TWI316559B - - Google Patents

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Publication number
TWI316559B
TWI316559B TW95123599A TW95123599A TWI316559B TW I316559 B TWI316559 B TW I316559B TW 95123599 A TW95123599 A TW 95123599A TW 95123599 A TW95123599 A TW 95123599A TW I316559 B TWI316559 B TW I316559B
Authority
TW
Taiwan
Prior art keywords
cavity
disposed
periphery
disk
carrying unit
Prior art date
Application number
TW95123599A
Other languages
English (en)
Chinese (zh)
Other versions
TW200801213A (en
Inventor
Mao Hsiung Chang
Jenn Tzong Chen
Ting Shien Duh
Original Assignee
Atomic Energy Council
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atomic Energy Council filed Critical Atomic Energy Council
Priority to TW95123599A priority Critical patent/TW200801213A/zh
Publication of TW200801213A publication Critical patent/TW200801213A/zh
Application granted granted Critical
Publication of TWI316559B publication Critical patent/TWI316559B/zh

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  • Physical Vapour Deposition (AREA)
  • Particle Accelerators (AREA)
TW95123599A 2006-06-29 2006-06-29 High pressure encircled cooling target chamber TW200801213A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW95123599A TW200801213A (en) 2006-06-29 2006-06-29 High pressure encircled cooling target chamber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW95123599A TW200801213A (en) 2006-06-29 2006-06-29 High pressure encircled cooling target chamber

Publications (2)

Publication Number Publication Date
TW200801213A TW200801213A (en) 2008-01-01
TWI316559B true TWI316559B (enExample) 2009-11-01

Family

ID=44764979

Family Applications (1)

Application Number Title Priority Date Filing Date
TW95123599A TW200801213A (en) 2006-06-29 2006-06-29 High pressure encircled cooling target chamber

Country Status (1)

Country Link
TW (1) TW200801213A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106399953A (zh) * 2016-06-21 2017-02-15 乔宪武 一种溅射靶材自循环冷却装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106399953A (zh) * 2016-06-21 2017-02-15 乔宪武 一种溅射靶材自循环冷却装置
CN106399953B (zh) * 2016-06-21 2018-12-18 杭州联芳科技有限公司 一种溅射靶材自循环冷却装置

Also Published As

Publication number Publication date
TW200801213A (en) 2008-01-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees