1314030 九、發明說明: 【發明所屬之技術領域】 本發明係一種具微凸塊陣列之排線及其接合方法,尤 才曰種毋須使用異方性導電膠/膜,藉由形成於排線上的 微凸塊陣列與基板或1 c元件之對應接構成電連接。 【先前技術】 在導線排線和1C元件以及LCD玻璃基板和pCB連結 技術中異方性導電膠(Anisotropic-conductive Paste, ACP)或異方性導電膜(Anisotropic conductive fnm,ACF) 係扮次一個結合的角色。異方性導電膜/膠的組成成分中 包含有小顆粒的金屬顆粒,並均勻分佈在膠體中。 當排線欲結合至LCD玻璃基板或pCB時,係利用異 方性導電膜/膠黏合兩者,故膠體中的金屬顆粒會介於線 路及LCD玻璃基板a pCB當中,異方性導電膜/膠受到 壓合的位置,其内部膠體中的金屬顆粒係作為導電體,藉 此傳遞信號。而沒被壓合到的金屬粒子則不會導通,同時 膠材也當作黏合劑,黏合線路板和基板或是線路板和|c 元件。 如第六圖A、B所示,-排線(7 〇 )上的導電線路 (7 1 )係利用異方性導電膠/膜(8 〇 )結合於一基板 (7 2 )上,該異方性導電膠(8 〇 )即介於其中當=黏 合劑而包含在内部的金屬顆粒(8 i )係當作導體,該基 板(72)可以是-PCB的基板或是-Lcd的玻璃基 板,而形成於LCD玻璃基板上的導線可為透明電極(工 1314030 τ 0)或是鋁線。 a —如第七圖所不,為利用異方性導電膠/膜(8 〇 )結 元件(7 3 )上的金屬凸塊(7 4 )和排線(7 1 2 )上的線路(7 1 )相互結合’ IC it件(7 3 )上的金 、 凸鬼C74)也是透過異方性導電膠/膜(8〇)中的 金屬:粒(8 1)和線路(71)相互導通。 。月參見第人圖所不,係利用一種非導電性的膠/膜(8 ·=) (N〇n_C〇ndUCtive fi|m or paste, NCF、NCP)的結 2方式’丨C疋件(7 3 )上之金屬凸塊(7 * )係藉由非 導電性的膠/膜(8 2 )的黏結力量和導線(7工)相互 結合而導通,由於當中沒有導電的金屬顆粒作為媒介,而 是完全靠黏膠的力量,故其可靠度不佳故並未廣泛使用。 縱使如前面所述使用異方性導電膠/膜(8〇)的方 ' 式’仍是存在有下列缺點: 的空間’而膠體流 因而產生電性不良1314030 IX. Description of the Invention: [Technical Field] The present invention relates to a cable with a microbump array and a bonding method thereof, and it is particularly necessary to use an anisotropic conductive paste/film by forming on a wire The microbump array is electrically connected to the corresponding connection of the substrate or the 1 c element. [Prior Art] Aisotropic-conductive Paste (ACP) or anisotropic conductive fnm (ACF) is the next in the wire and 1C components, as well as the LCD glass substrate and pCB bonding technology. Combined roles. The composition of the anisotropic conductive film/glue contains small particles of metal particles and is uniformly distributed in the colloid. When the cable is to be bonded to the LCD glass substrate or pCB, the anisotropic conductive film/glue is used for bonding, so the metal particles in the colloid will be interposed between the circuit and the LCD glass substrate a pCB, the anisotropic conductive film / The position at which the glue is pressed, the metal particles in the inner colloid act as electrical conductors, thereby transmitting a signal. The metal particles that are not pressed are not turned on, and the glue is also used as a binder to bond the board and substrate or the board and the |c component. As shown in the sixth figure A and B, the conductive line (7 1 ) on the cable (7 〇) is bonded to a substrate (72) by using an anisotropic conductive paste/film (8 〇). The square conductive paste (8 〇) is a metal particle (8 i ) contained therein as a binder, and the substrate (72) may be a substrate of -PCB or a glass substrate of -Lcd. The wire formed on the LCD glass substrate may be a transparent electrode (work 1314030 τ 0) or an aluminum wire. a — as shown in the seventh figure, to use the metal bumps (7 4 ) on the anisotropic conductive adhesive/film (8 〇) junction component (7 3 ) and the wires on the cable (7 1 2 ) (7) 1) The combination of the 'IC it piece (7 3 ) gold, the convex ghost C74) is also transmitted through the metal in the anisotropic conductive paste/film (8 〇): the particle (81) and the line (71) are electrically connected to each other. . See the figure of the person in the month, using a non-conductive glue/film (8 ·=) (N〇n_C〇ndUCtive fi|m or paste, NCF, NCP) knot 2 way '丨C疋 (7 3) The metal bumps (7*) are electrically connected by the bonding force of the non-conductive glue/film (8 2 ) and the wires (7 work), because there is no conductive metal particles as a medium, It is completely dependent on the strength of the glue, so its reliability is not good, so it is not widely used. Even if the anisotropic conductive paste/film (8 Å) is used as described above, there are still the following disadvantages: the space of the colloidal flow and thus the electrical failure.
1 .結合點四周必需有供膠體流通 通會造成内涵的金屬顆粒分佈不均勻, 問題。 大小 2 ·導線的線寬、線距設計必須考慮金屬顆粒的尺寸 ’否則會產生短路或是電路導通不良。 3·異方性導電膠/膜製程複雜。 導致異方性導電 4 ·由於所使用到的金屬顆粒特殊 膠/膜價格昂貴,供應來源有限。 【發明内容】 鑑於上述習知使用異方性導電膠,膜的衍生缺點,本 1314030 發明之主要目的係提出一種具微凸塊陣列之排線製法,以 •該製法所得之排線係彳直接對應接觸力L c D玻璃基板或 • P C B上之導線而毋須使用異方性導電膠/膜。 為達成前述目的,本發明之排線製法係包含: , 形成複數金屬導線於一基材表面上; ; 塗佈—光阻乾❹於該金屬導線上,纟中該光阻乾膜 層係形成複數光阻開孔; ^金屬微凸塊於該力阻開孔内並去除該光阻乾膜 層,其中該金屬微凸塊係形成於金屬導線上; 電鍍一保護層於該金屬微凸塊表面。 刚述複數光阻開孔可排列為矩陣形狀。 前述複數光阻開孔係均勻分佈於基材表面上。 • 前述金屬微凸塊係可利用電鍍或非電鍍方式形成。 • 卩該製法所得之排線,於黏合至L C D玻璃基板或p C B上之導線時,其導電微凸塊係能直接接觸在基板或p φ C B上的導線,兩者之間僅須以非導電膠/膜黏合即可。 【實施方式】 本發明的内谷疋將微凸塊陣array)製 =在排線的導線上,使得排線在接合到Lcd玻璃基板、PCB 或丨C το件可以無需使用異方性導電膜(ACF)或異方性導電 :(CP)利岫述微凸塊陣列(mjCro_bump array)取代ACF 或ACP裡面的金屬顆粒,在導線接合時只需要用到一般易 於取得的非導電膠材(例如N〇n_c〇nductjvepaste)。 1314030 請參閱第—圖A、B所示,首先在-基材,例如軟板 或印刷電路板(PCB)上形成有多道金屬導線( 藉以構成一排線(1 〇 )。 請參閱第二圖A、B所示,在形成有導線(11)的 -面,復利用光罩形成有具矩陣排列光阻開孔 案的光阻乾膜層(1 3 )。由於朵卩日Μ 5_一 自於先阻開孔(1 2 )係為陣 列圖形,所以均勻分佈在該排線( 應到金屬導線(11)的對位門顏?表面,無刻意對 )的對位問喊’惟必須考量的是金屬 導線(;/)的線距、線寬因素,再决定光阻開孔(12) 的分佈密度。陣列上光阻開孔(i 2 導線(U)形成45度的爽角Γ 和金屬 ,、 4 ^度的夾角,而且確保金屬導線(1 1 )上必定會有光阻開孔(i 2 )。 請參閱第三圖A、B所示,利用電錄或無電鍵方式, 於光阻開孔(12)的位置上係形成導電微凸塊(Η), 由於光阻開孔(12)係平均分佈在排線(ι〇)表面, 故即使在非金屬導線(11)的位置是有光阻開孔(Η), 程只會在金屬表面形成,所以前述導電微凸塊(1 ^導線(1 1 )上形成。電鑛製程完畢後, 係去除該光阻乾膜層(13),形成的微㈣(14)陣 列再於表面鑛錫、錄或金當作一表面保護層,如此一完整 的排線(10)架構係已形成’而該排線(i 〇)之接合 :法’以下將以該排線(10)如何結合至一lcd破璃 基板或是印刷電路板舉例說明。 請參見第四圖A、B所示,訢、+.…, 厅丁 别迷形成有微凸塊(1 4 ) 1314030 的排線(1 〇 ),係可利用一般易於取得的非導電膠(2 -〇)黏合至一基板(7 0)上,該基板(7〇)可以是一 -P匚B的基板或疋一 L CD的玻璃基板,而形成於l CD 破璃基板上的導線可為透明電極(I To)或是紹線,前 述微凸塊(1 4 )便是與基板(7 〇 )的導線或接點形成 接觸。 同理,請參閱第五圖所示,本發明的排線(i 〇 )係 魯應用於結合- 1 C元件(7 3 ) ’排線(丄〇 )上的微凸 塊(1 4 )係對應接觸於I c元件(下3 )的金屬凸塊(7 4 ),兩者之間同樣是以非導電膠(2 〇 )加以黏合。 綜上所述,本發明利用形成有微凸塊之排線結合於L C D之玻璃基板或是印刷電路板上時,只須使用到非導電 、 性膠材即可,毋須使用到成本昂貴的異方性導電膠/膜, 士此來,對於降低成本及製程複雜度均有相當明顯的進 步,故本案於符合發明專利要件前提之下,爰依法提出申 • 請0 【圖式簡單說明】 第一圖A :係本發明於一軟板或p c B上形成導線之 剖面圖。 第—圖B :係第一圖A之底面示意圖。 第二圖A :係本發明於排線上形成光阻乾膜層之剖面 圖。 第二圖B:係第二圊a之底面示意圖。 8 1314030 第三圖A :係本發明於排線上形成導電微凸塊之剖面 圖。 第二圖B:係第三圖a之底面示意圖。 第四A圖:係本發明排線結合至一基板之示意圖。 第四圖B :係第四圖a之頂面示意圖。 第五圖係'本發明排線結合至c元件之示意圖。 第/、圖A .係習知利用異方性導電膜或導電膠結合排 線至一基板之剖面圖。1. There must be a problem that the distribution of the metal particles in the connotation is uneven around the joint. Size 2 • The line width and line spacing of the wire must be designed to take into account the size of the metal particles. Otherwise, a short circuit or poor circuit conduction may occur. 3. The anisotropic conductive adhesive/film process is complicated. Causes anisotropic conductivity 4 · Due to the special metal/particles used in the metal particles, the supply source is limited. SUMMARY OF THE INVENTION In view of the above-mentioned conventional use of an anisotropic conductive paste, a disadvantage of the derivative of the film, the main object of the 1314030 invention is to provide a wire arrangement method with a microbump array, and the cable system obtained by the method is directly Corresponding contact force L c D The glass substrate or the wire on the PCB does not require the use of an anisotropic conductive paste/film. In order to achieve the above object, the wire arranging method of the present invention comprises: forming a plurality of metal wires on a surface of a substrate; coating-resisting dry on the metal wires, and forming the photoresist dry film layer in the yttrium a plurality of photoresist openings; a metal microbump in the force blocking opening and removing the photoresist dry film layer, wherein the metal microbump is formed on the metal wire; plating a protective layer on the metal microbump surface. Just as the complex photoresist openings can be arranged in a matrix shape. The plurality of photoresist openings are evenly distributed on the surface of the substrate. • The aforementioned metal microbumps can be formed by electroplating or electroless plating. • The wire obtained by the method, when bonded to the LCD glass substrate or the wire on the p CB, the conductive microbump can directly contact the wire on the substrate or p φ CB, and only need to be non- The conductive adhesive/film can be bonded. [Embodiment] The inner valley of the present invention is made of microbump arrays on the wires of the wires, so that the wires can be bonded to the Lcd glass substrate, the PCB or the 丨C τ, and the anisotropic conductive film can be omitted. (ACF) or anisotropic conduction: (CP) The microbump array (mjCro_bump array) replaces the metal particles in the ACF or ACP, and only a commonly available non-conductive glue is required for wire bonding (eg N〇n_c〇nductjvepaste). 1314030 Please refer to Fig. A and B for the first step of forming a plurality of metal wires on a substrate, such as a flexible board or a printed circuit board (PCB) (to form a row of wires (1 〇). See second As shown in FIGS. A and B, in the surface on which the wires (11) are formed, a photoresist dry film layer (1 3 ) having a matrix-arranged photoresist opening is formed by using a photomask. Since the first opening hole (1 2 ) is an array pattern, it is evenly distributed on the line (should be on the surface of the metal wire (11), and the surface is not deliberately). What must be considered is the line spacing and line width factor of the metal wire (; /), and then determine the distribution density of the photoresist opening (12). The photoresist opening on the array (i 2 wire (U) forms a 45 degree refresh angle Γ and metal, 4 ^ degree angle, and ensure that there is a photoresist opening (i 2 ) on the metal wire (1 1 ). Please refer to the third figure A, B, using the electric record or no key , forming conductive micro-bumps (Η) at the position of the photoresist opening (12), since the photoresist opening (12) is evenly distributed on the surface of the wiring, even in The position of the metal wire (11) is a photoresist opening (Η), and the process is only formed on the metal surface, so the above-mentioned conductive microbump (1 ^ wire (1 1 ) is formed. After the process of the electric ore is completed, the system is removed. The photoresist dry film layer (13), formed by the micro (four) (14) array and then the surface mineral tin, recorded or gold as a surface protective layer, such a complete cable (10) architecture has formed 'and The connection of the cable (i 〇): the method of 'how to combine the cable (10) to an lcd glass substrate or a printed circuit board. Please refer to the fourth figure A, B, Xin, + ...., 厅 别 别 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 140 140 140 140 140 140 140 140 140 140 140 140 140 140 140 140 140 140 140 140 140 140 140 140 140 140 140 140 140 140 140 140 140 140 140 The substrate (7〇) may be a substrate of a -P匚B or a glass substrate of a CD, and the wire formed on the CD substrate may be a transparent electrode (I To) or a line, the aforementioned micro The bump (14) is in contact with the wire or the contact of the substrate (7 。). Similarly, as shown in the fifth figure, the cable (i 〇) of the present invention is The microbump (1 4 ) applied to the bonding - 1 C component (7 3 ) 'wire line (丄〇) corresponds to the metal bump (7 4 ) contacting the I c element (bottom 3), both of which The same is also bonded by a non-conductive glue (2 〇). In summary, the present invention uses only the wires formed with the micro bumps to be bonded to the glass substrate of the LCD or the printed circuit board, and only non-conductive is used. The adhesive material can be used, and it is not necessary to use the expensive anisotropic conductive adhesive/film. Therefore, there is a considerable improvement in the cost reduction and process complexity, so the case is in accordance with the premise of the invention patent requirements.提出Proposed application according to law • Please 0 [Simplified description of the drawing] The first figure A is a cross-sectional view of the wire formed on a soft board or pc B of the present invention. Figure B: is a schematic view of the bottom surface of the first Figure A. Fig. 2A is a cross-sectional view showing the formation of a photoresist dry film layer on the wiring line of the present invention. Figure B: is a schematic view of the bottom surface of the second 圊a. 8 1314030 FIG. 3A is a cross-sectional view showing the formation of conductive microbumps on the wire in the present invention. Figure B is a schematic view of the bottom surface of the third figure a. Figure 4A is a schematic view showing the bonding of the cable of the present invention to a substrate. Figure 4B is a top plan view of the fourth figure a. The fifth figure is a schematic view of the assembly of the present invention to the c-element. Fig. 3 and Fig. A are cross-sectional views of a substrate which is bonded to a substrate by an anisotropic conductive film or a conductive paste.
至一 第六圖B··係第六圖八之頂面示意圖。 第七Q .係習知利用異方性導電膠或導 1 c元件之剖面圖。 電膜結合排線 第八圖:係習知利 C元件之剖面圖。 用非導電性膠/膜結合排線至To the sixth figure B·· is the top view of the sixth figure eight. The seventh Q. is a cross-sectional view of the use of an anisotropic conductive paste or a conductive member. Electro-film combined with the cable. Figure 8: A section of the C-component of the Xizhili. Use non-conductive glue / film bonding cable to
I 【主要元件符號說明 ^ 1 〇 )排線 (1 2 )光阻開孔 (1 4 )微凸塊 (7 0 )排線 (7 2 )基板I [Main component symbol description ^ 1 〇 ) Cable (1 2 ) Resistor opening (1 4 ) Microbump (7 0 ) Cable (7 2 ) Substrate
(1 1)金屬線路 (1 3 )光阻乾膜層 (2〇)非導電膠 (7 1 )線路 (7 3 ) I C元件 (80)異方性導電膠/膜 (8 2 )非導電性膠/膜(1 1) Metal line (1 3 ) Photoresist dry film layer (2 〇) Non-conductive glue (7 1 ) Line (7 3 ) IC component (80) Anisotropic conductive adhesive / film (8 2 ) Non-conductive Glue/film