BUSfiS 50005TW 19691twf.doc/e 九、發明說明： 【發明所屬之技術領域】 本發明是有關於一種清洗裝置，且特別是有關於一種 利用毛刷輪來清洗基板表面的裝置。 【先前技術】BUSFIS 50005TW 19691twf.doc/e IX. Description of the Invention: [Technical Field] The present invention relates to a cleaning device, and more particularly to a device for cleaning a surface of a substrate using a brush wheel. [Prior Art]
由於平面顯示技術的突飛猛進，其應用逐漸從電腦用 螢幕延伸至家用電視。就薄膜電晶體液晶顯示器 (TFT-LCD)製程而言，清洗步驟經常連接於鍍膜、微& 及蝕刻等步驟之前、中、後等時機，用以維持顯示器基= 在生產過程中之表面潔淨度。 基板表面之清洗方式包括化學性及物理性的清洗方 式。舉例而言，利用轉動中之毛刷輪表面的纖毛來刷洗 (scrub)基板表面以達到清洗目的者屬於物理性的清洗方 式。毛刷刷洗（brush cleaning)通常應用於剛拆封後之素 玻璃基板的清洗，並歧地_於目前的濕式清洗設備，。'Due to the rapid advancement of flat panel display technology, its applications have gradually extended from computer screens to home TVs. In the case of a thin film transistor liquid crystal display (TFT-LCD) process, the cleaning step is often connected to the steps before, during, and after the steps of coating, micro-amplification, and etching to maintain the display base = surface cleanliness during production. degree. The cleaning method of the substrate surface includes chemical and physical cleaning methods. For example, it is a physical cleaning method to scrub the surface of the substrate with the cilia on the surface of the brush wheel in rotation to achieve cleaning. Brush cleaning is usually applied to the cleaning of the primed glass substrate just after unpacking, and is inconsistent with current wet cleaning equipment. '
由於顯示器基板之尺寸的不斷增加，大尺寸素玻璃基板之 清洗步驟大多已毛刷刷洗，所以毛卿絲置之零組 件具有很大的市場商機。 &矢應用上’以;袞輪式毛刷來清洗基板表面之可控 毛刷接觸基板的時間及壓合力道。因此，為了 力L=之清洗度’可增加毛刷接觸基板的時間、增 加毛=觸基板的μ合力道或㈣增加日相及壓合 半驟加毛刷接觸基板的時間，·必造成清洗 步驟所祕的時„長，這不齡顯 5 1311503 P&1950005TW 19691twf.doc/e 若增加毛刷接觸基板的壓合力道，則增加基板作水平滑動 的機率，這會提高基板發生滑片及疊片的機率，因而不 於顯示器之產能的提升。 【發明内容】 本發明之目的疋提供一種基板清洗裝置，用以提升 板之清洗效能。 土Due to the increasing size of the display substrate, most of the cleaning steps of the large-sized glass substrate have been brushed, so the zero component of the Maoqing silk has great market opportunities. & application of the 以 wheel brush to clean the surface of the substrate to control the time and pressure of the substrate. Therefore, in order to improve the cleaning degree of the force L=, it is possible to increase the time during which the brush contacts the substrate, increase the thickness of the hair=contacting substrate, or (4) increase the time of the solar phase and the pressure of the half-bucking brush to contact the substrate, and must cause cleaning. The secret of the step is „long, this is not age 5 1311503 P&1950005TW 19691twf.doc/e If the pressure of the brush contacting the substrate is increased, the probability of the substrate sliding horizontally is increased, which will increase the slip and stack of the substrate. The probability of the film is thus not increased by the productivity of the display. SUMMARY OF THE INVENTION The object of the present invention is to provide a substrate cleaning device for improving the cleaning performance of the board.
本發明之另一目的是提供一種基板清洗裝置，用以 低基板發生滑片的機率。 本發明提供一種基板清洗裝置，適於清洗一沿著〜 動^向來移動之基板’該基板清洗裝置包括—毛刷輪，其 沿著一旋轉軸線來旋轉，用以刷洗該基板之一表面，其'中 上述旋轉軸線與上述移動方向之夾角大於〇度且小於、 度。 、Another object of the present invention is to provide a substrate cleaning apparatus for reducing the probability of occurrence of a slider on a substrate. The present invention provides a substrate cleaning apparatus adapted to clean a substrate moving along a moving direction. The substrate cleaning apparatus includes a brush wheel that rotates along an axis of rotation for brushing a surface of the substrate. The angle between the above-mentioned rotation axis and the above-mentioned moving direction is greater than the twist and less than, degrees. ,
基於上述，藉由將毛刷輪之旋轉軸線與基板之移動方 向的夾角設定為銳角，本發明之基板清洗裝置可以提升美 板之清洗效能及降低基板發生滑片的機率。 土 為讓本發明之上述和其他目的、特徵和優點能更 明=下y文特舉多個實施例，並配合所關式，作詳細說 【實施方式】 侧視實施例之—種基板清洗㈣ 1A乃‘ 疋圖1A之毛刷輪的俯視圖。請參考g 乃3用"* ϋ發明之第—實施例的—種基板清洗裝置1C 疋用來>月洗-沿著一移動方向M來移動之基板ι〇，； 6 13115似 50005TW 19691twf.doc/eBased on the above, by setting the angle between the rotation axis of the brush wheel and the moving direction of the substrate to an acute angle, the substrate cleaning apparatus of the present invention can improve the cleaning performance of the board and reduce the probability of the slider occurring on the substrate. The above and other objects, features, and advantages of the present invention will become more apparent. The embodiments of the present invention will be described in detail with reference to the accompanying drawings. (d) 1A is a top view of the brush wheel of Figure 1A. Please refer to the third paragraph of the invention, which is the same as the first embodiment of the invention - the substrate cleaning device 1C is used for > monthly washing - the substrate moving along a moving direction M, 6 13115 like 50005TW 19691twf .doc/e
IiiiG可藉由—基板輸送裝置之多個導引滾輪20或其 他機構來沿著移動方向Μ來作水平移動。 在第-實施例中’基板清洗裝置谢並未包括上述之 ，板輸送裝置，但在其他實施例中，基板清洗裝置ι〇ι及 基板輸送裝置亦可整合於單一設備。 基板清洗裝置101包括一毛刷輪11〇，其沿著一旋轉 轴線Η1而可_地設置於基板1G之輸送路徑的上方，並 利用毛刷輪110上的纖毛來刷洗基板10之表面12，以生 3板K)之表面12，其中旋轉抽線m與移動方向M = 夹角更設定大於0度且小於90度。 為了提升清洗基板10的效能，基板清洗裝置應更 可包括一驅動馬達112,其_至毛刷輪1U)，用以驅使毛 刷輪m沿著旋轉軸線H1來旋轉，因而提高基板1〇之單 位面積在單㈣間内❹丨毛難110之纖毛的摩擦次數。 f述之驅動馬達112例如是經由一傳動機構（未繪示）來 轉毛刷輪110之一端’而毛刷輪110之另-端則連接 :轴承（未繪示），故驅動馬達112之轉動動能可傳遞至 毛刷輪110，用以驅使毛刷輪11〇作旋轉。 Μ =調η整毛刷輪11G接觸基板1G之壓合力道，基板 置101更可包括一高度調整器114,用以調整毛刷 輪10之軸心施相對於基板10之表面12的距離，因而 :周正毛刷輪110之纖毛受力形變後所施加在基板10之表面 機:的力:合十述之高度調整器114例如為馬達及線性移動 13115¾¾ 50005TW 19691twf.doc/e 為了提升清洗基板ίο的效能，基板清洗裝置丨⑴ 可包括一液體喷灑器116，其是面朝基板1〇之^面 設置’用以賴液體至基板1G之表面12。切 如是清洗液或去離子水等。 狀液體例 值得注思的疋，毛刷輪110之旋轉軸線Hi鱼 向Μ之夾角A1已設定大於()度且小於9G度，即、 為—銳角，所以基板1G之表面12受到毛刷輪⑽ 所接觸的寬度將成為傳統寬度的secA1倍。因此， 樣的設置方式可以增加紐1G之整個表面 ^到毛刷輪11G所刷洗的時間，因而提升基板ω之清洗效IiiiG can be horizontally moved along the moving direction by a plurality of guiding rollers 20 or other mechanisms of the substrate conveying device. In the first embodiment, the substrate cleaning apparatus does not include the above-described board conveying apparatus, but in other embodiments, the substrate cleaning apparatus ι and the substrate conveying apparatus may be integrated into a single apparatus. The substrate cleaning device 101 includes a brush wheel 11 that is disposed above the transport path of the substrate 1G along a rotational axis ,1 and scrubs the surface of the substrate 10 with cilia on the brush wheel 110. The surface 12 of the three plates K) is set, wherein the rotary drawing line m and the moving direction M = angle are set more than 0 degrees and less than 90 degrees. In order to improve the performance of the cleaning substrate 10, the substrate cleaning device should further include a driving motor 112, which is _ to the brush wheel 1U), for driving the brush wheel m