TWI279396B - Substrate glass for display device - Google Patents

Substrate glass for display device Download PDF

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Publication number
TWI279396B
TWI279396B TW094117912A TW94117912A TWI279396B TW I279396 B TWI279396 B TW I279396B TW 094117912 A TW094117912 A TW 094117912A TW 94117912 A TW94117912 A TW 94117912A TW I279396 B TWI279396 B TW I279396B
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TW
Taiwan
Prior art keywords
glass
display device
substrate glass
expansion coefficient
deformation point
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TW094117912A
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Chinese (zh)
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TW200609194A (en
Inventor
Tatsuya Tsuzuki
Hiroshi Machishita
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Central Glass Co Ltd
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Priority claimed from JP2004164311A external-priority patent/JP4391321B2/en
Priority claimed from JP2004283139A external-priority patent/JP2006096594A/en
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Publication of TW200609194A publication Critical patent/TW200609194A/en
Application granted granted Critical
Publication of TWI279396B publication Critical patent/TWI279396B/en

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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C03C3/087Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20Constructional details
    • H01J11/34Vessels, containers or parts thereof, e.g. substrates

Abstract

A substrate glass for a flat panel display device, which comprises, in wt%, 63 to 69% of SiO2, 0.5 to 5% of Al2O3, 2 to 7% of Na2O, 8 to 17% of K2O, 10 to 18% of MgO, 0 to 7% of CaO, 0 to 3% of SrO, 0 to 3% of BaO and 0.5 to 7% of ZrO2, and has a distortion spot of 570 DEG C or higher.

Description

1279396 (1) 九、發明說明 【發明所屬之技術領域】 本發明係有關耐熱性優,輕量且高強度的玻璃組成 ^ 物。特別是有關適合於要求與通常的鈉鈣矽玻璃同樣高熱 膨脹係數與高耐熱性之玻璃基板,例如PDP (電漿顯示面 板)、或EL (電激發光)、FE (冷發色顯示器)等的電子顯 示用基板之玻璃組成物。 【先前技術】 向來,於PDP的製造領域,基板玻璃使用於常溫〜 3〇〇°C的熱膨脹係數爲80〜90 X 1(T7/ °C程度,變形點爲 5 1 0〜5 2 0 °C程度的鈉鈣矽玻璃。鈉鈣矽玻璃利用於多方 面’具低價格而容易調配的利點。但是由於變形點低,配 置於玻璃基板上的電極線圖型,由更低融點之玻璃形成絕 緣被覆等,面板製作上施以各種熱處理時,基板玻璃容易 ® 產生彎曲或收縮等的變形之不適現象。 爲消除上述不適現象,近年提案以與鈉鈣矽玻璃同樣 的鈉鈣系玻璃,具鈉鈣矽玻璃近似的熱膨脹係數,變形點 • 超過5 5 0 °C,或超過600°C之高變形點玻璃(例如專利文 獻1〜3 )。此等的玻璃,於顯示面板的製造步驟,熱變形 少,又與其他構材的整合性亦佳。 專利文獻1 :日本專利第273 8 03 6號公報 專利文獻2 :日本特開平9-20264 1號公報 專利文獻1 :日本特開平9-25 5 3 54號公報 (2) 1279396 【發明內容】 [發明之揭示] 但是,向來的高變形玻璃,成分組成本身對鈉鈣矽玻 ~ 璃稍稍爲特異之組成,向來的高變形點玻璃的密度比鈉鈣 矽玻璃重,多數超過2.6。此係顯示裝置的輕量化困難的 問題,產生因玻璃基板的自重而下陷的問題。即,由玻璃 基板的自重之下陷量 (W)爲如式(1)所示,隨玻璃的 • 密度 (P )而增大,因此玻璃基板大型化時下陷量變更 大,於基板的運輸或移動步驟引起破損等的不適。 W = c ( p / E) (L4 / t2) (1) W :最大下陷量,L : 2邊支撐間的距離,t :板厚, P :玻璃密度,E :玻璃的楊氏係數,c :係數 又,由於向來之高變形玻璃比鈉鈣矽玻璃脆,施以各 ^ 種處理時有容易破裂的問題。一般玻璃的破裂係由傷痕 (龜裂)爲起點所引起之脆性破壞,對該破壞之抗性係稱 爲破壞靭性 (KIC)。因此,爲改善上述破裂問題必要爲 - KIC高的玻璃。 本發明的目的,係爲解決此等問題,提供具有與鈉鈣 矽玻璃同程度的線膨脹係數,同時變形點與KIC高’密度 低爲特性之基板玻璃。1279396 (1) Description of the Invention [Technical Field of the Invention] The present invention relates to a glass composition excellent in heat resistance, light weight, and high strength. In particular, it is suitable for glass substrates that require the same high thermal expansion coefficient and high heat resistance as ordinary soda strontium glass, such as PDP (plasma display panel), EL (electrically excited light), FE (cold hair color display), etc. The glass composition of the substrate for electronic display. [Prior Art] Conventionally, in the field of PDP manufacturing, the substrate glass is used at a normal temperature of ~3 ° C. The coefficient of thermal expansion is 80 to 90 X 1 (T7 / ° C degree, the deformation point is 5 1 0 to 5 2 0 ° C-level sodium-calcium bismuth glass. Sodium-calcium strontium glass is used in many aspects to have a low price and easy to adjust. However, due to the low deformation point, the electrode line pattern placed on the glass substrate is lower than the melting point. When the glass is formed into an insulating coating or the like, and the various heat treatments are applied to the panel, the substrate glass is likely to be deformed by bending or shrinkage. In order to eliminate the above-mentioned discomfort, the soda-lime glass similar to the soda-lime-glass glass has been proposed in recent years. A glass having a thermal expansion coefficient similar to that of sodium calcium strontium glass, a deformation point of more than 550 ° C, or a high deformation point glass exceeding 600 ° C (for example, Patent Documents 1 to 3). These glasses are used in the manufacture of display panels. In the step, the thermal deformation is small, and the integration with other members is also good. Patent Document 1: Japanese Patent No. 273 8 03 6 Patent Document 2: Japanese Patent Laid-Open No. 9-20264 No. 1 Patent Document 1: Japanese Special Opening 9-25 5 3 54 (2) 1279396 [Disclosure of the Invention] [Revelation of the Invention] However, the high-deformation glass of the past has a composition which is slightly specific to the sodium calcium silicate glass, and the density of the high-deformation point glass is higher than that of the sodium calcium strontium. The glass is heavy, and most of them exceed 2.6. This is a problem that the weight of the display device is difficult to be sag due to the weight of the glass substrate. That is, the amount of self-weight (W) of the glass substrate is as shown in the formula (1). Since the glass substrate increases in density (P), the amount of sag is greatly changed when the glass substrate is enlarged, and discomfort such as breakage occurs in the transportation or moving step of the substrate. W = c ( p / E) (L4 / t2) (1) W: maximum sinking amount, L: distance between 2 side supports, t: plate thickness, P: glass density, E: Young's modulus of glass, c: coefficient, due to the high deformation glass that is more than sodium calcium The glass is brittle and has a problem of easy cracking when applied to various treatments. Generally, the crack of the glass is brittle fracture caused by the flaw (crack), and the resistance to the damage is called fracture toughness (KIC). Therefore, it is necessary to improve the above cracking problem. - KIC-high glass. The object of the present invention is to provide a substrate glass having the same linear expansion coefficient as that of soda-lime-germ glass and a low deformation point and KIC high density.

依本發明,可提供以重量%表示’含有Si〇2爲63〜 69、Al2〇3 爲 〇·5〜5、Na20 爲 2〜7、K20 爲 8〜17、MgO 1279396According to the present invention, it can be provided in % by weight, 'containing Si〇2 is 63 to 69, Al2〇3 is 〇·5~5, Na20 is 2 to 7, K20 is 8 to 17, MgO 1279396

爲10〜18、CaO爲0〜7、SrO爲0〜3、BaO爲0〜3、 Zr〇2爲0.5〜7,且變形點爲5 7 0 °C以上之平面顯示裝置用 基板玻璃。 [發明之最佳實施形態] 依本發明,可提供具有通常之鈉鈣矽玻璃同程度的膨 脹係數,密度低,且破壞強靭性KIC高的高變形點玻璃, φ 極適合於PDP、EL及FED等的電子顯示器用玻璃基板。 依本發明的上述玻璃,實質上,以重量%表示,可僅 含有 Si02 爲 63 〜69、A1203 爲 0.5〜5、Na20 爲 2〜7、 K2〇 爲 8〜17、MgO 爲 10〜18、CaO 爲 0〜7、SrO 爲 0〜 3、BaO爲0〜3、Zr02爲0.5〜7所構成的玻璃。The substrate glass for a flat display device having 10 to 18, CaO of 0 to 7, SrO of 0 to 3, BaO of 0 to 3, Zr〇2 of 0.5 to 7, and a deformation point of 570 ° C or more. BEST MODE FOR CARRYING OUT THE INVENTION According to the present invention, it is possible to provide a high-deformation point glass having the same degree of expansion coefficient as that of ordinary soda-lime glass, low density, and high KIC resistance, and φ is extremely suitable for PDP, EL and A glass substrate for an electronic display such as FED. The glass according to the present invention is substantially expressed by weight %, and may contain only SiO 2 of 63 to 69, A1203 of 0.5 to 5, Na20 of 2 to 7, K2 〇 of 8 to 17, MgO of 10 to 18, and CaO. A glass composed of 0 to 7, SrO of 0 to 3, BaO of 0 to 3, and Zr02 of 0.5 to 7.

Si02爲玻璃主成分,重量%未達63%時由於不能得到 所希望的破壞靭性KIC,玻璃的耐熱性及化學耐久性惡 化。另一方面超過69%時、由於玻璃融液的高溫黏度變 # 高,玻璃成形變困難。又,玻璃的線熱膨脹係數過小,與 顯示面板的其他構件的整合性變差。因此爲63〜69%,理 想爲64〜68%的範圍。 ^ ai2o3爲提高變形點及破壞靭性KIC之成分,爲必須 之成分。重量%未達0.5 %時玻璃的變形點及破壞靭性K1C 變低,另一方面超過5 °/。時由於玻璃融液的高溫黏度變 高,透明消失傾向增大玻璃成形變困難。因此以〇.5〜 5 %,理想爲1〜4 %。Si02 is a glass main component, and when the weight % is less than 63%, the desired fracture toughness KIC cannot be obtained, and the heat resistance and chemical durability of the glass are deteriorated. On the other hand, when it exceeds 69%, since the high-temperature viscosity of the glass melt becomes high, the glass forming becomes difficult. Further, the coefficient of thermal expansion of the glass is too small, and the integration with other members of the display panel is deteriorated. Therefore, it is 63 to 69%, and is ideally in the range of 64 to 68%. ^ ai2o3 is a necessary component for improving the deformation point and breaking the toughness KIC. When the weight % is less than 0.5%, the deformation point and fracture toughness K1C of the glass become lower, and on the other hand, it exceeds 5 °/. At the time, since the high-temperature viscosity of the glass melt becomes high, the tendency of the transparent disappearance tends to increase the difficulty in forming the glass. Therefore, 〇.5~5 %, ideally 1~4%.

Na2◦與K20同爲玻璃熔解時的融劑作用,又爲維持 (4) 1279396 適度玻璃的線熱膨脹係數不可或缺者。未達2°/。時作爲融 劑的效果不充分,又線膨脹係數過低。超過7%時變形點 過低。因此以2〜7 %,理想爲3〜6 %。 K20,顯示Na20同樣的作用效果,同時由於與Na20 的混合鹼效果抑制鹼離子的移動,爲高玻璃體積電阻率必 須之成分。未達8 %時此等的作用不充分,超過1 7 %時線 膨脹係數過大,又變形點過低。 Κ2〇含量可爲14〜17%,更可爲15〜17%。K20爲該 含量時,定義爲本發明的第1玻璃。相對的Κ20含量爲8 〜15%,又8〜14%,或10〜13 %亦可,Κ20爲該含量時, 定義爲本發明的第2玻璃。Both Na2◦ and K20 are the melt action of glass melting, and it is indispensable to maintain the linear thermal expansion coefficient of (4) 1279396 moderate glass. Less than 2°/. The effect as a melt is insufficient and the coefficient of linear expansion is too low. When it exceeds 7%, the deformation point is too low. Therefore, 2 to 7%, ideally 3 to 6%. K20 shows the same effect of Na20, and at the same time, it inhibits the movement of alkali ions due to the mixed alkali effect with Na20, which is a necessary component for high glass volume resistivity. When the amount is less than 8%, the effect is not sufficient. When the temperature exceeds 17%, the coefficient of linear expansion is too large, and the deformation point is too low. The content of Κ2〇 may be 14 to 17%, and may be 15 to 17%. When K20 is this content, it is defined as the first glass of the present invention. The relative Κ20 content is 8 to 15%, 8 to 14%, or 10 to 13%. When Κ20 is the content, it is defined as the second glass of the present invention.

MgO爲增大玻璃的破壞靭性KIC,又可提昇變形點的 必須成分。未達1 0 %時此等的作用不充分。另一方面超過 1 8 %時由於透明消失傾向變大,玻璃的成形變困難。因此 以1 0〜1 8 %,理想爲1 〇 · 5〜1 6 %的範圍。MgO is an essential component for increasing the fracture toughness KIC of the glass and increasing the deformation point. When the amount is less than 10%, the effect is not sufficient. On the other hand, when it exceeds 18%, the tendency of transparency disappears, and the formation of glass becomes difficult. Therefore, the range is 1 0~1 8 %, ideally 1 〇 · 5~1 6 %.

CaO非爲必要成分,具有玻璃熔解時降低熔融玻璃的 黏度作用,同時具有提昇玻璃變形點的作用。因此可含 7°/。以下。超過7%時玻璃的硬度上升破壞靭性Kic下降, 理想爲導入7%以下。CaO is not an essential component, and has a function of lowering the viscosity of the molten glass when the glass is melted, and has a function of raising the deformation point of the glass. Therefore it can contain 7°/. the following. When the hardness exceeds 7%, the hardness of the glass rises and the toughness Kic decreases, and it is preferable to introduce 7% or less.

SrO與BaO非爲必要成分,與CaO共存下具有降低 玻璃融液的高溫黏度抑制產生透明消失的作用。超過3 % 時線熱膨脹係數高,各自爲3 %以下的範圍爲理想。SrO and BaO are not essential components, and coexistence with CaO has the effect of reducing the high-temperature viscosity of the glass melt to cause transparency to disappear. When the temperature exceeds 3%, the coefficient of thermal expansion of the line is high, and each of them is preferably in the range of 3% or less.

Zr〇2爲具有提升玻璃變形點、玻璃的化學耐久性的 效果之必要成分’以含有0.5以上爲理想。超過7%時密 (5) 1279396 度上升,不能維持所希望之値。因此以0.5〜7%,理想爲 1〜6 %的範圍。 ^ B2〇3非必要成分,由於具有降低玻璃熔解時熔融玻 , 璃的黏度作用,具有減少透明消失傾向的作用,可含5% 以下。超過5%時變形點過低,以導入5%以下的範圍爲理 想。Zr〇2 is an essential component for the effect of improving the chemical stability of the glass and the chemical durability of the glass. The content of Zr〇2 is preferably 0.5 or more. When it is more than 7%, the density (5) rises to 1,279,396 degrees, and it cannot maintain the hope. Therefore, it is in the range of 0.5 to 7%, preferably 1 to 6%. ^ B2〇3 Non-essential component, because it has the effect of reducing the viscosity of molten glass and glass when the glass is melted, it has the effect of reducing the tendency of transparency to disappear, and may contain 5% or less. When the value exceeds 5%, the deformation point is too low, and it is desirable to introduce a range of 5% or less.

Li20爲非必要成分,可促進降低玻璃的高溫黏度, # 玻璃原料的熔融。但是,含量超過3 %時變形點過度降 低,以導入3 %以下範圍爲理想。 依本發明例示之型態玻璃可僅由上述成分所構成,在 不損及本發明的目的範圍可含其他成分以重量%表示其合 計量不超過3 %。例如,爲玻璃的熔解、澄清、成形性的 改善可含S03、Cl、F、As203等合計量1%以下。又,爲 玻璃的著色可含合計量1%以下之Fe2〇3、CoO、NiO等。 又,爲防止PDP對電子線的褐色化可含Ti02及Ce02各 — 自至1 %,合計量至1 %。 變形點未達57(TC,於基板上配置電極線圖型,更由 低融點玻璃形成絕緣被覆等,面板製作時施以各種熱處理 . 時,基板玻璃容易產生變曲或收縮等變形之不適宜情形。 又,本發明的玻璃,於3 0 °C〜3 0 0 °C之平均線熱膨脹 係數可爲70 X 1(T7 °C至90 X 10·7 °C的範圍。超出此範 圍時與構成顯示面板的其他構材的整合性變差。 又,本發明的第1玻璃,於3 0 °C〜3 0 0 °C之平均線熱 膨脹係數可爲86 X 10·7 °C至90 X ΙΟ·7 t的範圍內,亦 -8- (6) 1279396 可爲87 χ ΙΟ'7 °C至88 χ l〇·7 °C的範圍內,爲後者的範 圍時平均線膨脹係數約略與一般浮體法所製造之鈉鈣矽玻 ‘ 璃的平均線熱膨脹係數相等。相對於此,第2玻璃,於 - 30°C〜3〇〇°C之平均線熱膨脹係數可爲70 X 1 (Γ7 °C至85 X 10·7 °C的範圍內。 又,本發明的玻璃,破壞靭性K! c亦可爲0.7 Μ P a · m1/2以上。破壞靭性KIC未達0.7 MPa · m1/2也許顯示裝 # 置的製造步驟中容易產生破裂的問題。 又,本發明的玻璃,亦可密度低於2.6 g / cm3。密度 爲2.6 g / cm3以上時,比一般的鈉鈣矽玻璃之値爲大, 顯示裝置大型化時產生由玻璃基板的自重而變形或破壞等 的不適宜情形。 【實施方式】 以下以表1所示非限定的實施例1〜5及表2所示非 ® 限定的實施例1〜8各自例證本發明的第1及第2玻璃 者。相對於此,表3所示之比較例1〜4爲此等之對照 者0 (實施例1〜5,實施例1〜8及比較例1〜4) (玻璃的製作) 將由矽砂、氧化鋁、碳酸鈉、硫酸鈉、碳酸鉀、氧化 鎂、碳酸鈣、碳酸緦、碳酸鋇、及矽酸鉻所成調合原料塡 充於鉑鉗鍋,於1 5 0 0〜1 6 0 0 °C電爐內,約加熱6小時熔 (7) 1279396 融,加熱熔融途中以鉑棒攪拌融液將玻璃均質化。其次將 熔融玻璃倒入鑄型,爲緩緩冷卻將其移至保持600〜700 °C的電氣爐內於該爐內冷卻,得到如表1的實施例1〜 — 5、表2的實施例1〜8及表3的比較例1〜4所示組成之 玻璃。所得之玻璃試料爲無氣泡或脈理的均質物。 此等之玻璃依以下的方法測定變形點(°C )、平均線熱 膨脹係數(1(T7 /°C)、破壞靭性KIC (MPa· m1/2)及密度 _ (g / cm3)。 變形點依JIS R 3103-2的規定爲基準由射線彎曲法測 定。線膨脹係數係使用機械分析裝置TM A 8 3 1 0 (日本理 學電機(股)製)測定於30〜3 00 °C之平均線熱膨脹係 數。破壞性係使用微小硬度計DMH - 2 (日本松澤精機 (股)製)依JIS R 1 607記載之精密陶瓷的破壞靭性試驗 方法(壓子壓入法)算出。密度以無泡玻璃(約5 〇 g) 依阿基米德法測定。 -10- (8) 1279396 表 1_ 實施例 1 2 3 4 5Li20 is an optional component that promotes lowering the high temperature viscosity of the glass and #melting of the glass material. However, when the content exceeds 3%, the deformation point is excessively lowered, and it is desirable to introduce a range of 3% or less. The exemplified glass according to the present invention may be composed only of the above-mentioned components, and other components may be contained in a weight % of not more than 3% by weight insofar as the object of the present invention is not impaired. For example, the melting, clarification, and moldability of the glass may include a total amount of S03, Cl, F, and As203 of 1% or less. Further, the color of the glass may contain Fe2〇3, CoO, NiO or the like in a total amount of 1% or less. Further, in order to prevent the PDP from browning the electron beam, it is possible to contain Ti02 and Ce02 each to 1%, and the total amount is 1%. The deformation point is less than 57 (TC, the electrode line pattern is placed on the substrate, and the insulating coating is formed by the low-melting glass. When the panel is manufactured with various heat treatments, the substrate glass is prone to deformation or shrinkage. Further, in the glass of the present invention, the average linear thermal expansion coefficient at 30 ° C to 300 ° C may be 70 X 1 (T7 ° C to 90 X 10 · 7 ° C. When this range is exceeded) The integration with other members constituting the display panel is deteriorated. Further, in the first glass of the present invention, the average linear thermal expansion coefficient at 30 ° C to 300 ° C may be 86 X 10·7 ° C to 90 ° In the range of X ΙΟ·7 t, also -8-(6) 1279396 can be in the range of 87 χ 7 '7 °C to 88 χ l〇·7 °C, and the average linear expansion coefficient is approximately the same in the latter range. Generally, the average linear thermal expansion coefficient of the soda-calcium glass produced by the floating body method is equal. In contrast, the second glass has an average linear thermal expansion coefficient of 70 X 1 at - 30 ° C to 3 ° ° C ( Γ 7 ° C to 85 X 10·7 ° C. Further, in the glass of the present invention, the fracture toughness K! c may be 0.7 Μ P a · m1/2 or more. The fracture toughness KIC is not reached. 0.7 MPa · m1/2 may show the problem of cracking easily in the manufacturing steps of the device. Moreover, the glass of the present invention may have a density of less than 2.6 g / cm 3 . When the density is 2.6 g / cm 3 or more, the ratio is higher than the average The sodium sulphate glass is large, and when the display device is enlarged, an unsuitable situation such as deformation or destruction of the glass substrate due to its own weight occurs. [Embodiment] Hereinafter, the non-limiting examples 1 to 5 and the table shown in Table 1 are shown. The first and second glasses of the present invention are exemplified by the non-® limited examples 1 to 8 shown in Fig. 2. In contrast, the comparative examples 1 to 4 shown in Table 3 are the counterparts 0 of this example (Example 1) ~5, Examples 1 to 8 and Comparative Examples 1 to 4) (Production of glass) will be composed of cerium, alumina, sodium carbonate, sodium sulfate, potassium carbonate, magnesium oxide, calcium carbonate, cesium carbonate, cesium carbonate, and cesium. The raw material prepared by the acid chromium is filled in a platinum pliers pot, and is heated in an electric furnace at 1 500 to 1 600 ° C for about 6 hours to melt (7) 1279396. The mixture is heated and melted to melt the glass with a platinum rod. Homogenization. Next, pour the molten glass into the mold and move it to a temperature of 600~700 °C for slow cooling. The furnace was cooled in the furnace to obtain glasses of the compositions shown in Examples 1 to 5 of Table 1, Examples 1 to 8 of Table 2, and Comparative Examples 1 to 4 of Table 3. The obtained glass sample was bubble-free. Or homogenous matter of the vein. These glasses are measured by the following methods for deformation point (°C), average linear thermal expansion coefficient (1 (T7 / ° C), fracture toughness KIC (MPa · m1/2) and density _ ( g / cm3). The deformation point is measured by the ray bending method based on the provisions of JIS R 3103-2. The linear expansion coefficient was measured by a mechanical analyzer TM A 8 3 1 0 (manufactured by Nippon Scientific Electric Co., Ltd.) at an average linear thermal expansion coefficient of 30 to 300 °C. The destructive system was calculated using a microhardness tester DMH-2 (manufactured by Matsushita Seiki Co., Ltd.) in accordance with the fracture toughness test method (compression press method) of the precision ceramics described in JIS R 1 607. The density is determined by the Achillemethod method using a bubble-free glass (about 5 〇 g). -10- (8) 1279396 Table 1_ Example 1 2 3 4 5

Si 〇2 66.0 Al2 〇3 1.0 Na20 4.0 K20 15.5 MgO 11.0 CaO SrO BaO Zr 02 2.5 變形點 570 密度 2.491 破壞靭性KIC 0.767 膨脹係數 88 64.5 64.5 64.0 63.0 2.0 3.0 3.5 4.0 4.0 4.0 3.5 5.0 15.5 15.5 16.5 14.0 11.5 10.5 10.0 10.0 0.5 0.5 1.0 2.5 2.0 2.0 3.0 573 570 572 570 2.496 2.485 2.483 2.512 0.775 0.797 0.805 0.784 86 86 87 87 -11 - (9) 1279396 表2_ 實施例 123456 78Si 〇 2 66.0 Al2 〇3 1.0 Na20 4.0 K20 15.5 MgO 11.0 CaO SrO BaO Zr 02 2.5 Deformation point 570 Density 2.491 Destructive toughness KIC 0.767 Expansion coefficient 88 64.5 64.5 64.0 63.0 2.0 3.0 3.5 4.0 4.0 4.0 3.5 5.0 15.5 15.5 16.5 14.0 11.5 10.5 10.0 10.0 0.5 0.5 1.0 2.5 2.0 2.0 3.0 573 570 572 570 2.496 2.485 2.483 2.512 0.775 0.797 0.805 0.784 86 86 87 87 -11 - (9) 1279396 Table 2_ Example 123456 78

Si 〇2 AI2 〇3 63.5 64.0 64.0 65.0 65.0 65.0 65.5 68.0 4.5 4.5 4.5 5.0Si 〇2 AI2 〇3 63.5 64.0 64.0 65.0 65.0 65.0 65.5 68.0 4.5 4.5 4.5 5.0

Na2 0 κ20 14.0 10.5 MgO 10.5 11.5 CaO 0.5 0.5 SrO 0.5 0.5 BaO Zr 02 2.0 3.5 變形點 593 606 密度 2.51 2.535 破壞靭性KIC 0.87 0.838 膨脹係數 85 76 2.0 1.0 1.5 3.0 2.0 1.0 6.0 3.0 6.0 4.0 3.5 6.0 8.5 11.0 8.0 11.5 11.5 8.0 15.0 10.5 13.0 11.0 1L0 16.0 0.5 2.0 1.5 1.0 1.0 3.0 0.5 0.5 0.5 1.0 3.5 4.5 3.5 4.0 5.5 1.0 601 606 597 614 624 586 2.563 2.587 2.569 2.537 2.548 2.505 0.834 0.774 0.806 0.819 0.819 0.875 79 72 79 76 71 77 -12- (10) 1279396 表 3_________ 比較例 1 23 4Na2 0 κ20 14.0 10.5 MgO 10.5 11.5 CaO 0.5 0.5 SrO 0.5 0.5 BaO Zr 02 2.0 3.5 Deformation point 593 606 Density 2.51 2.535 Destructive toughness KIC 0.87 0.838 Expansion coefficient 85 76 2.0 1.0 1.5 3.0 2.0 1.0 6.0 3.0 6.0 4.0 3.5 6.0 8.5 11.0 8.0 11.5 11.5 8.0 15.0 10.5 13.0 11.0 1L0 16.0 0.5 2.0 1.5 1.0 1.0 3.0 0.5 0.5 0.5 1.0 3.5 4.5 3.5 4.0 5.5 1.0 601 606 597 614 624 586 2.563 2.587 2.569 2.537 2.548 2.505 0.834 0.774 0.806 0.819 0.819 0.875 79 72 79 76 71 77 - 12- (10) 1279396 Table 3_________ Comparative Example 1 23 4

Si 〇2 70.9 54.6 55.5 68.9 Ah 〇3 2.0 8.7 6.6 0.9 Na2〇 13.6 4.5 5.1 4.6 K2〇 0.8 8.2 6.4 4.8 MgO 3.6 2.9 1.2 0.1 CaO 9.1 7.4 2.2 9.7 SrO 9.3 6.7 BaO 9.9 9.0 0.4 Zr O2 3.8 4.7 3.9 變形點 507 583 580 582 密度 2.514 2.741 2.843 2.64 破壞靭性KIC 0.73 0.65 0.67 0.64 膨脹係數 87 85 83 75Si 〇2 70.9 54.6 55.5 68.9 Ah 〇3 2.0 8.7 6.6 0.9 Na2〇13.6 4.5 5.1 4.6 K2〇0.8 8.2 6.4 4.8 MgO 3.6 2.9 1.2 0.1 CaO 9.1 7.4 2.2 9.7 SrO 9.3 6.7 BaO 9.9 9.0 0.4 Zr O2 3.8 4.7 3.9 Deformation point 507 583 580 582 Density 2.514 2.741 2.843 2.64 Destructive toughness KIC 0.73 0.65 0.67 0.64 Expansion coefficient 87 85 83 75

(結果) 表1的實施例1〜5的玻璃及表2中的實施例1〜8的 玻璃各自對應本發明的第1及第2玻璃。比較例1爲鈉鈣 矽玻璃。比較例2〜4爲向來的高變形點玻璃。比較例1 的鈉鈣矽玻璃,密度低於2·6、破壞靭性Kic爲〇·7 Mpa · m 1/2者’變形點顯著呈現低於比較例2〜4的高變形點玻 -13- (11) Γ279396 璃。一方面,比較例2〜4的咼變形點玻璃’顯示變形點 爲於5 8 0 °C以上者,密度超過2 · 6又破壞靭性c未達0 · 7 ΜPa · m 1 /2。 ^ 相對於此,表1中的實施例1〜5及表2中實施例1 〜8的玻璃,5 7 0 °C以上充分高的變形點’密度未達2 ·6 ’ 破壞靭性爲超過〇·75 MPa· m1/2充分滿足0.7 MPa· m1/2 以上。因此,可明白本申請發明的玻璃具有與鈉錦砂玻璃 •同樣的線熱膨脹係數,具有向來高變形點玻璃同樣的耐熱 性,低密度,而破壞靭性高’(Results) The glasses of Examples 1 to 5 in Table 1 and the glasses of Examples 1 to 8 in Table 2 correspond to the first and second glasses of the present invention. Comparative Example 1 is a soda lime bismuth glass. Comparative Examples 2 to 4 are conventional high-deformation point glasses. In the sodium-calcium bismuth glass of Comparative Example 1, the density was less than 2.6, and the fracture toughness Kic was 〇·7 Mpa · m 1/2. The deformation point was significantly lower than that of Comparative Example 2 to 4 (11) Γ279396 glass. On the other hand, the 咼 deformation point glass of Comparative Examples 2 to 4 showed a deformation point of 580 ° C or more, and the density exceeded 2 · 6 and the fracture toughness c did not reach 0 · 7 Μ Pa · m 1 /2. On the other hand, in the glass of Examples 1 to 5 in Table 1 and Tables 1 to 8 in Table 2, the deformation point at a sufficiently high density of 570 ° C or higher was less than 2 · 6 ', and the fracture toughness exceeded 〇. ·75 MPa·m1/2 satisfies 0.7 MPa·m1/2 or more. Therefore, it can be understood that the glass of the present invention has the same linear thermal expansion coefficient as that of the sodium brocade glass, and has the same heat resistance as the high-deformation point glass, low density, and high fracture toughness.

-14--14-

Claims (1)

1279396 ψ 十、申請專利範園 第94 1 1 79 1 2號專利申請案 中文申請專利範圍修正本 民國95年12月8 日修正1279396 ψ X. Application for Patent Fan Park No. 94 1 1 79 1 2 Patent Application Revision of Chinese Patent Application Scope Amendment of December 8, 1995 1 · 一種平面顯示裝置用基板玻璃,其特徵爲,以重 量%表示,含有 Si02爲 63〜69、Α12〇3爲 0.5〜5、Na20 爲2〜7、K2〇爲8〜17、MgO爲10〜18、CaO爲0〜7、 31*0爲〇〜3、:8&0爲0〜3、21*02爲0.5〜7,且變形點爲 570°C以上,破壞靭性 KIC爲0.7 MPa · m1/2以上,密度 爲低於2·6 g / cm3者。 2 ·如申請專利範圍第1項之平面顯示裝置用基板玻 璃,其實質以重量%表示,僅由Si02爲63〜69、Al2〇3爲 0.5 〜5、Na2〇 爲 2 〜7、K20 爲 8 〜17、MgO 爲 10 〜18、 CaO 爲 〇〜7、Si:0 爲 0 〜3、BaO 爲 0〜3、Zr02 爲 0.5 〜7 所成者。 3 .如申請專利範圍第1或2項之平面顯示裝置用基 板玻璃,其爲含Κ2 Ο 1 4〜1 7重量%。 4. 如申請專利範圍第1或2項之平面顯示裝置用基 板玻璃,其爲含Κ2 Ο 8〜1 5重量。/〇。 5. 如申請專利範圍第1或2項之平面顯示裝置用基 板玻璃,其中於30°C〜3 00 °C之平均線熱膨脹係數爲70 X iO·7 / 〇C 〜90 X 1〇·7 /。。者。 6. 如申請專利範圍第3項之平面顯示裝置用基板玻 璃,其中於30°C〜300°C之平均線熱膨脹係數爲86 X 10·7 12793961 . A substrate glass for a flat display device, which is characterized by weight %, containing SiO 2 of 63 to 69, Α12〇3 of 0.5 to 5, Na20 of 2 to 7, K2〇 of 8 to 17, and MgO of 10 ~18, CaO is 0 to 7, 31*0 is 〇~3, 8&0 is 0 to 3, 21*02 is 0.5 to 7, and the deformation point is 570 ° C or more, and the fracture toughness KIC is 0.7 MPa. Above m1/2, the density is less than 2·6 g / cm3. 2. The substrate glass for a flat display device according to claim 1, wherein the substrate is substantially expressed by weight %, and is only 63 to 69 for SiO 2 , 0.5 to 5 for Al 2 〇 3, 2 to 7 for Na 2 , and 8 for K 20 . ~17, MgO is 10 to 18, CaO is 〇~7, Si:0 is 0 to 3, BaO is 0 to 3, and Zr02 is 0.5 to 7. 3. The substrate glass for a flat display device according to claim 1 or 2, which is Κ2 Ο 14 4 to 17% by weight. 4. The base glass for a flat display device according to claim 1 or 2, which is Κ2 Ο 8 to 15 weight. /〇. 5. The substrate glass for a flat display device according to claim 1 or 2, wherein the average linear thermal expansion coefficient at 30 ° C to 300 ° C is 70 X iO · 7 / 〇 C 〜 90 X 1 〇 · 7 /. . By. 6. The substrate glass for a flat display device according to item 3 of the patent application, wherein the average linear thermal expansion coefficient at 30 ° C to 300 ° C is 86 X 10·7 1279396 / °C 〜9 Ο χ 1 (Γ7 / °C 者。 7 .如申請專利範圍第4項之平面顯示裝置用基板玻 璃,其中於30°C〜3 00 °C之平均線熱膨脹係數爲70 χ 10_7 / °C 〜8 5 χ 1 0 ·7 / °C 者。 -2-/ °C ~9 Ο χ 1 (Γ7 / °C. 7. For the substrate glass for flat panel display device of claim 4, the average linear thermal expansion coefficient at 30 ° C to 300 ° C is 70 χ 10_7 / °C ~ 8 5 χ 1 0 · 7 / °C. -2-
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