flow controller 10 becomes stable, the fourth shutoff valve 24 is closed at S23. In this manner, the flow path is closed by the second shutoff valve 22 and the fourth shutoff valve 24, and the mass flow controller 104 outlet, the second shutoff valve 22, and the fourth shutoff valve 24 are closed as the pocket path. The pressure of the space formed began to rise. After the pressure in the flow path reaches the pressure h, 'at S24, the third shut-off valve 23' is closed and thus the second closed space of the volume Vz is generated. Next at S15, the pressure P, and the temperature T! are measured. 2097-8068-PF; Ahddub 1329191 • After the middle, the first shut-off valve 21 is closed at S26, and the _-seven-segment shut-off valve 22 is opened. Therefore, the first closed space of the volume V2 is maintained in the original pressure state. Then, at step S27, after the process chamber 13 is evacuated, the second shutoff valve 22 is closed. The processing chamber 13 provided in the semiconductor process is often provided with a vacuum pump or the like that generates a high vacuum, and can generate a substantially vacuum state as in Fig. 12. By closing the second shutoff valve 22 at this time, the volume Vi is A dense φ closed space maintains a high degree of vacuum. Then, the third shutoff valve 23 is opened at S28, and the first sealed space is communicated with the first closed space', and the pressure and temperature T2 are measured. According to the above manner, the pressure of the second closed space of the known volume V2 is obtained as the pressure Ρ!, the temperature is the state of the temperature ;ι; and the first closed space and the second volume V2 of the volume V! which is unknown The pressure in the state in which the closed space is connected is the state of the pressure P2 and the temperature of the temperature T2. According to the state equation of the ideal gas based on these states, the volume Vm of the first closed space after the modification can be known by the above-described equation of the volume Vm which is unknown. Further, the calculation steps of the equation of state of the ideal gas are as follows. When the above state is expressed by the equation, pjpmRTi and P2 (Vi + V〇 = ri2RT2 are two equations. Here, the R-based gas constant is the number of moles in the system. In addition, if the space is highly sealed, the molar is The number should be the same, and, because the vacuum is 20097-8068-PF at a high level; Ahddub 35 sorts the gas constant R to the above-mentioned number of ears and the number of ears, "this, the work, the relationship of f; When the table is inflammatory, ir ', is V1 = (plTl - p2T2) / (p2T2) V2 because the right term of the above formula

Vi. Yu Wang. p is known, so the volume can be calculated by calculation. The 12th figure and the 1st step shown in Fig. 13 are shown in Fig. 12, and the main idea is the same.

The method of ghost ^ is to fill the first closed space n B second confined space with nitrogen gas, and the amount "... and the second confined space pumping] two τ. Work and speculate the pressure after vacuuming Ρ 2,,, Tian Translated 2 'Open the third shut-off valve, (10) - Connect, Α in the closed room and the first closed space connected to measure the pressure after the time? 3 and temperature I root

Tl, pressure ρ2, Shanghai itch T r. 】 / dish display capacity 2 垩 force P3, temperature T3, and volume v2, calculate the specific means of the current product V 丨. Different ® but 'according to the user's action ^ Because the gas flow path 30 is considered to be SI1: the vacuum generated is not high, and cannot be produced: straight: the exhaust flow path 31 is not connected and has a high degree of vacuum The case of ::...4, so the above two methods are proposed. According to this method, if one of the basins of the treatment chamber 13 or the vacuum pump 14 is used, the vacuum can be generated by using the 飧畑~, and the transfer v' and the heterogeneous valley product V丨 can be calculated, and the vacuum on the vacuum pump 14 side is not good. In the case, if it is the volume of Figure 12, the advantage. The gas accumulation unit of the method of the first embodiment can be modified by the method of providing the unknown volume generated after the semi-conducting, and the gas can be modified. The aggregation unit is changed to the mass flow controller 2 2 2097-8068-PF; Ahddub 36 1329191 correction of the flow. According to the mass flow rate correction system of the present invention described above, a correction system for the absolute flow rate of the effect (1)-type mass flow controller as shown below can be obtained, and the correction has the flow control set in the system. And the flute-difficult milk (10) road 30 - the shut-off valve 21 - the flow rate 4 control unit mass flow controller 10 absolute flow rate, with · exhaust flow path 31, the first shut-off valve 2] And the inlet and outlet of the gas flow path 30 and the vacuum system between the two cutting chambers; the second shutoff valve 23 and the fourth shutoff valve 24 are disposed in the exhaust flow path μ; the pressure sensor 11 And a temperature sensor 12, an exhaust flow path 31 disposed between the third shutoff valve 23 and the fourth shutoff chamber 24; and a correction control device, the (four) force sensor li and the temperature sensor 12 'The memory gas type inherently shrinks the factor data, and the mass flow controller 1. The volume value of the predetermined space formed by the outlet, the second shutoff valve I, and the fourth shutoff valve 24; the readout from the compression factor data of the calibration control device at the first measurement time and the pressure sensor 11 The pressure P1 and the temperature T of the temperature sensor 12 correspond to the first: compression factor + z, and the mass G1 is obtained from the pressure P1, the temperature 、, the volume v, and the first compression factor 2 >; the control device for correction The compression factor data, the second compression factor Zz corresponding to the pressure of the pressure sensor U and the temperature Tz of the temperature sensor 丨2 in the second measurement, and the valley product V from the pressure p2 and the temperature Tz And the second compression factor Ζ2 obtains the mass g2; according to the difference between the mass G1 and the mass I G2, the absolute flow rate of the mass flow controller 1 可 can be corrected. Therefore, instead of measuring gas such as nitrogen close to the ideal gas, and 2097-8068 ~ PF; Ahddub 37 1329191, the mass flow controller 10 can be performed using the processing gas of the gas type actually flowing to the mass flow controller 10. The correction of the absolute flow rate is performed by correcting the state equation of the ideal gas by the compression factor Z corresponding to each of the pressure value and the temperature value at each time, so that an absolute flow rate with high accuracy is obtained, and thus the mass flow controller 10 can be performed. The excellent effect of the correction of the absolute flow rate.

When the absolute flow rate is calculated using the equation of state of the ideal gas, the absolute flow rate of the actual gas is deviated. Therefore, in order to correct the non-ideal behavior of the actual gas, the correction factor is added, but the compression factor system showing the non-ideal behavior is shown. A function of pressure and temperature, the value of which varies depending on the pressure and temperature at the moment of measurement. Therefore, if only the correction factor is added, the absolute flow rate is calculated based on the pressure drop or the pressure rise in the closed space. The value of the compression factor z to be corrected is different between the case where the pressure is low and the case where the pressure is high. The calculated value of the absolute flow rate is deviated, but by using the first compression factor 2 and the second compression factor I corresponding to the respective pressures and temperatures during the first measurement and the second measurement, Appropriate absolute flow in the measurement, and because the actual gas can be used to obtain the absolute flow with good precision, if the gas calibration using the measurement is not different from the actual use state, it can be corrected according to the absolute flow rate. Because of this correction, the absolute flow rate of the gas supplied to the semiconductor device can be grasped. (2) The correction system for the absolute flow rate of the flow controller described in (1) is characterized in that the flow controller is fixed in a predetermined 38 2097-8068-PF; the flow in Ahddub # Λ丨L In the measurement, the first mode and the first mode are switched according to the fixed flow rate of the fluid of the mass flow controller 10 according to the "the town", and the first mode determines the first - θ ' based on the elapsed time. The Charley time and the first 1 time measurement, and the second mode determines the first measurement time and the second measurement time based on the predetermined pressure; therefore, there is a flow rate that can pass the gas passing through the mass flow controller 10 The excellent effect of high precision correction. The flow rate of the process gas, such as the mass flow controller 1 of the flow controller of the flow controller of the μ-direction rolling body, is passed through the mass flow controller

The flow rate of 10 has a range of 2 CC to 2000 CC. In the case of correcting the absolute flow rate of the mass flow controller 1 ,, it is also necessary to set the flow rate correction in the same state as the use state. However, 'pressure and time have a proportional relationship, although the flow is low because the pressure is difficult to rise', so it takes time to see the change, but in the case of a large flow, the pressure changes in a short time. In this case, due to the responsiveness of the machine, when the pressure rises in a too short period of time, when the pressure is measured based on the elapsed time, there is a possibility that the accuracy is deteriorated... because it is close to the maximum range: Measurement, so depending on the accuracy of the response, there is also the possibility of exceeding the measurement range of the pressure sensor u. Therefore, high-precision flow rate correction can be realized by measuring the time based on the elapsed time with a small flow rate and measuring the absolute flow rate based on a predetermined flow rate. (3) A correction system for the absolute flow rate of the flow controller, correcting the gas flow path 30 having the inlet 209.7-8068-PF/Ahddub 39 1329191 connected to the outlet of the mass flow controller and the processing chamber 13 The absolute flow rate of the mass flow controller 1 流量 of the flow control unit of the shut-off valve 21 and the second shut-off valve 22 is characterized in that it has: the exhaust flow path 31' will be the first shut-off valve 21 and the second The gas flow path 30 between the shut-off valves 22 communicates with the inlet of the vacuum pump 14; the third cut

The shutoff valve 23 and the fourth shutoff valve 24 are disposed in the exhaust flow path 31; the pressure sensor 11 and the temperature sensor 12 are disposed between the third shutoff valve 23 and the fourth shutoff valve 24 The exhaust flow path 31; and the correction control device are connected to the pressure sensor 11 and the temperature sensor 12; and have a first sealed space by the first shutoff valve 21, the second shutoff valve 22, and the The third shutoff valve 23 is closed; and the second closed space is formed by closing the third shutoff valve 23 and the fourth shutoff valve 24, and is separated by the third shutoff valve 23 and the first sealed space. The volume V 2 is known; the gas is filled in the first sealed space and the second closed space, and the pressure p, the temperature T1 is measured; the first sealed space and the second sealed space are evacuated, and the vacuum is measured. Pressure P2, temperature T2; opening the third shut-off valve 23, and connecting the first closed space and the second closed space, measuring the pressure Ps and the temperature τ after the time "according to the pressure 、, temperature 、, pressure P2, temperature τ2 , the pressure Pa, the temperature η, and the volume V2' to obtain the volume Vl of the first closed space; the special measuring machine is used, and Use a measuring valve such as a measuring tank that reduces the space efficiency of the gas gathering circuit, etc., and a shut-off valve provided in the opening and closing flow path - ^ β · "ΊΒ, the field is re-measured with force and temperature, and the volume is unknown. (4) The volume change of the flow path due to the modification, etc., can also be promoted to the excellent effect of correcting the absolute flow rate of the controller of the lamp flow 1. It is necessary to correctly correct the absolute flow rate of the mass flow controller 10 2097- 8068-PF; Ahddub 40 Master the volume inside the machine and piping. This is because the flow rate of the ideal state quantity controller is 0, so the τ + 卞 ^ 向 质量 质量 质量 。 。 。 。 。 。 。 。 。 Can not be calculated, therefore, if there is such a way to determine the volume of the volume in the assembled state, ... Λ Λ x x x x , , , , , , , , x x x x x x x x x x x x x x x x x x x x x x x x x (Simplified description of the drawings) Fig. 1 is a flow chart showing the minimum structure necessary for correcting the absolute flow rate of the flow controller according to the first embodiment of the present invention. First embodiment Fig. 3 is a view showing a configuration of a gas collecting unit according to a first embodiment of the present invention. Fig. 4 is a view showing a third embodiment of the first embodiment of the present invention. A side view of the gas aggregating unit shown in Fig. 5. Fig. 5 is a table showing the values of the compression factor Z of each substance in an environment of 300 kPa and 300 Torr. Fig. 6 is a view showing the gas of the first embodiment of the present invention. The compression factor Z of the SF6 of the processing unit 100 is subjected to the influence of temperature and pressure. Fig. 7 shows the gas accumulation sheet 2097-8068-PF of the first embodiment of the present invention; Ahddub 41 • - The compression factor Z of N2 of the flowing flushing gas is affected by the temperature and pressure*.

Fig. 8 is a graph showing an example of the accuracy of the case where the absolute factor is corrected using the compression factor Z and the case where the absolute flow rate is not corrected using the compression factor Z in the first embodiment of the present invention. Fig. 9 is a graph showing the relationship between the pressure and the measurement time ' in the first embodiment of the present invention. Fig. 1 is a view showing the case where the fluid of the first embodiment of the present invention is nitrogen gas at a certain volume. The relationship between the pressure and the measurement time is tabulated. Fig. 1 is a flow chart showing the procedure of correcting the absolute flow rate of the circuit shown in Fig. 1 of the first embodiment of the present invention. Fig. 12 is a view showing the structure of Fig. 1 of the second embodiment of the present invention, showing a means for measuring the volume Vi which is unknown to the system. Fig. 13 is a view showing the structure of Fig. 1 of the second embodiment of the present invention, showing another means for measuring the volume V1 which is unknown to the system. Lu 14 shows a piping diagram of a correction system for the absolute flow rate of the mass flow controller of Patent Document 1. Fig. 15 is a schematic view showing the piping of the calibration system of the gas piping system of Patent Document 2. Fig. 16 is a view showing the gas mass flow rate measuring system of Patent Document 3. [Main component symbol description] 10 ~ mass flow controller; 11 ~ pressure sensor; 2〇97-8〇68-PF; Ahddub 42 1329191 12~ temperature sensor; 13~ processing chamber; 14~ vacuum pump; ~ pressure gauge; 16~ regulator; 20~ correction unit; 21~ first shut-off valve; 22~ second shut-off valve; 23~ third shut-off valve; 24~ fourth shut-off valve; 27~flushing valve; 28~5th shut-off valve; 3 0~ gas flow path, 31~exhaust flow path; 32~flushing line; 33~first gas supply path; 34~second gas supply path; 35~third gas supply path; dG~ inflow mass; Gl, G2~ mass; (1卩~ set pressure range; Pl, P2, P3~ pressure; Q〇~ absolute flow; T!, τ2, τ3~ temperature; V, V2, V3~ volume; Zl-first compression factor; Z2~ second compression factor; r〇~ specific gravity; dt~ elapsed time. 2097-8068-PF; Ahddub 43

Claims (1)

• X. Patent application scope: 1. A correction system for the absolute flow rate of the flow controller, correcting the first shut-off valve and the second valve having a gas flow path connected to the inlet of the flow controller and the inlet of the processing chamber The flow rate of the flow control unit of the shut-off valve. The absolute flow of the controller is characterized by: an exhaust flow path 'the gas flow path between the first shut-off valve and the second shut-off valve and a vacuum pump The third inlet valve and the fourth shut-off valve are disposed in the exhaust flow path; the pressure sensor and the temperature sensor are disposed on the third shut-off valve and the fourth shut-off valve The exhaust flow path between the exhaust gas flow path and the correction control device, the compression sensor and the temperature sensor inherent in the memory gas type, and the outlet of the flow controller, the second cut The volume value of the predetermined space formed by the valve and the fourth shut-off valve; the first pressure of the pressure sensor is read from the compression factor data of the calibration control device Value and the temperature sensor The first temperature value corresponds to the first compression factor value, and the first quality is obtained from the first pressure value, the first temperature value, the volume value, and the first compression factor value; The compression factor data reads a second compression factor value corresponding to the second pressure value of the pressure sensor and the second temperature value of the temperature sensor during the second measurement, and from the second pressure value, The second temperature value, the volume value, and the second compression factor value determine a second mass. According to the difference between the first mass and the second mass, correcting the flow control of the 2097-8068-PF/Ahddub 44 Absolute flow. 2. If applying for a patent specification correction system, where = = the flow of the absolute flow of the flow controller; - the flow controller is to make a predetermined fixed flow measurement time, according to the flow control through the flow control - The method and the fixed flow of the body determine the formula (4), and the first mode is based on the elapsed time to be both the macro and the first time, and the second mode is based on the pressure.疋 The first 1 time measurement and the second measurement time. A calibration system for a flow controller that is calibrated in an ancient π field, correcting the gas that is connected to the inlet of the flow controller and the process: the road, the first-cut valve and the second cut The absolute flow rate of the flow controller of the flow control unit of the shut-off valve is characterized by: Α exhaust flow path 'the gas flow path between the first shut-off valve and the second shut-off valve and the vacuum pump a third shut-off valve and a fourth shut-off valve are disposed in the exhaust flow path; a pressure sensor and a temperature sensor are disposed between the third shut-off valve and the fourth shut-off valve The exhaust flow path; and a correction control device connected to the pressure sensor and the temperature sensor; having: a first sealed space, the first shutoff valve, the second shutoff valve, and The third shutoff valve is closed to be formed; and the second closed space is formed by closing the third shutoff valve and the fourth shutoff valve, and the third shutoff valve is separated from the first closed space Open volume 2097'8068-PF; Ahddub 45 1329191 product v2 is known; The first sealed space and the second sealed space are measured for pressure Pi and temperature T!; the first sealed space and the second sealed space are evacuated, and the pressure p2 and the temperature τ2 after vacuuming are measured; Opening the third shut-off valve, connecting the first sealed space and the second closed space, and measuring the pressure Ρ3 and the temperature τ3 after the time; according to the pressure Ρ!, the temperature Ti, the pressure ρ2, the temperature Τ2, the pressure ρ3, the temperature τ3, and the volume ν2 determine the volume Vi of the first sealed space. 2097-8068-PF; Ahddub 46