九、發明說明： 【發明所屬之技術領域】 本發明涉及一種連續式的真空製程設備.此類設備可廣 泛應用於任何需要於真空下進行加工及/或檢測工作的製 程例如光學或電子產品的蒸鑛或錢鑛製程。 【先前技術】 大陸實用新型第03219715.2號揭示了一種連續式蒸鐘 或濺鍍機，包括真空鍍膜機，所述真空鍍膜機的兩端分別 社、封連接在若干個進件真空過渡室和出件真空過渡室，每 個進件真空過渡室和出件真空過渡室均安裝有抽真空裝 置，進件真空過渡室、真空鍍膜機和出件真空過渡室之間 貫通有工件傳動裝置，每個室與室之間均設有密封移動門 裝置。操作時，工件被送入第一真空過渡室後須等到其真 空度與後續的第二真空過渡室的真空度相等時才將工件 由第一真空過渡室送入第二真空過渡室，當第二真空過渡 室的真空度與後續的第三真空過渡室的真空度相等時，才 將工件由第二真空過渡室送入第三真空過渡室當第三真 空過渡室的真空度與真空鍍膜機的真空度相等時，才將工 件由第三真空過渡室送入真空鍍膜機進行鍍膜，才將工件 由第一真空過渡室送入第二真空過渡室整體真空鍍膜加 工。雖然此實用新型可以使真空鍍膜機始終處於真空狀 態’實現真空鍍膜機的連續工作。但是工件傳輸上仍有時 間延遲的問題，亦即工件的鍍膜加工程序仍是間歇式操 因此有進—步被提高生產效率的改良空間。 【發明内容】 本發明的—主要目的在 真空製程-· I + H間延遲的連續式 件傳輪的睹Η 、 又備進行具有的工 4延遲問題，縮短或 間延遲，因Α卜 避光工件傳輪所造成的時 ^ 因而提高生產效率。 為了達成上述發明目的一種 無時間延遲的遠W亩” ，‘、、本發明内容所完成的 —前初級真空室θ ... 真I製耘至， 的工件進^ ^室分料接該真空製程室 件進口和工件出口，·一前真 至 室分別連接兮‘、，* 又至及—後真空過渡 空過渡室'前初級真空室、真空製程匕，其中該前真 及後真空過渡室都安裳有… 後初級真空室、 間的#以裝置及安裝有-貫通其 .件傳動裝置’設置於該前真空過 役封移動門奘署•执职 幻入口的第一 ’叹置於該前真空過沪宮L兮A t ^ ^ + 丹工磯及至和該前初級真空 至之間的第一密封移動門裝 置 4二 該真空製程室之間的第=密…該…真空室和 製程至和該後初級真空室之 二 SS丄 J乐四达封移動門萸詈.π 置於該後初級真空室和該後 ，扠 ^P1.». ^^ 俊具二過渡至之間的第五密封移 勃門裝置，設置於該後真空 P气驻甚.η ^ 至的出口的第六密封移動 門裝置，及一控制裝置其用 件的、笛 控制該工件傳動裝置輸送工 牛的速度及該第一至第六密封 使撂：杜良诗τ 乂“ 多動門裝置的開啟及關閉， 吏传工件為該工件傳動裝置 、汽的輸送通過該前真空過浐 6 1321161 室、前初級真空室、真空製程室、後初級真空室、及後真 空過渡室，及使該第一至第六密封移動門裝置在工件到達 時被開啟及工件通過後被關閉’且相鄰的兩密封移動門裝 置未同時開啟。 較佳的，該真空製程室内配備有濺鍍裝置或蒸錄裝置。 較佳的，該真空製程室内配備有檢測裝置，例如掃描 式電子顯微鏡或光譜儀。 較佳的，本發明的連續式真空製程設備具有多於一個 的真空製程室，該多個真空製程室介於該前初級真空室和 後初級真空室之間且互相串聯。 較佳的，該多個真空製程室的每一室同時或單獨的配 備有濺鐘裝置、蒸鍵裝置或檢測裝置，但濺鍍裝置和蒸鑛 裝置不同時配備於一個真空製程室。 【實施方式】 遲的揭示—種使W述本發明的設備進行無時間延 遲的連續式真空加工方法，包含下列步驟： a) 啟動該前真空過沪玄么、 室、後初級真空室、及ζ直V刖初級真空室、真空製程 該真空製程室且有一適二二過渡室的抽真空裝置，使得 b) 適於進行真空加工的低壓； 工件傳動裝置連續的:送通二控制裝置’使得工件為該 使該第：：，！、後初級真空室、及後真空過渡室，及 王第六岔封移叙 11置在工件到達時被開啟及工 7 1321161 件通過後被關閉，^相鄰 砂切门裒置未同時開啟； # 工件通過該前真空過渡室所需的時間足夠該前 真空過渡室被抽真空至—想要的低厘； 足夠^ 真空該前初_室所需的時間足夠該前初級 ’至 真工至一等於該真空製程室的低壓； 該工件在通過該真空製程室時被進行真空加工；IX. INSTRUCTIONS: TECHNICAL FIELD The present invention relates to a continuous vacuum process apparatus. Such equipment can be widely applied to any process such as optical or electronic products that requires processing and/or inspection under vacuum. Steam or mine process. [Prior Art] Continental Utility Model No. 03219715.2 discloses a continuous steaming or sputtering machine, including a vacuum coating machine, the two ends of the vacuum coating machine are respectively connected to a plurality of inlet vacuum transition chambers and a vacuum transition chamber, each of the inlet vacuum transition chamber and the outlet vacuum transition chamber are equipped with a vacuuming device, and a workpiece transmission device is penetrated between the inlet vacuum transition chamber, the vacuum coating machine and the outlet vacuum transition chamber, and each chamber A sealed moving door device is provided between the chamber and the chamber. During operation, after the workpiece is sent into the first vacuum transition chamber, the workpiece is sent from the first vacuum transition chamber to the second vacuum transition chamber when the vacuum is equal to the vacuum of the subsequent second vacuum transition chamber. When the vacuum degree of the second vacuum transition chamber is equal to the vacuum degree of the subsequent third vacuum transition chamber, the workpiece is sent from the second vacuum transition chamber to the third vacuum transition chamber. The vacuum degree and vacuum coating machine of the third vacuum transition chamber When the vacuum degree is equal, the workpiece is sent from the third vacuum transition chamber to the vacuum coating machine for coating, and the workpiece is sent from the first vacuum transition chamber to the second vacuum transition chamber for overall vacuum coating processing. Although the utility model allows the vacuum coater to