TWI306782B - Suspension for showerhead in process chamber - Google Patents

Suspension for showerhead in process chamber Download PDF

Info

Publication number
TWI306782B
TWI306782B TW095128932A TW95128932A TWI306782B TW I306782 B TWI306782 B TW I306782B TW 095128932 A TW095128932 A TW 095128932A TW 95128932 A TW95128932 A TW 95128932A TW I306782 B TWI306782 B TW I306782B
Authority
TW
Taiwan
Prior art keywords
suspension
wall
sprinkler head
gas
periphery
Prior art date
Application number
TW095128932A
Other languages
English (en)
Chinese (zh)
Other versions
TW200709854A (en
Inventor
Ernst Keller
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of TW200709854A publication Critical patent/TW200709854A/zh
Application granted granted Critical
Publication of TWI306782B publication Critical patent/TWI306782B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45587—Mechanical means for changing the gas flow
    • C23C16/45591—Fixed means, e.g. wings, baffles

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Fire-Extinguishing By Fire Departments, And Fire-Extinguishing Equipment And Control Thereof (AREA)
TW095128932A 2005-09-02 2006-08-07 Suspension for showerhead in process chamber TWI306782B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US71387505P 2005-09-02 2005-09-02

Publications (2)

Publication Number Publication Date
TW200709854A TW200709854A (en) 2007-03-16
TWI306782B true TWI306782B (en) 2009-03-01

Family

ID=37816905

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095128932A TWI306782B (en) 2005-09-02 2006-08-07 Suspension for showerhead in process chamber

Country Status (4)

Country Link
JP (1) JP5489390B2 (https=)
KR (1) KR101354575B1 (https=)
CN (1) CN1924085B (https=)
TW (1) TWI306782B (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI766219B (zh) * 2019-01-07 2022-06-01 日商愛發科股份有限公司 真空處理裝置及真空處理裝置之清潔方法

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101139215B1 (ko) * 2009-10-27 2012-05-14 주식회사 테스 기판 처리 장치
CN102918180B (zh) 2010-05-21 2014-12-17 应用材料公司 大面积电极上的紧密安装的陶瓷绝缘体
US8721791B2 (en) 2010-07-28 2014-05-13 Applied Materials, Inc. Showerhead support structure for improved gas flow
CN106884157B (zh) 2011-03-04 2019-06-21 诺发系统公司 混合型陶瓷喷淋头
DE102015110440A1 (de) * 2014-11-20 2016-05-25 Aixtron Se CVD- oder PVD-Reaktor zum Beschichten großflächiger Substrate
DE102015118765A1 (de) * 2014-11-20 2016-06-09 Aixtron Se Vorrichtung zum Beschichten eines großflächigen Substrats
KR101590346B1 (ko) * 2015-01-30 2016-02-01 주식회사 테스 박막증착장치
JP6242933B2 (ja) 2016-03-31 2017-12-06 株式会社日立国際電気 基板処理装置、半導体装置の製造方法およびプログラム
JP7132358B2 (ja) * 2019-01-07 2022-09-06 株式会社アルバック 真空処理装置
KR102700366B1 (ko) * 2019-01-29 2024-08-30 주성엔지니어링(주) 샤워헤드 및 이를 포함하는 기판처리장치
US12486574B2 (en) 2019-08-23 2025-12-02 Lam Research Corporation Thermally controlled chandelier showerhead
KR102618455B1 (ko) * 2019-12-02 2023-12-27 주식회사 원익아이피에스 샤워헤드조립체 및 이를 포함하는 기판처리장치
US12011731B2 (en) * 2020-07-10 2024-06-18 Applied Materials, Inc. Faceplate tensioning method and apparatus to prevent droop
KR102909116B1 (ko) * 2022-10-04 2026-01-07 주식회사 원익아이피에스 가스분사조립체 및 이를 포함하는 기판처리장치
KR102828735B1 (ko) 2023-04-27 2025-07-03 (주)티티에스 샤워헤드 코너 영역의 공정가스 흐름 개선 장치

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5670218A (en) * 1995-10-04 1997-09-23 Hyundai Electronics Industries Co., Ltd. Method for forming ferroelectric thin film and apparatus therefor
JP3480271B2 (ja) * 1997-10-07 2003-12-15 東京エレクトロン株式会社 熱処理装置のシャワーヘッド構造
US6300255B1 (en) * 1999-02-24 2001-10-09 Applied Materials, Inc. Method and apparatus for processing semiconductive wafers
US6461435B1 (en) * 2000-06-22 2002-10-08 Applied Materials, Inc. Showerhead with reduced contact area
US7131218B2 (en) * 2004-02-23 2006-11-07 Nike, Inc. Fluid-filled bladder incorporating a foam tensile member
JP4698251B2 (ja) * 2004-02-24 2011-06-08 アプライド マテリアルズ インコーポレイテッド 可動又は柔軟なシャワーヘッド取り付け

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI766219B (zh) * 2019-01-07 2022-06-01 日商愛發科股份有限公司 真空處理裝置及真空處理裝置之清潔方法

Also Published As

Publication number Publication date
KR20070026210A (ko) 2007-03-08
JP5489390B2 (ja) 2014-05-14
JP2007123840A (ja) 2007-05-17
TW200709854A (en) 2007-03-16
KR101354575B1 (ko) 2014-01-22
CN1924085A (zh) 2007-03-07
CN1924085B (zh) 2013-10-23

Similar Documents

Publication Publication Date Title
TWI306782B (en) Suspension for showerhead in process chamber
US7641762B2 (en) Gas sealing skirt for suspended showerhead in process chamber
KR100929455B1 (ko) 플라즈마 챔버용의 현가형 가스 분배 매니폴드
US7017269B2 (en) Suspended gas distribution plate
TWI412621B (zh) 具有遮蔽板的陰影框
CN102212798A (zh) 适应热膨胀的喷头装备
KR20060126922A (ko) 개선된 배플 플레이트를 위한 방법 및 장치
US7776178B2 (en) Suspension for showerhead in process chamber
TW202123304A (zh) 用於處理腔室的高導通下部護罩
CN200996043Y (zh) 一种屏蔽框架组件
KR20170048880A (ko) 기판지지대 및 그가 설치된 기판처리장치