TW200729330A - Dry etching apparatus capable of monitoring motion of wap ring thereof - Google Patents

Dry etching apparatus capable of monitoring motion of wap ring thereof

Info

Publication number
TW200729330A
TW200729330A TW095102490A TW95102490A TW200729330A TW 200729330 A TW200729330 A TW 200729330A TW 095102490 A TW095102490 A TW 095102490A TW 95102490 A TW95102490 A TW 95102490A TW 200729330 A TW200729330 A TW 200729330A
Authority
TW
Taiwan
Prior art keywords
ring
dry etching
apparatus capable
etching apparatus
monitoring motion
Prior art date
Application number
TW095102490A
Other languages
Chinese (zh)
Other versions
TWI294145B (en
Inventor
Shyh-Kuen Lai
Original Assignee
United Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Microelectronics Corp filed Critical United Microelectronics Corp
Priority to TW95102490A priority Critical patent/TWI294145B/en
Publication of TW200729330A publication Critical patent/TW200729330A/en
Application granted granted Critical
Publication of TWI294145B publication Critical patent/TWI294145B/en

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

An optical monitoring system includes a ring-shaped object suspended by and engaged with a plurality of vertical plunger shafts. Normally, the vertical plunger shafts move upward and downward reciprocally and coherently, but independently, such that the ring-shaped object ascends or descends horizontally. A light transceiver device is affixed to one vertical plunger shaft. A plurality optical reflector elements are affixed to respective other plunger shafts. A light beam emanated from said light transceiver is reflected by the optical reflector elements and is eventually re-directed back to the light transceiver device.
TW95102490A 2006-01-23 2006-01-23 Dry etching apparatus capable of monitoring motion of wap ring thereof TWI294145B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW95102490A TWI294145B (en) 2006-01-23 2006-01-23 Dry etching apparatus capable of monitoring motion of wap ring thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW95102490A TWI294145B (en) 2006-01-23 2006-01-23 Dry etching apparatus capable of monitoring motion of wap ring thereof

Publications (2)

Publication Number Publication Date
TW200729330A true TW200729330A (en) 2007-08-01
TWI294145B TWI294145B (en) 2008-03-01

Family

ID=45068073

Family Applications (1)

Application Number Title Priority Date Filing Date
TW95102490A TWI294145B (en) 2006-01-23 2006-01-23 Dry etching apparatus capable of monitoring motion of wap ring thereof

Country Status (1)

Country Link
TW (1) TWI294145B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI478635B (en) * 2008-01-08 2015-03-21 Lam Res Corp Methods and apparatus for a wide conductance kit
TWI679675B (en) * 2016-12-30 2019-12-11 大陸商中微半導體設備（上海）股份有限公司 Capacitive coupling plasma processing device and plasma processing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI478635B (en) * 2008-01-08 2015-03-21 Lam Res Corp Methods and apparatus for a wide conductance kit
TWI679675B (en) * 2016-12-30 2019-12-11 大陸商中微半導體設備（上海）股份有限公司 Capacitive coupling plasma processing device and plasma processing method

Also Published As

Publication number Publication date
TWI294145B (en) 2008-03-01

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