TWI301728B - Active matrix oled - Google Patents

Active matrix oled Download PDF

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Publication number
TWI301728B
TWI301728B TW94112832A TW94112832A TWI301728B TW I301728 B TWI301728 B TW I301728B TW 94112832 A TW94112832 A TW 94112832A TW 94112832 A TW94112832 A TW 94112832A TW I301728 B TWI301728 B TW I301728B
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Taiwan
Prior art keywords
organic light
active organic
emitting element
barrier layer
electrode
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TW94112832A
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Chinese (zh)
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TW200638787A (en
Inventor
Yu Kai Han
Hsia Tsai Hsiao
Tien Rong Lu
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Ritdisplay Corp
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Publication of TWI301728B publication Critical patent/TWI301728B/en

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1301728 13055twfl.doc/d 96/11/30 九、發明說明: 【發明所屬之技術領域】 本發明是有關於一種主動式有機發光元件(Active Matrix 0LED),且特別是有關於一種適用於噴墨 之主動式有機發光元件。 衣壬 【先前技術】1301728 13055twfl.doc/d 96/11/30 IX. Description of the Invention: [Technical Field] The present invention relates to an active organic light-emitting element (Active Matrix 0LED), and in particular to a method suitable for inkjet Active organic light-emitting elements. Clothing [previous technique]

資訊通訊產業已成為現今的主流產業,特別是可攜帶 式的各種通訊顯示產品更是發展的重點。而由於平面^示 器是人與資訊之_溝通界面,因此其發展顯得特^重 要。目前應用在平面顯示ϋ的技術包括有電漿顯示器 (Plasma Display Panel,PDP)、液晶顯示器(Liquid Crystal Display, LCD)、無機電激發光顯示器(ΐη〇Γ^η^ Electroluminescent Display)、發光二極體 Emitting Diode,LED)顯示器、真空示The information and communication industry has become the mainstream industry today, especially the portable communication display products are the focus of development. Since the flat panel display is a communication interface between people and information, its development is particularly important. Currently used in flat panel display technology include Plasma Display Panel (PDP), Liquid Crystal Display (LCD), Inorganic Electroluminescence Display (ΐη〇Γ^η^ Electroluminescent Display), and LED Body Emitting Diode, LED) display, vacuum display

Flu〇麗ence Display,VFD)、場致發射顯示器⑻别 Emission Display, FED)以及電變色顯示器Flu ence display (VFD), field emission display (8) Emission Display, FED) and electrochromic display

(Electro-Chromic Display)等等。 …口- 相較於其他平面顯示器,有機發光顯示器以其自發 光、無視角、省電、製程簡易、低成本、操作溫度廣泛、 高應答速度錢全彩化料的優點,使其具有極大的潛 力,因此可望成為下一代平面顯示器之主流。 現今一種主動式有機發光顯示器已在積極的發展中, 其係於已形成有多個薄膜電晶體之基板上依序形成陽極 層、有機官忐層以及陰極層。據此,有機發光元件係利用 薄膜電晶體來驅動。 1301728 13〇55twfl.doc/d 96/11/30 而上述有機官能層的形成方式係依昭复 選擇’依照有機官能性材料的分子量不同” ^的祕來 有機電激發光元件(smaH mQlecule G p為小分子 分子有機《錢科(p_er SM~G_與高 晴兩大類;例如以高分子有機官能材; 修贈程(ink-jet print)的方式口 ίΠ,性材料溶於溶劑中,以作為噴墨S it 官能騎使用的墨液,然後進行噴墨印刷2 進仃固化(curnig)以將墨水中的溶劑去除或八 :n,只需要進行對準、喷墨及固化等步驟。此外, 由於贺墨印刷使用設備少、材料使用率高^一 步降低製造的成本。 此更』進 -般來說’利时騎難程以形成有機官能層時, ^ 了阻隔各個晝素中之墨水(有機官能性材料)不會交互污 =色,所以會在m之間配置阻隔層雜隔墨水。 ,參照圖i以及圖2 ’圖!所綠示是有機發光晝素陣列基 =墨:刷製程的示意圖,圖2是圖i之單一晝素的立 圖。嘴墨印刷製程的進行方式是利用填充有發 先材枓(105a、l〇5b、l〇5c)的喷墨頭1〇丨以箭頭1〇3之方 向喷灑墨水(105a、lG5b、105c)至基板刚上的畫素1〇6 中。雖然在每-晝素⑽之周圍都有阻隔層⑽阻絕墨水 (105a、l〇5b、l〇5c)溢流至鄰近的晝素1〇6中,但是在喷 1301728 13055twfl.d〇c/d 96/11/30 墨印刷的過程中,墨水(105a、105b、l〇5c)除了會噴著於 畫素106内之外,亦有可能會喷灑在高度較高的阻隔層1〇4 ·: 上^而這些被喷著在阻隔層104上的墨水(i〇5a、i〇5b、1〇5c) : 將容易沿著阻隔層1〇4而流至鄰近的畫素1〇6内。所以, 目前的喷墨技術來形成有機發光畫素陣列基板之有機 官能層會產生以下的問題·· 、、、丨·若相鄰二畫素内所喷灑之墨水為具有相同發光材 料之墨水時,例如同為紅色、同為綠色或同為藍色,則在 進行噴墨印刷時,墨水會沿著阻隔層流至鄰近的畫素中, 使传發光材料層的膜厚不一致。 、 、,2·若相鄰二畫素内所喷灑之墨水為不相同的發光材 料之墨水時,例如為紅色、綠色或藍色其中之二,則在進 仃喷墨印刷時,墨水會沿著阻隔層而流至鄰近的晝素中, 而造成相互混色的問題。 一 ” 【發明内容】 有鑑於此,本發明的目的就是在提供一種主動式有機 春 發光元件,以解決習知利用喷墨印刷製程以形成有機官能 層時容易產生墨水溢流之情形,而造成有機官能層之膜p 不均,或是於鄰近晝素之間有相互混色的問題。 予 本發明提出一種主動式有機發光元件,此主動式有 發光元件包括一基板、配置在基板上之一第一/第二薄膜 晶體與一電容器以及一電極且電極係與第二薄膜電晶體連 接、以及一阻隔層,其中阻隔層覆蓋住第一/第二薄膜電曰曰 • 體、電容器以及至少一部分的電極,以於電極上定義出: 、 開口面積,其中位於電極周圍的至少一部份的阻隔層表面 1301728 13055twfl.doc/d 96/11/30 具有一凹槽。 本發明提出一種主動式有機發光元件,此主動式有 發光70件包括一基板、配置在基板上之至少二薄膜電晶體 與至少-電容器以及一電極且電極係與其中一薄膜電晶體 連接、以及一阻隔層,其中阻隔層覆蓋住上述之薄膜電曰 體電谷态以及至少一部分的電極,以於電極上定義出— 開口面積,其中位於電極周圍的至少一部份的阻隔層表面 具有一凹槽。 提出-種主動式有機發光元件’主動式有機發 =件匕括—基板、配置在基板上之—第第二薄曰 桩舁-電容器以及一電極且電極係與第二薄膜電晶體: 接、以及一第一阻隔層盥一第一 運 Λ 電容器以及至少―部分的電極以 资的/ί出—開σ面積’其中位於電極周圍的至少-抑阻隔層表面具有—凹槽 阻隔層表面之凹槽内。 丨哺伹於弟一 本發明提出-種主動式有機發 發光元件包括-基板、配置在基板上之至少二 蓋住上述之薄膜電【:層阻隔層覆 以於雷描山 w及至夕一部分的電極, 以,電極上疋義出—開口面積,其中位 一部份的阻隔層表面具有1槽。第二2=至少 隔層表面之凹槽内。 丨网層位於第一阻 由於本發明所提出之阻隔層中係設計有凹槽,所以當 ,728 l3〇55twfl.doc/d 96/11/30(Electro-Chromic Display) and so on. ... mouth - Compared with other flat panel displays, organic light-emitting displays have great advantages due to their self-illumination, no viewing angle, power saving, simple process, low cost, wide operating temperature and high response speed. Potential, so it is expected to become the mainstream of the next generation of flat panel displays. An active organic light-emitting display has been actively developed in the prior art by sequentially forming an anode layer, an organic mantle layer, and a cathode layer on a substrate on which a plurality of thin film transistors have been formed. According to this, the organic light emitting element is driven by the thin film transistor. 1301728 13〇55twfl.doc/d 96/11/30 The formation of the above-mentioned organic functional layer is based on the selection of 'organic electroluminescent element according to the molecular weight of the organic functional material' (smaH mQlecule G p For the small molecule molecule organic "Qi Ke (p_er SM ~ G_ and Gao Qing two categories; for example, polymer organic functional materials; ink-jet print), the material is dissolved in the solvent, As the ink used for the inkjet Sit function, it is then subjected to inkjet printing to remove the solvent in the ink or to remove the solvent: only the steps of alignment, inkjet, and curing are required. Because Hemo printing uses less equipment and high material utilization rate, the cost of manufacturing is reduced in one step. This is more to say, in general, when it is difficult to ride an organic functional layer, it blocks the ink in each element. (Organic functional materials) will not interact with the stain = color, so the barrier layer of interstitial ink will be placed between m. See Figure i and Figure 2 'Figure! Green is the organic light-emitting halogen array base = ink: brush Schematic diagram of the process, Figure 2 is a single element of Figure i The inkjet printing process is carried out by spraying the ink in the direction of the arrow 1〇3 by using the inkjet head 1 filled with the hairpin 105 (105a, l〇5b, l〇5c) (105a, lG5b). , 105c) to the pixel 1〇6 on the substrate. Although there is a barrier layer (10) around each of the halogen (10), the ink (105a, l〇5b, l〇5c) is blocked from overflowing to the adjacent halogen 1 〇6, but in the process of ink printing 1301728 13055twfl.d〇c/d 96/11/30, the ink (105a, 105b, l〇5c) is sprayed in the pixel 106, It may be sprayed on the higher-level barrier layer 1〇4·: and these inks (i〇5a, i〇5b, 1〇5c) sprayed on the barrier layer 104: will easily follow the barrier layer 1〇4 flows into the adjacent pixel 1〇6. Therefore, the current inkjet technology to form the organic functional layer of the organic light-emitting pixel array substrate will cause the following problems: ·,,, When the ink sprayed in the pixel is an ink having the same luminescent material, for example, both red, green, or blue, the ink will follow the barrier layer during inkjet printing. Flowing into adjacent pixels causes the film thickness of the light-emitting material layer to be inconsistent. , , , 2 · If the ink sprayed in the adjacent two pixels is different ink of the light-emitting material, for example, red, green Or two of the blue, when inkjet printing, the ink will flow along the barrier layer to the adjacent halogen, causing the problem of mutual color mixing. A" [Invention] In view of this, the present invention The purpose of the invention is to provide an active organic spring light-emitting element to solve the problem that the ink overflow is easily generated when an ink-jet printing process is used to form an organic functional layer, and the film of the organic functional layer is uneven, or There is a problem of color mixing between adjacent pixels. An active organic light emitting device is provided. The active light emitting device comprises a substrate, a first/second thin film crystal disposed on the substrate and a capacitor, and an electrode connected to the second thin film transistor. And a barrier layer, wherein the barrier layer covers the first/second thin film capacitor body, the capacitor and at least a portion of the electrode to define on the electrode: an opening area, wherein at least a portion of the electrode is located around the electrode The barrier layer surface 1301728 13055twfl.doc/d 96/11/30 has a recess. The present invention provides an active organic light emitting device, wherein the active light emitting device comprises a substrate, at least two thin film transistors disposed on the substrate, and at least a capacitor and an electrode, and the electrode system is connected to one of the thin film transistors, and a barrier layer, wherein the barrier layer covers the above-mentioned thin film electric grid state and at least a portion of the electrodes to define an opening area on the electrode, wherein at least a portion of the barrier layer surface around the electrode has a concave surface groove. Proposed an active organic light-emitting element 'active organic light-emitting element=substrate-substrate, a second thin-ply-chopper-capacitor disposed on a substrate, and an electrode and an electrode system and a second thin film transistor: And a first barrier layer, a first capacitor, and at least a portion of the electrode, wherein the at least one surface of the barrier layer has a recessed surface of the recess barrier layer Inside the slot. The invention relates to an active organic light-emitting element comprising: a substrate, at least two disposed on the substrate, covering the above-mentioned thin film electric layer: the layer barrier layer is covered by The electrode, the electrode, has an open area, and a part of the barrier layer has a groove on the surface. The second 2 = at least in the groove of the surface of the barrier. The mesh layer is located at the first barrier. The barrier layer proposed in the present invention is designed with a groove, so when, 728 l3〇55twfl.doc/d 96/11/30

Si噴墨印刷技術將墨水噴著於各晝素之電極上時,多餘 • %:二Μ進凹槽並陷於其中,因此可以避免墨水流到鄰 -S* 素 0 % 槽内f外’在本發明除了在阻隔層中係設計有凹槽,且凹 次配置有另一阻隔層,因此當利用喷墨印刷技術將墨 於2著於各晝素之電極上時,多餘的墨水會流進凹槽並陷 I 、中’如此將可避免墨水流到鄰近的畫素。 讓本發明之上述和其他目的、特徵、和優點能更明 、、1,下文特舉一較佳實施例,並配合所附圖式, 一說明如下。 【實施方式】 圖5係繪示本發明一較佳實施例之主動式有機發光晝 素陣列基板之示意圖,圖6是圖5之其中一晝素的等效電 路圖。請參照圖5以及圖6,本發明之主動式有機發光晝 素陣列基板包括基板200、配置在基板200上之掃瞄線 φ SL1、SL2〜SLn與資料線DL1、DL2〜DLm以及多個晝素206, 其中此些晝素206中除了包括有機官能層212以及第二電 極214之外,各晝素206内更包括用以驅動發光元件之主 動元件,如圖6所示,其包括至少二薄膜電晶體以及至少 一電容器以及與其中一薄膜電晶體連接之一第一電極。以 其中一實例來說,各晝素中係包括開關電晶體1〇、驅動電 晶體20以及電容器30,且開關電晶體1〇係配置在掃瞄線 • SL與資料線DL之交會處,而驅動電晶體2〇之一電極端係 、 與發光二極體40連接。本發明之各畫素中除了包括上述各 9 1301728 13055twfl.doc/d 96/11/30 元件之外,更包括有阻隔層結構,如圖3與圖4所绔 有機g能層212係至少選自電洞注入層、電洞傳輸層When Si inkjet printing technology sprays ink onto the electrodes of each element, it is redundant. %: The second ink is recessed into the groove and trapped therein, so that the ink can be prevented from flowing into the adjacent-S*0% groove. In addition to the design of the recess in the barrier layer, and the recess is provided with another barrier layer, when the ink is applied to the electrodes of the respective pixels by the inkjet printing technique, the excess ink flows into the ink. The groove is trapped in I, Medium' so that ink can be prevented from flowing to adjacent pixels. The above and other objects, features and advantages of the present invention will become more apparent. [Embodiment] FIG. 5 is a schematic view showing an active organic light-emitting pixel array substrate according to a preferred embodiment of the present invention, and FIG. 6 is an equivalent circuit diagram of one of the elements of FIG. Referring to FIG. 5 and FIG. 6 , the active organic light-emitting halogen array substrate of the present invention comprises a substrate 200 , scan lines φ SL1 , SL2 ~ SLn and data lines DL1 , DL2 DLDLm and a plurality of 配置 arranged on the substrate 200 . In addition to the organic functional layer 212 and the second electrode 214, each of the halogens 206 further includes an active element for driving the light-emitting element, as shown in FIG. 6, which includes at least two a thin film transistor and at least one capacitor and one of the first electrodes connected to one of the thin film transistors. In one example, each of the elements includes a switching transistor 1 , a driving transistor 20 , and a capacitor 30 , and the switching transistor 1 is disposed at the intersection of the scan line • SL and the data line DL. One of the electrode terminals of the driving transistor 2 is connected to the light emitting diode 40. Each of the pixels of the present invention includes a barrier layer structure in addition to the above-mentioned 9 1301728 13055 twfl.doc/d 96/11/30 elements, and at least the organic g energy layer 212 of FIG. 3 and FIG. Self-hole injection layer, hole transmission layer

• 光層、電洞阻擋層、電子傳輸層與電子注入層。θ X • 圖3係繪示本發明一較佳實施例之主動式有機發 ·· 素陣列基板其中一晝素之部分結構示意圖,圖4是^示^ 發明-較佳實施例之主動式有機發光畫素陣列基板之其中 一晝素的剖面示意圖。請參照圖3以及圖4,本發明^主 動式有機發光畫素陣列基板之各畫素2〇6係包括^置在美 • 板200上之薄膜電晶體/電容器與第一電極210、阻 202、有機官能層212以及第二電極214。 同s 在一較佳實施例中,基板200例如是矽基板、玻璃基 板、塑膠基板或是柔性基板。另外,薄膜電晶體/電容器與 第一,極210係配置在基板2〇〇上,其中第一電極會與其 中一薄膜電晶體連接。在一較佳實施例中,各晝素具有一 開關電晶體10、一驅動電晶體2〇以及一電容器3〇(如圖6 所示)。然而,本發明並不限定開關電晶體1〇以及驅動電 ㉟體20之形式,其可以是非晶⑦薄膜電晶體或是多晶石夕薄 擊膜電晶體。同樣的,本發明也不限定電容器3〇之形式,其 係依據電晶體之製程與設計不同而有所不同,例如若上述 電晶體是採用多晶石夕薄膜電晶體,則電容器3〇之下電極例 如是石夕材質。 在圖7中係繪示出與第一電極連接之薄膜電晶體之剖 面示意圖/其係包括配置在基板200上之薄膜電晶體 210b,與薄膜電晶體2i〇b連接之第一電極2i〇a覆蓋住聲 膜電晶體210b以及部分第一電極21〇a之阻隔層2〇2。 1301728 13055twfl.doc/d 96/11/30 特別值得一提的是,本發明々 之薄膜電晶體與電容器的數量,i 旦素内所使用 外,上述之第-雷朽训 其係視實際設計而定。此 二$ 例如是作為陽極之用,1材_ 物及銦辞氧化物其中之㈣,氧化 亦可以作為陰極之用,其材質例如i金屬=極210a 凊繼績參照圖3、圖4與圖7,阻隔層 上 述之各晝素2G6内之薄膜電晶體、電容器以及^二= ^ 一電極21〇’以於第一電極21〇上定義出一開口面積, 於第-電極·周圍的至少一部份的阻隔層2〇2表 ,/、有-凹槽208。在-較佳實施例中,p且隔層2〇2所定 義出之開口面積例如是矩形、橢圓形、圓形。在一較佳實 施例中,Ji述之凹槽·的形狀例如是長條形,且其深度 例如是小於0.3微米。在-較佳實施例中,阻隔層2〇2未 形成有凹槽208之處的厚度例如是小於丨微米。此外,阻 隔層202的材質例如是光阻材料(例如聚亞醯胺在另一• Light layer, hole barrier layer, electron transport layer and electron injection layer. θ X • FIG. 3 is a partial structural diagram of one element of an active organic matrix substrate according to a preferred embodiment of the present invention, and FIG. 4 is an active organic A schematic cross-sectional view of one of the elements of the luminescent pixel array substrate. Referring to FIG. 3 and FIG. 4, each pixel 2〇6 of the active organic light-emitting pixel array substrate of the present invention comprises a thin film transistor/capacitor disposed on the US board 200, and a first electrode 210 and a resistor 202. The organic functional layer 212 and the second electrode 214. In a preferred embodiment, the substrate 200 is, for example, a germanium substrate, a glass substrate, a plastic substrate, or a flexible substrate. In addition, the thin film transistor/capacitor and the first pole 210 are disposed on the substrate 2, wherein the first electrode is connected to one of the thin film transistors. In a preferred embodiment, each element has a switching transistor 10, a driving transistor 2A, and a capacitor 3 (shown in Figure 6). However, the present invention is not limited to the form of the switching transistor 1A and the driving body 35, which may be an amorphous 7 thin film transistor or a polycrystalline thin film transistor. Similarly, the present invention does not limit the form of the capacitor 3〇, which differs depending on the process and design of the transistor. For example, if the transistor is a polycrystalline thin film transistor, the capacitor is under 3〇. The electrode is, for example, a stone material. FIG. 7 is a schematic cross-sectional view showing a thin film transistor connected to a first electrode, which comprises a thin film transistor 210b disposed on a substrate 200, and a first electrode 2i〇a connected to the thin film transistor 2i〇b. The sound insulating film 210b and the barrier layer 2〇2 of the partial first electrode 21〇a are covered. 1301728 13055twfl.doc/d 96/11/30 It is particularly worth mentioning that the number of thin film transistors and capacitors used in the present invention is the same as that used in the first element. And set. For example, the second material is used as an anode, and one of the materials and the indium oxide (4), and the oxidation can also be used as a cathode. The material thereof is, for example, i metal=pole 210a, and the succession is shown in FIG. 3, FIG. 4 and FIG. 7. The thin film transistor, the capacitor, and the second electrode of the respective layers 2G6 in the barrier layer are defined as an opening area on the first electrode 21A, and at least one around the first electrode. Part of the barrier layer 2〇2, /, has a groove 208. In the preferred embodiment, p and the opening area defined by the spacer 2〇2 are, for example, rectangular, elliptical or circular. In a preferred embodiment, the shape of the groove described by Ji is, for example, an elongated shape, and its depth is, for example, less than 0.3 μm. In the preferred embodiment, the thickness of the barrier layer 2 〇 2 where the recess 208 is not formed is, for example, less than 丨 micron. In addition, the material of the barrier layer 202 is, for example, a photoresist material (for example, polyammonium is in another

較佳實施例中,阻隔層202的材質例如是氧化物、氮化物 或是氮氧化物。 由上述之說明可知,由於阻隔層202中係形成有凹槽 208,所以當利用喷墨印刷製程以將有機官能層墨水喷著於 晝素206時,多餘的墨水會流進凹槽208並陷於其中,因 此可以避免墨水流到鄰近的晝素中。 當進行完喷墨印刷製程之後,所形成之有機官能層 212會覆蓋阻隔層202所暴露出之第一電極210上。之後, 所形成之第二電極214則是覆蓋在有機官能層212上,如 11 1301728 96/11/30 13055twfl.doc/d 此即構成完整之主動式有機發光晝素陣列基板之晝素,其 係包括發光二極體40(包含第一電極膜、有機官能層與第 二電極膜)、薄膜電晶體10、20以及電容器30(如圖5所 緣示)。 本實施例之另一種阻隔層之結構如圖8與圖9所繪 示’其係先前所述之圖3與圖4之晝素相似,唯一不同的 是在於阻隔層202表面之凹槽208之側壁係為斜坡狀。In the preferred embodiment, the material of the barrier layer 202 is, for example, an oxide, a nitride or an oxynitride. As can be seen from the above description, since the recess 208 is formed in the barrier layer 202, when an inkjet printing process is used to spray the organic functional layer ink onto the halogen 206, excess ink may flow into the recess 208 and become trapped. Among them, it is possible to prevent the ink from flowing into the adjacent halogen. After the ink jet printing process is completed, the formed organic functional layer 212 covers the first electrode 210 exposed by the barrier layer 202. Thereafter, the formed second electrode 214 is overlaid on the organic functional layer 212, such as 11 1301728 96/11/30 13055 twfl.doc / d, which constitutes a complete active organic light-emitting halogen array substrate, which The system includes a light-emitting diode 40 (including a first electrode film, an organic functional layer and a second electrode film), thin film transistors 10 and 20, and a capacitor 30 (as shown in FIG. 5). The structure of another barrier layer of this embodiment is similar to that of FIG. 8 and FIG. 4 as shown in FIG. 8 and FIG. 9 . The only difference is that the groove 208 of the surface of the barrier layer 202 is The side walls are sloped.

本發明之第二實施例之有機發光晝素陣列基板同樣是 由多數畫素206所構成,而每一晝素之結構如圖1〇與圖 11所示。圖10係繪示本發明另一較佳實施例之主動式有 機發光晝素陣列基板其中一晝素之部分結構示意圖,圖Η 疋繪不本發明另一較佳實施例之主動式有機發光晝素陣列 基板之其中一晝素的剖面示意圖。圖10與圖11所繪示之 畫素與先前所述之圖3與圖4之晝素相似,不同之處在於 阻隔層202之凹槽2〇8内更包括設置有另一阻隔層2〇4。、 在一較佳實施例中,阻隔層2〇4並未填滿凹槽2〇8。在一 ,佳貝%例中,阻隔層204之材質例如是光阻材料(例 聚亞醯胺) 由上述之說明可知,由於阻隔層2G2中係形成有凹槽 所以ϋ於凹208,内的阻隔層204並未填滿凹槽208, 206 ί,多$將有機官能層墨水喷著於晝素 以避免墨槽208並陷於其中 同樣的’當進行完噴墨印刷製程之後,所形成之有機 1301728 13055twfl.doc/d 96/11/30 Π Ϊ會覆蓋,隔層202所暴露出之第一電極210 κ ί所形成之第二電極214則是覆蓋在有機官能層 之*辛,成完整之主動式有機發光晝素陣列基i „、包括發光二極體4Q(包含陽極層 :::、薄膜電晶體10、2°以及儲存電容_‘ 由上述之綱可知,本發明之具有下列優點: 斤提出之主動式有機發光晝素陣列基板中, i喷凹'所以當利用喷墨印刷技術將墨 於;旦素電極上時,多餘的墨水會流進凹槽並陷 於/、中,因此可以避免墨水流到鄰近的畫素。 由於甘本《月之另―種主動式有機發光畫素陣列基板令, 層,'設計有_’且⑽内係配置有一阻隔 :士 U利㈣墨印刷技術將墨水嘴著於各畫 的墨水會流進凹槽並陷於其:將免 墨水流到鄰近的畫素。 j避免 限定:二=2_例揭露如上,然其並非用以 和範園;,當可此技藝者,在不脫離本發明之精神 範之更動與顺,因此本發明之保護 【圏=;】_請專利範圍所界定者為準。 极:製程以形成有機發光畫素陣列基 if:其中一畫素之立體結構示意圖。 Θ疋又照本發明一較佳實施例之主動式有機發光畫 13 1301728 13〇55twfl .doc/d 96/11/30 素陣之其中一晝素之部分結構示意圖。 素=之其中-畫素的二=式有 素_基;一較佳實施例之主動式有機發光畫 圖6疋依照本發明一較伟每 素陣列基板之1中一金音66竺只^ 動式有機發光晝 圖7是依照本發明一較 1 素陣列基,其卜畫素式有機發光畫 j H日林發㈣—較佳實關之 晝素陣列基板之其中-畫素之部分結構示意圖 查音照ίΐ明另—較佳實施例之主動式有機發光 旦素陣列基板之其中—晝素的剖面示意圖。 圖10是紐本發明又—錄實關之絲式有機發 、,旦素陣列基板之其巾—晝素之部分結構示意圖。 ^圖11疋依照本發明又一較佳實施例之主動式有機發 光晝素陣列基板之其中一晝素的剖面示意圖。 【主要元件符號說明】 100、200:基板 101 :喷墨頭 102、104、202、204 ··阻隔層 103 :箭頭 105a、105b、105c :墨水 106、206 :晝素 208 ·•凹槽 14 1301728 13055twfl.doc/d 96/11/30 210 :薄膜電晶體及電極 210a :第一電極 • 210b:薄膜電晶體 ' 212:有機官能層 214 :第二電極 DL、DL1〜DLm :資料線 SL、SL、SL1 〜SLn :掃瞄線 10 :開關電晶體 • 20 :驅動電晶體 30 :電容器 40 :發光二極體(包含第一電極、有機官能層與第二電 極膜)The organic light-emitting halogen array substrate of the second embodiment of the present invention is also composed of a plurality of pixels 206, and the structure of each element is as shown in Figs. 1 and 11 . FIG. 10 is a partial structural diagram of a halogen element of an active organic light-emitting halogen array substrate according to another preferred embodiment of the present invention, and illustrates an active organic light-emitting device according to another preferred embodiment of the present invention. A schematic cross-sectional view of one of the elements of the matrix substrate. The pixel illustrated in FIG. 10 and FIG. 11 is similar to the pixel of FIG. 3 and FIG. 4 previously described, except that the groove 2〇8 of the barrier layer 202 further includes another barrier layer 2〇. 4. In a preferred embodiment, the barrier layer 2〇4 does not fill the recesses 2〇8. In one example, the material of the barrier layer 204 is, for example, a photoresist material (for example, polyamidamine). As described above, since the barrier layer 2G2 is formed with a groove, it is recessed in the recess 208. The barrier layer 204 is not filled with the grooves 208, 206 ί, and the organic functional layer ink is sprayed on the halogen to prevent the ink tank 208 from being trapped therein. The same is formed after the inkjet printing process is completed. 1301728 13055twfl.doc/d 96/11/30 Π 覆盖 will cover, the second electrode 214 formed by the first electrode 210 κ ί exposed by the spacer 202 is covered by the organic functional layer The active organic light-emitting halogen array base i includes a light-emitting diode 4Q (including an anode layer:::, a thin film transistor 10, 2°, and a storage capacitor_'. As can be seen from the above, the present invention has the following advantages: In the active organic light-emitting halogen array substrate proposed by Jin, i is concave, so when ink is printed on the ink electrode by the inkjet printing technology, the excess ink will flow into the groove and be trapped in /, so Avoid ink flowing to adjacent pixels. Thanks to Ganben Another type of active organic light-emitting pixel array substrate, layer, 'design has _' and (10) is configured with a barrier: Shi Uli (four) ink printing technology will ink the ink nozzle into each groove will flow into the groove and Entrapped in it: the ink will be flown to the adjacent pixels. j Avoid the limitation: two = 2_ example disclosed above, but it is not used to and Fan Yuan; Therefore, the protection of the present invention [圏=;]_ is subject to the scope defined by the patent. Extreme: Process to form an organic light-emitting pixel array if: a schematic diagram of a three-dimensional structure of one of the pixels. A preferred organic light-emitting picture 13 1301728 13〇55twfl .doc/d 96/11/30 A schematic diagram of a part of the structure of a single element of the primed matrix. The active organic light-emitting pattern of a preferred embodiment is a gold-tone 66 竺 动 有机 有机 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋Prime array base, its picture-like organic light painting j H Ri Linfa (four) - better real off A schematic diagram of a part of the structure of the pixel array of the pixel array substrate. The schematic diagram of the elemental element of the active organic light-emitting matrix array substrate of the preferred embodiment is shown in Fig. 10. A schematic diagram of a partial structure of a silk-like organic hair, a dentin-based array substrate, and a honeycomb element. FIG. 11 is a schematic diagram of one of the active organic light-emitting halogen array substrates according to still another preferred embodiment of the present invention. Schematic diagram of the cross section of the element. [Main component symbol description] 100, 200: Substrate 101: Inkjet heads 102, 104, 202, 204 · Barrier layer 103: Arrows 105a, 105b, 105c: Ink 106, 206: Alizarin 208 ·• Groove 14 1301728 13055twfl.doc/d 96/11/30 210 : Thin film transistor and electrode 210a: first electrode • 210b: thin film transistor '212: organic functional layer 214: second electrode DL, DL1 to DLm : Data line SL, SL, SL1 to SLn: Scan line 10: Switching transistor • 20: Driving transistor 30: Capacitor 40: Light-emitting diode (including first electrode, organic functional layer and second electrode film)

1515

Claims (1)

1301728 13055twf2.doc/d ST: Ϊ; V.—、ί A 4¾¾正::磁頁丨 97-05-05 十、申請專利範圍: 1·種主動式有機發光元件,其至 一基板; 美板上第/第—軸電晶體與至少—電容,其皆係配置於 一第—電極,係連結於第二薄膜電晶體;以及1301728 13055twf2.doc/d ST: Ϊ; V.—, ί A 43⁄43⁄4 正:: Magnetic page 丨97-05-05 X. Patent application scope: 1. Active type organic light-emitting element, to a substrate; The upper/first-axis transistor and at least the capacitor are disposed on a first electrode and connected to the second thin film transistor; 層’係覆蓋於第―、第二薄膜電晶體、電容之 有—部份阻隔層未覆蓋於第—電極之上而能定義 極之開π面積;其中,該阻隔層至少有一部份位 在弟-電極周圍之上的表面具有一凹槽。 2·如申請專利範圍第1項所述之主動式有機發光元 /、’其中該阻隔層於該第一電極上所定義出之該開口面積 係為矩形、橢圓形、圓形或長條形。The layer 'covers the first, second thin film transistor, and the capacitor has a part of the barrier layer not covering the first electrode and can define an opening π area; wherein the barrier layer has at least a portion of the The surface above the electrode has a groove. 2. The active organic light-emitting element according to claim 1, wherein the opening area defined by the barrier layer on the first electrode is rectangular, elliptical, circular or elongated. . 3·如申請專利範圍第1項所述之主動式有機發光元 件,其中該阻隔層表面之該凹槽的深度係小於0.3微米。 4·如申請專利範圍第1項所述之主動式有機發光元 件,其中未配置有該凹槽之該阻隔層的厚度係小於〇· 1微 米0 5_如申請專利範圍第1項所述之主動式有機發光元 件’其中該阻隔層之材質包括光阻材料。 6·如申睛專利範圍第1項所述之主動式有機發光元 件’其中該阻隔層之材質包括聚亞醯胺。 7·如申請專利範圍第丨項所述之主動式有機發光元 件’其中該阻隔層之材質包括氧化物、氮化物或是氮氧化 物0 16 130172813055twf2.doc/d3. The active organic light-emitting element of claim 1, wherein the groove of the barrier layer has a depth of less than 0.3 micrometers. 4. The active organic light-emitting element according to claim 1, wherein the thickness of the barrier layer not provided with the groove is less than 〇·1 μm 0 5 as described in claim 1 The active organic light-emitting element 'where the material of the barrier layer comprises a photoresist material. 6. The active organic light-emitting element of claim 1, wherein the material of the barrier layer comprises polyamidamine. 7. The active organic light-emitting element of claim </ RTI> wherein the material of the barrier layer comprises an oxide, a nitride or an oxynitride 0 16 130172813055 twf2.doc/d 97-04-03 ▲ tt”專利範圍第1項所述之主動式有機發光元 1»1二,板係選自、魏板、玻璃基板、塑膠基板及 柔性基板至少其中之_。 專利範圍第1項所述之主動式有機發先元 /、中該第一電極係為陽極。 1項所述之主動式錢發光元 x %極之材質係為導電之金屬氧化物。 豆中兮利圍第10項所述之主動式有機發光元 及氧:銦至少化物係選自氧化銦錫、氧化鋁鋅 範圍第1項所叙絲式錢發光元 ” T該第一電極係為陰極。 1項崎之絲狀機發光元 之材f係為金屬或合金。 其中該第圍曰第/項所述之主動式有機發光元 1二1:電晶體係為一開關電晶體。 # Λ中兮ϋ利範圍第14項所述之主動式有機發光元 日體係為非晶珍薄膜電晶體或是多_ 件,1贿社絲林機發光元 Ϊ7如由咬击賴电晶體係為一驅動電晶體。 =·如申#專利範圍第16項所述之主動 Ϊ膜電IS驅動電晶體係為非嘯電晶體或是多: 申吻專利觀圍第1項所述之主動式有機發光元 件 件 件 件 件 件 17 |W 日修 1301728 13055twf2.doc/d 97-04-03 - 件,其中位於該第一雷托、息&amp; 19•如申請專利,且隔層侧壁係為斜坡狀。 • · 件,電絲/圍 項所述之絲式有機發光元 件/、中亥電奋盗之下電極之材質係為石夕。 2〇. 一種主動式有機發光元件,其至少包含. 一基板; ^ 板上至少兩個溥膜電晶體與至少一電容,其皆係配置於基 第_电極,係連結於該任一薄膜電晶體;以及 -阻隔層,係覆蓋於薄膜電晶體、電.容之上且至 層2蓋於第一電極之上而能定義出第-電極 表=有==至少有—部份位在第一電極 林2i·中如 =專爲利範圍第20項所述之主動式有機發光元 ί牛i,、中&quot;1層於該第—電極上所定義出之該開口面積 係為矩形、橢圓形、圓形或長條形。 、 杜12由如=請專利範圍第20項所述之主動式有機發光元 件’,、中^隔層表面之該凹槽的深度係小於0.3微米。 怂2m專士利範圍第2〇項所述之主動式有機發光元 件’,、中未配置有該凹槽之該阻隔層的厚度係小於〇1微 米。 * 申請專利範圍第2Q項所述之主動式有機發光元 件’…中遠阻隔層之材質包括光阻材料。 25.如申請專利範圍第2〇項所述之主動式有機發光元 件,其中該阻隔層之材質包括聚亞醯胺。 26·如申請專利範圍第2〇項所述之主動式有機發光元 1301728 13055twf2.doc/d ¥ 4:月(更.)正督換頁 97-04-03 件,其中该阻隔層之材質包括氧化物、氮化物或是氮氧化 物。 27·如申請專利範圍第20項所述之主動式有機發光元 件,其中該基板係選自矽基板、玻璃基板、塑膠基板及矛 性基板至少其中之一。 $ 28·如申请專利範圍第2〇項所述之主動式有機發光元 件’其中該第一電極係為陽極。 29·如申^請專利範圍第2〇項所述之主動式有機發光元 件,其中該第-電極之材質係為導電之金屬氧化物。 政申利範圍第29項所述之主動式有機發光元 件二/二广电之金屬氧化物係選自氧化錮錫、氧化銘鋅 及乳化鋼辞至少其中之一。 件 專利範圍第2〇項所述之主動式有機發光元 中该弟一電極係為陰極。 件 $中如兮=]範目第2g項所狀絲料機發光元 一中該苐一%極之材質係為金屬或合金。 件 =·中如申,上利範圍第2°項所述之主動式有機發光元 其中一薄臈電晶體係為開關電晶體。 件 申門n利曰範圍第33項所述之主動式有機發光元 薄膜電曰^電曰曰體係為非晶石夕薄膜電晶體或是多晶石夕 件Λ5中如範圍第20項所述之主動式有機發光元 件其中另—溥膜電晶體係為驅動電晶體。 件,3λ如圍第35項所述之主動式有機發光元 件純動電日曰體係為非晶石夕薄膜電晶體或是多晶石夕 19 1301728 13055twf2.doc/d 97-04-03 月。卩疹(更)正替換頁 薄膜電晶體。 件,其中^申於&quot;該專第心^第=所述之主動式有機發光元 狀。 °膜邊緣之該阻隔層侧壁係為斜坡 件,第2G項所述之絲式有機發光元 仵η電谷益之下電極之 39· 一種主動式有機發光元件,其至少才包貝含: ^基板, 基板上 第-/第二薄臈電晶體與至少一電容,其皆係配置於 9 第-電極,係連結於第二薄膜電晶體; 〜J 5^3層’係覆蓋於第一、第二薄膜電晶體、電 谷之上且至f有—部份第-阻隔層未覆蓋於第-電極之上 而能定義出第-電極之開Π面積;其中,該第—阻隔層至 少有一部份位在第—電極·之上的表面具有-凹槽^以 及97-04-03 ▲ tt"The active organic light-emitting element 1»1 according to item 1 of the patent scope, the board is selected from at least one of the Wei board, the glass substrate, the plastic substrate and the flexible substrate. The active organic hair precursor/in the first item is an anode. The active carbon light element x% of the material described in the item 1 is a conductive metal oxide. The active organic light-emitting element and the oxygen-indium compound according to Item 10 are at least selected from the group consisting of indium tin oxide and aluminum oxide zinc, and the first electrode is a cathode. The material f of the item 1 is a metal or alloy. The active organic light-emitting element described in the above-mentioned Item / Item 1 2: The electro-crystalline system is a switching transistor. # The active organic light-emitting day system described in item 14 of the profit-making range of the middle is an amorphous thin-film transistor or a multi-piece, and the british silk machine is a light-emitting system. It is a drive transistor. =·############################################################################################## Item 17 | W 日修1301728 13055twf2.doc/d 97-04-03 - The piece is located in the first Leito, the interest &19; as claimed, and the side walls of the compartment are sloped. • · The wire, the wire-type organic light-emitting element described in the wire/enclosure, and the material of the electrode under the Zhonghai Electric Strike are Shi Xi. An active organic light-emitting device comprising at least one substrate; ^ at least two germanium film transistors and at least one capacitor on the plate, both of which are disposed on the base electrode, and are connected to the film a transistor; and a barrier layer overlying the thin film transistor, the electrical capacitance and above the layer 2 overlying the first electrode to define a first electrode table = yes == at least - part of the The first electrode forest 2i·中如= for the active organic light-emitting element described in item 20 of the profit range ί 牛 i,, middle &quot; the opening area defined by the first layer on the first electrode is a rectangle , oval, round or long. , Du 12 by the active organic light-emitting element as described in claim 20, wherein the groove of the surface of the interlayer has a depth of less than 0.3 μm. The active organic light-emitting element of the item 2 of the m2m 士士利范围, the thickness of the barrier layer in which the groove is not disposed is less than 〇1 μm. * The active organic light-emitting element described in the patent application scope 2Q... The material of the medium-distance barrier layer includes a photoresist material. 25. The active organic light-emitting device of claim 2, wherein the material of the barrier layer comprises polyamidamine. 26· The active organic light-emitting element 1301728 13055twf2.doc/d as described in the second paragraph of the patent application scope is: 4: month (more.), the official page is changed to 97-04-03, wherein the material of the barrier layer includes oxidation. Matter, nitride or oxynitride. The active organic light-emitting element according to claim 20, wherein the substrate is at least one selected from the group consisting of a germanium substrate, a glass substrate, a plastic substrate, and a spear substrate. The active organic light-emitting element of the invention of claim 2, wherein the first electrode is an anode. The active organic light-emitting element according to claim 2, wherein the material of the first electrode is a conductive metal oxide. The metal oxide of the active organic light-emitting element 2/2 radio and television mentioned in the 29th item of Zheng Shenli is selected from at least one of yttrium tin oxide, oxidized zinc and emulsified steel. In the active organic light-emitting element described in the second aspect of the patent, the first electrode is a cathode. Pieces of the material such as 兮 =] 目目 2g item of the filament machine illuminating element in the first one of the material is a metal or alloy. Pieces =· Zhongru Shen, the active organic light-emitting element described in item 2 of the upper range. One thin-thickness electro-crystal system is a switching transistor. The active organic light-emitting element thin film electro-hydraulic system described in item 33 of the Shenmen n Liwei range is an amorphous thin-film transistor or a polycrystalline stone Λ5 as described in the scope 20 The active organic light-emitting element of which is another 溥 film electro-crystal system is a driving transistor. Piece, 3λ, such as the active organic light-emitting element described in Item 35, the pure electrokinetic solar corona system is amorphous austenitic thin film transistor or polycrystalline lithos 19 1301728 13055twf2.doc/d 97-04-03 month. Pityriasis (more) is replacing the page of the film transistor. Piece, in which ^ is applied to &quot; the special heart ^ the = the active organic light-emitting element. The sidewall of the barrier layer at the edge of the film is a ramp member, and the electrode of the wire-type organic light-emitting element described in item 2G is an active organic light-emitting element, which is at least included in the film: ^ substrate, the first / second thin germanium transistor on the substrate and at least one capacitor, which are arranged at 9 first electrode, connected to the second thin film transistor; ~ J 5 ^ 3 layer ' is covered by the first a second thin film transistor, an electric valley, and a portion of the first barrier layer not covering the first electrode to define an opening area of the first electrode; wherein the first barrier layer is at least a portion of the surface above the first electrode has a groove ^ and 一第二阻隔層’配置在該第-阻隔層表面之凹槽内。 =·如申^ __39項所述之主動式有機發光元 件’其中該弟-阻隔層於該第—電極上岐義出之該開口 面積係為矩形、橢圓形、圓形或長條形。 41.如申請專利範圍第39項所述之主動式有機發光元 件’其中該第-阻隔層表面之該凹槽的深度係小於0.3微 米0 42.如申請專利範圍第39項所述之主動式有機發光元 件,其中未配置有該凹槽之該第—阻隔層的厚度係小於 20 却少另曰修(吏)正替換頁 - 97-04-03 0.1微米。 43·如申請專利範圍第39項所述之主動式有機發光元 件,其中該第一阻隔層之材質包括光阻材料。 44·如申請專利範圍第39項所述之主動式有機發光元 件,其中該第一阻隔層之材質包括聚亞醯胺。 45·如申請專利範圍第39項所述之主動式有機發光元 件,其中該第一阻隔層之材質包括氧化物、氮化物或是氮 氧化物。 46·如申請專利範圍第39項所述之主動式有機發光元 件,其中該基板係選自矽基板、玻璃基板、塑膠基板及柔 性基板至少其中之一。 47·如申請專利範圍第39項所述之主動式有機發光元 件,其中該第一電極係為陽極。 48·如申請專利範圍第39項所述之主動式有機發光元 件,其中該第一電極之材質係為導電之金屬氧化物。 49·如申請專利範圍第48項所述之主動式有機發光元 件’其中該導電之金屬氧化物係選自氧化銦錫、氧化鋁鋅 及氧化銦辞至少其中之一。 50·如申請專利範圍第39項所述之主動式有機發光元 件’其中該第一電極係為陰極。 51·如申,專利範圍第39項所述之主動式有機發光元 件,其中該第一電極之材質係為金屬或合金。 52·如申J青專利範圍第39項所述之主動式有機發光元 件’其中該第-薄膜電晶體係為一開關電晶體。 53·如申請專利範圍第52項所述之主動式有機發光元 21 1301728 13055twf2.doc/d 日修 (更)正替換頁 97-04-03 ==開關電晶體係為非崎電晶體或是多晶梦 件,Hymt39撕狀找料機發光元 甲X弟—薄膜電晶體係為一驅動電晶體。 株f由如申請專利範圍第54項所述之主動式有機發井开 薄膜電=驅動電晶體係為非晶料膜電晶體或是ί晶石夕 件,其56中::d圍:39項所述之主動式有機發光元 57 2ίΪί —ΐ邊緣之該阻隔層㈣係為斜坡狀。 件,1^㈣39項所狀絲林機發光元 ,、Τβ亥電奋益之下電極之材質係為矽。 件 L8·中如至申39項所狀饰切機發光元 ^ 夕有&quot;卩份之該凹槽未被該阻隔層埴滿。 件 ^中如^專^範圍第39項所述之主動式有機發光元 ,、中該阻隔層之材質包括光阻材料。 件 10中如==範目第39項麟之絲式有機發光元 中&quot;亥阻隔層之材質包括聚亞醯胺。 61· —種主動式有機發光元件,其至少包 一基板; 至少兩個薄膜電晶體與至少一電容,其皆係配置於基 板上; ^電極,係連結於該任一薄膜電晶體;以及 一第一阻隔層,係覆蓋於薄膜電晶體、電容之上且至 少有-部份第-阻隔層未覆蓋於第一電極之上而能定義出 第-電極之開口面積;其中,該第一阻隔層至少有一部份 22 1301728 13〇55twf2.doc/dA second barrier layer ' is disposed in the recess of the surface of the first barrier layer. The active organic light-emitting element as described in claim __39, wherein the opening area of the barrier layer on the first electrode is rectangular, elliptical, circular or elongated. 41. The active organic light-emitting device of claim 39, wherein a depth of the groove of the surface of the first barrier layer is less than 0.3 micrometers. 42. Active according to claim 39 The organic light-emitting element, wherein the thickness of the first barrier layer not provided with the groove is less than 20 but less than another (页) positive replacement page - 97-04-03 0.1 micron. 43. The active organic light-emitting device of claim 39, wherein the material of the first barrier layer comprises a photoresist material. 44. The active organic light-emitting device of claim 39, wherein the material of the first barrier layer comprises polyamidamine. The active organic light-emitting device of claim 39, wherein the material of the first barrier layer comprises an oxide, a nitride or an oxynitride. The active organic light-emitting element according to claim 39, wherein the substrate is at least one selected from the group consisting of a germanium substrate, a glass substrate, a plastic substrate, and a flexible substrate. 47. The active organic light-emitting device of claim 39, wherein the first electrode is an anode. 48. The active organic light-emitting device of claim 39, wherein the material of the first electrode is a conductive metal oxide. 49. The active organic light-emitting device of claim 48, wherein the conductive metal oxide is selected from at least one of indium tin oxide, aluminum zinc oxide, and indium oxide. 50. The active organic light-emitting device of claim 39, wherein the first electrode is a cathode. The active organic light-emitting element of claim 39, wherein the material of the first electrode is a metal or an alloy. 52. The active organic light-emitting element of claim 39, wherein the first-thin-film electro-crystalline system is a switching transistor. 53. Active organic light-emitting element 21 as described in claim 52. 1301728 13055twf2.doc/d Japanese repair (more) is being replaced by page 97-04-03 == Switching electro-crystal system is non-Saki Electric crystal or Polycrystalline dream piece, Hymt39 tear-shaped looking machine luminous element X brother - thin film electro-crystal system is a driving transistor. The strain f is made up of the active organic well-opening thin film electric electric drive system as described in claim 54 of the patent application, and the amorphous electric film crystal system is an amorphous material film crystal or a quartz crystal piece, wherein: 56::d: 39 The active organic light-emitting element (57) of the active organic light-emitting element described in the section has a slope shape. Piece, 1^(4) 39 items of the silk machine illuminating element, and the material of the electrode under the Τβ海电奋 benefit is 矽. L8·中如至申39 item of the cutting machine luminous element ^ 夕有&quot; The groove is not filled by the barrier layer. The active organic light-emitting element according to item 39 of the general specification, wherein the material of the barrier layer comprises a photoresist material. In item 10, the =######################################################### An active organic light-emitting device comprising at least one substrate; at least two thin film transistors and at least one capacitor disposed on the substrate; an electrode connected to the thin film transistor; and a a first barrier layer covering the thin film transistor and the capacitor and at least a portion of the first barrier layer not covering the first electrode to define an opening area of the first electrode; wherein the first barrier At least one part of the layer 22 1301728 13〇55twf2.doc/d 97-04-03 位衫:電極周圍之上的表面具有一凹槽;以及 621 一由阻Λ層,位於該第一阻隔層表面之該凹槽内。 件,i中今第m圍第61項所述之主動式有機發光元 口面積=於該第—電極膜上所定仙之該開 觀馬矩形、橢圓形、圓形或長條形。 件Λ3·中&quot;;申第請,範圍第61項所述之主動式有機發光元 ^。八中料—阻隔層表面之該凹槽的深度係小於0.3微 件蝴機發光元 01微米。$&quot;凹槽之該阻隔層的厚度係小於 件 L5·中如利範圍第61項所述之主動式有機發光元 其中該弟—阻隔層之材質包括光阻材料。 件 撕狀主喊有機發光元 /、甲/弟阻隔層之材質包括聚亞醯胺。 件 6Λ如該項所狀主喊有機發光元 〜二 層材質包括氧化物、氮化物或是氮 氧化物。 68·如申明專利範圍帛61項所述之主動 件,其中該基板係選自錢板、玻璃基板、塑膠紐^ 性基板至少其中之一。 $ 彼6甘9^f專利補第61項所述之主動式有機發光元 件’其中該第一電極係為陽極。 70·如申料職圍第61項所述之絲式有機發光元 件,其中該第-電極之材質係為導電之金屬氧化物。 23 1301728 13055twf2.doc/d97-04-03 Shirt: the surface above the electrode has a groove; and 621 is a barrier layer located in the groove of the surface of the first barrier layer. The active organic light-emitting element area as described in item 61 of the mth circumference of i today is the rectangular, elliptical, circular or elongated shape of the open horse on the first electrode film. Λ3·中&quot;; Shen Di, the active organic light-emitting element described in the scope of item 61. Eight medium material—the depth of the groove on the surface of the barrier layer is less than 0.3 micron. The thickness of the barrier layer of the $&quot; groove is smaller than that of the active organic light-emitting element described in Item 61 of the L5. The material of the barrier layer includes a photoresist material. The material of the tear-off main shouting organic light-emitting element /, A / brother barrier layer includes polyamidamine. Article 6 Λ 该项 有机 有机 有机 有机 有机 有机 有机 ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ ~ 68. The active component of claim 61, wherein the substrate is selected from at least one of a money board, a glass substrate, and a plastic substrate. The active organic light-emitting element described in the 61st patent of the invention is wherein the first electrode is an anode. 70. The wire-type organic light-emitting device of claim 61, wherein the material of the first electrode is a conductive metal oxide. 23 1301728 13055twf2.doc/d 97-04-0397-04-03 71·如申請專利範圍第7〇項所述之主動式有機發光元 件’其中該導電之金屬氧化物係選自氧化銦錫、氧化銘鋅 及氧化銦鋅至少其中之一。 72·如申請專利範圍第61項所述之主動式有機發光元 件,其中該第一電極係為陰極。 73·如申請專利範圍第61項所述之主動式有機發光元 件,其中該第一電極之材質係為金屬或合金。 74·如申請專利範圍第61項所述之主動式有機發光元 件,其中一薄膜電晶體係為開關電晶體。 75·如申請專利範圍第74項所述之主動式有機發光元 件’其中该開關電晶體係為非晶砍薄膜電晶體或是多晶石夕 薄膜電晶體。71. The active organic light-emitting device of claim 7, wherein the conductive metal oxide is at least one selected from the group consisting of indium tin oxide, zinc oxide, and indium zinc oxide. The active organic light-emitting device of claim 61, wherein the first electrode is a cathode. 73. The active organic light-emitting device of claim 61, wherein the first electrode is made of a metal or an alloy. 74. The active organic light-emitting element of claim 61, wherein the thin film electro-crystalline system is a switching transistor. 75. The active organic light-emitting device of claim 74, wherein the switch transistor system is an amorphous chopped film transistor or a polycrystalline film transistor. ▲ 7甘\如申請專利範圍第61項所述之主動式有機發光元 件,另一薄膜電晶體係為驅動電晶體。 此,1\如兮申1 專利範圍第76項所述之主動式有機發光元 薄膜^晶^動電晶體料非晶⑨賊電晶體或是多晶石夕 件,其78中第61項所述之主動式有機發光元 79,如中邊緣之該阻隔層侧壁係為斜坡狀。 其中該電容哭之H第61項所述之主動式有機發光元 80 下電極之材質係為矽。 其中至少月有園第61項所述之主動式有機發光元 8'ι·如申請專m之該凹槽未频阻隔層填滿。 其中該阻隔層之項所述之主動式有機發光元 〈材質包括光阻材料。 件 件 件 24 1301728 13055twf2.doc/d .......... __·ιιιι_ι__1 年1日修(更)正替換頁 97-04-03 82.如申請專科範圍第61項所述之主動式有機發光元 件,其中該阻隔層之材質包括聚亞醯胺。▲ 7 Gan \ If the active organic light-emitting element described in claim 61 is applied, the other thin-film electro-crystal system is a driving transistor. Therefore, 1\, such as the active organic light-emitting element film according to the 76th patent of the patent application, the crystallized electro-optical crystal material, the amorphous 9 thief transistor or the polycrystalline stone, the 61st item of 78 The active organic light-emitting element 79, such as the middle edge of the barrier layer, has a sloped shape. The material of the lower electrode of the active organic light-emitting element 80 described in Item 61 of the capacitor crying H is 矽. At least the active organic light-emitting element described in Item 61 of the Moon has been filled with the groove of the frequency band of the application. The active organic light-emitting element (the material mentioned in the item of the barrier layer) comprises a photoresist material. Piece piece 24 1301728 13055twf2.doc/d .......... __·ιιιι_ι__1 Year 1 repair (more) replacement page 97-04-03 82. If you apply for the scope of the specialist section 61 An active organic light emitting device, wherein the material of the barrier layer comprises polyamidamine. 25 1301728 13055twfl.doc/d 96/11/30 七、 指定代表圖: (一) 、本案指定代表圖為:圖3 (二) 、本代表圖之元件代表符號簡單說明: 200 :基板 202 :阻隔層 206 ··畫素 208 :凹槽 210 :薄膜電晶體及第一電極 八、 本案若有化學式時,請揭示最能顯示發明特徵 的化學式: 無25 1301728 13055twfl.doc/d 96/11/30 VII. Designated representative map: (1) The representative representative figure of this case is: Figure 3 (2), the representative symbol of the representative figure is a simple description: 200: Substrate 202: Barrier Layer 206 · · pixel 208 : groove 210 : thin film transistor and first electrode VIII. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention:
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI512706B (en) * 2010-03-16 2015-12-11 Samsung Display Co Ltd Pixel and organic light emitting display including the same
TWI565050B (en) * 2012-10-22 2017-01-01 三星顯示器有限公司 Organic light emitting display and method of manufacturing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI512706B (en) * 2010-03-16 2015-12-11 Samsung Display Co Ltd Pixel and organic light emitting display including the same
TWI565050B (en) * 2012-10-22 2017-01-01 三星顯示器有限公司 Organic light emitting display and method of manufacturing the same

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