TWI320348B - Combination method for multiple etching areas and article irradiated by processing machine - Google Patents
Combination method for multiple etching areas and article irradiated by processing machineInfo
- Publication number
- TWI320348B TWI320348B TW096117669A TW96117669A TWI320348B TW I320348 B TWI320348 B TW I320348B TW 096117669 A TW096117669 A TW 096117669A TW 96117669 A TW96117669 A TW 96117669A TW I320348 B TWI320348 B TW I320348B
- Authority
- TW
- Taiwan
- Prior art keywords
- processing machine
- combination method
- multiple etching
- etching areas
- article irradiated
- Prior art date
Links
- 238000005530 etching Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133524—Light-guides, e.g. fibre-optic bundles, louvered or jalousie light-guides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
- H01L21/02005—Preparing bulk and homogeneous wafers
- H01L21/0203—Making porous regions on the surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Laser Beam Processing (AREA)
- Liquid Crystal (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW096117669A TWI320348B (en) | 2007-05-17 | 2007-05-17 | Combination method for multiple etching areas and article irradiated by processing machine |
JP2007290574A JP2008284605A (ja) | 2007-05-17 | 2007-11-08 | 多重加工区域の組合方法 |
KR1020070128247A KR100904725B1 (ko) | 2007-05-17 | 2007-12-11 | 다중가공구역의 조합방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW096117669A TWI320348B (en) | 2007-05-17 | 2007-05-17 | Combination method for multiple etching areas and article irradiated by processing machine |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200846120A TW200846120A (en) | 2008-12-01 |
TWI320348B true TWI320348B (en) | 2010-02-11 |
Family
ID=40144823
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096117669A TWI320348B (en) | 2007-05-17 | 2007-05-17 | Combination method for multiple etching areas and article irradiated by processing machine |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2008284605A (zh) |
KR (1) | KR100904725B1 (zh) |
TW (1) | TWI320348B (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5221734B2 (ja) * | 2011-10-21 | 2013-06-26 | 株式会社片岡製作所 | 加工機 |
WO2015069032A1 (ko) * | 2013-11-08 | 2015-05-14 | 김인석 | 불연속 분할 가공 방식의 도광판 패턴 형성 방법 |
TWI666081B (zh) * | 2017-12-15 | 2019-07-21 | 新代科技股份有限公司 | 雷射打標分區接合裝置及其方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2636984B2 (ja) * | 1991-07-09 | 1997-08-06 | 大日本スクリーン製造株式会社 | 画像接続方法および装置 |
JP2001088346A (ja) | 1999-09-21 | 2001-04-03 | Fuji Photo Film Co Ltd | 露光記録方法 |
JP2003053560A (ja) | 2001-08-09 | 2003-02-26 | Ngk Spark Plug Co Ltd | レーザ加工方法及びプリント配線基板の製造方法 |
JP2004148600A (ja) * | 2002-10-29 | 2004-05-27 | Kyocera Mita Corp | レーザ露光システム及びそれを備えた画像形成装置 |
JP2004152720A (ja) * | 2002-11-01 | 2004-05-27 | Optoquest Co Ltd | 面状光源 |
US7271822B2 (en) * | 2004-07-28 | 2007-09-18 | Hewlett-Packard Development Company, L.P. | Seamless stitching of multiple image fields in a wide-format laser printer |
JP4653503B2 (ja) * | 2005-01-24 | 2011-03-16 | 株式会社リコー | 光走査装置及び画像形成装置等 |
-
2007
- 2007-05-17 TW TW096117669A patent/TWI320348B/zh not_active IP Right Cessation
- 2007-11-08 JP JP2007290574A patent/JP2008284605A/ja active Pending
- 2007-12-11 KR KR1020070128247A patent/KR100904725B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TW200846120A (en) | 2008-12-01 |
JP2008284605A (ja) | 2008-11-27 |
KR20080101637A (ko) | 2008-11-21 |
KR100904725B1 (ko) | 2009-06-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |