1290879 九、發明說明： 【發明所屬之技術領域】 本發明係關於一種用於化學機械拋光之研磨片材及一種 用於製造該研磨片材之方法。 【先前技術】 化學機械拋光（Chemical Mechanical Policing，CMP)係 一種使用研磨片材平坦化基板的表面之程序。CMP一般可 用於拋光透鏡、鏡面、液晶顯示器之基板、矽晶圓及矽晶 圓上之氧化及/或金屬層。 美國專利第6,454,634號揭示了一種藉由以下方法製造之 研磨片材，該方法包含下列步驟：將熱塑性發泡樹脂澆注 到一圓形模具中以形成一鑄件，將該鎢件切成薄片，並在 薄片之表面中機械加工數個巨大孔洞（macr〇-channels)。該 研磨片材包含一種由聚胺基甲酸酯製得之聚合物基模，且 其中分佈有中空彈性聚合微球。由熱塑性發泡樹脂製得之 研磨片材中的孔眼大小及分佈高度取決於用於鑄模之混合 物中每一種組份的分佈，並且亦取決於圓形模具之溫度分 佈’故較難以使得在圓形模具中用以鑄模之混合物中的每 一組份分佈平均。此外，由於聚胺基甲酸酯之黏彈性特 性，用於切片步驟之刀片無法精確定位於薄片邊緣上，並 隨後影響孔眼之平整度、大小及分佈。此等因素降低了製 造该研磨片材時之批次均勻性，因此使所涉及之抛光步驟 變得複雜。另一方面，在該專利中研磨片材之孔眼彼此間 ϋ不連續’因此拋光液無法通暢地流動，並且拋光微粒無 99777.doc 1290879 法均勻地擴散開。另外，在拋光期間形成之殘留物容易留 在研磨片材表面並且不容易移除；因此，殘留物可能損傷 或破壞待拋光之基板。 美國專利申請公開案第2004/0224623 A1號則揭示了一 種類似盤狀之研磨片材。該研磨片材包含纖維及固定纖維 之樹脂而形成盤狀。該研磨片材具有至少一個表面層，該 表面層基本上無孔並包含有機纖維及固定該有機纖維之樹 脂。該研磨片材之表面層之一表面係經機械拋光，使得該 有機纖維暴露於該表面層之表面上。該申請案亦揭示了將 一種經樹脂浸潰之薄片狀纖維基底材料與一種未經樹脂浸 潰之薄片狀纖維基底材料層疊，並藉由熱壓成型將其合併 以形成一研磨片材。然而，熱壓成型步驟容易導致在層之 間形成不平整之空間。因此，研磨片材表面之硬度、平整 度、壓縮比、彈性及回收率均受到影響。在成型期間，熱 壓成型層之密度亦發生變化。另夕卜，使用高溫(諸如3〇〇。〇 與高壓（諸如196 kN/m)條件製造之方法將使研磨片材之表 面燒焦並變硬，且進而研磨片材會損傷並破壞待拋光之基 板。此外，當製造研磨片#時，容易發生遷移 (migration)’並且聚合物無法均句分佈於薄片狀之纖維基 底中。用於層壓之熱度亦會影響品質，例如研磨片材之硬 度、彈性、壓縮比及密度，上述因素均會降低拋光效率。 【發明内容】 種用於製造研磨片材之方 本發明之一目的在於提供一 法，其包含以下步驟： 99777.doc 1290879 ⑷提供包含複數種纖維之基底材料；該基底材料具有一 用於拋光一基板之表面； (b) 使用彈性體溶液浸潰該基底材料之該表面； (c) 固化浸潰於該基底材料之女矣 山 竹之絲面的言玄彈性體，以形成 肷入該彈性體及該等纖維中的 W複数個弟一連續微孔； (d) 使用調節聚合物溶液浸潰 又，貝在步驟（c)中所獲得之該基 底材料的該表面及該彈性體；及 (e) 固化浸潰於該基底材料 亥表面及该弹性體的該調節 聚合物，並將該調節聚合物部分地填充於該等第一連續微 孔以形成複數個第二連續微孔。 、 本發明之另—目的在於提供—種研磨片材，該研磨片材 包含一具有用於拋光一基板之表面的基底材料，盆中該表 面包含複數纖維、至少—種彈性體及至少—種調節聚合 物，且複數個連續微孔嵌入該等纖維、彈性體及調節聚合 物中。 本备月之再一目的在於提供一種拋光一基板之方法，該 方法包含以下步驟：使用一研磨片材拋光基板之一表面， 其中該研磨片材包含一具有用於拋光一基板之表面的基底 材料其中該表面包含複數纖維、至少一種彈性體及至少 種调即聚合物，且複數個連續微孔嵌入該等纖維、彈性 體及調節聚合物中。 【實施方式】 本發明提供一種用於製造研磨片材之方法，該方法包含 以下步驟： 99777.doc 1290879 ⑷提供包含複數種纖維之基底材料；該基底材料具有一 用於拋光一基板之表面； (b)使用彈性體溶液浸潰該基底材料之該表面； ⑷固化浸潰於該基底材料之該表面的該彈性體，以形成 肷入该彈性體及該等纖維中的複數個第一連續微孔； ⑷使用調節聚合物m潰在㈣⑷巾所獲得之該基 底材料的該表面及該彈性體；及 鲁⑷固化浸潰於該基底材料之該表面及該彈性體的該調節 聚合物，並將該調節聚合物部分地填充於該等第一連續微 孔以形成複數個第二連續微孔。 根據本發明，任何包含纖維之基底材料皆可應用於本發 明。較佳地，該基底材料為一種不織布，更佳地，該基底 材料為軋輥（rolled)不織布。軋輥不織布可以成捲方式使 用，此與包括成型或鑄造之習知製造單個研磨片材的方法 相比，可改善批次均勻性。 _ 本文中所用之「纖維」乙詞係指單一纖維或複合纖維， 較佳為複合纖維。纖維係根據待拋光之基板選擇。根據本 說明書之揭示内容，本發明所屬技術領域中具通常知識者 可選擇合適之纖維種類，並協調該纖維與彈性體及/或調 節聚合物。較佳地，該纖維係至少一由選自由下列各物組 成之群中之材料所製成··聚醯胺、對苯二甲醯胺、聚酯、 聚甲基丙烯酸甲酯、聚對苯二甲酸乙二醇酯、聚丙烯腈及 其混合物。 基底材料表面上之纖維提供了用於拋光之突起，同時亦 99777.doc 1290879 提供一支架，從而允許彈性體及調節聚合物置放於由該支 架所界定之空間内。為具有令人滿意之作用，該纖維之長 度較佳為0.5 cm至10.5 cm ’意即，在此領域中界定為「短 纖維」者。1290879 IX. Description of the Invention: [Technical Field of the Invention] The present invention relates to an abrasive sheet for chemical mechanical polishing and a method for producing the same. [Prior Art] Chemical Mechanical Policing (CMP) is a procedure for flattening the surface of a substrate using an abrasive sheet. CMP is typically used to polish lenses, mirrors, substrates for liquid crystal displays, germanium wafers, and oxide and/or metal layers on twinned circles. U.S. Patent No. 6,454,634 discloses an abrasive sheet produced by a method comprising: casting a thermoplastic foamed resin into a circular mold to form a casting, and cutting the tungsten member into a sheet, and Several large holes (macr〇-channels) are machined in the surface of the sheet. The abrasive sheet comprises a polymer base mold made of polyurethane and in which hollow elastic polymeric microspheres are distributed. The size and distribution height of the pores in the abrasive sheet made of the thermoplastic foamed resin depends on the distribution of each component in the mixture used for the mold, and also depends on the temperature distribution of the circular mold. Each component in the mixture used to mold the mold is distributed evenly. In addition, due to the viscoelastic properties of the polyurethane, the blade used in the slicing step cannot be accurately positioned on the edge of the sheet and subsequently affects the flatness, size and distribution of the aperture. These factors reduce the batch uniformity in the manufacture of the abrasive sheet, thus complicating the polishing steps involved. On the other hand, in the patent, the perforations of the abrasive sheet are not continuous with each other' so that the polishing liquid cannot flow smoothly, and the polishing particles are uniformly spread without the method of 99777.doc 1290879. In addition, the residue formed during polishing tends to remain on the surface of the abrasive sheet and is not easily removed; therefore, the residue may damage or destroy the substrate to be polished. A disc-like abrasive sheet is disclosed in U.S. Patent Application Publication No. 2004/0224623 A1. The polishing sheet contains a fiber and a resin fixing the fiber to form a disk shape. The abrasive sheet has at least one surface layer which is substantially non-porous and comprises organic fibers and a resin for fixing the organic fibers. One of the surface layers of the abrasive sheet is mechanically polished such that the organic fibers are exposed on the surface of the surface layer. The application also discloses laminating a resin-impregnated sheet-like fibrous base material with a resin-impregnated sheet-like fibrous base material and combining them by thermoforming to form an abrasive sheet. However, the hot press forming step tends to cause an uneven space to be formed between the layers. Therefore, the hardness, flatness, compression ratio, elasticity, and recovery of the surface of the abrasive sheet are all affected. The density of the thermoformed layer also changes during molding. In addition, the use of high temperature (such as 3 〇〇. 〇 and high pressure (such as 196 kN / m) conditions of the method will burn the surface of the abrasive sheet and harden, and then the abrasive sheet will damage and destroy the to be polished In addition, when the abrasive sheet # is manufactured, migration is apt to occur and the polymer cannot be uniformly distributed in the sheet-like fibrous substrate. The heat for lamination also affects the quality, such as grinding the sheet. Hardness, elasticity, compression ratio and density, all of the above factors can reduce the polishing efficiency. SUMMARY OF THE INVENTION One object of the present invention is to provide a method comprising the following steps: 99777.doc 1290879 (4) Providing a base material comprising a plurality of fibers; the base material having a surface for polishing a substrate; (b) impregnating the surface of the base material with an elastomer solution; (c) curing the female impregnated with the base material a sinuous elastomer of the silk surface of the mangosteen, to form a continuous microporous of the plurality of younger brothers into the elastomer and the fibers; (d) impregnating with a polymer solution, The surface of the base material obtained in step (c) and the elastomer; and (e) solidifying the conditioning polymer impregnated on the surface of the base material and the elastomer, and partially adjusting the polymer Filling the first continuous micropores to form a plurality of second continuous micropores. Another object of the present invention is to provide an abrasive sheet comprising a substrate having a surface for polishing a substrate In the material, the surface of the basin comprises a plurality of fibers, at least one elastomer and at least one type of conditioning polymer, and a plurality of continuous micropores are embedded in the fibers, the elastomer and the conditioning polymer. A method of polishing a substrate, the method comprising the steps of: polishing a surface of a substrate using an abrasive sheet, wherein the abrasive sheet comprises a substrate material having a surface for polishing a substrate, wherein the surface comprises a plurality of fibers, At least one elastomer and at least one type of polymer, and a plurality of continuous micropores are embedded in the fibers, the elastomer, and the conditioning polymer. A method for producing an abrasive sheet comprising the following steps: 99777.doc 1290879 (4) providing a substrate material comprising a plurality of fibers; the substrate material having a surface for polishing a substrate; (b) using elasticity The body solution impregnates the surface of the substrate material; (4) curing the elastomer impregnated on the surface of the substrate material to form a plurality of first continuous micropores that are entangled into the elastomer and the fibers; (4) use Adjusting the polymer m to collapse the surface of the base material obtained by the (4) (4) towel and the elastomer; and Lu (4) curing the surface of the base material and the conditioning polymer of the elastomer, and polymerizing the adjustment The material is partially filled in the first continuous micropores to form a plurality of second continuous micropores. According to the present invention, any substrate material comprising fibers can be applied to the present invention. Preferably, the base material is a non-woven fabric, and more preferably, the base material is a rolled nonwoven fabric. Roll non-woven fabrics can be used in a roll form, which improves batch uniformity compared to conventional methods of forming or grinding a single abrasive sheet. The term "fiber" as used herein refers to a single fiber or a composite fiber, preferably a composite fiber. The fiber system is selected according to the substrate to be polished. In accordance with the disclosure of this specification, one of ordinary skill in the art to which the invention pertains may select a suitable fiber type and coordinate the fiber with the elastomer and/or the conditioning polymer. Preferably, the fiber is made of at least one material selected from the group consisting of polyamine, terephthalamide, polyester, polymethyl methacrylate, polyparaphenylene Ethylene glycol dicarboxylate, polyacrylonitrile, and mixtures thereof. The fibers on the surface of the substrate material provide protrusions for polishing, and a holder is also provided by 99777.doc 1290879 to allow the elastomer and conditioning polymer to be placed in the space defined by the holder. In order to have a satisfactory effect, the length of the fiber is preferably from 0.5 cm to 10.5 cm', which is defined as "short fiber" in the field.
本文中所用之「彈性體」6詞亦稱為「彈性聚合物」， 係指顯示類似橡膠性質之聚合物。在拋光時，彈性體係充 當良好的缓衝區’以避免損傷待拋光之基板表面。在本發 明之一較佳實施例中，該彈性體為發泡樹脂。本文中所用X 之「發泡樹脂」乙詞係指含有熱塑性樹脂及熱分解發泡劑 之材料。彈性體較佳係至少一選自由下列各物組成之群 :’·聚醯胺、聚碳酸酯、聚胺基腈、”基丙烯酸酯、環 二树月曰、酚醛樹脂、聚甲基丙烯酸甲酉旨、聚醯胺酯、乙烯 苯聚合物、丙烯酸樹脂及聚胺基甲酸酯。 在本發明方法之步驟⑻中’使用彈性體溶液浸潰基底 材枓之方式可為任何f知的浸潰方法。用於浸潰之條件係 為本《月所屬技術領域中具通常知識者所熟知。用於彈性 體溶液：合適的溶劑包括二甲基甲醯胺_F)。彈性體溶 較佳地， 基底材料。 :°視f月况包含添加劑，諸如清潔劑。彈性體在彈性體溶 夜中之'辰度較佳係自2重量〇/〇至60重量％。 ^驟（b)進一步包含使用彈性體溶液浸潰整個 在本發明方半 ,,^ /之步驟（c)中，固化浸漬於基底材料中之彈 性體以形成包含於^ α咖 ^ ;弹性脱及該纖維中之複數個第一連續微 &的方式可為^壬 了白知的固化方法。在本發明之一實施例 99777.doc 1290879 中，係將基底材料放入固化溶液中進行固化。較佳地，固 化溶液包含0至40重量％之二甲基甲酿胺水溶液。用於固 化之條件為本發明所屬技術領域中具通常知識者所熟知。 固化較佳係於室溫及室壓下進行。 在本發明之一較佳實施例中，用於製造研磨片材之方法 進一步包含在步驟（c)之後洗滌基底材料之步驟（cl)。洗滌 方式可為任何習知的洗滌方法。在本發明之一實施例中， 鲁 可使用水洗滌’並可視情況地使用擠壓輪。洗蘇條件為本 發明所屬技術領域中具通常知識者所熟知。較佳係於5〇1 至9〇°C的水中洗滌該基底材料，並接著使該基底材料經受 擠壓輪數次。 在本發明之一更佳實施例中，製造研磨片材之方法進一 步包含在步驟（Cl)之後乾燥基底材料的步驟（c2)。乾燥方 式可為任何習知的乾燥方法。乾燥條件為本發明所屬技術 領域中具通常知識者所熟知。在本發明之一實施例中，該 _ 乾蚝為空氣乾燥，並且乾燥溫度係自至艺。 較佳地，用於製造研磨片材之方法進一步包含在步驟 (d)之則機械拋光基底材料之表面及彈性體的步驟。機 械拋光的方式可為任何習知的機械拋光方法，諸如使用砂 紙研磨。機械拋光條件為本發明所屬技術領域中具通常知 硪者所熟知。更佳地，在機械拋光之後，使該纖維暴露於 基底材料之表面。 本文中所用之「凋節聚合物」乙詞係指一種用於改變基 底材料之表面特性的聚合物，其中基底材料係藉由根據本 99777.docAs used herein, the term "elastomer" is also referred to as "elastic polymer" and refers to a polymer that exhibits rubber-like properties. When polishing, the elastomeric system acts as a good buffer' to avoid damage to the surface of the substrate to be polished. In a preferred embodiment of the invention, the elastomer is a foamed resin. The term "foamed resin" as used herein means a material containing a thermoplastic resin and a thermally decomposable foaming agent. Preferably, the elastomer is at least one selected from the group consisting of: polyamine, polycarbonate, polyamine nitrile, acrylate, bismuth, phenolic resin, polymethyl methacrylate酉 、 醯 醯 醯 醯 。 。 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在 在Crushing method. The conditions for impregnation are well known to those of ordinary skill in the art of the month. For elastomer solutions: suitable solvents include dimethylformamide _F. Ground material: The material contains an additive such as a cleaning agent. The 'length of the elastomer in the elastomer solution is preferably from 2 parts 〇 / 〇 to 60% by weight. ^ (b) further includes The elastomer is impregnated with the elastomer solution, and the elastomer immersed in the base material is solidified in the step (c) of the present invention to form a plurality of elastomers which are contained in the fiber. The first continuous micro & method can be used to cure the curing method In an embodiment of the invention, in the embodiment 99777.doc 1290879, the substrate material is placed in a curing solution for curing. Preferably, the curing solution contains 0 to 40% by weight of an aqueous solution of dimethyl methamine. The conditions are well known to those of ordinary skill in the art to which the invention pertains. Curing is preferably carried out at room temperature and under chamber pressure. In a preferred embodiment of the invention, the method for making an abrasive sheet is further included in The step (c) of washing the substrate material after the step (c) may be any conventional washing method. In one embodiment of the invention, the water may be washed with water and optionally using a squeeze wheel. The conditions are well known to those of ordinary skill in the art to which the invention pertains. Preferably, the substrate material is washed in water at 5〇1 to 9 °C and the substrate material is subsequently subjected to a squeeze wheel several times. In a preferred embodiment of the invention, the method of producing a polishing sheet further comprises the step (c2) of drying the substrate material after the step (Cl). The drying method may be any conventional drying method. It is well known to those skilled in the art to which the present invention pertains. In one embodiment of the invention, the drying is air drying and the drying temperature is self-contained. Preferably, the method for making an abrasive sheet Further comprising the step of mechanically polishing the surface of the substrate material and the elastomer in step (d). The mechanical polishing may be performed by any conventional mechanical polishing method, such as sanding. Mechanical polishing conditions are within the technical field of the present invention. It is well known to those of ordinary skill. More preferably, after mechanical polishing, the fiber is exposed to the surface of the substrate material. As used herein, the term "depleted polymer" refers to a method for changing the surface properties of a substrate material. Polymer, wherein the substrate material is based on this 99777.doc
-11 - 1290879 發明方法的步驟（(：）所獲得。 成且勺人 u為複數個弟一連續微孔係 成且包含於該彈性體及纖維中， 研麻m ^故在應用時可能無法滿足 研磨片材的某些特性，諸如 性。力虛 硬度、飽和度、模量或親水 “」作為將所有该等特性調節到 ，的調節劑。在研磨片材中所形成之第二連續微孔孔捏 :於弟一連續微孔孔徑。調節聚合物之種類與數量可根 據每性體及待拋光之基板的種類與數量而定。在本發明之 -較佳實施例中’調節聚合物為清潔劑聚合物、硬度調節 聚合物、飽和度調節聚合物、模量調節聚合物或親水性調 節聚合物。在本發明之一更佳實施例中，言周節聚合物係至 少一選自由下列各物組成之群：聚醯胺、聚碳酸酯、聚胺 基腈、聚甲基丙烯酸酯、環氧樹脂、酚醛樹脂、聚甲基丙 烯酸甲酯、聚醯胺酯、乙烯苯聚合物、丙烯酸樹脂、聚胺 基甲酸醋、含羥基聚合物、含矽疏水物及含氟化物疏水 物。舉例而言，硬度調節聚合物具有改善研磨片材硬度之 月b力’且其工作溫度係低於基底材料的變形溫度，較佳係 將聚胺基甲酸酯、聚甲基丙烯酸酯及聚甲基丙烯酸甲酯作 為硬度調節聚合物，此硬度調節聚合物有益於拋光效率， 且不影響研磨片材的均勻性及平整度。另一方面，親水性 調節聚合物包含親水物及疏水物。含羥基聚合物適用於親 水物；疏水物較佳為含矽或氟化物之疏水物。 在本發明方法之步驟（d)中，使用調節聚合物溶液浸潰 在步驟（c)中所獲得之基底材料表面及彈性體的方式可為任 何習知的浸潰方法。使用調節聚合物溶液浸潰基底材料之 99777.doc -12- 1290879 卞' 為本發明所屬技術領域中具通常知識者所熟知。用於 甲。以合物溶液的合適溶劑包括水、甲基乙基嗣（μεκ)及 該等溶劑中，水為較佳，因為其具有廣泛調節該 =曰4匆溶液之黏度及聚合物含量的能力。此外，水亦 ^吊谷易渗人基底材料。調節聚合物溶液視情況地包含添 月丨J諸如消泡劑（resistant form s〇luti〇啦增稠劑。較佳 調節聚合物在彈性體溶液中之濃度係自1〇重量％至100重 量％ 〇 較佳地’步冑(d)包含使用調節溶液浸潰整個基底材 心在實施例卜研磨片材可連續地提供一用於抛光之表 面，因而減少了替換研磨片材之次數。 在該方法之步驟⑷中，固化浸潰於基底材料之表面及彈 性體中之調節聚合物的方式可為任何習知的固化方法。固 化條件為本發明所屬技術領域中具通常知識者所熟知。 在本發明之一較佳實施例中，製造研磨片材之方法進一 • 乂匕a在步驟（e)之後洗滌基底材料之表面的步驟（el)。洗 滌步驟可為任何習知的洗務方法。洗務條件為本發明所屬 技術領域中具通常知識者所熟知。較佳係於5〇它至卯。c的 X中洗淼忒基底材料，並且接著使該基底材料經受擠壓輪 數次。 在本發明之一更佳實施例中，製造研磨片材之方法進一 乂匕§在V驟（el)之後乾燥基底材料之表面的步驟（e2)。 乾燦方式可為任何f知的乾燥方法。乾燥條件為本發明所 屬技術7員域中具通常知識者所熟知。在本發明之一實施例 99777.doc -13- 1290879 中’乾燥為空氣乾燥，並且乾燥溫度在1〇〇。〇至17〇它之範 圍内。 較佳地，用於製造研磨片材之方法進一步包含在步驟 (e2)之後機械拋光基底材料之表面及彈性體以及調節聚合 物的步驟（e3)。機械拋光之方式可為任何習知的機械拋光 方法。機械拋光條件為本發明所屬技術領域中具通常知識 者所热知。更佳係在機械拋光之後，使纖維暴露於基底材 料之表面。 在本發明之一較佳實施例中，重複步驟0)及（(〇數次。 每次使用的彈性體的種類可相同或不同。 在本發明另一較佳實施例中，重複步驟（句及（e)數次。 每次使用之調節聚合物的種類可相同或不同。 根據本發明，彈性體可與調節聚合物相同或不同。在本 發明之一較佳實施例中，彈性體與調節聚合物係為不同。 根據本發明之方法製造的研磨片材具有嵌入彈性體、調 _ 即聚合物及纖維中之複數個連續微孔。該研磨片材之連續 U孔大小均勻，有利於拋光液之流動及拋光顆粒之分佈以 及拋光殘留物之移除。在本發明之較佳實施例中，連續微 孔具有〇·1 μιη至500 μηι範圍内的孔徑。 根據本發明之方法製造研磨片材能夠避免藉由鑄模熱塑 性發泡樹脂製造的習知研磨片材的缺陷，因為本發明之基 底材料並非藉由鑄模所形成，故其特性不會受鑄模的影 曰根據本务明之研磨片材的平整度及均勻性皆優於習知 研磨片材。此外，本發明之方法亦不需熱壓及層壓，使得 99777.doc-11 - 1290879 The steps of the method of the invention ((:) are obtained. The scooping person u is a plurality of brothers and a continuous microporous system is included in the elastomer and the fiber, and may not be used in the application. Satisfying certain properties of the abrasive sheet, such as properties. Flexural hardness, saturation, modulus, or hydrophilic "" as a modifier that adjusts all of these properties. The second continuous micro-form formed in the abrasive sheet Pore pinch: a continuous micropore diameter. The type and amount of the polymer to be adjusted may depend on the type and amount of the substrate and the substrate to be polished. In the preferred embodiment of the invention, the polymer is adjusted. a detergent polymer, a hardness adjusting polymer, a saturation adjusting polymer, a modulus adjusting polymer or a hydrophilicity adjusting polymer. In a further preferred embodiment of the present invention, at least one selected from the group consisting of a group consisting of polyamine, polycarbonate, polyamine nitrile, polymethacrylate, epoxy resin, phenolic resin, polymethyl methacrylate, polyamidoester, vinyl benzene polymer, Acrylic resin, polyamine Formic acid vinegar, hydroxyl-containing polymer, hydrazine-containing hydrophobe and fluoride-containing hydrophobe. For example, the hardness-adjusting polymer has a monthly b-force that improves the hardness of the abrasive sheet and its operating temperature is lower than the deformation temperature of the base material. Preferably, the polyurethane, the polymethacrylate and the polymethyl methacrylate are used as the hardness adjusting polymer, and the hardness adjusting polymer is beneficial to the polishing efficiency without affecting the uniformity of the polished sheet and Flatness. On the other hand, the hydrophilicity adjusting polymer comprises a hydrophilic substance and a hydrophobe. The hydroxyl group-containing polymer is suitable for a hydrophile; the hydrophobe is preferably a hydrophobe containing rhodium or fluoride. In the step of the method of the invention (d The manner of impregnating the surface of the substrate material and the elastomer obtained in the step (c) with the conditioning polymer solution may be any conventional impregnation method. The impregnation of the substrate material using the conditioning polymer solution is 99777.doc -12- 1290879 卞' is well known to those of ordinary skill in the art to which the present invention pertains. Suitable solvents for the solution of the solution include water, methyl ethyl hydrazine (μεκ), and the like. Among the agents, water is preferred because it has the ability to widely adjust the viscosity and polymer content of the solution. In addition, the water is also easy to infiltrate the substrate material. The adjustment polymer solution optionally includes丨J such as a defoamer (resistant form s〇luti〇 thickener. It is preferred to adjust the concentration of the polymer in the elastomer solution from 1% by weight to 100% by weight 〇 preferably 'step 胄 (d Including the use of the conditioning solution to impregnate the entire substrate core. In the embodiment, the abrasive sheet can continuously provide a surface for polishing, thereby reducing the number of times the abrasive sheet is replaced. In step (4) of the method, the curing is impregnated. The manner in which the polymer is conditioned on the surface of the substrate material and in the elastomer can be any conventional curing method. The curing conditions are well known to those of ordinary skill in the art to which the present invention pertains. In a preferred embodiment of the invention, the method of making an abrasive sheet further comprises the step (el) of washing the surface of the substrate material after step (e). The washing step can be any conventional washing method. Washing conditions are well known to those of ordinary skill in the art to which the invention pertains. It is preferably at 5 〇 to 卯. The base material is washed in X of c, and then the substrate material is subjected to a squeeze wheel several times. In a more preferred embodiment of the invention, the method of making the abrasive sheet further comprises the step (e2) of drying the surface of the substrate material after the V (el). The dry method can be any drying method known. Drying conditions are well known to those of ordinary skill in the art of the present invention. In one embodiment of the invention 99777.doc -13 - 1290879 'drying is air drying and the drying temperature is 1 Torr. 