to rotate along the rotation axis H1, thereby improving the substrate 1 The number of rubs per unit area of cilia in the single (four) between ten and ten. The drive motor 112 is, for example, turned to one end of the brush wheel 110 via a transmission mechanism (not shown), and the other end of the brush wheel 110 is connected: a bearing (not shown), so the drive motor 112 The rotational kinetic energy can be transmitted to the brush wheel 110 for driving the brush wheel 11 to rotate. Μ=The η whole brush wheel 11G contacts the pressing force of the substrate 1G, and the substrate 101 further includes a height adjuster 114 for adjusting the distance between the axis of the brush wheel 10 and the surface 12 of the substrate 10. Therefore, the cilia of the Zhouzheng brush wheel 110 is deformed by the force applied to the surface of the substrate 10: the force: the height adjuster 114 is, for example, a motor and a linear movement 131153⁄43⁄4 50005TW 19691twf.doc/e In order to improve the cleaning substrate ίο The performance of the substrate cleaning device (1) may include a liquid dispenser 116 that is disposed facing the substrate 1 to "see" the liquid to the surface 12 of the substrate 1G. Cut into cleaning solution or deionized water. The liquid sample is worthy of consideration. The angle A1 of the rotation axis of the brush wheel 110 is set to be greater than () degrees and less than 9G degrees, that is, an acute angle, so the surface 12 of the substrate 1G is subjected to the brush wheel. (10) The width of the contact will be 1 times the secA of the traditional width. Therefore, the setting method can increase the cleaning time of the substrate ω by increasing the entire surface of the button 1G to the brushing time of the brush wheel 11G.
月匕Q =注意的是’當正旋轉中之毛刷輪11〇施加一刷洗 =在基板10上時’由於旋轉軸線m與移動方向M之 夾角A1已設定為大於。度且小於9〇 F定的為=，所以基板1_動方向M上所受到刷= 二刀力^ x:Al，其小於刷洗力F。因此，藉由這樣 的叹置方式可以降低基板1〇發生滑片的機率。 祕t第—實施例中，基板清洗襄置1G1更可包括另一毛 ，其沿著一旋轉轴、線H2而可樞轉地設置於基板 =送路徑的下方，並利用毛刷輪110上的纖毛來刷洗 =10之表面14 ’其中旋轉軸線H2與移動方向M之夾 角A2大於〇度且小於9〇度，即失角八2為一銳角。 丰剔^圖1A所示’若在基板1〇之表面12上設有上述之 mo ’而沒有其他的支擇構件的話，旋轉軸線 19691twf.doc/e 與方疋轉軸線HI可设疋貫質上相互平行且位於同一平面 上，使彳于基板10之同一區段位於毛刷輪11〇及毛刷輪12〇 之間。 此外，相似於上述之驅動馬達112、高度調整器114 及液體喷瀧器116對應於毛刷輪11〇的設置方式，基板清 洗裝置101更可包括一驅動馬達122、高度調整器124及 液體喷灑器126，其對應於毛刷輪12〇的設置方式分別相 似於驅動馬達112、高度調整器114及液體噴灑器116之 對應於毛刷輪110的設置方式，於此不再費述。 第一實施例之基板清洗裝置101是毛刷輪11〇及毛刷 輪120均已預先固定的設計，但在下面的第二實施例中， 毛刷輪110及120可相對於基板10之移動方向M來調整 其旋轉軸線H1及旋轉軸線H2與移動方向μ的夾角。 圖2Α是本發明之第二實施例之基板清洗裝置的側視 圖，而圖2Β是圖2Α之毛刷輪的俯視圖。請參考圖2Α及 圖2Β’除了可包括第一實施例的基板清洗裝置1〇ι所包括 的構件以外，本發明之第二實施例之基板清洗裝置1〇2更 包括一角度調整器118’其連接於毛刷輪11〇，用以調整旋 轉軸線Η1與移動方向Μ之夾角Α1。此外，基板清洗裝 置102更包括另一角度調整器128，其連接於毛刷 用以調整旋轉軸線H2與移動方向μ之夾角八2。 在其他實施例中，上述之角度調整器118及角度調整 器128亦可依照設計上的需要分別與高度調整器丨14及高 度調整器124整合為單-單元，亦即可同時提供高度調整 9 311艰_ 5T\V 19691twf.doc/e 及角度調整的調整器。 ，藉由角度調整器118及角度調 丈角A1及失角A2之前後，如圖所示周整Month = Q = Note that 'when a brush wheel 11 is being rotated, a brush is applied = on the substrate 10' because the angle A1 between the rotation axis m and the moving direction M has been set to be larger. Degree is less than 9 〇 F is set to =, so the substrate 1_ moving direction M is subjected to brush = two-knife force ^ x: Al, which is smaller than the brushing force F. Therefore, the probability of occurrence of the slider of the substrate 1〇 can be reduced by such an slanting method. In the first embodiment, the substrate cleaning device 1G1 may further include another hair that is pivotally disposed under the substrate=feed path along a rotation axis and a line H2, and is utilized on the brush wheel 110. The cilia is brushed = 10 of the surface 14' wherein the angle A2 between the axis of rotation H2 and the direction of movement M is greater than the degree of twist and less than 9 degrees, that is, the angle of departure 8 is an acute angle. Figure 1A shows that if the mo' is provided on the surface 12 of the substrate 1 without any other supporting members, the axis of rotation 19691 twf.doc/e and the axis HI can be set. The upper portions are parallel to each other and are located on the same plane such that the same section of the substrate 10 is located between the brush wheel 11 and the brush wheel 12A. In addition, similar to the above-mentioned driving motor 112, height adjuster 114 and liquid squirt 116 corresponding to the arrangement of the brush wheel 11 ,, the substrate cleaning device 101 may further include a driving motor 122, a height adjuster 124 and a liquid spray The arrangement of the sprinklers 126 corresponding to the brush wheels 12A is similar to the arrangement of the drive motor 112, the height adjuster 114 and the liquid sprayer 116 corresponding to the brush wheel 110, and will not be described herein. The substrate cleaning apparatus 101 of the first embodiment has a design in which the brush wheel 11 and the brush wheel 120 are both fixed in advance, but in the following second embodiment, the brush wheels 110 and 120 are movable relative to the substrate 10. The direction M adjusts the angle between the rotation axis H1 and the rotation axis H2 and the moving direction μ. Fig. 2A is a side elevational view of the substrate cleaning apparatus of the second embodiment of the present invention, and Fig. 2A is a plan view of the brush wheel of Fig. 2; Referring to FIG. 2A and FIG. 2B, in addition to the components included in the substrate cleaning apparatus 1A of the first embodiment, the substrate cleaning apparatus 1 2 of the second embodiment of the present invention further includes an angle adjuster 118'. It is connected to the brush wheel 11〇 for adjusting the angle Α1 between the rotation axis Η1 and the moving direction Μ. Further, the substrate cleaning device 102 further includes another angle adjuster 128 coupled to the brush for adjusting the angle 八 of the rotation axis H2 and the moving direction μ. In other embodiments, the angle adjuster 118 and the angle adjuster 128 may be integrated into the single-unit with the height adjuster 14 and the height adjuster 124 according to design requirements, and the height adjustment may be provided at the same time. 311 _ _ 5T \ V 19691twf.doc / e and angle adjustment adjuster. After adjusting the angle A1 and the angle A2 by the angle adjuster 118 and the angle, as shown in the figure
之毛^二疋,t 3A之角度調整器的實施例’圖4B是圖4A 度調整器難傾斜角度後的示意圖。2 ^ 4Α及圖4Β，在製程腔體2〇〇中，毛二= 端!分別輕接至這兩個高度調整iilH。 兩端的高度毛刷輪110之輪轴11如的 另外’這兩個分別輕接於 受到:動而，正或負X轴:14之一部分’並可 例而e，當右側之角声 。 118a之在χ軸方向 ς: : 118經由兩調整桿 no之輪轴_的右J對f動’因而主動地旋轉毛刷輪 動地沿著-沿著伸=之/度調整器山則可被 度調整器m的兩調以:,，軌道130移動，且左側之角 對移動’因而使得毛刷輪對應在X轴方向上作相 4A之位置移動至其在圖4輪軸1衞的左端從其在圖 因此，藉由這兩個#立置。 之輪轴U〇a相對二^ 他未緣示之實施例中，這此度。當然，在其 度調整器而直接調整毛= 13115Q35〇〇〇5XW 19691twf.doc/e f直接地減至兩角度調整器，再分別間接 古 ^整器。此外，在其他未繪示之實施例中，魄於毛^ 兩端的角度調整器亦可同時主動地調整毛刷輪 優 .綜上所述’本發明之基板清洗裝置至少包括下列 (一）本發明藉由將毛刷輪之旋轉轴線與基板之移動 ^向的炎角設定為銳角基板之整個表面的單位面 受到毛刷輪所刷洗的時間，&而提升基板之清洗度。換言 之，在相同的清洗環境之下，相較於習知技術，本明^ 提升基板之清洗效能。 (二）本發明藉由將毛刷輪之旋轉軸線與基板之移動 方向的夾角設定為銳角，故可降低毛刷輪接觸基板之壓合 力道在基板之移動方向上的分力，因而降低基板發生 的機率。 雖然本發明已以多個實施例揭露如上，然其並非用以 限定本發明，任何熟習此技藝者，在不脫離本發明之精神 ^範圍内’當可作些許之更動與潤飾’因此本發明之保護 範圍當視後附之申請專利範圍所界定者為準。 【圖式簡單說明】 圖1Α是本發明之第一貫施例之一種基板清洗裝置的 侧視圖。 圖1Β是圖1Α之毛刷輪的俯視圖。 圖2Α是本發明之第二實施例之基板清洗裝置的侧視 19691twf.doc/e 圖2B是圖2A之毛刷輪的俯視圖。 之基板清洗裝置於旋轉毛刷輪後的側 圖3B是圖3A之毛刷輪的俯視圖。 圖4A是圖3A之角度調整器的實施例。 圖4B是圖4A之毛刷輪經由角度調整器調整傾斜 後的不意圖。Example of the angle adjuster of the t 3A FIG. 4B is a schematic view of the angle adjuster of FIG. 2 ^ 4Α and Figure 4Β, in the process chamber 2〇〇, the hair 2 = end! Lightly connected to these two height adjustment iilH. The heights of the ends of the wheel 11 of the brush wheel 110 are, for example, the other two are lightly connected to: a positive or negative X-axis: a portion of 14 and can be e, for example, when the right side is sounded. 118a in the x-axis direction :: : 118 via the two adjustment lever no of the axle _ the right J to f move ' thus actively rotate the brush to move along - along the extension = / adjust the adjuster mountain can The two adjustments of the adjuster m are:, the track 130 moves, and the left side of the pair moves. Thus, the brush wheel is moved to the left end of the wheel axis 1 in the direction of the phase 4A in the X-axis direction. From its in the picture, therefore, with these two #立立. The wheel axle U〇a is relatively different from the embodiment shown in this example. Of course, in the degree adjuster and directly adjust the hair = 13115Q35 〇〇〇 5XW 19691twf.doc / e f directly reduced to the two angle adjuster, and then indirectly. In addition, in other embodiments not shown, the angle adjusters at both ends of the hair can also actively adjust the brush wheel at the same time. In summary, the substrate cleaning device of the present invention includes at least the following (1) The invention improves the cleaning degree of the substrate by setting the inflammatory angle of the rotation axis of the brush wheel and the movement direction of the substrate to the time when the unit surface of the entire surface of the acute angle substrate is brushed by the brush wheel. In other words, in the same cleaning environment, compared with the prior art, the cleaning performance of the substrate is improved. (2) The invention sets the angle between the rotation axis of the brush wheel and the moving direction of the substrate to an acute angle, so that the component force of the pressing force of the brush wheel contacting the substrate in the moving direction of the substrate can be reduced, thereby reducing the substrate. The probability of occurrence. The present invention has been disclosed in the above embodiments in various embodiments, and it is not intended to limit the invention, and the present invention may be modified and retouched without departing from the spirit of the invention. The scope of protection is subject to the definition of the scope of the patent application. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1A is a side view of a substrate cleaning apparatus according to a first embodiment of the present invention. Figure 1 is a top plan view of the brush wheel of Figure 1. Figure 2A is a side elevational view of the substrate cleaning apparatus of the second embodiment of the present invention. 19691twf.doc/e Figure 2B is a plan view of the brush wheel of Figure 2A. 3B is a plan view of the brush wheel of Fig. 3A. 4A is an embodiment of the angle adjuster of FIG. 3A. Fig. 4B is a schematic view of the brush wheel of Fig. 4A after the tilt is adjusted via the angle adjuster.
【主要元件符號說明】 1〇 :基板 12 :表面 14 :表面 2〇 :導引滾輪 101、102 :基板清洗裝置 110、120 .毛刷輪 112、122 :驅動馬達 114、124 :高度調整器[Main component symbol description] 1〇: Substrate 12: Surface 14: Surface 2〇: Guide roller 101, 102: Substrate cleaning device 110, 120. Brush wheel 112, 122: Drive motor 114, 124: Height adjuster
圖3A是圖2A 視圖。 116、126 :液體噴灑器 118、128 :角度調整器 118a :調整桿 130 :軌道 2〇〇 :製程腔體 Al、A2 :夹角 HI、H2 :旋轉軸線 Μ:移動方向 12Figure 3A is a view of Figure 2A. 116, 126: liquid sprayer 118, 128: angle adjuster 118a: adjustment lever 130: rail 2〇〇: process chamber Al, A2: angle HI, H2: axis of rotation Μ: direction of movement 12