.1294145 * 九、發明說明： 【發明所屬之技術領域】 本發明係有關於一種製作半導體元件之設備，特別是有關於一 種可即時監控電漿侷限環（plasma confinement ring或wafer pressure ring或WAP ring)作動以及驅動該電漿侷限環動作之連動 栓軸（plunger shaft)的乾蝕刻設備。 藝 【先前技術】 電水乾姓刻可以用來在晶圓的不同材料層上钱刻出所要的導 線或70件圖案，其在目前的積體電路元件製程中，仍為一不可或 缺的半導體技術。-般而言，用來實施電漿乾侧的乾钱刻設備 白匕括有反應至设體，其内配置有相互平行的上、下電極，待 姓刻的ΒΘ®則是被放置於下電極，並使反應氣體通人反應室内， 然後利用適當的無線電波功率使通人反應室⑽反應氣體在兩平 ^行的上、下電極之間發生碰撞，產生電裝，進而使晶圓表面接觸 電漿以進行蝕刻。 近來已有許多相關的研究將其重點放在如何使無線電波功率 產生的電聚能夠被侷限在上、下電極之間的局部空間，並致力於 使電漿能夠㈣地更加均勻，以使_更有效率。為達成此目的， 在某些機型的乾侧設備中已加入一種稱為「電聚偈限環」的元 件、，其係配置圍繞在電極的周圍，並且可升降運動，用來使電襞 可以盡量地被侷限在晶圓上方的局部區域。 1294145 ηBACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for fabricating a semiconductor component, and more particularly to a plasma confinement ring or a wafer pressure ring or a WAP ring. a dry etching apparatus that operates and drives a plunger shaft of the plasma confinement ring. Art [Previous Technology] The electric water dry name can be used to engrave the desired wire or 70 patterns on different layers of the wafer, which is still indispensable in the current integrated circuit component process. Semiconductor technology. In general, the dry money engraving equipment used to implement the dry side of the plasma includes a reaction to the body, in which the upper and lower electrodes are parallel to each other, and the ΒΘ® to be surnamed is placed under The electrode, and the reaction gas is passed into the reaction chamber, and then the reaction gas of the reaction chamber (10) is collided between the upper and lower electrodes of the two cells by appropriate radio wave power to generate an electric device, thereby making the surface of the wafer Contact the plasma for etching. Recently, many related studies have focused on how to make the electric power generated by radio wave power be confined to the local space between the upper and lower electrodes, and to make the plasma more uniform (4) so that _ more efficient. In order to achieve this, an element called "Electrical Confinement Ring" has been added to the dry side equipment of some models, which is arranged around the electrode and can be moved up and down for electric power. It can be limited as much as possible to a local area above the wafer. 1294145 η
I > ， 請參财1圖’其繪示狀習知技藝之她刻設備部分組件的 剖面示意圖。如第i圖所示，乾侧設備10包括有一下部組件12 以及-上部組件13’其中下部組件12通常又包括有一碟狀靜電式 晶圓座（electros她 chuck，ESC) 12a、對準環（f〇cusring) 12^ 及地環（groundring) 12c。靜電式晶圓座仏係用來放置一晶圓 ‘ 2〇 ’同¥通常又作為-下電極（或陽極），對準環⑶則沿著靜電 .式晶圓座12a周圍配置。上部組件13通常包括有一上電極叫或 • 陰極）以及一電漿侷限環16，包覆在上電極η周圍。 聰示，賴侷限環16 一般包括有較厚的轉 nng) ^ ’以制定在扭轉環⑹下方，厚度較_三個次環16b、 12 13 應至双體25中，使其可以在真空魏下操作。 電漿侷限環16通常是由三個（第1圖中僅顯示且中之一）連』 所支撐平衡，並由連動栓軸32帶動‘ 下之升降勒，而母-個__32 滾輪34固定連接，可移動式下滾輪34__彈性=移= 彈黃（圖未不），與相對應的—固定 、， 滚輪之H城凸輪W，其辟_2所打向 =吏上、下滾輪之間產生位移，並帶動連動栓㈣，如 ，娜40的機械力與彈簧的回復彈力，讓電 ： 以在弟圖所示的「待機位置」與第2圖所示的「工作位置2 6 1294145 間做升降運動。 然而，使用到電漿侷限環16的乾綱設㈣，复 電極Μ與電襞舰環16之間的間隙18十分狹小，通常僅=1 吋左右，或甚至更小。#進行乾细_ . 行升降作動的過程中，若三個連動栓㈣之間的運^= ==細爾物輪嶋 ， 而導致上電極14側壁發生碰撞或摩擦，產圓 ^響產品的良率。前述造成連動_32之間運動行=== 因，例如’連繫上、下滚輪的彈菁彈性疲乏或 致的原 它零件的磨損。 或其 由此可知，上述習知技藝仍有缺點需要進-步的改良及改盖’ 而業界目前需要的是_種可㈣監控帶動電襞侷 ⑽ 其運動行程-不-致的預細，藉此避= 圓及\品的Γ4婦發生碰撞或縣，產娜，影響到晶 【發明内容】 本毛月之主要目的即在提供—種警示及監控祕，可 帶動電漿侷限環升降的造 现控 拿的連動栓軸，藉此避免電漿侷限環與上電極 側壁發生碰撞或摩捧，姦 產生顆粒，影響到晶圓及產品的良率。 1294145 根據本發明讀佳實補，本發明提供—種可監控電漿褐π 作動的紐刻設備，包括有-反應室殼體，其内設有一上部㈣^ 以及-下部組件，其中該下部組件包括有一電聚侷限環，圍繞 一上電極的周圍；複數個連動栓軸，與該電漿侷限環連社，= 該複數個連動栓軸分別與相對應之一可移動式下滾輪連^，μ 可移動式下滾輪又分別與相對應之一固定式上滾輪透過一彈性^ 置相連繫，·-環狀凸輪，介於該可移動式下滾輪與該固定式： 輪之間’藉由往復地移動’使該電漿侷限環得以升降作動；以及' 一光學監控系統’包括有—光收發裝置以及複數個光學反射件， 其分別固定在相對應之該可移動式下滾輪或者相對應之該連動栓 2上，其中該紐發裝置可發出—光束，藉由該複數個光學反射 4的反射，最終將該光歧射職紐魏置树。 根據本發明之另-較佳實施例，本發明提供—種可監控懸吊物 ^升降作動的光學監控系統，包含有—待監控物件，連接至複數 個連動祕，其巾該魏個軸絲細立地朗步往復上 ，動’並▼動該待監控物件水平地精作動；—光收發裳置，固 二置於細數個軸細之以及減個絲反射件，分別 口疋在相對應之該連動絲上，其中該光收發裝置可發出一 彻嶋，細爾反射, 種可監控物件形 根據本《明之另_較佳實施例，本發明提供一 •1294145 '變的光學監控系統，包含有—光收發裝置，蚊設置於一待於控 物件之上；以及複賴絲反射件’分顧定在鱗監控物敎 之其它監控位置，其中該献發裝置可發出—光束，藉由該複數 個光學反射件的反射’最終將該光束反射回該光收發裝置本身。 .—為了使貴審查委員能更進-步了解本發明之特徵及技術内 -a ’雜_下有關本發明之詳細說明與_。然崎附圖式僅 • 供參考與說明用，並非用來對本發明加以限制者。 【實施方式】 以下即藉由第3 ®至第6 ®詳細說明本發明較佳實施例，其中 相關圖式中若有相同的it件則仍沿用相_符號說明，使其一致。 請參閱第3 ®，魏示岐本發明健實_之乾侧設備部 分組件的示_，包括賴舰環、連動姉與光學監控系 統之相對配置。如第3圖所示，本發明乾侧設備励同樣包括 有-下部組件12以及-上部組件13，其中下部組件12以及上部 組件13找安裝在-反應室殼體25巾，使其可以在真空環境下 下部組件12包括有—碟狀靜電式晶圓座（ESC) 12a、對準環 12b以及地環12c，其中靜電式晶圓座仏係用來放置一晶圓如， 同時通常又作為一下電極（或陽極）；對準環既則沿著靜電式晶 9 J294145 圓座12a周圍配置，主要是用來使電漿的密度更加均勻，其可以 是由純銘、經過陽極處理触、不鏽鋼或其它材料構成。 上部組件13包括有—上電極14 (或陰極）以及—電漿揭限環 16 ’圍繞包覆在上電極M的周圍。f漿侷限環10包括有較厚的 .扭轉環16a，以及固定在扭轉環16a下方，厚度較薄的三個次環 .16b、16c及16d，但不限於此。#進行電歸刻製程時，電聚偈 • 轉16下降直到接觸到地環12c的表©，藉此將產生的電漿盡量 侷限在上、下電極之間以及晶圓2〇的上方反應空間。 電漿偈限環I6可以是由石英、陶莞材料或其它不易受電裝侵 餘的材料所構成。此外，#進行賴·，反應氣體可經 由配置在上電極14中央的進氣管路通人反應室内，在上電極^ 上^以另設有導流板(圖未示)。經反應的氣體及副產物則是利用— 真空泵浦(®未示)抽出反應室。前述的反錢體分子經由施加在 上、下電極的無線電功率而產生劇烈碰撞，產生 20表面進行餘刻反應。 隹曰曰圓 根據本發明之較佳實施例，電漿侷限環16由三個（第3圖中僅 顯示其中之―）連動栓軸32所支撐平衡，並由連動栓㈣帶動立 上、下之升降運動，而每-個連動栓軸32的另一端又與一可移動 之下滾輪34固定連接，可移動式下滾輪34則利用—彈性装置， 例如彈簧（圖未示），與相對應的—固定之上滾輪％相連繫。同樣 1294145 的’在上、下滾輪之間設有一環狀凸輪4〇， 向往復地移動，使上、下滾輪之間產生位移，並°帶動斤示方 如此’藉由環狀凸輪4。的機械力與彈簧 環16得以「待機位置」與「桌置」之間做升降^電水偈限 如前所述’她嶋侷限環16的乾糊設㈣ 於上電極14與賴侷限環16之間犧料分狹小。 _侧製獅需使電漿舰環16進行升㈣ ^ =乾 =_行程不一致，即使僅有微小的偏差= 成電聚侷限環16的傾斜，而導致上電極14側錄 ’污__且影響產品的良率。造成連動检:幻二 原因可能是連繫上、下滚輪的彈菁彈性疲乏或 考上下滾輪或其它零件的磨損等等。 ►統6=^參_ 4至第5圖’鱗示的分別是本發明光學監控系 圖 #的餘刻設備組件之平面配置示意圖以及立面示意 :二I:免先前技藝所可能導致賴侷限環16與上電極14側 或縣而發生_粒污染，本發籠佳實施例提供一 4予監控系統6〇，其包括三組光學組件60a、_及60c，如第 ^所不’料城凸輪4()的外侧緣分別配置在⑽度角的相 今立置上。根據本發明較佳實施例，光學組件咖包括有一雷射 魏置62a，其固定在一支撐件咖的上端。光學組件包括 一光學反射件62b，其固定在一支撐件_的上端。光學組件 .1294145 —6〇C包括有一光學反射件62c，其固定在-支撐件64c的上端。 基本上，光學組件6Ga的雷射收發裝置必、光學組件_的 光學反射件62b以及光學組件60c的光學反射件必係配置在同 -平面上。光學組件60a❺雷射收發裝置62以系對準光學組件_ .的光學反射件62b發射-雷射光束72，在電漿條環16進行升降 ，的過程中，以正常情形來說，雷射光束72可以被光學組件_的 籲絲反射件必反射(光束叫並重新引導反射光的方向朝向光學 組件60c的光學反射件62c，最後，再藉由光學反射件62c的反射， 將雷射(光束76)引導回光學組件6〇a的雷射收發裝置必，並由其 偵測器接收。 但是，當系統發生異常狀況，例如，由於彈簧彈性疲乏或者上、 下滾輪或其它零件的磨損料因素，三個連動栓軸32之間的運動 • 行程不-致，或其中之一失常而無法作動，此時，光學組件偷 的雷射收發裝置62a由於原本的光徑被破壞將無法偵測到任何反 射光束。此時，如第5圖所示，光學組件6〇a的雷射收發裝置62a 將觸動警不裝置80，例如警鈴或警示燈號，藉此通知操作員前來 維護。另外，光學組件60a的雷射收發裝置62a亦可以傳送一信 號給控制單元90，而即時停止環狀凸輪4〇以及連動栓轴32，避 免電裝偈限環16與上電極14侧壁發生碰撞或摩擦而可能發生的 顆粒污染。 12 • 1294145 ‘如第3圖所示，根據本發明之較佳實施例，光學組件60a的雷 射收毛衣置62a以及光學反射件62b與62c皆設於較固定式上滾 輪36高出-高度η之位置，其中高度H需大於或等於電裝偈限 裱16在前述「待機位置」與「工作位置」之間的最大升降距離。 車乂為重要者’固疋式上滚輪36不應妨細彳光學組件6Qa的雷射收 發裝置62a以及光學反射件62b與62c之間的光徑。 _ 根據本發明之較佳實施例，各個支撐件64a、6牝及6如的另 外一端則與個別相對應的可移動式下滾輪34或者連動栓軸32相 固定連接，如此使雷射收發裝置62a以及光學反射件62b與62e 能與相對應的可移動式下滾輪34或者連動栓轴32同時升起或降 下。根據本發明之較佳實施例，支撐件64a、64b及64c可以是由 不鏽鋼或金屬等較堅固之材料所構成，但並不限於所舉之不鏽鋼 或金屬，亦可為非金屬。 •根據本發明之較佳實施例，光學反射件62b與62c可以是鏡子 或者任合適合的光反射表面，例如後面有背膠的反光貼紙，又或 者，光學反射件62b與62c可以是光纖元件。此外，本發明並不 侷限在雷射光束之使用，其它的光源，例如紅外線或發光二極體， 亦可為光源，僅需在某些情況下，為了使光束截面積更為集中或 者调整光線能量，可視情況增加一些外部的光學元件。