〇 to 17〇 within its range. Preferably, the method for producing an abrasive sheet further comprises the step (e3) of mechanically polishing the surface of the base material and the elastomer and adjusting the polymer after the step (e2). The mechanical polishing can be by any conventional mechanical polishing method. Mechanical polishing conditions are well known to those of ordinary skill in the art to which the invention pertains. More preferably, after mechanical polishing, the fibers are exposed to the surface of the substrate material. In a preferred embodiment of the invention, steps 0) and (() are repeated. The types of elastomers used each time may be the same or different. In another preferred embodiment of the invention, the steps are repeated (sentences) And (e) several times. The type of the conditioning polymer used each time may be the same or different. According to the present invention, the elastomer may be the same as or different from the conditioning polymer. In a preferred embodiment of the invention, the elastomer The conditioning polymer is different. The abrasive sheet produced by the method of the present invention has a plurality of continuous micropores embedded in the elastomer, the polymer, and the fibers. The continuous U-hole size of the abrasive sheet is uniform, which is advantageous for The flow of the polishing liquid and the distribution of the polishing particles and the removal of the polishing residue. In a preferred embodiment of the invention, the continuous micropores have a pore size in the range of from 1 μm to 500 μη. The grinding is carried out according to the method of the present invention. The sheet can avoid the defects of the conventional abrasive sheet produced by molding the thermoplastic foamed resin, because the base material of the present invention is not formed by the mold, so its characteristics are not affected by the mold. Flatness and uniformity of the abrasive sheet material are superior to the lead out of the conventional abrasive sheet. Further, the method of the present invention and also without pressing the laminate, such 99777.doc
-14- 1290879 根據本發明之研磨片材不备 L 、， 何小θ破槌待拋光之基板的表面。另 外’當應用根據本發明之研磨 u ^ ir 立 呵保月材時，拋光效率可令人滿 0 本發明提供—種研磨片材，該研磨片材包含-具有用於 抛光-基板之表面的基底材料，其中該表面包含複數纖 維、至少一種彈性體及至少一種調節聚合物，且複數個連 續微孔嵌入該等纖維、彈性體及調節聚合物中。 •本發明亦提供一種拋光一基板之方法，該方法包含以下 乂驟使用研磨片材拋光基板之一表面，其中該研磨片 材包含一具有用於拋光一基板之表面的基底材料，其中該 表面包含複數纖維、至少一種彈性體及至少一種調節聚合 物，且複數個連續微孔嵌入該等纖維、彈性體及調節聚合 物中。研磨片材研磨片材 以下實例僅用於說明之目的，而非用於限制本發明之範 疇。 φ 實例 基底材料：將具有3丹尼爾細度之Nylon⑧與聚對苯二甲 酸乙二醇酯（PET)的複合纖維形成一不織布基底材料，其 中Nylon®與pet之比率為7:3。基底材料厚度為2.25 mm， 禮、度為0.22 g/cm3，且單位面積重量為496 g/m2。 浸潰··將基底材料浸潰於包含49重量％之聚醯胺酯、49 重量％之溶劑及2重量％之清潔劑的彈性體溶液中。 固化：浸潰後，將基底材料放入包含18重量％之二曱基 甲醯胺水溶液的固化溶液中，並以固化浸潰在纖維中之彈 99777.doc -15- 1290879 性體。 洗滌：藉由擠壓輪移除殘留物及過量之固化溶液。接著 在80°C之水中洗滌該基底材料，並接著使該基底材料經受 擠壓輪數次。 乾燥：洗滌後，接著在140°C下乾燥基底材料。 拋光·乾燥後’使用#150及#400之砂紙以1200及1300 rpm機械拋光基底材料，獲得具有平坦表面的128 mm半成 品⑴。 • ^ 浸潰與固化：將1.28 mm的半成品浸潰於含有75重量0/〇 之聚甲基丙稀酸甲酯的調節聚合物溶液中，並應用擠壓輪 輔助浸潰。接著使經浸潰之半成品在12 5 °C下固化。 乾燥：接著乾燥基底材料以移除過量的水，以獲得研磨 片材（2)。 分析·分析所獲得之研磨片材（2)與半成品（丨）之特性。 待拋光之基板材料為一氧化石夕，使用之設備為IPEC372。 _ 結果顯不於表1及圖1中。結果證明，在使用調節聚合物處 理之後，硬度與壓縮比均得到改進。處理之後之密度並有 所增加。 表1 : 肖氏Α硬度 肖氏D硬度 壓縮比(％) 密度(g/cm3) 半成。口(1) 75 1〇 ' 0.45 研磨片材(2) 95 14 ^ 0.70 將所獲得之研磨片材⑺與半成品⑴安置於化學機械抛 光裝置上以用於分析拋光特性。結果顯示於表2中。結果 表明’使用調節聚合物處理之後’其移除率升高，且不均 99777.doc -16- 1290879-14- 1290879 The abrasive sheet according to the present invention is not provided with L, and the small θ breaks the surface of the substrate to be polished. In addition, when the abrasive material according to the present invention is applied, the polishing efficiency can be made full. The present invention provides an abrasive sheet comprising - having a surface for polishing - a substrate a substrate material, wherein the surface comprises a plurality of fibers, at least one elastomer, and at least one conditioning polymer, and a plurality of continuous micropores are embedded in the fibers, elastomers, and conditioning polymers. The present invention also provides a method of polishing a substrate, the method comprising: polishing a surface of a substrate using a polishing sheet, wherein the polishing sheet comprises a substrate material having a surface for polishing a substrate, wherein the surface A plurality of fibers, at least one elastomer, and at least one conditioning polymer are included, and a plurality of continuous micropores are embedded in the fibers, elastomers, and conditioning polymers. Abrasive Sheet Abrasive Sheet The following examples are for illustrative purposes only and are not intended to limit the scope of the invention. φ Example Base material: A composite fiber of Nylon 8 and polyethylene terephthalate (PET) having a denier of 3 denier was formed into a nonwoven base material, wherein the ratio of Nylon® to pet was 7:3. The base material has a thickness of 2.25 mm, a courtesy of 0.22 g/cm3, and a basis weight of 496 g/m2. Dipping · The base material was impregnated into an elastomer solution containing 49% by weight of polyurethane, 49% by weight of solvent and 2% by weight of detergent. Curing: After impregnation, the substrate material was placed in a solidified solution containing 18% by weight of an aqueous solution of dimethyl hydrazine, and the immersed in the fiber 99777.doc -15-128901. Washing: The residue and excess curing solution are removed by a squeeze wheel. The substrate material was then washed in water at 80 ° C and then the substrate material was subjected to a squeeze wheel several times. Drying: After washing, the substrate material was then dried at 140 °C. After polishing and drying, the base material was mechanically polished at 1200 and 1300 rpm using sandpaper of #150 and #400 to obtain a 128 mm semi-finished product (1) having a flat surface. • ^ Impregnation and solidification: A 1.28 mm semi-finished product was impregnated into a conditioning polymer solution containing 75 wt% of polymethyl methacrylate and a squeeze wheel assisted impregnation. The impregnated semifinished product is then cured at 12 5 °C. Drying: The base material is then dried to remove excess water to obtain a ground sheet (2). Analyze and analyze the properties of the obtained abrasive sheet (2) and semi-finished product (丨). The substrate material to be polished is a oxidized stone, and the device used is IPEC372. _ The results are not shown in Table 1 and Figure 1. As a result, it was confirmed that the hardness and the compression ratio were improved after the treatment with the conditioning polymer. The density after treatment has increased. Table 1: Shore hardness 肖 Shore D hardness Compression ratio (%) Density (g/cm3) Semi-form. Mouth (1) 75 1〇 '0.45 Abrasive sheet (2) 95 14 ^ 0.70 The obtained abrasive sheet (7) and semi-finished product (1) were placed on a chemical mechanical polishing apparatus for analysis of polishing characteristics. The results are shown in Table 2. The results show that the removal rate is increased after treatment with the conditioning polymer, and the unevenness is 99777.doc -16-12890879
儘管已說明並描述了本發明之實施例，但本發明所屬技 術領域中具通常知識者仍可作出各種修改及改進。因此本 發明之實施例係自說明性而非限制性之意義上加以描述。While the embodiments of the present invention have been illustrated and described, it will be understood that The embodiments of the invention are therefore described by way of illustration and not limitation.
期望本發明並不限於所說明之特定形式，並期望所有不偏 離本發明之精神及範疇之修改均處於申請專利範圍所界定 之範圍内。 【圖式簡單說明】 圖1為半成品（l)(a)及研磨片材（2)(b)之穿透式電子顯微 鏡圖。 99777.docIt is to be understood that the invention is not to be construed as being limited to the details of the scope of the invention. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a transmission electron micrograph of a semi-finished product (1) (a) and an abrasive sheet (2) (b). 99777.doc
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