1328675 九、發明說明： 【發明所屬之技術領域】 本發月係有關於一種具折射率及厚度修正效益之 =光學㈣監控法’尤指—種在無須改變傳統光學 架構下’即可同時具有折射率及厚度個別即時修 正之效益。1328675 IX. Description of the invention: [Technical field to which the invention pertains] The present invention relates to a refractive index and thickness correction benefit = optical (four) monitoring method, especially in the case of without changing the traditional optical architecture The benefits of individual corrections in refractive index and thickness.
【先前技術J 按’多層干涉光學鍍膜之成效絕大部分取決於對 ^料之光學特性與料掌控之精確性，目前—般所使 =之監控方式為計算時間，石英㈣片監控及光學訊 媒U之以光強度判斷之光學監控。而—般光學監控 擾之問題為，在铲5,丨八 ^ 在鍍到四分之一波長整數膜堆 jQuf wavestack)往往光學訊號之變化極不靈 破，導致切點難以分辨，扃 在非整數膜堆時切點同樣無[Previous technology J The effectiveness of multi-layer interference optical coating depends largely on the optical characteristics of the material and the accuracy of the material control. Currently, the monitoring method is the calculation time, quartz (four) film monitoring and optical information. The media U is optically monitored by light intensity. The problem of optical monitoring is that the shovel 5, 丨 ^ ^ 在 镀 镀 镀 四 四 四 四 四 四 四 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往 往往There is no tangent point in the membrane stack.
法判斷；且當多層干涉铲 & p a A 越低，誤差越w薄膜m堆r層數越多靈敏度 田潯膜折射率因製程參數或製程方 改變時，由一般之光學監控方法無法即時分辨光學 特性之差異性〇 卞刀辨尤子 習知之預期穿透率在相同之製程環境及參數下， 般穿料監控法料時監控，根制預設之停鍍 ㈤-_t)決定停鍍時機，或在穿料達到極值 寺為停鍍時機。一般光學於批 祕e , ^r- ^ 子·^•控在四分之一波長整數膜 ，即先子厚度到達極值點時，反應不靈敏，導致切 5 1328675 二:=:;亦即，即使實際與預期 形上不僅無法做出判 攸其圖 預期相同之停鍍點； 、a誤之厚度仍會出現跟 ^膜堆中。& ·: 上述問題同樣會出現於非整 使用時之所需。 用者係無法付合使用者於實際 【發明内容】 本發明之主要目的係在於 學監控架構Τ* ,即* 在…、湏改變傳統光 修正之效益卩可时具有折射率及厚度個別即時 本發明之次要目的係在 合，便可求出最佳停錢點不而使用電腦數值擬 膜層對】目的係在於’鍍膜者可任意選擇每 L而無須限^於單—波長即可製㈣更符合 之光學元件。 Τ 口原&叶 攸為達乂上之目的’本發明係一種具折射率及厚产 上正效益之精密光學鍍膜監控法，藉由二 圖形曲線中選擇一較靈敏之t松.士且 尤予m控 時，刹田^ 波長，於開始鍵膜 之穿㈣1學監控圖形曲線隨膜之厚度成長而變化 率反射率之極值點’推算出當下膜層之折射 射率佶：下膜層終點或下一層起始點之穿透率或反 丰值，推异出該當下膜層之厚度，在製作多層膜堆 6 1.328675 時，依據各膜層折射率和厚度計算前層膜堆對應於一 參考波長之等效導納值，並利用該前層膜堆對應於該 參考波長之等效導納值在切點為實數之特性，算出該 >下膜層對應之錯誤補償厚度，藉此推算對應於該監 控波長具錯誤補償厚度之切點，並以此切點為停鑛點 停鑛’使製鍵最終輸出之成品之光譜位置不偏移。 【實施方式】The judgment is made; and when the multi-layer interference shovel & pa A is lower, the error is more w. The more the m-layer r-layer is, the more the sensitivity of the field film is changed by the process parameters or the process, and the general optical monitoring method cannot be instantly distinguished. Differences in optical characteristics The expected penetration rate of the knives is determined under the same process environment and parameters. When the material is monitored and monitored, the preset stop plating (5)-_t) determines the timing of the stop plating. Or when the material reaches the extreme value of the temple for the stop plating time. Generally, the optics are in the secret e, ^r- ^子·^• is controlled in a quarter-wavelength integer film, that is, when the thickness of the precursor reaches the extreme point, the reaction is insensitive, resulting in the cutting 5 1328675 2:=:; Even if the actual and expected shape is not only impossible to make the same stoppage point as expected, the thickness of a mistake will still appear in the film stack. & ·: The above problems will also occur in the case of non-integration. The user is unable to pay the user in practice. [Inventive content] The main purpose of the present invention is to monitor the monitoring structure ,*, that is, to change the efficiency of the conventional light correction, and to have a refractive index and thickness individual instant copies. The secondary purpose of the invention is to find the best stop money and not to use the computer numerical imitation layer. The purpose is that the 'coater can choose arbitrarily every L without having to limit the single-wavelength. (d) More compatible optical components. Τ 口原 & 叶攸 is the purpose of the 乂 ' 'The present invention is a precision optical coating monitoring method with refractive index and thick yield, by selecting a more sensitive t-song from the two graphic curves Especially when the m control, the brake field ^ wavelength, at the beginning of the key film wear (four) 1 school monitor graphic curve with the thickness of the film growth and the rate of change of the extreme value of the reflectivity 'calculated the refractive index of the current film layer 佶: lower film The penetration rate or inverse value of the starting point of the layer or the starting point of the next layer, the thickness of the current film layer is deducted. When the multilayer film stack 6 1.328675 is fabricated, the front layer film stack is calculated according to the refractive index and thickness of each film layer. Calculating the equivalent admittance value of a reference wavelength, and calculating the error compensation thickness corresponding to the lower layer by using the characteristic of the equivalent admittance value corresponding to the reference wavelength of the front layer film at the tangent point, This calculation corresponds to the cutoff point of the monitoring wavelength with the error compensation thickness, and the cut point is the stoppage of the stop point, so that the spectral position of the final output of the key is not offset. [Embodiment]
清參閱『第1圖』所示，係本發明之製作流程 意圖。如圖所示：本發㈣—種具折射率及厚度修 效益之精密转制監控法，其至少包括下列步驟 示 正 工叹仅丄丄.在一来興 監控圖形曲線中選擇一較高靈 予 長； 平又同R敏度之波長為監控波 (B )推算當下膜層之折 時，利用哕#與e㈤ 手丄J .於開始鍍膜 夸m學監控圖形曲線隨 透率或反射率之極值點 化之穿 膜層之折射率； °己錄其值’並以此推算當下 “）推算當下臈層之厚 層終點或下一層起始點之穿透率：：違當下膜 該當下膜層之厚度； 射率值，以推算 (ϋ)具出等效導納值上 依據步驟（Β)及步驟f 任衣作多層膜堆時， ^(C)所算出之切層折射率 7 =度’以計算前層膜堆對應於—參考波長之等效導 节夫算出補償厚度15:以該前層膜堆對應於 ==等效導納值，結合-四分之-波堆之補 X 使該參考波長在切點之等效導納值到達實 錯誤補償::::::度:…出該當τ膜層對應具 且辑iF)推算停鑛點16:推算該監控波長對庫於 鍍點曰效益)之補償厚度之切點’並以此切點騎 (Cut-P〇1nt)停鍍；以及 層 構 益 (G^判斷是否為最末層工7 :判斷 右不為最末層則回至步驟（A)製作下一層最末 ^本發明於運料，係無須改變傳統 :可同時具有折射率及厚度個別即時修正= 極信 該光學監㈣形上所提供之資訊， 射：點=點上膜堆之光學特性，推導出各模二折 斤入=其對應之補償厚度’可幫助鍍膜者對々 :輸二之折射率做仰時之修正，進： 出最佳停㈣，2=使用電腦數值擬合，便可求 心極值不改變使其光譜位置不偏移及* 子應在預估之切點附近有較高 、層 無須限定於單-波長，便能_誤:=另_而 1328675 方面亦能以短於該參考波長之監控波長監控，仍可使 鍍出之成品光譜依然保持在正確之位置，進而使該鍍 膜者更能掌握製程狀況，以製鍍出更符合原設計之光 學元件。See "Fig. 1" for the purpose of the production process of the present invention. As shown in the figure: This issue (4) - a precision conversion monitoring method with refractive index and thickness repair efficiency, which at least includes the following steps to show the positive work sigh only. Select a higher spirit in a graphical display curve Long; the same as the wavelength of R sensitivity is the monitoring wave (B) to calculate the fold of the current film layer, using 哕 # and e (5) hand 丄 J. At the beginning of the coating film monitoring curve curve with the penetration or reflectivity The refractive index of the transmembrane layer; the value recorded by 'and the current ") is used to estimate the penetration rate of the thick layer end point of the lower layer or the starting point of the next layer:: the lower film The thickness of the layer; the value of the rate of incidence, in order to calculate (ϋ) with the equivalent admittance value according to the step (Β) and step f when the coat is used as a multilayer film stack, ^(C) calculated the refractive index of the slice 7 = The degree is calculated by calculating the equivalent thickness of the front layer film stack corresponding to the reference wavelength: the front layer film stack corresponds to the == equivalent admittance value, and the combined-quadruple-wave pile complement X makes the equivalent admittance value of the reference wavelength at the tangent point reach the real error compensation::::::degree:...the τ film layer corresponds to the set iF ) Calculate the stop point 16: Calculate the cut-off point of the compensation thickness of the monitoring wavelength for the plating point 并) and stop the plating with the cut point (Cut-P〇1nt); and the layer structure benefit (G^ judge whether The last layer of work 7: judge the right is not the last layer, then go back to step (A) to make the next layer of the last ^ the invention in the material, there is no need to change the tradition: can have both refractive index and thickness, individual corrections = very The information provided by the optical monitor (four) shape, shot: point = the optical characteristics of the film stack on the point, deducing the two molds of each mold = its corresponding compensation thickness 'can help the coatinger to 々: the refractive index of the two Do the correction of the elevation, enter: the best stop (four), 2 = use the computer numerical value fitting, you can find the maximum value of the heart does not change so that its spectral position is not offset and * should be higher near the estimated cut point, The layer is not limited to a single-wavelength, and can be monitored by monitoring wavelengths shorter than the reference wavelength, and the finished product spectrum can still be kept in the correct position, thereby enabling the layer to remain in the correct position. The coating person is better able to master the process conditions to make a more optical component that is more in line with the original design.
凊參閱F第2圖』所示，係本發明之實施示意圖。 如圖所不：本發明具折射率及厚度修正效益之精密光 學錢膜監控法於實際實施時而製鍍出之光譜圖2 2， 將其为別與依極值點方法（Turning p〇int)製鑛之極 值點光譜圖2 1、及依越極值轉折點方法（〇verShot) 製鍍之越極值轉折點光譜圖2 3比較後，可知本發明 確貫比依極值點方法製鍍出之極值點光譜圖2 1及依 越極值轉折點方法（0verSh〇t)製鍍之越極值轉折點 光譜圖2 3更佳’因係具有實數之特性。所以本發明 可以此計算出當下膜層對應具錯誤補償效益之補償厚 度’進而以此推算出停鍍點。凊 Refer to FIG. 2F for a schematic view of the implementation of the present invention. As shown in the figure: the precision optical film monitoring method with refractive index and thickness correction effect of the present invention is used to prepare the plated spectrum 2 2 in actual practice, and it is a method according to the extreme point method (Turning p〇int) ) The extreme point spectrum of the ore-making method 2 1. The method of the extreme value turning point (〇verShot) The more extreme turning point of the plating is shown in Fig. 2 3 After comparison, it can be seen that the present invention is more effective than the extreme point method. The extremum point spectrum is shown in Fig. 2 1 and the extreme value turning point method (0 verSh〇t) is used to make the plate of the extreme value turning point spectrum. 2 3 better 'because the system has the characteristics of real numbers. Therefore, the present invention can calculate the compensation thickness of the lower film layer corresponding to the error compensation benefit, and thereby calculate the stop plating point.
，纟上所述，本發明係一種具折射率及厚度修正效 盈之精密光學㈣監控法，可有效改善習用之種種缺 點，在無須改變傳統光學監控架構下，即可同時呈有 折射率及厚度個別即時修正之效益，進而使=明: 産生能更進步、更實用、更符合使用者之所須，確已 符合發明專射請之要件，差依法提出專利申請。 惟以上所述者， 當不能以此限定本發 僅為本發明之較佳實施例而已， 明實施之範圍；故，凡依本發明 9 1.328675 申請專利範圍及發明說明書内容所作之簡單的等效變 化與修飾，皆應仍屬本發明專利涵蓋之範圍内。 1328675 【圖式簡單說明】 第1圖，係本發明之製作流程示意圖。 第2圖，係本發明之實施示意圖。 【主要元件符號說明】 步驟（A )選擇一較靈敏之監控波長1 1 步驟（B )推算當下膜層之折射率1 2 步驟（C)推算當下膜層之厚度13 步驟（D)算出等效導納值14 步驟（E )算出補償厚度1 5 步驟（F )推算停鍍點1 6 步驟（G)判斷是否為最末層17 極值點光譜圖2 1 本發明之光譜圖2 2 越極值轉折點光譜圖2 3As described above, the present invention is a precision optical (four) monitoring method with refractive index and thickness correction effect, which can effectively improve various disadvantages of the conventional use, and can have a refractive index at the same time without changing the conventional optical monitoring structure. The effectiveness of individual thickness corrections in the future, so that = Ming: to produce more progressive, more practical, more in line with the needs of the user, has indeed met the requirements of the invention, the patent application. However, the above description is not intended to limit the present invention as a preferred embodiment of the present invention, and is intended to be within the scope of the present invention; therefore, the simple equivalent of the scope of the invention and the contents of the description of the invention in accordance with the invention. Changes and modifications are still within the scope of the invention. 1328675 [Simple description of the drawings] Fig. 1 is a schematic diagram of the production process of the present invention. Fig. 2 is a schematic view showing the implementation of the present invention. [Main component symbol description] Step (A) Select a more sensitive monitoring wavelength 1 1 Step (B) Calculate the refractive index of the lower film layer 1 2 Step (C) Calculate the thickness of the lower film layer 13 Step (D) Calculate the equivalent Admittance value 14 Step (E) Calculate the compensation thickness 1 5 Step (F) Calculate the stop plating point 1 6 Step (G) Determine whether it is the last layer 17 Extreme point spectrum Figure 2 1 The spectrum of the invention 2 2 The more extreme Value turning point spectrum Figure 2 3