另外，對 於本發明光學監控系統60之準確度以及精確度之調整，則可以利 用改變光學反射件62b與62c之面積尺寸大小來達成。 13 •1294145 除了上述較佳實施例之乾姓刻設備應用外，本發明亦可廣泛地 被應用於精密監控某一物件的位置偏差、偏移，或者在三度立體 空間中由於材料疲乏所導致的形變，例如飛機結構之變形或走位。 請參閱第6圖，其繪示的是本發明監控物件位置偏移或 者在二度立體空間中由於材料疲乏或負載異常所導致的形 變之系統示意圖。如第6圖所示，監控系統丨2〇包括一雷 φ 射收發裝置1〇2以及複數個光學反射件1〇4、106、1〇8及 110 ’其中光學反射件104、106、108及110分別安裝在待 監控物件（圖未示）上的監控位置A、B、C…至Z處（待監控 物數目可以是光源能力而定）。雷射收發裝置1〇2另電連接 至一警示裝置140，例如警鈴或警示燈號。光學反射件 104、106、108及110之安裝角度及相對位置需使雷射收 發裝置102所發射出之雷射光束132由最後的光學反射件 • 110反射回雷射收發裝置1〇2本身。只要待監控物件發生 卜-^…——— _ 位置偏移或者在三度立體空間中由於材料疲乏或負載異常 所導致的形變，即導致雷射收發裝置102所發射出之雷射 光束最終由於光徑被破壞而無法返回雷射收發裝置102本 身，此時，雷射收發裝置1〇2即觸發警示裝置14〇警告或 通知人員處理。 以上所述僅為本發明之較佳實施例，凡依本發明申請專 • 利範圍所做之均等變化與修飾，皆應屬本發明之涵蓋範圍。 1294145 【圖式簡單說明】 =綠示的是習知技藝設備部分組件的剖面示意圖。 的是f知技藝#賴條賴於—「功 的示意圖。 軸是本發雜好齡丨之触觀料分組件 =忍圖，包括電漿舰環、連動栓倾先學監鮮統之相對 監控系統及部分的紐刻設備組件 第4圖繪示的是本發明光學 之平面配置示意圖。 監控系統及部分的乾侧設備組件 弟5圖繪示的是本發明光學 之立面示意圖。 【主要元件符號說明】 10 乾蝕刻設備 12 下部纟且件 12a 靜電式晶圓座 12b 對準環 12c 地環 13 上部組件 14 上電極 16 電漿侷限環 16a 扭轉環 16b 次環 16c 次環 16d 次環 18 間隙 20 晶圓 25 反應室殼體 32 連動拾'車由 15 1294145I >, please refer to the diagram of the section 1 of the device for her engraving. As shown in Fig. i, the dry side device 10 includes a lower assembly 12 and an upper assembly 13', wherein the lower assembly 12 generally further includes a dish-shaped electrostatic wafer holder (ESC) 12a, an alignment ring ( F〇cusring) 12^ and groundring 12c. The electrostatic wafer holder is used to place a wafer ‘2〇’ with the usual - as the lower electrode (or anode), and the alignment ring (3) is placed around the electrostatic wafer holder 12a. The upper assembly 13 generally includes an upper electrode or a cathode and a plasma confinement ring 16 that is wrapped around the upper electrode η. Concise, the limit ring 16 generally includes a thicker turn nng) ^ ' to be developed under the torsion ring (6), the thickness of the _ three sub-rings 16b, 12 13 should be in the double body 25, so that it can be in the vacuum Wei Under the operation. The plasma confinement ring 16 is usually balanced by three (only one of which is shown in Fig. 1), and is driven by the linkage bolt shaft 32, and the female __32 roller 34 is fixed. Connection, movable lower roller 34__elastic=shift=elastic yellow (picture is not), and corresponding-fixed, roller H-city cam W, its _2 hits = 吏 upper and lower rollers The displacement is generated and the linkage bolt (4) is driven. For example, the mechanical force of the Na 40 and the spring return force of the spring are given to the "standby position" shown in the figure and the "working position 2 6 1294145 shown in the second figure. During the lifting movement, however, the gap between the counter electrode Μ and the electric stern ring 16 is very narrow, usually only about 1 吋, or even smaller, using the dry outline (4) of the plasma confinement ring 16. During the process of lifting and lowering, if the three interlocking bolts (four) are transported ^= == fine rims, causing collision or friction on the side wall of the upper electrode 14, the yield of the product is rounded. The above causes the movement between linkages _32 === because, for example, the elasticity of the elastics of the upper and lower rollers is tired or the original The wear of its parts. Or it can be seen that the above-mentioned conventional techniques still have shortcomings that require further improvement and modification. 'What the industry needs now is _ (4) Monitoring and driving the power station (10) Its motion stroke - no - To the pre-fine, to avoid = round and \ product of the Γ 4 women collided or county, producing Na, affecting the crystal [invention content] The main purpose of this month is to provide a kind of warning and monitoring secret, can drive electricity The pulp limit ring lifts the control of the interlocking shaft, thereby preventing the plasma confinement ring from colliding with the upper electrode sidewall or holding the particles, which causes particles and affects the yield of the wafer and the product. 1294145 According to the invention In the present invention, there is provided a neo-etching device capable of monitoring plasma brown π actuation, comprising a reaction chamber housing having an upper (four) and a lower assembly, wherein the lower assembly includes a concentration limit. a ring surrounding the periphery of an upper electrode; a plurality of interlocking pin shafts connected to the plasma confinement ring, = the plurality of interlocking pin shafts respectively corresponding to one of the movable lower rollers, and the μ movable type The scroll wheel is corresponding to one of the corresponding The fixed upper roller is connected through an elastic system, and the annular cam is between the movable lower roller and the fixed type: 'reciprocally moving' between the wheels to lift and lower the plasma limit ring And an 'optical monitoring system' includes an optical transceiver device and a plurality of optical reflectors respectively fixed to the corresponding movable lower roller or the corresponding linkage pin 2, wherein the button device can be Generating a light beam, and by reflecting the plurality of optical reflections 4, finally illuminating the optical illuminating task. According to another preferred embodiment of the present invention, the present invention provides a monitorable suspension The actuated optical monitoring system comprises: the object to be monitored, connected to a plurality of interlocking secrets, and the towel of the Wei shaft is arranged in a reciprocating manner, moving and moving the object to be monitored horizontally and finely; The skirt is placed, the solid two is placed in a plurality of shafts and the wire reflection members are respectively fixed on the corresponding connecting wires, wherein the optical transceiver can emit a full 嶋, fine reflection, and can be monitored Object shape In the present invention, the present invention provides a 1.294294' optical monitoring system, including an optical transceiver, the mosquito is disposed on a control object; and the retroreflective member is distracted. Located at other monitoring locations of the scale monitor, the dispensing device can emit a beam of light that is reflected back to the optical transceiver itself by the reflection of the plurality of optical reflectors. - In order to enable your review board to further understand the features and techniques of the present invention - a detailed description of the invention and _. The drawings are for reference and description only and are not intended to limit the invention. [Embodiment] Hereinafter, preferred embodiments of the present invention will be described in detail by means of the third to sixth aspects, wherein if the same element is used in the related drawings, the phase_symbol is still used to make it consistent. Please refer to Section 3®, wei 岐 健 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ As shown in Fig. 3, the dry side equipment of the present invention also includes a lower portion 12 and an upper assembly 13, wherein the lower assembly 12 and the upper assembly 13 are mounted in the -reaction chamber housing 25 so that they can be vacuumed The lower assembly 12 of the environment includes a disc-shaped electrostatic wafer holder (ESC) 12a, an alignment ring 12b, and a ground ring 12c, wherein the electrostatic wafer holder is used to place a wafer, for example, and is usually used as a Electrode (or anode); the alignment ring is placed along the circumference of the electrostatic base 9 J294145 round seat 12a, mainly used to make the density of the plasma more uniform, which can be purely polished, anodized, stainless steel or Other materials. The upper assembly 13 includes an upper electrode 14 (or a cathode) and a plasma removal ring 16' surrounding the upper electrode M. The f-circumferential ring 10 includes a thicker torsion ring 16a, and three sub-rings 16b, 16c, and 16d which are fixed below the torsion ring 16a, but are not limited thereto. # When performing the electric engraving process, the electro-convergence • turn 16 down until it contacts the surface © of the ground ring 12c, thereby limiting the generated plasma to the upper and lower electrodes and the reaction space above the wafer 2〇. . The plasma helium ring I6 may be composed of quartz, ceramic materials or other materials that are not easily damaged by electrical equipment. Further, #进行进行, the reaction gas can be passed through the inlet pipe disposed in the center of the upper electrode 14 into the reaction chamber, and the upper electrode is provided with a baffle (not shown). The reacted gases and by-products are pumped out of the reaction chamber using a vacuum pump (® not shown). The aforementioned anti-money molecules generate a violent collision via the radio power applied to the upper and lower electrodes, producing a surface of 20 for the residual reaction. According to a preferred embodiment of the present invention, the plasma confinement ring 16 is balanced by three (only the one of which is shown in Fig. 3), and is connected by the linkage bolt (four). The lifting movement, and the other end of each of the interlocking bolt shafts 32 is fixedly coupled to a movable lower roller 34, and the movable lower roller 34 is utilised by an elastic means such as a spring (not shown). The fixed roller is connected to the %. Similarly, the 1294145 is provided with an annular cam 4〇 between the upper and lower rollers, which moves reciprocally to cause displacement between the upper and lower rollers, and to drive the finger so that the ring cam 4 is used. The mechanical force and the spring ring 16 can be lifted between the "standby position" and the "table". The electric water limit is as described above. 'She is limited to the dry ring of the ring 16 (4) on the upper electrode 14 and the upper limit ring 16 The sacrifice between the two is narrow. _ Side lions need to make the plasma ship ring 16 rise (4) ^ = dry = _ stroke is inconsistent, even if only a slight deviation = the inclination of the electric power limit ring 16 causes the upper electrode 14 side to record 'smudge__ and Affect the yield of the product. Caused by the linkage check: Magic 2 may be due to the elastic tension of the upper and lower rollers, or the wear of the upper and lower rollers or other parts. ► 统6=^参_4 to Fig. 5' are the plane configuration diagrams of the engraved equipment components of the optical monitoring system of the present invention and the elevational diagrams: II: the prior art may cause the limitation The ring 16 and the upper electrode 14 side or county occur _ grain contamination, the preferred embodiment of the present invention provides a 4 monitoring system 6 〇, which includes three sets of optical components 60a, _ and 60c, such as the second The outer edges of the cams 4 () are respectively disposed on the opposite sides of the (10) degree angle. In accordance with a preferred embodiment of the present invention, the optical component coffee includes a laser mount 62a that is secured to the upper end of a support member. The optical assembly includes an optical reflector 62b that is secured to the upper end of a support member. The optical assembly .1294145 - 6A includes an optical reflector 62c that is attached to the upper end of the - support member 64c. Basically, the laser transceiver of the optical component 6Ga, the optical reflector 62b of the optical component, and the optical reflector of the optical component 60c must be disposed on the same plane. The optical component 60a ❺ laser transceiver 62 emits a laser beam 72 with an optical reflector 62b that is aligned with the optical component. During the process of lifting and lowering the plasma strip 16, the laser beam is normally used. 72 can be reflected by the wire-shaking reflector of the optical component (the beam calls and redirects the direction of the reflected light toward the optical reflector 62c of the optical component 60c, and finally, the laser (reflection) of the optical reflector 62c 76) The laser transceiver that leads back to the optical component 6〇a must be received by its detector. However, when an abnormal condition occurs in the system, for example, due to spring elastic fatigue or wear factors of the upper and lower rollers or other parts, The movement between the three linkage bolt shafts 32 is not correct, or one of them is abnormal and cannot be actuated. At this time, the laser transmitting and detaching device 62a of the optical component cannot be detected because the original optical path is broken. Any reflected beam. At this time, as shown in Fig. 5, the laser transceiver 62a of the optical component 6a will activate the alarm device 80, such as an alarm or warning light, to inform the operator to come to the maintenance. The laser transceiver unit 62a of the optical component 60a can also transmit a signal to the control unit 90, and immediately stop the annular cam 4〇 and the linkage bolt shaft 32 to prevent the armor ring 16 from colliding or rubbing against the sidewall of the upper electrode 14. And particle contamination that may occur. 12 • 1294145 'As shown in FIG. 3, according to a preferred embodiment of the present invention, the laser sweater set 62a and the optical reflectors 62b and 62c of the optical assembly 60a are both fixed. The upper roller 36 is raised above the height η position, wherein the height H needs to be greater than or equal to the maximum lifting distance between the "standby position" and the "working position" of the electrical mounting limit 。16. The upper roller 36 should not obscure the optical path between the laser transceiver 62a of the optical component 6Qa and the optical reflectors 62b and 62c. _ According to a preferred embodiment of the present invention, the respective support members 64a, 6A and 6 The other end is fixedly connected to the corresponding movable lower roller 34 or the linkage shaft 32, so that the laser transceiver 62a and the optical reflectors 62b and 62e can be coupled with the corresponding movable lower roller 34. Or even The bolt shaft 32 is raised or lowered at the same time. According to a preferred embodiment of the present invention, the support members 64a, 64b and 64c may be made of a relatively strong material such as stainless steel or metal, but are not limited to the stainless steel or metal cited. It may also be non-metallic. • According to a preferred embodiment of the invention, the optical reflectors 62b and 62c may be mirrors or any suitable light reflecting surface, such as a retroreflective sticker with a backing, or an optical reflector 62b. And 62c may be a fiber optic component. Furthermore, the invention is not limited to the use of a laser beam, and other sources, such as infrared or illuminating diodes, may also be light sources, in some cases only in order to The area is more concentrated or the light energy is adjusted, and some external optical components may be added as appropriate. In addition, the accuracy and accuracy of the optical monitoring system 60 of the present invention can be achieved by varying the area size of the optical reflectors 62b and 62c. 13 • 1294145 In addition to the dry-named device application of the preferred embodiment described above, the present invention can also be widely applied to closely monitor the positional deviation, offset of an object, or due to material fatigue in a three-dimensional space. The deformation, such as the deformation or movement of the aircraft structure. Referring to Fig. 6, there is shown a system diagram of the positional shift of the monitored object of the present invention or the deformation caused by material fatigue or load abnormality in the second dimensional space. As shown in FIG. 6, the monitoring system 〇2〇 includes a lightning ray transmitting and receiving device 1〇2 and a plurality of optical reflecting members 1〇4, 106, 1〇8 and 110′, wherein the optical reflecting members 104, 106, 108 and 110 are respectively installed at monitoring positions A, B, C... to Z on the object to be monitored (not shown) (the number of objects to be monitored may be determined by the light source capability). The laser transceiver unit 1〇2 is additionally electrically coupled to a warning device 140, such as an alarm or warning light. The mounting angles and relative positions of the optical reflectors 104, 106, 108 and 110 are such that the laser beam 132 emitted by the laser transceiver 102 is reflected back from the last optical reflector 110 to the laser transceiver 1 2 itself. As long as the object to be monitored is misaligned or deformed due to material fatigue or load abnormality in the three-dimensional space, the laser beam emitted by the laser transceiver 102 is ultimately due to The optical path is broken and cannot be returned to the laser transceiver 102 itself. At this time, the laser transceiver 1 触发 2 triggers the warning device 14 to warn or notify the person to handle. The above are only the preferred embodiments of the present invention, and all changes and modifications made to the specific scope of the application of the present invention are intended to be within the scope of the present invention. 1294145 [Simple description of the diagram] = Green is a schematic cross-sectional view of some components of the conventional art equipment. The knowledge of the art is based on the fact that the axis is the tactile component of the complex age, including the resistance of the plasma ship, the relative monitoring of the transformers. System and Part of the Engraving Equipment Component Figure 4 is a schematic diagram showing the optical plane configuration of the present invention. The monitoring system and part of the dry side equipment component 5 are schematic views of the optical facade of the present invention. DESCRIPTION OF SYMBOLS 10 Dry etching equipment 12 Lower part 12a Electrostatic wafer holder 12b Alignment ring 12c Ground ring 13 Upper part 14 Upper electrode 16 Plasma confinement ring 16a Torsion ring 16b Sub-ring 16c Sub-ring 16d Sub-ring 18 Clearance 20 wafer 25 reaction chamber housing 32 linked to pick up 'car by 15 1294145
34 下滾輪 36 上滾輪 40 環狀凸輪 42 移動方向 60 光學監控系統 60a 光學組件 60b 光學組件 60c 光學組件 62a 雷射收發裝置 62b 光學反射件 62c 光學反射件 64a 支撐件 64b 支撐件 64c 支撐件 72 雷射光束 74 反射光束 76 反射光束 80 警示裝置 90 控制單元 100 乾蝕刻設備 120 光學監控系統 102 雷射收發裝置 104 光學反射件 106 光學反射件 108 光學反射件 110 光學反射件 140 警示裝置 132 雷射光束34 lower roller 36 upper roller 40 annular cam 42 moving direction 60 optical monitoring system 60a optical component 60b optical component 60c optical component 62a laser transceiver 62b optical reflector 62c optical reflector 64a support 64b support 64c support 72 Beam 74 Reflected beam 76 Reflected beam 80 Warning device 90 Control unit 100 Dry etching device 120 Optical monitoring system 102 Laser transceiver 104 Optical reflector 106 Optical reflector 108 Optical reflector 110 Optical reflector 140 Warning device 132 Laser beam
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