be in a vacuum state at all times, the continuous operation of the vacuum coater is achieved. However, there is still a problem of time delay in the transfer of the workpiece, that is, the coating process of the workpiece is still intermittent operation, so there is room for improvement in productivity. SUMMARY OF THE INVENTION The main object of the present invention is to reduce the delay of the continuous part of the transfer process between the vacuum process and the I + H, and to reduce the delay or the delay. The time caused by the workpiece transfer wheel thus increases the production efficiency. In order to achieve the above object of the invention, a time-delay-free far-acre ",", the content of the present invention is completed - the front primary vacuum chamber θ ... the true I system is smashed, the workpiece into the chamber is connected to the vacuum Process chamber inlet and workpiece outlet, · a front true to the chamber respectively connected 兮 ',, * and then - after the vacuum transition air transition chamber 'front primary vacuum chamber, vacuum process 匕, where the front and rear vacuum transition chamber Duan's skirt has... After the primary vacuum chamber, between the device and the installation - through it. The transmission device is set in the front of the vacuum evacuation seal to move the door to the door. The front vacuum passes through the Shanghai Palace L兮A t ^ ^ + Dangongji and the first sealed moving door device between the front and the first primary vacuum to the second sealing door between the vacuum processing chambers... the vacuum chamber and The process to and after the primary vacuum chamber of the two SS丄J Le Si Dafeng moving threshold 萸詈. π placed in the rear primary vacuum chamber and after the fork ^ P1.». ^^ Jun two transition between a fifth sealed shifting door device, disposed at the sixth seal of the outlet of the vacuum P gas at a position of .η ^ a moving door device, and a control device for controlling the speed of the workpiece transmission to transport the work cattle and the first to sixth seals for the workpiece transmission device: Du Liangshi τ 乂 "Dosing and closing of the multi-door device" The rumored workpiece is the workpiece transmission device, the vapor is transported through the front vacuum 浐 6 1321161 chamber, the front primary vacuum chamber, the vacuum processing chamber, the rear primary vacuum chamber, and the rear vacuum transition chamber, and the first to sixth The sealed moving door device is opened when the workpiece arrives and is closed after the workpiece passes, and the adjacent two sealed moving door devices are not simultaneously opened. Preferably, the vacuum processing chamber is equipped with a sputtering device or a steaming device. Preferably, the vacuum processing chamber is equipped with a detecting device such as a scanning electron microscope or a spectrometer. Preferably, the continuous vacuum process apparatus of the present invention has more than one vacuum process chamber interposed between the front primary vacuum chamber and the rear primary vacuum chamber and connected in series. Preferably, each of the plurality of vacuum processing chambers is provided with a splashing device, a steaming device or a detecting device simultaneously or separately, but the sputtering device and the steaming device are not simultaneously provided in a vacuum processing chamber. [Embodiment] Late disclosure - a continuous vacuum processing method for making the device of the present invention without time delay, comprising the following steps: a) starting the pre-vacuum through the Xuanjing, the chamber, the post-primary vacuum chamber, and ζV V 刖 primary vacuum chamber, vacuum process The vacuum process chamber and a vacuum chamber suitable for the two-two transition chamber, so that b) is suitable for vacuum processing low pressure; workpiece transmission continuous: feed two control device makes The artifact for that makes the first::,! , the post-primary vacuum chamber, and the post-vacuum transition chamber, and the king's sixth seal and retraction 11 are opened when the workpiece arrives and the workpiece is closed after the passage of 7 1321161 pieces, and the adjacent sand cut gates are not simultaneously opened; # The time required for the workpiece to pass through the front vacuum transition chamber is sufficient for the front vacuum transition chamber to be evacuated to the desired low PCT; sufficient ^ vacuum to allow the previous primary chamber to be sufficient for the previous primary 'to the real work to One is equal to the low pressure of the vacuum processing chamber; the workpiece is vacuum processed while passing through the vacuum processing chamber;
=工件通過該後初級真空室所f的時^夠該後初級 真工至被抽真空至-等於該真空製程室的低壓；及 、、該工件通過該後真空過渡室所需的時間足夠該後真空 過渡至被抽真空至一想要的低壓。 較佳的’該真空製程室具有10-1至10_、Γ的壓力。 較佳的，該前初級真空室及後初級真空室的壓力變化 介於常壓至真空製程室的壓力。 …較佳的，該前真空過渡室的壓力變化介於一大氣壓至 別初級真工至的壓力’及該後真空過渡室的壓力變化介於 一大氣壓至後初級真空室的壓力。 較佳的，於本發明方法中在該真空製程室内對工件進 行濺鍍或蒸鍍。更佳的’在該真空製程室内在進行濺鍍或 蒸鍍之前對工件先進行用於除去工件上雜氣的前處理，該 前處理包含紅外線前處理、電漿前處理或離子束前處理。 ^較佳的，於本發明方法中在該工件離開該真空製程室 前對工件進行檢測。更佳的，該檢測包含使用掃描式電子 顯微鏡或光譜儀對工件進行檢測。 較佳的，使用於本發明方法的設備具有多於一個的真 8 1321161 空製程室，該多個真空製 — 具展程至介於該前初級真空室和後初 空至之間且互相串聯，其中該方法包含在工件依序通 f該夕個真空製程室時被依序進行真空加工。更佳的，該 ^個真空製程室的每一個同時或單獨的配備有濺鍍裝置、 条鐘裝置、或俞虑拉罢 裝置’但減鍍裝置和蒸鍍裝置不同時 配備於一個真空_招它，# 至"、中該方法包含在工件依序通過 該多個真空製程室時被依库 _ 依序進仃濺鍍裝置、蒸鍍裝置、或 前處理。較佳的，該多個真 丹 取紅至的至少一個進一步配 備有檢測裝置’其中該方法包 ^ 3在工件依序通過該多個真 空製程室時被進行至少一次檢測。 本發明的一較佳實施例俜斜 1 J係針對大陸實用新型第 219715.2號的連續式蒸鍍濺鐘撼所彳士认 、规艰鍍機所作的改良。此大陸實 用新型第03219715.2號所揭示的内容 說明書。 ^參考以被併入本 如圖！所示’-種依本發明的—較佳實施例 無時間延遲的連續式真空製程設備包. Γ . ^ ^ ^ ^ 真空製程室 C，一刖初級真空室β及一後初級真办 许二至Β’分別連接 空製程室的工件進口2和工件出口3.° ， 刖真空過渡室a 及一後真空過渡室A，分別連接該前初級直办^ 丹工至B及後初級 真空室B，’其中該前真空過渡室A、前初級真空室b、直 空製程室C、後初級真空室B1、及後真空至 真 ' <硬室A'都安奘 有一抽真空裝置及安裝有一貫通其間的 " 件傳動裝置7 ; 設置於該前真空過渡室A的入口的第—六 达封移動門萝罟 G1;設置於該前真空過渡室A和該前初級直办 51 、具-室B之間的 9 ^密封移動門裝置G2;設置於該前初級真空室8㈣真 二製程室c之間的第三密封移 製程室c和該後初級真空室B，之間置於該真空 η . ]的第四岔封移動門梦署 :4,設置於該後初級真空”和該後真空過渡 ： 第五密封移動門裝置G5;設置於 曰的 的第六密封移動門裝置G6;及—控的出口 # # ^ ^ ^ 7 ^ 徑制裝置其用於控制該工 傳動裝置7輪送工件的速度 驻至第六密封移動門 _置的開啟及關閉’使得工件為該工件傳動裝置7連 通過該前真空過渡室Α、前初級真空室Β、真：製r 至C、後初級真空室b，、月饴古 ’工t私 至㈣… 過渡室A，，及使該第- 被關I 4時被開啟及卫件通過後 圖2、圖3、圓4、目5及圖 的連續式真空鍍^借^ #丁為適用於本發明 具工鍍膜。又備，包括位於該真空製程室C， 配備有一真空鑛膜機^真空製程室c的工件進口2: 件出口3上分別密封連桩.义 和工 J在釘連接在則真空過渡室A及 室B，和後初級真空室 、、真工 丹工至B、及後真空過渡室a丨， 室均安裝有抽真空裝置6 „„ 八中每一 imu你 貫通每一室的工件傳動装置 74置於該刖真空過渡室A的入口的第一密 置 G1;設置於該前真空過 ]裝置 第二密封移動門裝置G2_却署於# B之間的 空製程室C之間的第三密封 至Β和該真 在釘移勤門裝置G3;設詈 製程室C和該後初級真空室B.之間的第四密封移^空 G4;設置於該後初級 ：第在封移動門裝置 至B和该後真空過渡室A,之間的 10 第 ^ ^ 、移動門裝置G5;設置於該後真空過渡室A,的出口 、、第密封移動門裝置G6。所述工件傳動裝置7包括設置 於底部的聯動導輥9和設置於頂部的導轨1〇。每—室均設 有獨立的聯動導輥驅動電機Π。所述密封移動門裴置G1 都包括與該室側向連通的密封盒12，密封人 # 有移動門"，移動…下沒有導向裝置14、，：動2:;; 外側沒有伸縮氣缸15，每一室内設有與移動門 ^ 封的密封框16。 平面岔 舉例說明本發明的無時 择作如、具空製程設備 杈作如下，其中假設工件通過每個密封移動門裝置（第— 至第六）的傳動耗時少於4秒；前真空過渡〜 &、— 真空室Β、後初級真空室Β,、及後真空過产:Α月"刀級 間為5秒；及真空製程室C的通過時…’的通過時 速被輸送)。 ”為秒(工件以等 第0秒第一批工件位於Gi前； 第4秒第一批工件位於〇 1後； 第9秒第一批工件位於G2前； 第1 3秒第一批工件位於g2後 第1 8秒第一批工件位於G3前 第22秒第一批工件位於G3後 第27秒第一批工件位於G4前 第3 1秒第一批工件位於g4後 第36秒第一批工件位於G5前， 第40秒第一批工件位於G5後； 11 G6前； G6後。 第45秒第一批工件位於 第49秒第—批工件位於 母批工件之間的問 秒即隔為13秒，亦即將上述秒數加13 心即為第二批工侔的/ 通過G2且^ 第13秒時第-批工件剛 ^吉 閉後’輪到01被開啟讓第二批工件進入 該刖真空過渡室A。1 7M , ^ . 列出密封移動門裝置開啟又關閉 的時點及工件的j立署主 置表1中的"開又關”代表開啟接著又 關閉’括弧内的數字代表工件的批號。 表1 密封移動門裝置（室） 時間（秒） G1(A) G2(B) G3(C) G4 (B') G5 (A·) G6 0~4 開又關（1) 關 關 關 關 關 4 關 關 關 關 關 關 9〜13 關 開又關（1) 關 關 關 關 13-17 開又關(2) 關 關 關 L 關 關 18-12 關 關 開又關(1) 關 關 關 22-26 關 開又關(2) 關 關 關 關 26-30 開又關(3) 關 關 關 關 關 31-35 關 關 開又關(2) 關 關 關 35-39 關 開又關(3) 關 關 關 關 39-43 開又關(4) 關 關 關 關 關 17-21 關 關 關 開又關(1) 關 關 12 1321161 43-47 26~30 65 〜69 關 關 、關 關 關 開又關(1) 關 、關 ------- 關 關 關 ^~~~-- 關 關 開又關（1) 韦£tj則一個密封蒋 閉後，後—個密封移動門裝門裝置被開啟又關 一室同時與前二室聯通。工件經工:又:閉，以避免後 傳遞至該前真空過渡室A中。待G1 裝置7由大氣下 A配備的抽真空裝置6啟動開始抽氣密：移動門裝置關閉， 封移動門裝置前’隨即打開G2 :傳動至仍密 至初級真空室B，中間不會因為要配人=置將工件傳送 度而造成的時㈣遲 ° 相要求的真空 足的部分，將會由八與8 具二程度不 ό 9 订真空平衡動作來彌補。 ，、封移動門裂置關閉的同時，…配備的抽真空事 1始不間斷的抽氣，直至下-次⑴密封移動門農置開啟 則，才將A的抽真空裝置關閉。同樣的原理應用…Αι， 如此即為-個無時間延遲的連續式真空製程設備。 圖1中前後兩個真空過渡室(AW)，作為—個真空 過渡區域並與後方及前方的初級真空室（B及Βι)連结，'如 13 此可以大幅減少因為真空傳動時，真空抽氣所造成的時間 延誤，建立一個沒有時間延遲、真正的連續式真空製程設 備。此種設備可廣泛應用於需要於真空下進行加工製程， 可達成無時間延遲的連續生產，大幅增加單位產能。 貫施例 本貫施例的目的在證實本發明方法及設備可達成連續 % 性操作。本實施例使用類似前述如圖1至ό所示的本發明 的連續式真空製程設備。該前真空過渡室Α、前初級真空 Β真空製程室C、後初級真空室Β1、及後真空過渡室 Α的起始壓力都為760 torr。實驗時G1 一被關閉G2隨即 破開啟，同時開始抽真空裝置6開始對真空過渡室a、前 初級真空室B、真空製程室C、後初級真空室B，、及後真 二過渡至A抽真空。當工件通過〇2後，G2隨即被關閉。 龟工件到達G3前’ G3被開啟。當工作通過〇3後，〇3隨 即被關閉。當工件到達G4前，G4被開啟。當工作通過G4 後，G4隨即被關閉。G4 —被關閉G5隨即被開啟。當工作 通過G5後，G5隨即被關閉。當工件到達（J6前，G6被開 啟。由於G2及G5被開啟的時點係設定在最早，因此對前 初級真空室B及後初級真空室B，的真空度的達成，尤其是 實驗一開始由760 torr開始抽真空，具最大的挑戰。 本實施例的前真空過渡室A、前初級真空室b、真空 製程室C、後初級真空室B，、及後真空過渡室A，的體積為： A=b = Bi=A'=220 L，C = 10〇〇 L。抽氣速率為 A = B=B，=a，= 14 1321161 1200m1/hr »真空製程室C的溫度為60°C度，其内部的加 工裝置有離子鎗（Ion Beam)及電漿前處理設備。工作的傳送 • · 係使用4 cm直徑的輪轴，以50 rpm的速度傳送125 cm長 .. 的台車。 圖7顯示前初級真空室B在實驗一開始的壓力變化， 從其中可以看出該前初級真空室B可於30秒内由760 torr 減壓到7.8 X 10·2 ton· ’符合開啟G3所需的壓力要求。如 果將G2被開啟的時點設定在晚一點，例如在工件快到達 G2時才被開啟，上述由760 torr減壓到7.8 X 1 〇-2 t〇rr的時 間可由30秒再縮短。第二次G2被開啟時，因為該前初級 真空室B的壓力已經不是一開始的760 t〇rr ’因此在3〇秒 内將可由7.8 X 1〇_2 torr降至更低。 • 真空製程室C製程參數： 1.不進行電漿前處理： 滅鑛製程：工作壓力：3*1〇-3 t〇rr 工作氣體：Ar 在聚碳酸（簡稱PC)及丙烯腈-丁二稀笨乙 稀共聚物（簡稱ABS)基材上濺鍍Cu+SuS， 總厚度約為〇 · 3微米。 15 1 前處理：RF電聚處理3〇秒 工作壓力：1.6* 1(T2 torr 工作氣體Ar + 〇2 2 ·有電漿處理： 1321161 濺鍍製程：工作壓力：3*l〇_3torr 工作氣體：Ar 在PC及ABS基材上錢鍵Cu + SuS，總厚度 '* 約為0.3微米。 不進行電漿前處理及進行電漿前處理的實驗分別被行 兩次’每一次實驗的15個濺鍍基材其表面電阻值被示於圖 8。從圖8可以看出所有次實驗的15個濺鍍基材其表面電 _ 阻值均約低於5歐姆，其中經過RF電漿處理者均約低於 3 · 8歐姆。 【圖式簡單說明】 圖1顯示一種依本發明的一較佳實施例所完成的無時 間延遲的連續式真空製程設備的俯視示意圖。 圖2顯示圖1中的無時間延遲的連續式真空製程設備 的俯視圖。 • 圖3顯示圖2的連續式真空製程設備的側視圖。 圖4為沿圖3中A-A線的剖視圖。 圖5為沿圖3中Β·Β線的剖視圖。 圖6為沿圖4中C-C線的剖視圖。 圖7顯示於本發明的一實施例中前初級真空室Β在實 驗一開始的壓力變化。 圖8 _示於本發明的一實施例中15個濺鍍基材的表面 電阻值，甘Α丄 .. 〜中方形點及菱形點代表不進行電漿前處理的兩 次實驗的結果 — '^呆而二角形點及X點代表進行電漿前處理的 16 1321161 兩次實驗的結果。 【主要元件符號說明】 G1-G6·.密封移動門裝置；2..工件進口； 3..工件出口； A..前真空過渡室；B..前初級真空室；C..真空製程室； A’.·後真空過渡室；B’..後初級真空室；6..真空裝置； 7.. 工件傳動裝置；9..聯動導輥；10..導軌； 11.. 聯動導輥驅動電機；12..密封盒；13..移動門；= the time when the workpiece passes through the post-primary vacuum chamber f is sufficient to be evacuated to - equal to the low pressure of the vacuum processing chamber; and, the time required for the workpiece to pass through the post-vacuum transition chamber is sufficient The post vacuum transitions to being evacuated to a desired low pressure. Preferably, the vacuum process chamber has a pressure of 10-1 to 10 mm. Preferably, the pressures of the front primary vacuum chamber and the rear primary vacuum chamber vary from atmospheric pressure to vacuum processing chamber pressure. Preferably, the pressure in the front vacuum transition chamber varies from atmospheric pressure to the pressure at which the primary vacuum is applied, and the pressure change in the vacuum transition chamber is between one atmosphere and the pressure in the primary vacuum chamber. Preferably, the workpiece is sputtered or vapor deposited in the vacuum process chamber in the method of the present invention. More preferably, the workpiece is first subjected to pretreatment for removing impurities on the workpiece prior to sputtering or vapor deposition in the vacuum processing chamber, and the pretreatment includes infrared pretreatment, plasma pretreatment or ion beam pretreatment. Preferably, in the method of the invention, the workpiece is inspected prior to exiting the vacuum processing chamber. More preferably, the test involves the inspection of the workpiece using a scanning electron microscope or spectrometer. Preferably, the apparatus for use in the method of the present invention has more than one true 8 1321161 empty process chamber, the plurality of vacuum systems being spread between the front primary vacuum chamber and the rear primary space to and in series with each other, wherein The method includes sequentially performing vacuum processing when the workpieces are sequentially passed through the vacuum processing chamber. More preferably, each of the vacuum processing chambers is equipped with a sputtering device, a bell device, or a vacuum device, respectively, but the plating device and the vapor deposition device are not equipped with a vacuum at the same time. It, #至", the method is included when the workpiece sequentially passes through the plurality of vacuum process chambers, and is sequentially subjected to a sputtering device, an evaporation device, or a pretreatment. Preferably, at least one of the plurality of true reds is further provided with a detecting device' wherein the method package is subjected to at least one detection when the workpiece sequentially passes through the plurality of vacuum processing chambers. A preferred embodiment of the present invention is a skewed 1 J system which is an improvement of the continuous vapor deposition oscillating clock of the Continental Utility Model No. 219715.2. This mainland uses the contents of the new manual No. 03219715.2. ^ Reference to be incorporated into this picture! Illustrated in the present invention - a preferred embodiment of a continuous vacuum process equipment package without time delay. Γ . ^ ^ ^ ^ Vacuum process chamber C, a primary vacuum chamber β and a post-primary To the workpiece inlet 2 and the workpiece outlet 3.°, the 刖 vacuum transition chamber a and the rear vacuum transition chamber A respectively connected to the empty process chamber, respectively connected to the front primary unit directly to the B and the rear primary vacuum chamber B , wherein the front vacuum transition chamber A, the front primary vacuum chamber b, the straight air processing chamber C, the rear primary vacuum chamber B1, and the rear vacuum to the true 'hard chamber A' are all equipped with a vacuuming device and a mounting device a "piece transmission device 7 therethrough; a sixth-six-seal movement door Rosin G1 disposed at the entrance of the front vacuum transition chamber A; disposed in the front vacuum transition chamber A and the front-stage primary unit 51, with - a 9^ seal moving door device G2 between the chambers B; a third sealing shifting chamber c disposed between the front primary vacuum chamber 8 (four) and the second primary processing chamber c, and the rear primary vacuum chamber B, placed between the vacuum η . ] The fourth seal of the mobile door dream: 4, set in the post-primary vacuum" and the post-vacuum transition : a fifth sealed moving door device G5; a sixth sealed moving door device G6 disposed at the weir; and a controlled outlet # # ^ ^ ^ 7 ^ a sizing device for controlling the working transmission device 7 to carry the workpiece The speed is set to the sixth sealing movement door _ opening and closing 'the workpiece is the workpiece transmission device 7 through the front vacuum transition chamber Α, the front primary vacuum chamber Β, true: r to C, the rear primary vacuum chamber b , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , Vacuum plating ^ ^ is suitable for the coating of the present invention. Also included, including the vacuum processing chamber C, equipped with a vacuum film machine ^ vacuum process chamber c of the workpiece inlet 2: the outlet 3 is sealed separately The pile and the Yihe J are connected in the vacuum transition chamber A and the chamber B, and the rear primary vacuum chamber, the real work to the B, and the rear vacuum transition chamber a, and the chamber is equipped with a vacuum device 6 „ „ Each of the eight Iu you pass through the workpiece transmission 74 of each chamber is placed in the first dense entrance of the 刖 vacuum transition chamber A Set G1; set in the front vacuum device] the second sealed moving door device G2_ is between the #B between the empty process chamber C between the third seal to the Β and the true nail transfer door device G3; a fourth seal movement G4 between the process chamber C and the rear primary vacuum chamber B. is disposed in the post-primary: between 10 and 10 of the moving door device B and the rear vacuum transition chamber A a ^^, a moving door device G5; an outlet provided in the rear vacuum transition chamber A, and a first sealing moving door device G6. The workpiece transmission device 7 includes a linkage guide roller 9 disposed at the bottom and a guide disposed at the top Track 1〇. Each chamber is equipped with an independent linkage guide roller drive motor Π. The sealed moving door sill G1 includes a sealed box 12 that is laterally connected to the chamber, a sealing person # has a moving door, a moving device has no guiding device 14, and a moving 2:; Each chamber is provided with a sealing frame 16 for moving the door. The plan 岔 exemplifies the timeless alternative of the present invention, such as an empty process device, in which it is assumed that the movement of the workpiece through each of the sealed moving door devices (the first to sixth) takes less than 4 seconds; the front vacuum transition ~ &, - vacuum chamber Β, post-primary vacuum chamber Β, and post-vacuum overproduction: Α月" Between the knife stages is 5 seconds; and when the vacuum process chamber C passes... 'the speed is transmitted by the speed. "for seconds (the workpiece is equal to 0 seconds before the first batch of workpieces are in front of Gi; the first batch of workpieces is located after 〇1 in the 4th second; the first batch of workpieces is located before G2 in the 9th second; the first batch of workpieces is located in the 13th second After g2, the first batch of workpieces is located in the 22nd second before G3. The first batch of workpieces is located in the 27th second after G3. The first batch of workpieces is located in the 31st second before G4. The first batch of workpieces is in the 36th second after g4. The workpiece is located in front of G5. The first batch of workpieces is located behind G5 in the 40th second; before 11 G6; after G6. The first batch of workpieces in the 45th second is in the 49th second. The first batch of workpieces is located between the master batches. 13 seconds, that is, the above number of seconds plus 13 hearts is the second batch of work / through G2 and ^ the 13th second when the first batch of workpieces just after the closing of the 'turned 01' is turned on to let the second batch of workpieces into the刖Vacuum transition chamber A. 1 7M , ^ . Lists the time when the sealed moving door device is opened and closed and the workpiece of the workpiece. The "open and close" in the table 1 represents the opening and then closing the number in the brackets. The batch number representing the workpiece. Table 1 Sealed moving door device (room) Time (seconds) G1(A) G2(B) G3(C) G4 (B') G5 (A·) G6 0~4 On and off (1) turn off Close off and close off 4 Closed off Closed off 9~13 Off and off (1) Closed off 13-17 On and off (2) Off Off L Off Off 18-12 Off Off On Off (1) )Off off 22-26 off and off (2) off off off 26-30 on and off (3) off off off off 31-35 off off on off (2) off off off 35-39 off On and off (3) Off and off off 39-43 On and off (4) Off off and off off 17-21 Off off off and off (1) Off 12 1321161 43-47 26~30 65 ~69 Off Off, close off and off (1) off, off ------- off off ^~~~-- off off and off (1) Wei £tj is a seal after closing, after - The sealed moving door door device is opened and closed, and is connected to the first two chambers at the same time. The workpiece is processed: again: closed to avoid the transfer to the front vacuum transition chamber A. The G1 device 7 is equipped with the atmosphere A The vacuuming device 6 starts to start pumping airtightness: the moving door device is closed, and the G2 is opened immediately before the moving door device is sealed: the transmission is still tight to the primary vacuum chamber B, and the workpiece is not conveyed due to the matching of the workpiece. When it is caused (four) The part of the vacuum foot that is sought will be compensated by the eight and eight degrees of vacuum balancing action. When the moving door is closed and closed, the vacuum pumping is equipped with uninterrupted pumping. The vacuuming device of A is closed until the next-time (1) sealed moving door is opened. The same principle applies... Αι, so that is a continuous vacuum process equipment without time delay. In Figure 1, the front and rear two vacuum transition chambers (AW) act as a vacuum transition zone and are connected to the rear and front primary vacuum chambers (B and Βι), such as 13 can greatly reduce the vacuum pumping The time delay caused by gas creates a true continuous vacuum process equipment without time delay. This type of equipment can be widely used in processes that require vacuum processing to achieve continuous production without time delay and significantly increase unit capacity. The purpose of this example is to demonstrate that the methods and apparatus of the present invention achieve continuous % operation. This embodiment uses a continuous vacuum process apparatus similar to the one shown in the foregoing Figures 1 to 。. The initial pressures of the front vacuum transition chamber Α, the front primary vacuum Β vacuum process chamber C, the rear primary vacuum chamber Β 1, and the rear vacuum transition chamber 都 are all 760 torr. At the time of the test, G1 is turned off and G2 is immediately broken, and at the same time, the vacuuming device 6 starts to start the vacuum transition chamber a, the front primary vacuum chamber B, the vacuum processing chamber C, the rear primary vacuum chamber B, and the post-transition to A pumping. vacuum. When the workpiece passes 〇2, G2 is turned off. Before the turtle workpiece reaches G3, G3 is turned on. When the work passes 〇3, 〇3 is immediately closed. G4 is turned on before the workpiece reaches G4. When working through G4, G4 is shut down. G4 — G5 is turned off and then turned on. When working through G5, G5 is shut down. When the workpiece arrives (G6 is turned on before J6. Since the time points when G2 and G5 are turned on are set at the earliest, the vacuum degree of the front primary vacuum chamber B and the rear primary vacuum chamber B is achieved, especially at the beginning of the experiment. The 760 torr starts to vacuum, which has the greatest challenge. The volume of the front vacuum transition chamber A, the front primary vacuum chamber b, the vacuum processing chamber C, the rear primary vacuum chamber B, and the rear vacuum transition chamber A of this embodiment are: A=b = Bi=A'=220 L, C = 10〇〇L. The pumping rate is A = B=B,=a,= 14 1321161 1200m1/hr »The temperature of vacuum process chamber C is 60°C The internal processing equipment includes an ion gun (Ion Beam) and a plasma pretreatment device. The transfer of the work • The use of a 4 cm diameter axle to transport a 125 cm long trolley at 50 rpm. The pressure change of the front primary vacuum chamber B at the beginning of the experiment is shown, from which it can be seen that the front primary vacuum chamber B can be decompressed from 760 torr to 7.8 X 10·2 ton in 30 seconds. Pressure requirement. If the time when G2 is turned on is set later, for example, when the workpiece reaches G2, it is turned on. The above time from 760 torr decompression to 7.8 X 1 〇-2 t〇rr can be shortened by 30 seconds. When the second G2 is turned on, because the pressure of the front primary vacuum chamber B is not the first 760 t〇 Rr 'thus will be reduced from 7.8 X 1〇_2 torr to less in 3 sec. • Vacuum process chamber C process parameters: 1. No plasma pretreatment: Excavation process: Working pressure: 3*1〇 -3 t〇rr Working gas: Ar Sputtered Cu+SuS on a polycarbonate (abbreviated as PC) and acrylonitrile-butadiene ethylene (ABS) substrate with a total thickness of about 〇·3 μm. 15 1 Pre-treatment: RF electropolymerization 3 sec. Working pressure: 1.6* 1 (T2 torr working gas Ar + 〇 2 2 · Plasma treatment: 1321161 Sputtering process: Working pressure: 3*l〇_3torr Working gas :Ar On the PC and ABS substrate, the carbon bond Cu + SuS, the total thickness '* is about 0.3 μm. The experiment without plasma pretreatment and plasma pretreatment is performed twice respectively. 15 of each experiment. The surface resistance of the sputtered substrate is shown in Fig. 8. It can be seen from Fig. 8 that the surface spattering values of the 15 sputtered substrates of all the experiments were lower than about 5 ohms, wherein the RF plasma treatment is less than about 3.8 ohms. [Schematic Description] FIG. 1 shows a continuous vacuum process apparatus without time delay according to a preferred embodiment of the present invention. A top plan view of Figure 2. Figure 2 shows a top view of the timeless continuous vacuum process apparatus of Figure 1. • Figure 3 shows a side view of the continuous vacuum process apparatus of Figure 2. Figure 4 is a cross-sectional view taken along line A-A of Figure 3 . Figure 5 is a cross-sectional view taken along line Β·Β in Figure 3 . Figure 6 is a cross-sectional view taken along line C-C of Figure 4 . Figure 7 shows the pressure change of the front primary vacuum chamber Β at the beginning of the experiment in an embodiment of the invention. Figure 8 - shows the surface resistance values of 15 sputtered substrates in an embodiment of the present invention, Ganzi.. ~ Medium square dots and diamond dots represent the results of two experiments without plasma pretreatment - ' ^ The dull point and the X point represent the results of two experiments of 16 1321161 for plasma pretreatment. [Main component symbol description] G1-G6·. Sealed moving door device; 2.. workpiece inlet; 3. workpiece exit; A.. front vacuum transition chamber; B.. front primary vacuum chamber; C.. vacuum process chamber A'.·After the vacuum transition chamber; B'..After the primary vacuum chamber; 6.. Vacuum device; 7.. Workpiece transmission; 9.. Linkage guide roller; 10.. Guide rail; 11.. Linkage guide roller Drive motor; 12.. sealed box; 13.. moving door;
14.. 導向裝置；15·.伸縮氣缸；16··密封框14. Guide device; 15·. Telescopic cylinder; 16·· Sealing frame
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