TW200736845A - Mask and exposure method for producing high depth photoresist - Google Patents
Mask and exposure method for producing high depth photoresistInfo
- Publication number
- TW200736845A TW200736845A TW095109931A TW95109931A TW200736845A TW 200736845 A TW200736845 A TW 200736845A TW 095109931 A TW095109931 A TW 095109931A TW 95109931 A TW95109931 A TW 95109931A TW 200736845 A TW200736845 A TW 200736845A
- Authority
- TW
- Taiwan
- Prior art keywords
- mask
- photoresist
- exposure method
- high depth
- producing high
- Prior art date
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
This invention provides a mask and its exposure method, in which the mask comprises a mask main body and a protrusion section. The protrusion section is formed at one side of the mask main body. When the mask covers a structure substrate coated with a photoresist thereon, the protrusion section inscribes a photoresist patter with depth. A high depth photoresist pattern is formed after carrying out an exposure and then the residual photoresist is removed by using a chemical method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW095109931A TW200736845A (en) | 2006-03-22 | 2006-03-22 | Mask and exposure method for producing high depth photoresist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW095109931A TW200736845A (en) | 2006-03-22 | 2006-03-22 | Mask and exposure method for producing high depth photoresist |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200736845A true TW200736845A (en) | 2007-10-01 |
TWI326003B TWI326003B (en) | 2010-06-11 |
Family
ID=45074302
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095109931A TW200736845A (en) | 2006-03-22 | 2006-03-22 | Mask and exposure method for producing high depth photoresist |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW200736845A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014153889A1 (en) * | 2013-03-26 | 2014-10-02 | 北京京东方光电科技有限公司 | Ultraviolet mask plate and preparation method therefor, and curing method for sealant |
-
2006
- 2006-03-22 TW TW095109931A patent/TW200736845A/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014153889A1 (en) * | 2013-03-26 | 2014-10-02 | 北京京东方光电科技有限公司 | Ultraviolet mask plate and preparation method therefor, and curing method for sealant |
Also Published As
Publication number | Publication date |
---|---|
TWI326003B (en) | 2010-06-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |