TWI326003B - - Google Patents
Download PDFInfo
- Publication number
- TWI326003B TWI326003B TW95109931A TW95109931A TWI326003B TW I326003 B TWI326003 B TW I326003B TW 95109931 A TW95109931 A TW 95109931A TW 95109931 A TW95109931 A TW 95109931A TW I326003 B TWI326003 B TW I326003B
- Authority
- TW
- Taiwan
- Prior art keywords
- reticle
- photoresist
- pattern
- structural substrate
- light
- Prior art date
Links
- 229920002120 photoresistant polymer Polymers 0.000 claims description 68
- 239000000758 substrate Substances 0.000 claims description 34
- 238000000034 method Methods 0.000 claims description 17
- 230000008859 change Effects 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000004049 embossing Methods 0.000 claims description 2
- 239000011521 glass Substances 0.000 claims 2
- 210000003298 dental enamel Anatomy 0.000 claims 1
- 108091008695 photoreceptors Proteins 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 9
- 230000008569 process Effects 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 3
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW095109931A TW200736845A (en) | 2006-03-22 | 2006-03-22 | Mask and exposure method for producing high depth photoresist |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW095109931A TW200736845A (en) | 2006-03-22 | 2006-03-22 | Mask and exposure method for producing high depth photoresist |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200736845A TW200736845A (en) | 2007-10-01 |
| TWI326003B true TWI326003B (https=) | 2010-06-11 |
Family
ID=45074302
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW095109931A TW200736845A (en) | 2006-03-22 | 2006-03-22 | Mask and exposure method for producing high depth photoresist |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TW200736845A (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104076597B (zh) * | 2013-03-26 | 2016-03-02 | 北京京东方光电科技有限公司 | 一种紫外线掩膜板及其制备方法和封框胶的固化方法 |
-
2006
- 2006-03-22 TW TW095109931A patent/TW200736845A/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| TW200736845A (en) | 2007-10-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR20040030556A (ko) | 리소그래픽 템플레이트 | |
| DE2658400A1 (de) | Verfahren zur herstellung einer negativen maske auf einem substrat | |
| TWI355080B (https=) | ||
| CN102096314A (zh) | 制造压印模的方法和使用压印模形成图案的方法 | |
| JP2002107911A5 (https=) | ||
| EP0984327A3 (en) | Process for producing halftone mask | |
| CN107445489B (zh) | 一种含彩色油墨纹路图案的玻璃板的制备方法及玻璃板 | |
| CN105093636A (zh) | 触控显示基板及其制备方法和触控显示面板 | |
| KR20020072533A (ko) | 하부 해상도 정렬 마크 윈도우를 구비하는 사진 식각 마스크 | |
| TWI288116B (en) | Method of manufacturing a LIGA mold by backside exposure | |
| TWI326003B (https=) | ||
| EP1286219A3 (en) | Method of recording identifier and set of photomasks | |
| TW201226210A (en) | A printing system and the printing method thereof | |
| JPH031522A (ja) | レジストパターン形成法 | |
| TW201334657A (zh) | 用於平版印刷之印刷板及其製備方法 | |
| US6749969B2 (en) | Reverse tone process for masks | |
| GB2065921A (en) | Method of producing amtt-surfaced light-scattering structures and opaque and/or transparent structures | |
| TW200413838A (en) | Photo mask, method of manufacturing electronic device, and method of manufacturing photo mask | |
| TW200728905A (en) | Photomask and exposure method using same | |
| CN103941551B (zh) | 一种曝光用掩模板、曝光设备及显示用基板的制作方法 | |
| TWI250376B (en) | Method of double exposure and fabricating an attenuated phase shifting mask | |
| TWM519808U (zh) | 具彩色光阻圖案之裝置 | |
| JPS62245251A (ja) | レジストパタ−ン形成方法 | |
| US3122436A (en) | Making rotogravure cylinders or plates | |
| CN106353965B (zh) | 曲面形光罩、具彩色光阻图案的曲面装置及其制作方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |